TWI417412B - A carbon nanotube array and method for making the same - Google Patents
A carbon nanotube array and method for making the same Download PDFInfo
- Publication number
- TWI417412B TWI417412B TW100113623A TW100113623A TWI417412B TW I417412 B TWI417412 B TW I417412B TW 100113623 A TW100113623 A TW 100113623A TW 100113623 A TW100113623 A TW 100113623A TW I417412 B TWI417412 B TW I417412B
- Authority
- TW
- Taiwan
- Prior art keywords
- carbon
- carbon nanotube
- catalyst layer
- reaction
- different
- Prior art date
Links
Landscapes
- Carbon And Carbon Compounds (AREA)
Description
本發明涉及一種奈米碳管陣列及其製備方法,尤其涉及一種摻有同位素的奈米碳管陣列及其製備方法。 The invention relates to a carbon nanotube array and a preparation method thereof, in particular to an isotope-doped carbon nanotube array and a preparation method thereof.
同位素標示方法係研究材料生長機理的有力工具,故,同位素標記的奈米材料可研究該奈米材料的生長機理,該同位素標記的奈米材料利用在奈米材料的合成過程中,將含有某一特定元素(一般係輕元素,如碳、硼、氮或氧)的同位素的反應物按照預定的濃度(以純物質或混合物的形式)和順序使其參與反應,從而製備出原位生長的該同位素標示的奈米材料。 The isotope labeling method is a powerful tool for studying the growth mechanism of materials. Therefore, the isotope-labeled nanomaterial can study the growth mechanism of the nanomaterial. The isotope-labeled nanomaterial will be used in the synthesis of nanomaterials. A reactant of an isotope of a specific element (generally a light element such as carbon, boron, nitrogen or oxygen) is allowed to participate in a reaction at a predetermined concentration (in the form of a pure substance or a mixture), thereby preparing the in situ growth. Isotopically labeled nanomaterials.
范守善等人於2006年4月18日公告的,公告號為US 7,029,751 B2,標題為“Isotope-doped carbon nanotube and method and apparatus for forming the same”的專利揭示了一種摻有同位素的奈米碳管陣列及其製備方法。該摻有同位素的奈米碳管陣列包括由單一同位素組成的第一奈米碳管片段和第二奈米碳管片段,該第一奈米碳管片段和第二奈米碳管片段沿奈米碳管的縱向交替排列。該摻有同位素的奈米碳管陣列的製備方法包括如下步驟:提供分別由12C和13C組成的乙烯氣體;提供其上形成有催化劑層的基底,並將該基底置入反應室中;將該反應室抽成真空,通 入預定壓力的保護性氣體;在650℃~750℃的反應條件下,使由12C組成的乙烯氣體發生反應並生成第一奈米碳管片段;反應預定時間後,將碳源切換至由13C組成的乙烯氣體上,在650℃~750℃的反應條件下,使由13C組成的乙烯氣體發生反應,繼續生長第二奈米碳管片段,從而得到摻有同位素的奈米碳管陣列。 The patent entitled "Isotope-doped carbon nanotube and method and apparatus for forming the same" is disclosed in the patent No. 7,029,751 B2, issued on Apr. 18, 2006, the disclosure of which is incorporated herein by reference. Array and its preparation method. The isotope-doped carbon nanotube array comprises a first carbon nanotube segment and a second carbon nanotube segment composed of a single isotope, the first carbon nanotube segment and the second carbon nanotube segment along the Nai The longitudinal direction of the carbon nanotubes is alternately arranged. The method for preparing an isotope-doped carbon nanotube array comprises the steps of: providing an ethylene gas composed of 12 C and 13 C, respectively; providing a substrate on which a catalyst layer is formed, and placing the substrate in a reaction chamber; The reaction chamber is evacuated, and a protective gas of a predetermined pressure is introduced; under the reaction condition of 650 ° C to 750 ° C, the ethylene gas composed of 12 C is reacted to generate a first carbon nanotube segment; after time, the carbon source gas is switched to the ethylene composition by 13 C, under the reaction conditions of 650 ℃ ~ 750 ℃, ethylene gas is composed of from 13 C to react, a second carbon nanotube segments continue to grow, so that An array of carbon nanotubes doped with isotopes is obtained.
先前技術中,所述奈米碳管陣列係由摻雜有相同的同位素的單一奈米碳管組成的。然而,先前技術中並沒有揭示一種具有複數個摻雜有不同同位素奈米碳管子陣列的奈米碳管陣列。 In the prior art, the carbon nanotube array is composed of a single carbon nanotube doped with the same isotope. However, the prior art does not disclose a carbon nanotube array having a plurality of arrays of nanotubes doped with different isotopes.
有鑒於此,提供一種具有複數個摻雜有不同同位素的奈米碳管子陣列的奈米碳管陣列及其製備方法實為必要。 In view of the above, it is necessary to provide a carbon nanotube array having a plurality of nano carbon tube arrays doped with different isotopes and a preparation method thereof.
一種奈米碳管陣列的製備方法,包括:提供一形成有催化劑層的基底,並將該形成有催化劑層的基底置入一反應室中;提供至少兩種碳源氣,該至少兩種碳源氣中的碳元素分別由不同種類的單一碳同位素組成;以及將所述至少兩種碳源氣同時通入所述反應室中,控制所述催化劑層的溫度使該催化劑層不同區域分別達到不同的反應溫度,並使所述至少兩種碳源氣在催化劑層不同區域發生反應,分別形成含有不同種類的碳同位素的奈米碳管,形成奈米碳管陣列。 A method for preparing a carbon nanotube array, comprising: providing a substrate formed with a catalyst layer, and placing the substrate formed with the catalyst layer into a reaction chamber; providing at least two carbon source gases, the at least two carbons The carbon elements in the source gas are respectively composed of different kinds of single carbon isotopes; and the at least two carbon source gases are simultaneously introduced into the reaction chamber, and the temperature of the catalyst layer is controlled to achieve different regions of the catalyst layer respectively. Different reaction temperatures, and the at least two carbon source gases react in different regions of the catalyst layer to form carbon nanotubes containing different kinds of carbon isotopes to form a carbon nanotube array.
一種利用所述奈米碳管陣列的製備方法製備的奈米碳管陣列,其中,所述奈米碳管陣列由至少兩個奈米碳管子陣列組成,所述至少兩個奈米碳管子陣列分別由含有不同組合的碳同位素的奈米碳管組成。 A carbon nanotube array prepared by the method for preparing the carbon nanotube array, wherein the carbon nanotube array is composed of an array of at least two nano carbon tubes, the at least two nano carbon tube arrays They are composed of carbon nanotubes containing different combinations of carbon isotopes.
與先前技術相比較,所述奈米碳管陣列係一個具有複數個奈米碳管子陣列的奈米碳管陣列,該複數個奈米碳管子陣列中奈米碳管分別摻雜有不同的同位素。 Compared with the prior art, the carbon nanotube array is a carbon nanotube array having a plurality of carbon nanotube arrays, and the carbon nanotubes in the plurality of nano carbon tube arrays are respectively doped with different isotopes .
所述奈米碳管陣列的製備方法通過控制所述催化劑層溫度使該催化劑層不同區域分別達到不同的反應溫度,使各種碳源氣在催化劑層不同區域發生反應,即可獲得複數個摻雜有不同同位素的奈米碳管子陣列。故,該製備方法可一次製備出複數個摻雜有不同同位素的奈米碳管,減少了製備的時間。並且,該方法通過控制催化劑層不同區域的溫度,可方便的獲得具有各種圖形的摻有同位素的奈米碳管子陣列。 The preparation method of the carbon nanotube array can obtain a plurality of dopings by controlling the temperature of the catalyst layer to achieve different reaction temperatures in different regions of the catalyst layer, and reacting various carbon source gases in different regions of the catalyst layer. An array of nano carbon tubes with different isotopes. Therefore, the preparation method can prepare a plurality of carbon nanotubes doped with different isotopes at one time, which reduces the preparation time. Moreover, the method can conveniently obtain an isotope-doped nano carbon tube array having various patterns by controlling the temperature of different regions of the catalyst layer.
10;20;30;40‧‧‧奈米碳管陣列 10;20;30;40‧‧・nano carbon nanotube array
12;14;22;24;26‧‧‧奈米碳管片段 12;14;22;24;26‧‧‧Nano carbon nanotube fragments
32;34;36;42;44;46‧‧‧奈米碳管子陣列 32;34;36;42;44;46‧‧・Nano carbon pipe array
100;200‧‧‧反應裝置 100;200‧‧‧Reaction device
102;202‧‧‧保護氣體輸入通道 102; 202‧‧‧Protective gas input channel
104;106;108;204;206;208‧‧‧碳源氣輸入通道 104;106;108;204;206;208‧‧‧carbon source input channel
110;210‧‧‧排氣通道 110; 210‧‧‧ exhaust passage
112;114;116;118;212;214;216;218‧‧‧閥門 112;114;116;118;212;214;216;218‧‧‧ valves
120;220‧‧‧反應室 120; 220‧‧‧Reaction room
122;222‧‧‧反應爐 122; 222‧‧‧Reaction furnace
130;230‧‧‧催化劑層 130; 230‧‧‧ catalyst layer
132;232‧‧‧基底 132; 232‧‧‧ base
140;240‧‧‧雷射加熱裝置 140; 240‧‧ ‧ laser heating device
圖1係本發明第一實施例奈米碳管陣列的製備方法的流程圖。 1 is a flow chart showing a method of preparing a carbon nanotube array according to a first embodiment of the present invention.
圖2係本發明第一實施例奈米碳管陣列的製備裝置的示意圖。 Fig. 2 is a schematic view showing a preparation apparatus of a carbon nanotube array according to a first embodiment of the present invention.
圖3係本發明第一實施例製備的奈米碳管陣列的示意圖。 Figure 3 is a schematic illustration of a carbon nanotube array prepared in accordance with a first embodiment of the present invention.
圖4係本發明第二實施例製備的奈米碳管陣列的示意圖。 Figure 4 is a schematic illustration of a carbon nanotube array prepared in accordance with a second embodiment of the present invention.
圖5係本發明第三實施例奈米碳管陣列的製備裝置的示意圖。 Figure 5 is a schematic view showing a preparation apparatus of a carbon nanotube array of a third embodiment of the present invention.
圖6係本發明第四實施例奈米碳管陣列的製備方法的流程圖。 Figure 6 is a flow chart showing a method of preparing a carbon nanotube array according to a fourth embodiment of the present invention.
圖7係本發明第四實施例奈米碳管陣列的製備裝置的示意圖。 Fig. 7 is a schematic view showing a preparation apparatus of a carbon nanotube array according to a fourth embodiment of the present invention.
圖8係本發明第四實施例製備的奈米碳管陣列的示意圖。 Figure 8 is a schematic illustration of a carbon nanotube array prepared in accordance with a fourth embodiment of the present invention.
圖9係本發明第五實施例奈米碳管陣列的製備裝置的示意圖。 Figure 9 is a schematic view showing a preparation apparatus of a carbon nanotube array according to a fifth embodiment of the present invention.
圖10係本發明第五實施例製備的奈米碳管陣列的示意圖。 Figure 10 is a schematic illustration of a carbon nanotube array prepared in accordance with a fifth embodiment of the present invention.
下面將結合附圖及具體實施例對本發明作進一步的詳細說明。 The invention will be further described in detail below with reference to the drawings and specific embodiments.
請參閱圖1,本發明第一實施例提供一種奈米碳管陣列的製備方法,該製備方法主要包括以下步驟:(S101)提供一形成有催化劑層的基底,並將該形成有催化劑層的基底置入一反應室中;(S102)提供至少兩種碳源氣,該至少兩種碳源氣中的碳元素分別由不同種類的單一同位素組成;以及(S103)將所述至少兩種碳源氣同時通入所述反應室中,通過控制反應溫度,使所述至少兩種碳源氣在不同的溫度下發生反應,形成奈米碳管陣列。 Referring to FIG. 1 , a first embodiment of the present invention provides a method for preparing a carbon nanotube array. The preparation method mainly includes the following steps: (S101) providing a substrate formed with a catalyst layer, and forming the catalyst layer. The substrate is placed in a reaction chamber; (S102) providing at least two carbon source gases, the carbon elements of the at least two carbon source gases are respectively composed of different kinds of single isotopes; and (S103) the at least two carbons The source gas is simultaneously introduced into the reaction chamber, and by controlling the reaction temperature, the at least two carbon source gases are reacted at different temperatures to form an array of carbon nanotubes.
步驟S101,提供一形成有催化劑層的基底,並將該形成有催化劑層的基底置入一反應室中。 In step S101, a substrate formed with a catalyst layer is provided, and the substrate on which the catalyst layer is formed is placed in a reaction chamber.
請參閱圖2,提供一基底132,該基底132具有一平整、光滑的表面。所述基底132可選用拋光的矽片、拋光的二氧化矽片或拋光的石英片,該基底132的表面平整度以小於10奈米為佳。本實施例中,選用拋光的矽片作為所述基底132。 Referring to Figure 2, a substrate 132 is provided having a flat, smooth surface. The substrate 132 may be a polished ruthenium, a polished ruthenium dioxide sheet or a polished quartz sheet. The surface flatness of the substrate 132 is preferably less than 10 nm. In this embodiment, a polished cymbal is selected as the substrate 132.
在所述基底132表面形成一催化劑層130。該催化劑層130可通過電子束蒸發法、沈積法、濺射法或蒸鍍法等方法沈積於所述基底132的表面,該催化劑層130的厚度一般以3奈米~6奈米為宜。該催化劑層130與所述基底132形成良好的化學或物理結合。該催化劑層130的材料可選用鐵、鈷、鎳及其任意組合的合金材料等。本實施例中,選用厚度為5nm的鐵膜作為所述催化劑層130。該鐵膜可與所述拋光的矽片形成良好的接觸。 A catalyst layer 130 is formed on the surface of the substrate 132. The catalyst layer 130 may be deposited on the surface of the substrate 132 by an electron beam evaporation method, a deposition method, a sputtering method, or an evaporation method. The thickness of the catalyst layer 130 is generally from 3 nm to 6 nm. The catalyst layer 130 forms a good chemical or physical bond with the substrate 132. The material of the catalyst layer 130 may be selected from iron, cobalt, nickel, and alloy materials of any combination thereof. In the present embodiment, an iron film having a thickness of 5 nm is selected as the catalyst layer 130. The iron film can form good contact with the polished ruthenium.
提供一反應裝置100,該反應裝置100包括:一反應室120、一用 於加熱該反應室120的反應爐122、一保護氣體輸入通道102、三個碳源氣輸入通道104、106、108以及一排氣通道110。所述反應室120用於承載所述形成有催化劑層130的基底132;所述反應爐122包括有一加熱裝置,所述加熱裝置可對所述反應室120進行加熱,並使反應室120達到一預定溫度。所述保護氣體輸入通道102設置有一閥門112,通過所述保護氣體輸入通道102可輸入不同的惰性氣體,如氦氣、氬氣、氮氣等;所述碳源氣輸入通道104設置一閥門114,所述碳源氣輸入通道106設置一閥門116,所述碳源氣輸入通道108設置一閥門118,該碳源氣輸入通道104、106、108可分別輸入不同的碳源氣。 Providing a reaction device 100, the reaction device 100 includes: a reaction chamber 120, a The reaction furnace 122 for heating the reaction chamber 120, a shielding gas input passage 102, three carbon source gas input passages 104, 106, 108, and an exhaust passage 110 are provided. The reaction chamber 120 is configured to carry the substrate 132 formed with the catalyst layer 130; the reaction furnace 122 includes a heating device that heats the reaction chamber 120 and causes the reaction chamber 120 to reach one Scheduled temperature. The shielding gas input channel 102 is provided with a valve 112 through which different inert gases, such as helium, argon, nitrogen, etc., can be input; the carbon source gas input channel 104 is provided with a valve 114. The carbon source gas input passage 106 is provided with a valve 116. The carbon source gas input passage 108 is provided with a valve 118, and the carbon source gas input passages 104, 106, 108 can respectively input different carbon source gases.
將所述形成有催化劑層130的基底132置入所述反應室120中。所述催化劑層130朝向碳源氣通入方向並與水平面形成一定的夾角α,0°≦α<90°。可以理解,通過調整所述催化劑層130與水平面的夾角,可改善奈米碳管陣列生長均勻性。所述夾角可根據實際需要調整,本實施例中,所述催化劑層與水平面形成的夾角α為0°。可以理解,通過將所述形成有催化劑層130的基底132置入所述反應室120中,就可通過所述反應爐122中的加熱裝置對所述反應室120及催化劑層130進行加熱使所述反應室120及催化劑層130達到一預定的溫度。 The substrate 132 on which the catalyst layer 130 is formed is placed in the reaction chamber 120. The catalyst layer 130 faces the carbon source gas inlet direction and forms a certain angle α with the horizontal plane, 0°≦α<90°. It can be understood that by adjusting the angle between the catalyst layer 130 and the horizontal plane, the uniformity of growth of the carbon nanotube array can be improved. The angle can be adjusted according to actual needs. In the embodiment, the angle formed by the catalyst layer and the horizontal plane is 0°. It can be understood that by placing the substrate 132 on which the catalyst layer 130 is formed into the reaction chamber 120, the reaction chamber 120 and the catalyst layer 130 can be heated by the heating device in the reaction furnace 122. The reaction chamber 120 and the catalyst layer 130 reach a predetermined temperature.
步驟S102,提供至少兩種碳源氣,該至少兩種碳源氣中的碳元素分別由不同種類的單一同位素組成。 Step S102, providing at least two carbon source gases, wherein the carbon elements in the at least two carbon source gases are respectively composed of different kinds of single isotopes.
所述碳源氣可通過所述碳源氣輸入通道104、106以及108輸入到所述反應室120。所述碳源氣可以為甲烷、乙烯、乙炔、丙二烯及其他碳氫化合物。所述至少兩種碳源氣係指至少兩種不同材料 的碳源氣,例如乙烯與乙炔;或者甲烷與乙烯等,且所述至少兩種不同材料的碳源氣中的碳元素由不同種類的單一同位素組成,如12C,13C,14C等。本實施例中,提供兩種不同的碳源氣,該兩種碳源氣分別係含有12C同位素的乙炔及含有13C同位素的乙烯,所述兩種碳源氣可分別通過所述碳源氣輸入通道104及106輸入到反應室120。 The carbon source gas may be input to the reaction chamber 120 through the carbon source gas input passages 104, 106, and 108. The carbon source gas may be methane, ethylene, acetylene, propadiene, and other hydrocarbons. The at least two carbon source gases refer to carbon source gases of at least two different materials, such as ethylene and acetylene; or methane and ethylene, etc., and the carbon sources in the carbon source gases of the at least two different materials are different types Single isotope composition, such as 12 C, 13 C, 14 C, etc. In this embodiment, two different carbon source gases are provided, which are respectively an acetylene having a 12 C isotope and an ethylene containing a 13 C isotope, and the two carbon source gases can pass through the carbon source respectively. Gas input channels 104 and 106 are input to reaction chamber 120.
步驟S103,將所述至少兩種碳源氣同時通入所述反應室中,通過控制反應溫度,使所述至少兩種碳源氣在不同的溫度下發生反應,形成奈米碳管陣列。 Step S103, simultaneously introducing the at least two carbon source gases into the reaction chamber, and controlling the reaction temperature to react the at least two carbon source gases at different temperatures to form a carbon nanotube array.
本實施例中,首先,通過所述排氣通道110將所述反應室120抽真空後,通過保護氣體輸入通道102通入一預定壓強的保護氣,本實施例為壓強為1個大氣壓的氬氣;打開閥門114及116,通過碳源氣輸入通道104及106向反應室120內同時通入由12C組成的乙炔氣體和由13C組成的乙烯氣體,兩種氣體的流量均為120sccm(標準狀態下,每分鐘每立方釐米),流速均為1.2cm/s;通過反應爐122中的加熱裝置對該反應室120進行加熱,使該反應室120達到一第一溫度,該第一溫度為催化乙炔氣體分解製備奈米碳管的反應溫度,該第一溫度約為600℃-650℃。由於所述第一溫度僅達到乙炔氣體分解製備奈米碳管的反應溫度,而未達到乙烯氣體分解製備奈米碳管的反應溫度,故,該反應過程中僅有由12C組成的乙炔氣體發生分解反應,並生成由12C組成的奈米碳管片段於該催化劑層鐵膜上。 In this embodiment, first, after the reaction chamber 120 is evacuated through the exhaust passage 110, a shielding gas of a predetermined pressure is introduced through the shielding gas input passage 102. In this embodiment, the argon is at a pressure of 1 atmosphere. The valves 114 and 116 are opened, and the acetylene gas consisting of 12 C and the ethylene gas consisting of 13 C are simultaneously introduced into the reaction chamber 120 through the carbon source gas input passages 104 and 106, and the flow rates of the two gases are both 120 sccm ( In the standard state, every cubic centimeter per minute, the flow rate is 1.2 cm / s; the reaction chamber 120 is heated by a heating device in the reaction furnace 122, so that the reaction chamber 120 reaches a first temperature, the first temperature A reaction temperature for preparing a carbon nanotube for catalyzing the decomposition of acetylene gas, the first temperature being about 600 ° C to 650 ° C. Since the first temperature only reaches the reaction temperature for preparing the carbon nanotube by decomposition of acetylene gas, and does not reach the reaction temperature for preparing the carbon nanotube by ethylene gas decomposition, only acetylene gas composed of 12 C is used in the reaction. A decomposition reaction occurs, and a carbon nanotube segment composed of 12 C is formed on the catalyst layer iron film.
其次,反應預定時間後,通過反應爐122中的加熱裝置對該反應室120的溫度進行控制,使該反應室120達到一第二溫度,該第二 溫度大於所述第一溫度,該第二溫度為催化所述乙烯氣體分解製備奈米碳管的反應溫度,該第二溫度約為650℃-800℃。可以理解,由於所述第二溫度高於催化乙炔氣體反應製備奈米碳管的反應溫度,並且由於奈米碳管的生長點在該催化劑鐵膜上,故,在該反應過程中,由12C組成的乙炔氣體和由13C組成的乙烯氣體同時發生分解反應,分解反應生成的碳原子沈積於所述催化劑層鐵膜,並生成由13C和12C組成的奈米碳管片段,該奈米碳管片段將所述由12C組成的奈米碳管片段頂起,即,由13C和12C組成的奈米碳管片段生長於所述由12C組成的奈米碳管片段的底端。 Next, after the predetermined time of the reaction, the temperature of the reaction chamber 120 is controlled by the heating device in the reaction furnace 122, so that the reaction chamber 120 reaches a second temperature, the second temperature is greater than the first temperature, the second The temperature is a reaction temperature for catalyzing the decomposition of the ethylene gas to prepare a carbon nanotube, and the second temperature is about 650 ° C to 800 ° C. It can be understood that, since the second temperature is higher than the reaction temperature for preparing the carbon nanotube by the reaction of the catalytic acetylene gas, and since the growth point of the carbon nanotube is on the catalyst iron film, in the course of the reaction, 12 The acetylene gas composed of C and the ethylene gas composed of 13 C are simultaneously decomposed, and carbon atoms generated by the decomposition reaction are deposited on the iron film of the catalyst layer, and a carbon nanotube segment composed of 13 C and 12 C is generated, which A carbon nanotube fragment lifts the carbon nanotube segment consisting of 12 C, that is, a carbon nanotube segment composed of 13 C and 12 C is grown on the 12 C carbon nanotube segment The bottom end.
最後,繼續反應預定時間後,將反應室120冷卻至室溫,在催化劑層鐵膜上得到一奈米碳管陣列。 Finally, after the reaction is continued for a predetermined period of time, the reaction chamber 120 is cooled to room temperature, and an array of carbon nanotubes is obtained on the iron film of the catalyst layer.
此外,還可重復以上步驟,製備出週期性交替排列的奈米碳管陣列。 In addition, the above steps can be repeated to prepare an array of carbon nanotubes that are periodically arranged alternately.
請參閱圖3,本發明第一實施例製備得到的奈米碳管陣列10,該奈米碳管陣列10包括複數個奈米碳管,該複數個奈米碳管由一第一奈米碳管片段12及一第二奈米碳管片段14組成;該第二奈米碳管片段14形成於所述催化劑層鐵膜上,該第一奈米碳管片段12形成於該第二奈米碳管片段14上;其中,該第一奈米碳管片段12由12C組成,該第二奈米碳管片段14由12C及13C組成。 Referring to FIG. 3, a carbon nanotube array 10 prepared according to a first embodiment of the present invention, the carbon nanotube array 10 includes a plurality of carbon nanotubes, the plurality of carbon nanotubes being composed of a first nanocarbon a tube segment 12 and a second carbon nanotube segment 14; the second carbon nanotube segment 14 is formed on the catalyst layer iron film, and the first carbon nanotube segment 12 is formed on the second nanometer On the carbon tube segment 14; wherein the first carbon nanotube segment 12 is composed of 12 C, and the second carbon nanotube segment 14 is composed of 12 C and 13 C.
所述奈米碳管可係單壁奈米碳管、雙壁奈米碳管及多壁奈米碳管。本實施例中,該奈米碳管為一多壁奈米碳管。 The carbon nanotubes can be single-walled carbon nanotubes, double-walled carbon nanotubes, and multi-walled carbon nanotubes. In this embodiment, the carbon nanotube is a multi-walled carbon nanotube.
所述奈米碳管的直徑為0.5~50奈米,長度為50奈米~5毫米。所述第一奈米碳管片段12及第二奈米碳管片段14具有相等或不等的長 度,可根據實際需要製備獲得。本實施例中,奈米碳管的長度優選為100微米~900微米,所述第一奈米碳管片段12及第二奈米碳管片段14具有大致相等的長度。 The carbon nanotubes have a diameter of 0.5 to 50 nm and a length of 50 nm to 5 mm. The first carbon nanotube segment 12 and the second carbon nanotube segment 14 have equal or unequal lengths Degree can be prepared according to actual needs. In this embodiment, the length of the carbon nanotubes is preferably from 100 micrometers to 900 micrometers, and the first carbon nanotube segments 12 and the second carbon nanotube segments 14 have substantially equal lengths.
可以理解,在步驟S103中亦可先通過反應爐122中的加熱裝置對該反應室120進行加熱,使該反應室120的第一溫度達到催化乙烯氣體分解製備奈米碳管的反應溫度,即,使該反應室120的第一溫度達到650℃-800℃。此時,由於該第一溫度高於乙炔氣體分解製備奈米碳管的反應溫度,故,反應過程中由12C組成的乙炔氣體和由13C組成的乙烯氣體同時發生分解反應,生成的由13C和12C組成的奈米碳管片段沈積於該催化劑層鐵膜上;其次,反應預定時間後,通過反應爐122中的加熱裝置對該反應室120的溫度進行控制,使該反應室120的第二溫度僅達到催化乙炔氣體分解製備奈米碳管的反應溫度,即,使該反應室120的溫度下降到600℃-650℃。此時,由於該第二溫度僅達到催化乙炔氣體分解製備奈米碳管的反應溫度,故,該反應過程中僅有由12C組成的乙炔氣體發生分解反應,並生成的由12C組成的奈米碳管片段沈積於所述催化劑層鐵膜,將所述由13C和12C組成的奈米碳管片段頂起,即,生成的由12C組成的奈米碳管片段生長於所述由13C和12C組成的奈米碳管片段的底端。 It can be understood that, in step S103, the reaction chamber 120 can be heated first by the heating device in the reaction furnace 122, so that the first temperature of the reaction chamber 120 reaches a reaction temperature for catalyzing the decomposition of ethylene gas to prepare a carbon nanotube, that is, The first temperature of the reaction chamber 120 is brought to between 650 ° C and 800 ° C. At this time, since the first temperature is higher than the reaction temperature for preparing the carbon nanotube by decomposition of the acetylene gas, the acetylene gas composed of 12 C and the ethylene gas composed of 13 C are simultaneously decomposed during the reaction, and the generated A carbon nanotube segment composed of 13 C and 12 C is deposited on the iron film of the catalyst layer; secondly, after a predetermined time of reaction, the temperature of the reaction chamber 120 is controlled by a heating device in the reaction furnace 122 to make the reaction chamber The second temperature of 120 is only up to the reaction temperature at which the acetylene gas is decomposed to produce a carbon nanotube, that is, the temperature of the reaction chamber 120 is lowered to 600 ° C - 650 ° C. At this time, since the second temperature only reaches the reaction temperature for catalyzing the decomposition of the acetylene gas to prepare the carbon nanotubes, only the acetylene gas composed of 12 C is decomposed during the reaction, and the generated 12 C is formed. A carbon nanotube segment is deposited on the catalyst layer iron film, and the carbon nanotube segment composed of 13 C and 12 C is lifted up, that is, the generated carbon nanotube segment composed of 12 C is grown in the The bottom end of the carbon nanotube segment consisting of 13 C and 12 C is described.
本發明第二實施例提供一種奈米碳管陣列的製備方法,該製備方法主要包括以下步驟:(S201)提供一形成有催化劑層的基底,並將該形成有催化劑層的基底置入一反應室中;(S202)提供至少兩種碳源氣,該至少兩種碳源氣中的碳元素分別由不同種類的單一同位素組成;以及(S203)將所述至少兩種碳源氣同時通入 所述反應室中,通過控制反應溫度,使所述至少兩種碳源氣在不同的溫度下發生反應,形成奈米碳管陣列。 A second embodiment of the present invention provides a method for preparing a carbon nanotube array. The preparation method mainly comprises the following steps: (S201) providing a substrate formed with a catalyst layer, and placing the substrate formed with the catalyst layer into a reaction (S202) providing at least two carbon source gases, the carbon elements of the at least two carbon source gases being respectively composed of different kinds of single isotopes; and (S203) simultaneously introducing the at least two carbon source gases In the reaction chamber, by controlling the reaction temperature, the at least two carbon source gases are reacted at different temperatures to form an array of carbon nanotubes.
所述步驟S201和步驟S202與本發明第一實施例中的步驟S101及步驟S102基本相同,不同之處在於,進一步提供一第三碳源氣,其中,所述第三碳源氣中的碳元素亦由單一的同位素組成,且組成所述第三碳源氣中的碳的同位素與本發明第一實施例中組成所述兩種碳源氣中的碳的同位素不同。本實施例中所述第三碳源氣為含有14C同位素的甲烷。所述含有14C同位素的甲烷由所述碳源氣輸入通道108輸入到反應室120。 The step S201 and the step S202 are substantially the same as the step S101 and the step S102 in the first embodiment of the present invention, except that a third carbon source gas is further provided, wherein the carbon in the third carbon source gas The element is also composed of a single isotope, and the isotopes constituting the carbon in the third carbon source gas are different from the isotopes constituting the carbon in the two carbon source gases in the first embodiment of the present invention. The third carbon source gas in this embodiment is methane containing a 14 C isotope. The methane containing the 14 C isotope is input to the reaction chamber 120 from the carbon source gas input passage 108.
所述步驟S203與本發明第一實施例中的步驟S103基本相同,不同之處在於,由12C和13C組成的奈米碳管片段生長於所述由12C組成的奈米碳管片段的底端後,進一步包括:通過反應爐122中的加熱裝置對該反應室120的溫度進行控制,使該反應室120達到一第三溫度。該第三溫度為催化甲烷氣體分解製備奈米碳管的反應溫度,該第三溫度約為850℃-1100℃。由於所述第三溫度同時達到乙炔、乙烯和甲烷氣體分解製備奈米碳管的反應溫度,故,該反應過程中,由12C組成的乙炔氣體、由13C組成的乙烯氣體以及由14C組成的甲烷氣體同時發生分解反應,並生成由12C、13C及14C組成的奈米碳管片段沈積於所述催化劑層鐵膜,並將由12C和13C組成的奈米碳管片段頂起,即,該奈米碳管片段生長於所述由12C和13C組成的奈米碳管片段的底端。 The step S203 is substantially the same as the step S103 in the first embodiment of the present invention, except that a carbon nanotube segment composed of 12 C and 13 C is grown on the carbon nanotube segment composed of 12 C. After the bottom end, the method further comprises: controlling the temperature of the reaction chamber 120 by a heating device in the reaction furnace 122 to bring the reaction chamber 120 to a third temperature. The third temperature is a reaction temperature for catalyzing the decomposition of methane gas to prepare a carbon nanotube, and the third temperature is about 850 ° C to 1100 ° C. Since the third temperature simultaneously reaches the reaction temperature for preparing the carbon nanotubes by decomposition of acetylene, ethylene and methane gas, acetylene gas consisting of 12 C, ethylene gas consisting of 13 C and 14 C are used in the reaction. The methane gas of the composition is simultaneously decomposed, and a carbon nanotube segment composed of 12 C, 13 C and 14 C is deposited on the iron film of the catalyst layer, and a carbon nanotube segment composed of 12 C and 13 C is formed. Jacking up, i.e., the carbon nanotube segments are grown at the bottom end of the carbon nanotube segments consisting of 12 C and 13 C.
最後,繼續反應預定時間後,將反應室120冷卻至室溫,在催化劑層鐵膜上得到一奈米碳管陣列。 Finally, after the reaction is continued for a predetermined period of time, the reaction chamber 120 is cooled to room temperature, and an array of carbon nanotubes is obtained on the iron film of the catalyst layer.
另外,還可重復以上步驟,製備出週期性交替排列的奈米碳管陣 列;此外,還可通過反應爐122中的加熱裝置使所述反應室120先後達到不同的反應溫度,最後製備出不同種類的奈米碳管陣列。 In addition, the above steps can be repeated to prepare a carbon nanotube array which is periodically arranged alternately. In addition, the reaction chambers 120 can be successively brought to different reaction temperatures by heating means in the reaction furnace 122, and finally different types of carbon nanotube arrays are prepared.
請參閱圖4,由本發明第二實施例製備得到的奈米碳管陣列20,該奈米碳管陣列20包括複數個奈米碳管,該複數個奈米碳管由一第一奈米碳管片段22、一第二奈米碳管片段24及一第三奈米碳管片段26組成;其中,所述第一奈米碳管片段22由12C組成,所述第二奈米碳管片段24由12C及13C組成,所述第三奈米碳管片段26由12C、13C及14C組成。所述第一奈米碳管片段22、第二奈米碳管片段24及第三奈米碳管片段26具有相等或不等的長度,可根據實際需要通過控制反應時間來獲得。本實施例中,所述奈米碳管的長度優選為100微米~900微米,所述第一奈米碳管片段22、第二奈米碳管片段24及第三奈米碳管片段26具有大致相等的長度。 Referring to FIG. 4, a carbon nanotube array 20 prepared by the second embodiment of the present invention, the carbon nanotube array 20 includes a plurality of carbon nanotubes, the plurality of carbon nanotubes being composed of a first nanocarbon a tube segment 22, a second carbon nanotube segment 24 and a third carbon nanotube segment 26; wherein the first carbon nanotube segment 22 is composed of 12 C, the second carbon nanotube Fragment 24 consists of 12 C and 13 C, and said third carbon nanotube section 26 consists of 12 C, 13 C and 14 C. The first carbon nanotube section 22, the second carbon nanotube section 24, and the third carbon nanotube section 26 have equal or unequal lengths and can be obtained by controlling the reaction time according to actual needs. In this embodiment, the length of the carbon nanotubes is preferably from 100 micrometers to 900 micrometers, and the first carbon nanotube segments 22, the second carbon nanotube segments 24, and the third carbon nanotube segments 26 have Roughly equal length.
可以理解,所述奈米碳管中,第一奈米碳管片段22、第二奈米碳管片段24及第三奈米碳管片段26排列的順序可隨意組合,可通過在反應過程中通過控制溫度的方式實現按照不同的順序生長不同的奈米碳管片斷。 It can be understood that, in the carbon nanotube, the order of arranging the first carbon nanotube segment 22, the second carbon nanotube segment 24 and the third carbon nanotube segment 26 can be arbitrarily combined, and can be adopted during the reaction. Different carbon nanotube fragments are grown in different orders by controlling the temperature.
例如,在步驟203中,亦可先通過反應爐122中的加熱裝置對該反應室120的溫度進行控制,使反應室120的第一溫度達到催化甲烷氣體分解製備奈米碳管的反應溫度。由於所述第一溫度高於催化乙炔和乙烯氣體分解製備奈米碳管的反應溫度,故,該反應過程中乙炔、乙烯和甲烷氣體同時發生分解反應,生成由12C、13C及14C組成的奈米碳管片段沈積於該催化劑層鐵膜上。其次,反應預定時間後,通過反應爐122中的加熱裝置對該反應室120的溫度進行控制,使反應室120的第二溫度僅達到催化乙烯氣體分解製備 奈米碳管的反應溫度。此時,由於所述第二溫度低於催化甲烷氣體分解製備奈米碳管的反應溫度,但高於催化乙炔氣體分解製備奈米碳管的反應溫度,故,該反應過程中僅有乙炔和乙烯氣體發生分解反應,並生成由12C及13C組成的奈米碳管片段繼續生長於所述由12C、13C及14C組成的奈米碳管片段的底端;再次,反應預定時間後,通過反應爐122中的加熱裝置對該反應室120的溫度進行控制,使該反應室120的第三溫度僅達到催化乙炔氣體分解製備奈米碳管的反應溫度。此時,由於所述第三溫度低於催化甲烷和乙烯氣體分解製備奈米碳管的反應溫度,故,該反應過程中僅有乙炔氣體發生分解反應,生成由12C組成的奈米碳管片段繼續生長於所述由12C及13C組成的奈米碳管片段的底端。 For example, in step 203, the temperature of the reaction chamber 120 may be first controlled by a heating device in the reaction furnace 122, so that the first temperature of the reaction chamber 120 reaches a reaction temperature for catalyzing the decomposition of methane gas to prepare a carbon nanotube. Since the first temperature is higher than the reaction temperature for preparing the carbon nanotubes by catalyzing the decomposition of acetylene and ethylene gas, the acetylene, ethylene and methane gases are simultaneously decomposed during the reaction to form 12 C, 13 C and 14 C. A composition of carbon nanotube fragments is deposited on the catalyst layer iron film. Next, after the predetermined time of the reaction, the temperature of the reaction chamber 120 is controlled by the heating means in the reaction furnace 122 so that the second temperature of the reaction chamber 120 reaches only the reaction temperature for catalyzing the decomposition of ethylene gas to prepare the carbon nanotubes. At this time, since the second temperature is lower than the reaction temperature for preparing the carbon nanotube by the decomposition of the catalytic methane gas, but higher than the reaction temperature for preparing the carbon nanotube by the decomposition of the acetylene gas, only the acetylene and the reaction are carried out during the reaction. The ethylene gas undergoes a decomposition reaction, and a carbon nanotube segment composed of 12 C and 13 C is formed to continue to grow at the bottom end of the carbon nanotube segment consisting of 12 C, 13 C and 14 C; again, the reaction is scheduled After the time, the temperature of the reaction chamber 120 is controlled by a heating device in the reaction furnace 122 such that the third temperature of the reaction chamber 120 reaches only the reaction temperature for catalyzing the decomposition of acetylene gas to produce a carbon nanotube. At this time, since the third temperature is lower than the reaction temperature for preparing the carbon nanotube by catalytic decomposition of methane and ethylene gas, only the acetylene gas is decomposed during the reaction to form a carbon nanotube composed of 12 C. Fragments continue to grow at the bottom end of the carbon nanotube fragments consisting of 12 C and 13 C.
請參閱圖5,本發明第三實施例提供一種奈米碳管陣列的製備方法。該製備方法主要包括以下步驟:(S301)提供一形成有催化劑層的基底,並將該形成有催化劑層的基底置入一反應室中;(S302)提供至少兩種碳源氣,該至少兩種碳源氣中的碳元素分別由不同種類的單一同位素組成;(S303)將所述至少兩種碳源氣同時通入所述反應室中,通過一雷射加熱裝置控制反應溫度,使所述至少兩種碳源氣在不同的溫度下發生反應,形成奈米碳管陣列。 Referring to FIG. 5, a third embodiment of the present invention provides a method for preparing a carbon nanotube array. The preparation method mainly comprises the steps of: (S301) providing a substrate formed with a catalyst layer, and placing the substrate formed with the catalyst layer into a reaction chamber; (S302) providing at least two carbon source gases, the at least two The carbon elements in the carbon source gas are respectively composed of different kinds of single isotopes; (S303) simultaneously introducing the at least two carbon source gases into the reaction chamber, and controlling the reaction temperature by a laser heating device The at least two carbon source gases react at different temperatures to form an array of carbon nanotubes.
所述步驟S303與本發明第二實施例中的步驟S203基本相同,不同之處在於,本實施例中採用一雷射加熱裝置140取代所述反應爐122來加熱反應室120,通過控制該反應室120的溫度來控制反應溫度,或可採用雷射加熱裝置140直接對整個催化劑層130進行加熱,通過控制催化劑層130的溫度來控制反應溫度,使其達到一 預定的反應溫度。所述採用雷射加熱裝置140直接對整個催化劑層130進行加熱的方法為:可將雷射加熱裝置140產生的雷射光束從正面直接照射在所述催化劑層130上來加熱催化劑層130;亦可將雷射光束從背面照射在基底132上即照射沒有設置催化劑層的表面,熱量會透過基底132傳遞給催化劑層130,從而加熱催化劑層130。本實施例中,通過所述雷射加熱裝置140對所述置入反應室120的整個催化劑層130進行加熱,使反應溫度先後達到一第一溫度、一第二溫度以及一第三溫度。反應預定時間後,得到所述奈米碳管陣列。 The step S303 is substantially the same as the step S203 in the second embodiment of the present invention, except that in the embodiment, a laser heating device 140 is used instead of the reaction furnace 122 to heat the reaction chamber 120, by controlling the reaction. The temperature of the chamber 120 is used to control the reaction temperature, or the entire catalyst layer 130 may be directly heated by the laser heating device 140, and the temperature of the catalyst layer 130 is controlled to control the reaction temperature to reach a temperature. The predetermined reaction temperature. The method for directly heating the entire catalyst layer 130 by using the laser heating device 140 is: the laser beam generated by the laser heating device 140 can be directly irradiated on the catalyst layer 130 from the front surface to heat the catalyst layer 130; The laser beam is irradiated from the back surface onto the substrate 132, that is, the surface on which the catalyst layer is not disposed, and heat is transmitted to the catalyst layer 130 through the substrate 132, thereby heating the catalyst layer 130. In this embodiment, the entire catalyst layer 130 placed in the reaction chamber 120 is heated by the laser heating device 140, so that the reaction temperature reaches a first temperature, a second temperature, and a third temperature. After the reaction for a predetermined period of time, the carbon nanotube array is obtained.
請參閱圖6,本發明第四實施例進一步提供一種奈米碳管陣列的製備方法。 Referring to FIG. 6, a fourth embodiment of the present invention further provides a method for preparing a carbon nanotube array.
步驟S401,提供一形成有催化劑層的基底,並將該形成有催化劑層的基底置入一反應室中。 In step S401, a substrate formed with a catalyst layer is provided, and the substrate on which the catalyst layer is formed is placed in a reaction chamber.
請參閱圖7,首先,提供一基底232,並在該基底232表面形成一催化劑層230,所述基底232和催化劑層230與本發明第一實施例的基底132和催化劑層130的材料相同。 Referring to FIG. 7, first, a substrate 232 is provided, and a catalyst layer 230 is formed on the surface of the substrate 232. The substrate 232 and the catalyst layer 230 are the same as the substrate 132 and the catalyst layer 130 of the first embodiment of the present invention.
其次,提供一反應裝置200,該反應裝置200包括:一反應室220、一用於加熱該反應室220的反應爐222、一保護氣體輸入通道202、三個碳源氣輸入通道204、206、208、一排氣通道210、至少一雷射加熱裝置240。所述反應室220用於承載所述形成有催化劑層230的基底232;所述反應爐222包括有一加熱裝置,所述加熱裝置可對所述反應室220進行加熱,並使該反應室220達到一預定溫度。所述保護氣體輸入通道202設置有一閥門212,可通過所述保護氣體輸入通道202輸入不同的惰性氣體,如氦氣、氬氣、 氮氣等;所述碳源氣輸入通道204設置一閥門214,所述碳源氣輸入通道206設置一閥門216,所述碳源氣輸入通道208設置一閥門218,通過所述碳源氣輸入通道204、206、208可分別輸入不同的碳源氣;所述至少一雷射加熱裝置240用於對所述置入反應室220的催化劑層230的不同區域進行加熱,控制催化劑層230的不同區域達到一預定的反應溫度。 Next, a reaction device 200 is provided. The reaction device 200 includes a reaction chamber 220, a reaction furnace 222 for heating the reaction chamber 220, a shielding gas input passage 202, three carbon source gas input passages 204, 206, 208. An exhaust passage 210 and at least one laser heating device 240. The reaction chamber 220 is configured to carry the substrate 232 formed with the catalyst layer 230; the reaction furnace 222 includes a heating device that heats the reaction chamber 220 and causes the reaction chamber 220 to reach a predetermined temperature. The shielding gas input channel 202 is provided with a valve 212 through which different inert gases such as helium, argon, or the like can be input. Nitrogen gas or the like; the carbon source gas input passage 204 is provided with a valve 214, the carbon source gas input passage 206 is provided with a valve 216, and the carbon source gas input passage 208 is provided with a valve 218 through the carbon source gas input passage. 204, 206, 208 may respectively input different carbon source gases; the at least one laser heating device 240 is configured to heat different regions of the catalyst layer 230 placed in the reaction chamber 220 to control different regions of the catalyst layer 230. A predetermined reaction temperature is reached.
最後,將所述形成有催化劑層230的基底232置入所述反應室220中,所述催化劑層230朝向碳源氣通入方向並與水平面形成一定的夾角α,0°≦α<90°。本實施例中,該夾角α=45°,從而使碳源氣與所述催化劑層230形成良好的接觸。 Finally, the substrate 232 formed with the catalyst layer 230 is placed in the reaction chamber 220, and the catalyst layer 230 is directed toward the carbon source gas and forms a certain angle α with the horizontal plane, 0°≦α<90°. . In the present embodiment, the angle α = 45°, so that the carbon source gas forms good contact with the catalyst layer 230.
通過反應爐222對反應室220加熱可使得催化劑層230達到一預定的溫度。通過所述雷射加熱裝置240對所述催化劑層230的不同區域進行加熱,可使不同區域具有不同的溫度。所述雷射加熱裝置240可直接照射所述催化劑層230,使該催化劑層230達到一預定的溫度,亦可從背面間接照射所述基底232,使所述催化劑層230達到一預定的溫度。本實施例中,包括兩個雷射加熱裝置240,該兩個雷射加熱裝置240分別直接對所述催化劑層230的一第一反應區域和一第二反應區域進行加熱,使該第一反應區域和一第二反應區域分別達到不同的溫度。 Heating the reaction chamber 220 through the reaction furnace 222 allows the catalyst layer 230 to reach a predetermined temperature. Heating the different regions of the catalyst layer 230 by the laser heating device 240 allows different regions to have different temperatures. The laser heating device 240 can directly illuminate the catalyst layer 230 to bring the catalyst layer 230 to a predetermined temperature, and can indirectly illuminate the substrate 232 from the back surface to bring the catalyst layer 230 to a predetermined temperature. In this embodiment, two laser heating devices 240 are included, and the two laser heating devices 240 directly heat a first reaction region and a second reaction region of the catalyst layer 230 to make the first reaction. The region and a second reaction zone each reach a different temperature.
步驟S402,提供至少兩種碳源氣,該至少兩種碳源氣中的碳元素分別由不同種類的碳同位素組成。 In step S402, at least two carbon source gases are provided, and the carbon elements in the at least two carbon source gases are respectively composed of different kinds of carbon isotopes.
所述至少兩種碳源氣係指至少兩種不同材料的碳源氣,例如乙烯與乙炔;或者甲烷與乙烯等,且所述至少兩種不同材料的碳源氣中的碳元素由不同種類的單一同位素組成,如12C,13C,14C等。 所述碳源氣可分別由所述碳源氣輸入通道204、206、208輸入到所述反應室220。本實施例包括三種不同的碳源氣,該三種碳源氣分別係含有12C同位素的乙炔、含有13C同位素的乙烯以及含有14C同位素的甲烷。 The at least two carbon source gases refer to carbon source gases of at least two different materials, such as ethylene and acetylene; or methane and ethylene, etc., and the carbon sources in the carbon source gases of the at least two different materials are different types Single isotope composition, such as 12 C, 13 C, 14 C, etc. The carbon source gas may be input to the reaction chamber 220 from the carbon source gas input passages 204, 206, 208, respectively. This example includes three different carbon source gases, namely acetylene containing a 12 C isotope, ethylene containing a 13 C isotope, and methane containing a 14 C isotope.
步驟S403,將所述至少兩種碳源氣同時通入所述反應室中,控制所述催化劑層的溫度使該催化劑層不同區域分別達到不同的反應溫度,並使所述至少兩種碳源氣在催化劑層不同區域發生反應,分別形成含有不同種類的碳同位素的奈米碳管,進而形成奈米碳管陣列。 Step S403, simultaneously introducing the at least two kinds of carbon source gases into the reaction chamber, controlling the temperature of the catalyst layer so that different regions of the catalyst layer respectively reach different reaction temperatures, and the at least two carbon sources are The gas reacts in different regions of the catalyst layer to form carbon nanotubes containing different kinds of carbon isotopes, thereby forming a carbon nanotube array.
首先,通過所述排氣通道210將所述反應室220抽真空後,通過保護氣體輸入通道202通入一預定壓強的保護氣,本實施例為壓強為1個大氣壓的氬氣;同時打開閥門214、216及218,通過碳源氣輸入通道204、206及208分別向反應室220內同時通入由12C組成的乙炔氣體、由13C組成的乙烯氣體和由14C組成的甲烷氣體,三種氣體的流量均為120sccm(標準狀態下,每分鐘每立方釐米),流速均為1.2cm/s;通過反應爐222中的加熱裝置對該反應室220及置入該反應室220的催化劑層230進行加熱,使催化劑層230整體達到一第一溫度,同時額外通過所述兩個雷射加熱裝置240分別對所述催化劑層230的一第一反應區域和一第二反應區域進行加熱,使該第一反應區域和第二反應區域分別達到一第二溫度和一第三溫度,所述第二溫度和第三溫度均大於所述第一溫度。可以理解,所述第一反應區域和第二反應區域可具有相同或不相同的面積及形狀,該第一反應區域和第二反應區域的形狀可係方形、圓形、橢圓形、矩形等其他幾何形狀;此外,所述第一反應區 域和第二反應區域可係以並排的方式、一個反應區域包圍另一反應區域的方式或以其他方式分佈於所述催化劑層230的表面。本實施例中所述第一溫度為催化乙炔氣體分解製備奈米碳管的反應溫度,該第一溫度約為600℃-650℃;所述第二溫度為催化乙烯氣體分解製備奈米碳管的反應溫度,該第二溫度約為650℃-800℃;所述第三溫度為催化甲烷氣體分解製備奈米碳管的反應溫度,該第三溫度約為850℃-1100℃;該第一反應區域和第二反應區域並排分佈於所述催化劑層230的表面,該第一反應區域和第二反應區域為兩個面積相同的矩形區域。 First, after the reaction chamber 220 is evacuated through the exhaust passage 210, a shielding gas of a predetermined pressure is introduced through the shielding gas input passage 202, which is an argon gas having a pressure of 1 atmosphere; and the valve is opened at the same time. 214, 216 and 218, through the carbon source gas input channels 204, 206 and 208, respectively, into the reaction chamber 220, an acetylene gas composed of 12 C, an ethylene gas composed of 13 C and a methane gas composed of 14 C are simultaneously introduced. The flow rates of the three gases are both 120 sccm (standard state, per cubic centimeter per minute), and the flow rate is 1.2 cm/s; the reaction chamber 220 and the catalyst layer placed in the reaction chamber 220 are passed through a heating device in the reaction furnace 222. 230 is heated to bring the catalyst layer 230 as a whole to a first temperature, and a first reaction zone and a second reaction zone of the catalyst layer 230 are additionally heated by the two laser heating devices 240, respectively. The first reaction zone and the second reaction zone respectively reach a second temperature and a third temperature, and the second temperature and the third temperature are both greater than the first temperature. It can be understood that the first reaction region and the second reaction region may have the same or different areas and shapes, and the shapes of the first reaction region and the second reaction region may be square, circular, elliptical, rectangular, etc. Geometry; in addition, the first reaction zone and the second reaction zone may be distributed side by side, one reaction zone surrounding another reaction zone, or otherwise distributed over the surface of the catalyst layer 230. In the embodiment, the first temperature is a reaction temperature for catalyzing the decomposition of acetylene gas to prepare a carbon nanotube, and the first temperature is about 600 ° C to 650 ° C; and the second temperature is a catalytic carbon gas decomposition to prepare a carbon nanotube. Reaction temperature, the second temperature is about 650 ° C -800 ° C; the third temperature is a reaction temperature for catalyzing the decomposition of methane gas to prepare a carbon nanotube, the third temperature is about 850 ° C -1100 ° C; the first The reaction zone and the second reaction zone are distributed side by side on the surface of the catalyst layer 230, and the first reaction zone and the second reaction zone are two rectangular regions of the same area.
可以理解,由於所述第一反應區域的溫度達到乙炔和乙烯氣體分解製備奈米碳管的反應溫度,而未達到甲烷氣體分解製備奈米碳管的反應溫度,故,該第一反應區域中僅有由12C組成的乙炔氣體和由13C組成的乙烯氣體發生分解反應,並生成由12C和13C組成的奈米碳管子陣列沈積於所述第一反應區域的催化劑層鐵膜上;而所述第二反應區域的的溫度達到乙炔、乙烯和甲烷氣體分解製備奈米碳管的反應溫度,故,該第二反應區域中由12C組成的乙炔氣體、由13C組成的乙烯氣體以及由14C組成的甲烷氣體同時發生分解反應,並生成由12C、13C以及14C組成的奈米碳管子陣列沈積於所述第二反應區域的催化劑層鐵膜上;此外,由於所述催化劑層230中除第一反應區域和第二反應區域以外的其他反應區域僅達到催化乙炔氣體分解製備奈米碳管的反應溫度,而未達到催化乙烯和甲烷氣體分解製備奈米碳管的反應溫度,故,該反應區域中僅有由12C組成的乙炔氣體發生分解反應,生成由12C組成的奈米碳管子陣列沈積於所述其他反應區域的催化劑層鐵膜上。 It can be understood that, since the temperature of the first reaction zone reaches the reaction temperature of preparing the carbon nanotube by decomposition of acetylene and ethylene gas, and the reaction temperature of preparing the carbon nanotube by methane gas decomposition is not reached, the first reaction zone is Only the acetylene gas composed of 12 C and the ethylene gas composed of 13 C are decomposed, and an array of carbon nanotube tubes composed of 12 C and 13 C is deposited on the catalyst layer iron film of the first reaction zone. And the temperature of the second reaction zone reaches a reaction temperature at which the acetylene, ethylene and methane gas are decomposed to prepare a carbon nanotube, so that the second reaction zone is composed of 12 C of acetylene gas and 13 C of ethylene. a gas and a methane gas composed of 14 C are simultaneously decomposed, and an array of nano carbon tubes composed of 12 C, 13 C, and 14 C is deposited on the catalyst layer iron film of the second reaction zone; The reaction zone of the catalyst layer 230 except the first reaction zone and the second reaction zone only reaches a reaction temperature for catalyzing the decomposition of acetylene gas to prepare a carbon nanotube, but does not reach Ethylene and methane gas decomposition reaction temperature the preparation of carbon nanotube, so only acetylene gas consisting of 12 C decomposition reaction occurs in the reaction zone to produce a sub-array 12 C nanotube composition deposited on the other The catalyst layer of the reaction zone is on the iron film.
最後,繼續反應預定時間後,將反應室220冷卻至室溫,在催化劑層鐵膜上分別形成含有不同種類的碳同位素的奈米碳管,進而形成一奈米碳管陣列。 Finally, after the reaction is continued for a predetermined period of time, the reaction chamber 220 is cooled to room temperature, and carbon nanotubes containing different kinds of carbon isotopes are formed on the catalyst layer iron film to form an array of carbon nanotubes.
可以理解,反應預定時間後,還可通過所述雷射加熱裝置240分別對所述第一反應區域、第二反應區域以及除第一、第二反應區域以外的催化劑層區域的溫度進行控制,使該第一反應區域、第二反應區域以及除第一、第二反應區域以外的催化劑層區域分別達到不同的反應溫度,最後製備出具有複數個奈米碳管片段的奈米碳管子陣列。 It can be understood that, after the predetermined reaction time, the temperature of the first reaction zone, the second reaction zone, and the catalyst layer zone other than the first and second reaction zones can be controlled by the laser heating device 240, respectively. The first reaction zone, the second reaction zone, and the catalyst layer zones other than the first and second reaction zones are respectively brought to different reaction temperatures, and finally a nano carbon tube array having a plurality of carbon nanotube segments is prepared.
請參閱圖8,本發明第四實施例製備得到的奈米碳管陣列30,該奈米碳管陣列30由一第一奈米碳管子陣列32、一第二奈米碳管子陣列34及一第三奈米碳管子陣列36組成。其中,所述第二奈米碳管子陣列34和第三奈米碳管子陣列的形狀為矩形;該第二奈米碳管子陣列34和第三奈米碳管子陣列36的面積相等;該第二奈米碳管子陣列34和第三奈米碳管子陣列36間隔分佈,並且被所述第一奈米碳管子陣列32所包圍。所述第一奈米碳管子陣列32中的奈米碳管由12C組成,所述第二奈米碳管子陣列34的奈米碳管由12C及13C組成,所述第三奈米碳管子陣列36的奈米碳管由12C、13C及14C組成。所述第一奈米碳管子陣列32、第二奈米碳管子陣列34及第三奈米碳管子陣列36中的奈米碳管具有相等或不等的長度,可根據實際需要獲得。本實施例中,所述奈米碳管陣列30中的奈米碳管的長度優選為100微米~900微米,所述第一奈米碳管子陣列32、第二奈米碳管子陣列34及第三奈米碳管子陣列36中的奈米碳管具有大致相等的長度。 Referring to FIG. 8, a carbon nanotube array 30 prepared by a fourth embodiment of the present invention, the carbon nanotube array 30 comprises a first nano carbon tube array 32, a second nano carbon tube array 34 and a The third nano carbon tube array 36 is composed. The second nano carbon tube array 34 and the third nano carbon tube array have a rectangular shape; the second nano carbon tube array 34 and the third nano carbon tube array 36 have the same area; the second The nano carbon tube array 34 and the third nano carbon tube array 36 are spaced apart and surrounded by the first nano carbon tube array 32. The carbon nanotubes in the array of first carbon nanotube tubes 32 are composed of 12 C, and the carbon nanotubes of the array of second carbon nanotube tubes 34 are composed of 12 C and 13 C, the third nanometer. The carbon nanotubes of the carbon tube array 36 are composed of 12 C, 13 C and 14 C. The carbon nanotubes in the first nano carbon tube array 32, the second nano carbon tube array 34 and the third nano carbon tube array 36 have equal or unequal lengths and can be obtained according to actual needs. In this embodiment, the length of the carbon nanotubes in the carbon nanotube array 30 is preferably from 100 micrometers to 900 micrometers, and the first nano carbon tube array 32, the second nano carbon tube array 34 and the first The carbon nanotubes in the three nano carbon tube array 36 have substantially equal lengths.
可以理解,所述奈米碳管陣列30中可包括至少兩個奈米碳管子陣列。所述至少兩個奈米碳管子陣列中的奈米碳管可由不同種類的單一碳同位素或不同種類的碳同位素的組合的單一的奈米碳管片段組成。所述奈米碳管子陣列可具有不同的形狀及面積,該奈米碳管子陣列的形狀可係方形、圓形、橢圓形或矩形等其他幾何形狀;該至少兩種不同的奈米碳管子陣列可通過不同的設置方式組成所述奈米碳管陣列30。所述具有不同的排列方式係指:該至少兩種不同的奈米碳管子陣列可以並排設置、一個子陣列包圍另一個子陣列的方式設置、相互間隔設置或其他方式組成所述奈米碳管陣列30。 It can be understood that at least two nano carbon tube arrays can be included in the carbon nanotube array 30. The carbon nanotubes in the at least two nanocarbon tube arrays may be composed of a single carbon nanotube fragment of a different kind of single carbon isotope or a combination of different kinds of carbon isotopes. The array of nano carbon tubes may have different shapes and areas, and the shape of the array of carbon nanotube tubes may be square, circular, elliptical or rectangular; other shapes of the at least two different carbon nanotube tubes The carbon nanotube array 30 can be composed of different arrangements. The different arrangement means that the at least two different carbon nanotube arrays can be arranged side by side, one sub-array surrounds the other sub-array, arranged at intervals, or otherwise formed into the carbon nanotubes. Array 30.
所述奈米碳管可係單壁奈米碳管、雙壁奈米碳管及多壁奈米碳管。本實施例中,該奈米碳管為一多壁奈米碳管,該多壁奈米碳管的直徑為0.5~50奈米。 The carbon nanotubes can be single-walled carbon nanotubes, double-walled carbon nanotubes, and multi-walled carbon nanotubes. In this embodiment, the carbon nanotube is a multi-walled carbon nanotube, and the multi-walled carbon nanotube has a diameter of 0.5 to 50 nm.
請參閱圖9,本發明第五實施例進一步提供一種奈米碳管陣列的製備方法。該製備方法包括:(S501)提供一形成有催化劑層的基底,並將該形成有催化劑層的基底置入一反應室中;(S502)提供至少兩種碳源氣,該至少兩種碳源氣中的碳元素分別由不同種類的碳同位素組成;(S503)將所述至少兩種碳源氣同時通入所述反應室中,控制所述催化劑層的溫度使該催化劑層不同區域分別達到不同的反應溫度,並使所述至少兩種碳源氣在催化劑層不同區域發生反應,分別形成含有不同種類的碳同位素的奈米碳管,進而形成奈米碳管陣列。 Referring to FIG. 9, a fifth embodiment of the present invention further provides a method for preparing a carbon nanotube array. The preparation method comprises: (S501) providing a substrate formed with a catalyst layer, and placing the substrate formed with the catalyst layer into a reaction chamber; (S502) providing at least two carbon source gases, the at least two carbon sources The carbon elements in the gas are respectively composed of different kinds of carbon isotopes; (S503) simultaneously introducing the at least two carbon source gases into the reaction chamber, and controlling the temperature of the catalyst layer to achieve different regions of the catalyst layer respectively Different reaction temperatures, and the at least two carbon source gases react in different regions of the catalyst layer to form carbon nanotubes containing different kinds of carbon isotopes, thereby forming a carbon nanotube array.
所述步驟S501及步驟S502與本發明第四實施例中的步驟S401及步驟S402基本相同。不同之處在於,本實施例中,包括三個雷射加 熱裝置240,所述三個雷射加熱裝置240分別從所述基底232的背面照射所述基底232的三個區域,使與所述基底232的三個區域相對應的催化劑層230的三個反應區域分別達到不同的溫度。通過從基底的背面照射基底,可避免該雷射在照射時對奈米碳管的生長造成破壞。 The step S501 and the step S502 are substantially the same as the step S401 and the step S402 in the fourth embodiment of the present invention. The difference is that in this embodiment, three lasers are included. The thermal device 240, the three laser heating devices 240 respectively illuminate three regions of the substrate 232 from the back side of the substrate 232, and three of the catalyst layers 230 corresponding to the three regions of the substrate 232 The reaction zones reach different temperatures. By illuminating the substrate from the back side of the substrate, it is possible to prevent the laser from damaging the growth of the carbon nanotubes upon irradiation.
所述步驟S503與本發明第三實施例中的步驟S403基本相同。不同之處在於,保持反應爐222中溫度為室溫,同時通過所述三個雷射加熱裝置240分別對所述的基底232的一第一區域、一第二區域以及一第三區域進行照射,使與所述的基底232的第一區域、第二區域以及第三區域相對應的催化劑層230的一第一反應區域、一第二反應區域以及一第三反應區域分別達到一第一溫度、一第二溫度以及一第三溫度。本實施例中所述第一溫度為催化乙炔氣體分解製備奈米碳管的反應溫度,該第一溫度約為600℃-650℃;所述第二溫度為催化乙烯氣體分解製備奈米碳管的反應溫度,該第二溫度約為650℃-800℃;所述第三溫度為催化甲烷氣體分解製備奈米碳管的反應溫度,該第三溫度約為850℃-1100℃。 The step S503 is substantially the same as the step S403 in the third embodiment of the present invention. The difference is that the temperature in the reaction furnace 222 is kept at room temperature, and a first region, a second region and a third region of the substrate 232 are respectively irradiated by the three laser heating devices 240. a first reaction region, a second reaction region, and a third reaction region of the catalyst layer 230 corresponding to the first region, the second region, and the third region of the substrate 232 respectively reach a first temperature a second temperature and a third temperature. In the embodiment, the first temperature is a reaction temperature for catalyzing the decomposition of acetylene gas to prepare a carbon nanotube, and the first temperature is about 600 ° C to 650 ° C; and the second temperature is a catalytic carbon gas decomposition to prepare a carbon nanotube. The reaction temperature is about 650 ° C - 800 ° C; the third temperature is a reaction temperature for catalyzing the decomposition of methane gas to prepare a carbon nanotube, and the third temperature is about 850 ° C - 1100 ° C.
可以理解,由於所述第一反應區域的溫度僅達到乙炔氣體分解製備奈米碳管的反應溫度,而未達到乙烯和甲烷氣體分解製備奈米碳管的反應溫度,故,該第一反應區域中僅有由12C組成的乙炔氣體發生分解反應,並生成由12C組成的奈米碳管子陣列沈積於所述第一反應區域的催化劑層鐵膜上;而所述第二反應區域的的溫度僅達到乙炔和乙烯氣體分解製備奈米碳管的反應溫度,而未達到甲烷氣體分解製備奈米碳管的反應溫度,故,該第二反應區域中由12C組成的乙炔氣體和由13C組成的乙烯氣體同時發生分解反應 ,並生成由12C以及13C組成的奈米碳管子陣列沈積於所述第二反應區域的催化劑層鐵膜上;由於所述第三反應區域的反應溫度同時達到催化乙炔、乙烯和甲烷氣體分解製備奈米碳管的反應溫度,故,該反應區域中由12C組成的乙炔氣體、由13C組成的乙烯氣體和由14C組成的甲烷氣體同時發生分解反應,生成由12C、13C以及14C組成的奈米碳管子陣列沈積於所述第三反應區域的催化劑層鐵膜上。此外,由於所述催化劑層230中除第一反應區域、第二反應區域以及第三反應區域以外的其他區域均未達到催化乙炔、乙烯和甲烷氣體分解製備奈米碳管的反應溫度,故,該區域中沒有任何氣體發生反應亦沒有奈米碳管沈積於所述區域的催化劑層鐵膜上。 It can be understood that, since the temperature of the first reaction zone only reaches the reaction temperature of preparing the carbon nanotube by decomposition of acetylene gas, and the reaction temperature of preparing the carbon nanotube by decomposition of ethylene and methane gas is not reached, the first reaction zone is Only the acetylene gas composed of 12 C is decomposed, and a nano carbon tube array composed of 12 C is deposited on the catalyst layer iron film of the first reaction region; and the second reaction region The temperature only reaches the reaction temperature of the acetylene and ethylene gas to prepare the carbon nanotubes, but does not reach the reaction temperature of the methane gas decomposition to prepare the carbon nanotubes. Therefore, the acetylene gas consisting of 12 C in the second reaction zone is composed of 13 The ethylene gas composed of C is simultaneously decomposed, and an array of nano carbon tubes composed of 12 C and 13 C is deposited on the catalyst layer iron film of the second reaction zone; due to the reaction temperature of the third reaction zone while achieving catalytic acetylene, ethylene, and methane gas decomposition reaction temperature the preparation of carbon nanotube, so, the acetylene gas from the reaction zone consisting of 12 C, 13 C composed of Alkenyl concurrent gas and methane gas consisting of 14 C-decomposition reaction to produce carbon nanotubes by a sub-array 12 C, 13 C and 14 C consisting of an iron catalyst layer deposited on the film of the third reaction zone. In addition, since the reaction layer of the catalyst layer 230 except the first reaction zone, the second reaction zone, and the third reaction zone does not reach a reaction temperature for catalyzing the decomposition of acetylene, ethylene, and methane gas to prepare a carbon nanotube, No gas reacts in this region and no carbon nanotubes are deposited on the catalyst layer iron film in the region.
最後,繼續反應預定時間後,將反應室220冷卻至室溫,在催化劑層鐵膜上分別形成含有不同種類的碳同位素的奈米碳管,進而形成一奈米碳管陣列。 Finally, after the reaction is continued for a predetermined period of time, the reaction chamber 220 is cooled to room temperature, and carbon nanotubes containing different kinds of carbon isotopes are formed on the catalyst layer iron film to form an array of carbon nanotubes.
可以理解,反應預定時間後,可通過所述雷射加熱裝置240分別對所述第一反應區域、第二反應區域以及第三反應區域的溫度進行控制,使該第一反應區域、第二反應區域以及第三反應區域分別達到不同的反應溫度,最後製備出具有複數個奈米碳管片段的奈米碳管子陣列。其中,每一奈米碳管子陣列中的奈米碳管由分別含有不同種類單一碳同位素或者含有不同種類碳同位素的不同組合的複數個奈米碳管片段組成。 It can be understood that after the predetermined reaction time, the temperature of the first reaction zone, the second reaction zone and the third reaction zone can be controlled by the laser heating device 240 to make the first reaction zone and the second reaction. The region and the third reaction zone respectively reach different reaction temperatures, and finally a nano carbon tube array having a plurality of carbon nanotube segments is prepared. Wherein, the carbon nanotubes in each nano carbon tube array are composed of a plurality of carbon nanotube segments respectively containing different kinds of single carbon isotopes or different combinations of different kinds of carbon isotopes.
例如,在步驟S503之後,通過所述雷射加熱裝置240分別對所述第一反應區域、第二反應區域以及第三反應區域的溫度進行控制,使該第一反應區域的溫度達到650℃-800℃,即,達到催化乙 炔及乙烯氣體分解製備奈米碳管的反應溫度;使第二反應區域的溫度達到850℃-1100℃,即,達到催化甲烷、乙炔及乙烯氣體分解製備奈米碳管的反應溫度;使第三反應區域的溫度達到600℃-650℃,即,僅達到催化乙炔氣體分解製備奈米碳管的反應溫度。可以理解,由於所述第一反應區域的溫度達到催化乙炔及乙烯氣體分解製備奈米碳管的反應溫度,未達到催化甲烷氣體分解製備奈米碳管的反應溫度,該反應過程中,由12C組成的乙炔氣體和由13C組成的乙烯氣體同時發生分解反應,生成由12C及13C組成的奈米碳管片段生長於所述由12C組成的奈米碳管片段的底端。由於所述第二反應區域的溫度達到催化甲烷、乙炔及乙烯氣體分解製備奈米碳管的反應溫度,該反應過程中,由12C組成的乙炔氣體、由13C組成的乙烯氣體以及由14C組成的甲烷氣體同時發生分解反應,生成由12C、13C及14C組成的奈米碳管片段生長於所述由12C及13C組成的奈米碳管片段的底端。此外,由於所述第三反應區域的溫度僅達到催化乙炔氣體分解製備奈米碳管的反應溫度,該反應過程中,僅有由12C組成的乙炔氣體發生分解反應,生成由12C組成的奈米碳管片段生長於所述由12C、13C及14C組成的奈米碳管片段的底端。 For example, after step S503, the temperature of the first reaction zone, the second reaction zone, and the third reaction zone are respectively controlled by the laser heating device 240, so that the temperature of the first reaction zone reaches 650 ° C - 800 ° C, that is, the reaction temperature for catalyzing the decomposition of acetylene and ethylene gas to prepare a carbon nanotube; the temperature of the second reaction zone is 850 ° C -1100 ° C, that is, catalyzing the decomposition of methane, acetylene and ethylene gas to prepare nano carbon The reaction temperature of the tube; the temperature of the third reaction zone is from 600 ° C to 650 ° C, that is, only the reaction temperature for catalyzing the decomposition of acetylene gas to prepare the carbon nanotubes is reached. It can be understood that, since the temperature of the first reaction zone reaches a reaction temperature for catalyzing the decomposition of acetylene and ethylene gas to prepare a carbon nanotube, the reaction temperature for catalyzing the decomposition of methane gas to prepare a carbon nanotube is not reached, and the reaction process is carried out by 12 The acetylene gas composed of C and the ethylene gas composed of 13 C are simultaneously decomposed to form a carbon nanotube segment composed of 12 C and 13 C grown at the bottom end of the 12 C carbon nanotube segment. Since the temperature of the second reaction zone reaches a reaction temperature for catalyzing the decomposition of methane, acetylene and ethylene gas to prepare a carbon nanotube, the reaction process comprises an acetylene gas consisting of 12 C, an ethylene gas consisting of 13 C, and 14 The methane gas composed of C is simultaneously decomposed, and a carbon nanotube segment composed of 12 C, 13 C and 14 C is formed and grown at the bottom end of the carbon nanotube segment consisting of 12 C and 13 C. In addition, since the temperature of the third reaction zone only reaches the reaction temperature for preparing the carbon nanotubes by catalyzing the decomposition of acetylene gas, only the acetylene gas composed of 12 C is decomposed and reacts to form 12 C. A carbon nanotube fragment is grown at the bottom end of the carbon nanotube fragment consisting of 12 C, 13 C and 14 C.
可以理解,所述奈米碳管子陣列中的奈米碳管片段的排列順序亦可隨意組合,可通過在反應過程中控制溫度的方式實現按照不同的順序生長不同的奈米碳管片斷。 It can be understood that the arrangement order of the carbon nanotube segments in the nano carbon tube array can also be arbitrarily combined, and different carbon nanotube fragments can be grown in different orders by controlling the temperature during the reaction.
請參閱圖10,由本發明第五實施例製備得到的奈米碳管陣列40,該奈米碳管陣列40由一第一奈米碳管子陣列42、一第二奈米碳管子陣列44及一第三奈米碳管子陣列46組成;各個奈米碳管子陣列 由含有單一種類碳同位素或者含有不同種類碳同位素組合的單一的奈米碳管片段組成。其中,所述第一奈米碳管子陣列42中的奈米碳管由12C組成,所述第二奈米碳管子陣列44的奈米碳管由12C及13C組成,所述第三奈米碳管子陣列46的奈米碳管由12C、13C及14C組成。所述第一奈米碳管子陣列42、第二奈米碳管子陣列44及第三奈米碳管子陣列46中的奈米碳管具有相等或不等的長度,可根據實際需要獲得。本實施例中,所述奈米碳管陣列40中的奈米碳管的長度優選為100微米~900微米,所述第一奈米碳管子陣列42、第二奈米碳管子陣列44及第三奈米碳管子陣列46中的奈米碳管具有大致相等的長度。 Referring to FIG. 10, a carbon nanotube array 40 prepared by a fifth embodiment of the present invention, the carbon nanotube array 40 comprises a first nano carbon tube array 42, a second nano carbon tube array 44 and a The third nanocarbon tube array 46 is composed; each nano carbon tube array is composed of a single carbon nanotube segment containing a single type of carbon isotope or containing a combination of different types of carbon isotopes. Wherein, the carbon nanotubes in the array of first carbon nanotube tubes 42 are composed of 12 C, and the carbon nanotubes of the array of second carbon nanotube tubes 44 are composed of 12 C and 13 C, the third The carbon nanotubes of the nano carbon tube array 46 are composed of 12 C, 13 C and 14 C. The carbon nanotubes in the first nano carbon tube array 42, the second nano carbon tube array 44 and the third nano carbon tube array 46 have equal or unequal lengths and can be obtained according to actual needs. In this embodiment, the length of the carbon nanotubes in the carbon nanotube array 40 is preferably from 100 micrometers to 900 micrometers, and the first nano carbon tube array 42, the second nano carbon tube array 44, and the first The carbon nanotubes in the three nano carbon tube array 46 have substantially equal lengths.
本發明實施例所提供的奈米碳管陣列係一個具有複數個奈米碳管子陣列的奈米碳管陣列,由於該複數個奈米碳管子陣列中的奈米碳管分別摻雜有不同的同位素,故可方便的用於標記複數個樣本。 The carbon nanotube array provided by the embodiment of the present invention is a carbon nanotube array having a plurality of nano carbon tube arrays, wherein the carbon nanotubes in the plurality of nano carbon tube arrays are respectively doped with different carbon nanotubes. Isotope, so it can be conveniently used to mark a plurality of samples.
本發明實施例的奈米碳管陣列的製備方法,通過提供各種含有單一同位素的不同碳源氣體,並根據所述不同碳源氣體分解製備奈米碳管的反應溫度不同,通過控制不同的反應溫度,可使不同碳源氣體分解生長奈米碳管,從而得到奈米碳管陣列。該方法可根據實際需要,通過控制通入不同的碳源氣體以及各種碳源氣體的反應溫度,方便的獲得多種組合的摻有同位素的奈米碳管陣列,並可進一步研究奈米碳管的反應機理。 The method for preparing a carbon nanotube array according to an embodiment of the present invention provides different reaction temperatures by providing various carbon source gases containing a single isotope and preparing carbon nanotubes according to decomposition of the different carbon source gases, by controlling different reactions. The temperature allows the different carbon source gases to decompose and grow the carbon nanotubes to obtain a carbon nanotube array. The method can conveniently obtain various combinations of isotope-doped carbon nanotube arrays by controlling the reaction temperatures of different carbon source gases and various carbon source gases according to actual needs, and further study of carbon nanotubes. Reaction mechanism.
此外,所述奈米碳管陣列的製備方法通過控制所述催化劑層溫度使該催化劑層不同區域分別達到不同的反應溫度,使各種碳源氣在催化劑層不同區域發生反應,即可獲得複數個摻雜有不同同位 素奈米碳管子陣列。故,該製備方法可一次製備出複數個摻雜有不同同位素奈米碳管,減少了製備的時間。並且,該方法通過控制催化劑層不同區域的溫度,可方便的獲得具有各種圖形的摻有同位素的奈米碳管子陣列。 In addition, the method for preparing the carbon nanotube array can obtain a plurality of different carbon source gases in different regions of the catalyst layer by controlling the temperature of the catalyst layer to achieve different reaction temperatures in different regions of the catalyst layer. Doping with different isotopes An array of sodium carbon tubes. Therefore, the preparation method can prepare a plurality of carbon nanotubes doped with different isotopes at one time, which reduces the preparation time. Moreover, the method can conveniently obtain an isotope-doped nano carbon tube array having various patterns by controlling the temperature of different regions of the catalyst layer.
綜上所述,本發明確已符合發明專利之要件,遂依法提出專利申請。惟,以上所述者僅為本發明之較佳實施例,自不能以此限制本案之申請專利範圍。舉凡習知本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。 In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by those skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.
30‧‧‧奈米碳管陣列 30‧‧‧Nano Carbon Tube Array
32;34;36‧‧‧奈米碳管子陣列 32;34;36‧‧・Nano carbon pipe array
Claims (15)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW100113623A TWI417412B (en) | 2010-10-07 | 2011-04-20 | A carbon nanotube array and method for making the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW99134180 | 2010-10-07 | ||
TW100113623A TWI417412B (en) | 2010-10-07 | 2011-04-20 | A carbon nanotube array and method for making the same |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201215699A TW201215699A (en) | 2012-04-16 |
TWI417412B true TWI417412B (en) | 2013-12-01 |
Family
ID=46786906
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100113623A TWI417412B (en) | 2010-10-07 | 2011-04-20 | A carbon nanotube array and method for making the same |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI417412B (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1502554A (en) * | 2002-11-27 | 2004-06-09 | �廪��ѧ | Carbon nano pipe, its preparation process and equipment |
CN1699152A (en) * | 2004-05-20 | 2005-11-23 | 清华大学 | Nano carbon tube and preparation method thereof |
-
2011
- 2011-04-20 TW TW100113623A patent/TWI417412B/en active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1502554A (en) * | 2002-11-27 | 2004-06-09 | �廪��ѧ | Carbon nano pipe, its preparation process and equipment |
CN1699152A (en) * | 2004-05-20 | 2005-11-23 | 清华大学 | Nano carbon tube and preparation method thereof |
Non-Patent Citations (1)
Title |
---|
J.Shi et al.,"Direct synthesis of single-walled carbon nanotubes bridging metal electrodes by laser-assisted chemical vapor deposition",APPLIED PHYSICS LETTERS,89,2006,083105 * |
Also Published As
Publication number | Publication date |
---|---|
TW201215699A (en) | 2012-04-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2263974B1 (en) | Equipment and method for producing orientated carbon nano-tube aggregates | |
US8142568B2 (en) | Apparatus for synthesizing a single-wall carbon nanotube array | |
CN102417172B (en) | Preparation method of carbon nanotube array | |
US7883580B2 (en) | System and method for nanotube growth via Ion implantation using a catalytic transmembrane | |
JP5574264B2 (en) | Base material for producing aligned carbon nanotube aggregate and method for producing aligned carbon nanotube aggregate | |
JP2011136414A (en) | Isotope-doped nano-material, method for producing the same, and labeling method | |
US20160075558A1 (en) | Method for producing aligned carbon nanotube assembly | |
CN102534766B (en) | A kind of device of quick continuous production large-size graphene film and application thereof | |
CN102092704B (en) | Device and method for preparing carbon nanotube array | |
JP2009091174A (en) | Method for producing graphene sheet | |
EP2763936A1 (en) | Rapid synthesis of graphene and formation of graphene structures | |
JP2001303250A (en) | Vapor deposition method for perpendicularly orienting carbon nanotube utilizing low-pressure-dc-thermal chemical vapor deposition process | |
Chen et al. | Growth of carbon nanotubes at temperatures compatible with integrated circuit technologies | |
CN102417171B (en) | Carbon nano tube array and preparation method thereof | |
EP2716600A1 (en) | Apparatus and method for producing oriented carbon nanotube aggregate | |
TWI417412B (en) | A carbon nanotube array and method for making the same | |
Vinten et al. | Origin of periodic rippling during chemical vapor deposition growth of carbon nanotube forests | |
TWI417413B (en) | Method for making carbon nanotube array | |
JP5700819B2 (en) | Method for producing aligned carbon nanotube assembly | |
JP5085901B2 (en) | Carbon nanotube production equipment | |
KR100593418B1 (en) | Method for mass production of carbon nanotubes | |
TWI314917B (en) | Method for manufacturing carbon nanotubes array | |
JP2004332044A (en) | Method and device for producing carbon based substance | |
TWI386516B (en) | Apparatus for fabrication of carbon nanotubes | |
JP2005336043A (en) | Carbon nanotube and method of manufacturing carbon fiber |