TWI405494B - Organic light-emitting display device and manufacturing method of the same - Google Patents
Organic light-emitting display device and manufacturing method of the same Download PDFInfo
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- TWI405494B TWI405494B TW095143705A TW95143705A TWI405494B TW I405494 B TWI405494 B TW I405494B TW 095143705 A TW095143705 A TW 095143705A TW 95143705 A TW95143705 A TW 95143705A TW I405494 B TWI405494 B TW I405494B
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- substrate
- oxide
- organic light
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- light emitting
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 249
- 229920005989 resin Polymers 0.000 claims abstract description 23
- 239000011347 resin Substances 0.000 claims abstract description 23
- 239000010410 layer Substances 0.000 claims description 75
- 230000003014 reinforcing effect Effects 0.000 claims description 74
- 239000000463 material Substances 0.000 claims description 65
- 230000004927 fusion Effects 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 34
- 238000005253 cladding Methods 0.000 claims description 19
- 239000011521 glass Substances 0.000 claims description 17
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims description 9
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 9
- 238000003491 array Methods 0.000 claims description 8
- 229910000679 solder Inorganic materials 0.000 claims description 8
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910000416 bismuth oxide Inorganic materials 0.000 claims description 6
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 claims description 6
- 239000000395 magnesium oxide Substances 0.000 claims description 6
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 6
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 6
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 5
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 5
- 239000002356 single layer Substances 0.000 claims description 5
- 239000004925 Acrylic resin Substances 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- 239000003822 epoxy resin Substances 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 229920000647 polyepoxide Polymers 0.000 claims description 4
- 229920005749 polyurethane resin Polymers 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 3
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 3
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 3
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 3
- 239000005385 borate glass Substances 0.000 claims description 3
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims description 3
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 claims description 3
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 claims description 3
- FZFYOUJTOSBFPQ-UHFFFAOYSA-M dipotassium;hydroxide Chemical compound [OH-].[K+].[K+] FZFYOUJTOSBFPQ-UHFFFAOYSA-M 0.000 claims description 3
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 claims description 3
- ZPPSOOVFTBGHBI-UHFFFAOYSA-N lead(2+);oxido(oxo)borane Chemical compound [Pb+2].[O-]B=O.[O-]B=O ZPPSOOVFTBGHBI-UHFFFAOYSA-N 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 239000005365 phosphate glass Substances 0.000 claims description 3
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims description 3
- 238000005728 strengthening Methods 0.000 claims description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 3
- 229910001887 tin oxide Inorganic materials 0.000 claims description 3
- QUBMWJKTLKIJNN-UHFFFAOYSA-B tin(4+);tetraphosphate Chemical compound [Sn+4].[Sn+4].[Sn+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QUBMWJKTLKIJNN-UHFFFAOYSA-B 0.000 claims description 3
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 2
- 230000003647 oxidation Effects 0.000 claims description 2
- 238000007254 oxidation reaction Methods 0.000 claims description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims 2
- HTUMBQDCCIXGCV-UHFFFAOYSA-N lead oxide Chemical compound [O-2].[Pb+2] HTUMBQDCCIXGCV-UHFFFAOYSA-N 0.000 claims 2
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 claims 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- 238000007789 sealing Methods 0.000 abstract description 5
- 239000012779 reinforcing material Substances 0.000 abstract description 3
- 239000012044 organic layer Substances 0.000 description 21
- 238000001723 curing Methods 0.000 description 14
- 239000011368 organic material Substances 0.000 description 13
- 239000000945 filler Substances 0.000 description 12
- 229920001621 AMOLED Polymers 0.000 description 11
- 238000005538 encapsulation Methods 0.000 description 11
- 238000002347 injection Methods 0.000 description 10
- 239000007924 injection Substances 0.000 description 10
- 230000002745 absorbent Effects 0.000 description 9
- 239000002250 absorbent Substances 0.000 description 9
- 238000000137 annealing Methods 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 239000011159 matrix material Substances 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- 230000008569 process Effects 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 230000008021 deposition Effects 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 5
- 229910010272 inorganic material Inorganic materials 0.000 description 5
- 239000011147 inorganic material Substances 0.000 description 5
- 230000001678 irradiating effect Effects 0.000 description 5
- 239000012080 ambient air Substances 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 239000000084 colloidal system Substances 0.000 description 4
- 239000003292 glue Substances 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000969 carrier Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000012780 transparent material Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 239000011344 liquid material Substances 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 241001062472 Stokellia anisodon Species 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002085 enols Chemical class 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 239000001863 hydroxypropyl cellulose Substances 0.000 description 1
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 229910001867 inorganic solvent Inorganic materials 0.000 description 1
- 239000003049 inorganic solvent Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000012858 resilient material Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8428—Vertical spacers, e.g. arranged between the sealing arrangement and the OLED
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
本發明關於一種有機發光顯示裝置,更特別關於一種有機發光顯示裝置的封裝。 The present invention relates to an organic light emitting display device, and more particularly to a package of an organic light emitting display device.
有機發光顯示器是一種平面顯示裝置。有機發光顯示裝置通常包含位於相對的兩電極之間的有機發光層。將電壓施加於電極間以使自一電極注入的電子會於有機發光層中被耦合至自另一電極注入的電洞。藉此種耦合,發光層中的發光分子會被激發並降激回基態,因而發光。 An organic light emitting display is a flat display device. An organic light emitting display device typically includes an organic light emitting layer between opposing electrodes. A voltage is applied between the electrodes such that electrons injected from one electrode are coupled to the holes injected from the other electrode in the organic light-emitting layer. With this coupling, the luminescent molecules in the luminescent layer are excited and deactivated back to the ground state, thus illuminating.
這種有機發光顯示器的一種問題為,在水分及/或雜質滲入有機發光二極體的有機材料中時,會造成其惡化。 One problem with such an organic light emitting display is that it deteriorates when moisture and/or impurities penetrate into the organic material of the organic light emitting diode.
本發明的一種觀點提供有機發光顯示(OLED)裝置,其包含:第一基板;第二基板,其係置於第一基板上,其中第一與第二基板各由單一層所構層或包含複數層;有機發光像素陣列,其係介於第一與第二基板間;熔接封條,其係介於第一與第二基板間並圍繞該陣列,其中該熔接封條與第一、第二基板共同界定了陣列所在位置的包覆空間;強化構件,其係介 於第一與第二基板間,該強化構件互連了第一與第二基板。 One aspect of the present invention provides an organic light emitting display (OLED) device including: a first substrate; a second substrate disposed on the first substrate, wherein the first and second substrates are each layered or contained by a single layer a plurality of layers; an organic light emitting pixel array interposed between the first and second substrates; a fusion seal between the first and second substrates and surrounding the array, wherein the fusion seal and the first and second substrates Co-defining the cladding space where the array is located; The reinforcing member interconnects the first and second substrates between the first and second substrates.
強化構件可包含樹脂。該樹脂可包含下列一或多種:環氧樹脂、丙烯酸酯樹脂、與聚胺酯樹脂。該強化構件可接觸該熔接封條。該強化構件可不接觸該熔接封條。該強化構件可位於該包覆空間內。該強化構件可位於該包覆空間外。該強化構件可包含第一構件與第二構件,第一構件於包覆空間中,第二構件於包覆空間外。第一構件可包含與第二構件同樣的材料。第一構件可包含與第二構件不同的材料。 The reinforcing member may comprise a resin. The resin may comprise one or more of the following: an epoxy resin, an acrylate resin, and a polyurethane resin. The reinforcing member can contact the weld seal. The reinforcing member may not contact the weld seal. The reinforcing member can be located within the cladding space. The reinforcing member can be located outside of the cladding space. The reinforcing member may include a first member and a second member, the first member being in the cladding space and the second member being outside the cladding space. The first member may comprise the same material as the second member. The first member can comprise a different material than the second member.
該熔接封條可包含複數延長線段,其中該等線段會聯合起來環繞該陣列,且其中該強化構件會延著且實質上平行於至少其中一線段擴展。強化構件可包含複數個延長線段,其中該等線段會聯合起來環繞該陣列。強化構件的每一延長線段可沿著並實質上平行於熔接封條的其中一延長線段擴展。該強化構件可進一步密封該包覆空間。 The fused seal can include a plurality of extended segments, wherein the segments join together to surround the array, and wherein the reinforcing member extends and extends substantially parallel to at least one of the segments. The reinforcing member can include a plurality of extended segments, wherein the segments join together to surround the array. Each extension line segment of the reinforcing member can extend along and substantially parallel to one of the extended line segments of the fusion seal. The reinforcing member can further seal the cladding space.
本發明的另一項觀點提供一種製造有機發光顯示器(OLED)的方法。該方法包含:提供一種裝置其包含:第一基板;第二基板,其置於第一基板上;有機發光像素陣列,其介於第一與第二基板間;熔接物,其介於第一與第二基板間且環繞該陣列,其中該熔接物與第一基板與第二基板共同界定一包覆空間,陣列位於其內;未固化樹脂結構,其介於第一與第二基板間且接觸第一與第二基板,其中該未固化樹脂接觸或不接觸該熔接物;固化該未固化樹脂結構,以形成強化構件結合該第一與第二基板;施加雷射或紅外光束於熔接物,以將 熔接物與第一和第二基板接合。 Another aspect of the present invention provides a method of fabricating an organic light emitting display (OLED). The method includes: providing a device comprising: a first substrate; a second substrate disposed on the first substrate; an organic light emitting pixel array interposed between the first and second substrates; and a fusion material interposed therebetween And surrounding the array with the second substrate, wherein the fusion material and the first substrate and the second substrate together define a cladding space in which the array is located; an uncured resin structure interposed between the first and second substrates Contacting the first and second substrates, wherein the uncured resin is in contact with or not contacting the fusion; curing the uncured resin structure to form a reinforcing member to bond the first and second substrates; applying a laser or infrared beam to the fusion To The fuse is bonded to the first and second substrates.
該方法中,樹脂結構可包含下列一或多種:環氧樹脂、丙烯酸酯樹脂、與聚胺酯樹脂。強化構件可於包覆空間之內及/或之外。固化該未固化樹脂結構可包含將UV或熱施加至未固化樹脂結構。固化該未固化樹脂結構可實行於施加雷射或紅外光束之前。固化該未固化樹脂結構可接續於施加雷射或紅外光束之後實施。 In the method, the resin structure may comprise one or more of the following: an epoxy resin, an acrylate resin, and a polyurethane resin. The reinforcing members can be within and/or outside of the cladding space. Curing the uncured resin structure may comprise applying UV or heat to the uncured resin structure. Curing the uncured resin structure can be performed prior to applying a laser or infrared beam. Curing the uncured resin structure can be carried out subsequent to the application of a laser or infrared beam.
該裝置可進一步包含:複數個額外的有機發光像素陣列,其係介於第一與第二基板間;複數個額外的熔接物,其係介於第一與第二基板間,該等額外的熔接物會各自對應於額外的陣列之一而圍繞;複數個額外的未固化樹脂結構,其係介於第一與第二基板間,該等額外的未固化樹脂結構會在額外的熔接物的包覆空間之內或之外或者同時於其之內及之外。 The apparatus can further include: a plurality of additional organic luminescent pixel arrays interposed between the first and second substrates; a plurality of additional splicings between the first and second substrates, the additional The welds will each be surrounded by one of the additional arrays; a plurality of additional uncured resin structures are interposed between the first and second substrates, and the additional uncured resin structures will be in the additional welds Within or outside of the cladding space or both within and outside of it.
該方法可進一步包含:固化該等額外未固化樹脂結構,以形成複數個互聯於第一及第二基板的強化構件;將該等結果產物切割為複數片,各包含第一基板的切割部分、第二基板的切割部分、有機發光像素陣列、熔接物、與強化構件。 The method may further comprise: curing the additional uncured resin structures to form a plurality of reinforcing members interconnected to the first and second substrates; cutting the resulting products into a plurality of sheets, each comprising a cut portion of the first substrate, a cut portion of the second substrate, an organic light emitting pixel array, a fusion material, and a reinforcing member.
本發明另一觀點提供一種用於準備有機發光顯示裝置的方法,該裝置包括包含有機發光元件的第一基板與至少密封該基板像素區的第二基板。該方法包含:第一步驟,用以藉施加熔接膠質至第二基板像素區外側並將其退火形成熔接物;第二步驟,用以施加強化構件至熔接物邊;第三步驟,用以將 第二基板接合至第一基板;第四步驟,用以固化該強化構件;第五步驟,用以藉照射雷射或紅外線至熔接物將該第一基板黏著至第二基板。 Another aspect of the present invention provides a method for preparing an organic light emitting display device, the device comprising a first substrate including an organic light emitting element and a second substrate sealing at least the pixel region of the substrate. The method comprises: a first step of applying a fusion glue to the outside of the second substrate pixel region and annealing it to form a weld; a second step for applying the reinforcing member to the edge of the weld; and a third step for The second substrate is bonded to the first substrate; the fourth step is for curing the reinforcing member; and the fifth step is for adhering the first substrate to the second substrate by irradiating laser or infrared rays to the fusion.
本發明另一項觀點提供一種方法,其係用以一次準備複數個有機發光顯示裝置,其包含含有有機發光元件的第一基板以及至少密封於該第一基板的像素區的第二基板,而該方法包含:第一步驟,用以藉施加熔接塗料並將其退火以形成熔接物於第二基板原始薄片的外側,於其上形成有複數個第二基板;第二步驟,用以將強化構件施加至個別熔接物的側邊;第三步驟,用以將第二基板原始薄片連接至第一基板原始薄片,其上形成複數個第一基板;第四步驟,用以固化該強化構件;第五步驟,利用將雷射或紅外線照射於各熔接物,以將第一基板黏著至第二基板;第六步驟,用以切割互相連結的第一基板原始薄片與第二基板原始薄片,並將其分為獨立的有機發光顯示裝置。 Another aspect of the present invention provides a method for preparing a plurality of organic light emitting display devices at a time, comprising: a first substrate including an organic light emitting element; and a second substrate sealed at least in a pixel region of the first substrate, and The method comprises: a first step of applying a sinter coating and annealing it to form a smelt on the outer side of the original substrate of the second substrate, on which a plurality of second substrates are formed; and a second step for strengthening a member is applied to a side of the individual weld; a third step of connecting the second substrate original sheet to the first substrate original sheet, on which a plurality of first substrates are formed; and a fourth step of curing the reinforcing member; a fifth step of irradiating the first substrate with the laser or the infrared rays to adhere the first substrate to the second substrate; and a sixth step of cutting the first substrate original sheet and the second substrate original sheet which are connected to each other, and It is divided into independent organic light emitting display devices.
本發明另一觀點提供一種用於準備有機發光顯示裝置的方法,該裝置包括包含有機發光元件的第一基板與至少密封該基板像素區的第二基板。該方法包含:第一步驟,用以藉施加熔接膠質至第二基板像素區外側並將其退火形成熔接物;第二步驟,用以施加強化構件至熔接物邊;第三步驟,用以將第二基板接合至第一基板;第四步驟,用以藉照射雷射或紅外線至熔接物而將該第一基板黏著至第二基板;第五步驟,用以固化該強化構件。 Another aspect of the present invention provides a method for preparing an organic light emitting display device, the device comprising a first substrate including an organic light emitting element and a second substrate sealing at least the pixel region of the substrate. The method comprises: a first step of applying a fusion glue to the outside of the second substrate pixel region and annealing it to form a weld; a second step for applying the reinforcing member to the edge of the weld; and a third step for The second substrate is bonded to the first substrate; the fourth step is for adhering the first substrate to the second substrate by irradiating laser or infrared rays to the fusion; and the fifth step is for curing the reinforcing member.
本發明另一項觀點提供一種方法,其係用以一次準備複數個有機發光顯示裝置,其包含含有有機發光元件的第一基板以及至少密封於該第一基板的像素區的第二基板,而該方法包含:第一步驟,用以藉施加熔接膠質並將其退火以形成熔接物於第二基板原始薄片的外側,於其上形成有複數個第二基板;第二步驟,用以將強化構件施加至個別熔接物的側邊;第三步驟,用以將第二基板原始薄片連接至第一基板原始薄片,其上形成有複數個第一基板;第四步驟,用以固化該強化構件;第五步驟,利用將雷射或紅外線照射於各熔接物,以將第一基板黏著至第二基板;第六步驟,用以切割互相連結的第一基板原始薄片與第二基板原始薄片,並將其分為獨立的有機發光顯示裝置。 Another aspect of the present invention provides a method for preparing a plurality of organic light emitting display devices at a time, comprising: a first substrate including an organic light emitting element; and a second substrate sealed at least in a pixel region of the first substrate, and The method comprises: a first step of applying a fusion glue and annealing it to form a weld on the outer side of the original substrate of the second substrate, on which a plurality of second substrates are formed; and a second step for strengthening a member applied to a side of the individual weld; a third step of joining the second substrate original sheet to the first substrate original sheet, on which a plurality of first substrates are formed; and a fourth step of curing the reinforcing member a fifth step of irradiating the first substrate with the laser or the infrared ray to adhere the first substrate to the second substrate; and a sixth step of cutting the first substrate original sheet and the second substrate original sheet which are connected to each other, And it is divided into independent organic light-emitting display devices.
根據用以準備複數個有機發光顯示裝置的方法,強化構件會囊封該熔接物與囊封基板,並在利用熔接物時強化有機發光顯示裝置的封裝。此外,強化構件會保護有機發光元件不受周遭空氣破壞。 According to the method for preparing a plurality of organic light-emitting display devices, the reinforcing member encapsulates the melt and the encapsulated substrate, and strengthens the package of the organic light-emitting display device when the fuse is utilized. In addition, the reinforcing member protects the organic light-emitting element from the surrounding air.
1‧‧‧沉積基板 1‧‧‧Deposited substrate
2‧‧‧囊封基板 2‧‧‧encapsulated substrate
3‧‧‧囊封構件 3‧‧‧encapsulated components
4‧‧‧水分吸收劑 4‧‧‧Water Absorbent
100‧‧‧基板 100‧‧‧Substrate
100a‧‧‧像素區 100a‧‧‧pixel area
100b‧‧‧非像素區 100b‧‧‧Non-pixel area
101‧‧‧沉積基板 101‧‧‧Deposited substrate
111‧‧‧緩衝層 111‧‧‧buffer layer
112‧‧‧半導體層 112‧‧‧Semiconductor layer
112a‧‧‧主動層 112a‧‧‧ active layer
112b‧‧‧歐姆接觸層 112b‧‧‧Ohm contact layer
113‧‧‧閘極絕緣層 113‧‧‧ gate insulation
114‧‧‧閘極電極 114‧‧‧gate electrode
115‧‧‧層間絕緣層 115‧‧‧Interlayer insulation
116a‧‧‧源極電極 116a‧‧‧Source electrode
116b‧‧‧汲極電極 116b‧‧‧汲electrode
117‧‧‧平坦化層 117‧‧‧flattening layer
118‧‧‧通孔 118‧‧‧through hole
119‧‧‧第一電極 119‧‧‧first electrode
120‧‧‧像素界定膜 120‧‧‧ pixel definition film
121‧‧‧有機層 121‧‧‧Organic layer
122‧‧‧第二電極層 122‧‧‧Second electrode layer
150‧‧‧熔接物 150‧‧‧welds
160‧‧‧強化構件 160‧‧‧Strengthened components
170‧‧‧資料驅動器 170‧‧‧Data Drive
180、180’‧‧‧掃描驅動器 180, 180’‧‧‧ scan drive
200‧‧‧囊封基板 200‧‧‧encapsulated substrate
300‧‧‧基板原始薄片 300‧‧‧Sheet original sheet
350‧‧‧熔接膠質 350‧‧‧welding
360‧‧‧強化構件 360‧‧‧Strength
370‧‧‧原始基板囊封構件 370‧‧‧Original substrate encapsulation member
400‧‧‧囊封基板原始薄片 400‧‧‧encapsulated substrate original sheet
1000‧‧‧被動矩陣型OLED 1000‧‧‧Passive Matrix OLED
1001‧‧‧主動矩陣型OLED 1001‧‧‧Active Matrix OLED
1002‧‧‧基板 1002‧‧‧Substrate
1004‧‧‧陽極 1004‧‧‧Anode
1006‧‧‧陰極 1006‧‧‧ cathode
1010‧‧‧有機層 1010‧‧‧Organic layer
1011‧‧‧OLED裝置 1011‧‧‧OLED device
1012‧‧‧局域驅動電路 1012‧‧‧ Local drive circuit
1014‧‧‧平坦化層 1014‧‧‧flattening layer
1016‧‧‧資料線 1016‧‧‧Information line
1018‧‧‧掃描線 1018‧‧‧ scan line
1021‧‧‧OLED像素陣列 1021‧‧‧OLED pixel array
1061‧‧‧頂部基板 1061‧‧‧Top substrate
1071‧‧‧封條 1071‧‧‧Seal
1081‧‧‧包覆空間 1081‧‧‧wrapped space
1101‧‧‧共同底部基板 1101‧‧‧Common bottom substrate
圖1所示係一種有機發光顯示裝置的截面圖。 Figure 1 is a cross-sectional view showing an organic light emitting display device.
圖2所示係根據一實施例的一種有機發光顯示裝置的平面圖。 2 is a plan view of an organic light emitting display device according to an embodiment.
圖3所示係沿圖2所示有機發光顯示裝置的線A-A’所得截面圖。 Fig. 3 is a cross-sectional view taken along line A-A' of the organic light-emitting display device shown in Fig. 2.
圖4所示係根據另一實施例之有機發光顯示器的截面圖。 4 is a cross-sectional view of an organic light emitting display according to another embodiment.
圖5所示係根據另一實施例之有機發光顯示器的截面圖。 Figure 5 is a cross-sectional view of an organic light emitting display according to another embodiment.
圖6A到6E所示係根據一實施例的有機發光顯示器準備製程的截面圖。 6A to 6E are cross-sectional views showing an organic light emitting display preparation process according to an embodiment.
圖7A到7F所示係根據一實施例的於原始薄板單位的有機發光顯示裝置的準備製程的截面圖。 7A to 7F are cross-sectional views showing a preparation process of an organic light-emitting display device in an original thin plate unit according to an embodiment.
圖8A所示係根據一實施例之被動矩陣型有機發光顯示裝置的分解示意圖。 FIG. 8A is an exploded perspective view showing a passive matrix type organic light emitting display device according to an embodiment.
圖8B所示係根據一實施例之主動矩陣型有機發光顯示裝置的分解示意圖。 FIG. 8B is an exploded perspective view of an active matrix type organic light emitting display device according to an embodiment.
圖8C所示係根據一實施例之有機發光顯示裝置的俯視平面圖。 Figure 8C is a top plan view of an organic light emitting display device in accordance with an embodiment.
圖8D所示係沿圖8C所示有機發光顯示裝置的線D-D所得截面圖。 Fig. 8D is a cross-sectional view taken along line D-D of the organic light-emitting display device shown in Fig. 8C.
圖8E所示係根據一實施例之有機發光顯示裝置的量產立體示意圖。 FIG. 8E is a perspective view showing mass production of an organic light emitting display device according to an embodiment.
在下文,根據本發明的實施例將參考伴隨附圖一起描述。上述以及其他的本發明特徵及優點從下列實施例的描述及伴隨附圖將變得更明顯並且更容易理解。 Hereinafter, embodiments according to the present invention will be described with reference to the accompanying drawings. The above and other features and advantages of the present invention will become more apparent from the following description of the accompanying drawings.
有機發光顯示器(OLED)係包括有機發光二極體陣列的顯示器 。有機發光二極體係包括有機材料的固態元件,其在施加適當電位時產生並發射光。 Organic light emitting display (OLED) is a display including an organic light emitting diode array . Organic light-emitting diode systems include solid state elements of organic materials that generate and emit light when a suitable potential is applied.
依據所提供的激發電流安排,OLEDs通常可以歸納為兩種基本類型。圖8A所示係被動矩陣型OLED 1000的簡化架構分解圖。圖8B所示係主動矩陣型OLED 1001的簡化架構示意圖。在兩個構造中,OLED 1000、1001皆包含在基板1002上方建構的OLED像素,並且OLED像素包括陽極1004、陰極1006、以及有機層1010。當施加適當的電流於陽極1004時,電流流過像素然後可見光便會從有機層發出。 Depending on the excitation current arrangement provided, OLEDs can generally be grouped into two basic types. A simplified architectural exploded view of a passive matrix OLED 1000 is shown in FIG. 8A. FIG. 8B is a simplified schematic diagram of an active matrix OLED 1001. In both configurations, the OLEDs 1000, 1001 comprise OLED pixels constructed over the substrate 1002, and the OLED pixels include an anode 1004, a cathode 1006, and an organic layer 1010. When a suitable current is applied to the anode 1004, current flows through the pixels and visible light is emitted from the organic layer.
參考圖8A,被動矩陣OLED(PMOLED)的設計包括陽極1004的延長條帶,其通常安排為垂直於陰極1006延長條帶,而有機層介於二者之間。陰極1006與陽極1004條帶的交叉處界定個別的OLED像素,在適當地激發陽極1004及陰極1006的相應條帶時會產生並發射光。PMOLEDs提供相對簡單的製造優點。 Referring to Figure 8A, the design of a passive matrix OLED (PMOLED) includes an elongated strip of anode 1004 that is generally arranged to extend the strip perpendicular to the cathode 1006 with the organic layer interposed therebetween. The intersection of the cathode 1006 and the strip of anode 1004 defines individual OLED pixels that are generated and emitted when the respective strips of anode 1004 and cathode 1006 are properly excited. PMOLEDs offer relatively simple manufacturing advantages.
參考圖8B,主動矩陣OLED(AMOLED)包括在基板1002及OLED像素陣列之間安排的驅動電路1012。AMOLEDs的個別像素界定在共同陰極1006及陽極1004之間,該陽極與其他陽極電性獨立。每一個局域驅動電路1012耦合於OLED像素的一陽極1004,並進一步耦合於資料線1016及掃描線1018。在一些實施例中,掃描線1018供應掃描信號,其選擇數列驅動電路,而資料線1016供應資料信號給特定的驅動電路。資料信號及掃描信號激發局域驅動電路1012,其會激發陽極1004使光線從其對應的像素中發出。 Referring to FIG. 8B, an active matrix OLED (AMOLED) includes a driver circuit 1012 arranged between a substrate 1002 and an OLED pixel array. The individual pixels of the AMOLEDs are defined between a common cathode 1006 and an anode 1004 that is electrically independent of the other anodes. Each localized driver circuit 1012 is coupled to an anode 1004 of the OLED pixel and further coupled to the data line 1016 and the scan line 1018. In some embodiments, scan line 1018 supplies a scan signal that selects a series of drive circuits, while data line 1016 supplies a data signal to a particular drive circuit. The data signal and the scan signal excite the local drive circuit 1012, which excites the anode 1004 to emit light from its corresponding pixel.
在所示的AMOLED中,將局域驅動電路1012、資料線1016、以及掃描線1018埋在平坦化層1014裡,其介於像素陣列及基板1002二者間。平坦化層1014提供一個平坦的上表面,在其上形成有機發光像素陣列。平坦化層1014可以由有機及無機材料形成,並且雖然顯示為單層,其可以兩層或更多層形成。局域驅動電路1012通常用薄膜電晶體(TFT)形成並且以格子狀或是陣列在OLED像素陣列下排列。局域驅動電路1012可以至少部分由有機材料做成,包括有機TFT。AMOLEDs具有反應時間快的優勢,改進了它們在資料信號顯示時的可取性。此外,AMOLEDs具有比被動矩陣OLEDs耗電較少的優點。 In the illustrated AMOLED, the local driver circuit 1012, the data line 1016, and the scan line 1018 are buried in the planarization layer 1014 between the pixel array and the substrate 1002. The planarization layer 1014 provides a flat upper surface on which an array of organic light emitting pixels is formed. The planarization layer 1014 may be formed of organic and inorganic materials, and although shown as a single layer, it may be formed of two or more layers. The local drive circuit 1012 is typically formed of thin film transistors (TFTs) and arranged in a grid or array under the OLED pixel array. The localized drive circuit 1012 can be at least partially made of an organic material, including an organic TFT. AMOLEDs have the advantage of fast response time and improve their desirability in the display of data signals. In addition, AMOLEDs have the advantage of less power consumption than passive matrix OLEDs.
參考PMOLED及AMOLED設計的共同特徵,基板1002提供OLED像素及電路的架構性支撐。在各種實施例中,基板1002包括硬式或是彈性材料以及不透明或透明材料,例如塑膠、玻璃以及/或是金屬箔。如在上面提到的,每個OLED像素或是二極體都具有陽極1004、陰極1006、以及形成於陰陽極的有機層1010。當將合適的電流施加於陽極1004時,陰極1006注入電子而陽極1004注入電洞。在特定實施例中,會將陽極1004及陰極1006倒置,也就是陰極在基板1002上形成,陽極則被相反地排列。 Referring to the common features of PMOLED and AMOLED designs, substrate 1002 provides architectural support for OLED pixels and circuitry. In various embodiments, substrate 1002 comprises a hard or resilient material and an opaque or transparent material such as plastic, glass, and/or metal foil. As mentioned above, each OLED pixel or diode has an anode 1004, a cathode 1006, and an organic layer 1010 formed on the anode and cathode. When a suitable current is applied to the anode 1004, the cathode 1006 injects electrons and the anode 1004 injects into the holes. In a particular embodiment, anode 1004 and cathode 1006 are inverted, that is, the cathode is formed on substrate 1002 and the anodes are arranged oppositely.
在陰極1006及陽極1004二者之間插入一或更多有機層。更明確地,至少一發射或是發光層介於陰極1006以及陽極1004之間。發光層可包括一或更多有機發光化合物。通常,發光層會配置以發出單色可見光,例如藍色、綠色、紅色,或是白 色。在圖式說明的實施例中,一個有機層1010在陰極1006及陽極1004之間形成並且作為發光層。在陽極1004及陰極1006之間形成的額外層可以包括電洞傳輸層、電洞注入層、電子傳輸層、以及電子注入層。 One or more organic layers are interposed between the cathode 1006 and the anode 1004. More specifically, at least one of the emissive or luminescent layers is interposed between the cathode 1006 and the anode 1004. The luminescent layer can include one or more organic luminescent compounds. Typically, the luminescent layer will be configured to emit monochromatic visible light, such as blue, green, red, or white. color. In the illustrated embodiment, an organic layer 1010 is formed between the cathode 1006 and the anode 1004 and acts as a light-emitting layer. The additional layer formed between the anode 1004 and the cathode 1006 may include a hole transport layer, a hole injection layer, an electron transport layer, and an electron injection layer.
電洞傳輸以及/或是注入層可以介於發光層1010以及陽極1004之間。電子傳輸以及/或是注入層可以介於陰極1006及發光層1010之間。電子注入層透過降低從陰極1006注入電子所需的功函數以促進電子從陰極1006注入到發光層1010。類似地,電洞注入層可促進電洞從陽極1004朝發光層1010注入。電洞及電子傳輸層促進載子從各別電極朝向發光層的運動。 The hole transport and/or the implant layer may be interposed between the light emitting layer 1010 and the anode 1004. The electron transport and/or injection layer can be interposed between the cathode 1006 and the luminescent layer 1010. The electron injection layer facilitates electron injection from the cathode 1006 to the light emitting layer 1010 by reducing the work function required to inject electrons from the cathode 1006. Similarly, the hole injection layer facilitates injection of holes from the anode 1004 toward the luminescent layer 1010. The holes and the electron transport layer promote the movement of the carriers from the respective electrodes toward the luminescent layer.
在一些實施例中,單層可同時具有電子注入以及傳輸功能或是同時具有電洞注入以及傳輸功能。一些實施例中,不具有這些層中的一或多層。在一些實施例中,一或多個有機層會摻雜一或多種材料,其可幫助載子的注入以及/或是傳輸。在陰極及陽極之間只形成一層有機層的實施例中,有機層可以不只包括有機光化合物,而且包括某些功能性材料,其可幫助載子在該層的注入或是傳輸。 In some embodiments, a single layer can have both electron injection and transfer functions or both hole injection and transfer functions. In some embodiments, there is no one or more of these layers. In some embodiments, one or more organic layers may be doped with one or more materials that aid in the injection and/or transport of the carriers. In embodiments where only one organic layer is formed between the cathode and the anode, the organic layer may include not only organic photocompounds, but also certain functional materials that aid in the implantation or transport of carriers at the layer.
已經發展用於包括發光層的此等層中的許多有機材料。用於這些層中的許多其他有機材料也已發展。在一些實施例中,這些有機材料可以包括寡聚物及高分子的大分子。在一些實施例中,用於這些層的有機材料可以是相對小的分子。熟習該項技術者由這些個別層的要求功能的觀點以及特殊設計之 鄰接層材料的觀點中,可以選擇用於每一層的適當材料。 Many organic materials have been developed for use in such layers including luminescent layers. Many other organic materials used in these layers have also been developed. In some embodiments, these organic materials may include macromolecules of oligomers and polymers. In some embodiments, the organic materials used for these layers can be relatively small molecules. Those who are familiar with the technology from the perspective of the required functions of these individual layers and special designs From the standpoint of adjacent layer materials, suitable materials for each layer can be selected.
在操作中,電路在陰極1006及陽極1004之間提供適當位能。這使電流從陽極1004穿過介於二者間的有機層流到陰極1006。在一個實施例中,陰極1006提供電子到相鄰有機層1010。陽極1004將電洞注入到有機層1010。電洞及電子在有機層1010裡重新結合並且產生稱為「激子」的具能量粒子。激子將其能量轉移到有機層1010中的有機發光材料,而該能量會用以從有機發光材料發出可見光。OLED 1000、1001產生並且發出的光譜特性取決於有機層裡有機分子的本質及組成。熟習該項技術者可以選擇一或更多有機層的組成以適合特定的應用需求。 In operation, the circuit provides appropriate potential between cathode 1006 and anode 1004. This causes current to flow from the anode 1004 through the organic layer therebetween to the cathode 1006. In one embodiment, cathode 1006 provides electrons to adjacent organic layer 1010. The anode 1004 injects a hole into the organic layer 1010. The holes and electrons recombine in the organic layer 1010 and produce energetic particles called "excitons". The excitons transfer their energy to the organic luminescent material in the organic layer 1010, which is used to emit visible light from the organic luminescent material. The spectral properties produced and emitted by OLEDs 1000, 1001 depend on the nature and composition of the organic molecules in the organic layer. Those skilled in the art can select one or more organic layer compositions to suit a particular application.
OLED裝置也可以基於光的發射方向分類。在一種稱為「上發光」型的類型中,OLED裝置通過陰極或是頂部電極1006發射光並且顯示影像。在這些實施例中,陰極1006是由對可見光透明的材料或至少部分透明的材料製成。某些實施例中,為了避免任何可通過陽極或是底部電極1004的光損失,陽極可以由實質上可反射可見光的材料製成。第二型OLED裝置通過陽極或是底部電極1004發射光線並且稱為「下發光」型。在下發光型OLED裝置裡,陽極1004由對可見光至少部分透明的材料製成。在下發光型OLED裝置中,陰極1006常由實質上可反射可見光的材料製成。第三型OLED裝置在兩個方向發光,也就是同時通過陽極1004以及陰極1006發光。取決於光的發射方向,基板可以由對可見光透明、不透明或是反射的材料 製成。 OLED devices can also be classified based on the direction of emission of light. In a type referred to as "uplighting" type, the OLED device emits light through the cathode or top electrode 1006 and displays an image. In these embodiments, the cathode 1006 is made of a material that is transparent to visible light or that is at least partially transparent. In some embodiments, to avoid any loss of light that can pass through the anode or bottom electrode 1004, the anode can be made of a material that substantially reflects visible light. The second type OLED device emits light through the anode or bottom electrode 1004 and is referred to as a "lower illuminating" type. In a lower emission type OLED device, the anode 1004 is made of a material that is at least partially transparent to visible light. In a lower emission type OLED device, the cathode 1006 is often made of a material that substantially reflects visible light. The third type OLED device emits light in two directions, that is, simultaneously through the anode 1004 and the cathode 1006. The substrate may be made of a material that is transparent, opaque or reflective to visible light depending on the direction in which the light is emitted. production.
在很多實施例中,OLED像素陣列1021包括複數個有機發光像素,如圖8C顯示的方式排列在基板1002上。在一些實施例中,陣列1021裡的像素由驅動電路(不顯示)控制開及關,並且以複數個像素整體在陣列1021上顯示資訊或是影像。在某些實施例中,OLED像素陣列1021的排列係關於其他構件(例如驅動及控制電子元件),以界定顯示區域及非顯示區域。在這些實施例中,顯示區域指的是基板1002中形成OLED像素陣列1021的區域。非顯示器區域指的是基板1002的剩餘區域。在一些實施例中,非顯示區域可以包含邏輯以及/或是電源供應電路。可理解至少一部分的控制/驅動電路元件排列在顯示區域內。例如,在PMOLEDs裡,導電構件將延伸進入顯示區域以提供合適的電位給陽極以及陰極。在AMOLEDs裡,局域驅動電路以及耦合於驅動電路的資料/掃描連接線將延伸進入顯示區域,以驅動並且控制AMOLEDs的個別像素。 In many embodiments, OLED pixel array 1021 includes a plurality of organic luminescent pixels arranged on substrate 1002 in the manner shown in Figure 8C. In some embodiments, the pixels in array 1021 are controlled to be turned on and off by a driver circuit (not shown), and information or images are displayed on array 1021 as a whole in a plurality of pixels. In some embodiments, the OLED pixel array 1021 is arranged with respect to other components (eg, drive and control electronics) to define a display area and a non-display area. In these embodiments, the display area refers to the area in the substrate 1002 where the OLED pixel array 1021 is formed. The non-display area refers to the remaining area of the substrate 1002. In some embodiments, the non-display area can include logic and/or power supply circuitry. It will be appreciated that at least a portion of the control/drive circuit components are arranged within the display area. For example, in PMOLEDs, conductive members will extend into the display area to provide a suitable potential to the anode and cathode. In AMOLEDs, local drive circuitry and data/scan connections coupled to the drive circuitry will extend into the display area to drive and control individual pixels of the AMOLEDs.
OLED裝置的一種設計及製造方面的考量是要使OLED裝置特定有機材料層能承受曝露於水、氧或其他有害氣體的損害或是加速惡化。因此,通常可理解會密封或是囊封OLED裝置以抑制製造或是操作環境中對水分及氧或是其他有害氣體的曝露。圖8D所示係說明囊封OLED裝置1011沿著圖8C的D-D線的截面。在這個實施例中,通常平坦的頂部平板或是基板1061與封條1071接合,封條進一步與底部平板或是基板1002接合,以包覆或是囊封OLED像素陣列1021。在其他實施例中,在頂 部平板1061或是底部平板1002上形成一或更多層,而封條1071通過該層耦合於底部或是頂部基板1002、1061。在所示的實施例中,封條1071沿著OLED像素陣列1021或是底部或頂部平板1002、1061的周圍延伸。 One consideration in the design and manufacture of OLED devices is to enable the OLED device specific organic material layer to withstand damage or accelerate deterioration of exposure to water, oxygen or other harmful gases. Thus, it is generally understood that the OLED device will be sealed or encapsulated to inhibit exposure to moisture and oxygen or other harmful gases in the manufacturing or operating environment. Figure 8D illustrates a cross section of the encapsulated OLED device 1011 along the line D-D of Figure 8C. In this embodiment, a generally flat top plate or substrate 1061 is bonded to the seal 1071, and the seal is further joined to the bottom plate or substrate 1002 to encapsulate or encapsulate the OLED pixel array 1021. In other embodiments, at the top One or more layers are formed on the flat plate 1061 or the bottom plate 1002, and the seal 1071 is coupled to the bottom or top substrate 1002, 1061 through the layer. In the illustrated embodiment, the seal 1071 extends along the perimeter of the OLED pixel array 1021 or the bottom or top panels 1002, 1061.
在一些實施例中,封條1071如將在下面更進一步討論的由一種熔接材料製成。在各種實施例中,頂部及底部平板1061、1002包括例如塑膠、玻璃以及/或是金屬箔的材料,其可以提供氧以及/或是水的通路障壁因此保護OLED像素陣列1021不曝露於這些物質。在一些實施例中,頂部平板1061及底部平板1002的至少一者由實質上透明的材料形成。 In some embodiments, the seal 1071 is made of a weld material as will be discussed further below. In various embodiments, the top and bottom panels 1061, 1002 comprise a material such as plastic, glass, and/or metal foil that can provide oxygen and/or water barriers to the barrier thereby protecting the OLED pixel array 1021 from exposure to such materials. . In some embodiments, at least one of the top panel 1061 and the bottom panel 1002 is formed from a substantially transparent material.
為了增加OLED裝置1011的壽命,通常要求封條1071以及頂部及底部平板1061、1002提供對氧及水蒸汽的實質上不可滲透的密封,並提供實質上密封包覆的空間1081。在特定應用中,顯示了熔接材料封條1071結合頂部及底部平板1061、1002提供了使氧少於約10-3cc/m2-day的氧障壁以及使水少於約10-6g/m2-day的水障壁。因為一些氧以及水分可滲透進包覆空間1081,因此在一些實施例中會於包覆空間1081內形成吸收氧以及/或是水分的材料。 To increase the lifetime of the OLED device 1011, the seal 1071 and the top and bottom plates 1061, 1002 are typically required to provide a substantially impermeable seal to oxygen and water vapor and provide a substantially sealed envelope space 1081. In a particular application, it is shown that the weld material seal 1071 in combination with the top and bottom plates 1061, 1002 provides an oxygen barrier having an oxygen of less than about 10 -3 cc/m 2 -day and a water content of less than about 10 -6 g/m. 2 -day water barrier. Because some of the oxygen and moisture can penetrate into the cladding space 1081, in some embodiments a material that absorbs oxygen and/or moisture can be formed within the cladding space 1081.
封條1071具有一寬度W,為它在平行於頂部或底部基板1061、1002表面方向的厚度,如圖8D所示。寬度隨實施例不同而有變化,其範圍從大約300微米到大約3000微米,或者從大約500微米到大約1500微米。而且,封條1071上不同位置的寬度可以變化。在一些實施例中,封條1071的寬度在封條 1071與底部以及頂部基板1002、1061中的一者接觸的地方或封條1071與在基板上形成之層接觸的地方最大。在封條1071與其他者接觸時封條寬度可為最小。封條1071之單一截面的寬度變化與封條1071的截面形狀及其他設計參數有關。 The seal 1071 has a width W which is the thickness in the direction parallel to the surface of the top or bottom substrate 1061, 1002, as shown in Fig. 8D. The width varies from embodiment to embodiment and ranges from about 300 microns to about 3000 microns, or from about 500 microns to about 1500 microns. Moreover, the width of the different positions on the seal 1071 can vary. In some embodiments, the width of the seal 1071 is in the seal The place where the 1071 is in contact with one of the bottom and the top substrates 1002, 1061 or the seal 1071 is the largest in contact with the layer formed on the substrate. The seal width can be minimized when the seal 1071 is in contact with others. The change in width of the single section of the seal 1071 is related to the cross-sectional shape of the seal 1071 and other design parameters.
封條1071具有高度H,為它在垂直於頂部或是底部基板1061、1002表面方向的厚度,如圖8D所示。高度隨實施例不同而有變化,其範圍從大約2微米到大約30微米,或者從大約10微米到大約15微米。通常,在封條1071不同位置的高度不明顯變化。不過,在某些實施例中,封條1071的高度可以在不同的位置變化。 The seal 1071 has a height H which is the thickness in the direction perpendicular to the top or bottom substrate 1061, 1002, as shown in Fig. 8D. The height varies from embodiment to embodiment and ranges from about 2 microns to about 30 microns, or from about 10 microns to about 15 microns. Generally, the height at different positions of the seal 1071 does not change significantly. However, in some embodiments, the height of the seal 1071 can vary at different locations.
在所示的實施例中,封條1071具有大致為矩形的截面。不過,在其他實施例中封條1071可以具有其他各種截面形狀,例如大致方形的截面、大致梯形的截面、其一或是多邊緣為圓形的截面或是其他配合特定應用需求的指示的形狀。為了改進密封性,通常要增加封條1071直接與底部或是頂部基板1002、1061或與其上的形成層接觸的界面面積。在一些實施例中,可以設計封條的形狀使得界面面積增加。 In the illustrated embodiment, the seal 1071 has a generally rectangular cross section. However, in other embodiments the seal 1071 can have various other cross-sectional shapes, such as a generally square cross-section, a generally trapezoidal cross-section, one or more cross-sections that are circular in shape, or other shapes that are indicative of a particular application need. In order to improve the sealing, it is common to increase the interface area of the seal 1071 directly with the bottom or top substrate 1002, 1061 or the layer formed thereon. In some embodiments, the shape of the seal can be designed such that the interface area is increased.
封條1071可以緊鄰OLED陣列1021配置,而在其他實施例中封條1071與OLED陣列1021隔開一段距離。在特定實施例中,封條1071普遍包含線性片段,其連結在一起以圍繞OLED陣列1021。在某些實施例中,這種封條1071的線性片段可以延伸,通常平行於OLED陣列1021的各邊界。在其他實施例中,會以非平行於OLED陣列1021各邊界的關係來配置封條1071的一 或更多線性片段。而在其他實施例中,至少封條1071的一部分在頂部平板1061及底部平板1002之間以曲線模式延伸。 The seal 1071 can be disposed in close proximity to the OLED array 1021, while in other embodiments the seal 1071 is spaced a distance from the OLED array 1021. In a particular embodiment, the seal 1071 generally comprises linear segments that are joined together to surround the OLED array 1021. In some embodiments, a linear segment of such seal 1071 can extend, generally parallel to the boundaries of OLED array 1021. In other embodiments, one of the seals 1071 will be disposed in a relationship that is non-parallel to the boundaries of the OLED array 1021. Or more linear segments. In other embodiments, at least a portion of the seal 1071 extends in a curved pattern between the top panel 1061 and the bottom panel 1002.
如在上面提到的,在某些實施例中封條1071使用一種熔接材料或是僅僅「熔接物」或是「玻璃熔接物」形成,其包括微細玻璃顆粒。熔接顆粒包括下列一或多者:氧化鎂(MgO)、氧化鈣(CaO)、氧化鋇(BaO)、氧化鋰(Li2O)、氧化鈉(Na2O)、氧化鉀(K2O)、氧化硼(B2O3)、氧化釩(V2O5)、氧化鋅(ZnO)、氧化碲(TeO2)、氧化鋁(Al2O3)、二氧化矽(SiO2)、氧化鉛(PbO)、氧化錫(SnO)、氧化磷(P2O5)、氧化釕(Ru2O)、氧化銣(Rb2O)、氧化銠(Rh2O)、氧化鐵(Fe2O3)、氧化銅(CuO)、氧化鈦(TIO2)、氧化鎢(WO3)、氧化鉍(Bi2O3)、氧化銻(Sb2O3)、硼酸鉛玻璃、磷酸錫玻璃、釩酸鹽玻璃以及硼矽酸鹽等等組成。在一些實施例中,顆粒大小從大約2微米到大約30微米的範圍,或者從大約5微米到大約10微米,但不限於此。顆粒大小可以如頂部及底部基板1061、1002之間的距離或是任何在這些基板上形成而與熔接封條接觸的層之間的距離。 As mentioned above, in some embodiments the seal 1071 is formed using a weld material or only "fusible" or "glass weld" which includes fine glass particles. The fused particles include one or more of the following: magnesium oxide (MgO), calcium oxide (CaO), barium oxide (BaO), lithium oxide (Li 2 O), sodium oxide (Na 2 O), potassium oxide (K 2 O). Boron oxide (B 2 O 3 ), vanadium oxide (V 2 O 5 ), zinc oxide (ZnO), cerium oxide (TeO 2 ), aluminum oxide (Al 2 O 3 ), cerium oxide (SiO 2 ), oxidation Lead (PbO), tin oxide (SnO), phosphorus oxide (P 2 O 5 ), ruthenium oxide (Ru 2 O), ruthenium oxide (Rb 2 O), ruthenium oxide (Rh 2 O), iron oxide (Fe 2 O 3 ), copper oxide (CuO), titanium oxide (TIO 2 ), tungsten oxide (WO 3 ), bismuth oxide (Bi 2 O 3 ), bismuth oxide (Sb 2 O 3 ), lead borate glass, tin phosphate glass, vanadium It is composed of acid salt glass and borosilicate. In some embodiments, the particle size ranges from about 2 microns to about 30 microns, or from about 5 microns to about 10 microns, but is not limited thereto. The particle size can be such as the distance between the top and bottom substrates 1061, 1002 or the distance between any of the layers formed on the substrates that are in contact with the frit seal.
用來形成封條1071的熔接材料也可以包括一或是更多填料或是附加材料。可以提供填料或是附加材料以調整封條1071的整體熱膨脹特性以及/或是調整封條1071對入射輻射能量之選定頻率的吸收特性。填料或是附加材料也可以包括交換以及/或是附加填料以調整熔接物的熱膨脹係數。例如填料或是附加材料可以包括過渡金屬例如鉻(Cr)、鐵(Fe)、錳(Mn) 、鈷(Co)、銅(Cu)以及/或是釩。填料或是附加物的額外材料包括ZnSiO4、PbTiO3、ZrO2、鋰霞石。 The weld material used to form the seal 1071 may also include one or more fillers or additional materials. Fillers or additional materials may be provided to adjust the overall thermal expansion characteristics of the seal 1071 and/or to adjust the absorption characteristics of the seal 1071 to a selected frequency of incident radiant energy. The filler or additional material may also include an exchange and/or additional filler to adjust the coefficient of thermal expansion of the weld. For example, the filler or additional material may include transition metals such as chromium (Cr), iron (Fe), manganese (Mn), cobalt (Co), copper (Cu), and/or vanadium. Additional materials for the filler or addenda include ZnSiO 4 , PbTiO 3 , ZrO 2 , and cryptite.
在一些實施例中,乾燥組成的熔接材料包含從大約20到90重量百分比(wt%)的玻璃顆粒,並且剩下的包含填料以及/或是附加物。在一些實施例中,熔接糊狀物包含大約10-30 wt%的有機材料以及大約70-90 wt%的無機材料。在一些實施例中,熔接糊狀物包含大約20 wt%的有機材料以及大約80 wt%的無機材料。在一些實施例中,有機材料可以包括大約0-30 wt%的黏合劑以及大約70-100 wt%的溶劑。在一些實施例中,有機材料有大約10 wt%的黏合劑以及大約90 wt%的溶劑。在一些實施例中,無機材料可以包括大約0-10 wt%的附加物,大約20-40 wt%的填料以及大約50-80 wt%的玻璃粉末。在一些實施例中,無機材料有大約0-5 wt%是附加物,大約25-30 wt%是填料以及大約65-75 wt%是玻璃粉末。 In some embodiments, the dry composition of the weld material comprises from about 20 to 90 weight percent (wt%) glass particles, and the remainder comprises filler and/or addenda. In some embodiments, the fusion paste comprises about 10-30 wt% organic material and about 70-90 wt% inorganic material. In some embodiments, the fusion paste comprises about 20 wt% organic material and about 80 wt% inorganic material. In some embodiments, the organic material can include from about 0 to 30 wt% binder and from about 70 to 100 wt% solvent. In some embodiments, the organic material has about 10 wt% binder and about 90 wt% solvent. In some embodiments, the inorganic material can include from about 0 to 10 wt% of the addenda, from about 20 to 40 wt% of the filler, and from about 50 to 80 wt% of the glass powder. In some embodiments, the inorganic material has from about 0 to about 5% by weight of the addenda, from about 25 to about 30 percent by weight of the filler, and from about 65 to about 75 percent by weight of the glass powder.
在形成熔接封條時,將液體材料添加在乾燥熔接材料中以形成熔接糊狀物。任何含有或是不含有附加物的有機或是無機溶劑可以用作為液體材料。在一些實施例中,溶劑包括一或更多的有機化合物。例如可應用的有機化合物為乙基纖維素、硝化纖維素、氫氧基丙基纖維素、丁卡必醇乙酸鹽、烯醇、丁基甘醇、丙烯酸酯化合物。然後可以應用如此形成的熔接糊狀物以將頂部以及/或是底部平板1061、1002上的封條1071成形。 In forming the fusion seal, a liquid material is added to the dry fusion material to form a fusion paste. Any organic or inorganic solvent with or without additives may be used as the liquid material. In some embodiments, the solvent comprises one or more organic compounds. For example, applicable organic compounds are ethyl cellulose, nitrocellulose, hydroxypropyl cellulose, tetracarbitol acetate, enol, butyl glycol, acrylate compounds. The fusion paste thus formed can then be applied to shape the seal 1071 on the top and/or bottom panels 1061, 1002.
在一個示範實施例中,封條1071的形狀最初以熔接糊狀物形 成並且插入於頂部平板1061及底部平板1002兩者之間。在特定實施例中,封條1071可以預硬化以及預燒結到頂部平板及底部平板1061、1002兩者之一上。在頂部平板1061及底部平板1002以兩者之間的封條1071組合以後,封條1071的幾個部份選擇性地加熱以使得形成封條1071的熔接材料至少部分熔化。封條1071接著可重新固化以形成頂部平板1061以及底部平板1002之間的穩固接點,因此防止包覆的OLED像素陣列1021曝露到氧氣或是水中。 In an exemplary embodiment, the shape of the seal 1071 is initially in the form of a fused paste And inserted between the top plate 1061 and the bottom plate 1002. In a particular embodiment, the seal 1071 can be pre-cured and pre-sintered onto one of the top and bottom panels 1061, 1002. After the top plate 1061 and the bottom plate 1002 are combined with the seal 1071 therebetween, portions of the seal 1071 are selectively heated such that the weld material forming the seal 1071 is at least partially melted. The seal 1071 can then be re-solidified to form a stable joint between the top plate 1061 and the bottom plate 1002, thus preventing the coated OLED pixel array 1021 from being exposed to oxygen or water.
在一些實施例中,熔接封條的選擇性加熱以光(例如雷射或是導向的紅外光燈)照射來實行。如之前提到的,形成封條1071的熔接材料可以結合一或更多附加物或是填料,例如選擇用來改進照射光吸收的物種以促進熔接材料的加熱及熔化而形成封條1071。 In some embodiments, selective heating of the fusion seal is performed with illumination of light, such as a laser or a directed infrared light. As previously mentioned, the weld material forming the seal 1071 can incorporate one or more addenda or fillers, such as a species selected to improve absorption of the illumination light to promote heating and melting of the weld material to form the seal 1071.
在一些實施例中,OLED裝置1011是大量生產的。圖8E所示的實施例中,複數個分開的OLED陣列1021係在共同底部基板1101上形成。在所示的實施例中,每一個OLED陣列1021係以熔接物成形的封條1071包圍。在一些實施例中,將共同頂部基板(不顯示)放置在共同底部基板1101與其上形成的結構之上,使得OLED陣列1021以及成形的熔接糊狀物介於共同底部基板1101及共同頂部基板之間。OLED陣列1021係囊封並且密封的,例如透過先前描述的單一OLED顯示裝置的封裝過程。最終產品包括透過共同底部以及頂部基板而保持在一起的複數個OLED裝置。然後將最終產品切成複數片,每一片組成圖 8D的OLED裝置1011。在某些實施例中,個別OLED裝置1011更進一步接受額外的封裝操作以進一步改進由熔接封條1071以及頂部及底部基板1061、1002所形成的密封。 In some embodiments, OLED device 1011 is mass produced. In the embodiment shown in FIG. 8E, a plurality of separate OLED arrays 1021 are formed on a common bottom substrate 1101. In the illustrated embodiment, each OLED array 1021 is surrounded by a seal 1071 formed by a weld. In some embodiments, a common top substrate (not shown) is placed over the common bottom substrate 1101 and the structure formed thereon such that the OLED array 1021 and the shaped fusion paste are interposed between the common bottom substrate 1101 and the common top substrate. between. The OLED array 1021 is encapsulated and sealed, such as through a packaging process of a single OLED display device as previously described. The final product includes a plurality of OLED devices held together by a common bottom and a top substrate. Then cut the final product into multiple pieces, each piece of composition 8D OLED device 1011. In some embodiments, the individual OLED devices 1011 are further subjected to additional packaging operations to further improve the seal formed by the fusion seal 1071 and the top and bottom substrates 1061, 1002.
圖1所示係一種有機發光二極體的密封結構截面圖。參考圖1,該有機發光顯示裝置包含:沉積基板1、囊封基板2、囊封構件3、與水分吸收劑4。沉積基板1係包含像素區與非像素區的基板,該項素區包含至少一個有機發光二極體,而該非像素區則環繞該像素區。囊封基板2係相對黏著於沉積基板的形成有機發光二極體之面。 1 is a cross-sectional view showing a sealing structure of an organic light emitting diode. Referring to FIG. 1, the organic light-emitting display device includes a deposition substrate 1, an encapsulation substrate 2, an encapsulation member 3, and a moisture absorbent 4. The deposition substrate 1 is a substrate including a pixel region and a non-pixel region, the prime region includes at least one organic light emitting diode, and the non-pixel region surrounds the pixel region. The encapsulating substrate 2 is relatively adhered to the surface of the deposition substrate on which the organic light emitting diode is formed.
囊封構件3係沿沉積基板1與囊封基板2的邊緣形成,以將沉積基板1黏著至囊封基板2。該囊封構件3係由紫外光照射法等之方法而固化。雖然已施加囊封構件3,但由於氫氣、氧氣、與水分等等,仍可能經由細微裂縫滲入,該水分吸收劑4係包含於囊封基板2之中以將其移除。 The encapsulation member 3 is formed along the edges of the deposition substrate 1 and the encapsulation substrate 2 to adhere the deposition substrate 1 to the encapsulation substrate 2. The encapsulating member 3 is cured by a method such as ultraviolet irradiation. Although the encapsulating member 3 has been applied, it is still possible to infiltrate through fine cracks due to hydrogen gas, oxygen gas, moisture, and the like, and the moisture absorbent 4 is contained in the encapsulating substrate 2 to be removed.
然而,囊封構件3無法完全防止環境空氣的滲入。此外,水分吸收劑4係藉會造成排氣的退火過程而塗佈於囊封基板上。因此,退火過程可能減少囊封構件3與基板間的黏著,而使得有機發光二極體容易暴露於環境空氣。 However, the encapsulating member 3 cannot completely prevent the infiltration of ambient air. Further, the moisture absorbent 4 is applied to the encapsulating substrate by an annealing process which causes the exhaust gas. Therefore, the annealing process may reduce the adhesion between the encapsulating member 3 and the substrate, so that the organic light emitting diode is easily exposed to the ambient air.
一實施例中,係經由將熔接物施加於不包含水分吸收劑的玻璃基板而將有機發光二極體囊封。據此,由於基板與囊封基板間的空間係由將熔化的熔接物固化而完全密封,便不需要水分吸收劑,且有機發光二極體可更有效率地被保護。 In one embodiment, the organic light-emitting diode is encapsulated by applying a weld to a glass substrate that does not include a moisture absorbent. According to this, since the space between the substrate and the encapsulating substrate is completely sealed by solidifying the melted fusion material, the moisture absorbent is not required, and the organic light emitting diode can be more effectively protected.
然而,由於熔接材料很脆弱,當施加外來衝擊力時,壓力集中現象會發生於熔接物與基板的黏著表面上,因而造成裂縫會自黏著表面產生並擴張進入整個基板。 However, since the welding material is very weak, when an external impact force is applied, pressure concentration occurs on the bonding surface of the fusion material and the substrate, so that cracks are generated from the bonding surface and expanded into the entire substrate.
圖2係根據一實施例的有機發光顯示裝置的平面圖。圖3係沿圖2所示的有機發光顯示裝置的線A-A’所得之截面圖。有機發光顯示裝置包含:基板100、囊封基板200、熔接物150、與強化構件160。本說明書的內容中,基板100指的是包含有機發光元件的基板。基板100可為單一層或是多層的。沉積基板101指的是基底基板,其上形成有機發光元件。 2 is a plan view of an organic light emitting display device according to an embodiment. Fig. 3 is a cross-sectional view taken along line A-A' of the organic light-emitting display device shown in Fig. 2. The organic light-emitting display device includes a substrate 100, an encapsulation substrate 200, a fusion material 150, and a reinforcing member 160. In the context of the present specification, the substrate 100 refers to a substrate including an organic light emitting element. The substrate 100 can be a single layer or a plurality of layers. The deposition substrate 101 refers to a base substrate on which an organic light emitting element is formed.
基板100包含像素區100a與環繞該像素區100a的非像素區100b,而該基板100為包含有機發光元件的平板。該像素區100a包含至少一個有機發光元件,其具有第一電極119、有機層121、與第二電極122。於下文中的解釋,像素區100a指的是會於其中藉由有機發光元件發出的光顯示預定影像的區域,而非像素區100b指的是基板100之上像素區100a之外的所有區域。 The substrate 100 includes a pixel region 100a and a non-pixel region 100b surrounding the pixel region 100a, and the substrate 100 is a flat plate including an organic light emitting element. The pixel region 100a includes at least one organic light emitting element having a first electrode 119, an organic layer 121, and a second electrode 122. As explained hereinafter, the pixel region 100a refers to a region in which a predetermined image is displayed by light emitted from the organic light-emitting element, and the non-pixel region 100b refers to all regions except the pixel region 100a above the substrate 100.
像素區100a包含排列於列方向中的複數個掃描線(S1到Sm)與排列於行方向中的複數個資料線(D1到Dm)。複數個像素會形成於掃描線(S1到Sm)與資料線(D1與Dm)間的相交處,其可自用以驅動有機發光元件的驅動積體電路接收訊號。 The pixel region 100a includes a plurality of scanning lines (S1 to Sm) arranged in the column direction and a plurality of data lines (D1 to Dm) arranged in the row direction. A plurality of pixels are formed at intersections between the scan lines (S1 to Sm) and the data lines (D1 and Dm), which can receive signals from the driving integrated circuit for driving the organic light emitting elements.
同時也於非像素區100b中形成用以驅動有機發光元件的驅動IC與分別電連接至掃描線(S1到Sm)與資料線(D1與Dm)的金 屬接線。圖示實施例中,驅動IC包含資料驅動器170與掃描驅動器180、180’。 At the same time, a driving IC for driving the organic light emitting element and gold respectively electrically connected to the scan lines (S1 to Sm) and the data lines (D1 and Dm) are also formed in the non-pixel region 100b. It is a wiring. In the illustrated embodiment, the driver IC includes a data driver 170 and scan drivers 180, 180'.
圖示有機發光元件係以主動矩陣型驅動。其結構將以圖示解釋。 The illustrated organic light emitting elements are driven in an active matrix type. Its structure will be explained graphically.
緩衝層111會形成於基底基板101上。該緩衝層係由如氧化矽SiO2或氮化矽SiNx等的絕緣材料所做成。該緩衝層111係形成以保護基板100,使其不受如外來熱之因素造成的傷害。 The buffer layer 111 is formed on the base substrate 101. The buffer layer is made of an insulating material such as yttria SiO 2 or tantalum nitride SiN x . The buffer layer 111 is formed to protect the substrate 100 from damage caused by factors such as external heat.
緩衝層111的至少任一區上,半導體層112包含主動層112a與歐姆接觸層112b。閘極絕緣層113形成於半導體層112與緩衝層111上,於閘極絕緣層113一區域上形成有閘極電極114,其大小係對應主動層112a的寬度。 On at least any of the regions of the buffer layer 111, the semiconductor layer 112 includes an active layer 112a and an ohmic contact layer 112b. The gate insulating layer 113 is formed on the semiconductor layer 112 and the buffer layer 111. On one region of the gate insulating layer 113, a gate electrode 114 is formed, the size of which corresponds to the width of the active layer 112a.
層間絕緣層115形成於具有閘極電極114的閘極絕緣層113之上,而源極與汲極電極116a、116b則形成於層間絕緣層115的預定區域上。 The interlayer insulating layer 115 is formed over the gate insulating layer 113 having the gate electrode 114, and the source and drain electrodes 116a, 116b are formed on a predetermined region of the interlayer insulating layer 115.
源極與汲極電極116a、116b形成以連接於歐姆接觸層112b,而平坦化層117係形成於包含源極與汲極電極116a、116b的層間絕緣層115上。 The source and drain electrodes 116a, 116b are formed to be connected to the ohmic contact layer 112b, and the planarization layer 117 is formed on the interlayer insulating layer 115 including the source and drain electrodes 116a, 116b.
第一電極119形成於平坦化層117的一區域上。第一電極119經由通孔118連接至源極與汲極電極116a、116b的任何一個裸露的區域。 The first electrode 119 is formed on a region of the planarization layer 117. The first electrode 119 is connected to any exposed region of the source and drain electrodes 116a, 116b via the via 118.
像素界定膜120形成於包含第一電極119的平坦化層117上, 該像素界定膜具有開口(未顯示於圖中)以使第一電極119的至少一區域裸露。 The pixel defining film 120 is formed on the planarization layer 117 including the first electrode 119. The pixel defining film has an opening (not shown) to expose at least one region of the first electrode 119.
有機層121形成於像素界定膜120的開口中。第二電極層122形成於像素界定膜120與有機層121之上。鈍化層可進一步形成於第二電極層122的上表面之上。 The organic layer 121 is formed in the opening of the pixel defining film 120. The second electrode layer 122 is formed over the pixel defining film 120 and the organic layer 121. A passivation layer may be further formed over the upper surface of the second electrode layer 122.
該實施例可應用於有機發光元件的主動矩陣型結構或被動矩陣型結構。熟習本技藝者將會了解此等結構係可被改變的。各結構皆已熟知,因此其細節解釋將被省略。 This embodiment can be applied to an active matrix type structure or a passive matrix type structure of an organic light emitting element. Those skilled in the art will appreciate that such structures can be altered. Each structure is well known, and thus its detailed explanation will be omitted.
囊封基板200為用以囊封基板的至少一個形成有有機發光元件的像素區100a的一種構件,其在於前發光或兩側發光的情況中可包含透明材料。或者,在被發光情況中,囊封基板可包含不透光材料。在前發光的情況中,用於囊封基板200的範例材料可為玻璃,但不限於此。 The encapsulating substrate 200 is a member for encapsulating at least one pixel region 100a of the substrate on which the organic light emitting element is formed, which may include a transparent material in the case of front light emission or light emission on both sides. Alternatively, in the case of being illuminated, the encapsulating substrate may comprise an opaque material. In the case of front illuminating, an exemplary material for encapsulating the substrate 200 may be glass, but is not limited thereto.
圖示實施例中的囊封基板是平板型,其至少密封了該形成有有機發光元件的像素區。舉例來說,圖示實施例中,所有資料驅動器與接腳墊部分以外的區域接被密封。 The encapsulating substrate in the illustrated embodiment is a flat type which seals at least the pixel region in which the organic light emitting element is formed. For example, in the illustrated embodiment, all of the data drivers are sealed from areas other than the pad portion.
熔接物150囊封該像素區100a致使環境空氣無法滲入,該熔接物係形成於囊封基板200與基板100的非像素區100b間的空間中。該熔接物可為包含添加物的玻璃原物料,其為粉末形式。其也可為藉由熔化該熔接物形成的玻璃。於本說明書內容中,「熔接物」可指上面任一者。 The solder 150 encapsulates the pixel region 100a such that ambient air cannot penetrate, and the solder is formed in a space between the encapsulation substrate 200 and the non-pixel region 100b of the substrate 100. The weld may be a glass stock comprising an additive in powder form. It can also be a glass formed by melting the weld. In the context of the present specification, "fusible" may mean any of the above.
熔接物150係形成以形成包覆線,其係藉由與囊封基板接合 於基板100側的邊緣間隔固定間距形成。 The fuse 150 is formed to form a covered wire by bonding to the encapsulated substrate The edges on the side of the substrate 100 are formed at a fixed pitch.
熔接物150係以熔接膠質狀態施加於囊封基板200,其包含玻璃材料、吸收雷射的吸收劑、與用以減少熱膨脹係數的填充劑。接著,熔接物150係藉由雷射或紅外線熔化且固化於囊封基板200與基板100間,以囊封該囊封基板200與基板100。 The weld 150 is applied to the encapsulating substrate 200 in a fused colloid state, which comprises a glass material, a laser absorbing absorbent, and a filler for reducing the coefficient of thermal expansion. Next, the fusion material 150 is melted by laser or infrared rays and solidified between the encapsulating substrate 200 and the substrate 100 to encapsulate the encapsulating substrate 200 and the substrate 100.
一實施例中,其中包含含有過渡金屬的吸收劑。此種材料的範例包含V2O5。 In one embodiment, an absorbent containing a transition metal is included therein. An example of such a material contains V 2 O 5 .
一實施例中,由熔接物形成的線寬度是從約0.5mm到約1.5mm。該熔接物150的厚度可從約10到約20μm。 In one embodiment, the line width formed by the weld is from about 0.5 mm to about 1.5 mm. The thickness of the weld 150 can range from about 10 to about 20 microns.
同時,該基板100直接接觸熔接物150之側的建構與材料並不限於上述實施例。一實施例中,非直接與驅動積體電路接觸的金屬接線的部分並不與金屬接線重疊。由於如前述,熔接物150係經雷射或紅外線照射,該金屬接線可於熔接物與金屬接線重疊時受到傷害。 Meanwhile, the construction and material of the side of the substrate 100 directly contacting the weld 150 are not limited to the above embodiment. In one embodiment, the portion of the metal wiring that is not in direct contact with the drive integrated circuit does not overlap the metal wiring. Since the weld 150 is irradiated by laser or infrared rays as described above, the metal wire can be damaged when the weld is overlapped with the metal wire.
於基板100、囊封基板200、與熔接物150皆為玻璃時,該強化構件160可防止有機發光顯示裝置被輕易破壞。在熔接物150不藉熔化黏著或當其黏著相當弱時,該強化構件160也可當作熔接物。該強化構件160可以預定間隙與熔接物150相隔。其他實施例中,強化構件可接觸該熔接物150。 When the substrate 100, the encapsulating substrate 200, and the fusing material 150 are both glass, the reinforcing member 160 can prevent the organic light emitting display device from being easily broken. The reinforcing member 160 can also serve as a weld when the weld 150 is not adhered by fusion or when it is relatively weakly adhered. The reinforcing member 160 may be spaced apart from the weld 150 by a predetermined gap. In other embodiments, the reinforcing member can contact the weld 150.
強化構件160中所使用的一種材料,係經自固化、熱固化、或UV固化的樹脂。舉例來說,可自固化樹脂包含丙烯酸氫。丙烯酸酯是一種以約80℃的溫度熱固化的材料。環氧樹脂、 丙烯酸酯樹脂、與聚胺酯樹脂可被UV固化。 One of the materials used in the reinforcing member 160 is a self-curing, heat-curing, or UV-curing resin. For example, the self-curable resin comprises hydrogen acrylate. Acrylate is a material that is thermally cured at a temperature of about 80 °C. Epoxy resin, The acrylate resin and the polyurethane resin can be UV cured.
同時,不同於圖3中的實施例,圖4和圖5所示係有機發光顯示裝置的圖,其中該強化構件係個別形成於有機發光顯示裝置的內側與外側,與熔接物間隔開來。由此等實施例,熟習本技藝人士可了解,該強化構件可形成於熔接物的內側或外側上,或同時形成於其兩側上。 Meanwhile, unlike the embodiment in FIG. 3, FIGS. 4 and 5 are diagrams of an organic light-emitting display device in which the reinforcing members are individually formed on the inner side and the outer side of the organic light-emitting display device, spaced apart from the fusion material. Thus, it will be appreciated by those skilled in the art that the reinforcing members can be formed on the inside or the outside of the weld or simultaneously formed on both sides thereof.
前述有機發光顯示裝置可以多種方法準備,然而其可參考圖6A至6E基於準備方法的第一實施例來描述。圖6A至6E所示係製造有機發光顯示裝置的製程。 The foregoing organic light-emitting display device can be prepared in various methods, however it can be described based on the first embodiment of the preparation method with reference to FIGS. 6A to 6E. 6A to 6E show a process of manufacturing an organic light emitting display device.
首先,該熔接物150係施加至囊封基板200周圍部分,並與其邊緣間隔預定間距。熔接物150係形成於對應於基板非像素區的位置,其將描述於下文。熔接物150係以膠質狀態施加至囊封基板200,且在將其中所包含的水分或有機黏合劑除去之後會藉由退火而固化。 First, the weld 150 is applied to a portion around the encapsulating substrate 200 and spaced apart from its edge by a predetermined distance. The fuse 150 is formed at a position corresponding to the non-pixel area of the substrate, which will be described below. The fuse 150 is applied to the encapsulating substrate 200 in a colloidal state, and is cured by annealing after removing the moisture or organic binder contained therein.
接著參考圖6B,包含樹脂的強化構件160被沿著所施加的熔接膠質的外側施加。該強化構件160可由分配或網印法形成。強化構件160可與熔接物150相隔預定間距形成或接觸該熔接物150形成。該強化構件160亦可對齊囊封基板200的邊緣或可形成於該邊緣之內。 Referring next to Fig. 6B, a reinforcing member 160 containing a resin is applied along the outside of the applied fusion colloid. The reinforcing member 160 can be formed by dispensing or screen printing. The reinforcing member 160 may be formed with or formed in contact with the weld 150 at a predetermined interval. The reinforcing member 160 can also be aligned with or can be formed within the edge of the encapsulating substrate 200.
接著,會提供包含像素區與非像素區的基板100,該像素區包含有機發光元件,而該非像素區中有驅動積體電路與金屬接線等等形成。該基板100係接合於囊封基板200而包覆包含 像素區的區域(圖6C)。 Next, a substrate 100 including a pixel region and a non-pixel region is provided, the pixel region including an organic light emitting element, and the non-pixel region is formed with a driver integrated circuit and a metal wiring or the like. The substrate 100 is bonded to the encapsulation substrate 200 and covered The area of the pixel area (Fig. 6C).
接著,該強化構件160會固化於接合的基板100與囊封基板200間。當強化構件的材料系可由紫外光固化的,其會於遮蔽之後接受紫外光照射。當強化構件160的材料係可被熱處理的,該強化構件160會接受熱照射。在以熱固化的情況中,由於高溫會對有機發光元件造成重大損害。一實施例中,該溫度約為80℃或以下(圖6D)。 Next, the reinforcing member 160 is cured between the bonded substrate 100 and the encapsulating substrate 200. When the material of the reinforcing member is curable by ultraviolet light, it is exposed to ultraviolet light after being shielded. When the material of the reinforcing member 160 can be heat treated, the reinforcing member 160 receives heat radiation. In the case of heat curing, the organic light-emitting element is greatly damaged due to the high temperature. In one embodiment, the temperature is about 80 ° C or less (Figure 6D).
接著,位於相接合的基板100與囊封基板200間的熔接物150會接受雷射或紅外線照射。因此,熔接物150會熔化於基板100與囊封基板200間。一實施例中,熔接物150係由雷射或紅外線熔化。用來照射的雷射或紅外線的波長可自800nm至約1200nm(視情況而定可為810nm)。光束尺寸可為直徑自1.0nm至約3.0nm。輸出電功率可自約15瓦至約45瓦。熔接物150以外的部分皆被遮蔽。銅與鋁的雙層膜會被用為一種用以遮蔽的材料。之後,熔化的熔接物150固化後會黏著該基板100與囊封基板200。 Next, the fusion material 150 between the bonded substrate 100 and the encapsulating substrate 200 is exposed to laser or infrared rays. Therefore, the fuse 150 is melted between the substrate 100 and the encapsulation substrate 200. In one embodiment, the weld 150 is melted by laser or infrared light. The wavelength of the laser or infrared ray used to illuminate may range from 800 nm to about 1200 nm (depending on 810 nm). The beam size can range from 1.0 nm to about 3.0 nm in diameter. The output electrical power can range from about 15 watts to about 45 watts. Portions other than the weld 150 are shielded. A two-layer film of copper and aluminum is used as a material for shielding. Thereafter, the molten solder 150 adheres to the substrate 100 and the encapsulating substrate 200 after curing.
同時,有機發光顯示裝置的準備方法的第二實施例提供一種方法以將固化強化構件步驟與以雷射照射熔接物的步驟交換。熟悉本技藝人士將可了解,強化構件可在熔化/固化該熔接物之後被固化。 Meanwhile, the second embodiment of the preparation method of the organic light-emitting display device provides a method of exchanging the step of curing the reinforcing member with the step of irradiating the fusion with laser. Those skilled in the art will appreciate that the reinforcing member can be cured after melting/curing the weld.
前述準備方法是一種用以準備獨立有機發光顯示裝置的準備方法。在量產時,會有複數個顯示裝置單元同時製備。因此 該準備方法將於下文中參考圖7A到7E而描述。 The foregoing preparation method is a preparation method for preparing an independent organic light-emitting display device. In mass production, a plurality of display device units are simultaneously prepared. therefore This preparation method will be described below with reference to FIGS. 7A to 7E.
首先,會提供囊封基板原始薄片400。該原始薄片400將被切割為獨立的囊封基板,下文中將詳述。熔接膠質以封閉圈型形式施加於將施加熔接封條的原始薄片之上。熔接膠質可包含:玻璃材料、用以吸收雷射的吸收劑、用以減低熱膨脹係數的填充物、與有機接合劑等等。施加熔接膠質後,會以約300℃至約500℃的溫度將該熔接膠質退火,而該有機接合劑或水分等等,會於退火過程中蒸發(圖7A)。 First, an encapsulated substrate original sheet 400 is provided. The original sheet 400 will be cut into individual encapsulated substrates as will be described in more detail below. The weld colloid is applied in a closed loop form over the original sheet to which the weld seal will be applied. The fusion sizing may include: a glass material, an absorbent for absorbing the laser, a filler for reducing the coefficient of thermal expansion, an organic bonding agent, and the like. After the fusion of the glue is applied, the weld is annealed at a temperature of from about 300 ° C to about 500 ° C, and the organic binder or moisture, etc., evaporates during the annealing process ( FIG. 7A ).
接著,包含樹脂的強化構件360會沿著所施加的熔接膠質350的外側施加。該強化構件360會藉分配法或網印法形成。其可與熔接膠質相隔預定間距或接觸該膠質而形成。該強化構件360也可形成為不突出於囊封基板邊緣或可形成於其邊緣內(圖7B)。 Next, the reinforcing member 360 containing the resin is applied along the outer side of the applied fusion glume 350. The reinforcing member 360 is formed by a distribution method or a screen printing method. It may be formed at a predetermined distance from the weld colloid or in contact with the gel. The reinforcing member 360 can also be formed not to protrude from the edge of the encapsulating substrate or can be formed in its edge (Fig. 7B).
一實施例中,該樹脂材料係進一步沿著整個囊封基板原始薄片400的邊緣形成。接著,該原始薄片囊封構件370會首先固化並藉接合該囊封基板原始薄片至基板原始薄片300而黏著。接著會實行接合製程。此情況中,即使原始薄片囊封構件370的接合製程是進行於非真空狀態,其可防止內部有機發光元件裸露於環境空氣中。 In one embodiment, the resin material is further formed along the entire edge of the encapsulated substrate original sheet 400. Next, the original wafer encapsulation member 370 will first cure and adhere by bonding the encapsulated substrate original sheet to the substrate original sheet 300. The bonding process is then carried out. In this case, even if the joining process of the original sheet enclosing member 370 is performed in a non-vacuum state, it can prevent the internal organic light emitting element from being exposed to the ambient air.
接著,該囊封基板原始薄片400上會形成退火熔接物350,並接合於分開備製的基板原始薄片300。此時,該囊封基板原始薄片400係接合,致使其可覆蓋基板原始薄片300的個別像 素區(圖7C)。 Next, an annealing frit 350 is formed on the encapsulating substrate original sheet 400 and bonded to the separately prepared substrate original sheet 300. At this time, the encapsulated substrate original sheet 400 is bonded so that it can cover the individual image of the substrate original sheet 300. Plain area (Figure 7C).
接著,強化構件360會接受雷射或熱照射。包含樹脂材料的強化構件會因而固化並強化該熔接物(圖7D)。 Next, the reinforcing member 360 will receive laser or thermal illumination. The reinforcing member comprising the resin material will thus cure and strengthen the weld (Fig. 7D).
接著,介於彼此接合的基板原始薄片300與原始薄片400間的熔接物350會接受雷射或紅外線照射,以黏合囊封基板原始薄片400與各基板原始薄片300。一實施例中,熔接物150會藉雷射或紅外線而熔化。要照射的雷射或紅外線的波長可設為約810nm。該光束尺寸可設為直徑約1.0mm至約3.0mm。輸出電功率可設為自約25瓦至約45瓦。該雷射可以囊封基板側、基板側、或兩側的方向照射。一實施例中,接合狀態中的基板與囊封基板的內部維持有低於大氣壓力的壓力(圖7E)。 Next, the fusion material 350 between the substrate original sheet 300 joined to the original sheet 400 and the original sheet 400 is subjected to laser or infrared irradiation to adhere the substrate original sheet 400 and the substrate original sheet 300. In one embodiment, the weld 150 will be melted by laser or infrared light. The wavelength of the laser or infrared ray to be irradiated can be set to about 810 nm. The beam size can be set to a diameter of from about 1.0 mm to about 3.0 mm. The output electrical power can be set from about 25 watts to about 45 watts. The laser can be irradiated in a direction encapsulating the substrate side, the substrate side, or both sides. In one embodiment, the substrate in the joined state and the interior of the encapsulated substrate are maintained at a pressure below atmospheric pressure (Fig. 7E).
接著,可藉切割複數個於接合狀態的原始薄片300與囊封基板原始薄片400成為獨立顯示裝置單元,以備製獨立有機發光顯示裝置。一實施例中,切割線係位於兩個強化構件間。一實施例中,獨立囊封基板僅接合於獨立基板的預定區域,只有囊封基板會被分開來切割(圖7F)。 Then, the original sheet 300 and the encapsulated substrate original sheet 400 which are cut in a joined state can be cut into a separate display device unit to prepare an independent organic light-emitting display device. In one embodiment, the cutting line is located between the two reinforcing members. In one embodiment, the individual encapsulating substrates are only bonded to predetermined areas of the individual substrates, and only the encapsulating substrates are separated for cutting (Fig. 7F).
獨立面板挖槽並清洗後,會於基板提供驅動積體電路。偏光板會提供於囊封基板的表面。也會實施用以提供彈性印刷電路的製程與用以提供tuppy的製程。 After the individual panels are grooved and cleaned, a drive integrated circuit is provided on the substrate. A polarizing plate is provided on the surface of the encapsulating substrate. Processes for providing flexible printed circuits and processes for providing tuppy are also implemented.
實施例中,利用前述的原始薄片來量產有機發光顯示裝置,熟習此項技藝的人士將了解,熔接物可先被固化,而可於之後固化強化材料。 In an embodiment, the prior art sheet is used to mass produce an organic light emitting display device. Those skilled in the art will appreciate that the solder may be cured prior to curing the reinforcing material.
雖然本發明主要以描述於前面實施例的基本原則,其他各種修改與改變也可實行而不脫離本發明的原則與範疇。舉例來說,改變形成強化構件方法與改變形成強化構件的位置皆可實行。 While the invention has been described with respect to the basic principles of the foregoing embodiments, various modifications and changes can be made without departing from the spirit and scope of the invention. For example, changing the method of forming the reinforcing member and changing the position at which the reinforcing member is formed can be performed.
雖然本發明一些實施例已顯示且描述,熟習本技藝的人士可了解,可於實施例中做改變而不脫離本發明原則與精神,該原則與精神係定義於申請專利範圍與其等效範圍中。舉例來說,強化構件的形成方法與形成位置皆可改變。 While the invention has been shown and described with respect to the embodiments of the invention . For example, the forming method and the forming position of the reinforcing member may be changed.
100‧‧‧基板 100‧‧‧Substrate
100a‧‧‧像素區 100a‧‧‧pixel area
100b‧‧‧非像素區 100b‧‧‧Non-pixel area
150‧‧‧熔接物 150‧‧‧welds
160‧‧‧強化構件 160‧‧‧Strengthened components
170‧‧‧資料驅動器 170‧‧‧Data Drive
180、180’‧‧‧掃描驅動器 180, 180’‧‧‧ scan drive
200‧‧‧囊封基板 200‧‧‧encapsulated substrate
Claims (12)
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KR1020060035455A KR100745328B1 (en) | 2006-01-20 | 2006-04-19 | Organic light-emitting display device and the manufacturing method of the same |
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CN104241542A (en) * | 2014-09-22 | 2014-12-24 | 深圳市华星光电技术有限公司 | OLED packaging method and structure |
US9385346B2 (en) | 2013-11-28 | 2016-07-05 | Innolux Corporation | Organic light emitting diode display panel and method for manufacturing the same |
US10831070B2 (en) | 2018-10-01 | 2020-11-10 | Himax Display, Inc. | Display panel |
TWI750421B (en) * | 2018-10-30 | 2021-12-21 | 立景光電股份有限公司 | Display panel |
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KR100897132B1 (en) | 2007-09-12 | 2009-05-14 | 삼성모바일디스플레이주식회사 | Apparatus for encapsulation of display panel and method for manufacturing organic light emitting diode using the same |
KR100899447B1 (en) * | 2008-02-22 | 2009-05-27 | 삼성모바일디스플레이주식회사 | Organic light emitting diode display device and fabrication method of the same |
US8198807B2 (en) * | 2008-02-28 | 2012-06-12 | Corning Incorporated | Hermetically-sealed packages for electronic components having reduced unused areas |
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KR101084179B1 (en) | 2009-12-28 | 2011-11-17 | 삼성모바일디스플레이주식회사 | Method for encapsulation of organic light emitting display device |
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KR102051391B1 (en) | 2013-04-15 | 2019-12-04 | 삼성디스플레이 주식회사 | Display apparatus |
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US9385346B2 (en) | 2013-11-28 | 2016-07-05 | Innolux Corporation | Organic light emitting diode display panel and method for manufacturing the same |
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US10831070B2 (en) | 2018-10-01 | 2020-11-10 | Himax Display, Inc. | Display panel |
TWI750421B (en) * | 2018-10-30 | 2021-12-21 | 立景光電股份有限公司 | Display panel |
Also Published As
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TW200730007A (en) | 2007-08-01 |
KR100745328B1 (en) | 2007-08-01 |
KR20070077010A (en) | 2007-07-25 |
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