TWI496238B - Alignment system and method thereof - Google Patents
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Description
本發明是有關於一種對準系統及其方法,特別是有關於一種藉由相互感應方式形成複數個感應值及其比對結果,並依據比對結果進行對準之對準系統及其方法。 The present invention relates to an alignment system and method thereof, and more particularly to an alignment system and method for forming a plurality of sensing values and their alignment results by mutual induction and aligning the results according to the alignment results.
晶圓級封裝(WLP)是一項先進的半導體封裝技術,其所有的步驟都需在切片前的晶圓級完成,這樣封裝後的尺寸不會比晶片本身大很多,提供3D構裝更具競爭性的批量生產的封裝技術。 Wafer-level packaging (WLP) is an advanced semiconductor packaging technology, all of which need to be done at the wafer level before slicing, so that the package size is not much larger than the wafer itself, providing a 3D package. Competitive mass production packaging technology.
其中晶圓級製程的生產週期幾乎與晶圓尺寸無關,對於封裝裝置,必須在速度和精確度之間做取捨,伴隨著高對準精確度的要求,總是要付出產能降低的風險作為代價,因為必須等待震動停止和對準控制回饋循環的運作,習知於晶圓極封裝作業係利用光學式對準技術進行對準校正。 The production cycle of the wafer-level process is almost independent of the wafer size. For the packaged device, the trade-off between speed and accuracy must be made. With the high alignment accuracy, the risk of capacity reduction is always paid. Because it is necessary to wait for the operation of the vibration stop and alignment control feedback loop, it is conventional to use the optical alignment technique for alignment correction in the wafer pole package operation.
由於矽晶圓不透光,進而須使用紅外線光源穿透晶圓之方式以輔助對準,然而因晶圓具有厚度,因此會使得利用紅外線光源穿透方式的光學式對準解析度相較容易因厚度影響而產生誤差。 Since the germanium wafer is opaque, the infrared light source must be used to penetrate the wafer to assist the alignment. However, since the wafer has a thickness, the optical alignment resolution using the infrared light source penetration mode is relatively easy. Error due to thickness effects.
有鑑於上述習知技藝之問題,本發明之目的就是在提供一種對準系統及方法,以解決習知技術之對準較容易產生誤差之問題。 In view of the above-described problems of the prior art, it is an object of the present invention to provide an alignment system and method for solving the problem that the alignment of the prior art is more susceptible to errors.
根據本發明之目的,提出一種對準系統,其包含第一載具、第二載具及處理模組。第一載具裝載具有至少一第一感應件之第一目標元件。第二載具係與第一載具相對應,並於對應第一目標元件之一側裝載具有複數個第二感應件之第二目標元件,當第一目標元件距離第二目標元件預設距離時,至少一第一感應件分別與複數個第二感應件相互感應形成複數個感應值。處理模組係將複數個感應值進行比較以取得比較結果,並依據比較結果調整第一載具及第二載具之相對位置,以使第一目標元件及第二目標元件相互對準。 In accordance with the purpose of the present invention, an alignment system is provided that includes a first carrier, a second carrier, and a processing module. The first carrier loads a first target component having at least one first inductive component. The second carrier corresponds to the first carrier, and loads a second target component having a plurality of second sensing components on a side corresponding to the first target component, when the first target component is separated from the second target component by a preset distance The at least one first sensing component and the plurality of second sensing components respectively sense each other to form a plurality of sensing values. The processing module compares the plurality of sensing values to obtain a comparison result, and adjusts the relative positions of the first carrier and the second carrier according to the comparison result, so that the first target component and the second target component are aligned with each other.
較佳地,第一目標元件及第二目標元件可為晶圓或晶片。 Preferably, the first target component and the second target component can be wafers or wafers.
較佳地,各至少一第一感應件距第一目標元件之幾何中心之距離可相等,而各複數個第二感應件距第二目標元件之幾何中心之距離可相等。 Preferably, the distance between each of the at least one first sensing element is equal to the geometric center of the first target element, and the distance between each of the plurality of second sensing elements is equal to the geometric center of the second target element.
較佳地,當至少一第一感應件與複數個第二感應件分別相互感應形成之感應值相等時,則可完成對準動作。 Preferably, the alignment action can be completed when the sensing values formed by the at least one first sensing element and the plurality of second sensing elements are respectively mutually equal.
較佳地,第一目標元件距離第二目標元件預設距離時,將停止第一載具及第二載具相互接近;當完成對準動作時,第一載具及第二載具再繼續相互接近,以使第一目標元件及第二目標元件相互貼合以完成封裝。 Preferably, when the first target component is separated from the second target component by a predetermined distance, the first carrier and the second carrier are stopped from each other; when the alignment operation is completed, the first carrier and the second carrier continue to be continued. Approaching each other such that the first target element and the second target element are attached to each other to complete the package.
此外,本發明更提出一種對準方法,包含下列步驟:裝載具有至少一第一感應件之第一目標元件至第一載具上;裝載具有複數個第二感應件之第二目標元件至第二載具上;使第一載具及第二載具相互接近;藉由第一目標元件距離第二目標元件預設距離時,至少一第一感應件 與複數個第二感應件相互感應形成複數個感應值;利用處理模組比較複數個感應值以取得比較結果;依據比較結果,調整第一載具及第二載具之相對位置,以使第一半導體元件及第二半導體元件相互對準。 In addition, the present invention further provides an alignment method comprising the steps of: loading a first target component having at least one first sensing component onto a first carrier; loading a second target component having a plurality of second sensing components to a a second carrier; the first carrier and the second carrier are adjacent to each other; and the first sensing component is at least a first sensing component when the first target component is at a predetermined distance from the second target component Forming a plurality of sensing values with the plurality of second sensing members; comparing the plurality of sensing values by the processing module to obtain a comparison result; adjusting the relative positions of the first carrier and the second carrier according to the comparison result, so that the first A semiconductor component and a second semiconductor component are aligned with each other.
承上所述,依本發明之對準系統及其方法,其可具有下述優點:此對準系統及其方法可藉由感應件進行相互感應以形成感應值,再由處理模組進行比對,進而依據比對結果進行對準校正,藉此提高對準校正作業之準確度。 According to the present invention, the alignment system and method thereof have the following advantages: the alignment system and the method thereof can be mutually inductively sensed by the sensing member to form an induced value, and then processed by the processing module. Then, the alignment correction is performed based on the comparison result, thereby improving the accuracy of the alignment correction operation.
1‧‧‧對準系統 1‧‧‧Alignment system
11‧‧‧第一載具 11‧‧‧First Vehicle
111‧‧‧第一目標元件 111‧‧‧First target component
1111‧‧‧第一感應件 1111‧‧‧First sensing parts
12‧‧‧第二載具 12‧‧‧Second Vehicle
121‧‧‧第二目標元件 121‧‧‧second target component
1211‧‧‧第二感應件 1211‧‧‧Second sensing parts
13‧‧‧處理模組 13‧‧‧Processing module
311、511‧‧‧第一晶圓 311, 511‧‧‧ first wafer
3111、5111‧‧‧第一電極 3111, 5111‧‧‧ first electrode
3112、5112‧‧‧第一幾何中心 3112, 5112‧‧‧ first geometric center
321、521‧‧‧第二晶圓 321, 521‧‧‧second wafer
3211、5211‧‧‧第二電極 3211, 5211‧‧‧ second electrode
3212、5212‧‧‧第二幾何中心 3212, 5212‧‧‧ Second Geometric Center
C1、C2‧‧‧電容值 C 1 , C 2 ‧‧‧ capacitance values
S61至S66‧‧‧步驟 S61 to S66‧‧‧ steps
第1圖係為本發明之對準系統之方塊圖。 Figure 1 is a block diagram of the alignment system of the present invention.
第2圖係為本發明之對準系統之示意圖。 Figure 2 is a schematic illustration of the alignment system of the present invention.
第3圖係為本發明之對準系統之第一實施例之示意圖。 Figure 3 is a schematic illustration of a first embodiment of an alignment system of the present invention.
第4圖係為電容感測差動電路之電路圖。 Figure 4 is a circuit diagram of a capacitive sensing differential circuit.
第5圖係為本發明之對準系統之第二實施例之示意圖。 Figure 5 is a schematic illustration of a second embodiment of the alignment system of the present invention.
第6圖係為本發明之對準方法之流程圖。 Figure 6 is a flow chart of the alignment method of the present invention.
以下將參照相關圖式,說明依本發明之對準系統及其方法之實施例,為使便於理解,下述實施例中之相同元件係以相同之符號標示來說明。 The embodiments of the alignment system and the method thereof according to the present invention will be described below with reference to the accompanying drawings. For the sake of understanding, the same components in the following embodiments are denoted by the same reference numerals.
請參閱第1圖及第2圖,第1圖係為本發明之對準系統之方塊圖;第2圖係為本發明之對準系統之示意圖。如圖所示,本發明之對準系統1,其包含第一載具11、第二載具12及處理模組13。第一載具11裝 載具有第一感應件1111之第一目標元件111。第二載具12與第一載具11相對應,並於對應第一目標元件111之一側裝載具有第二感應件1211之第二目標元件121,當第一目標元件111距離第二目標元件121符合預設距離時(例如可適當感應之距離),第一感應件1111將分別與第二感應件1211相互感應形成感應值。處理模組13將感應值進行比較以取得比較結果,並依據比較結果控制相關作動元件以調整第一載具11及第二載具12之相對位置,以使第一目標元件111及第二目標元件121相互對準。順帶一提的是,處理模組13控制作動元件(例如機械手臂等)以調整第一載具11及第二載具12之相對位置之技術,係為所屬領域人員所熟知,於此便不再贅述。 Please refer to FIG. 1 and FIG. 2, which are block diagrams of the alignment system of the present invention; and FIG. 2 is a schematic view of the alignment system of the present invention. As shown, the alignment system 1 of the present invention includes a first carrier 11, a second carrier 12, and a processing module 13. First carrier 11 The first target element 111 having the first sensing element 1111 is carried. The second carrier 12 corresponds to the first carrier 11 and loads a second target component 121 having a second sensing component 1211 on a side corresponding to the first target component 111, when the first target component 111 is away from the second target component When the predetermined distance is met (for example, the distance can be appropriately sensed), the first sensing element 1111 and the second sensing element 1211 respectively sense each other to form an induced value. The processing module 13 compares the sensing values to obtain a comparison result, and controls the relevant driving elements according to the comparison result to adjust the relative positions of the first carrier 11 and the second carrier 12 to make the first target component 111 and the second target The elements 121 are aligned with each other. Incidentally, the technique of the processing module 13 for controlling the relative position of the first carrier 11 and the second carrier 12 by controlling the actuating member (for example, a robot arm, etc.) is well known to those skilled in the art, and thus Let me repeat.
其中,第一目標元件111及第二目標元件121可為晶圓或晶片,因此對準系統1適用之第一目標元件111及第二目標元件121可為晶圓與晶圓,或是晶圓對晶片。此外,第一載具11與第二載具12為相互對應設置,於下述實施例中,將以第一載具11在第二載具12之上為例,但不應以此為限。 The first target component 111 and the second target component 121 can be a wafer or a wafer. Therefore, the first target component 111 and the second target component 121 applicable to the alignment system 1 can be a wafer and a wafer, or a wafer. For the wafer. In addition, the first carrier 11 and the second carrier 12 are disposed corresponding to each other. In the following embodiments, the first carrier 11 is disposed on the second carrier 12 as an example, but should not be limited thereto. .
更詳細地說,於下述實施例中,第一目標元件111及第二目標元件121係分別各以晶圓為例,但不應就此限定。第一感應件1111對應晶圓可為第一電極,而第二感應件1211可對應晶圓為第二電極;再進一步地說,若第一感應件1111之數量為一個,則第一感應件1111之位置可位在第一目標元件111之幾何中心位置;若第一感應件1111之數量為複數個,較佳地,第一感應件1111距第一目標元件111之幾何中心之 距離應皆相等,而各複數個第二感應件1211距第二目標元件121之幾何中心之距離亦皆相等。 In more detail, in the following embodiments, the first target element 111 and the second target element 121 are each exemplified by a wafer, but should not be limited thereto. The first sensing element 1111 corresponds to the wafer as the first electrode, and the second sensing element 1211 can correspond to the wafer as the second electrode; further, if the number of the first sensing elements 1111 is one, the first sensing element The position of 1111 can be located at the geometric center position of the first target element 111; if the number of the first sensing elements 1111 is plural, preferably, the first sensing element 1111 is located at the geometric center of the first target element 111. The distances should be equal, and the distance between each of the plurality of second sensing members 1211 from the geometric center of the second target member 121 is also equal.
藉此,當第一目標元件111距第二目標元件121預設距離時,至少一第一感應件1111與複數個第二感應件1211分別相互感應形成之感應值皆相等;換言之,第一感應件1111數量以一個為例,由於第一目標元件111及第二目標元件121之幾何中心應相互對應,故分別與幾何中心相距距離相等之複數個第二感應件1211與第一感應件1111之距離應相等,進而所產生之感應值亦應相等。 Therefore, when the first target element 111 is at a predetermined distance from the second target element 121, the sensing values formed by the at least one first sensing element 1111 and the plurality of second sensing elements 1211 are respectively equal to each other; in other words, the first sensing The number of the pieces 1111 is taken as an example. Since the geometric centers of the first target element 111 and the second target element 121 should correspond to each other, the plurality of second sensing elements 1211 and the first sensing element 1111 are respectively equidistant from the geometric center. The distances should be equal and the resulting values should be equal.
如第2圖所示,第一載具11與第二載具12會帶動第一目標元件111及第二目標元件121漸漸接近,其移動方向可參考圖中箭頭指示,亦可僅第一載具11移動或僅第二載具12移動,不在此限定;當第一目標元件111與第二目標元件121之距離為預設距離時,將停止移動,第一感應件1111及複數個第二感應件1211將感應形成複數個感應值,再藉由處理模組13進行比較,以取得比較結果,並依據比較結果調整第一載具11及第二載具12之相對位置;再一次進行感應以形成感應值並進行比較,待取得之比較結果為複數個感應值均相等時,則表示第一目標元件111已對準第二目標元件121,因此,第一載具11及第二載具12繼續移動,以使第一目標元件111及第二目標元件121接近貼合以完成封裝。 As shown in FIG. 2, the first carrier 11 and the second carrier 12 will gradually bring the first target element 111 and the second target element 121 closer to each other, and the moving direction thereof may be indicated by an arrow in the figure, or only the first carrier. If the distance between the first target element 111 and the second target element 121 is a preset distance, the movement will stop, the first sensing element 1111 and the plurality of second parts. The sensing component 1211 will inductively form a plurality of sensing values, and then compare the processing module 13 to obtain a comparison result, and adjust the relative positions of the first carrier 11 and the second carrier 12 according to the comparison result; When the sensing value is formed and compared, when the comparison result to be obtained is equal to the plurality of sensing values, it indicates that the first target component 111 has been aligned with the second target component 121, and therefore, the first carrier 11 and the second carrier 12 continues to move so that the first target element 111 and the second target element 121 are close to each other to complete the package.
請一併參閱第3圖及第4圖,第3圖係為本發明之對準系統之第一實施例之示意圖:第4圖係為電容感測差動電路之電路圖。如圖所示,於本實施例中,第一目標元件為第一晶圓311,其具有一個第一感應件(第一電極3111)係位於第一晶圓311之第一幾何中心3112上;第二目標 元件321為第二晶圓,其具有兩個第二感應件(第二電極3211),其係對應設置於第二晶圓321之第二幾何中心3212之兩側,且各第二電極3211與第二幾何中心3212之距離相等。當第一晶圓311與第二晶圓321相距一預設距離時,第一電極3111與一第二電極3211互相感應形成電容值C1,且第一電極3111亦與另一第二電極3211感應形成電容值C2;而上述中之處理模組13係包含電容感測差動電路,其可比較電容值C1、C2之大小;若電容值C1大於電容值C2,則表示第一電極3111比較靠近對應電容值C1之第二電極3211,亦表示第一電極3111較偏往該方向;若電容值C2大於電容值C1,則表示第一電極3111比較靠近對應電容值C2之第二電極3211,亦表示第一電極3111較偏往該方向。藉此,以判斷第一電極3111偏往哪個方向,進而對準校正第一載具11及第二載具12之位置。 Please refer to FIG. 3 and FIG. 4 together. FIG. 3 is a schematic diagram of a first embodiment of the alignment system of the present invention: FIG. 4 is a circuit diagram of a capacitive sensing differential circuit. As shown in the figure, in the embodiment, the first target component is a first wafer 311 having a first sensing component (first electrode 3111) located on the first geometric center 3112 of the first wafer 311; The second target component 321 is a second wafer having two second sensing members (second electrodes 3211) corresponding to two sides of the second geometric center 3212 of the second wafer 321, and each second The electrodes 3211 are equidistant from the second geometric center 3212. When the first wafer 311 and the second wafer 321 are apart from each other by a predetermined distance, the first electrode 3111 and the second electrode 3211 are mutually induced to form a capacitance value C 1 , and the first electrode 3111 is also coupled to the other second electrode 3211. Inductively forming a capacitance value C 2 ; and the processing module 13 in the above includes a capacitance sensing differential circuit, which can compare the capacitance values C 1 and C 2 ; if the capacitance value C 1 is greater than the capacitance value C 2 , the first electrode 3111 corresponding to the capacitance value C is closer to the second electrode 32111, a first electrode 3111 also indicates the direction to bias the more; if the capacitance value C 2 is greater than the capacitance value C 1 represents the first capacitor electrode 3111 is closer to the corresponding The second electrode 3211 of the value C 2 also indicates that the first electrode 3111 is biased in the direction. Thereby, it is determined which direction the first electrode 3111 is biased, and the positions of the first carrier 11 and the second carrier 12 are aligned and corrected.
其中值得注意的是,本實施例係示範第一目標元件111之幾何中心對準第二目標元件121幾何中心之方式,在實際運用下,而利用電容值C1、C2具有一預定差值而表示其特定方式下的對準,故應不以此為限。 It should be noted that this embodiment exemplifies the manner in which the geometric center of the first target element 111 is aligned with the geometric center of the second target element 121. In practice, the capacitance values C 1 and C 2 have a predetermined difference. It indicates the alignment in its specific mode, so it should not be limited to this.
依據第一實施例,本發明更提出第二實施例作更進一步之舉例說明。 According to the first embodiment, the present invention further provides a second embodiment for further exemplification.
請參閱第5圖,其係為本發明之對準系統之第二實施例之示意圖。如圖所示,於本實施例中,第一目標元件為第一晶圓511,其具有一個第一感應件(第一電極5111)係位於第一晶圓511之第一幾何中心5112上;第二目標元件為第二晶圓521,其具有四個第二感應件(第二電極5211),其係對應設置於第二晶圓521之第二幾何中心5212之四週,且 各第二電極5211與第二幾何中心5212之距離相等。如第一實施例所述,第一電極5111係與四第二電極5211分別相互感應形成四個電容值;藉由電容感測差動電路比較四電容值之大小;以判斷第一電極5211偏往哪個方向,進而校正第一載具11及第二載具12之位置以相互對準。 Please refer to FIG. 5, which is a schematic view of a second embodiment of the alignment system of the present invention. As shown in the present embodiment, the first target component is a first wafer 511 having a first sensing component (first electrode 5111) located on a first geometric center 5112 of the first wafer 511; The second target component is a second wafer 521 having four second sensing members (second electrodes 5211 ) correspondingly disposed around the second geometric center 5212 of the second wafer 521 , and The distance between each of the second electrodes 5211 and the second geometric center 5212 is equal. As described in the first embodiment, the first electrode 5111 and the fourth second electrode 5211 are respectively induced to form four capacitance values; the capacitance sensing differential circuit compares the magnitude of the four capacitance values; to determine the first electrode 5211 bias In which direction, the positions of the first carrier 11 and the second carrier 12 are corrected to be aligned with each other.
承上所述,第一電極及第二電極係於生產晶圓之過程加入至晶圓之中,其相關技術係為該技術領域具通常知識者所熟悉,便不在此贅述。 As described above, the first electrode and the second electrode are added to the wafer during the process of producing the wafer, and the related art is familiar to those skilled in the art, and will not be described herein.
儘管前述在說明本發明之對準系統的過程中,亦已同時說明本發明之對準方法的概念,但為求清楚起見,以下另繪示流程圖詳細說明。 Although the foregoing description of the alignment method of the present invention has been described in the foregoing description of the alignment system of the present invention, for the sake of clarity, the flow chart will be described in detail below.
請參閱第6圖,其係為本發明之對準方法之流程圖。如圖所示,本發明之對準方法其包含下列步驟: Please refer to FIG. 6, which is a flow chart of the alignment method of the present invention. As shown, the alignment method of the present invention comprises the following steps:
(S61)裝載具有至少一第一感應件之第一目標元件至第一載具上。 (S61) loading the first target component having the at least one first sensing component onto the first carrier.
(S62)裝載具有複數個第二感應件之第二目標元件至第二載具上。 (S62) loading the second target component having the plurality of second sensing members onto the second carrier.
(S63)使第一載具及第二載具相互接近。 (S63) bringing the first carrier and the second carrier closer to each other.
(S64)藉由第一目標元件距離第二目標元件預設距離時,至少一第一感應件與複數個第二感應件相互感應形成複數個感應值。 (S64) When the first target component is separated from the second target component by a predetermined distance, the at least one first sensing component and the plurality of second sensing components sense each other to form a plurality of sensing values.
(S65)利用處理模組比較複數個感應值以取得比較結果。 (S65) The processing module compares the plurality of sensing values to obtain a comparison result.
(S66)依據比較結果,調整第一載具及第二載具之相對位置,以使第一半導體元件及第二半導體元件相互對準。 (S66) Adjusting the relative positions of the first carrier and the second carrier according to the comparison result to align the first semiconductor element and the second semiconductor element with each other.
本發明之對準方法的詳細說明以及實施方式已於前面敘述本發明之對準系統時描述過,在此為了簡略說明便不再贅述。 The detailed description and embodiments of the alignment method of the present invention have been described above in connection with the alignment system of the present invention, and will not be described again for the sake of brevity.
以上所述僅為舉例性,而非為限制性者。任何未脫離本發明之精神與範疇,而對其進行之等效修改或變更,均應包含於後附之申請專利範圍中。 The above is intended to be illustrative only and not limiting. Any equivalent modifications or alterations to the spirit and scope of the invention are intended to be included in the scope of the appended claims.
1‧‧‧對準系統 1‧‧‧Alignment system
11‧‧‧第一載具 11‧‧‧First Vehicle
111‧‧‧第一目標元件 111‧‧‧First target component
1111‧‧‧第一感應件 1111‧‧‧First sensing parts
12‧‧‧第二載具 12‧‧‧Second Vehicle
121‧‧‧第二目標元件 121‧‧‧second target component
1211‧‧‧第二感應件 1211‧‧‧Second sensing parts
13‧‧‧處理模組 13‧‧‧Processing module
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TW201234516A (en) * | 2010-12-13 | 2012-08-16 | Ev Group E Thallner Gmbh | Apparatus, device and method for determining alignment errors |
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