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TWI491014B - Method of forming semiconductor stack unit and semiconductor package - Google Patents

Method of forming semiconductor stack unit and semiconductor package Download PDF

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Publication number
TWI491014B
TWI491014B TW101131738A TW101131738A TWI491014B TW I491014 B TWI491014 B TW I491014B TW 101131738 A TW101131738 A TW 101131738A TW 101131738 A TW101131738 A TW 101131738A TW I491014 B TWI491014 B TW I491014B
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Taiwan
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semiconductor
adhesive layer
conductive
semiconductor substrate
carrier
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TW101131738A
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Chinese (zh)
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TW201409658A (en
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蔣靜雯
邱承浩
陳光欣
盧俊宏
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矽品精密工業股份有限公司
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Publication of TW201409658A publication Critical patent/TW201409658A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods

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Description

半導體堆疊單元與半導體封裝件之製法Semiconductor stacking unit and semiconductor package manufacturing method

本發明係有關於一種半導體堆疊單元、半導體封裝件及其製法,尤指一種具有嵌埋的導電元件之半導體堆疊單元、半導體封裝件及其製法。The present invention relates to a semiconductor stacked unit, a semiconductor package, and a method of fabricating the same, and more particularly to a semiconductor stacked unit having a buried conductive element, a semiconductor package, and a method of fabricating the same.

隨著時代的進步,現今電子產品均朝向微型化、多功能、高電性及高速運作的方向發展,為了配合此一發展趨勢,半導體業者莫不積極研發體積微小、高性能、高功能、與高速度化的半導體封裝件,藉以符合電子產品之要求。With the advancement of the times, today's electronic products are developing towards miniaturization, multi-function, high-power and high-speed operation. In order to cope with this development trend, the semiconductor industry is not actively developing small size, high performance, high function, and high. Speed-oriented semiconductor packages to meet the requirements of electronic products.

半導體封裝件為了達到更積集化及更高的效能表現,因而發展出所謂的穿矽中介板(through silicon interposer,TSI),其係形成複數貫穿矽基材之上下表面的通孔,並填充導電材料於該等通孔內以成為複數導電穿孔,亦可於該矽基材之上下表面形成線路層,而構成一穿矽中介板。In order to achieve more integration and higher performance, the semiconductor package has developed a so-called through silicon interposer (TSI) which forms a plurality of through holes penetrating the lower surface of the substrate and is filled. The conductive material is formed in the through holes to form a plurality of conductive through holes, and a circuit layer may be formed on the lower surface of the base material to form a piercing interposer.

第1A與1B圖所示者,係習知之穿矽中介板及其製法之剖視圖。The figures shown in Figs. 1A and 1B are cross-sectional views of a conventional piercing interposer and a method of manufacturing the same.

如第1A圖所示,其係先提供一具有相對之第一表面10a與第二表面10b及複數貫穿該第一表面10a與第二表面10b之導電通孔101之半導體基板10,並於該第一表面10a上設置複數電性連接該導電通孔101的第一導電凸塊11a,且使該半導體基板10之第一表面10a與第一導電凸塊11a藉由暫時性黏著層12暫時地固定於承載板13上的 剝離層14上,接著,於該半導體基板10之第二表面10b上設置電性連接該導電通孔101的第二導電凸塊11b。As shown in FIG. 1A, a semiconductor substrate 10 having a first surface 10a and a second surface 10b opposite to each other and a plurality of conductive vias 101 extending through the first surface 10a and the second surface 10b is provided. A first conductive bump 11a electrically connected to the conductive via 101 is disposed on the first surface 10a, and the first surface 10a of the semiconductor substrate 10 and the first conductive bump 11a are temporarily temporarily provided by the temporary adhesive layer 12. Fixed to the carrier plate 13 On the second layer 10b of the semiconductor substrate 10, a second conductive bump 11b electrically connected to the conductive via 101 is disposed on the peeling layer 14.

如第1B圖所示,於該半導體基板10之第二表面10b上貼上切割用膠膜15,並移除該第一表面10a上之承載板13、剝離層14與暫時性黏著層12,最後再進行切單步驟(未圖示)。As shown in FIG. 1B, a dicing film 15 is attached to the second surface 10b of the semiconductor substrate 10, and the carrier sheet 13, the peeling layer 14, and the temporary adhesive layer 12 on the first surface 10a are removed. Finally, a singulation step (not shown) is performed.

惟,於移除該暫時性黏著層12時,經常會有移除不完全的情況,而容易發生於該第一表面10a上殘留有該暫時性黏著層12的情況,導致最終的良率下降。However, when the temporary adhesive layer 12 is removed, the removal is often incomplete, and the temporary adhesive layer 12 remains on the first surface 10a, resulting in a final yield drop. .

因此,如何避免上述習知技術中之種種問題,實已成為目前亟欲解決的課題。Therefore, how to avoid various problems in the above-mentioned prior art has become a problem that is currently being solved.

有鑒於上述習知技術之缺失,本發明提供一種半導體堆疊單元,係包括:半導體基板,係具有相對之第一表面與第二表面及複數貫穿該第一表面與第二表面之導電通孔;第一膠層,係形成於該半導體基板之第一表面上;複數第一導電元件,係嵌埋於該第一膠層中,並外露於該第一膠層之表面,且電性連接各該導電通孔;以及複數第二導電元件,係形成於該第二表面上,且電性連接各該導電通孔。The present invention provides a semiconductor stacking unit comprising: a semiconductor substrate having opposite first and second surfaces and a plurality of conductive vias extending through the first surface and the second surface; a first adhesive layer is formed on the first surface of the semiconductor substrate; a plurality of first conductive elements are embedded in the first adhesive layer and exposed on the surface of the first adhesive layer, and electrically connected The conductive vias are formed on the second surface and electrically connected to the conductive vias.

本發明復提供一種半導體堆疊單元之製法,係包括:提供一具有相對之第一表面與第二表面及複數貫穿該第一表面與第二表面之導電通孔之半導體基板;於該第一表面上形成複數電性連接各該導電通孔的第一導電元件;使該 半導體基板接置於一承載件上的膠層上,且該膠層係包覆該第一表面與第一導電元件;於該第二表面上形成複數電性連接各該導電通孔的第二導電元件,並移除該承載件;使該半導體基板藉其第二導電元件接置於一承載片上;從該膠層之側研磨移除部分該膠層,以外露該第一導電元件;進行切單步驟;以及移除該承載片。The invention provides a method for fabricating a semiconductor stacked unit, comprising: providing a semiconductor substrate having opposite first and second surfaces and a plurality of conductive vias penetrating the first surface and the second surface; Forming a plurality of first conductive elements electrically connected to the conductive vias; The semiconductor substrate is disposed on the adhesive layer on a carrier, and the adhesive layer covers the first surface and the first conductive component; and the second surface is formed with a plurality of electrically connected to each of the conductive vias. a conductive member, and removing the carrier; the semiconductor substrate is attached to a carrier by its second conductive component; a portion of the adhesive layer is removed from the side of the adhesive layer to expose the first conductive component; Cutting a single step; and removing the carrier sheet.

本發明提供另一種半導體堆疊單元之製法,係包括:提供一具有相對之第一表面與第二表面及複數貫穿該第一表面與第二表面之導電通孔之半導體基板;於該第一表面上形成複數電性連接各該導電通孔的第一導電元件;使該半導體基板接置於一承載件上的第一膠層上,且該第一膠層係包覆該第一表面與第一導電元件;於該第二表面上形成複數電性連接各該導電通孔的第二導電元件;於該第二表面上形成第二膠層,且該第二膠層包覆該第二導電元件;從該第二膠層之側研磨移除部分該第二膠層,以外露該第二導電元件;移除該承載件,並使該半導體基板藉其第二導電元件與第二膠層接置於一承載片上;從該第一膠層之側研磨移除部分該第一膠層,以外露該第一導電元件;進行切單步驟;以及移除該承載片。The invention provides a method for fabricating another semiconductor stacking unit, comprising: providing a semiconductor substrate having opposite first and second surfaces and a plurality of conductive vias penetrating the first surface and the second surface; Forming a plurality of first conductive elements electrically connected to the conductive vias; the semiconductor substrate is placed on the first adhesive layer on a carrier, and the first adhesive layer covers the first surface and the first a conductive element; forming a plurality of second conductive elements electrically connected to the conductive vias on the second surface; forming a second adhesive layer on the second surface, and the second adhesive layer covers the second conductive Removing a portion of the second adhesive layer from the side of the second adhesive layer to expose the second conductive member; removing the carrier and causing the semiconductor substrate to pass the second conductive member and the second adhesive layer Attached to a carrier sheet; grinding and removing a portion of the first adhesive layer from the side of the first adhesive layer, exposing the first conductive member; performing a singulation step; and removing the carrier sheet.

本發明又提供一種半導體封裝件,係包括:第一半導體堆疊單元,係包括:半導體基板,係具有相對之第一表面與第二表面及複數貫穿該第一表面與第二表面之導電通孔;第一膠層,係形成於該半導體基板之第一表面上;複數第一導電元件,係嵌埋於該第一膠層中,並外露於該第 一膠層之表面,且電性連接各該導電通孔;以及複數第二導電元件,係形成於該第二表面上,且電性連接各該導電通孔;封裝基板,係具有相對之第三表面與第四表面,該第一半導體堆疊單元係藉其第二導電元件接置於該第三表面上;以及半導體晶片,係接置於該第一半導體堆疊單元上。The present invention further provides a semiconductor package, comprising: a first semiconductor stacked unit, comprising: a semiconductor substrate having opposite first and second surfaces and a plurality of conductive vias penetrating the first surface and the second surface a first adhesive layer formed on the first surface of the semiconductor substrate; a plurality of first conductive elements embedded in the first adhesive layer and exposed to the first a surface of a glue layer electrically connected to each of the conductive vias; and a plurality of second conductive elements formed on the second surface and electrically connected to the conductive vias; the package substrate has a relative a third surface and a fourth surface, the first semiconductor stacked unit being attached to the third surface by a second conductive element thereof; and a semiconductor wafer attached to the first semiconductor stacked unit.

本發明再提供一種半導體封裝件之製法,係包括:提供一第一半導體堆疊單元,係包括:半導體基板,係具有相對之第一表面與第二表面及複數貫穿該第一表面與第二表面之導電通孔;第一膠層,係形成於該半導體基板之第一表面上;複數第一導電元件,係嵌埋於該第一膠層中,並外露於該第一膠層之表面,且電性連接各該導電通孔;以及複數第二導電元件,係形成於該第二表面上,且電性連接各該導電通孔;以及使該第一半導體堆疊單元藉其第二導電元件接置於一具有相對之第三表面與第四表面的封裝基板之第三表面上,並於該第一半導體堆疊單元上接置半導體晶片。The present invention further provides a method of fabricating a semiconductor package, comprising: providing a first semiconductor stacked unit, comprising: a semiconductor substrate having opposite first and second surfaces and a plurality of first and second surfaces a first conductive layer formed on the first surface of the semiconductor substrate; a plurality of first conductive elements embedded in the first adhesive layer and exposed on the surface of the first adhesive layer And electrically connecting the conductive vias; and the plurality of second conductive elements are formed on the second surface and electrically connected to the conductive vias; and the first semiconductor stacked unit is supported by the second conductive components And a third surface of the package substrate having the third surface and the fourth surface opposite to each other, and the semiconductor wafer is mounted on the first semiconductor stacked unit.

由上可知,因為本發明係於半導體基板上形成包覆導電元件的永久鍵結的膠材,例如封裝膠體或底膠,然後再研磨該膠材與導電元件,以外露該導電元件,而不需如習知技術般使用暫時性黏著層及移除該暫時性黏著層之步驟,因此不會有黏膠殘留於該半導體基板上的問題,故可有效提高良率。As can be seen from the above, since the present invention forms a permanently bonded adhesive material covering a conductive member on a semiconductor substrate, such as an encapsulant or a primer, and then grinding the adhesive and the conductive member, the conductive member is exposed without It is necessary to use a temporary adhesive layer and a step of removing the temporary adhesive layer as in the prior art, so that there is no problem that the adhesive remains on the semiconductor substrate, so that the yield can be effectively improved.

以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。The other embodiments of the present invention will be readily understood by those skilled in the art from this disclosure.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「上」、「側」、「齊平」及「一」等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。It is to be understood that the structure, the proportions, the size, and the like of the present invention are intended to be used in conjunction with the disclosure of the specification, and are not intended to limit the invention. The conditions are limited, so it is not technically meaningful. Any modification of the structure, change of the proportional relationship or adjustment of the size should remain in this book without affecting the effects and the objectives that can be achieved by the present invention. The technical content disclosed in the invention can be covered. In the meantime, the terms "upper", "side", "smooth" and "one" are used in the description, and are not intended to limit the scope of the invention. Changes or adjustments to the relative relationship are considered to be within the scope of the invention without departing from the scope of the invention.

第一實施例First embodiment

第2A至2F圖所示者,係本發明之半導體堆疊單元、半導體封裝件及其製法之第一實施例的示意圖,其中,第2D’圖係第2D圖之另一實施態樣。2A to 2F are views showing a first embodiment of the semiconductor stacked unit, the semiconductor package, and the method of fabricating the same according to the present invention, wherein the second D' is a second embodiment of the second embodiment.

如第2A圖所示,提供一具有相對之第一表面20a與第二表面20b及複數貫穿該第一表面20a與第二表面20b之導電通孔201之半導體基板20,該半導體基板20係包括至少一晶片或中介層,並於該第一表面20a上形成複數電性連接各該導電通孔201的第一導電元件21a,該第一導電元件21a例如為導電凸塊,接著,使該半導體基板20 藉其第一導電元件21a接置於一承載件22上的膠層23上,該膠層23之材質可例如為底膠(underfill)或封裝膠體,且該膠層23係包覆該第一表面20a與第一導電元件21a,該承載件22係包括一承載板221及其上之剝離層(release layer)222,且該膠層23係形成於該剝離層222上,再於該第二表面20b上形成複數電性連接各該導電通孔201的第二導電元件21b,該第二導電元件21b例如為導電凸塊。As shown in FIG. 2A, a semiconductor substrate 20 having a first surface 20a and a second surface 20b opposite to each other and a plurality of conductive vias 201 extending through the first surface 20a and the second surface 20b is provided. The semiconductor substrate 20 includes At least one wafer or interposer, and forming a plurality of first conductive elements 21a electrically connected to the conductive vias 201 on the first surface 20a, the first conductive elements 21a being, for example, conductive bumps, and then the semiconductor Substrate 20 The material of the adhesive layer 23 can be, for example, an underfill or an encapsulant, and the adhesive layer 23 is coated with the first first conductive member 21a. The surface 20a and the first conductive element 21a, the carrier 22 includes a carrier plate 221 and a release layer 222 thereon, and the adhesive layer 23 is formed on the peeling layer 222, and then the second A plurality of second conductive elements 21b electrically connected to the conductive vias 201 are formed on the surface 20b, and the second conductive elements 21b are, for example, conductive bumps.

如第2B圖所示,移除該承載件22,並使該半導體基板20藉其第二導電元件21b接置於一例如為膠膜的承載片24上。As shown in FIG. 2B, the carrier 22 is removed and the semiconductor substrate 20 is attached to a carrier sheet 24, such as a film, by its second conductive element 21b.

如第2C圖所示,從該膠層23之側研磨移除部分該膠層23與第一導電元件21a,以外露該第一導電元件21a。As shown in FIG. 2C, a portion of the adhesive layer 23 and the first conductive member 21a are removed from the side of the adhesive layer 23 to expose the first conductive member 21a.

如第2D圖所示,進行切單步驟,並移除該承載片24,至此即完成本發明之半導體堆疊單元2;其中,該第一導電元件21a與第二導電元件21b亦可為銅材質之金屬柱,如第2D’圖所示之半導體堆疊單元2’。As shown in FIG. 2D, the dicing step is performed, and the carrier sheet 24 is removed, thereby completing the semiconductor stacking unit 2 of the present invention; wherein the first conductive element 21a and the second conductive element 21b may also be made of copper. A metal post, such as the semiconductor stacking unit 2' shown in FIG. 2D'.

如第2E圖所示,使該半導體堆疊單元2藉其第二導電元件21b接置於一具有相對之第三表面25a與第四表面25b的封裝基板25之第三表面25a上,並於該半導體堆疊單元2與封裝基板25之間形成底膠26,且於該封裝基板25之第四表面25b上設置複數銲球27。As shown in FIG. 2E, the semiconductor stacking unit 2 is placed on the third surface 25a of the package substrate 25 having the third surface 25a and the fourth surface 25b opposite thereto by the second conductive member 21b. A primer 26 is formed between the semiconductor stacking unit 2 and the package substrate 25, and a plurality of solder balls 27 are disposed on the fourth surface 25b of the package substrate 25.

如第2F圖所示,於該第一導電元件21a上接置半導體晶片28,並於該封裝基板25之第三表面25a上形成封 裝膠體29,以包覆該半導體堆疊單元2與半導體晶片28,至此即完成本發明之半導體封裝件。As shown in FIG. 2F, the semiconductor wafer 28 is mounted on the first conductive element 21a, and a sealing is formed on the third surface 25a of the package substrate 25. A colloid 29 is mounted to coat the semiconductor stacked unit 2 and the semiconductor wafer 28, and thus the semiconductor package of the present invention is completed.

第二實施例Second embodiment

第3A至3E圖所示者,係本發明之半導體堆疊單元及其製法之第二實施例的示意圖,其中,第3D’圖係第3D圖之另一實施態樣,第3E圖係第3D圖之應用例。本實施例之作法係大致相同於前一實施例,主要不同之處僅在於本實施例係使半導體堆疊單元上下對稱以減少翹曲(warpage)現象,故在此僅進行簡單的說明。3A to 3E are schematic views showing a second embodiment of the semiconductor stacked unit of the present invention and a method of manufacturing the same, wherein the 3D' is a third embodiment of the 3D drawing, and the 3E is the 3D. The application example of the figure. The embodiment of the present embodiment is substantially the same as the previous embodiment. The main difference is that the present embodiment is such that the semiconductor stacked unit is vertically symmetrical to reduce the warpage phenomenon, and therefore only a brief description will be made herein.

如第3A圖所示,提供一具有相對之第一表面20a與第二表面20b及複數貫穿該第一表面20a與第二表面20b之導電通孔201之半導體基板20,該半導體基板20係包括至少一晶片或中介層,於該第一表面20a上形成複數電性連接各該導電通孔201的第一導電元件21a,該第一導電元件21a例如為導電凸塊,並使該半導體基板20藉其第一導電元件21a接置於一承載件22上的第一膠層23a上,該第一膠層23a之材質可例如為底膠或封裝膠體,且該第一膠層23a係包覆該第一表面20a與第一導電元件21a,該承載件22係包括一承載板221及其上之剝離層222,且該第一膠層23a係形成於該剝離層222上,再於該第二表面20b上形成複數電性連接各該導電通孔201的第二導電元件21b,該第二導電元件21b例如為導電凸塊。As shown in FIG. 3A, a semiconductor substrate 20 having a first surface 20a and a second surface 20b opposite to each other and a plurality of conductive vias 201 extending through the first surface 20a and the second surface 20b is provided. The semiconductor substrate 20 includes A first conductive element 21a electrically connected to each of the conductive vias 201 is formed on the first surface 20a, and the first conductive element 21a is, for example, a conductive bump, and the semiconductor substrate 20 is formed on the first surface 20a. The first adhesive layer 21a is attached to the first adhesive layer 23a of the carrier member 22. The material of the first adhesive layer 23a can be, for example, a primer or an encapsulant, and the first adhesive layer 23a is coated. The first surface 20a and the first conductive element 21a, the carrier 22 includes a carrier plate 221 and a release layer 222 thereon, and the first adhesive layer 23a is formed on the release layer 222, and then A plurality of second conductive elements 21b electrically connected to the conductive vias 201 are formed on the two surfaces 20b, and the second conductive elements 21b are, for example, conductive bumps.

如第3B圖所示,於該第二表面20b上形成例如為底膠或封裝膠體的第二膠層23b,且該第二膠層23b包覆該 第二導電元件21b,並從該第二膠層23b之側研磨移除部分該第二膠層23b與第二導電元件21b,以外露該第二導電元件21b。As shown in FIG. 3B, a second adhesive layer 23b, such as a primer or an encapsulant, is formed on the second surface 20b, and the second adhesive layer 23b covers the second adhesive layer 23b. The second conductive element 21b, and the portion of the second adhesive layer 23b and the second conductive member 21b are removed from the side of the second adhesive layer 23b to expose the second conductive member 21b.

如第3C圖所示,移除該承載件22,並使該半導體基板20藉其第二導電元件21b與第二膠層23b接置於一例如為膠膜的承載片24上。As shown in FIG. 3C, the carrier 22 is removed, and the semiconductor substrate 20 is attached to the carrier sheet 24, such as a film, by the second conductive member 21b and the second adhesive layer 23b.

如第3D圖所示,從該第一膠層23a之側研磨移除部分該第一膠層23a與第一導電元件21a,以外露該第一導電元件21a,並進行切單步驟,且移除該承載片24,至此即完成本發明之半導體堆疊單元3;其中,該第一導電元件21a與第二導電元件21b亦可為銅材質之金屬柱,如第3D’圖所示之半導體堆疊單元3’。As shown in FIG. 3D, a portion of the first adhesive layer 23a and the first conductive member 21a are removed from the side of the first adhesive layer 23a, the first conductive member 21a is exposed, and a singulation step is performed, and the step is performed. In addition to the carrier sheet 24, the semiconductor stacking unit 3 of the present invention is completed; wherein the first conductive element 21a and the second conductive element 21b may also be metal pillars of copper material, such as the semiconductor stack shown in FIG. 3D' Unit 3'.

如第3E圖所示,將第3D圖之半導體堆疊單元3(第二半導體堆疊單元)設於第2F圖之半導體堆疊單元2(第一半導體堆疊單元)與半導體晶片28之間,而構成另一種半導體封裝件,要注意的是,除了該半導體堆疊單元3(第二半導體堆疊單元)之外,該半導體堆疊單元2(第一半導體堆疊單元)與半導體晶片28之間亦可設置具有矽貫孔(TSV)之晶片或中介板(interposer)。As shown in FIG. 3E, the semiconductor stacking unit 3 (second semiconductor stacked unit) of FIG. 3D is disposed between the semiconductor stacked unit 2 (first semiconductor stacked unit) of FIG. 2F and the semiconductor wafer 28, and constitutes another A semiconductor package, it is to be noted that, besides the semiconductor stacked unit 3 (second semiconductor stacked unit), the semiconductor stacked unit 2 (first semiconductor stacked unit) and the semiconductor wafer 28 may be disposed to have a continuity A wafer or interposer of a via (TSV).

本發明復提供一種半導體堆疊單元,係包括:半導體基板20,係具有相對之第一表面20a與第二表面20b及複數貫穿該第一表面20a與第二表面20b之導電通孔201;第一膠層23a,係形成於該半導體基板20之第一表面20a上;複數第一導電元件21a,係嵌埋於該第一膠層23a中, 並外露於該第一膠層23a之表面,且電性連接各該導電通孔201;以及複數第二導電元件21b,係形成於該第二表面20b上,且電性連接各該導電通孔201。The present invention further provides a semiconductor stacking unit comprising: a semiconductor substrate 20 having a first surface 20a and a second surface 20b opposite to each other and a plurality of conductive vias 201 extending through the first surface 20a and the second surface 20b; The adhesive layer 23a is formed on the first surface 20a of the semiconductor substrate 20; the plurality of first conductive elements 21a are embedded in the first adhesive layer 23a. And being exposed on the surface of the first adhesive layer 23a, and electrically connecting the conductive vias 201; and the plurality of second conductive elements 21b are formed on the second surface 20b, and electrically connected to the conductive vias 201.

於本發明之半導體堆疊單元中,該第一導電元件21a係齊平於該第一膠層23a之表面,該半導體基板20係包括至少一晶片或中介層,該第一膠層23a係為底膠或封裝膠體,該第一導電元件21a係為導電凸塊或金屬柱,且該第二導電元件21b係為導電凸塊或金屬柱。In the semiconductor stacking unit of the present invention, the first conductive element 21a is flush with the surface of the first adhesive layer 23a, and the semiconductor substrate 20 includes at least one wafer or interposer, and the first adhesive layer 23a is a bottom. The first conductive element 21a is a conductive bump or a metal pillar, and the second conductive component 21b is a conductive bump or a metal pillar.

所述之半導體堆疊單元中,復包括第二膠層23b,係形成於該半導體基板20之第二表面20b上,並包覆該第二導電元件21b,且該第二導電元件21b係外露於該第二膠層23b之表面,該第二膠層23b係為底膠或封裝膠體,該第二導電元件21b係齊平於該第二膠層23b之表面。The semiconductor stacking unit further includes a second adhesive layer 23b formed on the second surface 20b of the semiconductor substrate 20 and covering the second conductive component 21b, and the second conductive component 21b is exposed The surface of the second adhesive layer 23b is a primer or encapsulant, and the second conductive member 21b is flush with the surface of the second adhesive layer 23b.

本發明復提供一種半導體封裝件,係包括:半導體堆疊單元,係包括:半導體基板20,係具有相對之第一表面20a與第二表面20b及複數貫穿該第一表面20a與第二表面20b之導電通孔201;第一膠層23a,係形成於該半導體基板20之第一表面20a上;複數第一導電元件21a,係嵌埋於該第一膠層23a中,並外露於該第一膠層23a之表面,且電性連接各該導電通孔201;以及複數第二導電元件21b,係形成於該第二表面20b上,且電性連接各該導電通孔201;封裝基板25,係具有相對之第三表面25a與第四表面25b,該半導體堆疊單元係藉其第二導電元件21b接置於該第三表面25a上;半導體晶片28,係接置於該第一 導電元件21a上;以及封裝膠體29,係形成於該封裝基板25上,以包覆該半導體堆疊單元與半導體晶片28。The present invention further provides a semiconductor package, comprising: a semiconductor stacking unit, comprising: a semiconductor substrate 20 having opposite first and second surfaces 20a and 20b and a plurality of first and second surfaces 20a and 20b a first conductive layer 21a is formed on the first surface 20a of the semiconductor substrate 20; a plurality of first conductive elements 21a are embedded in the first adhesive layer 23a and exposed to the first a surface of the adhesive layer 23a, and electrically connected to each of the conductive vias 201; and a plurality of second conductive elements 21b formed on the second surface 20b, and electrically connected to each of the conductive vias 201; the package substrate 25, Corresponding to the third surface 25a and the fourth surface 25b, the semiconductor stacked unit is attached to the third surface 25a by the second conductive element 21b; the semiconductor wafer 28 is tied to the first surface The conductive member 21a; and the encapsulant 29 are formed on the package substrate 25 to encapsulate the semiconductor stacked unit and the semiconductor wafer 28.

於所述之半導體封裝件中,該第一導電元件21a係齊平於該第一膠層23a之表面,並復包括底膠26,係形成於該半導體堆疊單元與封裝基板25之間,且復包括複數銲球27,係設置於該封裝基板25之第四表面25b上。In the semiconductor package, the first conductive element 21a is flush with the surface of the first adhesive layer 23a, and includes a primer 26 formed between the semiconductor stacked unit and the package substrate 25, and The plurality of solder balls 27 are disposed on the fourth surface 25b of the package substrate 25.

綜上所述,相較於習知技術,由於本發明係於半導體基板上形成包覆導電元件的永久鍵結的膠層,例如封裝膠體或底膠,然後再研磨該膠層與導電元件,以外露該導電元件,而不需如習知技術般使用暫時性黏著層及移除該暫時性黏著層之步驟,因此不會有黏膠殘留於該半導體基板上的問題,故可有效提高良率。In summary, the present invention is based on the invention to form a permanently bonded adhesive layer covering a conductive member on a semiconductor substrate, such as an encapsulant or a primer, and then grinding the adhesive layer and the conductive member. Excluding the conductive element without using the temporary adhesive layer and removing the temporary adhesive layer as in the prior art, so that there is no problem that the adhesive remains on the semiconductor substrate, so that the good adhesion can be effectively improved. rate.

上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。The above embodiments are intended to illustrate the principles of the invention and its effects, and are not intended to limit the invention. Any of the above-described embodiments may be modified by those skilled in the art without departing from the spirit and scope of the invention. Therefore, the scope of protection of the present invention should be as set forth in the appended claims.

10,20‧‧‧半導體基板10,20‧‧‧Semiconductor substrate

10a,20a‧‧‧第一表面10a, 20a‧‧‧ first surface

10b,20b‧‧‧第二表面10b, 20b‧‧‧ second surface

101,201‧‧‧導電通孔101,201‧‧‧Electrical through hole

11a‧‧‧第一導電凸塊11a‧‧‧First conductive bump

11b‧‧‧第二導電凸塊11b‧‧‧Second conductive bump

12‧‧‧暫時性黏著層12‧‧‧ Temporary adhesive layer

13,221‧‧‧承載板13,221‧‧‧ carrying board

14,222‧‧‧剝離層14,222‧‧‧ peeling layer

15‧‧‧切割用膠膜15‧‧‧Cutting film

2,2’,3,3’‧‧‧半導體堆疊單元2,2’,3,3’‧‧‧Semiconductor stacking unit

21a‧‧‧第一導電元件21a‧‧‧First conductive element

21b‧‧‧第二導電元件21b‧‧‧Second conductive element

22‧‧‧承載件22‧‧‧Carrier

23‧‧‧膠層23‧‧‧ glue layer

23a‧‧‧第一膠層23a‧‧‧First layer

23b‧‧‧第二膠層23b‧‧‧Second layer

24‧‧‧承載片24‧‧‧Carrier

25‧‧‧封裝基板25‧‧‧Package substrate

25a‧‧‧第三表面25a‧‧‧ third surface

25b‧‧‧第四表面25b‧‧‧ fourth surface

26‧‧‧底膠26‧‧‧Bottom glue

27‧‧‧銲球27‧‧‧ solder balls

28‧‧‧半導體晶片28‧‧‧Semiconductor wafer

29‧‧‧封裝膠體29‧‧‧Package colloid

第1A與1B圖所示者係習知之穿矽中介板及其製法之剖視圖;第2A至2F圖所示者係本發明之半導體堆疊單元、半導體封裝件及其製法之第一實施例的示意圖,其中,第2D’圖係第2D圖之另一實施態樣;以及第3A至3E圖所示者係本發明之半導體堆疊單元及其 製法之第二實施例的示意圖,其中,第3D’圖係第3D圖之另一實施態樣,第3E圖係第3D圖之應用例。1A and 1B are cross-sectional views of a conventional piercing interposer and a method of manufacturing the same; and FIGS. 2A to 2F are schematic views showing a first embodiment of a semiconductor stacking unit, a semiconductor package, and a method of manufacturing the same according to the present invention; Wherein the 2D' diagram is another embodiment of the 2D diagram; and the 3A to 3E diagrams are the semiconductor stacking unit of the present invention and A schematic diagram of a second embodiment of the method, wherein the third embodiment is a third embodiment of the third embodiment, and the third embodiment is an application example of the third embodiment.

2‧‧‧半導體堆疊單元2‧‧‧Semiconductor stacking unit

20‧‧‧半導體基板20‧‧‧Semiconductor substrate

20a‧‧‧第一表面20a‧‧‧ first surface

20b‧‧‧第二表面20b‧‧‧second surface

201‧‧‧導電通孔201‧‧‧ conductive vias

21a‧‧‧第一導電元件21a‧‧‧First conductive element

21b‧‧‧第二導電元件21b‧‧‧Second conductive element

23‧‧‧膠層23‧‧‧ glue layer

Claims (21)

一種半導體堆疊單元之製法,係包括:提供一具有相對之第一表面與第二表面及複數貫穿該第一表面與第二表面之導電通孔之半導體基板;於該半導體基板之第一表面上形成複數電性連接各該導電通孔的第一導電元件;使該半導體基板接置於一承載件上的永久鍵結的膠層上,且該膠層係包覆該半導體基板之整個該第一表面與該第一導電元件;於該半導體基板之第二表面上形成複數電性連接各該導電通孔的第二導電元件,並移除該承載件以外露出永久鍵結的該膠層;使該半導體基板藉其第二導電元件接置於一承載片上;從該膠層之側研磨移除部分該膠層,以外露該第一導電元件;進行切單步驟,以使該膠層之側表面齊平於該半導體基板之側表面;以及移除該承載片。 A semiconductor stacking unit is provided, comprising: providing a semiconductor substrate having opposite first and second surfaces and a plurality of conductive vias penetrating the first surface and the second surface; on the first surface of the semiconductor substrate Forming a plurality of first conductive elements electrically connected to the conductive vias; the semiconductor substrate is attached to the permanently bonded adhesive layer on a carrier, and the adhesive layer covers the entire surface of the semiconductor substrate a surface and the first conductive element; forming a plurality of second conductive elements electrically connected to the conductive vias on the second surface of the semiconductor substrate, and removing the adhesive layer exposed outside the carrier; The semiconductor substrate is placed on a carrier by its second conductive component; a portion of the adhesive layer is removed from the side of the adhesive layer to expose the first conductive component; and a singulation step is performed to make the adhesive layer The side surface is flush with the side surface of the semiconductor substrate; and the carrier sheet is removed. 如申請專利範圍第1項所述之半導體堆疊單元之製法,其中,該承載件係包括一承載板及其上之剝離層,且該膠層係形成於該剝離層上。 The method of manufacturing a semiconductor stacking unit according to claim 1, wherein the carrier comprises a carrier plate and a release layer thereon, and the adhesive layer is formed on the release layer. 如申請專利範圍第1項所述之半導體堆疊單元之製法,其中,該半導體基板係包括至少一晶片或中介層。 The method of fabricating a semiconductor stacking unit according to claim 1, wherein the semiconductor substrate comprises at least one wafer or an interposer. 如申請專利範圍第1項所述之半導體堆疊單元之製法,其中,該膠層係為底膠或封裝膠體。 The method of manufacturing a semiconductor stacking unit according to claim 1, wherein the adhesive layer is a primer or an encapsulant. 如申請專利範圍第1項所述之半導體堆疊單元之製法,其中,該第一導電元件係為導電凸塊或金屬柱,且該第二導電元件係為導電凸塊或金屬柱。 The method of manufacturing a semiconductor stacking unit according to claim 1, wherein the first conductive element is a conductive bump or a metal pillar, and the second conductive component is a conductive bump or a metal pillar. 如申請專利範圍第1項所述之半導體堆疊單元之製法,其中,該承載片係為膠膜。 The method of manufacturing a semiconductor stacking unit according to claim 1, wherein the carrier sheet is a film. 如申請專利範圍第1項所述之半導體堆疊單元之製法,其中,研磨移除部分該膠層復包括研磨移除部分該第一導電元件。 The method of fabricating a semiconductor stacking unit according to claim 1, wherein the grinding removing portion of the adhesive layer comprises grinding the removed portion of the first conductive member. 一種半導體堆疊單元之製法,係包括:提供一具有相對之第一表面與第二表面及複數貫穿該第一表面與第二表面之導電通孔之半導體基板;於該半導體基板之第一表面上形成複數電性連接各該導電通孔的第一導電元件;使該半導體基板接置於一承載件上的永久鍵結的第一膠層上,且該第一膠層係包覆該半導體基板之整個該第一表面與該第一導電元件;於該半導體基板之第二表面上形成複數電性連接各該導電通孔的第二導電元件;於該半導體基板之第二表面上形成第二膠層,且該第二膠層包覆該第二導電元件;從該第二膠層之側研磨移除部分該第二膠層,以外露該第二導電元件; 移除該承載件以外露出永久鍵結的該第一膠層,並使該半導體基板藉其第二導電元件與第二膠層接置於一承載片上;從該第一膠層之側研磨移除部分該第一膠層,以外露該第一導電元件;進行切單步驟,以使該第一膠層之側表面齊平於該半導體基板之側表面;以及移除該承載片。 A semiconductor stacking unit is provided, comprising: providing a semiconductor substrate having opposite first and second surfaces and a plurality of conductive vias penetrating the first surface and the second surface; on the first surface of the semiconductor substrate Forming a plurality of first conductive elements electrically connected to the conductive vias; the semiconductor substrate is attached to the first adhesive layer of the permanent bond on a carrier, and the first adhesive layer covers the semiconductor substrate And forming a second electrically conductive element electrically connected to each of the conductive vias on the second surface of the semiconductor substrate; forming a second surface on the second surface of the semiconductor substrate a second adhesive layer, and the second adhesive layer covers the second conductive member; and the second adhesive layer is removed from the side of the second adhesive layer to expose the second conductive member; Removing the first adhesive layer that is permanently bonded outside the carrier, and attaching the semiconductor substrate to the carrier by the second conductive component and the second adhesive layer; grinding from the side of the first adhesive layer Except for a portion of the first adhesive layer, the first conductive member is exposed; a singulation step is performed to make a side surface of the first adhesive layer flush with a side surface of the semiconductor substrate; and the carrier sheet is removed. 如申請專利範圍第8項所述之半導體堆疊單元之製法,其中,研磨移除部分該第二膠層復包括研磨移除部分該第二導電元件。 The method of fabricating a semiconductor stacking unit according to claim 8, wherein the grinding removing portion of the second adhesive layer comprises grinding the removed portion of the second conductive member. 如申請專利範圍第8項所述之半導體堆疊單元之製法,其中,研磨移除部分該第一膠層復包括研磨移除部分該第一導電元件。 The method of fabricating a semiconductor stacking unit according to claim 8, wherein the grinding removing portion of the first adhesive layer comprises grinding the removed portion of the first conductive member. 如申請專利範圍第8項所述之半導體堆疊單元之製法,其中,該承載件係包括一承載板及其上之剝離層,且該第一膠層係形成於該剝離層上。 The method of manufacturing a semiconductor stacking unit according to claim 8, wherein the carrier comprises a carrier plate and a release layer thereon, and the first adhesive layer is formed on the release layer. 如申請專利範圍第8項所述之半導體堆疊單元之製法,其中,該半導體基板係包括至少一晶片或中介層。 The method of fabricating a semiconductor stacking unit according to claim 8, wherein the semiconductor substrate comprises at least one wafer or an interposer. 如申請專利範圍第8項所述之半導體堆疊單元之製法,其中,該第一膠層係為底膠或封裝膠體,且該第二膠層係為底膠或封裝膠體。 The method for manufacturing a semiconductor stacking unit according to claim 8, wherein the first adhesive layer is a primer or an encapsulant, and the second adhesive layer is a primer or an encapsulant. 如申請專利範圍第8項所述之半導體堆疊單元之製法,其中,該第一導電元件係為導電凸塊或金屬柱, 且該第二導電元件係為導電凸塊或金屬柱。 The method of manufacturing a semiconductor stacking unit according to claim 8, wherein the first conductive element is a conductive bump or a metal pillar. And the second conductive element is a conductive bump or a metal pillar. 如申請專利範圍第8項所述之半導體堆疊單元之製法,其中,該承載片係為膠膜。 The method of manufacturing a semiconductor stacking unit according to claim 8, wherein the carrier sheet is a film. 一種半導體封裝件之製法,係包括:提供一第一半導體堆疊單元,係包括:半導體基板,係具有相對之第一表面與第二表面及複數貫穿該第一表面與第二表面之導電通孔;第一膠層,係形成於該半導體基板之整個該第一表面上,且該第一膠層之側表面齊平於該半導體基板之側表面;複數第一導電元件,係嵌埋於該第一膠層中,並外露於該第一膠層之表面,且電性連接各該導電通孔;以及複數第二導電元件,係形成於該半導體基板之第二表面上,且電性連接各該導電通孔;其中,該第一半導體堆疊單元之製程包括:使該半導體基板接置於一承載件上的永久鍵結的該第一膠層上,並於形成該些第二導電元件後移除該承載件以外露出永久鍵結的該第一膠層,且使該半導體基板藉其第二導電元件接置於一承載片上,再於切單步驟後移除該承載片;以及使該第一半導體堆疊單元藉其第二導電元件接置於一具有相對之第三表面與第四表面的封裝基板之第 三表面上,並於該第一半導體堆疊單元上接置半導體晶片。 A method of fabricating a semiconductor package, comprising: providing a first semiconductor stacked unit, comprising: a semiconductor substrate having opposite first and second surfaces and a plurality of conductive vias extending through the first surface and the second surface a first adhesive layer is formed on the entire first surface of the semiconductor substrate, and a side surface of the first adhesive layer is flush with a side surface of the semiconductor substrate; a plurality of first conductive elements are embedded in the first adhesive layer The first adhesive layer is exposed on the surface of the first adhesive layer and electrically connected to each of the conductive vias; and the plurality of second conductive elements are formed on the second surface of the semiconductor substrate and electrically connected Each of the conductive vias; wherein the process of the first semiconductor stacked unit comprises: bonding the semiconductor substrate to the first adhesive layer permanently bonded on a carrier, and forming the second conductive components After removing the first adhesive layer that is permanently bonded outside the carrier, and the semiconductor substrate is placed on a carrier by the second conductive component, and then removing the carrier after the singulation step; The The semiconductor stacking unit by means of which a second electrically conductive contact element disposed on a package substrate having opposite third and fourth surfaces of the On the three surfaces, a semiconductor wafer is attached to the first semiconductor stacked unit. 如申請專利範圍第16項所述之半導體封裝件之製法,其中,該第一導電元件係齊平於該第一膠層之表面。 The method of fabricating a semiconductor package according to claim 16, wherein the first conductive element is flush with a surface of the first adhesive layer. 如申請專利範圍第16項所述之半導體封裝件之製法,復包括於該封裝基板上形成封裝膠體,以包覆該第一半導體堆疊單元與半導體晶片。 The method of fabricating a semiconductor package according to claim 16, further comprising forming an encapsulant on the package substrate to encapsulate the first semiconductor stacked unit and the semiconductor wafer. 如申請專利範圍第16項所述之半導體封裝件之製法,復包括於該第一半導體堆疊單元與封裝基板之間形成底膠。 The method of fabricating a semiconductor package according to claim 16, further comprising forming a primer between the first semiconductor stacked unit and the package substrate. 如申請專利範圍第16項所述之半導體封裝件之製法,復包括於該第一半導體堆疊單元與半導體晶片之間設置具有矽貫孔之晶片、中介板或第二半導體堆疊單元。 The method of fabricating a semiconductor package according to claim 16, further comprising a wafer, an interposer or a second semiconductor stacking unit having a via hole disposed between the first semiconductor stacked unit and the semiconductor wafer. 如申請專利範圍第16項所述之半導體封裝件之製法,復包括於該封裝基板之第四表面上設置複數銲球。The method of fabricating a semiconductor package according to claim 16, wherein the plurality of solder balls are disposed on the fourth surface of the package substrate.
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