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TWI476896B - Multi-chip module and manufacturing method thereof - Google Patents

Multi-chip module and manufacturing method thereof Download PDF

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Publication number
TWI476896B
TWI476896B TW100132230A TW100132230A TWI476896B TW I476896 B TWI476896 B TW I476896B TW 100132230 A TW100132230 A TW 100132230A TW 100132230 A TW100132230 A TW 100132230A TW I476896 B TWI476896 B TW I476896B
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Taiwan
Prior art keywords
wafer
current
high voltage
power switch
voltage component
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TW100132230A
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Chinese (zh)
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TW201312728A (en
Inventor
Chien Fu Tang
Isaac Y Chen
Jiun Hung Pan
Peng Ju Lan
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Richtek Technology Corp
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Publication of TWI476896B publication Critical patent/TWI476896B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48257Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a die pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4911Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
    • H01L2224/49111Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49171Fan-out arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

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  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Description

多晶片模組及其製造方法Multi-chip module and method of manufacturing same

本發明係有關一種多晶片模組及其製造方法,特別是指一種將高壓元件晶片與低壓控制晶片固定於同一晶片座之多晶片模組及其製造方法。The present invention relates to a multi-wafer module and a method of fabricating the same, and more particularly to a multi-wafer module in which a high-voltage component wafer and a low-voltage control wafer are fixed to the same wafer holder and a method of fabricating the same.

第1圖顯示一種典型的電源供應電路,其中,多晶片模組10中的低壓控制晶片14,根據反馳式(flyback)的回授訊號FB,以及電流感測訊號CS,操作高壓元件晶片12中的功率開關,以將輸入電壓Vin轉換為輸出電壓Vout。1 shows a typical power supply circuit in which a low voltage control chip 14 in a multi-chip module 10 operates a high voltage component wafer 12 in accordance with a flyback feedback signal FB and a current sense signal CS. The power switch in the middle to convert the input voltage Vin into an output voltage Vout.

請參閱第2A圖,顯示多晶片模組10一種先前技術的安排方式。如圖所示,多晶片模組10包含高壓元件晶片12與低壓控制晶片14。其中,高壓元件晶片12固定於專用的晶片座11上;且低壓控制晶片14固定於另一個專用的晶片座13上。一般而言,高壓元件與低壓元件的製程不同,分別製造的成本較同時製造於同一基板上來得低,因此分別製造成為高壓元件晶片12與低壓控制晶片14是很普遍的方式;此外,高壓元件若為垂直式的元件,則其基板表面具有電位,因此,高壓元件晶片12與低壓控制晶片14不宜同時固定於同一晶片座上,以免相互影響,甚至造成短路,其具體實施方式,如第2A圖所示,將高壓元件晶片12與低壓控制晶片14固定於不同的晶片座11與13上,並將其封裝於同一模組中。這種先前技術的優點在於:整合高壓元件晶片12與低壓控制晶片14於單一封裝之內,並避免晶片訊號相互的干擾影響。Referring to Figure 2A, a prior art arrangement of the multi-chip module 10 is shown. As shown, the multi-wafer module 10 includes a high voltage component wafer 12 and a low voltage control wafer 14. The high voltage component wafer 12 is fixed to the dedicated wafer holder 11; and the low voltage control wafer 14 is fixed to the other dedicated wafer holder 13. In general, the manufacturing process of the high-voltage component and the low-voltage component is different, and the manufacturing cost is lower than that of manufacturing the same substrate at the same time. Therefore, it is common to manufacture the high-voltage component wafer 12 and the low-voltage control wafer 14 respectively; If it is a vertical component, the surface of the substrate has a potential. Therefore, the high-voltage component wafer 12 and the low-voltage control wafer 14 are not preferably fixed on the same wafer holder at the same time, so as to avoid mutual influence or even cause a short circuit. The specific implementation manner is as shown in FIG. 2A. As shown, the high voltage component wafer 12 and the low voltage control wafer 14 are mounted on different wafer holders 11 and 13 and packaged in the same module. An advantage of this prior art is that the high voltage component die 12 and the low voltage control die 14 are integrated within a single package and the interference effects of the wafer signals are avoided.

第2B圖顯示第2A圖中,AA切線的剖面圖。如圖所示,分開的晶片座11與晶片座13上,分別固定高壓元件晶片12與低壓控制晶片14,且其晶片間,利用金屬導線15相互耦接,以傳送訊號。這種先前技術的缺點是:晶片固定於單一專屬晶片座,因此每一晶片座的面積相對於共用晶片座的安排方式小,如此一來,其散熱的效率相對較差。此外,低壓控制晶片14中的溫度感測器(未示出)無法感測高壓元件晶片12(或感測準確度較差)的溫度,以於溫度過高時啟動過溫保護(over temperature protection,OTP)。上述先前技術例如可見於美國專利申請案第2007/0200537號。Fig. 2B is a cross-sectional view showing the AA tangent line in Fig. 2A. As shown in the figure, the high-voltage component wafer 12 and the low-voltage control wafer 14 are respectively fixed on the separate wafer holder 11 and the wafer holder 13, and the wafers are coupled to each other by metal wires 15 to transmit signals. A disadvantage of this prior art is that the wafer is fixed to a single dedicated wafer holder, so that the area of each wafer holder is small relative to the arrangement of the common wafer holder, so that the heat dissipation efficiency is relatively poor. In addition, a temperature sensor (not shown) in the low voltage control wafer 14 cannot sense the temperature of the high voltage component wafer 12 (or the sensing accuracy is poor) to initiate over temperature protection when the temperature is too high. OTP). The above prior art is described, for example, in U.S. Patent Application Serial No. 2007/0200537.

第3A-3C圖顯示另一種多晶片模組20安排方式的先前技術。相較於前述先前技術,此先前技術係將高壓元件與低壓元件整合於單一(monolithic)晶片22中。如第3A圖所示,晶片座21將單一晶片22固定於其上,如此一來,晶片座21相較於前述之先前技術中,分開的晶片座11與13,本先前技術的散熱面積較大,具有較佳的散熱效果。第3B圖分別以簡圖顯示單一晶片22的上視圖,如圖所示,高壓元件221與低壓元件222整合於單一晶片22中。第3C圖顯示第2A圖中,AA切線的剖面圖。但這種先前技術的缺點在於,高壓元件需要與低壓元件同時於同一基板上製造,其製造成本較高;此外,高壓元件與低壓元件於同一基板上,容易產生訊號相互影響的雜訊問題,例如串擾(crosstalk)等問題。Figures 3A-3C show prior art of another multi-wafer module 20 arrangement. This prior art integrates high voltage components and low voltage components into a monolithic wafer 22 as compared to the prior art described above. As shown in FIG. 3A, the wafer holder 21 has a single wafer 22 secured thereto, such that the wafer holder 21 has a lower heat dissipation area than the prior art, the separate wafer holders 11 and 13 of the prior art. Large, with better heat dissipation. 3B shows a top view of a single wafer 22, respectively, in a simplified view, with the high voltage component 221 and the low voltage component 222 integrated into a single wafer 22 as shown. Fig. 3C is a cross-sectional view showing the line AA in Fig. 2A. However, the disadvantage of this prior art is that the high voltage component needs to be fabricated on the same substrate as the low voltage component at the same time, and the manufacturing cost thereof is high. Moreover, the high voltage component and the low voltage component are on the same substrate, and the noise problem of signal mutual influence is easily generated. For example, crosstalk and other issues.

有鑑於此,本發明即針對上述先前技術之不足,提出一種將高壓元件晶片與低壓控制晶片固定於同一晶片座之多晶片模組及其製造方法,可改善晶片散熱問題,並且不需要增加製造成本。In view of the above, the present invention is directed to the deficiencies of the prior art described above, and provides a multi-chip module in which a high-voltage component wafer and a low-voltage control wafer are fixed on the same wafer holder, and a manufacturing method thereof, which can improve the heat dissipation problem of the wafer and does not require an increase in manufacturing. cost.

本發明目的之一在提供一種多晶片模組。One of the objects of the present invention is to provide a multi-wafer module.

本發明另一目的在提供一種多晶片模組製造方法。Another object of the present invention is to provide a method of fabricating a multi-wafer module.

為達上述之目的,就其中一觀點言,本發明提供了一種多晶片模組,包含:一高壓元件晶片,其具有至少一功率開關;一低壓控制晶片,其藉由金屬導線與該高壓元件晶片耦接;單一晶片座,用以將該高壓元件晶片與該低壓控制晶片固定於其上;以及複數引腳,藉由該晶片座之一延伸部或金屬導線與該單一晶片座耦接。In order to achieve the above object, in one aspect, the present invention provides a multi-chip module comprising: a high voltage component wafer having at least one power switch; and a low voltage control wafer by a metal wire and the high voltage component a wafer coupling; a single wafer holder for mounting the high voltage component wafer and the low voltage control wafer thereon; and a plurality of pins coupled to the single wafer holder by an extension or metal wire of the wafer holder.

在其中一種實施型態中,其中該高壓元件晶片宜包括:一橫向(lateral)金屬氧化物半導體場效電晶體(metal oxide semiconductor field effect transistor,MOSFET)功率開關;以及一橫向空乏型啟動開關。In one embodiment, the high voltage device chip preferably includes: a lateral metal oxide semiconductor field effect transistor (MOSFET) power switch; and a lateral depletion start switch.

所述多晶片模組,其中該高壓元件晶片可更包含一熱二極體用以感測溫度。The multi-chip module, wherein the high voltage device chip further comprises a thermal diode for sensing temperature.

在另一種實施型態中,其中該橫向空乏型啟動開關宜具有一橫向空乏型MOSFET或一橫向空乏型接面場效電晶體(junction field effect transistor,JFET)。In another embodiment, the lateral depletion start switch preferably has a lateral depletion MOSFET or a lateral depletion junction field effect transistor (JFET).

在另一種實施型態中,其中該功率開關具有一第一電流流入端、一第一控制端、以及一第一電流流出端,藉由該第一控制端的操作,控制一開關電流流入該第一電流流入端,並自該第一電流流出端流出;該高壓元件晶片更包括一取樣電晶體,用以取樣該開關電流,其包含:一第二電流流入端,包含於該第一電流流入端;一第二控制端,包含於該第一控制端;以及一第二電流流出端,與該第一電流流出端流出隔絕,並產生一與該開關電流具有一比例之取樣電流。In another embodiment, the power switch has a first current inflow end, a first control end, and a first current outflow end, and by the operation of the first control end, controlling a switch current to flow into the first a current flowing into the end and flowing out from the first current outflow end; the high voltage component chip further includes a sampling transistor for sampling the switching current, comprising: a second current inflow end, included in the first current inflow a second control terminal is included in the first control terminal; and a second current outflow terminal is isolated from the first current outflow terminal and generates a sampling current proportional to the switch current.

就另一觀點,本發明也提供了一種多晶片模組製造方法,包含:提供一高壓元件晶片,其具有至少一功率開關;藉由金屬導線將該高壓元件晶片耦接至一低壓控制晶片;將該高壓元件晶片與該低壓控制晶片固定於單一晶片座;以及藉由該晶片座之一延伸部或金屬導線將該單一晶片座耦接至複數引腳。In another aspect, the present invention also provides a method for fabricating a multi-chip module, comprising: providing a high voltage device chip having at least one power switch; coupling the high voltage device wafer to a low voltage control wafer by a metal wire; The high voltage device wafer and the low voltage control wafer are fixed to a single wafer holder; and the single wafer holder is coupled to the plurality of pins by an extension or metal wire of the wafer holder.

底下藉由具體實施例詳加說明,當更容易瞭解本發明之目的、技術內容、特點及其所達成之功效。The purpose, technical content, features and effects achieved by the present invention will be more readily understood by the detailed description of the embodiments.

請參閱第4A與第4B圖,顯示本發明第一個實施例,多晶片模組30中包含具有至少一功率開關之高壓元件晶片32、低壓控制晶片34、單一晶片座31與複數引腳37。如第4A圖所示,低壓控制晶片34其藉由金屬導線35與高壓元件晶片32耦接。並且,高壓元件晶片32與低壓控制晶片34皆固定於單一晶片座31上,如第4B圖所示之第4A圖中CC剖線之剖視圖。此外,複數引腳37藉由晶片座31之延伸部39或金屬導線35與單一晶片座31上之高壓元件晶片32與低壓控制晶片34耦接。Referring to FIGS. 4A and 4B, a first embodiment of the present invention is shown. The multi-chip module 30 includes a high voltage component wafer 32 having at least one power switch, a low voltage control wafer 34, a single wafer holder 31 and a plurality of pins 37. . As shown in FIG. 4A, the low voltage control wafer 34 is coupled to the high voltage device wafer 32 by metal wires 35. Further, both the high voltage element wafer 32 and the low voltage control wafer 34 are fixed to the single wafer holder 31, as shown in the cross-sectional view taken along line CC in Fig. 4A shown in Fig. 4B. In addition, the plurality of pins 37 are coupled to the low voltage control wafer 34 by the extensions 39 or metal wires 35 of the wafer holder 31 and the high voltage device wafer 32 on the single wafer holder 31.

為使高壓元件晶片32與低壓控制晶片34可固定於單一晶片座31上,且為避免如先前技術所述之垂直式高壓元件的基板表面與低壓控制晶片之基板表面具有不同的電位;本實施例之高壓元件晶片32可以但不限於包括:橫向金屬氧化物半導體場效電晶體(metal oxide semiconductor field effect transistor,MOSFET)功率開關;以及/或橫向空乏型啟動開關。由於橫向高壓元件與垂直式高壓元件不同,其基板表面與低壓控制晶片之基板表面具有相同電位(接地),因此可以固定於同一晶片座31上。In order to prevent the high voltage component chip 32 and the low voltage control wafer 34 from being fixed on the single wafer holder 31, and to avoid the substrate surface of the vertical high voltage component and the substrate surface of the low voltage control wafer as described in the prior art, the potential is different; The high voltage component wafer 32 can be, but is not limited to, comprising: a lateral metal oxide semiconductor field effect transistor (MOSFET) power switch; and/or a lateral depletion start switch. Since the lateral high voltage element is different from the vertical high voltage element, the surface of the substrate has the same potential (ground) as the surface of the substrate of the low voltage control wafer, and thus can be fixed to the same wafer holder 31.

其中,高壓元件晶片32中,可以但不限於包括如熱二極體(thermal diode),可用以感測溫度,進而對高壓元件加以控制,以進一步避免晶片過熱。The high voltage component chip 32 can be, but is not limited to, including, for example, a thermal diode, which can be used to sense the temperature and thereby control the high voltage component to further prevent the wafer from overheating.

此外,上述橫向空乏型啟動開關例如但不限於為橫向空乏型MOSFET或橫向空乏型接面場效電晶體(junction field effect transistor,JFET),其用以操作於電路啟動程序。In addition, the lateral depletion start switch is, for example but not limited to, a lateral depletion MOSFET or a lateral depletion junction field effect transistor (JFET) for operating in a circuit startup procedure.

第5A-5C圖顯示本發明第二個實施例。如第5A圖所示,多晶片模組40中包含高壓元件晶片42與低壓控制晶片44。在本實施例中,高壓元件晶片42例如包含功率開關S1與取樣電晶體S2,取樣電晶體S2係用以感測功率開關S1之電流。取樣電晶體S2的電流流入端耦接於功率開關S1之電流流入端。取樣電晶體S2的控制端與功率開關S1之控制端,皆耦接於低壓控制晶片44的控制接腳Gate。取樣電晶體S2的電流流出端與電阻R之一端耦接,電阻R之另一端則耦接於地。(在NMOS的情況下,電流流入端為汲極、控制端為閘極、電流流出端為源極;在PMOS或雙載子接面電晶體時則為對應的端子,此為相同技術領域中之具有通常知識者所熟知。)藉由此種取樣方式,可減少感測功率開關電流的功率損失,並提升效率,改善取樣的精確度。此外,請參照第5B圖,顯示藉由取樣電晶體S2感測功率開關S1電流,以達成過電流保護(over current protection,OCP)的機制,可以進一步省略低壓控制晶片44的電流感測CS接腳。如第5B圖所示,將取樣電晶體S2源極耦接至一比較器電路,與一設定值比較,並產生過電流保護訊號OCP,即可達成過電流保護機制,進而省略低壓控制晶片44的電流感測CS接腳,以提高整合性,並降低製造成本。Figures 5A-5C show a second embodiment of the invention. As shown in FIG. 5A, the multi-chip module 40 includes a high voltage element wafer 42 and a low voltage control wafer 44. In the present embodiment, the high voltage component wafer 42 includes, for example, a power switch S1 and a sampling transistor S2, and the sampling transistor S2 is used to sense the current of the power switch S1. The current inflow end of the sampling transistor S2 is coupled to the current inflow end of the power switch S1. The control terminal of the sampling transistor S2 and the control terminal of the power switch S1 are coupled to the control pin Gate of the low voltage control chip 44. The current outflow end of the sampling transistor S2 is coupled to one end of the resistor R, and the other end of the resistor R is coupled to the ground. (In the case of NMOS, the current inflow terminal is a drain, the control terminal is a gate, and the current outflow terminal is a source; in the case of a PMOS or a dual carrier junction transistor, it is a corresponding terminal, which is in the same technical field. It is well known to those of ordinary skill.) With this sampling method, the power loss of the sensing power switch current can be reduced, and the efficiency can be improved, and the sampling accuracy can be improved. In addition, referring to FIG. 5B, the mechanism for sensing the power switch S1 current by the sampling transistor S2 to achieve over current protection (OCP) is shown, and the current sensing CS connection of the low voltage control chip 44 can be further omitted. foot. As shown in FIG. 5B, the source of the sampling transistor S2 is coupled to a comparator circuit, and compared with a set value, and an overcurrent protection signal OCP is generated to achieve an overcurrent protection mechanism, thereby omitting the low voltage control chip 44. The current senses the CS pin to improve integration and reduce manufacturing costs.

第5C圖顯示取樣電晶體S2與功率開關S1的上視圖。如第5C圖所示,功率開關S1包含汲極Drain、漂移區、閘極Gate、以及源極Source1。在實際的做法中,可視為將源極Source1分割出一小段以作為取樣電晶體S2之源極Source2,而汲極Drain、漂移區、與閘極Gate則與功率開關S1共用,也就是說,功率開關S1的汲極Drain(電流流入端)與閘極Gate(控制端)也分別作為或包含取樣電晶體S2的汲極Drain(電流流入端)與閘極Gate(控制端),而取樣電晶體S2的源極Source2(電流流出端)與功率開關S1的源極Source1(電流流出端)隔絕,但取樣電晶體S2與功率開關S1整合成單一元件,以節約元件面積及簡化元件製作程序。如此,可根據源極Source2與源極Source1的尺寸比例,與感測到的源極Source2電壓或電流訊號,即可推導出功率開關S1的開關電流,以作為電流感測訊號CS或直接用以進行過電流保護機制。Figure 5C shows a top view of the sampling transistor S2 and the power switch S1. As shown in FIG. 5C, the power switch S1 includes a drain Drain, a drift region, a gate Gate, and a source Source1. In a practical practice, it can be considered that the source Source1 is divided into a small segment as the source source 2 of the sampling transistor S2, and the drain Drain, the drift region, and the gate Gate are shared with the power switch S1, that is, The drain Drain (current inflow end) and the gate Gate (control end) of the power switch S1 also serve as or contain the drain Drain (current inflow end) and the gate Gate (control end) of the sampling transistor S2, respectively, and the sampling power The source Source2 (current outflow end) of the crystal S2 is isolated from the source Source1 (current outflow end) of the power switch S1, but the sampling transistor S2 and the power switch S1 are integrated into a single component to save component area and simplify the component fabrication process. In this way, according to the size ratio of the source Source2 and the source Source1, and the sensed source Source2 voltage or current signal, the switching current of the power switch S1 can be derived as the current sensing signal CS or directly used. Overcurrent protection mechanism.

以上已針對較佳實施例來說明本發明,唯以上所述者,僅係為使熟悉本技術者易於了解本發明的內容而已,並非用來限定本發明之權利範圍。在本發明之相同精神下,熟悉本技術者可以思及各種等效變化。例如,功率開關S1可為PMOS或NMOS電晶體;在所示各實施例電路中,可插入不影響訊號主要意義的元件,如其他開關等;又例如比較器或誤差放大器的輸入端正負可以互換,僅需對應修正電路的訊號處理方式即可;再例如本發明之多晶片模組可以應用於各種電源供應電路,例如功率因子校正(PFC)電路、返馳式功率因子校正電路、或半橋電路等,並非限於如各圖所示之返馳式電路。凡此種種,皆可根據本發明的教示類推而得,因此,本發明的範圍應涵蓋上述及其他所有等效變化。The present invention has been described with reference to the preferred embodiments thereof, and the present invention is not intended to limit the scope of the present invention. In the same spirit of the invention, various equivalent changes can be conceived by those skilled in the art. For example, the power switch S1 can be a PMOS or NMOS transistor; in the circuit of each embodiment shown, components that do not affect the main meaning of the signal, such as other switches, can be inserted; for example, the inputs of the comparator or the error amplifier can be interchanged. For example, the multi-chip module of the present invention can be applied to various power supply circuits, such as a power factor correction (PFC) circuit, a flyback power factor correction circuit, or a half bridge. The circuit or the like is not limited to the flyback circuit as shown in each drawing. All such modifications may be made in accordance with the teachings of the present invention, and the scope of the present invention should be construed to cover the above and other equivalents.

10,20,30,40‧‧‧多晶片模組10, 20, 30, 40‧‧‧ multi-chip modules

11,13,15,21,31‧‧‧晶片座11,13,15,21,31‧‧‧ wafer holder

12,16,32,42‧‧‧高壓元件晶片12,16,32,42‧‧‧High-voltage component wafer

14,34,44‧‧‧低壓控制晶片14,34,44‧‧‧Low-voltage control chip

15,35‧‧‧金屬導線15,35‧‧‧Metal wire

22‧‧‧單一晶片22‧‧‧ Single chip

221‧‧‧高壓元件221‧‧‧High-voltage components

222‧‧‧低壓元件222‧‧‧ Low-voltage components

37‧‧‧引腳37‧‧‧ pin

39‧‧‧延伸部39‧‧‧Extension

CS‧‧‧電流感測訊號CS‧‧‧current sensing signal

Drain‧‧‧汲極Drain‧‧‧汲

Drift Region‧‧‧漂移區Drift Region‧‧‧Drift Zone

FB‧‧‧回授訊號FB‧‧‧ feedback signal

Gate‧‧‧閘極Gate‧‧‧ gate

R‧‧‧電阻R‧‧‧resistance

S1‧‧‧功率開關S1‧‧‧ power switch

S2‧‧‧取樣電晶體S2‧‧‧Sampling transistor

Source 1,Source 2‧‧‧源極Source 1, Source 2‧‧‧ Source

Vin‧‧‧輸入電壓Vin‧‧‧Input voltage

Vout‧‧‧輸出電壓Vout‧‧‧ output voltage

第1圖顯示一種典型的電源供應電路。Figure 1 shows a typical power supply circuit.

第2A-2B圖顯示多晶片模組10一種先前技術的安排方式。2A-2B shows a prior art arrangement of multi-wafer module 10.

第3A-3C圖顯示另一種多晶片模組20安排方式的先前技術。Figures 3A-3C show prior art of another multi-wafer module 20 arrangement.

第4A-4B圖顯示本發明第一個實施例。4A-4B shows a first embodiment of the present invention.

第5A-5C圖顯示本發明第二個實施例。Figures 5A-5C show a second embodiment of the invention.

30...多晶片模組30. . . Multi-chip module

31...晶片座31. . . Wafer holder

32...高壓元件晶片32. . . High voltage component chip

34...低壓控制晶片34. . . Low voltage control chip

35...金屬導線35. . . Metal wire

37...引腳37. . . Pin

39...延伸部39. . . Extension

Claims (8)

一種多晶片模組,包含:一高壓元件晶片,其具有至少一功率開關、以及用以感測溫度之一熱二極體;一低壓控制晶片,其藉由金屬導線與該高壓元件晶片耦接;單一晶片座,用以將該高壓元件晶片與該低壓控制晶片固定於其上;以及複數引腳,藉由該晶片座之一延伸部或金屬導線與該單一晶片座耦接。 A multi-chip module comprising: a high voltage component wafer having at least one power switch and a thermal diode for sensing temperature; and a low voltage control wafer coupled to the high voltage component wafer by a metal wire a single wafer holder for mounting the high voltage component wafer and the low voltage control wafer thereon; and a plurality of pins coupled to the single wafer holder by an extension or metal wire of the wafer holder. 如申請專利範圍第1項所述之多晶片模組,其中該高壓元件晶片包括:一橫向(lateral)金屬氧化物半導體場效電晶體(metal oxide semiconductor field effect transistor,MOSFET)功率開關;以及一橫向空乏型啟動開關。 The multi-chip module of claim 1, wherein the high voltage device chip comprises: a lateral metal oxide semiconductor field effect transistor (MOSFET) power switch; and a Horizontal depletion start switch. 如申請專利範圍第2項所述之多晶片模組,其中該橫向空乏型啟動開關具有一橫向空乏型MOSFET或一橫向空乏型接面場效電晶體(junction field effect transistor,JFET)。 The multi-wafer module of claim 2, wherein the lateral depletion start switch has a lateral depletion MOSFET or a lateral depletion junction field effect transistor (JFET). 如申請專利範圍第1項所述之多晶片模組,其中該功率開關具有一第一電流流入端、一第一控制端、以及一第一電流流出端,藉由該第一控制端的操作,控制一開關電流流入該第一電流流入端,並自該第一電流流出端流出;該高壓元件晶片更包括一取樣電晶體,用以取樣該開關電流,其包含:該第一電流流入端;該第一控制端;以及一第二電流流出端,與該第一電流流出端流出隔絕,並產生一與該開關電流具有一比例之取樣電流,其中該取樣電晶體 與功率開關整合成單一元件。 The multi-chip module of claim 1, wherein the power switch has a first current inflow end, a first control end, and a first current outflow end, by operation of the first control end, Controlling a switching current flowing into the first current inflow end and flowing out from the first current outflow end; the high voltage component chip further includes a sampling transistor for sampling the switching current, comprising: the first current inflow end; The first control terminal; and a second current outflow end are isolated from the first current outflow end, and generate a sampling current having a ratio of the switching current, wherein the sampling transistor Integrates with the power switch into a single component. 一種多晶片模組製造方法,包含:提供一高壓元件晶片,其具有至少一功率開關、以及用以感測溫度之一熱二極體;藉由金屬導線將該高壓元件晶片耦接至一低壓控制晶片;將該高壓元件晶片與該低壓控制晶片固定於單一晶片座;以及藉由該晶片座之一延伸部或金屬導線將該單一晶片座耦接至複數引腳。 A multi-chip module manufacturing method comprising: providing a high-voltage component chip having at least one power switch and a thermal diode for sensing temperature; coupling the high-voltage component wafer to a low voltage by a metal wire Controlling the wafer; fixing the high voltage component wafer and the low voltage control wafer to a single wafer holder; and coupling the single wafer holder to the plurality of pins by an extension or metal wire of the wafer holder. 如申請專利範圍第5項所述之多晶片模組製造方法,其中該高壓元件晶片包括:一橫向(lateral)金屬氧化物半導體場效電晶體(metal oxide semiconductor field effect transistor,MOSFET)功率開關;以及一橫向空乏型啟動開關。 The multi-chip module manufacturing method of claim 5, wherein the high voltage device chip comprises: a lateral metal oxide semiconductor field effect transistor (MOSFET) power switch; And a horizontal depletion start switch. 如申請專利範圍第6項所述之多晶片模組製造方法,其中該橫向空乏型啟動開關具有一橫向空乏型MOSFET或一橫向空乏型接面場效電晶體(junction field effect transistor,JFET)。 The multi-wafer module manufacturing method of claim 6, wherein the lateral depletion start switch has a lateral depletion MOSFET or a lateral depletion junction field effect transistor (JFET). 如申請專利範圍第5項所述之多晶片模組製造方法,其中該功率開關具有一第一電流流入端、一第一控制端、以及一第一電流流出端,藉由該第一控制端的操作,控制一開關電流流入該第一電流流入端,並自該第一電流流出端流出;該高壓元件晶片更包括一取樣電晶體,用以取樣該開關電流,其包含:該第一電流流入端;該第一控制端;以及一第二電流流出端,與該第一電流流出端流出隔絕,並產生一與該開關電流具有一比例之取樣電流,其中該取樣電晶體 與功率開關整合成單一元件。 The multi-chip module manufacturing method of claim 5, wherein the power switch has a first current inflow end, a first control end, and a first current outflow end, wherein the first control end is Operating, controlling a switching current to flow into the first current inflow end and flowing out from the first current outflow end; the high voltage component chip further includes a sampling transistor for sampling the switching current, the method comprising: the first current inflow a first control terminal; and a second current outflow end, which is isolated from the first current outflow end and generates a sampling current having a ratio of the switching current, wherein the sampling transistor Integrates with the power switch into a single component.
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Citations (4)

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US6756689B2 (en) * 1999-09-13 2004-06-29 Fairchild Korea Semiconductor, Ltd. Power device having multi-chip package structure
US20080304305A1 (en) * 2007-06-11 2008-12-11 Alpha & Omega Semiconductor, Ltd. Boost converter with integrated high power discrete fet and low voltage controller
TW200905853A (en) * 2007-07-31 2009-02-01 Alpha & Amp Omega Semiconductor Ltd A multi-die DC-DC buck power converter with efficient packaging
US20110063025A1 (en) * 2008-02-13 2011-03-17 Masliah Denis A High Breakdown Voltage Double-Gate Semiconductor Device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6756689B2 (en) * 1999-09-13 2004-06-29 Fairchild Korea Semiconductor, Ltd. Power device having multi-chip package structure
US20080304305A1 (en) * 2007-06-11 2008-12-11 Alpha & Omega Semiconductor, Ltd. Boost converter with integrated high power discrete fet and low voltage controller
TW200905853A (en) * 2007-07-31 2009-02-01 Alpha & Amp Omega Semiconductor Ltd A multi-die DC-DC buck power converter with efficient packaging
US20110063025A1 (en) * 2008-02-13 2011-03-17 Masliah Denis A High Breakdown Voltage Double-Gate Semiconductor Device

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