TWI462979B - A coating liquid, a hardened film and a resin laminate, and a method for producing the hardened film and the resin laminate - Google Patents
A coating liquid, a hardened film and a resin laminate, and a method for producing the hardened film and the resin laminate Download PDFInfo
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- TWI462979B TWI462979B TW098122441A TW98122441A TWI462979B TW I462979 B TWI462979 B TW I462979B TW 098122441 A TW098122441 A TW 098122441A TW 98122441 A TW98122441 A TW 98122441A TW I462979 B TWI462979 B TW I462979B
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/45—Anti-settling agents
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/48—Stabilisers against degradation by oxygen, light or heat
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Description
本發明係關於一種塗布液、硬化膜及樹脂積層體與該硬化膜及樹脂積層體之製造方法。The present invention relates to a coating liquid, a cured film, a resin laminate, and a method for producing the cured film and the resin laminate.
熱塑性塑膠尤其是聚碳酸酯樹脂,因透明性優異、輕量且耐衝擊性亦優異,故被廣泛用作代替玻璃之結構材料。然而,因耐磨耗性、耐擦傷性、耐候性及耐化學性等表面特性差,故其用途受到限制,業者迫切希望改良聚碳酸酯基材的表面特性。Thermoplastic plastics, especially polycarbonate resins, are widely used as structural materials instead of glass because of their excellent transparency, light weight, and excellent impact resistance. However, since surface properties such as abrasion resistance, scratch resistance, weather resistance, and chemical resistance are poor, the use thereof is limited, and it is highly desired to improve the surface properties of the polycarbonate substrate.
作為表面特性之改良方法,有以表面處理劑被覆聚碳酸酯樹脂成形品的表面之方法。例如,提出有一種於聚碳酸酯基材之表面形成包含多官能丙烯酸系光硬化性樹脂、三聚氰胺系或有機聚矽氧烷系熱硬化性樹脂之硬化層之方法。As a method of improving the surface characteristics, there is a method of coating the surface of a polycarbonate resin molded article with a surface treatment agent. For example, a method of forming a cured layer containing a polyfunctional acrylic photocurable resin, a melamine-based or an organopolyoxyalkylene-based thermosetting resin on the surface of a polycarbonate substrate has been proposed.
該等之中,以有機矽氧烷系樹脂被覆者,因耐磨耗性、耐擦傷性、耐化學性優異而被認為有用。但是,利用該有機矽氧烷系樹脂之被覆在對聚碳酸酯樹脂之密著性方面存在問題,尤其於在室外長期使用之情形時,存在塗布層剝落之問題。又,即使為了提高密著性或耐磨耗性而使有機矽氧烷系樹脂的膜厚變厚,亦存在於硬化時容易產生斷裂等問題,故業者迫切希望加以改良。Among these, those covered with an organic siloxane-based resin are considered to be useful because they are excellent in abrasion resistance, scratch resistance, and chemical resistance. However, the coating of the organic siloxane-based resin has a problem in adhesion to the polycarbonate resin, and in particular, when it is used outdoors for a long period of time, there is a problem that the coating layer is peeled off. In addition, even if the film thickness of the organic siloxane oxide resin is increased in order to improve the adhesion or the abrasion resistance, there is a problem that cracking easily occurs during curing, and the manufacturer is eager to improve.
關於密著性之改良,專利文獻1中提出有一種將接著性良好的各種聚合物調配入塗料或硬塗材料中之方法,但耐擦傷性並不充分。又,專利文獻2及3中記載有,將硬化膜施加於基材表面,進而在其上設置無機硬質物層,但並未獲得充分的密著性。In the improvement of the adhesion, Patent Document 1 proposes a method of blending various polymers having good adhesion into a coating material or a hard coating material, but the scratch resistance is not sufficient. Further, in Patent Documents 2 and 3, the cured film is applied to the surface of the substrate, and an inorganic hard layer is provided thereon, but sufficient adhesion is not obtained.
專利文獻4及5中揭示有一種包含被覆層及基材之樹脂積層體,該被覆層具有具備紫外線吸收能力之高分子奈米粒子高分散於矽氧烷基質(Si-O骨架)中的膜內部結構。該樹脂積層體之耐磨耗性以及基板與被覆層之初期密著性優異,但於將該樹脂積層體用於如附雨刷之車窗等伴有劇烈摩擦之零件之情形時,在耐擦傷性及耐磨耗性等方面尚有改良之餘地。又,在耐久性(耐煮沸性)方面亦尚有改良之餘地。Patent Literatures 4 and 5 disclose a resin laminate comprising a coating layer and a substrate, wherein the coating layer has a film in which a polymer nanoparticle having an ultraviolet absorbing ability is highly dispersed in a siloxane matrix (Si-O skeleton). Internal structure. The resin laminate has excellent abrasion resistance and initial adhesion between the substrate and the coating layer. However, when the resin laminate is used for a member such as a window with a wiper, which is accompanied by severe friction, it is resistant to abrasion. There is still room for improvement in terms of sex and wear resistance. Moreover, there is still room for improvement in terms of durability (boil resistance).
專利文獻1:日本專利特開平11-43646號公報Patent Document 1: Japanese Patent Laid-Open No. Hei 11-43646
專利文獻2:日本專利特開昭58-29835號公報Patent Document 2: Japanese Patent Laid-Open Publication No. SHO 58-29835
專利文獻3:日本專利特開昭64-4343號公報Patent Document 3: Japanese Patent Laid-Open No. 64-4343
專利文獻4:WO 2006/022347號小冊子Patent Document 4: WO 2006/022347 pamphlet
專利文獻5:WO 2007/099784號小冊子Patent Document 5: WO 2007/099784 brochure
本發明係於上述情況下完成者,其目的在於提供一種形成如下硬化膜之塗布液,該硬化膜即使不使用底塗劑亦對基材或無機硬質物層、透明導電膜及光觸媒層具有良好之密著性,並且具有優異之耐磨耗性、耐擦傷性、耐撓曲性、耐候性(紫外線吸收能力)、耐久性(耐煮沸性)等特性;將該塗布液硬化而成之具有上述特性之硬化膜及於基材上具有該硬化膜之樹脂積層體;與該硬化膜及樹脂積層體之製造方法。The present invention has been made in view of the above circumstances, and an object thereof is to provide a coating liquid which forms a cured film which is excellent for a substrate, an inorganic hard material layer, a transparent conductive film, and a photocatalyst layer even without using a primer. Adhesive property, and excellent properties such as abrasion resistance, scratch resistance, flex resistance, weather resistance (UV absorbing ability), durability (boil resistance), and hardening of the coating liquid A cured film having the above characteristics and a resin laminate having the cured film on a substrate; and a method for producing the cured film and the resin laminate.
本發明者們對形成具有上述特性之硬化膜的塗布液反覆進行努力研究,結果獲得下述知識見解。The present inventors conducted an intensive study on the formation of a coating liquid for forming a cured film having the above characteristics, and as a result, obtained the following knowledge.
本發明者們發現:藉由將包含具有烷氧基之矽烷化合物的水解縮合物、含有包含具有紫外線吸收基之單體單元之共聚物的有機高分子微粒、膠體二氧化矽、硬化觸媒及分散介質之塗布液加熱使其硬化,而獲得具有所需特性之硬化膜,並且藉由使該硬化膜形成於基材上或者無機硬質物層、透明導電膜及光觸媒層的各層與基材之間,而獲得所需之樹脂積層體。The present inventors have found that a hydrolyzed condensate comprising a decane compound having an alkoxy group, an organic polymer fine particle containing a copolymer containing a monomer unit having an ultraviolet absorbing group, a colloidal cerium oxide, a hardening catalyst, and The coating liquid of the dispersion medium is heated and hardened to obtain a cured film having desired characteristics, and the cured film is formed on the substrate or the layers of the inorganic hard layer, the transparent conductive film, and the photocatalyst layer and the substrate. In order to obtain the desired resin laminate.
本發明係基於上述知識見解而完成者。The present invention has been completed based on the above knowledge findings.
亦即,本發明提供一種下述之塗布液、硬化膜及樹脂積層體與該硬化膜及樹脂積層體之製造方法。That is, the present invention provides a coating liquid, a cured film, a resin laminate, and a method for producing the cured film and the resin laminate.
[1]一種塗布液,其特徵在於包含下述(A)~(E)成分:[1] A coating liquid comprising the following components (A) to (E):
(A)下述(A-1)~(A-5)成分之具有烷氧基之矽烷化合物的水解縮合物,(A) a hydrolysis-condensation product of alkane-containing decane compound of the following (A-1) to (A-5) components,
(A-1)四烷氧基矽烷化合物,(A-1) a tetraalkoxydecane compound,
(A-2)不含胺基、環氧基及異氰酸酯基之有機烷氧基矽烷化合物,(A-2) an organoalkoxydecane compound containing no amine group, epoxy group or isocyanate group,
(A-3)具有胺基及烷氧基之矽烷化合物,(A-3) a decane compound having an amine group and an alkoxy group,
(A-4)具有環氧基及烷氧基之矽烷化合物,(A-4) a decane compound having an epoxy group and an alkoxy group,
(A-5)具有烷氧基之封端化異氰酸基矽烷化合物;(A-5) a blocked isocyanatodecane compound having an alkoxy group;
(B)含有包含具有紫外線吸收基之單體單元之共聚物的有機高分子微粒;(B) an organic polymer microparticle containing a copolymer comprising a monomer unit having an ultraviolet absorbing group;
(C)膠體二氧化矽;(C) colloidal cerium oxide;
(D)硬化觸媒;(D) hardening catalyst;
(E)分散介質。(E) Dispersing medium.
[2]如[1]之塗布液,其更包含(F)經矽烷化合物處理之氧化鈰、及(G)分散穩定劑。[2] The coating liquid according to [1], which further comprises (F) cerium oxide treated by decane compound, and (G) dispersion stabilizer.
[3]如[1]或[2]之塗布液,其中(A-1)成分為以下述通式(1)所表示之四烷氧基矽烷化合物:[3] The coating liquid according to [1] or [2], wherein the component (A-1) is a tetraalkoxydecane compound represented by the following formula (1):
Si(OR1 )4 ......(1)Si(OR 1 ) 4 ......(1)
[式中,R1 表示碳數為1~4之烷基或具有醚鍵之烷基;複數個R1 可相同亦可不同]。[wherein, R 1 represents an alkyl group having a carbon number of 1 to 4 or an alkyl group having an ether bond; and a plurality of R 1 's may be the same or different).
[4]如[1]或[2]之塗布液,其中(A-2)成分為以下述通式(2)所表示之不含胺基、環氧基及異氰酸酯基之有機烷氧基矽烷化合物:[4] The coating liquid according to [1] or [2], wherein the component (A-2) is an organoalkoxydecane having no amine group, epoxy group or isocyanate group represented by the following formula (2) Compound:
R2 a Si(OR3 )4-a ......(2)R 2 a Si(OR 3 ) 4-a ......(2)
[式中,R2 表示碳數為1~10之烷基或氟烷基;乙烯基;苯基;或者經甲基丙烯醯氧基取代之碳數為1~3之烷基,R3 表示碳數為1~4之烷基或具有醚鍵之烷基,a表示1或2;於R2 為複數個之情形時,複數個R2 可相同亦可不同,複數個OR3 可相同亦可不同]。Wherein R 2 represents an alkyl group or a fluoroalkyl group having a carbon number of 1 to 10; a vinyl group; a phenyl group; or an alkyl group having a carbon number of 1 to 3 substituted with a methacryloxy group, and R 3 represents An alkyl group having 1 to 4 carbon atoms or an alkyl group having an ether bond, a represents 1 or 2; when R 2 is plural, plural R 2 's may be the same or different, and a plurality of OR 3 may be the same Can be different].
[5]如[1]或[2]之塗布液,其中(A-3)成分為以下述通式(3)所表示之具有胺基及烷氧基之矽烷化合物:[5] The coating liquid according to [1] or [2], wherein the component (A-3) is a decane compound having an amine group and an alkoxy group represented by the following formula (3):
R4 b Si(OR5 )4-b ......(3)R 4 b Si(OR 5 ) 4-b ......(3)
[式中,R4 表示碳數為1~4之烷基;乙烯基;苯基;或者經選自甲基丙烯醯氧基、胺基(-NH2 基)、胺基烷基[-(CH2 )x -NH2 基(其中,x為1~3之整數)]、烷基胺基[-NHR基(其中,R為碳數1~3之烷基)]中的1種以上基所取代之碳數為1~3之烷基,R4 之至少1個表示經胺基、或胺基烷基或烷基胺基中之任一者所取代之碳數為1~3之烷基;R5 表示碳數為1~4之烷基,b表示1或2;於R4 為複數個之情形時,複數個R4 可相同亦可不同,複數個OR5 可相同亦可不同]。Wherein R 4 represents an alkyl group having a carbon number of 1 to 4; a vinyl group; a phenyl group; or an alkyl group selected from a methacryloxy group, an amine group (-NH 2 group), an aminoalkyl group [-( CH 2 ) x -NH 2 group (wherein x is an integer of 1 to 3)], and one or more groups of an alkylamino group [-NHR group (wherein R is an alkyl group having 1 to 3 carbon atoms)] The substituted carbon number is 1 to 3 alkyl groups, and at least one of R 4 represents an alkyl group having 1 to 3 carbon atoms substituted by an amine group or an aminoalkyl group or an alkylamine group. R 5 represents an alkyl group having a carbon number of 1 to 4, and b represents 1 or 2; when R 4 is plural, a plurality of R 4 may be the same or different, and a plurality of OR 5 may be the same or different. ].
[6]如[1]或[2]之塗布液,其中(A-4)成分為以下述通式(4)所表示之具有環氧基及烷氧基之矽烷化合物:[6] The coating liquid according to [1] or [2], wherein the component (A-4) is a decane compound having an epoxy group and an alkoxy group represented by the following formula (4):
R6 c Si(OR7 )4-c ......(4)R 6 c Si(OR 7 ) 4-c ......(4)
[式中,R6 表示碳數為1~4之烷基;乙烯基;苯基;或者經選自甲基丙烯醯氧基、環氧丙氧基、3,4-環氧基環己基中的1種以上基所取代之碳數為1~3之烷基,R6 之至少1個表示經環氧丙氧基或3,4-環氧基環己基所取代之碳數為1~3之烷基;R7 表示碳數為1~4之烷基,c表示1或2;於R6 為複數個之情形時,複數個R6 可相同亦可不同,複數個OR7 可相同亦可不同]。Wherein R 6 represents an alkyl group having a carbon number of 1 to 4; a vinyl group; a phenyl group; or is selected from a methacryloxy group, a glycidoxy group, a 3,4-epoxycyclohexyl group. The carbon number substituted by one or more kinds of groups is 1 to 3 alkyl groups, and at least one of R 6 represents a carbon number of 1 to 3 substituted by a glycidoxy group or a 3,4-epoxycyclohexyl group. The alkyl group; R 7 represents an alkyl group having a carbon number of 1 to 4, and c represents 1 or 2; when R 6 is plural, a plurality of R 6 may be the same or different, and a plurality of OR 7 may be the same. Can be different].
[7]如[1]或[2]之塗布液,其中(A-5)成分為以下述通式(5)所表示之具有烷氧基之封端化異氰酸基矽烷化合物:[7] The coating liquid according to [1] or [2], wherein the component (A-5) is a blocked isocyanatodecane compound having an alkoxy group represented by the following formula (5):
R8 d Si(OR9 )4-d ......(5)R 8 d Si(OR 9 ) 4-d ......(5)
[式中,R8 表示碳數為1~4之烷基;乙烯基;苯基;或者經選自甲基丙烯醯氧基、封端化異氰酸酯基中的1種以上基所取代之碳數為1~3之烷基,R8 之至少1個表示經封端化異氰酸酯基所取代之碳數為1~3之烷基;R9 表示碳數為1~4之烷基,d表示1或2;於R8 為複數個情形時,複數個R8 可相同亦可不同,複數個OR9 可相同亦可不同]。Wherein R 8 represents an alkyl group having a carbon number of 1 to 4; a vinyl group; a phenyl group; or a carbon number substituted with one or more groups selected from the group consisting of a methacryloxy group and a blocked isocyanate group; It is an alkyl group of 1 to 3, and at least one of R 8 represents an alkyl group having 1 to 3 carbon atoms which is substituted with a blocked isocyanate group; R 9 represents an alkyl group having 1 to 4 carbon atoms, and d represents 1 Or 2; when R 8 is a plurality of cases, the plurality of R 8 may be the same or different, and the plurality of OR 9 may be the same or different].
[8]如[1]至[7]中任一項之塗布液,其係於向使(A-1)成分、(A-2)成分及(A-4)成分的水解縮合物與(B)~(E)成分接觸而獲得之反應產物中加入(A-5)成分並使其反應後,進而加入(A-3)成分並使其反應而成者。[8] The coating liquid according to any one of [1] to [7], which is a hydrolyzed condensate to (A-1) component, (A-2) component, and (A-4) component ( B) The component (A-5) is added to the reaction product obtained by contacting the component (E) and reacted, and then the component (A-3) is further added and reacted.
[9]如第[1]至[7]中任一項之塗布液,其係於向藉由將包含(A-1)成分、(A-2)成分、(A-4)成分及(B)~(E)成分之混合物加熱而獲得之反應產物中加入(A-5)成分並使其反應後,進而加入(A-3)成分並使其反應而成者。[9] The coating liquid according to any one of [1] to [7], which is characterized by comprising (A-1) component, (A-2) component, (A-4) component and ( After the component (A-5) is added to the reaction product obtained by heating the mixture of the components B to (E) and reacted, the component (A-3) is further added and reacted.
[10]一種硬化膜,其係使如上述[1]至[9]中任一項之塗布液硬化而成者。[10] A cured film obtained by curing the coating liquid according to any one of the above [1] to [9].
[11]一種樹脂積層體,其特徵在於具有:基材、及直接形成於該基材上之如[10]之硬化膜。[11] A resin laminate comprising: a substrate; and a cured film of [10] directly formed on the substrate.
[12]一種樹脂積層體,其特徵在於具有:基材、形成於該基材上之如[10]之硬化膜、及形成於上述硬化膜上之無機層。[12] A resin laminate comprising: a substrate; a cured film of [10] formed on the substrate; and an inorganic layer formed on the cured film.
[13]一種樹脂積層體,其特徵在於具有:基材、形成於該基材上之如[10]之硬化膜、及形成於上述硬化膜上之透明導電膜。[13] A resin laminate comprising: a substrate; a cured film of [10] formed on the substrate; and a transparent conductive film formed on the cured film.
[14]一種樹脂積層體,其特徵在於具有:基材、形成於該基材上之如[10]之硬化膜、及形成於上述硬化膜上之光觸媒層[14] A resin laminate comprising: a substrate, a cured film of [10] formed on the substrate, and a photocatalyst layer formed on the cured film
[15]如[13]之樹脂積層體,其中上述硬化膜之厚度為0.1~50μm。[15] The resin laminate according to [13], wherein the cured film has a thickness of 0.1 to 50 μm.
[16]如[13]之樹脂積層體,其中上述透明導電膜之載子濃度為1×1018 /cm3 以上。[16] The resin laminate according to [13], wherein the transparent conductive film has a carrier concentration of 1 × 10 18 /cm 3 or more.
[17]如[13]之樹脂積層體,其中上述基材為樹脂基材。[17] The resin laminate according to [13], wherein the substrate is a resin substrate.
[18]如[11]、[12]及[17]中任一項之樹脂積層體,其中上述基材具有凹凸。[18] The resin laminate according to any one of [11], wherein the substrate has irregularities.
[19]如[11]、[12]、[17]及[18]中任一項之樹脂積層體,其中上述基材呈橢圓柱形。[19] The resin laminate of any one of [11], [12], [17], [18], wherein the substrate has an elliptical cylindrical shape.
[20]如[11]、[12]、[17]及[18]中任一項之樹脂積層體,其中上述基材呈圓柱形。[20] The resin laminate according to any one of [11], [12], [17], wherein the substrate is cylindrical.
[21]如[11]、[12]、[17]至[20]中任一項之樹脂積層體,其中在上述基材之未形成硬化膜的面上具有樹脂層。[21] The resin laminate according to any one of [11], wherein the surface of the substrate on which the cured film is not formed has a resin layer.
[22]如[11]、[12]、[14]、[17]至[21]中任一項之樹脂積層體,其中上述硬化膜之厚度為0.5~6μm。[22] The resin laminate according to any one of [11], [12], [14], wherein the thickness of the cured film is 0.5 to 6 μm.
[23]如[11]、[12]、[14]、[17]至[22]中任一項之樹脂積層體,其中基材為聚酯樹脂、聚碳酸酯樹脂或聚烯烴系樹脂。[23] The resin laminate according to any one of [11], [12], wherein the substrate is a polyester resin, a polycarbonate resin or a polyolefin resin.
[24]一種硬化膜之製造方法,其特徵在於包括:將上述[1]至[9]中任一項之塗布液加熱並使其硬化之步驟。[24] A method for producing a cured film, comprising the step of heating and hardening the coating liquid according to any one of the above [1] to [9].
[25]一種樹脂積層體之製造方法,其特徵在於包括:將如上述[1]至[9]中任一項之塗布液塗布於基材上之步驟、使上述塗布液乾燥之步驟、對上述基材進行熱成形之步驟、使上述塗布液硬化而設置塗布層之步驟。[25] A method for producing a resin layered body, comprising the steps of: applying a coating liquid according to any one of [1] to [9] to a substrate, and drying the coating liquid; The step of thermoforming the base material, and the step of curing the coating liquid to form a coating layer.
[26]如[25]之樹脂積層體之製造方法,其更包括:在使上述塗布液硬化而成之樹脂積層體之不具有塗布層的面上設置樹脂層之步驟。[26] The method for producing a resin laminate according to [25], further comprising the step of providing a resin layer on a surface of the resin laminate obtained by curing the coating liquid without a coating layer.
[27]一種樹脂積層體之製造方法,其特徵在於包括:在基材上形成使如上述[1]至[9]中任一項之塗布液硬化而成之硬化膜之步驟、在上述硬化膜上形成透明導電膜之步驟。[27] A method of producing a resin laminate, comprising the step of forming a cured film obtained by curing the coating liquid according to any one of [1] to [9] above, and hardening the hardening film. A step of forming a transparent conductive film on the film.
[28]一種樹脂積層體之製造方法,其特徵在於包括:在基材上形成使如上述[1]至[9]中任一項之塗布液硬化而成之硬化膜之步驟、在上述硬化膜上形成光觸媒層之步驟。[28] A method for producing a resin laminate, comprising the step of forming a cured film obtained by curing the coating liquid according to any one of the above [1] to [9] on a substrate, and the hardening The step of forming a photocatalyst layer on the film.
根據本發明,可提供一種形成如下硬化膜之塗布液,該硬化膜即使不使用底塗劑亦對基材或無機硬質物層、透明導電膜及光觸媒層具有良好之密著性,並且具有優異的耐磨耗性、耐擦傷性、耐撓曲性、耐候性(紫外線吸收能力)、耐久性(耐煮沸性)等特性。According to the present invention, it is possible to provide a coating liquid which forms a cured film which has good adhesion to a substrate or an inorganic hard material layer, a transparent conductive film and a photocatalyst layer, and which is excellent even without using a primer. Characteristics such as abrasion resistance, scratch resistance, flex resistance, weather resistance (UV absorption capacity), and durability (boiling resistance).
又,根據本發明,可提供一種使上述塗布液硬化而成之具有上述特性之硬化膜,以及在基材上或者在無機硬質物層、透明導電膜及光觸媒層的各層與基材之間具有該硬化膜之樹脂積層體,與該硬化膜及樹脂積層體之製造方法。Moreover, according to the present invention, it is possible to provide a cured film having the above characteristics obtained by curing the coating liquid, and having a substrate or a layer between the inorganic hard material layer, the transparent conductive film, and the photocatalyst layer and the substrate. A resin laminate of the cured film, and a method for producing the cured film and the resin laminate.
首先,對本發明之塗布液加以說明。First, the coating liquid of the present invention will be described.
本發明之塗布液之特徵在於包含下述(A)~(E)成分。The coating liquid of the present invention is characterized by comprising the following components (A) to (E).
本發明之塗布液含有下述(A-1)~(A-5)之5種化合物的水解縮合物作為(A)成分之具有烷氧基之矽烷化合物的水解縮合物。水解縮合物可為(A-1)~(A-5)中之單獨化合物的水解縮合物,亦可為包含(A-1)~(A-5)中之任意2種以上之混合物的水解縮合物。The coating liquid of the present invention contains a hydrolysis-condensation product of five compounds of the following (A-1) to (A-5) as a hydrolysis-condensation product of the alkoxy group-containing decane compound of the component (A). The hydrolysis condensate may be a hydrolysis condensate of a single compound in (A-1) to (A-5), or may be a hydrolysis containing a mixture of any two or more of (A-1) to (A-5). Condensate.
於本發明中,所謂具有烷氧基之矽烷化合物,係指烷氧基矽烷化合物及/或其部分縮合物;所謂烷氧基矽烷化合物的部分縮合物,係指烷氧基矽烷化合物的一部分進行縮合,於分子內形成矽氧烷鍵(Si-O鍵)而成之聚烷氧基矽烷化合物或聚有機烷氧基矽烷化合物。In the present invention, the alkane compound having an alkoxy group means an alkoxydecane compound and/or a partial condensate thereof; and a partial condensate of an alkoxydecane compound means a part of an alkoxydecane compound. A polyalkoxydecane compound or a polyorganooxyoxydecane compound obtained by forming a siloxane chain (Si-O bond) in a molecule.
又,所謂具有烷氧基之矽烷化合物的水解縮合物,係指除包含具有烷氧基之矽烷化合物的水解縮合物以外,亦包含水解縮合前的該具有烷氧基之矽烷化合物之狀態者。In addition, the hydrolysis-condensation product of the alkane compound having an alkoxy group means a state in which the alkoxy group-containing decane compound before the hydrolysis condensation is contained in addition to the hydrolysis-condensation product containing the alkoxy group-containing decane compound.
(A-1)化合物為四烷氧基矽烷化合物。又,亦可使用以矽氧烷鍵(Si-O鍵)而鍵結之部分縮合物(聚烷氧基矽烷化合物)。該等化合物可單獨使用1種,亦可組合使用2種以上。The compound (A-1) is a tetraalkoxydecane compound. Further, a partial condensate (polyalkoxydecane compound) bonded by a siloxane chain (Si-O bond) may also be used. These compounds may be used alone or in combination of two or more.
作為(A-1)化合物,四烷氧基矽烷化合物及其部分縮合物例如可以下述通式(1)表示,尤其適宜的是以下述通式(6)所表示之化合物。The tetraalkoxydecane compound and a partial condensate thereof can be represented by the following formula (1), and a compound represented by the following formula (6) is particularly preferable as the compound (A-1).
Si(OR1 )4 ......(1)Si(OR 1 ) 4 ......(1)
[式中,R1 為碳數1~4之烷基或具有醚鍵之烷基;複數個R1 可相同亦可不同]。[wherein, R 1 is an alkyl group having 1 to 4 carbon atoms or an alkyl group having an ether bond; and a plurality of R 1 's may be the same or different).
[式中,R1 與上述相同,n為1~15之整數]。[wherein R 1 is the same as above, and n is an integer of 1 to 15].
於上述通式(1)及(6)中,作為碳數為1~4之烷基,可列舉:甲基、乙基、正丙基、異丙基、正丁基、各種丁基;又,作為R1 為具有醚鍵的碳數為1~4之烷基之OR1 ,例如可列舉:2-甲氧基乙氧基、3-甲氧基丙氧基等。In the above formulae (1) and (6), examples of the alkyl group having 1 to 4 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, and various butyl groups; Examples of the OR 1 in which R 1 is an alkyl group having an ether bond and having 1 to 4 carbon atoms include, for example, 2-methoxyethoxy group, 3-methoxypropoxy group and the like.
作為(A-1)化合物之四烷氧基矽烷化合物,可列舉:四甲氧基矽烷、四乙氧基矽烷、四正丙氧基矽烷、四異丙氧基矽烷、四正丁氧基矽烷、四異丁氧基矽烷等。The tetraalkoxydecane compound of the compound (A-1) may, for example, be tetramethoxynonane, tetraethoxydecane, tetra-n-propoxydecane, tetraisopropoxydecane or tetra-n-butoxydecane. , tetraisobutoxy decane, and the like.
又,作為聚烷氧基矽烷化合物,可列舉:多摩化學工業股份有限公司製造之「M Silicate 51」、「Silicate 40」、「Silicate 45」;Colcoat股份有限公司製造之「矽酸甲酯51」、「矽酸甲酯53A」、「矽酸乙酯40」、「矽酸乙酯48」等。Further, examples of the polyalkoxydecane compound include "M Silicate 51", "Silicate 40", and "Silicate 45" manufactured by Tama Chemical Industry Co., Ltd.; "Methyl citrate 51" manufactured by Colcoat Co., Ltd. "Methyl citrate 53A", "Ethyl citrate 40", "Ethyl citrate 48" and the like.
(A-2)化合物為不含胺基、環氧基及異氰酸酯基之有機烷氧基矽烷化合物。又,亦可使用其部分縮合物。該等化合物可單獨使用1種,亦可組合使用2種以上。The compound (A-2) is an organoalkoxydecane compound containing no amine group, epoxy group or isocyanate group. Further, a partial condensate thereof can also be used. These compounds may be used alone or in combination of two or more.
作為(A-2)化合物,有機烷氧基矽烷化合物及其部分縮合物較好的是2官能烷氧基矽烷、3官能烷氧基矽烷,例如可以下述通式(2)表示,尤其適宜的是以下述通式(7)所表示之化合物。The compound (A-2), the organoalkoxydecane compound and a partial condensate thereof are preferably a bifunctional alkoxydecane or a trifunctional alkoxydecane, and can be represented, for example, by the following formula (2), and is particularly suitable. It is a compound represented by the following general formula (7).
R2 a Si(OR3 )4-a ......(2)R 2 a Si(OR 3 ) 4-a ......(2)
[式中,R2 為碳數1~10之烷基或氟烷基;乙烯基;苯基;或者經甲基丙烯醯氧基取代之碳數為1~3之烷基,R3 為碳數1~4之烷基或具有醚鍵之烷基,a為1或2;於R2 為複數個之情形時,複數個R2 可相同亦可不同,複數個OR3 可相同亦可不同]。Wherein R 2 is an alkyl group having 1 to 10 carbon atoms or a fluoroalkyl group; a vinyl group; a phenyl group; or an alkyl group having 1 to 3 carbon atoms substituted by a methacryloxy group, and R 3 is carbon a number of 1 to 4 alkyl groups or an alkyl group having an ether bond, a is 1 or 2; when R 2 is plural, plural R 2 's may be the same or different, and a plurality of OR 3 may be the same or different ].
[式中,R2 及R3 與上述相同,m為1~15之整數]。[wherein R 2 and R 3 are the same as defined above, and m is an integer of 1 to 15].
於上述通式(2)及(7)中,作為碳數為1~10之烷基,可為直鏈狀、支鏈狀中之任意者,例如可列舉:甲基、乙基、正丙基、異丙基、各種丁基、各種己基、各種辛基、各種癸基等;作為氟烷基,例如可列舉:三氟乙基、三氟丙基等。又,作為碳數為1~3之烷基,可列舉:甲基、乙基、正丙基、異丙基。碳數為1~4之烷基或具有醚鍵之烷基係如上述通式(1)中所說明。In the above formulae (2) and (7), the alkyl group having 1 to 10 carbon atoms may be any of a linear chain and a branched chain, and examples thereof include methyl group, ethyl group, and n-propyl group. The group, the isopropyl group, the various butyl groups, various hexyl groups, various octyl groups, and various fluorenyl groups; and examples of the fluoroalkyl group include a trifluoroethyl group and a trifluoropropyl group. Further, examples of the alkyl group having 1 to 3 carbon atoms include a methyl group, an ethyl group, a n-propyl group, and an isopropyl group. The alkyl group having 1 to 4 carbon atoms or the alkyl group having an ether bond is as described in the above formula (1).
於以通式(2)所表示之有機烷氧基矽烷化合物中,作為3官能烷氧基矽烷,可列舉:甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三丙氧基矽烷、甲基三丁氧基矽烷、甲基-三(2-甲氧基乙氧基)矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙基三丙氧基矽烷、乙基三丁氧基矽烷、乙基-三(2-甲氧基乙氧基)矽烷、己基三甲氧基矽烷、己基三乙氧基矽烷、己基三丙氧基矽烷、己基三丁氧基矽烷、癸基三甲氧基矽烷、癸基三乙氧基矽烷、癸基三丙氧基矽烷、癸基三丁氧基矽烷、於取代基中導入有氟原子之三氟丙基三甲氧基矽烷等氟烷基(三烷氧基)矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷等。又,亦可列舉:具有2種烷氧基之甲基二甲氧基(乙氧基)矽烷、乙基二乙氧基(甲氧基)矽烷等。In the organoalkoxydecane compound represented by the formula (2), examples of the trifunctional alkoxydecane include methyltrimethoxydecane, methyltriethoxydecane, and methyltripropoxyl. Decane, methyl tributoxydecane, methyl-tris(2-methoxyethoxy)decane, ethyltrimethoxydecane, ethyltriethoxydecane, ethyltripropoxydecane, B Tris-butoxy decane, ethyl-tris(2-methoxyethoxy)decane, hexyltrimethoxydecane, hexyltriethoxydecane, hexyltripropoxydecane, hexyltributyloxydecane, Fluorine-based trimethoxy decane, decyl triethoxy decane, decyl tripropoxy decane, decyl tributoxy decane, fluorine having a fluorine atom introduced into a substituent, such as trifluoropropyltrimethoxy decane Alkyl (trialkoxy)decane, phenyltrimethoxydecane, phenyltriethoxydecane, vinyltrimethoxydecane, vinyltriethoxydecane, γ-methylpropenyloxypropyl Trimethoxy decane and the like. Further, examples thereof include methyldimethoxy(ethoxy)decane having two alkoxy groups, ethyldiethoxy(methoxy)decane, and the like.
作為2官能烷氧基矽烷,可列舉:二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、雙(2-甲氧基乙氧基)二甲基矽烷、二乙基二乙氧基矽烷、二苯基二甲氧基矽烷、二苯基二乙氧基矽烷等。Examples of the bifunctional alkoxydecane include dimethyldimethoxydecane, dimethyldiethoxydecane, bis(2-methoxyethoxy)dimethylnonane, and diethyldiethylamine. Oxydecane, diphenyldimethoxydecane, diphenyldiethoxydecane, and the like.
作為聚有機烷氧基矽烷化合物之具體例,可列舉:多摩化學工業股份有限公司製造之「MTMS-A」;Colcoat股份有限公司製造之「SS-101」;東麗道康寧(Toray-Dow Corning)股份有限公司製造之「AZ-6101」、「SR2402」、「AY42-163」等。Specific examples of the polyorgano alkoxydecane compound include "MTMS-A" manufactured by Tama Chemical Industry Co., Ltd.; "SS-101" manufactured by Colcoat Co., Ltd.; Toray-Dow Corning "AZ-6101", "SR2402", "AY42-163" manufactured by the company.
(A-3)化合物為具有胺基及烷氧基之矽烷化合物,且為不含環氧基及異氰酸酯基之烷氧基矽烷化合物。又,亦可使用其部分縮合物(含有胺基之聚有機烷氧基矽烷化合物)。該等化合物可單獨使用1種,亦可組合使用2種以上。The compound (A-3) is a decane compound having an amine group and an alkoxy group, and is an alkoxydecane compound containing no epoxy group or isocyanate group. Further, a partial condensate (polyorgano alkoxydecane compound containing an amine group) may also be used. These compounds may be used alone or in combination of two or more.
作為(A-3)化合物,含有胺基之有機烷氧基矽烷化合物及其部分縮合物,例如可以下述通式(3)表示。The organoalkoxydecane compound containing an amine group and a partial condensate thereof as the compound (A-3) can be represented, for example, by the following formula (3).
R4 b Si(OR5 )4-b ......(3)R 4 b Si(OR 5 ) 4-b ......(3)
[式中,R4 為碳數1~4之烷基;乙烯基;苯基;或者經選自甲基丙烯醯氧基、胺基(-NH2 基)、胺基烷基[-(CH2 )x -NH2 基(其中,x為1~3之整數)])、烷基胺基[-NHR基(其中,R為碳數1~3之烷基)中的1種以上基所取代之碳數為1~3之烷基;R4 之至少1個為經胺基、或者胺基烷基或烷基胺基中之任一者所取代之碳數為1~3之烷基;R5 為碳數1~4之烷基,b為1或2;於R4 為複數個之情形時,複數個R4 可相同亦可不同,複數個OR5 可相同亦可不同]。Wherein R 4 is an alkyl group having 1 to 4 carbon atoms; a vinyl group; a phenyl group; or an alkyl group selected from a methacryloxy group, an amine group (-NH 2 group), an amino group [-(CH) 2 ) an x- NH 2 group (wherein x is an integer of 1 to 3)]), and an alkylamino group [-NHR group (wherein R is an alkyl group having 1 to 3 carbon atoms) Substituting an alkyl group having 1 to 3 carbon atoms; at least one of R 4 is an alkyl group having 1 to 3 carbon atoms substituted by an amine group or an aminoalkyl group or an alkylamine group R 5 is an alkyl group having 1 to 4 carbon atoms, and b is 1 or 2; when R 4 is plural, plural R 4 's may be the same or different, and a plurality of OR 5 may be the same or different.
於上述通式(3)中,碳數為1~3之烷基、碳數為1~4之烷基係如上述通式(1)或(2)中所說明。In the above formula (3), an alkyl group having 1 to 3 carbon atoms and an alkyl group having 1 to 4 carbon atoms are as described in the above formula (1) or (2).
作為以通式(3)所表示之含有胺基之有機烷氧基矽烷化合物之具體例,可列舉:N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基甲基二乙氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三乙氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、N-甲基胺基丙基三甲氧基矽烷、N-甲基胺基丙基三乙氧基矽烷等。Specific examples of the organoalkoxydecane compound containing an amine group represented by the formula (3) include N-(2-aminoethyl)-3-aminopropylmethyldimethoxy group. Decane, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane, N-(2-aminoethyl)-3-aminopropylmethyldiethoxydecane, N -(2-Aminoethyl)-3-aminopropyltriethoxydecane, 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, N-methylamine Propyltrimethoxydecane, N-methylaminopropyltriethoxydecane, and the like.
又,作為含有胺基之聚有機烷氧基矽烷化合物,例如可列舉:信越矽酮(Shin-Etsu Silicones)股份有限公司製造之「KBP-90」等。In addition, examples of the polyorgano alkoxydecane compound containing an amine group include "KBP-90" manufactured by Shin-Etsu Silicones Co., Ltd., and the like.
(A-4)化合物為具有環氧基及烷氧基之矽烷化合物,且為不含胺基及異氰酸酯基之烷氧基矽烷化合物。又,亦可使用其部分縮合物(含有環氧基之聚有機烷氧基矽烷化合物)。該等化合物可單獨使用1種,亦可組合使用2種以上。The compound (A-4) is a decane compound having an epoxy group and an alkoxy group, and is an alkoxydecane compound containing no amine group or isocyanate group. Further, a partial condensate (polyoxyalkoxydecane compound containing an epoxy group) may also be used. These compounds may be used alone or in combination of two or more.
作為(A-4)化合物,含有環氧基之有機烷氧基矽烷化合物及其部分縮合物。例如可以下述通式(4)表示。As the compound (A-4), an epoxy group-containing organoalkoxydecane compound and a partial condensate thereof. For example, it can be represented by the following general formula (4).
[R6 c Si(OR7 )4-c ......(4)[R 6 c Si(OR 7 ) 4-c ......(4)
[式中,R6 為碳數1~4之烷基;乙烯基;苯基;或者經選自甲基丙烯醯氧基、環氧丙氧基、3,4-環氧基環己基中的1種以上基所取代之碳數為1~3之烷基;R6 之至少1個為經環氧丙氧基或3,4-環氧基環己基所取代之碳數為1~3之烷基;R7 為碳數1~4之烷基,c為1或2;於R6 為複數個之情形時,複數個R6 可相同亦可不同,複數個OR7 可相同亦可不同]。Wherein R 6 is an alkyl group having 1 to 4 carbon atoms; a vinyl group; a phenyl group; or an alkyl group selected from the group consisting of a methacryloxy group, a glycidoxy group, and a 3,4-epoxycyclohexyl group. One or more substituents are substituted with an alkyl group having 1 to 3 carbon atoms; at least one of R 6 is substituted by a glycidoxy group or a 3,4-epoxycyclohexyl group having a carbon number of 1 to 3 Alkyl; R 7 is an alkyl group having 1 to 4 carbon atoms, and c is 1 or 2; when R 6 is plural, a plurality of R 6 may be the same or different, and a plurality of OR 7 may be the same or different. ].
於上述通式(4)中之碳數為1~3之烷基、碳數為1~4之烷基係如上述通式(1)或(2)中所說明。The alkyl group having 1 to 3 carbon atoms and the alkyl group having 1 to 4 carbon atoms in the above formula (4) is as described in the above formula (1) or (2).
作為以通式(4)所表示之含有環氧基之有機烷氧基矽烷化合物之具體例,可列舉:3-環氧丙氧基丙基甲基二甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、2-(3,4-環氧基環己基)乙基三甲氧基矽烷、2-(3,4-環氧基環己基)乙基三乙氧基矽烷等。Specific examples of the epoxy group-containing organoalkoxydecane compound represented by the formula (4) include 3-glycidoxypropylmethyldimethoxydecane and 3-epoxypropyl. Oxypropylmethyldiethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane, 2-(3,4-epoxy Ethylcyclohexyl)ethyltrimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltriethoxydecane, and the like.
(A-5)化合物為具有烷氧基之封端化異氰酸基矽烷化合物(一般而言,亦稱為封端化異氰酸酯基矽烷化合物),且為雖含有封端化異氰酸酯基但不含有胺基及環氧基之烷氧基矽烷化合物。又,亦可使用其部分縮合物(含有封端化異氰酸酯基之聚有機烷氧基矽烷化合物)。該等化合物可單獨使用1種,亦可使用2種以上。The compound (A-5) is a blocked isocyanatodecane compound having an alkoxy group (generally, also referred to as a blocked isocyanate decane compound), and contains a blocked isocyanate group but does not contain Amino and epoxy alkoxydecane compounds. Further, a partial condensate (polyorgano alkoxy decane compound containing a blocked isocyanate group) may also be used. These compounds may be used alone or in combination of two or more.
再者,所謂封端化異氰酸基矽烷化合物,係指以肟等封端劑(blocking agent)將異氰酸酯基加以保護而使其不活化,再藉由加熱使其去封端化以使異氰酸酯基活化(再生)之異氰酸基矽烷化合物(一般而言,亦稱為異氰酸酯基矽烷化合物)。Further, the term "blocked isocyanatodecane compound" means that the isocyanate group is protected from blocking by a blocking agent such as hydrazine, and is further blocked by heating to cause isocyanate. A base activated (regenerated) isocyanatodecane compound (generally, also known as an isocyanate decane compound).
作為(A-5)化合物,含有封端化異氰酸酯基之有機烷氧基矽烷化合物及其部分縮合物,例如可以下述通式(5)來表示。The organoalkoxydecane compound containing a blocked isocyanate group and a partial condensate thereof as the compound (A-5) can be represented, for example, by the following formula (5).
R8 d Si(OR9 )4-d ......(5)R 8 d Si(OR 9 ) 4-d ......(5)
[式中,R8 為碳數1~4之烷基;乙烯基;苯基;或者經選自甲基丙烯醯氧基、封端化異氰酸酯基中的1種以上基所取代之碳數為1~3之烷基,R8 之至少1個為經封端化異氰酸酯基取代之碳數為1~3之烷基;R9 為碳數1~4之烷基,d為1或2;於R8 為複數個情形時,複數個R8 可相同亦可不同,複數個OR9 可相同亦可不同]。Wherein R 8 is an alkyl group having 1 to 4 carbon atoms; a vinyl group; a phenyl group; or a carbon number substituted with one or more groups selected from the group consisting of a methacryloxy group and a blocked isocyanate group; The alkyl group of 1 to 3, at least one of R 8 is an alkyl group having 1 to 3 carbon atoms substituted by a blocked isocyanate group; R 9 is an alkyl group having 1 to 4 carbon atoms, and d is 1 or 2; When R 8 is a plurality of cases, the plurality of R 8 may be the same or different, and the plurality of OR 9 may be the same or different].
於上述通式(5)中,碳數為1~3之烷基、碳數為1~4之烷基係如上述通式(1)或(2)中所說明。In the above formula (5), an alkyl group having 1 to 3 carbon atoms and an alkyl group having 1 to 4 carbon atoms are as described in the above formula (1) or (2).
作為以上述通式(5)所表示之含有封端化異氰酸酯基之有機烷氧基矽烷化合物之具體例,可列舉將3-異氰酸基丙基三甲氧基矽烷、3-異氰酸基丙基三乙氧基矽烷、3-異氰酸基丙基甲基二甲氧基矽烷、3-異氰酸基丙基甲基二乙氧基矽烷、3-異氰酸基丙基乙基二乙氧基矽烷等化合物中的異氰酸酯基以封端劑加以保護者。該等之中,作為較佳化合物,可列舉:3-封端化異氰酸基丙基三乙氧基矽烷。Specific examples of the organoalkoxydecane compound having a blocked isocyanate group represented by the above formula (5) include 3-isocyanatopropyltrimethoxydecane and 3-isocyanato group. Propyltriethoxydecane, 3-isocyanatopropylmethyldimethoxydecane, 3-isocyanatopropylmethyldiethoxydecane, 3-isocyanatopropylethyl The isocyanate group in the compound such as diethoxydecane is protected by a blocking agent. Among these, as a preferable compound, 3-blocked isocyanatopropyl triethoxy decane is mentioned.
作為異氰酸酯基之封端劑,可使用:丙酮肟、2-丁酮肟、環己酮肟、甲基異丁基酮肟等肟化合物;ε-己內醯胺等內醯胺類;單烷基酚(甲酚、壬基酚等)等烷基酚類;3,5-二甲苯酚、二第三丁基苯酚等二烷基酚類;三甲基酚等三烷基酚類;丙二酸二乙酯等丙二酸二酯;乙醯丙酮、如乙醯乙酸乙酯之乙醯乙酸酯等活性亞甲基化合物類;甲醇、乙醇、正丁醇等醇類;甲基溶纖劑、丁基溶纖劑等含有羥基之醚類;乳酸乙酯、乳酸戊酯等含有羥基之酯類;丁基硫醇、己基硫醇等硫醇類;乙醯苯胺、丙烯醯胺、二聚酸醯胺等醯胺類;咪唑、2-乙基咪唑等咪唑類;3,5-二甲基吡唑等吡唑類;1,2,4-三唑等三唑類;丁二醯亞胺、鄰苯二甲醯亞胺等醯亞胺類等。又,為了控制封端劑之解離溫度,亦可併用二月桂酸二丁基錫(dibutyltin dilaurate)等觸媒。As the terminal blocking agent for the isocyanate group, an anthracene compound such as acetone oxime, 2-butanone oxime, cyclohexanone oxime or methyl isobutyl ketone oxime; an indoleamine such as ε-caprolactam; Alkylphenols such as phenol (cresol, nonylphenol, etc.); dialkylphenols such as 3,5-xylenol and di-tert-butylphenol; trialkylphenols such as trimethylphenol; Malonic acid diester such as diethyl diacetate; active methylene compound such as acetamidine acetone, ethyl acetate such as ethyl acetate; methanol such as methanol, ethanol or n-butanol; a hydroxyl group-containing ether such as a fiber or a butyl cellosolve; a hydroxyl group-containing ester such as ethyl lactate or amyl lactate; a mercaptan such as butyl mercaptan or hexyl mercaptan; acetanilide, acrylamide, and dimerization. Hydrazines such as decylamine; imidazoles such as imidazole and 2-ethylimidazole; pyrazoles such as 3,5-dimethylpyrazole; triazoles such as 1,2,4-triazole; Amines such as amines and phthalimides. Further, in order to control the dissociation temperature of the blocking agent, a catalyst such as dibutyltin dilaurate may be used in combination.
本發明之塗布液中含有有機高分子微粒(以下,有時稱為高分子紫外線吸收樹脂微粒)作為(B)成分,該有機高分子微粒子含有包含具有紫外線吸收基之單體單元之共聚物。The coating liquid of the present invention contains organic polymer fine particles (hereinafter sometimes referred to as polymer ultraviolet absorbing resin fine particles) as the component (B), and the organic polymer fine particles contain a copolymer containing a monomer unit having an ultraviolet absorbing group.
作為該高分子紫外線吸收樹脂微粒,例如可例示:使側鏈上具有發揮紫外線吸收劑之作用的骨架(二苯甲酮系、苯并三唑系、三系等)之丙烯酸系單體(以下,稱為紫外線吸收性丙烯酸系單體)與其他乙烯系不飽和化合物(丙烯酸、甲基丙烯酸及該等之衍生物、苯乙烯、乙酸乙烯酯等)共聚合而成者。先前之紫外線吸收劑一般為分子量200~700之低分子,相對於此,高分子紫外線吸收樹脂微粒之重量平均分子量通常超過1萬。該高分子紫外線吸收樹脂微粒係與塑膠的相容性及耐熱性等自先前以來所存在之低分子型紫外線吸收劑的缺點得到改良、且可長期賦予耐候性能者。The polymer ultraviolet ray absorbing resin fine particles are, for example, a skeleton having a function of exhibiting an ultraviolet absorbing agent in a side chain (benzophenone-based, benzotriazole-based, or tertiary) Acrylic monomer (hereinafter referred to as ultraviolet absorbing acrylic monomer) and other ethylenically unsaturated compounds (acrylic acid, methacrylic acid and derivatives thereof, styrene, vinyl acetate, etc.) Aggregated. The conventional ultraviolet absorber is generally a low molecular weight of 200 to 700. In contrast, the weight average molecular weight of the polymer ultraviolet absorbing resin particles is usually more than 10,000. The polymer ultraviolet ray absorbing resin particles are improved in compatibility with plastics, heat resistance, and the like, and the disadvantages of the low molecular weight ultraviolet ray absorbent which have existed from the prior art are improved, and the weather resistance can be imparted for a long period of time.
作為上述紫外線吸收性丙烯酸系單體,若係分子內具有各為至少1個之紫外線吸收基及丙烯醯基之化合物即可,並無特別限制。作為此種化合物,例如可列舉:以下述通式(8)所表示之苯并三唑系化合物、以及以通式(9)所表示之二苯甲酮系化合物。The ultraviolet absorbing acrylic monomer is not particularly limited as long as it has at least one ultraviolet absorbing group and an acryl fluorenyl group in the molecule. Examples of such a compound include a benzotriazole-based compound represented by the following formula (8) and a benzophenone-based compound represented by the formula (9).
[式中,X表示氫原子或氯原子,R10 表示氫原子、甲基、或碳數為4~8之三級烷基,R11 表示直鏈狀或支鏈狀之碳數為2~10之伸烷基,R12 表示氫原子或甲基,p表示0或1]。[wherein, X represents a hydrogen atom or a chlorine atom, R 10 represents a hydrogen atom, a methyl group, or a tertiary alkyl group having a carbon number of 4 to 8, and R 11 represents a linear or branched carbon number of 2~ 10 is an alkyl group, R 12 represents a hydrogen atom or a methyl group, and p represents 0 or 1].
[式中,R13 表示氫原子或甲基,R14 表示經取代或未經取代之直鏈狀或支鏈狀之碳數為2~10之伸烷基,R15 表示氫原子或羥基,R16 表示氫原子、羥基、或碳數為1~6之烷氧基]。Wherein R 13 represents a hydrogen atom or a methyl group, and R 14 represents a substituted or unsubstituted linear or branched alkyl group having 2 to 10 carbon atoms, and R 15 represents a hydrogen atom or a hydroxyl group. R 16 represents a hydrogen atom, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms.
作為以上述通式(8)所表示之苯并三唑系化合物之具體例,例如可列舉:2-(2'-羥基-5'-(甲基)丙烯醯氧基苯基)-2H-苯并三唑、2-(2'-羥基-3'-第三丁基-5'-(甲基)丙烯醯氧基甲基苯基)-2H-苯并三唑、2-[2'-羥基-5'-(2-(甲基)丙烯醯氧基乙基)苯基]-2H-苯并三唑、2-[2'-羥基-3'-第三丁基-5'-(2-(甲基)丙烯醯氧基乙基)苯基]-5-氯-2H-苯并三唑、2-[2'-羥基-3'-甲基-5'-(8-(甲基)丙烯醯氧基辛基)苯基]-2H-苯并三唑等。Specific examples of the benzotriazole-based compound represented by the above formula (8) include, for example, 2-(2'-hydroxy-5'-(meth)acryloxyphenyl)-2H- Benzotriazole, 2-(2'-hydroxy-3'-tert-butyl-5'-(meth)acryloxymethylphenyl)-2H-benzotriazole, 2-[2' -hydroxy-5'-(2-(methyl)acryloxyethyl)phenyl]-2H-benzotriazole, 2-[2'-hydroxy-3'-tert-butyl-5'- (2-(Methyl)acryloxyethyl)phenyl]-5-chloro-2H-benzotriazole, 2-[2'-hydroxy-3'-methyl-5'-(8-( Methyl)propenyloxyoctyl)phenyl]-2H-benzotriazole or the like.
作為以上述通式(9)所表示之二苯甲酮系化合物之具體例,例如可列舉:2-羥基-4-(2-(甲基)丙烯醯氧基乙氧基)二苯甲酮、2-羥基-4-(4-(甲基)丙烯醯氧基丁氧基)二苯甲酮、2,2'-二羥基-4-(2-(甲基)丙烯醯氧基乙氧基)二苯甲酮、2,4-二羥基-4'-(2-(甲基)丙烯醯氧基乙氧基)二苯甲酮、2,2',4-三羥基-4'-(2-(甲基)丙烯醯氧基乙氧基)二苯甲酮、2-羥基-4-(3-(甲基)丙烯醯氧基-2-羥基丙氧基)二苯甲酮、2-羥基-4-(3-(甲基)丙烯醯氧基-1-羥基丙氧基)二苯甲酮等。Specific examples of the benzophenone-based compound represented by the above formula (9) include, for example, 2-hydroxy-4-(2-(methyl)propenyloxyethoxy)benzophenone. , 2-hydroxy-4-(4-(methyl)propenyloxybutoxy)benzophenone, 2,2'-dihydroxy-4-(2-(methyl)acryloxyethoxy ethoxylate Benzophenone, 2,4-dihydroxy-4'-(2-(methyl)propenyloxyethoxy)benzophenone, 2,2',4-trihydroxy-4'- (2-(Methyl)acryloxyethoxyethoxy)benzophenone, 2-hydroxy-4-(3-(methyl)propenyloxy-2-hydroxypropoxy)benzophenone, 2-hydroxy-4-(3-(methyl)propenyloxy-1-hydroxypropoxy)benzophenone or the like.
該等紫外線吸收性丙烯酸系單體可單獨使用1種,亦可組合使用2種以上。These ultraviolet absorbing acrylic monomers may be used alone or in combination of two or more.
該作為(B)成分之高分子紫外線吸收樹脂微粒中之上述紫外線吸收性丙烯酸系單體單元的含量,就所得硬化膜的紫外線吸收能力、其他物性及經濟性之平衡等觀點而言,通常為5~70質量%左右,較好的是10~60質量%左右。The content of the ultraviolet absorbing acrylic monomer unit in the polymer ultraviolet absorbing resin fine particles as the component (B) is usually in terms of the ultraviolet absorbing ability, other physical properties, and economy of the cured film. 5~70% by mass, preferably about 10~60% by mass.
於本發明之塗布液中,該用作(B)成分之高分子紫外線吸收樹脂微粒就製造性、塗布液中之分散性、塗布液之塗布性及硬化膜之透明性等觀點而言,平均粒徑較好的是1~200nm之範圍,更好的是1~100nm之範圍。再者,該高分子紫外線吸收樹脂微粒之平均粒徑可藉由雷射繞射散射法進行測定。In the coating liquid of the present invention, the polymer ultraviolet absorbing resin fine particles used as the component (B) are averaged from the viewpoints of manufacturability, dispersibility in a coating liquid, coating properties of a coating liquid, and transparency of a cured film. The particle diameter is preferably in the range of 1 to 200 nm, more preferably in the range of 1 to 100 nm. Further, the average particle diameter of the polymer ultraviolet absorbing resin particles can be measured by a laser diffraction scattering method.
於本發明中,該高分子紫外線吸收樹脂微粒較好的是以分散於分散介質中之形態而使用;作為分散介質,例如可較好地列舉:水、甲醇、乙醇、丙醇、1-甲氧基-2-丙醇等低級醇;甲基溶纖劑等溶纖劑類等。藉由使用此種分散介質,高分子紫外線吸收樹脂微粒之分散性提高,可防止沈降。進而較好的是分散介質為水者。於分散介質為水之情形時,亦可用於在形成具有來自上述(A)成分之Si-O鍵之基質時所必需的矽烷化合物之水解、縮合反應中,因而較為適宜。In the present invention, the polymer ultraviolet absorbing resin fine particles are preferably used in a form dispersed in a dispersion medium; as the dispersion medium, for example, water, methanol, ethanol, propanol, 1-methyl is preferably exemplified. a lower alcohol such as oxy-2-propanol; a cellosolve such as a methyl cellosolve; By using such a dispersion medium, the dispersibility of the polymer ultraviolet absorbing resin fine particles is improved, and sedimentation can be prevented. Further preferably, the dispersion medium is water. When the dispersion medium is water, it can be used in the hydrolysis and condensation reaction of a decane compound which is necessary for forming a matrix having Si-O bonds derived from the above (A) component, and is therefore preferable.
對於該用作(B)成分之高分子紫外線吸收樹脂微粒之製造方法並無特別限制,可採用先前公知之方法,例如乳化聚合法及微細懸浮聚合法等。The method for producing the polymer ultraviolet absorbing resin fine particles used as the component (B) is not particularly limited, and a conventionally known method such as an emulsion polymerization method or a fine suspension polymerization method can be employed.
乳化聚合法係如下方法:使用包含水性分散介質、陰離子性或非離子性界面活性劑之乳化劑以及水溶性聚合起始劑,使包含作為單體之紫外線吸收性丙烯酸系單體、及與該單體共聚合之乙烯性不飽和單體之混合物乳化成微細之液滴,於包含上述單體混合物之界面活性劑微胞層內進行聚合,而獲得高分子紫外線吸收樹脂微粒之分散液。The emulsion polymerization method is a method of using a emulsifier comprising an aqueous dispersion medium, an anionic or nonionic surfactant, and a water-soluble polymerization initiator to form a UV-absorbing acrylic monomer as a monomer, and The mixture of the monomer-copolymerized ethylenically unsaturated monomers is emulsified into fine droplets, and polymerization is carried out in the surfactant microcap layer containing the above monomer mixture to obtain a dispersion of the polymer ultraviolet absorbing resin fine particles.
另一方面,微細懸浮聚合法係如下方法:首先,向水性介質中加入上述單體混合物、油溶性聚合起始劑、乳化劑以及視需要之其他添加劑並進行預混合,再利用均質機進行均質化處理,以進行油滴之粒徑調節。繼而,將經均質化處理之溶液送入聚合器中進行聚合反應,而獲得高分子紫外線吸收樹脂微粒之分散液。On the other hand, the fine suspension polymerization method is as follows: First, the above monomer mixture, an oil-soluble polymerization initiator, an emulsifier, and other additives as needed are added to an aqueous medium and premixed, and then homogenized by a homogenizer. The treatment is carried out to adjust the particle size of the oil droplets. Then, the homogenized solution is sent to a polymerization vessel to carry out a polymerization reaction, thereby obtaining a dispersion of the polymer ultraviolet absorbing resin fine particles.
上述任一種方法中之聚合溫度均為30~80℃左右。The polymerization temperature in any of the above methods is about 30 to 80 °C.
作為用於乳化聚合之水溶性聚合起始劑,例如可列舉:過硫酸鉀、過硫酸銨、過氧化氫等水溶性過氧化物;該等起始劑或者氫過氧化異丙苯(cumene hydroperoxide)、氫過氧化第三丁基等氫過氧化物;組合有酸性亞硫酸鈉、亞硫酸銨、抗壞血酸等還原劑之氧化還原系起始劑;2,2'-偶氮雙(2-甲基丙脒)二鹽酸鹽等水溶性偶氮化合物等。Examples of the water-soluble polymerization initiator used for the emulsion polymerization include water-soluble peroxides such as potassium persulfate, ammonium persulfate, and hydrogen peroxide; and such initiators or cumene hydroperoxide. a hydroperoxide such as a third butyl hydroperoxide; a redox initiator combined with a reducing agent such as acidic sodium sulfite, ammonium sulfite or ascorbic acid; 2,2'-azobis(2-methylpropane)水溶性) a water-soluble azo compound such as a dihydrochloride salt.
另一方面,作為用於微細懸浮聚合之油溶性聚合起始劑,例如可列舉:二醯基過氧化物(diacyl peroxide)類、酮過氧化物(ketone peroxide)類、過氧酯(peroxyester)類、過氧化二碳酸酯(peroxydicarbonate)類等油溶性有機過氧化物;2,2'-偶氮雙異丁腈、2,2'-偶氮雙(2,4-二甲基戊腈)等偶氮化合物等。On the other hand, examples of the oil-soluble polymerization initiator used for the fine suspension polymerization include diacyl peroxides, ketone peroxides, and peroxyesters. Oil-soluble organic peroxides such as peroxydicarbonate; 2,2'-azobisisobutyronitrile, 2,2'-azobis(2,4-dimethylvaleronitrile) Such as azo compounds and the like.
作為該可用作(B)成分之高分子紫外線吸收樹脂微粒之具體例,可列舉:一方社油脂工業股份有限公司製造之塗布用高分子紫外線吸收劑ULS-700、ULS-1770、ULS-383MA、ULS-1383MA、ULS-383MG、ULS-385MG、ULS-1383MG、ULS-1385MG、ULS-635MH等;Nikko化學研究所股份有限公司製造之高分子紫外線吸收樹脂塗料NCI-905-20EM及NCI-905-20EMA(以苯乙烯單體與苯并三唑系單體之共聚物形成之高分子紫外線吸收劑)等。Specific examples of the polymer ultraviolet absorbing resin fine particles which can be used as the component (B) include a coating polymer ultraviolet absorbers ULS-700, ULS-1770, and ULS-383MA manufactured by One Society of Oils and Fats Co., Ltd. , ULS-1383MA, ULS-383MG, ULS-385MG, ULS-1383MG, ULS-1385MG, ULS-635MH, etc.; UV-absorbing resin coatings NCI-905-20EM and NCI-905 manufactured by Nikko Chemical Research Institute Co., Ltd. -20EMA (polymer ultraviolet absorber formed by copolymer of styrene monomer and benzotriazole monomer).
於本發明中,作為(B)成分,上述高分子紫外線吸收樹脂微粒可單獨使用1種,亦可組合使用2種以上。In the present invention, the polymer ultraviolet absorbing resin fine particles may be used singly or in combination of two or more kinds as the component (B).
本發明之塗布液中含有膠體二氧化矽作為(C)成分。The coating liquid of the present invention contains colloidal cerium oxide as the component (C).
本發明中所使用之所謂膠體二氧化矽,亦指膠體二氧化矽、膠體矽酸。在水中係指藉由水合而在表面具有Si-OH基之氧化矽的膠體懸浮液,若向矽酸鈉的水溶液中加入鹽酸則生成。最近,相繼開發出新的製備法,有分散於非水溶液中者、及以氣相法所製作之微粉末狀者,粒徑亦為自數nm至數μm者,各種各樣。平均粒徑較好的是1~200nm左右。粒子之組成不定,亦存在形成矽氧烷鍵(-Si-O-、-Si-O-Si-)而高分子化者。粒子表面為多孔性,在水中一般帶負電。再者,上述平均粒徑可藉由雷射繞射散射法進行測定。The so-called colloidal cerium oxide used in the present invention also refers to colloidal cerium oxide or colloidal ceric acid. In water, it refers to a colloidal suspension of cerium oxide having a Si-OH group on the surface by hydration, and is formed by adding hydrochloric acid to an aqueous solution of sodium citrate. Recently, a new preparation method has been developed, which is dispersed in a non-aqueous solution, and a fine powder produced by a vapor phase method, and has a particle diameter of from several nm to several μm. The average particle diameter is preferably from about 1 to 200 nm. The composition of the particles is indefinite, and there is also a formation of a siloxane coupling (-Si-O-, -Si-O-Si-) and a high molecular weight. The surface of the particles is porous and generally negatively charged in water. Further, the above average particle diameter can be measured by a laser diffraction scattering method.
作為市售品,可列舉:扶桑化學工業股份有限公司製造之「超高純度膠體二氧化矽」Quartron PL系列(品名:PL-1、PL-3、PL-7);上述公司製造之「高純度有機溶膠」、日產化學工業股份有限公司製造之「膠體二氧化矽(品名:Snowtex 20、Snowtex 30、Snowtex 40、Snowtex O、Snowtex O-40、Snowtex C、Snowtex N、Snowtex S、Snowtex 20L、Snowtex OL等)」及「有機二氧化矽溶膠(品名:甲醇二氧化矽溶膠、MA-ST-MS、MA-ST-L、IPA-ST、IPA-ST- MS、IPA-ST-L、IPA-ST-ZL、IPA-ST-UP、EG-ST、NPC-ST-30、MEK-ST、MEK-ST-MS、MIBK-ST、XBA-ST、PMA-ST、DMAC-ST、PAM-ST等)」。As a commercial item, the "Ultra High Purity Colloidal Antimony Oxide" Quartron PL series (product name: PL-1, PL-3, PL-7) manufactured by Fuso Chemical Industry Co., Ltd.; "Purified organosol", manufactured by Nissan Chemical Industries Co., Ltd. "colloidal cerium oxide (product name: Snowtex 20, Snowtex 30, Snowtex 40, Snowtex O, Snowtex O-40, Snowtex C, Snowtex N, Snowtex S, Snowtex 20L, Snowtex OL, etc.) and "organic cerium oxide sol (product name: methanol cerium oxide sol, MA-ST-MS, MA-ST-L, IPA-ST, IPA-ST-MS, IPA-ST-L, IPA -ST-ZL, IPA-ST-UP, EG-ST, NPC-ST-30, MEK-ST, MEK-ST-MS, MIBK-ST, XBA-ST, PMA-ST, DMAC-ST, PAM-ST Wait)".
於本發明中,作為(C)成分,上述膠體二氧化矽可單獨使用1種,亦可組合使用2種以上。In the present invention, the colloidal ceria may be used singly or in combination of two or more kinds as the component (C).
本發明之塗布液含有硬化觸媒作為(D)成分。The coating liquid of the present invention contains a curing catalyst as the component (D).
該硬化觸媒係使上述(A)成分中的矽烷化合物(A-1)~(A-5)成分水解及縮合(硬化)之觸媒,例如可列舉:鹽酸、硫酸、硝酸、磷酸、亞硝酸、過氯酸、胺基磺酸等無機酸;甲酸、乙酸、丙酸、丁酸、乙二酸、檸檬酸、酒石酸、丁二酸、馬來酸、麩胺酸、乳酸、對甲苯磺酸等有機酸。The catalyst for hydrolyzing and condensing (curing) the decane compound (A-1) to (A-5) in the component (A), for example, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, or sub Mineral acids such as nitric acid, perchloric acid, aminosulfonic acid; formic acid, acetic acid, propionic acid, butyric acid, oxalic acid, citric acid, tartaric acid, succinic acid, maleic acid, glutamic acid, lactic acid, p-toluene Organic acids such as acids.
又,可列舉:氫氧化鋰、氫氧化鈉、氫氧化鉀、正己基胺、二甲基胺、三丁基胺、二氮雜雙環十一烯、乙酸乙醇胺、甲酸二甲基苯胺、苯甲酸四乙基銨鹽、乙酸鈉、乙酸鉀、丙酸鈉、麩胺酸鈉、丙酸鉀、甲酸鈉、甲酸鉀、乙酸苯甲醯基三甲基銨鹽、乙酸四甲基銨、辛酸錫等有機金屬鹽;鈦酸四異丙酯、鈦酸四丁酯、三異丁氧基鋁、三異丙氧基鋁、乙醯丙酮鋁、SnCl4 、TiCl4 、ZnCl4 等路易斯酸等。Further, examples thereof include lithium hydroxide, sodium hydroxide, potassium hydroxide, n-hexylamine, dimethylamine, tributylamine, diazabicycloundecene, ethanolamine, dimethylaniline formate, and benzoic acid. Tetraethylammonium salt, sodium acetate, potassium acetate, sodium propionate, sodium glutamate, potassium propionate, sodium formate, potassium formate, benzamidine trimethylammonium acetate, tetramethylammonium acetate, tin octylate, etc. Organometallic salts; tetraisopropyl titanate, tetrabutyl titanate, triisobutoxyaluminum, aluminum triisopropoxide, aluminum acetoacetate, Lewis acid such as SnCl 4 , TiCl 4 , ZnCl 4 , and the like.
該等硬化觸媒中,即使增加(B)及(C)成分之調配量,亦可進行高分散化,可提高所得膜之透明性,因此可較好地使用有機酸。尤其可使用有機羧酸,其中可較好地使用乙酸。Among these hardening catalysts, even if the amount of the components (B) and (C) is increased, the dispersion can be increased, and the transparency of the obtained film can be improved. Therefore, an organic acid can be preferably used. In particular, an organic carboxylic acid can be used, of which acetic acid can be preferably used.
於本發明中,作為(D)成分,上述硬化觸媒可單獨使用,亦可組合使用2種以上。In the present invention, as the component (D), the curing catalyst may be used singly or in combination of two or more.
本發明之塗布液含有分散介質作為(E)成分。The coating liquid of the present invention contains a dispersion medium as the component (E).
本發明之塗布液係以上述各成分粒子經分散於分散介質中之狀態而使用。本發明中所使用之分散介質,若係可將上述各成分粒子均勻混合且分散者即可,並無特別限定,例如除水之外,可列舉:醇類、芳香族烴類、醚類、酮類、酯類等有機系分散介質。該等有機系分散介質中,作為醇類之具體例,可列舉:甲醇、乙醇、正丙醇、異丙醇、正丁醇、第二丁醇、第三丁醇、正己醇、正辛醇、乙二醇、二乙二醇、三乙二醇、乙二醇單丁醚、乙二醇單乙醚乙酸酯、二乙二醇單乙醚、1-甲氧基-2-丙醇(丙二醇單甲醚)、丙二醇單甲醚乙酸酯、二丙酮醇、甲基溶纖劑、乙基溶纖劑、丙基溶纖劑、丁基溶纖劑等。The coating liquid of the present invention is used in a state in which the above-mentioned respective component particles are dispersed in a dispersion medium. The dispersion medium to be used in the present invention is not particularly limited as long as it can uniformly disperse and disperse the above-mentioned respective component particles. Examples of the water removal include alcohols, aromatic hydrocarbons, and ethers. An organic dispersion medium such as a ketone or an ester. In the organic dispersion medium, specific examples of the alcohol include methanol, ethanol, n-propanol, isopropanol, n-butanol, second butanol, third butanol, n-hexanol, and n-octanol. , ethylene glycol, diethylene glycol, triethylene glycol, ethylene glycol monobutyl ether, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether, 1-methoxy-2-propanol (propylene glycol) Monomethyl ether), propylene glycol monomethyl ether acetate, diacetone alcohol, methyl cellosolve, ethyl cellosolve, propyl cellosolve, butyl cellosolve, and the like.
作為其他分散介質之具體例,可列舉:環己酮、丙酮、甲基乙基酮、甲基異丁基酮.、四氫呋喃、1,4-二烷、1,2-二甲氧基乙烷、二甲苯、二氯乙烷、甲苯、乙酸甲酯、乙酸乙酯、乙酸乙氧基乙酯等。Specific examples of the other dispersion medium include cyclohexanone, acetone, methyl ethyl ketone, methyl isobutyl ketone, tetrahydrofuran, and 1,4-diene. Alkane, 1,2-dimethoxyethane, xylene, dichloroethane, toluene, methyl acetate, ethyl acetate, ethoxyethyl acetate, and the like.
該等分散介質中,就作為分散介質的性能之觀點而言,較好的是水及醇類。Among these dispersion media, water and alcohols are preferred from the viewpoint of the performance of the dispersion medium.
於本發明中,作為(E)成分,上述分散介質可單獨使用1種,亦可組合使用2種以上。In the present invention, the dispersion medium may be used singly or in combination of two or more kinds as the component (E).
本發明之塗布液較好的是含有經矽烷化合物處理(前處理)之氧化鈰作為(F)成分。The coating liquid of the present invention is preferably a cerium oxide containing a decane compound treated (pretreated) as the component (F).
此處所謂之前處理,係指藉由氧化鈰之OH基與矽烷化合物之矽醇基反應形成共價鍵而改變氧化鈰的表面狀態。經矽烷處理之氧化鈰即使與分散有陰離子性粒子之溶膠(例如膠體二氧化矽等)混合亦不會產生凝集或析出物,進而該經矽烷處理之氧化鈰可分散於水及醇之兩者中。The term "pretreatment" as used herein refers to changing the surface state of cerium oxide by reacting an OH group of cerium oxide with a sterol group of a decane compound to form a covalent bond. The decane-treated cerium oxide does not generate agglomerates or precipitates even when mixed with a sol (for example, colloidal cerium oxide or the like) in which anionic particles are dispersed, and the decane-treated cerium oxide can be dispersed in both water and alcohol. in.
對於所使用之氧化鈰並無特別限定,但較好的是呈粒子狀且平均粒徑為1~200nm者,就透明性之觀點而言,較好的是平均粒徑為1~100nm者。又,就提高分散性之觀點而言,於將(F)成分添加於本發明之塗布液中時,較好的是使其分散於水或醇等分散介質中後再添加。The cerium oxide to be used is not particularly limited, but is preferably in the form of particles and has an average particle diameter of from 1 to 200 nm. From the viewpoint of transparency, the average particle diameter is preferably from 1 to 100 nm. In addition, when the component (F) is added to the coating liquid of the present invention from the viewpoint of improving the dispersibility, it is preferably added after being dispersed in a dispersion medium such as water or alcohol.
所謂(F)成分之「分散」,係指分散相(固體)浮游懸浮於分散介質(液體)中之狀態。又,所謂「溶膠」,係指以液體為分散介質且以固體為分散粒子之膠體,有時亦稱為膠體溶液。又,上述氧化鈰微粒之平均粒徑可藉由雷射繞射散射法進行測定。The "dispersion" of the component (F) means a state in which the dispersed phase (solid) is suspended and suspended in a dispersion medium (liquid). Further, the term "sol" refers to a colloid in which a liquid is a dispersion medium and a solid is a dispersed particle, and is sometimes referred to as a colloidal solution. Further, the average particle diameter of the above cerium oxide microparticles can be measured by a laser diffraction scattering method.
作為分散介質,係基於上述(E)成分,較好的是水或醇。尤其醇係指由上述(A)成分中之(A-1)~(A-5)成分中所記載的矽烷化合物所生成之醇及上述(E)成分中所記載之醇,尤其好的是分散於甲醇、乙醇、正丙醇、異丙醇、1-甲氧基-2-丙醇等低級醇中。再者,作為分散介質之水或醇可單獨使用1種,亦可組合使用2種以上。The dispersion medium is based on the above component (E), and is preferably water or an alcohol. In particular, the alcohol is an alcohol produced from the decane compound described in the components (A-1) to (A-5) in the component (A), and the alcohol described in the component (E), and particularly preferably It is dispersed in a lower alcohol such as methanol, ethanol, n-propanol, isopropanol or 1-methoxy-2-propanol. Further, the water or the alcohol as the dispersion medium may be used singly or in combination of two or more.
該(F)成分係使具有表面電荷之氧化鈰溶膠與矽烷化合物反應而使其表面改質而成之分散液,係不會產生凝集、析出、凝膠化而可適宜添加於本發明之塗布液中者。該矽烷化合物係亦完全包含烷氧基矽烷或其水解縮合物者。因此,由於無法求出在分散液狀態下之正確的固形物濃度,而將成為原料之氧化鈰之量與烷氧基矽烷之完全縮合物之量的總量除以投入量之總量,將以百分率所表示者作為計算上之固形物濃度。The component (F) is a dispersion obtained by reacting a surface-charged cerium oxide sol with a decane compound to modify the surface thereof, and is preferably added to the coating of the present invention without causing aggregation, precipitation, or gelation. In the liquid. The decane compound also completely contains an alkoxydecane or a hydrolysis condensate thereof. Therefore, since the correct solid concentration in the dispersion state cannot be obtained, the total amount of the amount of the cerium oxide which is the raw material and the amount of the complete condensate of the alkoxysilane is divided by the total amount of the input amount. The percentage expressed as a percentage of the solid matter concentration.
對於所使用原料之氧化鈰微粒之製造方法並無特別限制,但由於在粉體狀態下難以與矽烷化合物反應,故適宜作為分散液來使用。用以使其分散之穩定劑就促進矽烷化合物的水解反應之觀點而言,可適宜利用使用酸性分散穩定劑之酸穩定型陽離子系氧化鈰溶膠,較理想的是平均粒徑為1~200nm者,就賦予透明性之觀點而言,平均粒徑較好的是1~100nm。作為所添加之酸性分散穩定劑,可列舉:鹽酸、硝酸、過氯酸等無機酸;或乙酸、甲酸、乳酸等有機羧酸。該等可單獨或者併用使用。其中,有機羧酸具有針對金屬之配位效果,因而就使氧化鈰與矽烷化合物進一步反應之觀點而言,分散穩定劑以使用無機酸、更適宜的是鹽酸之氧化鈰溶膠為佳。The method for producing the cerium oxide fine particles of the raw material to be used is not particularly limited. However, since it is difficult to react with the decane compound in the powder state, it is suitably used as a dispersion liquid. The acid-stabilized cationic cerium oxide sol using an acidic dispersion stabilizer can be suitably used from the viewpoint of promoting the hydrolysis reaction of the decane compound, and it is preferable that the average particle diameter is 1 to 200 nm. From the viewpoint of imparting transparency, the average particle diameter is preferably from 1 to 100 nm. Examples of the acidic dispersion stabilizer to be added include inorganic acids such as hydrochloric acid, nitric acid, and perchloric acid; and organic carboxylic acids such as acetic acid, formic acid, and lactic acid. These can be used alone or in combination. Among them, the organic carboxylic acid has a coordination effect with respect to a metal, and therefore, from the viewpoint of further reacting cerium oxide with a decane compound, the dispersion stabilizer is preferably a cerium oxide sol which is a mineral acid, more preferably hydrochloric acid.
作為市售品,可列舉:多木化學股份有限公司製造之「Needral H-15」等。As a commercial item, "Needral H-15" by Domus Chemical Co., Ltd., etc. are mentioned.
所使用原料之矽烷化合物可與上述(A)成分同等地定義,為了在製造硬化膜時使其與(A)成分及(C)成分之矽醇基適宜形成矽氧烷鍵,則較好的是上述(A-1)化合物。該等可單獨使用,亦可將兩者組合使用。The decane compound of the raw material to be used can be defined in the same manner as the above-mentioned component (A), and it is preferred to form a decyl alcohol bond with a sterol group of the component (A) and the component (C) when the cured film is produced. It is the above compound (A-1). These may be used alone or in combination.
又,作為(F)成分中之矽烷化合物,除上述四烷氧基矽烷及其水解縮合物或者聚烷氧基矽烷之外,亦可併用有機烷氧基矽烷或其水解縮合物或者聚有機烷氧基矽烷來使用。作為有機烷氧基矽烷之具體例,係(A)成分中具有一種以上之有機取代基者,更好的是可列舉(A-2)~(A-5)成分。Further, as the decane compound in the component (F), in addition to the above tetraalkoxy decane and its hydrolysis condensate or polyalkoxydecane, an organic alkoxysilane or a hydrolysis condensate thereof or a polyorganoalkane may be used in combination. Oxydecane is used. Specific examples of the organoalkoxydecane include those having one or more organic substituents in the component (A), and more preferably (A-2) to (A-5).
表面處理之結構可為完全的2層結構,亦可為各自的烷氧基矽烷或其水解縮合物或者聚烷氧基矽烷混合存在之結構。The surface treatment structure may be a completely two-layer structure, or may be a structure in which a respective alkoxydecane or a hydrolysis condensate thereof or a polyalkoxydecane is mixed.
氧化鈰粒子表層之OH基的反應性高,因而若於表面處理中僅直接使用有機烷氧基矽烷,則由於其反應速度之不同而存在促進僅氧化鈰的凝集、凝膠化之虞。因此,作為(F)成分中之氧化鈰之表面處理,較理想的是,第一,利用反應性高之四烷氧基矽烷或其水解縮合物對氧化鈰表層進行處理,第二,使有機烷氧基矽烷或其水解縮合物反應而進行處理。Since the OH group of the surface layer of the cerium oxide particles has high reactivity, when only the organoalkoxysilane is used as it is in the surface treatment, aggregation and gelation of only cerium oxide are promoted due to the difference in the reaction rate. Therefore, as the surface treatment of cerium oxide in the component (F), it is preferred that, first, the cerium oxide surface layer is treated with a highly reactive tetraalkoxy decane or a hydrolysis condensate thereof, and secondly, organic The alkoxydecane or its hydrolysis condensate is reacted and treated.
如此,在(F)成分之矽烷處理層中形成具有一部分有機取代基之結構,藉此可在製造硬化膜時使其與(A)成分及(C)成分之矽醇基適宜形成矽氧烷鍵,同時可進一步提高硬化膜之柔軟性。Thus, a structure having a part of the organic substituent is formed in the decane-treated layer of the component (F), whereby the sterol group of the component (A) and the component (C) can be suitably formed into a decane when the cured film is produced. The key can further improve the softness of the cured film.
一般的陽離子性氧化鈰溶膠,若並非在以矽烷化合物進行表面處理之後,則由於與本發明塗布液中之具有陰離子性之成分產生凝集、凝膠化,而變得難以添加。因此,為了使其穩定地分散於本發明之塗布液中,必需如上述般使陽離子性氧化鈰溶膠之氧化鈰微粒表層部之OH基與矽烷化合物之矽醇基反應而進行表面處理後使用。When the surface of the cationic cerium oxide sol is not subjected to surface treatment with a decane compound, aggregation with a component having an anionic property in the coating liquid of the present invention causes aggregation and gelation, which makes it difficult to add. Therefore, in order to stably disperse it in the coating liquid of the present invention, it is necessary to react the OH group of the surface layer portion of the cerium oxide microparticles of the cationic cerium oxide sol with the sterol group of the decane compound and perform surface treatment as described above.
於(F)成分中,用於表面處理之矽烷化合物的使用量係以作為矽烷化合物之金屬氧化物之質量來考慮。矽烷化合物之金屬氧化物例如係以下述通式來定義。In the component (F), the amount of the decane compound used for the surface treatment is considered in consideration of the mass of the metal oxide as the decane compound. The metal oxide of the decane compound is, for example, defined by the following formula.
R1 m R2 n SiO((4-m-n)/2) R 1 m R 2 n SiO ((4-mn)/2)
(式中,R1 及R2 分別獨立為碳數1~10之烷基或氟烷基;乙烯基;苯基;或者經選自甲基丙烯醯氧基、胺基、胺基烷基、烷基胺基、環氧丙氧基、3,4-環氧基環己基及封端化異氰酸酯基中之1種以上基所取代之碳數為1~3之烷基,m及n分別獨立為0、1或2,m+n為0、1或2)。(wherein R 1 and R 2 are each independently an alkyl group having 1 to 10 carbon atoms or a fluoroalkyl group; a vinyl group; a phenyl group; or an alkyl group selected from a methacryloxy group, an amine group, an amino group, or an alkyl group; The alkyl group having 1 to 3 carbon atoms substituted by one or more of the alkylamino group, the glycidoxy group, the 3,4-epoxycyclohexyl group and the blocked isocyanate group, and m and n are each independently Is 0, 1, or 2, and m+n is 0, 1, or 2).
溶膠中之金屬氧化物總質量(CeO2 與R1 m R2 n SiO((4-m-n)/2) 之總量)中的矽烷化合物之質量(R1 m R2 n SiO((4-m-n)/2) )之比例較好的是50質量%以下,更好的是2~40質量%。若少於此,則存在氧化鈰其本身產生凝集、凝膠化之虞,進而若多於此,則存在矽烷化合物其本身發生反應而凝集、凝膠化之虞。The mass of the total mass of the metal oxide in the sol (the total amount of CeO 2 and R 1 m R 2 n SiO ((4-mn)/2)) (R 1 m R 2 n SiO ((4- The ratio of mn)/2) ) is preferably 50% by mass or less, more preferably 2% to 40% by mass. If it is less than this, cerium oxide itself may be aggregated or gelled, and if it is more than this, the decane compound itself may react and aggregate and gel.
該(F)成分之具體製造方法可採用下述方法。The specific method for producing the component (F) can be carried out by the following method.
製備包含陽離子性氧化鈰溶膠與上述(E)成分之第一混合液,繼而混合入一種以上之矽烷化合物(A)成分,藉此製備第二液。於室溫下之熟成之後,進而進行室溫或加熱攪拌,藉此製成(F)成分。(E)成分可在製備(F)成分後進而加入以進行稀釋,又,亦可加入其他分散介質以進行分散介質置換。A first liquid mixture comprising a cationic cerium oxide sol and the above component (E) is prepared, followed by mixing one or more decane compound (A) components, thereby preparing a second liquid. After aging at room temperature, the mixture is further stirred at room temperature or under heating to prepare a component (F). The component (E) may be further added after the preparation of the component (F) for dilution, or may be added to another dispersion medium for displacement of the dispersion medium.
進而,於併用有機烷氧基矽烷之情形時,更好的是可採用下述方法。Further, in the case of using an alkoxysilane in combination, it is more preferable to employ the following method.
製備包含陽離子性氧化鈰溶膠與下述(E)成分之第一混合液,繼而混合入四烷氧基矽烷((A)成分),藉此製備第二液。於室溫下之熟成之後,混合入有機烷氧基矽烷((A)成分),製備第三混合液。進而進行室溫或加熱攪拌,藉此製成(F)成分。(E)成分可在製備(F)成分後進而加入以進行稀釋,又,亦可加入其他分散介質以進行分散介質置換。A first liquid mixture comprising a cationic cerium oxide sol and the following component (E) is prepared, followed by mixing with a tetraalkoxy decane (component (A)), whereby a second liquid is prepared. After aging at room temperature, the organoalkoxydecane (component (A)) was mixed to prepare a third mixed liquid. Further, the component (F) is prepared by stirring at room temperature or by heating. The component (E) may be further added after the preparation of the component (F) for dilution, or may be added to another dispersion medium for displacement of the dispersion medium.
添加於本發明塗布液中之經矽烷處理之氧化鈰溶膠,即使在製造後於室溫下放置1週,在容器底部亦未以目視確認到凝集沈降物。對於直至添加於本發明塗布液為止之該溶膠靜置時間並無特別限制。The decane-treated cerium oxide sol added to the coating liquid of the present invention was visually confirmed to be agglomerated at the bottom of the container even after being left at room temperature for one week after the production. The sol standing time until the addition to the coating liquid of the present invention is not particularly limited.
於本發明中,作為(F)成分,上述氧化鈰溶膠可單獨使用1種,亦可組合使用2種以上。In the present invention, the cerium oxide sol may be used singly or in combination of two or more kinds as the component (F).
本發明之塗布液較好的是含有分散穩定劑作為(G)成分。The coating liquid of the present invention preferably contains a dispersion stabilizer as the component (G).
該分散穩定劑係用以使矽烷化合物(A-1)~(A-5)成分之反應物、(B)、(C)及(F)成分穩定地分散於塗布液中而抑制凝集沈降及凝膠化之添加劑。於本發明塗布液中,(B)、(C)及(F)成分之微粒較好的是不產生凝集沈降及凝膠化而保持分散之狀態,例如較好的是穩定地浮游懸浮之膠體狀態。The dispersion stabilizer is used for stably dispersing the reactants of the decane compounds (A-1) to (A-5) and the components (B), (C) and (F) in the coating liquid to suppress aggregation and sedimentation. Gelling additive. In the coating liquid of the present invention, the fine particles of the components (B), (C) and (F) are preferably in a state of being dispersed without causing aggregation, sedimentation and gelation, and for example, a colloid which is stably suspended and suspended is preferably used. status.
為了利用熱硬化時之縮合反應,本發明之塗布液較理想的是在塗布前將金屬烷氧化物封端為OH體。因此,較理想的是維持促進水解反應且抑制縮合反應之酸性條件。進而,羧酸本身不僅具有作為酸之效果,而且亦具有針對金屬之配位效果,從而亦成為對烷氧化物之穩定化有效之添加劑,因此可利用有機酸,其中可更好地利用有機羧酸作為(G)成分。例如可列舉:甲酸、乙酸、丙酸、丁酸、戊酸、三甲基乙酸(pivalic acid)、乙二酸、丙二酸、丁二酸、戊二酸、己二酸等。又,本發明之塗布液藉由熱硬化而形成硬化膜,因而較好的是具有在熱硬化時不會殘留於硬化膜內之程度沸點者,更好的是可利用乙酸。In order to utilize the condensation reaction upon thermal hardening, it is preferred that the coating liquid of the present invention terminates the metal alkoxide to an OH body before coating. Therefore, it is desirable to maintain an acidic condition which promotes the hydrolysis reaction and suppresses the condensation reaction. Further, the carboxylic acid itself not only has an effect as an acid, but also has a coordination effect on the metal, and thus becomes an effective additive for stabilizing the alkoxide, so that an organic acid can be utilized, in which the organic carboxy can be better utilized. The acid is used as the component (G). For example, formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid and the like can be mentioned. Further, since the coating liquid of the present invention forms a cured film by thermal curing, it is preferred to have a boiling point which does not remain in the cured film during thermal curing, and it is more preferable to use acetic acid.
於本發明中,作為(G)成分,上述分散穩定劑可單獨使用1種,亦可組合使用2種以上。In the present invention, the dispersion stabilizer may be used singly or in combination of two or more kinds as the component (G).
本發明之塗布液中,除上述(A)[(A-1)~(A-5)]~(E)成分以外,可視需要而適當含有先前塗布液中所使用之公知之各種添加成分。In the coating liquid of the present invention, in addition to the above components (A) [(A-1) to (A-5)] to (E), various known additives to be used in the previous coating liquid may be appropriately contained as needed.
作為可視需要而含有之添加成分,例如可列舉:調平劑、可撓性賦予劑,進而可列舉:潤滑性賦予劑、抗氧化劑、上藍劑(blueing agent)、抗靜電劑、消泡劑(發泡抑制劑)、光穩定劑、耐候性賦予劑、著色劑、微粒之分散劑(沈降防止劑)及微粒表面活性之改質劑等。Examples of the additive component to be contained as necessary include a leveling agent and a flexibility imparting agent, and examples thereof include a lubricity imparting agent, an antioxidant, a blueing agent, an antistatic agent, and an antifoaming agent. (foaming inhibitor), light stabilizer, weather resistance imparting agent, coloring agent, fine particle dispersing agent (precipitation preventing agent), and particulate surface active modifier.
本發明之塗布液中,為了提高所得硬化膜之平滑性以及塗布時之流動性,可添加調平劑,作為該等添加劑,可列舉:聚矽氧系調平劑、氟系調平劑、丙烯酸系調平劑、乙烯系調平劑、以及將氟系與丙烯酸系複合化而成之調平劑等。上述調平劑全部可作用於塗膜表面,從而使表面張力降低。上述調平劑具有各種特徵,可視目的而使用。表面張力之降低能力較強的是聚矽氧系調平劑及氟系調平劑,丙烯酸系調平劑與乙烯基系調平劑於進行再塗布之情形時,不易產生潤濕不良而較為有利。In the coating liquid of the present invention, a leveling agent may be added in order to improve the smoothness of the obtained cured film and the fluidity at the time of coating, and examples of the additives include a polyfluorene-based leveling agent and a fluorine-based leveling agent. An acrylic leveling agent, an ethylene leveling agent, and a leveling agent which combines a fluorine type and an acrylic type. All of the above leveling agents can act on the surface of the coating film to lower the surface tension. The above leveling agents have various characteristics and can be used as intended. When the surface tension is lowered, the polyfluorene-based leveling agent and the fluorine-based leveling agent are strong, and when the acrylic-based leveling agent and the vinyl-based leveling agent are recoated, it is less likely to cause poor wetting. advantageous.
作為聚矽氧系調平劑之具體例,可使用聚環氧烷與聚二甲基矽氧烷之共聚物等。作為聚矽氧系調平劑之市售品,可列舉:東麗道康寧股份有限公司製造之FZ-2118、FZ-77、FZ-2161等;信越化學工業股份有限公司製造之KP321、KP323、KP324、KP326、KP340、KP341等;Momentive Performance Materials Japan有限公司製造之TSF4440、TSF4441、TSF4445、TSF4450、TSF4446、TSF4452、 TSF4453、TSF4460等;BYK Chemie Japan股份有限公司製造之BYK-300、BYK-302、BYK-306、BYK-307、BYK-320、BYK-325、BYK-330、BYK-331、BYK-333、BYK-337、BYK-341、BYK-344、BYK-345、BYK-346、BYK-348、BYK-377、BYK-378、BYK-UV3500、BYK-3510、BYK-3570等聚醚改質矽油(聚環氧烷改質矽油)等。As a specific example of the polyoxymethylene-based leveling agent, a copolymer of a polyalkylene oxide and a polydimethylsiloxane can be used. As a commercial product of a polyoxane-based leveling agent, FZ-2118, FZ-77, FZ-2161, etc. manufactured by Toray Dow Corning Co., Ltd.; KP321, KP323, KP324 manufactured by Shin-Etsu Chemical Co., Ltd. , KP326, KP340, KP341, etc.; TSF4440, TSF4441, TSF4445, TSF4450, TSF4446, TSF4452 , TSF4453, TSF4460, etc. manufactured by Momentive Performance Materials Japan Co., Ltd.; BYK-300, BYK-302, BYK manufactured by BYK Chemie Japan Co., Ltd. -306, BYK-307, BYK-320, BYK-325, BYK-330, BYK-331, BYK-333, BYK-337, BYK-341, BYK-344, BYK-345, BYK-346, BYK-348 , BYK-377, BYK-378, BYK-UV3500, BYK-3510, BYK-3570 and other polyether modified eucalyptus oil (polyalkylene oxide modified eucalyptus oil).
又,於必需具有150℃以上的耐熱性之情形時,以聚酯改質或具有苯環之芳烷基改質矽油為宜。作為聚酯改質矽油之市售品,可列舉:BYK Chemie Japan股份有限公司製造之BYK-310、BYK-315、BYK-370等;作為具有苯環之芳烷基改質矽油之市售品,可列舉:BYK Chemie Japan股份有限公司製造之BYK-322、BYK-323等。Further, in the case where it is necessary to have heat resistance of 150 ° C or more, it is preferred to modify the polyester or the aralkyl modified sulfonate having a benzene ring. As a commercial item of the polyester modified eucalyptus oil, BYK-310, BYK-315, BYK-370, etc., manufactured by BYK Chemie Japan Co., Ltd.; and a commercial product of an aralkyl modified oyster oil having a benzene ring; For example, BYK-322, BYK-323, etc. manufactured by BYK Chemie Japan Co., Ltd. may be mentioned.
作為氟系調平劑,可使用聚環氧烷與氟碳化合物之共聚物等。As the fluorine-based leveling agent, a copolymer of a polyalkylene oxide and a fluorocarbon compound or the like can be used.
作為氟系調平劑之市售品,可列舉:DIC股份有限公司製造之MEGAFAC系列、住友3M股份有限公司製造之FC系列等。As a commercial item of a fluorine-based leveling agent, the MEGAFAC series manufactured by DIC Corporation, and the FC series manufactured by Sumitomo 3M Co., Ltd., etc. are mentioned.
作為丙烯酸系調平劑之市售品,可列舉:BYK Chemie Japan股份有限公司製造之BYK-350、BYK-352、BYK-354、BYK-355、BYK-358N、BYK-361N、BYK-380N、BYK-381、BYK-392等、導入有氟之BYK-340等。As a commercial item of the acrylic leveling agent, BYK-350, BYK-352, BYK-354, BYK-355, BYK-358N, BYK-361N, BYK-380N, which are manufactured by BYK Chemie Japan Co., Ltd., BYK-381, BYK-392, etc., introduced with fluorine BYK-340.
藉由調配此種調平劑,可改善硬化膜之完成後外觀,即使製成薄膜亦可均勻塗布。相對於塗布液之總量,調平劑之使用量較好的是0.01~10質量%,進而較好的是0.02~5質量%。By blending such a leveling agent, the appearance of the cured film can be improved, and even if it is formed into a film, it can be uniformly coated. The amount of the leveling agent used is preferably from 0.01 to 10% by mass, more preferably from 0.02 to 5% by mass, based on the total amount of the coating liquid.
作為調配調平劑之方法,可在製備塗布液時調配,亦可在即將形成硬化膜前調配入塗布液中,進而亦可在製備塗布液及即將形成硬化膜前的兩個階段進行調配。The method of blending the leveling agent may be formulated in the preparation of the coating liquid, or may be formulated into the coating liquid immediately before the formation of the cured film, or may be formulated in two stages before the preparation of the coating liquid and the formation of the cured film.
為了提高所得硬化膜之柔軟姓,可使本發明之塗布液中含有可撓性賦予劑作為應力緩和劑。In order to increase the softness of the obtained cured film, the coating liquid of the present invention may contain a flexibility imparting agent as a stress relieving agent.
作為可撓性賦予劑,例如可使用聚矽氧樹脂等。As the flexibility imparting agent, for example, a polyfluorene resin or the like can be used.
作為聚矽氧樹脂之市售品,可列舉:Wacker公司製造之Resin MK系列,例如Belsil PMS MK(為包含CH3 SiO3/2 之重複單元(單元T)之聚合物,且為亦包含至1質量%為止之(CH3 )2 SiO2/2 單元(單元D)者);及信越化學工業股份有限公司製造之KR-242A(包含98質量%之單元T與2質量%之二甲基單元D且包含Si-OH末端基者)、KR-251(包含88質量%之單元T與12質量%之二甲基單元D且包含Si-OH末端基者)、KR-220L(包含式CH3 SiO3/2 之單元Y且包含Si-OH(矽醇)末端基者)等。As a commercial product of a polyoxyxene resin, a Resin MK series manufactured by Wacker Co., Ltd., for example, Belsil PMS MK (a polymer comprising a repeating unit (unit T) of CH 3 SiO 3/2 , and is also included to 1% by mass of (CH 3 ) 2 SiO 2/2 unit (unit D); and KR-242A manufactured by Shin-Etsu Chemical Co., Ltd. (containing 98% by mass of unit T and 2% by mass of dimethyl group) Unit D and containing Si-OH terminal group), KR-251 (containing 88% by mass of unit T and 12% by mass of dimethyl unit D and containing Si-OH terminal group), KR-220L (including formula CH) 3 unit Y of SiO 3/2 and containing Si-OH (sterol) terminal group) and the like.
本發明塗布液中之各成分之含量可適當選定,各成分之含量例如較好的是選定為以下所示之範圍。The content of each component in the coating liquid of the present invention can be appropriately selected, and the content of each component is preferably selected in the range shown below.
除(E)成分之分散介質之外,以質量%來表示相對於(A)[(A-1)~(A-5)]~(D)成分之總量的各成分含量。再者,以分散狀態而較好地使用之(B)及(C)成分僅利用各自的固形物來計算,各成分中所包含之分散介質係(E)成分中所包含者。In addition to the dispersion medium of the component (E), the content of each component relative to the total amount of the components (A) [(A-1) to (A-5)] to (D) is expressed by mass%. Further, the components (B) and (C) which are preferably used in a dispersed state are calculated only by the respective solid materials, and those contained in the dispersion medium (E) component contained in each component are included.
(A-1)成分之含量通常為0.01~40質量%左右,較好的是0.1~20質量%。(A-2)成分之含量通常為0.1~40質量%左右,較好的是1~30質量%。(A-3)成分之含量通常為0.1~30質量%左右,較好的是0.3~20質量%。(A-4)成分之含量通常為0.1~30質量%左右,較好的是0.3~20質量%。(A-5)成分之含量通常為0.1~50質量%左右,較好的是1~40質量%。The content of the component (A-1) is usually about 0.01 to 40% by mass, preferably 0.1 to 20% by mass. The content of the component (A-2) is usually from about 0.1 to 40% by mass, preferably from 1 to 30% by mass. The content of the component (A-3) is usually from about 0.1 to 30% by mass, preferably from 0.3 to 20% by mass. The content of the component (A-4) is usually from about 0.1 to 30% by mass, preferably from 0.3 to 20% by mass. The content of the component (A-5) is usually from about 0.1 to 50% by mass, preferably from 1 to 40% by mass.
(B)成分之含量通常為0.1~50質量%左右,較好的是1~40質量%。(C)成分之含量通常為0.1~70質量%左右,較好的是1~50質量%。(D)成分之含量通常為0.001~30質量%左右,較好的是0.001~20質量%。相對於(A)[(A-1)~(A-5)]~(D)成分之總質量份,(E)成分之含量通常為5~1000質量份左右,較好的是20~800質量份。The content of the component (B) is usually from about 0.1 to 50% by mass, preferably from 1 to 40% by mass. The content of the component (C) is usually from about 0.1 to 70% by mass, preferably from 1 to 50% by mass. The content of the component (D) is usually from 0.001 to 30% by mass, preferably from 0.001 to 20% by mass. The content of the (E) component is usually about 5 to 1000 parts by mass, preferably 20 to 800, based on the total mass parts of the components (A)[(A-1) to (A-5)] to (D). Parts by mass.
再者,對於(A-3)成分與(A-5)成分之調配莫耳比並無特別限制,較好的是1:1~1:5,更好的是1:2~1:4。若(A-3)成分與(A-5)成分之調配莫耳比在上述範圍內,則所得硬化膜之耐久性進一步提高。Further, there is no particular limitation on the molar ratio of the (A-3) component to the (A-5) component, and it is preferably 1:1 to 1:5, more preferably 1:2 to 1:4. . When the blending molar ratio of the component (A-3) to the component (A-5) is within the above range, the durability of the obtained cured film is further improved.
本發明之塗布液較好的是向使(A-1)成分、(A-2)成分及(A-4)成分之水解縮合物與(B)~(E)成分接觸而獲得之反應產物中加入(A-5)成分並使其反應後,進而加入(A-3)成分並使其反應而成者。又,進而較好的是向藉由將包含(A-1)成分、(A-2)成分、(A-4)成分及(B)~(E)成分之混合物加熱而獲得之反應產物中加入(A-5)成分並使其反應後,進而加入(A-3)成分並使其反應而成者。The coating liquid of the present invention is preferably a reaction product obtained by bringing a hydrolysis condensate of the component (A-1), the component (A-2) and the component (A-4) into contact with the components (B) to (E). After the component (A-5) is added and reacted, the component (A-3) is further added and reacted. Further, it is further preferred to use a reaction product obtained by heating a mixture comprising the components (A-1), (A-2), (A-4) and (B) to (E). After the component (A-5) is added and reacted, the component (A-3) is further added and reacted.
具體而言,較理想的是進行下述操作來製備塗布液。Specifically, it is preferred to carry out the following operations to prepare a coating liquid.
較好的是,首先製作至少包含(A-1)、(A-2)、(A-4)、(B)、(D)及(E)成分之第一混合液,繼而混合入(C)成分而製作第二混合液,進而繼續混合入(A-5)成分而製作第三混合液。最後混合入(A-3)成分而製備塗布液。Preferably, first, a first mixed liquid containing at least (A-1), (A-2), (A-4), (B), (D), and (E) components is prepared, followed by mixing (C) The second mixed liquid was prepared as a component, and the component (A-5) was further mixed to prepare a third mixed liquid. Finally, the component (A-3) was mixed to prepare a coating liquid.
若以上述方式將各成分分離而製備,則塗布液之溶液保存穩定性(不產生凝膠化等)提高,因而較好。When the components are separated and prepared as described above, the solution stability of the solution (there is no gelation or the like) is improved, which is preferable.
尤其於藉由(B)及(C)成分之添加量而使溶液中之水量增加時,該效果得以進一步發揮。例如,將(A-1)、(A-2)、(A-4)、(B)、(D)及(E)成分混合後,加入(C)成分。繼而,混合入(A-5)成分,最後混合入(A-3)成分。再者,在製備塗布液後進而加入(E)成分,藉此可稀釋塗布液。In particular, when the amount of water in the solution is increased by the addition amount of the components (B) and (C), the effect is further exerted. For example, after mixing the components (A-1), (A-2), (A-4), (B), (D), and (E), the component (C) is added. Then, the component (A-5) is mixed, and finally, the component (A-3) is mixed. Further, after the coating liquid is prepared, the component (E) is further added, whereby the coating liquid can be diluted.
已知如本發明塗布液之混合材料的溶液保存穩定性容易影響溶液pH值(例如,「溶膠-凝膠法於奈米技術中之應用/主編:作花濟夫」CMC出版)。於本發明塗布液之製備中,因混合入酸性成分作為(D)成分,且混合入鹼性成分作為(A-3)成分及(D)成分,故溶液pH值隨混合順序而變化。It is known that the solution storage stability of the mixed material of the coating liquid of the present invention easily affects the pH value of the solution (for example, "Application of the Sol-Gel Method in Nanotechnology/Editor: As a Flower" CMC publication). In the preparation of the coating liquid of the present invention, the acidic component is mixed as the component (D), and the alkaline component is mixed as the component (A-3) and the component (D). Therefore, the pH of the solution changes depending on the mixing order.
作為溶液pH值,例如利用以校正用pH標準液修正之可攜式pH計(Hanna公司製造:商品名Checker-1)進行評價之溶液pH值,較好的是使上述第一混合液及第二混合液為pH≦6,使第三混合液及最終混合液為pH≦7。尤其若第三混合液亦即於(A-3)成分之混合時溶液pH值超過8,則存在溶液穩定性下降之虞。自塗布液之製備開始時直至製備完成時為止,較好的是溶液保持酸性狀態。亦即,較好的是以維持此種條件之順序來製備塗布液。As the pH value of the solution, for example, the pH of the solution to be evaluated by a portable pH meter (manufactured by Hanna Co., Ltd., trade name: Checker-1) corrected by the pH standard solution is preferably the first mixed liquid and the first The second mixture was pH ≦6, so that the third mixture and the final mixture were pH ≦7. In particular, if the pH of the solution exceeds 8 when the third liquid mixture is mixed with the component (A-3), there is a possibility that the stability of the solution is lowered. It is preferred that the solution remains in an acidic state from the start of preparation of the coating liquid until the completion of the preparation. That is, it is preferred to prepare a coating liquid in the order in which such conditions are maintained.
又,上述第一混合液、第二混合液、及第三混合液較好的是在將各成分混合後進行加熱處理。溫度較好的是30℃~130℃,更好的是50℃~90℃,加熱處理時間較好的是30分鐘~24小時,更好的是1小時~8小時。關於混合、加熱方法,若為可均勻混合、加熱之方法則無特別限制。藉由以此種方式進行加熱,則溶液內之(A-1)、(A-2)、(A-3)、(A-4)及(A-5)成分之縮合反應進行,耐煮沸性及其他耐久性提高。(A-1)、(A-2)、(A-3)、(A-4)及(A-5)成分之反應可利用溶液Si-NMR(nuclear magnetic resonance,核磁共振)進行分析,藉此可設計成合適之結構。若未達30℃或未達30分鐘,則反應極其緩慢之情形較多,又,於超過130℃或超過24小時之情形時,(A-1)、(A-2)、(A-3)、(A-4)及(A-5)成分之反應過度進行,溶液產生凝膠化或高黏性化,從而存在無法塗布之虞。Further, it is preferred that the first mixed liquid, the second mixed liquid, and the third mixed liquid are subjected to heat treatment after mixing the respective components. The temperature is preferably from 30 ° C to 130 ° C, more preferably from 50 ° C to 90 ° C, and the heat treatment time is preferably from 30 minutes to 24 hours, more preferably from 1 hour to 8 hours. The mixing and heating method is not particularly limited as long as it can be uniformly mixed and heated. By heating in this manner, the condensation reaction of the components (A-1), (A-2), (A-3), (A-4) and (A-5) in the solution proceeds, and the boiling resistance is promoted. Sex and other durability improvements. The reactions of the components (A-1), (A-2), (A-3), (A-4) and (A-5) can be analyzed by solution Si-NMR (nuclear magnetic resonance). This can be designed into a suitable structure. If it is less than 30 ° C or less than 30 minutes, the reaction is extremely slow, and when it exceeds 130 ° C or exceeds 24 hours, (A-1), (A-2), (A-3) The reaction of the components (A-4) and (A-5) is excessively carried out, and the solution is gelated or highly viscous, so that there is a possibility that the coating cannot be applied.
混合入(A-3)成分後之最終液(塗布液)亦較好的是進行加熱處理。於在室溫下混合之情形時,容易受到攪拌效率之影響,於由此導致(A-3)成分之分散度較低之情形時,存在硬化膜之透明性(總透光率下降、霧度上升)下降之虞。溫度較好的是30℃~130℃,更好的是50℃~90℃,時間較好的是5分鐘~10小時,更好的是15分鐘~6小時。關於混合、加熱方法,若為可均勻混合、加熱之方法則無特別限制。若未達30℃或未達5分鐘,則加熱處理之效果欠缺之情形較多,又,若超過130℃或超過10小時,則溶液產生凝膠化或高黏性化,從而存在無法塗布之虞。It is also preferred to carry out heat treatment of the final liquid (coating liquid) after mixing the component (A-3). When it is mixed at room temperature, it is easily affected by the stirring efficiency, and when the dispersion degree of the component (A-3) is low, the transparency of the cured film (the total light transmittance is lowered, the mist is lowered). Degree rises). The temperature is preferably from 30 ° C to 130 ° C, more preferably from 50 ° C to 90 ° C, and the time is preferably from 5 minutes to 10 hours, more preferably from 15 minutes to 6 hours. The mixing and heating method is not particularly limited as long as it can be uniformly mixed and heated. If it is less than 30 ° C or less than 5 minutes, the effect of heat treatment is insufficient, and if it exceeds 130 ° C or exceeds 10 hours, the solution gelatinizes or becomes highly viscous, so that it cannot be coated. Hey.
於後述之實施例中,記載有使用靜置1週後所獲得之塗布液而製造之硬化膜的評價結果,對於直至製造硬化膜為止之溶液靜置時間並無特別限制。In the examples described later, the evaluation results of the cured film produced by using the coating liquid obtained after standing for one week are described, and the solution standing time until the production of the cured film is not particularly limited.
本發明之含有(A)~(G)成分之塗布液中之各成分的含量可適當選定,(A)~(E)成分之各含量除(E)成分之分散介質之外,係以質量%來表示相對於(A)[(A-1)~(A-5)]~(G)成分之總量的各成分含量,除此以外,可與含有(A)~(E)成分之塗布液之情形相同。The content of each component in the coating liquid containing the components (A) to (G) of the present invention can be appropriately selected, and the content of each of the components (A) to (E) is in addition to the dispersion medium of the component (E). % indicates the content of each component relative to the total amount of (A) [(A-1) to (A-5)] to (G) components, and may contain (A) to (E) components. The same applies to the coating liquid.
(F)成分之含量通常為0.01~30質量%左右,較好的是0.1~20質量%。(G)成分之含量通常為1~60質量份左右,較好的是10~50質量份左右。The content of the component (F) is usually from about 0.01 to 30% by mass, preferably from 0.1 to 20% by mass. The content of the component (G) is usually from about 1 to 60 parts by mass, preferably from about 10 to 50 parts by mass.
該塗布液較好的是向使(A-1)、(A-2)、(A-4)及(A-5)成分之水解縮合物與(B)~(G)成分接觸而獲得之反應產物中加入(A-3)成分並使其反應而成者,具體而言,較好的是進行下述操作而製備塗布液。The coating liquid is preferably obtained by bringing a hydrolysis condensate of the components (A-1), (A-2), (A-4) and (A-5) into contact with the components (B) to (G). The component (A-3) is added to the reaction product and reacted. Specifically, it is preferred to prepare a coating liquid by the following operation.
較好的是,首先製作至少包含(A-1)、(A-2)、(A-4)、(B)、及(D)、(E)、(G)成分之第一混合液,繼而混合入(C)及(F)成分而製作第二混合液,進而繼續混合入(A-5)成分而製作第三混合液。最後混合入(A-3)成分而製備塗布液。Preferably, first, a first mixed liquid containing at least (A-1), (A-2), (A-4), (B), and (D), (E), (G) components is prepared. Then, the components (C) and (F) were mixed to prepare a second mixed liquid, and the components (A-5) were further mixed to prepare a third mixed liquid. Finally, the component (A-3) was mixed to prepare a coating liquid.
若以上述方式將各成分分離而製備,則塗布液之溶液保存穩定性(不產生凝膠化等)提高,因而較好。尤其於由於(B)、(C)及(F)成分之添加量增加而使溶液中之水量增加時,該效果得以進一步發揮。When the components are separated and prepared as described above, the solution stability of the solution (there is no gelation or the like) is improved, which is preferable. This effect is further exerted especially when the amount of water in the solution is increased due to an increase in the amount of the components (B), (C) and (F).
例如,在混合入(A-1)、(A-2)、(A-4)、(B)、及(D)、(E)、(G)成分後,加入(C)及(F)成分。繼而,混合入(A-5)成分,最後混合入(A-3)成分。For example, after mixing the components (A-1), (A-2), (A-4), (B), and (D), (E), and (G), add (C) and (F). ingredient. Then, the component (A-5) is mixed, and finally, the component (A-3) is mixed.
再者,(E)成分可藉由在製備塗布液後進而加入來稀釋塗布液。Further, the component (E) can be diluted by further adding a coating liquid after the preparation of the coating liquid.
作為進而較好的塗布液製備方法,可向使(A-1)、(A-2)、(A-4)成分之水解縮合物與(B)、(C)、(D)、(E)及(G)成分接觸而獲得之反應產物中加入(F)及(A-5)成分並使其反應,再向所獲得之反應產物中加入(A-3)成分並使其反應而製備塗布液。Further, as a further preferred method for preparing a coating liquid, the hydrolysis condensate of the components (A-1), (A-2), and (A-4) and (B), (C), (D), and (E) can be used. (F) and (A-5) are added to the reaction product obtained by contacting the component (G), and reacted, and (A-3) component is added to the obtained reaction product, and reacted to prepare a reaction product. Coating solution.
具體而言,係向將包含(A-1)、(A-2)、(A-4)、(B)、(C)、(D)、(E)及(G)成分之混合物加熱而獲得之反應產物中加入(F)及(A-5)成分並加熱,繼而向所獲得之反應產物中加入(A-3)成分並加熱而獲得塗布液者。藉由採用此種製備方法,可進一步提高塗布液之分散性,可提高硬化膜之透明性。Specifically, the mixture comprising the components (A-1), (A-2), (A-4), (B), (C), (D), (E), and (G) is heated. The component (F) and (A-5) are added to the obtained reaction product and heated, and then the component (A-3) is added to the obtained reaction product and heated to obtain a coating liquid. By adopting such a preparation method, the dispersibility of the coating liquid can be further improved, and the transparency of the cured film can be improved.
又,向使(A-1)、(A-2)、(A-4)及(A-5)成分的水解縮合物與(B)、(C)、(D)、(E)及(G)成分接觸而獲得的反應產物中加入(F)成分並使其反應,再向所獲得的反應產物中加入(A-3)成分並使其反應,藉此亦可製備塗布液。Further, the hydrolysis condensate of the components (A-1), (A-2), (A-4) and (A-5) and (B), (C), (D), (E) and The component (F) is added to the reaction product obtained by contacting the components with G), and the component (A-3) is added to the obtained reaction product to carry out a reaction, whereby a coating liquid can also be prepared.
具體而言,例如向包含(A-1)、(A-2)、(A-4)、(A-5)、(B)、(C)、(D)、(E)及(G)成分的混合物加熱而獲得的反應產物中加入(F)成分並加熱,繼而向所獲得的反應產物中加入(A-3)成分並加熱,藉此獲得塗布液。藉由採用此種製備方法,可進一步提高塗布液之分散性,從而可提高硬化膜之透明性。Specifically, for example, (A-1), (A-2), (A-4), (A-5), (B), (C), (D), (E), and (G) are included. The component (F) is added to the reaction product obtained by heating the mixture of the components and heated, and then the component (A-3) is added to the obtained reaction product and heated, whereby a coating liquid is obtained. By adopting such a preparation method, the dispersibility of the coating liquid can be further improved, and the transparency of the cured film can be improved.
進而,亦可藉由向使(A-1)、(A-2)、(A-4)成分之水解縮合物與(B)~(G)成分接觸而獲得之反應產物中加入(A-5)成分並使其反應,再向所獲得之反應產物中加入(A-3)成分並使其反應而製備塗布液。Further, it is also possible to add (A- to the reaction product obtained by bringing the hydrolysis condensate of the components (A-1), (A-2) and (A-4) into contact with the components (B) to (G). 5) The component is reacted, and the component (A-3) is added to the obtained reaction product and reacted to prepare a coating liquid.
具體而言,例如係向將包含(A-1)、(A-2)、(A-4)及(B)~(G)成分之混合物加熱而獲得之反應產物中加入(A-5)成分並加熱,繼而向所獲得之反應產物中加入(A-3)成分並加熱而獲得塗布液者。藉由採用此種製備方法,可進一步提高塗布液之分散性,可提高硬化膜之透明性。Specifically, for example, a reaction product obtained by heating a mixture containing the components (A-1), (A-2), (A-4), and (B) to (G) is added (A-5). The component is heated and then the component (A-3) is added to the obtained reaction product and heated to obtain a coating liquid. By adopting such a preparation method, the dispersibility of the coating liquid can be further improved, and the transparency of the cured film can be improved.
已知如本發明塗布液之混合材料的溶液保存穩定性容易影響溶液pH值(例如,「溶膠-凝膠法於奈米技術中之應用/主編:作花濟夫」CMC出版)。於本發明塗布液之製備中,因混合入酸性成分作為(D)及(G)成分,且混合入鹼性成分作為(A-3)及(D)成分,故溶液pH值隨混合順序而變化。It is known that the solution storage stability of the mixed material of the coating liquid of the present invention easily affects the pH value of the solution (for example, "Application of the Sol-Gel Method in Nanotechnology/Editor: As a Flower" CMC publication). In the preparation of the coating liquid of the present invention, since the acidic component is mixed as the components (D) and (G), and the alkaline component is mixed as the components (A-3) and (D), the pH of the solution varies depending on the mixing order. Variety.
作為溶液pH值,例如利用以校正用pH標準液修正之可攜式pH計(Hanna公司製造:商品名Checker-1)進行評價之溶液pH值,較好的是使上述第一混合液及第二混合液為pH≦6,使第三混合液及最終混合液為pH≦7。尤其若第三混合液亦即於(A-3)成分之混合時溶液pH值超過8,則存在溶液穩定性下降之虞。自塗布液之製備開始時直至製備完成時為止,較好的是溶液保持酸性狀態。亦即,較好的是以維持上述條件之順序來製備塗布液。As the pH value of the solution, for example, the pH of the solution to be evaluated by a portable pH meter (manufactured by Hanna Co., Ltd., trade name: Checker-1) corrected by the pH standard solution is preferably the first mixed liquid and the first The second mixture was pH ≦6, so that the third mixture and the final mixture were pH ≦7. In particular, if the pH of the solution exceeds 8 when the third liquid mixture is mixed with the component (A-3), there is a possibility that the stability of the solution is lowered. It is preferred that the solution remains in an acidic state from the start of preparation of the coating liquid until the completion of the preparation. That is, it is preferred to prepare a coating liquid in the order of maintaining the above conditions.
又,上述第一混合液、第二混合液、及第三混合液較好的是在將各成分混合後進行加熱處理。溫度較好的是30℃~130℃,更好的是50℃~90℃,加熱處理時間較好的是30分鐘~24小時,更好的是1小時~8小時。關於混合、加熱方法,若為可均勻混合、加熱之方法則無特別限制。藉由以此種方式進行加熱,則溶液內之(A-1)、(A-2)、(A-3)、(A-4)、及(A-5)成分之縮合反應進行,耐久性(耐煮沸性)及其他特性提高。(A-1)、(A-2)、(A-3)、(A-4)、及(A-5)成分之反應可利用溶液Si-NMR進行分析,藉此可設計成合適之結構。若未達30℃或未達30分鐘,則反應極其緩慢之情形較多,又,於超過130℃或超過24小時之情形時,(A-1)、(A-2)、(A-3)、(A-4)、及(A-5)成分之反應過度進行,溶液產生凝膠化或高黏性化,從而存在無法塗布之虞。Further, it is preferred that the first mixed liquid, the second mixed liquid, and the third mixed liquid are subjected to heat treatment after mixing the respective components. The temperature is preferably from 30 ° C to 130 ° C, more preferably from 50 ° C to 90 ° C, and the heat treatment time is preferably from 30 minutes to 24 hours, more preferably from 1 hour to 8 hours. The mixing and heating method is not particularly limited as long as it can be uniformly mixed and heated. By heating in this manner, the condensation reaction of the components (A-1), (A-2), (A-3), (A-4), and (A-5) in the solution proceeds, and is durable. Sex (boiling resistance) and other properties are improved. The reactions of the components (A-1), (A-2), (A-3), (A-4), and (A-5) can be analyzed by solution Si-NMR, whereby a suitable structure can be designed. . If it is less than 30 ° C or less than 30 minutes, the reaction is extremely slow, and when it exceeds 130 ° C or exceeds 24 hours, (A-1), (A-2), (A-3) The reaction of the components (A-4) and (A-5) is excessively carried out, and the solution is gelated or highly viscous, so that the coating cannot be applied.
又,混合入(A-3)成分後之最終液(塗布液)亦較好的是進行加熱處理。於在室溫下混合之情形時,容易受到攪拌效率之影響,於由此導致(A-3)成分之分散度較低之情形時,存在硬化膜之透明性下降(總透光率下降、霧度上升)之虞。溫度較好的是30℃~130℃,更好的是50℃~90℃,時間較好的是5分鐘~10小時,更好的是15分鐘~6小時。關於混合、加熱方法,若為可均勻混合、加熱之方法則無特別限制。若未達30℃或未達5分鐘,則加熱處理之效果欠缺之情形較多,又,若超過130℃或超過10小時,則溶液產生凝膠化或高黏性化,從而存在無法塗布之虞。Further, it is also preferred that the final liquid (coating liquid) after mixing the component (A-3) is subjected to heat treatment. When it is mixed at room temperature, it is easily affected by the stirring efficiency, and when the degree of dispersion of the component (A-3) is low, the transparency of the cured film is lowered (the total light transmittance is lowered, After the haze rises). The temperature is preferably from 30 ° C to 130 ° C, more preferably from 50 ° C to 90 ° C, and the time is preferably from 5 minutes to 10 hours, more preferably from 15 minutes to 6 hours. The mixing and heating method is not particularly limited as long as it can be uniformly mixed and heated. If it is less than 30 ° C or less than 5 minutes, the effect of heat treatment is insufficient, and if it exceeds 130 ° C or exceeds 10 hours, the solution gelatinizes or becomes highly viscous, so that it cannot be coated. Hey.
於下述實施例中,記載有使用靜置1週後所得之塗布液而製造之硬化膜的評價結果,對於直至硬化膜製造為止之溶液靜置時間並無特別限制。In the following examples, the evaluation results of the cured film produced by using the coating liquid obtained after standing for one week are described, and the solution standing time until the production of the cured film is not particularly limited.
進而,本發明中所使用之(F)成分由於係酸性穩定型,故與其他分散液混合時,為了防止混合時之凝集、析出、凝膠化,更好的是在同為酸性之溶膠中進行混合。例如,若將鹼性穩定型陰離子性微粒之溶膠與(F)成分直接混合,則會脫離可穩定分散之pH值範圍,由此存在無法維持分散之可能性。Further, since the component (F) used in the present invention is acid-stable, when it is mixed with another dispersion, in order to prevent aggregation, precipitation, and gelation during mixing, it is more preferable to be in the same acidic sol. Mix. For example, when the sol of the alkali-stable anionic fine particles is directly mixed with the component (F), the pH range in which the dispersion can be stably dispersed is removed, and there is a possibility that the dispersion cannot be maintained.
本發明塗布液之透明性、與樹脂之密著性、耐候性、耐磨耗性、耐擦傷性優異,可用作各種透明有機構件之塗布材料。具體而言可用作:樹脂製車窗、建築物等之樹脂窗、道路遮音壁、拱廊等大面積透明構件、儀器面板等計量儀器類、建築物之樹脂窗、透明塑膠零件、眼鏡透鏡、護目鏡、轉印用膜、塑膠溫室等透明有機構件之面塗材料或底塗材料。The coating liquid of the present invention is excellent in transparency, resin adhesion, weather resistance, abrasion resistance, and scratch resistance, and can be used as a coating material for various transparent organic members. Specifically, it can be used as a resin window, a resin window such as a building, a large-area transparent member such as a road soundproof wall or an arcade, a measuring instrument such as an instrument panel, a resin window of a building, a transparent plastic part, a spectacle lens, A face coating material or a primer material for transparent organic members such as goggles, transfer film, and plastic greenhouse.
進而,因透明性非常高,故著色亦容易,且與各種著色顏料之相容性優異,因此亦可用作各種塗料之原料或塗裝前之底塗材料。例如,可應用於汽車內外部裝飾、產業機械、鋼傢具、建築用內外部裝飾、家電、塑膠製品等之塗裝。又,本發明之塗布液因與金屬亦充分密著並且耐酸性高,故亦耐受近來被視為問題之酸雨。因此,尤其適於車體或鋁車輪等在室外使用之構件。作為與塗料非常相似之用途,利用其高著色性、與顏料之相容,從而亦可應用於各種油墨中。Further, since the transparency is very high, coloring is also easy, and compatibility with various coloring pigments is excellent. Therefore, it can be used as a raw material for various coating materials or as a primer material before coating. For example, it can be applied to interior and exterior decoration of automobiles, industrial machinery, steel furniture, interior and exterior decoration of buildings, home appliances, plastic products, and the like. Further, since the coating liquid of the present invention is sufficiently adhered to the metal and has high acid resistance, it is also resistant to acid rain which has recently been regarded as a problem. Therefore, it is particularly suitable for a member for outdoor use such as a vehicle body or an aluminum wheel. As a very similar application to paints, it can be used in various inks because of its high colorability and compatibility with pigments.
又,本發明之塗布液利用高透明性、高密著性、優異之耐磨耗性、耐擦傷性,從而亦可應用於電氣電子領域、光學領域等中所使用之精密構件。例如,在電漿顯示器、液晶顯示器、有機EL(electroluminescence,電激發光)顯示器等各種顯示器中,使用各種抗反射膜、偏光膜、氣體阻隔膜、相位差膜、導電性膜等必需具有硬塗性作為其功能之一的膜,亦可用作該等之構件。此外,光碟基板用之硬塗材料、光纖之塗布劑、觸摸面板、太陽電池面板之被覆材料等亦作為利用高透明性、高密著性、優異之耐磨耗性、耐擦傷性之用途而列舉。於濾色鏡、全像元件、CCD(charge coupled device,電漿耦合裝置)照相機等中使用各種保護膜,該等保護膜不僅被要求具有透明性、耐磨耗性、耐擦傷性及密著性,而且自製造上之問題考慮亦要求具有某種程度的低黏度。本發明之塗布液可藉由成分調整而控制為所需黏度,因而亦可用作上述保護膜。又,本發明之塗布液係不僅具有硬塗性能並且亦可使其彎曲變形之材料,亦可用於近來盛行研究之可撓性顯示器。Moreover, the coating liquid of the present invention can be applied to precision members used in the field of electrical and electronic, optical, and the like by utilizing high transparency, high adhesion, excellent abrasion resistance, and scratch resistance. For example, in various displays such as a plasma display, a liquid crystal display, and an organic EL (electroluminescence) display, various anti-reflection films, polarizing films, gas barrier films, retardation films, conductive films, and the like must be used. A film which is one of its functions can also be used as a member of these. In addition, hard coating materials for optical disk substrates, coating materials for optical fibers, touch panels, and coating materials for solar cell panels are also listed as applications utilizing high transparency, high adhesion, excellent abrasion resistance, and scratch resistance. . Various protective films are used for color filters, hologram elements, CCD (charge coupled device) cameras, etc., and such protective films are required not only to have transparency, abrasion resistance, scratch resistance, and adhesion. Moreover, consideration of manufacturing issues also requires a certain degree of low viscosity. The coating liquid of the present invention can be controlled to a desired viscosity by composition adjustment, and thus can also be used as the above protective film. Further, the coating liquid of the present invention is a material which not only has a hard coating property but also can be bent and deformed, and can also be used for a flexible display which has recently been studied.
又,本發明之塗布液亦可使近紅外區域之電磁波良好地透射。因此,亦可應用於電波收發用天線、RFID(Radio Frequency Identification,射頻辨識)資料載體、車用雷達裝置等之被覆材料等。Further, the coating liquid of the present invention can also transmit electromagnetic waves in the near-infrared region well. Therefore, it can also be applied to a radio wave transmitting and receiving antenna, an RFID (Radio Frequency Identification) data carrier, a coating material such as a vehicle radar device, and the like.
作為其他用途,可列舉:各種透明裝飾品之塗布劑、各種表皮材料(汽車座椅、汽車門內部裝飾用、沙發、傢具等)、滑動零件(煞車片(brake pad)等)、纖維之集束劑、氣體阻隔塗布劑等。Examples of other uses include coating agents for various transparent decorations, various skin materials (car seats, interior doors for automobiles, sofas, furniture, etc.), sliding parts (brake pads, etc.), and bundles of fibers. Agent, gas barrier coating agent, and the like.
以下,對本發明之硬化膜加以說明。Hereinafter, the cured film of the present invention will be described.
本發明之硬化膜係利用常法使上述本發明之塗布液硬化而成之硬化膜。The cured film of the present invention is a cured film obtained by curing the above-described coating liquid of the present invention by a usual method.
具體而言,於形成硬化膜之對象即樹脂成形品(射出成形品、膜或片等)之基材上,利用噴霧、浸漬、淋幕式塗布、棒式塗布或輥塗布等公知之方法,塗布塗布液而形成塗膜。Specifically, a known method such as spraying, dipping, shower coating, bar coating, or roll coating is used for the substrate of the resin molded article (the injection molded article, the film, or the sheet) which is a target of the cured film. The coating liquid is applied to form a coating film.
塗膜之厚度取決於所形成之硬化膜最終以何種形態來使用。The thickness of the coating film depends on the form in which the formed cured film is finally used.
於第一態樣中,作為塗膜之厚度,將硬化膜之厚度調整為較好的是0.5~6μm、更好的是0.5~3μm。其後,以適當之硬化條件,通常於室溫~190℃、較好的是80~140℃下加熱硬化10分鐘~24小時左右、較好的是30分鐘~3小時,藉此獲得所需之硬化膜。In the first aspect, as the thickness of the coating film, the thickness of the cured film is preferably 0.5 to 6 μm, more preferably 0.5 to 3 μm. Thereafter, it is heated and hardened under appropriate curing conditions, usually at room temperature to 190 ° C, preferably 80 to 140 ° C for 10 minutes to 24 hours, preferably 30 minutes to 3 hours, thereby obtaining the desired Hardened film.
於第二態樣中,作為塗膜之厚度,將硬化膜之厚度調整為較好的是1~50μm、更好的是2~20μm。其後,以適當之硬化條件,通常於80~190℃、較好的是100~140℃下加熱硬化10分鐘~24小時、較好的是30分鐘~3小時,藉此獲得所需之硬化膜。In the second aspect, as the thickness of the coating film, the thickness of the cured film is preferably from 1 to 50 μm, more preferably from 2 to 20 μm. Thereafter, the hardening is carried out under suitable curing conditions, usually at 80 to 190 ° C, preferably at 100 to 140 ° C for 10 minutes to 24 hours, preferably 30 minutes to 3 hours, thereby obtaining the desired hardening. membrane.
由本發明之含有(A)~(E)成分之塗布液所獲得之硬化膜於膜中分散有有機高分子微粒((B)成分)、膠體二氧化矽((C)成分)。The cured film obtained from the coating liquid containing the components (A) to (E) of the present invention has organic polymer fine particles (component (B)) and colloidal cerium oxide (component (C)) dispersed in the film.
該分散狀態較好的是無機有機混成之海島結構。相當於海島結構之島的有機高分子微粒及膠體二氧化矽等粒子成分的粒徑較好的是200nm以下,更好的是100nm以下,不凝集而均勻分散。The dispersed state is preferably an island structure of an inorganic organic mixture. The particle size of the organic polymer fine particles and the colloidal ceria which are equivalent to the island structure island is preferably 200 nm or less, more preferably 100 nm or less, and is uniformly dispersed without being aggregated.
本發明硬化膜之總透光率較好的是80%以上,更好的是85%以上,霧度值較好的是10%以下,更好的是5%以下。此種硬化膜具有高透明性。The total light transmittance of the cured film of the present invention is preferably 80% or more, more preferably 85% or more, and the haze value is preferably 10% or less, more preferably 5% or less. Such a cured film has high transparency.
再者,有機高分子微粒((B)成分)、膠體二氧化矽((C)成分)所分散之具有Si-O鍵之基質來自(A-1)、(A-2)、(A-3)、(A-4)及(A-5)成分。Further, the matrix having Si-O bonds dispersed by the organic polymer fine particles (component (B)) and the colloidal cerium oxide (component (C)) are derived from (A-1), (A-2), (A- 3), (A-4) and (A-5) components.
又,本發明亦提供一種硬化膜之製造方法,其特徵在於包括:將上述本發明之塗布液加熱並使其硬化之步驟。Further, the present invention provides a method for producing a cured film, which comprises the step of heating and hardening the above-described coating liquid of the present invention.
又,由本發明之含有(A)~(G)成分之塗布液所獲得之硬化膜於膜中分散有有機高分子微粒((B)成分)、膠體二氧化矽((C)成分)、氧化鈰粒子((F)成分)。Further, the cured film obtained by the coating liquid containing the components (A) to (G) of the present invention has organic polymer fine particles (component (B)), colloidal cerium oxide (component (C)), and oxide dispersed in the film.铈 particles ((F) component).
本發明之硬化膜之霧度值較好的是10%以下,更好的是5%以下。此種硬化膜之耐紫外線性優異並且具有高透明性。The cured film of the present invention preferably has a haze value of 10% or less, more preferably 5% or less. Such a cured film is excellent in ultraviolet resistance and has high transparency.
再者,有機高分子微粒((B)成分)、膠體二氧化矽((C)成分)、氧化鈰粒子((F)成分)所分散之具有Si-O鍵之基質來自各(A)成分。Further, a matrix having Si-O bonds dispersed by organic polymer fine particles (component (B)), colloidal cerium oxide (component (C)), and cerium oxide particles (component (F)) is derived from each component (A). .
又,本發明亦提供一種硬化膜之製造方法,其特徵在於包括:將上述本發明之塗布液加熱並使其硬化之步驟。Further, the present invention provides a method for producing a cured film, which comprises the step of heating and hardening the above-described coating liquid of the present invention.
以下,對本發明之樹脂積層體加以說明。Hereinafter, the resin laminate of the present invention will be described.
樹脂積層體包含基材及形成於基材上之樹脂層。The resin laminate includes a substrate and a resin layer formed on the substrate.
形成於基材上之樹脂層可為一層,亦可為兩層以上。The resin layer formed on the substrate may be one layer or two or more layers.
以下,對本發明之樹脂積層體加以詳細說明。Hereinafter, the resin laminate of the present invention will be described in detail.
本發明之第1樹脂積層體係在基材上或者在無機層(無機硬質物層)與基材之間具有上述本發明硬化膜之積層體。又,本發明之第2樹脂積層體係具有基材、形成於該基材上之本發明硬化膜、形成於硬化膜上之透明導電膜之積層體。進而,本發明之第3樹脂積層體係具有基材、形成於該基材上之本發明硬化膜、及形成於硬化膜上之光觸媒層之積層體。以下,有時將第1~第3樹脂積層體統稱為本發明之樹脂積層體。The first resin laminate system of the present invention has the laminate of the above-described cured film of the present invention on a substrate or between an inorganic layer (inorganic hard layer) and a substrate. Moreover, the second resin layered system of the present invention has a substrate, a cured film of the present invention formed on the substrate, and a laminate of a transparent conductive film formed on the cured film. Further, the third resin layered system of the present invention has a substrate, a cured film of the present invention formed on the substrate, and a laminate of photocatalyst layers formed on the cured film. Hereinafter, the first to third resin laminates are collectively referred to as the resin laminate of the present invention.
使用本發明之塗布液而形成上述硬化膜之方法,係如上述本發明硬化膜之說明中所示。本發明之樹脂積層體具有優異之耐磨耗性、耐擦傷性、耐撓曲性及耐煮沸性,其用途係如上述本發明塗布液中之用途說明中所示。The method of forming the above-mentioned cured film by using the coating liquid of the present invention is as shown in the above description of the cured film of the present invention. The resin laminate of the present invention has excellent abrasion resistance, scratch resistance, flex resistance and boiling resistance, and its use is as shown in the application description of the coating liquid of the present invention described above.
本發明之樹脂積層體若具有上述構成則無特別限制。例如可使用於:二輪車、三輪車之擋風玻璃,汽車用、軌道車輛用、建設機械車輛用窗,建設機械車輛用頂,汽車內部裝飾用構件,汽車外部裝飾用構件,摩托車用構件,卡車之貨箱外罩,電車、飛機、船舶等各種交通工具的內外部裝飾用構件;視聽設備(audiovisual)、洗衣機、炊飯器、電鍋、IH(Induction Heating,感應加熱)烹調爐等家庭用電器、傢具等之構件,行動電話、筆記型電腦、遙控裝置等之構件;傢具用外部裝飾材料、建築材料、車窗、建築物等之窗用遮光膜,牆面、天花板、地板等之建築用內部裝飾,壁板等之外壁、圍牆、屋頂、門扇、擋山牆封簷板等之建築用外部裝飾,窗框、門扇、扶手、門檻、門楣等傢具類之表面裝飾材料,向下聚光燈、路燈等之照明零件,電漿、液晶、有機EL等之各種顯示器,太陽電池,抗反射膜;光透鏡,光碟,鏡,矯正用眼鏡、太陽眼鏡、運動用護目鏡、安全眼鏡等之眼鏡透鏡,窗玻璃等之光學構件;瓶,化粧品容器,洗劑、沐浴皂、洗手皂等之容器,甜食及點心、飲料類之容器,小件盒等各種包裝容器、包裝材料;此外,可使用於:日式彈珠台等之構件、手提箱等提包類,衛生間便座、桌墊、鐘錶、白板、防護盾以及雜貨等。The resin laminate of the present invention is not particularly limited as long as it has the above configuration. For example, it can be used for: windshields for two-wheeled vehicles, tricycles, windows for automobiles, rail vehicles, construction machinery vehicles, roofs for construction machinery vehicles, components for interior decoration of automobiles, components for exterior decoration of automobiles, components for motorcycles, trucks The outer cover of the cargo box, the internal and external decorative components of various vehicles such as electric cars, airplanes, ships, etc.; household appliances such as audiovisual equipment, washing machines, rice cookers, electric cookers, IH (Induction Heating) cooking stoves, Components such as furniture, mobile phones, notebook computers, remote control devices, etc.; exterior materials for furniture, building materials, window shades for windows, buildings, etc., interiors for walls, ceilings, floors, etc. Decorative exteriors, siding and other exterior walls, fences, roofs, door leaves, gables and other decorative exteriors, window frames, door leaves, handrails, sills, sills and other furniture decorative materials, downlights, street lights, etc. Lighting parts, plasma, liquid crystal, organic EL, etc., solar cells, anti-reflection film; optical lens, optical disk, mirror Glasses for correcting glasses, sunglasses, sports goggles, safety glasses, etc., optical components such as window glass; containers for bottles, cosmetic containers, lotions, bath soaps, hand soaps, confections, snacks, beverages, etc. Containers, small boxes, and other packaging containers and packaging materials; in addition, they can be used for: Japanese-style pinballs and other components, suitcases, etc., toilet seats, table mats, clocks, whiteboards, protective shields, and miscellaneous goods.
作為上述汽車內部裝飾用構件,例如可列舉:儀器面板、控制台盒、儀錶蓋、儀錶面板、指示面板、門飾板、門鎖圈、方向盤、車窗升降開關座、中央儀錶群、控制板、變速桿套、開關類、煙灰缸等。Examples of the automotive interior decorative member include an instrument panel, a console box, a meter cover, an instrument panel, an indicator panel, a door trim, a door lock ring, a steering wheel, a window lift switch seat, a center instrument cluster, and a control panel. , shift lever sleeves, switches, ashtrays, etc.
作為上述汽車外部裝飾用構件,例如可列舉:防風雨襯條、保險桿、保險桿護擋、側擋泥板、車身鑲板、車門、擾流板、發動機罩、車身護條、行李箱蓋、前格柵、支撐座、車輪蓋、中柱、後視鏡、中心裝飾、側飾條、門飾條、窗飾條等,窗、頭燈、尾燈、車燈反射鏡、門遮陽板、擋風零件等。Examples of the automobile exterior decorative member include a weatherproof lining, a bumper, a bumper guard, a side fender, a body panel, a door, a spoiler, a hood, a body guard, and a trunk lid. , front grille, support base, wheel cover, center pillar, rear view mirror, center decoration, side trim strips, door trim strips, window trim strips, etc., windows, headlights, taillights, lamp mirrors, door visors, Windshield parts, etc.
又,作為上述摩托車用構件,例如可列舉:外殼、擋泥板、油箱蓋、載物箱蓋等。Moreover, examples of the member for the motorcycle include a casing, a fender, a fuel tank cap, a tank lid, and the like.
作為上述視聽設備、洗衣機、炊飯器、電鍋、IH烹調爐等家庭用電器、傢具等構件,例如可列舉:前面板、控制面板、觸摸面板、薄膜開關面板、按鈕、標誌、表面裝飾材料等。Examples of the household appliances, furniture, and the like such as the above-described audio-visual equipment, washing machine, rice cooker, electric cooker, and IH cooking oven include a front panel, a control panel, a touch panel, a membrane switch panel, a button, a logo, a surface decorative material, and the like. .
作為上述建築材料,例如可列舉:道路透光性遮音板、鐵路及工廠周邊之隔音板、拱廊、防風面板、防雪棚、車棚及自行車停車場、公共汽車站、日光室、遊廊等之屋頂及入口或半球型屋頂等之採光材料、建築物等之窗、塑膠溫室等。Examples of the above-mentioned building materials include a road-transparent sound-absorbing panel, a soundproof panel around a railway and a factory, an arcade, a windproof panel, a snow shelter, a carport, a bicycle parking lot, a bus stop, a sunroom, a veranda, and the like. Lighting materials such as entrances or hemispherical roofs, windows for buildings, plastic greenhouses, etc.
作為上述行動電話、筆記型電腦、遙控裝置等之構件,例如可列舉:殼體、顯示窗、小鍵盤、按鈕等。Examples of the components of the mobile phone, the notebook computer, and the remote control device include a casing, a display window, a keypad, a button, and the like.
作為基材,可使用包含樹脂、金屬、木材、橡膠、混凝土、石材、陶瓷、皮革、紙、布及纖維中之至少任一種者,但較好的是使用樹脂製基材(樹脂基材)。As the substrate, at least one of resin, metal, wood, rubber, concrete, stone, ceramic, leather, paper, cloth, and fiber may be used, but a resin substrate (resin substrate) is preferably used. .
作為基材,可列舉樹脂製成形體、膜、片等。膜、片係採用擠出成形法、充氣法、溶液流延法等公知之成形方法而製造,其等亦可視需要而沿單軸及/或雙軸方向延伸。對於基材中之樹脂種類並無特別限制,可根據所得樹脂積層體的用途,自各種樹脂中適當選擇。Examples of the substrate include a resin, a film, a sheet, and the like. The film or sheet is produced by a known molding method such as an extrusion molding method, an aeration method, or a solution casting method, and the like may be extended in a uniaxial and/or biaxial direction as needed. The type of the resin in the substrate is not particularly limited, and can be appropriately selected from various resins depending on the use of the obtained resin laminate.
又,本發明之基材可具有凹凸,並且不論基材形狀如何,可為圓柱形、橢圓柱形、稜柱形等。Further, the substrate of the present invention may have irregularities and may be cylindrical, elliptical cylindrical, prismatic or the like regardless of the shape of the substrate.
又,本發明之樹脂積層體可於其內部具有空間,於具有內部空間之情形時,亦可於內壁部分積層其他樹脂層。Further, the resin laminate of the present invention may have a space inside it, and when it has an internal space, another resin layer may be laminated on the inner wall portion.
因此,對於本發明之基材的形狀並無特別限制,本發明之樹脂積層體包含如下所述的藉由嵌入成形或嵌入模成形而獲得之樹脂積層體。Therefore, the shape of the substrate of the present invention is not particularly limited, and the resin laminate of the present invention comprises a resin laminate obtained by insert molding or insert molding as described below.
於本發明中,作為可用於基材之樹脂,例如可列舉:聚乙烯、聚丙烯、環烯烴系樹脂(例如:JSR股份有限公司製造之「Arton」、日本Zeon股份有限公司製造之「Zeonor」、「Zeonex」)、聚甲基戊烯等聚烯烴系樹脂;聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等之聚酯系樹脂;二乙酸纖維素、三乙酸纖維素、乙酸丁酸纖維素等纖維素系樹脂;聚苯乙烯、對排聚苯乙烯、丙烯腈-丁二烯-苯乙烯樹脂(ABS樹脂)等苯乙烯系樹脂;聚醯亞胺、聚醚醯亞胺、聚醯胺醯亞胺等醯亞胺系樹脂;尼龍等聚醯胺系樹脂;聚醚酮、聚醚醚酮等酮系樹脂;聚碸、聚醚碸等碸系樹脂;聚氯乙烯、聚偏二氯乙烯等氯乙烯系樹脂;聚甲基丙烯酸甲酯等丙烯酸系樹脂;聚碳酸酯樹脂、聚苯硫醚、聚縮醛、改質聚苯醚、聚乙烯醇、環氧樹脂、氟樹脂等;亦可為將上述聚合物混合複數種而成之聚合物合金聚合物摻合物。又,亦可為將上述樹脂積層複數層而成之積層結構體。上述樹脂中,較好的是聚酯系樹脂、聚烯烴系樹脂及聚碳酸酯樹脂。In the present invention, examples of the resin that can be used for the substrate include polyethylene, polypropylene, and a cycloolefin resin (for example, "Arton" manufactured by JSR Co., Ltd., and "Zeonor" manufactured by Zeon Co., Ltd., Japan. , "Zeonex"), polyolefin resin such as polymethylpentene; polyester resin such as polyethylene terephthalate, polybutylene terephthalate or polyethylene naphthalate; a cellulose resin such as cellulose acetate, cellulose triacetate or cellulose acetate butyrate; a styrene resin such as polystyrene, aligned polystyrene or acrylonitrile-butadiene-styrene resin (ABS resin); a quinone imine resin such as polyimine, polyether sulfimine or polyamidoximine; a melamine resin such as nylon; a ketone resin such as polyether ketone or polyether ether ketone; polyfluorene or polyether Anthraquinone resin; vinyl chloride resin such as polyvinyl chloride or polyvinylidene chloride; acrylic resin such as polymethyl methacrylate; polycarbonate resin, polyphenylene sulfide, polyacetal, modified polyphenylene Ether, polyvinyl alcohol, epoxy resin, fluororesin, etc.; Bonding together a plurality of kinds of polymer alloys polymer blends. Further, it may be a laminated structure in which a plurality of layers of the above resin are laminated. Among the above resins, preferred are polyester resins, polyolefin resins, and polycarbonate resins.
以該等樹脂為原材料之基材,可為透明、半透明之任意者,又,可為經著色者,亦可為未著色者,若根據用途適當選擇即可。於用於光學用途之情形時,較好的是透明性優異、且未著色者。上述樹脂中,尤其適宜的是透明性及機械物性、耐熱性等優異之聚碳酸酯。The base material which uses these resins as a raw material may be either transparent or translucent, and may be a coloring or an uncolored one, and may be appropriately selected according to the use. When it is used for optical use, it is preferred that it is excellent in transparency and is not colored. Among the above resins, polycarbonates excellent in transparency, mechanical properties, heat resistance and the like are particularly preferable.
對於基材之厚度並無特別限制,可視情況適當選擇,但通常為5μm~30mm左右,較好的是15μm~10mm。The thickness of the substrate is not particularly limited and may be appropriately selected depending on the case, but is usually about 5 μm to 30 mm, preferably 15 μm to 10 mm.
本發明之塗布液可於基材上密著性良好地形成硬化膜,為了進一步提高其密著性,可視需要利用氧化法或凹凸化法等,對基材之至少形成有硬化膜之側的表面實施表面處理。作為上述氧化法,例如可列舉:電暈放電處理、低壓電漿法或大氣壓電漿法等之電漿處理、鉻酸處理(濕式)、火焰處理、熱風處理、臭氧‧紫外線照射處理、電子束處理、ITRO處理等,又,作為凹凸化法,例如可列舉:噴砂法、溶劑處理法等。該等表面處理法可根據基材之種類來適當選擇,通常就硬化及操作性等方面而言,較好的是採用電暈放電處理法。又,亦可利用矽烷偶合劑進行表面處理或設置底塗層。The coating liquid of the present invention can form a cured film with good adhesion to a substrate, and in order to further improve the adhesion, it is necessary to form at least a side of the substrate with a cured film by an oxidation method, a roughening method, or the like. The surface is surface treated. Examples of the oxidation method include a plasma treatment such as a corona discharge treatment, a low pressure plasma method, or an atmospheric piezoelectric slurry method, a chromic acid treatment (wet type), a flame treatment, a hot air treatment, an ozone ‧ an ultraviolet irradiation treatment, and the like. The electron beam treatment, the ITRO treatment, and the like, and examples of the unevenness method include a sand blast method and a solvent treatment method. These surface treatment methods can be appropriately selected depending on the kind of the substrate, and in general, in terms of hardening and workability, a corona discharge treatment method is preferably used. Further, the surface treatment or the undercoat layer may be provided by using a decane coupling agent.
第1樹脂積層體中之無機硬質物層可根據所欲賦予之功能來選擇,並無特別限制。例如,於欲對無機硬質物層賦予耐磨耗性之情形時,無機硬質物層較好的是SiOx (1.8≦x≦2)膜、SiNy (1.2≦y≦4/3)膜或者非晶碳膜。The inorganic hard material layer in the first resin laminate may be selected depending on the function to be imparted, and is not particularly limited. For example, when it is desired to impart abrasion resistance to the inorganic hard layer, the inorganic hard layer is preferably a SiO x (1.8≦x≦2) film, a SiN y (1.2≦y≦4/3) film or Amorphous carbon film.
上述SiOx (1.8≦x≦2)膜、SiNy (1.2≦y≦4/3)膜由於係利用例如下述化學性氣相沈積法或物理性氣相沈積法進行成膜,故就化學計量學而言反應並未完成。因此,在無機硬質物層中可形成未導入氧原子或氮原子之缺損部,且在SiOx 及SiNy 膜中x及y具有範圍。The above SiO x (1.8≦x≦2) film and SiN y (1.2≦y≦4/3) film are formed by film formation by, for example, the following chemical vapor deposition method or physical vapor deposition method. In terms of metrology, the response was not completed. Therefore, a defect portion in which an oxygen atom or a nitrogen atom is not introduced can be formed in the inorganic hard material layer, and x and y have a range in the SiO x and SiN y films.
再者,若將氧與氮同時投入即可製作的氧化矽與氮化矽混合存在之複合物亦適宜。Further, a composite in which cerium oxide and cerium nitride which are prepared by simultaneously introducing oxygen and nitrogen are also suitable.
又,無機硬質物層之硬質性若於如實施例中所示的使用TABER磨耗試驗機之評價中霧度之上升為未達10%之程度即可。或者,若以微維氏硬度(micro Vickers hardness)計為500HV左右以上即可。Further, the hardness of the inorganic hard layer may be such that the increase in haze is less than 10% in the evaluation using the TABER abrasion tester as shown in the examples. Alternatively, it may be about 500 HV or more in terms of micro Vickers hardness.
無機硬質物層之厚度例如較好的是1μm以上,更好的是1~8μm。又,於下述無機硬質物層之製造方法中,無機硬質物層較好的是直接積層於硬化膜上。The thickness of the inorganic hard layer is, for example, preferably 1 μm or more, more preferably 1 to 8 μm. Further, in the method for producing an inorganic hard material layer described below, it is preferred that the inorganic hard material layer is directly laminated on the cured film.
本發明之樹脂積層體之無機硬質物層較好的是藉由化學氣相沈積法(CVD法,chemical vapor deposition)或者物理氣相沈積法(PVD法,physical vapor deposition)進行成膜。作為CVD法之具體例,可列舉:電漿CVD法、光CVD法等;作為PVD法之具體例,可列舉:離子電鍍法、真空蒸鍍法、濺鍍法等。The inorganic hard layer of the resin laminate of the present invention is preferably formed by chemical vapor deposition (CVD) or physical vapor deposition (PVD). Specific examples of the CVD method include a plasma CVD method and a photo CVD method. Specific examples of the PVD method include an ion plating method, a vacuum vapor deposition method, and a sputtering method.
利用如上述之於真空下進行之薄膜形成技術而成膜之無機硬質物層通常具有與無機成分密著,但與有機成分難以密著之性質。於本發明之樹脂積層體之情形時,由於硬化膜具有將有機微粒封入Si-O基質中之無機‧有機混成結構,故無機硬質物層與硬化膜之密著性良好。The inorganic hard material layer formed by the thin film formation technique carried out under vacuum as described above usually has a property of being in close contact with the inorganic component but not adhering to the organic component. In the case of the resin laminate of the present invention, since the cured film has an inorganic ‧ organic mixed structure in which the organic fine particles are encapsulated in the Si—O matrix, the adhesion between the inorganic hard layer and the cured film is good.
作為利用CVD法來積層無機硬質物層之具體例,對利用電漿CVD法而於硬化膜上形成SiOx (1.8≦x≦2)之情形加以說明。As a specific example of laminating an inorganic hard material layer by a CVD method, a case where SiO x (1.8 ≦ x ≦ 2) is formed on a cured film by a plasma CVD method will be described.
所謂電漿CVD法,係指將原料氣體導入至能量密度高之電漿狀態中以使其分解,並利用化學反應使目標材料被覆於基材上之方法。於本發明中,於電漿CVD裝置內配置包含基材及硬化膜之積層體,使裝置內成為真空後,一面向電漿CVD裝置內添加氬氣一面導入SiOx (1.8≦x≦2)膜之原料氣體,當各氣體流量變得穩定時,施加電力而產生電漿,從而於硬化膜上形成SiOx (1.8≦x≦2)膜。The plasma CVD method refers to a method in which a raw material gas is introduced into a plasma state having a high energy density to be decomposed, and a target material is coated on a substrate by a chemical reaction. In the present invention, a laminate including a substrate and a cured film is placed in a plasma CVD apparatus, and after the inside of the apparatus is vacuumed, SiO x (1.8 ≦ x ≦ 2) is introduced while adding argon gas to the plasma CVD apparatus. When the gas flow rate of each of the membranes becomes stable, electric power is applied to generate plasma, and a SiO x (1.8 ≦ x ≦ 2) film is formed on the cured film.
於無機硬質物層為SiOx (1.8≦x≦2)膜之情形時,形成SiOx (1.8≦x≦2)膜之原料例如為矽原料氣體及氧原料氣體。An inorganic layer is hard when SiO x (1.8 ≦ x ≦ 2) the case of film, forming SiO x (1.8 ≦ x ≦ 2 ) of the film material, for example silicon raw material gas and oxygen gas.
形成SiOx (1.8≦x≦2)膜之矽原料氣體,較好的是使用矽烷氣體或有機矽化合物氣體。The ruthenium material gas which forms the SiO x (1.8 ≦ x ≦ 2) film is preferably a decane gas or an organic ruthenium compound gas.
作為適宜使用之矽烷氣體,可列舉:SiH4 氣體、Si2 H6 氣體、Si3 H8 氣體等。Examples of the decane gas to be suitably used include SiH 4 gas, Si 2 H 6 gas, and Si 3 H 8 gas.
有機矽化合物較好的是自矽上鍵結有含碳之基者中任意選擇。作為適宜使用之有機矽化合物之具體例,可列舉:四甲氧基矽烷、四乙氧基矽烷、甲基三甲氧基矽烷、乙基三甲氧基矽烷、四甲基二矽氧烷、二甲氧基二甲基矽烷、二乙氧基二甲基矽烷、甲基三乙氧基矽烷、八甲基環四矽烷等。The organic ruthenium compound is preferably selected from those having a carbon-containing group bonded to the ruthenium. Specific examples of the organic ruthenium compound which is suitably used include tetramethoxy decane, tetraethoxy decane, methyl trimethoxy decane, ethyl trimethoxy decane, tetramethyl dioxane, and dimethyl. Oxy dimethyl decane, diethoxy dimethyl decane, methyl triethoxy decane, octamethylcyclotetraoxane, and the like.
該等有機矽化合物可單獨使用其一種,亦可併用兩種以上。These organic hydrazine compounds may be used alone or in combination of two or more.
於SiOx (1.8≦x≦2)膜之矽原料氣體為矽烷氣體之情形時,作為適宜使用之氧原料氣體,可列舉N2 O氣。In the case where the raw material gas of the SiO x (1.8 ≦ x ≦ 2) film is decane gas, N 2 O gas is exemplified as the oxygen source gas which is suitably used.
又,於SiOx (1.8≦x≦2)膜之矽原料氣體為有機矽化合物氣體之情形時,作為適宜使用之氧原料氣體,可列舉:N2 O氣、O2 氣及O3 氣。Further, in the case where the raw material gas of the SiO x (1.8 ≦ x ≦ 2) film is an organic ruthenium compound gas, examples of the oxygen source gas which is suitably used include N 2 O gas, O 2 gas, and O 3 gas.
上述矽原料氣體及氧原料氣體之流量例如為1~500cm3 /分鐘,較好的是1~300cm3 /分鐘。又,氬氣之流量例如為20~400cm3 /分鐘,較好的是100~300cm3 /分鐘。The flow rate of the above-mentioned ruthenium raw material gas and oxygen raw material gas is, for example, 1 to 500 cm 3 /min, preferably 1 to 300 cm 3 /min. Further, the flow rate of argon gas, for example, 20 ~ 400cm 3 / min, preferably 100 ~ 300cm 3 / min.
所使用之電漿CVD裝置若為通常所使用之裝置則無特別限定,例如可使用平行板電極型、電容耦合型、電感耦合型等。電漿CVD裝置內之壓力例如較好的是1.33~133Pa左右,尤其好的是約2.7Pa。The plasma CVD apparatus to be used is not particularly limited as long as it is generally used, and for example, a parallel plate electrode type, a capacitive coupling type, an inductive coupling type or the like can be used. The pressure in the plasma CVD apparatus is, for example, preferably about 1.33 to 133 Pa, and particularly preferably about 2.7 Pa.
電力施加中所使用之電源的頻率可於聲波~微波範圍內廣泛使用。The frequency of the power source used in power application can be widely used in the range of sound waves to microwaves.
於利用上述電漿CVD法於硬化膜上形成SiOx (1.8≦x≦2)膜之情形時,使用有機矽化合物作為矽原料氣體且有機矽化合物於常溫下為液體或固體時,將加入有機矽化合物之容器整體加熱,使其氣化而使用。When the SiO x (1.8≦x≦2) film is formed on the cured film by the above plasma CVD method, an organic germanium compound is used as the germanium source gas and the organic germanium compound is liquid or solid at normal temperature, and organic is added. The container of the hydrazine compound is heated as a whole and used for gasification.
於上述情形時,將有機矽化合物氣體及氧原料氣體之流量例如控制為1~10cm3 /分鐘,與將流量例如控制為20~400cm3 /分鐘之氬氣一同導入電漿CVD裝置內(直接氣化導入方式)。In the above case, the flow rate of organic silicon compound gas and a material gas of oxygen, for example, controlled to 1 ~ 10cm 3 / min, and the argon flow is controlled, for example, 20 ~ 400cm 3 / minute introduced with the plasma CVD apparatus (direct Gasification introduction method).
又,除上述直接氣化導入方式外,於有機矽化合物為液體之情形時,亦可使用氬氣作為載體氣體,例如以20~400cm3 /分鐘之流量將氬氣導入至加入有機矽化合物之可控制溫度的容器中,使有機矽化合物起泡,從而將有機矽化合物蒸氣與氬氣一同導入電漿CVD裝置內(使用載體氣體之起泡導入方式)。Further, in addition to the above-described direct gasification introduction method, when the organic ruthenium compound is a liquid, argon gas may be used as a carrier gas, for example, argon gas may be introduced into the organic ruthenium compound at a flow rate of 20 to 400 cm 3 /min. In the temperature-controlled container, the organic ruthenium compound is bubbled, and the organic ruthenium compound vapor is introduced into the plasma CVD apparatus together with argon gas (foaming introduction method using a carrier gas).
於上述無機硬質物層之製造方法中,於無機硬質物層為SiNy (1.2≦y≦4/3)膜之情形時,形成SiNy (1.2≦y≦4/3)膜之原料氣體例如為矽原料氣體及氮原料氣體。In the method for producing an inorganic hard material layer, when the inorganic hard material layer is a SiN y (1.2 ≦ y ≦ 4/3) film, a material gas of a SiN y (1.2 ≦ y ≦ 4/3) film is formed, for example. It is a raw material gas and a nitrogen raw material gas.
作為適宜使用之矽原料氣體,可列舉:SiH4 氣、Si2 H6 氣、Si3 H8 氣等之矽烷氣體。Examples of the raw material gas which is suitably used include a decane gas such as SiH 4 gas, Si 2 H 6 gas, or Si 3 H 8 gas.
又,作為適宜使用之氮原料氣體,可列舉:N2 氣及NH3 氣。Further, examples of the nitrogen source gas which is suitably used include N 2 gas and NH 3 gas.
於上述無機硬質物層之製造方法中,於無機硬質物層為非晶碳膜之情形時,作為形成非晶碳膜之原料氣體,適宜使用烴氣體。In the method of producing the inorganic hard material layer, when the inorganic hard material layer is an amorphous carbon film, a hydrocarbon gas is preferably used as a material gas for forming the amorphous carbon film.
再者,於烴氣體之濃度高之情形時,亦可同時導入H2 氣進行稀釋。Further, when the concentration of the hydrocarbon gas is high, H 2 gas may be simultaneously introduced for dilution.
於上述利用CVD法之無機硬質物層之製造方法中,使用原料氣體作為無機硬質物層之原料,但並不限定於此。例如,亦可使下述無機硬質物層之蒸鍍原料氣化後使用。In the above-described method for producing an inorganic hard material layer by the CVD method, a material gas is used as a raw material of the inorganic hard material layer, but the invention is not limited thereto. For example, the vapor deposition material of the inorganic hard material layer described below may be vaporized and used.
作為利用PVD法來積層無機硬質物層之具體例,對利用離子電鍍法來積層無機硬質物層之情形加以說明。As a specific example of laminating an inorganic hard material layer by the PVD method, a case where an inorganic hard material layer is laminated by ion plating will be described.
所謂離子電鍍法,係指將反應性氣體等導入真空蒸鍍裝置內,利用各種方法使裝置內產生氣體電漿,使所生成之蒸鍍粒子(原子‧分子)之一部分離子化並加速,向置於真空中之基材照射蒸鍍粒子及其離子,從而於基材上形成蒸鍍材料之薄膜之方法。亦即,所謂離子電鍍法,係指真空蒸鍍技術與電漿技術之複合技術。The ion plating method refers to introducing a reactive gas or the like into a vacuum vapor deposition device, and generating a gas plasma in the device by various methods to ionize and accelerate one of the generated vapor deposition particles (atoms and molecules). A method in which a substrate placed in a vacuum is irradiated with vapor-deposited particles and ions thereof to form a thin film of a vapor deposition material on a substrate. That is, the so-called ion plating method refers to a composite technology of vacuum evaporation technology and plasma technology.
上述離子電鍍法例如揭示於日本專利特開昭58-29835號公報中。The above ion plating method is disclosed, for example, in Japanese Laid-Open Patent Publication No. SHO 58-29835.
於本發明中,將基材及硬化膜之積層體、以及無機硬質物層之蒸鍍原料分別配置於真空蒸鍍裝置內之規定位置,為了產生電漿而將氬氣、氙氣等惰性氣體,以及視需要之O2 、N2 、乙炔、空氣等反應性氣體導入裝置內,於蒸鍍原料之附近施加高頻電壓以使蒸鍍原料電漿化,從而將無機硬質物層積層於硬化膜上。In the present invention, the laminate of the substrate and the cured film and the vapor deposition material of the inorganic hard layer are disposed at predetermined positions in the vacuum vapor deposition apparatus, and an inert gas such as argon gas or helium gas is generated to generate plasma. And a reactive gas introduction device such as O 2 , N 2 , acetylene or air, if necessary, applies a high-frequency voltage in the vicinity of the vapor deposition material to plasma the vapor deposition material, thereby laminating the inorganic hard material on the cured film. on.
作為無機硬質物層之蒸鍍原料,於無機硬質物層為SiOx (1.8≦x≦2)膜之情形時可列舉氧化矽等,於無機硬質物層為SiNy (1.2≦y≦4/3)膜之情形時可列舉氮化矽等,又,於無機硬質物層為非晶碳膜之情形時可列舉DLC(diamond-like carbon,類鑽碳)等。As a vapor deposition material of the inorganic hard material layer, when the inorganic hard material layer is a SiO x (1.8 ≦ x ≦ 2) film, cerium oxide or the like is exemplified, and in the inorganic hard material layer, SiN y (1.2 ≦ y ≦ 4 / 3) In the case of a film, a tantalum nitride or the like may be mentioned, and in the case where the inorganic hard material layer is an amorphous carbon film, DLC (diamond-like carbon) or the like may be mentioned.
無機硬質物層之蒸鍍原料若使用欲使其形成為無機硬質物層之原料本身即可。The material for vapor deposition of the inorganic hard material layer may be a material which is to be formed into an inorganic hard material layer.
再者,離子電鍍法中之無機硬質物層之蒸鍍原料並不限定於固體。例如,於難以使蒸鍍原料蒸發的原料之情形時,亦可將上述無機硬質物層之原料氣體(矽原料氣體及氧原料氣體)導入真空蒸鍍裝置內,進行反應蒸鍍而積層無機硬質物層。Further, the vapor deposition material of the inorganic hard material layer in the ion plating method is not limited to a solid. For example, in the case of a raw material which is difficult to evaporate the vapor deposition material, the raw material gas (the raw material gas and the oxygen source gas) of the inorganic hard material layer may be introduced into a vacuum vapor deposition apparatus to carry out reactive vapor deposition to laminate an inorganic hard material. Layer of matter.
真空蒸鍍裝置內之壓力例如為1.3×10-3 ~1.3×10-1 Pa左右。The pressure in the vacuum evaporation apparatus is, for example, about 1.3 × 10 -3 to 1.3 × 10 -1 Pa.
施加高頻電壓之裝置若為可進行高頻放電之裝置則無特別限定。上述高頻電壓例如為0.5kV~8.0kV左右。The device for applying a high-frequency voltage is not particularly limited as long as it can perform high-frequency discharge. The high frequency voltage is, for example, about 0.5 kV to 8.0 kV.
於上述離子電鍍法中,為了使對硬化膜表層之蒸鍍於高頻放電中進行,可採用電阻加熱、電子束加熱、高頻感應加熱、雷射光束加熱等加熱方法,視需要使蒸鍍原料蒸發。In the above ion plating method, in order to carry out vapor deposition on the surface layer of the cured film in high-frequency discharge, heating methods such as resistance heating, electron beam heating, high-frequency induction heating, and laser beam heating may be employed, and evaporation may be performed as needed. The raw material evaporates.
利用PVD法之無機硬質物層之積層方法並不限定於離子電鍍法。如上所述,可利用真空蒸鍍法、濺鍍法等來積層無機硬質物層。The method of laminating the inorganic hard layer using the PVD method is not limited to the ion plating method. As described above, the inorganic hard material layer can be laminated by a vacuum deposition method, a sputtering method, or the like.
所謂真空蒸鍍法,係指在真空中使原料受熱蒸發,將該蒸發粒子輸送至基材表面,使蒸發粒子在基材表面再排列而形成薄膜之方法。於真空蒸鍍法中,真空度通常為1.3×10-2 Pa以下。The vacuum vapor deposition method refers to a method in which a raw material is heated and evaporated in a vacuum to transport the evaporated particles to the surface of the substrate, and the evaporated particles are rearranged on the surface of the substrate to form a thin film. In the vacuum evaporation method, the degree of vacuum is usually 1.3 × 10 -2 Pa or less.
所謂濺鍍法,係指使惰性氣體成為電漿,再使所獲得之正離子撞擊原料而將原料表面之元素原子撞出,使其附著及/或堆積在位於其附近之基材上而形成薄膜之方法。The sputtering method refers to forming an inert gas into a plasma, and then causing the obtained positive ions to strike the raw material to knock out elemental atoms on the surface of the raw material, attaching and/or depositing on the substrate located in the vicinity thereof to form a thin film. The method.
本發明之第2樹脂積層體中之透明導電膜可根據所欲賦予之功能而選擇,並無特別限制。例如,於欲對透明導電膜賦予低電阻的電氣特性之情形時,透明導電膜較好的是可列舉:氧化鋅、AZO(摻鋁氧化鋅)或GZO(摻鎵氧化鋅)等以氧化鋅為主成分之材料,或者ITO(摻錫氧化銦)、SnO2 (氧化錫)、IZO(摻鋅氧化銦)、ICO(摻鈰氧化銦)、ATO(摻銻氧化錫)、FTO(摻氟氧化錫)等不以氧化鋅為主成分之透明且具有導電性之材料。The transparent conductive film in the second resin laminate of the present invention can be selected depending on the function to be imparted, and is not particularly limited. For example, in the case where an electrical property of a low electrical resistance is to be imparted to the transparent conductive film, the transparent conductive film is preferably zinc oxide, AZO (aluminum-doped zinc oxide) or GZO (gallium-doped zinc oxide) or the like. Main component material, or ITO (tin-doped indium oxide), SnO 2 (tin oxide), IZO (zinc-doped indium oxide), ICO (indium-doped indium oxide), ATO (antimony-doped tin oxide), FTO (fluorine-doped A material that is transparent and electrically conductive, such as tin oxide, is not mainly composed of zinc oxide.
透明導電膜之導電性的指標之一有載子濃度,載子濃度越大則導電性越高。載子濃度若為1×1018 /cm3 以上,則獲得10000Ω/□以下之表面電阻值,因而較好。又,若載子濃度為1×1019 /cm以上,則會產生紅外反射,適宜作為抗反射膜。進而,若載子濃度為5×1019 /cm3 以上,則可製作用作觸摸面板用途之具有10~1000Ω/□之表面電阻值的樹脂積層體。One of the indexes of the conductivity of the transparent conductive film is the carrier concentration, and the higher the carrier concentration, the higher the conductivity. When the carrier concentration is 1 × 10 18 /cm 3 or more, a surface resistance value of 10000 Ω / □ or less is obtained, which is preferable. Further, when the carrier concentration is 1 × 10 19 /cm or more, infrared reflection occurs, and it is suitable as an antireflection film. Further, when the carrier concentration is 5 × 10 19 /cm 3 or more, a resin laminate having a surface resistance value of 10 to 1000 Ω/□ which is used for a touch panel can be produced.
若將透明導電膜製成非晶質薄膜,則被覆率變得良好,因此可進一步減小膜厚,故較好。作為非晶質之透明導電膜材料,可列舉:IZO(摻鋅氧化銦)、ZTO(氧化鋅-氧化錫)系薄膜、IZTO(氧化銦-氧化鋅-氧化錫)系、氧化錫系薄膜等,又,可列舉添加有對該等薄膜賦予電氣特性、光學特性、機械特性之氧化物之系等。When the transparent conductive film is made into an amorphous film, the coverage ratio is good, so that the film thickness can be further reduced, which is preferable. Examples of the amorphous transparent conductive film material include IZO (zinc-doped indium oxide), ZTO (zinc oxide-tin oxide)-based film, IZTO (indium oxide-zinc oxide-tin oxide)-based, tin oxide-based film, and the like. Further, a system in which an oxide having electrical characteristics, optical characteristics, and mechanical properties is imparted to the film is added.
於將表面電阻值設定為高電阻值之情形時,可藉由選擇材料或者利用膜厚或成膜條件來調整。例如,於降低表面電阻值之情形時,透明導電膜中可使用ITO等電阻率良好(低)之結晶性材料。又,可藉由增加膜厚而降低表面電阻值,但若減小透明導電膜之膜厚,則可期待透射率提高。When the surface resistance value is set to a high resistance value, it can be adjusted by selecting a material or by using a film thickness or a film formation condition. For example, when the surface resistance value is lowered, a crystalline material having a good (low) electrical resistivity such as ITO can be used for the transparent conductive film. Moreover, the surface resistance value can be lowered by increasing the film thickness. However, when the film thickness of the transparent conductive film is made small, the transmittance can be expected to be improved.
又,關於表面電阻值,若視使用目的而適當決定即可,若為用於光電元件、光電轉換元件、液晶、觸摸面板等者,則表面電阻值較好的是10Ω/□以上且5000Ω/□以下,更好的是100Ω/□以上且2000Ω/□以下。又,透明導電膜之厚度例如較好的是5nm以上,更好的是10~300nm。又,於下述透明導電膜之形成方法中,透明導電膜較好的是直接積層於硬化膜上。In addition, the surface resistance value may be appropriately determined depending on the purpose of use, and if it is used for a photovoltaic element, a photoelectric conversion element, a liquid crystal, a touch panel or the like, the surface resistance value is preferably 10 Ω/□ or more and 5000 Ω/ □ Below, it is better to be 100 Ω/□ or more and 2000 Ω/□ or less. Further, the thickness of the transparent conductive film is, for example, preferably 5 nm or more, more preferably 10 to 300 nm. Further, in the method of forming a transparent conductive film described below, it is preferred that the transparent conductive film is directly laminated on the cured film.
又,各層之最佳膜厚例如可藉由以下方法而決定。Further, the optimum film thickness of each layer can be determined, for example, by the following method.
首先,根據用途來決定可獲得必需表面電阻值之透明導電膜的膜厚。其次,將硬化膜中所使用之材料的折射率設為固定值,一面採用最佳化演算法一面改變硬化膜之膜厚,求出可獲得最高透射率或者最低反射率之硬化膜的膜厚。First, the film thickness of the transparent conductive film in which the necessary surface resistance value can be obtained is determined according to the use. Next, the refractive index of the material used in the cured film is set to a fixed value, and the film thickness of the cured film is changed by an optimization algorithm to determine the film thickness of the cured film which can obtain the highest transmittance or the lowest reflectance. .
再者,設於硬化膜上之透明導電膜可為單層,亦可為2層以上之多層膜。例如,可考慮具有導電性之附多層膜之基材的透射率(反射率)而設置2層以上之透明導電膜,亦可進一步設置折射率高之抗反射膜。又,即使於形成抗反射膜之情形時,亦並非侷限於1層者,亦可形成可獲得所需透射率(反射率)之多層結構(例如2層~6層等)。Further, the transparent conductive film provided on the cured film may be a single layer or a multilayer film of two or more layers. For example, a transparent conductive film of two or more layers may be provided in consideration of transmittance (reflectance) of a substrate having a conductive multilayer film, and an antireflection film having a high refractive index may be further provided. Further, even in the case where the antireflection film is formed, it is not limited to one layer, and a multilayer structure (for example, two to six layers) which can obtain a desired transmittance (reflectance) can be formed.
以下,對本發明之第2樹脂積層體之製造方法加以說明。Hereinafter, a method of producing the second resin laminate of the present invention will be described.
本發明之樹脂積層體之製造方法之特徵在於包括:於基材上形成使上述包含(A)~(E)成分之塗布液硬化而成之硬化膜的步驟(a)、以及於上述硬化膜上形成透明導電膜之步驟(b)。The method for producing a resin laminate according to the present invention includes the step (a) of forming a cured film obtained by curing the coating liquid containing the components (A) to (E) on a substrate, and the cured film. Step (b) of forming a transparent conductive film thereon.
再者,關於上述步驟(a),係如上述塗布液及硬化膜之說明中所示。Further, the above step (a) is as shown in the description of the above coating liquid and cured film.
本發明之第2樹脂積層體係在透明導電膜與基材之間形成有硬化膜者,透明導電膜較好的是利用化學氣相沈積法(CVD法)、物理氣相沈積法(PVD法)或者塗布法而形成於該硬化膜上。作為CVD法之具體例,可列舉:電漿CVD法、光CVD法、細霧(mist)法等;作為PVD法之具體例,可列舉:離子電鍍法、真空蒸鍍法、濺鍍法等;塗布法之具體例可列舉:噴霧法、旋轉塗布法、棒式塗布法、刮刀塗布法、噴墨法等。In the second resin laminate system of the present invention, a cured film is formed between the transparent conductive film and the substrate, and the transparent conductive film is preferably a chemical vapor deposition method (CVD method) or a physical vapor deposition method (PVD method). Or a coating method is formed on the cured film. Specific examples of the CVD method include a plasma CVD method, a photo CVD method, and a mist method. Specific examples of the PVD method include an ion plating method, a vacuum vapor deposition method, and a sputtering method. Specific examples of the coating method include a spray method, a spin coating method, a bar coating method, a knife coating method, and an inkjet method.
利用於真空下進行之薄膜形成技術而形成之透明導電膜通常具有與無機成分密著,但與有機成分難以密著之性質。於本發明之樹脂積層體之情形時,由於硬化膜具有將有機微粒封入Si-O基質中之無機‧有機混成結構,故透明導電膜與硬化膜之密著性良好。The transparent conductive film formed by the thin film formation technique performed under vacuum generally has a property of being in close contact with an inorganic component but not adhering to an organic component. In the case of the resin laminate of the present invention, since the cured film has an inorganic ‧ organic mixed structure in which the organic fine particles are encapsulated in the Si—O matrix, the adhesion between the transparent conductive film and the cured film is good.
作為利用濺鍍法來積層透明導電膜之具體例,對利用濺鍍法而於硬化膜上形成ITO膜之情形加以說明。As a specific example of laminating a transparent conductive film by a sputtering method, a case where an ITO film is formed on a cured film by a sputtering method will be described.
所謂濺鍍法,係指使惰性氣體成為電漿,再使所獲得之正離子撞擊原料而將原料表面之元素原子撞出,使其附著及/或堆積在位於其附近的稱為靶(target)之基材上而形成薄膜之方法。The sputtering method refers to the process of causing an inert gas to be a plasma, and causing the obtained positive ions to strike the raw material to knock out elemental atoms on the surface of the raw material, causing them to adhere and/or accumulate in the vicinity thereof. A method of forming a film on a substrate.
於此情形時,靶係使用ITO燒結體。於濺鍍裝置內配置包含基材及硬化膜之積層體,使裝置內通常成為10-5 Pa以下之真空後,通入氬氣,於0.1~10Pa左右之真空下施加0.1~10kW/cm2 左右的直流電力以產生電漿,從而於硬化膜上形成ITO膜。In this case, the target system uses an ITO sintered body. A laminate including a substrate and a cured film is placed in a sputtering apparatus, and a vacuum of 10 -5 Pa or less is usually applied to the apparatus, and argon gas is introduced thereto, and 0.1 to 10 kW/cm 2 is applied under a vacuum of about 0.1 to 10 Pa. The left and right DC power is generated to generate plasma to form an ITO film on the cured film.
於透明導電膜為ITO膜之情形時,形成ITO膜之原料例如係使用添加有10質量%之SnO2 之氧化銦燒結體靶。為了控制導電率及光學特性,亦有將氧氣混入氬氣中之情形。In the case where the transparent conductive film is an ITO film, the raw material for forming the ITO film is, for example, an indium oxide sintered body target to which 10% by mass of SnO 2 is added. In order to control conductivity and optical characteristics, there is also a case where oxygen is mixed into argon gas.
利用PVD法之透明導電膜之積層方法並不限定於上述濺鍍法,可利用真空蒸鍍法、離子電鍍法等來積層透明導電膜。The method of laminating the transparent conductive film by the PVD method is not limited to the above-described sputtering method, and the transparent conductive film can be laminated by a vacuum deposition method, an ion plating method, or the like.
所謂真空蒸鍍法,係指在真空中使原料受熱蒸發,將該蒸發粒子輸送至基材表面,使蒸發粒子在基材表面上再排列而形成薄膜之方法。於真空蒸鍍法中,真空度通常為1.3×10-2 Pa以下。The vacuum vapor deposition method refers to a method in which a raw material is evaporated by heat in a vacuum, and the evaporated particles are transported to the surface of the substrate to re-arrange the evaporated particles on the surface of the substrate to form a thin film. In the vacuum evaporation method, the degree of vacuum is usually 1.3 × 10 -2 Pa or less.
所謂離子電鍍法,係指將反應性氣體等導入真空蒸鍍裝置內,利用各種方法使裝置內產生氣體電漿,使所生成之蒸鍍粒子(原子‧分子)之一部分離子化並加速,向置於真空中之基材照射蒸鍍粒子及其離子,從而於基材上形成蒸鍍材料之薄膜之方法。亦即,所謂離子電鍍法,係指真空蒸鍍技術與電漿技術之複合技術。The ion plating method refers to introducing a reactive gas or the like into a vacuum vapor deposition device, and generating a gas plasma in the device by various methods to ionize and accelerate one of the generated vapor deposition particles (atoms and molecules). A method in which a substrate placed in a vacuum is irradiated with vapor-deposited particles and ions thereof to form a thin film of a vapor deposition material on a substrate. That is, the so-called ion plating method refers to a composite technology of vacuum evaporation technology and plasma technology.
作為利用CVD法來積層透明導電膜之具體例,對利用電漿CVD法而於硬化膜上形成ZnO膜之情形加以說明。A specific example of laminating a transparent conductive film by a CVD method will be described for a case where a ZnO film is formed on a cured film by a plasma CVD method.
所謂電漿CVD法,係指將原料氣體導入至能量密度高之電漿狀態中以使其分解,並利用化學反應使目標材料被覆於基材上之方法。The plasma CVD method refers to a method in which a raw material gas is introduced into a plasma state having a high energy density to be decomposed, and a target material is coated on a substrate by a chemical reaction.
於本發明之第2樹脂積層體中,於電漿CVD裝置內配置包含基材及硬化膜之積層體,使裝置內成為真空後,一面向電漿CVD裝置內添加氬氣一面導入ZnO膜之原料氣體,當各氣體流量變得穩定時,施加電力而產生電漿,從而於硬化膜上形成ZnO膜。In the second resin laminate of the present invention, a laminate including a substrate and a cured film is placed in a plasma CVD apparatus, and after the inside of the apparatus is vacuumed, ZnO film is introduced into the plasma CVD apparatus while introducing argon gas. When the flow rate of each gas becomes stable, electric power is applied to generate a plasma, thereby forming a ZnO film on the cured film.
對於本發明之第3樹脂積層體之光觸媒層中所使用之光觸媒材料並無特別限制,可使用先前公知者,例如:二氧化鈦、鈦酸鍶、鈦酸鋇、鈦酸鈉、二氧化鋯、α-Fe2 O3 、氧化鎢、硫化鎘、硫化鋅等。該等可單獨使用,亦可將複數種組合使用。該等之中,二氧化鈦、尤其是銳鈦礦型二氧化鈦可用作實用性光觸媒。又,為了促進該等光觸媒之活性,亦可添加先前公知之光觸媒促進劑。作為光觸媒促進劑,例如可較好地列舉:鉑、鈀、銠、釕等鉑族金屬,該等可單獨使用,亦可將複數種組合使用。就光觸媒活性之觀點而言,該光觸媒促進劑之添加量通常相對於光觸媒而而於1~20質量%之範圍內選擇。The photocatalyst material used in the photocatalyst layer of the third resin laminate of the present invention is not particularly limited, and conventionally known ones such as titanium dioxide, barium titanate, barium titanate, sodium titanate, zirconium dioxide, and α can be used. -Fe 2 O 3 , tungsten oxide, cadmium sulfide, zinc sulfide, and the like. These may be used alone or in combination of plural kinds. Among these, titanium dioxide, especially anatase type titanium dioxide, can be used as a practical photocatalyst. Further, in order to promote the activity of the photocatalyst, a conventionally known photocatalyst promoter may be added. The photocatalyst promoter may, for example, be preferably a platinum group metal such as platinum, palladium, rhodium or iridium, and these may be used singly or in combination of plural kinds. From the viewpoint of photocatalytic activity, the amount of the photocatalyst promoter to be added is usually selected in the range of 1 to 20% by mass based on the photocatalyst.
光觸媒層之形成法如後述,於利用濕式法之情形時,光觸媒層之基質中通常使用聚矽氧系化合物。例如作為一例,將聚有機矽氧烷或四乙氧基矽烷等烷氧基矽烷水解後進行縮合而成者等直接成為基質。The formation method of the photocatalyst layer is as follows, and in the case of the wet method, a polyfluorene-based compound is usually used in the matrix of the photocatalyst layer. For example, an alkoxydecane such as polyorganosiloxane or tetraethoxysilane is hydrolyzed and then condensed to form a matrix.
以下,對本發明之第3樹脂積層體之製造方法加以說明。Hereinafter, a method of producing the third resin laminate of the present invention will be described.
本發明之樹脂積層體之製造方法包括:於基材上形成上述本發明之硬化膜之步驟(a)、以及於上述硬化膜上形成光觸媒層之步驟(b)。再者,關於上述步驟(a),係如上述硬化膜之說明中所示。The method for producing a resin laminate of the present invention comprises the step (a) of forming the above-mentioned cured film of the present invention on a substrate, and the step (b) of forming a photocatalyst layer on the cured film. Further, the above step (a) is as shown in the description of the above cured film.
對於在硬化膜上形成光觸媒層之方法並無特別限制,可使用各種方法。例如可列舉:真空蒸鍍法、濺鍍法等PVD法;或金屬噴敷法等乾式法、使用塗布液之濕式法等。作為用於濕式法之塗布液,較好的是使用使除光觸媒粒子以外的成分分散於適當之無機系黏合劑(例如,聚矽氧系化合物等)中者。The method of forming the photocatalyst layer on the cured film is not particularly limited, and various methods can be used. For example, a PVD method such as a vacuum deposition method or a sputtering method; a dry method such as a metal spray method, a wet method using a coating liquid, or the like can be given. As the coating liquid used in the wet method, it is preferred to use a component other than the photocatalyst particles dispersed in a suitable inorganic binder (for example, a polyoxo compound).
塗布液可利用公知之方法,例如浸漬塗布法、旋轉塗布法、噴霧塗布法、棒式塗布法、刀片塗布法、輥塗布法、刮刀塗布法、模塗法、凹版塗布法等進行塗布,使其乾燥或硬化而形成光觸媒層。光觸媒層之厚度通常為5nm~2μm,較好的是10nm~2μm,尤其好的是20nm~1μm。若未達5nm,則有未充分發揮光觸媒功能之虞。若超過2μm,則即使厚度大於此,光觸媒功能亦不明顯提高。The coating liquid can be applied by a known method such as a dip coating method, a spin coating method, a spray coating method, a bar coating method, a blade coating method, a roll coating method, a knife coating method, a die coating method, a gravure coating method, or the like. It dries or hardens to form a photocatalyst layer. The thickness of the photocatalyst layer is usually 5 nm to 2 μm, preferably 10 nm to 2 μm, and particularly preferably 20 nm to 1 μm. If it is less than 5 nm, the photocatalytic function is not fully utilized. If it exceeds 2 μm, the photocatalytic function is not significantly improved even if the thickness is larger than this.
本發明之樹脂積層體亦可為成形體(樹脂積層體之成形體)。樹脂積層體之成形體可藉由熱成形而製造。作為熱成形,例如可列舉:真空成形、真空壓空成形、壓空成形、塞助成形、緊合模成形。The resin laminate of the present invention may be a molded body (a molded body of a resin laminate). The molded body of the resin laminate can be produced by thermoforming. Examples of the hot forming include vacuum forming, vacuum forming, pressure forming, plug assist molding, and press molding.
以下對用於熱成形之基材(以下,僅稱為「基材」)加以說明。Hereinafter, a substrate for thermoforming (hereinafter simply referred to as "substrate") will be described.
為了進行利用熱之成形,較好的是以基材之軟化點在50~300℃左右之範圍內之熱塑性樹脂為主體之片或膜,例如可列舉:聚碳酸酯、聚丙烯、聚乙烯、聚苯乙烯、丙烯腈-丁二烯-苯乙烯樹脂(ABS樹脂)、丙烯腈-苯乙烯樹脂(AS樹脂)、甲基丙烯酸甲酯-苯乙烯樹脂(MS樹脂)、聚酯系樹脂、丙烯酸系樹脂、氯乙烯系樹脂、氟系樹脂等,亦可為將上述聚合物混合複數種而成之聚合物合金‧聚合物摻合物。又,亦可為將上述樹脂積層複數層而成之積層結構體。In order to perform heat forming, a sheet or film mainly composed of a thermoplastic resin having a softening point of the substrate of from about 50 to 300 ° C is preferably used, and examples thereof include polycarbonate, polypropylene, and polyethylene. Polystyrene, acrylonitrile-butadiene-styrene resin (ABS resin), acrylonitrile-styrene resin (AS resin), methyl methacrylate-styrene resin (MS resin), polyester resin, acrylic acid A resin, a vinyl chloride resin, a fluorine resin, or the like may be used, and a polymer alloy ‧ polymer blend obtained by mixing the above polymers may be used. Further, it may be a laminated structure in which a plurality of layers of the above resin are laminated.
亦可於基材之未形成硬化膜之面上設置裝飾層。作為裝飾層,可列舉:油墨層、高亮度油墨層、金屬蒸鍍層等。又,裝飾層可為單層,亦可為相互組合之積層。A decorative layer may also be provided on the surface of the substrate on which the cured film is not formed. Examples of the decorative layer include an ink layer, a high-brightness ink layer, and a metal deposition layer. Further, the decorative layer may be a single layer or a laminated layer combined with each other.
其次,對基材之厚度加以說明。Next, the thickness of the substrate will be described.
嵌入成形用基材片或膜之厚度較好的是5μm~0.7mm。於未達5μm之情形時,存在膜強度低而在成形時膜破裂之問題。又,若超過0.7mm,則難以製成捲繞狀態之嵌入成形用片,成為生產性差者。The thickness of the substrate sheet or film for insert molding is preferably from 5 μm to 0.7 mm. When it is less than 5 μm, there is a problem that the film strength is low and the film is broken at the time of molding. Moreover, when it exceeds 0.7 mm, it is difficult to produce the insert molding sheet in a wound state, and it is inferior in productivity.
以下,對熱成形方法之一例加以說明,但本發明不受下述記載之限制。Hereinafter, an example of the thermoforming method will be described, but the present invention is not limited to the following description.
於射出成形模具內以硬化膜側之面朝向可動模具之方式設置未進行熱成形之基材片,利用可動模具之真空抽吸孔進行真空抽吸,藉此進行預備成形。繼而,利用將射出樹脂填充於未形成硬化膜之面側之模內成形,使射出樹脂與基材片一體化。A substrate sheet which is not thermoformed is placed in the injection molding mold so that the surface on the side of the cured film faces the movable mold, and vacuum forming is performed by vacuum suction holes of the movable mold to perform preliminary molding. Then, the injection resin is filled in the in-mold surface on the side where the cured film is not formed, and the injection resin is integrated with the base material sheet.
又,亦可於射出成形模具內設置已進行熱成形之基材片後,利用將射出樹脂填充於未形成硬化膜之面側之嵌入模成形,使射出樹脂與基材片一體化。In addition, after the base material sheet which has been subjected to hot forming is provided in the injection molding die, the injection resin is molded on the surface of the surface on which the cured film is not formed, and the injection resin is integrated with the base material sheet.
為了將成形用基材片成形為凹凸或者圓柱形、橢圓柱形而進行熱成形。作為熱成形法,可列舉:真空成形(包含塞助成形等)、真空壓空成形、壓空成形、緊合模成形、擠壓成形等。Thermoforming is carried out in order to form the base material sheet for forming into irregularities or cylindrical or elliptical cylinders. Examples of the thermoforming method include vacuum forming (including plug assist molding, etc.), vacuum pressure forming, pressure forming, press molding, and extrusion molding.
為了將已進行熱成形之基材片安裝於射出成形模具內,而進行將不需要之部分切割而使其符合射出成形模具形狀之修整。In order to mount the substrate sheet which has been thermoformed in the injection molding die, trimming is performed so that the unnecessary portion is cut to conform to the shape of the injection molding die.
對於修整之方法並無特別限定,例如可列舉:模切割法、雷射切割法、噴水法、切刀按壓法、湯姆森(Thomson)沖壓法等。再者,亦可於熱成形時同時進行修整。The method of dressing is not particularly limited, and examples thereof include a die cutting method, a laser cutting method, a water spray method, a cutter pressing method, and a Thomson pressing method. Furthermore, it is also possible to perform trimming simultaneously during hot forming.
於射出成形模具內以硬化膜側之面朝向可動模具之方式設置未進行熱成形之基材,利用可動模具之真空抽吸孔進行真空抽吸,藉此進行預備成形。繼而,將射出樹脂填充於未形成硬化膜之面側。對於模內射出成形之條件並無特別限制,可在通常的射出成形之條件範圍內進行調整。又,射出成形機可使用立式射出成形機、臥式射出成形機中之任一種。A substrate which is not thermoformed is placed in the injection molding die so that the surface on the side of the cured film faces the movable mold, and vacuum forming is performed by vacuum suction holes of the movable mold to perform preliminary molding. Then, the injection resin was filled on the side of the surface where the cured film was not formed. The conditions for the in-mold injection molding are not particularly limited, and can be adjusted within the range of the usual injection molding conditions. Further, the injection molding machine can use either a vertical injection molding machine or a horizontal injection molding machine.
將已進行熱成形之基材片設置於射出成形模具內後,將射出樹脂填充於未形成硬化膜之面側。After the base material sheet which has been subjected to thermoforming is placed in the injection molding die, the injection resin is filled on the surface side where the cured film is not formed.
對於嵌入模射出成形之條件並無特別限制,可在通常的射出成形之條件範圍內進行調整。又,射出成形機可使用立式射出成形機、臥式射出成形機中之任一種。The conditions for the injection molding of the insert mold are not particularly limited, and can be adjusted within the range of the usual injection molding conditions. Further, the injection molding machine can use either a vertical injection molding machine or a horizontal injection molding machine.
射出成形模具中具有用以將射出樹脂填充於未進行熱成形之基材片的未形成硬化膜之面側而設置的機構。The injection molding die has a mechanism for filling the injection resin on the surface side of the substrate sheet which is not thermoformed, on which the cured film is not formed.
於立式射出成形機之情形時,若設置於模具之下模中則由重力固定。於必需設置於模具之上模中之情形時,則有:自模具中進行真空抽吸而將已進行熱成形之基材片加以固定之方法、利用模具之凸部分加以覆蓋之方法、及利用銷子加以固定之方法等。於臥式射出成形機之情形時,則有在設置於固定側、可移動側之任意側的情形下均進行真空抽吸而加以固定之方式、利用模具之凸部分加以覆蓋之方法、及利用銷子加以固定之方法等。In the case of a vertical injection molding machine, it is fixed by gravity if it is placed in the lower mold of the mold. In the case where it is necessary to be placed in the mold above the mold, there are a method of fixing the substrate sheet which has been thermoformed by vacuum suction from the mold, a method of covering with the convex portion of the mold, and utilizing The method of fixing the pin, etc. In the case of the horizontal injection molding machine, there is a method of vacuum suction and fixing on either the fixed side or the movable side, and a method of covering with a convex portion of the mold, and utilizing The method of fixing the pin, etc.
又,本發明亦提供:硬化膜之製造方法,其特徵在於包括將上述本發明之塗布液加熱並使其硬化之步驟;以及樹脂積層體之製造方法,其特徵在於包括將上述本發明之塗布液塗布於基材上之步驟、使上述塗布液乾燥之步驟、將上述基材進行熱成形之步驟、使上述塗布液硬化而設置塗布層之步驟。Furthermore, the present invention also provides a method for producing a cured film, comprising the steps of: heating and hardening the coating liquid of the present invention; and a method for producing a resin laminate, characterized by comprising coating the above-described present invention The step of applying a liquid to the substrate, the step of drying the coating liquid, the step of thermoforming the substrate, and the step of curing the coating liquid to form a coating layer.
再者,於上述樹脂積層體之製造方法中,更包括於使塗布液硬化而成之樹脂積層體的不具有塗布層之面上設置樹脂層之步驟。Furthermore, in the method for producing a resin laminated body, the resin layered body obtained by curing the coating liquid is further provided with a resin layer provided on a surface of the resin laminate which does not have a coating layer.
利用實施例來更詳細地說明本發明,但本發明不受該等例之任何限定。The invention is illustrated in more detail by way of examples, but the invention is not limited by the examples.
再者,只要未特別提及,則各例中之諸特性係依照下述要領而求得。Further, as long as it is not specifically mentioned, the characteristics in each example are obtained in accordance with the following methods.
於鐵氟龍(註冊商標)培養皿上,對使塗布液熱硬化而獲得之試樣進行熱重量測定(氮氣下,以20℃/分鐘升溫,室溫~800℃),根據其於800℃下之殘渣而求得。The sample obtained by thermally hardening the coating liquid was subjected to thermogravimetric measurement on a Teflon (registered trademark) petri dish (temperature at 20 ° C / min under nitrogen, room temperature to 800 ° C), according to which it was at 800 ° C. The residue is obtained.
藉由計算而算出。詳細而言,算出(A-1)~(A-5)成分之水解‧縮合反應完全進行者((A)成分)、有機高分子微粒((B)成分)及膠體二氧化矽((C)成分)之總質量中的有機高分子微粒之質量%。Calculated by calculation. Specifically, the hydrolysis of the components (A-1) to (A-5) and the completion of the condensation reaction ((A) component), organic polymer microparticles (component (B)), and colloidal ceria (C) The mass % of the organic polymer microparticles in the total mass of the component).
於常溫下密封保存14日,藉由目視而判定凝膠化之有無。對於未凝膠化者,利用A & D股份有限公司之音叉型振動式黏度計SV-10進行黏度測定,將與初期相比之變化率為3倍以內者記為「○」,將超過3倍者記為「X」。The film was sealed and stored at room temperature for 14 days, and the presence or absence of gelation was judged by visual observation. For those who are not gelled, the viscosity is measured by the tuning fork vibrating viscometer SV-10 of A & D Co., Ltd., and the rate of change from the initial period of 3 times is marked as "○", which will exceed 3 The double is marked as "X".
目視觀察硬化膜之外觀,對異物及斑點圖案、白濁加以確認,將未確認到上述情況者記為「良好」。The appearance of the cured film was visually observed, and the foreign matter, the speckle pattern, and the white turbidity were confirmed, and those which did not confirm the above were described as "good".
利用直讀霧度計(direct-read haze computer)(Suga試驗機股份有限公司製造,HGM-2DP)測定積層體之總透光率及霧度。The total light transmittance and haze of the laminate were measured by a direct-read haze computer (manufactured by Suga Test Machine Co., Ltd., HGM-2DP).
使用磨耗輪CS-10F及TABER磨耗試驗機(旋轉磨耗試驗機)(東洋精機股份有限公司製造,型號:TS),於荷重4.9N下進行500轉TABER磨耗試驗,將TABER磨耗試驗前之霧度與TABER磨耗試驗後之霧度之差(ΔH)未達15者記為「○」,將霧度之差為15以上者記為「X」。Using a wear wheel CS-10F and a TABER abrasion tester (rotary wear tester) (manufactured by Toyo Seiki Co., Ltd., model: TS), a 500 rpm TABER abrasion test was carried out at a load of 4.9 N, and the haze before the TABER abrasion test was performed. The difference (f) between the haze after the TABER abrasion test was less than 15 and was marked as "○", and the difference in haze was 15 or more as "X".
於實施例1~11及比較例1~6中,使用鋼絲絨#0000(荷重為4.9N),以2000mm/sec往復50次後,藉由目視來評價表面之受損情況。將完全未受損者記為「1」,將稍許受損者記為「2」,將經摩擦之部位的一半以上之面受損者記為「3」。In Examples 1 to 11 and Comparative Examples 1 to 6, steel wool #0000 (load: 4.9 N) was used, and after reciprocating 50 times at 2000 mm/sec, the damage of the surface was visually evaluated. Those who are completely undamaged are marked as "1", those who are slightly damaged are marked as "2", and those who have suffered damage to more than half of the parts that are rubbed are marked as "3".
於實施例12~16及比較例7~11中,使用鋼絲絨#0000(荷重為9.8N),以2000mm/sec往復50次後,藉由目視來評價表面之受損情況。將完全未受損者記為「1」,將稍許受損者記為「2」,將經摩擦之部位的一半以上之面受損者記為「3」。In Examples 12 to 16 and Comparative Examples 7 to 11, steel wool #0000 (load 9.8 N) was used, and after reciprocating 50 times at 2000 mm/sec, the damage of the surface was visually evaluated. Those who are completely undamaged are marked as "1", those who are slightly damaged are marked as "2", and those who have suffered damage to more than half of the parts that are rubbed are marked as "3".
依照JIS K 5400,利用剃刀之刀刃將試樣(硬化膜)以2mm間隔切入縱橫各11條之切縫而形成100個網格,用指腹使市售之玻璃紙膠帶(「CT-24(寬度為24mm)」,Nichiban股份有限公司製造)與試樣充分密著後,以90°之角度向近前方向迅速剝離,將硬化膜未剝離而殘存之網格數(X)以X/100表示,以對硬化膜之密著性進行評價。According to JIS K 5400, a sample (hardened film) was cut into the slits of 11 vertical and horizontal sides at intervals of 2 mm using a razor blade to form 100 meshes, and a commercially available cellophane tape was used with a finger pad ("CT-24 (width) 24mm)", manufactured by Nichiban Co., Ltd.), after being sufficiently adhered to the sample, it is quickly peeled off at an angle of 90° in the immediate direction, and the number of meshes (X) in which the cured film is not peeled off and expressed is represented by X/100. The adhesion of the cured film was evaluated.
將積層體之試樣於不鏽鋼製燒杯中之沸水中浸漬5小時後,對密著性進行評價。密著性之評價係以與上述(8)同樣之方式進行。The sample of the laminate was immersed in boiling water in a stainless steel beaker for 5 hours, and then the adhesion was evaluated. The evaluation of the adhesion was carried out in the same manner as in the above (8).
用1000小時實施氙弧燈耐候試驗(Atlas公司之Ci65,輸出功率為6.5kW,黑面板溫度為63℃,相對濕度為50%)。以試驗前後之硬化膜密著性的變化來評價耐候性。The xenon arc lamp weathering test was carried out for 1000 hours (Atlas Ci65, output power was 6.5 kW, black panel temperature was 63 ° C, relative humidity was 50%). The weather resistance was evaluated by the change in the adhesion of the cured film before and after the test.
除使用100mm×寬度50mm×厚度1mm之住友電木(Sumitomo Bakelite)股份有限公司製造之聚碳酸酯標準板(商品名:ECK100)作為基板以外,以與各例相同之方法製造樹脂積層體之試樣。A test for producing a resin laminate in the same manner as in each example except that a polycarbonate standard plate (trade name: ECK100) manufactured by Sumitomo Bakelite Co., Ltd., 100 mm × width 50 mm × thickness 1 mm was used as the substrate. kind.
用手指夾持該試樣之兩端,進行10次半徑為50mm之曲線之強制彎曲,將積層面上未產生裂痕者記為「○」,將產生裂痕者記為「×」。The both ends of the sample were held by fingers, and forced bending was performed 10 times on a curve having a radius of 50 mm, and those having no crack on the layer were marked as "○", and those having cracks were marked as "×".
利用耐熱性試驗(TABAI製造,PS-222)中,以110℃、720小時之條件實施。以試驗前後之硬化膜密著性的變化來評價耐熱性。The heat resistance test (manufactured by TABAI, PS-222) was carried out at 110 ° C for 720 hours. The heat resistance was evaluated by the change in the adhesion of the cured film before and after the test.
利用TEM(transmission electron microscope,穿透式電子顯微鏡)進行硬化膜之剖面觀察,選出10個存在於其1μm見方之區域中之有機微粒,使用美國NIH(National Institute of Health)製造之Freesoft:NIH Image 1.63求得平均粒徑。將有機微粒之平均粒徑為200nm以下者記為「○」,將平均粒徑大於200nm者記為「×」,又,將雖亦存在粒徑為200nm以下者,但存在粒子熔著而成為粒徑達到200nm以上之變形蟲(ameba)狀者的情況記為「Δ」。Using a TEM (transmission electron microscope) to observe the cross-section of the cured film, 10 organic particles present in the region of 1 μm square were selected, and Freesoft: NIH Image manufactured by National Institute of Health, USA was used. 1.63 to obtain the average particle size. When the average particle diameter of the organic fine particles is 200 nm or less, "○" is used, and when the average particle diameter is larger than 200 nm, the particle diameter is 200 nm or less. The case of an amoeba having a particle diameter of 200 nm or more is referred to as "Δ".
以與上述(13)同樣之方式求得硬化膜中之膠體二氧化矽微粒各自之平均粒徑。將平均粒徑為200nm以下者記為「○」,將平均粒徑大於200nm者記為「×」。The average particle diameter of each of the colloidal cerium oxide microparticles in the cured film was determined in the same manner as in the above (13). The average particle diameter of 200 nm or less is referred to as "○", and the average particle diameter of more than 200 nm is referred to as "x".
又,於實施例及比較例中,以商品名記載之原料的詳細內容如下。Moreover, in the examples and comparative examples, the details of the raw materials described by the trade names are as follows.
(A-1)成分:M Silicate 51「作為四甲氧基矽烷之部分縮合物(平均為三~五聚物)的聚烷氧基矽烷」多摩化學工業股份有限公司製造(A-1) Component: M Silicate 51 "Polyalkyloxydecane as a partial condensate of tetramethoxydecane (average three to pentamer)" manufactured by Tama Chemical Industry Co., Ltd.
(A-2)成分:MTMS-A「作為甲基三甲氧基矽烷之部分縮合物的聚有機烷氧基矽烷」多摩化學工業股份有限公司製造(A-2) Component: MTMS-A "Polyorganoalkoxydecane as a partial condensate of methyltrimethoxydecane" manufactured by Tama Chemical Industry Co., Ltd.
(A-2)成分:SR2402「作為甲基三甲氧基矽烷之部分縮合物的聚有機烷氧基矽烷」東麗道康寧股份有限公司製造(A-2) Component: SR2402 "Polyorganoalkoxydecane as a partial condensate of methyltrimethoxydecane" manufactured by Toray Dow Corning Co., Ltd.
(B)成分:ULS-1385MG(紫外線吸收骨架種:苯并三唑系)一方社油脂工業股份有限公司製造(水分散/固形物濃度為30質量%)(B) component: ULS-1385MG (ultraviolet absorption skeleton: benzotriazole) manufactured by Yoshisei Oil & Fats Co., Ltd. (water dispersion/solid content concentration: 30% by mass)
(B)成分:ULS-385MG(紫外線吸收骨架種:二苯甲酮系)一方社油脂工業股份有限公司製造(水分散/固形物濃度為30質量%)(B) component: ULS-385MG (ultraviolet absorption skeleton: benzophenone) manufactured by Yoshisei Oil & Fats Co., Ltd. (water dispersion/solid content concentration: 30% by mass)
(C)成分:IPA-ST-L(膠體二氧化矽)(C) Component: IPA-ST-L (colloidal cerium oxide)
日產化學工業股份有限公司製造(異丙醇分散,膠體二氧化矽濃度為30質量%,平均粒徑為40~50nm(製造廠公布值))Nissan Chemical Industry Co., Ltd. (isopropyl alcohol dispersion, colloidal cerium oxide concentration of 30% by mass, average particle size of 40~50nm (manufacturer published value))
依照表1所示之成分及調配量進行製備。The preparation was carried out in accordance with the ingredients and the amounts shown in Table 1.
向容積為50ml之試樣管中投入有機高分子微粒:ULS-1385MG((B)成分+(E)成分)0.80g,一面以500rpm攪拌,一面分別用1分鐘依序滴加1-甲氧基-2-丙醇((E)成分)4.25g、水((E)成分)0.50g、乙酸((D)成分)0.50g、M Silicate 51((A-1)成分0.40g、MTMS-A((A-2)成分)1.10g、二甲氧基-3-環氧丙氧基丙基甲基矽烷((A-4)成分)0.55g、20質量%對甲苯磺酸甲醇溶液((D)成分+(E)成分)0.05g。繼而,於室溫下以500rpm攪拌60分鐘後,靜置一日,將其作為A液。Into a sample tube having a volume of 50 ml, 0.80 g of organic polymer microparticles: ULS-1385MG (component (B) and (E)) was added, and while stirring at 500 rpm, 1-methoxyl was sequentially added dropwise over 1 minute. Base-2-propanol ((E) component) 4.25 g, water ((E) component) 0.50 g, acetic acid ((D) component) 0.50 g, M Silicate 51 ((A-1) component 0.40 g, MTMS- A ((A-2) component) 1.10 g, dimethoxy-3-glycidoxypropylmethyl decane (component (A-4)) 0.55 g, 20% by mass of p-toluenesulfonic acid methanol solution ( (D) Component + (E) Component) 0.05 g. Then, the mixture was stirred at 500 rpm for 60 minutes at room temperature, and then allowed to stand for one day, and this was used as the solution A.
向容積為20ml之試樣管中投入3-異氰酸基丙基三乙氧基矽烷1.10g及2-丁酮肟(異氰酸酯基之封端劑)0.35g,於室溫下以500rpm攪拌10分鐘後,靜置一日,將其作為C液。關於異氰酸酯基經封端化,係根據13 C-NMR中異氰酸酯基之信號消失而確認。將3-異氰酸基丙基三乙氧基矽烷與2-丁酮肟的調配量之合計作為封端化異氰酸基矽烷化合物:(A-5)成分之量。To a sample tube having a volume of 20 ml, 0.31 g of 3-isocyanatopropyltriethoxydecane and 0.35 g of 2-butanone oxime (blocking agent for isocyanate group) were placed, and stirred at 500 rpm at room temperature. After a minute, let stand for one day and use it as liquid C. The blocking of the isocyanate group was confirmed by the disappearance of the signal of the isocyanate group in the 13 C-NMR. The total amount of 3-isocyanatepropyltriethoxydecane and 2-butanone oxime is defined as the amount of the blocked isocyanatodecane compound: (A-5).
於安裝有冷卻管之200ml三口燒瓶中加入A液及攪拌子,一面以500rpm攪拌,一面用5分鐘滴加作為B液之IPA-ST-L((C)成分+(E)成分)6.50g,於室溫下攪拌60分鐘。繼而,以氮氣流下、600rpm、80℃之條件加熱3小時。繼而,加入C液,以相同條件於80℃下攪拌4小時後,於室溫下靜置一夜。Into a 200 ml three-necked flask equipped with a cooling tube, a solution A and a stir bar were added, and while stirring at 500 rpm, IPA-ST-L (component (+) (E) component) was added dropwise as a liquid B for 5 minutes. Stir at room temperature for 60 minutes. Then, it was heated under a nitrogen stream at 600 rpm and 80 ° C for 3 hours. Then, the solution C was added, and the mixture was stirred at 80 ° C for 4 hours under the same conditions, and then allowed to stand at room temperature overnight.
進而,向其中用2分鐘滴加作為D液之3-胺基丙基三甲氧基矽烷((A-3)成分)0.40g。於室溫下攪拌10分鐘後,進而以氮氣流下、700rpm、80℃之條件加熱3小時。Further, 0.40 g of 3-aminopropyltrimethoxydecane (component (A-3)) as a D solution was added dropwise thereto over 2 minutes. After stirring at room temperature for 10 minutes, it was further heated under a nitrogen stream at 700 rpm and 80 ° C for 3 hours.
繼而靜置1週而獲得塗布液。Then, it was allowed to stand for 1 week to obtain a coating liquid.
使用聚碳酸酯基材[出光興產股份有限公司製造,商品名:Tarflon,商品編號:IV2200R(耐候等級),厚度為3mm(總透光率為90%,霧度值為0.5%)]作為基材。As a polycarbonate substrate [manufactured by Idemitsu Kosan Co., Ltd., trade name: Tarflon, product number: IV2200R (weathering grade), thickness: 3 mm (total light transmittance: 90%, haze value: 0.5%)] was used. Substrate.
利用棒式塗布機,將上述(1)中所獲得之塗布液以硬化膜達到3μm之方式塗布於厚度為3mm之聚碳酸酯成形體之表面,以130℃、2小時之條件使其熱硬化,藉此製作包含基材及硬化膜之積層體。The coating liquid obtained in the above (1) was applied to the surface of a polycarbonate molded body having a thickness of 3 mm by a stick coater at a thickness of 3 μm, and was thermally hardened at 130 ° C for 2 hours. Thereby, a laminate including a substrate and a cured film is produced.
對所獲得之塗布液及積層體進行評價。將評價結果示於表2。The obtained coating liquid and laminated body were evaluated. The evaluation results are shown in Table 2.
以與實施例1同樣之方法並依照表1所示之成分及調配量來製造塗布液,且製作積層體。將對所獲得之塗布液及積層體之評價結果示於表2。The coating liquid was produced in the same manner as in Example 1 in accordance with the components and the amounts shown in Table 1, and a laminate was produced. The evaluation results of the obtained coating liquid and laminated body are shown in Table 2.
依照表3所示之成分及調配量進行製備。The preparation was carried out in accordance with the ingredients and the amounts shown in Table 3.
向容積為50ml之試樣管中投入ULS-1385MG((B)成分+(E)成分)0.90g,一面以500rpm攪拌,一面分別用1分鐘依序滴加1-甲氧基-2-丙醇((E)成分)2.00g、水((E)成分)0.09g、乙酸((D)成分)3.20g、甲基三甲氧基矽烷((A-2)成分)2.00g、二甲氧基-3-環氧丙氧基丙基甲基矽烷((A-4)成分)0.96g、5質量%對甲苯磺酸甲醇溶液((D)成分+(E)成分)0.20g。繼而,於室溫下以500rpm攪拌60分鐘後,靜置一日,將其作為A液。Into a sample tube having a volume of 50 ml, 0.90 g of ULS-1385MG (component (B) and (E)) was added, and while stirring at 500 rpm, 1-methoxy-2-prop was sequentially added dropwise over 1 minute. Alcohol ((E) component) 2.00 g, water ((E) component) 0.09 g, acetic acid ((D) component) 3.20 g, methyltrimethoxydecane ((A-2) component) 2.00 g, dimethoxy Base-3-glycidoxypropylmethyldecane (component (A-4)): 0.96 g, 5% by mass of a methanol solution of p-toluenesulfonic acid (component (D) + (E)) 0.20 g. Then, after stirring at 500 rpm for 60 minutes at room temperature, it was left to stand for one day, and it was made into the A liquid.
向容積為20ml之試樣管中投入3-異氰酸基丙基三乙氧基矽烷1.10g及2-丁酮肟(異氰酸酯基之封端劑)0.36g,於室溫下以500rpm攪拌10分鐘後,靜置一日,將其作為C液。關於異氰酸酯基經封端化,係根據13 C-NMR中異氰酸酯基之信號消失而確認。將3-異氰酸基丙基三乙氧基矽烷與2-丁酮肟的調配量之合計作為封端化異氰酸基矽烷化合物:(A-5)成分之量。0.16 g of 3-isocyanatopropyltriethoxydecane and 0.36 g of 2-butanone oxime (blocking agent for isocyanate group) were placed in a sample tube having a volume of 20 ml, and stirred at 500 rpm at room temperature. After a minute, let stand for one day and use it as liquid C. The blocking of the isocyanate group was confirmed by the disappearance of the signal of the isocyanate group in the 13 C-NMR. The total amount of 3-isocyanatepropyltriethoxydecane and 2-butanone oxime is defined as the amount of the blocked isocyanatodecane compound: (A-5).
於安裝有冷卻管之200ml三口燒瓶中加入A液及攪拌子,一面以500rpm攪拌,一面用5分鐘滴加作為B液之IPA-ST-L((C)成分+(E)成分)7.20g,於室溫下攪拌10分鐘。繼而,以氮氣流下、600rpm、80℃之條件加熱3小時。繼而,加入C液,以相同條件於80℃下攪拌4小時後,於室溫下靜置一夜。A liquid and a stirrer were placed in a 200 ml three-necked flask equipped with a cooling tube, and while stirring at 500 rpm, IPA-ST-L (component (+) (E) component) of 7.00 g was added dropwise over 5 minutes. Stir at room temperature for 10 minutes. Then, it was heated under a nitrogen stream at 600 rpm and 80 ° C for 3 hours. Then, the solution C was added, and the mixture was stirred at 80 ° C for 4 hours under the same conditions, and then allowed to stand at room temperature overnight.
進而,向其中用2分鐘滴加作為D液之3-胺基丙基三甲氧基矽烷((A-3)成分)0.40g。於室溫下攪拌10分鐘後,進而以氮氣流下、700rpm、80℃之條件加熱3小時。Further, 0.40 g of 3-aminopropyltrimethoxydecane (component (A-3)) as a D solution was added dropwise thereto over 2 minutes. After stirring at room temperature for 10 minutes, it was further heated under a nitrogen stream at 700 rpm and 80 ° C for 3 hours.
繼而靜置1週而獲得塗布液。(該比較例1係表示於實施例1之塗布液中不使用(A-1)成分而製造之塗布液者,且為使其硬化膜中之有機高分子微粒含量與實施例1為相同量者)。繼而,使用該塗布液,以與實施例1(2)同樣之方式製作包含基材及硬化膜之積層體。Then, it was allowed to stand for 1 week to obtain a coating liquid. (Comparative Example 1 is a coating liquid produced by using the component (A-1) in the coating liquid of Example 1, and the content of the organic polymer fine particles in the cured film is the same as in Example 1. By). Then, using the coating liquid, a laminate including a substrate and a cured film was produced in the same manner as in Example 1 (2).
對所獲得之塗布液及積層體進行評價。將評價結果示於表4。The obtained coating liquid and laminated body were evaluated. The evaluation results are shown in Table 4.
以與比較例1同樣之方法並依照表3所示之成分及調配量來製造塗布液,並且製作積層體。(該比較例2、3係表示於實施例2、3之塗布液中不使用(A-1)成分而製造之塗布液者,且為使其硬化膜中之有機高分子微粒含量與實施例2、3為相同量者。又,比較例4係表示於實施例3之塗布液中不使用(A-5)成分而製造之塗布液者,且為使其硬化膜中之有機高分子含量與實施例3為相同量者。比較例5係表示於實施例3之塗布液中不使用(A-5)成分及(C)成分而製造之塗布液者,且為使其硬化膜中之有機高分子含量與實施例3為相同量者。比較例6係表示於實施例3之塗布液中不使用(A-1)成分及(C)成分而製造之塗布液者,且為使其硬化膜中之有機高分子含量與實施例3為相同量者)。The coating liquid was produced in the same manner as in Comparative Example 1 in accordance with the components and the amounts shown in Table 3, and a layered product was produced. (Comparative Examples 2 and 3 show the coating liquid produced by using the component (A-1) in the coating liquids of Examples 2 and 3, and the content of the organic polymer fine particles in the cured film and the examples. 2 and 3 are the same amount. Further, Comparative Example 4 is a coating liquid produced by using the component (A-5) in the coating liquid of Example 3, and is an organic polymer content in the cured film. The same amount as in Example 3. The comparative example 5 is a coating liquid produced by using the component (A-5) and the component (C) in the coating liquid of Example 3, and is used in the cured film. The content of the organic polymer was the same as that of Example 3. The comparative example 6 shows the coating liquid produced by using the component (A-1) and the component (C) in the coating liquid of Example 3, and The content of the organic polymer in the cured film was the same as in Example 3.
對所獲得之塗布液及積層體進行評價。將評價結果示於表4。The obtained coating liquid and laminated body were evaluated. The evaluation results are shown in Table 4.
由表1~4可知,本發明之塗布液、由其所獲得之硬化膜及積層體(實施例1~11)均於大致所有評價項目中為合格。As is clear from Tables 1 to 4, the coating liquid of the present invention, the cured film obtained therefrom and the laminates (Examples 1 to 11) were all acceptable in substantially all evaluation items.
不含(A-1)成分之比較例1~3及比較例6的溶液穩定性、膜外觀、透明性、密著性、耐煮沸性良好,但耐擦傷性與實施例1~11者相比較差。又,不含(A-5)成分之比較例4、5的膜外觀、透明性、密著性良好,但溶液穩定性、耐煮沸性與實施例1~11者相比較差。The solution stability, film appearance, transparency, adhesion, and boiling resistance of Comparative Examples 1 to 3 and Comparative Example 6 containing no component (A-1) were good, but the scratch resistance was inferior to those of Examples 1 to 11. Relatively poor. Further, in Comparative Examples 4 and 5 containing no component (A-5), the film appearance, transparency, and adhesion were good, but solution stability and boiling resistance were inferior to those of Examples 1 to 11.
利用棒式塗布機,將實施例1之塗布液以硬化膜達到3μm之方式塗布於厚度為3mm之聚碳酸酯(PC)成形體之表面或者經電暈處理之聚丙烯片[Idemitsu Unitech股份有限公司製造,商品名:Superpurelay,商品編號:SG-140TC,厚度為300μm(總透光率為94%、霧度值為2.3%)]上,以130℃、2小時之條件使其熱硬化,藉此製作包含基材及硬化膜之積層體。於上述所製作之積層體上,進而以下述方法成膜為無機硬質物層,從而獲得積層體。The coating liquid of Example 1 was applied to the surface of a polycarbonate (PC) formed body having a thickness of 3 mm or a corona-treated polypropylene sheet by a bar coater at a thickness of 3 μm [Idemitsu Unitech Co., Ltd. Made by the company, the product name: Superpurelay, product number: SG-140TC, thickness 300μm (total light transmittance 94%, haze value 2.3%)], it is thermally hardened at 130 ° C for 2 hours. Thereby, a laminate including a substrate and a cured film was produced. Further, a layered body was obtained by forming a film of an inorganic hard substance layer on the layered body produced above by the following method.
對所獲得之包含基材、硬化膜及無機硬質物層之積層體進行評價。將評價結果示於表5。The obtained laminate including the substrate, the cured film, and the inorganic hard layer was evaluated. The evaluation results are shown in Table 5.
將所製作之包含基材及硬化膜之積層體設置於電漿CVD裝置內,進行排氣直至裝置內之真空度達到2.7×10-3 Pa,將基材之溫度提高至100℃,保持5分鐘,進行基材之脫氣。其後,恢復至室溫後,進行排氣直至裝置內之真空度達到2.7×10-4 Pa。The produced laminate including the substrate and the cured film is placed in a plasma CVD apparatus, and evacuated until the degree of vacuum in the apparatus reaches 2.7×10 −3 Pa, and the temperature of the substrate is raised to 100° C., and 5 is maintained. In minutes, the substrate was degassed. Thereafter, after returning to room temperature, the gas was evacuated until the degree of vacuum in the apparatus reached 2.7 × 10 -4 Pa.
使真空度為2.7×10-4 Pa後,向裝置內導入SiH4 氣、N2 O氣及Ar氣,氣體流量為:SiH4 氣流量為1cm3 /分鐘、N2 O氣流量為200cm3 /分鐘、Ar氣流量為300cm3 /分鐘,當真空度穩定為2.7Pa左右時,施加電力而產生電漿,從而於硬化膜上形成膜厚為5μm之SiOx (1.8≦x≦2)膜(無機硬質物層)。After the degree of vacuum was 2.7 × 10 -4 Pa, SiH 4 gas, N 2 O gas and Ar gas were introduced into the apparatus, and the gas flow rate was: SiH 4 gas flow rate was 1 cm 3 /min, and N 2 O gas flow rate was 200 cm 3 /min, Ar gas flow rate is 300 cm 3 /min, and when the vacuum degree is stabilized at about 2.7 Pa, electric power is applied to generate plasma, thereby forming a SiO x (1.8 ≦ x ≦ 2) film having a film thickness of 5 μm on the cured film. (Inorganic hard layer).
將所製作之包含基材及硬化膜之積層體設置於電漿CVD裝置內,進行排氣直至裝置內之真空度達到2.7×10-3 Pa,將基材之溫度提高至100℃,保持5分鐘,進行基材之脫氣。其後,恢復至室溫後,進行排氣直至裝置內之真空度達到2.7×10-4 Pa。The produced laminate including the substrate and the cured film is placed in a plasma CVD apparatus, and evacuated until the degree of vacuum in the apparatus reaches 2.7×10 −3 Pa, and the temperature of the substrate is raised to 100° C., and 5 is maintained. In minutes, the substrate was degassed. Thereafter, after returning to room temperature, the gas was evacuated until the degree of vacuum in the apparatus reached 2.7 × 10 -4 Pa.
向使真空度為2.7×10-4 Pa之電漿CVD裝置內,以CH4 氣流量為1cm3 /分鐘、H2 氣流量為150cm3 /分鐘、Ar氣流量為300cm3 /分鐘之氣體流量導入CH4 氣、H2 氣及Ar氣,當真空度穩定為2.7Pa左右時,施加電力而產生電漿,形成膜厚為7μm之非晶碳膜(無機硬質物層)。To a plasma CVD apparatus having a vacuum of 2.7 × 10 -4 Pa, a gas flow rate of CH 4 gas flow rate of 1 cm 3 /min, H 2 gas flow rate of 150 cm 3 /min, and Ar gas flow rate of 300 cm 3 /min CH 4 gas, H 2 gas, and Ar gas were introduced, and when the degree of vacuum was stabilized at about 2.7 Pa, electric power was applied to generate plasma, and an amorphous carbon film (inorganic hard material layer) having a film thickness of 7 μm was formed.
將所製作之包含基材及硬化膜之積層體設置於電漿CVD裝置內,進行排氣直至裝置內之真空度達到2.7×10-3 Pa,將基材之溫度提高至100℃,保持5分鐘,進行基材之脫氣。其後,恢復至室溫後,進行排氣直至裝置內之真空度達到2.7×10-4 Pa。The produced laminate including the substrate and the cured film is placed in a plasma CVD apparatus, and evacuated until the degree of vacuum in the apparatus reaches 2.7×10 −3 Pa, and the temperature of the substrate is raised to 100° C., and 5 is maintained. In minutes, the substrate was degassed. Thereafter, after returning to room temperature, the gas was evacuated until the degree of vacuum in the apparatus reached 2.7 × 10 -4 Pa.
向電漿CVD裝置內,以SiH4 氣流量為1cm3 /分鐘、NH3 氣流量為200cm3 /分鐘、Ar氣流量為400cm3 /分鐘之氣體流量導入SiH4 氣、NH3 氣及Ar氣,當真空度穩定為2.7Pa左右時,施加電力而產生電漿,形成膜厚為7μm之SiNy (1.2≦y≦4/3)膜(無機硬質物層)。Into the plasma CVD apparatus to SiH 4 gas flow rate of 1cm 3 / min, NH 3 gas flow rate of 200cm 3 / min, Ar gas flow rate gas flow 400cm 3 / min of introducing SiH 4 gas, NH 3 gas and an Ar gas When the degree of vacuum was stabilized at about 2.7 Pa, electric power was applied to generate plasma, and a SiN y (1.2 ≦ y ≦ 4/3) film (inorganic hard layer) having a film thickness of 7 μm was formed.
將所製作之包含基材及硬化膜之積層體設置於離子電鍍裝置內,蒸發源為SiO2 晶粒。進行排氣直至裝置內之真空度達到2.7×10-4 Pa。向高頻線圈施加高頻電壓1.5kV,導入氬氣及O2 氣。停止導入氣體後,使裝置內之真空度為1.33×10-3 Pa,進行1~2分鐘SiO2 離子電鍍。其後,一面保持裝置內之真空一面放置冷卻20分鐘,從而於硬化膜上形成膜厚為1.5μm之SiO2 (1.8≦x≦2)膜(無機硬質物層)。The produced laminate including the substrate and the cured film was placed in an ion plating apparatus, and the evaporation source was SiO 2 crystal grains. The exhaust was performed until the degree of vacuum in the apparatus reached 2.7 × 10 -4 Pa. A high-frequency voltage of 1.5 kV was applied to the high-frequency coil, and argon gas and O 2 gas were introduced. After the introduction of the gas was stopped, the degree of vacuum in the apparatus was 1.33 × 10 -3 Pa, and SiO 2 ion plating was performed for 1 to 2 minutes. Thereafter, the film was cooled for 20 minutes while maintaining the vacuum in the apparatus to form a SiO 2 (1.8 ≦ x ≦ 2) film (inorganic hard layer) having a film thickness of 1.5 μm on the cured film.
使用比較例1之塗布液,以與實施例12~16同樣之方法獲得積層體。Using the coating liquid of Comparative Example 1, a laminate was obtained in the same manner as in Examples 12 to 16.
對所獲得之包含基材、硬化膜及無機硬質物層之積層體進行評價。將評價結果示於表5。The obtained laminate including the substrate, the cured film, and the inorganic hard layer was evaluated. The evaluation results are shown in Table 5.
由表5可知,使用實施例1之塗布液的積層體(實施例12~16)均於大致所有評價項目中為合格。As is clear from Table 5, the laminates (Examples 12 to 16) using the coating liquid of Example 1 were all qualified in almost all evaluation items.
比較例7~11係使用比較例1之塗布液的積層體,膜外觀、透明性、耐磨耗性、耐擦傷性良好,但密著性、耐煮沸性與實施例12~16者相比較差。In Comparative Examples 7 to 11, the laminate of the coating liquid of Comparative Example 1 was used, and the film appearance, transparency, abrasion resistance, and scratch resistance were good, but the adhesion and boiling resistance were compared with those of Examples 12 to 16. difference.
上述例中之諸特性係依照下述要領而求得。The characteristics of the above examples are obtained in accordance with the following methods.
於鐵氟龍(註冊商標)培養皿上,對使塗布液熱硬化而獲得之試樣進行熱重量測定(氮氣下,以20℃/分鐘升溫,室溫~800℃),根據其於800℃下之殘渣而求得。The sample obtained by thermally hardening the coating liquid was subjected to thermogravimetric measurement on a Teflon (registered trademark) petri dish (temperature at 20 ° C / min under nitrogen, room temperature to 800 ° C), according to which it was at 800 ° C. The residue is obtained.
藉由計算而算出。詳細而言,算出(A-1)~(A-5)成分之水解‧縮合反應完全進行者((A)成分)、有機高分子微粒((B)成分)及膠體二氧化矽((C)成分)、氧化鈰((F)成分)之總質量中的有機高分子微粒之質量%。Calculated by calculation. Specifically, the hydrolysis of the components (A-1) to (A-5) and the completion of the condensation reaction ((A) component), organic polymer microparticles (component (B)), and colloidal ceria (C) ) The mass % of the organic polymer fine particles in the total mass of the cerium oxide (component (F)).
藉由計算而算出。Calculated by calculation.
於常溫下密封保存14日,藉由目視而判定凝膠化之有無。對於未凝膠化者,利用A & D股份有限公司之音叉型振動式黏度計SV-10進行黏度測定,將與初期相比之變化率在3倍以內者記為「○」,將超過3倍者記為「×」。The film was sealed and stored at room temperature for 14 days, and the presence or absence of gelation was judged by visual observation. For those who are not gelled, the viscosity is measured by the tuning fork vibrating viscometer SV-10 of A & D Co., Ltd., and the rate of change compared with the initial period is 3 times or less, which is more than 3 The double is recorded as "X".
目視觀察硬化膜之外觀,對異物及斑點圖案、白濁加以確認,將未確認到上述情況者記為「良好」。The appearance of the cured film was visually observed, and the foreign matter, the speckle pattern, and the white turbidity were confirmed, and those which did not confirm the above were described as "good".
利用直讀霧度計(Suga試驗機股份有限公司製造,HGM-2DP)測定積層體之總透光率及霧度。The total light transmittance and haze of the laminate were measured by a direct reading haze meter (manufactured by Suga Test Machine Co., Ltd., HGM-2DP).
關於耐磨耗性之評價,係使用磨耗輪CS-10F及TABER磨耗試驗機(旋轉磨耗試驗機)(東洋精機股份有限公司製造,型號:TS),於荷重4.9N下進行500轉TABER磨耗試驗,將TABER磨耗試驗前之霧度與TABER磨耗試驗後之霧度之差(ΔH)未達15者記為「○」,將霧度之差為15以上者記為「×」。For the evaluation of wear resistance, a 500 rpm TABER abrasion test was carried out under a load of 4.9 N using a wear wheel CS-10F and a TABER abrasion tester (rotary wear tester) (manufactured by Toyo Seiki Co., Ltd., model: TS). The difference between the haze before the TABER abrasion test and the haze after the TABER abrasion test (ΔH) is less than 15 and is indicated as "○", and the difference in haze is 15 or more is indicated as "x".
關於耐擦傷性之評價,係於實施例17~20及比較例12~14中,使用鋼絲絨#0000(荷重為4.9N),以2000mm/sec往復50次後,藉由目視來評價表面之受損情況。將完全未受損者記為「1」,將稍許受損者記為「2」,將經摩擦之部位的一半以上之面受損者記為「3」。The evaluation of the scratch resistance was carried out by visually evaluating the surface by using steel wool #0000 (load 4.9 N) and reciprocating 50 times at 2000 mm/sec in Examples 17 to 20 and Comparative Examples 12 to 14. Damaged situation. Those who are completely undamaged are marked as "1", those who are slightly damaged are marked as "2", and those who have suffered damage to more than half of the parts that are rubbed are marked as "3".
依照JIS K 5400,利用剃刀之刀刃將試樣(硬化膜)以2mm間隔切入縱橫各11條之切縫而形成100個網格,用指腹使市售之玻璃紙膠帶(「CT-24(寬度為24mm)」,Nichiban股份有限公司製造)與試樣充分密著後,以90°之角度向近前方向迅速剝離,將硬化膜未剝離而殘存之網格數(X)以X/100表示,以對硬化膜之密著性進行評價。According to JIS K 5400, a sample (hardened film) was cut into the slits of 11 vertical and horizontal sides at intervals of 2 mm using a razor blade to form 100 meshes, and a commercially available cellophane tape was used with a finger pad ("CT-24 (width) 24mm)", manufactured by Nichiban Co., Ltd.), after being sufficiently adhered to the sample, it is quickly peeled off at an angle of 90° in the immediate direction, and the number of meshes (X) in which the cured film is not peeled off and expressed is represented by X/100. The adhesion of the cured film was evaluated.
將積層體之試樣於不鏽鋼製燒杯中之沸水中浸漬5小時後,對密著性進行評價。密著性之評價係以與上述(8)同樣之方式進行。The sample of the laminate was immersed in boiling water in a stainless steel beaker for 5 hours, and then the adhesion was evaluated. The evaluation of the adhesion was carried out in the same manner as in the above (8).
用2400小時實施氙弧燈耐候試驗(Atlas公司之Ci65,輸出功率為6.5kW,黑面板溫度為63℃,相對濕度為50%)。以試驗前後之硬化膜密著性的變化來評價耐候性。The xenon arc lamp weathering test was carried out for 2,400 hours (Ci65 from Atlas, the output power was 6.5 kW, the black panel temperature was 63 ° C, and the relative humidity was 50%). The weather resistance was evaluated by the change in the adhesion of the cured film before and after the test.
除使用100mm×寬度50mm×厚度1mm之住友電木股份有限公司製造之聚碳酸酯標準板(商品名:Polyca-Ace,商品編號:ECK100)作為基板以外,以與各例相同之方法製造樹脂積層體之試樣。A resin laminate was produced in the same manner as in each example except that a polycarbonate standard plate (trade name: Polyca-Ace, product number: ECK100) manufactured by Sumitomo Bakelite Co., Ltd. of 100 mm × width 50 mm × thickness 1 mm was used as the substrate. Sample of the body.
用手指夾持該試樣之兩端,進行10次半徑為50mm之曲線之強制彎曲,將積層面上未產生裂痕者記為「○」,將產生裂痕者記為「×」。The both ends of the sample were held by fingers, and forced bending was performed 10 times on a curve having a radius of 50 mm, and those having no crack on the layer were marked as "○", and those having cracks were marked as "×".
利用耐熱性試驗(TABAI製造,PS-222),以110℃、720小時之條件實施。以試驗前後之硬化膜密著性的變化來評價耐熱性。The heat resistance test (manufactured by TABAI, PS-222) was carried out at 110 ° C for 720 hours. The heat resistance was evaluated by the change in the adhesion of the cured film before and after the test.
利用TEM(穿透式電子顯微鏡)進行硬化膜之剖面觀察,選出10個存在於其1μm見方之區域中之有機微粒,使用美國NIH(National Institute of Health)製造之Freesoft:NIH Image 1.63求得平均粒徑。將有機微粒之平均粒徑為200nm以下者記為「○」,將平均粒徑大於200nm者記為「×」,又,將雖亦存在粒徑為200nm以下者,但存在粒子熔著而成為粒徑為200nm以上之變形蟲狀者的情況記為「Δ」。The cross-section of the cured film was observed by TEM (transmission electron microscope), and 10 organic fine particles present in the region of 1 μm square were selected, and averaged using Freesoft: NIH Image 1.63 manufactured by National Institute of Health, USA. Particle size. When the average particle diameter of the organic fine particles is 200 nm or less, "○" is used, and when the average particle diameter is larger than 200 nm, the particle diameter is 200 nm or less. The case of an amoeba having a particle diameter of 200 nm or more is referred to as "Δ".
以與上述(13)同樣之方式求得硬化膜中之氧化鈰微粒及膠體二氧化矽微粒各自之平均粒徑。將各自之平均粒徑為200nm以下者記為「○」,將任一者之平均粒徑大於200nm者記為「×」。The average particle diameter of each of the cerium oxide fine particles and the colloidal cerium oxide fine particles in the cured film was determined in the same manner as in the above (13). Those having an average particle diameter of 200 nm or less are referred to as "○", and those having an average particle diameter of more than 200 nm are referred to as "x".
又,於實施例及比較例中,以商品名所記載之原料的詳細內容如下。Moreover, in the examples and comparative examples, the details of the raw materials described in the trade names are as follows.
一方社油脂工業股份有限公司製造(水分散/固形物濃度為30質量%)Manufactured by Yosuke Oil & Fat Industry Co., Ltd. (water dispersion/solids concentration is 30% by mass)
一方社油脂工業股份有限公司製造(水分散/固形物濃度為30質量%)Manufactured by Yosuke Oil & Fat Industry Co., Ltd. (water dispersion/solids concentration is 30% by mass)
日產化學工業股份有限公司製造(異丙醇分散,膠體二氧化矽濃度為30質量%,平均粒徑為40~50nm(製造廠公布值))Nissan Chemical Industry Co., Ltd. (isopropyl alcohol dispersion, colloidal cerium oxide concentration of 30% by mass, average particle size of 40~50nm (manufacturer published value))
多木化學股份有限公司製造(水分散,氧化鈰濃度為15質量%,平均粒徑為8nm以下,pH值為3.5(製造廠產品目錄值))Manufactured by Doki Chemical Co., Ltd. (water dispersion, cerium oxide concentration of 15% by mass, average particle size of 8 nm or less, pH of 3.5 (manufacturer catalogue value))
(再者,使用Malvern公司製造之Zetasizer Nano系列Nano-ZS,以20℃、分散介質為水、累計次數為50次之條件對Needral U-15測定ζ電位,結果為+28.8mV,確認氧化鈰粒子具有陽離子性)。(Further, using a Zetasizer Nano series Nano-ZS manufactured by Malvern, the zeta potential was measured on Needral U-15 at 20 ° C, the dispersion medium was water, and the cumulative number of times was 50 times, and the result was +28.8 mV, confirming cerium oxide. The particles are cationic).
多木化學股份有限公司製造(水分散,氧化鈰濃度為15~16質量%,穩定劑:鹽酸未達1.0質量%,pH值為1~3(製造廠公布值))Made by Dumu Chemical Co., Ltd. (water dispersion, cerium oxide concentration is 15~16% by mass, stabilizer: hydrochloric acid is less than 1.0% by mass, pH is 1-3 (manufacturer's published value))
(再者,使用Malvern公司製造之Zetasizer Nano系列Nano-ZS,以20℃、分散介質為水、累計次數為50次之條件對Needral H-15測定ζ電位,結果為+53.7mV,確認氧化鈰粒子具有陽離子性)。(Further, using a Zetasizer Nano series Nano-ZS manufactured by Malvern, the zeta potential was measured on Needral H-15 at 20 ° C, the dispersion medium was water, and the cumulative number of times was 50 times, and the result was +53.7 mV, confirming cerium oxide. The particles are cationic).
依照表6之成分及投入量進行製造。Manufactured according to the composition and input amount of Table 6.
向容積為50ml之試樣管中投入Needral H-15((F')成分)10.0g,一面以500rpm攪拌,一面分別用1分鐘依序滴加1-甲氧基-2-丙醇((E)成分)7.0g、四乙氧基矽烷((A)成分)2.23g。繼而,於室溫下攪拌90分鐘後,於室溫下靜置90分鐘。將其與攪拌子投入安裝有冷卻管之100ml三口燒瓶中,一面以500rpm攪拌,一面於氮氣流下、80℃下加熱4小時。繼而,於室溫下靜置一週,製成包含矽烷化合物與氧化鈰之反應產物的分散液F1((F)成分)。Into a sample tube having a volume of 50 ml, 10.0 g of Needral H-15 ((F') component) was placed, and while stirring at 500 rpm, 1-methoxy-2-propanol was sequentially added dropwise over 1 minute (( E) component: 7.0 g, tetraethoxy decane (component (A)) 2.23 g. Then, after stirring at room temperature for 90 minutes, it was allowed to stand at room temperature for 90 minutes. This was placed in a 100 ml three-necked flask equipped with a cooling tube, and stirred at 500 rpm while stirring at 500 rpm for 4 hours under a nitrogen stream. Then, it was allowed to stand at room temperature for one week to prepare a dispersion F1 (component (F)) containing a reaction product of a decane compound and cerium oxide.
向容積為10ml之試樣管中投入IPA-ST-L((C)成分,分散有陰離子性膠體二氧化矽之IPA分散溶膠)1.0g及攪拌子,一面以400rpm攪拌,一面用1分鐘滴加包含矽烷化合物與氧化鈰之反應產物的分散液F1((F)成分)1.0g,繼而於室溫下攪拌1小時。以目視確認攪拌結束後之分散狀態為未產生凝集、析出、凝膠化而分散。Into a sample tube having a volume of 10 ml, 1.0 g of IPA-ST-L ((C) component, IPA dispersion sol in which an anionic colloidal cerium oxide was dispersed) and a stir bar were placed, and the mixture was stirred at 400 rpm while being dropped for 1 minute. 1.0 g of a dispersion F1 (component (F)) containing a reaction product of a decane compound and cerium oxide was added, followed by stirring at room temperature for 1 hour. It was visually confirmed that the dispersion state after the completion of the stirring was such that aggregation did not occur due to aggregation, precipitation, or gelation.
依照表6之成分及投入量進行製造。Manufactured according to the composition and input amount of Table 6.
向容積為50ml之試樣管中投入Needral H-15((F')成分)10.0g,一面以500rpm攪拌,一面分別用1分鐘滴加1-甲氧基-2-丙醇((E)成分)7.0g、四乙氧基矽烷((A)成分)1.49g。繼而,於室溫下攪拌90分鐘後,於室溫下靜置90分鐘。將其及攪拌子投入安裝有冷卻管之100ml三口燒瓶中,一面以500rpm攪拌,一面用1分鐘滴加3-環氧丙氧基丙基三甲氧基矽烷((A)成分)0.30g,於室溫下攪拌120分鐘。將其一面以500rpm攪拌一面於氮氣流下、80℃下加熱9小時。繼而,於室溫下靜置一週,製成包含矽烷化合物與氧化鈰之反應產物的分散液F2((F)成分)。10.0 g of Needral H-15 ((F') component) was placed in a sample tube having a volume of 50 ml, and 1-methoxy-2-propanol ((E) was added dropwise thereto for 1 minute while stirring at 500 rpm. Component) 7.0 g, tetraethoxy decane (component (A)) 1.49 g. Then, after stirring at room temperature for 90 minutes, it was allowed to stand at room temperature for 90 minutes. This and the stirrer were placed in a 100 ml three-necked flask equipped with a cooling tube, and while stirring at 500 rpm, 0.30 g of 3-glycidoxypropyltrimethoxydecane (component (A)) was added dropwise over 1 minute. Stir at room temperature for 120 minutes. One side was heated at 500 rpm and heated at 80 ° C for 9 hours under a nitrogen stream. Then, it was allowed to stand at room temperature for one week to prepare a dispersion F2 (component (F)) containing a reaction product of a decane compound and cerium oxide.
再者,對於該分散液F2,以與上述(2)之分散性試驗同樣之方法,確認未產生凝集、析出、凝膠化而分散。In the same manner as in the dispersibility test of the above (2), it was confirmed that the dispersion liquid F2 was not aggregated, precipitated, or gelated and dispersed.
依照表7之成分及投入量進行製備。Prepared according to the ingredients and input amounts of Table 7.
向容積為50ml之試樣管中投入有機高分子微粒:ULS-1385MG(實施例17)或者ULS-385MG(實施例18)((B)成分+(E)成分)0.85g,一面以500rpm攪拌,一面分別用1分鐘滴加1-甲氧基-2-丙醇((E)成分)4.25g、水((E)成分)0.50g、乙酸((G)成分)2.80g、M Silicate 51((A-1)成分)0.40g、甲基三甲氧基矽烷((A-2)成分)1.51g、二甲氧基-3-環氧丙氧基丙基甲基矽烷((A-4)成分)0.55g、20質量%對甲苯磺酸甲醇溶液((D)成分+(E)成分)0.05g。繼而,於室溫下以500rpm攪拌60分鐘後,靜置一日,將其作為A液。The organic polymer microparticles: ULS-1385MG (Example 17) or ULS-385MG (Example 18) ((B) component + (E) component) 0.85 g were placed in a sample tube having a volume of 50 ml, and stirred at 500 rpm. On the other hand, 1-methoxy-2-propanol ((E) component) 4.25 g, water ((E) component) 0.50 g, acetic acid ((G) component) 2.80 g, M Silicate 51 were added dropwise over 1 minute. ((A-1) component) 0.40 g, methyltrimethoxydecane (component (A-2)) 1.51 g, dimethoxy-3-glycidoxypropylmethyldecane ((A-4) ) Component) 0.55 g, 20% by mass of a p-toluenesulfonic acid methanol solution ((D) component + (E) component) 0.05 g. Then, after stirring at 500 rpm for 60 minutes at room temperature, it was left to stand for one day, and it was made into the A liquid.
於安裝有冷卻管之200ml三口燒瓶中加入A液及攪拌子,一面以500rpm攪拌,一面用5分鐘滴加作為B液之IPA-ST-L((C)成分+(E)成分)6.50g,於室溫下攪拌20分鐘。繼而,以氮氣流下、500rpm、80℃之條件加熱攪拌7小時後,於溫下靜置一夜,將其作為A'液。Into a 200 ml three-necked flask equipped with a cooling tube, a solution A and a stir bar were added, and while stirring at 500 rpm, IPA-ST-L (component (+) (E) component) was added dropwise as a liquid B for 5 minutes. Stir at room temperature for 20 minutes. Then, the mixture was heated and stirred under a nitrogen stream at 500 rpm and 80 ° C for 7 hours, and then allowed to stand overnight at a temperature to obtain an A' solution.
向容積為20ml之試樣管中投入3-異氰酸基丙基三乙氧基矽烷1.10g及2-丁酮肟(異氰酸酯基之封端劑)0.35g,於室溫下以500rpm攪拌10分鐘後,靜置一日,將其作為C液。關於異氰酸酯基經封端化,係根據13 C-NMR中異氰酸酯基之信號消失而確認。將3-異氰酸基丙基三乙氧基矽烷與2-丁酮肟的調配量之合計作為封端化異氰酸基矽烷化合物:(A-5)成分之量。To a sample tube having a volume of 20 ml, 0.31 g of 3-isocyanatopropyltriethoxydecane and 0.35 g of 2-butanone oxime (blocking agent for isocyanate group) were placed, and stirred at 500 rpm at room temperature. After a minute, let stand for one day and use it as liquid C. The blocking of the isocyanate group was confirmed by the disappearance of the signal of the isocyanate group in the 13 C-NMR. The total amount of 3-isocyanatepropyltriethoxydecane and 2-butanone oxime is defined as the amount of the blocked isocyanatodecane compound: (A-5).
一面以650rpm攪拌A'液,一面用5分鐘滴加包含矽烷化合物與氧化鈰之反應產物的分散液F1((F)成分+(E)成分)3.26g,於室溫下攪拌20分鐘。繼而,用5分鐘加入C液,於室溫下攪拌10分鐘。繼而,以氮氣流下、650rpm、80℃之條件加熱攪拌4小時後,於室溫下靜置一夜。While stirring the A' liquid at 650 rpm, 3.26 g of a dispersion F1 ((F) component + (E) component) containing a reaction product of a decane compound and cerium oxide was added dropwise over 5 minutes, and the mixture was stirred at room temperature for 20 minutes. Then, the solution C was added over 5 minutes, and stirred at room temperature for 10 minutes. Then, the mixture was heated and stirred under a nitrogen stream at 650 rpm and 80 ° C for 4 hours, and then allowed to stand at room temperature overnight.
進而,向其中用2分鐘滴加作為D液之3-胺基丙基三甲氧基矽烷((A-3)成分)0.40g。於室溫下攪拌10分鐘後,繼而以氮氣流下、450rpm、80℃之條件加熱3小時。Further, 0.40 g of 3-aminopropyltrimethoxydecane (component (A-3)) as a D solution was added dropwise thereto over 2 minutes. After stirring at room temperature for 10 minutes, it was heated under a nitrogen stream at 450 rpm and 80 ° C for 3 hours.
繼而靜置1週而獲得塗布液。Then, it was allowed to stand for 1 week to obtain a coating liquid.
使用聚碳酸酯基材[出光興產股份有限公司製造,商品名:Tarflon,商品編號:IV2200R(耐候等級),厚度為3mm(總透光率為90%,霧度值為0.5%)]作為樹脂基材。As a polycarbonate substrate [manufactured by Idemitsu Kosan Co., Ltd., trade name: Tarflon, product number: IV2200R (weathering grade), thickness: 3 mm (total light transmittance: 90%, haze value: 0.5%)] was used. Resin substrate.
利用棒式塗布機,將上述所獲得之塗布液以硬化膜達到7μm之方式塗布於厚度為3mm之聚碳酸酯成形體之表面,以130℃、2小時之條件使其熱硬化,藉此製作積層體。The coating liquid obtained above was applied to the surface of a polycarbonate molded body having a thickness of 3 mm by a bar coater so as to have a cured film of 7 μm, and was thermally cured at 130 ° C for 2 hours. Laminated body.
對所獲得之塗布液及積層體進行評價。將評價結果示於表8。The obtained coating liquid and laminated body were evaluated. The evaluation results are shown in Table 8.
於上述「(4)塗布液之製造」中,使用分散液F2來代替分散液F1,依照表7之成分及投入量來製備該實施例之塗布液,並製作積層體。將對所獲得之塗布液及積層體之評價結果示於表8。In the above "(4) Production of Coating Liquid", the dispersion liquid F2 was used instead of the dispersion liquid F1, and the coating liquid of the example was prepared in accordance with the components and the amounts of the amounts shown in Table 7, and a laminate was produced. The evaluation results of the obtained coating liquid and laminated body are shown in Table 8.
於上述「(4)塗布液之製造」中,使用表7所示之Needral U-15或Needral H-15來代替分散液F1,依照表7之成分及投入量來製備該比較例之塗布液,並製作積層體。將對所獲得之塗布液及積層體之評價結果示於表8。In the above "(4) Production of coating liquid", Needral U-15 or Needral H-15 shown in Table 7 was used instead of the dispersion liquid F1, and the coating liquid of the comparative example was prepared in accordance with the components and the input amount of Table 7. And make a layered body. The evaluation results of the obtained coating liquid and laminated body are shown in Table 8.
實施例17~20之塗布液均為溶液穩定性良好,由其所獲得之積層體亦在所有評價中獲得優異之結果。另一方面,比較例13之塗布液的穩定性低、實用性低。又,比較例12、14之密著性差。The coating liquids of Examples 17 to 20 were all excellent in solution stability, and the laminate obtained therefrom also obtained excellent results in all evaluations. On the other hand, the coating liquid of Comparative Example 13 had low stability and low practicability. Further, in Comparative Examples 12 and 14, the adhesion was poor.
將藉由實施例1、2、5、6所製造之塗布液以硬化膜之厚度達到2~3μm之方式塗布於基材表面上,如下述<基材及硬化膜之熱硬化條件>所示,以適合於所使用之基材的溫度及時間使其熱硬化,藉此製作包含基材及硬化膜之積層體。The coating liquids produced in Examples 1, 2, 5, and 6 were applied to the surface of the substrate so that the thickness of the cured film was 2 to 3 μm, as shown in the following <Thermal curing conditions of the substrate and the cured film> The laminate comprising the substrate and the cured film is formed by thermosetting at a temperature and for a time suitable for the substrate to be used.
其次,利用下述方法在所製作之包含基材及硬化膜之積層體上形成透明導電膜,獲得樹脂積層體。Next, a transparent conductive film was formed on the produced laminate including the substrate and the cured film by the following method to obtain a resin laminate.
將對所獲得之包含基材、硬化膜及透明導電膜之樹脂積層體進行評價之結果示於表9。The results of evaluation of the obtained resin laminate including the substrate, the cured film, and the transparent conductive film are shown in Table 9.
(1)聚碳酸酯[厚度為400μm(總透光率為92%,霧度值為0.4%)],120℃,2小時(1) Polycarbonate [thickness: 400 μm (total light transmittance: 92%, haze value: 0.4%)], 120 ° C, 2 hours
(2)聚對苯二甲酸乙二酯[Unitika股份有限公司製造,商品名:Emblet,等級:S,厚度為25μm(總透光率為89%,霧度值為2.5%)],100℃,2小時(2) Polyethylene terephthalate [manufactured by Unitika Co., Ltd., trade name: Emblt, grade: S, thickness 25 μm (total light transmittance 89%, haze value 2.5%)], 100 ° C ,2 hours
(3)聚丙烯[Idemitsu Unitech股份有限公司製造,商品名:Purethermo,厚度為250μm(總透光率為94%,霧度值為8.5%)],100℃,2小時(3) Polypropylene [manufactured by Idemitsu Unitech Co., Ltd., trade name: Purethermo, thickness 250 μm (total light transmittance 94%, haze value 8.5%)], 100 ° C, 2 hours
將所製作之包含基材及硬化膜之積層體設置於濺鍍裝置(島津HSM-552)內,進行排氣直至裝置內之真空度達到1.0×10-4 Pa。其後,使氬氣流入裝置內,將裝置內之壓力調整為0.2Pa。靶係使用IZO(In2 O3 :ZnO=90:10質量%)燒結體靶。以濺鍍DC(direct current,直流)輸出功率100W來製作膜厚為20nm或膜厚為120nm之透明導電膜。基板溫度為室溫。The produced laminate including the substrate and the cured film was placed in a sputtering apparatus (Shimadzu HSM-552), and evacuated until the degree of vacuum in the apparatus reached 1.0 × 10 -4 Pa. Thereafter, argon gas was introduced into the apparatus, and the pressure inside the apparatus was adjusted to 0.2 Pa. The target system was sintered with a target of IZO (In 2 O 3 : ZnO = 90: 10% by mass). A transparent conductive film having a film thickness of 20 nm or a film thickness of 120 nm was formed by sputtering a DC (direct current) output power of 100 W. The substrate temperature is room temperature.
靶係使用IZTO靶(In2 O3 :ZnO:SnO2 =20:40:40質量%),以與上述(1)同樣之方法形成。The target system was formed in the same manner as in the above (1) using an IZTO target (In 2 O 3 :ZnO:SnO 2 =20:40:40% by mass).
靶係使用ZTO靶(ZnO:SnO2 =10:90質量%),以與上述(1)同樣之方法形成。The target system was formed in the same manner as in the above (1) using a ZTO target (ZnO: SnO 2 = 10: 90% by mass).
靶係使用SnO2 燒結體靶,以與上述(1)同樣之順序形成SnO2 薄膜。The SnO 2 sintered body target was used for the target system, and a SnO 2 film was formed in the same order as in the above (1).
靶係使用ITO靶(In2 O3 :SnO2 =90:10質量%),以與上述(1)同樣之方法形成。形成後,在大氣中利用烘箱於120℃下進行1小時熱處理。The target system was formed in the same manner as in the above (1) using an ITO target (In 2 O 3 :SnO 2 = 90: 10% by mass). After the formation, heat treatment was performed in an atmosphere at 120 ° C for 1 hour in an atmosphere.
在實施例21中所使用之基材上不形成硬化膜而直接形成透明導電膜,獲得樹脂積層體。A transparent conductive film was directly formed on the substrate used in Example 21 without forming a cured film, and a resin laminate was obtained.
將對所獲得之包含基材及透明導電膜之積層體進行評價之結果示於表10。The results of evaluation of the obtained laminate including the substrate and the transparent conductive film are shown in Table 10.
實施例21~32、比較例15~26之各例中之諸特性係依照下述要領而求得。The characteristics of each of Examples 21 to 32 and Comparative Examples 15 to 26 were obtained in accordance with the following procedures.
目視觀察樹脂積層體之外觀,對異物及斑點圖案、裂痕之有無加以確認,將未確認到上述情況者記為「○」,將確認到上述情況者記為「×」。The appearance of the resin laminate was visually observed, and the presence or absence of the foreign matter, the speckle pattern, and the crack was confirmed. The case where the above was not confirmed was indicated as "○", and the case where the above was confirmed was referred to as "x".
利用直讀霧度計(Suga試驗機股份有限公司製造,HGM-2DP)測定樹脂積層體之總透光率及霧度。The total light transmittance and haze of the resin laminate were measured using a direct reading haze meter (manufactured by Suga Test Machine Co., Ltd., HGM-2DP).
依照JIS K5600-5-4,使用塗膜用鉛筆刮痕硬度試驗機(手動式)(井元製作所股份有限公司製造),在樹脂積層體之透明導電膜表面進行評價。According to JIS K5600-5-4, the surface of the transparent conductive film of the resin laminated body was evaluated using a pencil scratch hardness tester (manual type) (manufactured by Imoto Seisakusho Co., Ltd.).
使用鋼絲絨#0000,以荷重4.9N、2000mm/sec在樹脂積層體之透明導電膜之表面上往復10次後,藉由目視以3等級來評價透明導電膜之表面的受損狀態。將完全未受損者記為「1」,將稍許受損者記為「2」,將經摩擦之部位的一半以上之面受損者記為「3」。Using steel wool #0000, after reciprocating 10 times on the surface of the transparent conductive film of the resin laminate with a load of 4.9 N and 2000 mm/sec, the damaged state of the surface of the transparent conductive film was evaluated by visual observation in three steps. Those who are completely undamaged are marked as "1", those who are slightly damaged are marked as "2", and those who have suffered damage to more than half of the parts that are rubbed are marked as "3".
依照JIS K 5400,利用剃刀之刀刃將樹脂積層體之透明導電膜表面以2mm間隔切入縱橫各11條之切縫而形成100個網格,用指腹使市售之玻璃紙膠帶(「CT-24(寬度為24mm)」,Nichiban股份有限公司製造)與透明導電膜表面充分密著後,以90℃之角度向近前方向迅速剝離,將透明導電膜未剝離而殘存之網格數(X)以X/100表示,以對透明導電膜之密著性進行評價。According to JIS K 5400, the surface of the transparent conductive film of the resin laminated body was cut into the slits of 11 vertical and horizontal lines at intervals of 2 mm by a blade of a razor to form 100 meshes, and a commercially available cellophane tape was used with a finger pad ("CT-24" (width: 24 mm), manufactured by Nichiban Co., Ltd.), after sufficiently adhering to the surface of the transparent conductive film, the film was quickly peeled off at an angle of 90 ° C in the near direction, and the number of meshes (X) in which the transparent conductive film was not peeled off and remained X/100 indicates that the adhesion to the transparent conductive film was evaluated.
於耐濕性試驗(小型環境試驗器,Espec股份有限公司製造,SH-221)中,於50℃、95RH%之環境中靜置100小時後,對密著性進行評價。密著性係以與上述(5)同樣之方式進行評價。In the moisture resistance test (small environment tester, manufactured by Espec Co., Ltd., SH-221), the adhesion was evaluated after standing at 100 ° C and 95 RH% for 100 hours. The adhesion was evaluated in the same manner as in the above (5).
用手指夾持樹脂積層體試樣之兩端,進行10次半徑為50mm之曲線之強制彎曲,對積層面確認裂痕或剝離之有無,將未確認到該等者記為「○」,將確認到該等者記為「×」。The both ends of the resin laminate sample were held by a finger, and forced bending was performed on a curve having a radius of 50 mm for 10 times. The presence or absence of cracks or peeling was confirmed on the laminate layer, and those not confirmed were marked as "○", and it was confirmed. These are recorded as "X".
利用低電阻率計Loresta-EP(三菱化學股份有限公司製造),藉由四探針法在樹脂積層體之透明導電膜表面進行比電阻之測定。The specific resistance of the surface of the transparent conductive film of the resin laminate was measured by a four-probe method using a low resistivity meter Loresta-EP (manufactured by Mitsubishi Chemical Corporation).
載子濃度係以van der Pole法進行測定。霍爾(Hall)測定裝置及其測定條件如下。The carrier concentration was determined by the van der Pole method. The Hall measuring apparatus and its measurement conditions are as follows.
東陽技術公司製造:Resi Test8310Made by Dongyang Technology Co., Ltd.: Resi Test8310
測定溫度:室溫(25℃)Measuring temperature: room temperature (25 ° C)
測定磁場:0.5TMeasuring magnetic field: 0.5T
測定電流:10-12 ~10-4 AMeasuring current: 10 -12 ~ 10 -4 A
測定模式:AC(alternating current,交流)磁場Measurement mode: AC (alternating current)
結晶性之判定係藉由X射線繞射測定而進行。X射線繞射測定(XRD,X-ray diffraction)之測定條件如下所述。將無明確之結晶性峰者作為非晶。The determination of crystallinity was carried out by X-ray diffraction measurement. The measurement conditions of X-ray diffraction (XRD, X-ray diffraction) are as follows. Those who have no clear crystallographic peaks are regarded as amorphous.
Rigaku股份有限公司製造:Ultima-IIIManufactured by Rigaku Co., Ltd.: Ultima-III
X射線:Cu-Kα射線(波長未1.5406,利用石墨單色器進行單色化)X-ray: Cu-Kα ray (wavelength not 1.5406 , using a graphite monochromator for monochromization)
輸出功率:50kV-120mAOutput power: 50kV-120mA
2θ-θ反射法,連續掃描(1.0°/分鐘)2θ-θ reflection method, continuous scanning (1.0°/min)
2θ測定角度:5~80°2θ measurement angle: 5~80°
取樣間隔:0.02°Sampling interval: 0.02°
狹縫DS、SS:2/3°、RS:0.6mmSlit DS, SS: 2/3°, RS: 0.6 mm
由表9、10可知,包含基材、硬化膜及透明導電膜之樹脂積層體(實施例21~32)均於大致所有評價項目中為合格。As is clear from Tables 9 and 10, the resin laminates including the base material, the cured film, and the transparent conductive film (Examples 21 to 32) were all qualified in almost all evaluation items.
於未夾持硬化膜之比較例15~26中,基材中使用聚碳酸酯之比較例15~18及23~26的膜外觀、密著性、耐撓曲性良好,但透明性、表面硬度、耐擦傷性、導電性與實施例21~24及29~32相比較差。又,基材中使用聚丙烯之實施例19、20與實施例25、26相比,膜外觀、表面硬度、耐擦傷性、密著性、耐撓曲性較差。基材中使用聚對苯二甲酸乙二酯之比較例21、22的膜外觀、光學特性、密著性、耐撓曲性良好,但表面硬度、耐擦傷性、導電性與實施例27、28相比較差。In Comparative Examples 15 to 26 in which the cured film was not sandwiched, Comparative Examples 15 to 18 and 23 to 26 in which polycarbonate was used as the substrate exhibited good film appearance, adhesion, and flex resistance, but transparency and surface. The hardness, scratch resistance, and electrical conductivity were inferior to those of Examples 21 to 24 and 29 to 32. Further, in Examples 19 and 20 in which polypropylene was used as the substrate, the film appearance, surface hardness, scratch resistance, adhesion, and flex resistance were inferior to those of Examples 25 and 26. In Comparative Examples 21 and 22 in which polyethylene terephthalate was used as the substrate, the film appearance, optical properties, adhesion, and flex resistance were good, but surface hardness, scratch resistance, and electrical conductivity were the same as in Example 27. 28 is relatively poor.
利用棒式塗布機,將實施例1中所獲得之塗布液以硬化膜達到2~5μm之方式塗布於厚度為3mm之聚碳酸酯成形體之表面,以130℃、2小時之條件使其熱硬化,藉此製作包含基材及硬化膜之積層體。The coating liquid obtained in Example 1 was applied to the surface of a polycarbonate molded body having a thickness of 3 mm by a bar coater at a temperature of 2 to 5 μm, and was heated at 130 ° C for 2 hours. After hardening, a laminate including a substrate and a cured film is produced.
繼而,於所製作之包含基材及硬化膜之積層體的硬化膜上,以加熱處理後之厚度達到約0.5μm之方式塗布石原產業股份有限公司製造之光觸媒面塗劑「ST-K211」後,於100℃下進行30分鐘加熱處理,而製作光觸媒層。Then, after applying the photocatalytic top coating agent "ST-K211" manufactured by Ishihara Sangyo Co., Ltd. on the cured film of the laminated body including the substrate and the cured film, the thickness after the heat treatment is about 0.5 μm. The photocatalyst layer was formed by heat treatment at 100 ° C for 30 minutes.
將對所獲得之包含基材、硬化膜及光觸媒層之樹脂積層體進行評價之結果示於表11。The results of evaluation of the obtained resin laminate including the substrate, the cured film, and the photocatalyst layer are shown in Table 11.
除使用實施例8中所獲得之塗布液來代替實施例1中所獲得之塗布液以外,以與實施例33同樣之方式製作包含基材、硬化膜及光觸媒層之樹脂積層體。將對其評價之結果示於表11。A resin laminate including a substrate, a cured film, and a photocatalyst layer was produced in the same manner as in Example 33 except that the coating liquid obtained in Example 8 was used instead of the coating liquid obtained in Example 1. The results of the evaluation thereof are shown in Table 11.
除使用實施例9中所獲得之塗布液來代替實施例1中所獲得之塗布液以外,以與實施例33同樣之方式製作包含基材、硬化膜及光觸媒層之樹脂積層體。將對其評價之結果示於表11。A resin laminate including a substrate, a cured film, and a photocatalyst layer was produced in the same manner as in Example 33 except that the coating liquid obtained in Example 9 was used instead of the coating liquid obtained in Example 1. The results of the evaluation thereof are shown in Table 11.
除不使用實施例1中所獲得之塗布液以外,以與實施例33同樣之方式製作包含基材、硬化膜及光觸媒層之樹脂積層體。將對其評價之結果示於表11。A resin laminate including a substrate, a cured film, and a photocatalyst layer was produced in the same manner as in Example 33 except that the coating liquid obtained in Example 1 was not used. The results of the evaluation thereof are shown in Table 11.
除使用石原產業(股)製造之底塗劑「ST-K300」來代替實施例1中所獲得之塗布液,且將其以乾燥後之厚度達到約0.3μm之方式塗布以外,以與實施例33同樣之方式製作包含基材、硬化膜及光觸媒層之樹脂積層體。將對其評價之結果示於表11。The coating liquid obtained in Example 1 was replaced with the primer "ST-K300" manufactured by Ishihara Sangyo Co., Ltd., and coated to have a thickness of about 0.3 μm after drying, in the same manner as in the examples. In the same manner, a resin laminate including a substrate, a cured film, and a photocatalyst layer was produced in the same manner. The results of the evaluation thereof are shown in Table 11.
除了於比較例28之底塗劑上,進而以乾燥加熱後之厚度達到約3μm之方式塗布石原產業(股)製造之底塗劑「ST-K102a」與「ST-K102b」之等量混合液(ST-K102),於室溫下乾燥5分鐘後,於100℃下加熱30分鐘以外,以與實施例33同樣之方式製作包含基材、硬化膜及光觸媒層之樹脂積層體。將對其評價之結果示於表11。In the same manner as in the primer of Comparative Example 28, the same amount of the primers "ST-K102a" and "ST-K102b" manufactured by Ishihara Satoshi Co., Ltd. was applied in such a manner that the thickness after drying and heating reached about 3 μm. (ST-K102), after drying at room temperature for 5 minutes, and heating at 100 ° C for 30 minutes, a resin laminate including a substrate, a cured film, and a photocatalyst layer was produced in the same manner as in Example 33. The results of the evaluation thereof are shown in Table 11.
實施例33~35、比較例27~29之各例中之諸特性係依照下述要領而求得。The characteristics of each of Examples 33 to 35 and Comparative Examples 27 to 29 were determined in accordance with the following procedures.
作為光觸媒功能是否表現之指標,可列舉親水性之程度(一般若具有與水之接觸角為40°以下之親水性,則稱為具有防污性)。作為光觸媒功能表現出何種程度之指標,係利用以下方法測定接觸角。As an indicator of whether or not the photocatalytic function is expressed, the degree of hydrophilicity (generally, if it has hydrophilicity with a contact angle with water of 40 or less, it is said to have antifouling property). As a measure of the extent to which the photocatalyst function is exhibited, the contact angle is measured by the following method.
以藍黑燈管(black light blue lamp)向光觸媒層側照射1mW/cm2 之紫外線,測定接觸角之經時變化。接觸角係利用微注射器將離子交換水20ml滴加至光觸媒層面上,利用影像處理接觸角計(協和界面科學(股)製造,CA-A)對水滴進行測定。Ultraviolet rays of 1 mW/cm 2 were irradiated to the side of the photocatalyst layer with a black light blue lamp, and the change with time of the contact angle was measured. At the contact angle, 20 ml of ion-exchanged water was dropped onto the photocatalyst layer by means of a micro-syringe, and water droplets were measured using an image processing contact angle meter (manufactured by Kyowa Interface Science Co., Ltd., CA-A).
利用直讀霧度計(Suga試驗機股份有限公司製造,HGM-2DP)測定積層體之總透光率及霧度。The total light transmittance and haze of the laminate were measured by a direct reading haze meter (manufactured by Suga Test Machine Co., Ltd., HGM-2DP).
使用SZ-optical SENSOR(日本電色工業(股)製造),依照JIS K7105來測定。It was measured in accordance with JIS K7105 using SZ-optical SENSOR (manufactured by Nippon Denshoku Industries Co., Ltd.).
使用磨耗輪CS-10F及TABER磨耗試驗機(旋轉磨耗試驗機)(東洋精機股份有限公司製造,型號:TS),於荷重4.9N下進行500轉TABER磨耗試驗,將TABER磨耗試驗前之霧度與TABER磨耗試驗後之霧度之差(ΔH)未達15者記為「○」,將霧度之差為15以上者記為「×」。Using a wear wheel CS-10F and a TABER abrasion tester (rotary wear tester) (manufactured by Toyo Seiki Co., Ltd., model: TS), a 500 rpm TABER abrasion test was carried out at a load of 4.9 N, and the haze before the TABER abrasion test was performed. The difference (f) between the haze after the TABER abrasion test is less than 15 and is indicated as "○", and the difference in haze is 15 or more as "x".
使用鋼絲絨#0000(荷重為4.9N),在樹脂積層體之光觸媒層之表面上以2000mm/sec往復50次後,藉由目視來評價光觸媒層表面之受損情況。將完全未受損者記為「1」,將稍許受損者記為「2」,將經摩擦之部位的一半以上之面受損者記為「3」。Using steel wool #0000 (load 4.9 N), the surface of the photocatalyst layer of the resin laminate was reciprocated 50 times at 2000 mm/sec, and the surface of the photocatalyst layer was visually evaluated for damage. Those who are completely undamaged are marked as "1", those who are slightly damaged are marked as "2", and those who have suffered damage to more than half of the parts that are rubbed are marked as "3".
依照JIS K 5400,利用剃刀之刀刃將樹脂積層體之光觸媒層表面以2mm間隔切入縱橫各11條之切縫而形成100個網格,用指腹使市售之玻璃紙膠帶(「CT-24(寬度為24mm)」,Nichiban股份有限公司製造)與光觸媒表面充分密著後,以90°之角度向近前方向迅速剝離,將光觸媒層未剝離而殘存之網格數(X)以X/100表示,以對光觸媒層之密著性進行評價。According to JIS K 5400, the surface of the photocatalyst layer of the resin laminated body was cut into the slits of 11 vertical and horizontal directions at intervals of 2 mm by a blade of a razor to form 100 meshes, and a commercially available cellophane tape was used with a finger pad ("CT-24 ( The width is 24 mm), and the surface of the photocatalyst is sufficiently adhered to the surface of the photocatalyst, and the photocatalyst layer is not peeled off and the number of grids remaining (X) is represented by X/100. To evaluate the adhesion of the photocatalyst layer.
實施氙弧燈耐候試驗(Atlas公司之Ci65,輸出功率為6.5kw,黑面板溫度為63℃,濕度為50%),以上述霧度、黃變度、密著性之參數變化程度來評價耐候性。The Xenon arc lamp weathering test (Ci65 from Atlas, output power is 6.5kw, black panel temperature is 63°C, humidity is 50%), and the weather resistance is evaluated by the degree of change of parameters such as haze, yellowness and adhesion. Sex.
實施例33~35中任一者之評價與比較例27~29相比,均為耐磨耗性、耐擦傷性及耐候性良好。The evaluation of any of Examples 33 to 35 was excellent in abrasion resistance, scratch resistance, and weather resistance as compared with Comparative Examples 27 to 29.
將實施例1之塗布液以膜厚達到2~3μm之方式塗布於厚度為0.5mm之聚碳酸酯(PC)片[三菱瓦斯股份有限公司製造,商品名:Iupilon Sheet]上,於20℃下使其乾燥240分鐘作為預硬化,製作成形用聚碳酸酯片。將所製作之成形用片進行真空成形,其後將其設置於射出成形模具中,以樹脂溫度為270℃、樹脂壓力為50MPa之條件將包含聚碳酸酯之射出成形樹脂[出光興產股份有限公司製造,商品名:Tarflon]射出至未形成預硬化膜之面上,藉此製造樹脂積層體之成形體。進而,使成形體於120℃下進行1分鐘後硬化。對於該樹脂積層體之成形體,將下述項目(1)~(3)之評價結果示於表12。The coating liquid of Example 1 was applied to a polycarbonate (PC) sheet having a thickness of 0.5 mm (manufactured by Mitsubishi Gas Co., Ltd., trade name: Iupilon Sheet) at a film thickness of 2 to 3 μm at 20 ° C. This was dried for 240 minutes as a pre-hardening, and a polycarbonate sheet for molding was produced. The formed sheet for forming was vacuum-formed, and then placed in an injection molding die, and the injection molding resin containing polycarbonate was prepared under the conditions of a resin temperature of 270 ° C and a resin pressure of 50 MPa. The product manufactured by the company, trade name: Tarflon, is injected onto the surface on which the pre-cured film is not formed, thereby producing a molded body of the resin laminate. Further, the molded body was cured at 120 ° C for 1 minute. The evaluation results of the following items (1) to (3) are shown in Table 12 for the molded body of the resin laminate.
目視觀察成形體之硬化膜面的外觀,對異物及斑點圖案、裂痕加以確認,將未確認到該等者記為「○」,將確認到該等者記為「×」。The appearance of the cured film surface of the molded body was visually observed, and the foreign matter, the speckle pattern, and the crack were confirmed, and those who did not confirm the number were marked as "○", and those who confirmed it were referred to as "x".
使用鋼絲絨#0000(荷重為4.9N)往復10次後,藉由目視來評價表面之受損情況。將完全未受損者記為「1」,將稍許受損者記為「2」,將經摩擦之部位的一半以上之面受損者記為「3」。After reciprocating 10 times using steel wool #0000 (load 4.9 N), the damage of the surface was evaluated by visual observation. Those who are completely undamaged are marked as "1", those who are slightly damaged are marked as "2", and those who have suffered damage to more than half of the parts that are rubbed are marked as "3".
依照JIS K 5400,利用剃刀之刃將成形體之硬化膜面以2mm間隔切入縱橫各11條之切縫而形成100個網格,用指腹使市售之玻璃紙膠帶(「CT-24(寬度為24mm)」,Nichiban股份有限公司製造)與成形體之硬化膜面充分密著後,以90°之角度向近前方向迅速剝離,硬化膜未自基材上剝離而殘存之網格數(X)以X/100表示,以對硬化膜之密著性進行評價。According to JIS K 5400, the cured film surface of the molded body was cut into the slits of 11 vertical and horizontal directions at intervals of 2 mm by a razor blade to form 100 meshes, and a commercially available cellophane tape was used with a finger pad ("CT-24 (width) 24mm)", manufactured by Nichiban Co., Ltd.), after being sufficiently adhered to the cured film surface of the molded body, it is quickly peeled off at an angle of 90° in the immediate direction, and the cured film is not peeled off from the substrate and the number of meshes remaining (X ) is expressed by X/100, and the adhesion of the cured film is evaluated.
以與實施例36同樣之方法製造成形體。成形用聚碳酸酯片係依照表6中所示之預硬化溫度、預硬化時間、後硬化溫度及後硬化時間而製作。將評價結果示於表12。A molded body was produced in the same manner as in Example 36. The polycarbonate sheet for molding was produced in accordance with the pre-hardening temperature, the pre-hardening time, the post-hardening temperature, and the post-hardening time shown in Table 6. The evaluation results are shown in Table 12.
將實施例1之塗布液以膜厚達到2~3μm之方式塗布於厚度為0.3mm之聚丙烯(PP)片[日本聚丙烯(Japan Polypropylene)股份有限公司製造,商品名:Wintec]上,於20℃下使其乾燥240分鐘作為預硬化,製作成形用聚丙烯片。將所製作之成形用片進行真空成形,其後設置於射出成形模具中,以樹脂溫度為270℃、樹脂壓力為40MPa之條件將包含聚丙烯之射出成形樹脂[Prime Polymer股份有限公司製造,商品名:Prime Polypro]射出至未形成預硬化膜之面上,藉此製造樹脂積層體之成形體。進而,使成形體於120℃下進行30秒後硬化。將評價結果示於表12。The coating liquid of Example 1 was applied to a polypropylene (PP) sheet (manufactured by Japan Polypropylene Co., Ltd., trade name: Wintec) having a thickness of 0.3 mm so as to have a film thickness of 2 to 3 μm. The film was dried by pre-curing at 20 ° C for 240 minutes to prepare a polypropylene sheet for molding. The formed sheet for forming was vacuum-molded, and then placed in an injection molding die, and an injection molding resin containing polypropylene was produced under the conditions of a resin temperature of 270 ° C and a resin pressure of 40 MPa. [Products manufactured by Prime Polymer Co., Ltd. Name: Prime Polypro] is injected onto the surface on which the pre-hardened film is not formed, thereby producing a molded body of a resin laminate. Further, the molded body was cured at 120 ° C for 30 seconds. The evaluation results are shown in Table 12.
以與實施例40同樣之方法製造成形體。成形用聚丙烯片係依照表12中所示之預硬化溫度、預硬化時間、後硬化溫度及後硬化化時間而製作。將評價結果示於表12。A molded body was produced in the same manner as in Example 40. The polypropylene sheet for molding was produced in accordance with the pre-hardening temperature, the pre-hardening time, the post-hardening temperature, and the post-hardening time shown in Table 12. The evaluation results are shown in Table 12.
使用比較例1之塗布液,以與實施例36、實施例39、實施例40、實施例43同樣之方法來製造成形體。將評價結果示於表12。A molded body was produced in the same manner as in Example 36, Example 39, Example 40, and Example 43 using the coating liquid of Comparative Example 1. The evaluation results are shown in Table 12.
由表12可知,實施例36~43係使用實施例1之塗布液的樹脂積層體之成形體,均於大致所有評價項目中為合格。As is clear from Table 12, Examples 36 to 43 are molded bodies of the resin laminate using the coating liquid of Example 1, and were all qualified in almost all evaluation items.
比較例30~33係使用比較例1之塗布液的樹脂積層體之成形體,膜外觀、密著性良好,但耐擦傷性與實施例36~43者相比較差。In Comparative Examples 30 to 33, the molded article of the resin laminate of the coating liquid of Comparative Example 1 was used, and the film appearance and adhesion were good, but the scratch resistance was inferior to those of Examples 36 to 43.
藉由使用本發明之塗布液,除了儀錶蓋等汽車內部零件、二輪車及三輪車之擋風玻璃、樹脂製車窗(各種車窗)、樹脂製建築材料窗、建築設備用頂、道路透光板(遮音板)、矯正用以外,可展開至太陽眼鏡、運動用眼鏡、安全眼鏡等眼鏡透鏡,電漿或液晶、有機EL等之顯示器,光碟、行動電話零件、觸摸面板、太陽電池等之電子設備零件等,路燈等照明零件、防風板、防護盾用之各種樹脂製材料,尤其是聚碳酸酯製材料;可適宜用作玻璃替代構件。By using the coating liquid of the present invention, in addition to automobile interior parts such as instrument covers, windshields for two-wheeled vehicles and tricycles, resin-made windows (various windows), resin building materials windows, roofs for construction equipment, and road light-transmissive panels (Music panel), for correction, can be deployed to eyeglass lenses such as sunglasses, sports glasses, safety glasses, monitors such as plasma, liquid crystal, and organic EL, and electronic devices such as optical discs, mobile phone parts, touch panels, and solar cells. Various parts of resin materials such as equipment parts, lighting parts such as street lamps, windshields and protective shields, especially polycarbonate materials; can be suitably used as glass substitute members.
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---|---|---|---|---|
TWI839884B (en) * | 2021-10-08 | 2024-04-21 | 南韓商Lg化學股份有限公司 | Cover window for display device of substrate-less type, display device including the same and method for manufacturing thereof |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5370263B2 (en) * | 2010-05-19 | 2013-12-18 | 株式会社オートネットワーク技術研究所 | Vehicle with solar battery |
JP2012127467A (en) * | 2010-12-17 | 2012-07-05 | Nagoya Oil Chem Co Ltd | High-pressure gas container |
WO2012099253A1 (en) * | 2011-01-20 | 2012-07-26 | 日産化学工業株式会社 | Coating composition for touch panels, coating film, and touch panel |
KR101249782B1 (en) * | 2011-03-04 | 2013-04-03 | 대주나노솔라주식회사 | Heat-curable dip-coating composition |
JP5823141B2 (en) | 2011-03-09 | 2015-11-25 | 株式会社Adeka | Method for producing zinc oxide film |
JP5889561B2 (en) * | 2011-07-15 | 2016-03-22 | 日本パーカライジング株式会社 | Water-based metal surface treatment agent and metal material with surface coating |
TWI418472B (en) * | 2011-08-08 | 2013-12-11 | Prior Company Ltd | Decoration film, decorated molding article and method for fabricating decorated molding article |
DE102012200969A1 (en) * | 2012-01-24 | 2013-07-25 | BSH Bosch und Siemens Hausgeräte GmbH | Component for a household appliance |
JP5964202B2 (en) * | 2012-10-24 | 2016-08-03 | 出光興産株式会社 | Coating composition |
WO2014119907A1 (en) * | 2013-01-31 | 2014-08-07 | Kolon Industries, Inc. | Silicone resin and method of preparing the same |
JP6080071B2 (en) * | 2013-03-11 | 2017-02-15 | パナソニックIpマネジメント株式会社 | Coating agent composition for metal painting |
JP6080072B2 (en) * | 2013-03-11 | 2017-02-15 | パナソニックIpマネジメント株式会社 | Coating agent composition for metal painting |
CN103264566B (en) * | 2013-05-09 | 2015-08-19 | 无锡市中星工业胶带有限公司 | A kind of heat resistant fire-proof plate BOPET diaphragm |
JP7117070B2 (en) * | 2014-02-18 | 2022-08-12 | 日東電工株式会社 | Laminate and image display device |
KR102367063B1 (en) * | 2015-06-24 | 2022-02-24 | 동우 화인켐 주식회사 | Hard Coating Composition and Hard Coating Film Using the Same |
US10428198B2 (en) | 2016-01-27 | 2019-10-01 | International Business Machines Corporation | Ultraviolet light absorbing matrix-modified light stabilizing silica particles |
US20220260911A1 (en) * | 2019-09-04 | 2022-08-18 | Samsung Sdi Co., Ltd. | Curable resin composition, cured film formed therefrom, and electronic device having cured film |
EP4349925A1 (en) | 2022-10-06 | 2024-04-10 | ETA SA Manufacture Horlogère Suisse | Method for producing an article comprising a coloured abrasion resistant coating, and article comprising such a coating |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006088615A (en) * | 2004-09-27 | 2006-04-06 | Fuji Photo Film Co Ltd | Lamination type gas barrier film |
WO2007099784A1 (en) * | 2006-02-24 | 2007-09-07 | Idemitsu Kosan Co., Ltd. | Coating composition, hardened film and resin laminate |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5829835A (en) | 1981-08-14 | 1983-02-22 | Asahi Glass Co Ltd | Method for forming inorganic film on surface of transparent plastic substrate |
US4842941A (en) | 1987-04-06 | 1989-06-27 | General Electric Company | Method for forming abrasion-resistant polycarbonate articles, and articles of manufacture produced thereby |
JPH06347606A (en) * | 1993-06-04 | 1994-12-22 | Asahi Optical Co Ltd | Production of dyed lens with hard coat |
JP3210513B2 (en) * | 1993-12-28 | 2001-09-17 | 日東電工株式会社 | LCD substrate |
JPH07204581A (en) * | 1994-01-24 | 1995-08-08 | Sekisui Chem Co Ltd | Production of laminated body |
JPH08113760A (en) * | 1994-10-14 | 1996-05-07 | Seiko Epson Corp | Coating composition |
JP3567945B2 (en) * | 1995-05-17 | 2004-09-22 | 三菱瓦斯化学株式会社 | Polycarbonate molding and method for producing the same |
EP0877068A3 (en) | 1997-05-05 | 2000-01-12 | General Electric Company | A primerless silicone hardcoat composition for plastic substrates, and related articles |
JP4401547B2 (en) * | 2000-08-11 | 2010-01-20 | 帝人化成株式会社 | Polycarbonate resin laminate |
JP3926117B2 (en) * | 2001-07-17 | 2007-06-06 | リンテック株式会社 | Hard coat film |
DE10215941A1 (en) * | 2002-04-11 | 2003-10-23 | Bayer Ag | Binder containing inorganic UV absorbers |
JP2004024967A (en) * | 2002-06-24 | 2004-01-29 | Nitto Denko Corp | Production method of coated sheet, production method of antireflection sheet, antireflection sheet, optical element, and image displaying device |
US7354650B2 (en) * | 2004-05-28 | 2008-04-08 | Ppg Industries Ohio, Inc. | Multi-layer coatings with an inorganic oxide network containing layer and methods for their application |
DE602005017638D1 (en) | 2004-08-26 | 2009-12-24 | Idemitsu Kosan Co | COATING COMPOSITION AND RESIN LAYER BODY |
JP2006077075A (en) | 2004-09-08 | 2006-03-23 | Sumitomo Metal Mining Co Ltd | Resin composition, transparent molded resin article for ultraviolet-shielding and transparent resin laminate for ultraviolet-shielding |
JP2007136800A (en) * | 2005-11-17 | 2007-06-07 | Fujifilm Corp | Gas-barrier laminated film and image display element using the same |
JP4961738B2 (en) * | 2005-12-21 | 2012-06-27 | 凸版印刷株式会社 | Conductive laminate and display |
JP5074053B2 (en) * | 2007-02-15 | 2012-11-14 | 出光興産株式会社 | Resin laminate and method for producing the same |
-
2009
- 2009-07-02 WO PCT/JP2009/062096 patent/WO2010001949A1/en active Application Filing
- 2009-07-02 TW TW098122441A patent/TWI462979B/en not_active IP Right Cessation
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006088615A (en) * | 2004-09-27 | 2006-04-06 | Fuji Photo Film Co Ltd | Lamination type gas barrier film |
WO2007099784A1 (en) * | 2006-02-24 | 2007-09-07 | Idemitsu Kosan Co., Ltd. | Coating composition, hardened film and resin laminate |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI839884B (en) * | 2021-10-08 | 2024-04-21 | 南韓商Lg化學股份有限公司 | Cover window for display device of substrate-less type, display device including the same and method for manufacturing thereof |
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