TWI461856B - With a precise alignment of the tilt exposure mechanism - Google Patents

Description

Precisely aligned tilt exposure mechanism

The present invention relates to a tilt exposure mechanism, and more particularly to a tilt exposure mechanism with precise alignment.

In the exposure process of microsystem manufacturing technology, the angle of the microstructure is limited by the refractive index of the material or medium, and the control of the angle is susceptible to the process parameters and it is difficult to control its accuracy, and vertical and tilt cannot be completed at the same time. Two exposure methods.

Since tilt exposure technology has been demonstrated, many micro-elements can be developed, such as micro-mirrors, germanium and optical waveguide structures required to fabricate 45-degree optical read/write heads for use in optoelectronic technology and bio-wafers. However, the conventional tilting exposure mechanism cannot simultaneously perform precise alignment and tilt exposure.

In the prior patent application, for example, the Patent No. 091105554 of the Republic of China is approved, which discloses a method for producing a tilted scattering reflector by a gray scale exposure method, characterized in that a mask is used, and the pattern of the mask is used. Derived from the gray scale generation scheme, the reticle pattern is vertically divided into a plurality of pattern regions, such that each pattern region has a plurality of micro transparent blocks and micro opaque blocks. And (micro dark block), and causing the change in the total area occupied by the plurality of micro-transparent blocks in each pattern region to have a continuity change characteristic to generate a transmittance profile of each pattern region, thereby The light transmittance change curve is adjusted to produce a desired structure in the photoresist layer of the above-described oblique scattering type reflector.

For example, the Patent No. 087120965 patent of the Republic of China is disclosed, which discloses a "printing plate exposure device using a signal capable of canceling the oblique deformation", which is for carrying a portrait information with a width of a plurality of pixels. A printing plate exposure apparatus which is spirally recorded on the surface of a printing brush plate which is worn on a cylinder, and is characterized in that the printing plate is wound on a cylinder in a substantially cylindrical shape, And a moving mechanism for recording the image information in the strip shape by the light beam and moving the exposure device to the cylinder axis direction by one image band width while the cylinder is rotated once; And a circuit that starts to write the image tape as a starting point, and generates a sawtooth wave-like signal that cancels the oblique deformation in the same cycle as the rotation cycle of the cylinder; and applies such a signal that cancels the oblique deformation. To the aforementioned exposer; while the cylinder rotates one revolution, the light beam is sequentially deflected in a direction opposite to the moving direction of the moving mechanism until the beam shift reaches a width of one portrait band, and for the brush plate No distortion records.

However, the structure of the above patent is relatively complicated and it is impossible to complete both vertical and oblique exposure modes, which is a drawback.

In view of the above disadvantages of the conventional exposure apparatus, the present invention provides a tilting exposure mechanism with precise alignment to improve the above disadvantages.

It is an object of the present invention to provide a tilting exposure mechanism with precise alignment, which has both vertical and oblique exposure modes, and can be incorporated with a compensation index matching material to improve the influence of the refractive index of the medium on the accuracy of the exposure angle. And there are digital computer-type counters to adjust the exposure angle, so that the microstructure angle is more accurate, which is more conducive to micro-process technology.

Another object of the present invention is to provide a tilting exposure mechanism with precise alignment, which can eliminate the need for many optical micro-components to be fabricated in a complicated and expensive manner by precision machining, grinding or injection molding, for the development of integrated technology. It can also eliminate the trouble of manual assembly, making the technology of miniaturization and integrated process integration a big step.

In order to achieve the above object, a tilting exposure mechanism with precise alignment according to the present invention includes: a slot body for carrying the following components; and a reticle mounting device disposed in the slot body having at least a reticle holder and at least one reticle and wafer holder for holding a reticle and a wafer; and an inclined angle rotating stage, which is placed in the slot body and can be combined with the reticle mount For adjusting the tilt angle of the reticle.

The detailed description of the drawings and the preferred embodiments are set forth in the accompanying drawings.

Please refer to FIG. 1 and FIG. 3c together, wherein FIG. 1 is an exploded perspective view of the tilting exposure mechanism with precise alignment in the present case; FIG. 2 is a schematic view showing the combination of the tilting exposure mechanism with precise alignment in the present case; The upper side view of the reticle of the present invention is shown; FIG. 3b is a schematic view of the lower side of the reticle of the present invention; and FIG. 3c is a schematic cross-sectional view of the reticle of the present invention.

As shown in the figure, the present invention has a precisely aligned tilt exposure mechanism comprising: a trough body 10; a reticle mount 20; and a combination of tilt angle rotating stages 30.

The tank body 10 is configured to carry the reticle mount 20 and the tilt angle rotating stage 30 and the like. The tank body 10 is a hollow rectangular parallelepiped and can be made of a metal material.

The reticle 20 is disposed in the cavity 10, and has at least one reticle clamp 21 and at least one reticle and wafer holder 22 for holding a reticle and a wafer (both not shown) ). The reticle 20 has a disk shape, and the upper surface further has at least one handle 23 and a plurality of knobs 24 (as shown in FIG. 3c), wherein the handle 23 can facilitate the light supply cover. With the installation of 20, the knob 24 can be equidistantly disposed on the reticle 20, and each knob 24 has a spring 25 underneath, and the knob 24 can adjust the bullet The value of the spring 25 is K.

As shown in FIGS. 3b and 3c, the number of the reticle clamps 21 is, for example but not limited to, four, and is equidistantly disposed on the lower surface of the reticle mount 20, in the embodiment, four reticle The jig 21 is described as an example, but is not limited thereto. The reticle and the wafer holder 22 are substantially L-shaped, and the number is four, and is equidistantly disposed on the lower surface of the reticle 20, and each reticle and wafer holder 22 is located in each reticle holder. In one embodiment, the four masks and the wafer holder 22 are described as an example, but are not limited thereto.

The tilt angle rotating stage 30 is placed in the slot body 10 and can be coupled with the reticle mount 20 for adjusting the tilt angle of the reticle mount 20.

In operation, the reticle can be fixed by four reticle clamps 21, and then the reticle and the wafer holder 22 are used to fix the wafer under the reticle. After the fixing is completed, the reticle is placed. 20 is fixed in the trough body 10, and finally the stage 30 is rotated at an oblique angle to adjust the exposure angle, so that the microstructure angle is more accurate and the micro-process technology is more favorable.

Please refer to FIG. 4 , which is a schematic exploded view of the tilting angle rotating stage of the present invention. As shown in the figure, the tilting angle rotating stage 30 of the present invention further has: a carrier 31; a main body 32; and a linking body 33.

The carrier 31 is disposed in the slot 10 and has a circular hole 311 for receiving the main body 32. The carrier 31 has a coupling hole 312.

The main body 32 has a rotating disc 321 , a gear 322 and a transmission rod 323 . The gear 322 is located above the rotating disc 321 and is connected to the rotating disc 321 . The driving of the rotating disc 321 can be driven to drive the main body 32 . The transmission rod 323 and the transmission rod 323 can pass through the circular hole 311. Further, the rotating disc 321 further has a handle 324 for the user to operate.

The linkage 33 is disposed on the other side of the carrier 31. The coupling body 33 also has a coupling hole 331 for the transmission rod 323 to be placed and held. The operator can rotate the rotary disk 321 by holding the handle 324. When the rotary disk 321 rotates, the gear 322 and the transmission rod 323 will be driven, and the transmission rod 323 is used to tilt the carrier 31 to the desired position. Angle, in order to achieve the desired angle of the operator.

Please refer to FIG. 5 , which is a schematic diagram of the tilting exposure mechanism with precise alignment in this case further having an angle and horizontal correction display device. As shown, the tilting exposure mechanism of the present invention with precise alignment further has an angle and level correction display device 40.

The angle and level correction display device 40 is disposed on one side wall of the slot body 10, such as but not limited to the left side wall, for displaying the tilt angle of the tilting stage 30, and as the tilt angle The transfer stage 30 is used for horizontal correction display, wherein the angle display device 40 is, for example but not limited to, a light emitting diode (LED) display device or a liquid crystal display device (LCD).

In addition, the precise alignment tilt exposure mechanism of the present invention further has a counter 50 such as, but not limited to, a digital computer type counter that is placed on one of the side walls of the housing 10, such as but not limited to the left side wall. And coupled to the tilt angle rotation stage 30, for precisely adjusting the rotation angle of the tilt angle rotation stage.

Therefore, as can be seen from the above results, the tilting exposure mechanism with precise alignment of the present invention has two vertical and oblique exposure modes, and can be placed with a compensation index matching material to improve the refractive index of the medium to accurately determine the exposure angle. Sexual effects, and a digital computer-type counter to adjust the exposure angle, making the microstructure angle more accurate, more conducive to micro-process technology; in addition, it can eliminate the need for many optical micro-components to use precision machining, grinding or injection molding And expensive production, for the development of integrated technology It can save the trouble of manual assembly, and make the technology of miniaturization and integrated process integration a big step. Therefore, it is indeed more advanced than the conventional tilt exposure mechanism.

The disclosure of the present invention is a preferred embodiment. Any change or modification of the present invention originating from the technical idea of the present invention and being easily inferred by those skilled in the art will not deviate from the scope of patent rights of the present invention.

In summary, this case, regardless of its purpose, means and efficacy, is showing its technical characteristics that are different from the conventional ones, and its first invention is practical and practical, and it is also in compliance with the patent requirements of the invention. Pray for the patents at an early date.

Slot ‧‧10

Photomask ‧ ‧ ‧

Photomask fixture ‧‧21

Mask and wafer fixture ‧‧22

‧‧23

Knob ‧‧‧24

Spring ‧‧25

Rotating stage with tilt angle ‧ ‧ 30

Carrier ‧‧31

Round hole ‧‧ 311

Combined hole ‧‧ 312

Main body ‧‧32

Rotating plate ‧ ‧ 321

Gear ‧‧322

Transmission rod ‧‧‧323

Handle ‧‧ 324

Linkage ‧‧33

Combined hole ‧ ‧ 331

Angle and level correction display device ‧‧40

Counter ‧‧50

FIG. 1 is a schematic view showing an exploded view of the tilting exposure mechanism with precise alignment in the present case.

FIG. 2 is a schematic view showing the combination of the tilting exposure mechanism with precise alignment in the present case.

FIG. 3a is a schematic view showing the upper side of the reticle of the present invention.

Figure 3b is a schematic view showing the underside of the reticle of the present invention.

FIG. 3c is a schematic view showing a cross-sectional view of the reticle of the present invention.

Fig. 4 is a schematic view showing the exploded view of the tilting stage of the tilt angle of the present invention.

FIG. 5 is a schematic view showing the tilting exposure mechanism with precise alignment of the present invention further having an angle and a horizontal correction display device.

Slot ‧‧10

Photomask ‧ ‧ ‧

‧‧23

Knob ‧‧‧24

Rotating stage with tilt angle ‧ ‧ 30

Claims (1)

A tilting exposure mechanism with precise alignment, comprising: a slot body for carrying the following components; a reticle mounting device disposed in the slot body, having at least one reticle holder and at least one reticle And a wafer holder for holding a reticle and a wafer, wherein the reticle is detachable; an inclined angle rotating stage is disposed in the groove and can be combined with the reticle, The reticle is placed in precise alignment and combined with the tilting angle rotating stage, and the exposure angle is adjusted to 5 to 75 degrees; a carrier is placed in the cavity and has a circular hole for accommodating The reticle is provided, and the carrier has a coupling hole; a main body having a rotating disk, a gear and a transmission rod, the gear is located below the rotating disk and connected to the rotating disk, and the rotating disk is acceptable Driven to drive the transmission rod, and the transmission rod can pass through the coupling hole; a linkage body is placed on the other side of the carrier, which also has a coupling hole for the transmission rod to be placed and held; a counter is disposed on one side wall of the slot and coupled to the tilt angle Rotating the stage for precisely adjusting the rotation angle of the tilting stage, wherein the counter is a digital computer type counter.