TWI452422B - Dust-proof film assembly - Google Patents
Dust-proof film assembly Download PDFInfo
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- TWI452422B TWI452422B TW101140616A TW101140616A TWI452422B TW I452422 B TWI452422 B TW I452422B TW 101140616 A TW101140616 A TW 101140616A TW 101140616 A TW101140616 A TW 101140616A TW I452422 B TWI452422 B TW I452422B
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- frame
- pellicle
- resin
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- 239000011347 resin Substances 0.000 claims description 54
- 229920005989 resin Polymers 0.000 claims description 54
- 239000010408 film Substances 0.000 claims description 44
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- 239000010410 layer Substances 0.000 description 7
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- 238000010030 laminating Methods 0.000 description 6
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- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
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- 229920000178 Acrylic resin Polymers 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
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- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 239000004831 Hot glue Substances 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- ZEASXVYVFFXULL-UHFFFAOYSA-N amezinium metilsulfate Chemical compound COS([O-])(=O)=O.COC1=CC(N)=CN=[N+]1C1=CC=CC=C1 ZEASXVYVFFXULL-UHFFFAOYSA-N 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
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- 238000010276 construction Methods 0.000 description 1
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- 229910003460 diamond Inorganic materials 0.000 description 1
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- 229910052742 iron Inorganic materials 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
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- 229920001220 nitrocellulos Polymers 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
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- 239000010453 quartz Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Packaging Frangible Articles (AREA)
- Laminated Bodies (AREA)
Description
本發明是有關於在半導體裝置、印刷基板或液晶顯示器等的製造中作為防塵器使用的防塵薄膜組件所用的的防塵薄膜組件框架、其製造方法以及防塵薄膜組件。The present invention relates to a pellicle frame for use in a pellicle for use as a dustproof device in the manufacture of a semiconductor device, a printed substrate, a liquid crystal display, or the like, a method of manufacturing the same, and a pellicle.
在LSI(Large Scale Integration,大型積體電路)、超LSI等的半導體製造以及液晶顯示器等的製造中,要對半導體晶圓或液晶用原板進行光照射,以製作圖案,此時使用的光遮罩(photomask)以及初縮遮罩(reticle)(以下,簡稱光遮罩)上如有灰塵附著,這樣的灰塵會吸收光或使光彎曲,從而具有以下問題:使轉印的圖案變形,或者使邊緣變得模糊,並且基底變黑等,使尺寸、品質、外觀等受損。In the manufacture of semiconductors such as LSI (Large Scale Integration) and super LSI, and the manufacture of liquid crystal displays, etc., the semiconductor wafer or the liquid crystal original plate is irradiated with light to form a pattern. The photomask and the reticle (hereinafter referred to as the light mask) are attached with dust, and the dust absorbs light or bends the light, thereby having the following problem: deforming the transferred pattern, or The edges are blurred, and the substrate becomes black or the like, which deteriorates the size, quality, appearance, and the like.
由此,這樣的作業通常在無塵室中進行,但是即使如此,也難以使光遮罩總是保持總是清潔,因此,要先在光遮罩表面貼附防塵的防塵薄膜組件,然後再進行曝光。這樣的場合,異物就不會在光遮罩的表面直接附著,而是在防塵薄膜組件上附著。因此,在微影時,只要將焦點對準光遮罩上的圖案上,防塵 薄膜組件上的異物就與為轉印無關了。Thus, such work is usually performed in a clean room, but even then, it is difficult to keep the light mask always clean, and therefore, a dustproof pellicle is attached to the surface of the light mask, and then Exposure. In such a case, the foreign matter does not adhere directly to the surface of the light mask, but adheres to the pellicle. Therefore, in lithography, as long as the focus is on the pattern on the light mask, dustproof The foreign matter on the membrane module is independent of the transfer.
防塵薄膜組件一般將光可以良好地透過的硝基纖維素、乙酸纖維素、或氟樹脂等形成的透明的防塵薄膜貼附或接著於由鋁、不銹鋼、聚乙烯等形成的防塵薄膜組件框架的上端面而形成。進一步,在防塵薄膜件框架的下端面上為了貼附光遮罩,通常設置聚丁烯樹脂、聚乙酸乙烯酯樹脂、丙烯酸樹脂、矽酮樹脂等形成的黏著層,以及以保護黏著層為目的的離型層(separater)。The pellicle film assembly generally attaches a transparent pell film formed of nitrocellulose, cellulose acetate, or fluororesin which is light-transmissive or adheres to a pellicle frame formed of aluminum, stainless steel, polyethylene, or the like. Formed on the upper end surface. Further, in order to attach a light mask to the lower end surface of the pellicle frame, an adhesive layer formed of a polybutene resin, a polyvinyl acetate resin, an acrylic resin, an anthrone resin, or the like is usually provided, and the adhesive layer is protected. The separation layer (separater).
為了使作為薄樹脂的防塵薄膜無鬆弛地被在防塵薄膜組件框架中被支持,以具有適當大小的張力的狀態在防塵薄膜組件框架上接著是必要的。但是,在用以往的材料製成的矩形的防塵薄膜組件中,防塵薄膜被貼附後的防塵薄膜組件框架由於防塵薄膜的張力而會有一些向內側彎曲,防塵薄膜容易鬆弛。這樣的現象在例如印刷基板以及液晶顯示器製造中使用的大型防塵薄膜組件等防塵薄膜組件框架的邊長大者,或者即使是半導體製造用的小型的防塵薄膜組件框架,由於材質以及尺寸上的限制而採用低剛性的框架的防塵薄膜組件中,尤為顯著。In order to allow the pellicle film as a thin resin to be supported in the pellicle frame without slack, it is necessary to have a proper size of tension on the pellicle frame. However, in the rectangular pellicle assembly made of the conventional material, the pellicle frame after the pellicle is attached is bent inward due to the tension of the pellicle, and the pellicle is easily loosened. Such a phenomenon is caused by, for example, a side of a dust-proof film module frame such as a large-sized pellicle film assembly used for manufacturing a printed circuit board or a liquid crystal display, or a small pellicle frame for semiconductor manufacturing, due to material and size limitations. This is especially true in pellicle modules that use a low-rigid frame.
另一方面,在光遮罩中,為了低成本化,要盡量使曝光領域廣闊。由此,若為了使防塵薄膜組件框架向內側的彎曲盡量小而進行小型化,這會產生可利用的曝光領域減少的問題。進一步,期望將彎曲量盡量抑制的同時,在寬度更小的防塵薄膜組件 框架使其內側的可曝光面積變得廣闊,從而減少成本。On the other hand, in the light mask, in order to reduce the cost, it is necessary to make the exposure field as wide as possible. Therefore, in order to miniaturize the bending of the pellicle frame inward as much as possible, there is a problem in that the field of exposure that can be utilized is reduced. Further, it is desirable to suppress the amount of bending as much as possible while the pellicle assembly having a smaller width The frame makes the exposed area inside it wider, thereby reducing costs.
作為解決該防塵薄膜組件框架的彎曲的裝置,例如,專利文獻1中公開了一種防塵薄膜組件框架,其為在框體的至少一對的邊上,中央部為外側凸的圓弧形狀部、其兩側具有外側凹的圓弧形狀部,進一步其外側具有直線形狀部。根據這樣的方法,進行適切的設計,可以將彎曲量控制在一定的值以下。As a device for solving the bending of the pellicle frame, for example, Patent Document 1 discloses a pellicle frame which is a circular arc-shaped portion which is convex at the center portion on at least one pair of sides of the frame body. The both sides have a circular arc-shaped portion that is concave on the outer side, and further has a linear portion on the outer side. According to such a method, an appropriate design can be performed to control the amount of bending below a certain value.
但是,不管哪樣的框寬,只要取得張力平衡,保持框的直線形狀是可能的,但是,如果在想盡量使框寬變窄的場合,即使得到直線形狀,但是剛性會變低,從而會變得難以處理,或用很小的外力,就可以使防塵薄膜發生折皺、鬆弛等問題,不宜於實用,好不容易貼附的防塵薄膜也不能發揮充分的效果。However, regardless of the frame width, it is possible to maintain the linear shape of the frame as long as the tension is balanced. However, if it is desired to narrow the frame width as much as possible, even if a linear shape is obtained, the rigidity becomes low and the It is difficult to handle, or with a small external force, the pellicle film can be wrinkled, slackened, etc., which is not suitable for practical use, and the dust-proof film that is attached easily cannot exert sufficient effects.
框高由曝光機的光學設計來決定。所以使框寬變窄並且使防塵薄膜組件框架的剛性變高的方法,為使用彈性系數高的材料。作為這樣的方法,例如,在專利文獻2中,記載了在鋁合金的框體上,埋入含有比框體的彈性系數大的不銹鋼的鐵以及鈦的防塵薄膜組件框架。但是,鋼鐵、不銹鋼等的鐵類合金的重量極重,另外,鈦合金的加工性(被削性)非常差,所以在實際中難以採用。作為它們的替代物,現在,在使用航空領域等中被加以利用且作為高剛性材料而為人所知的碳纖維複合材料的情況下,其相較上述各種金屬材料而大幅提高剛性,且重量以及加工性也沒有問題,因此受到期待。但是,使用碳纖維,有碳纖維會發生 灰塵等的擔心。The height of the frame is determined by the optical design of the exposure machine. Therefore, a method of narrowing the frame width and increasing the rigidity of the pellicle frame is to use a material having a high modulus of elasticity. In such a method, for example, Patent Document 2 discloses that a dust-proof membrane module frame containing iron and titanium of stainless steel having a larger modulus of elasticity than that of the frame is embedded in the frame of the aluminum alloy. However, iron alloys such as steel and stainless steel are extremely heavy, and the workability (cuttability) of the titanium alloy is extremely poor, so that it is difficult to use in practice. As an alternative to these, in the case of a carbon fiber composite material which is used as a highly rigid material and which is used as a highly rigid material, it is greatly improved in rigidity and weight as compared with the above various metal materials. There is no problem with the processability, so it is expected. However, with carbon fiber, carbon fiber will occur Worries such as dust.
進一步,在使用碳纖維複合材料的場合、原料成本、加工成本與一般所使用的鋁合金等比較,其成本會顯著上升。由於這樣的問題,碳纖維複合材料至今為止沒有被採用為防塵薄膜組件框架。Further, when a carbon fiber composite material is used, the raw material cost and the processing cost are significantly higher than those of an aluminum alloy generally used. Due to such problems, carbon fiber composite materials have not been adopted as a pellicle frame.
[專利文獻1]日本特開2006-56544號公報[Patent Document 1] JP-A-2006-56544
[專利文獻2]日本特開2006-284927號公報[Patent Document 2] Japanese Laid-Open Patent Publication No. 2006-284927
本發明就是要解決所述課題,利用在碳纖維中浸漬樹脂而成的複合材料,得到一種輕量化、使由於防塵薄膜的張力造成的彎曲以及在處理中發生的彎曲變小的高剛性且原料成本以及生產成本減低的防塵薄膜組件框架、以及其製造方法。另外在該防塵薄膜組件框架上將防塵薄膜貼附,可以得到一種具有大的曝光面積,原料成本以及生產成本減低的防塵薄膜組件。The present invention is to solve the above problems, and a composite material obtained by impregnating a resin with carbon fibers is used to obtain a high rigidity and a high raw material cost which is lightweight, bends due to the tension of the pellicle film, and has a small bending during processing. And a pellicle frame having a reduced production cost, and a method of manufacturing the same. Further, by attaching a dust-proof film to the pellicle frame, a pellicle having a large exposure area, reduced material cost, and reduced production cost can be obtained.
本發明的目的可以通過以下技術方案來達成:The object of the present invention can be achieved by the following technical solutions:
1.一種防塵薄膜組件框架,其為防塵薄膜繃緊覆蓋的多邊形的框體,其特徵在於:將碳纖維在形成該框架的各邊的長方向配向的被浸漬有樹脂的複合材料,沿多邊形進行纏繞疊層,使所述樹脂固化而成為一體。A pellicle frame which is a polygonal frame which is tightly covered by a pellicle film, characterized in that a carbon fiber is impregnated with a resin-impregnated composite material which forms a longitudinal direction of each side of the frame, along a polygon. The laminate is wound to cure the resin to be integrated.
2.如上述1所述的防塵薄膜組件框架,其中所述複合材料為連續的單一材料的纏繞疊層而成,或由多個至少纏繞1周的多個材料進行疊層而成。2. The pellicle frame according to the above 1, wherein the composite material is formed by winding a continuous single material or by laminating a plurality of materials which are wound at least for one week.
3.如上述1或2所述的防塵薄膜組件框架,其中所述複合材料為將配向的多根所述碳纖維用所述樹脂浸漬的片狀。3. The pellicle frame according to the above 1 or 2, wherein the composite material is a sheet in which a plurality of the carbon fibers to be aligned are impregnated with the resin.
4.如上述1~3中的任一項所述的防塵薄膜組件框架,其中所述框體的表面被研磨以及/或切削而平滑化。4. The pellicle frame according to any one of the above 1 to 3, wherein the surface of the frame is polished and/or cut to be smoothed.
5.如上述1~4的任一項所述的防塵薄膜組件框架,其中所述框體的表面,用樹脂覆蓋膜覆蓋。5. The pellicle frame according to any one of the above 1 to 4, wherein the surface of the frame is covered with a resin cover film.
6.一種防塵薄膜組件框架的製造方法,其特徵在於包括:基材形成步驟:在比期望的內尺寸小的呈多邊形的框體的芯材上,用具有比所述框體的所期望的高更大的寬度以及至少具有纏繞所述框體的一周的長度,在所述長度方向上配向的被樹脂浸漬了的碳纖維的片狀的複合材料,進行纏繞,進行比所述框體的所期望的外尺寸還要大地疊層,將所述樹脂加熱固化,將其作為基材;以及框體形成步驟:將所述基材進行切削加工,使其形成具有所期望的內尺寸、外尺寸以及高度的框體。A method of manufacturing a pellicle frame, comprising: a substrate forming step of: having a polygonal core frame body having a smaller than a desired inner dimension, having a desired ratio than the frame a sheet having a larger width and at least one circumference of the frame, and a sheet-like composite material of the resin-impregnated carbon fibers aligned in the longitudinal direction is entangled to be larger than the frame The desired outer dimension is further laminated, the resin is heat-cured and used as a substrate, and a frame forming step is performed by cutting the substrate to have a desired inner and outer dimensions. And a high degree of frame.
7.如上述6所述的防塵薄膜組件框架的製造方法,其具有所述基材形成步驟: 在具有在比所述框體的所期望的內尺寸小的芯材上,將具有比所述框體的所期望的高度的至少2倍的寬度以及至少具有所述框體的一周的長度的,在所述長度方向上配向的用樹脂浸漬的碳纖維的片狀複合材料進行纏繞,將得到的比所述框體的外尺寸大的疊層體進行加熱使樹脂固化,然後切削加工對與所述框體的邊平行的方向上進行分割,得到多個所述基材。7. The method of manufacturing a pellicle frame according to the above 6, comprising the substrate forming step: Having a core material that is smaller than a desired inner dimension of the frame body will have a width that is at least 2 times greater than a desired height of the frame body and at least a length of one week of the frame body a sheet-like composite material of resin-impregnated carbon fibers aligned in the longitudinal direction is wound, and the obtained laminate having a larger outer dimension than the frame body is heated to cure the resin, and then the cutting process is performed. The sides of the frame are divided in the direction parallel to each other to obtain a plurality of the substrates.
8.如上述5~7的任一項所述的防塵薄膜組件框架的製造方法,其具有在所述框體的表面上形成樹脂覆蓋膜的所述框體形成步驟。8. The method of manufacturing a pellicle frame according to any one of the items 5 to 7, further comprising the frame forming step of forming a resin coating film on a surface of the frame.
9.一種防塵薄膜組件,其特徵在於:在上述1~5的任一項所述的防塵薄膜組件框架上,將防塵薄膜繃緊貼附。A pellicle according to any one of the above 1 to 5, wherein the pellicle is stretched and attached.
本發明的防塵薄膜組件框架由在碳纖維中使樹脂浸漬而得到的複合材料形成,由此在具有輕量的同時,具有高的剛性。這樣的防塵薄膜組件框架,由於具有該構造的複合材料的碳纖維是沿著各邊的長方向配向,所以纖維的機械的強度可以發揮到最大限度,對於防塵薄膜的張力造成的彎曲以及處理中發生的彎曲,顯示出極高的剛性。另外,在碳纖維的配向的優點之上,由於沒有纖維的接縫或很少有接縫,所以可以在防止由接縫產生的強度的變低,並且在得到高剛性的同時,可以防止斷裂的發生、具有難以傳播的特性、以及高的可靠性。由此,與以往使用的材 料的防塵薄膜組件框架相比,各邊的寬度可以變窄,從而可以得到大的內側曝光面積。The pellicle frame of the present invention is formed of a composite material obtained by impregnating a resin with carbon fibers, thereby having high rigidity while having a light weight. In such a pellicle frame, since the carbon fiber of the composite material having the structure is aligned along the longitudinal direction of each side, the mechanical strength of the fiber can be maximized, bending due to the tension of the pell film, and occurrence during processing. The bending shows extremely high rigidity. In addition, on the advantage of the alignment of the carbon fibers, since there is no seam of the fibers or few seams, it is possible to prevent the strength generated by the seam from becoming low, and to prevent the fracture while obtaining high rigidity. Occurs, has characteristics that are difficult to propagate, and high reliability. Thus, the materials used in the past The width of each side can be narrowed compared to the dust-proof film assembly frame of the material, so that a large inner exposed area can be obtained.
進一步,本發明的防塵薄膜組件框架可以通過對其表面進行研磨以及切削等的加工使其平滑化,尺寸精度變高。進一步,該表面由於被樹脂覆蓋,對防塵薄膜組件框架的加工不會使碳纖維在切削面上露出,由此,在防止碳纖維的脫落以及灰塵發生的同時,可以防止由紫外線造成的老化。Further, the pellicle frame of the present invention can be smoothed by grinding, cutting, or the like on the surface thereof, and the dimensional accuracy is improved. Further, since the surface is covered with the resin, the processing of the pellicle frame does not expose the carbon fibers on the cutting surface, thereby preventing aging caused by ultraviolet rays while preventing the carbon fibers from falling off and dust.
根據本發明的防塵薄膜組件框架的製造方法,可以從大一圈的基材,用機械切削加工得到具有所期望的尺寸的防塵薄膜組件框架,由此可以在將表面的缺陷除去的同時,製得尺寸精度高,可以與通常的金屬加工品匹敵的防塵薄膜組件框架。According to the method for manufacturing a pellicle frame of the present invention, a pellicle frame having a desired size can be obtained by mechanical cutting from a large-sized substrate, whereby the surface defects can be removed. A high-precision, dust-proof film assembly frame that rivals common metal products.
根據本發明的防塵薄膜組件框架的製造方法,一次可以製得可以形成多個防塵薄膜組件框架的基材,這在用最小必要量即可形成防塵薄膜組件框架之上,可以使基材的加工量大幅度變少,這與一個一個地加工生產相比,會大幅度的降低原料成本以及生產成本。According to the method for manufacturing a pellicle frame of the present invention, a substrate on which a plurality of pellicle frame can be formed can be produced at a time, which can form a pellicle assembly frame with a minimum necessary amount, and can process the substrate. The amount is greatly reduced, which greatly reduces raw material costs and production costs compared to one-to-one processing.
本發明的防塵薄膜組件,可以確保由高剛性的防塵薄膜組件框架而得到的大的曝光面積,由此可以減少半導體以及液晶表示裝置等的製造成本。另外,在使用中沒有的灰塵發生的危險,具有極高的可靠性。The pellicle according to the present invention can secure a large exposure area obtained by a highly rigid pellicle frame, thereby reducing the manufacturing cost of a semiconductor, a liquid crystal display device, and the like. In addition, there is a danger of dust that does not occur during use, and it has extremely high reliability.
1‧‧‧防塵薄膜組件框架1‧‧‧Plastic membrane assembly frame
2‧‧‧通氣孔2‧‧‧vents
3‧‧‧凹孔3‧‧‧ recessed hole
4‧‧‧階差4‧‧ ‧ step
5‧‧‧預浸料5‧‧‧Prepreg
5a~5d‧‧‧預浸料5a~5d‧‧‧Prepreg
6‧‧‧開始纏繞點6‧‧‧Starting the winding point
6a~6d‧‧‧開始纏繞點6a~6d‧‧‧Starting the winding point
7‧‧‧纏繞結束點7‧‧‧ winding end point
7a~7d‧‧‧纏繞結束點7a~7d‧‧‧ winding end point
8a~8d‧‧‧中繼接合部8a~8d‧‧‧Relay joint
9‧‧‧樹脂覆蓋膜9‧‧‧ resin cover film
10‧‧‧基材10‧‧‧Substrate
10a~10c‧‧‧基材10a~10c‧‧‧Substrate
12‧‧‧芯材12‧‧‧ core material
13‧‧‧階差13‧‧ ‧ step
15‧‧‧碳纖維15‧‧‧carbon fiber
16‧‧‧砂輪機16‧‧‧ Grinder
20‧‧‧防塵薄膜組件20‧‧‧Pneumatic film assembly
21‧‧‧貼設面21‧‧‧ affixed
22‧‧‧防塵薄膜22‧‧‧Dust film
23‧‧‧遮罩黏著層23‧‧‧ Mask adhesive layer
24‧‧‧離型層24‧‧‧ release layer
25‧‧‧過濾器25‧‧‧Filter
P‧‧‧碳纖維的配向方向P‧‧‧ alignment direction of carbon fiber
圖1為適用本發明的防塵薄膜組件框架的斜視圖。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a perspective view showing a frame of a pellicle according to the present invention.
圖2(a)及圖2(b)為適用本發明的防塵薄膜組件框架的A-A線截面圖、B-B線截面圖以及其一部分放大截面圖。2(a) and 2(b) are a cross-sectional view taken along line A-A, a cross-sectional view taken along line B-B, and a partially enlarged cross-sectional view of the pellicle frame according to the present invention.
圖3(a)及圖3(b)為適用本發明的防塵薄膜組件框架的平面示意圖。3(a) and 3(b) are schematic plan views of a pellicle frame to which the present invention is applied.
圖4(a)及圖4(b)為適用本發明的另一個防塵薄膜組件框架的平面示意圖。4(a) and 4(b) are plan views showing another pellicle frame to which the present invention is applied.
圖5為表示對適用本發明的防塵薄膜組件框架的基材進行切削加工,得到期望的防塵薄膜組件框架的示意圖。Fig. 5 is a schematic view showing the cutting of a substrate to which the pellicle frame of the present invention is applied, to obtain a desired pellicle frame.
圖6(a)~圖6(d)為適用本發明的防塵薄膜組件框架的製造方法的概要圖。6(a) to 6(d) are schematic views showing a method of manufacturing a pellicle frame according to the present invention.
圖7(a)~圖7(d)為適用本發明的防塵薄膜組件框架的另一個製造方法的概要圖。7(a) to 7(d) are schematic views showing another manufacturing method of the pellicle frame to which the present invention is applied.
圖8為適用本發明的防塵薄膜組件的斜視圖。Figure 8 is a perspective view of a pellicle assembly to which the present invention is applied.
以下,對本發明的實施方式進行詳細說明,但是本發明的範圍並不受它們的限制。Hereinafter, embodiments of the present invention will be described in detail, but the scope of the present invention is not limited thereto.
對本發明的防塵薄膜組件框架,參照圖1進行詳細說明。The pellicle frame of the present invention will be described in detail with reference to Fig. 1 .
防塵薄膜組件框架1為由長邊和短邊形成的四邊形狀的框體,其4個角部內壁側以及外壁側都為圓弧狀。在長邊和短邊的各邊的壁面的規定的場所,分別設有使防塵薄膜組件框架1的 內側和外側進行通氣的通氣孔2以及處理時使用的凹孔3。另外,在設有遮罩黏著層的下端面,具有用來使遮罩黏著層形成的遮罩黏著層用階差4。但是,這樣的遮罩黏著層用階差4並非必須是階差。進一步,還可以根據必要進行稜部切平面或可以設置其他的階差、凹坑或溝等。The pellicle frame 1 is a rectangular frame formed of a long side and a short side, and has four arcuate inner wall sides and outer wall sides in an arc shape. In the predetermined places on the wall surfaces of the long sides and the short sides, the pellicle frame 1 is separately provided. The vent hole 2 that ventilates the inside and the outside and the recessed hole 3 that is used for the treatment. Further, on the lower end surface provided with the mask adhesive layer, there is a step 4 for the mask adhesive layer for forming the mask adhesive layer. However, such a mask adhesive layer with a step difference 4 does not have to be a step. Further, it is also possible to carry out the rib cutting plane as necessary or to provide other steps, pits or grooves.
這樣的防塵薄膜組件框架1為浸漬了樹脂的碳纖維片複合材料(以下,稱預浸料)構成的,這樣的預浸料5邊沿四邊形狀的芯材進行纏繞、疊層,然後使預浸料5中的樹脂固化而形成一體而成的。這樣的片狀的預浸料5,如圖1所示的防塵薄膜組件框架1的通過通氣孔2的A-A線截面圖的圖2(a)、以及圖1的B-B線截面圖以及該截面圖中的圓圈中的預浸料5的部分擴大截面圖的圖2(b)表示的那樣,各邊分別為層狀的預浸料5a、5b、5c、…的無間隙的疊層體。這樣的預浸料5疊層形成的防塵薄膜組件框架1的全部表面被樹脂覆蓋膜9覆蓋。Such a pellicle frame 1 is composed of a resin-impregnated carbon fiber sheet composite (hereinafter referred to as a prepreg), and such a prepreg 5 is wound and laminated along a quadrangular core material, and then the prepreg is applied. The resin in 5 is solidified to form an integral body. Such a sheet-like prepreg 5, FIG. 2(a) of the pellicle frame 1 of the pellicle frame 1 shown in FIG. 1 through the vent hole 2, and a cross-sectional view taken along line BB of FIG. In the partially enlarged cross-sectional view of the prepreg 5 in the middle circle, as shown in Fig. 2(b), each side is a gap-free laminate of layered prepregs 5a, 5b, 5c, .... The entire surface of the pellicle frame 1 formed by laminating such prepregs 5 is covered with the resin cover film 9.
預浸料5為由多根的長纖維狀的碳纖維15構成。該纖維方向僅在一個方向上配向,其為樹脂浸入的片狀的複合材料。該碳纖維15在框體的各邊的長的方向上,分別相互平行,在4邊的內壁以及外壁上以相同的方向形成。這樣的預浸料5中浸入的樹脂可以列舉環氧樹脂等。其中,優選在防塵薄膜組件框架1的表面的樹脂覆蓋膜9在形成時,可以加熱的、具有使發生的氣體量減低、以及具有高耐熱性之物。另外,預浸料5至少其連續長 度為防塵薄膜組件框架1的1周。優選片狀的長的預浸料5,從開始纏繞到纏繞結束,作為一條連續的單一材料一邊進行纏繞,一邊形成防塵薄膜組件框架1。The prepreg 5 is composed of a plurality of long-fiber carbon fibers 15. The fiber direction is aligned in only one direction, which is a sheet-like composite material in which the resin is immersed. The carbon fibers 15 are parallel to each other in the longitudinal direction of each side of the frame, and are formed in the same direction on the inner walls and the outer walls of the four sides. Examples of the resin immersed in such a prepreg 5 include an epoxy resin and the like. Among them, it is preferable that the resin coating film 9 on the surface of the pellicle frame 1 can be heated, have a reduced amount of gas generated, and have high heat resistance. In addition, the prepreg 5 is at least continuous The degree is one week of the pellicle frame 1 . It is preferable that the sheet-shaped long prepreg 5 is wound from the start to the end of winding, and is wound as a continuous single material to form the pellicle frame 1 .
防塵薄膜組件框架1,如圖3(a)及圖3(b)表示的那樣,優選用連續的一枚的片狀的預浸料5沿防塵薄膜組件框架1的邊進行連續地纏繞而疊層的構造。圖3(a)及圖3(b)中,用預浸料5的優選纏繞法形成的防塵薄膜組件框架1的平面示意圖用圖3(a)來表示,所述纏繞方法由圖3(b)來進行表示。圖3(a)中,開始纏繞點6以及纏繞結束點7有階差,但是實質上預浸料5為極薄的片狀,該階差無須注意。As shown in Figs. 3(a) and 3(b), the pellicle frame 1 is preferably continuously wound around a side of the pellicle frame 1 with a continuous sheet-like prepreg 5. The construction of the layer. 3(a) and 3(b), a plan view of the pellicle frame 1 formed by the preferred winding method of the prepreg 5 is shown in Fig. 3(a), and the winding method is shown in Fig. 3(b). ) to indicate. In Fig. 3(a), the starting winding point 6 and the winding end point 7 have a step difference, but substantially the prepreg 5 is an extremely thin sheet shape, and this step is not necessary to be noted.
用一枚片狀的預浸料5從纏繞開始點6到纏繞結束點7中間無接縫,由此由於預浸料5的接縫而造成的強度變低就可以被防止,所以有極高可靠性,同時,由於為連續作業,可以效率提高、成本降低。但是,預浸料5的長度不是無限的,是否要製成無接縫的防塵薄膜組件框架1,決定於製作的防塵薄膜組件框架1的大小以及疊層厚度,因此途中有幾處接縫也可以。例如,將具有可以多圈纏繞的長度的預浸料5進行纏繞疊層,在其纏繞結束點7,用另一個可以多圈纏繞的長的預浸料5的開始纏繞點6,從而可以進行無間隙地纏繞,將其疊層,形成防塵薄膜組件框架1。另外也可以用具有纏繞1圈的長度的預浸料5進行纏繞,用多個材料疊層形成防塵薄膜組件框架1。With a sheet-like prepreg 5, there is no seam from the winding start point 6 to the winding end point 7, whereby the strength due to the seam of the prepreg 5 can be prevented, so that it is extremely high. Reliability, at the same time, because of continuous operation, efficiency can be improved and cost can be reduced. However, the length of the prepreg 5 is not infinite, and whether or not the seamless pellicle frame 1 is to be formed depends on the size of the pellicle frame 1 to be produced and the thickness of the laminate, so that there are several seams on the way. can. For example, a prepreg 5 having a length that can be wound in multiple turns is wound and laminated, and at the winding end point 7, the winding point 6 is started with another long prepreg 5 which can be wound in a plurality of turns, thereby making it possible to carry out Winding without gaps, laminating them to form the pellicle frame 1. Alternatively, the prepreg 5 having a length of one turn may be wound, and a plurality of materials may be laminated to form the pellicle frame 1.
用具有1周纏繞的長度的預浸料5進行製造的場合,例如,如圖4(a)及圖4(b)表示的那樣,具有防塵薄膜組件框架1的1周的長度的預浸料為5a、5b、5c、…,每一周的開始纏繞點為6a、6b、6c、…,纏繞結束點為7a、7b、7c、…以及中繼接合部為8a、8b、8c、…,進行分別沒有間隙地疊層,使防塵薄膜組件框架1形成。圖4(a)及圖4(b)中,纏繞一周的預浸料5接合疊層形成的防塵薄膜組件框架1的平面示意圖用圖4(a)表示,該纏繞方法用圖4(b)來表示。When the prepreg 5 having a length of one winding is used for the production, for example, as shown in Figs. 4(a) and 4(b), the prepreg having the length of one week of the pellicle frame 1 is used. 5a, 5b, 5c, ..., the starting winding points of each week are 6a, 6b, 6c, ..., the winding end points are 7a, 7b, 7c, ... and the relay joints are 8a, 8b, 8c, ..., The pellicle frame 1 is formed by laminating without gaps, respectively. 4(a) and 4(b), a plan view of the pellicle frame 1 formed by laminating a prepreg 5 which is wound one turn is shown in Fig. 4(a), and the winding method is shown in Fig. 4(b). To represent.
預浸料5的接縫的接合部8a、8b、8c、…,優選為不出現在防塵薄膜組件框架1的角部。進一步,優選各層的接合部8a、8b、8c、…不重疊。由此,接合部8a、8b、8c、…的影響幾乎可以忽略不計,這樣就可以防止由於接合部8a、8b、8c、…產生的強度的變低。The joint portions 8a, 8b, 8c, ... of the seam of the prepreg 5 preferably do not appear at the corners of the pellicle frame 1. Further, it is preferable that the joint portions 8a, 8b, 8c, ... of the respective layers do not overlap. Thereby, the influence of the joint portions 8a, 8b, 8c, ... is almost negligible, so that the strength due to the joint portions 8a, 8b, 8c, ... can be prevented from becoming low.
對如此將預浸料5進行纏繞疊層而形成的防塵薄膜組件框架1的上端面以及下端面的預浸料端面以及切削設置必要的孔等的防塵薄膜組件框架1的表面,為了防止斷裂的碳纖維的露出以及浸入了碳纖維片的環氧樹脂等的樹脂在曝光時由於紫外線而造成的老化,優選用樹脂覆蓋膜9進行覆蓋。防塵薄膜組件框架1的表面完全被樹脂覆蓋膜9覆蓋,就可以防止由於碳纖維造成的灰塵的發生。The surface of the pellicle frame 1 of the upper end surface and the lower end surface of the pellicle frame 1 which is formed by winding the prepreg 5 in this manner, and the hole of the pellicle assembly frame 1 for cutting the necessary holes, etc., in order to prevent breakage The resin such as the exposed carbon fiber and the epoxy resin impregnated with the carbon fiber sheet is aged by ultraviolet rays during exposure, and is preferably covered with the resin cover film 9. The surface of the pellicle frame 1 is completely covered by the resin cover film 9, and the occurrence of dust due to carbon fibers can be prevented.
樹脂覆蓋膜9優選其材質在曝光用的紫外線中難以老化 之物。樹脂覆蓋膜9的色調,由於基底材料預浸料5為黑色,所以可以採用黑色以外的暗色(例如深藍等)以及透明,但是,黑色可以進一步將散亂光減低,所以為特別優選。樹脂覆蓋膜本身的顏色也好,將顏料、碳黑等混入樹脂覆蓋膜也可。作為這樣的樹脂覆蓋膜9,優選為丙烯酸樹脂,更優選為矽酮樹脂,進一步優選為氟樹脂。這樣的樹脂易於形成對紫外線的耐受性高,而且剝離強度高的覆蓋膜。氟樹脂的場合,對紫外線的耐受性特別優良,但是由於紫外線透過率也高,所以優選與混入的顏料等紫外線的透過性低的東西組合使用。另外,同時由於絕緣性高易於帶電,所以優選使用導電性高的東西。The resin cover film 9 is preferably made of a material which is difficult to age in the ultraviolet light for exposure. Things. Since the color tone of the resin cover film 9 is black, the base material prepreg 5 is black, and it is possible to use a dark color other than black (for example, dark blue or the like) and transparency. However, black can further reduce scattered light, which is particularly preferable. The color of the resin coating film itself is also good, and a pigment, carbon black or the like may be mixed into the resin coating film. As such a resin coating film 9, an acrylic resin is preferable, an anthrone resin is more preferable, and a fluororesin is further more preferable. Such a resin tends to form a cover film having high resistance to ultraviolet rays and high peel strength. In the case of a fluororesin, it is particularly excellent in resistance to ultraviolet rays. However, since the ultraviolet ray transmittance is also high, it is preferably used in combination with a low ultraviolet ray permeability such as a pigment to be mixed. Further, since it is easy to charge due to high insulation, it is preferable to use a material having high conductivity.
防塵薄膜組件框架1為多邊形的框體,其形狀沒有特別的限定,作為具體例,可以列舉角部為圓形的四邊形,4個角部全部為直角的矩形也可,與此類似的其他的形狀,例如,長方形、正方形、八角形等也可。The pellicle frame 1 is a polygonal frame, and its shape is not particularly limited. Specific examples include a quadrangular shape in which the corners are circular, and the four corners are all rectangular at right angles, and the like. Shapes, for example, rectangles, squares, octagons, etc. may also be used.
本發明的防塵薄膜組件框架1,作為液晶製造使用的一邊的長為超過500 mm的大型的防塵薄膜組件用,其效果大。但是,作為防塵薄膜組件框架1的對象防塵薄膜組件的大小並沒有限定。本發明的防塵薄膜組件框架1,適用於對尺寸(邊的長度)以及防塵薄膜的張力,以往防塵薄膜組件框架的剛性沒有得到充分確保的全部的防塵薄膜組件。The pellicle frame 1 of the present invention is used as a large pellicle having a length of more than 500 mm on one side for liquid crystal production, and has a large effect. However, the size of the object pellicle assembly as the pellicle frame 1 is not limited. The pellicle frame 1 of the present invention is suitable for all pellicle assemblies in which the rigidity of the pellicle frame is not sufficiently ensured in terms of the size (the length of the side) and the tension of the pellicle film.
作為對於種種的尺寸實用且尺寸精度高的防塵薄膜組 件框架1,優選用預浸料5疊層以及加熱固化了的防塵薄膜組件框架1的基材,得到與所期望的防塵薄膜組件框架1相比,內尺寸小、外尺寸大,進一步高度也高的防塵薄膜組件框架,然後用機械切削加工得到具有所期望的尺寸之物。在圖5,將預浸料5疊層製得比所期望的防塵薄膜組件框架1大一圈的基材10進行切削加工從而得到的防塵薄膜組件框架1的示意圖。基材10中,所期望的防塵薄膜組件框架1用二點以及線段構成的虛線來表示。As a dustproof film set that is practical for various sizes and high in dimensional accuracy The frame 1 is preferably laminated with a prepreg 5 and a base material of the heat-cured pellicle frame 1 which has a smaller inner size and a larger outer size than the desired pellicle frame 1. The high pellicle frame is then machined to obtain the desired size. In Fig. 5, a schematic view of a pellicle frame 1 obtained by laminating a prepreg 5 by a substrate 10 which is one turn larger than a desired pellicle frame 1 is formed. In the substrate 10, a desired pellicle frame 1 is represented by a dotted line composed of two dots and a line segment.
基材10的內尺寸以及外尺寸,要考慮切削餘量來進行決定,但是,優選對製作的防塵薄膜組件框架1單側大0.2 mm~3 mm左右,更優選為大0.5 mm~1 mm。預浸料5的厚度,即使厚的也就是0.2 mm前後,所以設定1 mm的切削餘量,要進行接近5周的纏繞,這樣的切削餘量越少,成本上越有利是明明白白的。但是,加熱固化時有可能出現變形,並且邊長越長,加工誤差也就越會發生,所述程度的切削餘量是必要的。The inner size and the outer size of the substrate 10 are determined in consideration of the cutting allowance. However, it is preferable that the produced pellicle frame 1 is large on the one side by about 0.2 mm to 3 mm, and more preferably from 0.5 mm to 1 mm. The thickness of the prepreg 5 is 0.2 mm or so even if it is thick. Therefore, setting a cutting allowance of 1 mm requires winding for nearly 5 weeks. The smaller the cutting allowance, the more advantageous the cost is. However, deformation may occur during heat curing, and the longer the side length, the more the machining error occurs, and the degree of cutting allowance is necessary.
從基材10進行機械加工得到所期望的防塵薄膜組件框架1,疊層的誤差以及加熱固化時的變形可能通過切削來進行修正,所以加工後的尺寸精度可以為與一般的金屬製防塵薄膜組件框架同等的程度。另外,預浸料5的使用量也僅比防塵薄膜組件框架1的形狀大一點點而進行疊層即可,所以浪費極少,與從1個板材切出的方法相比,可以大幅度地使生產成本減低。另外,與用棒狀的材料製作各邊,然後將它們接在一起來製作防塵薄膜 組件框架的形狀的場合相比,可降低預浸料5的使用量,但是對各棒狀的材料進行連接在一起的成本是必要的,進一步將棒狀的材料接在一起的連接部分的強度如何也被擔心。由此,從生產成本以及強度的兩面來考慮,本發明的方法具有優越性。The desired pellicle frame 1 is machined from the substrate 10, and the lamination error and deformation during heat curing may be corrected by cutting, so that the dimensional accuracy after processing can be compared with a general metal pellicle. The degree of the framework is equal. Further, since the amount of the prepreg 5 to be used is only a little larger than the shape of the pellicle frame 1 and is laminated, the waste is extremely small, and the amount of the prepreg 5 can be greatly reduced as compared with the method of cutting out from one plate. Production costs are reduced. In addition, the edges are made of a rod-shaped material, and then they are joined together to form a dust-proof film. The amount of use of the prepreg 5 can be reduced as compared with the case of the shape of the component frame, but the cost of joining the rod-shaped materials together is necessary, and the strength of the joint portion which further joins the rod-shaped materials together How to be worried too. Thus, the method of the present invention is advantageous in terms of both production cost and strength.
另外,在所述機械切削加工中,從基材10切出時,預浸料5中含有的碳纖維15的方向與用其形成的邊的方向嚴格一致有困難,所以有疊層的預浸料5的碳纖維15與防塵薄膜組件框架1的邊不能嚴格平行的場合。另外,在基材10的階段連續的碳纖維15,在表面近處也可能有被機械切削加工切斷的場合。但是,不管哪種場合,在實際上的影響很小,可以滿足本來目的以及得到預想的效果,這些也包括在本發明的技術思想的範圍之內。Further, in the mechanical cutting process, when the substrate 10 is cut out, the direction of the carbon fibers 15 contained in the prepreg 5 is strictly in accordance with the direction of the side formed by the substrate 10, so that the laminated prepreg is provided. The carbon fiber 15 of 5 is not strictly parallel to the side of the pellicle frame 1. Further, the carbon fibers 15 which are continuous at the stage of the substrate 10 may be cut by mechanical cutting in the vicinity of the surface. However, in either case, the actual influence is small, the original purpose and the intended effect can be satisfied, and these are also included in the scope of the technical idea of the present invention.
對作為上述的防塵薄膜組件框架1的製造方法一個實施例如圖6(a)~圖6(d)所示,以下對此加以詳細說明。One embodiment of the manufacturing method of the pellicle frame 1 described above is as shown in Figs. 6(a) to 6(d), and will be described in detail below.
將如圖6(a)表示的那樣,準備與四邊形狀的框體的所期望的防塵薄膜組件框架1的內尺寸相比,長邊以及短邊小,並且比所期望的防塵薄膜組件框架1的高度要高,並且對切削餘量也加以考慮而進行設計的芯材12。然後,將以規定的長度切斷的細長的預浸料5進行無鬆弛地纏繞,使該碳纖維5的配向與要形成的框體的邊的長方向一致。這樣的預浸料5的長度至少要為要形成的框體的一周的長度,並且要有比要形成的框體的高度要大的寬度。此時,優選預浸料5的碳纖維15與形成的邊平行。圖6 (a)中,箭頭P表示碳纖維15的配向方向。另外,在芯材12上,為了使預浸料5的纏繞開始點6漂亮地形成,優選設置高度為預浸料5的厚度的階差13,但是,由於彎曲半徑越小,疊層的時候碳纖維的折斷(斷裂)也就越會發生,所以半徑為至少3 mm以上為好。進一步,優選芯材12的角部具有與形成的防塵薄膜組件框架1的角部的形狀相近的半徑。As shown in FIG. 6(a), the long side and the short side are smaller than the inner size of the desired pellicle frame 1 of the frame of the quadrangular shape, and the desired pellicle frame 1 is prepared. The core material 12 is designed to have a high height and a consideration of the cutting allowance. Then, the elongated prepreg 5 cut at a predetermined length is wound without slack, and the alignment of the carbon fibers 5 coincides with the longitudinal direction of the side of the frame to be formed. The length of such prepreg 5 is at least the length of one circumference of the frame to be formed, and has a width larger than the height of the frame to be formed. At this time, it is preferable that the carbon fibers 15 of the prepreg 5 are parallel to the formed sides. Figure 6 In (a), an arrow P indicates an alignment direction of the carbon fibers 15. Further, in order to make the winding start point 6 of the prepreg 5 beautifully formed on the core material 12, it is preferable to set a step 13 having a height which is the thickness of the prepreg 5, but since the bending radius is smaller, the lamination time is The breakage (fracture) of the carbon fiber occurs more, so the radius is at least 3 mm or more. Further, it is preferable that the corner portion of the core material 12 has a radius close to the shape of the corner portion of the formed pellicle frame 1 .
將預浸料5進行纏繞,直至形成防塵薄膜組件框架1的外尺寸加上切削餘量的程度,得到圖6(b)表示的防塵薄膜組件框架的基材10。此時,疊層途中有預浸料5的接縫的場合,優選進行調整,使該接縫不在角部,無間隙地與下一個預浸料5進行接合。另外,芯材12在預浸料5疊層後以及加熱固化時,優選用彈簧等的向外擴張的機構,使其向外側具有張力(未圖示)。The prepreg 5 is wound until the outer size of the pellicle frame 1 is added to the extent of the cutting allowance, and the substrate 10 of the pellicle frame shown in Fig. 6(b) is obtained. In this case, when the seam of the prepreg 5 is formed in the middle of lamination, it is preferable to adjust so that the joint is not joined to the next prepreg 5 without a gap. Further, after the prepreg 5 is laminated and heat-cured, the core member 12 is preferably biased outward by a mechanism such as a spring (not shown).
將這樣的基材10以及芯材12收納於聚乙烯製的袋中(未圖示),真空減壓將內部的空氣抽出後,在(autoclave)中一邊進行加壓一邊加熱,將預浸料5中浸入的樹脂固化。冷卻後,從熱壓器中取出,將芯材12脫下,得到圖6(c)表示的那樣的比所期望的防塵薄膜組件框架1大一圈的基材10。將這樣的基材10,用機械加工器進行機械切削加工、研磨以及切削而平滑化,使各面變為規定的尺寸,進一步加工形成作為通氣孔2以及凹孔3的夾具孔,得到圖6(d)表示的那樣的,實用且尺寸精度高的防塵薄膜組件框架1。The base material 10 and the core material 12 are housed in a polyethylene bag (not shown), and the internal air is evacuated by vacuum decompression, and then heated while being pressurized (autoclave) to prepreg. The resin immersed in 5 is cured. After cooling, the core material 12 is taken out from the autoclave, and the substrate 10 which is larger than the desired pellicle frame 1 as shown in Fig. 6(c) is obtained. The substrate 10 is subjected to mechanical cutting, polishing, and cutting by a machine tool to be smoothed, and each surface is changed to a predetermined size, and a jig hole as the vent hole 2 and the recessed hole 3 is further processed to obtain a jig hole. (d) The pellicle frame 1 that is practical and has high dimensional accuracy.
本發明的防塵薄膜組件框架1,在通氣孔2以及凹孔3的加工時,是對預浸料5的疊層面進行垂直的孔加工,具有孔加工時的預浸料5的剝離以及斷裂的可能性小的優點。In the pellicle frame 1 of the present invention, when the vent hole 2 and the recessed hole 3 are processed, the laminated surface of the prepreg 5 is vertically processed, and the prepreg 5 is peeled and broken during the hole processing. The advantage of small possibilities.
進一步切削加工後,將得到的防塵薄膜組件框架1洗淨,進一步根據必要對其表面用樹脂覆蓋膜9進行覆蓋,使由於進行切削加工而造成的斷裂的碳纖維不在表面露出。防塵薄膜組件框架1的表面用樹脂覆蓋膜9進行覆蓋,可以防止斷裂的碳纖維的露出以及用洗淨不能得到完全洗淨的表面,從而在防塵薄膜組件被使用的場合不會有由於碳纖維以及樹脂的脫落而產生灰塵的危險,所以為進一步優選。不僅如此,還可以防止構成預浸料5中的環氧樹脂等的樹脂由於曝光的紫外線而發生的老化、以及由此產生的強度變低。After further cutting, the obtained pellicle frame 1 is washed, and the surface of the resin cover film 9 is covered as necessary, so that the carbon fibers which are broken by the cutting process are not exposed on the surface. The surface of the pellicle frame 1 is covered with a resin cover film 9, which prevents the exposed carbon fibers from being exposed and the surface which is not completely cleaned by washing, so that the carbon fiber and the resin are not used when the pellicle is used. It is further preferable because it is detached to generate dust. Further, it is possible to prevent deterioration of the resin which constitutes the epoxy resin or the like in the prepreg 5 due to the exposed ultraviolet rays, and the strength generated thereby.
用來覆蓋防塵薄膜組件框架1的表面的樹脂覆蓋膜9的形成,沒有特別的限定,將製作的防塵薄膜組件框架1充分洗淨、乾燥,將樹脂覆蓋膜9的形成樹脂以適當的濃度在溶劑中溶解,將使根據需要加入的顏料、碳黑等在溶劑中分散,用噴霧、浸漬、電沉積(electro deposition)等的公知的塗布手法進行塗布即可。這些,可以根據使用的樹脂的種類進行最適合的選擇即可,覆蓋膜形成後,對防塵薄膜組件框架全體進行加熱處理,在使溶劑完全揮發除去的同時,覆蓋膜中含有的低分子成分可以被減低,這是優選的。加熱溫度,優選盡量高的溫度,但是要綜合考慮預浸 料5的耐熱溫度、覆蓋膜樹脂9的耐熱溫度、覆蓋膜樹脂9的塗布時用的溶劑的沸點等來進行決定。The resin cover film 9 for covering the surface of the pellicle frame 1 is not particularly limited, and the prepared pellicle frame 1 is sufficiently washed and dried, and the resin of the resin cover film 9 is formed at an appropriate concentration. The solvent is dissolved in the solvent, and the pigment or carbon black to be added as needed is dispersed in a solvent, and may be applied by a known coating method such as spraying, dipping, or electrodeposition (electrodeposition). These can be optimally selected depending on the type of resin to be used. After the cover film is formed, the entire pellicle frame is heated, and the solvent is completely volatilized and removed, and the low molecular component contained in the cover film can be It is reduced, which is preferred. Heating temperature, preferably as high as possible, but considering pre-dip The heat-resistant temperature of the material 5, the heat-resistant temperature of the cover film resin 9, and the boiling point of the solvent used for coating the film resin 9 are determined.
另外,作為另一個製造方法,可以列舉如圖7(a)~圖7(d)表示的那樣,用管狀的基材10來進行加工的方法。如圖7(a)表示的那樣,準備四邊形狀的框體具有比所期望的防塵薄膜組件框架1的內尺寸小的長邊以及短邊,並且比所期望的防塵薄膜組件框架1的高度至少高2倍以上的芯材12。以預先規定的長度切斷的長的預浸料5,進行無鬆弛地纏繞,使碳纖維方向與要形成的框體的邊的長方向一致。這樣的預浸料5的長度,為至少要有形成的框體的一周的長度,並且比要形成的框體的高度高至少2倍以上,進一步優選高5倍以上。此時,優選預浸料5的碳纖維與要形成的邊平行。圖6(a)中,箭頭P為碳纖維的配向方向。另外,在這樣的場合,在芯材12上,優選設置厚度為預浸料5的厚度的階差13,進一步,優選具有施加向外側的張力的機構(未圖示)。Further, as another manufacturing method, a method of processing using a tubular base material 10 as shown in Figs. 7(a) to 7(d) can be cited. As shown in Fig. 7(a), the frame having the quadrangular shape has a longer side and a shorter side than the inner size of the desired pellicle frame 1, and is at least higher than the height of the desired pellicle frame 1. The core material 12 is 2 times higher. The long prepreg 5 cut at a predetermined length is wound without slack, and the carbon fiber direction is made to coincide with the longitudinal direction of the side of the frame to be formed. The length of such a prepreg 5 is at least one length of the frame to be formed, and is at least twice or more higher than the height of the frame to be formed, and more preferably five times or more higher. At this time, it is preferred that the carbon fibers of the prepreg 5 are parallel to the side to be formed. In Fig. 6(a), the arrow P is the direction in which the carbon fibers are aligned. Further, in such a case, it is preferable to provide a step 13 having a thickness which is the thickness of the prepreg 5 on the core material 12, and further preferably a mechanism (not shown) having a tension applied to the outside.
將預浸料5進行纏繞,直至達到比防塵薄膜組件框架1的外尺寸加上切削餘量的程度,如所述那樣,進行加熱固化,得到如圖7(b)表示的那樣的管狀的基材10。The prepreg 5 is wound until it reaches the outer dimension of the pellicle frame 1 plus the cutting allowance, and as described above, heat curing is performed to obtain a tubular base as shown in Fig. 7 (b). Material 10.
對於這樣的管狀的基材10,如圖7(c)表示的那樣,在要形成的防塵薄膜組件框架1的邊平行方向上,用砂輪機16進行輪狀切割,得到具有與所期望的防塵薄膜組件框架1的高度或 與其相近的高度的基材10a。同樣,對管狀的基材10進行輪切,如圖7(d)表示的那樣,一次可以得到多個基材10a、10b、10c、…。作為輪切加工方法,可以列舉砂輪機16,但是並不限定於此,例如,可以利用噴水、金剛石切割器、雷射切斷等,從切斷品質以及給基材10的不好的影響少的觀點,噴水為特別是優選。在此得的基材10a、10b、10c、…如所述圖6(a)~圖6(d)同樣,可以分別另行進行機械切削加工,分別作成防塵薄膜組件框架1。這可以一次生產多個防塵薄膜組件框架1,可以大幅度地提高製作效率。With such a tubular base material 10, as shown in Fig. 7(c), in the parallel direction of the side of the pellicle frame 1 to be formed, the grindstone 16 is used for the wheel cutting to obtain the desired dustproof The height of the membrane module frame 1 or A substrate 10a having a height similar thereto. Similarly, the tubular substrate 10 is subjected to wheel cutting, and as shown in Fig. 7 (d), a plurality of substrates 10a, 10b, 10c, ... can be obtained at one time. Although the grinder 16 is exemplified as the grinding method, the present invention is not limited thereto. For example, water jet, diamond cutter, laser cutting, or the like can be used, and the quality of cutting and the adverse effect on the substrate 10 are small. The point of view, water spray is especially preferred. In the same manner as in the above-described FIGS. 6(a) to 6(d), the base materials 10a, 10b, 10c, and the like can be separately subjected to mechanical cutting to form the pellicle frame 1 respectively. This makes it possible to produce a plurality of pellicle frame 1 at a time, which can greatly improve the production efficiency.
用這樣製作的防塵薄膜組件框架1構成的防塵薄膜組件的斜視概略圖如圖8所示。預浸料5的表面有樹脂覆蓋膜9形成的防塵薄膜組件框架1的一個端面上的貼設面21上介於防塵薄膜接著層,防塵薄膜22在其上繃緊設置,形成防塵薄膜組件20。作為防塵薄膜22的材質,為纖維素以及其衍生物、氟樹脂等。在另一個端面上設有遮罩黏著層23。作為形成遮罩黏著層23的遮罩黏著劑,可以列舉丙烯酸黏著劑、橡膠類黏著劑,熱熔黏著劑、矽酮黏著劑等。在這樣的遮罩黏著層23的表面上,為了對遮罩黏著層23進行保護,可以根據必要在PET等的薄的樹脂薄膜上設置離型劑層的離型層24。另外,根據必要,在防塵薄膜組件框架1的側面設置貫通的通氣孔2,由此,可以解除由於防塵薄膜組件內外的氣壓差造成的防塵薄膜22的膨脹以及凹陷,同時,為了防止優 選伴隨著通氣的從防塵薄膜組件外部的灰塵的侵入,優選設置過濾器25。為了易於處理,也可以在必要的場所設置凹孔3以及溝等(未圖示)。A schematic perspective view of the pellicle assembly constructed using the pellicle frame 1 thus produced is shown in FIG. The surface 21 of the prepreg 5 having the resin cover film 9 formed on the end surface of the pellicle frame 1 is interposed on the pellicle film, and the pellicle film 22 is stretched thereon to form the pellicle assembly 20 . The material of the pellicle film 22 is cellulose, a derivative thereof, a fluororesin or the like. A mask adhesive layer 23 is provided on the other end face. Examples of the masking adhesive that forms the masking adhesive layer 23 include an acrylic adhesive, a rubber-based adhesive, a hot-melt adhesive, and an anthrone adhesive. On the surface of such a mask adhesive layer 23, in order to protect the mask adhesive layer 23, the release layer 24 of the release agent layer may be provided on a thin resin film such as PET as necessary. Further, if necessary, the vent hole 2 is provided in the side surface of the pellicle frame 1, whereby the expansion and depression of the pellicle film 22 due to the difference in air pressure between the inside and the outside of the pellicle can be released, and at the same time, It is preferable to provide the filter 25 in order to infiltrate the dust from the outside of the pellicle assembly with ventilation. In order to facilitate handling, a recess 3, a groove, or the like (not shown) may be provided in a necessary place.
藉由以上的構造,在可以得到防塵薄膜22的張力造成的彎曲以及處理造成的彎曲小,具有大曝光面積的以及低成本的防塵薄膜組件20的同時,該防塵薄膜組件20在使用中沒有發生灰塵的危險,具有極高的可靠性。With the above configuration, the pellicle assembly 20 does not occur in use while the bending due to the tension of the pellicle film 22 and the bending caused by the treatment are small, and the pellicle assembly 20 having a large exposure area and a low cost is obtained. Danger of dust and high reliability.
以下,實施例對本發明的實施例進行詳細說明,但是本發明的範圍不受這些實施例的限制。The embodiments of the present invention are described in detail below, but the scope of the present invention is not limited by the embodiments.
用機械加工製作具有圖1表示的形狀的複合材料制的防塵薄膜組件框架1。這樣的防塵薄膜組件框架1的形狀為,各角部的外尺寸為904.5 mm×750 mm,內尺寸為896.5 mm×742 mm的長方形,厚度為5.8 mm,各角部的形狀為內側R2、外側R6。另外,在長邊以860 mm的間隔製作處理凹孔(直徑2.5 mm,深2 mm)3,在短邊以730 mm之間隔製作同樣的處理凹孔3。另外,在兩長邊中央部附近設置直徑為1.5mm的通氣孔2(各邊分別有4個)。A pellicle frame 1 made of a composite material having the shape shown in Fig. 1 was machined. Such a pellicle frame 1 has a shape in which the outer dimensions of the corner portions are 904.5 mm × 750 mm, the inner dimensions are 896.5 mm × 742 mm, and the thickness is 5.8 mm, and the shape of each corner portion is the inner side R2 and the outer side. R6. Further, a processing recess (2.5 mm in diameter and 2 mm in depth) 3 was formed at intervals of 860 mm on the long side, and the same processing recess 3 was formed in the short side at intervals of 730 mm. Further, vent holes 2 having a diameter of 1.5 mm (four on each side) were provided in the vicinity of the central portions of the two long sides.
這樣的防塵薄膜組件框架1的具體形成的製造步驟如下。在此使用的複合材料為一方向配向的碳纖維中浸入的環氧樹脂的片狀的預浸料5(商品名;E8025C-25N日本石墨纖維公司 製)。這樣的預浸料5以200 mm的長度切斷,圖7(a)~圖7(c)表示的那樣,以纖維方向與各邊平行方向在芯材12上纏繞疊層,加熱固化,得到外尺寸約906.5 mm×752 mm、內尺寸894.5 mm×740 mm、高約200 mm的管狀的基材10。從這樣的基材10,用噴水加工製取高6.5 mm的基材10a、10b、10c、…。然後,從這樣的基材10a、10b、10c、…,用加工器加工成具有所述尺寸的防塵薄膜組件框架1。The manufacturing steps of the specific formation of such a pellicle frame 1 are as follows. The composite material used herein is a sheet-shaped prepreg 5 of an epoxy resin immersed in a directional carbon fiber (trade name; E8025C-25N Japan Graphite Fiber Co., Ltd.) system). Such a prepreg 5 is cut by a length of 200 mm, and as shown in Fig. 7 (a) to Fig. 7 (c), the core material 12 is wound and laminated in a fiber direction parallel to each side, and heat-cured to obtain A tubular substrate 10 having an outer dimension of about 906.5 mm by 752 mm, an inner dimension of 894.5 mm by 740 mm, and a height of about 200 mm. From the substrate 10 as described above, the substrates 10a, 10b, 10c, ... having a height of 6.5 mm were produced by water jet processing. Then, the substrate 10a, 10b, 10c, ... are processed into a pellicle frame 1 having the above size by a processor.
接著,對這樣的防塵薄膜組件框架1用界面活性劑和純水進行良好的洗滌,80℃×3小時加熱乾燥後,表面用樹脂進行塗布,形成樹脂覆蓋膜9。塗布為將氟樹脂(商品名;CYTOP CT X 109A旭硝子公司製)用氟類溶劑(商品名;NOVEC7300,住友3M公司製)溶解,並且使碳黑(商品名;HCF2650,三菱化學公司製)分散的溶液,用噴霧法進行4回塗布。其後,烤箱中130℃加熱,使溶劑完全去除。氟樹脂的樹脂覆蓋膜9的膜厚為約30 μm。Then, the pellicle frame 1 is washed with a surfactant and pure water, heated and dried at 80 ° C for 3 hours, and then coated with a resin to form a resin cover film 9. The fluororesin (trade name; CYTOP CT X 109A Asahi Glass Co., Ltd.) was dissolved in a fluorine-based solvent (trade name; NOVEC 7300, manufactured by Sumitomo 3M Co., Ltd.), and carbon black (trade name; HCF 2650, manufactured by Mitsubishi Chemical Corporation) was dispersed. The solution was sprayed four times with a spray method. Thereafter, the oven was heated at 130 ° C to completely remove the solvent. The film thickness of the resin coating film 9 of the fluororesin is about 30 μm.
最後,進行尺寸的檢査,外尺寸以及內尺寸為加工指定尺寸的+0/-0.3 mm的範圍。另外,直角為以長邊為基準,對以90度畫的虛擬線有0.5 mm的錯位。Finally, the size is checked, and the outer and inner dimensions are in the range of +0/-0.3 mm for the specified size. In addition, the right angle is based on the long side, and the virtual line drawn at 90 degrees has a misalignment of 0.5 mm.
將這樣的防塵薄膜組件框架1搬入無塵室,用界面活性劑和純水進行洗滌,乾燥後,在暗室內用40萬勒的鹵素燈照射,進行外觀檢査。其結果,沒有複合材料的露出的地方。另外,也 沒有表面的閃光以及塗布斑等的缺陷以及由於洗淨而造成的樹脂覆蓋膜9的剝離等。The pellicle frame 1 was placed in a clean room, washed with a surfactant and pure water, dried, and then irradiated with a 400,000-liter halogen lamp in a dark room to perform an appearance inspection. As a result, there is no exposed area of the composite material. In addition, also There are no flashes of the surface, defects such as coating spots, and peeling of the resin cover film 9 due to washing.
接著,用這樣的防塵薄膜組件框架1製作圖8表示的那樣的防塵薄膜組件20。在防塵薄膜組件框架1的一個端面的貼設面21用空氣加壓式分配器將作為防塵薄膜接著層的矽酮黏著劑、以及在另一個端面上將作為遮罩黏著層23的矽酮黏著劑(商品名KR3700,信越化學工業公司製)進行塗布,加熱固化。然後,將離型劑被在表面賦予的厚度125 μm的PET薄膜以與防塵薄膜組件框架1幾乎同樣的形狀進行切斷加工製作的遮罩黏著層保護用剝離膜24加以安裝,進一步貼附覆蓋通氣孔2的3.6 mm×9.5 mm,厚度0.35 mm的PTFE製過濾器25。Next, the pellicle film assembly 20 shown in Fig. 8 is produced by using the pellicle frame 1 as described above. The affixing surface 21 of one end surface of the pellicle frame 1 is adhered to the crepe ketone as a pellicle adhesive layer by an air pressure type dispenser, and the fluorene ketone as the mask adhesive layer 23 is adhered to the other end surface. The agent (trade name: KR3700, manufactured by Shin-Etsu Chemical Co., Ltd.) was applied and heated and cured. Then, the PET film having a thickness of 125 μm which is applied to the surface of the release agent is attached to the mask adhesive layer protective release film 24 which is cut in substantially the same shape as the pellicle frame 1 and further attached. A PTFE filter 25 having a vent hole 2 of 3.6 mm × 9.5 mm and a thickness of 0.35 mm.
在所述防塵薄膜組件框架1之外,將氟類聚合物(商品名CYTOP,旭硝子公司製)用狹縫塗布法在1200 mm×850 mm×厚度10 mm的長方形石英基板上成膜,溶劑乾燥後,在與基板外形一樣形狀的鋁合金製暫用框進行接著、剝離,得到厚度約3 μm的防塵薄膜22。將這樣的防塵薄膜22在如所述的那樣製得的防塵薄膜組件框架1的一個端面的貼設面21上介於防塵薄膜接著層接著後,將防塵薄膜組件框架1的周圍的不要的防塵薄膜22用刀切斷除去,製得防塵薄膜組件20。In addition to the pellicle frame 1, a fluorine-based polymer (trade name: CYTOP, manufactured by Asahi Glass Co., Ltd.) was formed by a slit coating method on a rectangular quartz substrate of 1200 mm × 850 mm × thickness 10 mm, and the solvent was dried. Thereafter, the aluminum alloy temporary frame having the same shape as the outer shape of the substrate was subjected to adhesion and peeling to obtain a pellicle film 22 having a thickness of about 3 μm. Such a pellicle film 22 is placed on the attachment surface 21 of one end surface of the pellicle frame 1 as described above after the pellicle is adhered to the subsequent layer, and unnecessary dust is prevented from the periphery of the pellicle frame 1. The film 22 is cut off with a knife to obtain a pellicle film assembly 20.
然後,這樣的防塵薄膜組件20放在測量盤上,對防塵薄膜組件框架1的各邊的彎曲量進行計測。其結果,長邊的中央 部的向內側的彎曲量為單側1.0 mm,短邊中央部的向內側的彎曲量為單側0.6 mm。Then, such a pellicle film assembly 20 is placed on the measuring disk, and the amount of bending of each side of the pellicle frame 1 is measured. As a result, the center of the long side The inward bending amount of the portion is 1.0 mm on one side, and the inward bending amount in the central portion of the short side is 0.6 mm on one side.
用機械加工製作與所述實施例1同尺寸、同形狀的防塵薄膜組件框架。此時,作為基材,使用平紋的碳纖維織物用環氧樹脂進行浸漬成為片狀的預浸料(商品名:DIALEAD HMFJ3113/948A1,三菱樹脂公司製)疊層,加熱固化,得到910 mm×760 mm×厚度約6mm的板材。從這樣的板材料,用加工機械進行機械加工,得到所述尺寸的防塵薄膜組件框架,用與實施例1相同的步驟進行表面樹脂塗布。A pellicle frame of the same size and shape as that of the first embodiment was machined by machining. In this case, a prepreg (trade name: DIALEAD HMFJ3113/948A1, manufactured by Mitsubishi Plastics Co., Ltd.) impregnated with a sheet of a carbon fiber woven fabric is impregnated with a resin, and heat-cured to obtain 910 mm × 760. Mm x plate with a thickness of about 6 mm. From such a sheet material, it was machined by a processing machine to obtain a pellicle frame having the above dimensions, and surface resin coating was carried out by the same procedure as in Example 1.
接著,用這樣的防塵薄膜組件框架以與實施例1完全同樣的步驟,製作圖8表示的防塵薄膜組件,將完成的防塵薄膜組件放在測定盤上,對防塵薄膜組件框架各邊的彎曲量進行計測。結果,為長邊中央部的向內側的彎曲量為單側2.3 mm,短邊中央部的向內側的彎曲量為單側1.9 mm。另外,成本為所述實施例的約9倍。Next, using such a pellicle frame, the pellicle assembly shown in Fig. 8 was produced in exactly the same manner as in Example 1, and the finished pellicle was placed on the measuring disc, and the amount of bending on each side of the pellicle frame was performed. Take measurements. As a result, the amount of bending inward of the central portion of the long side was 2.3 mm on one side, and the amount of bending inward of the central portion of the short side was 1.9 mm on one side. In addition, the cost is about 9 times that of the embodiment.
用鋁合金A5052,機械加工製作與所述實施例的尺寸相同,形狀相同的防塵薄膜組件框架,表面施以黑色氧化鋁膜處理。然後,使用這樣的防塵薄膜組件框架進行防塵薄膜組件的製作,僅將防塵薄膜組件垂直立起,就會發生長邊、短邊都出現20 mm前 後的彎曲,連長方形的形狀都難以保證。因此,此物作為防塵薄膜組件框架完全不能使用。A pellicle frame having the same size and shape as that of the above-described embodiment was machined by an aluminum alloy A5052, and the surface was treated with a black alumina film. Then, the pellicle assembly is fabricated using such a pellicle frame, and only the pellicle assembly is vertically erected, and the long side and the short side are 20 mm before. The back bend, even the shape of the rectangle is difficult to guarantee. Therefore, this object is completely unusable as a pellicle frame.
本發明的防塵薄膜組件框架,剛性被大幅度提高,從而能確保大面積的曝光領域。由此,適宜在半導體、IC封裝體、印刷基板、液晶以及有機EL顯示裝置等的製造步驟中作為防塵薄膜組件使用。According to the pellicle frame of the present invention, the rigidity is greatly improved, and a large-area exposure field can be secured. Therefore, it is suitably used as a pellicle film in a manufacturing process of a semiconductor, an IC package, a printed circuit board, a liquid crystal, and an organic EL display device.
1‧‧‧防塵薄膜組件框架1‧‧‧Plastic membrane assembly frame
2‧‧‧通氣孔2‧‧‧vents
3‧‧‧凹孔3‧‧‧ recessed hole
4‧‧‧階差4‧‧ ‧ step
5‧‧‧預浸料5‧‧‧Prepreg
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JP5746662B2 (en) * | 2012-05-11 | 2015-07-08 | 信越化学工業株式会社 | Pellicle frame |
CN103279008A (en) * | 2013-05-23 | 2013-09-04 | 上海华力微电子有限公司 | Method for designing mask plate cover film |
JP6293041B2 (en) * | 2014-12-01 | 2018-03-14 | 信越化学工業株式会社 | Pellicle frame and pellicle using the same |
KR102254103B1 (en) * | 2015-01-07 | 2021-05-20 | 삼성전자주식회사 | Method of fabricating pellicles using supporting layer |
JP6519190B2 (en) * | 2015-01-16 | 2019-05-29 | 日本軽金属株式会社 | Support frame for pellicle |
JP2016139103A (en) * | 2015-01-29 | 2016-08-04 | 日本軽金属株式会社 | Supporting frame for pellicle |
WO2017113229A1 (en) * | 2015-12-30 | 2017-07-06 | 深圳市大富科技股份有限公司 | Mobile phone, mobile-phone frame, and method for manufacturing same |
CN110325908A (en) * | 2017-02-17 | 2019-10-11 | 三井化学株式会社 | Protect the manufacturing method of membrane module, exposure master, exposure device and semiconductor device |
KR20230017807A (en) * | 2020-06-04 | 2023-02-06 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Pellicle frame, pellicle, exposure original plate with pellicle, exposure method, semiconductor manufacturing method, and liquid crystal display panel manufacturing method |
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