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TWI339133B - Liquid material applying apparatus - Google Patents

Liquid material applying apparatus Download PDF

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Publication number
TWI339133B
TWI339133B TW097106432A TW97106432A TWI339133B TW I339133 B TWI339133 B TW I339133B TW 097106432 A TW097106432 A TW 097106432A TW 97106432 A TW97106432 A TW 97106432A TW I339133 B TWI339133 B TW I339133B
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TW
Taiwan
Prior art keywords
test
coating
substrate
nozzles
coated surface
Prior art date
Application number
TW097106432A
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Chinese (zh)
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TW200924858A (en
Inventor
Oze Hirokazu
Ueno Masatoshi
Original Assignee
Dainippon Screen Mfg
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Publication of TW200924858A publication Critical patent/TW200924858A/en
Application granted granted Critical
Publication of TWI339133B publication Critical patent/TWI339133B/en

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12044OLED

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Coating Apparatus (AREA)
  • Electroluminescent Light Sources (AREA)

Description

1339133 九、發明說明: 【發明所屬之技術領域】 本^明係關於一種對基板塗佈流動性材料之塗佈裝置。 、 【先前技術】 習知,開發有一種利用有機EL(Electr〇 Umineseenee) 材料之有機EL顯示裝置,例如,在使用高分子有機乩材 料的主動矩陣(active matrix)驅動方式之有機EL顯示裝 鲁置的製造中,於玻璃基板(以下,僅稱之為「基板」)上依 •序進行以下步驟:形成TFT(ThinFilmTransistor)電路; ^成作為陽極之iT0(Indium Tin 0xide)電極;形成間隔 壁;塗佈包含電洞輸送材料之流動性材料(以下,稱之為 「電洞輸送液」);利用加熱處理形成電洞輸送層;塗佈 包含有機EL材料之流動性材料(以下,稱為「有機el 液」);利用加熱處理形成有機EL層;形成陰極;以及形 成絕緣膜來進行密封。 • 於有機EL顯示裝置之製造中,作為將電洞輸送液或有 機EL液塗佈於基板上之塗佈裝置之一,係如日本專利特 開2002-75640號公報(文獻丨)及日本專利特開 2003-1 0755號公報(文獻2)所示,使連續吐出流動性材料 之複數個喷嘴相對於基板進行相對移動,藉此在基板上塗 佈流動性材料。 文 +在上述文獻1及文獻2之裝置中,使複數個喷嘴於主掃 田方向上移動’並且母當喷嘴朝主掃描方向上移動時,便 使基板於副掃播方向上移動,藉此將流動性材料以條紋狀 97106432 1339133 塗佈於形成在基板上之塗佈區域内的複數個間隔壁之間 的才曰中。於上述文獻1及文獻2之塗佈裝置中,藉由保持 構件將3個噴嘴-體保持著,並且以與基板垂直之支持轴 為中〜使该保持構件轉動,以減小3個噴嘴於副掃描方向 上之間距,而可使流動性材料之塗佈間距變窄。 另一方面,於日本專利特開20〇4_74〇5〇號公報(文獻 3)中揭示-塗佈裝置,其係使丨個喷嘴於主掃描方向上移 動,並且每當喷嘴於主掃描方向上移動時,使基板於副掃 描方向上料,藉此將流動性材才斗以條紋狀塗佈於形成在 基板上之塗佈區域内的複數間隔壁之間的槽中。在上述文 獻3之塗佈裝置中,朝設置在嘴嘴與基板之間的遮罩 =aSl〇上塗佈有機EL液’並根據遮罩上的有機el液之塗 :執跡以及基板上的槽之影像資料來修正基板之傾斜 度,以使喷嘴之主掃描方向與槽之延伸方向一致。 ,是’通常於上述裝置中,噴嘴之間距調整係藉由作章 進行的,調整結果之確認亦藉由作業: 二二=而進行的’故難以進行高精度之間距 二::檢測時以及調整結果之確認時等的轉= 基板之非塗佈區域上進行,而當嘴嘴數^ 乂夕日’、’㈣塗佈所f之範圍會大於非塗佈區域之 因而無法進行噴嘴之間距調整。 — , 【發明内容】 本發明係闕於一種對基板塗佈流動性材料之塗佈裝 97106432 7 丄 ^9133 ’、目的在於’在不對基板塗佈流動性材料之情況下, 可同知度地調整塗佈裝置之複數個喷嘴之間距。 、本發明之塗佈裝置具備:基板保持部,用以保持基板; ^數個喷嘴’朝向上述基板之主面連續地吐出流動性材 ,噴嘴掃描機構,使上述複數個噴嘴在與上述基板之上 述主面平行的主掃描方向相對於上述基板進行相對移 動同%•每备朝上述主掃描方向移動時,使上述 於上述複IU时嘴在與上述主面平行且與上述主掃描; =ΓΝ帝描方向進行相對移動;測試塗佈部,具有測 該測試塗佈面在未對上述基板進行塗佈時測試 ."上述禝數個喷嘴之流動性材料;測試塗佈部進退 、’使上述測試塗佈部在上述複數個喷嘴於上述主掃描 噴嘴:is動路徑進退,以使測試塗佈時的上述複數個 ::嘴佈面之間的距離、及塗佈時的上述複數 %板之上述主面之間的距離相等,·攝像部, 错由上述複數個噴嘴於上述主掃指方向 得㈣於上述測試塗佈面的流動性材料之圖案之影= 距檢測部,根據由上述攝像部 個影像而檢測上述複數 H 副掃描方向的間距;間距調整機構,對上述 =個喷嘴於上述副掃描方向的間距進行調整;二 ==更換機構’將上述測試塗佈部之上述測試塗佈面更 根據本發明,可在不對基板塗佈流 本二兩精度地調整複數個喷嘴之間距。 χ 貫施形態中,塗佈褒置更具備:基板旋 97106432 1339133 轉機構,使上述基板保持部以與上述基板之上述主面垂直 的旋轉軸為中心旋轉;另一個攝像部,取得在上述主掃描 、方向上與上述測言式塗佈®分開言免置的3 -個浪J試塗佈面 斤塗佈的流動性材料之圖案之影像;以及基板位置調整 部,根據由上述攝像部與上述另一個之攝像部所取得的流 動欧材料之圖案之影像、以及由上述攝像部與上述另一個 ,像部所取得的上述基板之上述主面上之定位用記號之 鲁影像,來控制上述喷嘴掃描機才冓及上述基板旋轉機構,藉 此調整上述基板相對於上述複數個喷嘴之相對位置。藉 此’可南精度地進行基板之位置調整。 本發明之另—較佳實施形態中,上述測試塗佈部係保持 樹脂膠帶之-部分的膠帶保持部,上述測試塗佈㈣上述 樹脂膠帶之上述-部分之主面,上述測試塗佈面更換機構 =備將上述樹脂豸帶朝上述測t式塗佈冑送出之膠帶供給 鲁本發明之又-實施形態中,上述測試塗佈面係相對於流 動性材料中之儒濕性與上述基板之上述主面相同的測= 主面,上述測試塗佈部係保持上述測試片之測試片保 〜上述目的及其他目的、特徵、態樣及優點,可參照隨附 .圖式’由以下本發明之詳細說明明白。 【實施方式】 圖1係表示本發明第i實施形態之塗佈裝置 圖,圖2係塗佈裝置!之前視圖。塗佈裝置1係對平面顯 97106432 9 ^39133 示裝置用之玻璃基板9(以下,僅稱之為「基板9」)塗佈 包含平面顯示裝置用之像素形成材料的流動性材料之裝 置。本實施形態中,塗佈裝置1係對主動矩陣驅動方式^ 有機EUEiecti·。Luminescence)顯示裝置用之基板9塗 佈包含有機EL材料的流動性材料(以下 液」)。 π风队 如圖1及圖2所示,塗佈裝置i具備:基板保持部”, 保持基板9 ;基板移動機構12,使基板 板9之主面平行的既定方向(亦即,圖i中之γ方向1 下,稱為「副掃描方向,N) u τ Μ ^ 」)上水平移動;以及基板旋轉機 !二 部11以與基板9之主面垂直的旋轉 哭U而㈣β基板保持部i i之内部具備利用有加熱 益之加熱機構(省略圖示)。 … 2 Y具備:CCD相機13’係配置於基板9上之 车 ;h方向上分別進行個別移動;塗佈頭i 4, 個噴嘴17朝向基板保持部11± 塗:為「上表面」)91連續吐出有_ 9之主面平γ且盘頭移動機構15,使塗佈5頁14在與基板 之χ方^ 丁 一副掃描方向垂直之方向(亦即,圖1中 之久方向,以下,魈盔「+以 Μ τ 個受液部16,在塗佑5知描方向」)上水平移動;2 被設置碩4之移動方向(亦即,X方向)上, 被》又置於基板保持部 ^ 有機EL液;以及/ 兩側並且承接來自塗佈頭Π之 及間距調整機構3,對複數個噴嘴17於副 97106432 向上之間距加以調整。如圖1所示,其還具備對來 塗佈頭14之有機EL液進行測試塗佈之測試塗佈單元 ^塗佈裝置1具備對上述構成加以控制之控制部10。 :通常之電腦相同’控制部10之構成係由以下各部分 或去:進/于各種運算處理之cpu;記憶所執行之程式 :⑽…運异處理之作業區域# _:記憶基本程式之 ,把憶各種資訊之固^磁碟;對作業人員顯示各種資 =顯示器;以及鍵盤及滑鼠等輸人部等。圖3係表示控 月=0之CPU等根據程式進行運算處理所實現之功能以 構成之方塊圖’圖3中之間距檢測部iqi、調整機 二1】。卩102及基板位置調整部j 〇3相當於由等所實 現之功能。再者,料功能亦可由複數台電腦實現。 圖1所示之塗佈頭"上’ 16個噴嘴17在圖!甲之χ =向(亦即’主掃描方向)上分開排列成大致 稍偏移圖1中夕 中之Y方向(亦即’副掃描方向)配置。本實施 鄰接之2個喷嘴17之間在副掃描方向上之距離, 專於預先形成於基板9之塗絲域上的在主掃描方向上 延伸之間隔壁之間的間距(以下,稱為「間隔壁之間距」) ^ 3倍。塗佈裝置!在未對基板9進行有機紅液之塗佈 ㈣試塗佈單元2進行有機壯液之測試塗佈,並根 Ί式塗佈之結果來控制間距調整機構3,藉此調整複數 固策嘴17之間於副掃猫方向上之距離。關於喷嘴p之間 距調整方法,於以下描述。 圖4及圖5分別係表示塗佈頭14之一部分的前視圖及 97106432 1339133 俯視圖。如圖4及圖5所示,塗佈頭14具備:朝向基板 9之上表面91 (參照圖"連續吐出有機乩液之16個噴 Π、以及安裝有該16個喷嘴之噴嘴安裝部14卜嘴 裝部141具備:與γ方向大致垂直之背板部14"、 固定於背板部14"之下端部(亦即,(—2)側之端部)且與 Z方向大致垂直之水平部1412。 16個噴嘴17分別可移動地安裝於從水平部1412之 側之邊緣朝( + Y)方向(亦即,副掃描方向)延伸之引導样 142上’於各喷嘴17之(])側設置有喷嘴鎖定部173,二 鎖定賀嘴17相對於喷嘴安裝部141之位置。 在圖1所示之塗佈裝置!中,在16個喷嘴17固定 =女裝部141上(參照圖4及圖5)之狀態下,在塗佈頭移 辟,構15之作用下’塗佈頭14 —邊從複數個噴嘴17連 吐出有機EL液’一邊朝主掃描方向移動,且 描方向移動1次,則基板9由基板移。 =朝副掃描方向(⑼方向)上步進移動。然後,複: 方向上之1反覆進行相對於基板9於主掃描方向及副掃描 ° 目對移動,藉此將有機液以條紋狀塗佈於基 二:士 t面91上。塗佈裝置1之塗佈頭移動機構15及 " 構12分別為喷嘴掃描機構,使1 6個噴嘴j 71339133 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD This invention relates to a coating apparatus for coating a substrate with a fluid material. [Prior Art] It is known to develop an organic EL display device using an organic EL (Electr〇Umineseenee) material, for example, an organic EL display device using an active matrix driving method using a polymer organic germanium material. In the manufacturing process, the following steps are performed on the glass substrate (hereinafter, simply referred to as "substrate"): forming a TFT (ThinFilm Transistor) circuit; ^ forming an iT0 (Indium Tin 0xide) electrode as an anode; forming a partition wall Applying a fluid material including a hole transporting material (hereinafter referred to as "hole transport liquid"); forming a hole transport layer by heat treatment; and applying a fluid material containing an organic EL material (hereinafter referred to as "Organic El liquid"); forming an organic EL layer by heat treatment; forming a cathode; and forming an insulating film for sealing. In the manufacture of an organic EL display device, one of the coating devices for applying a hole transporting liquid or an organic EL liquid to a substrate is disclosed in Japanese Patent Laid-Open Publication No. 2002-75640 (Document No.) and Japanese Patent. In JP-A-2003-1 0755 (Document 2), a plurality of nozzles for continuously discharging a fluid material are relatively moved with respect to a substrate, whereby a fluid material is applied onto the substrate. In the apparatus of the above documents 1 and 2, when a plurality of nozzles are moved in the main sweeping direction and the mother moves in the main scanning direction, the substrate is moved in the sub-sweeping direction, thereby The flowable material is applied in a stripe pattern of 97106432 1339133 between the plurality of partition walls formed in the coated area on the substrate. In the coating apparatus of the above documents 1 and 2, the holding means holds three nozzle bodies, and the support shaft perpendicular to the substrate is centered to rotate the holding member to reduce three nozzles. The distance between the sub-scanning directions can narrow the coating pitch of the fluid material. On the other hand, a coating apparatus which moves one nozzle in the main scanning direction and whenever the nozzle is in the main scanning direction is disclosed in Japanese Patent Laid-Open Publication No. Hei. No. Hei. During the movement, the substrate is fed in the sub-scanning direction, whereby the fluid material is applied in a stripe shape in a groove between the plurality of partition walls formed in the coating region on the substrate. In the coating apparatus of the above document 3, the organic EL liquid is applied onto the mask = aS1 设置 disposed between the nozzle and the substrate and coated according to the organic EL liquid on the mask: the trace and the substrate The image of the groove is used to correct the inclination of the substrate so that the main scanning direction of the nozzle coincides with the direction in which the groove extends. , 'It is usually in the above device, the adjustment of the nozzle spacing is performed by the chapter, and the confirmation of the adjustment result is also performed by the operation: 22=, so it is difficult to perform the high-precision distance between the two:: When the confirmation result is confirmed, etc., the rotation of the substrate is performed on the non-coated area of the substrate, and when the number of nozzles is the same as that of the non-coated area, the nozzle spacing adjustment cannot be performed. . — — SUMMARY OF THE INVENTION The present invention is applied to a coating material for a substrate coated with a fluid material, 97106432 7 丄^9133 ', with the purpose of 'without applying a fluid material to the substrate, Adjust the distance between the nozzles of the coating device. The coating device of the present invention includes: a substrate holding portion for holding the substrate; a plurality of nozzles 'continuously discharging the fluid material toward the main surface of the substrate, and a nozzle scanning mechanism for causing the plurality of nozzles to be in contact with the substrate The main scanning direction in which the main surfaces are parallel is relatively moved with respect to the substrate. When the preparation moves in the main scanning direction, the nozzle is parallel to the main surface and the main scanning is performed in the complex IU; Relatively moving in the direction of the drawing; testing the coating part, having the test coating surface tested when the substrate is not coated. " the flow material of the above nozzles; testing the coating part advance and retreat, 'make The test coating unit advances and retreats the plurality of nozzles in the main scanning nozzle:is moving path so that the plurality of nozzles at the time of test coating: the distance between the nozzle faces and the plurality of sheets at the time of coating The distance between the main surfaces is equal, and the imaging unit is offset by the pattern of the fluid material of the test coating surface in the direction of the main scanning finger by the plurality of nozzles. The measuring unit detects the pitch of the plurality of H sub-scanning directions based on the image of the imaging unit; the pitch adjusting mechanism adjusts the pitch of the nozzles in the sub-scanning direction; and the second==replacement mechanism s coats the test According to the present invention, the above-mentioned test coated surface of the cloth portion can adjust the distance between the plurality of nozzles without accurately applying the flow of the substrate. In the embodiment, the coating device further includes: a substrate rotating mechanism 97106432 1339133 rotating mechanism, wherein the substrate holding portion is rotated about a rotation axis perpendicular to the main surface of the substrate; and another imaging unit is obtained in the main body An image of a pattern of a fluid material coated with a 3 - wave J-coated coated surface coated with a scanning, direction, and the above-described test coating layer; and a substrate position adjusting portion according to the image capturing portion The image of the pattern of the flowing metal material obtained by the other imaging unit and the Lu image of the positioning symbol on the main surface of the substrate obtained by the imaging unit and the other image unit to control the image The nozzle scanner rotates the substrate rotating mechanism to adjust the relative position of the substrate relative to the plurality of nozzles. By this, the position adjustment of the substrate can be performed with precision. In another preferred embodiment of the present invention, the test coating portion holds a tape holding portion of a portion of the resin tape, and the test coating (4) the main surface of the portion of the resin tape is replaced by the test coated surface. Mechanism: The tape for feeding the resin tape to the above-mentioned t-coating package is supplied to the invention according to the invention. In the embodiment, the test coating surface is opposite to the foundation of the fluid material and the substrate. The same test surface as the main surface, the test coating portion maintains the test piece of the test piece, the above object and other objects, features, aspects and advantages, and can be referred to the accompanying drawings. The detailed explanation is clear. [Embodiment] Fig. 1 is a view showing a coating apparatus according to an i-th embodiment of the present invention, and Fig. 2 is a coating apparatus! Previous view. The coating apparatus 1 is a device for applying a fluid material including a pixel forming material for a flat display device to a glass substrate 9 (hereinafter simply referred to as "substrate 9") for a flat display device 97106432 9^39133. In the present embodiment, the coating apparatus 1 is an active matrix driving method, organic EUEiecti. Luminescence) A substrate 9 for a display device is coated with a fluid material (the following liquid) containing an organic EL material. As shown in FIGS. 1 and 2, the coating device i includes a substrate holding portion ー, and holds the substrate 9 and the substrate moving mechanism 12 in a predetermined direction in which the main faces of the substrate plates 9 are parallel (that is, in FIG. In the γ direction 1 , referred to as “sub-scanning direction, N) u τ Μ ^ ′), the substrate is rotated horizontally; and the substrate rotating machine 2 is rotated perpendicularly to the main surface of the substrate 9 and (4) the β substrate holding portion In ii, a heating mechanism (not shown) that uses heating benefits is provided. 2 Y includes: a CCD camera 13' is a car disposed on the substrate 9; the individual movement is performed in the h direction; the coating head i 4, the nozzles 17 are directed toward the substrate holding portion 11 ± "upper surface") 91 The main surface flat γ of _9 is continuously discharged and the pan head moving mechanism 15 is applied so that the coating 5 pages 14 are perpendicular to the scanning direction of the substrate (i.e., the long direction in Fig. 1, below) , the helmet "+ is Μ τ liquid receiving portion 16 in the direction of the Tuyou 5"); 2 is set in the moving direction of the 4 (ie, the X direction), and is placed on the substrate The holding portion ^ organic EL liquid; and / both sides and receiving the spacing adjustment mechanism 3 from the coating head, and adjusting the distance between the plurality of nozzles 17 on the upper side 97106432. As shown in Fig. 1, the test coating unit 1 for testing and coating the organic EL liquid from the coating head 14 is provided. The coating device 1 includes a control unit 10 for controlling the above configuration. : Normal computer is the same 'The structure of the control unit 10 is from the following parts or goes: cpu into/from various arithmetic processing; the program executed by memory: (10)...the work area of the different processing # _: the basic program of memory, Recalling the various information of the solid disk; showing various assets = display to the operator; and the input department such as keyboard and mouse. Fig. 3 is a block diagram showing the functions realized by the CPU or the like which is controlled by the program according to the program, and the distance detecting unit iqi and the adjusting unit 2 in Fig. 3; The crucible 102 and the substrate position adjusting unit j 〇3 correspond to functions realized by the equations. Furthermore, the material function can also be implemented by a plurality of computers. The coating head shown in Figure 1 is "upper" 16 nozzles 17 in the figure! A χ χ = are arranged in a direction (i.e., 'main scanning direction) to be slightly shifted from the Y direction (i.e., the 'sub-scanning direction') in the middle of Fig. 1 . The distance between the two nozzles 17 adjacent to the present embodiment in the sub-scanning direction is specific to the pitch between the partition walls extending in the main scanning direction formed on the coated filament region of the substrate 9 (hereinafter referred to as " The distance between the partition walls is ") ^ 3 times. Coating device! The substrate 9 is not coated with the organic red liquid. (4) The test coating unit 2 performs the test coating of the organic liquid, and the pitch adjustment mechanism 3 is controlled as a result of the root coating, thereby adjusting the plurality of solid nozzles 17 The distance between the secondary sweeping cats. The method of adjusting the pitch of the nozzles p is described below. 4 and 5 are front views showing a portion of the coating head 14 and a plan view of 97106432 1339133, respectively. As shown in FIGS. 4 and 5, the coating head 14 is provided with an upper surface 91 facing the substrate 9 (see FIG. " 16 squirts for continuously discharging organic sputum, and a nozzle mounting portion 14 to which the 16 nozzles are attached The mouthpiece portion 141 includes a back plate portion 14" substantially perpendicular to the γ direction, and a lower end portion (i.e., an end portion on the (-2) side) fixed to the lower plate portion 14" and substantially perpendicular to the Z direction. The portion 1412. The 16 nozzles 17 are movably mounted on the guide sample 142 extending from the edge of the horizontal portion 1412 toward the (+Y) direction (that is, the sub-scanning direction) on the respective nozzles 17 (]). The nozzle locking portion 173 is provided on the side, and the position of the second nozzle 17 with respect to the nozzle mounting portion 141 is fixed. In the coating device shown in Fig. 1, the 16 nozzles 17 are fixed = the women's portion 141 (refer to Fig. 4). In the state of FIG. 5), the coating head 14 is moved by the coating head 14 while the organic EL liquid is continuously ejected from the plurality of nozzles 17 while moving in the main scanning direction. Then, the substrate 9 is moved by the substrate. = Stepwise movement in the sub-scanning direction ((9) direction). Then, complex: direction 1 is repeatedly moved in the main scanning direction and the sub-scanning direction with respect to the substrate 9, whereby the organic liquid is applied in a stripe shape to the base 2: the t-plane 91. The coating head moving mechanism 15 of the coating device 1 And " 12 is the nozzle scanning mechanism, so that 16 nozzles j 7

與^裝物—起相對於基板9在主掃描方向及J 描方向上進行相對移動。 旧Relatively moving with respect to the substrate 9 in the main scanning direction and the J drawing direction. old

又,塗佈梦番1 I 之(咖與塗:=間距調整機構3在基板保持部11 土怖頭14個別地設置,16個喷嘴17及喷嘴 97106432 12 1339133 安裝部141(參照圖4及圖5)在噴嘴掃描機構之塗佈頭移 動機構15之作用下,與間距調整機構3相獨立地移動。 換s之,間距調整機構3係與藉由喷嘴掃描機構使塗佈頭 14相對於基板9之相對移動相獨立地配置。Further, the application of the dream cake 1 I (the coffee and the coating:= pitch adjustment mechanism 3 is separately provided in the substrate holding portion 11 of the soil head 14 and the 16 nozzles 17 and the nozzles 97106432 12 1339133 are attached to the mounting portion 141 (see FIG. 4 and FIG. 5) Moving independently of the pitch adjusting mechanism 3 by the coating head moving mechanism 15 of the nozzle scanning mechanism. The pitch adjusting mechanism 3 and the coating head 14 are opposed to the substrate by the nozzle scanning mechanism. The relative movement of 9 is independently configured.

間距調整機構3具備與複數個噴嘴17分別對應之複數 個(本實施形態中為16個)調整頭。目6及圖7係分別表 示間距調整機構3之複數個調整頭中位於最#近(—_ 之一調整頭3G、以及塗佈頭14之_部分的俯視圖及左側 視圖。圖6中’為求容易理解而省略圖4及圖5令的喷嘴 ^定部173之圖示。又,圖7中,為求容易理解,顯示出 喷嘴安裝嘴嘴17< 一部分的包含嘴嘴17之中心 軸的剖面。間距調整機構3中,複數個調整頭30之構造 完全相同。 如圖6及圖7所示,調整頭3〇具備: 3卜從⑼側及⑼側將第!固定部311及第= 314抵接於喷嘴安裝部141之水平部上,以將噴嘴 女裝部141固定;喷嘴抵接部32,從⑼側(亦即,副 描方向之-側)抵接於噴嘴17;噴嘴施壓機構 Π從與喷嘴抵接部32相反側(即,噴嘴丨 ' = 可W描方向之另一側)對喷嘴抵接部32施壓二: 接:移動機構34’對由噴嘴施壓機構33施壓 _ 所,噴嘴抵接部32於副掃描方向之位置加以, 間距凋整機構3在喷嘴安裝冑141被安 31之第1固定部311及第、 疋機構 第部夾持固定的狀態 97106432 173(參照圖圖示)來解除喷嘴鎖定部 332受到控制部1〇 :: 33之调…犯的氣缸 動。藉此,嘴嘴抿接^;·機構控制部1〇2(參照圖3)之驅 別從(-Ό側及^ 喷嘴施壓機構33之桿331分 接部移動機構34=^=7,噴嘴抵接部32在抵 噴嘴施壓機構33對嘴嘴抿接:Y)方向移動,而喷嘴17在 方向移動。接著,::接。"2施壓之狀態下,朝⑼ 用鎖定部摔ίΐ盖Γ 移動所需之距離後,再次利 喷^7=置機構來對喷嘴鎖定部173進行操作,以鎖定 於圖1所示之塗佈梦罢t 側起的第fWni "中凋整噴嘴之間距時,以從(-X) :之==7、:, 個噴嘴之鎖定解除。^縣準噴嘴以外的其他15 向上移動,調整各噴嘴17^置15個噴嘴17於副掃描方 描方向上與基準喷嘴間的距離成置為 構3所進行的喷嘴丨7之位’ 距凋整機 ㈣鳩由以下方法來進行:根離= 試塗佈之有機EL液之影像,藉由圖3所塗矛佈之早=進订測 ,距檢測部101而檢测出各嘴嘴間距離,並工根據 (亦即’根據間距檢測部101之檢測結果) 控制部102來控制間距調整 調鳖機構 34(參照圖6及圖7)。 1機構3之抵接部移動機構 97106432 1339133 如圖1所示,測試塗佈單元2具備:2個測試塗佈平台 部2卜設置於基板保持部u之⑼側,並配置成在X方 向上刀開且在Y方向上大致相同位置上丨以及中央受液部 22,在2個測試塗佈平台部21之間朝χ方向上延伸,並 且兩端部固定於測試㈣平台部21。各龍塗佈平台部 ^經由滑塊211(參照圖8及圖9)而在以向上可移動地 女裝於基板移動機構12之轨道121上,且經由連接部Hi 而固定於基板保持部11±。塗佈裝置!卜基板保持部 U在。基板移動機構12之作用下於γ方向上移動,而測試 塗佈單元2亦與基板保持部i卜起在γ方向上移動。 圖8及圖9係分別表示(+χ)側之測試塗佈平台部^的 左側視圖及後視圖i 8及圖9中亦―併料出基板移動 機構12之一部分,圖9中亦一併描繪出中央受液部。之 P刀又為求方便圓示,圖8及圖9中描繪出測試塗 佈平台部21之外殼212之剖面(圖13及圖15中亦相同)。 圖9中,亦描繪出樹脂膠帶213之刮面。塗佈裝置ι中, 圖1所示的(-X)側之測試塗佈平台部21亦具有與圖8及 圖9所示的( + χ)側之測試塗佈平台部21大致相同之構造。 如圖8及圖9所示’測試塗佈平台部21具備:滑塊21丄, 可移動地安裝於基板移動機構12之軌道121上;外殼 212,固定於滑塊2Π上;樹脂膠帶213 ,其係進行有機 EL液之測試塗佈的測試塗佈構件;膠帶保持部214,在外 豉212之上部對樹脂膠帶213之進行測試塗佈之部位加以 保持;膠帶供給部215,保持未使用之(亦即,未進行有 97106432 丄339133 ^棚液之測试塗佈之)捲狀的樹脂膠帶213,並且將該樹 ^ 2帶213送出而供給至膠帶保持部214;以及膠帶回收 ^ 將,纟二有機EL液測試塗佈之樹脂膠帶213中的使 用凡的部分捲繞回收。本實施形態中,利 = eSulilde)系之樹脂膠帶作為樹脂㈣ 二’二圖9所示’測試塗佈平台部21具備··使勝帶供 。二15及膠帶回收部216旋轉之馬$ 2171及蝸輪 2、以及配置於膠帶保持部214之(+χ)側 測試塗佈平台部21中,配置於勝帶保持部214之(_χ) = =外側受液部218,外側受液部218與配置在膠帶保持部 之側(在(一χ)側之測試塗佈平台部21中,配置於 膠帶保持部214之⑼側)的中央受液部22 一起,配置於 由膠帶保持部214所保持樹脂膠帶213之稍偏向下方(亦 即 ’ (-Ζ)側)。 平台部21中’膠帶供給部215及膠帶回收 216分別藉由馬達2171之酿#° 既定之备♦山圖中之逆時針旋轉 既疋之角度。由此’於膠帶保持部214中,樹脂膠帶 达出既定之長度’樹脂膠帶213之未使用部分 位於膠帶保持部214。如圖8所示,測試塗佈 具備感測器2⑸’其在膠帶供給部215與膠帶保 之間檢測從膠帶供給部215送出之樹脂膝帶213之^山Η 又’於膠π回收部216附近具備感測器2ΐ6ι 定量之樹脂膠帶213經谬帶回收部216之捲繞回收。測既 97106432 16 帶213之之測試塗佈平台部21中,由樹脂膠 m 部214所保持的一部分⑻側之主面, EL= 由複數個喷嘴17(參照圖υ所吐出之有機 L液的測試塗伟面2131 ’將樹脂膠帶213之上述一 ==膠帶保持部214成為具有測試塗佈面⑽之 / = g σ又,供給及回收樹脂膠帶213之膠帶供給部 及㈣回收部216成為將測試塗佈部之測試塗佈面 山1更換成新㈣試塗佈面之測試塗佈面更換機構。換 吕之,測試塗佈單元2具備:於主掃描方向上分開設置之 2個測試塗佈面2131、以及將該2個測試塗佈面2131盥 新的測試塗佈面個別更換之2個測試塗佈面更換機構。,、 圖10係表示圖8及圖9所示之膠帶保持部214附近之 俯視圖。如圖8至圖10所示,膠帶保持部214具備:膠 帶吸附部214卜配置於樹脂膠帶213之(_ζ)側(亦即,鱼 測試塗佈面2131相反側),且吸附樹脂膠帶213;膠帶按 愿部2142,酉己置於樹脂膠帶213之⑽側(亦即,以與測 試塗佈面2131對向之方式配置),且朝向膠帶吸附部2ΐ4ι 按壓樹脂膠帶213之測試塗佈面⑽附近之部位;㈣ 部升降機構2143,使膠帶按壓部2142於ζ方向上升降; 以及按壓部移動機構2144,使膠帶按壓部2142及按壓部 升降機構2143於Υ方向上移動。 勝帶吸附部2!41具備保持樹脂膠帶213並且與基板保 持部11上之基板9之上表面9U參照圖丨)平行的保持平 面2145’如圖10所示,膠帶按壓部2142具備在樹脂膠 97106432 17 1339133 帶213之測試塗佈面2131之( + γ)側及(_γ)側朝χ方向延 伸之2個爪部2146。圖8至圖10所示之膠帶保持部214 .中,在按壓部升降機構2143之作用下,膠帶按壓部2142 •下降,而於膠帶吸附部2141上稍彎曲成朝(+ 2)側凸起之 樹脂膠帶213係由2個爪部2146朝膠帶吸附部2141之伴 持平面2丨45上按壓。 呆 然後,使用膠帶吸附部2141來對樹脂膠帶213進行真 空吸附,藉此樹脂膠帶213之測試塗佈面2131以平滑之 狀態固定於膠帶吸附部2141之保持平面2145上,而$基 板9之上表面91(參照圖υ具有相同高度。測試塗佈^二 部21中,膠帶吸附部2141及膠帶按壓部2142 脂膠帶213之測試塗佈面2131加以固定之膠帶固定部: 在膠帶吸附部2141對樹脂膠帶213吸附之後,膠帶按壓 部2142 II由按壓部升降機構2143上升,與樹脂膠帶213 分開,並且藉由按壓部移動機構2144在(+ 1〇方向上移 鲁動’從測試塗佈面2131上退出。 其次,對在基板9上進行有機EL液塗佈之前的塗佈裝 置1之準備作業加以說明。塗佈裝置j之準備作業,係對 圖1所示之塗佈頭丨4的複數個噴嘴17於副掃描方向上' .間距(以下,稱為「噴嘴間距」)進行調整,並對基板9相 對於喷嘴π之相對位置進行調整後,於基板9上塗 機EL液。目11Α及圖11B係塗佈裝^之準備作業( 噴嘴間距之調整及基板9之位置調整)之流程圖。 塗佈裝置1中’首先’將基板保持部i工自圖i所示之 97106432 18 置朝(-Y)方向移動,而如圖12 之2個測試塗佈平台部21 V,測試塗佈單元2 1 7於主掃γ方& p 〇 α ;塗佈頭14之複數個噴嘴 主知描方向上的移動路徑(亦 、萬 對移動之路徑)下方之測試塗佈位置。Γ2Γ之相 塗佈中2個aD相機13之下方(步驟叫 機構,w/ ’基板移動機構12成為測試塗佈部進退 機構’該測試塗佈部進退機構使 :退 試塗佈部即勝帶保持部214(參照圖8至佈個測 鳴Η於主掃描方向上之移動路徑上進退。再者 = 佈:元2未必與基板保持部丨丨一起移 由= =機構12相獨立地受到驅動之其他測試塗=進J =例如’被設置於無桿式氣缸或基板移動機㈣之軌 Ϊ嘴他移動件)’而使測試塗佈單元2在複數個 、觜7於主掃描方向上之移動路徑上進退。 當測試塗佈單元2位於測試塗佈位置時,開始從塗佈頭 14之複數個喷嘴17朝向(+χ)側之受液部16吐出有機乩 液’並且驅動塗佈頭移動機構15使塗佈頭14開始移動。 然後,從複數個喷嘴17連續地吐出同—種有機此液,並 且如圖12之二點鏈線所示,塗佈頭14在從(+χ)側之受液 邛16上朝(-Χ)側之受液部16上的主掃描方向上移動由 此於測試塗佈單元2之各測試塗佈平台部21上,由膠帶 保持部214所保持的樹脂膠帶213之測試塗佈面2131(參 照圖8至圖1〇)上以條紋狀塗佈有機乩液(步驟si2)〇 此時,如上所述,樹脂膠帶213之測試塗佈面2131與 97106432 19 1339133 : = "上之基板9之上表面9ι具有相同高度,故 =之=複數個噴嘴17與樹脂膠帶213之測試塗佈面 Μ距離、及在基板9上進行有機EL液之 :複數:固喷嘴η與基板9之上表面91之間的距離相等: 機EL ;r ::]試塗佈平台部21之間,從喷嘴17吐出之有 機el液由巾央受液部22承接,在各賴塗料 之測試塗佈面2131與受液部ι6之間, 受液靖參照圖9)承接。 有機EL液由外側 然後,使用CCD相機13來拍攝各測試塗佈平台部2 =塗佈面213卜取得塗佈於測試塗佈面2ΐ3ι上的有機 之之條紋狀圖案之影像,並傳送至控制部W之間距 測部10U參照圖3)(步驟S13)。 :檢測部101根據由⑼側之CCD相機13 :像’找_EL液之各線之中心線,並檢 中心線間於副掃描方向上之各距離(亦即,副掃描 相互鄰接的2個喷嘴17間之各距離),作為噴嘴間距(牛 :Si?。再者,間距檢㈣1〇1對喷嘴間距之檢測可‘ = (-X)側之CCD相機13所取得之影像進行,且亦可根 2個CCD相機13分別取得之影像之雙方而進行(例 如,將根據兩影像所求得的喷嘴17之間距之 噴嘴間距)。 J m邗马 然後,求出基準噴嘴即從(_χ)側起的第8個噴嘴 =他15個嘴嘴Π各自之間的距離’並根據、嗔 嘴間距(如上所述,本實施形態个係指等於心= 97106432 之3倍的距離,以下,稱為「目桿 是否需要調整各嘴嘴17之位置(步驟:」广來確認 :"㈣準噴嘴之相對位置為既定位置喷嘴η 整作業。 ^位置之㈣’而結束噴嘴間距之調 相反,當經判斷需要進行喷嘴 求得的各噴嘴間距 之凋正時,根據以上 ^ ^ 15 ^ ^ ^ 101 ^ ^ 描方向上之欲移動量(以下,僅「「tm)於副掃 =:::。個移動噴嘴均需要進行喷嘴…: 二求出二噴二7广二動量後,停止塗佈頭14吐出有機 機構15之作用中之—點鏈線所示,在塗佈頭移動 調整機構3對向之Γ頭14朝(+Χ)側移動並位於與間距 之各調整頭30上:位置處。然後,於間距調整機構3 正員利上’利用圖6及圖7所千夕总壯加 構31之第1固定部311及第2固定==定機 (+Ό側來夾持噴嘴安裝,141 4侧及 安裝部141加以固定。 千。Ρ 1412,以將噴嘴 動之鎖定部操作機構來解除各移 描方向可移動。^ 173之鎖定’而使各移動噴嘴在副掃 102(參照_ 3Λ者’利用控制部10之調整機構控制部 中,作為間辟1來控制與各移動噴嘴對應之調整頭30 Β 5周整機構3之驅動部的抵接部移動機構34 97106432 21 之步進馬達343,並且 噴嘴抵接部32施壓之狀離下,^由出噴嘴㈣機構33對 求出的移動量二根據由間距檢測部101所 移動嘴嘴於副掃描方向上之移動,=步;S15i)。當各 置再次被鎖定部操作機構鎖定。=寺=移動喷嘴之位 動噴嘴無需進杆仞罢1杜* 再者,虽經判斷15個移 除,且亦不合朝一旧°時,該移動喷嘴之鎖定不會被解 ^ J不會朝副掃描方向上移動。 其後’安裝部固定機 定部314離開噴嘴安裝部141之水^^ 3U及第2固 頭14之噴嘴安裝部141之 ^ 1412,而使塗佈 佈頭14朝( + X)側之受液部16上^除。圖12所示之塗 嘴17吐出有機EL液。 移動’並開始從複數個噴 的於塗佈裝置1中,根據由間距檢測部101所求出 的移動!’藉由除1個基準喷嘴以外的 : 即,所有移動喷嘴)於s丨丨搞—士人 、薄 α π 〇tb η , ' 、田田向上之個別移動來調整喷The pitch adjustment mechanism 3 includes a plurality of (16 in the present embodiment) adjustment heads corresponding to the plurality of nozzles 17, respectively. Item 6 and FIG. 7 show a top view and a left side view, respectively, of the plurality of adjustment heads of the pitch adjustment mechanism 3 (the one of the adjustment heads 3G and the portion of the coating head 14). The illustration of the nozzle fixing portion 173 of Fig. 4 and Fig. 5 is omitted for easy understanding. Further, in Fig. 7, for easy understanding, the nozzle mounting nozzle 17<; part of the central axis including the nozzle 17 is shown. In the cross-section adjusting mechanism 3, the configuration of the plurality of adjusting heads 30 is completely the same. As shown in Fig. 6 and Fig. 7, the adjusting head 3'' is provided with: 3b from the (9) side and the (9) side, the first fixing portion 311 and the second = 314 abuts on the horizontal portion of the nozzle mounting portion 141 to fix the nozzle female portion 141; the nozzle abutting portion 32 abuts against the nozzle 17 from the (9) side (that is, the side of the sub-drawing direction); The pressing mechanism 施 applies pressure to the nozzle abutting portion 32 from the opposite side of the nozzle abutting portion 32 (ie, the other side of the nozzle 丨' = the readable direction): the moving mechanism 34' applies a pressing mechanism to the nozzle 33 is pressed _, the nozzle abutting portion 32 is placed at the position in the sub-scanning direction, and the pitch grading mechanism 3 is placed at the nozzle mounting 胄141 In the state in which the first fixing portion 311 of the 31 and the first and second members of the first and second mechanisms are clamped and fixed, 97106432 173 (see the drawing), the nozzle locking portion 332 is released from the cylinder of the control unit 1: 33. In this case, the nozzle control unit 1〇2 (see FIG. 3) is driven from the (-Ό side and the nozzle 331 of the nozzle pressure applying mechanism 33, the tapping unit moving mechanism 34=^=7, the nozzle The abutting portion 32 moves in the direction of the nozzle nozzle in the Y: direction, and the nozzle 17 moves in the direction. Then, the contact is moved in the direction of the nozzle (9). After the distance required for the movement, the nozzle locking portion 173 is operated again to lock the fWni " When the distance between the nozzles is reversed, the lock is released from (-X) :==7, :, and the other nozzles other than the county quasi-nozzle are moved upward, and each nozzle 17 is adjusted to set 15 nozzles 17 to the sub-scanning side. The distance between the drawing direction and the reference nozzle is set to the position of the nozzle 丨7 of the structure 3, and the distance from the immersion machine (4) is performed by the following method: root separation = trial coating The image of the EL liquid is detected by the early detection of the spear cloth of FIG. 3, and the distance between the nozzles is detected from the detecting unit 101, and the basis is determined (that is, the detection result according to the spacing detecting unit 101) The control unit 102 controls the pitch adjustment and adjustment mechanism 34 (see FIGS. 6 and 7). 1 Abutment portion movement mechanism 97106432 1339133 As shown in FIG. 1, the test coating unit 2 is provided with two test coatings. The platform portion 2 is disposed on the (9) side of the substrate holding portion u, and is disposed so as to be opened in the X direction and substantially at the same position in the Y direction and the central liquid receiving portion 22, in the two test coating platform portions 21 The direction extends in the direction of the yaw and the both ends are fixed to the test (four) platform portion 21. Each of the dragon coating platform portions is movably attached to the rail 121 of the substrate moving mechanism 12 via the slider 211 (see FIGS. 8 and 9), and is fixed to the substrate holding portion 11 via the connecting portion Hi. ±. Coating device! The substrate holding portion U is in. The substrate moving mechanism 12 moves in the γ direction, and the test coating unit 2 also moves in the γ direction with the substrate holding portion i. 8 and 9 are respectively a left side view and a rear view i 8 of the test coating platform portion on the (+χ) side, and a part of the substrate moving mechanism 12 in the same manner as in FIG. 9, which is also shown in FIG. The central fluid receiving portion is depicted. The P-knife is also shown for convenience. The cross-section of the outer casing 212 of the test coating platform portion 21 is depicted in Figs. 8 and 9 (the same applies to Figs. 13 and 15). In Fig. 9, the scraping surface of the resin tape 213 is also depicted. In the coating device ι, the test coating stage portion 21 on the (-X) side shown in Fig. 1 also has substantially the same structure as the test coating platform portion 21 on the (+ χ) side shown in Figs. 8 and 9 . . As shown in FIGS. 8 and 9 , the test coating platform unit 21 includes a slider 21 , which is movably attached to the rail 121 of the substrate moving mechanism 12 , a case 212 fixed to the slider 2 , and a resin tape 213 . This is a test coating member that performs test coating of an organic EL liquid; the tape holding portion 214 holds a portion where the resin tape 213 is subjected to test coating on the upper portion of the outer crucible 212; the tape supply portion 215 remains unused ( That is, the roll-shaped resin tape 213 having the test coating of 97106432 丄339133 ^ shed liquid is not carried out, and the tree 2 213 is fed out and supplied to the tape holding portion 214; and the tape is recovered, 纟The two organic EL liquid test coated resin tape 213 was used for partial winding recovery. In the present embodiment, a resin tape of the type of eSulilde is used as a resin (four). The second embodiment of the test coating unit portion 21 is provided with a winning tape. The second 15 and the tape collecting portion 216 are rotated by the horse $2171 and the worm wheel 2, and are disposed in the (+χ) side test coating platform portion 21 of the tape holding portion 214, and are disposed in the winning tape holding portion 214 (_χ) = = The outer liquid receiving portion 218, the outer liquid receiving portion 218, and the central liquid receiving portion disposed on the side of the tape holding portion (on the side of the test coating platform portion 21 on the side of the tape holding portion 214) 22 together, it is disposed slightly below the resin tape 213 held by the tape holding portion 214 (that is, the '(-Ζ) side). In the platform portion 21, the tape supply portion 215 and the tape recovery portion 216 are respectively rotated by the counter rotation of the motor 2171 by the rotation of the motor 2171. Thus, in the tape holding portion 214, the resin tape reaches a predetermined length. The unused portion of the resin tape 213 is located in the tape holding portion 214. As shown in FIG. 8, the test coating is provided with a sensor 2 (5)' which detects the resin knee band 213 which is sent out from the tape supply portion 215 between the tape supply portion 215 and the tape holder, and the rubber π collection portion 216 The resin tape 213 having a sensor 2 ΐ 6 ι in the vicinity is recovered by winding of the tape collecting portion 216. In the test coating platform portion 21 of the belt 97106432 16 belt 213, the main surface of the portion (8) side held by the resin rubber m portion 214, EL = a plurality of nozzles 17 (refer to the organic liquid L discharged from the drawing) Test of the coated surface 2131 'The above-mentioned one of the resin tape 213 = the tape holding portion 214 becomes / = g σ having the test coated surface (10), and the tape supply portion and the (four) recovery portion 216 for supplying and recovering the resin tape 213 become The test coating surface of the test coating section is replaced with a new (four) test coating surface test coating surface replacement mechanism. For the Lu, the test coating unit 2 is provided with two test coatings separately disposed in the main scanning direction. The cloth surface 2131 and the two test coated surface replacement mechanisms for individually replacing the test coating surfaces of the two test coated surfaces 2131. FIG. 10 shows the tape holding portion shown in FIGS. 8 and 9. As shown in FIG. 8 to FIG. 10, the tape holding portion 214 includes a tape suction portion 214 disposed on the (_ζ) side of the resin tape 213 (that is, on the opposite side of the fish test coated surface 2131), and Adsorbing resin tape 213; tape according to the wish section 2142, 酉 has been placed in the resin glue The (10) side of the belt 213 (that is, disposed opposite to the test coated surface 2131), and pressing the vicinity of the test coated surface (10) of the resin tape 213 toward the tape suction portion 2ΐ4ι; (4) the elevating mechanism 2143 The tape pressing portion 2142 is moved up and down in the ζ direction, and the pressing portion moving mechanism 2144 moves the tape pressing portion 2142 and the pressing portion lifting mechanism 2143 in the Υ direction. The winning tape suction portion 2! 41 is provided with the holding resin tape 213 and held by the substrate. The upper surface 9U of the substrate 9 on the portion 11 is referred to as a parallel holding plane 2145'. As shown in FIG. 10, the tape pressing portion 2142 is provided with a test coated surface 2131 of a resin adhesive 97106432 17 1339133 tape 213 (+ γ). Two claw portions 2146 extending in the χ direction on the side and the (_γ) side. In the tape holding portion 214 shown in Figs. 8 to 10, the tape pressing portion 2142 is lowered by the pressing portion elevating mechanism 2143, and is slightly curved toward the (+2) side on the tape suction portion 2141. The resin tape 213 is pressed by the two claw portions 2146 toward the accompanying plane 2丨45 of the tape suction portion 2141. Then, the resin tape 213 is vacuum-adsorbed by the tape suction portion 2141, whereby the test coated surface 2131 of the resin tape 213 is fixed in a smooth state to the holding plane 2145 of the tape adsorption portion 2141, and above the substrate 9 The surface 91 (see FIG. υ has the same height. In the test coating 2, the tape adsorption portion 2141 and the tape pressing portion 2142, the tape coating portion 2131 of the adhesive tape 213 is fixed to the tape fixing portion: in the tape adsorption portion 2141 After the resin tape 213 is adsorbed, the tape pressing portion 2142 II is lifted by the pressing portion lifting mechanism 2143, separated from the resin tape 213, and moved by the pressing portion moving mechanism 2144 in the (+ 1 〇 direction) from the test coated surface 2131. Next, the preparation operation of the coating device 1 before the application of the organic EL liquid on the substrate 9 will be described. The preparation operation of the coating device j is the plural of the coating head 4 shown in Fig. 1. The nozzles 17 are adjusted in the sub-scanning direction. The pitch (hereinafter referred to as "nozzle pitch") is adjusted, and the relative position of the substrate 9 with respect to the nozzle π is adjusted, and the EL liquid is applied to the substrate 9. Fig. 11B and Fig. 11B are flow charts of the preparation operation of the coating device (the adjustment of the nozzle pitch and the position adjustment of the substrate 9). In the coating device 1, the substrate holding portion i is firstly operated as shown in Fig. 18 is moved in the (-Y) direction, and as shown in Fig. 12, the test coating unit portion 21 V, the test coating unit 2 17 is in the main sweep γ square & p 〇 α; the plurality of coating heads 14 The nozzle is in the direction of the movement of the nozzle (also, the path of the pair of movements). The test coating position is below the two aD cameras 13 in the phase coating (step called mechanism, w/ 'substrate moving mechanism 12) The test coating unit advancing and retracting mechanism ‘the test coating unit advancing and retracting mechanism: the retracting coating unit, that is, the winning belt holding unit 214 (refer to FIG. 8 to the cloth moving sound in the main scanning direction). = cloth: element 2 does not necessarily move with the substrate holding portion 由 by = = mechanism 12 is independently driven to drive other test coating = J = for example, is set on the pole of the rodless cylinder or substrate moving machine (four) The mouth moves the part)', so that the test coating unit 2 is in the plural, 觜7 in the main scanning direction Advancing and retreating on the moving path. When the test coating unit 2 is at the test coating position, the organic sputum is ejected from the plurality of nozzles 17 of the coating head 14 toward the liquid receiving portion 16 on the (+χ) side and the coating head is driven. The moving mechanism 15 causes the coating head 14 to start moving. Then, the same organic liquid is continuously discharged from a plurality of nozzles 17, and as shown by the two-point chain line of Fig. 12, the coating head 14 is at (+χ). The side of the liquid receiver 16 is moved in the main scanning direction on the liquid-receiving portion 16 on the (-Χ) side, thereby being held by the tape holding portion 214 on each of the test coating platform portions 21 of the test coating unit 2. The test coating surface 2131 (refer to FIG. 8 to FIG. 1) of the resin tape 213 is coated with an organic mash in a stripe shape (step si2). At this time, as described above, the test coated surface 2131 of the resin tape 213 is 97106432 19 1339133 : = "The upper surface 9 of the upper substrate 9 has the same height, so = the distance between the plurality of nozzles 17 and the test coated surface of the resin tape 213, and the organic EL liquid on the substrate 9: The complex: the distance between the solid nozzle η and the upper surface 91 of the substrate 9 is equal: machine EL; r ::] test coating flat Between the portions 21, 17 discharged from the nozzle of the liquid-liquid organic el receiving portion 22 receiving the towels central, 2131 and between the fluid receiving portion ι6, a liquid Jing reference to FIG. 9) in the receiving test depends on the coated surface of the coating. The organic EL liquid is photographed from the outside and then the CCD camera 13 is used to photograph each of the test coating platform portions 2 = the coated surface 213 to obtain an image of the organic striped pattern applied on the test coated surface 2ΐ3ι, and transmitted to the control. The portion W between the portions W is referred to FIG. 3) (step S13). The detecting unit 101 detects the respective distances between the center lines in the sub-scanning direction based on the center line of each line of the CCD camera 13 on the (9) side, such as the 'finding_EL liquid (that is, two nozzles adjacent to each other in the sub-scanning). 17 distances are used as the nozzle pitch (bovine: Si?. Furthermore, the distance detection (4) 1〇1 detects the nozzle pitch and can be performed on the image obtained by the CCD camera 13 on the '= (-X) side, and It is performed by both the images acquired by the two CCD cameras 13 (for example, the nozzle pitch of the distance between the nozzles 17 obtained from the two images). Then, the reference nozzle is obtained from the (_χ) side. The 8th nozzle = the distance between the 15 mouths and the mouths of each of them 15 and according to the pitch of the mouth (as mentioned above, this embodiment refers to a distance equal to 3 times the heart = 97106432, hereinafter referred to as "Do you want to adjust the position of each nozzle 17? (Step: "To confirm: "4" The relative position of the quasi-nozzle is the η operation of the nozzle at the predetermined position. ^The position (4)' and the end of the nozzle spacing is reversed. It is judged that it is necessary to perform the nozzle pitch obtained by the nozzle, according to Above ^ ^ 15 ^ ^ ^ 101 ^ ^ The amount of movement in the direction of the drawing (hereinafter, only ""tm) in the sub-scan =:::. All moving nozzles need to be nozzles...: Two find two sprays and two 7 wide After the second momentum, the action of stopping the coating head 14 to discharge the organic mechanism 15 is indicated by the dotted chain, and the coating head movement adjusting mechanism 3 moves toward the (+Χ) side of the head 14 and is positioned at the distance. Each of the adjustment heads 30 is at a position. Then, the pitch adjustment mechanism 3 is used by the first fixed portion 311 and the second fixed == fixed machine (using the first and second strong additions 31 of FIGS. 6 and 7). + Ό 来 夹持 喷嘴 141 141 141 141 141 141 141 141 141 141 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 The moving nozzle is controlled by the sub-sweep 102 (refer to the adjustment mechanism control unit of the control unit 10 as the switch 1 to control the contact between the drive unit 30 of the adjustment head 30 Β 5 and the entire mechanism 3 corresponding to each of the moving nozzles. The stepping motor 343 of the moving mechanism 34 97106432 21, and the nozzle abutting portion 32 is pressed downward, and the nozzle (4) mechanism 33 The calculated movement amount 2 is based on the movement of the nozzle moved by the pitch detecting unit 101 in the sub-scanning direction, = step; S15i). When each position is locked by the locking portion operating mechanism again. = Temple = moving nozzle position The nozzle does not need to enter the rod 仞 1 * 再 再 再 再 再 再 杜 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再 再The mounting portion fixing portion 314 is separated from the water fitting portion 141 of the nozzle mounting portion 141 and the nozzle mounting portion 141 of the second fixing head 14 so that the coating head 14 faces the liquid receiving portion 16 on the (+X) side. On ^ divided. The applicator nozzle 17 shown in Fig. 12 discharges the organic EL liquid. The movement is started and started from a plurality of spray coating devices 1 based on the movement determined by the pitch detecting unit 101! 'Adjusting by the addition of one reference nozzle: that is, all moving nozzles, s丨丨 — 士 士 士 士 士 士 士 士 士 薄 薄 薄 薄 个别 个别 个别 个别 个别 个别 个别 个别 个别 个别 个别 个别 个别 个别 个别 个别 个别 个别 个别

鳥間距。本貫施形態中,於12〇一7〇〇 J 調整喷嘴間距。再者,塗佈 1圍内 4衣置1中’亦可使16個喷嘴 Π均在副知描方向上進行個別移動來調整噴嘴間距。 。。當,動嘴嘴於副掃描方向上之移動結束時,在測試塗佈 Γ 各測試塗佈平台部21上,圖8至圖H)所示的膠 =附部2⑷對樹脂膠帶213之吸附被解除,並且如圖 2=,v在、按壓部移動機構2144之作用下,膠帶按塵部 J42朝(-Y)方向移動而位於膠帶吸附部2⑷之上方 著’藉由圖9所示馬遠$?】71 η。 ,運2171之驅動,圓8至圖1〇所示之 97106432 22 1339133 膠帶保持部214中的樹脂膠帶213朝(+ 〇方向傳送既定之 長度,新的測試塗佈面2131位於膠帶吸附部2141上。 其次,在按壓部升降機構2143之作用下,膠帶按壓部 2142下降並朝向膠帶吸附部2141按壓樹脂膠帶213,並 士在膠帶吸附部2141之作用下,樹脂膠帶213被吸附, 藉此測試塗佈面更換成新的測試塗佈面2131並固定於保 持平面2145上(步驟S152)。當樹脂膠帶213被吸附後, 膠帶按壓部2142從測試塗佈面2131上退出。 1將測試塗佈面2131更換後,返回至步驟犯,塗佈頭 14 一邊從複數個喷嘴n吐出有機乩液一邊朝(_χ)方向 移動,在測試塗饰單元2之2個測試塗佈面2131上塗佈 有機EL液(步驟S12)。接著,藉由CCD相機13而取得測 試塗佈面2131上之有«EL液之圖案影像,並利用間距檢 測部101來檢測喷嘴間距,以確認是否需要對喷嘴位置進 行再調整(步驟S13〜S15)。然後,反覆進行以下動作, 直至判斷為無需調整喷嘴位置為止,即,在間距調整機構 3之作用下喷冑17朝副掃描方向之移動、及測試塗佈面 1之更換(步驟S151、S152),以及於測試塗佈面2131 上有機EL液之㈣、喷嘴間距之檢測、及是否需要調整 噴嘴位置之確認(步驟S丨2〜si5)。 當之㈣結束時’在由2個⑽相機13最後 斤取知之測„式塗佈面2] 31上的有機液圖案的2個影像 •係判斷為無需調整嘴嘴間距時之影像,以下,稱 為取終衫像」,分別藉由控制部i 0之基板位置調整 97106432 23 丄339133 部1〇3(參照圖3)而求出影像中的有機乩液之圖 描方向上之位置。接著,以由(+χ)側之CCD相機、13^斤 攝之最終影像為基準,求出由(_χ)側之 CCD相機13所拍 攝的最終影像中之圖案位置於副掃描方向上之偏移量(以 下,稱為「位置偏移量」)(步驟Si6)。 其次,在(-X)側之攝像部移動機構丨3 a受到基板位 整部103之控制下,(_χ)側之⑽相機13朝副掃描方向 移動與位置偏移量相等之距離,而調整2㈤⑽ =相^置(步驟S17)。藉此,2個哪相機13之攝像區 液之線平行。具體而言,當(_χ)側之⑽相機13的最炊L ^二的有機EL液之圖案與⑼側之最終影像相_ ()側偏移時’(-X)側之CCD相機13朝㈠)方向移動, 而當朝⑼側偏移時,(_χ)側之⑽相機13朝⑼ ,動。再者’塗佈裝中的CCD相機13之位置調整可 (-X)側之CCD相機13被固定之狀態下,藉由移動( 侧之CCD相機13而谁;#丄 ) 移動來進行。 ’亦可猎由使兩方之CCD相機13 :CCD相機13之位置調整結束時,在基板移動機構a 用下,基板9與基板保持部u及測試 =7:移動’並且如圖1中實線所示,基板9位於 個CCD相機13之下方(步驟_。此時於基板9之上 非珍你ίΛ’在(;+Υ)側之2個角部附近且塗佈區域外侧之 ^ V上所没置的2個定位用記號93(參照圖12), 97106432 24 ⑴ 9133 刀別位於2個CCD相機13之攝像區域内。在基板g上,2 個定位用記號93之中心連結而成之直線與塗佈區域之複 數個槽平行。 然後,2個CCD相機13在基板位置調整部丨〇3之控制 下,對基板9上之2個定位用記號93進行拍攝(步驟 S19)。其次,根據2個定位用記號93之影像而求出定位 用a己號93之中心間在副掃描方向上之距離,並根據預先 圮憶的定位用記號93之中心間在主掃描方向上的距離, 求出基板9於旋轉方向上之偏移量(亦即,傾斜度)。然 後,基板位置調整部103根據基板9之於旋轉方向上之偏 移里控制基板旋轉機構12a而使基板9發生旋轉,藉此2 個定位用記號93相對於CCD相機13於副掃描方向上之相 對位置相等(步驟S20)。 如以上所描述,塗佈裝置i中,2個CCD相機13相對 於複數個喷嘴17(從複數個喷嘴17吐出並塗佈於基板9 ^之有機EL液之線)於副掃描方向上的相對位置彼此相 等。因此,2個定位用記號93相對於CCD相機13於副掃 祂方向之相對位置彼此相等,藉此2個定位用記號⑽相 對於複數個喷嘴17(從複數個噴嘴17吐出並塗佈於基板9 ^之有機EL液之線)於副掃描方向上的相對位置彼此相 等。亦即,基板9上塗佈區域之間隔壁間的槽相對於主掃 描方向上的複數個喷嘴17之移動軌跡平行。 如此,塗佈裝置i中,根據由2個CCD相機13所取得 的有機EL液圖案之影像以及由2個⑽相機i 3所取得的 97106432 25 1339133 位之影像,基板移動 ^ 疋轉機構12a受到控制部10之基板位置锎 ς β 103/參照圖3)之控制’藉此來調整基板9相對於複 數個喷嘴1 7之相對位置。 、 7田土板9之位置5周整結束時,在塗佈頭移動機構 =之作料’塗佈頭14—邊從複數個噴嘴17連續地吐冓 出1機EL液邊朝主掃描方向移動,並且每當 月,!方向上移動…則基板9由基板移動機構 12朝副知描方向(( + γ)方向1卜牛 喑峰h 進移動。然後,複數個 ^ Π反復進行相對於基板9於主掃描方向及副掃描方 塗二H或直至基板9位於圖1中之二點鏈線所示之 m立置為止,藉此將有機EL液以 板9上。 土呷π丞 如上所說明’利用塗佈裝置i對測試塗饰單元2之 ,佈面2^塗佈有機⑶液,並根據由⑽相機13所取 :的測試塗佈面2131上之有㈣液圖案的影像而檢測噴 )二距:再根據該檢測結果,利用間距調整機構3來調整 硬數個育嘴17於副掃描方向上的間距。藉此,可在不對 基板9塗佈有機EL液之情況下’高精度地調整塗佈裝置 1之複數個喷嘴17於副掃描方向上的間距(亦即,噴嘴間 距)〇 、 敕=果為’與在基板上之非塗佈區域進行測試塗佈以調 :噴嘴間距之情況不同’可在不考慮嘴嘴數量與非塗佈區 域之大小間的關係(亦即,測試塗佈所需區域之大小與基 97106432 26 1339133 板上的可測試塗佈區域之大小之間的關係)的情況下,高 精度地調整喷嘴間距。因此,塗佈裝置丨之構造尤其適合 •具備數個(例如8個以上)喷嘴之塗佈裝置。又,塗佈裝置 、巾由於不對基板進行測試塗佈,故可防止經測試塗佈 ,f機E L液乾燥後可能會由有機E L材料產生之微粒,可 提高對基板9之塗佈品質。 土饰裝置1中’由於測試塗佈時的噴嘴17與測試塗佈 _面2+131之間於z方向之距離和對基板9塗佈有機乩液時 2賀嘴Π與基板9之上表面91之間於z方向之距離相 ,,故有機EL液塗佈於基板9上時的有機乩液之吐出距 離與測試塗佈時的吐出距離相等。假設,於基板上塗佈時 及測試塗佈時的吐出距離之差較大,則經塗佈的複數個有 機EL液之線之間距可能會發生變化,但本實施形態之塗 佈裝置1中,可防止於基板9上塗佈時及測試塗佈時的吐 出距離之差所造成之影響,故可更高精度地調整喷嘴門 •距。再者,塗佈裝置!中,只要在可防止吐出距離相對^ 有機EL液之線間距之差所造成影響之範圍内,則即便測 試塗佈時的噴嘴17與測試塗佈面2131之間於z方向上之 距離、和對基板9塗佈有機EL液時的噴嘴17與基板g之 表面91之間於z方向之距離稍有不同,亦可視 距離實質上相等。 迷 册=塗佈平台部21中,將測試塗佈面2131作為樹脂膠 贡之主面,利用膠帶供給部215將樹脂膠帶213送出 至膠帶保持部214,藉此可容易將使用完的(亦即,進行 97106432 27 1339133 有機EL液之測試塗佈後的)測試塗佈面2i3i更換成新的 未使用之測。式塗佈面。在膠帶保持部2 Η中,利用膠帶吸 附部2141及膠帶按壓部2142來固定樹脂膠帶213之測試 塗佈面2131並使其平坦,且使測試塗佈面2131與複數個 喷觜17之間的距離保持固定’藉此可更高精度地檢測喷 則4 k佈單元2中,測試塗佈平台部2丨之測試塗佈面 1在由k佈碩14進行測試塗佈時,會與複數個喷嘴^ 7 於主掃描方向上的相對移動路徑之僅一部分重疊。換言 "於k佈碩移動機構丨5作用下的複數個噴嘴17之移動 路徑上’纟主掃&方向之僅—部分上配置測試塗佈面 131因此’可使塗佈有機EL液之測試塗佈面之面積變 喷嘴4塗佈^ 2131之使用量。其結果可降低 噴幫間距凋整所需之成本。 从塗:裝置1中,根據由控制部10之間距檢測部101所 間距,利用調整機構控制部102來控制間距 嘴間距。h之果抵:二移動機構34 ’由此可自動地調整噴 育嘴間距調整所需之作業時間及勞力。又,利用門::: 喷嘴17全體)朝副^ Λ 以外的全體(或複數個 接的喷嘴17 向上進行個別移動’藉此可對鄰 度地調整。a 、田▼鈾方向上的各距離進行個別且高精 攻置1中’根據在主掃財向上分開的2個測試塗 97106432 28 佈面2131上所塗佈的有趟 板9上與主掃描方向像'«及在基 像,來調整基板9相對二=2二定位用記號93之影 複數個喷嘴17所塗佈之有機 :對位置’由此使由 域上的複數個槽精度:好有:液二與基板9之塗佈區 地千 可咼精度地進行基板 、隹。又,由於可利用喷嘴間距調整用之構成來 進订基板9之=置調整,故可簡化塗佈裝置!之構造。 更進步,藉由具有相同構造之2個測試塗佈平台部 21而構成將2個測試塗佈面2131分別固^之2個膠帶保 持。P 214、以及將2個測試塗佈面2131分別更換之2個 膠帶供給部215及2個膠帶回收部216,由此可使塗佈裝 置1之構造更加簡化。 其次,對本發明第2實施形態之塗佈裝置加以說明。第 2實施形態之塗佈裝置具備與圖8及圖9所示之測試塗佈 平台部21之構造不同的2個測試塗佈平台部21 a,而其 籲他構成與圖1至圖7所示之塗佈褒置1相同,在以下說明 中標註相同符號。 圖13係表示(+χ)側之測試塗佈平台部21a之左側視 圖。圖13中亦一併描繪出基板移動機構12之一部分。第 2實施形態之塗佈裝置中,(_χ)側之測試塗佈平台部21& 亦與圖13所示之(+χ)側之測試塗佈平台部2ia具有相同 之構造。 如圖13所示,測試塗佈平台部21 a具備:滑塊211, 可移動地安裝於基板移動機構12之執道121上;外殼 97106432 29 1339133 212 ’固定於滑塊211上;測試片213a,係進行有機El • 液之測試塗佈的測試塗佈構件;測試片保持部214a,在 - 外设212之上部對測试片213 a加以保持;測試片收容部 .215a’係於測試片213a之(-Z)側將未使用之(亦即,未進 行有機EL液之測試塗佈之)複數個測試片213b(以下,稱 為「等待測試片213b」)疊層並保持的匣盒(magazine) ^ 壓出機構216a,係將由測試片保持部214a所保持的測試 片213a朝向( + Y)方向壓出之氣缸;以及測試片回收部 217a’收取由壓出機構216a從測試片保持部21乜所壓^ 之測試片213a。 測試片213a係由相對於有機EL液之漂濕性與基板9相 同之材料形成的’本實施形態中’係由與基板9同材 玻璃所形成。X,於測試片213a的⑽側之主面上 =與有機EL液塗佈前形成於基板9上之薄膜(例如/ 返電洞輸送材料之) # pq + $ , 側之主…:ί 專膜’而測試片213wz) 面:、基板9之上表面91各自相 =(亦即’大致相等)。再者,亦可藉由適宜選= 、忒片213a的(+Ζ)側之主面盥美柘 二^二:::有㈣液之恤相同:: 測試塗佈平薄膜。Bird spacing. In the present embodiment, the nozzle pitch is adjusted at 12〇7〇〇 J. Further, in the case of coating 1 in the clothes, the 16 nozzles can be individually moved in the direction of the sub-trace to adjust the nozzle pitch. . . When the movement of the movable nozzle in the sub-scanning direction is completed, the adsorption of the resin tape 213 by the glue = attachment portion 2 (4) shown in Figs. 8 to H) is released on each of the test coating platform portions 21 of the test coating. 2, v, under the action of the pressing portion moving mechanism 2144, the tape moves in the (-Y) direction by the dust portion J42 and is positioned above the tape suction portion 2 (4) by the horse far $ shown in FIG. 】 71 η. Driven by the drive 2171, the resin tape 213 in the tape holding portion 214 shown in the circle 8 to FIG. 1A is conveyed toward the (+ 〇 direction) by a predetermined length, and the new test coated surface 2131 is placed on the tape suction portion 2141. Next, under the action of the pressing portion elevating mechanism 2143, the tape pressing portion 2142 is lowered and the resin tape 213 is pressed toward the tape suction portion 2141, and the resin tape 213 is adsorbed by the tape suction portion 2141, thereby applying the test coating. The cloth surface is replaced with a new test coated surface 2131 and fixed on the holding flat surface 2145 (step S152). When the resin tape 213 is adsorbed, the tape pressing portion 2142 is withdrawn from the test coated surface 2131. 1 Test coated surface After the replacement of 2131, the process returns to the step, and the coating head 14 is moved toward the (_χ) direction while discharging the organic sputum from the plurality of nozzles n, and the organic EL is applied to the two test coated surfaces 2131 of the test coating unit 2. Liquid (step S12). Next, the CCD camera 13 obtains a pattern image of the «EL liquid on the test coated surface 2131, and detects the nozzle pitch by the pitch detecting unit 101 to confirm whether the nozzle is required. Then, the adjustment is performed (steps S13 to S15). Then, the following operations are repeated until it is determined that the nozzle position is not required to be adjusted, that is, the movement of the squeegee 17 in the sub-scanning direction by the pitch adjustment mechanism 3, and the test coating Replacement of the cloth surface 1 (steps S151, S152), and (4) of the organic EL liquid on the test coated surface 2131, detection of the nozzle pitch, and confirmation of whether or not the nozzle position needs to be adjusted (steps S2 to Si5). (4) At the end, the two images of the organic liquid pattern on the "measured surface 2" of the two (10) cameras 13 are judged to be images without adjusting the nozzle pitch, hereinafter referred to as The position of the organic sputum in the image is determined by the substrate position adjustment 97106432 23 丄 339133 portion 1 〇 3 (see FIG. 3) of the control unit i 0. Then, the position in the drawing direction of the organic sputum in the image is obtained. The offset of the pattern position in the final image captured by the CCD camera 13 on the (_χ) side in the sub-scanning direction is obtained from the CCD camera on the (+χ) side and the final image of the 13-inch camera. Hereinafter, it is called "position offset") (step S I6) Next, the imaging unit moving mechanism 丨3a on the (-X) side is controlled by the substrate positioning unit 103, and the (10) camera 13 moves in the sub-scanning direction by a distance equal to the positional shift amount. And adjust 2 (5) (10) = phase setting (step S17). Thereby, the line of the camera area of the two cameras 13 is parallel. Specifically, when the (_χ) side (10) camera 13 is the most 炊 L ^ two organic The pattern of the EL liquid and the final image on the (9) side are shifted from the ((X) side of the CCD camera 13 toward (1)), and when shifted toward the (9) side, the (10) side (10) camera 13 (9), moving. Further, in the state where the position adjustment of the CCD camera 13 in the coating apparatus is fixed, the CCD camera 13 on the (-X) side is moved, and the movement is performed by moving (the side CCD camera 13; #丄). 'Also can be hunted by both CCD cameras 13 : CCD camera 13 position adjustment is completed, under the substrate moving mechanism a, the substrate 9 and the substrate holding portion u and test = 7: move ' and as shown in Figure 1 As shown by the line, the substrate 9 is located below the CCD camera 13 (step _. At this time, on the substrate 9, it is not near the two corners of the (;+Υ) side and the outside of the coating area ^ V Two positioning marks 93 (see Fig. 12), 97106432 24 (1) 9133 are not placed in the imaging area of the two CCD cameras 13. On the substrate g, the centers of the two positioning marks 93 are connected. The straight line is parallel to the plurality of grooves of the coating area. Then, the two CCD cameras 13 image the two positioning marks 93 on the substrate 9 under the control of the substrate position adjusting unit 3 (step S19). The distance between the centers of the positioning a-numbers 93 in the sub-scanning direction is obtained from the images of the two positioning marks 93, and the distance between the centers of the positioning marks 93 in the main scanning direction is based on the previous recall. The offset amount (that is, the inclination) of the substrate 9 in the rotational direction is obtained. Then, the substrate position The adjustment unit 103 rotates the substrate 9 by controlling the substrate rotation mechanism 12a in accordance with the offset of the substrate 9 in the rotational direction, whereby the relative positions of the two positioning marks 93 with respect to the CCD camera 13 in the sub-scanning direction are equal. (Step S20) As described above, in the coating device i, the two CCD cameras 13 are opposed to the plurality of nozzles 17 (the lines of the organic EL liquid discharged from the plurality of nozzles 17 and applied to the substrate 9) The relative positions in the scanning direction are equal to each other. Therefore, the relative positions of the two positioning marks 93 with respect to the CCD camera 13 in the direction of the sub-sweeping are equal to each other, whereby the two positioning marks (10) are opposed to the plurality of nozzles 17 (from plural The relative positions of the nozzles 17 and the organic EL liquid applied to the substrate 9 are equal to each other in the sub-scanning direction. That is, the grooves between the partition walls of the coated region on the substrate 9 are opposed to the main scanning direction. The movement trajectories of the plurality of nozzles 17 are parallel. Thus, in the coating device i, based on the image of the organic EL liquid pattern obtained by the two CCD cameras 13, and the 97106432 25 1339133 obtained by the two (10) cameras i 3 Image, base Cloth rotation movement mechanism 12a ^ of the substrate 10 by the control of the position cf ς β 103 / Control Referring to FIG 3) of 'whereby to adjust the relative position 17 with respect to the plurality of nozzles 9 complex substrates. When the position of the 7th soil plate 9 is completed at the end of the 5th week, the coating head moving mechanism = the coating head 14 - continuously ejects 1 EL liquid from the plurality of nozzles 17 and moves in the main scanning direction. And every month, in the direction of the movement, the substrate 9 is moved by the substrate moving mechanism 12 toward the sub-study direction (( + γ) direction 1 喑 喑 peak h. Then, a plurality of Π are repeatedly performed with respect to the substrate 9 for main scanning The direction and the sub-scanning side are coated with two H or until the substrate 9 is positioned at the m-line shown by the two-dot chain line in Fig. 1, whereby the organic EL liquid is applied to the plate 9. The soil 呷 丞 is as described above. The cloth device i is used to test the finishing unit 2, the cloth surface 2 is coated with the organic (3) liquid, and the spray is detected according to the image of the (four) liquid pattern on the test coated surface 2131 taken by the camera 10 (10). Further, based on the detection result, the pitch adjustment mechanism 3 is used to adjust the pitch of the plurality of nozzles 17 in the sub-scanning direction. Thereby, the pitch of the plurality of nozzles 17 of the coating device 1 in the sub-scanning direction (that is, the nozzle pitch) can be adjusted with high precision without applying the organic EL liquid to the substrate 9 〇, 敕 = 'Test coating with non-coated areas on the substrate to adjust: different nozzle spacing' can be used regardless of the relationship between the number of nozzles and the size of the non-coated area (ie, testing the area required for coating) In the case of the relationship between the size and the size of the testable coating area on the substrate 97106432 26 1339133, the nozzle pitch is adjusted with high precision. Therefore, the structure of the coating device is particularly suitable for a coating device having a plurality of nozzles (for example, eight or more). Further, since the coating device and the towel are not subjected to test coating on the substrate, it is possible to prevent the particles which are generated from the organic EL material after the test coating is dried, and the coating quality of the substrate 9 can be improved. In the earthenware apparatus 1 'the distance between the nozzle 17 at the time of test coating and the test coating surface 2+131 in the z direction and the application of the organic sputum to the substrate 9 and the upper surface of the substrate 9 Since the distance between the 91 and the z direction is opposite, the discharge distance of the organic sputum when the organic EL liquid is applied onto the substrate 9 is equal to the discharge distance at the time of test coating. Assuming that the difference in the discharge distance between the coating on the substrate and the test coating is large, the distance between the lines of the plurality of coated organic EL liquids may vary, but in the coating device 1 of the present embodiment. The influence of the difference in the discharge distance on the substrate 9 and the test coating can be prevented, so that the nozzle door distance can be adjusted with higher precision. Furthermore, the coating device! In the range in which the influence of the difference in the distance between the discharge distance and the line distance of the organic EL liquid can be prevented, the distance between the nozzle 17 and the test coated surface 2131 in the z direction during the test coating, and The distance between the nozzle 17 when the organic EL liquid is applied to the substrate 9 and the surface 91 of the substrate g is slightly different in the z direction, and the visible distance is substantially equal. In the coating platform portion 21, the test coated surface 2131 is used as the main surface of the resin glue, and the resin tape 213 is sent out to the tape holding portion 214 by the tape supply portion 215, whereby it can be easily used (also That is, the test coated surface 2i3i after the test coating of the 97106432 27 1339133 organic EL liquid was replaced with a new unused test. Coated surface. In the tape holding portion 2, the test coated surface 2131 of the resin tape 213 is fixed and flattened by the tape suction portion 2141 and the tape pressing portion 2142, and the test coated surface 2131 is interposed between the test coated surface 2131 and the plurality of squirts 17. The distance is kept fixed', whereby the spray can be detected with higher precision. In the 4 k cloth unit 2, the test coated surface 1 of the test coating platform portion 2 is tested and coated by the k-bundle 14 Only a part of the relative movement paths of the nozzles ^7 in the main scanning direction overlap. In other words, the test coating surface 131 is disposed on the moving path of the plurality of nozzles 17 under the action of the k-boom moving mechanism 丨5, so that the organic EL liquid can be applied. The area of the coated surface was measured to change the amount of the nozzle 4 applied to 2131. The result is a reduction in the cost of the jet spacing. In the coating apparatus 1, the pitch of the pitch nozzle is controlled by the adjustment mechanism control unit 102 based on the distance between the control unit 10 and the distance detecting unit 101. The fruit of h: the second moving mechanism 34' thus automatically adjusts the working time and labor required for the adjustment of the nozzle spacing. Further, the door::: the entire nozzle 17) can be adjusted to the latitude by the whole of the nozzles (or the plurality of nozzles 17 are individually moved upwards). The distances in the uranium direction of a, Tian Performing individual and high-precision attack 1 'based on the two test coatings 97106432 28 on the cloth surface 2131 which are separated in the main sweeping direction, the top plate 9 coated with the main scanning direction is '« and in the base image. Adjusting the substrate 9 relative to the two=2 two positioning marks 93, the organic coating applied by the plurality of nozzles 17: the position 'by the plurality of grooves on the domain accuracy: good: the coating of the liquid two and the substrate 9 The substrate and the crucible can be accurately placed in the area. Further, since the adjustment of the nozzle pitch can be adjusted by the configuration of the nozzle pitch adjustment, the structure of the coating device can be simplified. The two test coating platforms 21 of the structure are configured to hold two tapes that are fixed to the two test coated surfaces 2131. P 214 and two tape supply units 215 that replace the two test coated surfaces 2131, respectively. And two tape collecting portions 216, whereby the structure of the coating device 1 can be further improved Next, a coating apparatus according to a second embodiment of the present invention will be described. The coating apparatus of the second embodiment includes two test coatings different from the structure of the test coating stage unit 21 shown in Figs. 8 and 9 . The platform portion 21a is the same as the coating device 1 shown in Figs. 1 to 7, and the same reference numerals are used in the following description. Fig. 13 shows the test coating platform portion 21a on the (+χ) side. The left side view. Also shown in Fig. 13 is a portion of the substrate moving mechanism 12. In the coating apparatus of the second embodiment, the test coating platform portion 21 & on the (_χ) side is also shown in Fig. 13 (+ The test coating platform portion 2ia on the side has the same structure. As shown in Fig. 13, the test coating platform portion 21a is provided with a slider 211 movably mounted on the road 121 of the substrate moving mechanism 12; 97106432 29 1339133 212 'fixed on the slider 211; the test piece 213a is a test coating member for performing test coating of the organic El liquid; the test piece holding portion 214a, and the test piece 213 at the upper portion of the peripheral device 212 a is held; the test piece housing portion .215a' is attached to the test piece 213a On the (-Z) side, a plurality of test pieces 213b (hereinafter referred to as "waiting test pieces 213b") which are not used (that is, which have not been subjected to test coating of the organic EL liquid) are stacked and held (magazine) The extruding mechanism 216a is a cylinder that presses the test piece 213a held by the test piece holding portion 214a toward the (+Y) direction; and the test piece collecting portion 217a' is received by the pressing mechanism 216a from the test piece holding portion 21 The test piece 213a is formed by the same material as the substrate 9 in which the test piece 213a is formed of the same material as the substrate 9 with the same wettability as the organic EL liquid. X, on the main surface of the (10) side of the test piece 213a = a film formed on the substrate 9 before the application of the organic EL liquid (for example, / returning to the hole transporting material) #pq + $ , the side of the main...: ί Film 'and test piece 213wz) face: The upper surface 91 of the substrate 9 has a phase = (ie, 'substantially equal'). Furthermore, it is also possible to select the main surface of the (+Ζ) side of the slab 213a by the appropriate selection = 忒 213a.

成為供測試塗佈複數個;嘴側之主面 液之測試塗佈面2131,而田照圖D吐出之有機EL 保持部214a成為且有:二保持測試片213&之測試片 /、有利試塗佈面2131之測試塗佈部。 97106432 1339133 圖14係表示測試片保持部ma附近之俯視圖。如圖 13Λ®..14所示’測試片保持部2i4a具備大致矩形框狀 . _接# 2147,其抵接於測試片213a之測試 塗佈面213卜並決定z方向(亦即,與測試塗佈面⑽ 垂直之方向)上的測試塗佈面2131之位置。測試片保持部 2143之測試片2l3a藉由與測試片⑽之測試塗佈面 2131相反#K亦即’㈠)側)之測試片收容部215a,而經 由複數個等待測試片2l3b朝向測試塗佈面抵接部叫了按 壓,以對測試塗佈面抵接部2丨47施壓。 測試塗佈平台部21a t,壓出機構心受到驅動,而 抵接於測試塗饰面抵接部2147之測試片213_⑼方向 壓出並從測試片保持部214a取出。接著,將收容於測試 片收容部215a中之複數個等待測試片⑽中、最上部之 等待測試4腿朝向载片保持部心之賴塗佈面抵 接部2147施壓’而成為保持於測試片保持部2Ua中之新 的測試片心’該測試片⑽的( + Z)側之主面成為新的 測試塗佈面213卜亦即,測試塗佈平台部21a中,壓出 機構216a成為從測試片保持部2Ua中取出測試片21如 之測試片取出部,測試片收容部215a及麼出機構21^成 為將測試片保持部214a之測試塗佈面2131更換為新的測 試塗佈面之測試塗佈面更換機構。 第2實施形態之塗佈|置的準備作業(亦#,喷嘴間距 之調整及基板9之位置調整)之流程中,對於圖iu所示 之步驟S152中的測試塗佈面2131之更換,係指從利用樹 97106432 1339133 =帶213之送出者’變更為利用測試片213a之更換者, 除此之外與第〗實施形態相同。 、 =2貝%形態之塗佈裝置中,與第!實施形態相同,於 =塗佈單元2(參照㈣之測試塗佈面2131上塗佈有機 僮t並根據測試塗佈面2131上之有機EL液圖案之影 “双測噴觜間距’再根據檢測結果來調整複數個喷嘴 m參照圖1)於副掃摇方向上的間距。藉此,可在不對基 板9(參照圖1)it行有機EL液之塗佈的情況下,高精度ς 調整塗佈裝置之複數個喷嘴17於副掃描方向上的間距 (亦即,噴嘴間距)。 第2實施形態之塗佈裝置中,尤其將測試塗佈面2ΐ3ι 作為相對於有機EL液之濡濕性與基板9之上表面91相同 的測試片213a之主面,藉此可防止測試塗佈面2131與基 板9之上表面91的濡濕性之差所導致的測量誤差等,而 可高精度地檢測噴嘴間距。 • 於測試塗佈平台部21a上,設置有在測試片213a的(_z) 側收谷有複數個%待測試片213b之測試片收容部215a, 並利用壓出機構21 6 a從測s式片保持部214 a中壓出測試片 213a’而將新的測試片213a朝向測試片保持部2i4a之測 .試塗佈面抵接部2丨47施壓,以配置新的測試塗佈面 2131。藉此’可容易更換測試塗佈面2131,並且可將測 *試塗佈面2131與複數個喷嘴17之間的距離保持固定,而 可更高精度地檢測噴嘴間距。 以上對本發明之實施形態進行說明,但本發明並非限定 97106432 32 1339133 於上述實施形態,其可進行各種變更。 例如’對於第1實施形態之塗佈裝置1之測試塗佈平台 '部21 ’當膠帶保持部214中僅利用膠帶吸附部2141之吸 引力來吸附樹脂膠帶213以便將測試塗佈面2131以平滑 之狀態固定之情況時,亦可省略膠帶按壓部2142、按壓 部升降機構2143及按壓部移動機構2144,僅將膠帶吸附 =2141作為用以固定樹脂膠帶213之測試塗佈面2131的 #膠帶固定部。又,亦可無須進行膠帶吸附部2141之吸附, 而藉由膠帶按壓部2142之按壓來固定樹脂膠帶213之測 試塗佈面2131。於此情況下,僅膠帶按壓部2142成為膠 帶固定部。 塗佈裝置1之準備作業中,步驟S151中的利用間距調 整機構3使噴嘴17移動與步驟叩2中的測試塗佈面⑽ 之更換可並行進行,亦可使步驟S152在步驟siH之前進 打(第2實施形態中亦相同)。又,㈣S18中所拍攝之定 ㈣記號未必為設置於非塗佈區域上之定位專用記號,例 二亦可將形成於塗佈區域内之間隔壁上或非塗佈 的配線之一部分作為定位用記號。 — 間距調整機播^ φ _ 舞3申可利用1個調整頭30而依序造& =個喷嘴Π於副掃描方向上之位置調整,二: :置複數個調整頭3。。 況 : 塗佈頭移動機構15對塗佈…移喷:二:由 30所對應之位置依序 I、該調整碩 之1個喷嘴17竹么1動。再者,在將複數個噴嘴17中 ' 為土準噴嘴時,調整頭30不會對該基準 97106432 33 丄 喷嘴進行位置調整。 可移動:固定於噴嘴安裳;“「上亦可朝副掃描方向上不 17(或’除1個;:f7::置:’未必需要將所有喷嘴 方向上個別移動、 :固::有喷嘴H)於副掃描 嘴安裝部亦 移動地I有複數個噴嘴17之喷 機構之作用下,以二::機構3不同之其他間距調整 中心僅旋轉微小之角声— 垂直之凝轉軸為 間距。又,塗佈裝置變更副掃描方向上的嘴嘴 距之檢測結果,由作調整’亦可根據嘴嘴間 進行。 由作㈣制㈣整機構進行手動操作來 整構it 9之位置調整係藉由與喷嘴間距調 塗佈 =3=:_來進行時,亦可於測試 與上述實二於此情況下, 之情況下,高精度地調整=:基板9塗佈有機_ 圖15係表示利用樹脂膠帶213的測試塗佈單元2 a之並 他例之後視圖。對於圖15所示之測試塗佈單元2 八 21 差異’並且僅設置冑i個比基板之χ方向(亦即,主掃描 ^向)之寬度更大的測卩塗佈平台# 21b。在測試塗佈平 台部21b之上部之膠帶保持部214中,樹脂膠帶213朝X 方向延伸,其延伸長度與基板之X方向之寬度大致相等。 測試塗佈單元2a之膠帶保持部214中,遍及樹脂膠帶 97106432 34 1339133 213之X方向之大致全長塗佈有機EL液,在樹脂膠帶213 之X方向之兩端部附近的2個測試塗佈面⑽被膠帶吸 附部2141固定之狀態下’利用CCD相機進行拍攝:藉此 以與上述實施形態相同之方式檢測噴嘴間距,並且其 板位置調整所必要之資訊。 Λ 土 測試塗佈平台部21b中,使樹脂膠帶213為環狀,並在 1次測試塗佈結束時以® 15中之逆時針方向傳送。藉此, 使用完的測試塗佈面2131被更換為新的測試塗佈曰面。 又,使用完的測試塗佈面2131上’利用噴霧器⑽!喷射 清洗液,並使用氣刀(air knife)2192去除㈣著之㈣ EL材料,以便可用作新的測試塗佈面。再者,測試塗佈 平台部21b t構造亦可為,於⑻側及⑼側分別設有膠 帶供給部及膠帶回收部,將使用完的測試塗佈面捲繞並回 收。 上迷實施形態之塗佈裝置t,亦可取代利用基板移動機 聲構12來使基板9及基板保持部1;[移動,而是藉由塗佈頭 14於副掃描方向上之移動,來進行副掃描方向上的基板9 相對於塗佈頭14之相對移動。又,亦可取代利用塗佈頭 移動機構15來使塗佈頭14移動,而是藉由基板9及基板 .保持部11於主掃描方向上之移動’而進行主掃描方向上 的塗佈頭14相對於基板9之相對移動。 匕上述實施形態之塗佈裝置中,設置於塗佈頭14上的喷 嘴Π之數量並非限定於16個,3個以上即可。塗佈裝置 中,例如亦可從設置於塗佈頭14上之3個噴嘴17,將分 97106432 35 1339133 別包含紅色(R)、綠色(G)、藍色Γ 有機EL材料的3種有機EL=/出不 上。於此情況下,鄰接之2個喷佈於基板9 距離被調整為與間隔壁之間距相等。’《方向上的 =述2裝置中,亦可將包含像素形成材料即電洞 料(以下,稱為「電洞輸送液」)塗佈 :之電洞輸送層的材料’所謂「電洞輸送 =、π Λ 機EL_所形成之有機EL層中輸 达電洞之狹義的電洞輸送層,其還包含進行電洞注入之電 洞注入層。The test coating surface 2131 for the main surface liquid of the mouth side is applied, and the organic EL holding portion 214a which is discharged from the field image D is provided with: a test piece for holding the test piece 213 & The test coating portion of the coated surface 2131. 97106432 1339133 Fig. 14 is a plan view showing the vicinity of the test piece holding portion ma. As shown in Fig. 13A|..14, the test piece holding portion 2i4a has a substantially rectangular frame shape. _接# 2147, which abuts on the test coated surface 213 of the test piece 213a and determines the z direction (that is, with the test). The position of the test coated surface 2131 on the coated surface (10) in the vertical direction). The test piece 231a of the test piece holding portion 2143 is coated toward the test piece by a plurality of waiting test pieces 2l3b by the test piece accommodating portion 215a opposite to the test coated surface 2131 of the test piece (10), that is, the '(one) side). The surface abutting portion is called to press to press the test coated surface abutting portion 2 to 47. The coating plate portion 21a is tested, and the pressing mechanism is driven to be pressed out of the test piece 213_(9) of the test coating surface abutting portion 2147 and taken out from the test piece holding portion 214a. Then, in the plurality of waiting test pieces (10) accommodated in the test piece accommodating portion 215a, the uppermost waiting test test 4 legs are pressed toward the application surface contact portion 2147 of the slide holding portion core to be held in the test. The new test piece core in the sheet holding portion 2Ua's main surface of the (+Z) side of the test piece (10) becomes a new test coated surface 213, that is, in the test coating stage portion 21a, the pressing mechanism 216a becomes The test piece 21, such as the test piece take-out portion, is taken out from the test piece holding portion 2Ua, and the test piece accommodating portion 215a and the ejector mechanism 21 are replaced with the test coated surface 2131 of the test piece holding portion 214a as a new test coated surface. Test the coated surface replacement mechanism. In the flow of the preparation operation (the adjustment of the nozzle pitch and the position adjustment of the substrate 9) in the second embodiment, the replacement of the test coated surface 2131 in step S152 shown in Fig. iu is performed. The change from the use of the tree 97106432 1339133 = the sender of the belt 213 to the replacement of the test piece 213a is the same as that of the first embodiment. , = 2 shell % of the coating device, and the first! In the same embodiment, the organic coating t is applied to the coating coating surface 2131 of the coating unit 2 (refer to (4) and the image of the organic EL liquid on the coated surface 2131 is tested according to the "double sneezing pitch" and then according to the detection. As a result, the pitch of the plurality of nozzles m in the sub-sweep direction is adjusted with reference to FIG. 1). Thereby, it is possible to adjust the coating with high precision without applying the organic EL liquid to the substrate 9 (see FIG. 1). The pitch of the plurality of nozzles 17 of the cloth device in the sub-scanning direction (that is, the nozzle pitch). In the coating device of the second embodiment, the test coated surface 2ΐ3ι is particularly used as the wettability with respect to the organic EL liquid and the substrate. 9 is the main surface of the test piece 213a which is the same as the upper surface 91, whereby measurement errors or the like due to the difference in wettability between the test coated surface 2131 and the upper surface 91 of the substrate 9 can be prevented, and the nozzle pitch can be detected with high precision. • On the test coating platform portion 21a, a test piece accommodating portion 215a having a plurality of % to-be-tested pieces 213b on the (_z) side of the test piece 213a is provided, and the ejector mechanism is used to measure s The test piece 213a' is pressed out in the sheet holding portion 214a and will be new The test piece 213a is pressed toward the test coated surface abutting portion 2丨47 of the test piece holding portion 2i4a to configure a new test coated surface 2131. Thus, the test coated surface 2131 can be easily replaced, and The distance between the test coating surface 2131 and the plurality of nozzles 17 is kept constant, and the nozzle pitch can be detected with higher precision. The embodiment of the present invention has been described above, but the present invention is not limited to the above-described embodiment. For example, the test coating platform portion 21 of the coating device 1 of the first embodiment is used to adsorb the resin tape 213 by the suction force of the tape adsorption portion 2141 in the tape holding portion 214. When the test coated surface 2131 is fixed in a smooth state, the tape pressing portion 2142, the pressing portion lifting mechanism 2143, and the pressing portion moving mechanism 2144 may be omitted, and only the tape suction = 2141 is used as the test coating for fixing the resin tape 213. The tape fixing portion of the cloth surface 2131. Further, it is also possible to fix the resin tape 213 by pressing the tape pressing portion 2142 without performing the adsorption of the tape suction portion 2141. The cloth surface 2131. In this case, only the tape pressing portion 2142 is a tape fixing portion. In the preparation operation of the coating device 1, the nozzle 17 is moved by the pitch adjusting mechanism 3 in step S151 and the test coating in step 叩2 is performed. The replacement of the surface (10) may be performed in parallel, or the step S152 may be performed before the step siH (the same applies in the second embodiment). Further, the (four) mark captured in the S18 is not necessarily the position set on the uncoated region. For the special mark, in the second example, a part of the partition formed in the coating area or the uncoated wiring may be used as the positioning mark. — Pitch adjustment machine broadcast ^ φ _ Dance 3 Shen can use one adjustment head 30 to sequentially create & = nozzle position adjustment in the sub-scan direction, two: : Set a number of adjustment heads 3. . Condition: The coating head moving mechanism 15 is sprayed by the coating: 2: The position corresponding to 30 is sequentially followed by I, and the one nozzle 17 of the adjustment is moved. Further, when 'the number of nozzles' is a ground nozzle, the adjustment head 30 does not adjust the position of the reference 97106432 33 丄 nozzle. Movable: fixed to the nozzle; "" can also be 17 in the sub-scanning direction (or 'except 1;: f7:: set: ' does not necessarily need to move all nozzles individually, solid:: Yes The nozzle H) is operated by the spraying mechanism of the plurality of nozzles 17 in the sub-scanning nozzle mounting portion, and the center of the second:: different spacing adjustment mechanism of the mechanism 3 only rotates the minute corner sound - the vertical turning axis is the spacing In addition, the coating device changes the detection result of the nozzle distance in the sub-scanning direction, and the adjustment can be performed according to the mouth. The four-position system (4) is manually operated to construct the position adjustment system of the it9. When the coating is adjusted by the nozzle pitch = 3 =: _, it can be adjusted with high precision in the case of the test and the above-mentioned second case. =: The substrate 9 is coated with organic _ Figure 15 shows The test coating unit 2a of the resin tape 213 is used for the rear view of the example. For the test coating unit 2 shown in Fig. 15, the difference is '8' and only the direction of the substrate is set (i.e., the main scan) ^向) The wider width of the coating coating platform # 21b. In the tape holding portion 214 of the upper portion of the coating platform portion 21b, the resin tape 213 extends in the X direction, and its extension length is substantially equal to the width of the substrate in the X direction. The tape holding portion 214 of the test coating unit 2a is spread over the resin tape. In the state in which the two test coating surfaces (10) in the vicinity of the both ends of the resin tape 213 in the X direction are fixed by the tape suction portion 2141, the CCD camera is used. Shooting: In this way, the nozzle pitch is detected in the same manner as in the above embodiment, and the information necessary for the board position adjustment is adjusted. In the alumina test coating platform portion 21b, the resin tape 213 is made into a ring shape and coated in one test. At the end of the cloth, it is conveyed counterclockwise in the ® 15 . Thereby, the used test coated surface 2131 is replaced with a new test coated surface. Also, the used test coated surface 2131 is 'utilized with a sprayer (10) Spraying the cleaning liquid and removing (4) the (IV) EL material using an air knife 2192 so as to be used as a new test coated surface. Further, the test coating platform portion 21b t configuration may also be A tape supply unit and a tape collecting unit are provided on the (8) side and the (9) side, respectively, and the used test coated surface is wound and recovered. The coating device t of the embodiment may be used instead of the substrate moving machine. The substrate 9 and the substrate holding portion 1 are moved [moved, but the relative movement of the substrate 9 in the sub-scanning direction with respect to the coating head 14 is performed by the movement of the coating head 14 in the sub-scanning direction. Instead of using the coating head moving mechanism 15 to move the coating head 14, the coating head 14 in the main scanning direction may be opposed by the movement of the substrate 9 and the substrate holding portion 11 in the main scanning direction. Relative movement of the substrate 9. In the coating apparatus of the above embodiment, the number of the nozzles provided on the coating head 14 is not limited to sixteen, and three or more may be used. In the coating apparatus, for example, three types of organic ELs including red (R), green (G), and blue Γ organic EL materials may be included in the three nozzles 17 provided on the coating head 14 in portions 97106432 35 1339133 = / can not go out. In this case, the distance between the two adjacent sprayed substrates 9 is adjusted to be equal to the distance between the partition walls. 'In the direction of the device 2, a hole material including a pixel forming material (hereinafter referred to as "hole transport liquid") may be applied: a material of the hole transport layer "so-called "hole transport" =, π Λ machine EL_ formed in the organic EL layer, the narrow hole transport layer of the hole, which also includes a hole injection layer for hole injection.

上述塗佈裝置未必僅用於有機EL顯示裝置用之L :或液之塗佈,例如,對於液晶顯示裝置刪 4不裝置4平面顯示裝置用之基板,亦可用於塗佈包含著 =材料及螢光材料等其他種類之像素形成材料的流動性 材料之情況。The coating apparatus is not necessarily used for L: or liquid coating for an organic EL display device. For example, a liquid crystal display device may be used for coating a substrate for a flat display device, and may be used for coating a material and A case where a liquid material such as a fluorescent material forms a material of a material.

在如上所述之對有機EL顯示裝置用之基板進行有機EL '、之及電洞輸送液之塗佈、對其他平面顯示裝置用之基板進 行包含像素形成材料之流動性材料之塗佈中,要求流動性 材料之塗綠置具有較高的位置精度。如上所述,由於塗 佈裝置可高精度地調整複數個喷嘴17之間距,故尤其適 、口於對有機EL顯7F襞置用之基板進行有機EL液及電洞輸 送液之塗#冑其他平面顯示裝置用之基板進行包含像素 形成材料之流動性材料之塗佈。 97106432 36 1339133 又二述塗佈裝置除了用於平面顯示裝置 對磁碟或光磁碟用之玻璃基板、陶究基板、 ’ 録板等各種基板進行各種流動性材料之塗佈。 以上詳細描寫並說明了本發 、 例示,並非限定。因此可理解$,:、之說明僅為 解為,只要不脫離本發明之範 圍,可進行多種變形及具有多種態樣。 【圖式簡單說明】In the above, the application of the organic EL ', the hole transport liquid to the substrate for the organic EL display device, and the application of the fluid material including the pixel formation material to the substrate for another flat display device are performed. The greening of the flowable material is required to have a high positional accuracy. As described above, since the coating device can adjust the distance between the plurality of nozzles 17 with high precision, it is particularly suitable for coating the organic EL liquid and the hole transporting liquid on the substrate for the organic EL display 7F. The substrate for the flat display device is coated with a fluid material including a pixel forming material. 97106432 36 1339133 The coating apparatus is used for coating various fluid materials on various substrates such as a glass substrate for a magnetic disk or a magneto-optical disk, a ceramic substrate, and a recording plate. The present invention has been described and illustrated in detail above and is not intended to be limiting. It is therefore to be understood that the description of the "," is merely an exemplification, and various modifications and various aspects are possible without departing from the scope of the invention. [Simple description of the map]

圖1係第1實施形態之塗佈裝置之俯視圖。 圖2係塗佈裝置之前視圖。 圖3係表示控制部之功能的方塊圖。 圖4係表示塗佈頭之一部分的前視圖。 圖5係表示塗佈頭之一部分的俯視圖。 圖6係表示調整頭及塗佈頭之一部分的俯視圖。 圖7係表示調整頭及塗佈頭之一部分的左侧視圖。 圖8係測試塗佈平台部之左側視圖。 圖9係測試塗佈平台部之後視圖。 圖1 〇係表示勝帶保持部附近的俯視圖。 圖11A及圖11B係塗佈裝置之準備作業之流程圖。 圖12係塗佈裝置之俯視圖。 圖13係第2實施形態之測試塗佈平台部之左側視圖。 圖14係表示測試片保持部附近之俯視圖。 圖15係另一測試塗佈平台部之後視圖。 【主要元件符號說明】 塗佈裝置 97106432 37 1339133Fig. 1 is a plan view of a coating apparatus according to a first embodiment. Figure 2 is a front view of the coating apparatus. Fig. 3 is a block diagram showing the function of the control unit. Figure 4 is a front elevational view showing a portion of the coating head. Fig. 5 is a plan view showing a part of a coating head. Fig. 6 is a plan view showing a part of the adjustment head and the coating head. Fig. 7 is a left side view showing a part of the adjustment head and the coating head. Figure 8 is a left side view of the test coating platform section. Figure 9 is a rear view of the test coating platform section. Fig. 1 shows a plan view of the vicinity of the belt holding portion. 11A and 11B are flowcharts showing the preparation work of the coating device. Figure 12 is a plan view of the coating apparatus. Figure 13 is a left side view of the test coating platform portion of the second embodiment. Fig. 14 is a plan view showing the vicinity of the test piece holding portion. Figure 15 is a rear view of another test coating platform section. [Explanation of main component symbols] Coating device 97106432 37 1339133

2 測試塗佈單元 2a 測試塗佈單元 3 間距調整機構 9 基板 10 控制部 101 間距檢測部 102 調整機構控制部 103 基板位置調整部 11 基板保持部 111 連接部 12 基板移動機構 121 軌道 12a 基板旋轉機構 13 CCD相機 13a 攝像部移動機構 14 塗佈頭 141 喷嘴安裝部 142 引導槽 1411 背板部 1412 水平部 15 塗佈頭移動機構 16 受液部 17 喷嘴 173 喷嘴鎖定部 97106432 38 13391332 test coating unit 2a test coating unit 3 pitch adjustment mechanism 9 substrate 10 control unit 101 pitch detecting unit 102 adjustment mechanism control unit 103 substrate position adjusting portion 11 substrate holding portion 111 connecting portion 12 substrate moving mechanism 121 track 12a substrate rotating mechanism 13 CCD camera 13a imaging unit moving mechanism 14 coating head 141 nozzle mounting portion 142 guiding groove 1411 back plate portion 1412 horizontal portion 15 coating head moving mechanism 16 liquid receiving portion 17 nozzle 173 nozzle locking portion 97106432 38 1339133

21 測試塗佈平台部 21a 測試塗佈平台部 21b 測試塗佈平台部 211 滑塊 212 外殼 213 樹脂膠帶 213a 測試片 213b 等待測試片 2131 測試塗佈面 214 膠帶保持部 214a 測試片保持部 2141 膠帶吸附部 2142 膠帶按壓部 2143 按壓部升降機構 2144 按壓部移動機構 2145 保持平面 2146 爪部 2147 測試塗佈面抵接部 215 膠帶供給部 215a 測試片收容部 2151 感測器 216 膠帶回收部 216a 壓出機構 217a 測試片回收部 97106432 39 133913321 Test coating platform portion 21a Test coating platform portion 21b Test coating platform portion 211 Slider 212 Housing 213 Resin tape 213a Test piece 213b Waiting for test piece 2131 Test coated surface 214 Tape holding portion 214a Test piece holding portion 2141 Tape adsorption 2142 tape pressing portion 2143 pressing portion lifting mechanism 2144 pressing portion moving mechanism 2145 holding surface 2146 claw portion 2147 test coating surface abutting portion 215 tape supply portion 215a test piece housing portion 2151 sensor 216 tape collecting portion 216a pressing mechanism 217a Test piece recycling department 97106432 39 1339133

2161 感測器 2171 馬達 2172 蜗輪 218 外側受液部 2191 喷霧器 2192 氣刀 22 中央受液部 30 調整頭 31 安裝部固定機構 311 第1固定部 314 第2固定部 32 喷嘴抵接部 33 喷嘴施壓機構 331 桿 332 氣缸 333 調節器 34 抵接部移動機構 343 步進馬達 91 上表面 93 定位用記號 97106432 402161 Sensor 2171 Motor 2172 Worm gear 218 External liquid receiving portion 2191 Sprayer 2192 Air knife 22 Central liquid receiving portion 30 Adjustment head 31 Mounting portion fixing mechanism 311 First fixing portion 314 Second fixing portion 32 Nozzle abutting portion 33 Nozzle Pressing mechanism 331 Rod 332 Cylinder 333 Adjuster 34 Abutment moving mechanism 343 Stepping motor 91 Upper surface 93 Positioning mark 97106432 40

Claims (1)

1JJ9133 十、申請專利範圍·· .種塗佈裝置,係於基板塗佈流動性材料,·其具備有: * 基板保持部,用以保持基板; • 複數個喷嘴’朝向上述基板之主面連續地吐出流動性材 料; 喷嘴掃描機構,使上述複數個喷嘴在與上述基板之上述 主,平行之主掃描方向相對於上述基板進行相對移動,同 時母當朝上述主掃描方向移動時,使上述基板相對於上述 複數個喷嘴在與上述主面平行且與上述主掃描方向垂直 之副掃描方向進行相對移動; 、則《式塗佈,具有測試塗佈面,該測試塗佈面在未對上 述基板進行塗佈時測試塗佈來自上述複數個喷嘴之流動 性材料; 測·》式塗佈σ卩進退機構,使上述測試塗佈部在上述複數個 喷嘴於上述主掃描方向之相對移動路徑進退,以使測試塗 φ佈時的上述複數個噴嘴與上述測試塗佈面之間的距離、及 塗佈時的上述複數個嘴嘴與上述基板之上述主面之間的 距離相等; 攝像部’藉由上述複數個噴嘴於上述主掃描方向之相對 移動而取知塗佈於上述測試塗佈面的流動性材料之 之影像; —間距Up ’根據由上述攝像部取得之影像而檢測上述 複數個喷0^於上述副掃描方向的間距; 間距調整機構’對±述複數個喷嘴於上述副掃描方向的 97106432 1339133 間距進行調整;以及 • 測試塗佈面更換機構,將上述測試塗佈部之上述測試塗 • 佈面更換成新的測試塗佈面。 • 2·如申請專利範圍第1項之塗佈裝置,其甲, 於測試塗佈日夺’上述測言式塗佈面僅與上述複數個喷嘴於 上述主掃描方向的相對移動路徑之一部分重疊。 3.如申請專利範圍第丨項之塗佈裝置,其中&quot;,更具備有·· 擊基板旋轉機構,使上述基板保持部以與上述基板之上述 主面相垂直的旋轉軸為中心旋轉; 另-個攝像冑,取得在上述主掃描方向與上述測試塗佈 面分開設置的另-個測試塗佈面上所塗佈的流動性材料 之圖案之影像;以及 基板位置調整部,根據由上述攝像部與上述另一個攝像 f所取得的流動性材料之圖案之影像、以及由上述攝像部 二上述另一個攝像部所取得的上述基板之上述主面上之 1 ^用㈣之影像’來控制上述喷嘴掃描機構及上述基板 =機構’藉此調整上述基板相對於上述複數個喷嘴之 對位罟。 (如申請專利範圍第3項之塗佈裝置,其中,更具備有: 另y個測試塗佈面更換機構,其將上述另—個測試塗佈 广、上述測試塗佈面個別地更換成新的測試塗佈面。 i·如申請專利範圍第1項之塗佈裝置,其中, 接:間距檢測部而檢測上述副掃描方向上相互鄰 接的2個噴嘴間之各距離, 97106432 42 1339133 藉由上述間距調整機構使上述複數個噴嘴之全部 之其他全部於上述副掃描方向個別移動 調整上述各距離。 G 項之塗佈裝置,其 6.如申請專利範圍第1至5項中任 中,更具備有: 驅動部,驅動上述間距調整機構;以及 而控 調整機構控制部,根據上述間距檢測部之檢測結果 制上述驅動部。 中7.如申請專利範圍第項中任一項之塗佈裝置其 立上述測試塗佈部係保持樹脂膠帶之一部分的膠帶保 部,上述測試塗佈面係上述樹脂膠帶之上述一部分的主 面, 、上述測試塗佈面更換機構具備有將上述樹脂膠帶朝上 述測試塗佈部送出之膠帶供給部。 8. 如申請專利範圍第7項之塗佈裝置,其中, 、上述測試塗佈部具備有膠帶固定部,該膠帶固定部將上 述樹脂膠帶之上述測試塗佈面固定在與上述基板之 主面平行的保持平面上。 9. 如申請專利範圍第7項之塗佈裝置,其中,更具備有: 驅動部’驅動上述間距調整機構;以及 调整機構控制部’根據上述間距檢測部之檢測結果而 制上述驅動部。 工 10. 如申切專利範圍第1至5項中任一項之塗佈裝置, 97106432 43 1339133 其中, 係相對於流動性材料之㈣性與上述 上述測試塗佈面 基板之上述主面相同的測試片之主面, 部係料上述測試片之•片保持部。 .如申印專利範圍第10項之塗佈裝置,其中, 塗佈部具備有測試塗佈面抵接部,、該測試塗佈 面抵接料接於上述測t&lt;j^上述測試塗佈面,以決定盘 上返測试塗佈面垂直之方向上的上述測試塗佈面之位置, 上述測試塗佈面更換機構具備有: 測試片收容部,在與上述測試片之上述測試塗佈面相反 側保持有複數個專待測試片,同時經由上述複數個等待測 δ式片將上述測試片朝向上述測試塗佈面抵接部施壓;以及 測°式片取出部’從上述測試塗佈部取出上述測試片。 12.如申請專利範圍第ίο項之塗佈裝置,其中,更具備 有: 驅動部’驅動上述間距調整機構;以及 調整機構控制部,根據上述間距檢測部之檢測結果而控 制上述驅動部。 971064321JJ9133 X. Patent Application Scope The coating device applies a fluid material to a substrate, and includes: a substrate holding portion for holding the substrate; and a plurality of nozzles 'continuous toward the main surface of the substrate Disposing a fluid material; the nozzle scanning mechanism causes the plurality of nozzles to move relative to the substrate in a main scanning direction parallel to the main and parallel of the substrate, and when the mother moves in the main scanning direction, the substrate is made Relatively moving the plurality of nozzles in a sub-scanning direction parallel to the main surface and perpendicular to the main scanning direction; wherein, the coating has a test coated surface, and the test coated surface is not on the substrate Testing and coating the fluid material from the plurality of nozzles during coating; and measuring the σ卩 advancement and retreat mechanism, so that the test coating portion advances and retreats in a relative movement path of the plurality of nozzles in the main scanning direction, The distance between the plurality of nozzles when the test is coated with the φ cloth and the test coated surface, and the upper surface during coating The distance between the plurality of nozzles and the main surface of the substrate is equal; the imaging unit' knows the relative movement of the plurality of nozzles in the main scanning direction to determine the fluid material applied to the test coated surface. - the distance Up' detects the pitch of the plurality of jets in the sub-scanning direction based on the image obtained by the image capturing unit; the pitch adjusting mechanism 'speaks to the gap of 97106432 1339133 in the sub-scanning direction of the plurality of nozzles Make adjustments; and • Test the coated surface replacement mechanism and replace the above test coatings on the test coating section with a new test coating surface. 2. The coating device according to claim 1 of the patent application, wherein the test coating surface overlaps only one of the relative movement paths of the plurality of nozzles in the main scanning direction . 3. The coating device according to the ninth aspect of the invention, wherein the substrate rotation mechanism is configured to rotate the substrate holding portion around a rotation axis perpendicular to the main surface of the substrate; a camera image, an image of a pattern of a fluid material applied on another test coated surface provided separately from the test coated surface in the main scanning direction; and a substrate position adjusting portion according to the image capturing And the image of the pattern of the fluid material obtained by the other image f and the image of the first surface of the substrate obtained by the image capturing unit and the image of the fourth surface of the substrate (4) The nozzle scanning mechanism and the substrate=mechanism' thereby adjust the alignment of the substrate with respect to the plurality of nozzles. (Applicant of claim 3, wherein the coating device further comprises: y other test coated surface replacing mechanism, wherein the other test coating is widely applied, and the test coated surface is individually replaced with a new one. The coating device of the first aspect of the invention, wherein the distance detecting portion detects the distance between two nozzles adjacent to each other in the sub-scanning direction, 97106432 42 1339133 by The pitch adjustment mechanism moves all of the plurality of nozzles individually in the sub-scanning direction to adjust the respective distances. The coating device of item G, wherein, in the first to fifth aspects of the patent application, The drive unit is configured to drive the pitch adjustment mechanism, and the control adjustment mechanism control unit is configured to produce the drive unit based on the detection result of the pitch detection unit. 7. The coating device according to any one of the claims The test coating portion holds a portion of the resin tape which is a part of the resin tape, and the test coating surface is a main surface of the part of the resin tape. The test coated surface replacement mechanism includes a tape supply unit that feeds the resin tape toward the test application unit. The coating device according to claim 7, wherein the test coating portion is provided with a tape. a fixing portion that fixes the test coated surface of the resin tape on a holding plane parallel to a main surface of the substrate. 9. The coating device according to claim 7 of the invention, wherein The drive unit 'driving the pitch adjustment mechanism; and the adjustment mechanism control unit' to manufacture the drive unit based on the detection result of the pitch detection unit. 10. The coating according to any one of claims 1 to 5. In the apparatus, 97106432 43 1339133 is a main surface of the test piece which is the same as the above-mentioned main surface of the test coated surface substrate with respect to the fluidity of the fluid material, and the sheet holding portion of the test piece. The coating device of claim 10, wherein the coating portion is provided with a test coated surface abutting portion, and the test coated surface abutting material is connected to the above t&lt;j^ the above test coated surface to determine the position of the test coated surface in the direction perpendicular to the test coated surface of the disk, the test coated surface replacing mechanism provided with: a test piece receiving portion, a plurality of special test pieces are held on the opposite side of the test coated surface of the test piece, and the test piece is pressed toward the test coating surface abutting portion via the plurality of waiting δ slices; and The sheet take-out portion 'takes the test piece from the test coating portion. The coating device according to claim </RTI> of the invention, further comprising: a drive portion' driving the pitch adjustment mechanism; and an adjustment mechanism control portion The drive unit is controlled based on the detection result of the pitch detecting unit. 97106432
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