1339160 九、發明說明： 【發明所屬之技術領域】 本發明係有關於一種導光板之製造方法，特別係有關 於一種具有微凹凸透鏡之導光板之製造方法。 【先前技術】1339160 IX. Description of the Invention: TECHNICAL FIELD The present invention relates to a method of manufacturing a light guide plate, and more particularly to a method of manufacturing a light guide plate having a micro concave-convex lens. [Prior Art]
S知導光板之透鏡微結構係以v_cut形式形成於導光 板表面，如中華民國專利第M3丨丨〇48號，其係在該導光板 之上下表面分別建構有呈連續鋸齒溝槽狀之稜鏡微結構 (V-cut) ’然稜鏡微結構（v_cut)之製程繁複生產時間較長 且容易有棱鏡角度方面的公差，使得製造成本提高及困難 度增加’再者’ V_cut形式之導光板容易產生光干涉紋 (Moire)現象而導致導光板均勻度不佳必須額外設置—層 擴散膜，相對增加生產成本。 S 【發明内容】 “發月之主要目的係在於提供一種具有微凹凸透 之導光板之製造方法’包含下列步驟：提供一具有一第 ,表面與一第一下表面之第一基材；形成一第一光阻層 :玄第-基材之該第一上表面；圖案化該第一光阻層以形 ^數個第-柱狀光阻；進行—第1鮮㈣以使該些 狀光I5且形成有複數個第一弧狀表面；電鑄一第一金 材於該第—Iu# Μ “ 當_主 ▲材之该苐-上表面’該第-金屬材係具有 Φ肖第_表面’該第二表面係朝向該些第一柱 面二：些第一弧狀表面，以使該第-金屬材之該第二 ’複數個弧狀凹部；移除該第-基材及該第一光 1339160 I’以形成一第一模具；提供一具有一第二上表面與—第 ▲下表面之第二基#;形成一第二光阻層於該第二基材之 °玄第一上表面；圖案化該第二光阻層以形成複數個第二柱 狀光阻，進行一第二回銲步驟，以使該些第二柱狀光阻形 成有複數個第二弧狀表面；電鑄-第二金屬材於該第二基 材之該第二上表面，㈣二金屬#係覆蓋該些第二柱狀光 阻之㈣第二弧狀表面，以形成一具有複數個弧狀凸部之 •第二模具；提供一透光基板；以及將該第一模具壓合於該 透光基板之一第一顯露面及該第二模具壓合於該透光基 板之一第二顯露面，以使該透光基板之該第一顯露面形成 有複數個微凸透鏡及該第二顯露面形成有複數個微凹透 鏡。其係利用該第一及第二回銲步驟使得該第一與該第二 模具分別具有該些弧狀凹部及弧狀凸部，以使該透光基板 之該第一顯露面形成有該些微凸透鏡及該第二顯露面形 成有泫些微凹透鏡，以形成一具有微凹凸透鏡之導光板， 參具有製程簡便之功效，且該具有微凹凸透鏡之導光板之該 些微凸透鏡及該些微凹透鏡係可將穿透該具有微凹凸透 鏡之導光板之光線均勻散射，省略擴散膜之設置，達到降 低成本之功效。 【實施方式】 請參閱第1及2A至20圖，依據本發明之一具體實施 例係揭示一種具有微凹凸透鏡之導光板之製造方法，其係 包含下列步驟：請參閱步驟Η及2八圖，提供一第一基材 110,該第一基材110係具有一第一上表面U1與一第一下 1339160 表面112，在本實施例中，·該第一基材n 〇之材質係可選 自於矽基板或玻璃基板；請參閱步驟12及28圖，形成一 第光阻層120於該第一基材11〇之該第一上表面丨丨1; 叫參閱步驟]3及2C圖，圖案化該第一光阻層1 2〇以形成 複數個第一柱狀光阻121 ;請參閱步驟14及2D圖，進行 一第一回銲（reflow)步驟，以使該些第一柱狀光阻12丨形 成有複數個第-弧狀表面CS1，纟本實施例中，該第一回The lens microstructure of the light guide plate is formed on the surface of the light guide plate in the form of a v_cut, such as the Republic of China Patent No. M3丨丨〇48, which is constructed with a continuous serrated groove on the lower surface of the light guide plate. Mirror microstructure (V-cut) 'The process of v_cut is complicated and the production time is long and the tolerance of the prism angle is easy, which makes the manufacturing cost increase and the difficulty increases. 'More' V_cut form of light guide plate It is easy to produce an optical interference pattern (Moire) phenomenon, resulting in poor uniformity of the light guide plate. It is necessary to additionally provide a layer diffusion film, which increases the production cost. S [Summary of the Invention] The main purpose of the present invention is to provide a method for manufacturing a light guide plate having micro-concave and convexities, comprising the steps of: providing a first substrate having a first surface and a first lower surface; a first photoresist layer: the first upper surface of the meta-substrate; the first photoresist layer is patterned to form a plurality of first-column photoresist; and the first fresh (four) is performed to make the shape Light I5 is formed with a plurality of first arcuate surfaces; electroforming a first gold material on the first -Iu# Μ "When the 苐-main ▲ material of the 苐-upper surface" the first metal material has Φ 肖第The second surface is oriented toward the first cylindrical surfaces: a plurality of first curved surfaces to make the second plurality of arcuate recesses of the first metal material; removing the first substrate and The first light 1339160 I' is formed to form a first mold; a second base having a second upper surface and a second lower surface is provided; and a second photoresist layer is formed on the second substrate a first upper surface; patterning the second photoresist layer to form a plurality of second columnar photoresists, performing a second reflow step to make the second pillars The photoresist is formed with a plurality of second arcuate surfaces; the electroforming-second metal material is on the second upper surface of the second substrate, and (4) the two metal layers are covering the second columnar photoresists (four) second An arc-shaped surface to form a second mold having a plurality of arcuate protrusions; providing a transparent substrate; and pressing the first mold to one of the first exposed surface of the transparent substrate and the second mold Pressing on a second exposed surface of the transparent substrate such that the first exposed surface of the transparent substrate is formed with a plurality of micro convex lenses and the second exposed surface is formed with a plurality of concave lenses. The first and second reflowing steps are configured to have the arcuate recesses and the arcuate protrusions respectively on the first and second molds, so that the first exposed surface of the transparent substrate is formed with the micro The convex lens and the second exposed surface are formed with a plurality of micro concave lenses to form a light guide plate having a micro concave-convex lens, which has the advantages of simple process, and the micro convex lens and the micro concave lens of the light guide plate having the micro concave and convex lens can be The light that penetrates the light guide plate having the micro concave-convex lens is uniformly scattered, and the arrangement of the diffusion film is omitted, thereby achieving the effect of reducing cost. [Embodiment] Please refer to Figures 1 and 2A to 20, in accordance with an embodiment of the present invention, a method of manufacturing a light guide plate having a micro concave-convex lens, comprising the following steps: Providing a first substrate 110 having a first upper surface U1 and a first lower 1339160 surface 112. In this embodiment, the first substrate n 〇 is Selecting from the substrate or the glass substrate; referring to steps 12 and 28, forming a first photoresist layer 120 on the first upper surface 丨丨1 of the first substrate 11; refer to steps 3 and 2C The first photoresist layer 121 is patterned to form a plurality of first pillar photoresists 121; referring to steps 14 and 2D, a first reflow step is performed to make the first pillars The photoresist 12 is formed with a plurality of first arc-shaped surfaces CS1. In this embodiment, the first back
銲步驟之回銲時間係介於 2〜6小時’該第一回銲步驟之The reflow time of the soldering step is between 2 and 6 hours 'the first reflow step
回銲溫度係介於175〜300。(：；請參閱步驟15及2E圖，濺 鑛形成一第一種子層130(firstseed丨ayer)於該些第一柱 狀光阻121之該些第—弧狀表面CS1上，該第一種子層 130之材質係可選自於金、銀、銅及料可導電之金屬材； 請參閱步驟16&2F圖，電鑄一第一金屬材14〇於該第一 基材110之該第一上表面m，該第一金屬材14〇係具有 -第-表® 141與—第二表面丨42，該第二表面142係朝 向該些第-柱狀光a 121 <該些第一弧狀表面⑶，以使 該第-金屬材M0之該第二表面142形成有複數個弧狀凹 部⑷，較佳地’由於在電鑄該第一金屬# 14〇於該第一 基材110之該第一上表面111夕丰跟么 ^ 之步驟則，係已先濺鍍形成 該第一種子層130於該些第一柱狀光阻i2i之該些第一弧 狀表面CS1上’可增加該第一金屬# 14〇於該第一基材 110之該第一上表®⑴之附著力；請參閱步驟17及2C 圖，移除該第-基材uo及該第_光阻層12〇，以形成一 第一模具Mi’該第一模具M1係為具有該些弧狀凹部14: 10 1339160 之或第—金屬材140 ;請參閱步驟1 8及2H圖，提供一第 二基材150 ’該第二基材150係具有一第二上表面151與 一第一下表面152，在本實施例中’該第二基材15〇之材 質係可選自於石夕基板或玻璃基板；請參閱步驟19及21圖， 形成一第二光阻層160於該第二基材150之該第二上表面 151 ;請參閱步驟2〇及2J圖，圖案化該第二光阻層16〇 以形成複數個第二柱狀光阻丨6丨；請參閱步驟2 1及2κ圖， φ 進行一第二回銲步驟，以使該些第二枉狀光阻1 6 1形成有 複數個第二弧狀表面CS2，在該第二回銲步驟中，該第二 回銲步驟之回銲時間係介於2〜6小時，該第二回銲步驟 之回銲溫度係介於175〜3〇〇。〇 ;請參閱步驟22及2L圖， 濺鍍形成一第二種子層17〇( sec〇nd seed Uyer)於該些第 一柱狀光阻161之該些第二弧狀表面CS2上，該第二種子 層170之材質係可選自於金、銀、銅及鋁等可導電之金屬 材，租參閱步驟23及2M圖，電鑄一第二金屬材i 8〇於該 _第一基材I50之該第二上表面151，該第二金屬材18〇係 覆蓋戎些第二柱狀光阻161之該些第二弧狀表面cs2，以 形成一第一模具M2 ’該第二模具M2係具有複數個弧狀凸 邛181，其中该第一金屬材14〇之厚度係大於該第二金屬 材180，在本實施例中，該第二模具M2係為具有該些弧 狀凸部181之該第二金屬材18〇，較佳地，由於在電鑄該 第二金屬材180於該第二基材丨5〇之該第二上表面151之 步驟前，係已先濺鍍形成該第二種子層17〇於該些第二柱 狀光阻161之該些第二弧狀表面CS2上，可增加該第二金 1339160 屬材180於該第二基材15δ之該第二上表面151之附著 力；請參閱步驟24及2Ν圖，提供一透光基板210，該透 光基板210係具有一第〆顯露面211及一第二顯露面 2 12，在本實施例中，該透光基板2 1 0之材質係可選自於 玻璃或高透光性高分子材料；請參閱步驟25及20圖，將 該第一模具Ml壓合於該透光基板之該第一顯露面 211及將該第二模具M2壓合於該透光基板210之該第二 顯露面2 12，在本實施例中，由於該第二模具M2係設置 於該第二基材150之該第二上表面151，因此壓合該第二 模具M2於該透光基板2 1 0之該第二顯露面2 1 2時，係利 用壓合該第二基材150於該透光基板210之該第二顯露面 212以使該第二模具M2壓合於該透光基板210之該第二 顯露面2 1 2 ;請參閱第3圖，以使該透光基板2 1 0之該第 ~顯露面2 1 1形成有複數個微凸透鏡2 1 3及該第二顯露面 212形成有複數個微凹透鏡214，以形成一具有微凹凸透 鏡之導光板200 ’在本實施例中，該些微凹透鏡214與該 些微凸透鏡213之直徑係介於1.8402至22.613微米（μπι ) 之間’該些微凹透鏡214與該些微凸透鏡213之中心厚度 (center thickness )係介於 1 _2 至 34 微米（μιη )之間，該 些微凹透鏡214與該些微凸透鏡213之間距係介於〇1至 1 mm之間。本發明係利用該第一回銲步驟及該第二回銲步 驟使侍該第一模具M1與該第二模具M2分別具有該些弧 狀凹部143及該些弧狀凸部i 8丨，以使該透光基板2丨〇之 °亥第一顯路面2 1 1形成有該些微凸透鏡2丨3及該第二顯露 12 1339160 面212形成有該些微 w透鏡214，以形成該具有微凹凸透 鏡之導光板200，具有製 . ’良程間便之功效，且該具有微凹凸 ’兄之導光板200之該些微凸透冑213及該些微凹透鏡 214可將穿透該具有微凹凸透鏡之導光板200之光線均勻 散射，省略擴散膜之設置，達到降低成本之功效。 本發明之保護範圍當視後附之申請專利範圍所界定 者為準’任何熟知此項技藝者，在不脫離本發明之精神和 範圍内所作之任何變化與修改，均屬於本發明之保護範 圍。 【圖式簡單說明】 第1圖：.依據本發明之一具體實施例，一種具有微 凹凸透鏡之導光板之製造方法之流程圖。 第2A至20圖：依據本發明之一具體實施例，該具有微凹 凸透鏡之導光板之製造方法之載面示意 1 3 圖：依據本發明之一具體實施例，該具有微四 凸透鏡之導光板之裁面示意圖。 【主要元件符號說明】 11 提供 一第一 基材 12 形成 一第一 光阻層於該第一基材 13 圖案 化該第 一光阻層以形成複數個第一柱狀光阻 14 進行 一第一 回銲步驟 15 濺鍍 形成一 •第一種子層於該些第—拉壯止„ L ^ 枉狀光阻之該些 第一 弧狀表 面上 13 電缚一第一金屬材於該第一基材 移除該第一基材及該第一光阻層’以形成一第—模具 提供一第二基材 形成一第二光阻層於該第二基材 圖案化該第二光阻層以形成複數個第二柱狀光阻 進行一第二回銲步驟 賤鑛形成一第二種子層於該些第二柱狀光阻之該些 第二弧狀表面上 電鑄一第二金屬材於該第二基材 提供一透光基板，該透光基板係具有一第一顯露面及 一第二顯露面 將该第一模具壓合於該透 該第二模具壓合於該透光基板之該第二顯露面 第一基材 第一光阻層 第一金屬材 弧狀凹部 第一下表面 第二種子層 Π第一上表面 112第一下表面 第一柱狀光阻13〇第一種子層 !41第一表面 142第二表面 1 5〇第二基材 1 6 0第二光阻層 1 80第二金屬材 具有微凹凸透鏡之導光板 151第二上表面 1 6 1第二枉狀光阻 1 8 1弧狀凸部 透光基板 微凸透鏡 直徑 第二模具 211第一顯露面 212第二顯露面 2 1 4微凹透鏡 Η中心厚度 M丨第一模具 CS1第一弧狀表面CS2第一弧狀表面The reflow temperature is between 175 and 300. (:; see steps 15 and 2E, the first seed layer 130 (firstseed丨ayer) is formed on the first arcuate surfaces CS1 of the first columnar photoresists 121, the first seed The material of the layer 130 may be selected from the group consisting of gold, silver, copper and conductive materials; please refer to step 16 & 2F, electroforming a first metal material 14 to the first of the first substrate 110 The upper surface m, the first metal material 14 has a ---Table 141 and a second surface 丨42, the second surface 142 is oriented toward the first-columnar light a 121 < the first arc a surface (3) such that the second surface 142 of the first metal material M0 is formed with a plurality of arcuate recesses (4), preferably 'because the first metal #14 is electroformed on the first substrate 110 The step of the first upper surface 111 is performed by first sputtering, and the first seed layer 130 is formed on the first arcuate surfaces CS1 of the first columnar photoresists i2i. The first metal #14 is adhered to the first surface of the first substrate 110 (1); please refer to steps 17 and 2C to remove the first substrate uo and the first photoresist layer 12 Oh, Forming a first mold Mi' having the arc-shaped recesses 14: 10 1339160 or the first metal material 140; see steps 18 and 2H, providing a second substrate 150' The second substrate 150 has a second upper surface 151 and a first lower surface 152. In this embodiment, the material of the second substrate 15 can be selected from a stone substrate or a glass substrate; Steps 19 and 21, forming a second photoresist layer 160 on the second upper surface 151 of the second substrate 150; referring to steps 2A and 2J, patterning the second photoresist layer 16 to form a plurality of second columnar photoresists 丨6丨; please refer to step 2 1 and 2κ, φ for a second reflow step, so that the second ridge resistors 16 1 are formed with a plurality of second arcs The surface CS2, in the second reflow step, the reflow time of the second reflow step is between 2 and 6 hours, and the reflow temperature of the second reflow step is between 175 and 3 Torr. 〇; Referring to steps 22 and 2L, the sputtering forms a second seed layer 17 seed seed seed Uyer to the second arc sheets of the first columnar photoresist 161 The material of the second seed layer 170 may be selected from electrically conductive metal materials such as gold, silver, copper, and aluminum. For the rent, refer to steps 23 and 2M, and electroform a second metal material. The second upper surface 151 of the first substrate I50, the second metal material 18 is covered by the second arcuate surfaces cs2 of the second columnar photoresist 161 to form a first mold M2 ' The second mold M2 has a plurality of arcuate protrusions 181, wherein the thickness of the first metal material 14 is greater than the second metal material 180. In the embodiment, the second mold M2 has the same The second metal material 18〇 of the arcuate convex portion 181 is preferably, before the step of electroforming the second metal material 180 on the second upper surface 151 of the second substrate 丨5〇 The first seed layer 17 is sputtered to form the second arcuate surface CS2 of the second columnar photoresist 161, and the second gold 1339160 genus 180 is added to the second substrate 15δ. The adhesion of the second upper surface 151; please refer to steps 24 and 2 to provide a transparent substrate 210 having a first exposed surface 211 and The second exposed surface 2 12 , in this embodiment, the material of the transparent substrate 2 10 can be selected from glass or high light transmissive polymer material; please refer to steps 25 and 20, the first mold Ml is pressed against the first exposed surface 211 of the transparent substrate and the second mold M2 is pressed against the second exposed surface 2 12 of the transparent substrate 210. In this embodiment, due to the second mold The M2 is disposed on the second upper surface 151 of the second substrate 150. Therefore, when the second mold M2 is pressed against the second exposed surface 2 1 2 of the transparent substrate 2 10 , the The second substrate 150 is disposed on the second exposed surface 212 of the transparent substrate 210 to press the second mold M2 to the second exposed surface 2 1 2 of the transparent substrate 210; see FIG. 3, A plurality of micro convex lenses 2 1 3 are formed on the first exposed surface 2 1 1 of the transparent substrate 2 1 0 , and a plurality of micro concave lenses 214 are formed on the second exposed surface 212 to form a guide having a micro concave and convex lens. In the present embodiment, the diameters of the micro concave lenses 214 and the micro convex lenses 213 are between 1.8402 and 22.613 micrometers (μπι ). The center thickness of the micro concave lens 214 and the micro convex lens 213 is between 1 _2 and 34 μm, and the distance between the micro concave lens 214 and the micro convex lens 213 is between 〇1 and 1 mm. . The first reflow step and the second reflow step are used to make the first mold M1 and the second mold M2 respectively have the arcuate concave portions 143 and the arcuate convex portions i 8丨, Forming the micro-convex lens 2 丨 3 and the second exposing 12 1339160 surface 212 to form the micro-wright lens 214 to form the micro-convex lens The light guide plate 200 has the effect of making a good process, and the micro convex 213 of the light guide plate 200 having the micro concave and convexity and the micro concave lens 214 can penetrate the guide having the micro concave lens The light of the light plate 200 is evenly scattered, and the arrangement of the diffusion film is omitted, thereby achieving the effect of reducing the cost. The scope of the present invention is defined by the scope of the appended claims. Any changes and modifications made without departing from the spirit and scope of the invention belong to the scope of the present invention. . BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a flow chart showing a method of manufacturing a light guide plate having a micro concave-convex lens according to an embodiment of the present invention. 2A to 20: FIG. 3 is a schematic diagram of a method for manufacturing a light guide plate having a micro concave-convex lens according to an embodiment of the present invention. FIG. 3 is a view showing a guide having a micro-tetragonal lens according to an embodiment of the present invention. Schematic diagram of the light board. [Description of main component symbols] 11 providing a first substrate 12 to form a first photoresist layer, patterning the first photoresist layer on the first substrate 13 to form a plurality of first columnar photoresists 14 a reflowing step 15 is performed by sputtering to form a first seed layer on the first arcuate surfaces of the first tens of tens of L ^ 枉 photoresist to electrically bond a first metal material to the first Substrate removing the first substrate and the first photoresist layer ′ to form a first mold, providing a second substrate to form a second photoresist layer, and patterning the second photoresist layer on the second substrate Forming a plurality of second columnar photoresists to perform a second reflow process, forming a second seed layer, and electroforming a second metal material on the second arcuate surfaces of the second columnar photoresists Providing a transparent substrate on the second substrate, the transparent substrate having a first exposed surface and a second exposed surface for pressing the first mold to the second mold and pressing the transparent mold The second exposed surface of the first substrate, the first photoresist layer, the first metal material, the arcuate recess, the first lower surface, the second Sublayer Π first upper surface 112 first lower surface first columnar photoresist 13 〇 first seed layer! 41 first surface 142 second surface 1 5 〇 second substrate 1 60 second photoresist layer 1 80 The second metal material has a micro concave-convex lens light guide plate 151 second upper surface 1 6 1 second dome-shaped photoresist 1 8 1 arc-shaped convex portion transparent substrate micro convex lens diameter second mold 211 first exposed surface 212 second revealed Face 2 1 4 micro concave lens Η center thickness M 丨 first mold CS1 first curved surface CS2 first curved surface
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