TWI300497B - Reflection type liquid crystal display and method of manufacturing the same - Google Patents

Description

1300497 A7 _B7__ V. INSTRUCTIONS (i) (Please read the note on the back and fill out this page.) The present invention relates to a reflective liquid crystal display and a method of fabricating the same, and more particularly to a microlens array having a plurality of calibrations. Liquid crystal display and its manufacturing method. In today's information-oriented society, the role of an electronic display has become even more important. Various electronic displays have been widely used in various industrial fields. As the technology in electronic displays continues to evolve, various electronic displays with new functions have been developed in response to the various needs of this information-oriented society. In summary, an electronic display is a device that allows people to transmit video information. That is, an electronic display can be defined as an electronic device that converts electrical information signals output by various electronic devices into a visually identifiable optical information signal. Also, it can be defined as an electronic device that can be used as a bridge between people and electronic devices. The electronic displays can be classified into an illuminating display: the optical information signal is displayed by a illuminating method, and a non-illuminating display, the signals of which are displayed by light modulation methods, such as light reflection and scattering. And interference phenomena. The illuminating display is referred to as an active type display device such as a CRT (Cathode Ray Tube), a PDP (plasma display panel), an LED (Light Emitting Diode), and an ELD (Electro Luminescence Display). Non-illuminated displays are referred to as passive displays, such as LCD (liquid crystal display), EPID (electrophoretic image display), and the like. _ This CRT has been used for image displays such as TV receivers and monitors for a long time. The CRT has the highest market ratio due to its good quality and economic benefits, but there are still many shortcomings, such as the weight of this paper. The Chinese National Standard (CNS) A4 specification (210X297 mm) is applicable. 4 1300497 A7 —___B7______ , invention description () 2 heavy, large size and high power consumption, and so on. At the same time, due to the rapid advancement of semiconductor technology, many electronic devices have been miniaturized, and the weight is lighter, and those with lower voltage and lower driving power are being developed one after another; according to the current environment, it is necessary to have A flatter display that is thinner and lighter, and features lower drive voltages and lower power consumption to meet demand. Among various advanced flat-panel displays, LCDs are thinner and lighter than any other display, and have a lower driving voltage and lower power consumption. Moreover, the LCD also has a display quality similar to that of a CRT. Therefore, the LCD is widely used in various electronic devices. Moreover, since lCd can be easily manufactured, its application range is gradually expanded. These LCDs are classified as a transmissive LCD that uses an external light source to display an image, and another reflective LCD that replaces an external light source to display an image with ambient light. The reflective LCD has an advantage in that it consumes less power than a projection LCD and can display an excellent display effect outdoors. Moreover, the reflective LCD will be thinner and lighter because it does not require an attached light source, such as a backlight. However, the front reflective LCD has a darker screen and cannot display two resolutions and multiple colors. Therefore, the reflective LCD is limited to products that require display of simple patterns such as numbers or simple text. In order for reflective LCDs to be used in a variety of electronic devices, high resolution and multicolor display as well as enhanced reflective illumination are necessary. In addition, proper shelling, rapid response speed and contrast enhancement are also needed. This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the notes on the back and fill out this page)

•• Line L 1300497 A7 __B7 _^_ V. INSTRUCTIONS (3) In current reflective LCDs, two techniques are combined to enhance their brightness. One is to enhance the reflection efficiency of the reflective electrode, and the other is to achieve an ultra-high void ratio. A method of forming a convex body on a reflective electrode to increase the reflection efficiency is disclosed in U.S. Patent No. 5,610,741 (Naufumi Kimur), which is incorporated herein by reference. Fig. 1 is a partial plan view of a reflective LCD device disclosed in the aforementioned U.S. Patent; and Fig. 2 is a cross-sectional view of the reflective LCD device of Fig. 1. Referring to FIGS. 1 and 2 , the reflective LCD device has a first substrate 10 , a second substrate 15 is disposed on the first substrate 10 , and a liquid crystal layer 20 is disposed on the first and second substrates 10 . Between 15 and 15. The first substrate 10 includes a first insulating substrate 30 on which a plurality of gate bus lines 25 are disposed. The gate electrode 35 and the like are branched by the gate bus line 25. There are also a number of source bus lines 40 that are arranged to intersect the gate bus line 25. The source bus lines 40 are insulated from the gate bus lines 25 by an insulating layer. The source electrode 45 and the like are branched by the source bus line 40. A reflective electrode 50 or the like is provided between the first substrate 10 and the liquid crystal layer 20, and is provided in a plurality of rectangular regions formed by the intersection of the gate bus lines 25 and the source bus lines 40. The reflective electrode 50 is connected to a TFT device 55 disposed on the first substrate 10. The TFT device 55 forms a switching device having the gate bus line 25 and the source bus line 40. This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) --------------r,:---""...book........ .....线"-^丨' (Please read the notes on the back and fill out this page) 6 1300497 A7 _B7____ V. Inventive Note ( ) 4 There are many dimples 70, 71, etc. placed on the reflective electrode. The surface of the surface 50 is such that the surface is uneven. The indentations 70, 71 are irregularly laid over the entire surface. The reflective electrode 50 and one of the drain electrodes of the TFT device 55 are connected to each other via a contact hole 65. The gate bus line 25 and the gate electrode 35 are provided on a first insulating substrate 30 made of, for example, glass, which is deposited by sputtering to form a button (Ta) film and utilizes etching or light. The lithography method is used to pattern the deposited Ta film. Then, the gate insulating film 75 is provided to cover the gate bus line 25 and the gate electrode 35. The gate insulating film 75 is deposited by a plasma CVD (Chemical Vapor Deposition) method to form a SiNx film to have a thickness of, for example, 4000 Å. A semiconductor layer 80 having two amorphous yttrium (a-Si) is provided on the gate insulating film 75 to cover the gate electrode 35. Contact layers 85 and 90 formed of an n+ type doped a-Si layer are provided on the semiconductor layer 80. Then, a molybdenum (Mo) film is disposed on the first insulating substrate 30 to cover the structure formed by the above method, and the Mo film is patterned to form a source bus line 40, a source A pole electrode 45, and a drain electrode 60. In this way, the TFT device 55 can be fabricated. On the entire surface of the insulating substrate 30 provided with the TFT device 55, an organic insulating film 95 and a reflective electrode 50 are provided, each of which has an uneven surface. 3A to 3C are cross-sectional views showing the steps of the method of forming the organic insulating film and the reflective electrode of the device of Fig. 2. Please refer to Figure 3A. A photoresist film 100 will be applied by spin coating to the Chinese National Standard (CNS) A4 specification (210X297 mm) by spin coating."----------- ------------Γ装-·-----: "...订......---------ΨΦ (Please read the notes on the back and fill out this page -7 - 1300497 A7 ______B7 __ V. Description of Invention (5) The surface of the first insulating substrate 30 covers the TFT device 55. Then, the photoresist film 100 is pre-baked. It is disposed on the photoresist film 1 ,, and the light-transmissive region 1〇5 and the light-shielding region 106 are formed into a predetermined pattern, and exposure and development processes are performed. Therefore, it can be made corresponding to the mask η. The convex body 115 of the pattern of the crucible is then heat-treated, and the corners of the respective convex bodies 115 are formed into a rounded shape as shown in Fig. 3C. Referring to Fig. 3C, an organic insulating film 95 is The convex body 115 is formed by, for example, spin coating, and the surface of the organic insulating film 95 is also uneven by the convex body 115. Then, the organic insulating film 95 is covered with a mask. (not shown) Patterning, a contact hole 65 is formed which exposes the surface of the gate electrode 60 of the TFT device 55. A metal film of aluminum (A1) or nickel (Ni) as the reflective electrode 50 is provided in the organic film. On the insulating film 95. At this time, the contact hole 65 is filled with the material of the reflective electrode. The reflective electrode material is formed by vacuum sputtering. As a result, the dimples 70 and 71 will be formed in the The surface of the reflective electrode 50 has a shape corresponding to the organic insulating layer 25. Referring back to FIG. 2, a first alignment film 12 is disposed on the reflective electrode 50 and the organic insulating film 95. The second substrate 15 includes a second insulating substrate 14A, and is provided with a color filter film I25, a common electrode electrode and a second alignment film 135, etc. The insulating substrate 140 is made of glass. A color filter film 125 corresponding to each of the pixels 145 and 146 is disposed on the second insulating substrate 140. The color filter film 125 is provided with an ITO. Transparent materials such as (indium tin oxide) This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) --------- -----------,: Install ------- "------ order ............... line one ( Please read the following precautions and then fill out this page) 1300497 A7 _____B7 _ 5, the common electrode 130 of the invention (6), and the common electrode 13 is provided with a second orientation film 135, which can be made The second substrate 15. (Please read the precautions on the back side and then fill in the page.) The second substrate 15 is calibrated so as to be disposed on the first substrate 1A. A liquid crystal layer 20 containing liquid crystal and color material is injected into the gap between the first substrate 10 and the second substrate 15 by vacuum injection, and an LCD can be completed. There is a dimple provided on its reflective electrode to enhance its reflection efficiency, but it still has the following problems: First, the conventional reflective LCD has a hemispherical concave shape such as a microlens and has different sizes to The reflection efficiency is enhanced, but the ridge portions which are not provided with the dimples have different sizes depending on their positions, so that a problem will occur which lowers the uniformity of the entire reflection efficiency. In other words, since the ridge portions are different in size, the heights of the ridge portions are different at the regions of the dents which are different from each other on the reflective electrode, so the reflection The electrodes exhibit different reflectivities depending on different regions, so the reflective electrodes produce inconsistent reflectance. The decrease in the uniformity of reflection at the reflective electrode results in a decrease in the alignment uniformity of the liquid-friendly material, and forms one of the factors for reducing the contrast of the image displayed on the LCD: the inconsistency of the orientation of the liquid crystal material There is a high probability that the image will be blurred 'and the light will be 3⁄4 leaking. In addition, the conventional reflective LCD has a disadvantage that, due to the size of the dimples and the size of the regions between the dimples, it is difficult to accurately determine the design value according to the actual value in the actual process. The dimensions of the indentations are controlled, as well as the spacing between the indentations. This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) 9 1300497 A7 ________Β7___ V. Invention description ()· 7 Furthermore, although these dimples of different sizes are overlapped with each other However, since the dimples have a hemispherical shape, it is difficult to completely avoid the scattered reflection of incident light in the concave portion, which will limit the improvement of image quality. Since the whirlpool recognizing reflective LCD has a regular quadrilateral pixel shape, it has the disadvantage that not only a design must be performed from the beginning, but also can be used for different cell sizes and according to different information transmission devices. The display such as a handheld terminal or a liquid crystal television receiver, such as a cymbal size, is changed, and the conditions of a process cannot be set again. In particular, it is very difficult to apply to an electronic display that requires high reflectance in a particular direction, such as a mobile phone. Accordingly, it is an object of the present invention to provide a reflective LCD comprising a reflective electrode having a plurality of directional microlenses for enhancing reflection efficiency. Another object of the present invention is to provide a method of manufacturing a reflective electrode for an LCD which is particularly suitable for a lenticular lens type reflective lcd and which can considerably reduce manufacturing time and cost. Another object of the present invention is to provide two types of electronic display devices which include a reflective electrode and which have a high reflectance in a particular direction. The present invention is directed to providing a method of fabricating an electronic display that is particularly suitable for use in the manufacture of an electronic display device comprising a reflective electrode and having a high reflectivity in a particular direction. It is an object of the present invention to provide a reflective LCD which can solve the problem of forming a stepped portion at a boundary portion between an inner region and an outer region of a pixel, thereby obtaining a uniform image quality. The scale applies to China National Standard (CNS) A4 specification (210X297 mm) (Please read the note on the back and fill out this page) • Install the book - order -10 - 1300497 A7 B7 V. Invention description (please read the back first) A further object of the present invention is to provide an electronic display device comprising a reflective electrode, which can solve the problem of forming a step due to a boundary portion between an inner region and an outer region of a pixel. A problem that occurs in a portion, so that a uniform image quality can be obtained. To achieve the foregoing object of the present invention, a reflective LCD comprising: a first a substrate is provided with an array of pixels; a second substrate is disposed opposite the first substrate; a liquid crystal layer is disposed between the first and second substrates, and a reflective electrode is disposed on the second substrate and includes a plurality of first zones, and a plurality of second zones having a different height from the first zone; the first sum of the first lengths of the second zones arranged perpendicular to a first direction in winter, the ratio being perpendicular to The second sum of the second lengths of the second zones of the second direction is greater, such that the second zones have a higher reflectivity in the first direction than the second direction. To achieve the foregoing A purpose is to provide a method for manufacturing a reflective LCD, comprising the steps of: forming a pixel array on a first substrate; and coating an organic insulating film on the structure formed on the first substrate, the organic insulating film a first one, including a plurality, and a plurality of second regions having a height different from the first region, wherein the second regions are formed such that the second regions are arranged in a direction perpendicular to the first direction The first-to-sum of the first length component The second sum of the first length components of the first regions arranged perpendicular to the direction of the second direction is greater, and the second regions have a higher reflectivity in the first direction than the first direction; Forming a reflective electrode on the insulating film; forming a second substrate pair on the first substrate; and forming a liquid crystal layer between the nth substrate.

11 1300497 A7 __ B7 V. Inventive Note () 9 (Please read the note on the back and then fill out this page) Material «The present hair-and-purpose is to provide an electronic display device that contains an insulating substrate. Providing a pixel array and a reflection device coupled to the pixel array, and including a plurality of first regions and a plurality of first regions having different heights from the first region; wherein the second regions are set to 'make a first sum of the first-length components of the second regions arranged in a direction perpendicular to a first direction, and a second length component of the second regions arranged in a direction perpendicular to the second direction The sum of the two is greater, and the second regions have a higher reflectivity in the first direction than in the second direction. In order to achieve the foregoing further object of the present invention, there is provided a method of manufacturing an electronic display device comprising the steps of: forming a pixel array on an insulating substrate; and coating the structure formed on the insulating substrate a reflective device; wherein the reflective electrode is coupled to the pixel array, and includes a plurality of first regions and a plurality of second regions having different heights from the first region; wherein the second regions are configured to a first sum of first length components of the first region of the first region arranged in a direction perpendicular to a first direction, and a second sum of the second regions arranged in a direction perpendicular to a second direction The second sum of the length components is larger, and the second region has a souther reflection library in the second _ direction than the second direction. To achieve the foregoing, another object of the present invention is to provide a The reflective LCD includes: a first substrate on which an array of pixels is disposed; a second substrate disposed opposite the first substrate; a liquid crystal layer disposed between the first and second substrates; Set on the first substrate, which contains most of the The zone and the majority of the second zone have different heights from the first zone to scatter light, wherein the paper dimensions of the second zones arranged in a direction perpendicular to a first direction are applicable to the Chinese National Standard (CNS) A4 Specifications (210X297 mm 12 1300497 A7 B7 V. Invention description (please read the back note first and then fill out this page) The first-sum of the first length component is more than the number arranged in a direction perpendicular to a second direction. The second sum of the second length components of the two regions is greater such that the second regions have a higher reflectivity in the first direction than the second direction; and - the organic insulating film is disposed on the first substrate and the reflective electrode And having the same surface structure as the reflective electrode, wherein the surface structure of the organic insulating film extends to the outside of the boundary of one unit pixel. To achieve the foregoing another object of the present invention, an electronic display is provided. The device 'includes: - an insulating substrate is provided with a pixel array; a reflecting device is coupled to the image s array, and includes a plurality of first regions and a plurality of second regions having different heights from the first region. Light a first-sum sum of first length components of the second regions arranged perpendicular to the direction of the -first direction is greater than a second length component of the second regions arranged in a direction perpendicular to a second direction The second sum is larger, and the second regions have a higher reflectance in the first direction than the second direction; and - the organic insulating film is disposed between the first substrate and the opposite (four) pole, and has The same surface structure of the reflective electrode, wherein the surface structure of the organic insulating film extends to the outside of the boundary of a unit image. According to the invention, the majority of the first groove is continuously arranged in the horizontal direction, and most of The second groove is discontinuously arranged in the vertical direction and provided with a reflective electrode of the directional microlens surrounded by the first groove and the second groove, and the like, compared with the conventional reflective LCD. It has enhanced reflection efficiency in a specified direction. Therefore, the contrast and image product f will be significantly improved. Moreover, since the microlenses are oriented along the horizontal or vertical direction of the pixels, they are suitable for use in the Chinese National Standard (CNS) A4 specification (210X297) for electronic display papers that require high reflectivity in a particular direction. Gong Cheng) 13 - 1300497 A7 __B7 V. Invention Description ( ) 11 Display. Moreover, since the reflective electrode can be formed by an improved exposure and development method, the manufacturing cost and time can be reduced. When the groove filling member having various shapes is provided at the intersection of the grooves in the reflecting electrode, the reflectance of the reflecting electrode can be further improved, and the contrast and image quality are greatly improved. When the organic insulating film is formed, the grooves are provided at the outer region between the pixels in the same manner as the inner region of the pixel. ϋ, there will be no difference in south between the cell area and the external area between the cells. Therefore, residual image or distortion caused by light leakage during liquid crystal orientation can be eliminated. BRIEF DESCRIPTION OF THE DRAWINGS The above and other advantages of the present invention will be more apparent from the detailed description of the preferred embodiments, and the like. Partial plan view of the LCD; Fig. 2 is a cross-sectional view of the conventional reflection type of Fig. 1; - Figs. 3A to 3C are cross-sectional views showing the manufacture of the organic insulating film and the reflective electrode of Fig. 2; 4 is a cross-sectional view of a radiation type LCD according to a first embodiment of the present invention; FIG. 5A is a plan view of a reflective electrode in the LCD of FIG. 4; and FIG. 5B is a reflection electrode of another embodiment of the present invention. 6A to 6D are cross-sectional views showing a method of manufacturing the reflective LCD of FIG. 4; '7A and 7B are diagrams showing a contact hole formed on the upper surface of the organic insulating film of FIG. 6B and A cross-sectional view of the steps of most of the grooves; Figures 8A to 8C show the dimensions of the paper for manufacturing the reflective electrode of the second embodiment of the present invention applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -------- -------------Γ 丨·- (Please read the notes on the back and fill out this page)

• I 14 1300497 A7 ___B7_ V. BRIEF DESCRIPTION OF THE DRAWINGS ( ) FIG. 9 is a plan view of a reflective electrode according to a third embodiment of the present invention; FIGS. 10A to 10D are diagrams showing a reflective electrode according to a fourth embodiment of the present invention. FIG. 11 is a cross-sectional view showing a reflective electrode of a fifth embodiment of the present invention; FIGS. 12A to 12C are cross-sectional views showing a method of manufacturing the LCD of FIG. 11; and FIG. 13A is a sixth embodiment of the present invention; The planar layout of the reflective LCD of the reflective electrode is shown in FIG. 13B is a schematic cross-sectional view taken along line A-A' of FIG. 13A; and FIGS. 14A to 14D are reflective views showing the 13A and 13B drawings. A cross-sectional view showing a manufacturing method of LcD; - Figs. 15A and 15B are cross-sectional views showing a step of forming a contact hole and a plurality of grooves on the upper surface of the organic insulating film; - Fig. 16 is a plan view showing a second 1A to 17E is a plan view showing a mask pattern for fabricating a reflective electrode according to another embodiment of the present invention; FIGS. 18A to 18C are corresponding to one use. To make the inverse of the unit pixel of the reflective electrode of the embodiment of the present invention a plan view of the emitter electrode (or mask pattern); FIGS. 19 and 190 are graphs showing reflectance changes measured by an LCD having a reflective electrode of the 18th. FIG. 20A and FIG. 20B are diagrams showing the use of one having The reflectance change of the LCD of the reflective electrode of the 18th horse is measured at a viewing angle; the paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 public). (Please read the note on the back and fill out this page. ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) The change pattern; and the 22A and 22B are graphs showing the change in reflectance measured at a viewing angle using an LCD having the reflective electrode of FIG. The reflective LCD of the preferred embodiment of the present invention and a method of manufacturing the same will now be described in detail with reference to the accompanying drawings. ~ Embodiment 1 to Figure 4 are cross-sectional views of a reflective LCD of the first embodiment of the present invention. Referring to FIG. 4, a reflective LCD includes a first substrate 210 having an array of pixels disposed thereon, a second substrate 220 disposed opposite the first substrate 210, and a liquid crystal layer 230 disposed on the first substrate 210. And the second substrate 220; and a reflective electrode 235 shaped like a photo cell electrode; and disposed between the first substrate 210 and the liquid crystal layer 230. The first substrate 210 includes a first insulating substrate 240 and a thin film transistor (TFT) 245 as a switching device disposed on the first insulating substrate 240. The first substrate 210 is made of a non-conductive material such as glass, ceramic or the like. The TFT 245 includes a gate electrode 250, a gate insulating film 2.55, a semiconductor layer 260, a resistive contact layer 265, a source electrode 270, and a drain electrode 275. The gate electrode 250 is branched from a gate line (not shown) on the first insulating substrate 240, and has a two-layer structure, the bottom layer of which is made of chromium (Cr) and the top layer of which is made of aluminum (A1). production. The gate insulating film 255 is made of tantalum nitride (SixNy) and is formed on the entire surface of the first insulating film 240 provided with the gate electrode 250. This paper scale applies to Chinese national standard (_) M specification (210X297 mm) -----------------·:装-·.......":... ............——Line· (Please read the note on the back and then fill out this page) 1300497 A7 ------^- V. Invention description () 14 On the gate insulating film 255 is set in order A semiconductor layer 260 having an amorphous germanium and a resistive contact layer 265 of an n+ type amorphous germanium are provided. The source electrode 270 and the drain electrode 275 are provided on the resistive contact layer 265 and the gate insulating film mother 4255. The gate electrode 250 is disposed between the source electrode 270 and the drain electrode 275 to complete the TFT 245. The source electrode 270 and the drain electrode 275 are made of metal, such as tantalum (Ta), molybdenum (Mo). Titanium (Ti), chromium (Cr), etc. On the first absolute-edge substrate 240 provided with the TFT 245, an organic insulating film 280 made of a photoresist material is deposited. A contact hole 285 is provided. In the organic insulating film 280, a portion of the drain electrode 275 is exposed. The reflective electrode 235 is provided on the organic insulating film 280 including the contact hole 285. The reflective electrode 235 is via the contact hole 285. connection The drain electrode 275 is electrically connected to the reflective electrode 235. Fig. 5A is a detailed plan view of a reflective electrode corresponding to a unit pixel in the device shown in Fig. 4. As shown in Fig. 5A, The reflective electrode 235 of the present invention includes a plurality of first region portions 290 and a plurality of second region portions 295 having different heights from the first region portion 290. Along the first direction (vertical) a sum of the first length components of the second region portion 295 arranged in the second direction (horizontal direction) in a direction other than the first direction perpendicular to the second direction The second sum of the second length components of the second zone portion 295 is greater, such that the second zone portions 295 have a higher reflectivity in the first direction than the second direction.. For example, such The first zone part 290 and the second zone part 295 are applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) on the paper scale (please read the note on the back side and then fill in the page). 17 15 1300497 V. The description of the invention is lower than the number of 290 has a groove shape and its height (please read the back note first and then fill in this page) higher than the second move. 2 These second areas 295 have a bump shape and its height 295 can also be made 1 '44 first - The zone portion and the second zone portion have a convex shape on the first-region 290 and the height is high. The second zone 295 has a concave shape height lower than the first zone 290. 〇§等区°卩29〇 contains a plurality of first grooves 29〇& continually arranged in the horizontal direction. Further, a plurality of second grooves 2_ are discontinuously disposed in the vertical direction between the adjacent first grooves. In the second figure, the equal grooves 29〇b are arranged in an arc shape, so that the incident light will be reflected in the meandering direction as in the first and second directions. The second grooves 290b may also be formed in any form such as a straight line, a ring shape or the like. Preferably, the second recesses 290b are formed such that any of the recesses can be offset from the other adjacent recesses when arranged in the vertical direction. Preferably, the number of the second grooves provided in the vertical direction is 5·5 to 5 on each horizontal line of the unit pixel. The second zone portion 295 is a projection having a plurality of functions such as microlenses. In other words, the first portion 290 or the like composed of the continuous concave portion in the reflective electrode 235 is recessed to a certain depth lower than the projected second portion 295. Similarly, the second portion 295, which is formed by a relatively convex portion with respect to the first portion 290, is formed on the first substrate 210 to have a certain height. The second portion 295 of the microlens, such as a microlens that enhances reflection efficiency, is formed by a first portion 290 of the first recess 290a and the second recess 290b, and a unit pixel. Surrounded by boundaries. In other words, the paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 18 3 〇〇 497

, invention description 16 eve Ads ------------------------- armored _ (please read the notes on the back and fill out this page), one The second portion 295 is formed by two adjacent first grooves 29〇a, and two second grooves 29〇b in the central portion of the early pixels. And the second portion 295 adjacent to the boundary region of the unit pixel is composed of two adjacent first grooves 29a, a second groove 29b, and a part of the unit pixel Waiting for a common boundary to form. Since the directivity of the first portion 290 is set as such, the convex portion of the second region 295 will follow a first direction in the horizontal direction of a unit pixel, and along the unit pixel. The second direction in the vertical direction is oriented. Therefore, the present invention can be applied to a display having a higher reflectance in a specific direction than in other directions. According to the present invention, the convex portions of the second regions 295 have various shapes such as an elliptical shape 295a, a gradually obscuring or progressively curved meniscus 295^4, and a concave lens cross-sectional shape 295c. Racetrack shape 295d, half runway shape 295e, etc. Further, although the convex portions of the second portion 295 have the same shape, they may have different sizes from each other. The first and second recesses 29A, 290b, etc. in the first zone portion 290 each have a width range of about 2 to 5 μm. - The convex portion of the second region 295 has a different size in the range of about 4 to 20 μm. The interval between the center lines of the first grooves 290a arranged in parallel along the horizontal direction is set in the range of 5 to 2 μm, and the average is about 8·5 μm. The spacing between the ridges of the convex portions of the second regions 295 is set in the range of 12 to 22 μm, and the average is about 17 μm. Therefore, the shape and size of the convex portions of the second regions 295 can be differently changed, so that the interference phenomenon of the light reflected by the reflective electrodes can be minimized. This paper scale is applicable to the Chinese National Standard (CNS) Α4 specification (210X297 mm). 19 1300497 A7 _ B7_____ V. Description of the Invention (17) FIG. 5B is a detailed plan view of a reflective electrode according to another preferred embodiment of the present invention. The reflective electrode of Fig. 5B is the same as Fig. 5A except that a scattering recess 297 is provided in the central portion of each of the second regions 295. The scattering groove 297 prevents direct reflection of incident light and scatters the incident light. The size of the scattering groove 297 is preferably in the range of 2 to 3 μm. Referring back to FIG. 4, a first alignment film 300 is deposited on the reflective electrode 235 having the foregoing structure. The second substrate 220 facing the first substrate 210 includes a second insulating substrate 305, a filter. The color film 310, a common electrode 315, a second alignment film 320, a phase difference plate 325, and a polarizing plate 330. The second insulating substrate 305 is also made of a glass- or ceramic material, which is the same material as the first insulating substrate 240. The phase difference plate 325 and the polarizing plate 330 are sequentially disposed on the second insulating substrate 305. The color filter film 310 is deposited under the second insulating substrate 305, and the common electrode 315 and the second alignment film 320 are sequentially disposed under the color filter film 310 to complete the second substrate 220. The second alignment film 320 pre-angles the liquid crystal molecules of the liquid crystal layer 230 together with the first substrate 210. The spacers 335 and 336 and the like are placed between the first substrate 210 and the second substrate 220 to form a fixed gap therebetween for the liquid crystal layer 230 to be filled therein, that is, one of the reflective forms of the present invention LCD 200. Hereinafter, a method of manufacturing the reflective LCD of the present invention will be described in detail in conjunction with the drawings. Figures 6A to 6D are cross-sectional views showing the first actual paper size of the present invention in Figure 4 applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) ------------ ------------装-·- (Please read the notes on the back and fill out this page) i. 20 1300497 A7 • _B7__ V. Inventions ( ) 18 Reflective LCD of the example Manufacturing method. In the 6A to 6D drawings, the same elements are denoted by the same reference numerals. Referring to FIG. 6A, a metal layer is deposited on a first insulating substrate of glass or ceramic, such as group (Ta), titanium (Ti), copper (Mo), indium (A1), chromium (Cr), Copper (Cu), tungsten (W), and the like. Then, the metal layer is patterned to form a gate line, and a gate electrode 250 is disposed by the gate line branch. At this time, the gate electrode 250 and the gate line may be made of an alloy of Al-Cu or Al-Si-Cu. Further, a tantalum nitride film is deposited on the entire surface of the first insulating substrate 240 including the gate electrode 250 by plasma chemical vapor deposition to form the gate insulating film 255. On the gate insulating film 255, an amorphous ruthenium film and a doped n+ type amorphous ruthenium film are sequentially provided by plasma chemical vapor deposition. Then, the amorphous ruthenium film and the doped n+ amorphous ruthenium film will be patterned, and a semiconductor layer 260 and a resistive contact layer are continuously formed on the gate insulating film 255 provided with the gate electrode 250. 265. Then, a metal layer such as tantalum (Ta), titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr) v copper is coated on the first insulating substrate 240 provided with the above structure. (Cu), tungsten (W), and the like. That is, the metal layer is patterned to form a source electrode 270, and a drain electrode 275 is disposed by a source line branch. Therefore, a bonding transistor 245 including the gate electrode 250, the semiconductor layer 26.0, the resistive contact layer 265, the source electrode 270, the gate electrode 275, and the like can be completed. At this time, the gate insulating film 255 is interposed between the gate line and the source line, so that the gate line can be prevented from contacting the source line. .. Then, a photoresist film will be applied by spin coating on the TFT 245. This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the notes on the back and fill in the form) This page) -, can be 丨 21 1300497 A7 _ B7______ five, invention description ( ) 19 (please read the back of the note and then fill out this page) on the first insulating substrate 245 thickness of about 1~3 μηη, and form An organic insulating film 280 completes the first substrate 210. At this time, the organic insulating film 280 can be made, for example, of an acrylic resin containing PAC (Light Acting Component). Referring to FIG. 6 , a first mask 350 is calibrated to cover the organic insulating film 280 to form a contact hole 285. The organic insulating film is patterned through an exposure and development process, and the portion is formed. The contact hole 285 of the drain electrode 275 is exposed, and a plurality of four slots and the like are exposed. A method of forming the contact hole 285 on the organic insulating film 280, and a plurality of recesses will be explained below. Figs. 7 and 7 are cross-sectional views for explaining a method of forming contact holes, grooves, and the like on the organic insulating film 280. - Referring to Figures 7 and 7, the first mask 350 is calibrated over the organic insulating film 280 and is formed into a contact hole 285. The first mask 350 has a pattern corresponding to the contact hole 285. Then, the organic insulating film 280 is subjected to a first full exposure process to expose a portion of the organic insulating film 280 on the source/drain electrode 275. That is, the exposed organic insulating film 280 is subjected to a developing process, and a contact hole 285 exposing the source/drain electrode 275 is formed in the organic insulating film as shown in Fig. 7. Then, in order to form the grooves, a second mask 355 having a pattern corresponding to a groove for forming a micro-transparent mirror is calibrated to cover the organic insulating film 280 as shown in Fig. 7. At this time, the second mask 355 has the same pattern as the reflective electrode 235 in the fifth and fifth figures. Moreover, depending on the type of photoresist used, the second mask 355 can also have the Chinese National Standard (CNS) Α4 specification (210×297 mm) -22 - 1300497 A7 ______ B7_____. Description ( ) 20 The pattern in which the electrode 235 is inverted in shape. Specifically, the second mask 355 is formed by forming a pair of mask patterns on the transparent substrate in the first region of Fig. 5A. Further, as shown in Fig. 5b, the second mask 355 may also have a central recess pattern of about 2 to 3 μm in size. Therefore, the central recesses are formed in the central portion of the organic insulating film to improve the reflection efficiency. After the second mask 355 is used to expose the portion of the organic insulating film 280 except for the contact hole 285, a development process is performed, and a plurality of regular grooves are formed on the surface of the organic insulating film 280. 281. In other words, it will form a plurality of continuous grooves 281' on the organic insulating film 280 including a first groove having a fixed width in a first direction in the horizontal direction of the unit pixel and a vertical direction along the unit pixel. The second groove or the like in which the second direction is irregularly arranged. Therefore, the surface of the organic insulating film 28A can be divided into a first portion composed of a plurality of continuous grooves, and surrounded by the boundary portion of the unit pixels and the first portion. a second portion consisting of a plurality of protruding portions. In other words, after a plurality of grooves having a fixed width are formed along the ice flat direction of the unit cell, a plurality of grooves are provided along the vertical direction of the unit cell, and the protrusion formed by the groove is formed. In part, the convex portions surrounded by the plurality of grooves m are formed on the organic insulating film 280. Preferably, the vertically disposed grooves have a hemispherical cross-sectional shape. As described above, the first groove arranged along the horizontal direction of the unit pixel, and the second groove provided in the vertical direction, etc., each having a paper size of 2 to 5 μπ1 is applicable to the Chinese National Standard (CNS). Α4 specifications (210X297 mm) .....................Γ装-·-......"------ order... .......--...Line one (please read the notes on the back and fill out this page) -23 - 1300497 A7 ______B7_ V. Invention description ( ) 21 (Please read the note on the back first) The item is filled in again. The size of the protruding portion surrounded by the grooves has a size of 4 to 2 〇 μη. Further, the number of the second grooves arranged along the vertical direction is Regarding the reflectance in the first direction in the horizontal direction and the reflectance in the second direction in the vertical direction, the number can be changed, and it is preferable to be 〇 on every single horizontal line of a pixel unit. 52~5. The shape of the second grooves will illuminate all kinds of reflectivities on the pixel except for the vertical reflectivity. Therefore, when an equal reflectance is required for all directions, it is perpendicular to a required side. It is advantageous to increase the component of the straight line in the direction. Therefore, the convex portions provided on the organic insulating film preferably have a shape such that their lengths extending in the vertical direction have different sizes, such as straight lines. Or curved. When considering the reflectivity of the pixel in a particular direction, it is preferred that the vertically disposed grooves do not intersect adjacent vertical grooves (see Figure 5). Moreover, the second recesses may also be formed to be connected to or separated from the first recesses. 'In addition' using the mask as shown in Fig. 5 at the projection of the organic insulating film 280 When the pits are formed in a pit shape, the reflectance of the reflective electrode 235 provided on the organic insulating film 28 8 can be greatly increased. Please refer to FIG. 6C, as described above, in an excellent reflectance. After the metal layer, such as sho, nickel, chrome, silver, etc., is deposited on the organic insulating film 280 having the plurality of grooves 281, the deposited metal layer is patterned into a pixel shape and shaped as a gray Reflecting electrode 23 5. Then, a photoresist is coated on the reflective electrode 235, It will be rubbed to form a first alignment film 300' which can pre-tilt liquid crystal molecules in the liquid crystal layer at a selected angle. The reflective electrode 235 will have the same paper as the surface of the organic insulating film 280. The scale applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 24 1300497 A7 A ___________ B7 __ V. Invention description (). 22 (Please read the note on the back and then fill out this page) Shape. In other words, corresponding to The first region 290 of the recess 281 of the organic insulating film 280 has a structure, and a plurality of grooves or the like which are successively arranged in a first direction in a horizontal direction with a fixed width, and an irregular column in a second direction perpendicular thereto Most of the grooves are formed together. Due to the directivity of the reflective electrode 235 in the first region, the convex portion of the second region 295 can be aligned along the first direction of the vertical direction of the pixel and the second direction of the horizontal direction. The reflectance in a particular direction, such as the vertical direction, will be greatly enhanced. The reflective electrode 235 is divided into a first portion 29〇 having a plurality of recesses formed in the recess 281 of the organic insulating film, and a second portion 295 having a microlens region having a plurality of convex portions. . The first portion 290 is a continuous groove and is disposed lower than the second portion 295. Since the second portion 295 is surrounded by the first portion 29", the counter electrode 235 will have a structure formed by continuous recesses of the first portion 290. In the present invention, the grooves forming the first portion of the reflective electrode 235 have a width of about 2 to 5 μm, and the second portion 295 surrounded by the grooves has The different shapes are one, and at the same time have a size of about 4~2〇μηι: as shown in Figures 5 and 5Β. Referring to FIG. 61), a photochromic film 31, a transparent common electrode 315, and a second alignment film 32, etc., are sequentially disposed on the same material as the first insulating substrate 240. The material is 3〇5, and the second substrate 220 is completed. Then, the second substrate 220 is disposed on the first substrate 21, and is connected to each other with the spacer 335 and the like interposed therebetween, so that a gap is formed on the first substrate 210 and the second substrate. Between 220.嗣, when the liquid crystal paper size is applicable to the Chinese National Standard (CNS) Α4 specification (210X297 mm) 25 1300497 A7 ^___ B7 _ V. Invention Description ( ) 23 is injected into the first substrate 21 〇 and the second substrate by vacuum injection The liquid crystal layer 230 can be formed after the gap between the 22 turns, and the reflective LCD 200 of the present embodiment can be formed. Moreover, if necessary, a polarizing plate 33A and a phase difference plate 325 may be attached to the front surface of the second substrate 32A. Although not shown in the drawings, a black matrix may be provided between the second insulating substrate 3〇5 and the color filter film 31〇. - Embodiment 2 - Unlike Embodiment 1 described above, the present embodiment 2 can be formed on the organic insulating layer by using only one mask operation. In general, there are two methods of manufacturing the counter-radiation electrode as a reflector of an LCD. One is a method using a single-layer organic insulating film, and the other is a method using a two-layer organic insulating film. _ In the two methods, the latter uses a two-layer organic insulating film method, and the procedure of coating, exposing, and developing the organic insulating film is repeated twice. In other words, after the first applied organic insulating film is exposed to the full amount to form the convex portions, a second organic insulating film is overlaid on the first organic insulating film, and is exposed and developed again. To make a contact hole for exposing the source/drain electrode. This method can contribute to the reflectance of the reflective electrode provided on the organic insulating film, but the disadvantage is that the process is complicated and the manufacturing time and cost are increased. Due to these disadvantages, a method of using a single-layer organic insulating film is mainly used to form the reflective electrode. As shown in FIGS. 7A and 7B, after the organic insulating film 80 is overlaid on the entire surface of the first insulating substrate including the source/drain electrode 275, the paper scale is applicable to the Chinese National Standard (CNS) A4. Specifications (210X297 public) (Please read the note on the back and fill out this page). Install ', 1T—-line·* -26 - 1300497 A7 _ _ '_B7___ V. Invention description ( ) 24 (Please read the back first Note that the first mask 350 for forming the contact hole is placed in an exposure device, and then the portion of the organic insulating film 280 corresponding to the contact hole is used. Curtain 350 came first to expose. After the first exposure step is completed, a second mask 355 for forming a lens is placed in the exposure device, and a portion of the contact hole 285 other than the contact lens 285 to be formed will be exposed for the second time. Part of the first and second exposures will be imaged while the contact holes 285 and the microlens portions are formed. However, since the above method requires two masking steps, and two exposure steps to make the contact holes and the lens forming portion, the possibility of failure in unnecessary work increases, and the overall exposure time It will also increase. This embodiment provides the following manufacturing method in order to improve the efficiency in the exposure process. - Figs. 8A to 8C are cross-sectional views for explaining a method of manufacturing the reflective electrode of the present invention. Referring to Fig. 8A, an organic insulating film 370 is formed by spin coating to a thickness of about 1 to 3 μm and is provided on the entire surface of the insulating substrate 360 having the source/drain electrodes. That is, a first mask 375 having a predetermined pattern is calibrated to cover the organic insulating film 370 for making a contact hole 385. Then, the organic film 370 is subjected to partial exposure treatment. At this time, the partial exposure amount of the organic insulating film 370 passing through the first mask 375 becomes a value obtained by subtracting the lens exposure amount from the total exposure amount described in Figs. 6C and 60 >. In other words, when the partial exposure amount is "Ρ", the total exposure amount is "F", and the lens exposure amount is "R", the partial exposure amount can be obtained by the following formula (1): China National Standard (CNS) Α4 Specifications (210X297 mm) -27 - 1300497 A7 B7 V. Description of Invention ( ) 25 P=FR ...(1) (Please read the notes on the back and fill out this page) In this example Preferably, the portion of the exposure "P" is about 50% of the total exposure "F". According to the partial exposure amount, the contact hole 385 is formed in the organic insulating film 370 at a half of the target depth. As shown in Fig. 8B, in order to form a lens or the like on the top surface of the organic insulating film 370 by partial exposure, a second mask 380 having a predetermined pattern is calibrated to cover the organic insulating film 370. That is, the organic insulating film 370 is exposed through the second mask 380, and a plurality of grooves 371 are formed on the surface thereof, and a contact hole 385 of the source/drain electrode 365 is formed. Here, the second mask 380 has a pattern for exposing the contact hole portion 385 and the lenticular portion. Therefore, the portion of the organic insulating film 370 corresponding to the contact hole 385 is double-exposed, and is wider and deeper than the portion where the plurality of grooves 371 are formed, so that the grooves 371 can be combined with the exposure source. The contact holes 385 of the pole/drain electrodes 365 are simultaneously formed. In other words, according to the present invention, after the first mask 375 which can form the contact hole is covered on the insulating substrate 360, and the second mask 380 which can form the microlens, the contact of the organic insulating film 370 is: The first portion is first partially exposed by the first mask 375 to form the contact hole, and the exposure amount is subtracted from the total exposure amount suitable for forming the contact hole by a lens suitable for forming the lens. Exposure. Then, the lens forming portion and the contact hole forming portion of the organic insulating film 370 are sealed by the second mask 380 and simultaneously exposed to form the lenses, so that the organic insulating film 370 is formed with a contact hole 385. The portion will be double exposed and wider and deeper than the portion forming the grooves 371, but the groove portion. That is, the portion to be formed by the lens will be subjected to the Chinese National Standard (CNS) A4 specification (210X297 mm) -28 - 1300497 A7 ___B7_ V. The invention description ( ) 26 shallow exposure, compared with the contact hole portion. Therefore, the grooves 371 can be formed on the organic insulating film 370 simultaneously with the contact holes 385. Therefore, since one working process can be used for two processes, the insulating substrate and the mask can be set at one time, and the exposure time minus the lens exposure amount is shortened, which can save the exposure time; therefore, the implementation is performed. The time and cost of the method will be substantially reduced. In particular, since small- and medium-sized reflective LCDs, such as portable terminals or LCD television receivers, have a high number of exposures per substrate, the exposure time can be, for example, 30% less than conventional techniques. Or more, so that the total process time is significantly shortened. Referring to FIG. 8C', as previously described, a metal layer having excellent reflectivity, such as aluminum, nickel, chromium, silver, etc., is deposited on the organic insulating film 370 provided with the contact hole 385. A reflective electrode 390 is formed. In this case, the reflective electrode 390 is provided on the structure matching the structure of the underlying organic insulating film 370. Since the process after forming the reflective electrode 390 is the same as that of the first embodiment shown in Figs. 6C and 6D, the description thereof will be omitted. ~Example 3 to _ Fig. 9 is a plan view showing the pattern of the reflective electrode of the present embodiment. In the present embodiment, since the elements other than the reflective electrode 400 and the shape of the organic insulating film which determines the shape of the reflective electrode 400 are the same as those of the first embodiment, they will be omitted. Referring to Figure 9, the pattern of the reflective electrode 400 of the present embodiment includes a plurality of first region portions 410 and a plurality of second region portions 4〇5. The first portion 410 has a plurality of first recesses 410a, which are applicable to the Chinese National Standard (CNS) A4 specification (210×297 mm) along the horizontal paper scale of the pixel. l•装··.. ...."----丨#·................%# (Please read the notes on the back and fill out this page) -29 - 1300497 A7 --- _ B7___ V. INSTRUCTIONS (27) (Please read the note on the back and then fill out this page) The directions are arranged parallel to each other, and the majority of the second grooves 41〇1) are discontinuously arranged in the vertical direction of the pixel. The second portion 4〇5 includes a plurality of convex portions surrounded by the first portion 41〇 and the boundary line of the pixels. The protrusions forming the second portion 405 are formed. 4〇5a, 405b, 405c, etc., are enclosed by a plurality of grooves arranged in the horizontal direction and the vertical direction, and have an island shape. A fill groove convex body 4 will be set in each of the selected ones. Among the protruding portions 405a, 405b, and 405c, the convex portions of the second portion 405 are roughly divided into those having the groove-convex body and those having no grooved protrusions. In this embodiment The shapes of the recesses, the protruding portions 405a, 405b, and 405c, and the grooved protrusions 406 for forming the reflective electrode 4 are based on the organic insulating film provided under the reflective electrode 400. The pattern of the mask is determined. In other words, the figure 9 shows the pattern of the reflective electrode 4〇〇, but it can also be regarded as the pattern shape of the organic insulating film, or for the organic insulation. The pattern shape of the mask patterned by the film. As shown in Fig. 9, the mask also has a pattern corresponding to the grooves, and further includes an intersection between the first groove 410a and the second groove 41 Ob. Forming a groove pattern of the filling groove 406. In order to form the reflective electrode of the embodiment, a process for exposing the underlying organic insulating film according to the second embodiment will be performed, but the exposure process may also be performed. The grooves are formed by the method of the first embodiment. The grooves include a first portion 41 〇 which is a portion recessed from the second portion 405 and each has a width of about 2 to 5 μm. The continuous grooves are not fixed along the horizontal direction of the pixel It is arranged so that the groove provided in the vertical direction does not apply to the Chinese National Standard (CNS) Α4 specification (210×297 mm) -30 - 1300497 A7 ______Β7 in one of the vertical directions. OBJECT DESCRIPTION OF THE INVENTION ( ) 28 (Please read the note on the back and then fill out this page) The adjacent grooves intersect. In other words, the vertical rows of the convex portions passing through the second portion 4〇5 are arranged. The grooves are arranged such that they do not intersect in a straight line. The number of grooves passing through the convex portions of the second portion 4〇5 is related to the reflectance in the horizontal and vertical directions. Therefore, it can be changed depending on the size of the pixel, but it is preferably about 0.5 to 5 on a single horizontal line of each pixel. Further, the grooves which are arranged in the vertical direction and which pass through the convex portions are preferably in a hemispherical cross section. Since the vertically arranged grooves affect the reflectivity of the reflective electrode 400 in all directions except the vertical reflectance, it is preferably hemispherical, and the ytterbium exhibits the same reflectance in all directions. However, in order for the reflective electrode 400 to exhibit an asymmetrical high reflectance in a particular direction, the alignment component can be increased in a direction perpendicular to the desired direction. Further, the grooved projections 406 and the like which are protruded from the convex portions of the second portion 405 are provided in the vertically disposed second recesses 41〇1) and the first recesses arranged horizontally. At the junction of the groove 410a. Therefore, the cavities 4 can make the grooves provided on the organic insulating film have a uniform depth in the exposure and development process of the organic insulating film before the reflective electrode 400 is formed. In other words, since the horizontal width of the pattern is relatively larger than the other portions of the pattern at the parent fork point of the second groove 41〇b which is not aligned in the horizontally disposed first groove 410a, These intersections, under the same exposure conditions, will be etched deeper than the other portions, resulting in a flat profile that is different from the shape of the mask pattern. Therefore, when the mask pattern is manufactured, the recessed recessed portion 4〇6 and the mask pattern are formed together, and the organic insulating film is more etched at the intersection point than other portions. There is a degree of suppression to form a groove having a uniform depth on the top surface of the organic insulating film 370. In other words, the paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 public Chu) 31 A7 1300497 _B7___ V. Invention Description ( ) 29, the first part can be made to have the same (or the same) depth . The convex portions 405a, 405b, 405c and the like constituting the second partial portion have a racetrack shape (405a, 405b) or a concave lens shape (405c) and extend in the horizontal direction. However, although the projections have the same shape, they also have different sizes, and are in the range of about 4 to 20 μm; therefore, the interference of the light reflected by the reflection electrode 400 can be minimized. In this embodiment, as shown in FIG. 5, the reflectivity of the reflective electrode 400 can be increased by forming a pit-like groove in the center of each convex portion of the second portion 405. . ~ Embodiment 4 to 10th to 10D are enlarged plan views of a reflective electrode according to a fourth embodiment of the present invention, showing an enlargement of a horizontally arranged groove and a vertically arranged groove at the intersection of the pixel in the pixel. Figure. In this embodiment, the reflective electrode 420 preferably has the same shape as that of the first embodiment, but it may have a shape as in the third embodiment. Since the method of manufacturing the reflective electrode of the present embodiment is the same as that of the first or third embodiment, the description thereof will be omitted. – as shown in Figures 7 to 10D, a portion of a horizontal groove 425 intersecting a vertical groove 426 will be formed, for example, a dome (10Α), a triangle (10C), and a circle (10D). And grooving members 430, 431, 432, and 433 of inverted triangles (10 Β), etc., and 432 are disposed outside the intersection. The groove filling members 430, 431, 432, and 433 are formed by using a mask pattern which is used by the user when exposing and developing the organic insulating film, and can be used to form the reflective electrode 420. . In other words, instead of the grooved projection provided in the third embodiment, the paper size is applicable to the Chinese National Standard (CNS) Α4 specification (210X297 mm) ----------------- ( Please read the notes on the back and fill out this page.)

• I can be I - 32 _ 1300497 Α 7 Β 7 5. Inventive Note ( ) 30 406 ’ A mask pattern will be placed on the mask as shown in Figures 1QA to i〇D. The grooved members 430, 431, 432, 433 and the like disposed at the intersection of the first horizontal groove 425 and the second vertical groove 426 may be formed by exposing the organic insulating film to the image. After the reflective electrode 420, the grooves are laid on the entire surface of the pixel, so that the grooves are made to have the same depth. Generally, the depths of the first and second grooves 425 and 426 formed by the organic insulating film are formed under the same exposure amount and the same developing condition, so that there are Width of 425 and 426. If the width of the first and first grooves 425 and 426 is about 5 μm or less, the depth and width will be more closely related. The experimental results of the relationship between depth and width at a large exposure of approximately 3700 ms are shown in Table 1 below: Table 1

Groove width 2 μηη 3 μιη 4 μιη groove depth 2100 A 8700 A 10600 A Please refer to Table 1, when the widths of the first and second grooves 425 and 426 are 2 μηη, 3 μηι, 4 μηι, respectively , its depth will change eagerly. The intersection of the first horizontal groove 425 and the second vertical groove 426 may be deeper than other portions, and the reflective electrode 42 0 disposed on the organic insulating film may also be the same as the organic insulating layer. The problem. Therefore, the orientation of the liquid crystal material at the intersection portion is distorted to produce a specific region, and at the same time, light leakage occurs due to deflection of the liquid crystal material. Also, because the polarization of these parts of light will be applied to the Chinese national standard ((10)) Α 4 specifications (210X297 public). ....... "...Booking...---------r4# (Please read the notes on the back and fill out this page) 33 1300497 A7 _B7___ V. Inventions ( ) 31 (Please Read the back of the precautions and fill in this page. The variation of the brightness of the liquid crystal itself will change. Therefore, not only the reflection rate of the reflective electrode will decrease, but also the contrast and quality of the image will be largely However, in this embodiment, the correction of a mask pattern is performed at the intersection of the first horizontal groove 425 and the second vertical groove 426 of the reflective electrode 420 to form various shapes and 1~ The above-mentioned problem can be solved by the 3 μηι size of the grooving members 430, 431, 432, 433, etc. - Embodiment 5 to '11 is a cross-sectional view of a reflective LCD according to a fifth embodiment of the present invention. In addition to a TFT 560 disposed on the first insulating substrate 525, and a method of fabricating the TFT, the reflective electrode The other components, the method of the present embodiment, and the like are the same as the first embodiment. Referring to FIG. 4*11, a reflective LCD 500 of the present embodiment includes a first substrate 505 and a second substrate 510. To the first substrate, a liquid crystal layer 515 is disposed between the first substrate 505 and the second substrate 510, and a reflective electrode is disposed between the first substrate 505 and the liquid crystal layer 515. The first substrate 505 includes a first substrate 505. A second insulating substrate 525, and a TFT 560 are disposed on the first insulating substrate 525. The TFT 560 includes a gate electrode 540, and a source and drain regions 545, 550 are disposed under the gate electrode 540. A gate insulating film 535 is disposed between the gate electrode 540 and the source and drain electrodes 545, 550. An oxide layer 555 is disposed on the gate electrode 540, and a source electrode 570 is connected to the source region 545. And a drain electrode 575 is connected to the drain region 550. An organic insulating film 580 is disposed on the entire surface of the first substrate 505 having the T.FT thereon, and then a reflective electrode 520 has a plurality of grooves and the paper. The scale applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 34 1300497 A7 __B7_ The invention is provided on the organic insulating film 580. The reflective electrode 520 of the present invention can have the same shape as the first, third, and fourth embodiments, and the mask pattern used for squinting The second substrate 510 is provided with a second insulating substrate 600. A color filter film 605 is sequentially disposed under the second insulating substrate 600. A transparent common electrode 610, a second alignment film 615, and the like are disposed on the second insulating substrate 600, and a phase difference plate 620 and a polarizing plate 625 are sequentially disposed. The liquid crystal layer 515 is disposed between the first alignment film 590 on the first substrate 505 and the second alignment film 615 under the second substrate 510. Since the components are the same as in the first embodiment, the details are not redundant. 12A to 12C are cross-sectional views for explaining a method of manufacturing the reflective LCD in Fig. 11. - Referring to the 12th ABI, the polysilicon is deposited on a glass or ceramic insulating substrate 5 25 by low pressure chemical vapor deposition, and a polycrystalline germanium layer 530 is formed on the insulating substrate 525 by patterning. Then, tantalum nitride is deposited by plasma chemical vapor deposition on the insulating substrate 525Ji in which the polysilicon layer 530 is provided to form a gate insulating film 535, and then on the gate insulating film 535. A metal layer, such as a button, titanium, molybdenum, aluminum, chromium, copper, tungsten, etc., is deposited. The deposited metal layer 图 is patterned to form a gate electrode 540 branched from a gate line. Then, P-type ions are doped into the polysilicon layer 530 by an ion implantation method to form a source region 545 and a drain region of a thin film transistor 560. During the ion implantation process, the gate electrode 540 will be shaped like a mask. This paper scale applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) -----------------:Λ_装...玎.............. ... line (please read the note on the back and then fill out this page) -35 - 1300497 A7 _____B7______ V. Description of invention () 33 See page 12 & Figure 'An oxide film 5 5 5 will be deposited with a gate The insulating substrate 525 of the electrode 540 is partially etched to form the opening 546 of the source region 545 and the drain region 550 of the exposed TFT 560. And 551 and so on. Although Figs. 12A and 12B show a method of manufacturing the N-channel TFT, it is apparent that the P-channel TFT can also be fabricated in the same manner. Moreover, a pM〇s transistor can also be fabricated on a substrate by using a LOCOS (local oxidation of tantalum) method on a substrate of a P-type wafer to define a An isolation film between the active region and the field region; a gate region of a conductive material such as doped polysilicon or the like is formed on the active region; and a P+ source region and a gateless region are formed. As shown in Fig. 12C, a metal layer such as a button, titanium, molybdenum, aluminum, chromium, copper, tantalum or the like is deposited on the openings 546, 551 and the oxide film 555. The metal layer is patterned to form a gate electrode 540 and is disposed by a question line branch. The metal layer is then patterned to form a source electrode 570 and a electrodeless electrode 575 branched from a source line perpendicular to the gate line. Then, an organic insulating film 58CL is coated by a photosensitive resist by spin coating: on the entire surface of the substrate to a thickness of about 1 to 3 μm. Since the method of manufacturing the reflective LCD 500, the subsequent exposure and development process including the organic insulating film 580, and the method of forming a reflective electrode 52A are the same as those of the first embodiment, the description thereof will be omitted. . - Embodiment ό ~ As described above, the reflector structure of the LCD according to the present invention is formed by enclosing the first portion of the second portion at the same depth, and the paper scale is applicable to the Chinese national standard. (口^) Specifications (210X297 public) (Please read the notes on the back and fill out this page) • 丄, 一叮丨:丨 ▲·▲ -36 - 1300497

The reflection efficiency between the 34 and the boundary line and region between one pixel and another adjacent pixel form a state that is not clearly defined. In particular, please refer to the (4) diagram. When using the mask 355 to perform the "time" area, the pixel area will be exposed, but the - field between the pixels will not be exposed. The underlying insulating film 80' will be in the vicinity of the image area (Pin) and the external area of the pixel (p.). The existence of this height difference will not be obtained during the rubbing process. Consistent = friction effect', after the _LCD panel is made, the liquid crystal molecules are kept at the level of the solid state. In particular, since the outer region beyond the boundary of the cell is formed higher, At the beginning of the rubbing treatment, the rubbing treatment is performed to a weaker degree, so that residual images of the light leakage or distortion of the liquid crystal orientation may occur. Further, the rice is placed in the mat spacer scattering step before the liquid crystal is injected, and the spacers are If it is placed outside the boundary of the cell to form a higher place, the interval between the first and second substrates will not be fixed, so that it is difficult to form a stable LCD. The first portion of the insulating film and the portion of the second portion In the developing process, since there are boundary walls having a large height difference between the pixels, it will be difficult to uniformly form the first portion and the second portion. Further, if the organic insulating film is used When a calibration error occurs between the reflector and the top plate and the bottom plate, the change in reflectance becomes large, so that it is difficult to obtain uniform image quality. Therefore, the present embodiment is provided to solve the above disadvantages. This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) (please read the note on the back and fill out this page) 丨 丄 丨 丨 丨 丨 丨 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 Please read the precautions on the back side and fill in this page. Fig. 13A is a plan layout of a reflective LCD having a reflective electrode according to a sixth embodiment of the present invention, and Fig. 13B is a schematic cross-sectional view taken along line A-A'. Referring to FIGS. 13A and 13B, a reflective LCD 700 includes a first substrate 710 having an array of pixels disposed thereon, a second substrate 720 disposed opposite the first substrate 710, and a liquid crystal layer 730 disposed on the substrate. First substrate 710 and second Between the substrates 720, and a reflective electrode 735 as a pixel electrode, disposed between the first substrate 710 and the liquid crystal layer 730, the first substrate 710 includes a TFT 745 as a switching device, and is disposed on the first insulating substrate. The first insulating substrate 740 is a non-conductive material, such as glass or ceramic, etc. The TFT 745 includes a gate electrode 750 branched from a gate line 750a, and a gate insulating film 755, a semiconductor layer 760, a resistive contact layer 765, a source electrode 770, and a drain electrode 775. Further, under the drain electrode 775, a storage electrode 750b is disposed on the first insulating substrate 740. It is parallel to the gate line 750a. The gate electrode 750 has a two-layer structure consisting of a gate line (not shown in the figure) on a first jg edge substrate 740, and includes a lower layer of chromium and an upper layer of aluminum. The gate insulating film of tantalum nitride is overlaid on the entire surface of the first insulating substrate 74_0 provided with the gate electrode 750. The gate insulating film 755 provided with the gate electrode 750 is provided with the amorphous germanium semiconductor layer and the n + amorphous germanium resistive contact layer. The source electrode 7 7 0 and the drain electrode 7 7 5 are set at the gate of the paper. The Chinese National Standard (CNS) A4 specification (210×297 mm) is applied. 38 1300497 A7 B7 5. Inventive Note 36 The central portion of the resistive contact layer 765 and the gate insulating film 755 complete the germanium TFT 745. The source electrode 770 and the drain electrode 775 are made of a metal such as a button, a titanium alloy, or a chromium. On the first insulating substrate 740 provided with the TFT 745, an organic insulating film 780 such as a photoresist material is provided. There are a plurality of first portion portions (air grooves) and second portion portions (or protruding portions) having a height difference from the first portion portions, which are provided on the organic insulating film 780 At the meta-area, the district (please read the notes on the back and fill in the nest). Light scattering. Further, the first portion and the second portion of the pixel region or the like are extended to extend the outer region (Pout) between the pixel regions. The organic insulating film 780 includes a contact hole 785, and a portion of the electrode 775 of the TFT 745 is exposed. The reflective electrode 735 is disposed on the contact hole 785 and the organic insulating film 780. The reflective electrode 735 is connected to the small electrode 775 via the contact hole 785, so that the TFT 745 is electrically connected to the reflective electrode 735. A first alignment film 800 is stacked on the reflective electrode 735. The second substrate 720 of the first substrate 710 includes a second insulating substrate 805, a color filter 810, a common electrode 815, a second orientation 820, a phase difference plate 825, and a polarizing plate 830. The second insulating substrate 805 is made of the same slope or ceramic material as the first insulating substrate 740. The phase difference plate 825 and the polarizing plate 830 are sequentially & on the second insulating base #805. The color filter film 810 is provided under the insulating substrate 8〇5. The common electrode 815 and the second alignment film 820 are sequentially disposed under the color film 810 to complete the second substrate 720. The second alignment film 820 is pre-tilted with the first alignment film 800 at a selected angle. The liquid paper size of the liquid crystal layer 730 is applicable to the Chinese National Standard (TMs) A4 specification (210X297 public) 39 1300497 A7 _BT_____ V. Description of the invention ( ) 37 crystal molecules. (Please read the precautions on the back side and fill in this page.) The spacers 835, 836 and the like are interposed between the first substrate 710 and the second substrate 720, and a gap is formed therebetween. The liquid crystal layer 730 is disposed in the gap to complete the reflective LCD of the present embodiment. Hereinafter, a method of manufacturing a reflective LCD of an embodiment will be described in detail in conjunction with the drawings. 14A to 14D are cross-sectional views for explaining a method of manufacturing the reflective LCD of Figs. 13A and 13B. In the respective drawings, the same elements are denoted by the same reference numerals. Referring to Figure 14A, a metal layer, such as Ta, Ti, Mo, A, Cr, Cu, W, etc., is deposited on a glass or ceramic first insulating substrate 740. The metal layer is patterned to form a gate line 750a, a gate electrode 750 is branched from the gate line 750a, and a storage electrode line 750c is provided with the storage electrode 750b. At this time, the gate electrode 750 and the gate line 750a may be made of an alloy of Al-Cu or Al-Si-Cu. Then, tantalum nitride is deposited on the first insulating substrate 740 including the gate electrode 750 by plasma chemical vapor deposition to form an electrode insulating film 755. On the gate insulating film 755, an amorphous germanium film and an in-situ doped n+ amorphous germanium film are also sequentially provided by plasma chemical vapor deposition. Then, the amorphous ruthenium film and the in-situ doped n+ amorphous ruthenium film are patterned, and a semiconductor layer 760 and a resistive contact are formed on the gate insulating film 755 provided with the _ gate electrode 750. Layer 765. Then, on the first insulating substrate 740 having the above structure, a metal layer such as Ta, Ti, Mo, or 1, (^, (1; 11, ?, etc.) is provided. Applicable to China National Standard (CNS) A4 Specification (210X297 mm) -40 - 1300497 A7 _B7__ V. Invention Description ( ) 38 (Please read the note on the back and fill out this page) The metal layer will be patterned. Forming a source line (not shown) perpendicular to the gate line, and a source electrode 770 and a drain electrode 775 branched from the source line. Therefore, a package including the gate electrode 750 and the semiconductor The layer 760, the resistive contact layer 765, the source electrode 770, and the TFT 745 of the drain electrode 775 are completed. At this time, the gate insulating film 755 is interposed between the gate line and the source line. Therefore, the gate line can be prevented from contacting the source line. Then, a photoresist film is deposited by spin coating on the first insulating substrate 740 provided with the TFT 745 to a thickness of about 1 to 3 μm. An organic insulating film 780 is completed to complete the first substrate 710. At this time, the organic insulating film 780 is made of, for example, a PAC. (Photo-acting component) made of acrylic resin, etc. Please refer to Figure 14 for a "mask 850 will be calibrated to cover the organic insulating film 780 to form a contact hole 785; the organic insulating film will pass through The exposure development process is patterned to form a contact hole 785 partially exposed to the drain electrode 775, and a plurality of grooves, etc. Hereinafter, the contact on the top surface of the organic insulating film 780 will be described in detail. Hole 785 and a method of a plurality of grooves. _ 15th and 15th are cross-sectional views showing the process of making the contact hole and the plurality of recesses on the top surface of the organic insulating film. Please refer to pages 15 and 15 and A mask 850 is calibrated to cover the organic insulating film 7'', and the contact hole 785 is formed on the photoresist-made organic insulating film 780. The first mask 850 has a pattern corresponding to the contact hole 785. Then, the organic insulating film 780 receives the first full exposure process, and the paper size of the organic insulating film 780 on the source/drain electrode 775 is applicable to the Chinese National Standard (CNS) Α4 specification (210X297). Mm) 41 1300497 A7 ___ΒΊ __ 5. Description of the Invention ( ) 39 parts of exposure. In order to form a plurality of grooves 781 on the organic insulating film 780, a second mask 855 having a pattern corresponding to the groove 781 to be made into a microlens is to be The calibration is overlaid on the organic insulating film 780. Fig. 16 is a plan view showing the layout of the pattern on the second mask 855. In the second mask 855 shown in Fig. 16, one can be formed. The pattern of the second portion of the pattern extends to an outer region between pixels beyond the edge 691 of a unit cell. More specifically, referring to FIG. 16, the pattern of the second mask 855 for the reflective electrode is divided into a first portion 693 and a first portion 693 in the pixel. The second zone portion 695 of the height difference is located inside the side of the cell 691. The first zone portion 693 is formed to surround the second zone portion 695 with a closed loop. Wherein, the first zone portion 693 has a fixed width. The first portion 693 is formed into the shape of the groove and has a lower height than the second portion 695. The second portion 69 5 is formed into a convex shape and has a ratio The first zone portion 693 is of a higher height so that the second zone portion 695 will be shaped like a microlens. Therefore, since the first portion is made of a fixed width, the reflection efficiency is improved, and the image quality of the LCD is improved. As shown in Fig. 16, the second mask 855 is formed to have a pattern corresponding to the first portion of a transparent substrate. As described above, the pattern corresponding to the first portion is disposed in the inner region (Pin) of the pixel, and is designed to define the first paper scale of the reflective electrode to be applicable to the Chinese national standard (CNS). A4 size (210X297 mm) (Please read the note on the back and fill out this page) • Install ▲ ▲, can | | line, -42 - 1300497 A7 • _B7__ V. Invention description ( ) 40 (Read first Note on the back side of this page) Section 1 and Zone 2 sections. In the present embodiment, the mask pattern corresponding to the first region is set to extend from the inner region (Pin) of the pixel to the outer region (Pout) between the pixels. Depending on the type of photoresist used, the second mask 855 can also have a pattern that is inverted against the pattern shown. With the second mask 855, the portion of the organic insulating film 780 except the portion of the contact hole 785 will be exposed through a second lens exposure process. Then, the organic insulating film 780 is subjected to development processing, and a coil contact hole 78 5 exposing the source/drain discharge 775 is formed in the organic insulating film 780, and a plurality of irregular grooves 781 are formed. It is formed on the surface of the organic insulating film 780. _ As shown in Fig. 15B, the irregular grooves 781 and the like formed in the inner region of the pixel are similarly formed at the outer region (Pout) between the respective pixels. Referring back to Figure 14C, after a metal layer having good reflectivity such as A, Ni, Cr, Ag, etc. is deposited, the jhai metal layer is patterned into a predetermined image form to form the reflective electrode. 735. Then, a photoresist is coated on the reflective electrode 735 and rubbed to form the first alignment film 800, and the liquid crystal molecules of the liquid crystal layer can be pre-tilted at a predetermined angle. The reflective electrode will have the same shape as the top surface of the organic insulating film 780. The reflective electrode is divided into a first zone portion 790 and a second zone portion 795. The first zone portion 790 contains a plurality of grooves provided on the organic paper scale for the Chinese National Standard (CNS) Α 4 specification (210X297 mm) 43 1300497 A7 _ B7 __ V. Invention Description ( ) 41 Insulation film 780 In the groove 781, the second portion 795 has a plurality of convex portions which are microlens regions. At this time, the first zone portions 790 have continuous grooves which are recessed to a lower position than the second zone portions 795 corresponding to the projections, and the second The region portion 795 is surrounded by the first region portion 790, so that the reflective electrode 735 will have a structure surrounded by the first region portion 790 of the continuous groove. In this embodiment, the grooves of the first portion 790 of the reflective electrode 735 have a width of 2 to 5 μm, and the protruding portions of the second portion 795 have a thickness of about 4 to 20 μηι size. Referring to FIG. 14D, the color filter film 810, the transparent common electrode 815, and the second alignment film 820 are sequentially disposed on the second insulating substrate 805 made of the same material as the first insulating substrate 740. - completing the second substrate 720. The second substrate 720 is bonded to the first substrate 710 and has a spacer disposed therebetween to form a fixed gap between the first substrate 710 and the second substrate 720. Then, a liquid crystal material is injected into the gap by vacuum injection to form the liquid crystal layer 730, and the reflective LCD 700 of this embodiment is completed. Moreover, if necessary, the polarizing plate 830 and the phase difference plate 825 may be disposed on the entire surface of the second substrate 720, and although not shown in the drawings, the black matrix may be disposed on the second insulation. The substrate 805 is interposed between the color filter film 810. Figs. 17A to 173⁄4 are plan views showing a mask pattern for forming a reflective electrode of another embodiment of the present invention. First, the mask pattern shown in Figure 17A is similar. As shown in Figure 5A, except that the pattern for forming the second portion extends beyond the boundary of the pixel. The paper size applies to the Chinese National Standard (CNS). A4 size (210X297 mm) -----------------------Installation-------"··........ ........Line I (please read the note on the back and then fill out this page) 44 1300497 A7 _———____B7_ V. Inventive Note () External area of 42. The mask pattern of Figure 17A is The reflective electrode is formed and designed to have a higher reflectance than the other directions in a selected direction. The reflective electrode formed by the mask pattern of FIG. 17A includes a plurality of first partial portions 790 And a plurality of second zone portions 795 have a height difference with respect to the first zone portion 79. The second zone portions 795 are characterized by: along a direction perpendicular to the first direction (or vertical direction) a first sum of first length components arranged in two directions (or horizontal directions) is greater than a second sum of second length components arranged along a first direction perpendicular to the second direction, The second regions are caused to have a higher reflectivity in the first direction than in the second direction. For example, the first portion 79 has a groove shape and has a second portion 795 At a low height, the second portion is 5 in the shape of a bump and has a higher height than the first portion 790. Conversely, it can also make the first portion 790 convex. The styling has a higher height than the second zone portion 795, and the second zone portions 795 have a concave shape and a lower height than the first zone portion. The portion 790 is a first groove 79 including a number of turns, such as continuously extending in the horizontal direction. A plurality of second grooves 79 〇 b are discontinuously disposed in the adjacent first groove along the vertical direction. Between 79 〇 & In the drawing, although the second grooves are arranged in an arc form, the light energy is reflected to a direction other than the first and second directions; It is made into any shape, such as a straight line, or a ring, etc. Preferably, the second grooves 7901 are made in the second grooves 790b. Any groove that does not conform to the Chinese standard in the size of an adjacent concave paper set in the vertical direction ((3) Magic A4 specification (21〇χ297 公爱)...:Γ装-·:------ ...: order.............::40 (please read the notes on the back and fill out this page) -45 - 1300497 A7 P-— ___B7 _ V. Invention description () 43 slot intersection in a straight line Preferably, the number of second grooves arranged in the vertical direction is about 0.5 to 5 in each horizontal line of each unit pixel. The second portion 795 includes a plurality of shapes such as microlenses. The protruding part. In other words, the first portion 790 of the continuous grooves in the reflective electrode 735 is settled to a lower position at a lower depth than the projected second portion 795. Similarly, the second portion 795 has a portion that is more convex than the first portion 79, and is disposed on the first substrate 710 at a certain height. The second portion 795, which provides the reflectivity, is surrounded by the first portion 790 containing the first recess 790a and the second recess 790b, and the boundary of the unit pixel. In other words, the second portion 795, which is located at one of the central portions of a unit cell, is confined by the two adjacent first grooves 790a and second grooves 79B and the like. The second portion 795 adjacent to the boundary region of the unit pixel is surrounded by two adjacent first grooves 790a, a second groove 790b, and a part of the boundary of the unit pixel. limit. Due to the directivity of the first portion 790, the convex portions of the second portion 795 will be along the first direction 'the horizontal direction of a unit pixel' and the vertical of the unit pixel The second direction of the direction is oriented. Therefore, the LCD according to the present embodiment can be applied to a display which requires high reflectance in a specific direction. The convex portions constituting the second portion 795 have various shapes, such as an elliptical shape 795a, a tapered meniscus 795b, a concave lens sectional shape 795c, a racetrack shape 795d, a half runway shape 795_e, and the like. . Moreover, although the convex portions of the second portion 795 have the same shape, they have different paper sizes and are applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the cautions on the back first) Fill in this page) 丨 ' 订 订 订 订 • • • ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ Each of the first and second recesses 79A, 79B in the first zone portion 790 has a width of about 2 to 5 μm. The convex portion of the second portion 795 has a different size in the range of 4 to 20 μm. The interval between the center lines of the first grooves 790a disposed in parallel with each other in the horizontal direction is set to 5 to 2 〇 μηι, and the average is about 8·5 μη. The ridge pitch of the convex portion of the second portion 795 is set to 12 to 22 μm, and the average is about 17 μm. Therefore, the shape and size of the convex portions of the second portion 795 can be changed differently, so that the interference of the light reflected by the reflective electrode can be minimized. The mask pattern shown in the '17th drawing is similar to the 17th drawing except that a grooved convex pattern which can form the first portion of the same depth is provided in the first portion of the reflective electrode. The intersection (connection point) of the share. Moreover, the mask pattern shown in the 17th drawing is similar to that shown in Fig. 9, except that the pattern for forming the second portion extends to the side line 791 beyond one unit pixel. The outer area between the pixels. The reflective electrode formed by the mask pattern of Fig. 17 is divided into a plurality of first portion 410 and a plurality of second portions 4〇5. The first section 410 has a plurality of first recesses 410a disposed in parallel along the horizontal direction of the pixels, and a plurality of second recesses 410b disposed discontinuously in the vertical direction. The second portion 4〇5 has a plurality of convex portions 4〇5a, 405b, 405c and the like surrounded by the first portion 41〇 and the edge 791 of the pixel. The convex portions 4〇5a, 405b, 405c and the like constituting the second portion 405 are surrounded by the first and second grooves 410a and 41 Ob arranged in the horizontal and vertical directions. Limited, it has an island shape. The grooved projection 4〇6 is set to the Chinese National Standard (CNS) A4 specification (210X297 mm) for this paper size. .................1----··1#-- --- ------------% (Please read the notes on the back and fill out this page) 47 1300497 A7 ____ B7 _ V. Invention Description (μ) 45 In each of the selected projections Portions 405a, 405b, 405c. The cavities 406 may have a recess having a fixed depth which is disposed on the organic insulating film in a process of exposing and developing the organic insulating film to form the reflective electrode 4A. In other words, since the pattern at the intersection of the horizontally arranged first groove 410a and the vertically arranged second groove 41〇b is larger than the line width of the other portions of the pattern, the same exposure is obtained. Under the condition, it will be etched deeper at the intersection than other parts, and a flat shape which is not formed in the mask pattern can be obtained. Therefore, by making the concave pattern of the filling groove 406 together when the mask pattern is manufactured, the organic insulating film is more excessively engraved at the intersection point than other parts, and can be eliminated. To a certain extent, grooves having the same depth can be formed on the top surface of the organic insulating film 37A. In other words, the first zone portions can be made to have the same depth. 17C to 17E are views showing a mask pattern of another embodiment of the present invention. The mask pattern shown in Fig. 17C is similar to that of Fig. 17A except that in the pattern of the reflective electrode, there is no vertical groove 790b for forming the first portion 790. To the pattern, again, the mask pattern shown in Fig. 17D is also similar to that of Fig. 17A, except that in the pattern of the reflective electrode, only one image of each of the image regions is formed to form the first portion 79. The vertical pattern of the second recess 79 is disposed between the first recesses of the adjacent first portion. The mask pattern not shown in Fig. 17E is similar to that shown in Fig. 17A, except that in the pattern of the reflective electrode, each pixel has only 个5 for forming the first 35 part of the 79G. The vertical pattern of the two grooves 79Gb is sandwiched between the first grooves of the adjacent first zone portions. This paper scale applies to China National Standard (CNS) A4 specification (210X297 public) -------------------V: Install-·......."- ---丨, 可..................丨-线1· (Please read the notes on the back and fill out this page) -48 - 1300497 A7 ________·_B7____ V. Description of the invention ( According to the foregoing embodiment, when an organic insulating film is formed before forming a reflective electrode, a groove is provided between the pixels as in the pixel region. The outer region. As a result, no height difference will occur between the inner and outer regions of the cell region. Therefore, it can eliminate the distortion of the residual image due to light leakage when the liquid crystal is oriented. After the spacers, a uniform gap can be maintained between the first and second substrates. Furthermore, the LCD of the present invention has a plurality of first grooves arranged in the horizontal direction, and most of the vertical directions are not a second groove or the like is continuously arranged, and a microlens-type reflective electrode is formed and oriented by the first and second grooves, etc., so that it is more conventional The radiation type LCD can have a very high reflection efficiency in a specific direction. Therefore, the image contrast and quality caused by the reflective LCD of the present invention can be remarkably improved. ~ Reflectance Test ~ - 18A to 18C The figure is a plan view of a reflective electrode (or a mask pattern) corresponding to one unit pixel for forming a reflective electrode of an embodiment of the present invention. The mask pattern of FIGS. 18A to 18C and FIG. 9 can be used. The LCD having the reflective electrode of the second embodiment. Fig. 18A is a mask pattern in which a single second groove is formed, and the first groove between the & horizontal direction is the first. The figure shows a mask pattern in which only the first groove is provided; the i8c diagram shows a mask pattern in which only 0.5 of each horizontal length of a unit pixel is present. The second groove is disposed between the first grooves. Table 2 below shows the use of the Chinese National Standard (CNS) A4 specification (21〇χ297 mm) using the paper size of Figures 18A to 18C and Figure 9. -----------------Buy·· (Please read the notes on the back and fill out this page) -, can be 1: line! «.▲ 49 1300497 A7 B7 V. Description of invention (47 reflectance value measured by the LCD panel of the reflective electrode. When measuring the reflectance in the horizontal direction, the light will be upwards 30 degrees The incident angle is incident; when measuring the reflectance in the vertical direction, the light is incident at an incident angle of 30 degrees to the left or right. At this time, the reflectance can be obtained by the following formula (2) .: / The reflection measured by the LCD panel is 'R (reflectance):

The reflectance of xlOO and a standard reflector (BaS04) ^ The reflectance measured by the front side is shown in Table 2 in Table 2 below. (7) Reflectance W/D reflection in the horizontal direction of the vertical direction of the mask type Rate C/RW/D reflectance C/R Figure 18A Figure 78.5/2.81 27.93 12.1/0.55 22 Figure 18B Figure 232.8/11.4 20.42 0.35/0.17 2 Figure 18C Figure 153/5.16 29.65 5.1/0.3 17 Figure 9 Figure 35.4/1.03 34.36 14/0.38 36.84 Note 1): W/D reflectivity represents white reflectance / black reflectivity. The white reflectance is a value measured in a state in which the LCD panel is not driven, and the black reflectance is a value measured when the LCD panel is driven. Note 2): C/R stands for the contrast ratio. Further, the reflectance is measured by using an LCD panel including the reflecting electrodes of Figs. 18A to 18C and Fig. 9 and changing the viewing angle from the front side in the vertical direction or in the horizontal direction. The light is incident on the front side of the panel from a point of 30 degrees upward, and the reflectivity of the reflected light will be measured, and the angle is changed to 50 degrees upward, or the Chinese national standard (CNS) is applied along the paper scale. A4 size (210X297 mm) (Please read the note on the back and fill out this page) 50 1300497 A7 _ B7__ V. Invention description ( ) 48 The left side of the front side is tested, and the final reflectance will be determined by the above formula ( 2) Come and get. Figs. 19A and 19B are graphs showing changes in reflectance measured using an LCD having a reflective electrode of Fig. 18A. In particular, the μα map shows the change in reflectance measured by changing the reflection angle of the LCD panel face up, and the 19B graph shows the change of the reflection angle from the front side of the Lcd panel along the left side of the potato. The change in reflectivity. Figures 20A and 20B show the change in reflectance measured using an LCD having a reflective electrode of Figure 18B. In particular, FIG. 2A is a view showing a change in reflectance measured by changing the reflection angle of the LCD panel face up, and FIG. 20B is a view showing a change of the reflection angle from the front side of the LCD panel in the left direction. The measured change in reflectivity. 21A and 21B are graphs showing changes in reflectance measured using an LCD having a reflective electrode of Fig. 18C. In particular, Figure 21a shows the change in reflectance measured by changing the angle of reflection of the LCD panel face up, and 21B® shows the change in the angle of reflection from the front of the LCD panel along the left side. The widening of the reflectivity. 22A and 22B are graphs showing changes in reflectance measured using LC^D having the reflective electrode of Fig. 9. In particular, FIG. 22A shows a change in reflectance measured by changing the reflection angle of the LCD panel face up, and FIG. 22Bff shows the change of the reflection angle by the front side of the LCD panel in the left direction. The change in reflectivity. In Figs. 19A to 22B, the vertical axis represents the measured reflectance, and the horizontal axis represents the angle at the front of the LCD panel. Also, in each of the figures, the paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the note on the back and fill out this page). Attack -51 - 1300497 A7 Factory _ B7__ V. DESCRIPTION OF THE INVENTION ( ) 49 ♦ The symbol represents a measurement of the white state when the LCD panel is not driven, the symbol represents the measured value of the black state of the LCD panel when it is driven, and the ▲ symbol represents the contrast ratio. As shown in Table 2 and Figs. 19A to 22B, the LCD panel having the reflective electrode of the present invention shows that the reflectance in the horizontal direction is higher than that in the vertical direction. Therefore, when such LCDs are applied to devices in which the reflectance in the vertical direction is particularly important, the light efficiency can be enhanced. Further, when the second grooves are not provided, i.e., as shown in Fig. 18B, the reflectance in the vertical direction will be too high, and the reflectance in the horizontal direction will be too low. Therefore, it can be known that the second grooves preferably have at least 0.5 in each unit cell. For a handheld terminal, it is recommended that the reflectance in the vertical direction is preferably 2:1 to 3:1 in the horizontal direction, and the contrast ratio is preferably 30:; [to 40:1 〇 as described above The reflective LCd of the present invention comprises a plurality of first grooves continuously arranged in the horizontal direction, a plurality of second grooves arranged discontinuously in the vertical direction, and a first groove and a second concave The directional microlens reflective electrode formed by the groove or the like has an enhanced reflection efficiency for a characteristic direction compared to the conventional reflection type. Therefore, the contrast and image quality can be significantly improved; and 'because the microlenses are oriented along the horizontal or vertical direction of the pixel, they are suitable for electrons that have high and high transmittance for a particular direction. monitor. In addition, because the grooved parts with various shapes can be set on the reflective paper size, the Chinese National Standard (CNS) A4 specification (21〇χ297 mm)~~一卜·..................... !..."...Booking".............. (Please read the notes on the back and fill out this page.) -52 - 1300497 A7 B7 V. INSTRUCTIONS (50-pole groove intersection) Therefore, the reflectance of the reflective electrode can be further improved, and the contrast and image quality are greatly improved. Moreover, when the organic insulating film is formed before the reflective electrode is formed, the grooves will be like The inner region of the pixel is disposed at an outer region between the pixels. Therefore, a height difference is not generated between the pixel region and the external regions. Therefore, light leakage when the liquid crystal is oriented The residual image or distortion phenomenon formed can be eliminated. Moreover, a uniform gap can be obtained between the first substrate and the first substrate even after the spacer is disposed. Although the above embodiments show And an example of an LCd having a reflective electrode, but the invention is apparent The reflective electrode can be used for an electronic display that requires the reflective electrodes. In each of these examples, the light efficiency can be enhanced by controlling the reflectance so that the reflectance in the vertical direction is different from the reflectance in the horizontal direction. Although the present invention has been described in detail, it should be understood that various changes, (s), and modifications may be implemented without departing from the scope and spirit of the invention as defined in the appended claims. In the case of a backlit LCD, the embossed structures are not provided on the protective layer, and a transparent conductive material such as ITO and IZO may be used as the reflective electrode and the pad material.

(Please read the notes on the back and then fill out this page) Fortunately < Order - 53 1300497 A7 ___ _B7 V. Invention Description (5i) Component Label Control 10, 210 ' 505 \ 710 ... First Substrate 15 - 220 ^ 510 - 720 ... second substrate 20 · liquid crystal layer 25 ... gate bus line 30 , 240 , 525 , 740 · · first insulating substrate 35 , 250 , 540 , 750 ... gate electrode 40 ... source Bus lines 45, 270, 365, 570, 770 ... source electrodes 50, 235, 390, 400, 420, 520, 735... reflective electrodes 55... TFT devices 60, 275, 575, 775 ... drain electrodes 65, 285, 385, _785 ... contact holes 70, 71 · · dent 75, 255, 535, 755 ... gate insulating film 80, 260, 760 · · semiconductor layer 85, 90 ... contact layer 95, 280, 370, 580, 780 ... organic insulating film 100.. photoresist film 105 · · · light transmissive area 106.. shading area 110 ... mask 115.. convex ... 120, 300, 590, 800 .. First alignment film 125, 310, 605, 810 ... color filter film 110, 315, 610, 815 ... common electrode 135, 320, 615, 820 ... second alignment film 140, 30 5, 600, 805 ... second insulating substrate 200 > 500 > 700

...Reflective LCD Pan · (Please read the note on the back and fill out this page) ., Yes | This paper scale applies to China National Standard (CNS) A4 Specification (210X297 mm) 54 1300497 A7 B7 V. Invention Description ( ) 52 230, 515, 730············ 405, 695, 795 ... second zone portion 290a, 410a, 790a ... first groove 290b, 410b, 790b ... second groove 297 ... scattering groove 325, 620, 825 ... phase difference plates 330, 625, 830···polarizer 335, 336′835, 836...pad spacers 350, 375, 850··. first mask 355, 380, 855.·second mask 360...insulating substrate 406...filling groove Protrusion 425···horizontal groove 426···vertical groove 430, 431, 432, 433 ... filling groove 530... polycrystalline. 矽 layer 5 4 5... source region 546, 551... opening 550...thorium region 5 5 5...oxide layer 691,791...edge line 750a...gate line 750b···storage electrode 7S0c···storage electrode line (please read the back side first) Note: Please fill in this page). Install ' ., can | This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) 55

Claims (1)

56 1300497 6. The single horizontal line of the patent application scope varies between 0.5 and 5. 8. The liquid crystal display device of claim 5, wherein the reflective electrode forms a sump at the intersection of the first recess and the second recess. 9. The liquid crystal display device of claim 8, wherein the sump is a protrusion extending from the second region, and the sump is selected from At least one of the following groups is shaped: a chevron, a triangle, an inverted triangle, and a circle. 10. The liquid crystal display device of claim 1, wherein the first and second grooves have a width in the range of 2 to 5 μη. The liquid crystal display device of claim 1, wherein the region surrounded by the first and second grooves has at least two shapes selected from the group consisting of: elliptical shape, progressively crescent moon shape, and progressive loss Meniscus, racetrack shape, half runway shape, and an elongated concave lens shape. 12. The liquid crystal display device of claim 11, wherein the distance between the adjacent first grooves and the distance between the adjacent second grooves vary between 4 μηι and 20 μηι . 13. The liquid crystal display device of claim 1, wherein a region surrounded by the first and second grooves includes a scattering recess formed at a central portion. 14. The liquid crystal display device of claim 1, further comprising a thin film transistor as a switching element, the thin film transistor comprising a gate electrode, a gate insulating film, a semiconductor layer, and a resistive contact layer a source electrode, a drain electrode, etc. are sequentially formed on the first substrate 57 1300497 Sixth, the scope of application for patents. 15. The liquid crystal display device of claim 1, further comprising a thin film transistor as a switching element, the thin film transistor comprising a gate electrode, a source disposed under the gate electrode, and a drain region, a gate insulating film disposed between the gate electrode and the source and drain regions, an oxide layer disposed on the gate electrode, and a source electrode connected to the source region And a drain electrode connected to the drain region. The liquid crystal display device of claim 1, further comprising an organic insulating film formed between the first substrate and the reflective electrode, wherein the organic insulating film has the same surface structure as the reflective electrode. 17. A method of fabricating a liquid crystal display device comprising the steps of: forming an array of pixels on a substrate; An organic insulating film is formed on the structure of the substrate; a plurality of first regions are formed on a surface portion of the organic insulating film, and a second region having a height difference between the imaginary and the first regions is formed. The first region includes a plurality of first grooves and a plurality of second grooves extending in the H direction such that the reflective electrode is substantially orthogonal to the second direction of the factory direction The second recess is coupled to the first recesses adjacent to each other; 曰 forming a reflective electrode on the organic insulating film; forming a pair of second substrates facing the first substrate And forming a liquid crystal between the first substrate and the second substrate, as in the method of claim 17, wherein the β spin coating method is opened 彡忐. It is not formed in a thickness range of about 1 to 3 μηι. The method of claim 18, wherein the first region and the second region of the organic insulating film are used to have a corresponding one of the first region and the second region. The mask of the mask pattern exposes the organic insulating film, and the organic insulating film is developed to form the film. The method of claim 19, wherein the mask pattern corresponds to the first region, and the mask pattern comprises a scattering recess pattern, and a scattering recess can be formed at a central portion of the second region such as =. The method of claim 19, wherein the mask pattern comprises a groove pattern, wherein a groove is formed at an intersection of the first groove and the second groove, the filling The grooves enable the grooves of the first zone to have a uniform depth. The method of claim 19, wherein the step of forming the first region and the second region on the surface portion of the organic insulating film comprises the following steps: on the film = having the first pattern - the military screen is positioned in the organic insulation - the first mask is used to fully expose the organic insulating film, and the = contact hole is formed to connect the reflective electrode and the pixel array disposed on the substrate to have a second pattern a second mask is fixed over the film; and ♦ the core is organically insulated by the second mask to expose the organic organic insulating film to form the first region and the second region=film. The method of item 22, wherein the _th pattern has a shape of 59 1300497, the patent application is in the shape of a hetero-contact hole, and the second pattern has a shape corresponding to the area of the area or the second area. 24. The step of claim 19 of the patent scope is in the step of: the first region and the second region of the organic insulating film, which are made parallel to each other along the = direction and have one The width groove is selected, and the second grooves are formed discontinuously between the first grooves of the whirlpool 4 along the second direction. 25. The method of claim 19, wherein the step of forming the first region and the region comprises the steps of: forming a first mask having a first pattern on the film and positioning the organic insulation/utilization , the haidi-single screen partially exposes the organic insulating film, and the portion is also a contact hole connecting the reflective electrode and the pixel column disposed on the substrate; the second cover having the second pattern The screen is positioned above the film; and 'the second mask is used to expose the organic insulating film by lens, and the first and second regions are formed on the organic insulating film, and the contact hole is completed at the same time. The method of claim 25, wherein the partial exposure step is performed by an exposure 4, the exposure amount is a sub-exposure procedure to make a full exposure amount of the contact hole, minus for performing The amount of exposure resulting from the lens exposure of the lens exposure. 27. A liquid crystal display device comprising: 60 1300497. A patented invention-insulating substrate having an array of pixels formed thereon; and a reflector electrically coupled to the array of pixels and including a plurality of a recess extending in a first direction such that the reflector has a Lee's reflectivity in a second direction substantially orthogonal to the first direction and is between the first A distance between the grooves is irregular. 2 8 · The liquid crystal display device of claim 27, t includes a thin film transistor as a switching element, the thin film transistor comprising a pole electrode, a gate insulating layer, a semiconductor a layer, a resistive contact layer, and a source and drain electrode; or a gate electrode, a source and a drain region disposed under the gate electrode, _ disposed at the gate electrode and the source A gate insulating film between the drain regions, an oxide layer disposed on the gate electrode, a source electrode connected to the source region, and a gate electrode connected to the gate region. 29. A method of fabricating a liquid crystal display device comprising the steps of: forming an array of pixels on an insulative substrate; and forming a reflector on the insulative substrate, the reflector being electrically connected to the pixel An array, wherein the reflector comprises a plurality of first regions, and a second region having a height difference with the first region such as "Hai", wherein the first region includes a plurality of first grooves and a plurality of second portions a groove extending in a first direction to make the reflector highly reflective in a second direction substantially orthogonal to the first direction, and the second groove is coupled The first groove adjacent to each other. 3. The method of claim 29, wherein the step of making the reflector is 1300497. The scope of the patent application is formed on the insulating substrate. 31. The method of claim 3, wherein the method of forming the photoresist film comprises: positioning a first mask having a first pattern over the photoresist film Using the first mask to fully expose the photoresist film Forming a contact hole to electrically connect the switching element of the pixel array with the reverse (four); positioning a second cover having a second pattern over the photoresist film; and Μ (4) masking the lens to expose the green film, And forming a region having the same surface structure as the first region and the second region in the surface portion of the photoresist film. 32. The method of claim 30, wherein the step of forming the photoresist film comprises : positioning a first mask having a first pattern over the photoresist film; and partially exposing the photoresist film by using a mask to form an electrical connection to the switching element of the pixel array Connecting the reflector; positioning a second mask having a first pattern over the photoresist film; and 'using the second mask to expose the photoresist film to the lens, and the photoresist film The surface # forms the first and second regions, and simultaneously completes the contact hole. 33. The method of claim 29, wherein the method further comprises the following steps: forming on the insulating substrate An organic insulating film; utilizing one having 62 1300497 63 Bay 497 64