TWI381397B - Cu-Ni-Si-Co based copper alloy for electronic materials and its manufacturing method - Google Patents
Cu-Ni-Si-Co based copper alloy for electronic materials and its manufacturing method Download PDFInfo
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Description
本發明係關於一種析出硬化型銅合金,尤其係關於一種適用於各種電子機器零件之Cu-Ni-Si-Co系銅合金。The present invention relates to a precipitation hardening type copper alloy, and more particularly to a Cu-Ni-Si-Co based copper alloy suitable for use in various electronic machine parts.
對於連接器、開關、繼電器、接腳、端子、導線架等之各種電子機器零件中所使用之電子材料用銅合金而言,要求其兼具有高強度及高導電性(或熱傳導性)作為基本特性。近年來,電子零件之高積體化及小型化、薄壁化急速發展,與此相對應地,對於電子機器零件中所使用之銅合金之要求水準正逐步提高。For copper alloys for electronic materials used in various electronic equipment parts such as connectors, switches, relays, pins, terminals, lead frames, etc., it is required to have both high strength and high electrical conductivity (or thermal conductivity). Basic characteristics. In recent years, the high-integration, miniaturization, and thinning of electronic components have been rapidly progressing, and accordingly, the level of demand for copper alloys used in electronic component parts is gradually increasing.
根據高強度及高導電性之觀點,代替作為電子材料用銅合金之先前之以磷青銅、黃銅等為代表之固溶強化型銅合金,析出硬化型銅合金之使用量正在增加。對於析出硬化型銅合金而言,藉由對經固溶化處理之過飽和固溶體進行時效處理,而使細微之析出物均勻地分散,於合金之強度提高之同時,銅中之固溶元素量減少,導電性提高。因此,可獲得強度、彈性等之機械性質優異且導電性、熱傳導性良好之材料。From the viewpoint of high strength and high electrical conductivity, the use amount of the precipitation hardening type copper alloy is increasing in place of the solid solution strengthening type copper alloy represented by phosphor bronze, brass, or the like which is a copper alloy for electronic materials. In the precipitation hardening type copper alloy, by subjecting the solution-treated supersaturated solid solution to aging treatment, the fine precipitates are uniformly dispersed, and the strength of the alloy is increased while the amount of solid solution elements in the copper is increased. Reduced and improved conductivity. Therefore, a material excellent in mechanical properties such as strength and elasticity and excellent in electrical conductivity and thermal conductivity can be obtained.
析出硬化型銅合金中,一般稱為卡遜系合金之Cu-Ni-Si系銅合金係兼備較高之導電性、強度、及彎曲加工性之代表性之銅合金,且係業界中正被廣為開發之合金之一。該銅合金係藉由使細微之Ni-Si系金屬間化合物粒子析出至 銅基質中來提高強度與導電率。Among the precipitation-hardened copper alloys, the Cu-Ni-Si-based copper alloy, which is generally called a Carson-based alloy, has a high copper alloy which is excellent in electrical conductivity, strength, and bending workability, and is widely used in the industry. One of the alloys developed. The copper alloy is obtained by precipitating fine Ni-Si-based intermetallic compound particles to Copper matrix to increase strength and electrical conductivity.
目前正嘗試藉由於卡遜合金中添加Co而進一步提高其特性。Attempts have been made to further improve its properties by adding Co to the Carson alloy.
於日本專利特開平11-222641號公報(專利文獻1)中,Co與Ni相同地與Si形成化合物,使機械強度提高,而於對Cu-Co-Si系進行時效處理時,其機械強度、導電性僅較Cu-Ni-Si系合金略優。其中亦揭示:若成本允許,則亦可選擇Cu-Co-Si系或Cu-Ni-Co-Si系。此外亦揭示:該合金之製造方法係於冷加工之後,以700~920℃進行再結晶處理,其次,進行25%以下之冷加工、及420~550℃之時效處理之後,進而進行25%以下之冷加工及低溫退火之方法(申請專利範圍第10項)。In the same manner as in Ni, Co forms a compound with Si to improve the mechanical strength, and when the aging treatment is performed on the Cu-Co-Si system, the mechanical strength thereof is obtained. The conductivity is only slightly better than that of the Cu-Ni-Si alloy. It is also revealed that a Cu-Co-Si system or a Cu-Ni-Co-Si system may be selected if the cost permits. Further, it is also disclosed that the alloy is produced by recrystallization at 700 to 920 ° C after cold working, and secondly, cold working at 25% or less, and aging treatment at 420 to 550 ° C, and further cold working of 25% or less. And low temperature annealing method (patent application scope 10).
日本專利特表2005-532477號公報(專利文獻2)中揭示一種熱銅合金,以重量計,其包括鎳:1%~2.5%、鈷:0.5~2.0%、矽:0.5%~1.5%以及由銅及不可避免之雜質所構成之剩餘部分,鎳與鈷之合計含量為1.7%~4.3%,(Ni+Co)/Si之比為2:1~7:1,該熱銅合金具有超過40%IACS之導電性。將鈷與矽相組合,為了限制粒子成長且提高耐軟化性,而形成對時效硬化有效之矽化物。其中亦揭示:該合金之製造方法係實施850℃~1000℃之熱加工→實施800℃~1000℃之固溶化處理→實施350℃~600℃之溫度之30分鐘~30小時之第一時效退火→實施使剖面積減少10%~50%之冷加工→實施以低於第一時效退火溫度之溫度進行之第二時效退火的方法(申請專利範圍第25項、第 26項)。Japanese Laid-Open Patent Publication No. 2005-532477 (Patent Document 2) discloses a hot copper alloy comprising nickel: 1% to 2.5%, cobalt: 0.5 to 2.0%, lanthanum: 0.5% to 1.5%, and The remainder of the composition of copper and unavoidable impurities, the total content of nickel and cobalt is 1.7% to 4.3%, and the ratio of (Ni + Co) / Si is 2:1 to 7:1, and the hot copper alloy has more than Conductivity of 40% IACS. In combination with cobalt and ruthenium, in order to limit particle growth and improve softening resistance, a telluride effective for age hardening is formed. It is also disclosed that the alloy is manufactured by performing hot working at 850 ° C to 1000 ° C → performing solution treatment at 800 ° C to 1000 ° C → performing first aging annealing at a temperature of 350 ° C to 600 ° C for 30 minutes to 30 hours. → Performing a cold working to reduce the cross-sectional area by 10% to 50% → performing a second aging annealing at a temperature lower than the first aging annealing temperature (Patent No. 25, 26 items).
國際公開第2006/101172號說明書(專利文獻3)中揭示:於固溶化處理中,若刻意提高加熱後之冷卻速度,則可進一步發揮提高Cu-Ni-Si系合金之強度之效果,因此將冷卻速度設為每秒約10℃以上而進行冷卻極具效果(段落0028)。In the specification of the International Publication No. 2006/101172 (Patent Document 3), it is disclosed that, in the solution treatment, if the cooling rate after heating is intentionally increased, the effect of improving the strength of the Cu-Ni-Si alloy can be further exerted. The cooling rate is set to be about 10 ° C or more per second, and cooling is highly effective (paragraph 0028).
日本專利特開平9-20943號公報中揭示如下之Cu-Ni-Si-Co系合金之製造方法:於熱壓延之後,實施85%以上之冷壓延,以450~480℃進行5~30分鐘之退火之後,實施30%以下之冷壓延,進而以450~500℃進行30~120分鐘之時效處理(申請專利範圍第5項)。Japanese Laid-Open Patent Publication No. Hei 9-20943 discloses a method for producing a Cu-Ni-Si-Co alloy as follows: after hot rolling, a cold rolling of 85% or more is carried out, and it is carried out at 450 to 480 ° C for 5 to 30 minutes. After the annealing, cold rolling of 30% or less is carried out, and aging treatment is carried out at 450 to 500 ° C for 30 to 120 minutes (the fifth patent application).
[專利文獻1]日本專利特開平11-222641號公報[Patent Document 1] Japanese Patent Laid-Open No. Hei 11-222641
[專利文獻2]日本專利特表2005-532477號公報[Patent Document 2] Japanese Patent Laid-Open Publication No. 2005-532477
[專利文獻3]國際公開第2006/101172號說明書[Patent Document 3] International Publication No. 2006/101172
[專利文獻4]日本專利特開平9-20943號公報[Patent Document 4] Japanese Patent Laid-Open No. 9-20943
如此,已知係藉由於Cu-Ni-Si系合金中添加Co而提高強度及導電性,但先前之Cu-Ni-Si-Co系合金存在如下問題:即使為同一材料,根據測定部位之不同,強度、應力緩和特性、彎曲粗度等機械特性亦容易產生偏差。As described above, it is known that the strength and conductivity are improved by the addition of Co to the Cu-Ni-Si-based alloy. However, the conventional Cu-Ni-Si-Co-based alloy has a problem that even if it is the same material, it depends on the measurement site. Mechanical properties such as strength, stress relaxation characteristics, and bending thickness are also likely to be deviated.
因此,本發明之課題之一在於提供一種具備較佳之機械特性及電特性且機械特性均一之Cu-Ni-Si-Co系合金作 為電子材料用之銅合金。又,本發明之另一課題在於提供一種用以製造上述Cu-Ni-Si-Co系合金之方法。Therefore, one of the problems of the present invention is to provide a Cu-Ni-Si-Co alloy which has better mechanical and electrical properties and uniform mechanical properties. A copper alloy for electronic materials. Further, another object of the present invention is to provide a method for producing the above Cu-Ni-Si-Co alloy.
首先,本發明者發現:至今為止之Cu-Ni-Si-Co系合金之結晶粒之大小偏差較大,且混合有大粒子與小粒子,進而已查明該結晶粒徑之不均一性與機械特性之偏差有關。於Cu-Ni-Si-Co系合金中,因添加有Co,故必須以比通常之Cu-Ni-Si系合金高之溫度進行固溶化處理,此外其中再結晶粒容易粗大化。另一方面,固溶化處理步驟之前段中析出之結晶物或析出物等之第二相粒子會成為障礙物而阻礙結晶粒之成長。因此,Cu-Ni-Si-Co系合金與通常之Cu-Ni-Si系合金相比較,存在有再結晶粒之偏差易變大之傾向。First, the present inventors have found that the size of crystal grains of the Cu-Ni-Si-Co alloy to date has a large variation, and large particles and small particles are mixed, and the unevenness of the crystal grain size has been ascertained. The deviation of mechanical properties is related. In the Cu-Ni-Si-Co alloy, since Co is added, it is necessary to carry out a solution treatment at a temperature higher than that of a usual Cu-Ni-Si alloy, and in addition, the recrystallized grains are easily coarsened. On the other hand, the second phase particles such as crystals or precipitates precipitated in the previous stage of the solution treatment step become obstacles and hinder the growth of the crystal grains. Therefore, the Cu-Ni-Si-Co alloy tends to have a large variation in recrystallized grains as compared with a conventional Cu-Ni-Si alloy.
因此,本發明者對減小再結晶粒之偏差之方法進行銳意研究之後,獲得如下見解:於固溶化處理步驟之前段,預先使細微之第二相粒子儘可能以等間隔而同樣地析出至銅母相中,藉此,即使以較高之溫度進行固溶化處理,結晶粒因第二相粒子之釘扎效果(pinning effect)而不會變得太大,而且釘扎效果會均勻地作用於整個銅母相中,因此亦可使成長之再結晶粒之大小均一化。而且,已知其結果為可獲得機械特性之偏差小之Cu-Ni-Si-Co系合金。Therefore, the inventors of the present invention conducted intensive studies on the method of reducing the variation of the recrystallized grains, and obtained the following findings: in the preceding stage of the solution treatment step, the fine second phase particles are preliminarily precipitated at equal intervals as much as possible. In the copper matrix phase, even if the solution treatment is carried out at a relatively high temperature, the crystal grains do not become too large due to the pinning effect of the second phase particles, and the pinning effect uniformly acts. Throughout the copper matrix phase, the size of the growing recrystallized grains can also be uniformized. Further, as a result, it is known that a Cu-Ni-Si-Co alloy having a small variation in mechanical properties can be obtained.
以上述見解為背景而完成之本發明之一形態係一種電子材料用銅合金,其含有Ni:1.0~2.5質量%、Co:0.5~2.5質量%、Si:0.3~1.2質量%,剩餘部分由Cu及不可避 免之雜質所構成,該電子材料用銅合金之平均結晶粒徑為15~30μm,每觀察視野0.5mm2 之最大結晶粒徑與最小結晶粒徑之差之平均值為10μm以下。One aspect of the present invention completed in view of the above findings is a copper alloy for an electronic material containing Ni: 1.0 to 2.5% by mass, Co: 0.5 to 2.5% by mass, and Si: 0.3 to 1.2% by mass, the remainder being Cu and an unavoidable impurity are used. The average crystal grain size of the copper alloy for electronic material is 15 to 30 μm, and the average value of the difference between the maximum crystal grain size and the minimum crystal grain size of 0.5 mm 2 per observation field is 10 μm or less.
於一特定實施形態中,本發明之銅合金進一步含有最大為0.5質量%之Cr。In a specific embodiment, the copper alloy of the present invention further contains a maximum of 0.5% by mass of Cr.
於另一特定實施形態中,本發明之銅合金進一步包含總計最大為0.5質量%之選自Mg、Mn、Ag及P之1種或2種以上。In another specific embodiment, the copper alloy of the present invention further comprises one or more selected from the group consisting of Mg, Mn, Ag, and P in a total amount of 0.5% by mass in total.
於又一特定實施形態中,本發明之銅合金進一步包含總計最大為2.0質量%之選自Sn及Zn之1種或2種。In still another specific embodiment, the copper alloy of the present invention further comprises one or two selected from the group consisting of Sn and Zn in a total amount of 2.0% by mass in total.
於又一特定實施形態中,本發明之銅合金進一步包含總計最大為2.0質量%之選自As、Sb、Be、B、Ti、Zr、Al及Fe之1種或2種以上。In another specific embodiment, the copper alloy of the present invention further comprises one or more selected from the group consisting of As, Sb, Be, B, Ti, Zr, Al, and Fe in a total amount of 2.0% by mass in total.
又,於另一形態中,本發明係一種銅合金之製造方法,其包括依序進行以下步驟:步驟1,對具有所需組成之鑄錠進行熔解鑄造;步驟2,以950℃~1050℃加熱1小時之後進行熱壓延,將熱壓延結束時之溫度設為850℃以上,將自850℃至400℃之平均冷卻速度設為15℃/s以上而進行冷卻;步驟3,進行加工度為85%以上之冷壓延;步驟4,進行以350~500℃加熱1~24小時之時效處理;步驟5,以950℃~1050℃進行固溶化處理,將材料溫度自850℃下降至400℃之平均冷卻速度設為15℃/s以上而 進行冷卻;步驟6,進行隨意之冷壓延;步驟7,進行時效處理;以及步驟8,進行隨意之冷壓延。In another aspect, the present invention is a method for producing a copper alloy, comprising the steps of: step 1, performing melt casting on an ingot having a desired composition; and step 2, at 950 ° C to 1050 ° C After heating for 1 hour, hot rolling is performed, the temperature at the end of hot rolling is 850 ° C or higher, and the average cooling rate from 850 ° C to 400 ° C is 15 ° C / s or more for cooling; Step 3, processing The degree is more than 85% cold rolling; step 4, aging treatment at 350~500 °C for 1~24 hours; step 5, solid solution treatment at 950 °C ~ 1050 °C, the material temperature is lowered from 850 °C to 400 The average cooling rate of °C is set to 15 °C / s or more Cooling is carried out; step 6, optional cold rolling; step 7, aging treatment; and step 8, optional cold rolling.
於又一形態中,本發明係一種具備上述銅合金之伸銅品。In still another aspect, the present invention is a copper-clad product comprising the above copper alloy.
於又一形態中,本發明係一種具備上述銅合金之電子機器零件。In still another aspect, the present invention is an electronic machine component including the above copper alloy.
根據本發明,可使結晶粒徑於適當之範圍內均一化,故可獲得機械特性均一之Cu-Ni-Si-Co系合金。According to the present invention, the crystal grain size can be made uniform within an appropriate range, so that a Cu-Ni-Si-Co alloy having uniform mechanical properties can be obtained.
Ni、Co及Si,可藉由實施適當之熱處理而形成金屬間化合物,不使導電率劣化而實現高強度化。Ni, Co, and Si can form an intermetallic compound by performing appropriate heat treatment, and can achieve high strength without deteriorating the electrical conductivity.
若Ni、Co及Si之添加量分別為Ni:未滿1.0質量%、Co:未滿0.5質量%、Si:未滿0.3質量%,則無法獲得所需之強度,相反地,若Ni:超過2.5質量%、Co:超過2.5質量%、Si:超過1.2質量%,則雖可實現高強度化,但導電率明顯降低,進而熱加工性劣化。因此,Ni、Co及Si之添加量為Ni:1.0~2.5質量%、Co:0.5~2.5質量%、Si:0.3~1.2質量%。Ni、Co及Si之添加量較佳為Ni:1.5~2.0質量%、Co:0.5~2.0質量%、Si:0.5~1.0質量%。When the amounts of addition of Ni, Co, and Si are respectively Ni: less than 1.0% by mass, Co: less than 0.5% by mass, and Si: less than 0.3% by mass, the desired strength cannot be obtained. Conversely, if Ni: exceeds 2.5 mass%, Co: more than 2.5% by mass, and Si: more than 1.2% by mass, although high strength can be achieved, but the electrical conductivity is remarkably lowered, and the hot workability is deteriorated. Therefore, the addition amounts of Ni, Co, and Si are Ni: 1.0 to 2.5% by mass, Co: 0.5 to 2.5% by mass, and Si: 0.3 to 1.2% by mass. The addition amount of Ni, Co, and Si is preferably Ni: 1.5 to 2.0% by mass, Co: 0.5 to 2.0% by mass, and Si: 0.5 to 1.0% by mass.
Cr於熔解鑄造時之冷卻過程中會優先析出至結晶粒界,因此可對粒界進行強化,於熱加工時不易產生裂痕,從而可抑制良率之降低。亦即,利用固溶化處理等對熔解鑄造時粒界析出之Cr進行再固溶,而於後續之時效析出時,產生以Cr作為主成分之bcc結構之析出粒子或與Si之化合物。對於通常之Cu-Ni-Si系合金而言,所添加之Si量中,無助於時效析出之Si會於固溶於母相中之狀態下抑制導電率之上升,但藉由添加作為矽化物形成元素之Cr而進一步使矽化物析出,可減少固溶Si量,而可不損害強度而提昇導電率。然而,若Cr濃度超過0.5質量%,則容易形成粗大之第二相粒子,因而會損害產品特性。因此,於本發明之Cu-Ni-Si-Co系合金中,最大可添加0.5質量%之Cr。然而,若未滿0.03質量%,則其效果較小,因而較佳為添加0.03~0.5質量%,更佳為添加0.09~0.3質量%。Cr is preferentially precipitated to the crystal grain boundary during the cooling process during melt casting, so that the grain boundary can be strengthened, and cracks are less likely to occur during hot working, thereby suppressing a decrease in yield. In other words, Cr which is precipitated at the grain boundary during the melt casting is re-solid-solved by a solution treatment or the like, and when it is precipitated in the subsequent aging, a precipitated particle of a bcc structure containing Cr as a main component or a compound with Si is generated. In the conventional Cu-Ni-Si alloy, the amount of Si added does not contribute to the precipitation of Si, which inhibits the increase in conductivity in a state of being dissolved in the matrix phase, but is added as a deuteration. The Cr of the material forming element further precipitates the telluride, and the amount of solid solution Si can be reduced, and the conductivity can be improved without impairing the strength. However, if the Cr concentration exceeds 0.5% by mass, coarse second phase particles are easily formed, which may impair product characteristics. Therefore, in the Cu-Ni-Si-Co alloy of the present invention, 0.5% by mass of Cr can be added at the maximum. However, if it is less than 0.03 mass%, the effect is small, so it is preferably added in an amount of 0.03 to 0.5% by mass, more preferably 0.09 to 0.3% by mass.
若添加微量之Mg、Mn、Ag及P,則會改善強度、應力緩和特性等之產品特性而不損害導電率。主要藉由使上述Mg、Mn、Ag及P固溶於母相而發揮添加之效果,但亦可藉由使第二相粒子中含有上述Mg、Mn、Ag及P而發揮更進一步之效果。然而,若Mg、Mn、Ag及P之濃度之總計超過0.5%,則特性改善效果將飽和,且會損害製造性。因此,於本發明之Cu-Ni-Si-Co系合金中,最大可添加總計為0.5質量%之選自Mg、Mn、Ag及P中之1種或2種以上。 然而,若未滿0.01質量%,則其效果較小,因此較佳為總計添加0.01~0.5質量%,更佳為總計添加0.04~0.2質量%。When a small amount of Mg, Mn, Ag, and P is added, product characteristics such as strength and stress relaxation characteristics are improved without impairing electrical conductivity. The effect of addition is mainly achieved by solid-solving the Mg, Mn, Ag, and P in the matrix phase, but further effects can be exerted by including the Mg, Mn, Ag, and P in the second phase particles. However, if the total concentration of Mg, Mn, Ag, and P exceeds 0.5%, the property improving effect is saturated, and the manufacturability is impaired. Therefore, in the Cu-Ni-Si-Co alloy of the present invention, one or two or more selected from the group consisting of Mg, Mn, Ag, and P may be added in a total amount of 0.5% by mass. However, if it is less than 0.01% by mass, the effect is small, so it is preferable to add 0.01 to 0.5% by mass in total, and more preferably 0.04 to 0.2% by mass in total.
若添加微量之Sn及Zn,則會改善強度、應力緩和特性、鍍敷性等之產品特性而不會損害導電率。主要藉由使上述Sn及Zn固溶於母相而發揮添加之效果。然而,若Sn及Zn之總計超過2.0質量%,則特性改善效果將飽和,且會損害製造性。因此,於本發明之Cu-Ni-Si-Co系合金中,最大可添加總計為2.0質量%之選自Sn及Zn中之1種或2種。然而,若未滿0.05質量%,則其效果較小,因此較佳為總計添加0.05~2.0質量%,更佳為總計添加0.5~1.0質量%。When a small amount of Sn and Zn are added, product properties such as strength, stress relaxation characteristics, and plating properties are improved without impairing the electrical conductivity. The effect of addition is mainly exerted by dissolving the above Sn and Zn in the matrix phase. However, when the total of Sn and Zn exceeds 2.0% by mass, the property improving effect is saturated and the manufacturability is impaired. Therefore, in the Cu-Ni-Si-Co alloy of the present invention, a total of 2.0% by mass or less of one or two selected from the group consisting of Sn and Zn can be added. However, if it is less than 0.05% by mass, the effect is small, so it is preferable to add 0.05 to 2.0% by mass in total, and more preferably 0.5 to 1.0% by mass in total.
對於As、Sb、Be、B、Ti、Zr、Al及Fe而言,根據所要求之產品特性而對添加量進行調整,藉此改善導電率、強度、應力緩和特性、鍍敷性等之產品特性。主要藉由使上述As、Sb、Be、B、Ti、Zr、Al及Fe固溶於母相而發揮添加之效果,但亦可藉由使第二相粒子中含有上述As、Sb、Be、B、Ti、Zr、Al及Fe,或者形成新組成之第二相粒子而發揮更進一步之效果。然而,若該等元素之總計超過2.0質量%,則特性改善效果將飽和,且會損害製造性。因此,於本發明之Cu-Ni-Si-Co系合金中,最大可添加總計為2.0質量%之選自As、Sb、Be、B、Ti、Zr、Al及Fe之1種或2種以上。然而,若未滿0.001質量%,則其效果較小,因 此較佳為總計添加0.001~2.0質量%,更佳為總計添加0.05~1.0質量%。For As, Sb, Be, B, Ti, Zr, Al, and Fe, the amount of addition is adjusted according to the required product characteristics, thereby improving products such as conductivity, strength, stress relaxation characteristics, and plating properties. characteristic. The effect of addition is mainly achieved by dissolving the above As, Sb, Be, B, Ti, Zr, Al, and Fe in the matrix phase, but the second phase particles may contain the above-mentioned As, Sb, and Be, B, Ti, Zr, Al, and Fe, or the formation of a second phase particle of a new composition exerts a further effect. However, if the total of these elements exceeds 2.0% by mass, the property improving effect will be saturated and the manufacturability will be impaired. Therefore, in the Cu-Ni-Si-Co alloy of the present invention, a total of 2.0% by mass or more of one or more selected from the group consisting of As, Sb, Be, B, Ti, Zr, Al, and Fe may be added. . However, if it is less than 0.001% by mass, the effect is small because This is preferably 0.001 to 2.0% by mass in total, and more preferably 0.05 to 1.0% by mass in total.
若上述Mg、Mn、Ag、P、Sn、Zn、As、Sb、Be、B、Ti、Zr、Al及Fe之添加量合計超過3.0%,則易損害製造性,因而該等之合計較佳為2.0質量%以下,更佳為1.5質量%以下。When the total amount of Mg, Mn, Ag, P, Sn, Zn, As, Sb, Be, B, Ti, Zr, Al, and Fe added exceeds 3.0%, the manufacturability is liable to be impaired, so that the total amount of these is preferable. It is 2.0% by mass or less, more preferably 1.5% by mass or less.
結晶粒會對強度造成影響,強度與結晶粒徑之-1/2次方成比例即霍爾-佩契(Hall-Petch)方程式一般而言會成立。又,粗大之結晶粒會使彎曲加工性惡化,成為彎曲加工時之表面粗糙之主要原因。因此,關於銅合金,一般而言,結晶粒之細微化可提高強度,故而較佳。具體而言,較佳為30μm以下,更佳為23μm以下。The crystal grains have an effect on the strength, and the intensity is proportional to the -1/2 power of the crystal grain size, that is, the Hall-Petch equation generally holds. Further, the coarse crystal grains deteriorate the bending workability and become a cause of surface roughness during bending. Therefore, as for the copper alloy, in general, the fineness of the crystal grains can improve the strength, which is preferable. Specifically, it is preferably 30 μm or less, and more preferably 23 μm or less.
另一方面,如本發明之Cu-Ni-Si-Co系合金為析出強化型之合金,因此必須注意第二相粒子之析出狀態。於時效處理時析出至結晶粒內之第二相粒子有助於提高強度,但析出至結晶粒界之第二相粒子幾乎無助於提高強度。因此,為了提高強度,使第二相粒子析出至結晶粒內較佳。若結晶粒徑變小,則粒界面積變大,因而於時效處理時,第二相粒子容易優先析出至粒界。為了使第二相粒子析出至結晶粒內,結晶粒必須具有某程度之大小。具體而言,較佳為15μm以上,更佳為18μm以上。On the other hand, since the Cu-Ni-Si-Co alloy of the present invention is a precipitation strengthening type alloy, it is necessary to pay attention to the precipitation state of the second phase particles. The second phase particles which are precipitated into the crystal grains during the aging treatment contribute to the improvement of the strength, but the second phase particles which are precipitated to the crystal grain boundaries hardly contribute to the improvement of the strength. Therefore, in order to increase the strength, it is preferred to precipitate the second phase particles into the crystal grains. When the crystal grain size is small, the grain boundary area is increased, so that the second phase particles are preferentially precipitated to the grain boundary during the aging treatment. In order to precipitate the second phase particles into the crystal grains, the crystal grains must have a certain size. Specifically, it is preferably 15 μm or more, and more preferably 18 μm or more.
本發明中係將平均結晶粒徑控制於15~30μm之範圍。平均結晶粒徑較佳為18~23μm。藉由將平均結晶粒徑 控制於此種範圍,可均衡地獲得由結晶粒細微化產生之強度提高效果、及由析出硬化產生之強度提高效果該兩個效果。又,若為該範圍之結晶粒徑,則可獲得優異之彎曲加工性及應力緩和特性。In the present invention, the average crystal grain size is controlled in the range of 15 to 30 μm. The average crystal grain size is preferably from 18 to 23 μm. Average crystal grain size By controlling such a range, the two effects of the strength improving effect by the grain size finening and the strength improving effect by precipitation hardening can be obtained in a balanced manner. Moreover, if it is the crystal grain size of this range, the outstanding bending workability and stress relaxation characteristic can be acquired.
本發明中,所謂結晶粒徑,係指利用顯微鏡對平行於壓延方向之厚度方向之剖面進行觀察時,包圍各個結晶粒之最小圓的直徑,所謂平均結晶粒徑係指上述結晶粒徑之平均值。In the present invention, the crystal grain size refers to the diameter of the smallest circle surrounding each crystal grain when the cross section parallel to the thickness direction of the rolling direction is observed by a microscope, and the average crystal grain size means the average of the crystal grain sizes. value.
本發明中,每觀察視野0.5mm2 之最大結晶粒徑與最小結晶粒徑之差的平均值為10μm以下,較佳為7μm以下。差之平均值較理想為0μm,但實際上難以實現,因而將下限之實際之最低值設為3μm,典型而言最佳為3~7μm。於此,所謂最大結晶粒徑,係指於一個0.5mm2 之觀察視野中所觀察到的最大之結晶粒徑;所謂最小結晶粒徑,係指於同一視野中所觀察到的最小之結晶粒徑。於本發明中,在複數處之觀察視野中分別求得最大結晶粒徑與最小結晶粒徑之差,將該等差之平均值作為最大結晶粒徑與最小結晶粒徑之差之平均值。In the present invention, the average value of the difference between the maximum crystal grain size and the minimum crystal grain size per observation field of 0.5 mm 2 is 10 μm or less, preferably 7 μm or less. The average value of the difference is preferably 0 μm, but it is practically difficult to achieve, so the actual minimum value of the lower limit is set to 3 μm, and typically 3 to 7 μm. Here, the maximum crystal grain size refers to the largest crystal grain size observed in an observation field of 0.5 mm 2 ; the so-called minimum crystal grain size refers to the smallest crystal grain observed in the same field of view. path. In the present invention, the difference between the maximum crystal grain size and the minimum crystal grain size is obtained in the observation field at a plurality of points, and the average value of the differences is taken as the average value of the difference between the maximum crystal grain size and the minimum crystal grain size.
最大結晶粒徑與最小結晶粒徑之差較小,此係指結晶粒徑之大小均一,同一材料內之每個測定部位之機械特性之偏差減小。其結果,會使本發明之銅合金進行加工所得之伸銅品或電子機器零件之品質穩定性提高。The difference between the maximum crystal grain size and the minimum crystal grain size is small, which means that the crystal grain size is uniform, and the deviation of the mechanical properties of each measurement site in the same material is reduced. As a result, the quality stability of the copper-clad product or the electronic machine part obtained by processing the copper alloy of the present invention is improved.
卡遜系銅合金之一般製程中,首先使用大氣熔解爐, 將電解銅、Ni、Si、Co等之原料熔解,獲得所需組成之熔融物。繼而,將該熔融物鑄造成鑄錠。其後,進行熱壓延,並重複進行冷壓延與熱處理,從而製成具有所需厚度及特性之條或箔。熱處理中包括固溶化處理與時效處理。固溶化處理中,係以約700~1000℃之高溫進行加熱,使第二相粒子固溶於Cu母質中,同時使Cu母質再結晶。有時亦將熱壓延兼用作固溶化處理。時效處理中,係於約350~約550℃之溫度範圍加熱1小時以上,使已在固溶化處理中固溶之第二相粒子作為奈米級之細微粒子而析出。於該時效處理中,強度與導電率會上升。為了獲得更高之強度,有時於時效處理之前及/或時效處理之後進行冷壓延。又,於時效處理之後進行冷壓延之情形時,於冷壓延之後進行應力消除退火(低溫退火)。In the general process of the Caston copper alloy, the atmospheric melting furnace is used first. The raw materials of electrolytic copper, Ni, Si, Co, and the like are melted to obtain a melt of a desired composition. The melt is then cast into an ingot. Thereafter, hot rolling is performed, and cold rolling and heat treatment are repeated to form a strip or foil having a desired thickness and characteristics. The heat treatment includes solution treatment and aging treatment. In the solution treatment, heating is performed at a high temperature of about 700 to 1000 ° C to dissolve the second phase particles in the Cu matrix and recrystallize the Cu matrix. Hot rolling is also used as a solution treatment. In the aging treatment, the temperature is heated in a temperature range of about 350 to about 550 ° C for 1 hour or more, and the second phase particles which have been solid-solved in the solution treatment are precipitated as fine particles of the nanometer order. In this aging treatment, the strength and electrical conductivity will increase. In order to obtain higher strength, cold calendering is sometimes performed before the aging treatment and/or after the aging treatment. Further, in the case where cold rolling is performed after the aging treatment, stress relief annealing (low temperature annealing) is performed after cold rolling.
於上述各步驟之間歇,適當地進行用以除去表面之氧化銹皮之研削、研磨、及珠擊(shot blast)酸洗等。At the intervals of the above steps, grinding, polishing, and shot blast pickling for removing rust scale on the surface are appropriately performed.
本發明之銅合金基本上亦會經由上述製程,但為了將平均結晶粒徑及結晶粒徑之偏差控制於本發明中規定之範圍,如上所述,重要的是於固溶化處理步驟之前段,預先使細微之第二相粒子儘可能以等間隔且同樣地析出至銅母相中。為了獲得本發明之銅合金,尤其必須注意以下觀點而進行製造。The copper alloy of the present invention is basically also subjected to the above-described process, but in order to control the deviation of the average crystal grain size and the crystal grain size within the range specified in the present invention, as described above, it is important that the solid solution treatment step is preceded by The fine second phase particles are preliminarily precipitated into the copper matrix phase at equal intervals and in the same manner. In order to obtain the copper alloy of the present invention, it is particularly necessary to pay attention to the following viewpoints for production.
首先,於鑄造時之凝固過程中會不可避免地產生粗大之結晶物,於鑄造時之冷卻過程中會不可避免地產生粗大之析出物,因此於其後之步驟中,必須將該等結晶物固溶 於母相中。若以950℃~1050℃保持1小時以上之後進行熱壓延,且將熱壓延結束時之溫度設為850℃以上,則即使於已添加有Co,進而已添加有Cr之情形時,上述結晶物亦可固溶於母相中。950℃以上之溫度條件與其它卡遜系合金之情形相比係較高之溫度設定。若熱壓延前之保持溫度未滿950℃則固溶會不充分,若超過1050℃則存在材料熔解之可能性。又,若熱壓延結束時之溫度未滿850℃則已固溶之元素會再次析出,因而難以獲得高強度。因此,為了獲得高強度,較佳為以850℃結束熱壓延,並迅速冷卻。First, coarse crystals are inevitably produced during the solidification process during casting, and coarse precipitates are inevitably generated during the cooling process during casting. Therefore, in the subsequent steps, the crystals must be crystallized. Solid solution In the mother phase. When the temperature is 950 ° C to 1050 ° C for 1 hour or more and then hot rolling, and the temperature at the end of hot rolling is 850 ° C or higher, even if Co is added and Cr is added, the above The crystals can also be dissolved in the parent phase. Temperature conditions above 950 ° C are higher than those of other Carson-based alloys. If the holding temperature before hot rolling is less than 950 ° C, the solid solution may be insufficient, and if it exceeds 1050 ° C, the material may be melted. Further, when the temperature at the end of the hot rolling is less than 850 ° C, the elements which have been solid-solved are precipitated again, so that it is difficult to obtain high strength. Therefore, in order to obtain high strength, it is preferred to terminate the hot rolling at 850 ° C and rapidly cool it.
此時,若冷卻速度緩慢,則含有Co或Cr之Si系化合物將再次析出。當利用此種組成進行用以提高強度之熱處理(時效處理)時,因以冷卻過程中析出之析出物為核心而成長為無助於提高強度之粗大之析出物,故無法獲得高強度。因此,必須儘可能地提高冷卻速度,具體而言為15℃/s以上。然而,於至400℃左右為止之溫度下,第二相粒子之析出較為顯著,故未滿400℃時之冷卻速度不成為問題。因此,本發明中,將材料溫度自850℃至400℃為止之平均冷卻速度設為15℃/s以上,較佳為20℃/s以上而進行冷卻。所謂“自850℃降低至400℃為止時之平均冷卻速度”,係指對材料溫度自850℃降低至650℃為止之冷卻時間進行測量,並藉由“(850-400)(℃)/冷卻時間(s)”而算出之值(℃/s)。At this time, if the cooling rate is slow, the Si-based compound containing Co or Cr will be precipitated again. When the heat treatment (aging treatment) for increasing the strength is carried out by using such a composition, the precipitate which precipitated during the cooling process is the core and grows into a coarse precipitate which does not contribute to the improvement of strength, so that high strength cannot be obtained. Therefore, it is necessary to increase the cooling rate as much as possible, specifically, 15 ° C / s or more. However, since the precipitation of the second phase particles is remarkable at a temperature of up to about 400 ° C, the cooling rate at a temperature of less than 400 ° C is not a problem. Therefore, in the present invention, the average cooling rate of the material temperature from 850 ° C to 400 ° C is 15 ° C / s or more, preferably 20 ° C / s or more, and is cooled. The so-called "average cooling rate from 850 ° C to 400 ° C" refers to the measurement of the cooling time of the material temperature from 850 ° C to 650 ° C, and by "(850-400) ( ° C) / cooling The value (°C/s) calculated from time (s).
作為加快冷卻之方法,水冷最有效。然而,冷卻速度會根據用於水冷之水之溫度而變化,因此可藉由進行水溫 管理而進一步加快冷卻。若水溫為25℃以上,則有時會無法獲得所需之冷卻速度,因此較佳保持為25℃以下。若將材料放入至儲水之槽內進行水冷,則水之溫度會上升且易變為25℃以上,因此較佳為以霧狀(淋浴狀或薄霧狀)進行噴霧,以按照固定之水溫(25℃以下)對材料進行冷卻,或使恆常低溫之水於水槽中流動,從而防止水溫上升。又,增設水冷噴嘴或增加每單位時間之水量,藉此亦可使冷卻速度上升。As a method of speeding up cooling, water cooling is most effective. However, the cooling rate varies depending on the temperature of the water used for water cooling, so the water temperature can be used Management to further accelerate cooling. If the water temperature is 25 ° C or more, the required cooling rate may not be obtained, and therefore it is preferably kept at 25 ° C or lower. If the material is placed in a tank for water storage and water-cooled, the temperature of the water will rise and easily become 25 ° C or higher. Therefore, it is preferred to spray in a mist (shower or mist) to fix it. The water temperature (below 25 ° C) cools the material or allows the constant low temperature water to flow in the water tank to prevent the water temperature from rising. Further, by adding a water-cooling nozzle or increasing the amount of water per unit time, the cooling rate can also be increased.
於熱壓延之後實施冷壓延。為了使析出物均勻地析出,實施該冷壓延以增加成為析出位置之畸變,較佳為以85%以上之軋縮率而實施冷壓延,更佳為以95%以上之軋縮率而實施冷壓延。若不進行冷壓延而於熱壓延之後不久實施固溶化處理,則析出物不會均勻地析出。亦可適當地重複熱壓延及其後之冷壓延之組合。Cold rolling is performed after hot rolling. In order to uniformly precipitate the precipitate, the cold rolling is performed to increase the distortion at the deposition position, and it is preferable to carry out cold rolling at a rolling reduction ratio of 85% or more, and more preferably to perform cold rolling at a rolling reduction ratio of 95% or more. Calendering. If the solution treatment is carried out shortly after hot rolling without cold rolling, the precipitates are not uniformly deposited. The combination of hot rolling and subsequent cold rolling can also be suitably repeated.
於冷壓延之後實施第一時效處理。若於實施本步驟之前殘存有第二相粒子,則當實施本步驟時,此種第二相粒子會進一步成長,因而本步驟中最初析出之第二相粒子與粒徑會產生差異,但於本發明中,已於前段之步驟中使第二相粒子大致消失,因此,可使細微之第二相粒子以均勻之大小而同樣地析出。The first aging treatment is performed after cold rolling. If the second phase particles remain before the step is carried out, when the step is carried out, the second phase particles will further grow, so that the second phase particles initially precipitated in this step have a difference in particle size, but In the present invention, since the second phase particles are substantially eliminated in the step of the preceding stage, the fine second phase particles can be uniformly precipitated in a uniform size.
然而,若第一時效處理之時效溫度過低,則帶來釘扎效果之第二相粒子之析出量會減少,而僅可部分地獲得由固溶化處理產生之釘扎效果,因而結晶粒之大小變得不均。另一方面,若時效溫度過高,則第二相粒子變得粗大, 又,因第二相粒子會不均勻地析出,故第二相粒子之粒徑之大小會變得不均。又,時效時間越長則第二相粒子越生長,因而必須設定適當之時效時間。However, if the aging temperature of the first aging treatment is too low, the amount of precipitation of the second phase particles which bring the pinning effect is reduced, and only the pinning effect by the solution treatment can be partially obtained, and thus the crystal grains are The size becomes uneven. On the other hand, if the aging temperature is too high, the second phase particles become coarse. Further, since the second phase particles are unevenly precipitated, the particle size of the second phase particles becomes uneven. Further, the longer the aging time, the more the second phase particles grow, and it is necessary to set an appropriate aging time.
以350~500℃進行1~24小時之第一時效處理,較佳為以350℃以上且未滿400℃之溫度進行12~24小時之第一時效處理、以400℃以上且未滿450℃之溫度進行6~12小時之第一時效處理、以450℃以上且未滿500℃之溫度進行3~6小時之第一時效處理,藉此,可使細微之第二相粒子均勻地析出至母相中。若為此種組成,則可同樣地對下一步驟之固溶化處理中產生之再結晶粒之生長進行釘扎,從而可獲得結晶粒徑之偏差較小之整粒組成。The first aging treatment is performed at 350 to 500 ° C for 1 to 24 hours, preferably at a temperature of 350 ° C or higher and less than 400 ° C for the first aging treatment for 12 to 24 hours, at 400 ° C or higher and less than 450 ° C. The temperature is subjected to the first aging treatment for 6 to 12 hours, and the first aging treatment is performed at a temperature of 450 ° C or higher and less than 500 ° C for 3 to 6 hours, whereby the fine second phase particles can be uniformly deposited to In the mother phase. In the case of such a composition, the growth of the recrystallized grains generated in the solution treatment in the next step can be similarly pinned, and the composition of the whole grains having a small variation in crystal grain size can be obtained.
於第一時效處理之後進行固溶化處理。於此,一面使第二相粒子固溶,一面使細微且均勻之再結晶粒成長。因此,必須將固溶化溫度設為950℃~1050℃。於此,再結晶粒先成長,其後,因第一時效處理中析出之第二相粒子固溶,故可藉由釘扎效果而控制再結晶粒之成長。然而,因於第二相粒子固溶之後釘扎效果會消失,故若長時間連續進行固溶化處理,則再結晶粒將變大。因此,對於適當之固溶化處理之時間而言,於950℃以上且未滿1000℃之溫度時為60秒~300秒,較佳為120~180秒;於1000℃以上且未滿1050℃之溫度時為30秒~180秒,較佳為60秒~120秒。The solution treatment is carried out after the first aging treatment. Here, while the second phase particles are solid-solved, fine and uniform recrystallized grains are grown. Therefore, the solution temperature must be set to 950 ° C to 1050 ° C. Here, the recrystallized grains are first grown, and thereafter, since the second phase particles precipitated in the first aging treatment are solid-solved, the growth of the recrystallized grains can be controlled by the pinning effect. However, since the pinning effect disappears after solid solution of the second phase particles, if the solution treatment is continuously performed for a long period of time, the recrystallized grains become large. Therefore, the time for the appropriate solution treatment is 60 seconds to 300 seconds, preferably 120 to 180 seconds at a temperature of 950 ° C or more and less than 1000 ° C; and 1000 ° C or more and less than 1050 ° C. The temperature is 30 seconds to 180 seconds, preferably 60 seconds to 120 seconds.
即使於固溶化處理後之冷卻過程中,為了避免析出第二相粒子,材料溫度自850℃降低至400℃為止時之平均冷 卻速度應為15℃/s以上,較佳應為20℃/s以上。Even in the cooling process after solution treatment, in order to avoid precipitation of the second phase particles, the average temperature of the material temperature decreases from 850 ° C to 400 ° C However, the speed should be 15 ° C / s or more, preferably 20 ° C / s or more.
於固溶化處理之後實施第二時效處理。第二時效處理之條件可為對析出物之細微化有用而慣用實施之條件,但須注意對溫度及時間進行設定以使析出物不會粗大化。例舉時效處理之條件之一例如下:350~550℃之溫度範圍1~24小時,更佳為400~500℃之溫度範圍1~24小時。再者,時效處理後之冷卻速度幾乎不會對析出物之大小造成影響。於第二時效處理前之情形時,增加析出位置,利用析出位置來促進時效硬化,從而實現強度提昇。而於第二時效處理後之情形時,利用析出物來促進加工硬化,從而實現強度提昇。亦可於第二時效處理之前及/或之後實施冷壓延。A second aging treatment is performed after the solution treatment. The condition of the second aging treatment may be a condition that is practically used for the fineness of the precipitate, but care must be taken to set the temperature and time so that the precipitate does not coarsen. One of the conditions for aging treatment is as follows: a temperature range of 350 to 550 ° C for 1 to 24 hours, more preferably a temperature range of 400 to 500 ° C for 1 to 24 hours. Furthermore, the cooling rate after the aging treatment hardly affects the size of the precipitate. In the case of the second aging treatment, the precipitation position is increased, and the precipitation position is used to promote age hardening, thereby achieving strength improvement. In the case of the second aging treatment, the precipitate is used to promote work hardening, thereby achieving strength improvement. Cold rolling may also be performed before and/or after the second aging treatment.
本發明之Cu-Ni-Si-Co系合金可加工為各種伸銅品,例如可加工為板、條、管、棒及線,此外,本發明之Cu-Ni-Si-Co系銅合金可使用於導線架、連接器、接腳、端子、繼電器、開關、二次電池用箔材等之電子零件等。The Cu-Ni-Si-Co alloy of the present invention can be processed into various copper-exposed products, for example, can be processed into plates, strips, tubes, rods and wires, and in addition, the Cu-Ni-Si-Co-based copper alloy of the present invention can be processed. Used for electronic components such as lead frames, connectors, pins, terminals, relays, switches, and foils for secondary batteries.
以下,一併表示本發明之實施例與比較例,但該等實施例係為了更進一步理解本發明及其優點而提供者,並不對本發明進行限定。In the following, the embodiments and the comparative examples of the present invention are shown, but the present invention is not intended to limit the present invention.
於高頻熔解爐中,以1300℃將表1(實施例)及表2(比較例)所揭示之成分組成之銅合金熔化,將其鑄造成厚度為30mm之鑄錠。其次,將該鑄錠加熱至1000℃之後,對其進行熱壓延直至板厚為10mm為止,上升溫度(熱壓延 結束之溫度)係設為900℃。熱壓延結束之後,將材料溫度自850℃下降至400℃為止時之平均冷卻速度設為18℃/s而進行水冷,其後放置於空氣中進行冷卻。其次,為了除去表面之氧化銹皮而進行表面切削直至厚度為9mm為止,其後藉由冷壓延而形成厚度為0.15mm之板。繼而,以各種時效溫度實施3~12小時之第一時效處理之後,以各種固溶化溫度下進行120秒之固溶化處理,其後立即將材料溫度自850℃下降至400℃為止時之平均冷卻速度設為18℃/s而進行水冷,其後放置於空氣中進行冷卻。其次,將進行冷壓延直至厚度為0.10mm為止,以450℃並歷經3小時於惰性環境氣氛中實施第二時效處理,最後進行冷壓延直至厚度為0.08mm為止,從而製造出試驗片。In a high-frequency melting furnace, a copper alloy having the composition shown in Table 1 (Example) and Table 2 (Comparative Example) was melted at 1300 ° C, and cast into an ingot having a thickness of 30 mm. Next, after heating the ingot to 1000 ° C, it is hot rolled until the thickness is 10 mm, and the rising temperature (hot rolling) The temperature at the end was set to 900 °C. After the completion of the hot rolling, the average cooling rate when the material temperature was lowered from 850 ° C to 400 ° C was set to 18 ° C / s, and water-cooling was carried out, followed by being placed in the air for cooling. Next, surface cutting was performed to remove the scale of the surface to a thickness of 9 mm, and then a plate having a thickness of 0.15 mm was formed by cold rolling. Then, after performing the first aging treatment for 3 to 12 hours at various aging temperatures, the solution treatment is carried out at various solid solution temperatures for 120 seconds, and immediately after the material temperature is lowered from 850 ° C to 400 ° C, the average cooling is performed. The temperature was set to 18 ° C / s and water-cooled, and then placed in the air for cooling. Next, cold rolling was carried out until the thickness was 0.10 mm, and the second aging treatment was carried out at 450 ° C for 3 hours in an inert atmosphere, and finally cold rolling was performed until the thickness was 0.08 mm, thereby producing a test piece.
以下,對以上述方式獲得之各試驗片之各種特性進行評估。Hereinafter, various characteristics of each test piece obtained in the above manner were evaluated.
關於結晶粒徑,係以觀察面為平行於壓延方向之厚度方向之剖面之方式,將試料埋入至樹脂中,利用機械研磨對觀察面進行鏡面拋光之後,於相對於100容量份之水混合10容量份之濃度為36%之鹽酸而成之溶液中,溶解重量為該溶液重量之5%之氯化鐵。將試料於以上述方式製成之溶液中浸漬10秒,使金屬組成出現。其次,利用光學顯微鏡將上述金屬組成放大100倍,將0.5mm2 之觀察視野拍攝成一張照片,求出所有包圍各個結晶粒之最小圓之直徑,針對各觀察視野而算出平均值,將15處觀察視野之平均值 作為平均結晶粒徑。The crystal grain size is such that the observation surface is a cross section parallel to the thickness direction of the rolling direction, the sample is embedded in the resin, and the observation surface is mirror-polished by mechanical polishing, and then mixed with water of 100 parts by volume. In a solution of 10 parts by volume of 36% hydrochloric acid, the dissolved iron is 5% by weight of the solution. The sample was immersed in the solution prepared in the above manner for 10 seconds to cause a metal composition to appear. Next, the metal composition was magnified 100 times by an optical microscope, and an observation field of 0.5 mm 2 was taken as a photograph, and the diameter of all the smallest circles surrounding each crystal grain was determined, and the average value was calculated for each observation field, and 15 points were obtained. The average value of the visual field was observed as the average crystal grain size.
關於在求得平均結晶粒徑時所測得之結晶粒徑,係針對每個視野而求出最大值與最小值之差,將15處觀察視野之平均值作為最大結晶粒徑-最小結晶粒徑之差之平均值。Regarding the crystal grain size measured at the time of obtaining the average crystal grain size, the difference between the maximum value and the minimum value was obtained for each field of view, and the average value of the observation fields at 15 points was taken as the maximum crystal grain size - the smallest crystal grain size. The average of the difference in diameter.
關於強度,係進行壓延平行方向之拉伸試驗,測得0.2%之耐力(YS:MPa)。測定部位之強度之偏差為30處之最大強度-最小強度之差,平均強度為該30處之平均值。Regarding the strength, a tensile test in the parallel direction of rolling was performed, and an endurance of 0.2% (YS: MPa) was measured. The deviation of the strength of the measurement site is the difference between the maximum intensity and the minimum intensity at 30, and the average intensity is the average of the 30 points.
關於導電率(EC:%IACS),係藉由利用雙電橋之體積電阻率之測定而求出。測定部位之導電率之偏差為30處之最大強度-最小強度之差,平均導電率為該30處之平均值。The conductivity (EC: % IACS) was determined by measurement of the volume resistivity of the double bridge. The deviation of the conductivity of the measurement site was the difference between the maximum intensity and the minimum intensity at 30, and the average conductivity was the average of the 30 points.
關於應力緩和特性,如圖1所示,係於加工為寬10mm×長100mm之厚度t=0.08mm之各試驗片上,以標距l為25mm,且高度y0 上之負荷應力為0.2%耐力之80%之方式而決定高度,並負荷彎曲應力,對以150℃加熱1000小時後之圖2所示之永久變形量(高度)y進行測定,算出應力緩和率{[1-(y-y1 )(mm)/(y0 -y1 )(mm)]×100(%)}。再者,y1 為負荷應力前之初始之翹曲高度。測定部位之應力緩和率之偏差為30處之最大強度-最小強度之差,平均 應力緩和率為該30處之平均值。As for the stress relaxation characteristics, as shown in Fig. 1, the test piece having a thickness of 10 mm × 100 mm and a thickness of t = 0.08 mm is used, and the gauge length is 25 mm, and the load stress at the height y 0 is 0.2%. The height is determined by 80%, and the bending stress is applied. The permanent deformation amount (height) y shown in Fig. 2 after heating at 150 ° C for 1000 hours is measured to calculate the stress relaxation rate {[1-(yy 1 )]. (mm) / (y 0 - y 1 ) (mm)] × 100 (%)}. Furthermore, y 1 is the initial warpage height before the load stress. The deviation of the stress relaxation rate at the measurement site was the difference between the maximum strength and the minimum strength at 30 points, and the average stress relaxation rate was the average of the 30 points.
關於彎曲加工性,係藉由彎曲部之表面粗糙度而評估。根據JIS H 3130進行Badway(彎曲軸與壓延方向為同一方向)之W彎曲試驗,利用共軛焦雷射顯微鏡對彎曲部之表面進行解析,求出JIS B 0601規定之Ra(μm)。測定部位之彎曲粗度之偏差為30處之最大Ra-最小Ra之差,平均彎曲粗度為該30處之Ra之平均值。The bending workability is evaluated by the surface roughness of the bent portion. The W bending test of the Badway (the bending axis and the rolling direction are the same direction) was carried out in accordance with JIS H 3130, and the surface of the curved portion was analyzed by a conjugated focal laser microscope to obtain Ra (μm) defined in JIS B 0601. The deviation of the bending thickness of the measurement portion is the difference between the maximum Ra and the minimum Ra at 30 points, and the average bending thickness is the average value of Ra at the 30 points.
No.1~34之合金為本發明之實施例,具有適合電子材料用之強度及導電率,且特性之偏差亦少。The alloy of No. 1 to 34 is an embodiment of the present invention, and has strength and electrical conductivity suitable for an electronic material, and variations in characteristics are also small.
No.35~37、46~48之合金未進行第一時效處理,於固溶化處理時,結晶粒徑變粗大而導致強度及彎曲加工性劣化。The alloys of No. 35 to 37 and 46 to 48 were not subjected to the first aging treatment, and when the solution treatment was performed, the crystal grain size became coarse, and the strength and the bending workability were deteriorated.
關於No.38、39、42、44、49、50之合金,由於第一時效處理之時效溫度過低,第二相粒子較少,因此於固溶化處理時,結晶粒徑變粗大而導致強度及彎曲加工性劣化。又,結晶粒徑之偏差變多。其結果,特性之偏差變大。Regarding the alloys of No. 38, 39, 42, 44, 49, and 50, since the aging temperature of the first aging treatment is too low and the second phase particles are small, the crystal grain size becomes coarse and the strength is increased during the solution treatment. And the bending workability is deteriorated. Moreover, the variation in crystal grain size increases. As a result, the variation in characteristics becomes large.
關於No.40、41、43、45、51~54之合金,由於第一時效處理之時效溫度過高,第二相粒子不均勻地成長,因此結晶粒徑不均。其結果,特性之偏差變大。Regarding the alloys of Nos. 40, 41, 43, 45, and 51 to 54, since the aging temperature of the first aging treatment is too high, the second phase particles are unevenly grown, and thus the crystal grain size is uneven. As a result, the variation in characteristics becomes large.
關於No.55及56,由於Co之添加量過多,因此強度及導電率劣化。Regarding No. 55 and 56, since the amount of addition of Co is too large, strength and electrical conductivity are deteriorated.
No.57~60未進行第一時效處理,固溶化溫度較低。第二相粒子未充分地固溶,又,結晶粒過小,因而強度及應力緩和特性劣化。No. 57-60 was not subjected to the first aging treatment, and the solid solution temperature was low. The second phase particles are not sufficiently solid-dissolved, and the crystal grains are too small, so that the strength and stress relaxation characteristics are deteriorated.
l‧‧‧標距L‧‧‧ gauge length
t‧‧‧厚度T‧‧‧thickness
y‧‧‧永久變形量(高度)Y‧‧‧ permanent deformation (height)
y0 ‧‧‧高度y 0 ‧‧‧height
圖1係應力緩和試驗法之說明圖。Figure 1 is an explanatory diagram of the stress relaxation test method.
圖2係關於應力緩和試驗法之永久變形量之說明圖。Fig. 2 is an explanatory diagram of the amount of permanent deformation of the stress relaxation test method.
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