TWI364439B - - Google Patents

Description

1364439 IX. Description of the invention [Technical field to which the invention pertains] PCT A hardened film formed by hardening; a high refractive index material, a cured film and a layered ester thereof, a polymethacrylic acid methoxy resin, a melamine tree finger, an AS Various substrates such as resin, ice-cream glass, asbestos, etc. The protective coating material used has excellent coating properties, and is inferior in I, abrasion resistance, surface, chemical resistance, and coating film surface. The curable composition of the film is formed, but there is a cured film which cannot form a stable and scratch-resistant property. The present invention relates to a curable composition, a crucible, and a laminate. More specifically, the present invention C and a curable composition of an antistatic hard film.

[Prior Art] In recent years, it has been used as a plastic (polycarbonate, polystyrene, polyester, polyolefin, cycloaliphatic, triethylenesulfonyl cellulose resin, ABS tree, olefinic resin, etc.), metal, wood, paper. The glass surface is used to prevent scratches (scratches) and to prevent staining and as an anti-reflective coating material. It is required to have a hardness, scratch resistance, low curling property, adhesion, and transparency on the surface of various substrates. The curable composition of the cured film which is excellent in the appearance of the film is improved in that it has antistatic properties, and the conductive particles are required to exhibit certain antistatic properties, transparency, and itching. Patent Document 1: JP-A-2004-331909, JP-A-2005-31282, JP-A-2005-31208, JP-A No. 2005-31110, JP-A No. Hei. The problem of the present invention is to provide a hardenable composition which can obtain a cured film having stable antistatic property and excellent scratch resistance, and further having a high refractive index and a high reflectance. [Means for Solving the Problem] In order to achieve the above object, the present inventors conducted an active investigation and found that a certain surface resistance 可 can be achieved by controlling the particle diameter of the conductive particles having a polymerizable unsaturated group, and The polymerizable unsaturated group and the compound having the E0-modified bisphenol A skeleton as a part of the binder resin can provide a cured composition of a cured film which can obtain a high refractive index and excellent scratch resistance, and thus the present invention has been completed. That is, the present invention provides the following curable composition, cured film thereof and laminate thereof. ' 1. A curable composition containing the following components (A) to (C): (A) having a polymerizable unsaturated group and having a median particle diameter in the range of 65 to 85 nm' and selected from zinc a particle having at least one of an indium, tin, and antimony composition as a main component; (B) a compound having one or more polymerizable unsaturated groups, one or more alkylene oxide chains, and two or more aromatic rings; (C) a compound other than the above components (A) and (B) having one or more polymerizable unsaturated groups; 1364439 2. The curable composition according to the above 1, wherein the compound of the above component (B) has the following Structure shown by the general formula (B_1):

(B-1) [In the formula (B-1), R1 and R2 each represent a divalent hydrocarbon group having 2 to 4 carbon atoms, and R3 is a single bond or may have a divalent hydrocarbon group having 1 to 20 carbon atoms of an aromatic ring. R5 to R6 are a hydrogen atom or a methyl group 'R14 and Rl5 represents a hydrogen atom or a (meth) acrylonitrile group, and at least one of q R14 and p R15 is a (meth) acryl fluorenyl group, and m and η represent respectively. The number of 1~30 'P stands for 1-4, and q stands for 0~4. 3. The curable composition according to the above 1 or 2, wherein the compound of the above component (B) has a structure represented by the following formula (B-2):

CB-2) [In the formula (B-2), R4 represents a hydrogen atom or a methyl group, respectively, R11 and R12 represent a hydrogen atom, a methyl group, a phenyl group, respectively, and R13 is a hydrogen atom or a (meth)acryloyl group 'm Respectively represent the number of 1~3〇]. The sclerosing composition according to any one of the above 1 to 3, wherein the oxide particles of the component (A) are selected from the group consisting of tin oxide containing antimony, indium oxide containing tin, and tin oxide containing fluorine. a group consisting of zinc oxide containing aluminum. 5. The curable composition according to the above 4, wherein the oxide particles of the component (A) are tin oxide containing antimony. 6. The curable composition according to any one of the above 1 to 5, wherein the polymerizable unsaturated group contained in the component (A) contains a group having a structure represented by the following formula (4): Η ... —U—C—Ν—(4)

II

V

[In the formula (4), U represents ΝΗ, 0 (oxygen atom) or S (sulfur atom), and V represents 0 or S]. 7. The curable composition according to any one of the above 1 to 6, which further comprises (D) a compound which can initiate an active species by irradiation with an active energy ray. The curable composition according to any one of the items 1 to 7, further comprising (E) an organic solvent. 9. The curable composition according to any one of the above 1 to 8, wherein the polymerizable unsaturated group contained in the component (C) is a (meth) acrylonitrile group. 10. A cured film obtained by hardening a hardenable composition according to any one of 1 to 9 1364439. 11. A laminate comprising a cured film as described in 10 on a substrate . [Effect of the Invention] The curable composition of the present invention can obtain a cured film having stable antistatic properties and having high refractive index and reflectance and excellent scratch resistance. The cured film of the present invention can be used as an antistatic layer, a high refractive index layer or a hard coat layer of an antireflection laminate. [Embodiment] I. Hardening composition ^ The hardened composition of the present invention (hereinafter referred to as the composition of the present invention) may contain the following components (A) to (F). Among them, the components (A) to (C) are essential components, and the components (D) to (F) are optional components which can be added as needed. (A) particles having a polymerizable unsaturated group and having a median diameter of 65 to 85 nm and having an oxide selected from at least one element selected from the group consisting of zinc, indium, tin, and antimony as a main component; a compound having one or more polymerizable unsaturated groups, one or more alkylene oxide chains, and two or more aromatic rings; (C) having one or more polymerizable unsaturated groups other than the above components (A) and (B) a compound; (D) a compound capable of initiating an active species upon activation of an energy ray; (E) an organic solvent; (F) an additive. -9- 1364439 (1) Hereinafter, each component (A) has a polymerizable unsaturated group and a median particle diameter in the range of 65 to 85 nm, and is at least selected from the group consisting of zinc, indium, tin, and antimony. The particle component (A) having an oxide of an element as a main component is a particle having a polymerizable unsaturated group and having a specific median particle diameter and having an oxide of a specific element as a main component (hereinafter referred to as "reactive particle j") The reactive particles are particles (Aa) having an oxide of at least one element selected from the group consisting of zinc, indium, tin, and antimony as a main component, and a polymerizable unsaturated group and a hydrolyzable alkyl group in the molecule. The organic compound (Ab) is reacted to obtain * by reacting the component (A) with the polymerizable unsaturated group of the components (B) and (C) described later 'by the polymerization, the hardness of the resulting lipid-hardened film can be advanced - (1) Particles (Aa) having an oxide as a main component (hereinafter referred to as "oxide particles") Examples of the oxide particles include zinc oxide and indium oxide. Tin oxide, Tin oxide (ITO), antimony oxide particles, etc.. Among them, from the viewpoint of high hardness, cerium oxide particles are preferred. These may be used singly or in combination of two or more. Further, the oxide particles (Aa) are preferably used in the form of a powder or a solvent-dispersed sol. In the case of use as a solvent-dispersed sol, the dispersion medium is preferably an organic solvent from the viewpoint of compatibility with other components and dispersibility. Examples of the organic solvent include alcohols such as methanol, ethanol, isopropanol, butanol, and octanol; acetone, methyl ethyl-10- 1364439 ketone, methyl isobutyl ketone, cyclohexanone, and the like. Ketones; ethyl acetate, butyl acetate, ethyl lactate, γ-butyrolactone, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, etc.: ethylene glycol monomethyl ether, An ether such as diethylene glycol monobutyl ether: an aromatic hydrocarbon such as benzene, toluene or xylene; or a guanamine such as dimethylformamide, dimethylacetamide or hydrazine-methylpyrrolidone. Among them, preferred are methanol, isopropanol, butanol, methyl ethyl ketone, methyl isobutyl ketone, ethyl acetate, butyl acetate, toluene, and xylene. In addition, examples of the oxide particles (Aa) which impart excellent antistatic properties include tin oxide containing antimony, indium oxide containing tin, tin oxide containing fluorine, zinc oxide containing aluminum, and the like. The particle size of the ruthenium in the reactive ion must be in the range of 65 to 85 nm, preferably in the range of 70 to 80 nm. If the particle size of the particles is less than 65 nm, the surface resistance is not high enough and the scratch resistance is lowered. If it exceeds 85 nm, the transparency and reflectance may be impaired. Here, the median particle diameter means a particle diameter in which the powder is equal to the smaller one side when the powder is divided into two halves. The ruthenium particle diameter of the ruthenium-containing tin oxide particles dispersed in the obtained dispersion liquid can be measured under the following conditions. Machine: Dynamic Light Scattering Particle Size Distribution Measuring Device -11 - 1364439 Manufactured by Horiba, Ltd. Measurement conditions: Temperature 25 °C Surface sample is directly measured by stock solution Data analysis conditions: Particle size volume basis Dispersed particles ΑΤΟ Particle refractive index 2.05 The dispersion medium methanol refractive index 1.329 値 particle size is controlled by the dispersion time. That is, by shortening the dispersion time, the particle size of the crucible is increased, and the particle size of the crucible is made smaller by increasing the dispersion time. In addition, as an aqueous dispersion of zinc phthalate powder, Celunox, which is a product of Nissan Chemical Industry Co., Ltd., and a solvent dispersion of a powder such as tin oxide, indium oxide, or zinc oxide, may be used. For example, SN-100D manufactured by Ishihara Sangyo Co., Ltd. is used as the ITO powder, and the product of Mitsubishi Materials Co., Ltd. is exemplified as the ITO powder. The shape of the oxide particles (Aa) is spherical, hollow, porous, rod-shaped, plate-like, fibrous, or amorphous, and preferably spherical. The specific surface area of the oxide particles (Aa) (measured by a BET surface area measurement using nitrogen gas) is preferably from 10 to 1 000 m 2 /g, more preferably from 100 to 500 m 2 /g. The oxide particles (Aa) may be used in a dry state or in a state of being dispersed in water or an organic solvent. For example, a dispersion of fine particle-like oxide particles known in the art can be used as a solvent-dispersing sol of the above oxide. In particular, in applications requiring excellent transparency of a cured product, it is preferred to use an organic solvent-dispersing sol of an oxide. -12- 1364439 (2) Organic compound (Ab) The organic compound (Ab) used in the present invention is a compound having a polymerizable unsaturated group. It is preferably an organic compound containing a group represented by the following formula (4). 【化7】 Η 一 U — C一 Ν — (4)

II

V • [In the formula (4), U represents ΝΗ, ◦ (oxygen atom) or S (sulfur atom), and V represents 0 or S]. Further, it preferably contains a [-〇-C(= 0)-NH-] group, more preferably a [-0-C(=S)-NH_] group and [-SC(=0)-NH-] An organic compound of at least one of the bases. Further, the organic compound (Ab) is preferably a compound having a stanol group in the molecule or a compound which is hydrolyzed to form a stanol group. (i) The polymerizable unsaturated group contained in the polymerizable unsaturated organic compound (Ab) is not particularly limited, and preferred examples thereof include an acrylonitrile group, a methacryl fluorenyl group, a vinyl group, and a propylene group. Base, butadienyl, styryl, ethynyl, laurel, mercapto, acrylamide. The polymerizable unsaturated group may be a constituent unit of addition polymerization by an active radical. (ii) The group [-UC(=V)_NH-] represented by the above formula (4) contained in the base organic compound represented by the above formula (4) specifically has [-0-C (= 0) -NH-], [-0-C( = S)-NH-], [-SC( = 0)-NH-], [-NH-C( = 0)-NH-], [-NH 6 kinds of -C( = S)-NH-] and -13- 1364439 [-SC( = S)-NH-]. These may be used alone or in combination of two or more. Among them, in terms of thermal stability, it is better to use [-〇-(:( = 0)-?^-;| base and [-0-(:( = 3)-1^-]) And at least one of the [-SC(=0)-NH-] groups. It is considered that the group [-UC(=V)-NH-] represented by the above formula (4) is generated by hydrogen bonding between molecules. Appropriate cohesive force, in the case of a cured product, imparts excellent mechanical strength, adhesion to adjacent layers such as a substrate or a high refractive index layer, and heat resistance. (iii) stanol groups or by hydrolysis The thiol group-based organic compound (Ab) is preferably a compound having a stanol group in the molecule or a compound which is hydrolyzed to form a stanol group. Examples of the compound which forms a stanol group are those on a ruthenium atom. a compound which bonds to an alkoxy group, an aryloxy group, an ethoxylated group, an amine group, a halogen atom or the like, preferably a compound which bonds an alkoxy group or an aryloxy group to a halogen atom, that is, an alkoxy group. a compound of a decyl group or a compound containing an aryloxyalkyl group. The sterol group formed by a stanol group or a compound which forms a stanol group is formed by a condensation reaction or hydrolysis. The condensation reaction which occurs and the constituent unit which is bonded to the oxide particles (Aa). (iv) Preferred examples of the organic compound (Ab) are, for example, the following formula (1 1) Compound: -14 - (11) 1364439 [Chemical 8] (〇R6)j I Η R73-j-SiH-R8-S-C-N-R9-N~C-〇-r1〇-(Z) ο In the formula (11), R6 and R7 may be the same or different and are a group or an aryl group of hydrogen atoms 1 to 8, and examples thereof include a methyl group, an ethyl group, a phenyl group, a phenyl group, a phenyl group, a tolyl group, and the like. Wherein, 』 is 1~3; φ is the base represented by [(R6〇)jR73-jSi-], and examples thereof include a base sand yard base, a triethoxy sand yard base, and a triphenyloxy sand yard base. , alkoxy sand base, dimethyl methoxy fluorene, etc. such a group of trimethoxy decyl or triethoxy fluorenyl. R 8 is an aliphatic or aromatic structure having a carbon number of 1 to 12. The machine base ' may also include a linear, branched or cyclic structure. Examples thereof include a methylene group, an ethyl group, a propyl group, a butyl group, a cyclohexylene group, a phenyl group, and a phenylene group.伸十二院# R9 is a 2-valent organic base, usually selected a molecular weight of 14 to a divalent organic group having a good molecular weight of 76 to 500. As for a specific example, a hexane group such as a hexane group, an octylalkyl group, a dodecyl group or the like, a linear polyalkylene group or an alicyclic group Or a polycyclic bivalent organic group, a naphthyl group, a stretched biphenyl group, a polyphenylene group, or the like, a tertiary substituent such as a divalent aromatic group, or an aryl substituent. Further, the divalent inclusions include carbon removal. The atomic group of the element other than the atom and the hydrogen atom includes a polyether bond, a polyester bond, a polyamid bond, and a polycarbonate bond. R10 is a (k+Ι)valent organic group, preferably selected from a linear chain. Or carbon number propyl, Ding Yi integer. For example, trimethoxymethyl dimethyl, preferably the valence of 2 is as specific as that of the hexagram. 10,000, more, enumerated base; extended ring base; extended phenyl group; and this machine base can also be branched, or branched or -15- 1364439 cyclic saturated hydrocarbon group, unsaturated hydrocarbon group. z represents a monovalent organic group having a polymerizable unsaturated group capable of undergoing crosslinking reaction between molecules in the presence of a living free species. Further, it is preferably an integer of 1 to 20, more preferably an integer of 1 to 10, and preferably an integer of 1 to 5. Specific examples of the compound represented by the formula (1 1 ) include the following compounds represented by (12) and (13):

【化9】

(12)

[Acryl" in the formula (12) and the formula (13) represents an acryl group]. For the synthesis of the organic compound (Ab) used in the present invention, for example, the method described in JP-A-9-100111 can be used. Preferably, the hydrogenthiopropyltrimethoxydecane is mixed with isophorone diisocyanate in the presence of dibutyltin dilaurate, and after reacting at 60 to 70 ° C for several hours, pentaerythritol triacrylate is added. Further, it is produced by reacting at 60 to 70 ° C for several hours. -16- 1364439 (3) Preparation of Reactive Particles (A) The organic compound (Eb) having a stanol group or a group which is hydrolyzed to form a stanol group is mixed with metal oxide particles (Aa), and hydrolyzed to give a bond Knot. The ratio of the organic polymer component in the obtained reactive particles (E), that is, the hydrolyzate of the hydrolyzable decane and the condensate, is usually a constant % of the weight loss of the dry powder when it is completely burned in the air, for example, It is obtained by thermogravimetric analysis in air at room temperature to usually 80 (TC). The amount of bonding of the organic compound (Ab) to the oxide particles (Aa) to the reactive particles (A) (metal oxidation) The total amount of the particles (Aa) and the organic compound (Ab) is 100% by weight, preferably 0.01% by weight or more, more preferably 0.1% by weight or more, and most preferably 1% by weight or more. With metal oxide particles (Aa) When the bonding amount of the bonded organic compound (Ab) is less than 0.01% by weight, the dispersibility of the reactive particles (A) in the composition is insufficient, and the cured product is insufficient in transparency and scratch resistance. Further, the proportion of the metal oxide particles (Aa) in the raw material in the production of the reactive particles (A) is preferably from 5 to 99% by weight, more preferably from 10 to 98% by weight, constituting the reactive particles ( A) The content of the oxide particles (Aa) is preferably a reaction 6 to 95% by weight of the particles (A). The compounding amount of the component (A) in the composition of the present invention is preferably 50% in the case where the total amount of the composition is 100% by weight or less based on the organic solvent. 90% by weight, more preferably 65 to 85% by weight, and most preferably 75 to 80% by weight. If the amount of the component (A) is less than 50% by weight, high reflectance cannot be obtained when the cured film is formed. When it exceeds 90% by weight, the film formability is insufficient. Further, the content of the reactive particles (A) means a solid component, and when the reactive -17-1364439 particles are used in the form of a solvent-dispersed sol, the content does not include a solvent. (B) A compound having one or more polymerizable unsaturated groups, one or more alkylene oxide chains, and two or more aromatic rings (B) is a compound having a high refractive index as much as possible, and has an easy adhesion to oxidation. The properties of the particles on the particles that are not easily attached to the air make the resulting cured film have a higher refractive index. In the past, it was considered that if the compound having a bisphenol skeleton is modified by alkylene oxide (A0), The property becomes high, and thus the hardness of the obtained cured film is lowered. However, the present inventors have found that the hardness of the cured film such as scratch resistance is not lowered in combination with tin oxide containing antimony. The compound of the component (Β) preferably has the following formula (Β -1) The structure of the show.

In the formula (Β-1), the scales 1 and R2 are each a divalent hydrocarbon group having a carbon number of 2 to 4, preferably a stretching ethyl group and a stretching propyl group. R3 is a single bond or a divalent hydrocarbon group which may have a carbon number of the aromatic ring, and is preferably a methylene group, a isopropylidene group, a methylphenyl formamene or the like. -18- R5 to R6 represent a hydrogen atom or a methyl group. R14 and R15 represent a hydrogen atom or a (meth) acrylonitrile group, and at least one of the four R14 and P rm is a (meth) acryl fluorenyl group. m and η represent the number of 1 to 30, respectively, preferably 1 to 1 〇. ρ represents the number of Bu 4, preferably 1 to 2. q represents the number of 〇~4, preferably 1~2. The compound of the component (B) preferably has the following formula (B-2): [Chemical Formula 1]

In the formula (B-2), R4 represents a hydrogen atom or a methyl group, respectively. R11 and R12 each represent a hydrogen atom, and the methyl 'phenyl*R13 represents a hydrogen atom or a (meth)acryl fluorenyl group. m represents a number of 1 to 30, preferably 1 to 10. (1) The polymerizable unsaturated group is not particularly limited as the polymerizable unsaturated group of the component (B), but as a preferred example, for example, an acryloyl group, a methacryloyl group, a vinyl group, Propylene, butadienyl 'styryl, ethynyl, lauryl, maleidyl, acrylamide. The polymerizable unsaturated group is a constituent unit in which the components (A) and (C) are subjected to addition polymerization by an active free species. -19- 1364439 (2) Method for producing the component (B) The compound of the component (B), when the alkylene oxide is ethylene oxide (E0), can be produced as follows. The bisphenol is reacted with ethylene oxide under basic conditions to prepare an E0 adduct of bisphenol. The acrylic acid was reacted on the EO adduct of bisphenol with p-toluenesulfonic acid as a catalyst to prepare an E0 adduct diacrylate of bisphenol. (3) Specific examples of the compound of the component (B) include ethylene oxide of bisphenol a (hereinafter referred to as "E0") adduct di(meth)acrylate, epoxy of bisphenol a Propane (hereinafter referred to as "P〇") P〇 adduct di(meth)acrylate 'E0 adduct of bisphenol F di(meth)acrylate, P0 adduct of bisphenol f (A) The acrylate is preferably an E0 adduct di(meth)acrylate of bisphenol A.

As a commercial product of the component (B), for example, Biscoat 7 00 (bisphenol A, E0 adduct diacrylate; Osaka Organic Chemical Co., Ltd.), Light-Ester BP-2EM (bisphenol A) E0 adduct dimethyl propylene vinegar), Light-Acrylate BP-4EA (EO bis adduct of bisphenol A), Light-Acrylate BP-4PA (P0 adduct of bismuth A) Diacrylate); manufactured by Kyoeisha Chemical Co., Ltd., Aronix M-208 (EO adduct diacrylate of bisphenol F), Aronix M-210, Aronix 21 1B (EO addition product of bisphenol A) Acrylate); manufactured by Toagosei Co., Ltd., SR-349, SR-601, SR-602 (EO adduct diacrylate of bisphenol A), SR-3 48, SR-480, SR-903 6 ( EO Ether Adduct Dimethacrylate of Bisphenol A), Cayarad R-551, R712 (EO -20- 1364439 Adduct Diacrylate of Bisphenol A); NK ESTER ABE, manufactured by Nippon Kayaku Co., Ltd. -300, A-BPE-4, A-BPE-10, A-BPE-20, A-BPE-30, A-BPE-3 (EO addition bisacrylate of bisphenol A), NK ESTER ΒΡΕ- 1 00, BPE-200, BPE-300, BPE-500, BPE-900, BPE-1 300N (EO of bisphenol A) As was dimethacrylate); Shin-Nakamura Chemical Industries (Co., Ltd.) and the like. The amount of the component (B) in the composition of the present invention is usually from 1 to 15% by weight, preferably from 2 to 10% by weight, more preferably from 1 to 10% by weight, based on the total amount of the composition excluding the organic solvent. Within the range of 4 to 6 wt%. When the content of the component (B) is less than 1% by weight, the reflectance may be lowered, and if it exceeds 15% by weight, the curability may be insufficient. (C) A compound having one or more polymerizable unsaturated groups and having one or more polymerizable unsaturated groups in addition to the components (A) and (B) is obtained by curing the composition of the present invention. The cured film and the scratch resistance of the antireflection film using the cured film. The compound is not particularly limited as long as it is a compound containing at least one polymerizable unsaturated group in the molecule. In the case of a polymerizable unsaturated group, a (meth) acrylonitrile group is preferred. As the compound having one (meth) propylene fluorenyl group, for example, acryloyl morpholine, isobornyl (meth) acrylate, borneol (meth) acrylate, tricyclodecyl (meth) acrylate (meth)acrylic acid ester of (cyclo)-(meth)acrylic acid dicyclopentenyl (meth)acrylate, cyclohexyl (meth)acrylate, etc., (meth)acrylic acid, (meth)acrylic acid Benzyl ester, -21 - 1364439 4-butylcyclohexyl (meth)acrylate, acryloylmorpholine, vinylimidazole, vinylpyridine, 2-hydroxyethyl (meth)acrylate, (meth)acrylic acid 2 -hydroxypropyl ester, 2-hydroxybutyl (meth)acrylate, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, Methyl)butyl acrylate, amyl (meth)acrylate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, pentyl vinegar (meth)acrylate Valeric vinegar, hexyl (meth) acrylate, heptyl (meth) acrylate, ( Octyl methacrylate, isooctyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, decyl (meth)acrylate, decyl (meth)acrylate, (meth)acrylate Anthracene ester, eleventh (meth)acrylate, dodecyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, isostearyl (meth)acrylate, (Methyl) tetrahydrofurfuryl acrylate, butoxyethyl (meth)acrylate, ethoxydiethylene glycol (meth)acrylate, benzyl (meth)acrylate, (meth)acrylic acid Phenoxyethyl ester, polyethylene glycol mono(meth)acrylate, polypropylene glycol mono(methyl) diacid ester, methoxyethylene glycol (meth) acrylate, (meth) acrylate ethoxylate Ethyl ethyl ester, methoxy polyethylene glycol (meth) acrylate, methoxy polypropylene glycol (meth) acrylate, diacetone (meth) acrylamide, isobutoxymethyl (methyl) Acrylamide, N,N-dimethyl(meth)acrylamide, third octyl (meth) acrylamide, (A) Dimethylaminoethyl acrylate, (diethylaminoethyl methacrylate, 7-amino-3,7-dimethyloctyl vinegar (meth) acrylate, N,N-diethyl (methyl) Acrylamide, N,N-dimethylaminopropyl (meth) acrylamide, hydroxybutyl vinyl ether, lauryl acid, tetradecyl vinyl ether, 2-ethyl Hexyl vinyl ether, a compound of the following formula (15), Table -22- 1364439, etc. CH 2 = C(R26)-C00(R270)d-Ph-R28 (15) (wherein R26 represents a hydrogen atom or a methyl group , R27 represents a carbon number of 2 to 6, preferably 2 to 4 alkylene, R28 represents a hydrogen atom or a carbon number of 1 to 12, preferably 1 to 9, an alkyl group, Ph represents a phenyl group, and d represents 0 to 12 , preferably 1 to 8). As for these commercial products, listed as Aronix M-101, M-102, M-lll, M-113, M-114, M-117 (the above is East Asian synthesis ( (manufacturing); Biscoat LA, STA, IBAX, 2-MTA, #192, #193 (made by Osaka Organic Chemical Co., Ltd.); NK ESTER AMP-10G, AMP-20G, AMP-60G (above is Shin-Nakamura Chemical (manufactured by the company); Light-Acrylate LA, SA, IB-ΧΑ, PO-A, PO-200A, NP-4EA, NP-8EA (above is Kyoritsu Chemical Co., Ltd.); FA-511, FA-512A, and FA-513A (above, manufactured by Hitachi Chemical Co., Ltd.). Examples of the compound having two or more (meth) acrylonitrile groups include, for example, ethylene glycol di(meth)acrylate, dicyclopentenyl di(meth)acrylate, and triethylene glycol diacrylate. , tetraethylene glycol di(meth)acrylate, anthracene dialkyl dimethylene di(meth) acrylate, hydrazine (2-hydroxyethyl) polyisocyanate di(meth) acrylate, hydrazine (2-hydroxyethyl) polyisocyanate tri(meth)acrylate, caprolactone modified ruthenium (2-hydroxyethyl) polyisocyanate tri(meth) acrylate, trimethylolpropane tris(methyl) ) acrylate, ethylene oxide (hereinafter referred to as "E0") modified trimethylolpropane-23-1364439 tri(meth)acrylate, propylene oxide (hereinafter referred to as "P0") modified Trimethylol propyl tri- (meth) acrylate, tripropylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, bisphenol A diglycidyl ether two ends (methyl Acetone acid adduct, 1,4, butanediol di(meth) acrylate, 1,6-hexanediol (Meth) acrylate, pentaerythritol tri(meth) acrylate, pentaerythritol tetra(meth) acrylate, polyester di(meth) acrylate, polyethylene glycol di(meth) acrylate, dipentaerythritol (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol tetra (meth) acrylate, caprolactone modified dipentaerythritol hexa (meth) acrylate, caprolactone modified bis Pentaerythritol penta (meth) acrylate, bis(trimethylolpropane) tetra (meth) acrylate, and the like. As a commercial item of such a polyfunctional monomer, for example, SA 1 002 (manufactured by Mitsubishi Chemical Corporation), Biscoat 195, Biscoat 230, Biscoat 260, Biscoat 2 15 , Biscoat 310 , Biscoat 214 Η P can be cited. Biscoat 2 9 5 ' Biscoat 3 00, Biscoat 360 ' Biscoat GPT ' Biscoat 400, Biscoat 3000, Biscoat 3700 (above manufactured by Osaka Organic Chemical Industry Co., Ltd.), Casarate R-256, HDDA, NPGDA, TPGDA, MANDA, R-604, R-6 84, PET-30, GPO-303, TMPTA, THE-33 0, DPHA, DPHA-2H, DPHA-2C, DPHA-2I, D-3 10, D-3 3 0, DPCA -20, DPCA-30, DPCA-60, DPCA-120, DN-0075, DN-2475, T-1 420 > T-2020, T-2040 ' TPA-320 ' TA-330 ' RP-1040 ' RP -2040 ' R- 011, R-300, R-205 (above manufactured by Nippon Kayaku Co., Ltd.), M-220, M-23 3, M-240, M-215, M-3 05, M- 3 09 , M-310 , M- -24- 1364439 315, M-325, M-400, M-6200, M-6400 (above manufactured by Toagosei Co., Ltd.), Nufrontea BPE-400, BR-42M, GX-83 45 (above by Daiichi Kogyo Co., Ltd.), ASF-400 (above Manufactured by Nippon Steel Chemical Co., Ltd., 'Lypoxy SP-1506, SP-1507, SP-1509, VR-77, SP-4010, SP-4060 (manufactured by Showa Polymer Co., Ltd.). Further, the composition of the present invention is more preferably a compound containing at least three (meth)acrylamide groups in the molecule. As the compound containing three or more (meth) acrylamide groups, the above-exemplified three (meth) acrylate compound, tetra (meth) acrylate compound, and penta (meth) acrylate compound may be selected. And a hexa(meth) acrylate compound or the like, and among them, pentaerythritol hydroxy triacrylate and trimethylolpropane triacrylate are most preferable. These compounds may be used alone or in combination of two or more. The compounding amount of the component (C) in the composition of the present invention is not particularly limited, and the total amount of the composition other than the organic solvent is taken as 100% by weight, usually 1 to 15% by weight, preferably 5 to 1 4 The weight %, more preferably in the range of 1 1 to 13% by weight. When the amount of the component (C) is less than 1% by weight, the scratch resistance of the obtained cured coating film may not be obtained. On the other hand, if it exceeds 15% by weight, the refractive index is lowered. (D) Compound which initiates active species by irradiation with an active energy ray The compound of the present invention can be added with a compound which induces an active species by irradiation with an active energy ray (hereinafter referred to as "(D) component"). These compounds are used to cure the curable composition efficiently. As a compound which initiates an active species by irradiation with an active energy ray (hereinafter referred to as "photopolymerization initiator"), examples of the active species include a photoradical generator which initiates a free radical of -25-1364439. Further, the 'active energy ray' is defined as an energy ray which can cause decomposition of a compound which initiates an active species to produce an active species. The active energy ray includes light energy rays such as visible light, ultraviolet light, infrared light, x-rays, alpha rays, no radiation, and r rays. Among them, ultraviolet light is preferably used from the viewpoint of having a certain energy level, an accelerated hardening speed, and a relatively inexpensive irradiation device. As examples of the photoradical generating agent, for example, acetophenone, acetophenone benzyl ketal hydrazide, hydrazine-(I)-isopropylphenyl)_2-hydroxy-2-methylpropane-1 can be cited. -ketone, miso, ketone, 4-chlorobenzophenone, 4,4'-diaminobenzophenone, 1,1-dimethoxyoxybenzoin, 3,3,_2 Methyl-4_methoxybenzophenone, thioxanthone, 2,2-dimethoxy-2-phenylacetophenone, 1-(4-dodecylphenyl)_2-hydroxyl- 2-methylpropane-fluorenone, 2-methyl-i-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one, triphenylamine, 24,6-trimethyl Benzobenzhydryldiphenylphosphine oxide, hydrazine-hydroxycyclohexyl phenyl ketone, 2-hydroxymethyl-2-methyl-1-phenylpropan-1-one, anthrone, anthracene, benzoic acid, benzene Equivalent ethyl ether, benzoin propyl ether, benzophenone 'michlerone, 3-methylacetophenone, 3,3,,4,4'-tetra (t-butylperoxycarbonyl) Benzophenone (BTTB), 2-(dimethylamino)-1-[4-(morpholinyl)phenyl]-2-phenylmethyl)-butanone, 4-benzylidene -4'-Methyldiphenyl*thioether, 2-hydroxy-2-methyl-[4-(1-methylvinyl)phenyl]propanol oligomerization , Benzyl 'or BTTB and xanthene, sulfur xanthene, coumarin, ketocoumarin, other combinations of dye sensitizer. Among these photopolymerization initiators, preferred is 2,2-dimethoxy-2-phenyl-26- 1364439 acetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1- Ketone, 1-hydroxycyclohexyl phenyl ketone, 2,4,6-trimethylbenzylidene diphenyl oxime oxide, 2·methyl-1-[4-(methylthio)phenyl] -2-morpholinylpropan-1-one, 2-(dimethylamino)-1- [4-(morpholinyl)phenyl]-2-phenylmethyl)-1-butanol, 2- a hydroxy-2-methyl-[4-(1-methylvinyl)phenyl]propanol oligomer, etc., more preferably 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1-[4- (methylthio)phenyl]-2-morpholinylpropan-1-one, 2-(dimethylamino)-1-[4-(morpholinyl)phenyl]-2-phenylmethyl _ 1-butanol, 2-hydroxy-2-methyl-[4-(1-methylvinyl)phenyl]propanol oligomer, and the like. The compounding amount of the component (D) in the composition of the present invention is not particularly limited, and when the total amount of the composition other than the organic solvent is 1% by weight, preferably 0 to 15% by weight, more preferably 2 to 8 The weight % is preferably in the range of 3 to 6% by weight. If it exceeds 15% by weight, the hardness may be lowered. (E) Organic solvent The composition of the present invention may contain an organic solvent. A uniform antireflection film of a film can be formed by containing an organic solvent. As such organic solvents, ketones such as acetone 'methyl isobutyl ketone, methyl ethyl ketone, cyclohexanone, methyl amyl ketone, ethyl acetate, butyl acetate, propylene glycol monomethyl ether B are listed. Esters such as esters, propylene glycol monomethyl ether, methanol, ethanol, second butanol, third butanol '2-propanol' isopropanol, alcohols, aromatics such as benzene, toluene, chlorobenzene A single or a combination of two or more of aliphatics such as alkane and cyclohexane. Among these, ketones such as acetone, methyl isobutyl ketone, methyl ethyl ketone, cyclohexanone, and methyl amyl ketone are preferred, and ethyl acetate, butyl acetate, and propylene glycol monomethyl ether acetate are preferred. Ester and other esters; propylene glycol monomethyl ether, methanol, ethylene -27- 1364439 alcohol, second butanol, third butanol, 2-propanol, isopropanol and other alcohols, more preferably methyl isobutyl A single or a combination of two or more of ketone 'methyl amyl ketone and third butanol. As the organic solvent, a dispersion medium of the reactive particles of the above component (A) may be used, and it may be used in combination with other organic solvents. The amount of the organic solvent to be formulated is not particularly limited, and the total amount of the composition excluding the organic solvent is 100 parts by weight, preferably 10 to 10,000,000 parts by weight. The reason is that when the amount of the organic solvent is less than 10 parts by weight, it is difficult to adjust the viscosity of the curable composition. On the other hand, if it exceeds 100,000 parts by weight, the storage stability of the curable composition is lowered or the viscosity is lowered. Reduce the situation that makes the operation difficult. (F) Additive The composition of the present invention preferably contains a photosensitizer, a polymerization inhibitor, a polymerization initiator, a leveling agent, a wet modifier, and an interface within a range not impairing the object and effect of the present invention. Additives such as active agents, plasticizers, ultraviolet absorbers, antioxidants, antistatic agents, decane coupling agents, inorganic filling agents, pigments, dyes, and the like. (2) Modification method of the composition of the present invention The composition of the present invention can be mixed at room temperature or under heating, by separately adding the composition containing the above components (A) to (D) and the above (E) as needed Prepared by ~(F) ingredients. Specifically, it can be prepared by using a mixer such as a kneader, a kneader, a ball mill, or a three-roller drum. (3) Hardening conditions of the composition of the present invention The composition of the present invention can be hardened by heat and/or radiation (light). If -28-1364439 is hot, the heat source can use, for example, an electric heater, an infrared lamp, hot air, or the like. In the case of the radiation (light), the radiation source is not particularly limited as long as the composition can be cured for a short period of time after application. For example, as the infrared radiation source, a lamp, a resistance heating plate, and a lightning can be cited. For example, there are sunlight, lamps, fluorescent lamps, lasers, etc., and radiation sources of ultraviolet rays, such as mercury lamps, halogen lamps, lasers, etc., and electron beams. Examples of the radiation source include a cold cathode method in which a high-voltage pulse is generated by a metal by using a commercially available tungsten wire, and a secondary cathode method in which an ionized gaseous molecule and a metal are generated by collision. Electronic way. Further, examples of the radiation source of the α-ray, the /3 beam, and the r-ray include a nuclear fission material such as Co6(), and a vacuum tube in which the electrons collide with the anode in the r-ray system. These radiations may be irradiated one by one or two or more simultaneously or during a fixed period. As for the conditions by heat hardening, it is preferred to heat at a temperature in the range of 30 to 200 ° C for 1 to 180 minutes. By such heating, the base material is not damaged, and the antireflection film excellent in scratch resistance can be obtained more effectively. Further, for these reasons, it is more preferably heated at a temperature in the range of 50 to 180 ° C for 2 to 120 minutes, preferably at a temperature in the range of 80 to 150 ° C for 5 to 60 minutes. The condition for subsequent radiation irradiation is preferably such that the exposure amount is in the range of 0.01 to 10 J/cm 2 . The reason is that if the exposure amount is less than 0.01 J/cm2, there is a case where the curing is poor. On the other hand, if the exposure amount exceeds 10 J/cm2, the curing time -29 to 1364439 may be abnormal. Further, for these reasons, the preferable exposure amount 値 is in the range of 0.1 to 5 J/cm 2 , more preferably in the range of 0.3 to 3 J/cm 2 . II. Cured film and laminate The cured film of the present invention is composed of a cured product obtained by hardening the above-described composition of the present invention, and the cured film of the present invention can be used as a high refractive index because of its high refractive index and antistatic property. Antistatic layer. The laminate of the present invention contains a layer composed of the cured film of the present invention. The layer composed of the cured film of the present invention is a layer having a function of a high refractive index layer and/or an antistatic layer. Further, in the case where the laminate of the present invention is an antireflection film, a low refractive index layer, a hard coat layer, a substrate, or the like may be contained in addition to the above layer. Figure 1 shows a cross-sectional view of the antireflection film. As shown in FIG. 1, on the substrate 2, a hard coat layer 3, a high refractive index layer 4, and a low refractive index layer 5 are laminated. At this time, on the substrate 2, the high refractive index layer 4 may be directly formed instead of the hard coat layer 3. Further, a medium refractive index layer 6 (not shown) may be provided between the hard coat layer 3 and the high refractive index layer 4. (1) Low refractive index layer The curable composition for forming the low refractive index layer is not particularly limited, and a conventional material for forming a low refractive index layer can be used. The refractive index of the low refractive index layer (the refractive index of the N a - D line, the measurement temperature of 2 5 C) is preferably 1.50 or less. The reason is that when the refractive index of the low refractive index film exceeds 1.5 Å, the antireflection effect is remarkably lowered. Accordingly, the refractive index of the film having a low refractive index is preferably 1 to 48 or less, more preferably 1.45 or less. -30- 1364439 In addition, in the case where a plurality of low-refractive-index films are provided, as long as at least one of the layers has a refractive index 上述 within the above range, the refractive index 其他 of the other low-refractive-index films may be more than 1·5 据. value. The thickness of the low refractive index layer is not particularly limited, but is preferably, for example, 50 to 200 nm. The reason for this is that if the thickness of the low refractive index layer is less than 50 nm, the antireflection effect may not be sufficiently obtained. On the other hand, when the thickness exceeds 200 nm, light interference may occur to lower the antireflection effect. Therefore, the thickness of the low refractive index layer is more preferably 50 to 250 nm, and more preferably 70 to 150 nm. (2) High refractive index layer The high refractive index layer is composed of a cured film obtained by curing the composition of the present invention. Since the high refractive index layer also has antistatic properties, the barrier properties of the laminate can be improved. In the constitution and the like of the composition of the present invention, the above description is well known, and the detailed description thereof will be omitted. Hereinafter, the high refractive index layer and the thickness will be described. 5以上以上。 The refractive index of the high refractive index layer is preferably 1. 5 7 or more, more preferably 1. 5 8 or more, and most preferably 1. 5 9 or more. If the refractive index of the high refractive index layer is less than 1.57, sufficient antireflection may not be obtained. Further, the difference between the refractive index of the low refractive index layer and the low refractive index layer is 0.16 or more, more preferably 0.17. the above. The difference in refractive index between the high refractive index layer and the low refractive index layer may not be sufficient to achieve an antireflection effect if it does not reach 〇·16. The thickness of the high refractive index layer is not particularly limited, and is, for example, preferably from 50 to 30,000 nm. The reason is that if the thickness of the high refractive index layer is less than 50 nm, -31 - 1364439 may have an antireflection effect or a decrease in the adhesion to the substrate when combined with the low refractive index layer. When the thickness exceeds 30,000 nm, light interference is generated and the antireflection effect is lowered. Accordingly, the thickness of the high refractive index layer is more preferably 50 to 1,000 nm, more preferably 60 to 500 nm. Further, in order to obtain a higher antireflection property, when a plurality of high refractive index layers are provided to have a multilayer structure, the thickness of the plurality of high refractive index layers may be 5 〇 to 30,000 nm in total. Further, in the case where a hard coat layer is provided between the high refractive index layer and the substrate, the thickness of the high refractive index layer may be 50 to 300 nm. (3) Hard coat layer The constituent material of the hard coat layer used in the antireflection film of the present invention is not particularly limited. As the materials, a single or a combination of two or more of a decyl alkane resin, an acrylic resin, a melamine resin, and an epoxy resin is exemplified. Further, the thickness of the hard coat layer is not particularly limited, and is preferably from 1 to 100 μm, more preferably from 3 to 30 μm, because the hardness is lowered as a hard coat layer if the degree of the hard coat layer is less than Ιμηη. On the other hand, if the thickness exceeds ΙΟΟμηη, the base material may be deformed by hardening and shrinking of the hard coat layer. (4) Substrate The type of the substrate used for the antireflection film of the present invention is not particularly limited, and examples thereof include glass, polycarbonate resin, polyester resin, acrylic resin, and polyethylene terephthalate. A substrate composed of an alcohol ester resin (PET), a triacetyl cellulose resin (TAC) or the like. A wide range of anti-reflection film applications, such as anti-32-1364439 reflective film containing these substrates, in the lens portion of a camera, a screen display portion of a television (CRT), or a color filter in a liquid crystal display device Excellent anti-reflection effects are obtained in the field. In the following, the invention is specifically illustrated by the examples, which are not intended to limit the invention in any way. In addition, "%" and "parts" mean % by weight and parts by weight unless otherwise stated. Production Example 1: Preparation of a ruthenium-based dispersion of ruthenium-containing ruthenium oxide particles (manufactured by Ishihara Techno Co., Ltd., trade name: SN-10 0P, primary particle diameter: 1 to 30 nm) Trade name: Adecapulronick TR-70 1) and methanol are mixed in a ratio of 29.1/0 9/70 (weight ratio) (30% solids content, 29.1% total inorganic matter). Using a SC honing machine manufactured by Mitsui Mining & Co., Ltd., it was treated under the following conditions for 1 hour to obtain a particle dispersion solution having a particle diameter of 5 9 nm. Machine: SC honing machine frequency manufactured by Mitsui Mining Co., Ltd. Frequency: 60 Hz (equivalent to 3600 rpm) Shell capacity: 59 ml Liquid volume: 500 g of dispersed beads: Glass beads (TOSHINRIKO, BZ-01) (bead diameter 0.1 mm) 40 g, volume filling rate 27% The cerium particle size of the cerium-containing tin oxide particles dispersed in the obtained dispersion was measured under the following conditions: 9 -33 - 1364439 Light scattering type particle size distribution measuring device Measurement conditions: Temperature 2 51 Sample sample directly measured by the stock solution Data analysis conditions: Particle size Reference volume basis Dispersed particles ΑΤΟ Particle refractive index 2.05 Dispersion medium Methanol refractive index 1.329 Manufacturing Example 2: Polymerization is not The saturated organic compound (Ab) is produced in a dry air at 50 ° C for 1 hour in 221 parts of hydrothiopropyltrimethoxynonane and 1 part of dibutyltin dilaurate. In the solution, 222 parts of isophorone diisocyanate was added dropwise with stirring, and the mixture was stirred under heating at 7 ° C for 3 hours. 549 parts of Nakamura Chemical's NK Ester A-TMM-3LM-N (60% by weight of pentaerythritol triacrylate and 40% by weight of pentaerythritol tetraacrylate) were added dropwise thereto at 30 ° C for 1 hour. After the reaction of the pentaerythritol triacrylate having only a hydroxyl group with the reaction, the mixture was heated and stirred at 60 ° C for 10 hours to obtain an organic compound (Ab) containing a polymerizable unsaturated group. The amount of the isocyanate group remaining in the product was 0.1% or less by FT-IR analysis, indicating that the reaction was substantially quantitatively completed. In the infrared absorption spectrum of the product, it was found that the hydrogenthio group in the raw material characterized by the absorption peak of 25 50 CHT1 and the isocyanate group having the characteristic of 2260 (the absorption peak of = 1 ^1) disappeared, and a new amine group having a characteristic of 1 660 CHT1 peak was observed. The acid ester bond and the S(C=0)NH- group and the propylene fluorenyl group having a peak of -34-1364439 1720 cm·1 are shown to have an acrylonitrile group and a -S (C = 0) as a polymerizable unsaturated group. The acryloxy group-modified alkoxy decane of the NH- or urethane bond. Production Example 3: Preparation of Reactive Particle Dispersion A: 98.6 parts of the ruthenium particle dispersion produced in Production Example 1, 1.2 parts After the composition produced in Production Example 2, 0.02 parts of ion-exchanged water, and 0.01 part of p-hydroxyφylphenyl monomethyl ether were stirred at 60 ° C for 4 hours, 0.20 part of methyl orthoformate was added, and within 1 hour. The mixture was heated and stirred at the same temperature to obtain a reactive particle dispersion A. 2 g of the dispersion was weighed on an aluminum pan, and then dried on a hot plate at 175 ° C for 1 hour to obtain a solid content weighed. The content is 31%. In addition, the dispersion is weighed in a magnetic bottle and weighed at 80 °C. The inorganic residue after firing for 1 hour from a muffle furnace at 75 ° C for 30 minutes was calculated to have an inorganic content of 96% in the solid content. Production Example 4: Reactive particle dispersion In the preparation of the liquid B, the reactive particle dispersion B was prepared in the same manner as in Production Examples 1 to 3 except that the ruthenium particle diameter in the ruthenium particle dispersion in the production example 1 was 70 nm. Production Example 5: Reactive particle dispersion In addition to the ruthenium particle diameter of the ruthenium particle dispersion liquid in the production example 1, the reactive particle dispersion liquid C was prepared in the same manner as in Production Examples 1 to 3. -35 - 1364439 Production Example 6: Reactivity In the preparation of the particle dispersion D, the particle size of the ruthenium particle dispersion in the production example 1 was 89 nm, and the reactive particle dispersion D was prepared in the same manner as in Production Examples 1 to 3. Example 1 (1) High The composition of the refractive index antistatic hardening composition was added to a container for shielding ultraviolet rays, and the components shown in Table 1 were added, and stirred at room temperature for 1 hour to obtain a uniform composition. (2) Hard coating layer and high refractive index The manufacture of the laminate of the antistatic layer will be hard using the applicator of the device ring bar (#12) A coating material (manufactured by JSR Corporation, trade name: Z7 501) was applied to a polyethylene terephthalate (PET) film (PET A4300, manufactured by Toyobo Co., Ltd.) as a substrate. The film was dried in an oven at 80 ° C for 3 minutes to form a coating film. Then, a high-pressure mercury lamp was used in the atmosphere to cure the coating film by ultraviolet light at a light irradiation condition of 900 mJ/cm 2 . The applicator of #3) was coated on the hard coat cured film with the composition formulated in the above (1). Subsequently, it was dried in an oven at 80 ° C for 2 minutes to form a coating film. Next, a high-pressure mercury lamp was used in the atmosphere, and the coating film was cured by ultraviolet rays under a light irradiation condition of 600 mJ / c m2 to form a laminate. (3) A laminate having a hard coat layer, a high refractive index antistatic layer, and a low refractive index layer is prepared on the laminate produced according to the above (2), and an applicator having a ring bar (#1 2) is used. A low refractive index material (manufactured by JS R Co., Ltd., trade name: TU2157) was applied. At this time, it was used to dilute the solid component of -36-1364439 of the low refractive index material to 3.6% with methyl isobutyl ketone. Subsequently, it was dried in an oven at 8 (TC for 2 minutes to form a coating film. Then, in a nitrogen atmosphere, a high-pressure mercury lamp was used, and the coating film was cured by ultraviolet rays under a light irradiation condition of 600 mJ/cm 2 to prepare a laminate. The evaluation of the laminate having the hard coat layer and the high-refraction antistatic layer is based on the transparency (haze), surface resistance, and reflectance of the laminate produced in the above (2). The haze meter (manufactured by SUGA Test Instruments Co., Ltd.) was measured in accordance with ASTM D 1 003. The surface resistance (Ω/匚!) was measured using an Agilent Technology High Resistance Meter 4339B at an applied voltage of 100V. The reflectance measurement was carried out by a spectrophotometer (manufactured by JASCO Corporation, trade name: V_5 70) using a large-scale integrating sphere device (manufactured by JASCO Corporation, trade name: ILV-471). The results are shown in Table 1. (5) Evaluation of laminate having hard coat layer, high refractive index antistatic layer and low refractive index antistatic layer The scratch resistance of the laminate prepared according to the above (3) was measured by the following method (steel wire) Woollen Product resistance) A steel wool fabric (BOSTAR No. 0000, manufactured by Japan Steelwool Co., Ltd.) was attached to a vibration-type friction fastness tester (AB-301, manufactured by Tester Industries Co., Ltd.) at a load of 23 3 g/ The condition of cm2 was rubbed back and forth on the surface of the cured film 1 time to visually confirm whether or not the surface of the cured film was scratched, and -37-1364439 was evaluated according to the following criteria. The results are shown in Table 1. 〇: Only a little on the cured film was identified. Fine scratching X: Identification of stripped scratches on the entire surface of the cured film Example 2 and Comparative Examples 1 to 4 The composition was prepared in the same manner as in Example 1 except that the composition described in Table 1 was prepared, and a laminate was produced and evaluated. Listed in Table 1.

[Table 1]

Composition (parts by weight) Example 1 Example 2 Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 - Reactive Particle A (Medium 値 Particle Size 59 nm) _ _ 78.58 . _ (8) Reactive Particle B (中値Particle size 70nm) 78.58 _ _ _ 78.58 _ Reactive particle C (median particle size 78nm) _ 78.58 _ - - 78.58 -- Reactive particle D (midium particle size 89nm) - - _ 78.58 _ (B) Biscoat 700 5.04 5.04 5.04 5.04 • (C) ΡΕΤΑ 12.13 12.13 12.13 12.13 17.17 17.17 (D) Irg. 907 4.25 4.25 4.25 4.25 4.25 4.25 Total solid content 100 100 100 100 100 100 (E) Propylene glycol monomethyl ether 1250 1250 1250 1250 1250 1250 Methanol (dispersion medium containing particles) 225 225 225 225 225 225 Total solvent 1475 1475 1475 1475 1475 1475 Solid content concentration (% by weight) 6.3% 6.3% 6.3% 6.3% 6.3% 6.3% Characteristic evaluation index refractive index antistatic layer / Hard coating / PET laminate haze (%) 1.6 1.5 1.2 1.8 1.6 1.5 Surface resistance (Ω / mouth) 3xl09 5xl09 5xl012 5xl08 3xl09 5xl09 Maximum reflectance (%) 12.3 12.3 12.3 11.9 12.0 12.0 Low refractive index layer / high Refractive index antistatic layer coating /P ET laminate scratch resistance (steel wool resistance) 〇〇X 〇〇〇-38- 1364439 The components in Table 1 represent the following: Reactive particle A: Production example 3, medium 値 particle size 5 9 nm reaction Particle B: Production Example 4, medium-sized particle size: 70 nm Reactive particle C: Production Example 5, medium-sized particle size: 78 nrn Reactive particle D: Production Example 6, medium-thickness particle size: 89 nm Biscoat 700: Osaka Organic Chemical Co., Ltd. Bisphenol A, E0 adduct diacrylate PET A: manufactured by Shin-Nakamura Chemical Co., Ltd., tetramethylol methane triacrylate Irg. 907: manufactured by Ciba Special Chemicals Co., Ltd., 2-methyl-1 -[4-(Methylthio)phenyl-2-morpholinylpropan-1-one. As can be seen from the results of Table 1, the reactive particles have a median particle size of 7 Onm and 78 nm and contain components (B). Examples 1 and 2 of the compound have a surface resistance as low as 109 Ω/cm 2 , a high maximum reflectance, and excellent scratch resistance. On the contrary, in Comparative Example 1, in which the particle diameter of the reactive particles was as small as 5 9 nm, the surface resistance was high and the scratch resistance was deteriorated. On the other hand, in Comparative Example 2 in which the particle size of the reactive particles was as large as 89 nm, the haze property was high and the highest reflectance was low. Further, it can be seen that Comparative Examples 3 and 4 which do not contain the component (B) have a low maximum reflectance. [Industrial Applicability] The curable composition of the present invention can be used for producing a cured film excellent in high refractive index, antistatic property, and scratch resistance. The cured film of the present invention can be used as a coating film which requires antistatic property and scratch resistance, and can be used as a high refractive index antistatic layer of an antireflection film. -39- 1364439 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing an embodiment of a laminate (antireflection film) of the present invention. [Main component symbol description] 1 : Anti-reflection film

2 : Substrate 3 : Hard coat 4 : High refractive index antistatic layer 5 : Low refractive index layer

-40-

Claims (1)

1364439 Publication No. 097109883 Patent Application Revision of Chinese Patent Application; Amendment of February 24, 101, Republic of China, Patent Application Area 1. A hardenable composition containing the following components (A) ~(C): '(A) Oxidation of at least one element having a polymerizable unsaturated group and having a median particle diameter in the range of 65 to 85 nm and selected from the group consisting of zinc 'indium, tin, and antimony a particle having a main component; (B) a compound having one or more polymerizable unsaturated groups, one or more alkylene oxide chains, and two or more aromatic rings: (C) having one or more polymerizable unsaturated groups in addition to the above Compounds other than (A) and (B). 2. The sclerosing composition of claim 1, wherein the compound of the above component (B) has a structure represented by the following formula (B-1): [In the formula (B-1), R1 and R2 each represent a divalent hydrocarbon group having 2 to 4 carbon atoms, R3 is a single bond or may have a divalent hydrocarbon group having 1 to 20 carbon atoms of an aromatic ring, and R5 to R6 are hydrogen. An atom or a methyl group, R14 and R15 represent a hydrogen atom or a (meth) acrylonitrile group, at least one of q R14 and p R15 is a (meth) acryl fluorenyl group, and m and η represent a number of 1 to 30, respectively. p represents a number of 1364439 of 1-4, and q represents the number of 〇~4] β. 3. The sclerosing composition of claim 2, wherein the compound of the above component (Β) has the following formula (Β-2) The structure shown: [Chemical 2] [In the formula (Β-2), R4 represents a hydrogen atom or a methyl group respectively. 'R11 and R12 each independently represent a hydrogen atom, a methyl group, a phenyl group, and R13 is a hydrogen atom or a (meth)acryl fluorenyl group, and m each independently represents 1 ~30 number]. 4. The sclerosing composition of claim 3, wherein the oxide particles of the component (A) are selected from the group consisting of tin oxide containing antimony, indium oxide containing tin, tin oxide containing fluorine, and oxidation containing aluminum. A group of zinc. 5. The sclerosing composition of claim 4, wherein the oxide particles of the component (A) are tin oxide containing cerium. 6. The curable composition according to claim 1, wherein the polymerizable unsaturated group contained in the component (A) contains a group of the structure represented by the following formula (4) = [Chemical 3] Η ... -U —C_N— (4) II V 1364439 [In the formula (4), 'U represents NH, 〇 (oxygen atom) or S (sulfur atom), and V represents Ο or S]. 7. The sclerosing composition of claim 1, further comprising (D) a compound which produces an active species by irradiation with an active energy ray. 8. The sclerosing composition of claim 1 of the patent application further contains (E) an organic solvent. 9. The curable composition according to the first aspect of the invention, wherein the polymerizable unsaturated group contained in the component (C) is a (meth) acrylonitrile group. A hardened film obtained by hardening a curable composition according to any one of claims 1 to 9. A laminate comprising a cured film as in claim 10 of the patent application. -3-