TWI229430B - Optical micro electromechanical system package and manufacturing method thereof - Google Patents
Optical micro electromechanical system package and manufacturing method thereof Download PDFInfo
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- TWI229430B TWI229430B TW93100724A TW93100724A TWI229430B TW I229430 B TWI229430 B TW I229430B TW 93100724 A TW93100724 A TW 93100724A TW 93100724 A TW93100724 A TW 93100724A TW I229430 B TWI229430 B TW I229430B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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Abstract
Description
1229430 五、發明說明(l) 【發明所屬之技術領域】 本發明是有關於一種微機電(micro electromechanical system,ME MS)封裝結構及製造方 法’且特別是有關於一種光學微機電(opticai MEMS )封 裝結構及製造方法。 【先前技術】1229430 V. Description of the invention (l) [Technical field to which the invention belongs] The present invention relates to a micro electromechanical system (ME MS) package structure and manufacturing method ', and particularly to an optical micro electromechanical system (opticai MEMS) Packaging structure and manufacturing method. [Prior art]
在科技發展日新月異的現今時代中,光學微機電元件 係已經廣泛地被應用在現代人之曰常生活中。其十,光學 微機電元件包括感測元件及可動元件,感測元件例如是光 子感測’而可動疋件例如疋微鏡子(micromirror )。 這些光學微機電元件通常以可感測或可活動之方式配置於 半導體元件上,此半導體元件例如是互補金氧化物半導體 (complimentary metal-oxide semiconductor , CMOS )。由於此些光學微機電元件的作用係取決於可活動 性或可感測性,所以很重要的是,用以封裝此些光學微機 電元件的封裝結構必須不能干擾此些光學微機電元件之活 動空間或感測區域。In today's fast-changing era of science and technology, optical micro-electro-mechanical element systems have been widely used in modern life. Tenth, the optical microelectromechanical element includes a sensing element and a movable element. The sensing element is, for example, photon sensing, and the movable element is, for example, a micromirror. These optical micro-electro-mechanical elements are usually arranged on a semiconductor element in a sensible or movable manner. The semiconductor element is, for example, a complementary metal-oxide semiconductor (CMOS). Since the role of these optical microelectromechanical elements depends on their mobility or senseability, it is important that the packaging structure used to encapsulate these optical microelectromechanical elements must not interfere with the activities of these optical microelectromechanical elements Space or sensing area.
請參照第1圖,其緣示乃依照傳統之微機電封裝結構 的剖面圖。在第1圖中,微機電封裝結構丨〇包括一基板 12、一微機電晶片模組14、金線16a及16b、封膠體18和錫 球2 0a及2 0b。基板12具有相對之一基板頂面12a及一基板 底面12b和貫孔(via) 15a及15b,基板頂面i2a上具有鲜 接金手指13a及13b,基板底面12b上具有銲塾i7a及i7b。Please refer to FIG. 1. The edge diagram is a cross-sectional view of a conventional MEMS package structure. In the first figure, the MEMS package structure includes a substrate 12, a MEMS chip module 14, gold wires 16a and 16b, a sealing compound 18, and solder balls 20a and 20b. The substrate 12 has an opposite substrate top surface 12a, a substrate bottom surface 12b, and vias 15a and 15b. The substrate top surface i2a has fresh gold fingers 13a and 13b, and the substrate bottom surface 12b has solder pads i7a and i7b.
1229430 五、發明說明(2) 貫孔15a及15b係貫穿基板12、基板頂面I2a及基板底面 12b ’貫孔15a用以電性連接銲接金手指i3a及銲塾17a ,貫 孔15b用以電性連接銲接金手指1 3b及銲墊17b。1229430 V. Description of the invention (2) The through holes 15a and 15b penetrate the substrate 12, the top surface I2a and the bottom surface 12b of the substrate. The through hole 15a is used to electrically connect the gold finger i3a and the solder pad 17a, and the through hole 15b is used to electrically The gold finger 13b and the pad 17b are soldered to each other.
微機電晶片模組1 4包括一互補金氧化物半導體晶片 22、一微機械結構24及一外蓋26,互補金氧化物半導體晶 片22係以黏貼之方式配置於基板頂面1 2a上。互補金氧化 物半導體晶片22之頂面22a具有接墊28a及28b,微機械結 構24係配置於互補金氧化物半導體晶片22之頂面22a上^ 外蓋26係以凹口向下之方式配置於互補金氧化物半導體晶 片2 2之頂面2 2 a上’且外蓋2 6係與互補金氧化物半導體晶 片22之頂面22a圍成一空間30,使得微機械結構24位於空 間30中。金線16a用以電性連接接墊28a及銲接金手指 13a,金線16b用以電性連接接墊28b及銲接金手指13b。封 膠體18係覆蓋微機電晶片模組14、部分之基板正fil2a、 接墊28a及28b、金線16a及16b和銲接金手指13a及13b。此 外’錫球20a及2 Ob係分別配置於銲墊i7a及17b上,用以電 性連接外部之印刷電路板(printed circuit b〇ard, PCB ) 〇 然而’在微機電晶片模組14之運作過程中,外蓋2 6都 會累積靜電電荷。由於外蓋26沒有任何靜電放電 ^electrostatic discharge,ESD)防護之接地設計,外 蓋26上所累積之靜電電荷將會致使微機電晶片模組14將盔 法運作。此外,封膠體18之覆蓋體積過大,將會增加生^ 成本。另外,微機電晶片模組14運作時也會產生熱量,由The MEMS wafer module 14 includes a complementary gold oxide semiconductor wafer 22, a micromechanical structure 24, and an outer cover 26. The complementary gold oxide semiconductor wafer 22 is disposed on the top surface 12a of the substrate in an adhesive manner. The top surface 22a of the complementary gold oxide semiconductor wafer 22 has pads 28a and 28b. The micromechanical structure 24 is arranged on the top surface 22a of the complementary gold oxide semiconductor wafer 22. The outer cover 26 is arranged in a notch-down manner. On the top surface 2 2 a of the complementary gold oxide semiconductor wafer 22 and the cover 2 6 and the top surface 22 a of the complementary gold oxide semiconductor wafer 22 form a space 30 so that the micromechanical structure 24 is located in the space 30. . The gold wire 16a is used to electrically connect the pad 28a and the gold finger 13a, and the gold wire 16b is used to electrically connect the pad 28b and the gold finger 13b. The encapsulant 18 covers the micro-electro-mechanical chip module 14, part of the substrate positive fil2a, pads 28a and 28b, gold wires 16a and 16b, and solder gold fingers 13a and 13b. In addition, the solder balls 20a and 2 Ob are arranged on the solder pads i7a and 17b, respectively, for electrically connecting an external printed circuit board (PCB). However, the operation of the MEMS chip module 14 During the process, the outer cover 2 6 will accumulate electrostatic charges. Since the outer cover 26 does not have any electrostatic discharge (ESD) protection grounding design, the electrostatic charge accumulated on the outer cover 26 will cause the MEMS chip module 14 to operate the helmet method. In addition, the covering volume of the sealant 18 is too large, which will increase the production cost. In addition, the micro-electro-mechanical chip module 14 also generates heat during operation.
TW1289PA.ptd 第11頁 1229430TW1289PA.ptd Page 11 1229430
於基板12及封膠體18之散熱效果有限,導致微機電封裝結 構1 4之熱篁無法完全地被逸散至外界,影響微機電晶片模 組14的運作品質甚鉅。 【發明内容】 就是在提供一種光學微機電 製造方法,其配置靜電放電 ,ESD )防護導體、封膠體及 學微機電晶片模組之靜電放 之使用量及生產成本,並提 效果。 一種光學微機電封裝結構, 電晶片模組、一連接線、一 。基板之頂面具有至少一銲 包括一透明絕緣板、一光學 學微機電元件。光學微機電 光學微機電晶片之頂面具有 電晶片之一侧面及銲接手 電晶片之頂面上,透明絕緣 衣及光學微機電晶片圍成 置於空間内之光學微機電晶 上,連接線用以電性連接接 導體係以一導電銀膠黏貼於 面之間並接地,靜電放電防 有鑑於此,本發明的目的 (optical MEMS)封裝結構及 (electrostatic discharge 散熱錫球之設計,可以增加光 電防護的能力,減少封膠材料 高光學微機電封裝結構之散熱 根據本發明的目的,提出 至少包括一基板、一光學微機 靜電放電防護導體及一封膠體 接手指,光學微機電晶片模組 微機電晶片、一間隔環及一光 日日片係配置於基板之頂面上, 一接墊,接墊係靠近光學微機 指。間隔環係設置於光學微機 板係設置於間隔環上,並與間 一空間。光學微機電元件係配 片之頂面或透明絕緣板之底面 墊及銲接手指。靜電放電防護 透明絕緣板之底面及基板之頂The heat dissipation effect on the substrate 12 and the sealing compound 18 is limited, so that the heat of the micro-electromechanical package structure 14 cannot be completely dissipated to the outside, which affects the operation quality of the micro-electromechanical chip module 14 greatly. [Summary of the Invention] It is to provide an optical micro-electro-mechanical manufacturing method, which is equipped with electrostatic discharge (ESD) protective conductors, encapsulants, and the amount of electrostatic discharge and production costs of micro-electro-mechanical chip modules, and improve the effect. An optical micro-electro-mechanical package structure, an electric chip module, a connecting line, and a. The top surface of the substrate has at least one solder including a transparent insulating plate and an optical micro-electro-mechanical element. The top surface of the optical micro-electro-mechanical optical micro-electro-mechanical chip has one side of the electric chip and the top surface of the welding flashlight chip. The transparent insulating clothing and the optical micro-electro-mechanical chip are surrounded by the optical micro-electro-mechanical crystal placed in the space. The electrical connection and conduction system is adhered between the surfaces with a conductive silver adhesive and grounded. In view of this, the purpose of the present invention (optical MEMS) packaging structure and the design of the electrostatic discharge heat-dissipating solder ball can increase the photoelectric protection. According to the purpose of the present invention, it is proposed to include at least a substrate, an optical microcomputer electrostatic discharge protection conductor and a colloidal finger, and an optical microelectromechanical chip module microelectromechanical chip. A spacer ring and a light sun sheet are arranged on the top surface of the substrate, a pad, the pad is close to the optical microcomputer finger. The spacer ring is arranged on the optical microcomputer board and is arranged on the spacer ring, and Space. Optical micro-electro-mechanical components are the top surface of the matching plate or the bottom surface of the transparent insulation board and welding fingers. The electrostatic discharge protection is transparent The bottom surface of the top plate and the edge of the substrate
TW1289PA.ptd 第12頁 1229430 五、發明說明(4) 護導體係位於 覆盍部分之光 之基板之頂面 根據本發 構之製造方法 接手指。接著 基板之頂面上 之頂端上,靜 機電晶片模組 晶片模組至少 件、一間隔環 電晶片之頂面 隔環及光學微 置於空間内之 上,光學微機 光學微機電晶 板之頂面黏貼 係位於光學微 與透明絕緣板 連接接塾與銲 之光學微機電 頂面。 為讓本發 懂,下文特舉 光學微機電晶片之另一側面外。封膠體用以 學微機電晶片之頂面及侧面、連接線及部八 明的再一目的,提出一種光學微機 。首先’提供一基板,基板之頂面 以一導電銀膠黏貼一靜電放電防 靜電放電 然後,將 其中,光 ,並塗佈另一導電 電放電防 配置於該 包括一光 及一透明 護導體係 基板之頂 學微機電 絕緣板, 絕緣板係 上,透明 機電晶片圍成一空 光學微機 銀膠於 接地。 面上。 晶片、 間隔環 配置於 間。光 電晶片之頂面或 電晶片之頂面具有至少一 片之一側面。光學 靠近銲接 ’接墊係 機電晶片之另一侧 之底面黏 接手指。 晶片之頂 微機電 手指。 面外, 一光學微 係設置於 間隔環上 學微機電 透明絕緣 接墊,接 晶片之底 靜電放電 並藉由另 貼。接著 然後,形 面及側面 ’形成一連接線 成一封膠體,以 、連接線及部分 電封裝結 具有一銲 護導體於 防護導體 一光學微 學微機電 機電元 光學微機 ,並與間 元件係配 板之底面 墊係靠近 面係與基 防護導體 導電銀膠 ,以電性 覆蓋部分 之基板之 明之上述目的、特徵、和優點能更明顯易 一較佳實施例,並配合所附圖式,作詳細說TW1289PA.ptd Page 12 1229430 V. Description of the invention (4) The guide system is located on the top surface of the light-covered substrate. Connect the finger according to the manufacturing method of this structure. Then on the top of the top surface of the substrate, at least one of the static electromechanical chip module, the top surface spacer of a spacer ring chip and the optical micro are placed in the space, and the top of the optical microcomputer optical microelectromechanical crystal plate The surface adhesive is located on the top surface of the optical micro-electro-mechanical system where the connection between the optical micro and the transparent insulating plate is connected and welded. For the purpose of understanding the present invention, the other side of the optical micro-electro-mechanical chip is mentioned below. The encapsulant is used to learn the top and side surfaces of the micro-electromechanical chip, the connection line and the other purpose of the part, and an optical microcomputer is proposed. First, a substrate is provided. The top surface of the substrate is pasted with a conductive silver adhesive to prevent electrostatic discharge. Then, the substrate is coated with light and coated with another conductive electrical discharge to prevent dislocation. The substrate includes a light and a transparent protective system. The top of the substrate is a micro-electromechanical insulation board. On the insulation board, a transparent electro-mechanical wafer surrounds an empty optical microcomputer silver glue to ground. Surface. The wafer and the spacer ring are arranged in between. The top surface of the photovoltaic chip or the top surface of the chip has at least one side surface. The optical proximity soldering 'pad is a finger on the bottom surface of the other side of the electromechanical chip. The top of the chip MEMS finger. Outside the surface, an optical micro-system is set on the spacer ring, and the micro-electro-mechanical transparent insulation pad is connected to the bottom of the wafer for electrostatic discharge and attached by another. Then, the shape surface and the side surface form a connecting wire into a gel, and the connecting wire and a part of the electrical packaging junction have a welding protective conductor to the protective conductor, an optical micro-electromechanical electromechanical element optical microcomputer, and are matched with the inter-element. The bottom pad of the board is close to the surface and the conductive silver glue of the base protective conductor, and the above-mentioned purposes, features, and advantages of the base of the substrate are electrically covered. The above-mentioned purpose, features, and advantages can be more clearly and easily a preferred embodiment, and with the accompanying drawings, make Detailed
TW1289PA.ptdTW1289PA.ptd
1229430 五、發明說明(5) 明如下: 【實施方式】 請參照第2圖,其繪示乃依照本發明之較佳實施例之 光學微機電(opt i cal MEMS )封裝結構的剖面圖。在第2 圖中’光學微機電封裝結構40至少包括一基板42、一光學 微機電晶片模組44、一靜電放電(e iectrostat ic discharge,ESD )防護導體46、一連接線48、一封膠體 50、一錫球52和數個散熱錫球54。基板42具有相對之一基 板頂面42a及一基板底面42b和一貫孔59,基板頂面42a及 基板底面42b上係分別具有一銲接手指58及一銲墊6 0。貫 孔59係貫穿基板42、基板頂面42a及基板底面42b,用以電 性連接知*接手指5 8及鲜塾60。 光學微機電晶片模組44至少包括一光學微機電晶片 62、一透明絕緣板64、一光學微機電元件66及一間隔環 68 ’光學微機電晶片62具有一頂面62a、一底面62d和相對 之側面62b及62c,光學微機電晶片62之底面62d係藉由一 黏著劑63與基板頂面42a黏貼。光學微機電晶片62之頂面 62a上具有一接墊65,接墊65係靠近光學微機電晶片62之 侧面62b及銲接手指58。間隔環68係配置於光學微機電晶 片62之頂面62a上,透明絕緣板64係配置於間隔環68上, 並與間隔環6 8及光學微機電晶片6 2圍成一空間7 0,接墊6 5 係位於空間7 0之外。其中,光學微機電元件66係配置於空 間70内之光電微機電晶片62之頂面6 2a或透明絕緣板64之1229430 5. Description of the invention (5) The description is as follows: [Embodiment] Please refer to FIG. 2, which shows a cross-sectional view of an optical micro-electro-mechanical (opt i cal MEMS) packaging structure according to a preferred embodiment of the present invention. In FIG. 2 'the optical micro-electro-mechanical package structure 40 includes at least a substrate 42, an optical micro-electro-mechanical chip module 44, an electrostatic discharge (ESD) protective conductor 46, a connection line 48, and a gel. 50. A solder ball 52 and a plurality of heat-dissipating solder balls 54. The substrate 42 has an opposite substrate top surface 42a, a substrate bottom surface 42b, and a through hole 59. The substrate top surface 42a and the substrate bottom surface 42b have a soldering finger 58 and a solder pad 60, respectively. The through hole 59 penetrates the substrate 42, the substrate top surface 42a, and the substrate bottom surface 42b, and is used to electrically connect the fingers 58 and 60. The optical micro-electro-mechanical chip module 44 includes at least an optical micro-electro-mechanical chip 62, a transparent insulating plate 64, an optical micro-electro-mechanical element 66 and a spacer ring 68. The optical micro-electro-mechanical chip 62 has a top surface 62a, a bottom surface 62d, and an opposite surface. The side surfaces 62b and 62c and the bottom surface 62d of the optical micro-electro-mechanical chip 62 are adhered to the top surface 42a of the substrate by an adhesive 63. The top surface 62a of the optical micro-electro-mechanical chip 62 has a pad 65, and the pad 65 is close to the side surface 62b of the optical micro-electro-mechanical chip 62 and the soldering finger 58. The spacer ring 68 is arranged on the top surface 62a of the optical micro-electro-mechanical chip 62, and the transparent insulating plate 64 is arranged on the spacer ring 68, and forms a space 70 with the spacer ring 68 and the optical micro-electro-mechanical chip 62. The pad 6 5 is located outside the space 70. Among them, the optical micro-electro-mechanical element 66 is the top surface 62a of the photoelectric micro-electro-mechanical chip 62 disposed in the space 70 or the transparent insulating plate 64.
TW1289PA.ptd 第14頁 1229430 五、發明說明(6) 底面64a上。在本實施例中,本發明將光學微機電元件66 係配置於空間70内之光電微機電晶片62之頂面62a上。 需要注意的是,間隔環68係可藉由UV膠或環氧樹脂 (epoxy )配置於光學微機電晶片62之頂面62a及透明絕緣 板6 4之底面6 4 a之間’使得透明絕緣板6 4之底面β 4 b及光學 微機電晶片62之頂面62a相距一高度差。光學微機電元件 66可以是可動元件’如微鏡子(micromirror),可動元 件係配置於光學微機電晶片6 2之頂面6 2 a或透明絕緣板β 4 之底面64a上。光學微機電元件66可以是感測元件,感測 元件係配置於光學微機電晶片6 2之頂面6 2 a上。TW1289PA.ptd Page 14 1229430 V. Description of the invention (6) On the bottom surface 64a. In the embodiment, the optical micro-electro-mechanical element 66 is arranged on the top surface 62 a of the photoelectric micro-electro-mechanical chip 62 in the space 70 in the present invention. It should be noted that the spacer ring 68 can be arranged between the top surface 62a of the optical micro-electro-mechanical chip 62 and the bottom surface 6 4 a of the transparent insulating plate 64 by UV glue or epoxy to make a transparent insulating plate. The bottom surface β 4 b of 64 and the top surface 62 a of the optical micro-electro-mechanical chip 62 are separated by a height difference. The optical micro-electro-mechanical element 66 may be a movable element, such as a micromirror. The movable element is disposed on the top surface 6 2 a of the optical micro-electro-mechanical wafer 62 or the bottom surface 64 a of the transparent insulating plate β 4. The optical micro-electro-mechanical element 66 may be a sensing element. The sensing element is disposed on the top surface 6 2 a of the optical micro-electro-mechanical chip 62.
靜電放電防護導體46係分別以導電銀膠72a及72b黏貼 於基板頂面4 2 a及透明絕緣板6 4之底面6 4 a之間並接地,靜 電放電防護導體46係位於光學微機電晶片62之側面62c 外。如此一來,靜電放電防護導體46可以將透明絕緣板64 之靜電電何導入一外部接地端或基板5 2之接地層中,加強 光學微機電晶片模組4 4之靜電放電防護能力,並維持光學 微機電晶片模組44的運作效能。The electrostatic discharge protective conductor 46 is adhered to the top surface 4 2 a of the substrate and the bottom surface 6 4 a of the transparent insulating plate 64 with conductive silver glues 72a and 72b, respectively, and grounded. The electrostatic discharge protective conductor 46 is located on the optical micro-electromechanical chip 62. Outside 62c. In this way, the electrostatic discharge protective conductor 46 can introduce the static electricity of the transparent insulating plate 64 into an external ground terminal or the ground layer of the substrate 52 to strengthen the electrostatic discharge protection capability of the optical micro-electro-mechanical chip module 44 and maintain it. Operational performance of the optical micro-electro-mechanical chip module 44.
連接線58用以電性連接接墊65及銲接手指58,使得光 學微機電晶片62與基板42電性連接。封膠體50用以覆蓋部 分之光學微機電晶片62之頂面62a及侧面62b、連接線58及 部分之基板頂面42a。甚至,封膠體50更可覆蓋透明絕緣 板64之側面64b及部分之間隔環68。由於封膠體50並不需 要覆蓋整個光學微機電晶片模組44,大大地縮小封膠材質 之用量’減少生產成本許多。 、The connecting wire 58 is used to electrically connect the pad 65 and the soldering finger 58 so that the optical micro-electromechanical chip 62 and the substrate 42 are electrically connected. The sealing compound 50 is used to cover a part of the top surface 62a and the side surface 62b of the optical micro-electromechanical wafer 62, the connection line 58 and a part of the substrate top surface 42a. Furthermore, the sealing compound 50 can cover the side surface 64b of the transparent insulating plate 64 and a part of the spacer ring 68. Since the sealant 50 does not need to cover the entire optical micro-electro-mechanical chip module 44, the amount of sealant material is greatly reduced 'and the production cost is greatly reduced. ,
12294301229430
錫球52係配置於銲墊52上,用以電性連接一外部之印 刷電路板。散熱錫球54係配置於基板底面42b上,而形成P 虛(dummy )錫球。此些散熱錫球54用以幫助光學微機電 晶片模組44散熱,並提高光學微機電晶片模組44之運作品 質。 口口 如第3A圖所示’本發明之基板底面42b更可具有數個 銲墊60,且此些銲墊6 〇係以陣列之方式排放,則光學微機 電封裝結構4 0為平格陣列(1 an(j gr i d array,LGA )封來 結構。如第3 B圖所示,各銲墊6 〇上係可配置一錫球5 2,此 些錫球52也是以陣列之方式排放,則光學微機電封裝結構 40為球格陣列(ball grid array,BGA )封裝結構。 請參照第4A〜4F圖,其繪示乃依照本發明之較佳實施 例之光學微機電封裝結構之製造方法的流程剖面圖。首 先,在第4A圖中,提供一基板42。基板42具有一基板頂面 42a、一基板底面4 2b及至少一貫孔59、基板頂面42a及基 板底面42b上分別具有至少一銲接手指58及一銲墊6〇。$ 孔係貫穿基板42,用以電性連接銲接手指58及銲墊6〇。 接著,如第4B圖所示,以一導電銀膠72a黏貼一靜電放電 防護導體46於基板頂面42a上,並塗佈另一導 靜電放電防護導舰之頂端上。其中,黏著形於 成於靜電放電防護導體4 6及銲接手指5 8之間的 42a上,以預備後續之黏晶步驟。 的基扳頂面 然後,如第扎圖所示,進行黏晶步驟,將一光學微機 電晶片模組44配置於基板頂面42a上。其中,光學微機電The solder balls 52 are disposed on the solder pads 52 for electrically connecting an external printed circuit board. The heat-dissipating solder balls 54 are arranged on the bottom surface 42b of the substrate to form P dummy solder balls. These heat-dissipating solder balls 54 are used to help the optical micro-electro-mechanical chip module 44 dissipate heat and improve the operation quality of the optical micro-electro-mechanical chip module 44. As shown in FIG. 3A, the bottom surface 42b of the present invention may further have a plurality of bonding pads 60, and these bonding pads 60 are discharged in an array manner, and the optical microelectromechanical packaging structure 40 is a flat grid array. (1 an (j gr id array, LGA)). As shown in FIG. 3B, a solder ball 5 2 can be arranged on each solder pad 60, and these solder balls 52 are also discharged in an array manner. The optical micro-electro-mechanical packaging structure 40 is a ball grid array (BGA) packaging structure. Please refer to FIGS. 4A to 4F, which show a method for manufacturing an optical micro-electro-mechanical packaging structure according to a preferred embodiment of the present invention. First, in FIG. 4A, a substrate 42 is provided. The substrate 42 has a substrate top surface 42a, a substrate bottom surface 4 2b, and at least one through hole 59, the substrate top surface 42a, and the substrate bottom surface 42b. A soldering finger 58 and a soldering pad 60. The hole penetrates the substrate 42 and is used to electrically connect the soldering finger 58 and the soldering pad 60. Next, as shown in FIG. 4B, a static silver paste 72a is used to stick a static electricity. The discharge protection conductor 46 is on the top surface 42a of the substrate, and is coated with another conductive electrostatic discharge The top of the protective guide ship. Among them, it is adhered to 42a formed between the electrostatic discharge protective conductor 46 and the welding finger 5 8 to prepare for the subsequent sticking crystal step. Then, as shown in FIG. As shown, an optical micro-electro-mechanical chip module 44 is disposed on the substrate top surface 42a by performing a die-bonding step. Among them, the optical micro-electro-mechanical device
TW1289PA.ptd 第16頁 1229430 五、發明說明(8) 晶片模組44至少包括一光學微機電晶片62、一光學微機電 元件66、一透明絕緣板64及一間隔環68,間隔環68係設置 於光學微機電晶片62之頂面62a上。透明絕緣板64係配置 於間隔環68上,並與光學微機電晶片62及間隔環68圍成一 空間7 0。光學微機電元件6 6係配置於空間7 0内之光學微機 電晶片62之頂面62a或透明絕緣板64之底面64a上,光學微 機電晶片62之頂面62a具有至少一接墊65,接墊65位於空 間70之外’並罪近光學微機電晶片62之侧面62b。光學微 機電晶片62之底面62d係藉由黏著劑63與基板頂面42a黏 貼,接墊65係靠近銲接手指58。靜電放電防護導體46係位 於光學微機電晶片62之另一側面62b外,並藉由導電銀膠 72b與透明絕緣板64之底面64a黏貼。需要注音的菩,念/基 ⑽係可形成光學微機電晶片62之底二'的以疋進/黏者 晶步驟。此外,光學微機電晶片模組44可以透過具有數個 光學微機電晶片62之晶圓對具有數個透明絕緣板64之連續 板之接合及切割步驟完成。 接著,如第4D圖所示,進行銲線步驟,形成一連接 48 ’以電性連接接墊65與銲接手指58。然後,如第4£圖所 不,進行封膠步驟,形成一封膠體5〇,以覆蓋部分之光學 ==片。62Λ頂面62,侧面62b、連接線48及部分之基 侧面62b I mi牛封膠體50更可以覆蓋透明絕緣板64之 側面62b進灯植球步驟,形成錫球52於辉塾6 球54於基板底面仙上,光學微機電封裝結2TW1289PA.ptd Page 16 1229430 V. Description of the invention (8) The chip module 44 includes at least an optical micro-electro-mechanical chip 62, an optical micro-electro-mechanical element 66, a transparent insulating plate 64, and a spacer ring 68. The spacer ring 68 is provided. On the top surface 62 a of the optical micro-electro-mechanical wafer 62. The transparent insulating plate 64 is arranged on the spacer ring 68, and forms a space 70 with the optical micro-electromechanical wafer 62 and the spacer ring 68. The optical micro-electro-mechanical element 66 is arranged on the top surface 62 a of the optical micro-electro-mechanical chip 62 or the bottom surface 64 a of the transparent insulating plate 64 in the space 70. The pad 65 is located outside the space 70 'and is near the side 62b of the optical micro-electromechanical wafer 62. The bottom surface 62d of the optical micro-electro-mechanical chip 62 is adhered to the substrate top surface 42a by an adhesive 63, and the pad 65 is close to the soldering finger 58. The ESD protection conductor 46 is located outside the other side 62b of the optical micro-electro-mechanical chip 62, and is adhered to the bottom surface 64a of the transparent insulating plate 64 by a conductive silver glue 72b. The phonetic system that requires phonetic transcription can be used to form the bottom step of the optical micro-electro-mechanical chip 62 '. In addition, the optical micro-electro-mechanical wafer module 44 can be completed through the joining and cutting steps of a wafer having a plurality of optical micro-electro-mechanical wafers 62 to a continuous plate having a plurality of transparent insulating plates 64. Next, as shown in FIG. 4D, a wire bonding step is performed to form a connection 48 'to electrically connect the pad 65 and the soldering finger 58. Then, as shown in Fig. 4, the sealing step is performed to form a piece of colloid 50 to cover the optical portion of the sheet. The 62Λ top surface 62, the side surface 62b, the connecting line 48, and a part of the base side surface 62b I mi cow seal gel 50 can also cover the side surface 62b of the transparent insulating plate 64 into the lamp ball planting step to form a solder ball 52 on the Hui 6 ball 54 on On the underside of the substrate, optical micro-electro-mechanical packaging junction 2
1229430 五、發明說明(9) 然熟悉此技藝者亦可以明瞭本發明之技術並不侷限在 此,例如,靜電放電防護導體4 6為金屬,且為金、銀或 銅。此外,基板42為可撓性(flexible )基板、陶瓷基 板、雙順丁稀一酸醯亞胺(j3ismaleifflide triazene, BT )樹脂基板或透明絕緣板纖維環氧樹脂銅箔(ep〇Xy woven glass fabric copper clad laminate ,FR4)基 板。當基板42為可撓性基板時,基板42之基板底面42b可 藉由一排線連接至外界之一印刷電路板,且具有可撓性基 板之光電微機電封裝結構可以提高製程設計彈性 (routing flexibility )。另外,光學微機電晶片62為 互補金氧化半導體(complementary meta卜。xide semiconductor,CM0S)晶片,且透明絕緣板“為透明玻 璃板或透明塑膠板。連接線48為金 接金广且封膠體5。可以是底填材料(und=8)“ =發:上述實施例所揭露之光學微機電封裝結構及製 ΐ呀〆,可二Ϊ ΐ靜電放電防護導體、封膠體及散熱錫球之 力,減少封膠材料之使用量及 電:護能 電封裝結構之散熱效果。 成本並棱南光學微機 綜上所述,雖然本發明已 然其並非用以限定太恭日日γ y ^权佳實施例揭露如上, 本發明之精神和範“,當3藝者’在不脫離 ΐ發明之保護範圍當視後附之申===;者r TW1289PA.ptd 第18頁 1229430 圖式簡單說明 【圖式簡單說明】 :會:乃依照傳統之微機電封裝結構的剖面圖。 封裝結構的剖面圖。“實施例之光學微機電 面上HI繪示乃本發明之光學微機電封裝結構之基板底 面上,、有陣列排放之銲墊時之狀態的示意圖。 = 3!,繪示乃本發明之光學微機電结構之基板底 面上具有陣列排放之錫球時之狀態的示音 第4A〜4F圖繪示乃依照本發明之=奋二 機電封裝結構之製造方法的流程剖面圖佳“』之先子 圖式標號說明 10、4 0 ·光學微機電封裝結構 12、4 2 :基板 12a、42a :基板頂面 12b、42b :基板底面 13a、13b :銲接金手指 14 :微機電封裝結構 15a、15b、59 :貫孔 1 6 a、1 6 b :金線 1 7 a、1 7 b、6 0 :銲墊 18、50 :封膠體 20a、20b、52:錫球 22 :互補金氧化半導體晶片1229430 V. Description of the invention (9) Of course, those skilled in the art can also understand that the technology of the present invention is not limited to this. For example, the ESD protection conductor 46 is a metal and is gold, silver or copper. In addition, the substrate 42 is a flexible substrate, a ceramic substrate, a j3ismaleifflide triazene (BT) resin substrate, or a transparent insulating plate fiber epoxy copper foil (epoxy woven glass fabric). copper clad laminate (FR4) substrate. When the substrate 42 is a flexible substrate, the substrate bottom surface 42b of the substrate 42 can be connected to a printed circuit board of the outside by a row of wires, and the optoelectronic micro-electromechanical packaging structure with the flexible substrate can improve the process design flexibility. flexibility). In addition, the optical micro-electro-mechanical chip 62 is a complementary meta-oxide semiconductor (CMOS) chip, and the transparent insulating plate is a transparent glass plate or a transparent plastic plate. The connecting wire 48 is gold-plated and wide-encapsulated. 5 . Can be underfill material (und = 8) "= hair: the optical micro-electro-mechanical package structure and manufacturing system disclosed in the above embodiment, it can be Ϊ the force of the electrostatic discharge protection conductor, sealing gel and heat-dissipating solder ball, Reduce the amount of sealing material and electricity: heat dissipation effect of energy-saving electrical packaging structure. The cost is not as described above. Although the present invention is not intended to limit too respectful day γ y ^ Quan Jia embodiment is disclosed as above, the spirit and scope of the present invention ", when the three artists' The scope of protection of the invention should be attached as follows ===; by r TW1289PA.ptd page 18 1229430 Simple illustration of the drawing [Simplified illustration of the drawing]: Yes: It is a sectional view according to the traditional micro-electromechanical packaging structure. Package structure "The HI drawing on the optical micro-electro-mechanical surface of the embodiment is a schematic diagram of the state of the substrate of the optical micro-electro-mechanical package structure of the present invention when there are arrayed pads. = 3 !, the drawing shows the state of the state when the solder balls are arrayed on the bottom surface of the substrate of the optical micro-electromechanical structure of the present invention. Figures 4A to 4F are shown in accordance with the present invention. The flow chart of the method is shown in the figure of the first sub-pattern. 10, 4 0 · Optical micro-electro-mechanical package structure 12, 4 2: Substrate 12a, 42a: Substrate top surface 12b, 42b: Substrate bottom surface 13a, 13b: Solder gold Finger 14: MEMS package structure 15a, 15b, 59: Through hole 16a, 16b: Gold wire 17a, 17b, 60: Pad 18, 50: Sealing gel 20a, 20b, 52: Solder ball 22: complementary gold oxide semiconductor wafer
1229430 圖式簡單說明 22a :互補金氧化半導體晶片之頂面 24 :微鏡子 26 :外蓋 28a、28b、65 :接墊 30 、 70 :空間 44 :光學微機電封裝結構 46 :靜電放電防護導體 48 :連接線 5 4 :散熱錫球 58 :銲接手指 62 :光學微機電晶片 62a ··光學微機電晶片之頂面 62b、62c :光學微機電晶片之側面 62d :光學微機電晶片之底面 63 :黏著劑 64 :透明絕緣板 6 4 a :透明絕緣板之底面 6 4 b :透明絕緣板之側面 68 :間隔環 72a、72b ··導電銀膠1229430 Schematic illustration 22a: Top surface of complementary gold oxide semiconductor wafer 24: Micromirror 26: Covers 28a, 28b, 65: Pads 30, 70: Space 44: Optical microelectromechanical package structure 46: Electrostatic discharge protection conductor 48 : Connecting wire 5 4: Heat-dissipating solder ball 58: Welding finger 62: Optical micro-electro-mechanical chip 62 a · Top surfaces of optical micro-electro-mechanical chip 62 b, 62 c: Side surfaces of optical micro-electro-mechanical chip 62 d: Bottom surface of optical micro-electro-mechanical chip 63: Adhesion Agent 64: transparent insulation board 6 4 a: bottom surface of transparent insulation board 6 4 b: side surface of transparent insulation board 68: spacer ring 72a, 72b · conductive silver glue
TW1289PA.ptd 第20頁TW1289PA.ptd Page 20
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TW93100724A TWI229430B (en) | 2004-01-12 | 2004-01-12 | Optical micro electromechanical system package and manufacturing method thereof |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7764271B2 (en) | 2005-09-13 | 2010-07-27 | Lite-On Technology Corp. | Method of manufacturing an optical module |
US11646576B2 (en) | 2021-09-08 | 2023-05-09 | Analog Devices International Unlimited Company | Electrical overstress protection of microelectromechanical systems |
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2004
- 2004-01-12 TW TW93100724A patent/TWI229430B/en not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7764271B2 (en) | 2005-09-13 | 2010-07-27 | Lite-On Technology Corp. | Method of manufacturing an optical module |
US11646576B2 (en) | 2021-09-08 | 2023-05-09 | Analog Devices International Unlimited Company | Electrical overstress protection of microelectromechanical systems |
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TW200524105A (en) | 2005-07-16 |
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