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TWI248480B - Method for producing corrosion protective coatings on light metal alloys - Google Patents

Method for producing corrosion protective coatings on light metal alloys Download PDF

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TWI248480B
TWI248480B TW92128941A TW92128941A TWI248480B TW I248480 B TWI248480 B TW I248480B TW 92128941 A TW92128941 A TW 92128941A TW 92128941 A TW92128941 A TW 92128941A TW I248480 B TWI248480 B TW I248480B
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Taiwan
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light metal
metal alloy
pulse
surface treatment
coating
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TW92128941A
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Chinese (zh)
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TW200514875A (en
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Shr-Jiun Jung
Rung-Jou Weng
Olegdemine
Fong Clinton
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Ind Tech Res Inst
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  • Other Surface Treatments For Metallic Materials (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemical Treatment Of Metals (AREA)

Abstract

A corrosion-prevention surface treating method for light metals especially of aluminum and magnesium alloys. In electrolytes containing alkaline hydroxides and alkaline silicates, through application of positive and reverse pulse DC current, a uniform and corrosion resistant coating can be formed on the surface of the treated alloys. The ratio between pulse duration and rest interval between pulses are important process parameters. The ratio of pulse duration and rest period is to be maintained between 1:3 and 1:10. The time intervals between pulse and reverse pulse are kept between 0.3 and 30 millisecond. Every three and twelve pulses are to be followed by a single action of reverse pulse. This surface treatment is applicable on forged and die casted light metal alloys or metallic components of complex shapes. For high silicon (up to 12%) containing aluminum alloys is also a suitable candidate with a resulting surface coatings encompassing high concentration of oxidized substrate materials and minor presence of silicon oxides.

Description

1248480 案號 92128941 A_Μ. 曰 修正 五、發明說明(1) 【發明所屬技 本發明是 面處理法,使 電使輕金屬表 屬之抗钱性。 【先前技術】 近期有許 但是大量由輕 殼、電器裝置 並沒有應用於 用受到下列因 相較於傳統製 物質。 在1 9 70年 電用於金屬閥 術被企圖嘗試 變更,其中包 微電漿氧化及 電弧電漿放電 質的鍍層,微 鑛層的形成及 在微電弧電漿 輕金屬表面受 兩側的電位差 多有關 合金( 之零件 這些物 素影響 程得到 代中期 表面生 應用於 括輝光 電解電 (並非 電弧電 沉積過 氧化反 到一電 增力Π到 ,Markov 成氧化物 商業化。 電鍍、輝 漿氧化。 輝光放電 漿氧化之 程中涉及 應中的電 流影響形 臨界電壓 提出輝光放 微電弧氧化技 已經歷過多次 微電弧氧化、 看來,由於微 生成一良好性 此技術。 化學的反應, 制係為一種在 術領域】 有關於一種在輕金屬表面製造一抗钱鍍層表 用一脈衝直流電在輕金屬表面產生微電弧放 面形成一均質、抗蝕之鍍層,藉以提升輕金 微電弧氧化之相關發明相繼被提出, 尤其是鎂和鋁)製成的物件,例如外 、結構元件及消耗元件,微電弧氧化 質防蝕處理。而微電弧氧化廣泛的應 而被侷限,例如:功率消耗的增加、 粗糙度較高鍍層、電解質中包含有害 和Hradcovsky 保護層之後, 此技術之名稱 光放電氧化、 站在旁觀角色 或電弧放電) 名稱最能代表 電漿化學及電 漿化學反應機 成一介電層,而介電層中因 ,最後導致介電層中某一區1248480 Case No. 92128941 A_Μ. 修正 Amendment V. Description of the Invention (1) [Technical Field of the Invention] The present invention is a surface treatment method which makes electric light metal sheets resistant to money. [Prior Art] Recently, there are a large number of light-shell and electrical devices that have not been used for the following reasons compared to conventional materials. In 1970, the electric valve used in metal valve was attempted to change, including the coating of micro-plasma oxidation and arc plasma discharge, the formation of micro-mineral layer and the potential difference between the two sides of the light metal surface of the micro-arc plasma. Regarding the alloys (the parts of these factors affect the process of the generation of intermediate surface applications for the inclusion of glow electrolysis (not arc electrodeposition peroxide to an electric booster, Markov oxide oxide commercialization. Electroplating, glow plasma oxidation. The process of oxidation of the glow discharge slurry involves the influence of the current in the shape of the critical voltage. The glow-discharge micro-arc oxidation technique has undergone multiple micro-arc oxidation, which appears to be due to the micro-generation of a good technique. The chemical reaction is In the field of surgery, an invention relating to the manufacture of an anti-corrosion coating on a light metal surface is formed by a pulsed direct current on a light metal surface to form a homogeneous, resist-plated coating, thereby improving the light gold micro-arc oxidation. Proposed, in particular, articles made of magnesium and aluminum, such as outer, structural and consumable components, micro-electric Oxidation anti-corrosion treatment. While micro-arc oxidation should be limited, such as: increased power consumption, higher roughness coating, electrolyte containing harmful and Hradcovsky protective layer, the name of this technology is photo-discharge oxidation, standing on the sidelines Role or arc discharge) The name best represents the plasma chemistry and plasma chemical reaction machine into a dielectric layer, and the dielectric layer eventually leads to a certain area in the dielectric layer.

1248480 ---案號92128941_年月曰 修正___ 五、發明說明^一~^ " 域先崩潰,產生離子化的現象,生成一具活性物質,該處 在介電層内形成一電漿管道開始放電,而介電層中具較低 介電係數的區域先產生介電崩潰,介電層中其他區域則因 下一脈衝電流作用,放電反應位置偏移而陸續造成介電崩 潰,將使得被處理物件整體表面能產生連續電漿反應。最 後該電漿化學反應在被處理金屬表面生成一緻密氧化層。 在美國專利第3 9 5 6 0 8 0及4082622號中,Hradcovsky揭露一 種技術,該技術應用於金屬閥表面生成一石夕酸鹽鐘層,此 技術用一種連續直流電,在一含有鹼金屬矽酸鹽並結合鹼 金屬氫氧化物之電解質及添加一催化劑,例如納碌酸鹽 (美國專利第3956080號)或是添加一驗金屬過氧化物 (美國專利第4082 6 2 6號)。這個反應之電壓範圍22 0V至 1 5 0 〇 V,而電流密度0 · 5至1 0 · 0 A / d in2。使用一連續直流電, 反應最後生成一矽酸鹽鍍層。1248480 --- Case No. 92128941_年月曰曰 ___ V. Invention Description ^一~^ " The domain first collapses, produces ionization phenomenon, generates an active substance, which forms an electricity in the dielectric layer The slurry pipeline begins to discharge, and the dielectric layer has a dielectric breakdown in the region with a lower dielectric constant, and other regions in the dielectric layer are caused by the next pulse current, and the discharge reaction position shifts, causing dielectric breakdown. This will result in a continuous plasma reaction of the entire surface of the object being processed. Finally, the plasma chemical reaction produces a uniform dense oxide layer on the surface of the metal being treated. In U.S. Patent Nos. 3,959,080 and 4,082,262, Hradcovsky discloses a technique for applying a layer of a silicate layer to the surface of a metal valve. The technique uses a continuous direct current, in the presence of an alkali metal citrate. The salt is combined with an electrolyte of an alkali metal hydroxide and a catalyst such as a naphthenate (U.S. Patent No. 3,956,080) or a metal peroxide (U.S. Patent No. 4,082,262). The voltage range of this reaction is 22 0V to 150 〇 V, and the current density is 0 · 5 to 1 0 · 0 A / d in2. Using a continuous direct current, the reaction finally produces a tantalate coating.

在美國專利弟5811194 5虎中,Kurze 揭露·種更新進 的方式,在一含有絕緣層金屬表面生成一層厚度4〇-150/zm 氧化陶瓷鍍層。此方法是利用一直流或交流電作為電源, 包含一電解質,該電解質含有磷酸鹽、硼酸鹽、氟化物。 另外添加一穩定劑,該穩定劑選自六曱基二胺、尿素、乙 —醇、甘油。該操作溫度-3 0 °C至1 5 °C,操作溫度必須維 持在正負2 °C。電流密度1 A / dm2,電壓5 0至4 0 0 V,本反應係 在一固定電流模式中進行。本方法主要缺點在於電解質中 含有害物質’且該反應必須在低溫的環境中進行且溫度範 圍受到限制。In the US patent brother 5811194 5, Kurze unveiled the method of regenerating into a layer of 4 〇-150/zm oxidized ceramic coating on a metal surface containing an insulating layer. The method uses a direct current or an alternating current as a power source, and contains an electrolyte containing a phosphate, a borate, and a fluoride. Further, a stabilizer is added, and the stabilizer is selected from the group consisting of hexamethylenediamine, urea, ethyl alcohol, and glycerin. The operating temperature is -3 °C to 15 °C and the operating temperature must be maintained at plus or minus 2 °C. The current density is 1 A / dm2 and the voltage is 50 to 400 V. This reaction is carried out in a fixed current mode. The main disadvantage of this method is that it contains harmful substances in the electrolyte and the reaction must be carried out in a low temperature environment with a limited temperature range.

第8頁 1248480 曰Page 8 1248480 曰

案號 92128941 五、發明說明(3) 在美國第6365028號針對前述Kurze兩項問題提出改盖 的方案,Shatrov在鋁合金製成物件表面生成一堅硬保護 鍍層,此發明是利用50至60Hz交流電作為電源,一驗性電 解質中含一鹼金屬氫氧化物、鹼金屬矽酸鹽、鹼金屬焦碟 酸鹽及一過氧化物。這反應分為兩階段,其中第_階段, 反應在電流密度160至180A/dm2中進行5-90秒;第二階1 中,電流密度下降到3至30A/dm2,該反應持續進行且$其&所 需功率持續減少’直到生成一必需厚度之鍍層,此反應的 電解質中並不含有害物質,且可於室溫(15一 5〇 中“進 行’但因為咼電流也、度造成高功率消耗,且因使用、、古 造成高粗糙度鍍層。 ^ ^ 【發明内容】 本發明主要目的是提供一種於輕金屬表面形 鍍層,避免外界物質對輕金屬表面的腐蝕。 保濩 本發明另-目的是減少微電弧氧化之功率消 鑛層之平滑性。 ’ ^改善 本發明主要係利用一順向/反向 表面產生”弧電裝。在順向脈衝直流= =輕 理金屬表面先形成一介電層,而介兩 下’破處 面電荷,當脈衝直流電的電壓 :1兩端則包含許多表 介電層某,區域因為其介電係數;7氏;=’將會使 的現象,造成微電弧電漿生成’該電弧杈早杳生介電崩潰 氧化成-氧化物鍍層,而反向脈i則::材料表面融溶並 (例如硬度、孔隙度及平滑性)。卷;改善鍍層的性質 田反向脈衝同時於被處Case No. 92128941 V. INSTRUCTIONS (3) In US No. 6365028, the proposed solution for the two problems of Kurze mentioned above, Shatrov generates a hard protective coating on the surface of the aluminum alloy article. The invention uses 50 to 60 Hz alternating current as the The power source contains an alkali metal hydroxide, an alkali metal silicate, an alkali metal coke salt and a peroxide. The reaction is divided into two stages, in which the reaction is carried out for a period of 5-90 seconds at a current density of 160 to 180 A/dm 2 ; in the second step 1, the current density is decreased to 3 to 30 A/dm 2 , and the reaction is continued and $ Its & required power continues to decrease 'until a plating of the necessary thickness is generated, the electrolyte of this reaction does not contain harmful substances, and can be carried out at room temperature (15 to 5 但 but because of the 咼 current, the degree High power consumption, and high roughness coating due to use, and ancient. ^ ^ [Summary of the Invention] The main object of the present invention is to provide a surface coating on a light metal surface to avoid corrosion of light metal surfaces by external substances. The purpose is to reduce the smoothness of the power demineralization layer of micro-arc oxidation. '^Improve the invention mainly by using a forward/reverse surface to generate the arc electric device. In the forward pulse DC == light metal surface first forms a The dielectric layer, and the two sides of the 'breaking surface charge, when the pulsed DC voltage: 1 at both ends contains a number of surface dielectric layers, the region because of its dielectric coefficient; 7; = ' will make the phenomenon, Causing micro-electricity Plasma generation 'the arc 杈 early dielectric breakdown oxidized to oxide coating, while the reverse pulse i:: material surface melt and (such as hardness, porosity and smoothness). Volume; improve the properties of the coating The field reverse pulse is at the same time

1248480 案號 92128941 A_η 修正 五、發明說明(4) 理件表面生成一微電弧電漿時,並不會有新氧化物生成。 而當反向脈衝電流作用時,驗金屬陽離子存在會使得鍍層 被純化,因此鑛層中並不希望存在容易融化的元素,而透 過反向脈衝電流作用將可避免此情形。而且反向脈衝電流 同時也改善鍍層的耐磨耗性。 本發明主要係將被處理物件完全浸泡於一裝有電解質 中的不銹鋼電解槽中,並與陽極連接,該電解質成分包含 驗金屬氫氧化物及驗金屬^夕酸鹽,以一脈衝直流電作為其 電力來源,而每經過三至十二次的順向脈衝電壓作用,將 伴隨一次反向脈衝電壓,可得到一較佳品質之鍍層。 有關本發明的較佳實施例與技術内容,茲配合圖示說 明如下: 【實施方式】 第1實施例 1. 首先取一鍛造鋁合金6 0 6 1作為被處理物件6。 2. 準備一電解槽4中,製備電解質5,其中電解質5中含有 10g/L 氫氧化納 1 5 g / L 矽酸鈉 3 .將被處理物件與陽極8 1相連,陰極8 2放置一不鏽鋼片 其操作 4.使用順向脈衝直流電作為電源8,反應1 0分鐘 參數如下: 順向脈衝時間1 : 1. 0 ms 順向脈衝間隔時間3 : 3. Oms1248480 Case No. 92128941 A_η Correction V. INSTRUCTIONS (4) When a micro-arc plasma is generated on the surface of the workpiece, no new oxide is formed. When the reverse pulse current is applied, the presence of the metal cation will cause the coating to be purified, so that it is undesirable to have an element that is easily melted in the ore layer, and this can be avoided by the reverse pulse current. Moreover, the reverse pulse current also improves the wear resistance of the coating. The invention mainly comprises completely immersing the object to be treated in a stainless steel electrolytic cell filled with an electrolyte and connecting with an anode, the electrolyte component comprising a metal hydroxide and a metal oxide, and a pulsed direct current as a The source of electricity, and each three to twelve times of forward pulse voltage will be accompanied by a reverse pulse voltage, a better quality coating can be obtained. The preferred embodiment and technical contents of the present invention are as follows: [Embodiment] First Embodiment 1. First, a forged aluminum alloy 6 0 6 1 is taken as the object to be processed 6. 2. Prepare an electrolytic cell 4 to prepare an electrolyte 5 in which the electrolyte 5 contains 10 g/L of sodium hydroxide 1 5 g / L sodium citrate 3. The object to be treated is connected to the anode 8 1 and the cathode 8 2 is placed in a stainless steel. Operation of the chip 4. Using forward pulse DC as the power supply 8, the parameters of the reaction for 10 minutes are as follows: Forward pulse time 1: 1. 0 ms Forward pulse interval time 3: 3. Oms

第10頁 1248480 __案號 92128941 五、發明說明(5) 電流密度:5A/dm2 年月曰 修正Page 10 1248480 __ Case No. 92128941 V. Description of invention (5) Current density: 5A/dm2 Yearly 曰 Correction

5 ·反應生成一平滑、緻密 '均質8 // m厚的抗蝕錢展 第2實施例 又运6 0。 1.首先取一壓鑄鋁合金ADC12作為被處理物件6。 2·準備一電解槽4中,製備電解質5,其中電解質5中含有 8g/L氫氧化鈉 1 8 g / L矽酸鈉 3·將被處理物件6與陽極81相連,陰極82放置一不鑛鋼片 7 〇 ' 4 ·使用順向/反向脈衝直流電作為電源8,反應丨5分鐘, 其操作參數如下: 順向脈衝時間1 ·· 1. 〇 m s 反向脈衝時間2 ·· 1. 〇 ms 順向/反向脈衝間隔時間3 1 : 4 · 〇ms 電流密度:5 A / d m 2 5 ·反應生成一平滑、緻密、均質8 // m厚的耐磨耗性較佳抗 钱鐘層6 0。 土几 弟3實施例 1·首先取一壓鑄鎂合金AZ91D作為被處理物件6。 2·準備一電解槽4中,製備電解質5,其中電解質5中含有 10g/L氫氧化鈉 20g/L矽酸鈉 3·將被處理物件6與陽極81相連,陰極82放置一不鏽鋼片5 · The reaction produces a smooth, dense 'homogeneous 8 // m thick resist money show. The second embodiment transports 60. 1. First, a die-cast aluminum alloy ADC 12 is taken as the object to be processed 6. 2. Preparing an electrolytic cell 4 to prepare an electrolyte 5 in which the electrolyte 5 contains 8 g/L of sodium hydroxide and 18 g / L of sodium citrate. 3. The object to be treated 6 is connected to the anode 81, and the cathode 82 is placed in a non-mine. Steel plate 7 〇' 4 · Use forward/reverse pulse DC as power supply 8 and react for 分钟5 minutes. The operating parameters are as follows: Forward pulse time 1 ·· 1. 〇ms Reverse pulse time 2 ·· 1. 〇 Ms Forward/reverse pulse interval time 3 1 : 4 · 〇ms Current density: 5 A / dm 2 5 · The reaction produces a smooth, dense, homogeneous 8 // m thick wear resistance and better resistance to the clock layer 6 0. Example 3 of the soil brother 3 1. First, a die-cast magnesium alloy AZ91D is taken as the object to be processed 6. 2. Preparing an electrolytic cell 4 to prepare an electrolyte 5 in which the electrolyte 5 contains 10 g/L of sodium hydroxide 20 g/L of sodium citrate. 3. The object to be treated 6 is connected to the anode 81, and the cathode 82 is placed with a stainless steel piece.

第11頁 1248480Page 11 1248480

,反應1 5分鐘,其操作 _案號92128941 年 月 五、發明說明(6) 4.使用順向脈衝直流電作為電源8 參數如下: 順向脈衝時間1 : 0. 5 ms 順向脈衝間隔時間2 : 2. Oms 電流密度:2. 5A/dm2 5·反應生成一平滑8 // m厚的含氧化鎂、氧化鋁及氧 抗姓鍍層6 0。 之 弟4貫施例 1·首先取一壓鑄鎂合金AZ9 1 D作為被處理物件6。 2·準備一電解槽4中,製備電解質5,其中電解質5中人 8g/L氫氧化納 ' " 2 5 g / L 矽酸鈉 3 ·將被處理物件6與陽極8 1相連,陰極8 2放置一不鐵鋼片 1 ° 4 ·使用順向/反向脈衝直流電作為電源8,反應丨5分鐘, 其操作參數如下: 順向脈衝時間1 : 〇. 5 ms 逆向脈衝時間2 : 0 . 5 m s 順向/逆向脈衝間隔時間3 1 : 2 . 5ms 電流密度:3. 0 A/dm2 5·反應生成一平滑、敏密1〇 厚的抗钱鍍層60。 第5實施例 !·首先取一鍛造鎂合金AZ31作為被處理物件6。 2·準備一電解槽4中,製備電解質5,其中電解質5中含有, reaction 1 5 minutes, its operation _ case number 92128941 month five, invention description (6) 4. using forward pulse DC as the power supply 8 parameters are as follows: forward pulse time 1: 0. 5 ms forward pulse interval time 2 : 2. Oms current density: 2. 5A / dm2 5 · The reaction produces a smooth 8 / 4 m thick containing magnesium oxide, aluminum oxide and oxygen anti-surname plating 60. Example 4: First, a die-cast magnesium alloy AZ9 1 D is taken as the object to be processed 6. 2. Preparing an electrolytic cell 4 to prepare an electrolyte 5 in which 8 g/L of sodium hydroxide in the electrolyte 5 is < 2 5 g / L sodium citrate 3 · The object to be treated 6 is connected to the anode 8 1 , and the cathode 8 2 Place a non-ferrous steel sheet 1 ° 4 · Use forward/reverse pulse DC as the power supply 8 and react for 分钟 5 minutes. The operating parameters are as follows: Forward pulse time 1: 〇. 5 ms Reverse pulse time 2 : 0 . 5 ms forward/reverse pulse interval time 3 1 : 2 . 5ms Current density: 3.0 A/dm2 5 · The reaction produces a smooth, dense 1 〇 thick anti-corrosion coating 60. Fifth Embodiment! First, a forged magnesium alloy AZ31 was taken as the object to be processed 6. 2. Preparing an electrolytic cell 4 to prepare an electrolyte 5 in which the electrolyte 5 contains

第12頁 1248480 案號 92128941 年 月 修正 五、發明說明(7) l〇g/L 氫氧化鈉 2 0 g / L矽酸鈉 3. 將被處理物件6與陽極81相連,陰極82放置一不鏽鋼片 Ί 〇 4. 使用順向脈衝直流電作為電源8,反應1 5分鐘,其操作 參數如下: 順向脈衝時間1 : 0 . 5 in s 順向脈衝間隔時間2 : 2 · 5 m s 電流密度:2.0 A/dm2 5. 反應生成一平滑、1 5 // m厚的抗#鍵層6 0。 綜上所述僅為本發明的較佳實施例而已,並非用來限 定本發明之實施範圍。即凡依本發明申請專利範圍之内容 所為的等效變化與修飾,皆應為本發明之技術範疇。Page 12 1248480 Case No. 92128941 Revised Month 5, invention description (7) l〇g / L sodium hydroxide 2 0 g / L sodium citrate 3. The object to be treated 6 is connected to the anode 81, the cathode 82 is placed a stainless steel Ί 〇 4. Use forward pulse DC as the power supply 8 and react for 15 minutes. The operating parameters are as follows: Forward pulse time 1: 0 . 5 in s Forward pulse interval time 2 : 2 · 5 ms Current density: 2.0 A/dm2 5. The reaction produces a smooth, 1 5 // m thick anti-key layer 60. The above is only the preferred embodiment of the present invention and is not intended to limit the scope of the present invention. That is, equivalent changes and modifications constituting the scope of the patent application of the present invention should be the technical scope of the present invention.

第13頁 1248480 案號92128941 年 月 曰 修正 圖式簡單說明 【圖式簡單說明】 第1圖,反應電流與時間關係圖 第2圖,本發明實施例之示意圖 弟3圖’该物品處理後之剖面圖 【圖式符號說明】 1 .......順向脈衝時間 2 .......反向脈衝時間 3 .......順向脈衝間隔時間 3 .......順向/逆向脈衝間隔時間 4 .......電解槽 5 .......電解質 6 .......被處理物件 6 0......鑛層 7 .......不錄鋼片 8 .......電源 81......陽極 8 2......陰極Page 13 1248480 Case No. 92128941 Yearly correction diagram simple description [Simple diagram of the diagram] Figure 1, reaction current and time diagram Figure 2, schematic diagram of the embodiment of the invention 3 diagram 'after the article is processed Section view [schematic description] 1 ....... forward pulse time 2 .... reverse pulse time 3 ... ... forward pulse interval time 3 .... ... forward/reverse pulse interval time 4 ... electrolytic cell 5 ... electrolyte 6 ... ... treated object 6 0 ... mineral layer 7 .......Do not record steel sheets 8 .......Power supply 81...Anode 8 2...Cathode

第14頁Page 14

Claims (1)

1248480 案號92128941 年月日 修正 六、申請專利範圍 1 . 一種輕金屬合金抗钱鍍層表面處理法,其特徵係以一 微電漿電弧使輕金屬表面生成一抗#性鍍層,其步驟包 括:(1)取一待處理之輕金屬合金;(2)將該待處理輕金屬 合金放入含有5-25 g/L之驗金屬氫氧化物及15-50 g/L之 鹼金屬矽酸鹽之電解液中;(3)將該待處理輕金屬合金與 陽極相連;(4)於陰極放置一不銹鋼片;(5)通以電流密度 1 - 1 0 A / d m 2之脈衝直流電’該脈衝時間與脈衝間隔時間比 例為1 : 3至1 : 1 0,脈衝時間為0 . 1至3 . 0 m s,脈衝間隔時間 為0 . 3至3 0 m s,其總反應時間為3 - 6 0分鐘。 2. 如申請專利範圍第1項所述之輕金屬合金抗I虫鍍層表面 處理法,其中該輕金屬合金係為铭或鎮合金。 3. 如申請專利範圍第1項所述之輕金屬合金抗蝕鍍層表面 處理法,其中該輕金屬合金係為一種高石夕含量的銘合金。 4. 如申請專利範圍第1項所述之輕金屬合金抗I虫鍍層表面 處理法,其中該脈衝直流電係為順向或逆向脈衝直流電。 5. 如申請專利範圍第4項所述之輕金屬合金抗蝕鍍層表面 處理法,其中每3至1 2次順向脈衝直流電作用後,伴隨一 反向脈衝直流電作用。 6. 如申請專利範圍第1項所述之輕金屬合金抗I虫鍍層表面 處理法,其中該鹼金屬氫氧化物係為氫氧化鈉化氫氧化 鉀。 7. 如申請專利範圍第4項所述之輕金屬合金抗餘鍍層表面 處理法,其中該鹼金屬矽酸鹽係為矽酸鈉。1248480 Case No. 92128941 Revised on the sixth day of the month. Patent application scope 1. A light metal alloy anti-money plating surface treatment method characterized in that a micro-plasma arc is used to generate a primary coating on a light metal surface, the steps of which include: Taking a light metal alloy to be treated; (2) placing the light metal alloy to be treated into an electrolyte containing 5-25 g/L of metal hydroxide and 15-50 g/L of alkali metal silicate (3) connecting the light metal alloy to be treated to the anode; (4) placing a stainless steel piece on the cathode; (5) passing a pulsed direct current with a current density of 1 - 1 0 A / dm 2 'the pulse time and the pulse interval time The ratio is 1: 3 to 1: 1 0, the pulse time is 0. 1 to 3. 0 ms, the pulse interval is 0.3 to 30 ms, and the total reaction time is 3 - 60 minutes. 2. The surface treatment method of the light metal alloy anti-Im coating according to the first aspect of the patent application, wherein the light metal alloy is a Ming or a town alloy. 3. The surface treatment method of the light metal alloy resist coating according to claim 1, wherein the light metal alloy is an alloy of high stone content. 4. The light metal alloy anti-I pest coating surface treatment method according to claim 1, wherein the pulsed direct current is a forward or reverse pulse direct current. 5. The surface treatment method of a light metal alloy resist coating as described in claim 4, wherein after every 3 to 12 times of forward pulse direct current, a reverse pulse direct current action is applied. 6. The light metal alloy anti-I pest coating surface treatment method according to claim 1, wherein the alkali metal hydroxide is sodium hydroxide hydrated potassium hydroxide. 7. The method of surface treatment of a light metal alloy anti-residue layer according to claim 4, wherein the alkali metal silicate is sodium citrate. 第15頁Page 15
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