508263 A7 __ _B7____ 五、發明説明（Ο 〔發明所屬之技術領域〕 (請先閲讀背面之注意事項再填寫本頁) 本發明係有關要使用於在製造半導體，液晶等之電子 電路元件中，尤其在於淸洗、鈾刻過程時所生成之排氣的 處理裝置之排氣處理塔及使用於該處理塔的電熱器。 〔習知技術〕 於半導體製造過程中，有關如CVD (化學汽相澱積 )之半導體製造設備之操作，一般係以如下來進行。由如 S i H4 (對人體有毒，具有爆炸性之危險氣體）之澱積氣 體來澱積由氮氣來淸除在CVD室之所殘留之S i H4 氣體由如C2F6 (雖具有室溫效果，但無害）之淸洗 氣體來淸洗C V D室內由氮氣來淸除C V D室之淸洗 氣體以下重覆地實施以上之淸洗。 經濟部智慧財產局員工消費合作社印製 如前述，所使用於淸洗CVD室之氣體群中具有 P F C。其爲全氟化碳（Perfluorocarbon)之簡稱，而 CF4、CHFs、前述之C2F6爲其代表性之化合物。當 替代碳來使用化合物（Compound)時，會更加上以如NF 3 、S F6、S F4之不含C之含氟化合物爲對象者。 代表CF4、C2F6之PFC爲不燃性，又氣體本身 對人體之毒性並未明瞭，但至少具有急性、亞急性之毒性 爲周知。然而，化合物本身爲穩定者，因而放出於大氣中 時，會長期性地不產生變化而會滯留。有關在大氣中之消 耗壽命乃被指爲CF4爲50，000年，C2F6爲 10，0 0 0年，又地球溫暖化係數（以C〇2爲1之比較 -4- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 508263 A7 _B7_ 五、發明説明（2) (請先閲讀背面之注意事項再填寫本頁) 値），在 CF4 爲 4，400，C2F6 爲 6，200 (經 過20年時），因此，具有在地球環境上不能忽略之問題 ，而期盼能確立可去除代表C F4、C2F6之P E C的害 處。 然而，前者PFC，亦即以CF4、CHFs、C2Fe 爲代表之化合物乃由於C - F結合極穩定（結合能量爲 130Kcal/mol之極大者），要分解並不容易， 使僅以單純之加熱氧化分解來去除（有害）極爲困難。 例如以單純之加熱氧化分解時，於C 2 F 6時能以切斷 C - C鍵結來進行分解，就在處理溫度1 〇 〇 〇 °C，限制 處理風量2 5 0公升/m i η以下時，雖可予以去除，但 有關CF4因需要切斷結合能爲大之C-F，使得在上述風 量上，需要1400〜1500 °C。 圖1 5係習知之含有全氟化碳或全氟化化合物之半導 體排氣處理裝置（100)，由具有排氣分解反應室（ 1 0 7 )之排氣分解反應塔（1 0 1 )、前部擦洗器（ 經濟部智慧財產局員工消費合作社印製 1 0 9 )、後部擦洗器（1 1 0 )及排氣扇（1 1 1 )所 構成。該裝置（1 0 0)因使用於淸潔室，而安排成小型 。雖對於本裝置（1 〇 〇 )之氣體（排氣）分解反應乃使 用著電熱器（102)，但對於如前述之要熱分解半導體 排氣（F)，仍需要1400〜1500 °C之高溫。 當電熱器（102)以所謂1400〜1500 °C之 高溫來使用時，因該溫度以電熱器（1 0 2 )之發熱體材 料之物理性的性質言已接近於界限且有可能令供電部（ -5- 本纸張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 508263 A7 __^_ B7_ 五、發明説明（3) 1 0 5 )及周圍之絕緣構件（1 〇 6 )產生破壞絕緣之溫 度，因此，要在高溫下之長時間使用乃可謂幾乎不可能。 (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 依據圖15所示之習知裝置（1〇〇)，乃從排氣分 解反應室（107)頂部（1〇4)垂下電熱器（102 )來使用。熱（量）係朝排氣分解反應室（1 〇 7 )頂部 (1 04)上’而使收容有電熱器（1 〇 2)之供電部（ 1 0 5)的頂部（1 04)部分會成爲最高溫度。其結果 ，要求絕緣性之電熱器（1 〇 2 )的供電部（1 0 5 )爲 當然，甚至圍繞其之絕緣構件（1 〇 6 )的絕緣性會形成 大幅度地降低，而會在供電部（1 〇 5 )產生短路。又從 排氣分解反應室（1 0 7 )頂部（1 0 4 )垂下來配設電 熱器（1 0 2)且以高溫下持續使用之電熱器（1 〇2) 會由例如潛變之現象而逐漸伸長，其結果也具有所謂發生 斷線之問題。又如前述，本裝置（1 0 0 )本身因安排成 小型，使得排氣分解反應室（1 0 7 )之容積，也並非形 成很大。另一*方面’電熱器（1 0 2)爲一*種規格品，以 致可適合於使用在排氣分解反應室（1 0 7 )者可謂幾乎 不存在，使得電熱器（1 0 2 )本身之形狀成爲要設計本 裝置（1 0 0 )之瓶頸。換言之，製造裝置之廠家一側能 容易地來製造配合於裝置之電熱器（1 0 2)乙事成爲製 造裝置之廠家所要求之乙事。 除了上述之外，也有如下之問題。亦即，當從排氣分 解反應室（107)頂部（104)垂下加熱器（102 )來使用時，會成爲最高溫之電熱器（10 2 )之前端部 -6- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 508263 A7 B7 五、發明説明（4) (請先閲讀背面之注意事項再填寫本頁) 分乃在於最下部，而該熱會如前述朝頂部方向上升，並在 頂部（1 0 4 )附近形成高溫環境◊另一方面，排氣（F )將從排氣分解反應室（1 〇 7 )底部來導入於內部。該 排氣（F )因在前一過程以前部擦洗器（1 〇 9 )洗淨而 成爲含有水分之低溫氣體。 由於該低溫排氣（F )會在排氣分解反應室（1 〇 7 )，首先會接觸於已達到最高溫之電熱器（102)的前 端部分且維持該狀態來上升通過，因此，倘若要在該部分 進行熱分解時，有需要令低溫排氣（F )在轉眼間予以上 升至分解溫度，因而，電熱器（1 〇 2 )之前端部分的溫 度，倘若未成爲所需要以上之高溫時，就無法產生所定之 分解反應，甚至要在頂部（1 〇 4 )附近之高溫環境進行 熱分解之時，亦即，做成頂部（1 〇 4 )附近之高溫環境 成爲1400〜1500 °C時，也需要令電熱器（102 )前端部分之溫度成爲較其更高，以致會賦予電熱器（ 102)有過大之負擔。 經濟部智慧財產局員工消費合作社印製 如上述，若要熱分解低溫排氣（F )時，就必需施加 所需要以上之負荷於電熱器（102)，因而，具有可顯 著地縮短電熱器（1 0 2 )之壽命，並且可增大熱能成本 之問題。 其他，在於半導體排氣處理裝置，具有會堆積含於半 導體排氣且在熱分解半導體排氣時所產生之大量粉塵於裝 置之問題。該等粉塵會堆積於裝置內之所有之地方，且可 遂漸地塡塞裝置內空間。由粉塵之體積而裝置內之內部空 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 508263 經濟部智慧財產局員工消費合作社印製 A7 B7_五、發明説明（5) 間成爲狹隘化，有可能對於半導體排氣之熱分解不僅會波 及重大之不良影響，退一步言也有可能關連於事故之產生 〇 又由於在淸潔室內有需要頻繁地進行裝置之維護，因 此，有關維護裝置能成爲容易乙事也非常之重要。尤其電 熱器會在高負荷下來使用而使惡化（劣化）成爲顯著，以 致需要頻繁地進行更換。再者，淸潔室之頂部一般爲低， 倘若考慮到要取出電熱器之乙事時，裝置之高度也會受到 限制。 〔發明擬解決之課題〕 第1乃要求著，在以高溫下要進行半導體排氣之熱分 解反應時，可確保排氣分解處理室所使用之電熱器的供電 部絕緣性且可盡量減輕電熱器通電性之負荷，而且可令熱 損耗成最小限度之排氣處理裝置的排氣處理塔，以及能在 如此之嚴酷條件下使用且使用上容易之電熱器。 第2乃要求著，具備在長期使用時並不會堆積粉塵於 裝置內的裝置構造，第3要求著，具備優異於維護性之裝 置構造者。 〔解決課題用之手段〕 記載於申請專利範圍第1項（以下簡稱爲申請項1， 下同）之電熱器（7)，係尤其適合於使用在如排氣分解 處理室（1 a )之具有高溫，腐蝕性或/及爆炸性環境內 本&張尺度適财關家辟（CNS ) A4規格（210X297公釐) ~ (請先閲讀背面之注意事項再填寫本頁) 508263 A7 B7 五、發明説明（6) 者，其乃由「由：配設有供電（饋電）部（8a) 、（8 b) 於兩端’且配設發熱部（7a)於供電部（8a)( (請先閲讀背面之注意事項再填寫本頁) 8b)間之複數電熱器單體（71) (72).........，及 架設於相鄰之供電部（8 a ) (8b).........間，以與供 電部（8a) (8b)同一材料所形成之架設通電體所構 成，其特徵爲： 以塡隙嵌合穿設於架設通電體（8 c )之嵌合孔（ 8 d ) ( 8 d )和電熱器單體（7 1 ) (72).........之 供電部（8 a ) (8a)， 並以與供電部（8 a) (8b)同一材料所形成之無 機黏著材（劑）（8 e )塡充嵌合孔（8 d ) ( 8 d )… ……和供電部（8 a ) ( 8 a )間的間隙來黏著」。 依樣如此之結構時，因可利用穿設於架設通電體（8 c) 之嵌合孔（8d) ( 8 d ).........來連接複數之電熱 器單體（71) (72).........，因而可配合於排氣分解 經濟部智慧財產局員工消費合作社印製 處理室（1 a )之任意尺寸來實施加工，使得使用極方便 。又以與供電部（8 a ) ( 8 a )同一材料所形成之無機 黏著材（劑）來塡充電熱嵌合孔（8d) (8d)和供電 部（8 a ) ( 8 a )間的間隙來黏著，因而，即使予以塡 隙嵌合，兩者間之間隙能由無機黏著劑（8 e )來完整地 埋設’使得並不會在通電上形成障礙（不便），再者，本 電熱器（7 )之用途，並不限定於具有腐鈾性或/及爆炸 性之半導體排氣（F )用而已，適合於使用於需要 1 4 0 0 °C左右之高溫部分。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） -9 - 508263 A7 __ ___ B7 五、發明説明（7) 申請項2係排氣處理裝置（A )之排氣處理塔（1 ) 的〜例（參照圖1 )，其特徵爲由： (a )排氣處理塔本體（3 )，形成有排氣分解處理 室（1 a )於內部； (b) 本體底部（4)，安裝於排氣處理塔本體（3 )之底部； (c) 供氣管（6)，插穿於本體底部且豎立於排氣 處理塔本體（3 )內，而從其前端放出排氣（F )於排氣 分解處理室（la)內；及 (d) 電熱器（7)，配設其供電部（8b)於本體 底部（4)內且從本體底部（4)豎立配設， 所構成。 依據上述之半導體排氣處理裝置（A)，配設於排氣 分解處理室（1 a )內之電熱器（7)的供電部（8b) 乃配設於安裝在溫度爲最低之排氣處理塔本體（3 )之底 部的本體底部（4 )，因此，排氣處理塔本體（3 )內之 上部（二頂部）即使成爲高溫，本體底部（4 )也能保持 成較爲低溫，而且要通過低溫排氣（F )之供氣管（6 ) 因插穿於本體底部（4 )，致使本體底部（4 )可由.流通 供氣管（6 )之排氣（F )奪取熱而降低溫度，使得對於 供電部（8 b )或圍繞其之絕緣構件之絕緣性並不會產生 傷害。相反地可預熱排氣，使得可促進由電熱器（7 )所 進行之熱分解。 除此之外，因如前述，電熱器（7 )乃從本體底部（ I! — id. (請先閲讀背面之注意事項再填寫本頁) -裝· 訂 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS ) A4規格（21〇Χ297公釐） •10- 508263 A7 ___ _B7 _ 五、發明説明（8) (請先閲讀背面之注意事項再填寫本頁) 4 )豎起，而使成爲最高溫之電熱器（7 )前端部分位於 最上部之位置，致使所導入之排氣（F )可從低溫部朝高 溫部逐漸上升溫度下被預熱來上升於供氣管（6 )內，而 與低溫排氣（F )突然接觸於電熱器（7 )之高溫部之習 知例有所不同，並不需要過度地提高電熱器（7 )之負荷 。可大幅度地延長電熱器（7 )之壽命。 申請項3係更進一步限定申請項2所記載之排氣處理 裝置（A)的排氣處理塔（1)者（參照圖9、10)， 其特徵爲：「配設有沿著排氣分解處理室（1 a )頂部部 分（1 b )開口且從開口（ 2 1 )以間歇性地噴出惰氣（ I )用之粉塵去除機構（2 a )於前述排氣處理塔（1 ) 之頂部部分（1 b )」。又申請項4係更進一步限定申請 項2所記載之排氣處理裝置（A )之排氣處理塔（1 )者 ，其特徵爲：「配設有其開口（ 2 口）係開口於供氣管（ 6 )下端部且從其開口（ 2 口）以間歇性地噴出惰氣（I )用之粉塵去除機構（2 b )於前述排氣處理塔（1 )之 本體底部4」。 經濟部智慧財產局員工消費合作社印製 半導體排氣（F)內之粉塵（G)或伴隨著半導體排 氣（F )之熱分解所生成之粉塵（G )乃非常微細且如綿 之塵埃會堆積於裝置（A)內的任何地方。而如前述，該 所堆積之粉塵（G )會使裝置（K )內之空間部分成爲狹 隘化，使得逐漸損害裝置之功能。尤其，在排氣分解處理 室（1 a )形成堆積爲一種重大問題。爲此，從粉塵去除 機構（2 a ) ( 2 b )成間歇性地噴出惰氣（I )給予豎 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） ~ ' 508263 A7 ____B7 五、發明説明（9) (請先閲讀背面之注意事項再填寫本頁) 立配設於排氣分解處理室（1 a )內，尤其給予豎立配設 於容易堆積粉塵（G)之頂部部分（1 b )或本體底部（ 4)之供氣管（6)下端部來吹走前述堆積粉麈（g)並 予以去除它，以排除排氣分解處理室（1 a )內之粉塵堆 積時，就形成可大幅度地擴大（展延）本裝置（A)的要 維護期間。 再者，做爲要間歇性地噴出惰氣（I )之理由，乃可 由吹出惰氣時之高壓而能有效果地吹走粉塵及節減惰氣（ I )之使用量之緣故。 申請項5係更進一步來改良排氣處理裝置（A)之排 氣處理塔者，其特徵爲：「於申請項2所記載之排氣處理 裝置（A)之排氣處理塔（1 )中，在排氣處理塔（1 ) 兩側面形成突出配設有以軸支承於配設在收容排氣處理塔 (1 )用之外殼（2 7 )的軸承（2 9 )成可轉動的支承 軸（2 8 )」。 經濟部智慧財產局員工消費合作社印製 依據如此之結構時，排氣處理塔（1 )因框著於外殼 (2 7 )成可轉動，因而當要更換或維修例如安裝有電熱 器（7 )之內部構造物（4 5 )時，就躺下支承成垂直於 外殼（2 7 )內之排氣處理塔（1 )成水平或傾斜狀而拉 出排氣處理塔（1 )底部或頂部於外殼（2 7 )外且予以 固定，致使排氣處理塔（1 )成水平或傾斜狀態下來從排 氣處理塔（1 )之外殻（2 7 )的拉出側裝卸內部構造物 (45)(參照圖1 2 )，就可容易地插入卸下收容於排 氣分解處理室（1 a )內之內部構造物，使得可一舉解決 -12 - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 508263 經濟部智慧財產局員工消費合作社印製 A7 B7五、發明説明（1() 如習知例之要在高處進行作業，或淸潔室之頂部太低之問 題，或由於外殼（2 7)之配管（布管）或收容機構極複 雜而使要從排氣處理塔本體（3 )底部進行插入拔出內部 構造物（4 5 )極困難等等之習知所具有之問題。 申請項6係排氣處理裝置（A )之排氣處理塔（1 ) 之其他例（參照圖2)，其特徵爲由： (a)排氣處理塔本體（3)，形成排氣分解處理室 (1 a )於內部，且形成有冷卻部（1 2 )於排氣分解處 理室（1 a )底部； (b )本體底部，安裝於排氣處理塔本體（3 )底部 ，由冷卻部（1 2 )來冷卻； (c) 供氣管（6)，插穿於本體底部（4)且豎立 配設於排氣處理塔（3 )內，而從其前端放出排氣（F ) 於排氣分解處理室（1 a )內；及 (d) 電熱器（7)，配設有供電部（8b)於本體 底部（4)內且從本體底部豎立配設者， 所構成。 如此之狀態時，除了具有申請項2所敘述之作用，又 加上由冷卻部（1 2 )而使本體底部（4 )更具有冷卻效 果，使得具有效果性地防止供電部（8 b )及其周圍部分 產生絕緣破壞。再者，前述冷卻部（1 2 )亦可爲如配設 於本體底部（4 )內或外部之冷媒流通管（未圖示），也 可如形成於排氣處理塔本體（3 )底部外周圍之間接冷卻 護套（未圖示）者，也可如以下所要說明之直接冷卻護套 (請先閲讀背面之注意事項再填寫本頁) •裝· 訂 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -13- 508263 A7 B7 五、發明説明（11) #。再者，所使用之冷卻流體（2 0 )係水或各種冷媒液 〇 (請先閲讀背面之注意事項再填寫本頁) 申請項7係冷卻部（1 2 )之具體性結構例，冷卻部 (1 2 )之特徵係由： (a )冷卻壁（1 3 )，構成排氣分解處理室（1 a )底部側面，展延直至本體底部（4 )爲止； (b )冷卻流體回流部（1 4 )，以圍繞排氣處理塔 本體（3 )之狀態來形成排氣處理塔本體（3 )外周圍部 分； (c )噴出管（1 7 )，配設於冷卻流體回流部（ 1 4 )內，噴出冷卻流體（2 0 )於排氣處理塔本體（3 )之四周方向；及 (d )縫隙（1 8 )，沿著冷卻壁（1 3 )內周面形 成於冷卻流體回流部（1 4 )之冷卻流體噴出用， 所構成。 申請項8係冷卻部（1 2 )之其他具體性結構例， 冷卻部（1 2 )之特徵係由： 經濟部智慧財產局員工消費合作社印製 (a)冷卻壁（13)，構成排氣分解處理室（la )底部側面，展延直至本體底部（4 )爲止；及 (b )噴出管（1 7 )，沿著冷卻壁（1 3 )配設， 而沿著冷卻壁（1 3 )四周方向噴出冷卻流體（2 0 )， 所構成。 直接冷卻護套式之冷卻部（1 2 )係與間接水冷護套 或冷媒流通管有所不同，從沿著冷卻部（1 2 )內周面所 -14- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 508263 A7 B7 五、發明説明（ 形成之縫隙（1 8 )所噴出之冷卻流體（2 0 )乃沿著冷 卻壁（1 3 )內周面直接露出且不產生飛濺下成螺旋狀來 形成冷卻層（2 2 )(參照圖6 )而流下，因而，可增進 冷卻效果，使得對於供電部（8 b )之絕緣性保護可發揮 極大之力量。 申請項9係有關改良申請項6所記載之排氣處理裝置 (A )之排氣處理塔（1 )的冷卻部（1 2 )者，其特徵 爲：「從構成排氣分解處理室（1 a )之貼內部構件（ 3b)下端下垂配設要覆蓋冷卻壁（1 3)上部內周圍用 的遮蔽壁（1 9 )於冷卻壁內側」。 以如此地下垂配設遮蔽壁（1 9 )時，即使成螺旋狀 流下冷卻壁（1 3 )內周斜面之冷卻流體（2 0 )被加熱 而蒸發，其蒸氣也可由遮蔽壁（1 9 )予以遮蔽，使得難 以流入於排氣分解處理室（1 a )，因而，並不會產生由 冷卻流體（2 0 )之蒸氣來阻礙熱分解反應之情事。再者 ，排氣分解處理室（1 a )內之氣體因由配設於底部之排 氣部而從排氣分解處理室（1 a )排出，因而，排氣分解 處理室（1 a )內經常形成朝下流動，爲此，冷卻部（ 1 2 )之冷卻流體（2 0 )之蒸氣極少具有會上升而進入 於排氣分解處理室（1 a )內之危險性，但由於有遮蔽壁 (1 9 )之存在時，可更進一步地消除如此之危險性。 申請項1 0係更予以限定申請項6所記載之排氣處理 裝置（A)之排氣處理塔（1)者（參照圖9、10)， 其特徵爲：「配設有粉塵去除機構（2 a )成沿著排氣分 (請先閲讀背面之注意事項再填寫本頁) 裝. 訂 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS ) A4規格（210X29*7公釐） -15- 508263 A7 ______B7 五、發明説明（ 解處理室（1 a )頂部部分（1 b )開口且從開口（ 2 < (請先閲讀背面之注意事項再填寫本頁) )成間歇性地噴出惰氣（I )於前述排氣處理塔（1 )之 頂部部分」。又申請項1 1係更予以限定申請項6所記載 之排氣處理裝置（A)之排氣處理塔（1 )者，其特徵爲 :「配設有其開口（ 2 口）成開口於供氣管（6 )下端部 且從該開口（ 2 口）或間歇性地噴出惰性氣體（I )的粉 塵去除機構（2 b )於前述排氣處理塔1之本體底部（4 )j 〇 由而可獲得與前述同樣作用〔可排除排氣分解處理室 (1 a )內之粉塵堆積，而可大幅度地擴大（延長）維護 期間〕。 申請項1 2係更進一步改良排氣處理裝置（A )之排 氣處理塔（1 )者，其特徵爲：「於申請項6所記載之排 氣處理裝置（A )之排氣處理塔（1 )中，以軸支承於配 設在要收容排氣處理塔（1 )之外殼（2 7 )的軸承2 9 成可轉動的支承軸（2 8 )配設成突出於排氣處理塔（1 )兩側面」。 經濟部智慧財產局員工消費合作社印製 由而可獲得與前述同樣之作用〔將排氣處理塔（1 ) 做成水平或傾斜狀態，就可簡單地從排氣處理塔（丨）之 由外殼（2 7 )拉出側裝卸內部構造物（4 5 )，而且亦 可抑制裝置之高度〕。 〔發明之實施形態〕 以下’將使用圖1所示之實施例來說明。本發明之排 -16 - 本紙張尺度適用中顚家標準（CNS) M規格（21G><297公董） 508263 A7 B7 五、發明説明（Ο 氣分解處理裝置（A)，雖在圖中爲了容易理解而記載各 單元成支離破碎（分解狀）’但在實際上乃由要執行（a )P F C之熱分解，（b )所產生之氧化化合物的淸洗排 氣或去除固定化，（c)燃燒去除其他可燃性成分的3個 重要要素之各種結構單元，例如前部擦洗器（3 0 )、排 氣處理塔（1 )、後部擦洗器（4 0 )、配管系、配線系 、測量儀器類、排氣扇（5 0 )及水槽（6 0 )所構成， 且該等各個以配管或配線來連接，並收容該等於1個小型 之外殼（箱）（2 7)成一體。外殼（27)之大小爲高 約2公尺，橫向寬及深度約1公尺之長方形體，而由要構 成外殻（27)之骨架的架台（120)，及配設於其外 側之嵌板（5 b )所構成，剖面U字形之軸承（2 9 )突 出配設於架台（1 2 0 )之內側面。 於圖1中，前部擦洗器（3 0 )係以工場之半導體裝 置（未圖示）和排氣管道來連結，並導入在半導體製造過 程所使用之剩餘氣體及在半導體製造過程所使用，經過各 種化學反應所集合之排氣的半導體製造排氣或淸除氣體等 之各種排氣（F)於該處。 前部擦洗器（3 0 )係豎立配設於水槽（6 0 )上或 者與水槽（60)另外配設，兩者（30) (60a)乃 以配管連接，形成排水可送進於水槽（6 0 )。說明前部 擦洗器（3 0 )之槪略構造時，係以連接前述排氣管道（ 31)於頂部之直管型擦洗器本體（30 a)，及設置於 前述擦洗器本體（3 0 a )內部之頂部近旁，使鹼液，酸 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐) ~ (請先閲讀背面之注意事項再填寫本頁) -裝· 訂 經濟部智慧財產局員工消費合作社印製 508263 A7 _^____B7___ 五、發明説明（作 性液或水等之藥液成噴霧狀噴灑之噴嘴（3 2 )所構成， 而形成所噴灑之前述藥液可被水槽（6 0 )收容。 (請先閲讀背面之注意事項再填寫本頁) 噴（霧）嘴（3 2 )和水槽（6 0 )間乃配設有循環 水用之泵（33)，而形成可輸送水槽（60)內之儲存 水至噴嘴（32)。又前述循環水用泵（33)係使用自 來水來供應，以補給從水槽（6 0 )所溢出之水量份量。 再者，水槽（6 0 )因圖面之關係而排氣供應側（6 0 a )和反應排氣排出側（6 0 b )形分割狀，但在底部形成 連繫著。 經濟部智慧財產局員工消費合作社印製 排氣處理塔（1 )係豎立配設於水槽（6 0)或機台 (1 1 )上，或設置成與水槽（6 0 )分開，並懸吊從排 氣處理塔本體（3)之上部側面突出配設之樞著軸（28 )於從外殼（2 7 )突出配設之軸承（2 9 )成可轉動， 形成可保持成垂直狀態及從外殼（2 7 )拉出排氣處理塔 本體（3 )下端部來保持成水平狀態。在於懸吊保持排氣 處理塔本體（3 )於外殻下來保持持成水平狀態時，就能 成爲如下所說明之容易進行裝卸安裝於排氣處理塔本體（ 3)底部之本體底部（4)。 說明有關排氣處理塔（1 )之構造時，排氣處理塔本 體（3)係由不銹鋼製之圓筒狀之外壁護套（3a)，及 以耐火材所構成之貼內部構件（3 b )所構成，排氣分解 處理室（1 a )則形成於貼內部構件（3 b )之內部。貼 內部構件（3b)乃覆蓋外壁護套（3 a )之整個內周面 ，以令貼內部構件（3 b )可直接接觸於排氣（F )。排 -18- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 508263 A7 ___ B7__ 五、發明説明（ (請先閲讀背面之注意事項再填寫本頁) 氣處理塔本體（3 )底部組裝安裝有絕緣構件（9 )之本 體底部（4 )成一體。圖1之狀況時，係以如錨栓（anchor bolt)之接合件（1 〇 )來設置兩者（3 ) ( 4 )於機台（ 1 1 )成可裝卸，而在圖2之狀況時，則以如螺栓、螺帽 之接合件（10a)來扣緊兩者（3) (4)成可裝卸。 在外壁護套（3 a )兩側面上部，突出配設有剖面爲圓形 之支承軸28，並支承於配設在要構成外殼（27)之架 台（1 2 0 )之軸承（2 9 )成可轉動自如。 於絕緣構件（9 )中心，豎立配設有以優異於耐熱性 、腐蝕性之金屬管所構成之供氣管（6 )。供氣管係（6 )如前述配設成貫穿本體底部（4 )之絕緣構件（9 )之 中央，而前述電熱器（7)之供電部（8b)則配設成圍 繞著供氣管（6 )之狀態於絕緣構件（9 )內。供氣菅（ 6)之高度乃形成與前述電熱器（7)大致相等或較高。 經濟部智慧財產局員工消費合作社印製 (2 3 )係構成本體底部（4 )之一部分的筒部，具有塡 充、硬化之無機耐熱材於內部的絕緣構件（9 )。而由前 述電熱器（7 )、供氣管（6 )及塡充有絕緣構件（9 ) 之本體底部（4)來構成排氣處理塔（1 )之內部構造物 (4 5 )。插入於排氣分解處理室（1 a )之前述供氣管 (6 )乃連接有連接前部擦洗器（3 0 )之水槽（6 0 ) 之排氣供應側（6 0 a )的頂部部分或連接著從前部擦洗 器（3 0 )下端所導出之洗淨氣體輸送配管（3 4 )。排 氣處理塔本體（3 )下部開口配設有氣體配出部（5 )， 並藉分解氣體輸送配管（3 5 )來連接於其次之後部擦洗 本紙張尺度適用中國國家標準（CNS ) A4規格（210Χ297公釐） ~ 508263 A7 ______^B7___ 五、發明説明（1》 器（4 0 )。 電熱器（7)係由2或3支之電熱器單體（7 1)( (請先閲讀背面之注意事項再填寫本頁) 72).........，和連接電熱器單體（71) (72)…… …之一端的架設通電體所構成者，電熱器單體（71)( 7 2 ).........主體爲碳化矽之中實或中空的棒狀體，配設 有供電部（8a) (8b)於兩端，而配設有發熱部（ 7 a )於供電部（8 a ) ( 8 b )間。以與供電部（8 a )(8b)同一材料所形成之架設通電體（8c)，貫穿 配設有要與供電部（8 a ) ( 8 b )以塡隙嵌合之嵌合孔 (8d) (8d)成所要連接之數量（2或3)。而以塡 隙嵌合來插入於前述嵌合孔（8d) (8d)之電熱器單 體（7 1) (7 2).........供電部（8 a) (8 a)...... …和嵌合孔（8 d ) ( 8 d )之間隙，塡充黏著有以與供 電部（8 a ) ( 8 b )同一材料所形成之無機黏著劑（ 8e)。圖7係以架設通電體（8c)來連接2支之電熱 器單體（71) (72)的門型電熱器（7) 。（8f) 係連接於另一方供電部（8 b ) ( 8 b ).........之連接配 經濟部智慧財產局員工消費合作社印製 件。 後部擦洗器（4 0 )爲一般性之形狀，雖不需要詳述 ，但簡單地說明時，在後部擦洗器（4 0 )內部配設有洗 淨層（41)及配設於正上方之噴（霧）嘴（42)，並 形成豎立配設於水槽（6 0)上或與水槽（6 0)之反應 排氣排出側（60b)另設而兩者（40) (6〇b)以 配管連接並可令其排水送入於水槽6 0。至於後部擦洗器 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -20- 508263 A7 B7 五、發明説明（1参 (4 0 )的出口乃連接於用以待命放出己處理好之氣體（ F )的排氣扇（5 0 )。 接著，說明有關圖1之實施例（A)之作用。從半導 體製造裝置所放出之排氣（F )乃將導入於前部擦洗器（ 3 0)內來接觸於從噴嘴（3 2)所噴灑之霧狀藥液（鹼 液，酸性液或水），致使排氣（F )中之粉塵接觸於所噴 灑之微細液滴而被捕捉，並送入於水槽（6 0 )。與此同 時，排氣（F )中之水溶性成分也被吸收於藥液中而被去 在前述擦洗器（3 0 )所洗淨（淸洗）之低溫潤濕排 氣（F)，將藉洗淨氣體輸送配管（34)送入於供氣管 (6 )。排氣（F )乃首先接觸於絕緣構件（9 )而冷卻 它，接著上升供氣管（6)，而在上升中由周圍溫度所加 熱，並在充分予以预熱時會從供氣管（6 )前端放出於排 氣分解處理室（la)內。 由於配置有加熱電熱器（7 )成最高溫之前端部分於 供氣管（6 )周圍，予以充分預熱後從供氣管（6 )前端 於出於排氣處理塔本體（3 )內之排氣（F )，將接解於 前述電熱器（7 )前端部分且接觸於保持十分高溫之頂部 附近之高溫環境，使得可立即予以熱分解。 更詳述有關在熱分解時之電熱器（7 )時，電熱器（ 7 )乃豎立配設於配設在排氣處理塔本體（3 )底部之絕 緣構件（9 )，而形成最高溫之前端部分位於最高位置， 因此，接觸於高溫之前端部分的環境氣體會滯留於排氣處 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閱讀背面之注意事項再填寫本頁) •裝· 訂 經濟部智慧財產局員工消費合作社印製 -21 - 508263 A7 ___B7_ 五、發明説明（1令 理塔本體（3 )內之頂部附近，使得該部分之環境溫度可 保持成最高溫度。另一方面，供電部（8b) (8b)因 (請先閲讀背面之注意事項再填寫本頁) 埋設於不會滯留熱之位於排氣處理塔本體（3 )底部位置 的絕緣構件（9 )內，因而可抑制溫度上升。其結果，可 保持絕緣構件（9 )之絕緣性能，以致可確實地防止在操 作中由電熱器（7 )所引起之破壞絕緣而產生短路事故。 再者，於本排氣熱分解處理反應，在排氣分解處理室 (la)，除了在半導體製造裝置之半導體製程添加氧氣 (或空氣），又其未消化而殘留有在爆炸之下界限以下之 微量氧氣以外，並不積極地添加氧氣之未存在有遊離氧氣 之狀態來進行熱分解，相反地預先添加氮等之惰氣於所導 入之排氣，以令爆炸性排氣濃度成爲爆炸之下界限以下， 並添加氧氣（或空氣）於它來進行熱分解。以如此被熱分 解之排氣（F )，接著導入於後部擦洗器（4 0 )，以進 行由如鹼液，酸性液或水之藥液的藥液洗淨及降低溫度之 同時，由排氣扇（5 0)來放出於大氣中。 再者，當電熱器（7 )產生破損，或貼內部構件（ 經濟部智慧財產局員工消費合作社印製 3 b )等內部構有損傷，而需要分解排氣處理塔（1 )時 ，鬆開卸下接合件（1 0 ) (10a)，就可從排氣處理 塔本體（3)脫離本體底部（4)，使得可拉出電熱器（ 7 )等之內部構件至外部，由而能簡單地進行更換新構件 或予以維修。至於有關維修方法之實施例，將在另一項詳 述。 其次，說明有關圖2所示之第2實施例。與第1實施 -22- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 508263 A7 __B7___ 五、發明説明（2办 (請先閲讀背面之注意事項再填寫本頁) 例有相異之部分係配設有冷卻部（1 2 )於排氣處理塔（ 1 )之處。其他因形成相同，將省略其說明而僅對相異部 分爲中心加以說明。在排氣處理塔（1 )之外周中段形成 了冷卻流體回流部（1 4 )，而排氣處理塔（1 )之冷卻 流體回流部（1 4 )以下之部分形成爲冷卻壁（1 3 )。 冷卻流體回流部（1 4 )係由外壁護套（3 a )和圍 繞前述外壁護套（3 a )外側所配設之回流壁（1 5 )所 構成之中空部分，構成爲圍繞排氣處理塔本體（3 a )之 整個周圍。冷卻流體回流部（1 4 )安裝有導管（1 6 ) 於1至複數個部位，並插入安裝於導管（1 6 )之噴出管 (1 7 )於前述冷卻流體回流部（1 4 )。噴出管（1 7 )前端係配合於冷卻流體回流部（1 4 )來朝（圓）周方 向彎曲，以令噴出管（1 7 )在冷卻流體回流部（1 4 ) 內朝周方向噴出。又在冷卻流體回流部（1 4 )之外壁護 套（3 a )下端和冷卻壁（1 3 )上端穿設有遍及整個周 圍朝向本體底部（4 )開口之朝斜下方的縫隙（1 8 )。 經濟部智慧財產局員工消費合作社印製 冷卻壁（1 3 )係以耐熱性、耐腐蝕性之金屬板材料 所構成，其形狀在圖之實施例爲下窄之截頭圓錐體狀。當 然，也可成爲圓筒狀，但爲使冷卻流體（2 0 )可順暢地 流下，理想爲下窄之截頭圓錐體狀。 於排氣處理塔本體（3 )底部，與實施例1同樣，以 接合件（1 0 a )安裝有組裝收容於前述冷卻壁（1 3 ) 內之絕緣構件（9 )的本體底部（4 )形成可裝卸。而在 前述冷卻壁（1 3 )和本體底部（4 )之間，形成有聚集 -23- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 508263 A7 B7 五、發明説明（2i 冷卻流體（2 0 )之冷卻流體聚集部（2 1 )，而由聚集 於冷卻流體聚集部（2 1 )之冷卻流體（2 0 )來直接冷 卻絕緣材料（9) 〇 又從貼內部構件（3b)下端配設形成垂下之以耐蝕 性金屬所形成之圓筒狀的遮蔽壁（19)，其乃覆蓋冷卻 壁（1 3 )之上部內周圍，又在遮蔽壁（1 9 )下方設置 有惰氣供應噴嘴（2 6 )成貫穿冷卻壁（1 3 )。從惰氣 供應噴嘴（2 6 )所吹入於排氣分解處理室（1 a )底部 內之惰氣（I)，可旋轉底部（4)內之同時，與所分解 之排氣（F ) —齊從氣體排出（排氣）部（5 )排出。 以如此地來配設垂下遮蔽壁1 9且從惰氣供應噴嘴（ 2 6 )朝排氣分解處理室（1 a )底部內吹進惰氣時，即 使形成螺旋狀在冷卻壁（1 3 )內周之斜面流下之冷卻流 體（2 0 )被加熱而蒸發，該蒸氣也可由遮蔽壁（19 ) 所遮蔽，使得難以流入於排氣分解處理室（1 a )，因此 ，並不會產生由冷卻流體（2 0 )之蒸氣引起阻礙熱分解 反應之情事。再者，排氣分解處理室（1 a )內之氣體因 由配設於底部之排氣部（5 )而從排氣分解處理室（1 a )來排出，因而，排氣分解處理室（1 a )內經常有向下 流動之向下流之狀態，以致冷卻部（1 2 )之冷卻流體（ 2 0 )的蒸氣上升而流入於排氣分解處理室（1 a )內之 危險性極爲少，但由於具有遮蔽壁（1 9 )，可更一步地 消除該危險性。 圖5、6係冷卻部（1 2 )之其他實施例，乃替代配 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） ---^---“----m-裝--丨 (請先Μ讀背面之注意事項再填寫本頁) 訂 4 經濟部智慧財產局員工消費合作社印製 508263 A7 ______ B7 _ 五、發明説明（2会 (請先聞讀背面之注意事項再填寫本頁) 設回流壁（15 )而噴出管（1 7 a )沿著直接冷卻壁（ 1 3)來配設，並在其下方配設環狀之聚集液體環（24 )於冷卻壁（1 3 )之內周圍之例子。形成有可通過冷卻 流體（2 0)之間隙之環狀之聚集液體環（2 4 )和冷卻 壁（13)之間。由而，從噴出管（17a)噴出之冷卻 流體（2 0 )會沿著冷卻壁（1 3 )內周成螺旋狀流下， 而其一部分會通過間隙來流下，剩餘部分則形成被阻擋於 聚集液體環（24)。該狀態時，可由遮蔽壁（19)和 惰性供應噴嘴（2 6 )之作用而遮蔽冷卻液體（2 0 )之 蒸氣，使得難以流入排氣分解處理室（la)。 再者，圖2〜6之冷卻部（1 2 )係以水做爲冷卻流 體（20)，且冷卻流體（20)可直接露出於排氣處理 塔（1)底部來流動之直接冷卻護套，因而爲了不賦予影 響至排氣處理塔（1 )內之高溫環境，令直接排氣處理塔 (1 )之高度具有足夠之高度。而冷卻流體（2 0 )爲氮 氣或氬氣等之惰氣時，就可令塔高低於冷卻流體（2 0 ) 爲水時之塔高。 經濟部智慧財產局員工消費合作社印製 當然，也可替代圖2之直接冷卻護套方式而採用如配 設例如冷媒流通管（未圖示）於本體底部（4 )內或外面 ，並流通冷卻流體（2 0 )於其中之間接冷卻護套（未圖 示）者。 其次，將依照圖9及圖1 0來說明要安裝於有關本發 明之排氣處理塔（1)的粉麈去除機構（2)。在於排氣 處理塔本體（3)之頂部部分（lb)，安裝有由複數支 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -25- 508263 A7 B7 五、發明説明（2$ (於本實施例爲以間隔12 0°來安裝3支）管所形成之 第1粉塵去除機構（2 a )，其下端係開口於電熱器（7 )頂部或朝向前述頂部和排氣處理塔本體（3 )之內側壁 (1 c )之間，再者，穿設有通孔（2 ^ )於突出部分側 面。當然，前述粉塵去除機構（2 a )並不限定於前述之 狀況而已，亦可形成如圖1 0所示，以沿著頂部部分來彎 曲粉麈去除機構（2 a )前端。該部分之粉塵去除機構（ 2 a )之主要目的，係要吹走附著堆積於從頂部部分（ 1 b )至內側壁（1 c )上部之粉塵所用者。當然，也可 朝排氣處理塔本體（3 )之中心圓切線方向來彎曲粉塵去 除機構（2 a )前端，以令惰氣（I )能沿著頂部部分（ 1 b )來旋轉。 又在如前述之粉塵去除機構（2 a )前端朝向電熱器 (.7 )頂部或前述頂部和排氣處理塔本體（3 )內側壁（ 1 c )之間開口時，就可吹走附著堆積於電熱器（7 )頂 部或排氣處理塔本體（3 )內側壁（1 c )上部的粉塵。 又由管子所形成之第2粉塵去除機構（2 b )插穿於 供氣管（6)下端部，形成可從供氣管（6)底部朝向上 端開口以間歇性地吹出惰氣（I )。由而，可吹走供氣管 (6)之堆積粉麈（G)，尤其可吹走堆積於上端開口內 面之粉塵（G )。 再者，從排氣處理塔本體（3 )之本體底部（4 )側. 面安裝有由複數支（本實施例爲以間隔1 2 〇 °所隔開之 3個部位）管子所形成之第3粉塵去除機構（2 c)。而 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） ~ (請先聞讀背面之注意事項再填寫本頁) -裝· 訂 經濟部智慧財產局員工消費合作社印製 508263 經濟部智慧財產局員工消費合作社印製 A7 _ B7 _五、發明説明（2姜 第3粉塵去除機構（2 c )的插入端（2八）係從排氣處 理塔本體（3 )內側壁（1 c )下端和電熱器（7 )之間 朝上被彎曲著，而形成以間歇性地吹入惰氣（I )於排氣 處理塔本體（3 )內側壁（1 c )下端和電熱器（7 )之 間，以吹走前述部分之堆積粉塵（G )。 再者，前述惰氣（I ) 一般係使用氮氣。當然，因應 於所需，也可使用其他之惰氣，例如使用氬氣。又粉塵去 除機構（2 )雖以如管子所構成，當然也可由管子以外之 物品來構成，並不會受到前述例子所限定。又插入有吹入 氧氣（或空氣）用之噴嘴1 1於排氣處理塔本體（3 )之 頂部部分（1 b )近旁側壁，將供予熱分解排氣分解處理 室（1 a )內之排氣分解處理室（1 a )內之排氣（F ) 所用。 其次，將對於圖9、1 0之實施例（A )之作甩，以 省略重覆部分來加以說明。從半導體製造裝置所排出之排 氣（F)，將通過前部擦洗器（30)，洗淨氣體輸送配 管（34)來放出於排氣分解處理室（1 a)內。而在該 期間，排氣（F )會接觸於絕緣構件（9 )並予以冷卻， 而接著之上升供氣管（6 )中可由周圍溫度充分地予以預 熱。再者，該時之排氣（F)內仍包含有在前部擦洗器（ 3 0 )無法去除之少量粉塵（G )，而會附著於供氣管（ β )之內面。 如上述，雖可在上升供氣管（6 )時會被加熱，但排 氣（F )中若含有S i Η4 (矽烷）時，主要會在供氣管（ 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ 297公釐） _ 27 _ I—丨ΊΤ (請先聞讀背面之注意事項再填寫本頁) 装· 訂 4 508263 A7 B7 五、發明説明（2$ (請先聞讀背面之注意事項再填寫本頁) 6 )中間左右之被加熱成4 0 0〜5 0 0°C之部分被分解 而產生大量之粉麈（G)。而倘若以如前述，設置第2粉 塵去除機構（2 b)於供氣管（6)之下端底部，且從其 前端開口（ 2 口）朝上成間歇性地吹惰氣（I )時，所附 著於供氣管（6 )內面之粉塵（G)可由該氣體壓力而吹 入於排氣分解處理室（1 a )內。其結果，該大量之粉塵 (G)會進入於排氣分解處理室（1 a )內，且會附著於 頂部部分（1 b ) 〇 供氣管（6 )前端部分因已達到可熱分解排氣（F ) 之高溫，因此，如淸潔過程所排出之排氣（F)，其中含 有C2F6之時，當與前述電熱器（7 )前端部分或保持十 分高溫之頂部附近的高溫環境且具有由吹入於頂部部分（ 1 b )之氧氣（或空氣）時，就能有效地予以熱分解。 經濟部智慧財產局員工消費合作社印製 對於前述之附著於頂部部分（lb)之粉塵（G)， 將由配設於頂部部分（lb)之第1粉塵去除機構（2a )所處理。亦即，從形成有通孔（2 /)於側面且下端開 口（ 2 4 )之第1粉塵去除機構（2 a )所吹出之惰氣（ I )之一部分，將從下端開口（ 2 <)朝向電熱器（7 ) 前端或排氣分解處理室（1 a )內側壁（1 c )吹出，而 吹入堆積於該部分之粉麈（G)。另一方面，剩餘之惰氣 (I)，將會沿著頂部部分（1 b )吹出，並吹下堆積於 該部分之粉塵（G )。 前述粉塵（G )，將與被分解之排氣（F ) —齊在排 氣分解處理室（1 a )內部，由頂部部分（1 b )朝向本 -28- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 508263 A7 _ B7 _ 五、發明説明（2备 (請先閲讀背面之注意事項再填寫本頁) 體底部（4 )流下。該時，前述粉塵（G )會附著於排氣 分解處理室（la)之下部內側壁（lc)。爲此，第3 粉麈去除機構（2 c )就會操作產生作用。亦即，由配設 於本體底部（4)，而其開口（2 〃）朝向頂部方向之第 3粉麈去除機構（2 c)，以形成相反於前述分解排氣（ F )之流下方向來成間歇性地朝頂部方向吹出惰氣（I ) 來產生漩渦，就可具有效果性地吹走該部分之粉塵（G) 。而被吹走之粉塵（G)，將與分解排氣（F) —齊從配 設於本體底部（4)之分解氣體輸送配管（3 5 )輸送至 其次過程之擦洗器（40)，且與前述同樣，由鹼液，酸 性液或如水之藥液來進行藥液之洗淨及降低溫度，並由排 氣風扇來放出於大氣中。 經濟部智慧財產局員工消費合作社印製 圖1 3係顯示由前述粉塵去除機構（2 )所實施之 S i H4和C2F6之粉麈去除效果的曲線圖，圖1 4係其 比較例。在圖1 3之狀況時，因操作前述粉塵去除機構（ 2 )成間歇性地動作，因而排氣處理塔（1 )內之粉塵（ G )少且不會增加，甚至半導體製造裝置之操作週期（循 環）爲1 6 0週期後，也未能看出S i H4和C2F6去除 效率及加熱器輸出之降低，使得可大幅度地延長排氣處理 裝置（A )所要維護之期間。 而對於該狀況，在於圖1 4之比較例，因粉塵（G) 可逐漸地堆積於排氣處理塔（1 )內，使得排氣處理塔（ 1 )內之空間逐漸狹隘（狹窄）化，而使裝置之進口和出 口的差壓（壓差）逐漸變爲高，而在半導體製造裝置之操 -29 - 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 508263 A7 B7 五、發明説明（2> (請先W讀背面之注意事項再填寫本頁) 作週期爲4 0週期之處，S i H4之去除效率逐漸變爲不佳 ，並在4 2週期或4 3週期附近，迅速地令去除效率惡化 。另一方面，C2F6時，也在4 3週期附近開如迅速地惡 化去除效率。加熱器輸出也同樣以4 3週期附近爲境界形 成大幅度地降低。因此，在於比較例時，最遲也需要在· 4 0週期以前停止半導體製造之生產線，以分解比較例之 裝置來進行淸潔。 經濟部智慧財產局員工消費合作社印製 其次，將說明有關維護排氣處理塔（1 )之方法。排 氣之熱分解乃由電熱器（7)來在排氣處理塔（1 )內進 行，但如前述，要熱分解至少需要1 4 0 0 °C以上之高溫 高熱。除此之外，要成爲熱分解處理之對象的排氣（F) 又具有爆炸性、腐蝕性、毒性極強者，因而，電熱器（7 )成爲要在極爲嚴酷（嚴厲）之條件下使用，以致如使用 通常之金屬電阻體的電熱器（7 )並無法耐得住，因此， 使用以碳化矽爲主體之陶瓷電阻體。然而，即使採用該等 也會逐漸產生劣化或破損。又貼內部構件（3 a )或供氣 管（6)等之內部構造物（4 5)也由於會產生損傷，因 此，有需要定期性地從排氣處理塔（1 )拔出內部構造物 (4 5 )來使電熱器（7 )或供氣管（6 )更換成新品， 或進行加強、修補貼內部構件（3 a )之情事。 而要進行如此之維修時，將卸下連接於排氣處理塔（ 1 )之配管類或配線類，以令排氣處理塔（1 )成爲不拘 束分離狀之後，以如圖1 1所示，以支承軸（2 8 )爲中 心來轉動排氣處理塔（1 )而後外殻（箱）（2 7 )拉出 -30- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 508263 A7 B7 _ 五、發明説明（ (請先閲讀背面之注意事項再填寫本頁) 排氣處理塔（1 )底部，並形成爲傾斜或水平狀態來加以 固定。固定方法雖並未特別有所限定，但在此，將排氣處 理塔（1 )卡止於架設在架台（12 0)間之卡止桿（ 2 5 )來保持成傾斜或水平狀態。然後，放鬆接合件（ 1 0 a )且從排氣處理塔本體（3 )底部拉出內部構造物 (4 5 )。且在進行更換電熱器（7 )或供氣管（6 )爲 新東西，或加強、修補貼內部構件（3 a )等之所必要之 作業後，以接合件（1 0 a )來再固定內部構造物（4 5 )於排氣處理塔本體（3)底部。 然後，卸下卡止桿25，朝垂直方向，轉動排氣處理 塔（1)，並在成爲垂直之處予以固定於架台（120) ，最後連接配管類或配線類成爲原來之狀態，由而，可完 成一連串之維修。 經濟部智慧財產局員工消費合作社印製 圖1 2爲其他例子，該狀態爲從排氣處理塔本體（3 )頂部垂下電熱器（7 )來配設者，當要進行維修時，要 插入拔出具有安裝於頂部之電熱器（7)的內部構造物之 狀態者。該時，予以配設支承軸（2 8 )突出於排氣處理 塔本體（3 )之外壁護套（3 a )之兩面側下部（當然， 兩側面上部也可），而由配設於架台（120)之軸承（ 2 9 )來支承成可起卧。 而要維修時，就以支承軸（2 8 )爲中心臥倒排氣處 理塔（1)，以令排氣處理塔本體（3)頂部會露出於外 殻（2 7 )外，且使排氣處理塔（1 )卡止於例如架設於 架台（1 2 0 )之卡止桿（2 5 )，以保持成傾斜或水平 ϋ張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） ~ 508263 A7 B7 五、發明説明（2令 狀態，並與前述同樣，拉出具有電熱器（7 )之內部構造 物（4 5 )而進行所需要之維修後，再予以安裝。 (請先聞讀背面之注意事項再填寫本頁) 〔發明之效果〕 本發明因配設豎立配設於排氣分解處理室內之電熱器 供電部於溫度爲最低之排氣處埋塔本體底部之本體底部， 由而排氣處理塔本體內之上部（頂部部分）即使成爲高溫 ，也可保持供電部成較低之溫度，因而，可防止操作中之 供電部產生短路事故。除此之外，又在本體底部插穿有要 通過低溫排氣用之供氣管，使得本體底部和供氣管之間會 進行熱交換，以預熱排氣側，致使本體底部側被冷卻，由 而也可對於防止供電部產生短路事故有所貢獻。 再者，當配設冷卻部於排氣處理塔時，除了前述之冷 卻效果，又可增加本體底部之更有效之冷卻效果，使得可 有效果地防止供電部產生絕緣破壞之情事。如此之冷卻部 也可予以配設。 經濟部智慧財產局員工消費合作社印製 又在上述所使用之電熱器，因可利用穿孔設置之嵌合 孔來連接複數之電熱器單體，因此，可配合於排氣分解處 理室來加工成任意之尺寸，使得使用上極爲方便。 再者，本發明因構成由朝向排氣處理塔本體之排氣分 解處理室內之粉塵堆積部位開口之粉塵去除機耩，而從粉 塵去除機構成間歇性地噴出惰氣於排氣分解處理室內，因 而，能極具有效果地吹走極微細且輕之如棉的塵埃之粉塵 排出於裝置外，而形成不會堆積於裝置內。因此，可防止 -32- 本紙張尺度適用中國國家標準（CNS ) A4規格（210Χ：297公釐） 508263 A7 ___ B7 __ 五、發明説明（3备 (請先聞讀背面之注意事項再填寫本頁) 由粉塵而使裝置內之空間部分成爲狹隘化之情事，使得可 遍及長期性不會損壞裝置功能，而成爲較習知裝置可大幅 度地展延維護期間。 除此之外，本發明因將排氣處理塔樞著於外觳（箱） 成可轉動，因而在維護時，可令排氣處理塔倒成水平或傾 斜狀態，以拉出排氣處理塔底部或頂部於外殻外部來固定 成水平或傾斜狀態，以致能以該狀態來進行維護，使得可 一舉解決如習知例之所謂要在高處作業或淸潔室頂部太低 之問題，或由於外殻內之配管構造或收容機構形成極爲複 雜，使得要從排氣處理塔本體之底部插入拔出內部構造物 極爲困難之問題。 〔圖式之簡單說明〕 圖1係說明有關本發明之排氣分解處理裝置的第1實 施例結構之剖面圖。 圖2係說明有關本發明之排氣分解處理裝置的第2實 施例結構之剖面圖。 經濟部智慧財產局員工消費合作社印製 圖3係圖2之冷卻部的水平剖面圖。 圖4係放大圖2—部分的縱向剖面圖。 圖5係說明有關本發明之排氣分解處理裝置的第3實 施例結構之剖面圖。 圖6係放大圖5—部分的縱向剖面圖。 圖7係從使用於本發明之電熱器正面所看之部分剖面 圖。 . -33- 本紙張尺度適用中國國家標準（CNS ) A4規格（21〇Χ297公釐） 508263 A7 B7 五、發明説明（3) 圖8係圖7之平面圖。 (請先閲讀背面之注意事項再填寫本頁) 圖9係說明配設粉麈去除機構於有關本發明之排氣處 理塔時之結構的剖面圖。 圖1 0係說明圖9之其他實施例結構的剖面圖。 圖1 1係說明有關本發明之排氣處理裝置之懸吊保持 構造之結構的圖。 圖1 2係圖1 1之其他實施例的結構說明圖。 圖1 3係依據本發明之去除（有害氣體之）週期的曲 線圖。 圖14係依據習知例之去除（有害氣體之）週期的曲 線圖。 圖15係說明習知之排氣分解處理裝置的槪略結構之 剖面圖。 〔符號之說明〕 (F):排氣 （la):排氣分解處理室 經濟部智慧財產局員工消費合作社印製 (3 ):排氣處理塔本體 （4 ):本體底部 (6 ):供氣管 (7 ):電熱器 (8a，8b):供電（饋電）部 -34- 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐）508263 A7 __ _B7____ V. Description of the invention (0 [Technical field to which the invention belongs] (Please read the notes on the back before filling out this page) The present invention relates to electronic circuit components used in the manufacture of semiconductors, liquid crystals, etc., especially The exhaust gas processing tower of the processing equipment for the exhaust gas generated during the purge and uranium engraving process and the electric heater used in the processing tower. [Conventional Technology] In the semiconductor manufacturing process, related issues such as CVD (chemical vapor deposition) The operation of semiconductor manufacturing equipment is generally carried out as follows. From the deposition gas such as Si H4 (toxic to the human body, explosive hazardous gas) to deposit nitrogen to remove the remaining in the CVD chamber The Si H4 gas is purged with a purge gas such as C2F6 (although it has room temperature effect, but harmless). The CVD chamber is purged with nitrogen to remove the purge gas from the CVD chamber. The above cleaning is repeated. Printed by the Intellectual Property Bureau employee consumer cooperative as described above, the gas group used in the scrubbing CVD chamber has PFC. It is the abbreviation of Perfluorocarbon, and CF4, CHFs, the aforementioned C2F6 is its representative compound. When compounds are used instead of carbon, C-based fluorinated compounds such as NF 3, S F6, and S F4 are more targeted. PFCs representing CF4 and C2F6 It is non-combustible, and the toxicity of the gas itself to the human body is not clear, but it is known to have at least acute and subacute toxicity. However, the compound itself is stable, so it will not change for a long time when exposed to the atmosphere. It will stay. The consumption life in the atmosphere is referred to as CF4 is 50,000 years, C2F6 is 10,000 years, and the global warming coefficient (compared with C02 as 1-4 paper scale) Applicable to China National Standard (CNS) A4 specification (210X297mm) 508263 A7 _B7_ V. Description of the invention (2) (Please read the notes on the back before filling this page) 値), CF4 is 4,400, C2F6 is 6 , 200 (after 20 years), therefore, it has problems that cannot be ignored in the global environment, and it is hoped that the harm of PEC representing C F4 and C2F6 can be removed. However, the former PFC, that is, CF4, CHFs, The compound represented by C2Fe is The C-F bond is extremely stable (the maximum binding energy is 130Kcal / mol), it is not easy to decompose, and it is extremely difficult to remove (harmful) only by simple thermal oxidative decomposition. For example, with simple thermal oxidative decomposition, C 2 F 6 can be decomposed by cutting off the C-C bond. At the processing temperature of 1000 ° C, the processing air volume is limited to below 250 liters / mi η. Although it can be removed, the CF4 Due to the need to cut the binding energy to a large CF, the above air volume requires 1400 ~ 1500 ° C. Figure 15 is a conventional semiconductor exhaust gas treatment device (100) containing a perfluorocarbon or a perfluorinated compound. An exhaust gas decomposition reaction tower (1 0 1) having an exhaust gas decomposition reaction chamber (107), The front scrubber (printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by the consumer cooperative), the rear scrubber (110) and the exhaust fan (1111). The device (100) is arranged in a small size because it is used in a clean room. Although the heater (102) is used for the gas (exhaust gas) decomposition reaction of this device (100), as described above, the semiconductor exhaust gas (F) to be thermally decomposed requires a high temperature of 1400 to 1500 ° C. . When the electric heater (102) is used at a so-called high temperature of 1400 to 1500 ° C, the temperature is close to the limit due to the physical properties of the heating element material of the electric heater (102), and it may make the power supply unit (-5- This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 508263 A7 __ ^ _ B7_ V. Description of the invention (3) 1 0 5) and surrounding insulating members (1 〇 6) The temperature that destroys the insulation, so it is almost impossible to use it for a long time at high temperature. (Please read the precautions on the back before filling this page) The Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs printed the conventional device (100) shown in Figure 15 from the top of the exhaust decomposition reaction chamber (107) ( 104) The electric heater (102) is hung for use. The heat (volume) is directed toward the top (104) of the exhaust decomposition reaction chamber (107), so that the top (104) part of the power supply section (105) that houses the electric heater (102) will Become the highest temperature. As a result, as a matter of course, the power supply part (105) of the electric heater (100) that requires insulation is taken as a matter of course, and even the insulation of the insulation member (106) surrounding it will be greatly reduced, and the power supply will be reduced. A short circuit occurred in the part (105). From the top of the exhaust decomposition reaction chamber (107), the electric heater (1 0 2) equipped with an electric heater (1 0 2) hanging down and continuously used at a high temperature will change from, for example, the phenomenon of creep. And gradually elongation, as a result, there is a problem of so-called breakage. As mentioned above, the device (100) itself is arranged in a small size, so that the volume of the exhaust gas decomposition reaction chamber (107) is not large. On the other hand, the electric heater (1 0 2) is a kind of standard product, so that it is suitable for use in the exhaust gas decomposition reaction chamber (1 0 7) is almost non-existent, making the electric heater (1 0 2) itself The shape becomes the bottleneck of designing the device (100). In other words, the manufacturer of the device can easily manufacture the electric heater (102) which is compatible with the device, and it becomes a matter required by the manufacturer of the device. In addition to the above, there are the following problems. That is, when the heater (102) is suspended from the top (104) of the exhaust decomposition reaction chamber (107) and used, it will become the highest end of the electric heater (10 2). Standard (CNS) A4 specification (210X297 mm) 508263 A7 B7 V. Description of the invention (4) (Please read the precautions on the back before filling this page) The point is at the bottom, and the heat will rise toward the top as mentioned above A high-temperature environment is formed near the top (104). On the other hand, the exhaust gas (F) is introduced into the interior from the bottom of the exhaust gas decomposition reaction chamber (107). The exhaust gas (F) becomes a low-temperature gas containing moisture by being washed by the front scrubber (109) in the previous process. Since the low-temperature exhaust gas (F) will be in the exhaust gas decomposition reaction chamber (107), it will first contact the front end portion of the electric heater (102) that has reached the highest temperature and maintain this state to rise through. Therefore, if When thermal decomposition is performed in this part, it is necessary to raise the low-temperature exhaust gas (F) to the decomposition temperature in a blink of an eye. Therefore, if the temperature of the front part of the electric heater (102) is not higher than the required high temperature, , The predetermined decomposition reaction cannot occur, even when thermal decomposition is performed in a high temperature environment near the top (104), that is, when the high temperature environment near the top (104) is made 1400 ~ 1500 ° C It is also necessary to make the temperature of the front end of the electric heater (102) higher than it, so that the electric heater (102) will be burdened too much. The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs has printed as described above. In order to thermally decompose the low-temperature exhaust gas (F), it is necessary to apply more than the required load to the electric heater (102). Therefore, the electric heater can be significantly shortened ( 1 0 2), and can increase the cost of thermal energy. The other problem is that the semiconductor exhaust gas treatment device has a problem that a large amount of dust contained in the semiconductor exhaust gas is generated when the semiconductor exhaust gas is thermally decomposed into the device. This dust will accumulate everywhere in the device and can gradually congest the space inside the device. The size of the dust and the size of the paper inside the device apply the Chinese National Standard (CNS) A4 specification (210X297 mm) 508263 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7_V. Description of the invention (5) Narrowing may not only have a significant adverse effect on the thermal decomposition of semiconductor exhaust gas, but a step back may also be related to the occurrence of accidents. Also, due to the need for frequent device maintenance in clean rooms, the related maintenance It is also important that the device can be made easy. In particular, electric heaters are used under high load, so that the deterioration (deterioration) is so significant that they need to be replaced frequently. In addition, the top of the clean room is generally low. If the matter of taking out the electric heater is taken into consideration, the height of the device will also be limited. [Problems to be Solved by the Invention] The first requirement is to ensure the insulation of the power supply part of the electric heater used in the exhaust gas decomposition processing room and to reduce the electric heat as much as possible when the thermal decomposition reaction of the semiconductor exhaust gas is performed at a high temperature. It is an exhaust treatment tower of an exhaust treatment device that can minimize the heat loss of the device, and an electric heater that can be used under such severe conditions and is easy to use. The second requirement is to have a device structure that does not accumulate dust in the device during long-term use, and the third requirement is to have a device structure that is superior in maintainability. [Means for Solving the Problem] The electric heater (7) described in the first patent application scope (hereinafter referred to as application item 1, the same below) is particularly suitable for use in, for example, an exhaust gas decomposition treatment room (1 a). In high-temperature, corrosive or / and explosive environments, the & Zhang scales are suitable for financial affairs (CNS) A4 specifications (210X297 mm) ~ (Please read the precautions on the back before filling this page) 508263 A7 B7 V. Inventor (6), it consists of "by: equipped with power supply (feeding) sections (8a), (8b) at both ends" and heat generating section (7a) to power supply section (8a) (( Please read the precautions on the back before filling out this page) 8b) of multiple electric heater units (71) (72) ......... and erected in the adjacent power supply section (8a) ( 8b) ...... is composed of an erecting current body formed of the same material as the power supply section (8a) (8b), and is characterized in that: the erecting current body is fitted and passed through the gap ( 8 c) of the fitting hole (8 d) (8 d) and the heater unit (7 1) (72) ......... the power supply section (8 a) (8a), and Power supply part (8 a) (8b) inorganic adhesive material formed from the same material Agent) (8 e) filling the fitting hole Chen (8 d) (8 d) ... ...... and a power supply portion (8 a) a gap (8 a) between adhesion to. " In such a structure, since the fitting holes (8d) (8d) ... which are passed through the current-carrying body (8c) can be used to connect a plurality of electric heater units (71 ) (72) ......... Therefore, it can be processed in any size of the printing and processing room (1 a) of the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economics and Exhaust Decomposition, making it extremely convenient to use. The inorganic adhesive material (agent) formed from the same material as the power supply part (8a) (8a) is used to charge the space between the charging hot fitting hole (8d) (8d) and the power supply part (8a) (8a). The gap is adhered. Therefore, even if the gap is fitted, the gap between the two can be completely buried by the inorganic adhesive (8 e), so that no obstacle (inconvenience) is formed on the current. Furthermore, the electric heating The use of the device (7) is not limited to semiconductor fumes (F) with uranium decay or / and explosive properties, and is suitable for use in high-temperature parts that require about 140 ° C. This paper size applies Chinese National Standard (CNS) A4 specification (210X 297 mm) -9-508263 A7 __ ___ B7 V. Description of the invention (7) Application item 2 Series exhaust treatment device (A) exhaust treatment tower ( 1) (see Figure 1), which is characterized by: (a) the exhaust treatment tower body (3), an exhaust decomposition treatment chamber (1 a) is formed inside; (b) the bottom of the body (4) , Installed at the bottom of the exhaust treatment tower body (3); (c) an air supply pipe (6), inserted through the bottom of the body and erected in the exhaust treatment tower body (3), and discharges exhaust gas from its front end (F ) In the exhaust decomposition processing chamber (la); and (d) the electric heater (7), which is provided with its power supply part (8b) in the bottom of the body (4) and is erected from the bottom of the body (4), . According to the above-mentioned semiconductor exhaust treatment device (A), the power supply part (8b) of the electric heater (7) arranged in the exhaust decomposition processing chamber (1a) is arranged in the exhaust treatment installed at the lowest temperature The bottom (4) of the bottom of the tower body (3). Therefore, even if the upper part (top two) of the exhaust treatment tower body (3) becomes high temperature, the bottom of the body (4) can be kept at a relatively low temperature, and The gas supply pipe (6) passing the low-temperature exhaust gas (F) is inserted into the bottom of the body (4), so that the bottom of the body (4) can take heat from the exhaust gas (F) flowing through the air supply pipe (6) to reduce the temperature, so that No harm is caused to the insulation of the power supply section (8b) or the insulating members surrounding it. On the contrary, the exhaust gas can be preheated, so that the thermal decomposition by the electric heater (7) can be promoted. In addition, as mentioned above, the electric heater (7) is from the bottom of the body (I! — Id. (Please read the precautions on the back before filling out this page)-Binding and printing by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Consumption Cooperatives The paper size of the paper is applicable to the Chinese National Standard (CNS) A4 specification (21〇 × 297 mm) • 10- 508263 A7 ___ _B7 _ V. Description of the invention (8) (Please read the precautions on the back before filling this page) 4) It is erected so that the front end of the electric heater (7), which is the highest temperature, is located at the uppermost position, so that the exhaust gas (F) introduced can be preheated to rise from the low temperature portion to the high temperature portion to rise to the air supply pipe (6) is different from the conventional example that the low-temperature exhaust gas (F) suddenly contacts the high-temperature part of the electric heater (7), and does not need to increase the load of the electric heater (7) excessively. Can greatly extend the life of the electric heater (7). Application item 3 further restricts the exhaust treatment tower (1) of the exhaust treatment device (A) described in application item 2 (see Figs. 9 and 10), and is characterized in that: The top part (1 b) of the processing chamber (1 a) is opened and a dust removing mechanism (2 a) for inert gas (I) is intermittently sprayed from the opening (2 1) on the top of the aforementioned exhaust treatment tower (1) Part (1 b) ". Another application item 4 is a person who further restricts the exhaust treatment tower (1) of the exhaust treatment device (A) described in application item 2, which is characterized in that "the opening (2 ports) is provided in the air supply pipe. (6) A dust removal mechanism (2b) for the inert gas (I) is intermittently sprayed from the opening (2 port) at the lower end portion at the bottom 4 '' of the exhaust treatment tower (1). The dust (G) in the semiconductor exhaust (F) printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs or the dust (G) generated by the thermal decomposition of the semiconductor exhaust (F) is very fine and dusty. Deposit anywhere in the device (A). As mentioned above, the accumulated dust (G) will narrow the space in the device (K), which will gradually impair the function of the device. In particular, the formation of deposits in the exhaust gas decomposition processing chamber (1a) is a major problem. To this end, the inert gas (I) is intermittently sprayed from the dust removal mechanism (2a) (2b) to the vertical paper size to apply the Chinese National Standard (CNS) A4 specification (210X297mm) ~ '508263 A7 ____B7 5 、 Explanation of the invention (9) (Please read the precautions on the back before filling in this page) Vertically arranged in the exhaust decomposition treatment room (1 a), especially the vertical section is arranged on the top part that is easy to accumulate dust (G) ( 1 b) or the lower end of the air supply pipe (6) at the bottom of the body (4) to blow away the accumulated powder dust (g) and remove it to eliminate the accumulation of dust in the exhaust decomposition treatment chamber (1 a), The required maintenance period of the device (A) can be greatly expanded (extended). Furthermore, as the reason for intermittently ejecting the inert gas (I), the high pressure at which the inert gas is blown can effectively blow away the dust and reduce the amount of inert gas (I) used. Application item 5 is a person who further improves the exhaust treatment tower of the exhaust treatment device (A), and is characterized by "in the exhaust treatment tower (1) of the exhaust treatment device (A) described in application item 2 The two sides of the exhaust treatment tower (1) are formed with protruding shafts. The bearings (2 9) arranged on the housing (2 7) for housing the exhaust treatment tower (1) are pivoted to form a rotatable support shaft. (2 8) ". When the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs prints this structure, the exhaust treatment tower (1) is rotatably framed by the casing (2 7), so when it is necessary to replace or repair, for example, a heater (7) is installed When the internal structure (4 5), lie down and support the exhaust treatment tower (1) which is perpendicular to the inside of the shell (2 7) to be horizontal or inclined, and pull out the bottom or top of the exhaust treatment tower (1) at The outer shell (2 7) is fixed outside, so that the exhaust treatment tower (1) is horizontal or inclined, and the internal structure (45) is loaded and unloaded from the pull-out side of the outer shell (2 7) of the exhaust treatment tower (1). (Refer to Figure 12), it can be easily inserted and removed the internal structure contained in the exhaust decomposition processing chamber (1a), so that it can be resolved in one fell swoop-12-This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 508263 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Invention Description (1 () As is known in the art, work at a high place, or the top of the clean room is too low, or Due to the extremely complicated piping (distribution) of the casing (2 7) or the containing mechanism, It is difficult to insert and pull out the internal structure (4 5) from the bottom of the exhaust treatment tower body (3), and other problems. The exhaust treatment tower (application 6) of the exhaust treatment tower (A) ( 1) Another example (refer to FIG. 2), which is characterized by: (a) an exhaust treatment tower body (3), forming an exhaust decomposition treatment chamber (1 a) inside, and a cooling section (1 2) At the bottom of the exhaust decomposition processing chamber (1 a); (b) the bottom of the body, installed at the bottom of the exhaust treatment tower body (3), and cooled by the cooling section (1 2); (c) the air supply pipe (6), inserted It passes through the bottom of the body (4) and is erected in the exhaust treatment tower (3), and the exhaust gas (F) is released from the front end of the exhaust treatment chamber (1a); and (d) the electric heater ( 7) It is constituted by a power supply unit (8b) arranged inside the bottom of the body (4) and standing upright from the bottom of the body. In this state, in addition to the functions described in application item 2, plus cooling And the bottom part (4) of the body has a cooling effect, which effectively prevents the power supply part (8b) and its surrounding parts from being damaged by insulation. In addition, the cooling part (1 2) may be a refrigerant circulation pipe (not shown) arranged inside or outside the bottom (4) of the body, or may be formed outside the bottom of the exhaust treatment tower body (3). If a cooling jacket (not shown) is connected between the surroundings, you can also directly cool the jacket as described below (please read the precautions on the back before filling this page) • The size of the paper is bound to the Chinese national standard (CNS ) A4 specification (210X297mm) -13- 508263 A7 B7 V. Description of invention (11) #. In addition, the cooling fluid (20) used is water or various refrigerant liquids (please read the precautions on the back before filling this page). Specific structure example of the 7th cooling unit (1 2), the cooling unit (1 2) is characterized by: (a) a cooling wall (1 3), which constitutes the bottom side of the exhaust decomposition processing chamber (1 a), and extends to the bottom of the body (4); (b) a cooling fluid return section ( 1 4), forming the outer peripheral part of the exhaust treatment tower body (3) in a state surrounding the exhaust treatment tower body (3); (c) a discharge pipe (1 7), which is arranged at the cooling fluid return part (1 4 ), The cooling fluid (20) is ejected in the direction of the periphery of the exhaust treatment tower body (3); and (d) the gap (18) is formed in the cooling fluid return section along the inner peripheral surface of the cooling wall (13). (1 4) is used for cooling fluid ejection. Application item 8 is another specific structural example of the cooling unit (12). The characteristics of the cooling unit (12) are: (a) the cooling wall (13) printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs to constitute the exhaust The bottom side of the decomposition processing chamber (la) extends until the bottom of the body (4); and (b) the ejection pipe (1 7) is arranged along the cooling wall (1 3) and along the cooling wall (1 3) Cooling fluid (20) is ejected in the surrounding direction. The direct cooling jacket type cooling section (1 2) is different from the indirect water cooling jacket or refrigerant circulation pipe. It is from the place along the inner peripheral surface of the cooling section (1 2). CNS) A4 specification (210X297 mm) 508263 A7 B7 V. Description of the invention (The cooling fluid (20) sprayed from the formed gap (18) is directly exposed along the inner peripheral surface of the cooling wall (13) and does not generate The cooling layer (2 2) (see FIG. 6) is spiraled under the splash and flows down. Therefore, the cooling effect can be improved, and the insulation protection of the power supply section (8 b) can exert great power. Application item 9 series The improvement of the cooling part (12) of the exhaust treatment tower (1) of the exhaust treatment device (A) described in the application item 6, is characterized by "from the sticker constituting the exhaust decomposition treatment chamber (1a) The lower end of the inner member (3b) is provided with a shielding wall (1 9) for covering the upper and inner sides of the cooling wall (1 3) inside the cooling wall. " The cooling fluid (20) flowing down the inner peripheral slope of the cooling wall (13) spirally is heated and The vapor can also be shielded by the shielding wall (19), making it difficult to flow into the exhaust decomposition processing chamber (1a), and therefore, the vapor of the cooling fluid (20) will not be generated to hinder the thermal decomposition reaction. In addition, the gas in the exhaust decomposition processing chamber (1 a) is exhausted from the exhaust decomposition processing chamber (1 a) due to the exhaust portion disposed at the bottom. Therefore, the exhaust decomposition processing chamber (1 a) The inside often flows downward. For this reason, the vapor of the cooling fluid (20) in the cooling section (12) rarely has the risk of rising and entering the exhaust decomposition processing chamber (1a), but due to the shielding The existence of the wall (19) can further eliminate such a danger. Application item 10 is to further limit the exhaust treatment tower (1) of the exhaust treatment device (A) described in application item 6 ( (Refer to Figures 9 and 10), which is characterized by: "Equipped with a dust removal mechanism (2a) to distribute along the exhaust (please read the precautions on the back before filling this page). The paper size printed by the consumer cooperative is applicable to the Chinese National Standard (CNS) A4 specification (2 10X29 * 7mm) -15- 508263 A7 ______B7 V. Description of the invention (The top part (1 b) of the solution processing chamber (1 a) is open and from the opening (2 < (Please read the precautions on the back before filling this page)) The inert gas (I) is intermittently sprayed on the top part of the exhaust treatment tower (1) ". Another application item 1 1 is a person who further restricts the exhaust treatment tower (1) of the exhaust treatment device (A) described in application item 6, which is characterized by: "It is provided with an opening (2 ports) to provide an opening for the supply. The lower end of the gas pipe (6) and the dust removal mechanism (2b) that intermittently sprays the inert gas (I) from the opening (2 port) may be at the bottom (4) j of the exhaust treatment tower 1 The same effect as described above can be obtained [the dust accumulation in the exhaust decomposition processing chamber (1 a) can be eliminated, and the maintenance period can be greatly extended (extended).] Application item 1 2 System further improves the exhaust treatment device (A) The exhaust treatment tower (1) is characterized in that "the exhaust treatment tower (1) of the exhaust treatment device (A) described in the application item 6 is supported by a shaft and arranged to receive exhaust gas. The bearings 2 9 of the casing (2 7) of the processing tower (1) are rotatably supported on the shaft (2 8) and are arranged to protrude from both sides of the exhaust processing tower (1) ". Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and the Consumer Cooperative to obtain the same effect as described above. [The exhaust treatment tower (1) can be made horizontal or inclined, and the exhaust treatment tower (丨) can be easily removed from the housing. (2 7) The internal structure (4 5) can be loaded and unloaded on the pull-out side, and the height of the device can also be suppressed]. [Embodiment of Invention] Hereinafter, the embodiment shown in Fig. 1 will be described. Row of the invention -16-This paper size is applicable to China Standard (CNS) M specification (21G > < 297 public directors) 508263 A7 B7 V. Description of the invention (0 The gas decomposition processing device (A), although the units are fragmented (decomposed) for ease of understanding in the figure, but in reality are implemented ( a) Thermal decomposition of PFC, (b) Scrubbing exhaust or removal of immobilized oxidized compounds, (c) Various structural units of 3 important elements that burn and remove other combustible components, such as the front scrubber ( 30), exhaust treatment tower (1), rear scrubber (40), piping system, wiring system, measuring instruments, exhaust fan (50), and water tank (60), and each of these It is connected by piping or wiring and accommodates a small shell (box) (2 7) which is equal to one body. The size of the shell (27) is a rectangular body about 2 meters high, with a width and depth of about 1 meter. It is composed of a frame (120) to form the skeleton of the casing (27), and a panel (5b) arranged on the outer side thereof. A U-shaped bearing (2 9) in cross section is protrudingly arranged on the frame (1). 2)。 In FIG. 1, the front scrubber (30) is a semiconductor device ( (Pictured) and exhaust ducts are connected to introduce various semiconductor manufacturing exhaust gas or scavenging gas used in the semiconductor manufacturing process and semiconductor manufacturing exhaust gas which is collected through various chemical reactions. The exhaust gas (F) is there. The front scrubber (30) is erected on the water tank (60) or separately with the water tank (60), and the two (30) (60a) are connected by pipes. The drain water can be sent to the water tank (60). When describing the basic structure of the front scrubber (30), the straight-pipe scrubber body (30a) that connects the exhaust pipe (31) to the top is explained. ), And near the top of the inside of the scrubber body (30a), so that the size of the lye and acid paper applies the Chinese National Standard (CNS) A4 specification (210X297 mm) ~ (Please read the precautions on the back first) (Fill in this page again)-Assemble and print 508263 A7 _ ^ ____ B7___ printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention The spraying of the aforementioned liquid medicine can be water The tank (60) is contained. (Please read the precautions on the back before filling in this page.) There is a pump (33) for circulating water between the spray (mist) nozzle (3 2) and the water tank (60). The storage water in the transportable water tank (60) is formed to the nozzle (32). The circulating water pump (33) is supplied using tap water to replenish the amount of water overflowing from the water tank (60). Furthermore, the water tank (60) The exhaust gas supply side (60a) and the reaction exhaust gas discharge side (60b) are divided into two shapes due to the relationship between the drawings, but are connected at the bottom. The printed exhaust treatment tower (1) of the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is erected on the water tank (60) or machine (1 1), or is separated from the water tank (60) and suspended A pivot shaft (28) protruding from the side of the upper part of the exhaust treatment tower body (3) is rotatable, and a bearing (2 9) protruding from the casing (2 7) is rotatable, and can be maintained in a vertical state and from The casing (2 7) is pulled out of the lower end portion of the exhaust treatment tower body (3) to maintain a horizontal state. When the exhaust treatment tower main body (3) is suspended and held horizontally under the casing, it can be easily mounted and dismounted on the bottom of the exhaust treatment tower main body (3) as described below. (4) . When explaining the structure of the exhaust treatment tower (1), the exhaust treatment tower body (3) is a cylindrical outer wall sheath (3a) made of stainless steel, and an internal component (3 b) made of a refractory material ), The exhaust gas decomposition processing chamber (1 a) is formed inside the internal component (3 b). The internal component of the sticker (3b) covers the entire inner peripheral surface of the outer wall sheath (3a) so that the internal component of the sticker (3b) can directly contact the exhaust (F). Row-18- This paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297mm) 508263 A7 ___ B7__ V. Description of the invention ((Please read the precautions on the back before filling this page) Air treatment tower body (3) The bottom (4) of the main body with the insulating member (9) assembled and assembled at the bottom is integrated. In the situation of FIG. 1, the two (3) (4) are provided with joint members (10) such as anchor bolts (4) The machine (1 1) is attachable and detachable, and in the situation shown in FIG. 2, the two parts (3) and (4) are fastened with joints (10 a) such as bolts and nuts to be attachable and detachable. The upper part of both sides of the sleeve (3a) is provided with a supporting shaft 28 having a circular cross section and supported by a bearing (2 9) arranged on a stand (1 2 0) to constitute a casing (27) so as to be rotatable. Freely. At the center of the insulating member (9), an air supply pipe (6) composed of a metal pipe excellent in heat resistance and corrosion resistance is erected. The air supply pipe system (6) is arranged to penetrate the bottom of the body (4) as described above. ) Of the insulating member (9), and the power supply part (8b) of the electric heater (7) is arranged to surround the gas supply pipe (6). The state is in the insulating member (9). The height of the gas supply (6) is formed to be approximately equal to or higher than the electric heater (7). The printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs (2 3) constitutes the bottom of the body (4) A part of the tube has an insulating member (9) filled with a hardened inorganic heat-resistant material inside, and the aforementioned electric heater (7), the gas supply pipe (6), and the insulating member (9) are filled with the insulating member (9). The bottom of the body (4) constitutes the internal structure (4 5) of the exhaust treatment tower (1). The aforementioned air supply pipe (6) inserted in the exhaust decomposition treatment chamber (1 a) is connected with a scrubber connected to the front The top part of the exhaust gas supply side (60a) of the water tank (60) of (30) is connected to the cleaning gas delivery pipe (34) that is led out from the lower end of the front scrubber (30). Exhaust The lower part of the processing tower body (3) is provided with a gas distribution part (5), and is connected to the rear part by a decomposing gas conveying pipe (3 5). The paper size applies Chinese National Standard (CNS) A4 specification (210 × 297) Mm) ~ 508263 A7 ______ ^ B7___ V. Description of the invention (1 "device (40). Electricity The heater (7) consists of 2 or 3 electric heater units (7 1) ((Please read the precautions on the back before filling out this page) 72) ......... and connect the electric heater list The body (71) (72) ... is composed of a current-carrying body at one end, and the electric heater unit (71) (7 2) ......... The body is solid or hollow of silicon carbide The rod-shaped body is provided with power supply sections (8a) (8b) at both ends, and a heat generating section (7a) is provided between the power supply sections (8a) (8b). An erecting current body (8c) made of the same material as the power supply section (8a) (8b) is provided with a fitting hole (8d) to be fitted into the power supply section (8a) (8b) with a gap. ) (8d) into the number to be connected (2 or 3). The heater unit (7 1) (7 2) inserted into the aforementioned fitting holes (8d) (8d) with a gap fit is fitted to the power supply unit (8 a) (8 a ) ......… and the gap between the fitting hole (8 d) (8 d), filled with an inorganic adhesive (8e) formed with the same material as the power supply part (8 a) (8 b) . Fig. 7 is a door-type electric heater (7) connected with two electric heater units (71) (72) by erection of a current conductor (8c). (8f) It is connected to the other party's power supply department (8 b) (8 b) ......... The connection and distribution are printed by employees' cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. The rear scrubber (40) is a general shape. Although it is not necessary to describe in detail, when it is simply explained, a cleaning layer (41) is arranged inside the rear scrubber (40) and the upper part is disposed directly above it. Spray (mist) nozzle (42), and form an upright arrangement on the water tank (60) or the reaction exhaust side (60b) of the water tank (60), and two (40) (60) It is connected by piping and drains water into the sink 60. As for the rear scrubber, the paper size is in accordance with the Chinese National Standard (CNS) A4 (210X297 mm) -20-508263 A7 B7 V. Description of the invention (1 reference (4 0) The outlet is connected to the standby for release and has been disposed of The exhaust fan (50) of the gas (F). Next, the function of the embodiment (A) of FIG. 1 will be described. The exhaust gas (F) discharged from the semiconductor manufacturing device is introduced into the front scrubber ( 3 0) comes into contact with the misty chemical solution (alkali solution, acid solution or water) sprayed from the nozzle (3 2), so that the dust in the exhaust gas (F) contacts the sprayed fine droplets and is captured. And sent to the water tank (60). At the same time, the water-soluble components in the exhaust gas (F) are also absorbed in the medicinal solution and washed (washed) in the scrubber (30). The low-temperature wetting exhaust gas (F) is sent to the gas supply pipe (6) through the cleaned gas delivery pipe (34). The exhaust gas (F) first contacts the insulating member (9) to cool it, and then rises the supply The air pipe (6) is heated by the ambient temperature during the rise and will be released from the front end of the air supply pipe (6) when it is fully preheated Inside the gas decomposition treatment chamber (la). Because the heating electric heater (7) is arranged at the highest temperature around the gas supply pipe (6), it is fully preheated from the front end of the gas supply pipe (6) for exhaust treatment. The exhaust gas (F) in the tower body (3) will be disconnected to the front part of the electric heater (7) and contact the high temperature environment near the top that keeps very high temperature, so that it can be thermally decomposed immediately. When the electric heater (7) is thermally decomposed, the electric heater (7) is erected on the insulating member (9) arranged at the bottom of the exhaust treatment tower body (3), so that the front end part which forms the highest temperature is located at the highest position Therefore, the ambient gas exposed to the front end of high temperature will be trapped in the exhaust. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page). · Order printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-21-508263 A7 ___B7_ V. Description of the invention (1 near the top of the tower body (3), so that the ambient temperature of this part can be maintained at the highest temperature. Another On the other hand, the power supply section (8b) (8b) is buried in the insulating member (9) located at the bottom of the exhaust treatment tower body (3) because it does not retain heat (please read the precautions on the back before filling this page). As a result, the temperature rise can be suppressed. As a result, the insulation performance of the insulating member (9) can be maintained, so that the short circuit accident caused by the insulation damage caused by the electric heater (7) during operation can be reliably prevented. Furthermore, in this row In the aerothermal decomposition processing reaction, in the exhaust gas decomposition processing chamber (la), in addition to adding oxygen (or air) to the semiconductor manufacturing process of the semiconductor manufacturing device, and it has not been digested and a trace amount of oxygen remains below the limit of the explosion, and Oxygen is not actively added to perform thermal decomposition in the absence of free oxygen. On the contrary, inert gas such as nitrogen is added to the introduced exhaust gas in advance so that the concentration of explosive exhaust gas is below the lower limit of the explosion, and oxygen is added. (Or air) for thermal decomposition. The exhaust gas (F) thus thermally decomposed is then introduced into the rear scrubber (40) to clean and reduce the temperature of a chemical solution such as an alkaline solution, an acidic solution, or water, and reduce the temperature. The air fan (50) comes out of the atmosphere. Furthermore, when the electric heater (7) is damaged, or the internal components (printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by the consumer co-operative society 3b) are damaged, and the exhaust treatment tower (1) needs to be disassembled, release it. After removing the joint (10) (10a), the exhaust treatment tower body (3) can be detached from the bottom (4) of the body, so that internal components such as the electric heater (7) can be pulled out to the outside, thereby making it simple Replacement of new components or repair. As for the embodiment of the maintenance method, it will be detailed in another item. Next, a second embodiment shown in FIG. 2 will be described. It is in line with the first implementation-22- This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 508263 A7 __B7___ V. Description of the invention (2 offices (please read the notes on the back before filling this page) The different part is provided with a cooling part (1 2) at the exhaust treatment tower (1). Since the other parts are the same, the description will be omitted, and only the different parts will be described. The exhaust treatment tower ( 1) A cooling fluid return portion (1 4) is formed in the middle portion of the outer periphery, and a portion below the cooling fluid return portion (1 4) of the exhaust treatment tower (1) is formed as a cooling wall (1 3). The cooling fluid return portion ( 1 4) is a hollow part composed of an outer wall sheath (3 a) and a return wall (1 5) provided around the outer side of the outer wall sheath (3 a), and is configured to surround the exhaust treatment tower body (3 a The entire periphery of the cooling fluid return part (1 4) is provided with a conduit (1 6) at one to a plurality of positions, and the ejection pipe (1 7) installed in the conduit (16) is inserted into the cooling fluid return part ( 1 4). The front end of the ejection pipe (1 7) is matched with the cooling fluid return part (1 4) to The (circle) circumferential direction is bent so that the discharge pipe (1 7) is discharged in the cooling fluid return portion (1 4) toward the circumferential direction. The lower end of the outer wall sheath (3 a) of the cooling fluid return portion (1 4) and The upper end of the cooling wall (1 3) is perforated with a slit (1 8) diagonally below the opening towards the bottom of the body (4). The cooling wall (1 3) printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is heat-resistant. It is made of a metal plate material with good resistance and corrosion resistance. The shape of the embodiment shown in the figure is a narrow truncated cone. Of course, it can be cylindrical, but in order to make the cooling fluid (20) smooth. It flows down and is preferably a truncated cone with a narrow bottom. At the bottom of the exhaust treatment tower body (3), as in Example 1, a joint (1 0 a) is installed and assembled in the cooling wall (1 3). The bottom part (4) of the inner insulating member (9) is detachable. An aggregate is formed between the aforementioned cooling wall (1 3) and the bottom part (4) of the main body (23). ) A4 specifications (210X297 mm) 508263 A7 B7 V. Description of the invention (2i The cooling fluid gathering part (2 1) of the cooling fluid (20), and the cooling fluid (20) gathered in the cooling fluid gathering part (2 1) directly cools the insulating material (9). 3b) The lower end is provided with a cylindrical shielding wall (19) formed by a hanging corrosion-resistant metal, which covers the inner periphery of the upper part of the cooling wall (1 3), and is provided below the shielding wall (1 9). The inert gas supply nozzle (2 6) is formed to penetrate the cooling wall (1 3). The inert gas (I) blown from the inert gas supply nozzle (2 6) into the bottom of the exhaust gas decomposition processing chamber (1 a) can be rotated in the bottom (4) and simultaneously with the decomposed exhaust gas (F) -Exhaust from the gas exhaust (exhaust) section (5). In this way, when the hanging shielding wall 19 is arranged and the inert gas is blown into the bottom of the exhaust gas decomposition processing chamber (1 a) from the inert gas supply nozzle (2 6), the spiral wall (1 3) is formed even if it is spirally formed. The cooling fluid (20) flowing down the inner sloping surface is heated to evaporate. The vapor can also be shielded by the shielding wall (19), making it difficult to flow into the exhaust decomposition processing chamber (1a). The vapor of the cooling fluid (20) causes a situation that hinders the thermal decomposition reaction. In addition, the gas in the exhaust decomposition processing chamber (1a) is exhausted from the exhaust decomposition processing chamber (1a) because of the exhaust portion (5) arranged at the bottom. Therefore, the exhaust decomposition processing chamber (1a) a) there is always a downward flow state, so that the vapor of the cooling fluid (20) in the cooling section (12) rises and flows into the exhaust decomposition treatment chamber (1a) with very little danger, But with the shielding wall (19), the danger can be eliminated even further. Figures 5 and 6 are other embodiments of the cooling section (1 2), which are used instead of the paper size to apply the Chinese National Standard (CNS) A4 specification (210X297 mm) --- ^ --- "---- m-pack -丨 (Please read the notes on the back before filling this page) Order 4 Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Cooperatives, printed 508263 A7 ______ B7 _ V. Invention Description (2 sessions (please read the notes on the back first) Fill in this page again) Set the return wall (15) and the discharge pipe (1 7 a) along the direct cooling wall (1 3), and a ring-shaped collecting liquid ring (24) is arranged below the cooling wall. (1 3). The surrounding liquid ring (2 4) and the cooling wall (13) are formed between the cooling liquid (20) and the cooling liquid (20). As a result, the discharge pipe (17a) The cooling fluid (20) sprayed out will spiral down along the inner periphery of the cooling wall (1 3), and a part of it will flow down through the gap, and the remaining part will be blocked by the gathering liquid ring (24). This state At this time, the vapor of the cooling liquid (20) can be shielded by the function of the shielding wall (19) and the inert supply nozzle (2 6), making it difficult Into the exhaust gas decomposition processing chamber (la). Moreover, the cooling part (12) of Figs. 2 to 6 uses water as the cooling fluid (20), and the cooling fluid (20) can be directly exposed to the exhaust gas treatment tower ( 1) The direct cooling jacket flowing from the bottom, so as not to affect the high temperature environment in the exhaust treatment tower (1), the height of the direct exhaust treatment tower (1) should be sufficient. The cooling fluid (2 When the inert gas such as nitrogen or argon is used, the tower height can be lower than the cooling fluid (20) when it is water. It is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economics. For the direct cooling jacket method, if, for example, a refrigerant circulation pipe (not shown) is arranged in or on the bottom (4) of the body, and a cooling fluid (20) is circulated between the cooling jacket (not shown), Next, the dust removal mechanism (2) to be installed in the exhaust treatment tower (1) according to the present invention will be described in accordance with Figs. 9 and 10. It lies in the top portion (lb) of the exhaust treatment tower body (3). ), Installed with a number of paper sizes applicable to Chinese National Standards (CNS) A4 regulations (210X297 mm) -25- 508263 A7 B7 V. Description of the invention (2 $ (in this embodiment, 3 tubes are installed at an interval of 120 °), the first dust removal mechanism (2a) formed by the tube, its lower end The opening is at the top of the electric heater (7) or facing the aforementioned top and the inner side wall (1c) of the exhaust treatment tower body (3), and further, a through hole (2 ^) is penetrated to the side of the protruding portion. Of course The aforementioned dust removing mechanism (2a) is not limited to the aforementioned situation, and as shown in FIG. 10, the front end of the powder dust removing mechanism (2a) may be bent along the top portion. The main purpose of the dust removal mechanism (2 a) in this part is to blow away the dust adhered and accumulated on the part from the top part (1 b) to the upper part of the inner side wall (1 c). Of course, the front end of the dust removal mechanism (2a) can also be bent toward the center circle tangent to the exhaust treatment tower body (3), so that the inert gas (I) can rotate along the top portion (1b). When the front end of the dust removal mechanism (2a) is facing the top of the electric heater (.7) or the opening between the top and the inner wall (1c) of the exhaust treatment tower body (3), the deposit can be blown away. Dust on the top of the electric heater (7) or the upper part of the inner wall (1c) of the exhaust treatment tower body (3). A second dust removal mechanism (2b) formed by the pipe is inserted into the lower end portion of the air supply pipe (6) to form an opening from the bottom of the air supply pipe (6) toward the upper end to blow out inert gas (I) intermittently. As a result, the accumulated dust (G) of the air supply pipe (6) can be blown away, and especially the dust (G) accumulated on the inside of the upper opening. Furthermore, from the bottom (4) side of the main body (3) of the exhaust treatment tower body, a first tube formed by a plurality of tubes (three locations separated by an interval of 120 ° in this embodiment) is installed on the surface. 3 Dust removal mechanism (2c). And this paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) ~ (Please read the precautions on the back before filling out this page)-Binding and ordering printed by the Ministry of Economic Affairs Intellectual Property Bureau employee consumer cooperatives 508263 Ministry of Economic Affairs Printed by the Intellectual Property Bureau employee consumer cooperative A7 _ B7 _ V. Description of the invention (2 The insertion end (28) of the 3rd dust removal mechanism (2c) is from the inner side wall of the exhaust treatment tower body (3) (1c ) The bottom end and the electric heater (7) are bent upwards to form intermittently blowing inert gas (I) on the inner wall (1c) of the exhaust treatment tower body (3) and the electric heater (7). ) In order to blow away the accumulated dust (G) in the aforementioned part. In addition, the aforementioned inert gas (I) generally uses nitrogen. Of course, other inert gases may be used as required, such as argon. Although the dust removal mechanism (2) is formed as a tube, it can of course be composed of objects other than the tube, and is not limited by the foregoing example. A nozzle 11 for blowing oxygen (or air) is inserted in the row Top part (1b) of the gas treatment tower body (3) The side wall is used for the exhaust gas (F) in the exhaust gas decomposition processing chamber (1 a) in the thermal decomposition gas decomposition processing chamber (1 a). Next, the embodiment (A) of FIGS. 9 and 10 will be used. ), And the repeated parts will be omitted. The exhaust gas (F) discharged from the semiconductor manufacturing device will be discharged through the front scrubber (30) and the gas delivery pipe (34). The decomposition processing chamber (1 a) is decomposed. During this period, the exhaust gas (F) comes into contact with the insulating member (9) and is cooled, and then the rising air supply pipe (6) can be sufficiently preheated by the surrounding temperature. Moreover, the exhaust gas (F) at this time still contains a small amount of dust (G) that cannot be removed by the front scrubber (30), and will adhere to the inner surface of the air supply pipe (β). As mentioned above, although It can be heated when the air supply pipe (6) is raised, but if Si (Η) (silane) is contained in the exhaust gas (F), the air supply pipe (this paper size applies Chinese National Standard (CNS) A4 specification (210 × 297 mm) _ 27 _ I— 丨 ΊΤ (Please read the precautions on the back before filling out this page) Binding · Order 4 508263 A7 B7 V. Description of the invention (2 $ (please read the precautions on the back before filling in this page) 6) The middle part is heated to 4 0 ~ 5 0 0 ° C, which is decomposed to produce a large amount of powder. (G). If the second dust removal mechanism (2 b) is provided as described above, the lower end of the air supply pipe (6) is bottomed, and the inert gas is blown intermittently from the front opening (2) upward (I). ), The dust (G) attached to the inner surface of the gas supply pipe (6) can be blown into the exhaust decomposition processing chamber (1 a) by the gas pressure. As a result, the large amount of dust (G) will enter the exhaust decomposition processing chamber (1 a), and will adhere to the top portion (1 b). The front end portion of the gas supply pipe (6) has reached the thermally decomposable exhaust gas. (F) high temperature. Therefore, when the exhaust gas (F) discharged from the cleaning process contains C2F6, when it is in high temperature environment near the top part of the electric heater (7) or the top part with a very high temperature and has When oxygen (or air) is blown into the top part (1b), it can be effectively thermally decomposed. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs The aforementioned dust (G) attached to the top part (lb) will be processed by the first dust removal mechanism (2a) provided on the top part (lb). That is, a part of the inert gas (I) blown from the first dust removing mechanism (2a) formed with a through hole (2 /) on the side and a lower end opening (2 4), will be opened from the lower end (2 <) It is blown out toward the front end of the electric heater (7) or the inner wall (1c) of the exhaust decomposition processing chamber (1a), and the powder dust (G) accumulated in the part is blown out. On the other hand, the remaining inert gas (I) will be blown out along the top part (1 b), and the dust (G) accumulated in this part will be blown off. The aforementioned dust (G) will be in the exhaust decomposition processing chamber (1 a) together with the decomposed exhaust gas (F), and the top part (1 b) will face this-28. CNS) A4 specifications (210X297 mm) 508263 A7 _ B7 _ 5. Description of the invention (2 preparations (please read the precautions on the back before filling this page) The bottom of the body (4) will flow down. At this time, the aforementioned dust (G) will It is attached to the lower inner wall (lc) of the lower part of the exhaust gas decomposition treatment chamber (la). For this reason, the third powder removing mechanism (2 c) will operate and operate. That is, it is arranged on the bottom of the body (4), The opening (22) faces the third powder purge removing mechanism (2c) toward the top, so as to form an inverse gas (I) intermittently toward the top in a direction opposite to the downflow direction of the decomposed exhaust gas (F). When the vortex is generated, the dust (G) in the part can be effectively blown away, and the blown away dust (G) will be the same as the decomposed exhaust gas (F)-arranged at the bottom of the body (4). The decomposed gas delivery pipe (3 5) is sent to the scrubber (40) in the next process. Sex liquid or medicinal liquid such as water is used to wash and lower the temperature of the liquid medicine, and it is released into the atmosphere by an exhaust fan. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. Figure 13 shows the dust removal mechanism ( 2) The graph of the powder removal effect of Si H4 and C2F6 implemented, Figure 14 is a comparative example. In the situation of Figure 13, due to the operation of the aforementioned dust removal mechanism (2), it intermittently operates, Therefore, the dust (G) in the exhaust treatment tower (1) is small and does not increase. Even after the operating cycle (cycle) of the semiconductor manufacturing device is 160 cycles, the removal efficiency and the removal efficiency of Si H4 and C2F6 cannot be seen. The decrease in the heater output makes it possible to extend the maintenance period of the exhaust treatment device (A) significantly. In this case, the comparative example shown in FIG. 14 shows that the dust (G) can gradually accumulate in the exhaust treatment. In the tower (1), the space in the exhaust treatment tower (1) is gradually narrowed (narrowed), and the differential pressure (pressure difference) between the inlet and the outlet of the device gradually becomes high. -29-This paper size applies to China Standard (CNS) A4 specification (210X297 mm) 508263 A7 B7 V. Description of the invention (2 > (Please read the precautions on the back before filling this page) Where the cycle is 40 cycles, the removal efficiency of S i H4 It gradually becomes poor, and the removal efficiency is rapidly deteriorated in the vicinity of 42 cycles or 43 cycles. On the other hand, at C2F6, the removal efficiency is also rapidly deteriorated in the vicinity of 43 cycles. The heater output is also the same. The formation is greatly reduced in the vicinity of 43 cycles. Therefore, in the comparative example, it is necessary to stop the production line of semiconductor manufacturing before the 40 cycle at the latest, and clean the device of the comparative example by disassembling it. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Next, the methods for maintaining the exhaust treatment tower (1) will be explained. The thermal decomposition of the exhaust gas is performed in the exhaust treatment tower (1) by the electric heater (7), but as mentioned above, at least a high temperature of 140 ° C or higher is required for the thermal decomposition. In addition, the exhaust gas (F), which is the object of thermal decomposition treatment, is also explosive, corrosive, and extremely toxic. Therefore, the electric heater (7) has to be used under extremely severe (severe) conditions. As a result, the electric heater (7) using ordinary metal resistors cannot bear it. Therefore, a ceramic resistor with silicon carbide as the main body is used. However, even if these are used, deterioration or breakage gradually occurs. The internal structure (4 5) attached to the internal components (3 a) or the gas supply pipe (6) is also damaged, so it is necessary to periodically pull out the internal structure (1) from the exhaust treatment tower (1). 4 5) to replace the electric heater (7) or the air supply pipe (6) with a new one, or to strengthen and repair the internal components (3 a). In order to perform such maintenance, the piping or wiring connected to the exhaust treatment tower (1) is removed so that the exhaust treatment tower (1) becomes freely separated, as shown in FIG. 11 Use the support shaft (2 8) as the center to rotate the exhaust treatment tower (1) and then pull out the casing (box) (2 7). -30- This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) ) 508263 A7 B7 _ V. Description of the invention ((Please read the precautions on the back before filling out this page) The bottom of the exhaust treatment tower (1), and it is fixed in an inclined or horizontal state. Although the fixing method is not particularly It is limited, but here, the exhaust treatment tower (1) is locked by a locking rod (2 5) erected between the pedestals (120) to maintain an inclined or horizontal state. Then, the joint (1 0) is loosened a) and pull out the internal structure (4 5) from the bottom of the exhaust treatment tower body (3). and replace the electric heater (7) or the gas supply pipe (6) with a new thing, or strengthen and repair the internal components ( 3 a) and other necessary operations, then use the joint (1 0 a) to fix the internal structure (4 5 ) At the bottom of the exhaust treatment tower body (3). Then, remove the locking lever 25, turn the exhaust treatment tower (1) in a vertical direction, and fix it to the stand (120) at the vertical position, and finally connect The piping or wiring is in the original state, and a series of repairs can be completed. Printed on Figure 12 by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is another example, and this state is hanging from the top of the exhaust treatment tower body (3) The electric heater (7) is installed, and when maintenance is required, the state of the internal structure of the electric heater (7) installed on the top is inserted and removed. At this time, a support shaft (2 8) is provided. The lower part of both sides of the sheath (3 a) protruding from the outer wall of the exhaust treatment tower body (3 a) (of course, the upper part of both sides is also possible), and is supported by a bearing (2 9) arranged on the stand (120). When maintenance is needed, the exhaust treatment tower (1) is laid down with the support shaft (2 8) as the center so that the top of the exhaust treatment tower body (3) will be exposed outside the casing (2 7). , And the exhaust treatment tower (1) is locked at, for example, a stop mounted on a stand (1 2 0) (2 5) In order to maintain a slanted or horizontal scale, the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ~ 508263 A7 B7 V. Description of the invention (2 orders state, and the same as before, pull out The internal structure (4 5) with electric heater (7) needs to be repaired before it is installed. (Please read the precautions on the back before filling out this page) [Effects of the invention] The present invention is equipped with The electric heater power supply section arranged in the exhaust decomposition treatment chamber is erected to bury the bottom of the bottom of the tower body at the exhaust where the temperature is lowest, so that the upper part (top part) of the exhaust treatment tower body can be heated even if it becomes high temperature. Keeping the power supply unit to a lower temperature can prevent short circuit accidents in the power supply unit during operation. In addition, a gas supply pipe for low-temperature exhaust is inserted at the bottom of the body, so that heat exchange is performed between the bottom of the body and the gas supply pipe to preheat the exhaust side, so that the bottom side of the body is cooled. It can also contribute to preventing short-circuit accidents in the power supply section. Furthermore, when a cooling section is provided in the exhaust treatment tower, in addition to the cooling effect described above, a more effective cooling effect at the bottom of the body can be added, so that the power supply section can be effectively prevented from causing insulation damage. Such a cooling section can also be provided. The electric heaters printed by the employee's consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs and used in the above, can be connected to a plurality of electric heaters by using a fitting hole provided by a perforation. Therefore, it can be processed into an exhaust decomposition processing room to be processed into Any size makes it extremely convenient to use. Furthermore, the present invention constitutes a dust removing machine 耩 opened from a dust accumulation part facing the exhaust decomposition processing chamber of the exhaust treatment tower main body, and the inert gas is intermittently sprayed from the dust removing machine into the exhaust decomposition processing chamber. Therefore, extremely fine and light dust such as cotton dust can be blown away with great efficiency and discharged out of the device, so that it does not accumulate in the device. Therefore, it can be prevented that -32- This paper size applies to the Chinese National Standard (CNS) A4 specification (210 ×: 297 mm) 508263 A7 ___ B7 __ V. Description of the invention (3 preparations (please read the precautions on the back before filling in this Page) The dust makes the space inside the device narrow, so that the function of the device can not be damaged for a long period of time, and the maintenance period can be greatly extended compared to the conventional device. In addition, the present invention Because the exhaust treatment tower is pivoted on the outer casing (box) to be rotatable, during maintenance, the exhaust treatment tower can be inverted to a horizontal or inclined state to pull out the bottom or top of the exhaust treatment tower outside the casing. It can be fixed in a horizontal or inclined state so that maintenance can be performed in this state, which can solve the problem of so-called high-level work or the low top of the clean room, or the piping structure in the housing. Or the formation of the containment mechanism is extremely complicated, which makes it extremely difficult to insert and remove the internal structure from the bottom of the exhaust treatment tower body. [Simplified Description of the Drawings] FIG. 1 illustrates the exhaust gas analysis of the present invention. Sectional view of the structure of the first embodiment of the processing device. Fig. 2 is a cross-sectional view illustrating the structure of the second embodiment of the exhaust gas decomposition processing device of the present invention. A horizontal cross-sectional view of the cooling part of Fig. 2. Fig. 4 is an enlarged longitudinal cross-sectional view of Fig. 2-a part. Fig. 5 is a cross-sectional view illustrating the structure of a third embodiment of the exhaust gas decomposition treatment device according to the present invention. 5—A partial longitudinal sectional view. Figure 7 is a partial sectional view seen from the front of the electric heater used in the present invention. -33- This paper size is applicable to the Chinese National Standard (CNS) A4 specification (21 × 297 mm) 508263 A7 B7 V. Description of the invention (3) Figure 8 is a plan view of Figure 7. (Please read the precautions on the back before filling out this page) Figure 9 illustrates the installation of a powder dust removal mechanism on the exhaust treatment tower of the present invention Sectional view of the structure at the time. Fig. 10 is a cross-sectional view illustrating the structure of another embodiment of Fig. 9. Fig. 11 is a diagram illustrating the structure of the suspension holding structure of the exhaust gas treatment device of the present invention. Figure 11 of the other embodiment Schematic illustration of the structure. Figure 1 3 is a graph of the removal period (of harmful gases) according to the present invention. Figure 14 is a graph of the removal period (of harmful gases) according to the conventional example. Figure 15 is a description of the conventional exhaust gas. Sectional drawing of the schematic structure of the decomposition processing device. [Explanation of symbols] (F): Exhaust gas (la): Exhaust gas decomposition processing chamber Printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs (3): Exhaust gas treatment tower body (4): Bottom of the body (6): Air supply pipe (7): Electric heater (8a, 8b): Power supply (feeder) department -34- This paper size applies to China National Standard (CNS) A4 specification (210X297 mm)