TW442842B - Effluent gas stream treatment system for oxidation treatment of semiconductor manufacturing effluent gases - Google Patents

Abstract

An effluent gas stream treatment system (903) for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations (901). The effluent gas stream treatment system comprises a pre-oxidation treatment unit (905), which may for example comprise a scrubber, an oxidation unit (913) such an electrothermal oxidizer, and a post-oxidation treatment unit (917), such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer (852), quench (862) and wet scrubber assembly (870), for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures (1060, 1110).

Description

442842 A7 B7 V. Description of the invention (1) Field of invention invention covered by the Ministry of Central Standards Ordnance Industry Cooperatives The present invention relates to a system for processing industrial exhaust fluids, such as those produced in semiconductor manufacturing, photoelectric processing, etc. gas. This system can operate in a variety of ways including an oxidizer, gas scrubbing, particulate solids removal, and other units for processing exhaust gases. Explanation of Related Techniques When processing industrial fluid waste streams, people have integrated various unit operations and corresponding individual processing devices for processing effluents from upstream processing facilities. For example, there are various integrated thermal systems on the market for semiconductor manufacturing. Effluent and photoelectric treatment exhaust gas. These integrated systems are generally targeted for use with C \ / D, gold cane etching, etching, and heterodyne implant tools. Commercial integrated systems include Delatech Controlled Decomposition Oxidizer (CDO), Dunnsch icht Anlagen Systerae (DAS) escape system, and Edwards Thermal Processing Unit (Therma 丨 Processing Unit, TPU) * 3 each of these The commercial system consists of a heat treatment unit for oxidative decomposition of exhaust gas, a wet quench for temperature control of exhaust gas from the thermal oxidation section, and a wet scrub for removal of acid gases and particulates formed during the oxidation process. System combination. In De 丨 atech CD0, the thermal system includes an electrically heated tube, which can optionally be combined with a flame-based plug-in hydrogen injection system (Hyd "〇Sen Injection System, HIS for short), for breaking through from the exhaust air flow. Compounds that are particularly difficult to remove. In the above DAS escape system, the thermal oxidizer is based on a flame, using 02 as an oxidant and methane or hydrogen as a fuel. N-. I-»i-rr—— i- Γ t. I--! I-—a-il ·. ^ (Please read the precautions on the back before filling this page) This paper size applies to Chinese National Standard (CNS) A4 (210X2W mm) 4 ϊ 442842 Α7 Β7 Ministry of Economy The Central Bureau of Standards has another τ, the cooperative cooperative printed t. 5. Description of the invention (2) I 1 I In TPU, the thermal oxidizer contains-a flame-based surface combustion unit, whose 1 1 I uses air or 0 2 as an oxidant and methane As m / > »« * Material 〇i 1 In addition to these integrated commercial systems, there are also a variety of commercial singles-please first 1 1 1 unit operating system for processing exhaust airflow, including: a) Heating physical adsorption read back 1¾ 1 packed bed dry scrubber, b) unheated chemisorption packed bed dry scrubber, C) plus < ί 1 Γ thermochemical reaction packed bed dry scrubber, d) heating catalytic reaction Compaction bed washing matters 1 I, e) Wet scrubber, and f) Flame-based heat treatment unit 0 Depending on the nature of the airflow that undergoes the writing process, each of these unit operation techniques is suitable for a certain page V -1 1 Some applications 0 1 i Normally »Each of these individual technologies is based on a special removal mechanism that provides a specific discharge stream to 1 1 part. A) The components of the discharge stream that need to be removed in the remover 1 are structured as follows: It is sufficiently similar that a single removal technique can eliminate all the air and body hours cut by 1 I, or b) a specific sub-group gas stream 1 1 I component that does not respond to a specific removal mechanism, and its characteristics are such that the gas flow component Substance can be discharged No need to eliminate 1 1. Peptide and other technologies can provide excellent elimination. 1 Sometimes the last 1 of the above-mentioned systems based on independent single unit operation can choose to combine two or more of these various processing units. ≫ 1 Note 1 1 for a processing sequence. For each type of gas that passes through the system] Although ί 1 I is so, the implementation of this integrated equipment approach for the user after a is significantly more than the original 1 1 The equipment manufacturer is inconvenient, because the original equipment manufacturer can! 1 First, a single small processing unit is provided. The system provides the integration of various operation and processing units 1 1 0 In contrast, the end user must actually modify the component independent unit for the whole 1 I Combined Assembly and Operation 〇1 1 1 In addition, although in some applications, these original design manufacturers integrated the row 1 1 This paper size applies to China National Standard (CNS) A4 (210X 297 mm) 5 442842 A7 B7 via M-Part Standards Bureau, Industrial Cooperatives, Cooperatives, Cooperatives, Fifth, Invention Description (3) 1 1 1 The air flow treatment system can obviously have advantages over the single-unit operation% system I 1 1, but-generally, it can be implemented, for example The 1 I and other integrated systems of gasification, quenching, and washing unit operations have various shortcomings, including: ititkl. The particles are clogged in the respective sections μ and please read 1 1 f in the oxidizer section. At the part, particles are generated in the oxidation section, and the acidic gas in the scrubber section is read poorly. The acidic gas is not cleaned for the acidic gas. The high water consumption of the acidic gas is 11 and the grain is washed. Condensation of saturated exhaust gas in the reactor section leads to acid matters 1 I The collection and concentration of hydrates. The blockage of the inlet can be caused by a number of sources. This includes: (a) combustion as an oxidizer section The water vapor of the material is still moved to page II, resulting in M-a non-uniform or uniform way and the water-sensitive gas entering the water, such as the hydrolysis reaction of 1 1 j such as BC 1 3 or WF6 i (b) thermal sensitivity of entering The thermal decay of the gas 1 1; and U) the gas entering the system due to the condensation of the transition point in the system. Such a blockage problem may need to include a plunger mechanism or other solid removal device r I 1 to keep people □ frtr m. Solid accumulation demon »〇, and these mechanical placements increase the system 1 1 considerable cost and labor 0 In other situations, the problem of the blockage of person D may be a system of i 1 I and requires regular preventive repairs, Η Keep the entrance □ free of solid accumulation. However, this type of maintenance requires system downtime and lost productivity at the manufacturing facility. Existing integration point 1 using gas effluent treatment systems may also be in the factory. Experience in washing wastewater treatment Difficult problems 〇1 I Several factories treat η Fluorine (F-) 1 1 in the waste water produced by these point-of-use systems, or more often, in the treatment of 1 1 waste water produced by the gas effluent treatment system itself Can be difficult. 1 1 When the quality of the feedwater is poor when the integrated system of the treatment facility can be used »The water scrubber 1 I and the quenching part may also have clogging problems. In the southwestern United States, this is a general 1 1 I. In many areas, it is not easy to have Available water, high cost of water, and discharge 1 1 This paper size applies Chinese National Standard (CNS) A4 (210X297 mm) 6 442842 A7 B7 V. Description of the invention (4) The high cost of waste water disposal is also significant problem. In some cases, these factors necessitate the use of high-quality deionized water in the treatment facility to prevent clogging problems. Although effective in preventing scrubbers and quench packers, this solution involves a high cost associated with the actual cost of high quality deionized water for the owner. During the scrubbing operation, the poor scrubbing of the acid gas in the scrubber may be due to the small flow rate that passes through these systems. The diameter of the washing towers that handle these small flow rates is correspondingly small. When combined with the conventional large diameter C packing, the diameter of the c packing element may be too high, and the large diameter of the column may be caused in the washing tower. effect. This type of scrubber therefore requires a large water flow. It may cause channeling effects, overflow and lag, while the treated gas bag passes through the scrubber system without treatment. Due to the poor washing of these systems, the pipes downstream of these systems are often corroded due to the condensation of untreated exhaust gas from the scrubber. The halide gas is treated in the exhaust stream, and the exhaust gas from the washing tower will contain unwashed halogen contents due to the poor washing performance of the scrubber. Unwashed halogen content may cause pools of highly concentrated acids to condense under VLE dew point conditions, and actually be higher than expected acid / water temperatures. Summary of Inventions -Industry and Trade Cooperatives of the Central Bureau of Standards, Ministry of Economic Affairs-I —ΐ I ^^ 1 '-I H' · I ^^ 1 ^^ 1 I_ -------1 ^ _Ψ Λτν- ° (Please read the notes on the back before filling in this tribute.) The present invention relates to an integrated exhaust gas treatment system, which has facilities for processing industrial gas effluents, such as those generated during the manufacture of semiconductor materials and devices. In one aspect, the integrated exhaust gas treatment system of the present invention is configured to include some or all of the following system components. For example, a unitary housing as a lightweight point-of-use device: (i) a pretreatment unit for acid Removal of gases and particulates (such as one (pre)) This paper size applies Chinese National Standard (CNS) Λ4 specification (210X297 mm) 7 442842 A7 Printed by the Central Bureau of Standards and Consumers ’Cooperatives ^ B7 V. Description of the invention ( 5) scrubber); (ii) an electro-oxidizer or other oxidizer unit; (in) —oxidizer exhaust quench unit; (iv) —acid gas scrubber unit; (v) gas flow induction device such as An active motive flow device (blower, fan, pump, etc.) or a passive flow device (ejector, ejector, suction nozzle, etc.); M and (vi) associated control devices, which may include, for example, an inflow gas temperature control device ( Examples include a heat-tracing foreline pipe, heat exchanger, or other device to ensure proper hot gas flow through the integrated system), power supply unit (surge protection, continuous power (U PS) connection or dedicated UPS components, etc.), and other processing control components and sub-assemblies for use in the system, during its operation, monitor and selectively adjust the processing c conditions (temperature, history, flow rate, and composition) . The integrated exhaust gas treatment system of the present invention can utilize a pre-washer, oxidizer, and scrubber assembly. Combined with a population structure for directing a fluid flow to the assembly from an upstream processing facility, or otherwise for A processing airflow flows from an upstream airflow source to a downstream trajectory within the processing system. In a spring embodiment, this population structure includes first and second substantially vertical flow channel sections, which are coupled in series with each other. A generally vertical flow channel is defined by this series coupling pseudo, containing particulate solids. The fluid flow can flow from an upstream source of particulate-containing solid fluid to a downstream fluid processing system configured to accept a mass flow into the inlet structure. The first flow channel section is an upper section of the inlet structure and includes an inner gas-permeable wall, which may be made of a porous metal or ceramic, or other suitable structure ^^^ 1 -1 ^^^^ 1 1 sm I \ p / {Please read the precautions on the back before filling in this i) This paper size is applicable to China Store Standard (CNS) A4 specification (2 丨 0X 297 mm) 8 442842 Α7 Β7 The Central Standards Bureau of the Ministry of Economic Affairs also eliminates the cooperative Print

V. Description of the invention (Θ) I I | Material formation, encapsulating the first--upper part of the flow channel < > The breathable inner wall has an inner III surface bounding the upper part of the flow channel. II. I The breathable wall is enclosed by an outer wall. Peripheral r is opened and closed on the breathable inner wall. II. The outer wall is characteristically. Non-porous, but with a low-pressure gas flow D amma read back δ III With this configuration, an internal note is formed between the breathable wall and the outer sealing wall in each section. I Note I Partial volume 0 Items II Re I Low-pressure gas flow □ It is possible to couple the low-pressure gas source into a flow relationship writing, for example, by appropriate valves and control devices, to make this gas flow at a predetermined low rate. I | into the internal annular volume 1 for low-pressure gas aging inside Annular volume inflow III moving channel 0 A high pressure gas flow P can also be optionally provided to M in the first flow II moving channel section The outer wall is coupled to a high-pressure gas source in a flow relationship for I to order this gas to break into the internal annular volume. 9 This high-pressure gas flow is used to clean the inside. II. Breathable walls may have been deposited on its inner surface (in the first- -Any particle in the flow channel zone (boundary flow channel II) any high pressure gas) can also be controlled to flow in the desired pressure by the appropriate valve II [and the control device 0 I r the second flow channel section is coupled in series to the first flow Channel section * II for particulate-containing solid fluid flowing down from the first flow channel section to the second flow I channel section 0 The second flow channel includes--the outer wall, of which-liquid injection II □, which can be used with-- Liquid source, such as water or other processing fluids coupled. Outer wall II | May be coupled to the first-flow channel section by mating II flanges on the respective outer walls of the first and second flow channel sections 〇 The second flow channel includes an inner weir II wall, which is spaced apart from the outer wall to define an internal annular volume therebetween, and the II inner weir wall extends to the breathable wall within the first flow channel section but stops Less than II in this breathable wall »Μ in the first and second stream au, the respective EI of the moving channel section This paper size applies to the Chinese National Standard (CNS) A4 specification (210xπ7 mm) -9-442842 A7 B7 Printed by the Central Bureau of Standards of the Ministry of Economic Affairs, Beigong Consumer Cooperatives V. Description of the Invention (7) 1 1 | A gap is provided between the inner walls, defining an overflow weir. When the liquid flows into the internal annular volume between the outer wall and the inner wall of the second flow channel 1 1, the inductive liquid 1 I read 1 I overflows the overflow weir 3 and the inner surface of the inner wall of the second flow channel segment Downward reading 1 I. The flow of this liquid along the inner wall is used to wash away any particulate solids from the wall. Read the back 1 f I • and inhibit solids from depositing or forming on the inner wall surface of the inner wall. Note 1 I— And the second flow channel section are flange-connected to each other and may include-Item 1! Again 1.  1 Quickly release the clip assembly, K should be able to easily disassemble the individual sections of the entrance structure — and fill in the second flow channel section of the spring. Page 1 I And the first flow channel section of the 1-into P structure can be joined to a top-in IIP structure to quickly separate the inlet section, which can also be easily disassembled for cleaning and maintenance. In one aspect, the present invention is based on an exhaust gas treatment system, including a 1 I pre-washer for removing acid gases and particulates from the exhaust gas, an oxidizer 1 | for oxidation treatment of oxidizable components in the exhaust gas stream, and A subsequent water washes the 11 device for washing and exhausting the air stream after its oxidation treatment. In this pre-washing / oxidizing 1 r / washing tank, a gas / liquid interface structure can be used.  When the gas / liquid 1 I interface structure receives the heat emitted by the oxidizer and is filled with particulates, containing 1 part of the gas stream of the corrosive group, its resistance to solid deposition, blockage and corrosion> This gas / liquid interface 1 | surface The structure includes: 1 I — a first vertically extending inlet flow channel member defining a first 1! Gas flow flow path therein, this inlet flow channel member has--upper inlet 1 for directing 1 1 airflow to the airflow flow path And--the lower outlet end for discharging airflow from the airflow path after the airflow has passed through the airflow path of the 1 1P flow channel member »1 I a second flow channel member, externally connected to the first flow channel member, and Its content is 1 1 This paper size is applicable to the Chinese National Standard (CNS) Λ4 size (210X 297 mm) -10-442842 A7 B7 Printed by the Central Standards Bureau Bureau of Military Industry and Consumer Cooperatives of the Ministry of Economic Affairs 5. Description of the invention (8) 1 1 Open a relationship outward to define in between--toroidal volume > this The two flow passages 1 1 1 member extends downward to a bottom of the first flow channel member below the P end i [the bottom of the P end y. This second flow channel member has-* the upper part of the liquid-permeable gambling AS Please read the back 1 1 I above the P end under the first flow channel member »and the impermeable body part 1 i 1 to define the air flow path of the second flow channel member * * Note 1 1 Outer wall member Encapsulated externally connected second flow channel member i and its defined matters 1 I JJ —- Encapsulated internal annular volume; M and fill in this + clothing t — 1 liquid flowing in the outer wall member □ »for the liquid The Mm wax guides the outer wall structure 1 | the enclosed internal annular volume ti I between the piece and the second flow channel member, so that the liquid introduced by the liquid flowing person P on the outer wall member enters the interior of the package 1 1 I seal Circumferential volume r and leaky flow through ΐΜ.  The upper part of the second flow channel structure 1 is permeable to the liquid permeable part t for the subsequent impervious 1 1 along the second flow channel component. The inner surface of the body portion is moved downwards in the second flow channel component. The inner surface of the 1 I liquid portion provides a downward flowing liquid film 1 VX to prevent micro 1 I Ifkju solids from depositing and accumulating on it 1 and the air flow flowing through the first flow channel member 1 y under the D end. Discharge 9 is a flow path for flowing through the second flow channel member 1 I and subsequently discharged from the gas / tired interface structure. 0 1 1 This configuration prevents the air flow from directly contacting the wall on the lower part of the structure. It is bounded by the inner wall surface of the second flow channel member. The upper part of the "leakage weir" from the second flow channel member is a falling water film 1 1 to prevent the accumulation of particulate solids in the second flow. The inner wall surface of the channel member. On this 1 1 equal wall surface, the original liquid flow conveys the emblem particles 1 1 in the air flow contacting the water film, and is baked downward from the gas / liquid interface structure. Also, prevent 1 1 in the air flow. Aggressive substance contact wall P It is subject to falling water on the lower part of the interface structure 1 This paper size is applicable to Chinese National Standard (CNS) AA specifications (2 丨 OX 297 mm) -11-442842 A7 B7 @ 济 部 中心 标 Jud Bureau member-x Consumer Cooperative Co., Ltd. 5. Description of invention (9) 1 1 1 Membrane protection ΰ 1 1 1 The liquid permeable part above the second flow channel member may be a proper porous structure 1 I and may include--porous Sintered metal wall or --- porous ceramic wall, please refer to 1 1 for the pore size. For example, about 0. The range from 5 millimeters to 30 micrometers, or even larger hole diameter. 5 Read back 1 1! The present invention is also-~~ »from the aspects.  A system for treating exhaust gas stream > Note 1 I [where the system includes a pre-washer unit «-oxidizer / quench m unit 1 and matters 1 I and 1 scrubber unit, wherein the pre-washer unit uses --Upstream gas / liquid contact% This tower is contacted, in which water flows downward from the upper part of the tower, and is in contact with the lower part of the tower * and contacts! 1! | 入 P structure is guided to be approximately horizontally aligned * and is protected against a 1 1 gas shield Zhao P Provides shielding gas to the inside and outside of the tubular member concentrically. Ordered to accept the exhaust gas The tubular member terminates inside the outer tubular member 0 and outer 1! The tubular member extends approximately horizontally into the lower part of the pre-washing tower and the outer tubular member 1 has a diagonal cut open and the P end is arranged in the pre-wash The lower part of the polyester tower. The diagonal cut end of the outer tubular structure 1 1 1 is set so that the maximum length of the peripheral portion is set to I. The diameter covers the shortest peripheral portion of the tubular member ζB £ τ. Therefore, the airflow 1 1 i is inside The tubular member is discharged into the internal volume of the outer tubular member and the white outer tubular member 1 is cut diagonally and the P end is discharged into the lower part of the pre-washing tower. By the maximum length of the outer tubular member, the peripheral portion is located in the outer tubular member. The minimum length of the perimeter 1 [Part I above 1 The outer tubular member is set to prevent pre-washing of falling liquid in the tower 1 i iri is awarded to enter this tubular member 0 Moreover, the configuration of the diagonal cut end allows 1 1 person to lead to the The gas flow of the scrubbing tower becomes 1 I at the entry point to enter the tower for contact with the falling liquid 1 I. In the exhaust gas treatment system of the present invention You can use r as more complete below 1 1 This paper size applies Chinese National Standard (CNS) A4 specification (210X297mm) —12 — 442842 A7 B7 (10) Various other structures of P described by 1 1 1 ΰ 1 1 | Many other aspects of the present invention can be achieved in various ways including the following features:! 1 1.  Provided in the unit box configuration — overall integrated gas effluent treatment, please read 1 1 1 system, including--unblocked population, pre-washer, oxidizer, wet / dry interface, m read back I 1 cold, after Scrubber and motive device Note 1 1 Meaning 1 I 2.  Use a pre-treatment subsystem for fluorination a to absorb 0 such pre-treatments% Matter 1 I then 1 to remove the exciton precursor 9 instead of trying to remove the microparticles that form during the oxidation process. It can be used such as--particle pre-removal system) page 'w · 1 | 3.  Provide all kinds of □ / hole injection type wet / dry interface or multi-hole type interface * It can 1! Actually reduce water use and make unnecessary system leveling) i 1 4.  Provide-The outer shell and tube heat exchanger type oxidizer uses the radiant flux on the side of the outer shell as a working "fluid" 0 1 I 5.  Supercooling provided in the water scrubber (along with other 1 I other features described more fully below) produces-a kind of non-condensing or least condensing design and enhanced heat storage, thermal i 1 I migration acidity and particulate washing. In addition, a The ejector for the fluid discharge 1 1 Μ makes the exhaust gas treatment system to the exhaust gas line of the treatment system »τ invisible i see" r "or if necessary 1 you can use these discharge devices to increase upstream processing! 1 unit (for example, semiconductor manufacturing Tool) suction (1 1 6.  Use a defogging net in the scrubber column as a filling element. This defogging 1 1 net can actually reduce the wall effect in the scrubber column with a small diameter. 0 in the scrubber column. I mass transfer and thermal transfer can be related to With standard commercial random washing 1 1 column performance is better or better > and the washing column with m-removing net achieves relative 1 I low pressure drop 0 the gap part above the washing column can also be m The design is 1 II, which constitutes the scrubber column. As a good particle collector, it can be filled freely without 1 1 This paper size is applicable to China National Standard (CNS) A4 specification (2iOX 297 mm) 442842 Central Ministry of Economic Affairs; bureau of r Monthly Consumer Cooperatives Co., Ltd. A7 B7 V. Description of the Invention (η) The same flexibility and the flexibility that can not be achieved with a scrubber column containing a demister net. 7.  The use of heat transfer reinforced inserts in the oxidizer to retrofit the exhaust gas treatment system is suitable for applications where different overall heat fluxes are required for the overall system operation. 8.  The saturated Η20 / exhaust gas stream is recirculated from the oxidizer unit in the exhaust gas treatment bar to the inlet of the oxidizer unit to provide a low-cost source of hydrogen for oxidizing perfluorocarbon (P PC). 9.  Chemicals can be added to the pre-washer, and K changes the characteristics of the materials to be washed by M. An illustrative example is the addition of NΗ3 to a tungsten hexafluoride effluent, and M forms ammonium tungstate. By K produces a material with increased solubility for washing and removal. 1 0. An evaporator reactor design was used for the oxidizer unit to eliminate the accumulation of reactant / product paint on the wall of the oxidation step. Π. Use a dual-fluid atomizing nozzle in the quench unit that receives the hot exhaust stream from the self-gasifier unit to minimize the volume of the quench unit, or use other droplet atomization devices instead in the quench unit. Such as an ultra-wave nozzle or a piezoelectric nozzle. 12. The gas effluent treatment system of the present invention is integrated with a specific semiconductor manufacturing processing tool. 13. Exhaust gas directing (inlet) devices are used to avoid blockages, such as anti-blocking inlet structures configured more fully as described below, for example. 14.  In the flexibility of the oxidizer unit, K utilizes electricity or K-flame based oxidation (methane, propane, hydrogen, butane), and / or uses air or a silicon force of 02. 15.  A wet scrubber or a dry scrubber is used as a pre-washing and post-washing device. 1 6. A fluidized bed thermal oxidizer unit was used. This paper size applies the Chinese national standard (CNS > Α4 is now (2 丨 〇Χ29? Mm) —1 4-^^ 1 n 1 ^^ — »n ^ —.  ! -I— —I— * — ^^ 1 HI '^ — f I n ^ i —, ·, vs (Please read the notes on the back before filling out this page) 42 8 42 Gongxiaoxian Cooperatives Innu A7 B7 V. Invention Description (12) 1 7. A non-PFC breaker PFC recycling / recovery unit is used in the exhaust gas treatment system. 18. A non-blocking oxidizer unit using inserts is provided for disrupting the laminar boundary layer of gas tumble flow. Many other aspects, features and embodiments will be fully understood from the subsequent disclosure. Brief Description of the Drawings Figures 1-3 are a gas effluent treatment system according to a ® embodiment of the present invention, the schematic diagram of the continuous flow section of which is shown in FIG. A variation of the flow chart of a gaseous effluent treatment system of a real pickled example. Fig. 4 is a schematic flow chart of a gas discharge radon treatment system according to another embodiment of the present invention. Fig. 5 is a schematic flow diagram of another embodiment of an exhaust gas treatment system spring according to the present invention. Fig. 6 is a schematic flowchart of a processing system similar to that exemplified in the flowchart of Fig. 9 showing a modification according to another aspect of the present invention. Figures 7, 8 and 9 are respective schematic flowcharts according to other aspects of the invention. Fig. 10 is a schematic flowchart of a gas effluent treatment system according to another embodiment of the present invention, showing a gas / liquid interface inlet structure coupled with a pre-washing tower. FIG. 11 is a schematic diagram of another gas effluent processing system according to the present invention, which is shown as being contained in a suitcase dice. FIG. 12 is a schematic diagram of a gas effluent treatment system according to another embodiment of the present invention, showing that each of its optional auxiliary rib paper sizes is applicable to the national standard (CNS) Λ4 specification (210X297 mm)- n-I-I -1 -I ^^^ 1 1--n ^ i li.  {Please read the precautions on the back before filling this page) -15-442842 A7 B7 V. Description of the Invention (13) 1 I \ Features 〇1 1 | Figure 13 is-Anti-blocking person according to the exemplary embodiment of the present invention / — ^ 1 Schematic Π B 结构 Drawing 1 Please read 1 1 first | Figure 14 is a back view of an anti-blocking person P structure according to the alternative practical example of the present invention. For — according to another embodiment of the present invention, the anti-plugging of the alternative embodiment is shown in FIG. 1 I is a schematic diagram of the structure t. FIG. 16 is according to the present invention. Schematic diagram of the P-joint W · i I structure 1 1 FIG. 17 is a schematic view of an exemplary embodiment of the present invention. Gas / liquid interface junction 1 1 Schematic cross-sectional front view 1 Order Figure 1 8 is the top plan view of the device of ΓΞΊ Drawing 17 —- Same feed configuration for 1 | Liquid transfer to IBQ shown in Figure 17 Enveloping internal annular volume of the interface structure »II Detailed description of preferred tube embodiments 1 1 Γ The giant of the present invention provides an improved gas effluent treatment system 1 I f, which can be used to treat all kinds of white corresponding to different properties Exhaust gas I 1 generated by industrial processes 0 i 1 In aspect 1, the present invention contemplates a system for oxidizing the exhaust gas stream generated by a processing unit I 1 above the effluent, wherein gasification and 1 1 washing are performed. Treatment M Eliminates hazards or otherwise undesirable in the exhaust air stream 1 1 mass 0 1 1 in-specific aspects) where this exhaust air stream is The system can include oxygen fb and washing 1 1 cleaning unit operation * where Ά The system is pre-structured and set to minimize the adverse effects of the painting body 1 1 I particles in the air stream, such as may be generated first from the upstream burial, or 1 1 Paper size applies to Chinese national standard (CNS > A4 size (210X297mm) -16-442842 A7 B7 Central Standard of Ministry of Economic Affairs-Union Press K-! 5. Description of the invention (14) 1 1 It may be discharged in the original place Produced by the physical treatment system »For example, the oxidation reaction stream 1 1 1 causes the exhaust gas flow to cause particulate reaction products. 1 Read 1 The present invention is also related to the exhaust gas treatment system, which uses a gas / liquid first read 1 I interface structure to make the fluid power. Characteristics have the least adverse effects, and minimize the accumulation of particulate solids on the back side 1 1 f, and suppress the inevitable plugging of solids in the system.) Note 1 In other aspects, the present invention contemplates an integrated heat treatment The system is comparable to and better than other integrated heat treatment systems on the market. 1 This integration is better than this system. This integration fills%. The gas-based gas treatment system combines front-end heat treatment with exhaust gas adjustment and provides the most Pages 1 I Low cost of ownership after the user 〇 1 1 I The integrated exhaust gas flow treatment of the present invention can use an electricity-based 1 1 thermal oxidation treatment unit 〇 Although the present invention is mainly explained in the subsequent description of this case Calculate 1% of the exhaust airflow treatment using an electric treatment unit »But please acknowledge 1 I know t The treatment system of the present invention can be replaced by Including other thermal processing 1 | management components, such as flame-based processing, fluidized bed processing > plasma 1 1 | processing, etc. 0 1 t Provide a modular platform based on flexible unit operation »This invention 1 1 The exhaust gas treatment system can be easily modified to combine various exhaust gas streams, such as the ejections from semiconductor manufacturing tools, and can be easily repaired without much effort. 1 I changed to include other unit operation processes. 0 1 1 r The exhaust gas flow treatment system of the present invention provides significant stupidity in the various embodiments of the present invention, which is superior to that of the prior art processing system 1 including the anti-component exhaust gas treatment system 11 yuan and the blockage of the associated flow pipes and channels. Enhanced corrosion resistance due to efficient gas / fat 1 1 interface structure »extended production in need of maintenance 1 I operating time 1 low water usage rate when using washing treatment > superior Z washing 1 1 paper Standards are applicable to China National Standard Vehicle (CNS) A4 specifications (210X 297 mm) -17-12B42 A7 B7 Month of the Central Bureau of Standards of the Ministry of Economic Affairs and Consumer Cooperation Du Yin " V. Description of the invention (15) I! | Efficiency, M emission Removal level is greater than 99, based on the weight of the washable substance. 99¾ 1 1 1, M and halogen-reducing substances such as HC 1, C 12 and HF are below TLV level. Dangerous materials 1 I Please oxidize oxidative breakdown m below 1 TL V level 1 Read the treatment tube downstream of the oxidizer unit. 1 I line eliminates the erosive condensation of acids. The component processing unit reads out the exhaust gas treatment. 1 1 I% The system's flexible configuration S Μ and the majority of the discharge of the upstream processing facilities should be responsible. 1 The gas source 〇Matter 1 1 Re 1 Consider the oxidizer unit in the exhaust gas treatment% system of the present invention »Oxidation Fill this device can be used-.  Power supply, power supply, thermal oxidation effluent, gaseous material, or gasifier can be used. Page 1 I Use fuels such as M and A 1 ^ 7 m 〇 If the system is set to Yin Shi during the oxidation treatment 1 1 1 perfluorocarbon 9 system can be It is set to use steam as a source of 1 1 to complete the destruction of the perfluorocarbon. 5 The gasifier is the medium for this oxidation treatment. 1 It may contain air, oxygen, or other oxygen-containing gases. When washing the 1 1 large hot exhaust air stream, it can be contacted with water for gas, and dispersed by the spray nozzle or other appropriate disperser for this contact »It makes the 1 1 J exhaust gas treatment system The droplet volume and water consumption m are small during operation. When treating 1 t · The oxidizer contains a significant amount of silica dioxide particle stream. · It may be advantageous to use a caustic solution as a quenching medium. Siliconized grain . 1 1 Exhaust gas treatment system compared to the previous technology »With regard to anti-blocking and 1 I Corrosiveness, the least water use, and the exhaust gas treatment unit in the treatment of the system 1 1 1 Μ A lightweight and efficient physical configuration In terms of flexibility, the system 11 of the present invention achieves various advantages. 1 1 In the exhaust gas treatment system of the present invention, the pretreatment unit M 1 can be used-before the particles and acidity of the white treatment stream reach the heating oxidation chamber. And when it is 1 I, it is removed at low temperature, I tone is used to simplify the load demand of downstream equipment 5 1 1 This paper size is applicable to China National Standard (CNS) A4 specification (21 × 297 mm) 18-A7 B7 Ministry of Economic Affairs The Central Standards Bureau only works with consumer cooperatives. 5. Description of the invention (1G)! 1 J Although the state / itk The previous art system may be clogged and needs to be introduced without special packing structure 1 1 1. The system of the present invention actually depends on the inherent Fluid dynamics First, prevent 1 I, please 1 1 system filling. II. The exhaust air treatment system of the present invention can be installed on a read back with appropriate small marks. 1 1 lightweight unit box »so that the box needs the floor in the processing facility. The space aspect 1 1 The minimum product is the smallest. The item 1 I 1 1 1 The exhaust gas treatment system of the present invention utilizes-* oxidation unit for oxidation and discharge of the substances filled in the gas stream. The oxidizer medium is preferably clean dry air, but Page 1 1 Use oxygen or gas-enriched air for this g 9 and any other f 1 I oxygen-containing gas with appropriate characteristics. The exhaust gas treatment system of the present invention can be used to produce 1 I exhaust gas. — _ Upstream The processing unit t or there may be many rows 1 of the order gas source 1 to exhaust its components The air flow is integrated into a total flow delivered to the exhaust gas treatment system of the invention [1] to eliminate the danger of this air flow or! 1 Otherwise it is an undesired component 1 Μ produces a final 1 that exhausts these components. I Exhaust matter 1 If there is a situation t If the composition of the exhaust gas stream changes over time due to the implementation of different exhaust gas treatments 1 1 r may be suitable for > λ A time-varying mode 1 operation. For example, in semiconductor manufacturing, _Chemical vapor deposition (ch em ί C a 1! 1 va P 〇r C ep 0 S it 1 0 η, abbreviated as CVD), in the deposition step m may produce 1 1 I raw silicon compound ejection 1 and here After this CVD operation, the m CVD reactor can be cleaned, leading to the generation of NF 3 gaseous components. Since the silane generated from the CVD step will strongly react with these gaseous phases with the HF 3 from the CVD reactor cleaning step. Ancestors 1 1 cannot be mixed for a unit processing * And therefore 1 1 separate treatment is required in the exhaust gas treatment system. 0 1 1 The paper size is far from the Chinese National Standard (CNS) Λ4 specification (2) 0X 297 mm. ~ 19 442842 A7 B7 Central Bureau of Standards, Ministry of Economic Affairs Ninth Consumer Cooperative Indus V. Description of the invention (17) 1! I General practice in the present invention »The exhaust gas treatment system can use a pre-treatment 1 I 1 processing unit to contact the exhaust gas with water in it. Oxidation treatment is carried out upstream of the I 1 stream — · preliminary washing steps This type of pretreatment may therefore involve the first 1 1 reading 1 washing with water> or the pretreatment unit can be used-a chemical neutralization mixture read The back 1 provides contact with the exhaust gas stream and can also use water or — chemically neutralize M combined 1 | iteratively [matter wash m to g gasification unit effluent 0 Therefore, in the broad sense of the invention, the present invention Matter 1 1 re! The operation of the washing unit envisaged by the exhaust gas treatment system can be adapted to the specific airflow of the current management at K, using any suitable washing medium > or, you can page '—- · 1 [ Implementing washing as a dry washing operation t 1! I instead of wet washing. For this purpose, a variety of 1 1 gas dry scrubber materials are readily available on the market and can be explored. Tip 1 Order this huge 0 in VX. In fact, the washing unit used in the present invention can be any 1 I any suitable type »and can be configured to minimize the problem of solid nm blockage during its operation. [The present invention The exhaust gas treatment system can therefore vary widely in shape and composition processing list. These component processing units can include different types of oxidizers. - - thermal oxidizer, catalyst 'of oxidation, flame oxidizer, i 1 of evaporated oxygen, or other processing units.  Oxygen-exhaust gas flow components can be used to complete the oxygenated 1 i component 〇 1 I exhaust gas treatment system can also include a pre-treatment unit, as mentioned above, in 1 i to the i upstream gas facilities and the exhaust gas flow.  An aqueous medium or chemically neutralized 1 1 composition »Or replaced with a dry scrubber composition 9 Μ Complete the initial elimination of some components in the exhaust gas stream before the subsequent gas 1 1 gasification and washing treatment 0 gas 1 1 The chemical unit can be constructed and set to discharge hot exhaust gas to a quench zone »1 I As explained more fully below, it can be integrated with the main washing unit.  Therefore 1 1 This paper is in accordance with the standard ® National Standard (CNS) A4 specification (210X 297 mm) -20-442842 Printed by the Sheller Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs ^ A7 B7 V. Description of the invention (18) The temperature of the exhaust gas from the unit is significantly reduced for efficient subsequent processing. The unit may use a prime mover fluid device, an active device such as a pump, fan, compressor, turbine, etc., or a passive prime mover driver such as a discharger, exhaust fan, or the like. The exhaust gas treatment system of the present invention, in conjunction with the use of an aqueous medium for washing, may additionally adopt various neutralization treatments for removing acidic components therefrom, or otherwise for the desired pΗ level to be discharged from the exhaust gas treatment system The purpose of water 0 As another variation, the exhaust gas treatment system of the present invention may further include a wet electrostatic precipitator for gutter / feather water injection control when processing exhaust gas flow. Various aspects of the design and construction of the exhaust gas treatment system of the present invention will be described below. The oxidizer unit can be provided with appropriate temperature control and thermal tracking for temperature control operation of the oxidizer unit. The exhaust gas pretreatment unit can be set as a radon gas before entering the oxidation unit to remove as much acidic gas and particles as possible from the gas stream, thereby reducing the load requirements on downstream equipment. As mentioned, such a pretreatment unit may include a wet washing unit or, instead, a dry washing unit, or a combination of a wet and dry washing assembly, including an ingredient wet and dry washing unit. Possible wet scrubbing systems include cyclones, compaction towers, and wet spray towers. These wet towers can be operated in downstream or upstream flow systems. The pretreatment unit of the exhaust gas treatment system may include a wet scented mist tower, which uses a nitrogen-assisted atomizing nozzle M to guide the atomized washing water above the tower. If you want to add chemicals, you can use, for example, appropriate chemical storage and applicable Chinese National Standards (CNS) A4 specifications (210X297 mm) for this standard. '~ 2 1 — (Please read the precautions on the back before filling this page) 442842 A7 B7 The Central Standards Bureau of the Ministry of Economic Affairs only eliminates the printing of Hezhusha V. Description of the invention (19) I 1 Metering * Μ Online liquid-based static mixer device for chemical mixing 1 1 1 in 0 Explore the use of nitrogen-assisted water to make the exhaust gas treatment water I | consume a minimum of 9 and prevent the exhaust gas components from upstream of the oxidation unit and the air. Read 1 I reaction 0 to § liquids operated by these wet processing units It can be discharged to the regular reading back 1 1 I storage tank, which can be explained more fully below, and K is designed as an integral part of washing 1 | m vessel / quenching tower > as another--a change , Can be borrowed — spray into the matter 1 t then 1 1 to venturi (ventu r i) Nozzle wet spray operation instead of pre-treatment step m »Μ Fill in this book to complete acidic gas absorption and particulate removal. Therefore, when the present invention provides an upstream of the wet washing unit of the oxidation unit, the present invention cleans 1 1 1 exhaust gas component (which is a particulate I 1 agent in the state existing in the gasification unit), thereby oxidizing The unit provides the ability to control particle formation) 1 The oxidizing element as specified above may be configured to have any suitable configuration 1 I 0 For example, the oxidizing unit may use an electrothermal oxidizer to utilize the heater surface 1 I and A clam-shaped electric radiant heater with a large gap between the heating tubes is formed. In a specific embodiment, the oxidation unit may include a--single--vertical heating tube, and the exhaust gas is guided to the M through A nozzle, and discharge the collar to cover M 1 in a nitrogen jacket to suppress the reaction until the exhaust gas is actually in the oxidation chamber 1 i 〇 once in the oxidation chamber, air or other oxidizer media can be injected, Η Coaxial flow with the exhaust air from the cover 1 1 cover. The exhaust gas guiding device should be structured to closely simulate 1 1 i simulation of layered flows such as motion, M to prevent circulation,, \ M m flow, stagnation area, and other abnormal flows that may cause particle accumulation when operating 1 1 for oxidation on units Characteristics 0 1 1 The heating tube in this oxidation unit can be given Μ by appropriate thermal control device. Selective 1 1 Control f Μ to achieve the desired operating temperature system. Although it may require a minimum temperature of 1 ℃, the condition Μ achieves ignition and Broken gasifiable components »but too high 1 1 This paper size is applicable to China National Standard (CNS) A4 (210X297 mm) -22 442842 A7 B7 5. The temperature of the invention (20) may also promote particle agglomeration And accumulate on the surface of the tube wall. Therefore, the heating tube oxidation unit can use heat transfer to strengthen the tube insertion H, to promote the fluid flow to the disturbance in the exhaust gas flow flowing through the oxidation element, K to prevent particles from agglomerating on the side wall of the tube. Alternatively, the oxidizing element may include a bundle of heat exchange tubes to accommodate higher air flow velocities, and K may be used to prevent particles from agglomerating on the wall surface of the tube. These heat exchange tube bundles can be reinforced by heat transfer as described above with the single vertical heating tube configuration of the oxidation unit. As yet another alternative embodiment, the oxidation unit may include a plurality of rows of twisted tubes, which are adapted to high airflow velocities and long residence times, while maximizing the agglomeration of particles in the airflow by providing a continuous spiral gas flow path. This configuration increases the particle size for subsequent easy removal of solids from the gas flow. ^ Printed by the Central Ministry of Economic Affairs, the Ministry of Economic Affairs and Industry of the People's Republic of China. (Please read the precautions on the back before filling out this page.) The Structural Materials Section for the oxidation unit includes any suitable structural materials with proper consideration of the exhaust gas flow to be treated by M. Specific chemical composition. Suitable materials may include high temperature oxidation resistant alloys with good resistance characteristics to HF and HC1. The oxidation unit can be operated in a reduced environment, K avoids damaging the perfluorocarbon component, and an appropriate alloy can be used as a construction material to withstand these reductions. In this aspect, the exhaust gas treatment system of the present invention can utilize a unit for recovering the perfluorocarbon component of the exhaust gas stream for recycling it or other deer. As another variation, the oxidation unit may be configured with an electric ignition heater for heating air or other oxidizer media to a high temperature, and M for mixing with the exhaust gas stream. In some cases, this configuration can provide self-ignition of oxidizable components in the exhaust gas flow when contacting and mixing with the oxidizer medium, and this can increase the size of this paper and apply the Chinese national standard (. \ 5) 8 (4 2! 0 \ 297 mm) ~ -23-Α7 Β7 Printed by the Central Bureau of Standards of the Ministry of Economic Affairs and a separate consumer cooperative ^ 4- 5. Description of the invention (2) 1 1 The overall oxidation efficiency of the oxidation unit. 1 1 I As another variation, the oxidation unit can be constructed as an evaporative oxidation unit 1 j Please 1 7X1 〇 First 1 I The oxidation unit generates an oxidizing exhaust gas stream at an elevated temperature. 0 This heat flow is read back | | Or cool down to reduce the temperature for the exhaust gas treatment system. Note 1 1 Note 1 | Subsequent treatment and final discharge. Chapter 1 The re-exhaust gas treatment system may therefore include a quench 4 downstream of the oxidation unit. The quench unit may, for example, contain--single--vertical pipes, with-air assisted sheet '«• w- 1 I Water spray nozzle • Provides contact between water or other existing refrigerant and the oxidation unit 1 1 1 Exhaust gas 0 Available in the quenching section--Weir interface structure, 1 1 Provide-clearly defined heat / Cold interface) The quench unit can be properly combined with a deposit, such as--a dew point anticorrosive uranium alloy composition &examples; A 16 × Ν »1 | Ca Γ P e η ter 2 0» Ha C-22 and HaB alloy & gt The quenching unit should be structured as [I to make the thermal effect unfavorable to other processing units of the exhaust gas processing system i> «gm minimum Cr 1 1 I The quenching unit can be replaced by a multi-pipe co-current flow drop mm Acid absorption 1 column, there is a cooling water supply on the side of the shell, Μ completes heat transfer. 1 1 Oxidation unit and quench unit can align VX in a single unit—vertical orientation i provides a unitary linear gas flow path with 1 I> which minimizes abnormal flow characteristics and micro I | As an alternative embodiment, the quenching unit may be composed of a quenching device in J 1 嗔 mist feed Wenqiu f 1, M for quenching and particulate removal purposes 5 1 1 The exhaust gas treatment system of the present invention can be used-* in oxidation Unit downstream 1 1 scrubber 0 This scrubber can contain--single--vertical filling S tower, there is.  The liquid \ 1 I injection shoots into the P-filled column, and _.  Demister m m or above 1 1 This paper size applies Chinese National Standard (CNS) Λ4 specification (210X297 mm) 24 ^ 42842 A7 B7 Printed by the Central Bureau of Standards, Ministry of Economic Affairs, Consumer Cooperatives only (22) 1 i Other m-removing device The scrubber can feed M liquid water, which can cool M 1 1 I or relative to the exhaust gas discharged from the self-oxidation unit at a suitable temperature and choose 1 1 for washing The scrubber upstream undergoes quenching or preliminary cooling. 0 The scrubber may therefore include the first M 1 1 I Yes — the cooler may be located next to the wash tower and pre-cooled wash water or other read back I I aqueous wash media 0 instead of using except The gasket or phase U mechanism is used to make TE3 1 residual mist (small volume of water droplets) BS Han Shao or eliminate it 1 In fact, the meaning of the present invention I 1 The re-washer unit can be configured to allow the air flow to pass through and Larger drop of water "knocked down Fill the chest with the mist, remove the mist from the air stream, and use the fluid to minimize the amount of this thin m component or actually eliminate it. 1 i It is suitable to use cooling water in washing. Allow the exhaust airflow to cool below the ambient temperature 1 1 and reduce the amount of steam by the relative humidity conditions prevailing in the environment, such as in the environment of a semi-manufactured manufacturing operation »Exhaust airflow when semiconductor manufacturing tools 1 I 0 use Cooling water is also suitable to guide-a kind of heat storage effect, Η strengthen the acid absorption and particle absorption in the packing column 0 1 1 An alternative embodiment the scrubber unit includes a falling film acid absorption column 1 with cooling water The side of the feed absorption column > With this scrubber unit, 1 g of liquid from the pretreatment unit (quencher) and scrubber unit can be introduced to m 1 1 I to be discharged to the bottom of the scrubber column Often Storage tank 〇 In this way, the liquid flow used in g 1 I | exhaust gas processing system is integrated and this storage tank I i can be set for its gravity feed operation 0 1 1 or i from exhaust gas The washing of the components of the processing system in the processing unit m 1 1 liquid and other liquid streams can be obtained by suitable suction devices, such as centrifugal pumps 1 rusted 1 I pumps, air-driven pumps, dischargers »or other suitable liquids Motive drive 1 1 I device for JW pressurization or i system emission 0 1 1 This paper size applies the Chinese national standard ⑽) Na (2 ™ Chu) 442842 A7 B7 Ministry of Economy and Technology, Central Standards Bureau, Ordnance Industry, Hezhu Society Yin Lai V. Description of the invention (23) 1 1 I In a packing column scrubber, you can use--scrubber 1 > scrubber column and 1 1 | other components of the exhaust gas treatment system 1 m, Can be made of any suitable material, such as 1 I metal alloy, or painted Structural steel or other gold alloys are formed, and have the appropriate resistance characteristics relative to the corrosive substances in the fluid stream treated in the 1 1 I reading. Note 1 1 Coating 0 1 Note 1 of the present invention The exhaust gas treatment system may be configured to provide or not provide a punch 1 I 1 1 for circulation of the liquid stream used 0 As mentioned, the scrubber unit may include a dry scrubber 1 and it may be possible in some cases Replace the scrubber unit and the quencher unit with — * dry scrubber cartridge unit page I. The scrubber can also be equipped with an optional 1 i chemical pretreatment unit * Μ allows the use of wet or dry chemical injection into the scrubber Single 1 ί yuan 0 1 order can use a discharger to provide motive power 1 to extract the exhaust air flow through the exhaust 1 1 gas treatment System 0 This type of discharger is preferably an anti-corrosion and anti-stuffing device II design, using clean, dry air or other drainage fluids 1 Yes-· Modulating valve and control 1 I 1 Device M The desired pressure level provides the appropriate inlet P The pressure to exhaust gas treatment system 1 can also use a discharger, when the treatment system uses a water scrubber.  Supply 1 1 for heating the dry air to the steam-saturated exhaust gas stream 0. This supply 1 I for heating the dry air so use Η to reduce the relative humidity of the exhaust airflow below ambient saturation 1 Ϊ and condition 0. The exhauster can use air, Nitrogen or other suitable excretion medium I 1 emitter can also be coupled with an appropriate m-transmission module, allowing the ΐ, Μ, as m emitter 1 1 to be discharged for trapped particulates in this exhaust gas 1 1 can be utilized by the exhaust of the present invention The gas treatment system is provided for processing § exhaust gas from various upstream 1 I processing facilities. For example, the 1 i I physical exhaust gas located in the exhaust gas processing system may include tungsten CVD tools from a semi-carcass manufacturing plant. Standards are in accordance with Chinese National Standard (CNS) A4 specifications (210x 297 mm) -26-442842 A7 B7 V. Description of the invention (2Ί) Follow-up after clearing t: C It will be transferred to M for the accumulation Amount of hF in the wafer Removal of electrically Η into an overall and with the seat support member wall element having Η cleaning chamber ΓΠΤ to learn of each species can be operated production facility may be made when SP trjv guide body in half. The system of knowledge acquisition and accumulation of Shen Tung Wong's system is the judging process of the HF 0 system, and it is equipped with the equipment. The installation of the TT > management office is completed. The body, gasification and transformation can be used as a row, and can be used for operation and operation, use and production, and implementation of the map. The process of the flow of the original intention. The root zone 1 is continued to be -3. Ί1 ο _il, all the pictures are attached to the reference, please show the row diagram in the air supply, and bu—0. Minghua Development Co., Ltd. according to one of these diagrams shows Cheng Yiliu's diagram, and the line system shovel is short. After the clarification is revealed, follow the instructions in M. Please indicate% in M. The valve is installed on the control rib and the meter. Seite's outstanding Mingfa published the provincial and Chinese style maps of the WE in each of their respective M, Zeng Yiqiao, the skill of the art department knows that the β is being applied. . Yoshi. Guang Shizhi and Ming Xing hair configuration > i in the yike style square installation seed control system (please read the precautions on the back before filling this page) The outline of the example of the form and provide, ί Inner pit table grave road management Ministry of Economic Affairs Central Standard Vehicle Bureau Bureau of the Ministry of Economic Affairs of the Central Bureau of Standards and Vehicles Bureau of the military to eliminate the printing press to exchange hot water but cold 1 for the color special section 4 zone 1 1 Road to the picture change ¾ Cheng heat flow with dynamic flow line 6 11 Tube 0 has its T * T \ passing through the water, but it is in the cold envelope and is discharged at 1δ. Line 16 is coupled to a discharge line 24 containing a valve 26 therein. Lines 16 and 18 may be properly insulated to maximize the effectiveness of the cooler. The water in the pipe medium 30 flows through the cooler 12 and passes to the manifold pipe 3 2. The water is divided into two parts. One part of the pipe 3jl is passed to the Shantong Passing System, and the other part is pipe 36. To the spray head 38, it is guided to the exhaust air pretreatment column 40. - < 2. ____________ This paper size applies to Chinese National Standard (CNS) A4 (210X297 mm) -27-^ 42842 Α7 Β7 Printed by the Central Bureau of Standardization of the Ministry of Shanghai, and only printed by the cooperative. V. Description of the invention Exhaust gas in the pipeline 62 is guided and passed to the pretreatment column 40. The pipeline 62 can be insulated along its length by heat tracing 64, and the branch pipeline 66 of the insulation heat tracing characteristic can be passed to the next section of the process surface shown in FIG. • Line 42 is the oxygen line for the processing system, line 44 is the clean dry air line, and line 4δ is the nitrogen supply line, which can be branched to the nitrogen feed line 47 as shown in the figure for guiding nitrogen to flow in line 36 to Water for pretreatment column 40. The exhaust gas stream is directed to the column inlet section 50 in line 62, and can be enhanced by adding nitrogen from branch line 48 to M, if so (original) to the desired degree. The exhaust gas stream is pre-treated in column 40, and K produces a bottom sediment in line 60, which is passed to the part of the flowchart in FIG. The column at its upper end 52 produces a column effluent at line δδ, which is passed to reactor 90 in FIG. 2. A portion of the effluent at the top of the column can be recirculated to the column at line 56 and additional flow can be accommodated by line 58 as shown in the figure. In FIG. 2, system 116 includes an oxidation reactor 90 that receives nitrogen from line 46 at its upper end, and oxygen from line 42 and from line 44 from branch conduit 108 optionally clean dry air to be combined, where Line 110 provides an oxygen-containing gas to the upper end of the reactor. The water in line 34 separates into branch line 96 at manifold 94, passes to section 120 of the system shown in FIG. 3, and enters branch line 98, where the fluid flow can be cleaned and dried by branch line 97 from line 44 The air is enhanced and passed to a nozzle 102 on the oxidation reactor 90. The rest of the clean dry air flows on line 112 to the processing system's Figure 3 section. The oxidation reactor is also configured to receive water from the tube gland 100 through a population 92 in the middle portion of the reactor vessel. The characteristic of the reactor is a response (please read the precautions on the back before filling in this page) The size of the paper is applicable to the Chinese standard (CNS > Λ4 specification (210 × 297 mm) -28-44284 2 Jing Yi Printed by the Ministry of Standards and Leather Industry of the People's Republic of China. A7 B7 V. Description of the invention (; H) The heater δ8, which includes a heat exchange channel 86 therein, is coupled to the branch lines 82 and 84 of the power line 80, The heater 88 is activated by it to provide electric heating of the reactor for thermal oxidation of the exhaust gas flow guided to the oxidation reactor in line 6S. The oxidation reactor can be shown in the figure. A circulation line 106 is provided, The upper and lower ends are connected to each other. The effluent from the reactor flows in line 104 to the part of the processing system. Figure 3 contains part 120 of the processing system and includes a scrubber 124, defining a water supply for washing The internal volume 128 is directed to the nozzle 126 at line 96. The exhaust air is directed to the scrubber at line 104. The sinker at the bottom of the scrubber joins at line 132 with the liquid from the exhaust air pretreatment at line 60 and is discharged from the system. And passed to wastewater treatment or Disposal of other final use of liquids. The effluent from the top of the washing tower is passed to the discharger 144 at line 130, which supplies clean dry air from line 1 12 to produce a treatment system effluent, which is schematically shown in the line as shown in the figure 146 flows to the exhaust 150. The effluent can be enhanced by adding by-pass steam from line 66, and this line 66 can be thermally tracked and insulated as previously described. Figure 3 shows a modification in the short W-line diagram The pump 136 is configured to recirculate the bottom sediment of the liquid in the line 132, through the inlet pump line 138 to the troubleshooting liquid line 134, and the recirculated liquid is combined with the washing water in the line 96, and the M is processed therein and reprocessed. The liquid is circulated to enhance the washing operation. The treated liquid is then discharged from the system by the pipe medium 140 containing the valve 142. Figure 4 is a schematic flowchart of a gas effluent treatment system according to another embodiment of the present invention. In this system, the gas The exhaust flow is guided at lines 160, 162, 164, and 166, and is joined to M to form a combined row of paper at tube nipple 184. The X degree applies the Chinese National Standard (CNS) A4 specification (210X 297 mm)} n I 1v wear,-& (锖 Please read the precautions on the back before filling in this Va;) -29-442842 A7 B7 Printed by the Central Industry Standards Bureau of the Ministry of Economic Affairs, Monthly Consumer Cooperatives 5.Invention description (27) Outflow It is then passed to a heat exchanger 182 containing a heat exchange channel 180 joined to a line 178, which completes the heat exchange of the integrated stream. The heat exchanged exhaust gas can then be passed to the exhaust gas pretreatment column 2 1 0 in line 2 1 2 Or, if desired, part or all of the exhaust gas flow can be bypassed from the treatment system and flow to the exhaust gas 256 in line 1δ6. The cooling water heat exchanger 174 receives the cooling water feed in the line 168 and discharges the return cooling water in the return line 172. The water in line 170 passes through the cooler and joins in line 224 with the nitrogen from main nitrogen feed line 216 in branch line 222 and is discharged through pretreatment column 2 10 through nozzle 2 2 6. Additional nitrogen may be directed from the main nitrogen feed line 216 to the pretreatment column 210 at line 220. The clean dry air is directed to the system at line 176, and a portion of it can be passed at line 240 along with nitrogen in line 216 to the reactor 198 at its upper end. Oxygen is directed to the reactor at line 214. The reactor receives overhead effluent from the pretreatment column 210 at lines 2-30. The power line 218 provides a resistance heater 200 that can reach the reactor 198 as shown. The quench portion of the container containing the oxidation reactor 198 at its upper end receives water from line 202 at the inlet 20S, and a mixture of water and clean dry air is directed at line 204 to a nozzle 206 in the quench portion of the container. The quench portion of the container communicates with the scrubber 194. The scrubber receives at its upper end the water from the pipe medium 192 at the mouthpiece 196. The effluent gas from the top of the scrubber is transmitted to the discharger 252 in the line 250 at the pipe 250, and the discharger receives the dry air from the line 240 in the line 259. The effluent stream in line 254 is then joined with any by-pass exhaust gas from line 186 and flows in line 258 to the exhaust 256 of the processing system. (Please read the precautions on the back before filling this page) -5 This paper size is applicable to Chinese National Standard (CNS) A4 size (210X 297mm) 30-442842 A7 ___ B7_____ 5. Description of the invention (28) In pipeline 236 The bottom sinker from the exhaust air pretreatment column 210 and the bottom sinker of the camel scrubber 194 are joined in line 238, and can be passed to the liquid discharge or other processing. Fig. 5 is a schematic flow diagram of another embodiment of an exhaust gas treatment system according to the present invention. The exhaust gas flow in line 312 is guided to the pretreatment column 308 along with the atmosphere in line 310, and the water in line 302 is directed through a nozzle 306. The water flow to the nozzle 306 can be enhanced by recirculating liquid from the line 304. The effluent from the top of the pretreatment column in line 314 is passed to oxidation reactor 334, which also receives oxygen at line 330 and nitrogen at line 328. The container containing the reactor 334 was equipped with an electric heater 332, and quench water was led to the quench portion of a container 333 in line 32 4. Water or air / water mixture is injected at the nozzle 322 from the line 320 to the quench portion of the container 333. If desired, it can be enhanced by recirculating liquid from the line 318. The Central Bureau of the Ministry of Economic Affairs only works with consumer cooperatives. :, · II-II-i IIHI II-I In — ^ ϋ (Please read the notes on the back before filling this page) The scrubber 336 discharges the scrubbing gas at line 356, and the washing water flows to line 344, and The processing chemicals 340 pumped by the pump 342 from the container 338 in the line 341 and the pump 342 are connected to the M, and the K forms the washing liquid flowing in the line 346, and is connected with the recirculation fatigue in the pipe medium 348, and the M provides the washing medium. The pout 350 leads to the scrubber 336. The sediment from the bottom of the scrubber flows on the pipe line 304 to the waste water heat exchanger 352, and is exchanged with the hydrothermal heat exchanger in the line 354. Fig. 6 is a schematic flow chart of the processing system of the phase IW exemplified in the flow chart shown in _9, showing a modification according to another aspect of the present invention. In this case, the 6-cargo example, the scrubber 4 0 discharges the effluent from the top of the washing tower at line 4 2 and the paper size of the pipeline applies the Chinese national standard (CNS > Λ4 specification (210X297 mm) 31 5 、 Explanation of the invention (29) Α7 Β7 The bottom deposit is printed 404 by the Consumers' Cooperative of the Central Bureau of Standards of the Ministry of Consumers. A part of the bottom deposit can be recirculated in line 408, and the heat exchanger 414 The cooling water in line 410 is used for heat exchange, and it is used as a composition for washing liquid for hips, which is guided by pipe medium 430, and is used in heat exchanger 416 by cooling water flowing through lines 412 and 418 of main line 41 °. The washing liquid produced by the heat-exchanged water ° is additionally added from the container 420 and pumped from the line 42 4 to the line 428 by the pump 426, and is connected with the washing liquid from the line 430, and is transferred to the scrubber 400 at the line 406. The liquid treatment chemicals 422 on the nozzle are enhanced by M. Figures 7, 8 and 9 are separate schematic flow diagrams according to other aspects of the present invention. In Figure 7, steam or water in line 442 together with line 440 / Nitrogen mixture pre-M directed to pretreatment column 4 38. The vapor is in contact with the liquid from line 446, and M produces an overhead effluent that passes to line 443 to the oxidation reactor 450. The reactor receives oxygen at line 454 and nitrogen at line 452. The container containing reactor 450 The lower part is a quenching section that receives the recirculated quenching liquid in line 448, together with the air in the pipe medium 458 and the water in the line 456, and is used to guide the nozzle in the quenching section 460. The condenser 464 series The pre-configuration is as previously described, and it receives the washing liquid from the recirculation line 472 at line 478 from the bottom sediment of the pretreatment column at line 46δ, and the bottom sediment of the scrubber is merged with it as shown in line 470. The recirculated liquid in line 472 can be heat-exchanged in the heat exchanger 472 by the cooling water in the pipe medium 476. The washing liquid in line 478 can be enhanced by adding a chemical liquid from line 494 to it. For this purpose The chemical liquid is like the water that is led to the mixing container 4 8 0 9 in line 482 and the dry chemistry that is led to the container 4 8 0 in line 4 8 4 (please read the precautions on the back before filling this page). Be applicable National Standard (CNS > Α4 Specification (2Ϊ〇 × 297mm) '32-Printed by the Central Standard Bureau of the Ministry of Economic Affairs, Printed by the Military Industry Consumer Cooperatives ^ 842842 A7 B7 V. Description of the Invention (30) Product made. Or else, or otherwise The liquid chemical in the container 486 can be pumped to the line 49 2 by the pump 490 at the line 48 8, and the liquid chemical can be diluted therein with the water guided by the line. K this way. As shown in FIG. 7 The system is suitable for the intended end-use application of the treatment system of the present invention, and wet or dry chemical additions to wash tired bodies can be used as necessary or desired. In Figure δ, the exhaust gas stream is directed to the pretreatment column 500 in line 498 along with water or a water / nitrogen mixture at line 496 to M. A portion of this fluid can be transferred to Ji (transform, merge with the recirculated liquid from line 506, and pass to the nozzle in the pretreatment vessel. At the pretreatment column 500, the exhaust gas stream contacts the liquid to produce The effluent from the top of the column is passed to the reactor 5 1 0 in line 5 0. The reactor receives oxygen in line 5 1 6 and nitrogen in line 518. The lower part of the vessel containing the reactor 450 is the quench zone in line 5 08 The section recycles the quench liquid and receives water at lines 512 and 514. The scrubber 520 is constructed as previously described and is subjected to washing after line 540 has heat exchanged with its cooling water in heat exchanger 538 and line 530 Liquid. The sediment at the bottom of the scrubber is merged with the sediment at the bottom of the pretreatment column from line 526 at line 524, and the combined stream can be passed at line 529 to the effluent waste liquid treatment or other treatment, and the combined bottom sediment A portion of the liquid is recirculated at line 506. The effluent from the top of the scrubbing exhaust gas is discharged from the scrubber at line 5 2 2. In Figure 9, the exhaust gas flow is at line 5 46 along with water or water in line 544. / Nitrogen temperature compounds To the pretreatment column 542, the exhaust gas stream is in contact with the liquid from the line 548, so that the effluent at the top of the tower is generated at the line 550 and transmitted to the reactor. The paper size is applicable to Chinese national standards (CNS > A4 size (210 × 297 mm) ) (Please read the precautions on the back before filling out this page) -33-442842 A7 B7 1 ~ ~ — —. ____ 5. Description of the invention (3t) reactor 560. The reactor receives oxygen at line 562 and nitrogen at line 564 The lower part of the container containing the reactor 560 is a quenching section that receives the recirculated quenching solution in line 558, together with the air in line 5 56 and the water in line 554. The nozzles are drawn in. The scrubber 556 is constructed as described previously and accepts the washing liquid from the bottom of the pretreatment column at line 552 from the recirculation line 560, and at line 552, and the sediment at the bottom of the scrubber is shown in the figure. The line 558 is merged with it. The recirculated liquid in the pipe medium 560 can be heat exchanged by the cooling water in line 568 in the heat exchanger 564. A part of the cooling water in the line 568 is drawn out in line 57 and transmitted To heat exchanger 580, for heat exchange with the water guided by line 572. Under the action of pump 578, chemical additives can be added from line 576 to storage tank 574, and the washing water in line 572 is enhanced for subsequent exchange with water from line 560. The recirculated liquids are combined, such as mixed with the chemical / water solution at line 582, and then led to the pout at the upper end of the scrubber 556. Therefore, a washout of the exhaust air stream is performed. The generated effluent from the top of the wash tower is at line 5 6 2 Discharge of scrubbers. Printed by the Central Bureau of Standards, Ministry of Labor and Labor, 1HH n —Bn Λ ^^^^ 1 i ^ l— n ^ i-. (Please read the precautions on the back before filling in this (Page) FIG. 10 is a schematic diagram of an exhaust gas treatment system according to another embodiment of the present invention. A pretreatment unit, an oxidation unit, and a scrubber are used, wherein the scrubber and the oxidation unit are passed through a quenching chamber. coupling. The upstream processing unit 602 discharges exhaust gas at line 604, which enters the inlet 606 of the exhaust gas processing system. The inlet 606 is joined for gas flow communication with an inner tubular member 608 having an open discharge end 610. The tubular member 608 is concentrically disposed on the outer tubular member 618, and an internal 瓌 -shaped 〆fi volume 612 is raised therebetween. The outer tubular member 618 is provided with a tubular extension 622 bounded by the paper size applicable to the national standard (0 Yang) steam 4 specifications (2) 0 > < 297 mm) 1 3 4 _ 442842 A7 B7 V. Description of the invention (32) The gas inlet 620 is set, and the gas from the supply container 624 flows appropriately to the tubular extension 6 2 2 in the pipeline 6 2 6. The gas flows through the inner annular volume 612 between the inner and outer tubular members, so that the exhaust gas discharged from the open discharge end 610 of the inner tubular member is shielded from the gas supplied from the gas supply 6 24. For the purpose of modulating the gas flow from the gas supply 624, the line 626 may include a flow control valve or other flow control device for completing a predetermined gas flow rate to the tubular extension 622. Outside the population structure, the tubular member 618 has a diagonal cut-out discharge end 630, which is arranged such that the largest length peripheral portion of the outer cylindrical member 618 is above the smallest length peripheral portion of the tubular member. In this way, the maximum length of the perimeter is used as an "extended" structure to allow the exhaust gas flow to develop and be shielded from the protective gas from the gas supply 6 2 4. This protected exhaust gas flow is not in the pretreatment tower. 63 4 Premature contact with falling liquid 632. The pretreatment tower 634 is constructed as shown in the figure, and has a sump storage tank 636 for collecting and discharging the washing liquid from the tower in a duct 638. The tower is constructed with an upper portion 640, which is provided with a spray nozzle 642, which feeds the pre-supply from the liquid supply 646 from the conduit 644 and the line 648 coupled to the conduit 644. ^-^ 1 ^-^ 1 ^^^ 1-- i ^ i —I ικ---^^^ 1 ^^^ 1 ^^^ 1 i ^ n I -.- \ r {Please read the notes on the back before filling out this page) Military Engineer, Central Standards Bureau, Ministry of Economic Affairs Consumer Cooperative Co., Ltd. ^ install other or valve control flow. Shi 34 contains Γ 1 tower package to 8 moving 64 streamline pipe fluid. Dishwashing liquid pre-washing and changing facilities rm-The management department swims up here since the Ministry of _1 liquid "County 63 washing tower pre-entry into the structure of the discharge structure α into the pass I 0 bow break the lake gas out tl · . 0 part of the acidic body gas and grains to remove the mouth, clean the spray before being touched because of this flow and back to the air and out of the side by side of the tablets, and then the utensils are misted to remove the mixed body Ventilation out of the exhaustion 0 except 63 and the tower 'after passing through the water to remove the exhaustion to remove its discharge from the polyester W washing 2 pre 65 This paper size applies to China National Standard (CNS) A4 specifications (210X 297 mm)- 35 Μ Drop Department Central Standards Bureau κ K Eliminated by the Bamboo Society $ 442842 A7 B7 V. Description of the invention (H) At the catheter 65 4 is transmitted to the population unit 666, and the catheter 654 is in contrast to a larger concentric catheter 668 Concentrically arranged, it communicates with the enclosed space 670 receiving the shielding gas from the gas source 672 through the line 674. The outer conduit 6 6 S is externally enclosed by a closed space 6 7 6 which receives the oxidant medium. Such as air or other oxidant gas supplied from the oxidant medium connected to the closed space 676 via the pipe line 680 supplies 67 8. Lines 674 and 680 may include flow control valves or other flow control devices for modulating the flow of the respective gases. With this inlet structure 666, the effluent flows into the human duct 654, is protected from nitrogen or other inert gases from the supply source 672, and the effluent is directed to the oxidizer unit 6 8 2. The oxidizer medium is from the enclosed space 6 7 6 Obtained from supply source 6 7 8. The oxidation unit 682 may be a multi-zone oxidation reaction chamber, and the gas flow channel 6S4 defines a gas flow path 686 therein and is externally connected by the heater 6U. The heater 68δ may be an electric heating unit, or include any other suitable heating device, so that the gas in the gas flow path 686 is heated to an appropriate high temperature to complete the oxidation of the oxidizable component in the gas flow. The oxidized exhaust gas stream is then passed to a leaking weir gas / liquid interface structure 690 at conduit 684 as explained in more detail below. The roll-over weir gas / liquid interface structure receives liquid from the tired source 692 via a liquid feed line 6 9 4. The leaky weir gas / liquid interface protects the lower wall ducts 684 near the quench chamber 69S, so that these inner wall surface ducts 684 are isolated from the thermally aggressive reaction products in the exhaust gas stream processed by the oxidation unit 682. At the same time, the leaky weir gas / liquid interface structure provides a falling water film on these inner wall surfaces of the duct 684 under the interface structure 690 to prevent the particles M from being trapped and accumulating and agglomerating on the inner wall surface of the duct 684. _ This paper size applies Chinese National Standard (CNS) A4 specification (210 × 297 mm) ~~ (Please read the precautions on the back before filling this page), va -36--442842 A7 B7 V. Description of the invention (34 in Quenching chamber 696, quenching air flows from quenching air supply source 698 through line 700 to the quenching chamber, while quenching water flows from water supply source 702 through line 704 to mixing chamber 706, and the generated air / water flow from it In the quenching chamber 696, the nozzle 70S is discharged, and K completes the cooling of the quenching exhaust gas stream. The quenched exhaust gas then flows into the scrubber unit 710, from its lower portion 712 to its upper portion 714, through the packing bed 716 and the demister The gasket 71δ, M generates a treated exhaust gas stream. It is discharged from the scrubber unit at the top of the tower effluent duct 720 under the action of the exhauster 722, and is finally discharged from the exhaust treatment system at the exhaust line 724. The scrubber unit There is a spray nozzle 7 2 6 on 7 1 0, and the feeding medium 7 2 8 is supplied with the washing medium from the supply tank 7 3 0. The washing medium may be water or other aqueous medium, and optionally includes a chemical auxiliary adjuvant for enhanced washing The washing performance of the filter unit. Printed by the Central Government Procurement Bureau only for consumer cooperatives (please read the precautions on the back before filling out this page). The quenching chamber has a sink section 750 for collecting quenching tired bodies and washing liquid. The conduit 752 flows to the tank 754, which also receives the bottom sediment liquid from the pretreatment unit in line 638. Such "bottom sediment liquid" from the processing unit in the effluent treatment system may be borrowed, for example, from the treatment tank 756 Add the appropriate acid or basic reaction_M treatment in tank 754, there are ports 753,760 and 762 for this purpose, so that one or more treatment chemicals can be added, after which the last treated liquid can be discharged in the discharge duct 7 6 4 It is discharged from the system. Fig. 11 is a schematic diagram of a processing system according to another embodiment of the present invention, which is shown as being arranged in a box 800. The exhaust air treatment system of circle 1 1 is characterized by an exhaust air inlet guide This paper size applies Chinese National Standard (CNS) A4 specification (ZlOX297 mm) 37 442842 A7 B7 V. Description of the invention (3¾ tube 802 accepts the effluent from the effluent feed pipe medium 804. From an upstream processing unit 80 6, such as semiconductor manufacturing facilities to transport exhaust air. The inlet tube 802 is in communication with a gas cover structure 810, which contains a cylindrical tube S12, and a population 814 receives gas from the reserve 816 on the pipeline 81S. The wall 812 and the interior are breathable The wall 820 defines an internal annular volume 822, from which the gas from the storage tank 316 is directed to flow through the breathable wall 820 and covers the exhaust gas flow guided by the population duct 802. The exhaust gas flow then flows down through The first branch 824 of the pre-processing unit 826. The first branch 824 of the pretreatment unit is provided with a spray nozzle 828 connected to a feed duct 830, which is coupled to a suitable source of air and water (not shown). In this way, the downward exhaust gas flow comes into contact with the air / water jet, M pre-treats the gas and reduces its acidity, and M and entrains the particulates from the exhaust gas stream guided by the aqueous phase from the nozzle 828. The generated fatigue body is then collected in the U-shaped portion 832 under the pretreatment unit, and flows through the pipe 834 to the water collecting tank 836 (which is explained more fully below) through the manifold pipe 842 and the water collecting tank 840 of the scrubber unit. . . Disaster printed by Beigong Consumer Cooperative of Central Standard Soap Bureau of the Ministry of Economic Affairs (please read the precautions on the back before filling in this page) The exhaust air flows in the first branch of the pretreatment unit and comes in contact with air / 7K spray, and then flows upward through this unit The second branch 844, in which the exhaust air stream is in counter-current contact with a spray of falling water from a nozzle 84, which is coupled to a suitable source (not shown) of a liquid such as water or other washing medium via a conduit 848. From the pre-treatment unit 826, the pre-treatment exhaust gas is transmitted to the thermal oxidation unit 852 in the duct 850, and includes an exhaust gas flow pipe 854. The exhaust gas flows through its internal volume 856 and is heated to a sufficient temperature to oxidize and destroy the harmfulness of the air flow. Oxidizable component. The oxidizing exhaust gas stream is then explained more fully below, and the self-thermal oxidation unit 8 5 2 discharges to the leaking weir gas / liquid. The paper size is applicable to China National Standard (CNS) Λ4 specification (210X 297 Gongchu) -38-442842 A7 B7 V. Description of the invention (Interface structure 860, exhaust air flow and then flow in the duct 862, which constitutes a quenching chamber equipped with an inlet 864 for guiding quenching medium, such as water or air / water spray to washing Tower 870. The washing tower has a lower portion 872 including a bottom sediment storage tank 874, which discharges the accumulated liquid through a discharge pipe 876 to a water collecting tank 840, and the liquid can be discharged to K through the manifold 842 and the coupling discharge pipe. The tower 870 is provided with a scrubber medium spray nozzle 878 on the upper part thereof, which is coupled to a suitable source of the washing medium (not shown) via the feeding duct S80, which may contain water or other aqueous or washing media. The washing tower suitably contains Nozzle 878—a decanter or other liquid removal device (not shown) for reducing the moisture or liquid content of the scrubbing gas. The scrubbing gas rises to the upper end 890 of the scrubbing tower and is discharged through the effluent duct 892 at the top of the tower. Treatment line 8 9 4 is discharged outside the system box 800. With the configuration shown in Figure 11, the exhaust gas stream is subjected to a two-state washing process upstream of the thermal gasifier unit, and then washed downstream with the exhaust gas stream discharged from the thermal oxidation unit. The thermal oxidizer unit can be of any suitable type, for example, to provide an elevated temperature treatment of the exhaust airflow at a temperature of 200 (TF or higher). The Central Standards Bureau of the Ministry of Consumers only works with consumers and cooperation. Du Yinlai {Read First Read Back Note 1) Please fill in this page again.) Provide a gasification unit and pre-treatment (ie, pre-oxidation) washing and post-oxidation washing military unit in a single unit box, then provide a lightweight device shape, with a small footprint to adapt The exhaust air treatment strip is conveniently arranged in a semiconductor manufacturing or other processing facility, in which the exhaust air flow processed by the present invention is located. As mentioned, the washing unit in the exhaust air flow treatment system of the present invention may be other 1 Or dry scrubber or other processing unit for self-exhaust airflow. The paper size is applicable to China National Standard (CNS) A4 (2; 0X297mm) ~ -39-442 842 A7 B7 V. Explanation of the invention (37) Remove particulates and acidic components, M and other soluble or otherwise washed and removed components. Management and Processing You 90 On-line 1 The tube is free from reason, and the photos are shown as a channel 2- Figure 1 shows the system of entering the box, entering the body, and exiting kur0. The order of jt is located in the inner part, and the internal line is managed by the principle of the subsequent flow. The given order is 05, and the order is removed in the order. The solidified gas from the fluidized gas is discharged to the dynamic supply and removal of the exhaust emblem, to go to the 11th situation: s 化 part of the ai tube Η group S & after ® 0 0 ^ ^ Ψ ΐ gas ^ for the flow of gas out of kl · 0 The composition of oxygen can be hopelessly 91 or the wire damage tube has been cleaned up to 9 points after the current flow gasification is the final line. The cleaning and cleaning of the gas producing part of the MU body-drive the body or the current, push the original machine 21J, 9 and β device, and move the machine like a wheel body. 'The original wind of the exhaust fan is in the same place as it is, bh 0 0 The main pump is installed ^ — ^ 1 ^^^ 1 ^^^ 1 ^^^ 1 ^^^ 1 I ( Please read the precautions on the back before filling in this page.) The air extractor can be placed in tt, 0. If the package is included, it can be integrated. However, the cold product out of the JF treatment-cleaning and gas cleaning effect makes it possible, 7 hot 91 latent element of the gas scrubber cleaning and cleaning row to take the supply, after ¾ degree, the temperature is appropriately adapted g_ 部 部 中心 标芈 扃 Only workers' cooperatives printed in Yuandan remove particles and fractions of acidic hydrogen fluoride for supply. Including all the aptamers can be treated at 05 places \ ly The pre-set group removes this by using the special holes to enter the most-3 more. Use C or Yuanzi to make S ^ ^ Management 丨 of the Note ® Li: ls 5¾ / Step by step in every aspect of the system — 糸 结构 @ ΐ ® Face out, row of things' /! 出 干 _ / tiw Yuandanli b / ir oxygen installation

Wet in use, use the appropriate, skoko P interface type h oxygen as a device to change the heat pipe and / or put the dice to make a hot M with an extra bag when applicable 3 I 1 what% 1? Although it can transmit 3β heat by using a side-face killer, it can be used for the radiation. Ϊ Ϊ, appropriate to the normal heat ο addition body style This paper scale applies the Chinese National Standard (CNS) Λ4 specification (210 × 297 mm) ) -40-4 4284 2 A7 B7 V. Description of the invention (3S) The installation and exchange of heat include ο part J group 7ql chemistry 91 The first effect of oxygen can be cleaned, and the washing is forced to force the washing and chemical conversion. After condensing oxygen and condensing oxygen, the supply system is limited to washing the body, but the cold supply is provided. »Wash in a barrel with a pickled solid column in the water that can be used as a column in the top of the tower. Gas flow out, emptying, washing-washing, ¾ removal of mist in the network of the capacity-capacity-prevention ministry network, 1 fluid solid particles, micro-removal of gas flow, tr 8 imposed for volume-capacity mining-can be uniform carbon system, fluorine repair and full repair, 1 Hydrocarbon and fluorine are contained in the system and are returned to the supply stream. 7, gas 92 yuan The receipt of the list will return the carbon to halogen for one use. The Central Standards Bureau of the Ministry of Economic Affairs and the Nonggong Consumer Cooperative printed this type of atmosphere / fluorocarbon recovery unit (CRU). It can be constructed and operated by M such as Glenn M. , Ton et al., Pending U.S. patent applications 08/395, 162, February 27, 1995, " METHOD AND APPARATUS FOR CONCENTRATION AND RECOVERY OF HALOCARBONS FROM EFFLUENT GAS STREAMS 'and Glenn M. Ton et al., 1995 U.S. Patent Application No. 08/474, 517 dated June 7, 2014, "PROCESS 卩 OR REMOVEING AND RECOVERING HALOCARBONS FROM EFFLUEKT PROCESS STREAMS", the disclosure of which is incorporated herein by reference in its entirety. The halogenated carbon recovery unit 927 can therefore receive the exhaust gas from the line 911 at the line 925 after the gas stream washing of the processing unit 905 or other pre-oxidation treatment. The recovered carbon halide is then discharged from the CRD unit 927 in line 929, and Keyi wishes to recycle or otherwise utilize K. As another alternative embodiment, the halogenated carbon can be recovered downstream of the exhaust gas stream oxidation treatment. The oxidation treatment unit 913 may, as indicated, include a heat exchanger, and such a heat exchanger may be in the name of Mark R. istist et al. / 6 0 2, 1 3 4 No. ”p〇ΙΝΐ-ΟΡ-liSE This paper standard is common Chinese national standard (〇 阳 > 厶 4 gauge ^ (210 father 297 mm) ~ '--41--- ^^ 1-1 ^^ 1 — ^ 1 ^^ 1 L Αΰΐ. I-I 1 ^ 1 (Read the precautions on the back before filling in this page) 442842 A 7 B7 Military Department Central Ministry of Standards and Technology Consumption Cooperative Newsletter V. Invention Description (33) CATALYTIC OXIDATION APPARATUS AND METHOD OF TREATMENT OF VOC-COHTAINIHG GAS STREAMS "is more fully explained in its heat transfer channel using thermal transfer to strengthen the inserts, and its disclosure is fully referenced and referred to As another modification of the exhaust gas treatment system shown in Figure 12, if it is desired to destroy rather than recover the perfluorocarbon, the saturated water / exhaust gas stream from the grate cooling unit 923 can be recycled to line 931 to The 913, M inlet oxidized tritium provides a low-cost source of hydrogen for the oxidation of perfluorocarbons. 905 may include a pre-washer. Chemicals can be directed to this pre-washer. M changes the characteristics of the material to be washed, for example, by adding ammonia to the tungsten hexafluoride effluent, M produces ammonium phosphonate. Ammonium tungstate has Good soluble special stimulus for its washing and removal. Oxidation unit 91 3 may include a transport tube reactor, K in fc step to eliminate the accumulation of reaction products / product solids. Quench unit 923 can use atomizing nozzle, which uses Most fluids, such as water and air or other gases, are input to reduce the volume of the quench unit. This quench unit may instead include a quenching device such as an ultrasonic nozzle, a sprayer, or a petroleum nozzle, and K completes the quench operation. The oxidizing unit 9 1 3 can be electro-oxidized, or it can otherwise be affected by flame-based oxidation and by any other suitable oxidizing equipment and methods. The flame-based oxidizing unit can utilize any suitable fuel, such as methane. Propane, hydrogen, butane, etc., and the oxidizing medium used in the gasification unit. Usually can include air, oxygen, oxygen-enriched air, and any other gas containing Quality. In Κ step within the broad scope of underground here, the oxidation unit may also comprise a (Read Notes on the back and then fill the page)

• 1T paper size applies to the ten national standards (CNS) A4 specifications (21CTX297 mm) 4 2 442842 A7 B7 V. Description of the invention (40) Fluidized bed thermal oxidizer unit. As mentioned, the pre-oxidation treatment unit 9 05 and the post-oxidation treatment unit 9 1 7 may include any suitable type of scrubber, wet and dry scrubber, M and any other appropriate pre-oxidation and post-oxidation treatment device. Therefore, it will be seen that the exhaust gas flow treatment system of the present invention is suitable for the configuration of various component processing components to be embodied in M, and the processing unit can be embodied in a unit box or casing for use in a processing facility. , Such as semiconductor manufacturing plants. Generally, the treatment system of the present invention contemplates the use of a gas / liquid and a gas / liquid interface structure to provide a gas or liquid outer layer or sheath "hood" to exhaust airflow. It may be desirable to protect the exhaust airflow, such as the containment wall of the gas flow channel, and K to prevent the accumulation and deposition of solids that would occur without such airflow protection, and K and entrainment, especially in the protection of liquid films, which is harmful from air The portion of the emblem and the dissolving condition. Therefore, the exemplified version of the interface structure is described below. It represents the specific structural features and embodiments of this path. Printed by the Employees' Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs (please read the precautions on the back before filling out this page). Figure 13 is a schematic diagram of the anti-blocking population structure according to an exemplary embodiment of the present invention. The population structure is shown in the letter 13 as being connectable to the processing pipeline for coupling to the inlet structure, to which a source of airflow is directed. This upstream pipe can be appropriately thermally tracked in a conventional manner from M, as shown, from an upstream airflow source, such as a semiconductor manufacturing tool, to the entrance flange at the entrance structure. The purpose of this heat tracing is to add sufficient energy to the airflow in the pipeline to prevent the components of this airflow from condensing or sublimating in the inlet structure. This paper size applies Chinese National Standard (CNS) A4 specification (210X 297 mm) 43 A42B42 A7 B7 V. Description of the invention (41.) The entrance structure 1060 shown in FIG. 13 includes an entrance section 1007, including a population projection缘 1016. The population flange fits with the flange 1013 of the upper ring bark section 1008, which terminates at this flange at its upper end. The inlet section may be coupled to upstream particulate-containing solids and / or particulate-solids-forming flow generating facilities 1090, for example, as a semiconductor manufacturing tool. The annular section 1008 includes an inner porous wall 1006, which is an appropriate porosity that is permeable to properties, and an outer solid wall 1009 defining an annular inner volume 1020 therebetween. The inner surface of the inner porous wall 1006 thus defines a flow channel 1066 in the upper annular section 1008. The outer solid wall 1009 is enclosed at its upper and lower ends with respect to the inner wall 1006 by the end walls 1040 and 1042, and M envelopes the annular internal volume. The outer wall 1009 is provided with a gas population 1022, and a gas feed line 1024 is connected to the gas population. A gas feed line 1024 is connected at its outer end to a gas source 1004. A non-return valve 101 4 is arranged on the gas feed pipe line 1024, W to accommodate gas flowing into the annular internal volume 1020. The feed line 1 0 2 4 can also be provided with other flow control devices (not shown) for selectively feeding gas to the interior of the ring from a desired amount of source 4 M and a desired flow rate during system operation. Within the volume of 1020. Printed by the Central Standards Bureau of the Ministry of Economic Affairs, only a copy of Xiaoxian Cooperative ^ — ^ 1 ^^^^ 1----111 m ^^^^ 1 I n · — * 一 '(Please read the notes on the back before filling in this Page) may include a device for heating gas feed line 1024, which raises the temperature of the breathable porous wall 1006. The device for heating the gas feed line 1024 may include an electric heater, a flow tracking tube braid, a heating jacket, or a person skilled in the art, and may be used to transfer thermal energy to the internal passage of the gas feed line 1024 Any other heating process, M increases the temperature of the gas. For the purpose of illustration. The heating device used in the embodiment of Fig. 13 is composed of a heating coil 1023. A hot jacket can also cooperate with the heating device to raise the gas pipeline. The paper scale is suitable for China National Standards (CNS) Α4 ^ grid (210X297 mm) -44- 4428 ^ 2 Α7 87 Central Bureau of Standards, Ministry of Economic Affairs Printed by the Industrial and Consumer Cooperatives V. Description of the Invention (42) 1 02 4 Internal temperature I. The upper ring section 1 08 can also be provided with any high-pressure gas injection port 1050, which is connected to the high-pressure gas supply source 1005, and the high-pressure gas feed line 1052 is connected to this gas injection port 1050. The gas feed line is shown with a pilot control valve 1051 therein, which can be coupled to a flow control device (not shown) for operating the flow control valve 1051 in a predetermined sequence. The high-pressure gas inlet pipe medium 1052 may instead be arranged at any suitable angle with respect to the high-pressure gas injection port 1050, for example, at an oblique angle. If solid accumulation occurs on the inner wall surface of the gas-permeable wall, despite the fixed flux (or "flow through") of the lower pressure gas guided in line 1024 to the annular internal volume 1020, the optional high pressure gas injection port 1050 and The high-pressure gas feed line 1 052 also has advantages. It may include a device for heating the high-pressure gas feed line 1 052, which raises the temperature of the gas. The device for heating the gas feed line 1052 may include a resistance heater. Track the pipeline, heat the jacket, or any other heating system known to those skilled in the art and can be used to transfer thermal energy to the internal passage of the gas feed f-line 1052 to increase the temperature of the gas. For illustration purposes, draw The heating device used in the 13th embodiment is constituted by a heating coil 1 0 54. A thermal jacket can also cooperate with the heating device to increase the internal temperature of the gas line 1 052. The upper ring section 1008 is at its lower end Terminating on a flange 1026, it fits and attaches the flange 1028 of the lower ring section 1030. The flanges 1026 and 1028 can be sealed by providing a sealing device such as the 0-ring 1010 shown in FIG. . The ring section 1030 includes an outer wall 1012, which terminates at the upper end at the flange 1028. The outer wall is an outer jacket member that is joined to the paper standard by its end wall 1044 to this paper. The size of the paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297). (Centi) -4 5 — ^^ 1 I-— ^^ 1 ^^^ 1 1--1- ml n ^ i I ——r (Please read the precautions on the back before filling this page) 4 42842 A7 B7 V. Description of the invention (43) The inner weir wall 1011, K forms a ring-shaped internal container 1032 between the outer wall 1012 and the inner weir wall 1011. The inner weir wall 1011 extends vertically upward as shown in the figure, but terminates at an upper end 1046 It is switched on and off with the lower end of the inner porous wall 1006 in the upper annular section 1008, and M forms a gap 1036 therebetween, defining an overflow weir for the lower annular section 1030. The lower annular section 1030 The outer wall 1012 is provided with a water inlet 1048, a water feed line 1080 connected to the water supply 1003 can be connected to this population, among which a liquid flow control valve 1081 can be operatively coupled with other automatic control devices for maintaining liquid to the lower ring Desired flow rate in section 1030. Water inlet 1048 can be secured to the lower ring in the radial or tangential direction. 1030. A preferred embodiment sets the water inlet 1 048 to be tangentially fixed to the lower annular section 1030, so the water moving to the lower annular section is not guided to the fixed wall, but It is to set the turbulent swirl of the overflow water in the lower ring section, dissipate it by 0, guide it with tangential water, and then, if the momentum interferes with the top height of the water film, make the overflow overflow the water in the lower ring section. The film has the best level. By the Ministry of Economic Affairs, the Central Government Bureau of Work and Poverty Alleviation Cooperatives, the Extending Air Transporting Pipe 1070 can be used to guide particulate-containing solids and / or particulate-forming solids at a specific position in the inlet structure. The transporting pipe i 0 7 0 is coupled It is in a gas flow acceptance relationship with the upstream source 1 090, and directs and discharges the air flow to an appropriate position in the internal gas flow channel 1066, so as to minimize the formation of solids in the inlet structure. The transfer tube 1070 is externally connected by the outer solid wall 1 009, and the inlet 1007 is modified to fit the transfer tube 1070. The transfer tube 1070 may be heated to resist the condensation of the airflow flowing through the tube 1070. In the inlet structure shown in FIG. 13, the tube 1070 is coaxial with the outer porous wall 1006 and the acoustic wall 1006. Outer surface and porous wall of conveying tube 1070 The paper size exceeds the impurity ratio (CNS) Λ4 specification (21 [) x 297 mm) 4 6---------- I / II (read first Read the notes on the back and fill in this page) The Central Bureau of Standards of the Ministry of Consumers only X, printed by the consumer Hezhu company A7 B7 V. Description of the invention (44) The inner surface of 1006 defines an annular volume in between. The gas transfer tube 1070 includes a first end 1072, coupled to a gas flow source 1090 to form a gas flow receiving relationship, and a second end 1074 discharges the gas flow in the gas flow channel 1066. The second end 1074 may discharge the gas flow in the gas flow channel 1066 contained in the upper annular section 1008 or contained in the lower annular section 1030. In the illustrated embodiment, the pipe 1070 discharges the airflow at a point about one-half inch below the upper end 1046 of the weir wall, but it depends on the air flow, processing use, and conditions. The pipe 1070 can extend even lower than the upper end of the weir wall. 1 046, or may terminate above the upper end of the weir wall 1 0 46. The transfer tube 1070 can be constructed, for example, from about one-half to four inches of stainless steel. Those skilled in this art will recognize that the tube 1070 can be composed of various materials, various sizes, various sections, and various structures. The conveying pipe 1 0 70 is a co-circular flow type caused by the positioning of the porous wall 10 06 and the overflow weir 1011. When the processing gas outlet conveying pipe and the inlet 66 are processed with M, the processing gas and the overflow weir 10 are caused. The water vapor mixture of 11 is the smallest. Therefore, the formation of solids between the processing gas exiting the transfer pipe 1 0 0 and the water vapor from the overflow weir 1 0 11 is significantly minimized until the effect of the overflow weir 1 0 1 1 can be flushed into the downstream elimination device. A sufficient downstream point for any solid. In order to determine the anti-clogging efficiency of a given inlet design within the scope of the present invention, a suitable evaluation technique is to monitor the specific population at a flow rate of l-5Slpm at trichlorosilane and the average flow rate of the nitrogen carrier gas after several minutes. The solids accumulation and position of the structure to determine the suitability of the design and the effect of any changes in the entrance structural parameters. It may be desirable to monitor the nature of solid growth during a more observing period. According to the gas flow, processing and use, China National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page) One 4 7 One 442842 Consumption cooperative seal 5; 1 A7 B7 V. Description of invention (45) Depending on the situation, it may also be beneficial to maintain laminar axial airflow in the gas transfer pipe and in the annular section between the outside of the gas transfer pipe and the inside of the porous wall Flow, M. Ensure proper containment of the effluent and the containment chalk at the inlet. The transfer tube 1070 can also be preheated by K, which reduces condensed gas. The solid is formed on the wall of the tube 1070 by the condensation of the gas passing through the tube. Appropriate devices for the heating tube 1070 may include resistance heaters, flow tracking lines, heating jackets, etc. This heating system is constructed and arranged to transfer thermal energy to the internal channels of the transfer tube 1070 to resist condensation. For illustrative purposes, the heating device is shown as including a heating coil 1076. A thermal jacket can also cooperate with the heating device to raise the internal temperature of the transfer tube 1070. A thermal jacket can be used to raise the temperature of the sidewalls to prevent the condensable processing gas from condensing in the tube. At its lower end, the lower ring section 1 030 can be suitably joined to the housing of the water scrubber 1 0 1 3. The water scrubber can be constructed in a conventional manner for washing to remove particles and soluble fractions from the treatment stream. Alternatively, the inlet structure 1060 may be coupled to any other processing equipment for disposal or treatment of the gas flow through the inlet structure from the inlet end to its discharge end. Therefore, by using the inlet structure 1060 to provide a gas flow path 1066, the flowing liquid gas can flow through the square quotient shown by the arrow " 1001 "in Fig. 13 to the place shown by the arrow M 0 0 2 in Fig. 13 The direction of the discharge end. In operation, the gas containing particulate solids is guided by an upstream source, such as a semiconductor manufacturing tool (not shown), by appropriate connection pipes, which, as mentioned above, can be hot-tracked, and K is at the entrance structure Suppresses harmful sublimation or condensation of airflow components. The flow enters the entrance structure 1060 in the flow direction shown by the arrow "1" and passes through the population section 1007 (or if installed, through the transfer pipe 1070) (please read the precautions on the back before filling this page)

* 1T This paper size applies to China National Standards (CNS) A4 (210X 297 mm) 4 8-A42B42 A7 __B7_ 5. Description of the invention (4Γ *) and enter the upper ring section 100S. Gases such as nitrogen, or other gases. Tap 4 flows through a gas feed line 1024 connected to port 1022, and enters a ring-shaped internal volume 1020. The induced gas flows from the annular internal volume 1020 through the breathable wall 1006 and enters the internal gas flow channel 1066. Particulate or particulate-forming gas therefore flows when the gas from the gas feed line 1024 flows into the annular internal volume 1020 and passes through the gas-permeable wall 1006, flows through the internal gas flow channel 1066, and enters the water washer 1013. In this way, the gas from source 1 004 pressurizes the ring-shaped internal volume 10 20. This pressure ensures a stable flow of gas through the porous wall and into the internal gas flow channel 1066. With such a low flow rate, the g of the gas flows through the breathable wall to keep the particles in the air flow flowing through the internal gas flow channel 1066, leaving the inner wall surface of the inlet structure. Moreover, any gas that exists in the internal flow channel 10S6 with the gas flow also remains away from the inner wall surface of the inlet structure. If desired, the gas feed line 1024 can be thermally tracked. Such thermal tracking may be expected if the airflow flowing through the inlet structure contains materials that may condense or sublimate and deposit on the walls of the inlet structure. At the same time, through the high-pressure gas injection port 1050, the high-pressure gas from the high-pressure gas supply source 1005 can periodically flow through the high-pressure gas feed line 1052 to the ring-shaped internal volume 1020 through the high-pressure gas injection port 1050. For this purpose. A pipeline control valve (not shown) may be provided in the line 1052 to adapt to the pulsation guidance of the high-pressure gas. In this way, high-pressure gas is injected into the annular internal volume at a prescribed or predetermined interval, so that any particles accumulated on the inner surface of the gas-permeable wall 1006 are broken. The duration and time sequence of the pulsation-guided high-pressure gas. In this technique, the paper music scale is applicable to the Chinese National Standard (CNS) A4 specification (21〇 ×: 297 mm) -4 9 11-- II- —i ^ ^ i-1 ^ 々.   --^^^^ 1 One OJ (Please read the notes on the back before filling in this page) A7 B7 K-Industry Consumer Cooperation of the Central Standards Bureau of the Ministry of Economic Affairs Du Yin 袈 5. Description of the invention (47) 1 1 1 M OK without undue experimentation to achieve the desired wall wash 1 1 | Brush effect [ft »* response, which will prevent solids from accumulating on the surface of the breathable wall> If necessary, 1 I m When the washing machine for manufacturing tools adopts the structure, please firstly 1 1 I Interrupt this high pressure injection when the tool is cycled in batches, and read the back through the appropriate integration operation 1 1 The control device connected to the tool control system 1 Eliminate the problem in the tool Exhaust 0 Pressure 1 Meaning I Fluctuation 0 For this purpose,-control valves, such as-solenoid valves can be properly coupled with control work items 1 | 1 1 Assembly assembly Structural solid pickled flanges 10 2 6 and 1028 May be used for each other V_ 1 I clamping t VX yt upper ring section 1008 lower ring section 1 030 fast separation 1 1 〇 For this purpose, a clip speed can be used to separate the clips 0. Suitable materials such as 1 1 a Corrosion-resistant, high-temperature elastomer material, which forms a seal gasket 1010 between the flanges 10 02 6 and 1028. This elastomer gasket also functions as a heat barrier.    1 1 Minimize the transition from the ring section on the thermal g to the ring section below the entrance structure * 1 The item I is particularly important in the thermal tracking example of the present invention. 0 i The ring section above the P structure The breathable wall 1 00 6 may be formed from any suitable breathable material, such as ceramics, gold tins and metal alloys, and plastics. ≫ As a specific example, the wall may be made of-Η as te 1 1 〇y 27 6 material The outer wall 1 0 09 forming the ring-shaped 1 I section on the 0 may also be formed of I from any suitable material and may be, for example, 1 1 | —.  Thin-walled steel pipe 0 1 1 The ring section 1 030 under the P structure can be formed of any suitable material such as a poly 1 1 1 vinyl chloride plastic. From the water supply source 1003, a water jet 1 1 is injected into the annular internal volume 1032 0 between the outer wall 1012 and the inner weir wall 10 11 through a line 1050, preferably 1I. Water is injected tangentially, κ Water 1 1 I in the ring-shaped internal volume 1 Angular momentum is allowed to lead the water to the top 1046 of the weir wall 10 11 and within the P structure of the person 1 1 This paper size applies Chinese National Standard (CNS) Λ4 specification (2Ϊ0 × 297 Mm) —50 4 ^ 8 4 2 A7 B7 Printed by the Central Standard of the Ministry of Economic Affairs and the Consumers ’Cooperative Cooperative V. Description of the invention (48) 1 1 1 Flow channel 1 0 6 6 Spiral downward along the surface of the internal weir wall This water flow down the inner surface of the weir wall 10 11!! | Use M to wash down any exciter particles along the flow channel I | 1066 to the water washing device 1014 below the P structure. As mentioned, please First 1 I, for example, when the downstream processing unit is a combustion scrubber, the lower ring section 1 0 30 is a read back 1 1 can be omitted optional optional Feature square intended I i I 1 from the upstream processing unit and the travel of the α structure of the scrubber unit the exhaust gas matters t 1 1 I 1 again.   Pipe pressure is released. The pressure drop S through the inlet structure can be easily determined by M. The pressure drop can be borrowed— * Ph 〇t 〇he 1 i C meter or other appropriate M force sense-IfW meter to sense * * 1 1 and the number of this pressure drop May be issued to appropriate monitoring and control equipment 3 Μ Surveillance 1 1 Blockage at the inlet of the scrubber 〇 1 1 Use of the inlet according to the present invention Structure »Can be used in water scrubbers and semi-manufactured 1 fixture manufacturing operations Provide an interface between exhaust gas streams »It is normally processed 1 I operation is not repeated plugging 0 The structure of the present invention □ Structure provided-with two auxiliary ribs 1 1 I flow interface» Stable low-flow cleaning flow and-high pressure Pulsating flow 〇Low 1 1 The flowing cleaning flow causes a net flux of an inert gas such as nitrogen »leaving the inner surface of the upper ring 1 section to the centerline of the central flow channel 1066 〇 high pressure gas gaa flow 1 dynamic flow pair Plugging member providing one kind of self-cleaning ability billion rows high pressure gas stream Jit.  Use 1 i Μ to eliminate any particles accumulated in the 1 I surface of the ring structure on the central flow channel 1066. Any particles 0 1 1 gas, entrained particles, and previously deposited particles in the human P structure 1 1 The lower annular section is guided into the overflow on the inner wall surface to flush down into the person 1 1 The water scrubber 0 Μ downstream of the human □ structure This way, the upper annular section 1 I Direct interface 1 1 I between the ventilating wall and the weir wall in the annular section under the α structure. Provides-a highly efficient entry form, which is effective in making particles 1 1 in paper size in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) -51 — 442842 A7 Central Standards Bureau, Ministry of Economic Affairs Zhengong Consumption Hezhu Club printed B7 V. Invention Description (49) The accumulation of solids is the least. The population structure of the present invention has several advantages. When applied to semiconductor manufacturing facilities and water scrubber treatment systems for processing semiconductor waste gas effluent from tools, the exhaust gas from semiconductor tools can be thinly heated, and it is self-draining at the inlet structure of the water scrubber. The air port goes all the way to the water interface. Heat tracing at the inlet pipeline may conduct energy into the pipeline to heat the pipeline, which transfers energy to the flowing gas stream by forced convection. The process gas division heats the high-pressure gas flow line to heat the heat-tracing gas flow line by flowing gas to the upper ring section, and the heat-tracing high-pressure gas flow line by feeding pulsating high-pressure gas to the ring volume inside the ring section above the inlet structure. , Going down to the overflow weir of the annular section below the entrance structure. This flow of heated gas will keep the process gas flowing through the central flow channel of the inlet structure at a temperature determined by the vapor pressure of any particulate-forming gas in the gas stream flowing from the upstream processing unit to the inlet structure, which otherwise Will condense or sublimate and deposit on the walls of the entrance structure. Another advantage of the inlet structure of the present invention is that the structure can be easily disassembled. In the event that the inlet structure is blocked during operation, the structure can be easily separated as long as the clips or other fixing elements that hold the flanges of the inlet structure to each other are removed. The upper ring section can thus be removed by removing the clamps that hold the respective flanges in place, and separate the respective gas feed lines feeding the upper ring section for K replacement. Another advantage of the inlet structure of the present invention is that it is self-cleaning in characteristics. The particles entrained in the air flow flowing from the upstream processing unit to the inlet structure, or formed by chemical reactions in the inlet structure, can be easily looped above the inlet structure and injected into the pulsation in the internal annular volume of the person. The high-pressure paper size applies to the Chinese National Standard (CNS) Α4 specification (210 × 297 mm) {Please read the notes on the back before filling out this page) -52- A7 B7 Printed by the Consumer Goods Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs Description of the invention (50) 1 1 gas is cleaned from the breathable wall of the population structure. At this time, the particles removed from the inner wall surface of the upper ring section of the P structure I 1 [are then guided to the weir wall. Over 1 I flow part, the solids of the pellets are flushed here to the downstream scrubber > High pressure gas please read the pressure of I 1 I pressure pulsation first, the period and period of performance can be easily set to K, K adapts to read back 1 The prevalence of microparticle concentration in these systems and the characteristics of these solids The effectiveness of the injection will depend on the characteristics of the particulate solids. The matter of the invention [1 and 1] The structure is therefore g clean in nature, without using this to represent the previous technology flow. The scraper or plunger device of the Tianda Danhang cleaning device. 0 Page 1 1 Into the porous wall element of the annular section in the structure * The material specifications are based on the entry processing from the 1 1 I upstream processing unit. Depending on the form, if the gas stream contains 1 part of the acid group, these gases will be absorbed in the water scrubber and will exist in the water circulating in the ring section to the overflow weir wall under the structure of the person 1 ΰ There is an overflow weir wall 1 | Water may splash on the porous inner wall of the annular section on the structure. 0 The porous 1 1 wall in this case should be selected from the anticorrosive construction material. 1 1 1 The material of gold tin is Ha S t el 1 0 y 27610 1 It exhibits 1 excellent corrosion resistance under low temperature hydrated acid condition I The structure of the present invention 9 Another advantage is that it is used in water scrubbers 1 | Use T to reduce the steam reflux BT from the top of the 1 I of the water scrubber into the processing pipe when using the P structure as empirically explained in this example. The intention is to explain this point. Please note 1 1 Particles may be present in the exhaust stream of some semi-corporeal tools, such as from 1 1 Entrained particles of a mechanical tool or chemical reactants such as in the flow path 气流 of a gas stream 1 1 air Μ reactant 〇1 | The present invention makes the previously described Richards ο η ring emperor 1 master or put it, | II ----- 1 J Eliminated 〇 As the gas enters the porous surface of the inner surface of the annular section of the P m structure 1 1 This paper size applies to China National Standard (CNS) A4 (210X 297 mm) -53 -442842 Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs ^ A7 B7 V. Description of the invention (51) Stable outflow, when the inner wall surface of the upper ring section, the state of the static boundary layer cannot be generated. The net flux of flowing gas comes from Breathable wall, its function "pushes" the process gas away from the wall of the central flow channel of the boundary inlet structure, and avoids the existence of static boundary conditions, and avoids the Richardson ring effect by M swim. Therefore, if due to the chemical reaction in the flow The particles are formed, and the particles thus formed cannot find a wall to agglomerate thereon. The particles will instead flow into the water scrubber with the airflow. The same is true of entrained particles. Once the particles reach the top of the population, they will become entrained in the gas flow because they will not have walls to collect on them. Against the condition of the Richardson ring effect, the porous wall in the ring section of the inlet structure of the present invention is used as an effective barrier layer for the steam to be transferred back to the exhaust line of the treatment system. Any backward transfer will be very slow due to the interdiffusion mechanism described above. This factor will greatly increase the mean time to failure of the scrubber. Due to the inlet structure of the present invention, the scrubber inlet and the exhaust gas line will not often be blocked. When the transfer pipe 70 is used, a loop-shaped gas shield is formed by the action of the gas flowing through the porous wall 6, thereby minimizing or eliminating the backflow of steam. Although the porous wall member of the annular section above the inlet structure of the present invention has been described in this case as being constructed of a metallic material, please be aware that the breathable wall may be formed of any suitable construction material. For example, the porous wall can be a porous ceramic, plastic (such as porous polyethylene, polypropylene, polytetrafluoroethylene, etc.) or can withstand the aggressive atmosphere and temperature extremes that may exist when using the population structure of the present invention , And the formation of other materials under pressure. .  _Although the present invention has been illustrated in the example illustrated in Figure 13 in this case, the Chinese paper standard (CNS) Α4 specification (210X 297 mm) is applied to the paper size (Please read the precautions on the back before filling out this page ) -54-4428 ^ 2 The Central Standards Bureau of the Ministry of Economic Affairs of the People's Republic of China-x Poverty Alleviation Co., Ltd. printed A7 B7 V. Invention Description (52) Contains individual upper and lower ring sections, such as by flanges and Associated quick release clips or other interconnecting devices are coupled to each other, but please be aware that this entry structure may be formed as a unitary or integrated structure as may be desirable or necessary in the intended final use application of the present invention, And the lower ring segment is optional to the upper ring segment, and may be unnecessary in some cases. Please refer to FIG. 14, which illustrates another embodiment of an anti-clogging population structure. The entrance 1100 may instead include a tapered side edge 105 and is circumscribed by a solid outer wall 1110. The outer surface of the conveying tube 1112 and the inner surface of the conical side edge 1105 define an annular gas flow channel 1115 therebetween. The dimensional side edge κ an inert gas and / or a liquid radon surrounds a particulate-containing solid and / or solid to form a gas flow. Inert gas enters the inlet structure through a feed line 1120. The tapered side edges that open downward and outward have a progressively reduced cross-sectional area, which results in an increase in the speed of the inert gas and a decrease in pressure. The tapered side edge 1105 is designed to produce an inert gas at a speed equal to the speed of the air flow discharged from the transfer tube Π 12. The matching of the flow velocity between the gas flow and the inert gas is favorable for co-layered flow, M prevents disturbances in the gas flow, and prevents the interface between the two flow flows from mixing. The efficiency of the inlet is therefore enhanced by minimizing the accumulation of particulate solids during operation. Opening the tapered sides downwards and outwards can also use K to guide the liquid into the inlet structure. The outer wall 1110 and the lower end (periphery of the bottom) of the two-dimensional side edge are connected to each other in a horizontally split manner to define a liquid flow channel 1 U 5 therebetween. Spray The pout 1125 can be spread around in the entrance to disperse the liquid. The tapered side edges direct liquid to the wall surface 1130. If the liquid is, for example, water, a thin film of water will be formed on the wall surface 1 1 3 0, and M will wash the particulate solids to the downstream. This paper applies the Chinese National Standard (CNS) A4 specification (210 × 297 mm). 55-(Please read the precautions on the back before filling out this page) dd2842 A7 M "-Printed by B7 of the Central Bureau of Standards and Labor Cooperatives only. V. Description of the Invention (53) Scrubber. The material specifications of the two-dimensional side edge depend on the inert gas and gas flow flowing through the transfer tube 1Π2. If the gas stream contains acidic components, these gases will be present in the water circulating to the jet nozzle 1125. The tapered side edge should in this case be made of a corrosion resistant material. As discussed with reference to the embodiment of Fig. 13, the transfer tube, inert gas, and / or water may be heated to reduce condensation. FIG. 15 illustrates another example of an anti-clogging inlet structure 1200. The outer solid wall 1205 and the porous inner wall 1210 define an annular inner volume therebetween. The extended airflow transfer tube 1212 can be used to direct a particulate-containing solid and / or particulate-forming solids gas stream at a particular desired location on the inlet structure. The transfer tube 1212 is coupled into a gas flow receiving relationship with an upstream source, and directs and discharges the gas flow to a suitable location within the inlet structure. The surface of the inner porous wall 1210 facing the meat portion circumscribes the outer surface of the transfer tube 1212. The outer wall 1205 is enclosed at its upper end by a terminal 1 1 2 1 5. The outer wall is provided with a water inlet 1225, which can be connected to a water supply source. The end cover 1215 is provided with a gas inlet 1230, and the M glaze guides the inert gas into the inlet structure into the inlet structure. The end cap 1215 may instead include a porous diffuser structure, and the K-axis disperses inert gas into the inlet structure. A gas chamber or tank may optionally contain an inert gas, such as nitrogen, for introduction into the inlet. In this embodiment, water and M are squeezed through the porous inner wall 1210, M forms a thin liquid film, and K rinses the particles through the population structure. The porous wall 1210 may be any suitable material, such as ceramics. Metal, metal alloy, or a plastic such as polyvinyl chloride. As discussed above, the transfer tube, inert gas, and / or water may be heated by K to reduce or eliminate condensation. _ As a specific test structure shown in Figure 1 and 5__ Two alternatives, one paper size can be applied to China® Home Standard (CNS) A4 specifications (210X 297 male ~ " (Please read the back first) Please pay attention to this page before filling in this page.] 5 6 ^ Printed by the Central Standards Bureau of the Ministry of Economic Affairs, K. Co., Ltd. Consumer Cooperative, 442,842. 5. Description of the invention (54) Refer to the overflow weir of the type shown in Figure 13 instead of the porous inner wall 1210. The weir wall can be I M is structured to have an upper end, and an open relationship is formed between the upper end caps 1 2 and 15 to form a gap defining an overflow weir therebetween. Fig. 16 shows another embodiment of an anti-blocking population structure 1300. The upper ring bark section 1305 includes an upper inner porous wall 1310 and an outer upper solid wall 1315 defining an upper annular inner chamber 1320 therebetween. An extended airflow transfer pipe 1322 is circumscribed by the upper porous wall 1310 and is shown coaxially with the porous wall 1310. Gas The outer surface of the transfer tube and the inner surface of the upper porous wall define an annular volume therebetween. The transfer tube 1322 is coupled to accept a gas flow with an upstream gas source. The upper solid wall 1315 includes a population 1325, which guides the appropriate fluid. enter Inner chamber 1 320. The lower annular section 1330 includes a lower inner porous wall 1335 and an outer lower solid wall 1340, defining an annular inner chamber 1345 therebetween. The lower solid wall includes an inlet 1350, and M guides fluid into the lower chamber 1345. In operation, the inlet structure of Figure 16 allows inert gas to pass through the upper porous wall 1310 and water to squeeze through the lower porous wall 1 3 3 5. The flow of the inert gas keeps the particles in the air stream away from the inner wall surface of the inlet structure. A thin water film on the inner surface of the perforated wall 1335 removes any particles from the population structure. Figure 16 shows that the feed tube 1322 is above a transition site 1355 and discharges airflow between the upper section 1305 and the lower section 1330. The transition portion 1355 may be a portion that adjoins the upper ring section 1305 and the lower ring section 1330. The transition section 1355 may also include a section that separates the upper section 1305 and the lower section 1330 from the external gas transfer pipe 1322. Please understand that the transfer tube can be extended below the transition portion 1355 and enter the lower section. Regardless of the paper size of the transfer tube, the Chinese National Standard (CNS) A4 specification (210 × 297 mm) applies (please first Read the notes on the back and fill in this page again),-° 疒 ~ 57-at 42 8 厶 2 Α7 Β7 V. Description of the invention (5Γ >) 1322 Whether to discharge the gas flow in the upper section, the discharge in the transition site, or The discharge in the lower section will depend on the gas flow, processing use, and conditions. As discussed above, the transfer tube, inert gas, and / or water can be heated to reduce or eliminate condensation. M 17 is a schematic cross-sectional front view of a gas / liquid interface structure 1 410 according to an embodiment of the present invention. The gas / liquid interface structure 1410 includes a first vertically extending inlet flow channel member 1412 defined by a cylindrical elongated wall 1414. The cylindrical wall 1414 circumscribes an enclosed flow channel 1418 within the population flow channel member 1412. A radially outwardly extending flange 1416 is provided at the upper end of the cylindrical wall 1414 for joining the gas / tired interface structure to the associated process flow pipes, conduits, meters, etc. The first population flow channel member 1412 therefore has a population 1420 at its upper end and a corresponding outlet 1 42 2 at its lower end, so the opening inlet and outlet end K internal volume defines a flow path including the flow channel 1418 from an upstream processing unit The gas of 1458 may flow through it, as shown in the case of line 1460 in FIG. 17. The length of the first population flow channel member 1412 may be significantly shorter than that exemplified in FIG. 13, and the end of the outlet 1422 of this flow channel member may terminate in the internal annular volume 1430 of the structure, just below the top wall 1438. Alternatively, the end of the outlet 1422 of the flow channel member may terminate at a lower vertical point within the second flow channel member 1424 than illustrated in FIG. 13. The vertical downward degree of the first inlet flow channel member 1412 can therefore be changed during the implementation of the present invention, and the specific length and size characteristics can be easily determined-5 8 ~ This paper size applies to the Chinese National Cotton Liner (CNS) Α4 specification (210X297 (Mm) (Read the precautions on the back before filling in this page) 442842 A7 B7 V. Description of the invention (5B) without undue experimentation, κ choose a specific application using the entrance structure of the present invention to achieve the desired operating characteristics Shape and configuration. ^ The upstream processing unit 1458 may, for example, contain half of the carcass manufacturing tools and associated exhaust gas processing equipment. The effluent treatment apparatus may include an oxidizer for oxidizing oxidizable components in the exhaust gas. Suitable oxidizers are of widely different types, and may be constituted, for example, by a thermal oxidation unit, an electrothermal oxidizer, and the like. The upstream processing unit 1 45 8 includes a gas generating device and a gas processing device for semiconductor manufacturing operations. The airflow of the population 1420 directed to the first inlet flow channel member 1412 may be at an elevated temperature and may contain actual concentrations, such as Particulate solids in the form of sub-micron particles. Printed by the Central Standards Bureau of the Ministry of Economic Affairs, a separate consumer cooperative (please read the precautions on the back before filling out this page). The interface structure 1410 also includes a second flow channel member 24, which is connected to the first flow channel member 1412, as shown in the figure. As shown, they are separated to define an annular volume 1430 therebetween. The second flow channel member 1424 extends downward to a lower end 1468 below the lower end of the first flow channel member 1412, so the opening outlet 1422 of the first flow channel member is perpendicular to the lower end 1 468 of the second flow channel 1424. Kailuan Department. As discussed, the position of the outlet 1422 of the first flow channel member can be changed vertically in the broad sense of the present invention. The second flow channel member 1424 includes an upper liquid-permeable portion 1426 and a remaining liquid-impermeable portion. Portion 1428 extends downward from the liquid permeable portion 1426 as shown. The upper liquid-permeable portion 1426 and the lower liquid-impermeable portion 1428 can be formed in any suitable manner. For example, by joining an upper porous cylindrical section 1426 to a solid wall cylindrical section 1428 that was originally separate, the respective paper scales apply the Chinese National Standard (CNS) A4 specification (210 × 297 mm)- 59-B7 4 · The work of the Central Bureau of Standards and Labor was eliminated by the co-operative cooperatives. 4- V. Description of the invention (3 7) 1 1 1 Partially by brazing, welding, welding, mechanical fasteners, or K Any other suitable method! | In the proper way, by appropriate joining devices and methods to join each other) 1 I or, the second flow channel member 1 424 can be formed from a unitary cylindrical tube, please read 1 1 Notes such as water jet cutting, etching, sintering, micro-electro-machining > Note t or by M. Porosity or permeability characteristics can be transmitted to the upper part of this tubular member. Note 1 Any other suitable technique It is better that the liquid is permeable in characteristics. Then I 1 1 is that the second flow channel member K is initially The upper part and the lower part are formed, and they are joined together, and the upper part is made of a porous sintered metal sheet, a material family, a porous plastic material, a porous ceramic material, or other porous 1 1 materials. The composition, in which the porosity is a sufficient size characteristic, Μ is explained in more detail below 1 i, allowing the tired body to penetrate. 1 Ordering gas / liquid interface structure 1 4 1 0 Including--outer wall member 1 4 3 4, encapsulation type 1 I is externally connected to the second flow channel structure, and defines an enclosed inner ring shape 1 | product 1470. The outer wall member 1434 includes a cylindrical side wall 1436 i-.  The top wall 1 I 1 1 438 and the bottom end wall 14 40 collectively enclose the internal annular volume 1 47 0 · The side 1 wall 1 4 3 6 is provided with a liquid guide port 1 4 4 2. The mouth can be provided in any suitable way, but in the illustrated embodiment, it is formed by a tubular mouth extension 1 4 4 4 or otherwise, the mouth can be only--on the side wall, or other liquid Into the structure's hole P 1 I or open P, so that liquid can be poured into the inner ring volume from an external liquid supply source 1 1 product 1470 0 1 1 In the example of Figure 7 the liquid inlet 1442 and the flow control valve are contained therein. 1 1 1448 coupling of liquid guide line 1 446. The tired population pipeline i 4 4 6 yo kk 1 1 connected to the liquid supply tank 1 450 〇1 t Figure 18 is a top plan view of the device of Figure 17, showing the tangential feed configuration for the liquid supply 1 1 This paper size applies to China National Standard (CNS) Λ4 specification (210X 297 mm) ^ 6 0 442 842 A7 Central Ministry of Economic Affairs, Ministry of Economic Affairs only eliminates cooperation and cooperation 'Social Seal' B7 V. Description of Invention (58) The encapsulating internal annular volume 1470 of the interface structure is shown in Fig. 18. The tubular mouth extension 1 444 is arranged to intersect tangentially and join the cylindrical side wall of the outer wall member. K The liquid guided in this way is wound on a porous cylinder Shaped segment (permeability of the upper part of the fatigue body 1426), which is highly evenly distributed around the periphery, so the liquid film leaking through the porous cylindrical segment is correspondingly uniform around the periphery. As explained more fully below, the inner wall of the cover Surface 1 47 2. Liquid flow control valve 1 448 in line 1 446 may be coupled to a suitable controller / timer device, including a central processing unit (CPU), microprocessor, flow control panel, and / or auxiliary monitoring And a control device to provide a predetermined or otherwise selected fatigue flow from the storage tank 1450 through line 1 446 to the liquid inlet 1442. The liquid thus guided fills the internal annular volume 1470, and this liquid can be used at any Appropriate processing conditions are guided by M. In order for the processing gas stream, such as heat from semiconductor manufacturing operations, to be filled with particulate exhaust gas, the liquid in the internal annular volume 1470 may be water or other aqueous media. Since the second flow channel member 1 4 2 4 The liquid-permeable property of the upper liquid-permeable portion 1 426, the liquid from the inner annular volume 1470 passes through the upper portion 1426 of the second flow channel member, and the inner wall surface 1432 of this upper portion is shown as a liquid droplet 1 4 5 4. \ The discharged liquid droplets fall and coalesce with other liquid droplets due to the effect of gravity, and gather on the inner wall surface 1472 of the liquid-impermeable portion under the second flow channel member to form a downward flowing liquid film 1456. Since The liquid in the liquid film discharged from the open end 1468 under the second flow channel member can be guided to the Tongdang collection and processing device (not shown), for example, for This paper size is applicable to China National Standard (CNS) Λ4 specification (210X297 mm) (Please read the precautions on the back before filling this page) -61-4428 4 2 A7 B7 Central Ministry of Economic Affairs 4'-office consumption Cooperative cooperative seal V. Description of invention (59) 1 1 I Co-processing of swim processing unit 1 4 6 4 The air flow flows in the pipeline 1462 and second flow 1 i I The gas flow channel 1452 of the channel member flows to this processing unit 0 1 I The downstream processing unit 1 464 can be a water scrubber, reaction chamber, or other processing, please first 1 1! Device or processing area r in line 1 462 flow from channel 1 45 2 in its read back 1 1 goes further Processing operation 1 The last exhaust gas is in line 1466 from bottom to ikj 5 1 to 1 1 to be discharged from the processing unit 0 to the matter 1 I 1 1 The gas / liquid interface structure 1 410 is therefore structured to be used in Between the channel members * the liquid permeable part above the second flow channel member page 1426! | Provide _- internal annular volume 1430 1 thus leaking through the upper part of the liquid permeable 1 1 The liquid can coalesce and produce a falling liquid Thin film 1456 〇With this configuration, § 1 1 flow channel 1 4 1 8 gas flowing to flow channel 1 452 encounters the second flow 1 order the inner wall surface of the lower part of the channel member 1472 «its M — * protective liquid film 1456 1 1 to cover Therefore, any corrosive substances in the gas discharged from the 1 end 1 P 1 under the first flow channel member will be buffered by 1 i relative to the inner wall surface " > Μ in the second flow channel structure The inner wall surface of this piece minimizes the corrosion and adverse effects. 1 The reaction effect is minimized. 0 1 1 and the liquid is guided to the second flow channel member and the outer wall member. The internal annular volume of 1 4 3 4 t 1 1 1 > 1 Provide— * Liquid storage tank " coating "structure 0 1 1 I The liquid is supplied to the porous upper part of the second flow channel member for transmission through 1 I, and the liquid" leaks down "r Μ in the second The inner wall surface 1 1 of the flow channel member is formed into a protective film 1 1 This falling film on the inner surface 1 47 2 of the second flow channel member is also used to entrain and transport any particulate airflow away from the surface, in the absence of this liquid When filming, 1 l I may deposit and accumulate on the inner wall surface of the second flow channel member. 0 1 1 This paper size applies to China National Standard (CNS) A4 (210X 297 mm) -62-442842 A7 B7 Central Printed by the K-Kong Consumer Cooperative Co., Ltd. V. Description of the Invention (3) 1 1 1 Because of this, the falling liquid film is provided on the inner wall of the second flow channel member 1 1 1-.  This kind of protective cutting energy, M and provides-a kind of entrained medium, which transfers the solid particles 1 | body and any other gaseous components away from «Otherwise, when it accumulates in the flow channel, please read 1 I the internal wall surface of the component first. Will be harmful to read back 1¾ 1 1 1 As another addition to this structure illustrated in Figure 17-advantages * use _.  Permeable Note 1 | Italian I liquid part 1426, compared with lifting and drying-such as the structure of a liquid overflow weir, Matter 1 I re 1 [where the liquid in the internal annular volume 1470 will only overflow The upper end of the wall 1 426 is filled in, and the film on the wall flows down the entire inner surface length 1 | of the second flow channel member, so as to minimize the use of liquid. The soil overflow weir structure 1 i 1 of the present invention keeps the liquid required for operation at a very low level 0 1 1 The leakage overflow weir structure of the present invention is superior to the liquid overflow weir structure 1 of the m order. , Advantages. For the latter, precise alignment with the vertical is required in order for the overflow weir to work efficiently as designed 1 1 while the leakage weir structure can withstand 1 I deviations from normal (vertical) orientation without losing or compromising operational design efficiency 1 1 In other words, the seepage overflow weir structure of the present invention is characterized in that the addition rate and structure level of the overflow weir water 1 are produced, and the rate of t3 \ m small wet slip I i with the liquid-permeable weir wall is released. Coupling (because there is no need to establish and maintain the limit of liquid inventory, although it is available for opening 1 1) HJI Μ is discharged from the overflow weir, as in the case of the conventional overflow structure. 0 1 I as the gas / liquid interface of the type illustrated in Figure 17 Structure--Case 1 1 I Evidential example, this structure can be used downstream of the 1 1 oxidizer unit processing the heat from the exhaust gas from the semiconductor manufacturing operation, so the gas flow in line 1 460 into the interface 1 1 structure 1410 For increasing temperatures and filling with particles »such as dioxide i 1 Silicon, particulate metal, and U-like particles, such as sub-micron-sized particles or even larger solid 1 I bodies, M and aggressive solids 1 1 This paper size applies to China's national standard (CNS} A4 specification (2 丨 OX 297) (%) -63-Printed by the Central Bureau of Standards, tw Industrial and Consumer Cooperatives, 1i 442842 A7 B7 V. Description of the invention (61) In this spring embodiment, the upper part 1426 of the second flow channel member may have a thickness of about 1/16 At this time, the average pore size is composed of a sintered gold tincture wall of about 2 microns. The length of the first flow channel member 1412 may be about 44S inches and a diameter of about 2. 5 o'clock. The corresponding second flow channel member 1424 may correspond to a length of about 1 3.  5 inches with a diameter of about 4.  5 o'clock. The outer wall members 1 4 3 4 may have a vertical length of about 5.  At 5 o'clock, there is a diameter of about 6 inches. In this system, water can be used as the liquid medium from the storage tank 1450, which is introduced into the internal annular volume 1470 for the liquid to leak into the liquid-permeable portion 1426 above the second flow path member. Surface 1432. The water used in this system can be about 0.  1-0.  3 gallons / minute operation. Industrial applicability The exhaust gas treatment system of the present invention can be used for processing industrial exhaust fluids. Exhaust gases such as those produced in semiconductor manufacturing, optoelectronic processing, and other exhaust gas generation operations, where the effluent undergoes a process for purification, extracts useful airflow components from it, and recovers heat from the elevated temperature exhaust stream heat exchange , And / or other treatments that make the final discharge the desired characteristics. The exhaust air treatment system can be properly integrated in a lightweight unitized device configuration. In the case of semiconductor manufacturing effluent gas streams, effluent treatment should include oxidation of harmful stream components, gas scrubbing, and particulate solids removal. The effluent treatment system of the present invention may employ an inlet structure, which is structured and arranged to minimize inlet effects such as particulate solid deposition, air flow deterioration, and adverse hydrodynamic flow effects. This paper size applies to China National Standard (CNS) Α4 specification (210X297 mm) (Please read the precautions on the back before filling this page) I V-

-II -64-

Claims (1)

442842 A0CD 6. Scope of patent application --- 1. An exhaust airflow treatment system, including: a device for pretreatment of the exhaust airflow to enhance its characteristics for subsequent oxidation treatment; an oxidation unit for oxidizing at least the oxidizable exhaust airflow A part of the component M eliminates these oxidizable components; the device for the post-oxidation treatment of the exhaust gas stream, and the enhancement of the characteristics of the exhaust gas stream for the self-treatment system. 2. For example, the exhaust air treatment system of the patent application No. 1 includes a gas inlet structure for the K-liquid or gas cover medium cover to exhaust air. 3. The exhaust gas treatment system of item 2 of the patent application, wherein the cover medium contains a gas. 4. The exhaust gas treatment system according to item 2 of the patent application, wherein the cover medium contains a liquid. 5. For example, the exhaust gas flow processing system in the scope of claim 2, wherein the inlet structure includes a gas / liquid interface structure for transporting exhaust gas from its upstream source to a downstream processing unit, and the gas / liquid interface structure includes: Printed by the Cooperative of the Central Government Bureau of the Ministry of Economic Affairs (please read the note “$” on the back before filling out this page) A first vertically extending inlet flow channel member with an upper inlet for guiding the airflow and a lower end for discharging the Air flow: a second flow channel member, which is connected to the first flow channel member, and is spaced apart from it, K defines a circular volume therebetween, and the second flow channel member extends downward to a first flow channel member The lower end is lower than the lower end, and the second flow channel member has an upper liquid-permeable portion at a height above the lower end of the first flow channel member, and a liquid-impermeable portion below the upper liquid-permeable portion; Paper size applies to national standard (CNS) Α4 specification (210X297 mm) Λ 442842 A8 B8 C8 D8 VI. Delimitation of patent application scope and its combination The flow channel through the movable contact of two outer sealing receiving bag-like product of formula, the outer wall of the inner structure of the sealing ring portion and a packet of M in the two streams. The volume of the diversion volume is the liquid supply that encloses the ring supply part, and the inner α is enclosed in the wall of the body fluid structure of the moving flow fc— rr ΜΠ The structure of the night structure and the outer structure of the wall piece flow out of the bl3. The item contains the B-parts of the body fluid, and the special parts that can be used in the upper part of the body can be applied to the road. The second part of the flow is the second part of the structure. The column is a circular hole with a number of 6 systems. The material is made of gold and scorched in the first kind. It is a special piece. Please construct the wall. 7. The column and the hole are many (the notes on the back of the poem are read before you fill out this X). The item M of urr SR is part B. The body fluid can be used as a special part. Please construct a road such as Tongtong No. 8 Dongli No. 2 Materials, and its ceramic pottery can be shaped in various ways. Jun Wei Ping Fan Li Yi is a specialist who asks for an application such as Department 9. The system of uiri in the body fluid penetrability is as many as the number of micrometers ο 3 to the system of the wall hole of the structure. 311 311 Stream Item 5 of bh 5 Fan Li Zhuan 6 Please follow the same in the second and 0th axis of the flow path of the structure, and the uniform flow at the column is a unique feature of the upper row. Item 5: Fan Li specially requested to apply to the Central Bureau of Standards of the Ministry of Economic Affairs®, the Consumers' Cooperatives to print out the U-shaped type of automatic communication, and to seal the flow. # ΠΛΠ ίι ΛΤΛ 匸 通通 匸 # 0 ^ Μ 接 _ The wall structure of the channel wall is the first circular column of the liquid channel, the flow is 1 wall, the top is the first package, the first is the first one, the wall is the first part of the wall, the wall is the second part of the double-diameter, _ 成 # 道 延 通 f On the side of the wall, the system is outside the wall and the system is in. The system is Ϊ-11, and the flow is out of kr: Γ 2 Item 2 Fan Li specially invites Φ If you are in the supply unit, the structure is a single person. Block body anti-flow 1 contains the inclusion-containing structured grains of the micro-portion with the guide bow system to flow out of air hh. The inclusion-containing structure D into this paper is applicable to China National Standards (CNS) A4 standard (210X297 mm) 442842 A8 Β8 C8 D8 Patent application It to the second sophomore and the first stage of the first stage of the coupling section. The road is related to rtn ^ Ββ- $ frnu. The system is solidly supported by the particle-connected microfluids, which contains the body's self-flow, and the dynamic structure flows through its mouth to the source of the flowable monomer to the flow source. The structure on the outer wall and the first-and-segment-area structure Q into the inclusive zone area. Road flow »5 Flow wall 1 qi β · ύρ Road flow limit interface table 1 There is a mouth to the moving and rolling body The wall air can move through the air at low pressure and can flow around the air wall as a whole; the internal flow of the volume-shaped passages in the volume section can flow inwardly, and the pressure can be lowered at the source of Μ.丨 Low body air pressure in the volume ring section § Low body air pressure;-In the part of Doujitsu's capacitive flow ring, the inflow of the intra-structure knot inlet flow rate will be accumulated after the flow to the moving confluence can be compressed by the air port. High-flow integrated air wall section Zone passage ribs τηη Flow 1 The flow is first entered into the stream within the source air pressure. The body air pressure is high in the micro-section of the grain passage through the 勖 JJ > ΤΒΠΠ when the flow is formed, or the integrated sink is cleaned. The wall is permeated with gas, and the U section can be planted! The path “Tongji” contains the microcapsules in the body-solid segment of the second part of the self-flow. The micro-channel contains the power supply »i— as the first one includes the flow of the H9 flow, the injection of the second body, the first person, and the liquid person. Zhongxiang Road section of the road to help ΠΒΠ outside the wall 1 ----------- grey-- (Please read the note ^^ on the back before filling this page) Order the staff of the Central Bureau of Standards of the Ministry of Economic Affairs Consumption cooperative printing system Guan Xuejian, outside the wall and the inner opening of the weir, and the flowing path in the coupling section 1 and the non-flowing section in the outer section of the wall 2. The inside of the ring-shaped section 1 The air permeation of the wall can extend to the wall of the weir section of the flow wall that does not accumulate in the receiving wall and extends a wall. The air gap can be set between the supply area and the channel. In the inner zone, the second section of the road and the flow through the wall, the second zone is at the limit of the road, the surface flow table, the second section of the inner person, the first stream has a body wall liquid weir, and the road is connected to this paper. Home Standard (CNS) Α4 Specification (210X297 (%) 3 442842 A8 B8 C8 D8 VI. Patent application scope Passive flow down to the surface of the surface of the wall of the inner wall of the ring-shaped section of the road through the weir The flow of the overflowing body fluid of the second particle of the second micro-pipe In addition, the structure of the solid flow through the wall when washing the body □ The solid particles of the body that meet the flow of gas are contained in the wall weir in the solid shape or the surface of the accumulation surface. For example, the system of tidal currents in the system is coupled to the source. The air port pressure body is low and the air pressure is low. The external flow of the outer wall of the wall is surrounded by the flow. Fan Li specially asked the A to deal with the gas flow out of kl ·, 0. The item is to the coupling M Yu source. There is a flowing flow in the outer section of the wall with high gas pressure and high gas pressure. -------- Know-(Please read the note on the back of the tit before writing 4) X. Fan Lizhuan Please wash the washing machine as the first-rate, for the system to clean out the kl ·, 0 item washing water 1 to the second section rti. Qi f reasonable 2: the body of the body 胄 this solid-the other particle "type P open the speed term road with Π points 2 fast-moving 31 section L road in the flow zone 0 ^ Μ ^ ^» Pass the first 16 and 勖The first one is the first one in the first place, the second one is in the general management department, and the second one is Fan Li, who asks Jia A to form a circle for the passage of the section. Order: Printed by the Consumers Cooperative of the Central Procurement Bureau of the Ministry of Economic Affairs. Its system should handle the items of Ltr 0 2 1X Fan Li Zhuan if you want to align the axis with the road in the other section and the road in the second section and the section. Please refer to [such as Μ 系Wall air-permeable shape ΕΙ 17 .111. Hy 1 J ^ Tf MJ- > of the subjects of 2 items 2 1 靥 1 perimeter IgdfB j multij and i处 Take out ίTake out ίTake out of the pottery, pottery, pottery, and pottery of the pottery, H type 1 Μ Wall penetrability, and its system rtTCU Rectify the flow out of kh 0 item 2 1 Special application for this paper size is common to China Standard (CNS) A4 specification (2〗 OX297 mm) 4 Nian 42842 ABCD VI. Patent application scope The breathable wall and outer wall of the flow channel section have a circular cross section. 22. If the exhaust airflow of item 12 of the patent application scope The processing system, in which the outer wall and the inner weir wall of the second flow channel section have a round section. 23. For the exhaust air flow processing system of item 12 of the patent application, wherein the first flow channel section is connected to an upstream K Gas stream supply device containing particulate solids. 24. For example, the exhaust gas flow treatment system of the scope of patent application item 1, wherein the pre-oxidation unit includes a scrubber. 25. If the exhaust gas flow treatment system of the scope of patent application item 24, Among them, the scrubber is a wet scrubber. 2 6. The exhaust airflow treatment system of item 24 in the scope of the application, wherein the scrubber is a dry scrubber. 27. If the exhaust gas flow treatment system in item 24 of the patent application scope, The sink includes a wet washing tower, and the exhaust gas flows between it and a water-containing cleaning medium, and the system flows out of the item 0. 7 2 The first dust fan request please apply for 0 t Touch 28 to receive water for quality media washing water I .--------- installation ----- order (please read the note on the back to write this page first) Zheng labor consumption of the Central Ladder Bureau of the Ministry of Economic Affairs The item of the co-operative system in the cooperative's Indian policy is to deal with the gas out of the air. 7 2 Fan Li asked Shen Ru to guide him in the guidance-in the system. Discharge and discharge. The structure of the anti-contrast I1P b, the first encapsulation of the igisg II® containing Γ Γ a special package — the quality package application medium 卩 element wash. 5 single clear 30 chemical water and oxygen structure cover When the body gas passes through, the elementary oxygen will arrive at the first range. Fan Li specially asked φ to spray the mouth with the b / 1 oxygen preparation, including the yuan. The mist system sprays the gas and the gas flows out. Including row, package, Xiangta L, polyester paper, paper size, quick-use, Chinese National Standard (CNS) A4 (210 × 297 mm) 442842, printed by Zhenong Consumer Cooperative, Central Standards Bureau, Ministry of Economic Affairs, A8 B8 C8 D8 It is placed in it for guiding the water-containing cleaning medium into the washing chamber, and a demister structure is arranged on the upper part of the tower to cover the mist spray nozzle. 32. The exhaust gas treatment system according to item 1 of the patent application scope, comprising a gas cap inlet structure upstream of the oxidation unit. 3 3. The exhaust gas treatment system according to item 1 of the patent application scope, further comprising a liquid cover gas shower structure downstream of the oxidation unit. 34. If the exhaust gas treatment system of item 1 of the patent application scope includes a quench unit between the oxidation unit and the post-oxidation unit. 35. The exhaust gas treatment system according to item 34 of the patent application, wherein the oxidation unit, the quench unit and the post-oxidation unit include a unit structure with respect to a gas flow path passing therethrough. 36. The exhaust gas treatment system according to item 1 of the patent application scope, wherein the post-oxidation treatment unit includes a wet washing tower with a spray nozzle on its upper portion for discharging the washing medium therethrough, and M is provided in countercurrent contact with the exhaust gas flow. 37. The exhaust gas treatment system according to item 36 of the patent application scope, wherein the post-oxidation scrubber includes a filling therein for enhanced gas / liquid contact. 38. The exhaust gas treatment system according to item 36 of the patent application scope, wherein the post-oxidation washing tower includes a demister structure above the nozzle. 3 9. According to the exhaust gas treatment system of the scope of application for item 31, a quenching unit is disposed downstream of the oxidation unit, and the quenching unit includes a device for guiding the quenching medium, and M is used for cooling the discharge from the oxidation unit. airflow. 40. The exhaust gas treatment system according to item 1 of the scope of the patent application, wherein the pre-oxidation unit and the post-oxidation unit each include a wet scrubber, and each scrubber includes a sump storage tank for collecting the contacted liquid , And a pair of storage tanks, the paper size of the paper uses the Chinese National Standard (CNS) Α4 specification (210 × 297 mm) II n ^ i -I — — ^ 1 1 * ί ^ mu II If-I (Please read first Note ^ K on the back, please fill in this page again) 6 4428 ^ 2 A8 B8 C8 m Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 6. Scope of patent application 1 1 I Sink storage right is connected to the synthetic liquid flow acceptance relationship for collection from Wet scrubber 1 t 1 unit in contact with liquid. 1 41. If the exhaust gas treatment system i in the scope of patent application item 1 contains one, please read 1 1 1 The quenching unit downstream of the oxidation unit 9 has a device for making a saturated water flow g read back & 1 1 The unit is recycled to the oxo-L unit for perfluorocarbon oxidation in the oxidation unit. Note 1 I means 1 42. For example, the exhaust gas flow treatment system in item 1 of the scope of patent application f, wherein the gaseous 1 1 and 1 1 chemical unit includes an electro-oxidation device. 43. As in item 1 of the scope of patent application Exhaust gas treatment system in which the oxygen page 1 Iization unit includes a K-flame-based oxidation device 0 1 1 1 44. Exhaust gas treatment system such as the scope of patent application item 1 > wherein the oxygen 1 1ization unit contains a fluid Chemical bed thermal oxidizer device 0 1 to 45. For example, the exhaust gas treatment system r in the scope of patent application No. 1 wherein the oxygen 1 1 unit includes a heat exchanger. t 1 I 46. The exhaust gas treatment system according to item 45 of the patent application park, wherein the heat 1 1 exchanger includes a heat transfer enhanced insert in its fluid channel 0 1 47. Exhaust gas treatment% system f of which all 1 1 fluorinated carbon is recovered upstream or downstream of the oxidation unit 0 1 48. For example, the exhaust gas treatment system 9 of the patent application scope item 1 of which pre- 1 1 oxidation unit, oxidation unit And the post-oxidation unit is contained in a single unit box 1 1 structure 0 1 1 49. The exhaust gas treatment system t of the scope of application for patent 1 includes a 1 1 fluid drive actuator 6 I 50 downstream of the post-oxidation processing unit. For example, the exhaust gas treatment system of the 49th scope of the patent application, wherein the flow 1 1 prime mover includes a pump. 1 1 This paper uses China National Standard (CNS) A4 specifications (210 ×: 297 mm) ^ 42842 AS B8 C8 D8 Central Bureau of the Ministry of Economic Affairs! β: Printed by the Industrial and Consumer Cooperatives 6. Application scope of patent 1 1 I 5 1. Exhaust gas treatment system such as the scope of application for patent No. 4 9 in which the flow 1 1 1 body drive contains a discharger Q 1 1 1 52, such as The exhaust gas treatment system 3 of the scope of application for patent No. 1 of which is requested in advance. 1 The oxidation treatment unit includes a device for adding chemicals to the exhaust gas flow. 9 Μ Reaction 1 1 Forms a reaction product with increased solubility. Remove the j 1 and note 1 1 and the exhaust airflow is subjected to wet washing after chemical addition and reverse gills 0 meaning 1 item 1 5 3. If the exhaust airflow treatment% of the scope of the patent application is applied, the system t is pre-filled The Cao oxidation unit includes a U-shaped shell, including a first branch and a second branch section 1 which is written on this page 1-. The transverse yoke sections are joined to each other, and the first branch section includes a water mist mist device 1 I device. Contact the exhaust air stream with spray water to reduce exhaust The acidity of the air flow and the entrained particles, the second branch includes a water spray device, which is used to improve the discharge of 1 order of air flow and the mist water. The K and the lateral yoke constitute a collection tank, and the water supply 1 1 spray is Contact with the exhaust gas flow in the first and second branch parts. 0 1 1 54. For example, the exhaust gas treatment system of item 1 in the patent application range, wherein the oxygen 1 1 unit includes an evaporation oxidation unit 0 1 55. The exhaust gas treatment system of the first item of the patent scope, wherein the pre-1 I treatment device includes a wet washing unit upstream of the oxidation unit > for washing in the presence of 1 1 in the state of oxidation II, the exhaust gas is a particulate formation agent. The component t 1 controls the formation of particles in the oxidation unit 0! 1 56 by M. For example, the exhaust gas treatment system S of the scope of patent application No. 2 wherein the person 1! P structure includes an anti-plugging inlet structure Fluid of m 1 I flow To a processing unit in the exhaust airflow system, the person's structure includes a 1 1 1 substantially vertical flow channel for the fluid containing particulate solids to flow downward 1 1 through. The flow channel includes a boundary wall with an overflow The weir opening is redundant and 1 1 This paper size is applicable to the Chinese Gardening Standard (CMS) A4 specification (210X297 mm) -8 _Industrial policy of the J Industrial Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs A8 B8 C8 D8 The annular liquid supply storage tank is connected to the overflow weir opening and forms a liquid feeding relationship. There is a device for supplying liquid to the annular bark liquid supply storage tank, and μ is used to flow through the overflow weir to open α; so that the liquid flows into the annular liquid When supplied to the storage tank, the guided liquid flows through the overflow weir opening and flows along the boundary wall of the flow channel. When the air flow containing particulate solids flows through the flow channel of the inlet structure, any particulate solids are washed away from the wall. And inhibit the solid deposition or formation on the inner surface of the boundary wall. Means for opening the overflow weir flooded above, one of the boundaries of the gas cap wall portion. 5 8. If the exhaust gas treatment system of item 1 of the scope of patent application includes a quench unit for cooling the exhaust gas discharged from the oxidation unit. 59. If the exhaust gas treatment system of item 58 of the patent application scope, wherein the quench unit is constructed and arranged to contact the exhaust gas discharged from the self-oxidation unit, the M caustic solution completes the removal of silicon dioxide particles from the exhaust gas. 60. If the exhaust airflow treatment system of item 1 of the patent application scope includes an electrostatic precipitator controlled by a water supply ditch / feathered water jet. 61. For example, the exhaust gas treatment system of the scope of patent application includes an inlet structure selected from the group consisting of inlet structures (A) and (B): (Α) —the inlet structure includes: a breathable wall envelope A gas flow path, and an outer bladder-shaped outer sheath surrounding a breathable wall to define a ring-shaped gas storage tank therebetween; and a device for the air flow containing particulate solids and / or formed solids under pressure sufficient to cause gas to pass through the breathable wall Κ When resisting solid deposition or forming on the inner surface of a breathable wall, when flowing to a gas treatment system through this inlet structure, (please read the precautions on the back before filling this page) -1Τ. Table paper size applies to China National Standards (CNS) A4 specification (210 × 297 mm) 442842 Number of employees of the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Cooperatives Co., Ltd. A8 B8 C8 D8 6. Application scope of patent application Gas introduction 璟 -shaped gas storage tanks; M and (B) — the entrance structure contains : A first vertically extending inlet flow channel member with an upper inlet for guiding the airflow and a lower end for discharging the airflow: a second flow channel member externally connected to the first flow The channel member is spaced apart to define an annular volume therebetween, the second flow channel member extends downward to a lower end below the lower end of the first flow channel member, and the second flow channel member has a An upper liquid-permeable portion and a liquid-impermeable portion below the upper liquid-permeable portion; an outer wall member enclosing the second flow channel member and defining an enclosed annular volume with the outer flow member; M and a liquid mobile population on the outer wall member for introducing liquid into the enclosed inner annular volume between the second flow channel member and the outer wall member. 62. The exhaust gas treatment system according to item 1 of the scope of patent application * is configured to receive exhaust gas from at least one semiconductor process appliance with K. 63. The exhaust gas treatment system according to item 62 of the patent application, wherein the device for pre-treating the exhaust gas stream includes a pre-treatment unit configured to remove water-soluble components from the exhaust gas stream. 64. The exhaust gas treatment system according to item 63 of the patent application, wherein the pretreatment unit is provided with K to remove particles from the exhaust gas flow. 65. The exhaust gas treatment system according to item 1 of the application, wherein the oxidizing unit is arranged to increase the temperature of the exhaust gas when oxidizing at least a part of the oxidizable component of the exhaust gas. 66. If the exhaust airflow treatment system of item 1 of the patent application park is included, it also includes I .----------- h -------- order * ------ --Line- < Please read the notes on the back before filling in this page) This paper size applies to China National Standard (CNS) A4 (2) 0 X 297 mm) -10 — A2B42 Employees ’Consumption of Intellectual Property, Ministry of Economic Affairs Cooperative printed clothing A8 B8 C8 D8 VI. The scope of patent application includes a quench unit, which is located downstream of the oxidation unit * It is set to reduce the temperature of the exhaust air flow. 67. The exhaust gas flow treatment system according to item 1 of the patent application scope *, wherein the post-oxidation treatment device includes a post-treatment unit which is arranged to remove acidic components from the exhaust gas flow. 6 8. The exhaust gas treatment system according to item 67 of the patent application scope, wherein the post-processing unit is provided with M to remove particles from the exhaust gas stream. 69. The exhaust gas treatment system according to item 1 of the patent application, wherein the device for pretreatment of the exhaust gas stream includes a wet spray tower. 70. The exhaust gas treatment system according to item 69 of the patent application *, wherein the wet spray tower includes a blunt gas assisted spray nozzle. 71. The exhaust gas treatment system of item 70 in the Shen He patent, wherein the device for the post-oxidation exhaust gas flow includes a wet spray tower. 72. The exhaust air treatment system according to item 71 of the patent application *, wherein the wet spray tower comprises a demister net-like package. 73. The exhaust gas treatment system according to item 66 of the application, wherein the quench unit includes a mist nozzle. 74. The exhaust gas treatment system according to item 1 of the patent application *, wherein the oxidation unit includes a catalytic oxidizer. 75. The exhaust gas treatment system according to item 1 of the patent application scope, wherein the oxidation unit comprises a thermal oxidizer. 76. The exhaust gas treatment system according to item 1 of the scope of the patent application, wherein the oxidation unit is provided with an M · Wen exhaust gas and an oxidizer medium. 77.If you want to apply for patent No. 62 of the exhaust air treatment system, (Please read the precautions on the back before filling out this page)-Table --------- Order -------- -The paper size of the paper is in accordance with the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -11-4 42842 A8 B8 C8 D8 VI. Patent application range: implantation of implants 0 and etching of appliances Instrumented UV-body guide. For semi-profitable parties, for example, if the rM section uses a set system unit fb to circulate its liquid with oxygen, the system will drain the air and circulate the gas to reach kl ·. —Λ »3¾Jy. Part of the hydrogen component of halogens, its system 1-the treatment of gas outflow t-WWW item 8 7 Wei Fanli specifically invites the gas steaming water containing the source hydrogen in the system 3c to handle the gas outflow item 8 7 Fan Li specially asked for the minimum carbon content of b, fluorine, and chlorofluoro, including ί Μ. The elementary halogen containing the out of Ll ·, there are more than half of the guided system or 1 ΰπ to It is based on the use of * 11 system, which can be used to guide the body to the bottom of the device. 1 As little as: In the containing bag, the oxygen flow of a single unit of liquid is set to a minimum, and the discharge is as low as the oxygen source. When the hydrogen reaches 1, you can use the 'benefits, parts, and degrees. * Warm parts, parts, groups, liquids, halogens, and components. The meta-singulation from the M-use device is its swimming. Oxygen content in the composition »The acid is removed, and the liquid flows out after the liquid is removed. Tl · 5® (please read the precautions on the back before filling this page) k -------- Order --- ------ Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 1 A single item including the package and its installation item 11 8 The warm flowing fluid comes out of kl · 0 low drop M. The installation is used to swim on the HMV Bai Yuandan ί *-.! After processing, the Yuan Dan coldly came to install the item 2 8 If the damage reaches the source M, hydrogen is used to make 0, and the portion is called 551. The chemical oxygen halide to the contained reflux is removed by the liquid gas and the drainage is small to tl · 0. Fake or one tap is in the range of -1MΗ1. The size of this paper is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) -12 44284 2 A8 B8 C8 D8. The method of patent application scope fluid flow, including the following Steps: Remove water-soluble gas from the discharged liquid stream; (Please read the Precautions then fill page) oxidation of oxidizable ingredients at least one of the discharge portion of the stream; and removing acidic components from the exhaust stream. 85.-A method for treating a effluent stream from one or more semiconductor process equipment using a system including an oxidation unit * comprising the following steps: In the oxidation unit * using a hydrogen source to achieve at least discharge A portion of the dentin-containing component of the liquid stream and oxidizing at least a portion of the oxidizable component of the discharged liquid stream; and removing an acidic component from the discharged liquid stream. 86. The method of claim 85, wherein the step of achieving oxidation comprises the following steps: mixing the effluent stream with an oxidizer medium and water vapor; and heating the effluent stream. 87. The method of claim 81, wherein the hydrogen source comprises water vapor. Printed by the Intellectual Property Bureau's Consumer Cooperatives of the Ministry of Economic Affairs. 8δ. For the method in the 85th scope of the patent application *, where the hydrogen source contains water vapor. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 13-