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TW434379B - Modular surface mount mass flow and pressure controller - Google Patents

Modular surface mount mass flow and pressure controller Download PDF

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Publication number
TW434379B
TW434379B TW089107284A TW89107284A TW434379B TW 434379 B TW434379 B TW 434379B TW 089107284 A TW089107284 A TW 089107284A TW 89107284 A TW89107284 A TW 89107284A TW 434379 B TW434379 B TW 434379B
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TW
Taiwan
Prior art keywords
module
flow
gas
flow sensor
control valve
Prior art date
Application number
TW089107284A
Other languages
Chinese (zh)
Inventor
Anthony C Diprizio
Kevin T Mahan
Jon M Sutton
Maura I Toth
Original Assignee
Millipore Corp
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Publication of TW434379B publication Critical patent/TW434379B/en

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    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00Control of fluid pressure
    • G05D16/20Control of fluid pressure characterised by the use of electric means
    • G05D16/2006Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
    • G05D16/2013Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00Control of flow
    • G05D7/06Control of flow characterised by the use of electric means
    • G05D7/0617Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means

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  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)

Abstract

A modular surface mount mass flow and pressure controller of the present invention includes a modular flow sensor and a modular control valve. The modular flow sensor measures the amount of gas flowing through a modular gas stick and the modular control valve adjusts and controls the flow rate of gas through the modular gas stick. Both the modular flow sensor and the modular control valve are mounted on a surface of a modular base.

Description

Ά3·^Τ9 锤 案號 89107284 a 修正 五、發明說明(1) 發明領域 概括地說,本發明與氣體輸送系統及測量裝置有關-,特 別針對一種在模組氣體輸送系統中,整合不同組件之系統 和方法,尤其特別用於半導體製造,在模組氣體通道中整 合氣流組件。 發明背景 在今日有許多製造方法,需要輸送氣體通過一氣流通 道,且具若干組件用於調節、過濾及監測所通過之氣流, 例如時下流行的半導體製造方法,像化學蒸氣沈積法,即 須輸送超純氣體以適當的流速和流量到一器具内之處理 室,若干氣體組件典型的整合在氣流通道中(通常可參考 半導體製造法,如氣體通道),包括質量流動.痒制器,流 動監測器,濕度監測器,閥,調節器,氣體淨化器,壓力 感測器,擴散器,容率隔膜計,顯示器,壓力轉換器及其 他一些商業上可取得之組件。 圖1顯示一先前技藝範例之氣體通道10,或氣體通道, 在圖1中,氣體從源頭流經氣體通道1 0可包括,例如,一 隔離閥12,一調節器14,一壓力轉換器或感測器16,一過 濾器18,一隔離閥20,一質量流動控制器22及一下游隔離 空氣操作閥26而至處理室(未顯示),各個氣體組件為一獨 立單元,並以一系列連接器2 4加以連接,此為一範例製造 系統,任何若干增添及交替組件亦皆可能包括在從源頭至 處理室之氣體通道中,總之,在一氣體通道1 0系列線路中 加添氣體組件,由於組件長度及連接器長度而使氣體通道 10之全程長度增加。Ά3 · ^ Τ9 Hammer case No. 89107284 a Amendment V. Description of the invention (1) Field of the invention In general, the present invention relates to a gas delivery system and a measurement device, especially for a module gas delivery system that integrates different components Systems and methods, particularly for semiconductor manufacturing, integrate airflow components in module gas channels. BACKGROUND OF THE INVENTION There are many manufacturing methods today that require gas to be passed through an airflow channel and have several components for regulating, filtering, and monitoring the airflow passing through it. For example, the current popular semiconductor manufacturing methods, such as chemical vapor deposition, require Transport ultra-pure gas to the processing chamber in an appliance at a suitable flow rate and flow rate. Several gas components are typically integrated in the airflow channel (usually refer to semiconductor manufacturing methods, such as gas channels), including mass flow. Monitors, humidity monitors, valves, regulators, gas purifiers, pressure sensors, diffusers, capacity diaphragm meters, displays, pressure converters and other commercially available components. Figure 1 shows a gas channel 10, or gas channel, of a prior art example. In Figure 1, gas flows from the source through the gas channel 10 may include, for example, an isolation valve 12, a regulator 14, a pressure converter or Sensor 16, a filter 18, an isolation valve 20, a mass flow controller 22, and a downstream isolation air operation valve 26 to the processing chamber (not shown). Each gas component is an independent unit, and a series of Connector 24 is connected. This is an example manufacturing system. Any number of additional and alternate components may also be included in the gas channel from the source to the processing chamber. In short, a gas channel 10 series circuit is added with a gas component. Due to the length of the component and the length of the connector, the full length of the gas passage 10 is increased.

O:\63\ti3744.ptc 第4頁 'JA3 案號 89107284 年 月 a 修正 五、發明說明(2) 現有之氣體通道,另外之問題為質量流動控制器22典型 的建立在其對特殊氣體僅須在有一定限制範圍之流動-及壓 力條件下操作,若超出其原來參數,則質量流動控制器2 2 之感測器部份即須重新校正,但附屬的控制閥可能無法接 受在新的條件下(壓力,流量,氣體型態)運作,因此質量 流動控制器校正之變換需要付出高價,在典型的半導體製 造計劃書中,有可能需要多至50至200種不同之質量流動 控制器以應付各種不同之變換。 在現有氣體通道中,質量流動控制器典型的分為熱力基 礎型儀器或壓力基礎型儀器,當現有氣體通道從熱力基礎 轉換為壓力基礎流動控制時,整個質量流動控制器裝置必 須更換,如此要付出非常高的代價。 近來,半導體工業開始推動一種用標準安裝座 (footprint)之模組氣體通道,使用於模組氣體通道之標 準安裝座大約為1.5x 1.5時,據SEMI設計圊Doc. 2787.1(如圖4之顯示),某些氣體組件可能不適用模組氣 體通道之 1 . 5 X 1. 5吋模組安裝座。例如,標準質量流動控制器2 2之 基礎尺寸,圖2顯示約為4x1.5吋(尺寸A = 4吋,尺寸B = 1.5 吋),此即不適合模組氣體通道之模組安裝座1.5x1, 5 發明概述 本發明提供一改善氣體組件整合系統與方法,實質上地 消除或減少先前所開發的從一源頭經若干組件至目的場所 的氣流通道的不利情況及問題。O: \ 63 \ ti3744.ptc Page 4 'JA3 Case No. 89107284 a. Amendment V. Description of the Invention (2) Existing gas channels, the other problem is that the mass flow controller 22 is typically built only for special gases. It must be operated under a certain range of flow- and pressure conditions. If it exceeds its original parameters, the sensor part of the mass flow controller 2 2 must be recalibrated, but the attached control valve may not be accepted in the new Under the conditions (pressure, flow, gas type), the calibration of the mass flow controller needs to pay a high price. In a typical semiconductor manufacturing plan, up to 50 to 200 different mass flow controllers may be required. Cope with various changes. In the existing gas channel, the mass flow controller is typically divided into a thermal-based instrument or a pressure-based instrument. When the existing gas channel is converted from thermal-based to pressure-based flow control, the entire mass flow controller device must be replaced. Pay a very high price. Recently, the semiconductor industry has begun to promote a module gas channel with a standard footprint. When the standard mount for a module gas channel is approximately 1.5x 1.5, according to SEMI Design 圊 Doc. 2787.1 (shown in Figure 4) ), Some gas components may not be suitable for the module gas channel 1.5 x 1.5 inch module mount. For example, the basic size of the standard mass flow controller 22, Figure 2 shows about 4x1.5 inches (size A = 4 inches, size B = 1.5 inches), which is not a module mount for the module gas channel 1.5x1 5 SUMMARY OF THE INVENTION The present invention provides an improved gas component integration system and method, which substantially eliminates or reduces the disadvantages and problems of the previously developed airflow channels from a source through several components to a destination.

O:\63\63744.ptc 第5頁 4343 案號 89107234 曰 修正 五、發明說明(3) 具體而言,本發明之模組表面裝置流動感測器,如同圖 1所顯示,在一模組氣體通道中提供一整合質量流動控制 器2 2的方法,在一模組板面,氣體組件依原始氣流軸垂直 方向疊積,此氣體組件可個別製造,組件亦可用標準VC R 連接在一起或依SEMI設計圖Doc. 2787之規格連接,本發 明之具體實施為模組表面裝置質量流動及壓力控制器,包 含一模組流動感測器及一模組控制閥,模組流動感測器測 量流經模組氣體通道之氣體流量,模組控制閥調節和控制 流經模組氣體通道之流速,模組流動感測器及模組控制閥 兩者均裝置在一模組基礎面上(例如,頂上)° 本發明提供一重要技術優點,即為在模組氣體通道設計 中提供一質量流動控制器之組合功能方法。.. 本發明提供之另項技術優點,為易於維修和更換構成質 量流動控制器之模組氣體組件而減少相關成本。 本發明提供之另項技術優點,為減少現有質量流動控制 器之更換次數,此質量流動控制器用於半導體製造中各類 型氣體之所有不同處理範圍。 本發明提供之另項技術優點,為在氣體通道設計中提供 更具彈性地安置氣體組件。 本發明提供之另項技術優點,為提供一方法使易於轉換 從熱力基礎氣體通道設計到壓力基礎氣體通道設計,或從 壓力基礎轉換成熱力基礎氣體通道設計。 本發明提供之另項技術優點,為提供之氣體通道設計之 有關電子裝置既可為遙控者亦可為就地者。 圖式簡述O: \ 63 \ 63744.ptc Page 5 4343 Case No. 89107234 Amendment V. Description of the invention (3) Specifically, the module surface device flow sensor of the present invention, as shown in FIG. 1, is in a module A method for integrating a mass flow controller 22 is provided in the gas channel. On a module board surface, gas components are stacked vertically in the original airflow axis. This gas component can be manufactured separately, and the components can also be connected together using standard VCR or Connected according to the specifications of SEMI design drawing Doc. 2787, the present invention is implemented as a module surface device mass flow and pressure controller, which includes a module flow sensor and a module control valve. The module flow sensor measures The gas flow through the module gas channel, the module control valve regulates and controls the flow rate through the module gas channel, and both the module flow sensor and the module control valve are installed on a module base (for example, (Top) ° The present invention provides an important technical advantage, which is to provide a combined function method of a mass flow controller in the design of the module gas channel. .. Another technical advantage provided by the present invention is to reduce the related costs for easy maintenance and replacement of the module gas components that make up the mass flow controller. Another technical advantage provided by the present invention is that in order to reduce the number of replacements of the existing mass flow controller, the mass flow controller is used in all different processing ranges of various types of gases in semiconductor manufacturing. Another technical advantage provided by the present invention is to provide more flexible placement of gas components in the design of the gas channel. Another technical advantage provided by the present invention is to provide a method for easy conversion from the design of a thermal base gas channel to the design of a pressure base gas channel, or from a pressure base to a design of a thermal base gas channel. Another technical advantage provided by the present invention is that the relevant electronic device designed for the provided gas channel can be either a remote control or a local. Schematic description

O:\63V63744.ptc 第6頁 4343 79® 修正 案號 89107284 五、發明說明(4) 為更加全部明瞭本發明及優點,可參考目下所作如下之 與附圖對照連繫之敘述,在此敘述中可參看標號數指·示其 特徵: 圖1顯示一先前技藝氣體通道,具有一系列之個別,單 獨功能之氣體組件,包括一質量流動控制器沿氣體流動軸 呈線狀連結在一起; 圖2顯示先前技藝質量流動控制器之基本尺寸; 圖3顯示本發明之一具體實例,質量流動控制器己劃分 為一模組流動感測器和一模組控制閥; 圖4顯示模組流動感測器及模組閥之基本尺寸; 圖5顯示模組氣體通道在熱力基礎流動下之構造;及 圖6顯示模組氣體通道在壓力基礎流動下之樽造。 發明詳述 本發明提出之具體實例,均在圖中說明,依各圖内不同 部位有其相應之對照號數。 本發明之模組表面裝置質量流動及壓力控制器包含一模 組流動感測器及一模組控制閥,模組流動感測器測量流經 模組氣體通道之氣體流量,模組控制閥調節及控制流經模 組氣體通道之氣體流速,模組流動感測器及模組控制閥兩 者均裝置在模組基礎上。 在模組基礎上通常裝置模組流動感測器,模組控制閥及 其他氣體組件之連結包括連接器,可依照設計圖SEM I 2787規格(SEMI設計圖Doc. 2787中所述,在此總合作為參 考),如B1·密封,C-密封,CS-密封,W-密封及Z-密封連 結,例如裝置在模組基礎上之模組氣體組件,包括氣體過O: \ 63V63744.ptc Page 6 4343 79® Amendment No. 89107284 V. Description of the Invention (4) For a more complete understanding of the invention and its advantages, please refer to the following description in conjunction with the drawings, which is described here The reference numerals in the figure indicate the characteristics: Figure 1 shows a prior art gas channel, which has a series of individual, separate function gas components, including a mass flow controller connected linearly along the gas flow axis; Figure 2 shows the basic size of the prior art mass flow controller; Figure 3 shows a specific example of the present invention, the mass flow controller has been divided into a module flow sensor and a module control valve; Figure 4 shows the module flow sensor The basic dimensions of the detector and the module valve; Figure 5 shows the structure of the module gas channel under the thermal base flow; and Figure 6 shows the bottle manufacturing of the module gas channel under the pressure base flow. Detailed description of the invention The specific examples provided by the present invention are illustrated in the drawings, and corresponding numbers are assigned to different parts in the drawings. The module surface device mass flow and pressure controller of the present invention includes a module flow sensor and a module control valve. The module flow sensor measures the gas flow rate through the module gas channel, and the module control valve adjusts And control the gas flow rate through the module gas channel, both the module flow sensor and the module control valve are based on the module. Module flow sensors, module control valves and other gas components are usually connected on the basis of the module, including connectors, which can be in accordance with the design drawing SEM I 2787 (SEMI design drawing Doc. 2787. Cooperation as a reference), such as B1 · seal, C-seal, CS-seal, W-seal and Z-seal connection, such as module gas components based on the module, including gas

O:\63\63744.ptc 第7頁 4 :^43 7 9 案號 89107284 曰 修正 五、發明說明(5) 濾器,氣體淨化器,壓力轉換器,質量流動控制器,顯示 器,濕度監測器,測計儀表,閥,擴散器,容率隔膜計及 壓力調節器,本發明為一標準質量流動控制器,包括分別 為流動感測器及控制閥裝置在一模組基礎上,必須明白, 當本發明之多功能空氣組件更進一步表明特用於半導體氣 體通道外,此分別裝置流動感測器及控制閥於一模組基礎 上之系統及方法亦適用於其他氣體流動通道》 圖3顯示,為一模組氣體通道1 0相對於圖1傳統之線系列 氣體通道之具體實例,模組氣體通道1 0安置在模組基礎3 8 上’此符合SEMI 2787規格之模組氣體通道(包括所要求之 高度,長度及寬度)》圖1為各氣體組件組合之氣體通道10 線列構造,各個氣體組件前後需要一連結器2 #,圊1中標 準質量流動控制器22之基礎台長度,典型的超過氣體通道 中其他氣體組件之兩倍,在典型的先前技藝中,其流動控 制器此基礎台尺寸為4x 1,5吋,如圖2所顯示,頗大於適 合模組基礎3 8所需要之模組安裝座尺寸1 . 5 X 1 . 5 (如圖4所 顯示)吋,因之圖1中先前技藝之質量流動控制器2 2不能裝 置在模組基礎3 8上。 圈3顯示本發明所提供在先前技藝中組成質量流動控制 器2 2之流動感測器2 5及控制閥3 0分別裝置在模組基礎38 上,如此結果可減少沿氣體流動軸28之水平空間,本發明 之流動感測器2 5及控制閥3 0各適合1. 5 X 1 . 5对之模組安裝 座,如圖4所示(尺寸C約等於1. 5叶),可座落流動感測器 2 5及控制閥3 0作為一模組基礎台3 8,此外,氣體通道1 0之 長度將可減少,因為標準質量流動控制器22基礎台需4O: \ 63 \ 63744.ptc Page 7 4: ^ 43 7 9 Case No. 89107284 Amendment V. Description of Invention (5) Filter, gas purifier, pressure converter, mass flow controller, display, humidity monitor, Measuring instruments, valves, diffusers, capacity diaphragm gauges and pressure regulators. The present invention is a standard mass flow controller, including a flow sensor and a control valve device on a modular basis. It must be understood that, when The multifunctional air module of the present invention further shows that it is especially used outside the semiconductor gas channel. This system and method of separately installing a flow sensor and a control valve on a module basis is also applicable to other gas flow channels. This is a specific example of a module gas channel 10 compared to the traditional line series gas channel in Figure 1. The module gas channel 10 is placed on the module foundation 3 8 'This module gas channel conforming to the SEMI 2787 specification (including all (Required height, length, and width) "Figure 1 shows the gas channel 10 line structure of each gas component combination. A connector 2 # is required before and after each gas component. The standard mass flow controller 22 in 圊 1 The length of the foundation table is typically more than twice that of other gas components in the gas channel. In the typical previous technology, the size of the foundation of the flow controller is 4x 1,5 inches, as shown in Figure 2, which is quite larger than the suitable mold The size of the module mounting base required for group foundation 3 8 1.5 X 1.5 (as shown in Figure 4) inch, so the mass flow controller 2 2 of the previous technology in Figure 1 cannot be installed in the module foundation 3 8 on. Circle 3 shows that the flow sensor 25 and the control valve 30, which constitute the mass flow controller 22 in the prior art provided by the present invention, are respectively installed on the module base 38, so that the level along the gas flow axis 28 can be reduced. Space, the flow sensor 25 and the control valve 30 of the present invention are each suitable for a module mounting seat of 1.5 X 1.5 pairs, as shown in FIG. 4 (size C is approximately equal to 1.5 leaves), can be seated The flow sensor 25 and the control valve 30 are used as a module base 38. In addition, the length of the gas channel 10 can be reduced because the standard mass flow controller 22 base 4 needs 4

O:\63\637d4.ptc 第8頁 434379a ___索號 89107284_年月 q 五、發明說明(6) 吋,若組合流動感測器2 5與控制閥3 〇,其基礎僅3时,此 可節省沿氣體流動通道2 8之水平空間,並可提供其他-若干 利益。 、 圖1中,典型的標準質量流動控制器22建立在對特殊氣 體僅限於一定範圍之流動及壓力條件下操作,若超過其原 來參數操作’質量流動控制器2 2之感測器部份必須校正或 重定範圍,但附屬之控制閥可能不再接受在新的條件下 C壓力’力11·動或氣艘型態)運作’結果由於質量流動控制器 之校正變更’需要付出代價’本發明為免除此再設定範圍 及校正’在若干情況下可完全取代標準質量流動控制器 22 ’分離之流動感測器25可在超過5至6種不同型態氣體, 不同濃度及不同熱傳範圍下工作’分離之控制閥3〇亦可在 超於5至6種不同範圍下工作,以流動感測器25和控制閥3〇 作不同之組合,能夠涵蓋5 〇至2 0 〇種標準質量流動控制器 2 2所能建立的其他變更,同時若流動感測器2 5或控制閥3 〇 故障’僅須作部份的代替更換,比較更換全部標準質 動控制器22的代價為低& 本發明提供另項重大優點,為在沿氣體通道不同位置可 極具彈性的安置氣體組件,例如,某類型氣體對校正熱力 ^礎測量之標準質量流動控制器2 2出現問題,其他氣&對 校正壓力基礎測量之標準質量流動控制閥2 2出現問題,在 遇到採用特別氣體必須由熱力基礎轉換為壓力基礎時(或 相反轉換)’則全部標準質量控制器2 2必須被更換,本發 明由於採用分離模組流動感測器2 5及控制閥3 〇,即可免除 更換全部質量流動控制器2 2,如果氣體流過氣體通道丨〇,O: \ 63 \ 637d4.ptc page 8 434379a ___ cable number 89107284_year q 5. Description of the invention (6) inch, if the combination of the flow sensor 25 and the control valve 3 〇, the basis is only 3 hours, This may save horizontal space along the gas flow channel 28 and may provide other-several benefits. 1. In Figure 1, a typical standard mass flow controller 22 is built to operate under a certain range of flow and pressure conditions for special gases. If it exceeds its original parameters, the sensor part of the mass flow controller 22 must be operated. Correction or rerangement, but the attached control valve may no longer accept C pressure 'force 11 · moving or gas vessel type) operation under new conditions'. As a result of the correction of the mass flow controller's change, 'need to pay' the invention To avoid this, set the range and calibration again. In some cases, it can completely replace the standard mass flow controller 22. The separated flow sensor 25 can be used under more than 5 to 6 different types of gases, different concentrations and different heat transfer ranges. The working 'separated control valve 30 can also work in more than 5 to 6 different ranges. With different combinations of the flow sensor 25 and the control valve 30, it can cover 50 to 200 standard mass flows. Other changes that can be established by the controller 22, and at the same time if the flow sensor 25 or the control valve 3 fails, only a partial replacement is required, comparing the replacement of all standard mass motion controllers 22 The price is low. The present invention provides another important advantage. It is very flexible to place gas components at different positions along the gas channel. For example, a standard mass flow controller 22 for a certain type of gas to correct the thermal measurement has a problem. , Other gas & standard mass flow control valve 2 2 for calibration of pressure base measurement problems, when encountering the use of special gas must be converted from a thermal basis to a pressure basis (or vice versa), then all standard mass controllers 2 2 Must be replaced. Because the present invention uses a separate module flow sensor 25 and control valve 3 0, the replacement of all mass flow controllers 22 can be eliminated. If the gas flows through the gas channel 丨 0,

4343 79^ ___案號89107284_年月日_魅__ 五、發明說明(7) 或程序需要一熱力基礎測量,可在模組氣體通道10上裝置 —熱力流動感測器,若氣體流過氣體通道1 0,或程序-需要 壓力基礎測量,可在模組氣體通道1 0上裝置一壓力基礎流 動感測器,在模組氣體通道從熱力基礎測量氣體通道轉換 為壓力基礎測量氣體通道時,則不需要更換控制閥3 0,已 存在之質量流動感測器2 5,由電子設備控制,既可被遙控 亦可就地操控。 圖5顯示之具體實例,為一模組氣體通道10在熱力基礎 測量下之形貌,在圖5中,流動感測器2 5為一熱力基礎流 動感測器,且較佳者係可快速的沿氣體流動通道2 8安置在 控制閥3 0之前,電子設備可遙控或就地控制模組感測器2 5 及模組控制閥3 0,模組氣體通道1 0從熱力基考測量狀態轉 換為壓力基礎狀態,首先移去熱力流動感測器2 5及控制閥 3 0,其次安置控制閥3 0在熱力流動感測器2 5位置,最後安 置壓力基礎流動感測器25在控制閥30位置,模組氣體通道 10之壓力基礎狀態可在圖6中看到,在圖6中控制閥30可較 佳地沿氣艎流動通道2 8安置在壓力基礎流動感測器2 5之 前,只有當模組氣體通道1 0從熱力基礎測量狀態轉換為壓 力基礎狀態時,才須更換流動感測器2 5,此部份之更換代 價較低。 簡要的說,本發明之模組表面裝置質量流動及壓力控制 器包含一模組流動感測器及一模組控制閥,模組流動感測 器測量流經模組氣髏通道之氣體流量,模組控制閥調節及 控制流經模組氣體通道之氣體流速,模組流動感測器及模 組控制閥兩者均裝置在一模組基礎上。4343 79 ^ ___Case No. 89107284_year month_ charm__ V. Description of the Invention (7) or procedure requires a thermal basis measurement, which can be installed on the module gas channel 10-a thermal flow sensor, if the gas flow Pass through the gas channel 10, or the program-pressure-based measurement is required, a pressure-based flow sensor can be installed on the module gas channel 10, and the module gas channel is converted from a thermal-based measurement gas channel to a pressure-based measurement gas channel At this time, it is not necessary to replace the control valve 30, and the existing mass flow sensor 25 is controlled by electronic equipment, which can be remotely controlled or controlled locally. A specific example shown in FIG. 5 is a morphology of a module gas channel 10 under a thermal basis measurement. In FIG. 5, the flow sensor 25 is a thermal basis flow sensor, and the preferred one is a fast one. Along the gas flow channel 2 8 is placed before the control valve 30, the electronic device can remotely or locally control the module sensor 2 5 and the module control valve 30, and the module gas channel 1 0 measures the state from the thermodynamic test. To switch to the pressure-based state, first remove the thermal flow sensor 25 and the control valve 30, secondly place the control valve 30 at the thermal flow sensor 25 position, and finally place the pressure-based flow sensor 25 at the control valve At position 30, the pressure base state of the module gas channel 10 can be seen in FIG. 6. In FIG. 6, the control valve 30 can be preferably arranged along the gas flow channel 28 before the pressure base flow sensor 25. The flow sensor 25 must be replaced only when the module gas channel 10 is changed from the thermal base measurement state to the pressure base state. This part has a lower replacement cost. Briefly, the module surface device mass flow and pressure controller of the present invention includes a module flow sensor and a module control valve. The module flow sensor measures the gas flow through the module gas cross channel. The module control valve regulates and controls the gas flow rate through the module gas channel. Both the module flow sensor and the module control valve are installed on a module basis.

O:\63\63744.ptc 第10頁 案號 89107284 曰 修正 五 '發明說明(8) 雖然本發明已經以具體實例作為參考加以詳細說明,但 必須明瞭,此項說明僅為一例證,不必構成為一侷限-的理 念,因之須進一步瞭解,本發明具體實例中一些詳細的變 更。顯然的,具有一般技巧者參考此說明可能就本發明作 些增添的具體實例,值得考慮的是所有這些變更加添實例 都包含在本發明的精神和實質的範圍内,如以下的專利。O: \ 63 \ 63744.ptc Case No. 89107284 on page 10, Rev. 5 'Description of the Invention (8) Although the present invention has been described in detail with reference to specific examples, it must be clear that this description is only an example and does not need to constitute As a limited concept, it is necessary to further understand that some detailed changes in specific examples of the present invention. Obviously, those skilled in the art can refer to this description for specific examples that may be added to the present invention. It is worth considering that all these modified examples are included in the spirit and essence of the present invention, such as the following patents.

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Claims (1)

案號 89107284 _η 修正 六、申請專利範圍 1. 一種模組表面裝置質量流動及壓力控制器,包括: 一模組流動感測器,可執行測量流經一模組氣體通-道的 氣體流量; 一模組控制閥,可執行調節及控制流經一模組氣體通道 的氣體流速;及 一模組基礎,該模組流動感測器及模組控制閥都裝置在 此模組基礎表面上。 2. 如申請專利範圍第1項之表面裝置質量流動及壓力控 制器,其中該模組流動感測器可為一棋组·熱力基礎流動感 測器或一模組壓力基礎流動感測器。 3. 如申請專利範圍第1項之表面裝置質量流動及壓力控 制器,其中該模組流動感測器為一模組熱力奉礎流動感測 器,係位於該模組控制閥之前而形成一熱力基礎質量流動 型態,如此則該氣體先流經模組熱力基礎流動感測器,後 流過模組控制閥。 4. 如申請專利範圍第1項之表面裝置質量流動及壓力控 制器,其申該模組流動感測器為一模組壓力基礎流動感測 器,裝置在模組控制閥之後而形成一壓力基礎質量流動型 態,如此則該氣體先流經模組控制閥,後流過模組壓力基 礎流動感測器。 5. 如申請專利範圍第1項之表面裝置質量流動及壓力控 制器,其中該模組流動感測器及模組控制閥具有一模組安 裝座。 6. 如申請專利範圍第5項之表面裝置質量流動及壓力控Case No. 89107284 _η Amendment 6. Scope of patent application 1. A module surface device mass flow and pressure controller includes: a module flow sensor that can measure the gas flow through a module gas channel; A module control valve can perform regulation and control of the gas flow rate through a module gas channel; and a module foundation, the module flow sensor and the module control valve are both installed on the surface of the module foundation. 2. For example, the mass flow and pressure controller for surface devices in the scope of patent application item 1, where the module flow sensor can be a chess set · heat-based flow sensor or a module pressure-based flow sensor. 3. For example, the mass flow and pressure controller of the surface device in the scope of the patent application, wherein the module flow sensor is a module thermal foundation flow sensor, which is located in front of the module control valve to form a Thermal base mass flow pattern, so the gas flows through the module's thermal base flow sensor first, and then through the module control valve. 4. If the mass flow and pressure controller of the surface device of the patent application item 1 is applied, the module flow sensor is a module pressure-based flow sensor, and the device forms a pressure behind the module control valve. Basic mass flow pattern, so the gas flows through the module control valve first and then through the module pressure basic flow sensor. 5. For the surface device mass flow and pressure controller of item 1 of the patent application scope, the module flow sensor and the module control valve have a module mounting seat. 6. Mass flow and pressure control of surface devices such as the scope of patent application No. 5 O:\63\63744.ptc 第13頁 43« 了 9雙 案號 89107284 曰 修正 六、申請專利範圍 制器,其中模組安裝座附合SEMI設計圖Doc. 2 7 8 7。 7. 如申請專利範圍第6項之表面裝置質量流動及壓-力控 制器,其中該模組流動感測器及控制閥均裝置在模組基礎 上用作連接器並附合SEMI設計圈Doc. 2787。 8. 如申請專利範圍第1項之表面裝置質量流動及壓力控 制器,其中該模組流動感測器及模組控制閥,可沿該模組 氣體通道任何地點與任何模組組件互換。 9. 如申請專利範圍第1項之表面裝置質量流動及壓力控 制器,其中該模組流動感測器與另外具有不同測量範圍之 模組流動感測器,在不同濃度或不同熱導的氣體流動測量 時能夠容易的互換。 10. 如申請專利範圍第1項之表面裝置質量、流動及壓力 控制器,其t該模組控制閥與另外模組控制閥在控制不同 濃度之氣體流動時能夠容易的互換。 11. 如申請專利範圍第1項之表面裝置質量流動及壓力 控制器,其中電子設備可遙控或就地控制該模组流動感測 器及模組控制閥。 1 2. —種控制及壓制流經一模組氣體通道的方法,包括 之步驟為: 用模組流動感測器測量流經該模組氣體通道之氣體流 動; 用模組控制閥控制及調節流經該模組氣體通道之氣體流 動;及 該模組流動感測器及模組控制閥均裝置在模組基礎上。O: \ 63 \ 63744.ptc Page 13 43 «Yes 9 pairs Case No. 89107284 said Amendment 6. Scope of patent application, in which the module mounting base is attached to the SEMI design drawing Doc. 2 7 8 7. 7. If the surface device mass flow and pressure-force controller of item 6 of the patent application, the module flow sensor and control valve are both used as connectors on the basis of the module and attached to the SEMI design circle Doc . 2787. 8. If the surface device mass flow and pressure controller of item 1 of the patent application scope, the module flow sensor and module control valve can be interchanged with any module component at any place along the module gas channel. 9. For the mass flow and pressure controller of the surface device in the scope of the patent application, the module flow sensor and the other module flow sensor with different measurement range, different concentrations or different thermal conductivity of the gas Can be easily interchanged for flow measurement. 10. For the surface device mass, flow and pressure controllers in the first patent application scope, the module control valve and the other module control valve can be easily interchanged when controlling the flow of gases of different concentrations. 11. For the mass flow and pressure controller of surface device in the scope of patent application, the electronic equipment can remotely or locally control the module flow sensor and module control valve. 1 2. —A method for controlling and suppressing the flow of gas through a module, including the steps of: measuring the flow of gas through the gas channel of the module with a module flow sensor; controlling and adjusting with a module control valve The gas flow through the gas channel of the module; and the module flow sensor and the module control valve are both based on the module. O:\63\63744.ptc 第14頁 43^3.79® 垒破 89107284 a__a. a 修正 六、申請專利範圍 13. 如申請專利把圍 組氣體通道的方法’其 熱力基礎流動感測器或 14. 如申請專利範圍 組氣體通道的方法,更 控制閥為一熱力基礎質 型態。 15. 如申請專利範圍 組氣體通道的方法,其 基礎流動感測器,更包 在模組控制閥之前,如 器,後流過模組控制閥 1 6.如申請專利範圍 組氣體通道的方法,其 基礎流動感測器,更包 在模組控制閥之後,如 過壓力基礎流動感測器 17. 如申請專利範g 組氣體通道的方法,^ 各具有一模組安裝座。 18. 如申請專利範圍 组氣體通道的方法,其 Doc. 2787。 1 9 .如申請專利範圍 第1 2項之控制及壓制氣體流經一模 中該模組流動感測器可能為一-模組 一壓力基礎流動感測器β 第1 2項之控制及壓制氣體流經一模 包括裝置該模組流動感測器及模組 量流動型態或一壓力基礎質量流動 第1 2項之控制及壓制氣體流經一模 中該模組流動感測器為一模組熱力 括步驟安置此熱力基礎流動感測器 此則氣體先流經熱力基礎流動感測 〇 第1 2項之控制及壓制氣體流經一模 中該模組流動感測器為一模組壓力 括步驟安置此壓力基礎流動感測器 此則氣體先流經模組控制閥,後 '流 〇 第1 2項之控制及壓制氣體流經一模 中該模絚流動感測器及模組控制閥 第17項之控制及壓制氣體流經一模 中該模組安裝座附合SEMI設計圖 第1 2項之控制及壓制氣體流經一模O: \ 63 \ 63744.ptc Page 14 43 ^ 3.79® Barrier 89107284 a__a. A Amendment 6. Patent application scope 13. If applying for a patent, the method of enclosing a group of gas channels' its thermal base flow sensor or 14. For example, the method of applying a patent for a group of gas passages, the control valve is a thermal basic type. 15. If the method of applying for a patent scope group gas channel, the basic flow sensor is more packaged before the module control valve, such as a device, and then flows through the module control valve 1 6. If the method of applying a patent scope group gas channel method The basic flow sensor is further included behind the module control valve, such as the over-pressure basic flow sensor 17. If the method of applying for a patent group g gas channel, each has a module mounting seat. 18. For patent-applied methods of grouping gas channels, Doc. 2787. 19 .If the control and suppression gas of item 12 in the scope of the patent application flows through a mold, the module flow sensor may be a -module-pressure-based flow sensor β control and suppression of item 12 Gas flow through a mold includes the device flow sensor and module volume flow pattern or a pressure-based mass flow item 12 control and suppression of gas flow through a mold. The module flow sensor is a The module's thermal power includes steps to install the thermal-based flow sensor. Then the gas flows through the thermal-based flow sensor first. The control and suppression of the gas flow through a mold in item 12. The module's flow sensor is a module. Pressure includes steps to install the pressure-based flow sensor. Then the gas flows through the module control valve first, and then the flow of the 12th item of control and suppression gas flows through a mold. The mold flow sensor and module Control valve No. 17 control and pressurized gas flow through a mold The module mounting base is attached to the SEMI design drawing No. 12 control and pressurized gas flow through a mold 0:V63V63744.ptc 第15頁 _:_案號 89107284 六、申請專利範圍 年 修正 組氣體通道方法,其中該模組流動感測器及模組控制閥均 裝置在模組基礎上用作連結器且附合S Ε Μ I設計圖2 7 8 7-規 格,如Β-密封,C-密封,CS-密封,W-密封及Ζ-密封連結 器 2 0,如申請專利範圍第1 2項之控制及壓制氣體流經一模 組氣體通道方法,其中該模組流動感測器及模組控制閥可 沿該模組氣體通道與任何其他模組組件在任何地點互換。 21. 如申請專利範圍第1 2項之控制及壓制氣體流經一模 組氣體通道方法,更包括該模組流動感測器在測量不同濃 度或不同熱導之氣體流動時,可與其他具有不同測量範圍 之模組流動感測器互換的步驟。 22. 如申請專利範圍第1 2項之控制及壓制氣體流經一模 組氣體通道方法,更包括該模組控制閥在控制不同濃度之 氣體流動時,與其他模組控制閥互換的步驟。0: V63V63744.ptc Page 15 _: _ Case No. 89107284 Sixth, the patent application scope year correction group gas channel method, in which the module flow sensor and the module control valve are both used as connectors on the basis of the module And attached S Ε Μ I design drawing 2 7 8 7-specification, such as B-seal, C-seal, CS-seal, W-seal and Z-seal connector 20, as described in item 12 of the scope of patent application A method for controlling and suppressing the flow of gas through a module gas channel, wherein the module flow sensor and the module control valve can be interchanged with any other module components at any location along the module gas channel. 21. If the method of controlling and suppressing the flow of gas through a module gas channel in item 12 of the scope of the patent application, the method further includes that the module flow sensor can be used with other Steps for interchange of module flow sensors with different measurement ranges. 22. If the method for controlling and suppressing the flow of gas through a module gas channel in item 12 of the scope of the patent application, the method further includes the step of exchanging the module control valve with other module control valves when controlling the flow of gases of different concentrations. O:\63\63744.ptc 第16頁O: \ 63 \ 63744.ptc Page 16
TW089107284A 1999-04-19 2000-04-18 Modular surface mount mass flow and pressure controller TW434379B (en)

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TWI386578B (en) 2003-01-17 2013-02-21 Applied Materials Inc Method of preventing a mass flow controller from participating in crosstalk in an array of mass flow controllers
US20060000509A1 (en) * 2004-07-01 2006-01-05 Pozniak Peter M Fluid flow control device and system
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KR100323962B1 (en) * 1992-10-16 2002-06-20 죠안나 에스. 리디 Thermal mass flow controller with orthogonal thermal mass flow sensor
US5605179A (en) * 1995-03-17 1997-02-25 Insync Systems, Inc. Integrated gas panel
TW396380B (en) * 1997-06-13 2000-07-01 Swagelok Marketing Co A modular fluid component system and a face seal assembly for the same
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