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TW265425B - - Google Patents

Info

Publication number
TW265425B
TW265425B TW083103371A TW83103371A TW265425B TW 265425 B TW265425 B TW 265425B TW 083103371 A TW083103371 A TW 083103371A TW 83103371 A TW83103371 A TW 83103371A TW 265425 B TW265425 B TW 265425B
Authority
TW
Taiwan
Application number
TW083103371A
Original Assignee
Kansai Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kansai Paint Co Ltd filed Critical Kansai Paint Co Ltd
Application granted granted Critical
Publication of TW265425B publication Critical patent/TW265425B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW083103371A 1993-04-16 1994-04-15 TW265425B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11376993 1993-04-16
JP11935393 1993-04-23

Publications (1)

Publication Number Publication Date
TW265425B true TW265425B (zh) 1995-12-11

Family

ID=26452696

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083103371A TW265425B (zh) 1993-04-16 1994-04-15

Country Status (3)

Country Link
US (2) US5496678A (zh)
KR (1) KR100305960B1 (zh)
TW (1) TW265425B (zh)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5496678A (en) * 1993-04-16 1996-03-05 Kansai Paint Co., Ltd. Photosensitive compositions containing a polymer with carboxyl and hydroxyphenyl groups, a compound with multiple ethylenic unsaturation and a photo-acid generator
EP0738744B1 (en) * 1995-04-21 2002-11-27 Arch Specialty Chemicals, Inc. Cross-linked polymers
US6140022A (en) * 1996-07-19 2000-10-31 Agfa-Gevaert, N.V. Radiation sensitive imaging element and a method for producing lithographic plates therewith
US6200726B1 (en) 1996-09-16 2001-03-13 International Business Machines Corporation Optimization of space width for hybrid photoresist
US5962184A (en) * 1996-12-13 1999-10-05 International Business Machines Corporation Photoresist composition comprising a copolymer of a hydroxystyrene and a (meth)acrylate substituted with an alicyclic ester substituent
US6124077A (en) * 1997-09-05 2000-09-26 Kansai Paint Co., Ltd. Visible light-sensitive compositions and pattern formation process
WO1999054788A1 (fr) * 1998-04-17 1999-10-28 Kansai Paint Co., Ltd. Composition de resine photosensible
US6630285B2 (en) * 1998-10-15 2003-10-07 Mitsui Chemicals, Inc. Positive sensitive resin composition and a process for forming a resist pattern therewith
US6072006A (en) 1998-11-06 2000-06-06 Arch Specialty Chemicals, Inc. Preparation of partially cross-linked polymers and their use in pattern formation
US6670100B1 (en) * 1999-05-20 2003-12-30 Kansai Paint Co., Ltd. Positive type actinic ray-curable dry film and pattern-forming method by use of the same
EP1240552B1 (en) 1999-08-13 2012-09-19 Intellectual Ventures Holding 40 LLC Water-processable photoresist compositions
US6555286B1 (en) * 1999-08-25 2003-04-29 Kansai Paint Co., Ltd. Positive type actinic-ray-curable dry film and pattern-forming method by use of the same
US6455231B1 (en) * 1999-11-03 2002-09-24 Shipley Company, L.L.C. Dry film photoimageable compositions
JP3755571B2 (ja) * 1999-11-12 2006-03-15 信越化学工業株式会社 化学増幅ポジ型レジスト材料及びパターン形成方法
DE60128283T2 (de) 2000-03-22 2008-01-31 Shin-Etsu Chemical Co., Ltd. Chemisch verstärkte positiv arbeitende Resistzusammensetzung und Strukturierungsverfahren
JP2002122986A (ja) * 2000-10-16 2002-04-26 Kansai Paint Co Ltd ポジ型感光性樹脂組成物、ポジ型感光性ドライフィルム、その組成物を使用して得られる材料及びパターン形成方法
TWI298423B (en) 2001-02-06 2008-07-01 Nagase & Co Ltd Developer producing equipment and method
WO2003025674A1 (fr) * 2001-09-11 2003-03-27 Kansai Paint Co., Ltd. Composition pour rayons d'energie actinique et procede de formation de motif
TWI400570B (zh) 2005-07-25 2013-07-01 Nissan Chemical Ind Ltd 正型感光性樹脂組成物及由其所得之硬化膜
TWI411884B (zh) * 2006-05-16 2013-10-11 Nissan Chemical Ind Ltd 含有矽氧烷的正型感光性樹脂組成物
KR101258726B1 (ko) * 2008-03-26 2013-04-26 다이요 홀딩스 가부시키가이샤 감광성 수지 조성물, 그의 경화물 및 그의 경화물로 이루어지는 솔더 레지스트층을 갖는 인쇄 배선 기판

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
MY103006A (en) * 1987-03-30 1993-03-31 Microsi Inc Photoresist compositions
US5364738A (en) * 1991-10-07 1994-11-15 Fuji Photo Film Co., Ltd. Light-sensitive composition
US5262280A (en) * 1992-04-02 1993-11-16 Shipley Company Inc. Radiation sensitive compositions
US5496678A (en) * 1993-04-16 1996-03-05 Kansai Paint Co., Ltd. Photosensitive compositions containing a polymer with carboxyl and hydroxyphenyl groups, a compound with multiple ethylenic unsaturation and a photo-acid generator

Also Published As

Publication number Publication date
US5650259A (en) 1997-07-22
US5496678A (en) 1996-03-05
KR100305960B1 (ko) 2001-11-30

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