TW202433166A - Substrate storage case and substrate storage unit - Google Patents

Abstract

To provide a technique capable of preventing foreign matters from coming around onto a main surface of a substrate stored in a case, even if the foreign matters are generated inside the case. A substrate storage case 1 for use in storing a substrate 2 includes a main body portion 10 having a supporting member 11 inside, and a cover portion 20 having a partitioning member 21 inside. The substrate 2 has two opposite main surfaces of a rectangular shape, four side surfaces, and chamfered surfaces formed between the main surfaces and the side surfaces. When the substrate 2 is stored in the case 1, the supporting member 11 supports the substrate 2 in a state where one of the main surfaces is faced to a bottom surface of the main body portion 10. The partitioning member 21 comes in contact with an entire part of at least one of four ridge portions between the other main surface and the chamfered surfaces, comes in contact with at least one of the chamfered surfaces over an entire part in a direction of the ridge portion, or comes in contact with the other main surface in the vicinity of the at least one ridge portion over an entire part in the direction of the ridge portion.

Description

Substrate storage box and substrate storage body

The present invention relates to a substrate storage box and a substrate storage body.

The photomasks used in the manufacturing steps of display devices such as LCDP (Liquid Crystal Display Panel), PDP (Plasma Display Panel), and OLED (Organic Electro-Luminescence Display) panels are generally transported or stored in a substrate storage box called a mask box. The mask box has a base and a cover having a planar shape larger than the mask, and is configured to store the mask in an internal space formed between the base and the cover by covering the mask supported by the base with the cover (for example, refer to Patent Document 1). [Prior Art Document] [Patent Document]

[Patent Document 1] Japanese Patent Publication No. 2010-191149

[The problem the invention is trying to solve]

The substrate storage box (hereinafter sometimes referred to as the box) stores, in addition to a photomask having a thin film pattern formed on a substrate, a photomask base having a thin film formed on a substrate to be used as an original plate for manufacturing the photomask, a substrate for manufacturing the photomask base, etc. (hereinafter collectively referred to as the photomask, etc.). In a substrate storage box storing photomasks, etc., particles (foreign matter) may be generated from the side surfaces of the photomasks, etc. due to certain reasons (such as the influence of vibration during transportation). Regarding the generation of foreign matter in the box, although it has been proposed to suppress it by reducing the contact area between the photomask, etc. and the box components (such as the cover) (for example, refer to Patent Document 1), even if the contact area is reduced, it may not be possible to completely prevent the generation of foreign matter in the box. In particular, when a photomask base is stored in a substrate storage box, if foreign matter generated in the box is attached to the surface of a thin film provided on the main surface of the photomask base, when the photomask base is used to manufacture a photomask, it will cause multiple defects in the thin film pattern, and such a situation should be prevented in advance. In addition, even when a substrate before the thin film is provided is stored in a substrate storage box, if foreign matter generated in the box is attached to the main surface of the substrate (especially the main surface on the side where the thin film is formed), it will cause defects in the thin film of the photomask base.

The purpose of the present invention is to provide a technology that can prevent foreign matter from circumventing the main surface of the stored substrate when foreign matter is generated in the substrate storage box.

[Technical means to solve the problem]

(First Aspect) The first aspect of the present invention is a substrate storage box, which is used to store substrates and comprises: a main body having a supporting member inside; and a cover having a partitioning member inside; and the substrate has two opposing quadrilateral main surfaces, four side surfaces, and chamfered surfaces provided between each main surface and each side surface. When the substrate is stored in the substrate storage box, the supporting member supports the substrate in a state where the main surface faces the bottom surface of the main body; The partition member abuts all parts of at least one of the four ridges between the other main surface and the chamfered surface, or abuts all parts in the direction of the ridge on at least one of the chamfered surfaces, or abuts all parts in the direction of the ridge on the other main surface near at least one of the ridges.

(Second aspect) The second aspect of the present invention is a substrate storage box as in the first aspect, wherein the side of the partition member opposite to the side abutting against the substrate is fixed to the inner side of the cover.

(Aspect 3) Aspect 3 of the present invention is a substrate storage box as in aspect 1, wherein the side of the four side surfaces that abuts against the partition member is in an upward position when the substrate storage box is transported.

(Aspect 4) Aspect 4 of the present invention is a substrate storage box as in aspect 1, wherein a thin film is provided on the other main surface of the substrate.

(Fifth Aspect) The fifth aspect of the present invention is a substrate storage box, which is used to store substrates and has: a main body having a support member inside; and a cover having a frame-shaped partition member inside; and the substrate has two opposing quadrilateral main surfaces, four side surfaces, and chamfered surfaces provided between each main surface and each side surface, and when the substrate is stored in the substrate storage box, the support member supports the substrate in a state where one of the main surfaces faces the bottom surface of the main body; the partition member abuts against at least any one of the other main surface, the chamfered surface on the side of the other main surface, and the ridge between the other main surface and the chamfered surface, and surrounds the area of the other main surface inside the portion abutting against the partition member.

(Sixth Aspect) The sixth aspect of the present invention is a substrate storage box as in the fifth aspect, wherein the side of the partition member opposite to the side abutting against the substrate is fixed to the inner side of the cover.

(Seventh Aspect) The seventh aspect of the present invention is a substrate storage box as in the fifth aspect, wherein the side of the partition member opposite to the side abutting against the substrate is closed.

(Eighth Aspect) The eighth aspect of the present invention is a substrate storage box as in the fifth aspect, wherein a thin film is provided on the other main surface of the substrate.

(Aspect 9) The aspect 9 of the present invention is a substrate storage body, which is used to store a substrate in a storage box, and the substrate has two opposite main surfaces of a quadrilateral shape, four side surfaces, and chamfered surfaces provided between each main surface and each side surface; the storage box has: a main body having a supporting member inside; and a cover having a partitioning member inside; the supporting member supports the substrate in a state where one of the main surfaces is opposite to the bottom surface of the main body; The partition member abuts all parts of at least one of the four ridges between the other main surface and the chamfered surface, or abuts all parts in the direction of the ridge on at least one of the chamfered surfaces, or abuts all parts in the direction of the ridge on the other main surface near at least one of the ridges.

(10th aspect) The 10th aspect of the present invention is a substrate storage body as in the 9th aspect, wherein the side of the partition member opposite to the side abutting against the substrate is fixed to the inner side of the cover.

(11th aspect) The 11th aspect of the present invention is a substrate storage body as in the 9th aspect, wherein the side surface of the above-mentioned four side surfaces that abuts against the above-mentioned partition member is in an upward position when the substrate storage box is transported.

(Aspect 12) Aspect 12 of the present invention is a substrate storage body as in aspect 9, wherein a thin film is provided on the other main surface of the substrate.

(13th Aspect) The 13th aspect of the present invention is a substrate storage body, which is used to store a substrate in a storage box, and the substrate has two opposite main surfaces of a quadrilateral shape, four side surfaces, and chamfered surfaces provided between the main surfaces and the side surfaces; the storage box has: a main body having a supporting member inside; and a cover having a partitioning member inside; the supporting member supports the substrate in a state where one of the main surfaces faces the bottom surface of the main body; the partitioning member abuts against at least any one of the other main surface, the chamfered surface on the side of the other main surface, and the ridge between the other main surface and the chamfered surface, and surrounds the area of the other main surface inside the portion abutting against the partitioning member.

(Aspect 14) Aspect 14 of the present invention is a substrate storage body as in aspect 13, wherein the side of the partition member opposite to the side abutting against the substrate is fixed to the inner side of the cover.

(15th aspect) The 15th aspect of the present invention is a substrate storage body as in the 13th aspect, wherein the side of the partition member opposite to the side abutting against the substrate is closed.

(Sixteenth Aspect) The sixteenth aspect of the present invention is a substrate storage body as in the thirteenth aspect, wherein a thin film is provided on the other main surface of the substrate. [Effect of the Invention]

According to the present invention, when a substrate is stored in a substrate storage box, if a foreign object is generated in the substrate storage box, the foreign object can be prevented from circumventing the main surface of the stored substrate.

Hereinafter, embodiments of the substrate storage box and the substrate storage body of the present invention will be described.

The substrate storage box of the present invention can be applied to any of a photomask, a photomask base, and a substrate for a photomask base. In this embodiment, the substrate storage box is taken as an example as a photomask base box. The photomask base box is configured to store a substrate having a thin film for pattern formation on a main surface (another main surface), namely a photomask base.

In addition, in this specification, a substrate storage box containing a substrate (with or without a pattern forming film, and whether or not the film has a pattern) is referred to as a substrate storage body. Therefore, the substrate is considered to be a part of the substrate storage body, and in this embodiment, the photomask substrate box containing a photomask substrate is equivalent to the substrate storage body.

(Overall structure) Figure 1 is an exploded perspective view schematically showing the general structure of the substrate storage box (mask substrate box) of this embodiment. As shown in the figure, the mask substrate box 1 of this embodiment is used to store the mask substrate 2, and generally has a main body 10 and a cover 20. And, the mask substrate 2 is stored in the internal space formed between the main body 10 and the cover 20. Below, each of these parts will be explained in order.

(Photomask base) Figure 2 is a side sectional view showing an example of the main structure of a substrate (photomask base) constituting a substrate storage body of the present embodiment.

The mask base 2 is the basis of the mask used in the manufacturing steps of display devices such as LCDP, PDP, and OLED, and is a film-attached substrate with a quadrilateral shape and one side of the main surface being 300 mm or more (for example, 300 to 2000 mm). The mask base 2 is composed of a substrate 3 and a film 4 for pattern formation. The substrate 3 has two opposite quadrilateral main surfaces 3a, 3b, and four side surfaces 3c. Chamfered surfaces 3d and 3e are provided between each main surface 3a, 3b and each side surface 3c, and each of these surfaces 3a to 3e constitutes a plate-shaped substrate with a quadrilateral plane shape.

The photomask base 2 has a thin film (e.g., a metal thin film such as a chromium material or a metal silicide material) 4 formed on the main surface 3b of the substrate 3 to form a transfer pattern. Alternatively, the thin film 4 may be a metal thin film on which an anti-etching agent film is stacked.

In addition, ridge portions exist between adjacent surfaces among the surfaces 3a to 3e constituting the mask base 2. Therefore, for example, four ridge portions 3f exist between the main surface 3b and the chamfered surfaces 3e adjacent to the sides of the main surface 3b.

(Photomask substrate box) The photomask substrate box 1 accommodates the photomask substrate 2 as described above in the internal space between the main body 10 and the cover 20. The main body 10 and the cover 20 are formed, for example, by forming a resin material having mechanical strength. However, this is not limited to this, and it can also be formed by other materials (metal materials, etc.).

FIG3 is a side sectional view schematically showing a configuration example of a substrate storage body (a mask substrate box containing a mask substrate) of the present embodiment. As shown in the figure, the mask substrate box 1 has a body 10 which is a bottom container without a cover, and a cover 20 which covers the uncovered portion of the body 10. Moreover, the mask substrate 2 is stored in the internal space formed by the cover 20 covering the body 10. Therefore, the body 10 and the cover 20 both have a planar shape larger than the mask substrate 2. In addition, the photomask substrate 2 is stored in the inner space of the photomask substrate box 1 with one main surface 3a (FIG. 2) facing the bottom surface of the main body 10 and the other main surface (the main surface provided with the film 4) 3b (FIG. 2) located on the top side of the cover 20.

(Main body) The main body 10 constituting the photomask substrate box 1 has a supporting member 11 for supporting the photomask substrate 2 in the interior (i.e., the interior of the uncovered bottom container) in order to accommodate the photomask substrate 2.

The support member 11 is configured to support the photomask substrate 2 in a state where one of the main surfaces (the main surface on the side where the film 4 is not provided) 3a of the photomask substrate 2 faces the bottom surface of the main body 10. For example, the support member 11 is arranged inside the main body 10 in a manner to support the four corners of the main surface 3a of the photomask substrate 2 with respect to the photomask substrate 2 having a quadrilateral planar shape. However, it is not limited to supporting the four corners of the main surface 3a, and other parts of the main surface 3a may also be supported. In any case, in order to suppress the generation of foreign matter in the box, it is preferable to reduce the contact area between the support member 11 and the photomask substrate 2.

This supporting member can be formed by molding a resin material having mechanical strength, for example, similarly to the main body 10.

(Cover) The cover 20 constituting the photomask substrate box 1 forms an internal space for accommodating the photomask substrate 2 by covering the uncovered portion of the body 10, and seals the internal space. Therefore, the cover 20 is formed into a planar shape corresponding to the body 10 (for example, the same shape as the body 10).

In addition, a partition member 21 is provided at a position corresponding to the top surface of the internal space of the cover 20, extending from the top surface toward the opening side of the main body 10. That is, the cover 20 has the partition member 21 inside. The details of the partition member 21 will be described later.

The photomask substrate box 1 is formed by covering the uncovered portion (i.e., the opening portion) of the body 10 with the cover 20. That is, the photomask substrate box 1 is formed by combining the body 10 and the cover 20. Furthermore, the photomask substrate 2 is accommodated in the interior of the photomask substrate box 1 (i.e., the interior space of the body 10 and the cover 20) to form a substrate storage body.

In addition, regarding the photomask substrate box 1 containing the photomask substrate 2, that is, the substrate storage body, not only the cover 20 and the body 10 are in a state of being located in a vertical position, but also the photomask substrate box 1 can be transported or stored in a state in which the body 10 and the cover 20 are in a horizontal position. In addition, as shown in FIG. 4, the combination structure of the body 10 and the cover 20 makes the lower end of the cover 20 bulge outward so that the upper end of the body 10 can enter the inner side of the lower end of the cover 20. In addition, the outer surface of the upper end of the body 10 is connected to the inner surface side of the bulging part of the cover 20. Furthermore, a step is provided on the inner surface side of the bulging part of the cover 20, and when the mask substrate 2 is stored in the mask substrate box 1, as shown in FIG. 4, it becomes a design that is slightly floating from the upper end of the main body 10. On the other hand, when the mask substrate 2 is not stored in the mask substrate box 1, the upper end of the main body 10 abuts against the step of the cover 20. However, this combination structure is an example, for example, it is also possible to have a structure in which a concave portion is provided over the entire length of one of the upper end of the main body 10 and the lower end of the cover 20 without causing the lower end of the cover 20 to bulge outward, and a convex portion that enters the above-mentioned concave portion is provided over the entire length of the other. In this case, the outer surfaces of the main body 10 and the cover 20 can be flattened.

(Partitioning member) Here, the partitioning member 21 of the cover 20 of the photomask substrate box 1 is described in further detail.

FIG. 4 is an enlarged side sectional view showing an example of the main structure of a substrate storage body (a photomask substrate box storing photomask substrates) according to the present embodiment.

As shown in the figure, the partition member 21 is formed to extend from the top surface toward the opening side of the body 10 inside the cover 20, but the protrusion amount from the top surface is set to a dimension that abuts against the photomask base 2 when the body 10 and the cover 20 are combined. That is, the partition member 21 is configured to fix the side of the cover 20 (that is, the side opposite to the side abutting against the photomask base 2) to the inner side of the cover 20, and on the other hand, the protruding front end side abuts against the photomask base 2.

The partition member 21 contacts the photomask base 2 only near the periphery of the photomask base 2, and does not contact the film 4 in the main surface 3b. That is, the partition member 21 is formed like a frame that contacts only near the periphery of the photomask base 2. Thus, the space on the film 4 side further inside the contact portion of the partition member 21 and the space further outside the contact portion are separated from each other by the partition member 21.

It is most ideal that the partition member 21 formed in a frame shape is formed to abut against the entire area near the periphery of the mask substrate 2, that is, the vicinity of the four sides constituting the main surface 3b of the mask substrate 2. In this case, the partition member 21 is formed in a frame shape surrounding the film 4 on the main surface 3b of the mask substrate 2. However, the partition member 21 may not necessarily completely surround the film 4 on the main surface 3b. For example, the partition member 21 may also be formed to abut against one of the four sides constituting the main surface 3b of the mask substrate 2, which is located on the upper side when the mask substrate box 1 is in a vertical position. In this case, for example, when the mask substrate box 1 is transported in a vertical position, the abutment between the partition member 21 and the mask substrate 2 can be performed at the upper side. Furthermore, it is more preferable that the partition member 21 is formed to extend over the entire length of the other three sides (i.e., the sides located on the upper side and the left and right sides) except for one side located on the lower side when the photomask substrate box 1 is in a vertical position, and abuts against each side. That is, it is most desirable that the partition member 21 is formed in a frame shape that completely surrounds the film 4 on the main surface 3b of the photomask substrate 2, but it is not limited thereto, as long as it is formed corresponding to at least one side of the four sides constituting the main surface 3b.

The contact portion of the partition member 21 with the mask substrate 2 is, for example, any one of the ridge portion 3f, the chamfered surface 3e, or the vicinity of the ridge portion 3f in the main surface 3b of the mask substrate 2 illustrated in FIG. 2 . Specifically, when the mask substrate 2 is accommodated in a state where a main surface 3a faces the bottom surface of the main body 10 of the mask substrate box 1, the partition member 21 contacts all portions of at least one of the four ridge portions 3f between the other main surface (i.e., the main surface on which the film 4 is provided) 3b and the chamfered surface 3e (i.e., the partition member 21 contacts all portions of the ridge portion 3f in at least one chamfered surface 3e). 3e, the partition member 21 abuts all parts on an imaginary line set in the direction in which the ridge portion 3f extends) or, on another main surface 3b near at least one ridge portion 3f, the partition member 21 abuts all parts in the direction in which the ridge portion 3f extends (that is, in another main surface 3b, in a region near at least one ridge portion 3f, the partition member 21 abuts all parts on an imaginary line set in the direction in which the ridge portion 3f extends). When the partition member 21 abuts against another main surface 3b, it is ideal that the partition member 21 abuts against the main surface 3b in a region within a distance range of, for example, 3 mm from the ridge portion 3f to the side of the film 4. In addition, "with all parts" and "in all parts" in the above description can also be replaced with "throughout the entire length".

In this way, the partition member 21 abuts against at least any one of the other main surface 3b, the chamfered surface 3e on the side of the other main surface 3b, and the ridge portion 3f between the other main surface 3b and the chamfered surface 3e. Thus, the area on the other main surface 3b that is inside the abutment portion of the partition member 21 (i.e., the formation area of the film 4) and the area outside the abutment portion are separated by the partition member 21. Furthermore, the side of the partition member 21 opposite to the side that abuts against the mask substrate 2 (i.e., the top surface side of the cover 20) is fixed to the inside of the cover 20. And, with respect to the area inside the abutment portion between the mask substrate 2 and the partition member 21, the side of the cover 20 is closed by the top surface of the cover 20. Therefore, the formation area of the thin film 4 on the main surface 3b of the photomask substrate 2 divided by the partition member 21 is divided into a space different from the outer side space of the contact portion between the photomask substrate 2 and the partition member 21 by the cover 20 and the partition member 21 fixed thereto.

In addition, the partition member 21 is composed of a base portion 22 and a front end abutment portion 23. The base portion 22 is formed by forming the same forming material as the cover portion 20 (for example, a resin material with mechanical strength), and constitutes a protruding portion from the cover portion 20. That is, the base portion 22 is configured to function as a wall for partitioning the space along the ridge portion 3f. The front end abutment portion 23 is mounted on the protruding front end side of the base portion 22, and is formed of an elastic member such as silicone rubber or polyurethane rubber. The front end abutment portion 23 is provided over the entire area of the protruding front end side of the base portion 22. That is, the front end abutment portion 23 is formed to correspond to all parts of the direction in which the ridge portion 3f of the mask substrate 2 that is the abutment object extends. In addition, as shown in FIG. 4 , the front end abutting portion 23 preferably has an arc-shaped cross-sectional shape on the side opposite to the mounting side of the base portion 22 (i.e., the side abutting against the photomask base 2).

(Effects of the box when in use) Next, the effects of storing the photomask substrate 2 in the photomask substrate box 1 of the structure described above to form a substrate storage body, that is, the effects of the box when in use, will be described.

When storing the photomask base 2 in the photomask base box 1, first, prepare the main body 10 in a state not covered by the cover 20, and place the photomask base 2 to be stored on the support member 11 of the main body 10. At this time, the photomask base 2 is in a state where one main surface 3a faces the bottom surface of the main body 10, and the other main surface (i.e., the main surface provided with the film 4) 3b is exposed from the uncovered portion of the main body 10. In this way, the photomask base 2 is supported by the support member 11 of the main body 10, for example, at the four corners of the main surface 3a.

Thereafter, the body 10 and the cover 20 are assembled with each other in such a manner that the cover 20 covers the uncovered portion of the body 10. Thus, the inner space of the photomask blank box 1 is formed by the body 10 and the cover 20, and the photomask blank 2 is stored in the inner space.

At this time, in the inner space of the photomask substrate box 1, the partition member 21 in the cover 20 abuts against any one of the edge portion 3f, the chamfered surface 3e, or the vicinity of the edge portion 3f in the main surface 3b of the photomask substrate 2. By the abutment of the partition member 21 against the photomask substrate 2, the formation area of the thin film 4 on the main surface 3b of the photomask substrate 2 is divided into a space different from the space located outside the abutment portion of the partition member 21 (specifically, the space outside the side surface 3c of the photomask substrate 2).

That is, when the main body 10 and the cover 20 are combined to form the mask substrate box 1, and the mask substrate 2 is accommodated in the internal space of the mask substrate box 1, in the internal space of the mask substrate box 1, the space on the main surface (the main surface on which the film 4 is provided) 3b of the mask substrate 2 and other spaces (spaces further outward than the contact portion between the mask substrate 2 and the partition member 21) are divided into different spaces by the partition member 21.

In this way, when the photomask substrate 2 is stored in the photomask substrate box 1 to form a substrate storage body, the substrate storage body is transported or stored. When transporting or storing, the substrate storage body may be in a state where the cover 20 and the body 10 are located in a vertical position or the photomask substrate box 1 is in a vertical position.

However, when the substrate storage body is transported or stored, for example, as shown in FIG3 , particles (foreign matter) 5 may be generated from the side surface 3c ( FIG2 ) of the photomask substrate 2 in the internal space of the photomask substrate box 1 due to some reasons (such as the influence of vibration during transportation). Specifically, the side surface 3c has a rougher surface state than other surfaces, and abrasives used in the substrate manufacturing process may remain. Therefore, after being stored in the photomask substrate box 1, the abrasives remaining on the side surface 3c may appear as foreign matter in the internal space of the photomask substrate box 1. Regarding the generation of such foreign matter 5, even if the contact area between the photomask substrate 2 and the supporting member 11 of the main body 10 is reduced, it may not be completely prevented.

Therefore, the photomask substrate box 1 should be able to prevent foreign matter 5 from the side surface 3c of the stored photomask substrate 2 from circling around the main surface (main surface provided with thin film 4) 3b (FIG. 2) of the photomask substrate 2. In this regard, in the photomask substrate box 1 and the substrate storage body of the present embodiment, the space on the main surface (main surface provided with thin film 4) 3b of the photomask substrate 2 is divided into different spaces from other spaces by the partition member 21 possessed by the cover 20. Therefore, for example, even in the case where foreign matter 5 is generated from the side surface 3c of the photomask substrate 2, the foreign matter 5 will not circling around the space on the main surface (main surface provided with thin film 4) 3b of the photomask substrate 2. That is, it is possible to effectively prevent foreign matter 5 from being attached to the thin film 4 on the main surface 3b. This means that when using the stored mask base 2 to manufacture a mask, the following situation can be avoided in advance, that is, obstacles such as multiple defects in the thin film pattern caused by foreign matter 5 from the side 3c. In particular, when the thin film 4 on the main surface 3b of the mask base 2 is a layered structure of a metal thin film and an anti-etching agent film, the foreign matter 5 is easy to adhere to the anti-etching agent film. On the other hand, it is difficult to clean the anti-etching agent film, so the effect of the partition member 21 in preventing the foreign matter 5 from bypassing is very large.

As for the photomask substrate box 1, it is known in the technical common sense that it is ideal to minimize the contact area with the stored photomask substrate 2. In this regard, in this embodiment, a partition member 21 is provided in the photomask substrate box 1, and the partition member 21 is in contact with the photomask substrate 2, which is contrary to the previous technical common sense, thereby attempting to prevent the above-mentioned foreign matter 5 from circumventing.

As described above, the most effective way to prevent the foreign matter 5 from circumventing is to form the partition member 21 so as to abut against all four sides of the main surface 3b of the photomask blank 2. This is because the partition member 21 completely surrounds the periphery of the thin film 4 on the main surface 3b.

However, even if the partition member 21 does not completely surround the periphery of the film 4, as long as the partition member 21 is formed to correspond to at least one of the four sides of the main surface 3b constituting the photomask substrate 2, the above-mentioned foreign matter 5 can be prevented from circling. For example, when the photomask substrate box 1 is transported or stored in a vertical state, it is considered that the above-mentioned foreign matter 5 will move in the direction of gravity. Therefore, if the partition member 21 is formed to abut against one edge of the upper side of the photomask substrate 2 at least at the upper side, the partition member 21 acts as a wall along the one edge, and the foreign matter 5 can be prevented from circling to the film 4 on the main surface 3b located below it. In this case, the side surface 3c of the photomask substrate 2 that contacts the partition member 21 is located at the upper side when the photomask substrate box 1 is transported in a vertical state. In addition, if the partition member 21 contacts three sides (i.e., the upper and left and right positions) other than one side located at the lower side of the photomask substrate 2, in addition to preventing the foreign matter 5 from circling from the upper side, the foreign matter 5 can also be prevented from circling from the lateral direction, so it is better in preventing the foreign matter 5 from circling.

The partition member 21 contacts at least one of the main surface 3b, the chamfered surface 3e on the side of the main surface 3b, and the edge portion 3f between the main surface 3b and the chamfered surface 3e of the photomask substrate 2 shown in Fig. 2. Even when the partition member 21 contacts any of these portions, as long as the partition member 21 and the photomask substrate 2 are sealed by the contact, the foreign matter 5 can be prevented from circumventing as described above.

When the partition member 21 is brought into contact with the photomask base 2, as long as the partition member 21 is composed of a base portion 22 and a front end contact portion 23, the front end contact portion 23 mounted on the protruding front end side of the base portion 22 contacts the photomask base 2. Since the front end contact portion 23 is formed of an elastic member, the front end contact portion 23 can be elastically deformed when contacting the photomask base 2.

Therefore, even if the partition member 21 contacts the photomask base 2, scratches or other damages can be prevented from being generated on the side of the photomask base 2. This is because when the front end contact portion 23 has an arc-shaped cross-sectional shape, the contact area with the photomask base 2 can be reduced, which is more significant.

Furthermore, the interposition of the elastic front end contact portion 23 is also effective in preventing dust from being generated when the partition member 21 contacts the photomask base 2 .

Furthermore, by utilizing the elastic deformation of the front end abutting portion 23, regardless of the dimensional accuracy of the base portion 22 (i.e., even if the protrusion amount of the base portion 22 is deviated within the dimensional tolerance), the front end abutting portion 23 abuts against the side of the mask base 2 without a gap at all portions in the direction in which the ridge portion 3f of the mask base 2 extends, and the gap can be reliably closed. Furthermore, by utilizing the elastic deformation of the front end abutting portion 23, the continuity of the abutment with the mask base 2 can be easily maintained at all portions in the direction in which the ridge portion 3f of the mask base 2 extends (i.e., a state in which no gap is generated). That is, in the partition member 21, by disposing the elastic front end abutment portion 23 on the protruding front end side of the base portion 22 (i.e., the side of the mask substrate 2), it is very effective in preventing the above-mentioned foreign matter 5 from circling.

In addition, by utilizing the elastic deformation of the front end abutment portion 23, the pressure of the photomask substrate 2 on the supporting member 11 of the main body 10 can be fully ensured, thereby effectively preventing the photomask substrate 2 from shaking in the photomask substrate box 1. This means that the partition member 21 provided on the cover 20 also functions as a fixing member for the photomask substrate 2. Therefore, by making the partition member 21 multifunctional, it is also possible to suppress the complexity of the structure of the photomask substrate box 1.

In addition, as long as the partition member 21 meets the conditions for contact with the substrate described so far, there may be a gap (opening, slit, etc.) in the partition member 21. When the partition member 21 is provided with a gap, it is preferred to install a filter in the gap to prevent the intrusion of particles. A vent hole may also be provided in the base portion 22 of the partition member 21. In this case, it is preferred to install a filter in the vent hole.

On the other hand, Fig. 5 is an enlarged side sectional view showing an example of the main structure of a substrate storage body (a photomask substrate box storing a photomask substrate) of another embodiment of the present invention. The substrate storage body of the other embodiment is greatly different from the substrate storage body of the above embodiment in that a partition member 25 having a front end abutment portion 24 different from the front end abutment portion 23 shown in Fig. 4 is provided on the base portion 22.

Specifically, the side portion of the front end abutting portion 24 that abuts against the substrate 3 is formed into an oblique cross-section shape. When the photomask base 2 is stored in the photomask base box 1, the front end abutting portion 24 abuts against at least the edge portion 3f of the chamfered surface 3e and the chamfered surface 3e of the other main surface 3b of the substrate 3 (photomask base 2). In this way, since the area of the front end abutting portion 24 abutting against the photomask base 2 can be expanded, the state of holding the photomask base 2 can be made more stable. Furthermore, in the operation of housing the photomask substrate 2 in the photomask substrate box 1, even if the position of the photomask substrate 2 when placed in the main body 10 is slightly offset, by expanding the abutting area between the front end abutting portion 24 and the chamfered surface 3e, the area on the inner side from the abutting position of the partition member 25 (i.e., the forming area of the film 4) and the area on the outer side of the abutting position can be reliably separated.

In the photomask substrate box 1 of FIG. 5 , a back contact portion 30 is provided on the supporting member 11 on the side of the body 10 to contact one main surface 3a of the substrate 3 (photomask substrate 2). The back contact portion 30 and the front contact portion 24 are also composed of an elastic member. When the photomask substrate 2 is stored in the photomask substrate box 1, one main surface 3a of the photomask substrate 2 contacts the back contact portion 30 of the elastic member, and the chamfered surface 3e on the other main surface 3b contacts the front contact portion 24 of the elastic member. In the photomask substrate box 1, the photomask substrate 2 is clamped by two elastic members (the front contact portion 24 and the back contact portion 30), so the photomask substrate 2 can be stably held. In addition, other matters related to the substrate storage body of the other embodiment are the same as those of the substrate storage body of the embodiment of the present invention described above.

(Variations, etc.) The above specifically describes the implementation form of the present invention, but the technical scope of the present invention is not limited to the above implementation form, and various modifications can be made without departing from the scope of the gist.

In this embodiment, the photomask substrate box 1 storing the photomask substrate 2 is taken as an example of a substrate storage box, but the present invention is not limited thereto and can also be applied to other types of substrate storage boxes. As other types of substrate storage boxes, for example, a substrate box for storing a photomask substrate substrate (substrate 3 before the film 4 is set) or a photomask box for storing a photomask can be taken. This means that the substrate storage box described in this embodiment can be used as a photomask substrate box, a substrate box, and a photomask box in common.

When the substrate storage box described in the present embodiment is used as a substrate box, the substrate 3 is stored in the substrate box with the main surface 3b of the substrate 3 for the photomask base on which the thin film is formed facing the side of the cover 20 and the main surface 3b is separated by the partition member 21. On the other hand, when the substrate storage box described in the present embodiment is used as a photomask box, it is considered to store the photomask in the photomask box with the side of the thin film pattern in the photomask facing the side of the cover 20 and the surrounding of the thin film pattern separated by the partition member 21.

As a first variation of the above-mentioned photomask substrate box 1, the photomask substrate 2 can also be stored in the photomask substrate box 1 in a state where the other main surface (main surface provided with the film 4) 3b of the photomask substrate 2 is opposite to the bottom surface of the main body 10. In this case, in order to prevent foreign matter from circling the surface of the film 4 on the main surface 3b, it is preferable to provide a partition member 21 similar to the above-mentioned partition member 21 inside the main body 10. In this case, in the partition member 21, it is preferable to provide a notch at an appropriate position of the front end abutment portion 23 of the partition member 21 and the base portion 22, so that the photomask substrate 2 can be easily taken out from the main body 10. In addition, this variation can also be applied to substrate boxes and photomask boxes.

On the other hand, the technical idea that the partition member 21 functions as a fixing member of the photomask substrate 2 is sufficient to be an invention alone. That is, the photomask substrate box 1 of the technical idea has the following structure: when the photomask substrate 2 is stored in the photomask substrate box 1, the support member 11 supports one main surface 3a of the photomask substrate 2, and the front end contact portion 23 of the partition member (frame-shaped fixing member) 21 presses the other main surface 3b, the adjacent chamfered surface 3e, or the edge portion 3f, so that the mask substrate 2 is fixed in the photomask substrate box 1 in a non-shaking manner. And, when the photomask substrate 2 is taken out from the photomask substrate box 1, the cover portion 20 is removed from the main body 10, that is, the partition member 21 is removed from the photomask substrate 2 at the same time, so that the photomask substrate 2 can be taken out. In this case, when the photomask substrate 2 is stored in the photomask substrate box 1, it is not necessary to surround the area on the inner side of the other main surface 3b of the photomask substrate from the position abutting against the partition member 21. For example, an opening may be provided in the partition member 21. Furthermore, as long as the front end abutting portion 23 of the partition member 21 satisfies the function of fixing the substrate 3, it is not necessary to be provided on the entire side opposite to the main surface 3b of the substrate 3. For example, a notch portion may be provided in a part of the front end abutting portion 23 within the scope of satisfying the function of fixing the substrate 3, and the notch portion does not abut against the substrate 3. That is, the following technical idea is established.

A substrate storage box is used to store substrates and has: a main body having a supporting member inside; and a cover having a frame-shaped fixing member inside; and the substrate has two opposite quadrilateral main surfaces, four side surfaces, and chamfered surfaces provided between each main surface and each side surface, and when the substrate storage box stores the substrate, the supporting member supports the substrate in a state where one of the main surfaces faces the bottom surface of the main body; the front end contact portion of the fixing member contacts at least one of the other main surface, the chamfered surface on the side of the other main surface, and the ridge portion between the other main surface and the chamfered surface at the four sides of the main surface, and the substrate is fixed in the main body by the supporting member and the fixing member.

A substrate storage body, which stores a substrate in a storage box, and the substrate has two opposite main surfaces of a quadrilateral shape, four side surfaces, and a chamfered surface provided between the main surface and the side surfaces; the storage box has: a main body having a supporting member inside; and a cover having a frame-shaped fixing member inside; the supporting member supports the substrate in a state where one of the main surfaces faces the bottom surface of the main body; the front end contact portion of the fixing member contacts at least one of the other main surface, the chamfered surface on the side of the other main surface, and the edge portion between the other main surface and the chamfered surface at the four sides of the main surface, and the substrate is fixed in the main body by the supporting member and the fixing member.

As described above, the invention based on the technical idea of using a fixing member as a storage object is not limited to the storage object, and may be the substrate 3 or the photomask.

1: Photomask base box (substrate storage box) 2: Photomask base 3: Substrate 3a, 3b: Main surface 3c: Side surface 3d, 3e: Chamfered surface 3f: Edge part 4: Film 5: Foreign matter 10: Main body 11: Support member 20: Cover part 21, 25: Partition member 22: Base part 23, 24: Front end contact part 30: Back end contact part

FIG. 1 is an exploded perspective view schematically showing the general structure of a substrate storage box of one embodiment of the present invention. FIG. 2 is a side sectional view showing an example of the main structure of a substrate constituting a substrate storage body of one embodiment of the present invention. FIG. 3 is a side sectional view schematically showing the structure of a substrate storage body of one embodiment of the present invention. FIG. 4 is an enlarged side sectional view showing an example of the main structure of a substrate storage body of one embodiment of the present invention. FIG. 5 is an enlarged side sectional view showing an example of the main structure of a substrate storage body of another embodiment of the present invention.

2: Photomask base

5: Foreign objects

10: Main body

11: Support components

20: Cover

21: Partition components

22: Base part

23: Front end contact part

Claims (16)

A substrate storage box is used to store substrates and has: a main body having a support member inside; and a cover having a partition member inside; and the substrate has two opposing quadrilateral main surfaces, four side surfaces, and chamfered surfaces provided between each main surface and each side surface, and when the substrate is stored in the substrate storage box, the support member supports the substrate in a state where one of the main surfaces faces the bottom surface of the main body; the partition member abuts against all parts of at least one of the four ridges between another main surface and the chamfered surface, or abuts against all parts in the direction of the ridge on at least one of the chamfered surfaces, or abuts against all parts in the direction of the ridge on another main surface near at least one of the ridges. As in claim 1, the substrate storage box, wherein the side of the partition member opposite to the side abutting against the substrate is fixed to the inner side of the cover. As for the substrate storage box of claim 1, the side surface among the four side surfaces that abuts against the partition member is in an upward position when the substrate storage box is transported. A substrate storage box as claimed in claim 1, wherein a thin film is provided on the other main surface of the substrate. A substrate storage box is used to store substrates and comprises: a main body having a support member inside; and a cover having a frame-shaped partition member inside; and the substrate has two opposite main surfaces of a quadrilateral shape, four side surfaces, and chamfered surfaces provided between each main surface and each side surface, and when the substrate is stored in the substrate storage box, the support member supports the substrate in a state where one of the main surfaces faces the bottom surface of the main body; the partition member abuts against at least any one of the other main surface, the chamfered surface on the side of the other main surface, and the ridge between the other main surface and the chamfered surface, and surrounds the area of the other main surface inside the abutting portion with the partition member. As in claim 5, the substrate storage box, wherein the side of the partition member opposite to the side abutting against the substrate is fixed to the inner side of the cover. As in claim 5, the substrate storage box, wherein the side of the partition member opposite to the side abutting against the substrate is closed. A substrate storage box as claimed in claim 5, wherein a thin film is provided on the other main surface of the substrate. A substrate storage body, which stores a substrate in a storage box, wherein the substrate has two opposing quadrilateral main surfaces, four side surfaces, and chamfered surfaces provided between each main surface and each side surface; the storage box comprises: a main body having a supporting member inside; and a cover having a partitioning member inside; the supporting member supports the substrate in a state where one of the main surfaces faces the bottom surface of the main body; the partitioning member abuts against all parts of at least one of the four ridges between the other main surface and the chamfered surface, or abuts against all parts in the direction of the ridge on at least one of the chamfered surfaces, or abuts against all parts in the direction of the ridge on the other main surface near at least one of the ridges. A substrate storage body as claimed in claim 9, wherein the side of the partition member opposite to the side abutting against the substrate is fixed to the inner side of the cover. As for the substrate storage body of claim 9, the side surface among the above-mentioned four side surfaces that abuts against the above-mentioned partition member is in an upward position when the substrate storage box is transported. A substrate storage body as claimed in claim 9, wherein a thin film is provided on the other main surface of the substrate. A substrate storage body, which stores a substrate in a storage box, and the substrate has two opposite main surfaces of a quadrilateral shape, four side surfaces, and chamfered surfaces provided between the main surfaces and the side surfaces; the storage box has: a main body having a support member inside; and a cover having a partition member inside; the support member supports the substrate in a state where one main surface faces the bottom surface of the main body; the partition member abuts against at least any one of the other main surface, the chamfered surface on the side of the other main surface, and the ridge between the other main surface and the chamfered surface, and surrounds the area of the other main surface inside the portion abutting against the partition member. A substrate storage body as claimed in claim 13, wherein the side of the partition member opposite to the side abutting against the substrate is fixed to the inner side of the cover. A substrate storage body as claimed in claim 13, wherein the side of the partition member opposite to the side abutting against the substrate is closed. A substrate storage body as claimed in claim 13, wherein a thin film is provided on the other main surface of the substrate.