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TW202400734A - Surface treatment agent - Google Patents

Surface treatment agent Download PDF

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TW202400734A
TW202400734A TW112115596A TW112115596A TW202400734A TW 202400734 A TW202400734 A TW 202400734A TW 112115596 A TW112115596 A TW 112115596A TW 112115596 A TW112115596 A TW 112115596A TW 202400734 A TW202400734 A TW 202400734A
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渡邊裕介
前平健
山下恒雄
三橋尚志
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日商大金工業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/26Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers and other compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • C08G65/336Polymers modified by chemical after-treatment with organic compounds containing silicon
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00Coating compositions based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/18Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
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  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Combustion & Propulsion (AREA)
  • Wood Science & Technology (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polyethers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Surface Treatment Of Glass (AREA)
  • Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

The present disclosure provides fluoropolyether group-containing polyoxyalkylene compounds represented by component (B): which is represented by formula (B1) or (B2): R<SP>FB1</SP> - X<SP>B</SP> - R<SP>B</SP> (B1) R<SP>B</SP> - X<SP>B</SP> -R<SP>FB2</SP> - X<SP>B</SP> - R<SP>B</SP> (B2) [In the formula: details of each symbol are described in the specification].

Description

表面處理劑 surface treatment agent

本揭示係關於表面處理劑。 This disclosure relates to surface treatment agents.

若將某種含氟聚醚基之矽烷化合物使用在基材的表面處理時,則可提供優異的撥水性、撥油性、防污性等情事已為人所知。由含有含氟聚醚基之矽烷化合物之表面處理劑所得到的層(以下亦稱為「表面處理層」),係作為所謂之功能性薄膜而被施予在例如玻璃、塑膠、纖維、衛生用品、建築資材等各式各樣的基材。 It is known that if a certain fluoropolyether-based silane compound is used for surface treatment of a substrate, it can provide excellent water repellency, oil repellency, and antifouling properties. A layer obtained from a surface treatment agent containing a silane compound containing a fluoropolyether group (hereinafter also referred to as a "surface treatment layer") is applied as a so-called functional film to glass, plastics, fibers, sanitary products, etc. Various base materials such as supplies and building materials.

[先前技術文獻] [Prior technical literature]

[專利文獻] [Patent Document]

[專利文獻1]日本特開2014-218639號公報 [Patent Document 1] Japanese Patent Application Publication No. 2014-218639

專利文獻1所記載之含氟聚醚基之矽烷化合物可賦予具有優異功能之表面處理層,惟仍要求具有更高的摩擦耐久性之表面處理層。 The fluorine-containing polyether group silane compound described in Patent Document 1 can provide a surface treatment layer with excellent functions, but there is still a demand for a surface treatment layer with higher friction durability.

本揭示之目的在於提供一種具有摩擦耐久性更高的表面處理層之物品。 The purpose of this disclosure is to provide an article having a surface treatment layer with higher friction durability.

本揭示係包括下列樣態。 This disclosure includes the following aspects.

[1]一種含氟聚醚基之聚氧化烯(polyoxyalkylene)化合物,其為:以下列式(B1)或(B2)所表示之成分(B): [1] A fluoropolyether-based polyoxyalkylene compound, which is component (B) represented by the following formula (B1) or (B2):

RFB1-XB-RB (B1) R FB1 -X B -R B (B1)

RB-XB-RFB2-XB-RB (B2) R B -X B -R FB2 -X B -R B (B2)

式中: In the formula:

RFB1為Rf1-RF-Oq-, R FB1 is Rf 1 -R F -O q -,

RFB2為-Rf2 p-RF-Oq-, R FB2 is -Rf 2 p -R F -O q -,

RF分別獨立地為2價氟聚醚基, R F are independently divalent fluoropolyether groups,

Rf1可經1個或多於1個的氟原子所取代之C1-16烷基, Rf 1 may be a C 1-16 alkyl group substituted by 1 or more than 1 fluorine atom,

Rf2可經1個或多於1個的氟原子所取代之C1-6伸烷基, Rf 2 may be a C 1-6 alkylene group substituted by 1 or more than 1 fluorine atom,

p為0或1, p is 0 or 1,

q分別獨立地為0或1, q is independently 0 or 1,

XB分別獨立地為單鍵或2價基, X B is independently a single bond or a divalent base,

RB分別獨立地為含氧化烯之基。 R B are each independently an alkylene oxide-containing group.

[2]如上述[1]所述之含氟聚醚基之聚氧化烯化合物,其中前述含氧化烯之基係分別獨立地為以下述式所表示之基: [2] The polyoxyalkylene compound containing a fluoropolyether group as described in the above [1], wherein the aforementioned oxyalkylene-containing groups are independently groups represented by the following formula:

-R61-(OR63)b3-R62,或是 -R 61 -(OR 63 ) b3 -R 62 , or

-XE(-R61-(OR63)b3-R62)r2 -X E (-R 61 -(OR 63 ) b3 -R 62 ) r2

式中: In the formula:

R61分別獨立地為單鍵或C1-6伸烷基, R 61 are each independently a single bond or C 1-6 alkylene group,

R62分別獨立地為氫原子、C1-6烷基或C1-6烷氧基, R 62 are each independently a hydrogen atom, C 1-6 alkyl group or C 1-6 alkoxy group,

R63分別獨立地為C1-6伸烷基, R 63 are each independently C 1-6 alkylene group,

b3分別獨立地為1至6的整數, b3 are independently integers from 1 to 6,

XE為3至10價基, X E is 3 to 10 price base,

r2為2至9的整數,且較XE的價數小1。 r2 is an integer from 2 to 9, and is 1 less than the valence of X E.

[3]如上述[1]或[2]所述之含氟聚醚基之聚氧化烯化合物,其中前述含氧化烯之基分別獨立地為以下述式所表示之基: [3] The fluoropolyether group-containing polyoxyalkylene compound as described in the above [1] or [2], wherein the aforementioned oxyalkylene-containing groups are each independently a group represented by the following formula:

-R61-(OR63)b3-R62 -R 61 -(OR 63 ) b3 -R 62

式中: In the formula:

R61為單鍵或C1-6伸烷基, R 61 is a single bond or C 1-6 alkylene group,

R62為氫原子、C1-6烷基或C1-6烷氧基, R 62 is a hydrogen atom, C 1-6 alkyl group or C 1-6 alkoxy group,

R63分別獨立地為C1-6伸烷基, R 63 are each independently C 1-6 alkylene group,

b3為1至6的整數。 b3 is an integer from 1 to 6.

[4]如上述[2]或[3]所述之含氟聚醚基之聚氧化烯化合物,其中R63為C1-3伸烷基。 [4] The fluoropolyether group-containing polyoxyalkylene compound as described in the above [2] or [3], wherein R 63 is a C 1-3 alkylene group.

[5]如上述[1]至[4]中任一項所述之含氟聚醚基之聚氧化烯化合物,其中XB分別獨立地為單鍵或-(R67)b1-(R68)b2-, [5] The fluoropolyether group-containing polyoxyalkylene compound as described in any one of the above [1] to [4], wherein X B is each independently a single bond or -(R 67 ) b1 -(R 68 ) b2- ,

式中: In the formula:

R67分別獨立地為C1-6伸烷基, R 67 are each independently C 1-6 alkylene group,

R68分別獨立地為氧原子、硫原子、CO、NR69、CONR69、NR69CO或C6-12伸芳基, R 68 is independently an oxygen atom, a sulfur atom, CO, NR 69 , CONR 69 , NR 69 CO or C 6-12 aryl group,

R69分別獨立地為氫原子或C1-6烷基, R 69 are each independently a hydrogen atom or a C 1-6 alkyl group,

b1為0至6的整數, b1 is an integer from 0 to 6,

b2為0至6的整數, b2 is an integer from 0 to 6,

b1及b2之合計為1以上, The total of b1 and b2 is 1 or more,

標註b1或b2並以括弧括起之各重複單元的存在順序於式中為任意。 The order of existence of each repeating unit marked b1 or b2 and enclosed in parentheses is arbitrary in the formula.

[6]如上述[1]至[5]中任一項所述之含氟聚醚基之聚氧化烯化合物,其中XB分別獨立地為單鍵、C1-6伸烷基或-R64-O-R65-, [6] The fluoropolyether group-containing polyoxyalkylene compound as described in any one of the above [1] to [5], wherein X B is independently a single bond, C 1-6 alkylene group or -R 64 -OR 65- ,

R64為單鍵或C1-6伸烷基, R 64 is a single bond or C 1-6 alkylene group,

R65為單鍵或C1-6伸烷基。 R 65 is a single bond or C 1-6 alkylene group.

[7]如上述[1]至[6]中任一項所述之含氟聚醚基之聚氧化烯化合物,其中RF分別獨立地為以下列式所表示之基: [7] The polyoxyalkylene compound containing a fluoropolyether group as described in any one of the above [1] to [6], wherein R F are each independently a group represented by the following formula:

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3RFa 6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f -

式中: In the formula:

RFa分別獨立地為氫原子、氟原子或氯原子, R Fa are each independently a hydrogen atom, a fluorine atom or a chlorine atom,

a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的RFa為氫原子或氯原子之情形時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e and f are each independently an integer from 0 to 200. The sum of a, b, c, d, e and f is more than 1. Mark a, b, c, d, e or f The order of existence of each repeating unit enclosed in parentheses is arbitrary in the formula. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more. .

[8]如上述[1]至[7]中任一項所述之含氟聚醚基之聚氧化烯化合物,其中Rf1為C1-16全氟烷基, [8] The fluoropolyether group-containing polyoxyalkylene compound as described in any one of the above [1] to [7], wherein Rf 1 is a C 1-16 perfluoroalkyl group,

Rf2為C1-6全氟伸烷基, Rf 2 is C 1-6 perfluoroalkyl group,

RF分別獨立地為以下列式所表示之基: R F are independently the basis represented by the following formula:

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f -

式中: In the formula:

a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的RFa為氫原子或氯原子之情形時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e and f are each independently an integer from 0 to 200. The sum of a, b, c, d, e and f is more than 1. Mark a, b, c, d, e or f The order of existence of each repeating unit enclosed in parentheses is arbitrary in the formula. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more. .

[9]如上述[1]至[8]中任一項所述之含氟聚醚基之聚氧化烯化合物,其中RF分別獨立地為以下述式(f1)、(f2)、(f3)、(f4)、(f5)或(f6)所表示之基: [9] The fluoropolyether group-containing polyoxyalkylene compound as described in any one of the above [1] to [8], wherein R F are independently represented by the following formulas (f1), (f2), (f3) ), (f4), (f5) or (f6):

-(OC3F6)d-(OC2F4)e- (f1) -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1)

式中,d為1至200的整數,e為0或1; In the formula, d is an integer from 1 to 200, and e is 0 or 1;

-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f2) -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2)

式中,c及d分別獨立地為0至30的整數, In the formula, c and d are independently integers from 0 to 30,

e及f分別獨立地為1至200的整數, e and f are independently integers from 1 to 200,

c、d、e及f之和為10至200的整數, The sum of c, d, e and f is an integer from 10 to 200,

標註c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; The order of existence of each repeating unit marked c, d, e or f and enclosed in parentheses is arbitrary in the formula;

-(R6-R7)g- (f3) -(R 6 -R 7 ) g - (f3)

式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups selected from these groups,

g為2至100的整數; g is an integer from 2 to 100;

-(R6-R7)g-Rr-(R7’-R6’)g’- (f4) -(R 6 -R 7 ) g -R r -(R 7' -R 6' ) g' - (f4)

式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups independently selected from these groups,

R6’為OCF2或OC2F4R 6' is OCF 2 or OC 2 F 4 ,

R7’為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是獨立地選自此等基之2或3個基的組合, R 7' is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups independently selected from these groups,

g為2至100的整數, g is an integer from 2 to 100,

g’為2至100的整數, g’ is an integer from 2 to 100,

Rr為下列式: R r is the following formula:

Figure 112115596-A0202-12-0006-2
Figure 112115596-A0202-12-0006-2

式中,*表示鍵結位置; In the formula, * represents the bonding position;

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f5) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5)

式中,e為1以上200以下的整數,a、b、c、d及f分別獨立地為0以上200以下的整數,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, e is an integer from 1 to 200, a, b, c, d and f are each independently an integer from 0 to 200. Label a, b, c, d, e or f and enclose it in brackets. The order of existence of each repeating unit in the formula is arbitrary;

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f6) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6)

式中,f為1以上200以下的整數,a、b、c、d及e分別獨立地為0以上200以下的整數,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。 In the formula, f is an integer from 1 to 200, a, b, c, d and e are each independently an integer from 0 to 200. Label a, b, c, d, e or f and enclose it in brackets. The order of existence of each repeating unit in the formula is arbitrary.

[10]一種表面處理劑,係含有:成分(A):含氟聚醚基之矽烷化合物、以及 [10] A surface treatment agent containing: component (A): a fluorine-containing polyether-based silane compound, and

成分(B):如上述[1]至[9]中任一項所述之含氟聚醚基之聚氧化烯化合物。 Component (B): the fluorine-containing polyether-based polyoxyalkylene compound described in any one of [1] to [9] above.

[11]如上述[10]所述之表面處理劑,其中前述含氟聚醚基之矽烷化合物為以下述式(A1)或(A2)所表示之化合物: [11] The surface treatment agent according to the above [10], wherein the fluorine-containing polyether group silane compound is a compound represented by the following formula (A1) or (A2):

RFA1 α1-XA-RSi β1 (A1) R FA1 α1 -X A -R Si β1 (A1)

RSi γ1-XA-RFA2-XA-RSi γ1 (A2) R Si γ1 -X A -R FA2 -X A -R Si γ1 (A2)

式中: In the formula:

RFA1分別獨立地為Rf1-RF-Oq-, R FA1 are independently Rf 1 -R F -O q -,

RFA2為-Rf2 p-RF-Oq-, R FA2 is -Rf 2 p -R F -O q -,

RF分別獨立地為2價氟聚醚基, R F are independently divalent fluoropolyether groups,

Rf1為可經1個或多於1個的氟原子所取代之C1-16烷基, Rf 1 is a C 1-16 alkyl group which may be substituted by 1 or more than 1 fluorine atom,

Rf2為可經1個或多於1個的氟原子所取代之C1-6伸烷基, Rf 2 is a C 1-6 alkylene group which may be substituted by 1 or more than 1 fluorine atom,

p為0或1, p is 0 or 1,

q分別獨立地為0或1, q is independently 0 or 1,

RSi分別獨立地為含有與羥基、水解性基、氫原子或1價基鍵結之Si原子的1價基, R Si is each independently a monovalent group containing a Si atom bonded to a hydroxyl group, a hydrolyzable group, a hydrogen atom or a monovalent group,

至少1個RSi為含有與羥基或水解性基鍵結之Si原子的1價基, At least one R Si is a univalent group containing a Si atom bonded to a hydroxyl group or a hydrolyzable group,

XA分別獨立地為單鍵或2至10價基, X A are each independently a single bond or a valence base of 2 to 10,

α1為1至9的整數, α1 is an integer from 1 to 9,

β31為1至9的整數, β31 is an integer from 1 to 9,

γ1分別獨立地為1至9的整數。 γ1 is each independently an integer from 1 to 9.

[12]如上述[11]所述之表面處理劑,其中於式(A1)及(A2)中,RF分別獨立地為以下列式所表示之基: [12] The surface treatment agent as described in the above [11], wherein in the formulas (A1) and (A2), R F are each independently a group represented by the following formula:

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3RFa 6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f -

式中: In the formula:

RFa分別獨立地為氫原子、氟原子或氯原子, R Fa are each independently a hydrogen atom, a fluorine atom or a chlorine atom,

a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的RFa為氫原子或氯原子之情形時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e and f are each independently an integer from 0 to 200. The sum of a, b, c, d, e and f is more than 1. Mark a, b, c, d, e or f The order of existence of each repeating unit enclosed in parentheses is arbitrary in the formula. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more. .

[13]如上述[11]或[12]所述之表面處理劑,其中於式(A1)及(A2)中,Rf1為C1-16全氟烷基, [13] The surface treatment agent as described in the above [11] or [12], wherein in formulas (A1) and (A2), Rf 1 is a C 1-16 perfluoroalkyl group,

Rf2為C1-6全氟伸烷基, Rf 2 is C 1-6 perfluoroalkyl group,

RF分別獨立地為以下列式所表示之基: R F are independently the basis represented by the following formula:

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f -

式中: In the formula:

a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的RFa為氫原子或氯原子之情形時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e and f are each independently an integer from 0 to 200. The sum of a, b, c, d, e and f is more than 1. Mark a, b, c, d, e or f The order of existence of each repeating unit enclosed in parentheses is arbitrary in the formula. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more. .

[14]如上述[11]至[13]中任一項所述之表面處理劑,其中於式(A1)及(A2)中,RF分別獨立地為以下述式(f1)、(f2)、(f3)、(f4)、(f5)或(f6)所表示之基: [14] The surface treatment agent according to any one of the above [11] to [13], wherein in the formulas (A1) and (A2), R F is each independently represented by the following formula (f1), (f2) ), (f3), (f4), (f5) or (f6):

-(OC3F6)d-(OC2F4)e- (f1) -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1)

式中,d為1至200的整數,e為0或1; In the formula, d is an integer from 1 to 200, and e is 0 or 1;

-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f2) -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2)

式中,c及d分別獨立地為0至30的整數, In the formula, c and d are independently integers from 0 to 30,

e及f分別獨立地為1至200的整數, e and f are independently integers from 1 to 200,

c、d、e及f之和為10至200的整數, The sum of c, d, e and f is an integer from 10 to 200,

標註c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; The order of existence of each repeating unit marked c, d, e or f and enclosed in parentheses is arbitrary in the formula;

-(R6-R7)g- (f3) -(R 6 -R 7 ) g - (f3)

式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups selected from these groups,

g為2至100的整數; g is an integer from 2 to 100;

-(R6-R7)g-Rr-(R7’-R6’)g’- (f4) -(R 6 -R 7 ) g -R r -(R 7' -R 6' ) g' - (f4)

式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups independently selected from these groups,

R6’為OCF2或OC2F4R 6' is OCF 2 or OC 2 F 4 ,

R7’為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是獨立地選自此等基之2或3個基的組合, R 7' is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups independently selected from these groups,

g為2至100的整數, g is an integer from 2 to 100,

g’為2至100的整數, g’ is an integer from 2 to 100,

Rr為下列式: R r is the following formula:

Figure 112115596-A0202-12-0010-3
Figure 112115596-A0202-12-0010-3

式中,*表示鍵結位置; In the formula, * represents the bonding position;

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f5) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5)

式中,e為1以上200以下的整數,a、b、c、d及f分別獨立地為0以上200以下的整數,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, e is an integer from 1 to 200, a, b, c, d and f are each independently an integer from 0 to 200. Label a, b, c, d, e or f and enclose it in brackets. The order of existence of each repeating unit in the formula is arbitrary;

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f6) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6)

式中,f為1以上200以下的整數,a、b、c、d及e分別獨立地為0以上200以下的整數,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。 In the formula, f is an integer from 1 to 200, a, b, c, d and e are each independently an integer from 0 to 200. Label a, b, c, d, e or f and enclose it in brackets. The order of existence of each repeating unit in the formula is arbitrary.

[15]如上述[11]至[14]中任一項所述之表面處理劑,其中RSi為以下述式(S1)、(S2)、(S3)、(S4)或(S5)所表示之基: [15] The surface treatment agent according to any one of the above [11] to [14], wherein R Si is represented by the following formula (S1), (S2), (S3), (S4) or (S5) Representation basis:

Figure 112115596-A0202-12-0011-37
Figure 112115596-A0202-12-0011-37

- SiR11 n1R12 3-n1 (S2) - SiR 11 n1 R 12 3-n1 (S2)

- SiRa1 k1Rb1 l1Rc1 m1 (S3) - SiR a1 k1 R b1 l1 R c1 m1 (S3)

- CRd1 k2Re1 l2Rf1 m2 (S4) - CR d1 k2 R e1 l2 R f1 m2 (S4)

- NRg1Rh1 (S5) - NR g1 R h1 (S5)

式中: In the formula:

R11分別獨立地為羥基或水解性基, R 11 are each independently a hydroxyl group or a hydrolyzable group,

R12分別獨立地為氫原子或1價有機基, R 12 is each independently a hydrogen atom or a monovalent organic group,

n1於每個(SiR11 n1R12 3-n1)單元中分別獨立地為0至3的整數, n1 is an integer from 0 to 3 independently in each (SiR 11 n1 R 12 3-n1 ) unit,

X11分別獨立地為單鍵或2價基, X 11 is independently a single bond or a divalent base,

R13分別獨立地為氫原子或1價有機基, R 13 is each independently a hydrogen atom or a monovalent organic group,

t分別獨立地為2以上的整數, t is independently an integer above 2,

R14分別獨立地為氫原子、鹵素原子或-X11-SiR11 n1R12 3-n1R 14 is independently a hydrogen atom, a halogen atom or -X 11 -SiR 11 n1 R 12 3-n1 ,

R15分別獨立地為單鍵、氧原子、碳數1至6的伸烷基或碳數1至6的伸烷氧基, R 15 is each independently a single bond, an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or an alkyleneoxy group having 1 to 6 carbon atoms,

Ra1分別獨立地為-Z1-SiR21 p1R22 q1R23 r1R a1 are independently -Z 1 -SiR 21 p1 R 22 q1 R 23 r1 ;

Z1分別獨立地為2價基, Z 1 are independently 2-valent bases,

R21分別獨立地為-Z1’-SiR21’ p1’R22’ q1’R23’ r1’R 21 are independently -Z 1' -SiR 21' p1' R 22' q1' R 23' r1' ;

R22分別獨立地為羥基或水解性基, R 22 are each independently a hydroxyl group or a hydrolyzable group,

R23分別獨立地為氫原子或1價有機基, R 23 is each independently a hydrogen atom or a monovalent organic group,

p1分別獨立地為0至3的整數, p1 are independently integers from 0 to 3,

q1分別獨立地為0至3的整數, q1 are independently integers from 0 to 3,

r1分別獨立地為0至3的整數, r1 are independently integers from 0 to 3,

p1、q1及r1之合計於(SiR21 p1R22 q1R23 r1)單元中為3, The total of p1, q1 and r1 in the unit (SiR 21 p1 R 22 q1 R 23 r1 ) is 3,

Z1’分別獨立地為2價基, Z 1' are independently 2-valent bases,

R21’分別獨立地為-Z1”-SiR22” q1”R23” r1”R 21' are independently -Z 1” -SiR 22” q1” R 23” r1” ;

R22’分別獨立地為羥基或水解性基, R 22' are each independently a hydroxyl group or a hydrolyzable group,

R23’分別獨立地為氫原子或1價有機基, R 23' are each independently a hydrogen atom or a monovalent organic group,

p1’分別獨立地為0至3的整數, p1’ are independently integers from 0 to 3,

q1’分別獨立地為0至3的整數, q1’ are independently integers from 0 to 3,

r1’分別獨立地為0至3的整數, r1’ are independently integers from 0 to 3,

p1’、q1’及r1’之合計於(SiR21’ p1’R22’ q1’R23’ r1’)單元中為3, The total of p1', q1' and r1' in the (SiR 21' p1' R 22' q1' R 23' r1' ) unit is 3,

Z1”分別獨立地為2價基, Z 1” are independently 2-valent bases,

R22”分別獨立地為羥基或水解性基, R 22″ are each independently a hydroxyl group or a hydrolyzable group,

R23”分別獨立地為氫原子或1價有機基, R 23″ are each independently a hydrogen atom or a monovalent organic group,

q1”分別獨立地為0至3的整數, q1” are independently integers from 0 to 3,

r1”分別獨立地為0至3的整數, r1” are independently integers from 0 to 3,

q1”及r1”之合計於(SiR22” q1”R23” r1”)單元中為3, The total of q1” and r1” in the unit (SiR 22” q1” R 23” r1” ) is 3,

Rb1分別獨立地為羥基或水解性基, R b1 are each independently a hydroxyl group or a hydrolyzable group,

Rc1分別獨立地為氫原子或1價有機基, R c1 are each independently a hydrogen atom or a monovalent organic group,

k1分別獨立地為0至3的整數, k1 are independently integers from 0 to 3,

l1分別獨立地為0至3的整數, l1 are independently integers from 0 to 3,

m1分別獨立地為0至3的整數, m1 are independently integers from 0 to 3,

k1、l1及m1之合計於(SiRa1 k1Rb1 l1Rc1 m1)單元中為3, The total of k1, l1 and m1 in the (SiR a1 k1 R b1 l1 R c1 m1 ) unit is 3,

Rd1分別獨立地為-Z2-CR31 p2R32 q2R33 r2R d1 are independently -Z 2 -CR 31 p2 R 32 q2 R 33 r2 ;

Z2分別獨立地為單鍵、2價基; Z 2 are independently single bond and divalent base;

R31分別獨立地為-Z2’-CR32’ q2’R33’ r2’R 31 are independently -Z 2' -CR 32' q2' R 33' r2' ;

R32分別獨立地為-Z3-SiR34 n2R35 3-n2R 32 are each independently -Z 3 -SiR 34 n2 R 35 3-n2 ,

R33分別獨立地為氫原子、羥基或1價有機基, R 33 is independently a hydrogen atom, a hydroxyl group or a monovalent organic group,

p2分別獨立地為0至3的整數, p2 are independently integers from 0 to 3,

q2分別獨立地為0至3的整數, q2 are independently integers from 0 to 3,

r2分別獨立地為0至3的整數, r2 are independently integers from 0 to 3,

p2、q2及r2之合計於(CR31 p2R32 q2R33 r2)單元中為3, The total of p2, q2 and r2 in the unit (CR 31 p2 R 32 q2 R 33 r2 ) is 3,

Z2’分別獨立地為單鍵或2價基; Z 2' is independently a single bond or a divalent base;

R32’分別獨立地為-Z3-SiR34 n2R35 3-n2R 32' are each independently -Z 3 -SiR 34 n2 R 35 3-n2 ,

R33’分別獨立地為氫原子、羥基或1價有機基, R 33' are each independently a hydrogen atom, a hydroxyl group or a monovalent organic group,

q2’分別獨立地為0至3的整數, q2’ are independently integers from 0 to 3,

r2’分別獨立地為0至3的整數, r2’ are independently integers from 0 to 3,

q2’及r2’之合計於(CR32’ q2’R33’ r2’)單元中為3, The total of q2' and r2' in the (CR 32' q2' R 33' r2' ) unit is 3,

Z3分別獨立地為單鍵或2價基; Z 3 is independently a single bond or a divalent base;

R34分別獨立地為羥基或水解性基, R 34 are each independently a hydroxyl group or a hydrolyzable group,

R35分別獨立地為氫原子或1價有機基, R 35 is each independently a hydrogen atom or a monovalent organic group,

n2分別獨立地為0至3的整數, n2 are independently integers from 0 to 3,

Re1分別獨立地為-Z3-SiR34 n2R35 3-n2R e1 are each independently -Z 3 -SiR 34 n2 R 35 3-n2 ,

Rf1分別獨立地為氫原子、羥基或1價有機基, R f1 are each independently a hydrogen atom, a hydroxyl group or a monovalent organic group,

k2分別獨立地為0至3的整數, k2 are independently integers from 0 to 3,

l2分別獨立地為0至3的整數, l2 are independently integers from 0 to 3,

m2分別獨立地為0至3的整數, m2 are independently integers from 0 to 3,

k2、l2及m2之合計於(CRd1 k2Re1 l2Rf1 m2)單元中為3, The total of k2, l2 and m2 in the (CR d1 k2 R e1 l2 R f1 m2 ) unit is 3,

Rg1及Rh1分別獨立地為-Z4-SiR11 n1R12 3-n1、-Z4-SiRa1 k1Rb1 l1Rc1 m1或-Z4-CRd1 k2Re1 l2Rf1 m2R g1 and R h1 are independently -Z 4 -SiR 11 n1 R 12 3-n1 , -Z 4 -SiR a1 k1 R b1 l1 R c1 m1 or -Z 4 -CR d1 k2 R e1 l2 R f1 m2 ,

Z4分別獨立地為單鍵或2價基, Z 4 is independently a single bond or a divalent base,

惟於式(S1)、(S2)、(S3)、(S4)及(S5)中,存在有至少1個與羥基或水解性基鍵結之Si原子。 However, in formulas (S1), (S2), (S3), (S4) and (S5), there is at least one Si atom bonded to a hydroxyl group or a hydrolyzable group.

[16]如上述[11]至[15]中任一項所述之表面處理劑,其中α1、β1及γ1為1,XA為2價基。 [16] The surface treatment agent according to any one of the above [11] to [15], wherein α1, β1 and γ1 are 1, and X A is a divalent group.

[17]如上述[11]至[16]中任一項所述之表面處理劑,其中XA為單鍵或以下述式所表示之2價基: [17] The surface treatment agent as described in any one of the above [11] to [16], wherein X A is a single bond or a divalent group represented by the following formula:

-(R51)p5-(X51)q5- -(R 51 ) p5 -(X 51 ) q5 -

式中: In the formula:

R51為單鍵、-(CH2)s5-或鄰、間或對伸苯基, R 51 is a single bond, -(CH 2 ) s5 - or o-, m- or p-phenylene group,

s5為1至20的整數, s5 is an integer from 1 to 20,

X51為-(X52)l5-, X 51 is -(X 52 ) l5 -,

X52分別獨立地為選自由-O-、-S-、鄰、間或對伸苯基、-C(O)O-、-Si(R53)2-、-(Si(R53)2O)m5-Si(R53)2-、-CONR54-、-O-CONR54-、-NR54-及-(CH2)n5-所組成之群組的基, X 52 is independently selected from -O-, -S-, o-, m- or p-phenylene, -C(O)O-, -Si(R 53 ) 2 -, -(Si(R 53 ) 2 O) m5 -The base of the group consisting of -Si(R 53 ) 2 -, -CONR 54 -, -O-CONR 54 -, -NR 54 - and -(CH 2 ) n5 -,

R53分別獨立地為苯基、C1-6烷基或C1-6烷氧基, R 53 is independently phenyl, C 1-6 alkyl or C 1-6 alkoxy,

R54分別獨立地為氫原子、苯基或C1-6烷基, R 54 is independently a hydrogen atom, a phenyl group or a C 1-6 alkyl group,

m5分別獨立地為1至100的整數, m5 are independently integers from 1 to 100,

n5分別獨立地為1至20的整數, n5 are independently integers from 1 to 20,

l5為1至10的整數, l5 is an integer from 1 to 10,

p5為0或1, p5 is 0 or 1,

q5為0或1, q5 is 0 or 1,

在此,p5及q5的至少一方為1,標註p5或q5並以括弧括起之各重複單元的存在順序為任意, Here, at least one of p5 and q5 is 1, and the order of existence of the repeating units marked with p5 or q5 and enclosed in parentheses is arbitrary,

右側鍵結至RSiThe right side is bonded to R Si .

[18]如上述[11]至[15]中任一項所述之表面處理劑,其中XA為以下述式所表示之基: [18] The surface treatment agent according to any one of the above [11] to [15], wherein X A is a group represented by the following formula:

Figure 112115596-A0202-12-0016-4
Figure 112115596-A0202-12-0016-4

式中,Xa為單鍵或2價基。 In the formula, X a is a single bond or a divalent base.

[19]如上述[10]至[18]中任一項所述之表面處理劑,其中相對於成分(A)與成分(B)之合計,前述成分(B)的含量為1至70質量%。 [19] The surface treatment agent according to any one of the above [10] to [18], wherein the content of the component (B) is 1 to 70 mass based on the total of the component (A) and the component (B). %.

[20]如上述[10]至[19]中任一項所述之表面處理劑,其中相對於成分(A)與成分(B)之合計,前述成分(B)的含量為1至40質量%。 [20] The surface treatment agent according to any one of the above [10] to [19], wherein the content of the component (B) is 1 to 40 mass based on the total of the component (A) and the component (B). %.

[21]如上述[10]至[20]中任一項所述之表面處理劑,其更含有選自含氟油、聚矽氧油、醇及觸媒之1種或多於1種的其他成分。 [21] The surface treatment agent as described in any one of the above [10] to [20], which further contains one or more types selected from the group consisting of fluorine-containing oil, polysilicone oil, alcohol and catalyst. Other ingredients.

[22]如上述[10]至[21]中任一項所述之表面處理劑,其更含有溶劑。 [22] The surface treatment agent according to any one of [10] to [21] above, which further contains a solvent.

[23]如上述[10]至[22]中任一項所述之表面處理劑,其係使用作為防污性塗佈劑或防水性塗佈劑。 [23] The surface treatment agent according to any one of the above [10] to [22], which is used as an antifouling coating agent or a waterproof coating agent.

[24]一種顆粒,係含有如上述[10]至[23]中任一項所述之表面處理劑。 [24] Particles containing the surface treatment agent described in any one of [10] to [23] above.

[25]一種物品,係包含:基材;以及於該基材上由如上述[10]至[24]中任一項所述之表面處理劑所形成之層。 [25] An article comprising: a base material; and a layer formed on the base material by the surface treatment agent according to any one of the above [10] to [24].

[26]如上述[25]所述之物品,其中前述基材為玻璃基材。 [26] The article according to the above [25], wherein the base material is a glass base material.

[27]如上述[25]所述之物品,其係光學構件。 [27] The article described in [25] above, which is an optical component.

根據本揭示,可提供一種能夠賦予具有更高的摩擦耐久性之表面處理層之表面處理劑。 According to the present disclosure, it is possible to provide a surface treatment agent capable of imparting a surface treatment layer with higher friction durability.

於使用在本說明書中之情形時,所謂「1價有機基」,意指含有碳之1價基。1價有機基並無特別限定,可為烴基或該衍生物。所謂烴基的衍生物,意指於烴基的末端或分子鏈中具有1個或多於1個的N、O、S、Si、醯胺、磺醯基、矽氧烷、羰基、羰氧基等之基。在僅表示為「有機基」之情形時,意指1價有機基。此外,所謂「2價有機基」,意指含有碳之2價基。該2價有機基可列舉例如從有機基中更使1個氫原子脫離後之2價基。3價以上的有機基亦相同,意指從有機基中使預定數的氫原子脫離後之基。 When used in this specification, the "monovalent organic group" means a monovalent group containing carbon. The monovalent organic group is not particularly limited and may be a hydrocarbon group or a derivative thereof. The so-called derivatives of hydrocarbon groups mean one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, carbonyloxy, etc. groups at the end of the hydrocarbon group or in the molecular chain. the foundation. When simply expressed as "organic group", it means a monovalent organic group. In addition, the "bivalent organic group" means a divalent group containing carbon. Examples of the divalent organic group include a divalent group obtained by detaching one more hydrogen atom from the organic group. The same applies to an organic group having a valence of 3 or more, and means a group obtained by detaching a predetermined number of hydrogen atoms from the organic group.

於使用在本說明書中之情形時,所謂「烴基」,意指含有碳及氫之基,且係從烴中使氫原子脫離後之基。該烴基並無特別限定,可列舉C1-20烴基,例如脂肪族烴基、芳香族烴基等。上述「脂肪族烴基」可為直鏈狀、分枝鏈狀及環狀中任一者,且可為飽和及不飽和中任一者。此外,烴基可含有1個或多於1個的環結構。烴基可經1個或多於1個的取代基所取代。 As used in this specification, "hydrocarbyl group" means a group containing carbon and hydrogen, and is a group obtained by removing a hydrogen atom from a hydrocarbon. The hydrocarbon group is not particularly limited, and examples thereof include C 1-20 hydrocarbon groups, such as aliphatic hydrocarbon groups, aromatic hydrocarbon groups, and the like. The above-mentioned "aliphatic hydrocarbon group" may be linear, branched, or cyclic, and may be saturated or unsaturated. In addition, the hydrocarbon group may contain one or more than one ring structure. The hydrocarbyl group may be substituted with 1 or more than 1 substituent.

於使用在本說明書中之情形時,「烴基」的取代基並無特別限定,可列舉例如選自下列1個或多於1個的基:鹵素原子;可經1個或多於1個的鹵素原子所取代之C1-6烷基、C2-6烯基、C2-6炔基、C3-10環烷 基、C3-10不飽和環烷基、5至10員的雜矽基、5至10員的不飽和雜矽基、C6-10芳基及5至10員的雜芳基。 When used in this specification, the substituent of the "hydrocarbyl group" is not particularly limited, and may include, for example, one or more groups selected from the following: halogen atom; C 1-6 alkyl, C 2-6 alkenyl, C 2-6 alkynyl, C 3-10 cycloalkyl, C 3-10 unsaturated cycloalkyl, 5 to 10 membered hetero groups substituted by halogen atoms Silicon group, 5 to 10-membered unsaturated heterosilyl group, C 6-10 aryl group and 5 to 10-membered heteroaryl group.

於本說明書中所謂「水解性基」,於使用在本說明書中之情形時,意指可接受水解反應之基,亦即意指可藉由水解反應從化合物的主骨架中脫離之基。水解性基的例子可列舉:-ORh1、-OCORh1、-O-N=CRh1 2、-NRh1 2、-NHRh1、-NCO、鹵素(此等式中,Rh1表示取代或非取代之碳數1至4的烷基)等,較佳為-ORh1(亦即烷氧基)。Rh1的例子包含:甲基、乙基、丙基、異丙基、正丁基、異丁基等非取代烷基;氯甲基等取代烷基。彼等當中,較佳為烷基,尤其是非取代烷基,尤佳為甲基或乙基。 The term "hydrolyzable group" used in this specification means a group that can undergo hydrolysis reaction, that is, a group that can be separated from the main skeleton of the compound through a hydrolysis reaction. Examples of hydrolyzable groups include: -OR h1 , -OCOR h1 , -ON=CR h1 2 , -NR h1 2 , -NHR h1 , -NCO, halogen (in this equation, R h1 represents substituted or unsubstituted Alkyl group having 1 to 4 carbon atoms), etc., preferably -OR h1 (that is, alkoxy group). Examples of R h1 include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl; and substituted alkyl groups such as chloromethyl. Among them, an alkyl group is preferred, particularly an unsubstituted alkyl group, and a methyl or ethyl group is particularly preferred.

(表面處理劑) (surface treatment agent)

本揭示之表面處理劑係含有:成分(A):含氟聚醚基之矽烷化合物、以及 The surface treatment agent of the present disclosure contains: component (A): fluorine-containing polyether-based silane compound, and

成分(B):以下列式(B1)或(B2)所表示含氟聚醚基之聚氧化烯化合物, Component (B): a fluoropolyether-based polyoxyalkylene compound represented by the following formula (B1) or (B2),

RFB1-XB-RB (B1) R FB1 -X B -R B (B1)

RB-XB-RFB2-XB-RB (B2) R B -X B -R FB2 -X B -R B (B2)

式中: In the formula:

RFB1為Rf1-RF-Oq-, R FB1 is Rf 1 -R F -O q -,

RFB2為-Rf2 p-RF-Oq-, R FB2 is -Rf 2 p -R F -O q -,

RF分別獨立地為2價氟聚醚基, R F are independently divalent fluoropolyether groups,

Rf1可經1個或多於1個的氟原子所取代之C1-16烷基, Rf 1 may be a C 1-16 alkyl group substituted by 1 or more than 1 fluorine atom,

Rf2可經1個或多於1個的氟原子所取代之C1-6伸烷基, Rf 2 may be a C 1-6 alkylene group substituted by 1 or more than 1 fluorine atom,

p為0或1, p is 0 or 1,

q分別獨立地為0或1, q is independently 0 or 1,

XB分別獨立地為單鍵或2價基, X B is independently a single bond or a divalent base,

RB分別獨立地為含氧化烯之基。 R B are each independently an alkylene oxide-containing group.

本揭示之表面處理劑係藉由含有作為成分(B)之含氟聚醚基之聚氧化烯化合物,可賦予具有優異摩擦耐久性之表面處理層。 The surface treatment agent disclosed in the present disclosure can provide a surface treatment layer with excellent friction durability by containing a polyoxyalkylene compound containing a fluorine-containing polyether group as component (B).

(含氟聚醚基之矽烷化合物) (Fluorinated polyether-based silane compound)

上述含氟聚醚基之矽烷化合物為含有氟聚醚基以及水解性矽烷基之化合物。 The above-mentioned fluoropolyether group-containing silane compound is a compound containing a fluoropolyether group and a hydrolyzable silane group.

於一樣態中,上述含氟聚醚基之矽烷化合物為以下述式(A1)或(A2)所表示之含氟聚醚基之矽烷化合物: In one aspect, the fluorine-containing polyether group-containing silane compound is a fluorine-containing polyether group-containing silane compound represented by the following formula (A1) or (A2):

RFA1 α1-XA-RSi β1 (A1) R FA1 α1 -X A -R Si β1 (A1)

RSi γ1-XA-RFA2-XA-RSi γ1 (A2) R Si γ1 -X A -R FA2 -X A -R Si γ1 (A2)

式中: In the formula:

RFA1為Rf1-RF-Oq-, R FA1 is Rf 1 -R F -O q -,

RFA2為-Rf2 p-RF-Oq-, R FA2 is -Rf 2 p -R F -O q -,

RF分別獨立地為2價氟聚醚基, R F are independently divalent fluoropolyether groups,

Rf1為可經1個或多於1個的氟原子所取代之C1-16烷基, Rf 1 is a C 1-16 alkyl group which may be substituted by 1 or more than 1 fluorine atom,

Rf2為可經1個或多於1個的氟原子所取代之C1-6伸烷基, Rf 2 is a C 1-6 alkylene group which may be substituted by 1 or more than 1 fluorine atom,

p為0或1, p is 0 or 1,

q分別獨立地為0或1, q is independently 0 or 1,

RSi分別獨立地為含有與羥基、水解性基、氫原子或1價基鍵結之Si原子的1價基, R Si is each independently a monovalent group containing a Si atom bonded to a hydroxyl group, a hydrolyzable group, a hydrogen atom or a monovalent group,

至少1個RSi為含有與羥基或水解性基鍵結之Si原子的1價基, At least one R Si is a univalent group containing a Si atom bonded to a hydroxyl group or a hydrolyzable group,

XA分別獨立地為單鍵或2至10價基, X A are each independently a single bond or a valence base of 2 to 10,

α1為1至9的整數, α1 is an integer from 1 to 9,

β1為1至9的整數, β1 is an integer from 1 to 9,

γ1分別獨立地為1至9的整數。 γ1 is each independently an integer from 1 to 9.

於式(A1)中,RFA1為Rf1-RF-Oq-。 In formula (A1), R FA1 is Rf 1 -R F -O q -.

於式(A2)中,RFA2為-Rf2 p-RF-Oq-。 In formula (A2), R FA2 is -Rf 2 p -R F -O q -.

於式(A1)及(A2)中,Rf1為可經1個或多於1個的氟原子所取代之C1-16烷基。 In formulas (A1) and (A2), Rf 1 is a C 1-16 alkyl group which may be substituted by 1 or more than 1 fluorine atom.

上述可經1個或多於1個的氟原子所取代之C1-16烷基中的「C1-16烷基」可為直鏈或分枝鏈,較佳為直鏈或分枝鏈的C1-6烷基,尤其是C1-3烷基,尤佳為直鏈的C1-6烷基,尤其是C1-3烷基。 The "C 1-16 alkyl group" in the above-mentioned C 1-16 alkyl group which may be substituted by one or more fluorine atoms may be a straight chain or a branched chain, preferably a straight chain or a branched chain. The C 1-6 alkyl group, especially the C 1-3 alkyl group, is preferably a linear C 1-6 alkyl group, especially the C 1-3 alkyl group.

Rf1較佳為經1個或多於1個的氟原子所取代之C1-16烷基,尤佳為CF2H-C1-15全氟伸烷基,更佳為C1-16全氟烷基。 Rf 1 is preferably a C 1-16 alkyl group substituted by one or more fluorine atoms, especially a CF 2 HC 1-15 perfluoroalkyl group, and more preferably a C 1-16 perfluoro group. alkyl.

上述C1-16全氟烷基可為直鏈或分枝鏈,較佳為直鏈或分枝鏈的C1-6全氟烷基,尤其是C1-3全氟烷基,尤佳為直鏈的C1-6全氟烷基,尤其是C1-3全氟烷基,具體而言為-CF3、-CF2CF3或-CF2CF2CF3The above-mentioned C 1-16 perfluoroalkyl group can be a straight chain or a branched chain, preferably a straight chain or branched chain C 1-6 perfluoroalkyl group, especially a C 1-3 perfluoroalkyl group, especially It is a linear C 1-6 perfluoroalkyl group, especially a C 1-3 perfluoroalkyl group, specifically -CF 3 , -CF 2 CF 3 or -CF 2 CF 2 CF 3 .

於式(A1)及(A2)中,Rf2為可經1個或多於1個的氟原子所取代之C1-6伸烷基。 In formulas (A1) and (A2), Rf 2 is a C 1-6 alkylene group which may be substituted by one or more than one fluorine atom.

上述可經1個或多於1個的氟原子所取代之C1-6伸烷基中的「C1-6伸烷基」可為直鏈或分枝鏈,較佳為直鏈或分枝鏈的C1-3伸烷基,尤佳為直鏈的C1-3伸烷基。 The "C 1-6 alkylene group" in the above-mentioned C 1-6 alkylene group which may be substituted by one or more fluorine atoms can be a straight chain or a branched chain, preferably a straight chain or a branched chain. The branched chain C 1-3 alkylene group is particularly preferably a linear C 1-3 alkylene group.

Rf2較佳為經1個或多於1個的氟原子所取代之C1-6伸烷基,尤佳為C1-6全氟伸烷基,更佳為C1-3全氟伸烷基。 Rf 2 is preferably a C 1-6 alkylene group substituted by one or more fluorine atoms, especially a C 1-6 perfluoroalkylene group, and more preferably a C 1-3 perfluoroalkylene group. alkyl.

上述C1-6全氟伸烷基可為直鏈或分枝鏈,較佳為直鏈或分枝鏈的C1-3全氟伸烷基,尤佳為直鏈的C1-3全氟伸烷基,具體而言為-CF2-、-CF2CF2-或-CF2CF2CF2-。 The above-mentioned C 1-6 perfluoroalkylene group can be a straight chain or a branched chain, preferably a straight chain or branched chain C 1-3 perfluoroalkylene group, especially a straight chain C 1-3 perfluoroalkylene group. The fluoroalkylene group is specifically -CF 2 -, -CF 2 CF 2 - or -CF 2 CF 2 CF 2 -.

於上述式中,p為0或1。於一樣態中,p為0。於其他樣態中,p為1。 In the above formula, p is 0 or 1. In a state, p is 0. In other modalities, p is 1.

於上述式中,q分別獨立地為0或1。於一樣態中,q為0。於其他樣態中,q為1。 In the above formula, q is independently 0 or 1. In one state, q is 0. In other modalities, q is 1.

於式(A1)及(A2)中,RF分別獨立地為2價氟聚醚基。 In formulas (A1) and (A2), R F is each independently a divalent fluoropolyether group.

RF較佳為以下列式所表示之基: R F is preferably a base represented by the following formula:

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3RFa 6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f -

式中: In the formula:

RFa分別獨立地為氫原子、氟原子或氯原子, R Fa are each independently a hydrogen atom, a fluorine atom or a chlorine atom,

a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的RFa為氫原子或氯原子之情形時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e and f are each independently an integer from 0 to 200. The sum of a, b, c, d, e and f is more than 1. Mark a, b, c, d, e or f The order of existence of each repeating unit enclosed in parentheses is arbitrary in the formula. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more. .

RFa較佳為氫原子或氟原子,尤佳為氟原子。惟於所有的RFa為氫原子或氯原子之情形時,a、b、c、e及f的至少1個為1以上。 R Fa is preferably a hydrogen atom or a fluorine atom, particularly preferably a fluorine atom. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more.

a、b、c、d、e及f較佳係分別獨立地為0至100的整數,尤佳為0至50的整數。 It is preferable that a, b, c, d, e and f are each independently an integer from 0 to 100, particularly preferably an integer from 0 to 50.

a、b、c、d、e及f之和較佳為5以上,尤佳為10以上,更佳為20以上,例如可為25以上或30以上。a、b、c、d、e及f之和較佳為200以下,尤佳為100以下,更佳為60以下,例如可為50以下或30以下。 The sum of a, b, c, d, e and f is preferably 5 or more, particularly 10 or more, more preferably 20 or more, for example, 25 or more or 30 or more. The sum of a, b, c, d, e and f is preferably 200 or less, especially 100 or less, more preferably 60 or less, for example, it can be 50 or less or 30 or less.

此等重複單元可為直鏈狀或分枝鏈狀,亦可含有環結構。例如,-(OC6F12)-可為-(OCF2CF2CF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2CF2CF2)-、-(OCF2CF(CF3)CF2CF2CF2)-、-(OCF2CF2CF(CF3)CF2CF2)-、-(OCF2CF2CF2CF(CF3)CF2)-、-(OCF2CF2CF2CF2CF(CF3))-等。-(OC5F10)-可為-(OCF2CF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2CF2)-、-(OCF2CF(CF3)CF2CF2)-、-(OCF2CF2CF(CF3)CF2)-、-(OCF2CF2CF2CF(CF3))-等。-(OC4F8)-可為-(OCF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-及-(OCF2CF(C2F5))-中任一者。-(OC3F6)-(亦即於上述式中,RFa為氟原子)可為-(OCF2CF2CF2)-、-(OCF2CF2CF2)-及-(OCF2CF(CF3))-中任一者。-(OC2F4)-可為-(OCF2CF2)-及-(OCF(CF3))-中任一者。 These repeating units may be linear or branched, and may also contain cyclic structures. For example, -(OC 6 F 12 )- can be -(OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 CF 2 CF 2 )-, -(OCF 2 CF 2 CF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF 2 CF 2 CF(CF 3 )CF 2 )- , -(OCF 2 CF 2 CF 2 CF 2 CF(CF 3 ))-etc. -(OC 5 F 10 )- can be -(OCF 2 CF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 CF 2 )-, -(OCF 2 CF(CF 3 ) CF 2 CF 2 )-, -(OCF 2 CF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF 2 CF(CF 3 ))-, etc. -(OC 4 F 8 )- can be -(OCF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 )- ,-(OCF 2 CF 2 CF(CF 3 ))-,-(OC(CF 3 ) 2 CF 2 )-,-(OCF 2 C(CF 3 ) 2 )-,-(OCF(CF 3 )CF( Any one of CF 3 ))-, -(OCF(C 2 F 5 )CF 2 )- and -(OCF 2 CF(C 2 F 5 ))-. -(OC 3 F 6 )- (that is, in the above formula, R Fa is a fluorine atom) can be -(OCF 2 CF 2 CF 2 )-, -(OCF 2 CF 2 CF 2 )- and -(OCF 2 CF(CF 3 )) - any of them. -(OC 2 F 4 )- may be any one of -(OCF 2 CF 2 )- and -(OCF(CF 3 ))-.

上述環結構可為下述三員環、四員環、五員環或六員環。 The above-mentioned ring structure may be a three-member ring, a four-member ring, a five-member ring or a six-member ring as described below.

Figure 112115596-A0202-12-0023-5
Figure 112115596-A0202-12-0023-5

式中,*表示鍵結位置。 In the formula, * represents the bonding position.

上述環結構較佳為四員環、五員環或六員環,尤佳可為四員環或六員環。 The above-mentioned ring structure is preferably a four-member ring, a five-member ring or a six-member ring, and particularly preferably a four-member ring or a six-member ring.

具有環結構之重複單元較佳可為下述單元。 The repeating unit having a ring structure is preferably the following unit.

Figure 112115596-A0202-12-0024-6
Figure 112115596-A0202-12-0024-6

式中,*表示鍵結位置。 In the formula, * represents the bonding position.

於一樣態中,上述重複單元為直鏈狀。藉由將上述重複單元構成為直鏈狀,可提升表面處理層的表面平滑性、摩擦耐久性等。 In one aspect, the repeating units are linear. By configuring the above repeating units into a linear chain, the surface smoothness, friction durability, etc. of the surface treatment layer can be improved.

於一樣態中,上述重複單元為分枝鏈狀。藉由將上述重複單元構成為分枝鏈狀,可增大表面處理層的動摩擦係數。 In one aspect, the repeating units are in the form of branched chains. By configuring the above repeating units in a branched chain shape, the dynamic friction coefficient of the surface treatment layer can be increased.

於一樣態中,RF分別獨立地為以下述式(f1)至(f6)中任一式所表示之基。 In one form, R F are each independently a base represented by any one of the following formulas (f1) to (f6).

-(OC3F6)d-(OC2F4)e- (f1) -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1)

式中,d為1至200的整數,e為0或1,較佳為0; In the formula, d is an integer from 1 to 200, e is 0 or 1, preferably 0;

-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f2) -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2)

式中,c及d分別獨立地為0至30的整數,e及f分別獨立地為1至200的整數, In the formula, c and d are each independently an integer from 0 to 30, e and f are each independently an integer from 1 to 200,

c、d、e及f之和為2以上, The sum of c, d, e and f is 2 or more,

標註c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; The order of existence of each repeating unit marked c, d, e or f and enclosed in parentheses is arbitrary in the formula;

-(R6-R7)g- (f3) -(R 6 -R 7 ) g - (f3)

式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups independently selected from these groups,

g為2至100的整數; g is an integer from 2 to 100;

-(R6-R7)g-Rr-(R7’-R6’)g’- (f4) -(R 6 -R 7 ) g -R r -(R 7' -R 6' ) g' - (f4)

式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups independently selected from these groups,

R6’為OCF2或OC2F4R 6' is OCF 2 or OC 2 F 4 ,

R7’為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是獨立地選自此等基之2或3個基的組合, R 7' is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups independently selected from these groups,

g為2至100的整數, g is an integer from 2 to 100,

g’為2至100的整數, g’ is an integer from 2 to 100,

Rr為下列式: R r is the following formula:

Figure 112115596-A0202-12-0026-7
Figure 112115596-A0202-12-0026-7

式中,*表示鍵結位置; In the formula, * represents the bonding position;

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f5) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5)

式中,e為1以上200以下的整數,a、b、c、d及f分別獨立地為0以上200以下的整數,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, e is an integer from 1 to 200, a, b, c, d and f are each independently an integer from 0 to 200. Label a, b, c, d, e or f and enclose it in brackets. The order of existence of each repeating unit in the formula is arbitrary;

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f6) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6)

式中,f為1以上200以下的整數,a、b、c、d及e分別獨立地為0以上200以下的整數,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。 In the formula, f is an integer from 1 to 200, a, b, c, d and e are each independently an integer from 0 to 200. Label a, b, c, d, e or f and enclose it in brackets. The order of existence of each repeating unit in the formula is arbitrary.

於上述式(f1)中,d較佳為5至200,尤佳為10至100,更佳為15至50,例如為25至35的整數。上述式(f1)中的OC3F6較佳為(OCF2CF2CF2)、(OCF(CF3)CF2)或(OCF2CF(CF3)),尤佳為(OCF2CF2CF2)。 於一樣態中,e為0。於其他樣態中,e為1。上述式(f1)中的(OC2F4)較佳為(OCF2CF2)或(OCF(CF3)),尤佳為(OCF2CF2)。 In the above formula (f1), d is preferably an integer of 5 to 200, particularly 10 to 100, more preferably 15 to 50, for example, 25 to 35. OC 3 F 6 in the above formula (f1) is preferably (OCF 2 CF 2 CF 2 ), (OCF (CF 3 )CF 2 ) or (OCF 2 CF (CF 3 )), especially (OCF 2 CF 2 CF 2 ). In one state, e is 0. In other modalities, e is 1. (OC 2 F 4 ) in the above formula (f1) is preferably (OCF 2 CF 2 ) or (OCF (CF 3 )), particularly preferably (OCF 2 CF 2 ).

於上述式(f2)中,e及f較佳係分別獨立地為5至200,尤佳為10至200的整數。此外,c、d、e及f之和較佳為5以上,尤佳為10以上,例如可為15以上或20以上。於一樣態中,上述式(f2)較佳為以-(OCF2CF2CF2CF2)c-(OCF2CF2CF2)d-(OCF2CF2)e-(OCF2)f-所表示之基。於其他樣態中,式(f2)可為以-(OC2F4)e-(OCF2)f-所表示之基。 In the above formula (f2), e and f are preferably each independently an integer of 5 to 200, particularly preferably an integer of 10 to 200. In addition, the sum of c, d, e and f is preferably 5 or more, particularly 10 or more, and may be 15 or more or 20 or more, for example. In one form, the above formula (f2) is preferably -(OCF 2 CF 2 CF 2 CF 2 ) c -(OCF 2 CF 2 CF 2 ) d -(OCF 2 CF 2 ) e -(OCF 2 ) f -The basis represented. In other aspects, formula (f2) may be a base represented by -(OC 2 F 4 ) e -(OCF 2 ) f -.

於上述式(f3)中,R6較佳為OC2F4。於上述(f3)中,R7較佳為選自OC2F4、OC3F6及OC4F8之基或是獨立地選自此等基之2或3個基的組合,尤佳為OC3F6或OC4F8。獨立地選自OC2F4、OC3F6及OC4F8之2或3個基的組合並無特別限定,可列舉例如:-OC2F4OC3F6-、-OC2F4OC4F8-、-OC3F6OC2F4-、-OC3F6OC3F6-、-OC3F6OC4F8-、-OC4F8OC4F8-、-OC4F8OC3F6-、-OC4F8OC2F4-、-OC2F4OC2F4OC3F6-、-OC2F4OC2F4OC4F8-、-OC2F4OC3F6OC2F4-、-OC2F4OC3F6OC3F6-、-OC2F4OC4F8OC2F4-、-OC3F6OC2F4OC2F4-、-OC3F6OC2F4OC3F6-、-OC3F6OC3F6OC2F4-及-OC4F8OC2F4OC2F4-等。於上述式(f3)中,g較佳為3以上,尤佳為5以上的整數。上述g較佳為50以下的整數。於上述式(f3)中,OC2F4、OC3F6、OC4F8、OC5F10及OC6F12可為直鏈及分枝鏈中任一種,較佳為直鏈。於此樣態中,上述式(f3)較佳為-(OC2F4-OC3F6)g-或-(OC2F4-OC4F8)g-。 In the above formula (f3), R 6 is preferably OC 2 F 4 . In the above (f3), R 7 is preferably a group selected from OC 2 F 4 , OC 3 F 6 and OC 4 F 8 or a combination of 2 or 3 groups independently selected from these groups, particularly preferably is OC 3 F 6 or OC 4 F 8 . The combination of 2 or 3 groups independently selected from OC 2 F 4 , OC 3 F 6 and OC 4 F 8 is not particularly limited, and examples thereof include: -OC 2 F 4 OC 3 F 6 -, -OC 2 F 4 OC 4 F 8 -, -OC 3 F 6 OC 2 F 4 -, -OC 3 F 6 OC 3 F 6 -, -OC 3 F 6 OC 4 F 8 -, -OC 4 F 8 OC 4 F 8 - , -OC 4 F 8 OC 3 F 6 -, -OC 4 F 8 OC 2 F 4 -, -OC 2 F 4 OC 2 F 4 OC 3 F 6 -, -OC 2 F 4 OC 2 F 4 OC 4 F 8 -, -OC 2 F 4 OC 3 F 6 OC 2 F 4 -, -OC 2 F 4 OC 3 F 6 OC 3 F 6 -, -OC 2 F 4 OC 4 F 8 OC 2 F 4 -, -OC 3 F 6 OC 2 F 4 OC 2 F 4 -, -OC 3 F 6 OC 2 F 4 OC 3 F 6 -, -OC 3 F 6 OC 3 F 6 OC 2 F 4 -and-OC 4 F 8 OC 2 F 4 OC 2 F 4 -etc. In the above formula (f3), g is preferably an integer of 3 or more, and particularly preferably 5 or more. The above g is preferably an integer of 50 or less. In the above formula (f3), OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 may be either linear or branched chains, and linear chains are preferred. In this aspect, the above formula (f3) is preferably -(OC 2 F 4 -OC 3 F 6 ) g - or -(OC 2 F 4 -OC 4 F 8 ) g -.

於上述式(f4)中,R6、R7及g係與上述式(f3)的記載為相同涵義且具有相同的樣態。R6’、R7’及g’分別與上述式(f3)所記載之R6、R7及g為相同涵義且具有相同的樣態。Rr較佳為下列式: In the above-mentioned formula (f4), R 6 , R 7 and g have the same meaning and the same aspect as those described in the above-mentioned formula (f3). R 6' , R 7' and g' respectively have the same meaning and form as R 6 , R 7 and g described in the above formula (f3). R r is preferably the following formula:

Figure 112115596-A0202-12-0028-8
Figure 112115596-A0202-12-0028-8

式中,*表示鍵結位置; In the formula, * represents the bonding position;

尤佳為下列式: Particularly preferred is the following formula:

Figure 112115596-A0202-12-0028-9
Figure 112115596-A0202-12-0028-9

式中,*表示鍵結位置。 In the formula, * represents the bonding position.

於上述式(f5)中,e較佳為1以上100以下,尤佳為5以上100以下的整數。a、b、c、d、e及f之和較佳為5以上,尤佳為10以上,例如為10以上100以下。 In the above formula (f5), e is preferably an integer of not less than 1 and not more than 100, particularly preferably not less than 5 and not more than 100. The sum of a, b, c, d, e and f is preferably 5 or more, particularly 10 or more, for example, 10 or more and 100 or less.

於上述式(f6)中,f較佳為1以上100以下,尤佳為5以上100以下的整數。a、b、c、d、e及f之和較佳為5以上,尤佳為10以上,例如為10以上100以下。 In the above formula (f6), f is preferably an integer of not less than 1 and not more than 100, and particularly preferably not less than 5 and not more than 100. The sum of a, b, c, d, e and f is preferably 5 or more, particularly 10 or more, for example, 10 or more and 100 or less.

於一樣態中,RF為以上述式(f1)所表示之基。 In one aspect, R F is a base represented by the above formula (f1).

於一樣態中,RF為以上述式(f2)所表示之基。 In one aspect, R F is a base represented by the above formula (f2).

於一樣態中,RF為以上述式(f3)或(f4)所表示之基。 In one aspect, R F is a base represented by the above formula (f3) or (f4).

於一樣態中,上述RF為以上述式(f3)所表示之基。 In one aspect, the above-mentioned R F is a base represented by the above-mentioned formula (f3).

於一樣態中,上述RF為以上述式(f4)所表示之基。 In one aspect, the above-mentioned R F is a base represented by the above-mentioned formula (f4).

於一樣態中,RF為以上述式(f5)所表示之基。 In one aspect, R F is a base represented by the above formula (f5).

於一樣態中,RF為以上述式(f6)所表示之基。 In one aspect, R F is a base represented by the above formula (f6).

於RF中,e相對於f之比(以下稱為「e/f比」)較佳為0.1至10,尤佳為0.2至5,更佳為0.2至2,再更佳為0.2至1.5,特佳為0.2至0.85。藉由將e/f比設成為10以下,由此化合物所得到之表面處理層的平滑性、摩擦耐久性及耐化學性(例如相對於人工汗之耐久性)更為提升。e/f比愈小,表面處理層的平滑性及摩擦耐久性愈提升。另一方面,藉由將e/f比設成為0.1以上,可進一步提高化合物的穩定性。e/f比愈大,化合物的穩定性愈提升。 In R F , the ratio of e to f (hereinafter referred to as "e/f ratio") is preferably 0.1 to 10, more preferably 0.2 to 5, more preferably 0.2 to 2, still more preferably 0.2 to 1.5 , the best value is 0.2 to 0.85. By setting the e/f ratio to 10 or less, the smoothness, friction durability, and chemical resistance (for example, durability against artificial sweat) of the surface treatment layer obtained from this compound are further improved. The smaller the e/f ratio, the smoother and frictional durability of the surface treatment layer are improved. On the other hand, by setting the e/f ratio to 0.1 or more, the stability of the compound can be further improved. The larger the e/f ratio, the more stable the compound is.

於一樣態中,從耐熱性之觀點來看,上述e/f比較佳為1.0以上,尤佳可為1.0至2.0。 In one aspect, from the viewpoint of heat resistance, the e/f ratio is preferably 1.0 or more, and more preferably 1.0 to 2.0.

於上述含氟聚醚基之矽烷化合物中,RFA1及RFB2部分的數量平均分子量並無特別限定,例如為500至30,000,較佳為1,500至30,000,尤佳為2,000至10,000。於本說明書中,RFA1及RFA2的數量平均分子量係設成為藉由19F-NMR所測定之值。 In the above-mentioned silane compound containing a fluorine-containing polyether group, the number average molecular weight of the R FA1 and R FB2 parts is not particularly limited, but is, for example, 500 to 30,000, preferably 1,500 to 30,000, and particularly preferably 2,000 to 10,000. In this specification, the number average molecular weight of R FA1 and R FA2 is the value measured by 19 F-NMR.

於式(A1)及(A2)中,RSi分別獨立地為含有與羥基、水解性基、氫原子或1價基鍵結之Si原子的1價基,至少1個RSi為含有與羥基或水解性基鍵結之Si原子的1價基。 In the formulas (A1) and (A2), R Si is each independently a monovalent group containing a Si atom bonded to a hydroxyl group, a hydrolyzable group, a hydrogen atom or a monovalent group, and at least one R Si is a monovalent group containing a hydroxyl group. Or the monovalent group of the Si atom bonded to the hydrolyzable group.

於較佳樣態中,RSi為含有與羥基或水解性基鍵結之Si原子的1價基,尤佳為含有與水解性基鍵結之Si原子的1價基。 In a preferred embodiment, R Si is a monovalent group containing a Si atom bonded to a hydroxyl group or a hydrolyzable group, and particularly preferably a monovalent group containing a Si atom bonded to a hydrolyzable group.

於較佳樣態中,RSi為以下述式(S1)、(S2)、(S3)、(S4)或(S5)所表示之基。 In a preferred embodiment, R Si is a group represented by the following formula (S1), (S2), (S3), (S4) or (S5).

Figure 112115596-A0202-12-0030-10
Figure 112115596-A0202-12-0030-10

- SiR11 n1R12 3-n1 (S2) - SiR 11 n1 R 12 3-n1 (S2)

- SiRa1 k1Rb1 l1Rc1 m1 (S3) - SiR a1 k1 R b1 l1 R c1 m1 (S3)

- CRd1 k2Re1 l2Rf1 m2 (S4) - CR d1 k2 R e1 l2 R f1 m2 (S4)

- NRg1Rh1 (S5) - NR g1 R h1 (S5)

上述式中,R11分別獨立地為羥基或水解性基。 In the above formula, R 11 is each independently a hydroxyl group or a hydrolyzable group.

R11較佳係分別獨立地為水解性基。 R 11 is preferably each independently a hydrolyzable group.

R11較佳係分別獨立地為-ORh1、-OCORh1、-O-N=CRh1、-NRh1 2、-NHRh1、-NCO或鹵素(於此等式中,Rh1表示取代或非取代的C1-4烷基),尤佳為-ORh1(亦即烷氧基)。Rh1可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等非取代烷基;氯甲基等取代烷基。該等當中,較佳為烷基,尤其是非取代烷基,尤佳為甲基或乙基。於一樣態中,Rh1為甲基。於其他樣態中,Rh1為乙基。 R 11 is preferably independently -OR h1 , -OCOR h1 , -ON=CR h1 , -NR h1 2 , -NHR h1 , -NCO or halogen (in this equation, R h1 represents substituted or unsubstituted C 1-4 alkyl), especially -OR h1 (that is, alkoxy). Examples of R h1 include: unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl and isobutyl; substituted alkyl groups such as chloromethyl. Among these, an alkyl group is preferred, particularly an unsubstituted alkyl group, and a methyl or ethyl group is particularly preferred. In one form, R h1 is methyl. In other forms, R h1 is ethyl.

上述式中,R12分別獨立地為氫原子或1價基。該1價基為排除上述氫原子、羥基及水解性基之1價基。 In the above formula, R 12 is each independently a hydrogen atom or a monovalent group. This univalent group is a univalent group excluding the above-mentioned hydrogen atom, hydroxyl group and hydrolyzable group.

上述1價基較佳為1價有機基。該1價有機基為排除上述水解性基之1價有機基。 The above-mentioned monovalent group is preferably a monovalent organic group. This monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.

於R12中,1價基較佳為C1-20烷基,尤佳為C1-6烷基,更佳為甲基。 In R 12 , the monovalent group is preferably a C 1-20 alkyl group, particularly preferably a C 1-6 alkyl group, and more preferably a methyl group.

上述式中,n1於每個(SiR11 n1R12 3-n1)單元中分別獨立地為0至3的整數。惟於RSi為以式(S1)或(S2)所表示之基之情形時,於式(A1)及式(A2)之末端的RSi部分(以下亦僅稱為式(A1)及式(A2)的「末端部分」)中,存在有至少1個n1為1至3之(SiR11 n1R12 3-n1)單元。亦即,於該末端部分中,所有的n1不會同時為0。換言之,於式(A1)及式(A2)的末端部分中,存在有至少1個與羥基或水解性基鍵結之Si原子。 In the above formula, n1 is an integer from 0 to 3 independently in each (SiR 11 n1 R 12 3-n1 ) unit. However, when R Si is a base represented by formula (S1) or (S2), the R Si portion at the end of formula (A1) and formula (A2) (hereinafter also only referred to as formula (A1) and formula (A1)) In the "terminal part" of (A2)), there is at least one (SiR 11 n1 R 12 3-n1 ) unit in which n1 is 1 to 3. That is, in this terminal part, all n1 will not be 0 at the same time. In other words, at least one Si atom bonded to a hydroxyl group or a hydrolyzable group exists in the terminal portion of formula (A1) and formula (A2).

n1於每個(SiR11 n1R12 3-n1)單元中,較佳係分別獨立地為1至3的整數,尤佳為2或3,更佳為3。 n1 in each (SiR 11 n1 R 12 3-n1 ) unit is preferably independently an integer of 1 to 3, more preferably 2 or 3, more preferably 3.

上述式中,X11分別獨立地為單鍵或2價基。該2價基較佳為氧原子、硫原子、NH、CO或2價有機基。2價基較佳為2價有機基。該2價有機基較佳為-R28-Ox-R29-(式中,R28及R29分別獨立地為單鍵或C1-20伸烷基,x為0或1)。該C1-20伸烷基可為直鏈或分枝鏈,較佳為直鏈。該C1-20伸烷基較佳為C1-10伸烷基,尤佳為C1-6伸烷基,更佳為C1-3伸烷基。 In the above formula, X 11 is each independently a single bond or a divalent group. The divalent group is preferably an oxygen atom, a sulfur atom, NH, CO or a divalent organic group. The divalent group is preferably a divalent organic group. The divalent organic group is preferably -R 28 -O x -R 29 - (in the formula, R 28 and R 29 are each independently a single bond or a C 1-20 alkylene group, and x is 0 or 1). The C 1-20 alkylene group can be a straight chain or a branched chain, preferably a straight chain. The C 1-20 alkylene group is preferably a C 1-10 alkylene group, particularly preferably a C 1-6 alkylene group, and more preferably a C 1-3 alkylene group.

於一樣態中,X11分別獨立地為-C1-6伸烷基-O-C1-6伸烷基-或-O-C1-6伸烷基-。X11的右側鍵結至Si。 In one aspect, X 11 is each independently -C 1-6 alkylene-OC 1-6 alkylene- or -OC 1-6 alkylene-. The right side of X 11 is bonded to Si.

於較佳樣態中,X11分別獨立地為單鍵或直鏈的C1-6伸烷基,較佳為單鍵或直鏈的C1-3伸烷基,尤佳為單鍵或直鏈的C1-2伸烷基,更佳為直鏈的C1-2伸烷基。 In a preferred embodiment , A linear C 1-2 alkylene group, more preferably a linear C 1-2 alkylene group.

上述式中,R13分別獨立地為氫原子或1價有機基。該1價有機基較佳為C1-20烷基。該C1-20烷基可為直鏈或分枝鏈,較佳為直鏈。 In the above formula, R 13 is each independently a hydrogen atom or a monovalent organic group. The monovalent organic group is preferably a C 1-20 alkyl group. The C 1-20 alkyl group can be a straight chain or a branched chain, preferably a straight chain.

於較佳樣態中,R13分別獨立地為氫原子或直鏈的C1-6烷基,較佳為氫原子或直鏈的C1-3烷基,較佳為氫原子或甲基。 In a preferred embodiment, R 13 is independently a hydrogen atom or a linear C 1-6 alkyl group, preferably a hydrogen atom or a linear C 1-3 alkyl group, preferably a hydrogen atom or a methyl group. .

上述式中,t分別獨立地為2以上的整數。 In the above formula, t is each independently an integer of 2 or more.

t較佳係分別獨立地為2至10的整數,尤佳為2至6的整數。 It is preferable that t is an integer of 2 to 10 independently, and it is especially preferable that it is an integer of 2 to 6.

上述式中,R14分別獨立地為氫原子、鹵素原子或-X11-SiR11 n1R12 3-n1。該鹵素原子較佳為碘原子、氯原子或氟原子,尤佳為氟原子。於較佳樣態中,R14為氫原子。 In the above formula, R 14 is each independently a hydrogen atom, a halogen atom or -X 11 -SiR 11 n1 R 12 3-n1 . The halogen atom is preferably an iodine atom, a chlorine atom or a fluorine atom, and is particularly preferably a fluorine atom. In a preferred embodiment, R 14 is a hydrogen atom.

上述式中,R15於每次出現時分別獨立地為單鍵、氧原子、碳數1至6的伸烷基或碳數1至6的伸烷氧基。伸烷氧基中,伸烷基係鍵結至具有R13之碳原子。 In the above formula, each time R 15 appears, it is independently a single bond, an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or an alkyleneoxy group having 1 to 6 carbon atoms. In the alkyleneoxy group, the alkylene group is bonded to the carbon atom having R 13 .

於一樣態中,R15於每次出現時分別獨立地為氧原子、碳數1至6的伸烷基或碳數1至6的伸烷氧基。 In one aspect, each occurrence of R 15 is independently an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or an alkyleneoxy group having 1 to 6 carbon atoms.

於較佳樣態中,R15為單鍵。 In a preferred form, R 15 is a single bond.

於一樣態中,式(S1)為下述式(S1-a)。 In one aspect, formula (S1) is the following formula (S1-a).

Figure 112115596-A0202-12-0032-11
Figure 112115596-A0202-12-0032-11

式中, In the formula,

R11、R12、R13、X11及n1與上述式(S1)的記載為相同涵義, R 11 , R 12 , R 13 , X 11 and n1 have the same meaning as in the above formula (S1),

t1及t2分別獨立地為0以上的整數,較佳為1以上的整數,尤佳為1至10的整數,更佳為2至10的整數,例如為1至5的整數或2至5的整數,t1及t2之合計為2以上, t1 and t2 are each independently an integer above 0, preferably an integer above 1, especially an integer from 1 to 10, more preferably an integer from 2 to 10, for example, an integer from 1 to 5 or an integer from 2 to 5. Integer, the total of t1 and t2 is 2 or more,

標註t1及t2並以括弧括起之各重複單元的存在順序於式中為任意。 The order of existence of the repeating units marked t1 and t2 and enclosed in parentheses is arbitrary in the formula.

於較佳樣態中,式(S1)為下述式(S1-b)。 In a preferred aspect, formula (S1) is the following formula (S1-b).

Figure 112115596-A0202-12-0033-12
Figure 112115596-A0202-12-0033-12

式中,R11、R12、R13、X11、n1及t與上述式(S1)的記載為相同涵義。 In the formula, R 11 , R 12 , R 13 , X 11 , n1 and t have the same meanings as in the above formula (S1).

上述式中,Ra1分別獨立地為-Z1-SiR21 p1R22 q1R23 r1In the above formula, R a1 is each independently -Z 1 -SiR 21 p1 R 22 q1 R 23 r1 .

Z1分別獨立地為2價基。下列以Z1所記載之結構的右側鍵結至(SiR21 p1R22 q1R23 r1)。 Z 1 are each independently a divalent base. The right side of the structure described below as Z 1 is bonded to (SiR 21 p1 R 22 q1 R 23 r1 ).

上述2價基較佳為氧原子、硫原子、NH、CO或2價有機基,尤佳為氧原子或2價有機基。 The above-mentioned divalent group is preferably an oxygen atom, a sulfur atom, NH, CO or a divalent organic group, and particularly preferably an oxygen atom or a divalent organic group.

於較佳樣態中,Z1為2價有機基。 In a preferred embodiment, Z 1 is a divalent organic group.

於較佳樣態中,Z1係不含有與Z1所鍵結之Si原子形成矽氧烷鍵者。於式(S3)中,(Si-Z1-Si)較佳係不含矽氧烷鍵。 In a preferred embodiment, Z 1 does not contain a siloxane bond with the Si atom to which Z 1 is bonded. In formula (S3), (Si-Z 1 -Si) preferably does not contain siloxane bonds.

上述Z1較佳為C1-6伸烷基、-(CH2)z1-O-(CH2)z2-(式中,z1為0至6的整數,例如為1至6的整數,z2為0至6的整數,例如為1至6的整數)或-(CH2)z3-伸苯基-(CH2)z4-(式中,z3為0至6的整數,例如為1至6的整數,z4為0至6的整數,例如為1至6的整數)。該C1-6伸烷基可為直鏈或分枝鏈,較佳為直鏈。此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基之1個或多於1個的取代基所取代,較佳為非取代。 The above Z 1 is preferably a C 1-6 alkylene group, -(CH 2 ) z1 -O-(CH 2 ) z2 -(in the formula, z1 is an integer from 0 to 6, for example, it is an integer from 1 to 6, z2 is an integer from 0 to 6, for example, an integer from 1 to 6) or -(CH 2 ) z3 -phenylene-(CH 2 ) z4 -(where z3 is an integer from 0 to 6, for example, 1 to 6 an integer, z4 is an integer from 0 to 6, for example, an integer from 1 to 6). The C 1-6 alkylene group can be a straight chain or a branched chain, preferably a straight chain. These groups may be substituted by one or more substituents selected from the group consisting of fluorine atom, C 1-6 alkyl group, C 2-6 alkenyl group and C 2-6 alkynyl group, preferably unsubstituted .

於較佳樣態中,Z1為C1-6伸烷基或-(CH2)z3-伸苯基-(CH2)z4-,較佳為-伸苯基-(CH2)z4-。於Z1為該基之情形時,耐光性,尤其是耐紫外線性可進一步提高。 In a preferred embodiment, Z 1 is C 1-6 alkylene group or -(CH 2 ) z3 -phenylene group -(CH 2 ) z4 -, preferably -phenylene group -(CH 2 ) z4 - . When Z 1 is the base, the light resistance, especially the ultraviolet resistance, can be further improved.

於其他較佳樣態中,上述Z1為C1-3伸烷基。於一樣態中,Z1可為-CH2CH2CH2-。於其他樣態中,Z1可為-CH2CH2-。 In other preferred embodiments, the above-mentioned Z 1 is a C 1-3 alkylene group. In one aspect, Z 1 can be -CH 2 CH 2 CH 2 -. In other aspects, Z 1 can be -CH 2 CH 2 -.

R21分別獨立地為-Z1’-SiR21’ p1’R22’ q1’R23’ r1’R 21 is each independently -Z 1' -SiR 21' p1' R 22' q1' R 23' r1' .

上述Z1’分別獨立地為2價基。下列以Z1’所記載之結構的右側鍵結至(SiR21’ p1’R22’ q1’R23’ r1’)。 The above-mentioned Z 1' are each independently a divalent base. The right side of the structure described below with Z 1' is bonded to (SiR 21' p1' R 22' q1' R 23' r1' ).

上述2價基較佳為氧原子、硫原子、NH、CO或2價有機基,尤佳為氧原子或2價有機基。 The above-mentioned divalent group is preferably an oxygen atom, a sulfur atom, NH, CO or a divalent organic group, and particularly preferably an oxygen atom or a divalent organic group.

於較佳樣態中,Z1’為2價有機基。 In a preferred embodiment, Z 1' is a divalent organic group.

於較佳樣態中,Z1’係不含有與Z1’所鍵結之Si原子形成矽氧烷鍵者。於式(S3)中,(Si-Z1’-Si)較佳係不含矽氧烷鍵。 In a preferred embodiment, Z 1' does not contain a siloxane bond with the Si atom to which Z 1' is bonded. In formula (S3), (Si-Z 1' -Si) preferably does not contain siloxane bonds.

上述Z1’較佳為C1-6伸烷基、-(CH2)z1’-O-(CH2)z2’-(式中,z1’為0至6的整數,例如為1至6的整數,z2’為0至6的整數,例如為1至6的整數)或-(CH2)z3’-伸苯基-(CH2)z4’-(式中,z3’為0至6的整數,例如為1至6的整數,z4’為0至6的整數,例如為1至6的整數)。該C1-6伸烷基可為直鏈或分枝鏈,較佳為直鏈。此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基之1個或多於1個的取代基所取代,較佳為非取代。 The above Z 1' is preferably a C 1-6 alkylene group, -(CH 2 ) z1' -O-(CH 2 ) z2' -(in the formula, z1' is an integer from 0 to 6, for example, 1 to 6 an integer, z2' is an integer from 0 to 6, for example, an integer from 1 to 6) or -(CH 2 ) z3' -phenyl-(CH 2 ) z4' -(in the formula, z3' is 0 to 6 is an integer, for example, an integer from 1 to 6, z4' is an integer from 0 to 6, for example, an integer from 1 to 6). The C 1-6 alkylene group can be a straight chain or a branched chain, preferably a straight chain. These groups may be substituted by one or more substituents selected from the group consisting of fluorine atom, C 1-6 alkyl group, C 2-6 alkenyl group and C 2-6 alkynyl group, preferably unsubstituted .

於較佳樣態中,Z1’為C1-6伸烷基或-(CH2)z3’-伸苯基-(CH2)z4’-,較佳為-伸苯基-(CH2)z4’-。於Z1’為該基之情形時,耐光性,尤其是耐紫外線性可進一步提高。 In a preferred embodiment, Z 1' is C 1-6 alkylene or -(CH 2 ) z3' -phenylene-(CH 2 ) z4' -, preferably -phenylene-(CH 2 ) z4' -. When Z 1' is the base, the light resistance, especially the ultraviolet resistance, can be further improved.

於其他較佳樣態中,上述Z1’為C1-3伸烷基。於一樣態中,Z1’可為-CH2CH2CH2-。於其他樣態中,Z1’可為-CH2CH2-。 In other preferred embodiments, the above-mentioned Z 1' is a C 1-3 alkylene group. In one aspect, Z 1' can be -CH 2 CH 2 CH 2 -. In other aspects, Z 1' can be -CH 2 CH 2 -.

R21’分別獨立地為-Z1”-SiR22” q1”R23” r1”R 21' are independently -Z 1" -SiR 22" q1" R 23" r1" .

上述Z1”分別獨立地為2價基。下列以Z1”所記載之結構的右側鍵結至(SiR22” q1”R23” r1”)。 The above-mentioned Z 1″ are each independently a divalent group. The following is bonded to (SiR 22″ q1″ R 23″ r1″ ) from the right side of the structure described by Z 1″ .

上述2價基較佳為氧原子、硫原子、NH、CO或2價有機基,尤佳為氧原子或2價有機基。 The above-mentioned divalent group is preferably an oxygen atom, a sulfur atom, NH, CO or a divalent organic group, and particularly preferably an oxygen atom or a divalent organic group.

於較佳樣態中,Z1”為2價有機基。 In a preferred embodiment, Z 1″ is a divalent organic radical.

於較佳樣態中,Z1”係不含有與Z1"所鍵結之Si原子形成矽氧烷鍵者。於式(S3)中,(Si-Z1”-Si)較佳係不含矽氧烷鍵。 In a preferred embodiment, Z 1″ does not contain a siloxane bond with the Si atom to which Z 1″ is bonded. In formula (S3), (Si-Z 1″ -Si) preferably does not contain siloxane bonds.

上述Z1”較佳為C1-6伸烷基、-(CH2)z1”-O-(CH2)z2”-(式中,z1”為0至6的整數,例如為1至6的整數,z2”為0至6的整數,例如為1至6的整數)或-(CH2)z3”-伸苯基-(CH2)z4”-(式中,z3”為0至6的整數,例如為1至6的整數,z4”為0至6的整數,例如為1至6的整數)。該C1-6伸烷基可為直鏈或分枝鏈,較佳為直鏈。此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基之1個或多於1個的取代基所取代,較佳為非取代。 The above Z 1” is preferably a C 1-6 alkylene group, -(CH 2 ) z1” -O-(CH 2 ) z2” - (in the formula, z1” is an integer from 0 to 6, for example, 1 to 6 an integer, z2″ is an integer from 0 to 6, for example, an integer from 1 to 6) or -(CH 2 ) z3″ -phenyl-(CH 2 ) z4″ -(where z3″ is 0 to 6 is an integer, such as an integer from 1 to 6, z4″ is an integer from 0 to 6, such as an integer from 1 to 6). The C 1-6 alkylene group can be a straight chain or a branched chain, preferably straight chain Chain. These groups can be substituted by one or more substituents selected from, for example, fluorine atom, C 1-6 alkyl, C 2-6 alkenyl and C 2-6 alkynyl, preferably Non-replacement.

於較佳樣態中,Z1”為C1-6伸烷基或-(CH2)z3”-伸苯基-(CH2)z4”-,較佳為-伸苯基-(CH2)z4”-。於Z1”為該基之情形時,耐光性,尤其是耐紫外線性可進一步提高。 In a preferred embodiment, Z 1” is C 1-6 alkylene or -(CH 2 ) z3” -phenylene-(CH 2 ) z4” -, preferably -phenylene-(CH 2 ) z4” -. When Z 1″ is the base, the light resistance, especially the ultraviolet resistance, can be further improved.

於其他較佳樣態中,上述Z1”為C1-3伸烷基。於一樣態中,Z1”可為-CH2CH2CH2-。於其他樣態中,Z1”可為-CH2CH2-。 In other preferred embodiments, the above-mentioned Z 1″ is a C 1-3 alkylene group. In one embodiment, Z 1″ can be -CH 2 CH 2 CH 2 -. In other aspects, Z 1″ can be -CH 2 CH 2 -.

R22”分別獨立地為羥基或水解性基。 R 22″ is each independently a hydroxyl group or a hydrolyzable group.

R22”較佳係分別獨立地為水解性基。 R 22″ is preferably each independently a hydrolyzable group.

R22”較佳係分別獨立地為-ORh1、-OCORh1、-O-N=CRh1 2、-NRh1 2、-NHRh1、-NCO或鹵素(此等式中,Rh1表示取代或非取代的C1-4烷基),尤佳為-ORh1(亦即烷氧基)。Rh1可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等非取代烷基;氯甲基等取代烷基。該等當中,較佳為烷基,尤其是非取代烷基,尤佳為甲基或乙基。於一樣態中,Rh1為甲基,於其他樣態中,Rh1為乙基。 R 22″ is preferably independently -OR h1 , -OCOR h1 , -ON=CR h1 2 , -NR h1 2 , -NHR h1 , -NCO or halogen (in this equation, R h1 represents substituted or unsubstituted Substituted C 1-4 alkyl), especially -OR h1 (i.e. alkoxy). Examples of R h1 include: methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, etc. Unsubstituted alkyl; substituted alkyl such as chloromethyl. Among these, alkyl is preferred, especially unsubstituted alkyl, and methyl or ethyl is particularly preferred. In one form, R h1 is methyl, in In other forms, R h1 is ethyl.

R23”分別獨立地為氫原子或1價有機基。該1價有機基為排除上述水解性基之1價有機基。 R 23″ is each independently a hydrogen atom or a monovalent organic group. The monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.

於一樣態中,1價有機基為C1-20烷基,尤佳為C1-6烷基,更佳為甲基。 In one aspect, the monovalent organic group is a C 1-20 alkyl group, preferably a C 1-6 alkyl group, and more preferably a methyl group.

q1”分別獨立地為0至3的整數,上述r1”分別獨立地為0至3的整數。q1”與r1”之合計於(SiR22” q1”R23” r1”)單元中為3。 q1″ are each independently an integer from 0 to 3, and the above r1″ are each independently an integer from 0 to 3. The total of q1” and r1” in the unit (SiR 22” q1” R 23” r1” ) is 3.

上述q1”於每個(SiR22” q1”R23” r1”)單元中較佳係分別獨立地為1至3的整數,尤佳為2至3,更佳為3。 The above q1" in each (SiR 22" q1" R 23" r1" ) unit is preferably independently an integer of 1 to 3, more preferably 2 to 3, more preferably 3.

R22’分別獨立地為羥基或水解性基。 R 22' is each independently a hydroxyl group or a hydrolyzable group.

R22’較佳係分別獨立地為水解性基。 R 22' is preferably each independently a hydrolyzable group.

R22’較佳係分別獨立地為-ORh1、-OCORh1、-O-N=CRh1 2、-NRh1 2、-NHRh1、-NCO或鹵素(此等式中,Rh1表示取代或非取代的C1-4烷基),尤佳為-ORh1(亦即烷氧基)。Rh1可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等非取代烷基;氯甲基等取代烷基。該等當中,較佳為烷 基,尤其是非取代烷基,尤佳為甲基或乙基。於一樣態中,Rh1為甲基,於其他樣態中,Rh1為乙基。 R 22' is preferably independently -OR h1 , -OCOR h1 , -ON=CR h1 2 , -NR h1 2 , -NHR h1 , -NCO or halogen (in this equation, R h1 represents substituted or unsubstituted Substituted C 1-4 alkyl), especially -OR h1 (that is, alkoxy). Examples of R h1 include: unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl and isobutyl; substituted alkyl groups such as chloromethyl. Among these, an alkyl group is preferred, particularly an unsubstituted alkyl group, and a methyl or ethyl group is particularly preferred. In one aspect, R h1 is methyl, and in the other aspect, R h1 is ethyl.

R23’分別獨立地為氫原子或1價有機基。該1價有機基為排除上述水解性基之1價有機基。 R 23' is each independently a hydrogen atom or a monovalent organic group. This monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.

於一樣態中,1價有機基為C1-20烷基,尤佳為C1-6烷基,更佳為甲基。 In one aspect, the monovalent organic group is a C 1-20 alkyl group, preferably a C 1-6 alkyl group, and more preferably a methyl group.

上述p1’分別獨立地為0至3的整數,q1’分別獨立地為0至3的整數,r1’分別獨立地為0至3的整數。P’、q1’與r1’之合計於每個(SiR21’ p1’R22’ q1’R23’ r1’)單元中為3。 The above-mentioned p1' are each independently an integer from 0 to 3, q1' are each independently an integer from 0 to 3, and r1' are each independently an integer from 0 to 3. The sum of P', q1' and r1' is 3 in each (SiR 21' p1' R 22' q1' R 23' r1' ) unit.

於一樣態中,p1’為0。 In one state, p1’ is 0.

於一樣態中,p1’於每個(SiR21’ p1’R22’ q1’R23’ r1’)單元中分別獨立地為1至3的整數,可為2至3的整數或是3。於較佳樣態中,p1’為3。 In one form, p1' in each (SiR 21' p1' R 22' q1' R 23' r1' ) unit is independently an integer from 1 to 3, and may be an integer from 2 to 3 or 3. In the preferred form, p1' is 3.

於一樣態中,q1’於每個(SiR21’ p1’R22’ q1’R23’ r1’)單元中分別獨立地為1至3的整數,較佳為2或3,尤佳為3。 In one form, q1' in each (SiR 21' p1' R 22' q1' R 23' r1' ) unit is independently an integer from 1 to 3, preferably 2 or 3, especially 3 .

於一樣態中,p1’為0,q1’於每個(SiR21’ p1’R22’ q1’R23’ r1’)單元中分別獨立地為1至3的整數,較佳為2或3,更佳為3。 In a state, p1' is 0, and q1' in each (SiR 21' p1' R 22' q1' R 23' r1' ) unit is independently an integer from 1 to 3, preferably 2 or 3 , preferably 3.

R22分別獨立地為羥基或水解性基。 R 22 is each independently a hydroxyl group or a hydrolyzable group.

R22較佳係分別獨立地為水解性基。 R 22 is preferably each independently a hydrolyzable group.

R22’較佳係分別獨立地為-ORh1、-OCORh1、-O-N=CRh1 2、-NRh1 2、-NHRh1、-NCO或鹵素(此等式中,Rh1表示取代或非取代的C1-4烷基),尤佳為-ORh1(亦即烷氧基)。Rh1可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等非取代烷基;氯甲基等取代烷基。該等當中,較佳為烷 基,尤其是非取代烷基,尤佳為甲基或乙基。於一樣態中,Rh1為甲基,於其他樣態中,Rh1為乙基。 R 22' is preferably independently -OR h1 , -OCOR h1 , -ON=CR h1 2 , -NR h1 2 , -NHR h1 , -NCO or halogen (in this equation, R h1 represents substituted or unsubstituted Substituted C 1-4 alkyl), especially -OR h1 (that is, alkoxy). Examples of R h1 include: unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl and isobutyl; substituted alkyl groups such as chloromethyl. Among these, an alkyl group is preferred, particularly an unsubstituted alkyl group, and a methyl or ethyl group is particularly preferred. In one aspect, R h1 is methyl, and in the other aspect, R h1 is ethyl.

R23分別獨立地為氫原子或1價有機基。該1價有機基為排除上述水解性基之1價有機基。 R 23 is each independently a hydrogen atom or a monovalent organic group. This monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.

於一樣態中,1價有機基為C1-20烷基,尤佳為C1-6烷基,更佳為甲基。 In one aspect, the monovalent organic group is a C 1-20 alkyl group, preferably a C 1-6 alkyl group, and more preferably a methyl group.

上述p1分別獨立地為0至3的整數,q1分別獨立地為0至3的整數,r分別獨立地為0至3的整數。p1、q1與r1之合計於(SiR21 p1R22 q1R23 r1)單元中為3。 The above-mentioned p1 are each independently an integer from 0 to 3, q1 are each independently an integer from 0 to 3, and r are each independently an integer from 0 to 3. The total of p1, q1 and r1 is 3 in the (SiR 21 p1 R 22 q1 R 23 r1 ) unit.

於一樣態中,p1為0。 In one state, p1 is 0.

於一樣態中,p1於每個(SiR21 p1R22 q1R23 r1)單元中分別獨立地為1至3的整數、2至3的整數或是3。於較佳樣態中,p1為3。 In one state, p1 is independently an integer from 1 to 3, an integer from 2 to 3, or 3 in each (SiR 21 p1 R 22 q1 R 23 r1 ) unit. In the preferred configuration, p1 is 3.

於一樣態中,q1於每個(SiR21 p1R22 q1R23 r1)單元中分別獨立地為1至3的整數,較佳為2或3,尤佳為3。 In one aspect, q1 in each (SiR 21 p1 R 22 q1 R 23 r1 ) unit is independently an integer from 1 to 3, preferably 2 or 3, particularly preferably 3.

於一樣態中,p1為0,q1於每個(SiR21 p1R22 q1R23 r1)單元中分別獨立地為1至3的整數,較佳為2或3,更佳為3。 In one state, p1 is 0, and q1 in each (SiR 21 p1 R 22 q1 R 23 r1 ) unit is independently an integer from 1 to 3, preferably 2 or 3, more preferably 3.

上述式中,Rb1分別獨立地為羥基或水解性基。 In the above formula, R b1 is each independently a hydroxyl group or a hydrolyzable group.

Rb1較佳係分別獨立地為水解性基。 R b1 is preferably each independently a hydrolyzable group.

Rb1較佳係分別獨立地為-ORh1、-OCORh1、-O-N=CRh1 2、-NRh1 2、-NHRh1、-NCO或鹵素(此等式中,Rh1表示取代或非取代的C1-4烷基),尤佳為-ORh1(亦即烷氧基)。Rh1可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等非取代烷基;氯甲基等取代烷基。該等當中,較佳為烷 基,尤其是非取代烷基,尤佳為甲基或乙基。於一樣態中,Rh1為甲基,於其他樣態中,Rh1為乙基。 R b1 is preferably independently -OR h1 , -OCOR h1 , -ON=CR h1 2 , -NR h1 2 , -NHR h1 , -NCO or halogen (in this equation, R h1 represents substituted or unsubstituted C 1-4 alkyl), especially -OR h1 (that is, alkoxy). Examples of R h1 include: unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl and isobutyl; substituted alkyl groups such as chloromethyl. Among these, an alkyl group is preferred, particularly an unsubstituted alkyl group, and a methyl or ethyl group is particularly preferred. In one aspect, R h1 is methyl, and in the other aspect, R h1 is ethyl.

上述式中,Rc1分別獨立地為氫原子或1價有機基。該1價有機基為排除上述水解性基之1價有機基。 In the above formula, R c1 is each independently a hydrogen atom or a monovalent organic group. This monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.

於一樣態中,1價有機基為C1-20烷基,尤佳為C1-6烷基,更佳為甲基。 In one aspect, the monovalent organic group is a C 1-20 alkyl group, preferably a C 1-6 alkyl group, and more preferably a methyl group.

上述k1分別獨立地為0至3的整數,l1分別獨立地為0至3的整數,m1分別獨立地為0至3的整數。k1、l1與m1之合計於每個(SiRa1 k1Rb1 l1Rc1 m1)單元中為3。 The above k1 are each independently an integer from 0 to 3, l1 is each independently an integer from 0 to 3, and m1 is each independently an integer from 0 to 3. The sum of k1, l1 and m1 is 3 in each (SiR a1 k1 R b1 l1 R c1 m1 ) unit.

於一樣態中,k1於每個(SiRa1 k1Rb1 l1Rc1 m1)單元中分別獨立地為1至3的整數,較佳為2或3,尤佳為3。於較佳樣態中,k1為3。 In a state, k1 in each (SiR a1 k1 R b1 l1 R c1 m1 ) unit is independently an integer from 1 to 3, preferably 2 or 3, particularly preferably 3. In the preferred configuration, k1 is 3.

於式(A1)及(A2)中,於RSi為以式(S3)所表示之基之情形時,較佳係於式(A1)及式(A2)的末端部分中,存在有至少2個與羥基或水解性基鍵結之Si原子。 In formulas (A1) and (A2), when R Si is a group represented by formula (S3), it is preferable that at least 2 are present in the terminal portion of formula (A1) and formula (A2). A Si atom bonded to a hydroxyl group or a hydrolyzable group.

於較佳樣態中,以式(S3)所表示之基係具有-Z1-SiR22 q1R23 r1(式中,q1為1至3的整數,較佳為2或3,尤佳為3,r1為0至2的整數)、-Z1’-SiR22’ q1’R23’ r1’(式中,q1’為1至3的整數,較佳為2或3,尤佳為3,r1’為0至2的整數)或-Z1”-SiR22” q1”R23” r1”(式中,q1”為1至3的整數,較佳為2或3,尤佳為3,r1”為0至2的整數)中任一者。Z1、Z1’、Z1”、R22、R23、R22’、R23’、R22”、及R23”與上述為相同涵義。 In a preferred aspect, the base represented by formula (S3) has -Z 1 -SiR 22 q1 R 23 r1 (in the formula, q1 is an integer from 1 to 3, preferably 2 or 3, particularly preferably 3, r1 is an integer from 0 to 2), -Z 1' -SiR 22' q1' R 23' r1' (wherein, q1' is an integer from 1 to 3, preferably 2 or 3, especially 3 , r1' is an integer from 0 to 2) or -Z 1” -SiR 22” q1” R 23” r1” (wherein, q1” is an integer from 1 to 3, preferably 2 or 3, especially 3 , r1″ is any one of the integers from 0 to 2). Z 1 , Z 1′ , Z 1″ , R 22 , R 23 , R 22′ , R 23′ , R 22″ , and R 23″ are the same as the above have the same meaning.

於較佳樣態中,於式(S3)中存在有R21’之情形時,於至少1個,較佳於所有的R21’中,q1”為1至3的整數,較佳為2或3,尤佳為3。 In a preferred aspect, when R 21' is present in formula (S3), q1" is an integer from 1 to 3, preferably 2, in at least one, preferably all, R 21' Or 3, preferably 3.

於較佳樣態中,於式(S3)中存在有R21之情形時,於至少1個,較佳於所有的R21中,p1’為0,q1’為1至3的整數,較佳為2或3,尤佳為3。 In a preferred aspect, when R 21 exists in formula (S3), p1' is 0, and q1' is an integer from 1 to 3 in at least one, preferably all, R 21 , preferably The best is 2 or 3, especially 3.

於較佳樣態中,於式(S3)中存在有Ra1之情形時,於至少1個,較佳於所有的Ra1中,p1為0,q1為1至3的整數,較佳為2或3,尤佳為3。 In a preferred aspect, when there is R a1 in the formula (S3), p1 is 0, and q1 is an integer from 1 to 3 in at least one, preferably all, R a1 , preferably 2 or 3, preferably 3.

於較佳樣態中,於式(S3)中,k1為2或3,較佳為3,p1為0,q1為2或3,較佳為3。 In a preferred aspect, in formula (S3), k1 is 2 or 3, preferably 3, p1 is 0, and q1 is 2 or 3, preferably 3.

於一樣態中,式(S3)不含矽氧烷鍵。 In one aspect, formula (S3) contains no siloxane bonds.

Rd1分別獨立地為-Z2-CR31 p2R32 q2R33 r2R d1 are each independently -Z 2 -CR 31 p2 R 32 q2 R 33 r2 .

Z2分別獨立地為單鍵或2價基。以下列Z2所記載之結構的右側鍵結至(CR31 p2R32 q2R33 r2)。 Z 2 is independently a single bond or a divalent base. The right side of the structure described in Z 2 below is bonded to (CR 31 p2 R 32 q2 R 33 r2 ).

上述2價基較佳為氧原子、硫原子、NH、CO或2價有機基,尤佳為氧原子或2價有機基。 The above-mentioned divalent group is preferably an oxygen atom, a sulfur atom, NH, CO or a divalent organic group, and particularly preferably an oxygen atom or a divalent organic group.

Z2較佳係分別獨立地為氧原子或2價有機基,尤佳為2價有機基。 It is preferable that Z2 is independently an oxygen atom or a divalent organic group, and it is particularly preferable that it is a divalent organic group.

上述Z2較佳為C1-6伸烷基、-(CH2)z5-O-(CH2)z6-(式中,z5為0至6的整數,例如為1至6的整數,z6為0至6的整數,例如為1至6的整數)或-(CH2)z7-伸苯基-(CH2)z8-(式中,z7為0至6的整數,例如為1至6的整數,z8為0至6的整數,例如為1至6的整數)。該C1-6伸烷基可為直鏈或分枝鏈,較佳為直鏈。此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基之1個或多於1個的取代基所取代,較佳為非取代。 The above Z 2 is preferably a C 1-6 alkylene group, -(CH 2 ) z5 -O-(CH 2 ) z6 -(in the formula, z5 is an integer from 0 to 6, for example, it is an integer from 1 to 6, z6 is an integer from 0 to 6, for example, an integer from 1 to 6) or -(CH 2 ) z7 -phenylene-(CH 2 ) z8 -(where z7 is an integer from 0 to 6, for example, 1 to 6 an integer, z8 is an integer from 0 to 6, for example, an integer from 1 to 6). The C 1-6 alkylene group can be a straight chain or a branched chain, preferably a straight chain. These groups may be substituted by one or more substituents selected from the group consisting of fluorine atom, C 1-6 alkyl group, C 2-6 alkenyl group and C 2-6 alkynyl group, preferably unsubstituted .

於較佳樣態中,Z2為C1-6伸烷基或-(CH2)z7-伸苯基-(CH2)z8-,較佳為-伸苯基-(CH2)z8-。於Z2為該基之情形時,耐光性,尤其是耐紫外線性可進一步提高。 In a preferred embodiment, Z 2 is C 1-6 alkylene group or -(CH 2 ) z7 -phenylene group -(CH 2 ) z8 -, preferably -phenylene group -(CH 2 ) z8 - . When Z 2 is the base, the light resistance, especially the ultraviolet resistance, can be further improved.

於其他較佳樣態中,上述Z2為C1-3伸烷基。於一樣態中,Z2可為-CH2CH2CH2-。於其他樣態中,Z2可為-CH2CH2-。 In other preferred embodiments, the above-mentioned Z 2 is a C 1-3 alkylene group. In one aspect, Z 2 can be -CH 2 CH 2 CH 2 -. In other aspects, Z 2 can be -CH 2 CH 2 -.

R31分別獨立地為-Z2’-CR32’ q2’R33’ r2R 31 is each independently -Z 2' -CR 32' q2' R 33' r2 .

Z2’分別獨立地為單鍵或2價基。以下列Z2’所記載之結構的右側鍵結至(CR32’ q2’R33’ r2’)。 Z 2' is independently a single bond or a divalent base. The right side of the structure described below Z 2' is bonded to (CR 32' q2' R 33' r2' ).

上述2價基較佳為氧原子、硫原子、NH、CO或2價有機基,尤佳為氧原子或2價有機基。 The above-mentioned divalent group is preferably an oxygen atom, a sulfur atom, NH, CO or a divalent organic group, and particularly preferably an oxygen atom or a divalent organic group.

Z2’較佳係分別獨立地為氧原子或2價有機基,尤佳為2價有機基。 Z 2' is preferably each independently an oxygen atom or a divalent organic group, particularly preferably a divalent organic group.

上述Z2’較佳為C1-6伸烷基、-(CH2)z5’-O-(CH2)z6’-(式中,z5’為0至6的整數,例如為1至6的整數,z6’為0至6的整數,例如為1至6的整數)或-(CH2)z7’-伸苯基-(CH2)z8’-(式中,z7’為0至6的整數,例如為1至6的整數,z8’為0至6的整數,例如為1至6的整數)。該C1-6伸烷基可為直鏈或分枝鏈,較佳為直鏈。此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基之1個或多於1個的取代基所取代,較佳為非取代。 The above Z 2' is preferably a C 1-6 alkylene group, -(CH 2 ) z5' -O-(CH 2 ) z6' -(in the formula, z5' is an integer from 0 to 6, for example, 1 to 6 an integer, z6' is an integer from 0 to 6, for example, an integer from 1 to 6) or -(CH 2 ) z7' -phenyl-(CH 2 ) z8' -(where z7' is 0 to 6 is an integer, for example, an integer from 1 to 6, z8' is an integer from 0 to 6, for example, an integer from 1 to 6). The C 1-6 alkylene group can be a straight chain or a branched chain, preferably a straight chain. These groups may be substituted by one or more substituents selected from the group consisting of fluorine atom, C 1-6 alkyl group, C 2-6 alkenyl group and C 2-6 alkynyl group, preferably unsubstituted .

於較佳樣態中,Z2’為C1-6伸烷基或-(CH2)z7’-伸苯基-(CH2)z8’-,較佳為-伸苯基-(CH2)z8’-。於Z2’為該基之情形時,耐光性,尤其是耐紫外線性可進一步提高。 In a preferred embodiment, Z 2' is C 1-6 alkylene or -(CH 2 ) z7' -phenylene-(CH 2 ) z8' -, preferably -phenylene-(CH 2 ) z8' -. When Z 2' is the base, the light resistance, especially the ultraviolet resistance, can be further improved.

於其他較佳樣態中,上述Z2’為C1-3伸烷基。於一樣態中,Z2’可為-CH2CH2CH2-。於其他樣態中,Z2’可為-CH2CH2-。 In other preferred embodiments, the above-mentioned Z 2' is a C 1-3 alkylene group. In one aspect, Z 2' can be -CH 2 CH 2 CH 2 -. In other aspects, Z 2' can be -CH 2 CH 2 -.

R32’分別獨立地為-Z3-SiR34 n2R35 3-n2R 32' is each independently -Z 3 -SiR 34 n2 R 35 3-n2 .

上述Z3分別獨立地為單鍵或2價基。以下列Z3所記載之結構的右側鍵結至(SiR34 n2R35 3-n2)。 The above Z 3 are each independently a single bond or a divalent group. The right side of the structure described below as Z3 is bonded to (SiR 34 n2 R 35 3-n2 ).

上述2價基較佳為氧原子、硫原子、NH、CO或2價有機基,尤佳為氧原子或2價有機基。 The above-mentioned divalent group is preferably an oxygen atom, a sulfur atom, NH, CO or a divalent organic group, and particularly preferably an oxygen atom or a divalent organic group.

Z3較佳係分別獨立地為氧原子或2價有機基,尤佳為2價有機基。 Preferably, Z 3 is each independently an oxygen atom or a divalent organic group, particularly preferably a divalent organic group.

於一樣態中,Z3為氧原子。 In one state, Z 3 is an oxygen atom.

於一樣態中,Z3為2價有機基。 In one form, Z 3 is a divalent organic group.

上述Z3較佳為C1-6伸烷基、-(CH2)z5”-O-(CH2)z6”-(式中,z5”為0至6的整數,例如為1至6的整數,z6"為0至6的整數,例如為1至6的整數)或-(CH2)z7”-伸苯基-(CH2)z8”-(式中,z7”為0至6的整數,例如為1至6的整數,z8”為0至6的整數,例如為1至6的整數)。該C1-6伸烷基可為直鏈或分枝鏈,較佳為直鏈。此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基之1個或多於1個的取代基所取代,較佳為非取代。 The above Z 3 is preferably a C 1-6 alkylene group, -(CH 2 ) z5” -O-(CH 2 ) z6” - (in the formula, z5” is an integer from 0 to 6, for example, from 1 to 6 Integer, z6" is an integer from 0 to 6, for example, an integer from 1 to 6) or -(CH 2 ) z7" -phenyl-(CH 2 ) z8" - (in the formula, z7" is an integer from 0 to 6 An integer, for example, an integer from 1 to 6, z8″ is an integer from 0 to 6, for example, an integer from 1 to 6). The C 1-6 alkylene group can be a straight chain or a branched chain, preferably a straight chain. These groups may be substituted by one or more substituents selected from the group consisting of fluorine atom, C 1-6 alkyl group, C 2-6 alkenyl group and C 2-6 alkynyl group, preferably unsubstituted .

於較佳樣態中,Z3為C1-6伸烷基或-(CH2)z7”-伸苯基-(CH2)z8”-,較佳為-伸苯基-(CH2)z8”-。於Z3為該基之情形時,耐光性,尤其是耐紫外線性可進一步提高。 In a preferred embodiment, Z 3 is C 1-6 alkylene or -(CH 2 ) z7” -phenylene-(CH 2 ) z8” -, preferably -phenylene-(CH 2 ) z8” -. When Z 3 is the base, the light resistance, especially the ultraviolet resistance, can be further improved.

於其他較佳樣態中,上述Z3為C1-3伸烷基。於一樣態中,Z3可為-CH2CH2CH2-。於其他樣態中,Z3可為-CH2CH2-。 In other preferred embodiments, the above-mentioned Z 3 is a C 1-3 alkylene group. In one aspect, Z 3 can be -CH 2 CH 2 CH 2 -. In other aspects, Z 3 can be -CH 2 CH 2 -.

R34分別獨立地為羥基或水解性基。 R 34 is each independently a hydroxyl group or a hydrolyzable group.

R34較佳係分別獨立地為水解性基。 R 34 is preferably each independently a hydrolyzable group.

R34較佳係分別獨立地為-ORh1、-OCORh1、-O-N=CRh1 2、-NRh1 2、-NHRh1、-NCO或鹵素(此等式中,Rh1表示取代或非取代的C1-4烷基),尤佳為-ORh1(亦即烷氧基)。Rh1可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等非取代烷基;氯甲基等取代烷基。該等當中,較佳為烷基,尤其是非取代烷基,尤佳為甲基或乙基。於一樣態中,Rh1為甲基,於其他樣態中,Rh1為乙基。 R 34 is preferably independently -OR h1 , -OCOR h1 , -ON=CR h1 2 , -NR h1 2 , -NHR h1 , -NCO or halogen (in this equation, R h1 represents substituted or unsubstituted C 1-4 alkyl), especially -OR h1 (that is, alkoxy). Examples of R h1 include: unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl and isobutyl; substituted alkyl groups such as chloromethyl. Among these, an alkyl group is preferred, particularly an unsubstituted alkyl group, and a methyl or ethyl group is particularly preferred. In one aspect, R h1 is methyl, and in the other aspect, R h1 is ethyl.

R35分別獨立地為氫原子或1價有機基。該1價有機基為排除上述水解性基之1價有機基。 R 35 is each independently a hydrogen atom or a monovalent organic group. This monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.

於R35中,1價有機基較佳為C1-20烷基,尤佳為C1-6烷基,更佳為甲基。 In R 35 , the monovalent organic group is preferably a C 1-20 alkyl group, especially a C 1-6 alkyl group, and more preferably a methyl group.

上述式中,n2於每個(SiR34 n2R35 3-n2)單元中分別獨立地為0至3的整數。惟於RSi為以式(S4)所表示之基之情形時,於式(A1)及式(A2)的末端部分中,存在有至少1個n2為1至3之(SiR34 n2R35 3-n2)單元。亦即於該末端部分中,所有的n2不會同時為0。換言之,於式(A1)及式(A2)的末端部分中,存在有至少1個與羥基或水解性基鍵結之Si原子。 In the above formula, n2 in each (SiR 34 n2 R 35 3-n2 ) unit is independently an integer from 0 to 3. However, when R Si is a base represented by formula (S4), there is at least one n2 of 1 to 3 in the terminal part of formula (A1) and formula (A2) (SiR 34 n2 R 35 3-n2 ) unit. That is, in this terminal part, all n2 will not be 0 at the same time. In other words, at least one Si atom bonded to a hydroxyl group or a hydrolyzable group exists in the terminal portion of formula (A1) and formula (A2).

n2於每個(SiR34 n2R35 3-n2)單元中,較佳係分別獨立地為1至3的整數,尤佳為2或3,更佳為3。 n2 in each (SiR 34 n2 R 35 3-n2 ) unit is preferably independently an integer of 1 to 3, more preferably 2 or 3, more preferably 3.

R33’分別獨立地為氫原子、羥基或1價有機基。該1價有機基為排除上述水解性基之1價有機基。 R 33' is each independently a hydrogen atom, a hydroxyl group or a monovalent organic group. This monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.

於R33’中,1價有機基較佳可為C1-20烷基或以R41’-(OR42’)y1’-Oy2’-(式中,R41’為氫原子或C1-6烷基,R42’分別獨立地為C1-6伸烷基,y1’為1至30的整數,y2’為0或1)所表示之基。 In R 33' , the univalent organic group can preferably be a C 1-20 alkyl group or R 41' -(OR 42' ) y1' -O y2' -(in the formula, R 41' is a hydrogen atom or C 1-6 alkyl group, R 42' is each independently a C 1-6 alkyl group, y1' is an integer from 1 to 30, y2' is a group represented by 0 or 1).

於一樣態中,R41’為氫原子。 In one state, R 41' is a hydrogen atom.

於其他樣態中,R41’為C1-6烷基,較佳為C1-3烷基。 In other aspects, R 41' is C 1-6 alkyl, preferably C 1-3 alkyl.

R42’分別獨立地為C1-6伸烷基,較佳為C1-3伸烷基,尤佳為C2-3伸烷基。 R 42' is each independently a C 1-6 alkylene group, preferably a C 1-3 alkylene group, especially a C 2-3 alkylene group.

y1’為1至30的整數,較佳為1至20的整數,尤佳為1至10的整數,再更佳為2至10的整數,例如為2至6的整數、2至4的整數、3至6的整數或4至6的整數。 y1' is an integer from 1 to 30, preferably an integer from 1 to 20, especially an integer from 1 to 10, and more preferably an integer from 2 to 10, such as an integer from 2 to 6, or an integer from 2 to 4. , an integer from 3 to 6 or an integer from 4 to 6.

於一樣態中,R33’為羥基。 In one form, R 33' is hydroxyl.

於其他樣態中,R33’為C1-20烷基,尤佳為C1-6烷基。 In other aspects, R 33' is a C 1-20 alkyl group, especially a C 1-6 alkyl group.

於其他樣態中,R33’為R41’-(OR42’)y1’-Oy2’-。 In other forms, R 33' is R 41' -(OR 42' ) y1' -O y2' -.

上述q2’分別獨立地為0至3的整數,上述r2’分別獨立地為0至3的整數。q2’與r2’之合計於每個(CR32’ q2’R33’ r2’)單元中為3。 The above q2' are each independently an integer from 0 to 3, and the above r2' are each independently an integer from 0 to 3. The sum of q2' and r2' is 3 in each (CR 32' q2' R 33' r2' ) unit.

q2’於每個(CR32’ q2’R33’ r2’)單元中,較佳係分別獨立地為1至3的整數,尤佳為2或3,更佳為3。 q2' in each (CR 32' q2' R 33' r2' ) unit is preferably independently an integer of 1 to 3, more preferably 2 or 3, more preferably 3.

R32分別獨立地為-Z3-SiR34 n2R35 3-n2。該-Z3-SiR34 n2R35 3-n2與上述R32’中的記載為相同涵義。 R 32 is each independently -Z 3 -SiR 34 n2 R 35 3-n2 . -Z 3 -SiR 34 n2 R 35 3-n2 has the same meaning as described in the above-mentioned R 32' .

R33分別獨立地為氫原子、羥基或1價有機基。該1價有機基為排除上述水解性基之1價有機基。 R 33 is each independently a hydrogen atom, a hydroxyl group or a monovalent organic group. This monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.

於R33中,1價有機基較佳可為C1-20烷基或以R41-(OR42)y1-Oy2-(式中,R41為氫原子或C1-6烷基,R42分別獨立地為C1-6伸烷基,y1為1至30的整數,y2為0或1)所表示之基。 In R 33 , the monovalent organic group is preferably a C 1-20 alkyl group or R 41 -(OR 42 ) y1 -O y2 -(in the formula, R 41 is a hydrogen atom or a C 1-6 alkyl group, R 42 is each independently a C 1-6 alkylene group, y1 is an integer from 1 to 30, and y2 is a group represented by 0 or 1).

於一樣態中,R41為氫原子。 In one state, R 41 is a hydrogen atom.

於其他樣態中,R41為C1-6烷基,較佳為C1-3烷基。 In other aspects, R 41 is C 1-6 alkyl, preferably C 1-3 alkyl.

R42分別獨立地為C1-6伸烷基,較佳為C1-3伸烷基,尤佳為C2-3伸烷基。 R 42 is each independently a C 1-6 alkylene group, preferably a C 1-3 alkylene group, and particularly preferably a C 2-3 alkylene group.

y1為1至30的整數,較佳為1至20的整數,尤佳為1至10的整數,再更佳為2至10的整數,例如為2至6的整數、2至4的整數、3至6的整數或4至6的整數。 y1 is an integer from 1 to 30, preferably an integer from 1 to 20, especially an integer from 1 to 10, and more preferably an integer from 2 to 10, such as an integer from 2 to 6, an integer from 2 to 4, An integer from 3 to 6 or an integer from 4 to 6.

於一樣態中,R33為羥基。 In one form, R 33 is hydroxyl.

於其他樣態中,R33為C1-20烷基,尤佳為C1-6烷基。 In other aspects, R 33 is a C 1-20 alkyl group, especially a C 1-6 alkyl group.

於其他樣態中,R33為R41-(OR42)y1-Oy2-。 In other forms, R 33 is R 41 -(OR 42 ) y1 -O y2 -.

上述p2分別獨立地為0至3的整數,q2分別獨立地為0至3的整數,r2分別獨立地為0至3的整數。p2、q2及r2之合計於(CR31 p2R32 q2R33 r2)單元中為3。 The above-mentioned p2 is each independently an integer from 0 to 3, q2 is each independently an integer from 0 to 3, and r2 is each independently an integer from 0 to 3. The total of p2, q2 and r2 is 3 in the unit (CR 31 p2 R 32 q2 R 33 r2 ).

於一樣態中,p2為0。 In one state, p2 is 0.

於一樣態中,p2於每個(CR31 p2R32 q2R33 r2)單元中可分別獨立地為1至3的整數、2至3的整數或3。於較佳樣態中,p2為3。 In one aspect, p2 can be independently an integer from 1 to 3, an integer from 2 to 3, or 3 in each (CR 31 p2 R 32 q2 R 33 r2 ) unit. In the preferred configuration, p2 is 3.

於一樣態中,q2於每個(CR31 p2R32 q2R33 r2)單元中分別獨立地為1至3的整數,較佳為2或3,尤佳為3。 In one form, q2 in each (CR 31 p2 R 32 q2 R 33 r2 ) unit is independently an integer from 1 to 3, preferably 2 or 3, particularly preferably 3.

於一樣態中,p2為0,q2於每個(CR31 p2R32 q2R33 r2)單元中分別獨立地為1至3的整數,較佳為2或3,更佳為3。 In a state, p2 is 0, and q2 in each (CR 31 p2 R 32 q2 R 33 r2 ) unit is independently an integer from 1 to 3, preferably 2 or 3, more preferably 3.

Re1分別獨立地為-Z3-SiR34 n2R35 3-n2。該-Z3-SiR34 n2R35 3-n2與上述R32’中的記載為相同涵義。 R e1 is each independently -Z 3 -SiR 34 n2 R 35 3-n2 . -Z 3 -SiR 34 n2 R 35 3-n2 has the same meaning as described in the above-mentioned R 32' .

Rf1分別獨立地為氫原子、羥基或1價有機基。該1價有機基為排除上述水解性基之1價有機基。 R f1 is each independently a hydrogen atom, a hydroxyl group or a monovalent organic group. This monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.

於Rf1中,1價有機基較佳可為C1-20烷基或以R43-(OR44)y3-Oy4-(式中,R43為氫原子或C1-6烷基,R44分別獨立地為C1-6伸烷基,y3為1至30的整數,y4為0或1)所表示之基。 In R f1 , the univalent organic group is preferably a C 1-20 alkyl group or R 43 -(OR 44 ) y3 -O y4 -(in the formula, R 43 is a hydrogen atom or a C 1-6 alkyl group, R 44 is each independently a C 1-6 alkylene group, y3 is an integer from 1 to 30, and y4 is a group represented by 0 or 1).

於一樣態中,R43為氫原子。 In one state, R 43 is a hydrogen atom.

於其他樣態中,R43為C1-6烷基,較佳為C1-3烷基。 In other aspects, R 43 is C 1-6 alkyl, preferably C 1-3 alkyl.

R44分別獨立地為C1-6伸烷基,較佳為C1-3伸烷基,尤佳為C2-3伸烷基。 R 44 is each independently a C 1-6 alkylene group, preferably a C 1-3 alkylene group, especially a C 2-3 alkylene group.

y3為1至30的整數,較佳為1至20的整數,尤佳為1至10的整數,再更佳為2至10的整數,例如為2至6的整數、2至4的整數、3至6的整數或4至6的整數。 y3 is an integer from 1 to 30, preferably an integer from 1 to 20, especially an integer from 1 to 10, and more preferably an integer from 2 to 10, such as an integer from 2 to 6, an integer from 2 to 4, An integer from 3 to 6 or an integer from 4 to 6.

於一樣態中,Rf1為羥基。 In one form, R f1 is hydroxyl.

於其他樣態中,Rf1為C1-20烷基,尤佳為C1-6烷基。 In other aspects, R f1 is a C 1-20 alkyl group, especially a C 1-6 alkyl group.

於其他樣態中,Rf1為R43-(OR44)y3-Oy4-。 In other aspects, R f1 is R 43 -(OR 44 ) y3 -O y4 -.

上述k2分別獨立地為0至3的整數,l2分別獨立地為0至3的整數,m2為分別獨立地為0至3的整數。k2、l2及m2之合計於每個(CRd1 k2Re1 l2Rf1 m2)單元中為3。 The above k2 is an integer from 0 to 3 independently, l2 is an integer from 0 to 3 independently, and m2 is an integer from 0 to 3 independently. The sum of k2, l2 and m2 is 3 in each (CR d1 k2 R e1 l2 R f1 m2 ) unit.

於式(A1)及(A2)中,在RSi為以式(S4)所表示之基之情形時,較佳係於式(A1)及式(A2)的末端部分中,存在有至少2個與羥基或水解性基鍵結之Si原子。 In formulas (A1) and (A2), when R Si is a group represented by formula (S4), it is preferable that at least 2 are present in the terminal portion of formula (A1) and formula (A2). A Si atom bonded to a hydroxyl group or a hydrolyzable group.

於一樣態中,在RSi為以式(S4)所表示之基之情形時,n2為1至3,較佳為2或3,尤佳為3之(SiR34 n2R35 3-n2)單元,於式(A1)及式(A2)的各末端部分中係存在有2個以上,例如為2至27個,較佳為2至9個,尤佳為2至6個,更佳為2至3個,特佳為3個。 In one state, when R Si is a base represented by formula (S4), n2 is 1 to 3, preferably 2 or 3, particularly preferably 3 (SiR 34 n2 R 35 3-n2 ) There are more than 2 units in each terminal part of formula (A1) and formula (A2), for example, 2 to 27 units, preferably 2 to 9 units, particularly preferably 2 to 6 units, more preferably 2 to 3, preferably 3.

於較佳樣態中,於式(S4)中存在有R32’之情形時,於至少1個,較佳於所有的R32’中,n2為1至3的整數,較佳為2或3,尤佳為3。 In a preferred aspect, when R 32' is present in formula (S4), n2 is an integer from 1 to 3, preferably 2 or more, in at least one, preferably all, R 32'. 3, preferably 3.

於較佳樣態中,於式(S4)中存在有R32之情形時,於至少1個,較佳於所有的R32中,n2為1至3的整數,較佳為2或3,尤佳為3。 In a preferred aspect, when R 32 is present in formula (S4), n2 is an integer from 1 to 3, preferably 2 or 3, in at least one, preferably all, R 32 . The best number is 3.

於較佳樣態中,於式(S4)中存在有Re1之情形時,於至少1個,較佳於所有的Ra1中,n2為1至3的整數,較佳為2或3,尤佳為3。 In a preferred aspect, when there is R e1 in formula (S4), n2 is an integer from 1 to 3, preferably 2 or 3, in at least one, preferably all, R a1 . The best number is 3.

於較佳樣態中,於式(S4)中,k2為0,l2為2或3,較佳為3,n2為2或3,較佳為3。 In a preferred aspect, in formula (S4), k2 is 0, l2 is 2 or 3, preferably 3, and n2 is 2 or 3, preferably 3.

於一樣態中,式(S4)不含矽氧烷鍵。 In one aspect, formula (S4) contains no siloxane bonds.

Rg1及Rh1分別獨立地為-Z4-SiR11 n1R12 3-n1,-Z4-SiRa1 k1Rb1 l1Rc1 m1,-Z4-CRd1 k2Re1 l2Rf1 m2。在此,R11、R12、Ra1、Rb2、Rc1、Rd1、Re1、Rf1、n1、k1、l1、m1、k2、l2及m2係與上述為相同涵義。 R g1 and R h1 are independently -Z 4 -SiR 11 n1 R 12 3-n1 , -Z 4 -SiR a1 k1 R b1 l1 R c1 m1 , and -Z 4 -CR d1 k2 R e1 l2 R f1 m2 . Here, R 11 , R 12 , R a1 , R b2 , R c1 , R d1 , R e1 , R f1 , n1, k1, l1, m1, k2, l2 and m2 have the same meanings as above.

於較佳樣態中,Rg1及Rh1分別獨立地為-Z4-SiR11 n1R12 3-n1In a preferred embodiment, R g1 and R h1 are independently -Z 4 -SiR 11 n1 R 12 3-n1 .

上述Z4分別獨立地為單鍵或2價基。以下列Z4所記載之結構的右側鍵結至(SiR11 n1R12 3-n1)。 The above-mentioned Z 4 are each independently a single bond or a divalent group. (SiR 11 n1 R 12 3-n1 ) is bonded to the right side of the structure described in Z 4 below.

上述2價基較佳為氧原子、硫原子、NH、CO或2價有機基,尤佳為氧原子或2價有機基。 The above-mentioned divalent group is preferably an oxygen atom, a sulfur atom, NH, CO or a divalent organic group, and particularly preferably an oxygen atom or a divalent organic group.

Z4較佳係分別獨立地為氧原子或2價有機基,尤佳為2價有機基。 It is preferable that Z4 is independently an oxygen atom or a divalent organic group, and it is particularly preferable that it is a divalent organic group.

於一樣態中,Z4為氧原子。 In one state, Z 4 is an oxygen atom.

於一樣態中,Z4為2價有機基。 In one form, Z 4 is a divalent organic radical.

上述Z4較佳為C1-6伸烷基、-(CH2)z5”-O-(CH2)z6”-(式中,z5”為0至6的整數,例如為1至6的整數,z6”為0至6的整數,例如為1至6的整數)或-(CH2)z7”-伸苯基-(CH2)z8”-(式中,z7”為0至6的整數,例如為1至6的整數,z8”為0至6的整數,例如為1至6的整數)。該C1-6伸烷基可為直鏈或分枝鏈,較佳為直鏈。此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基之1個或多於1個的取代基所取代,較佳為非取代。 The above Z 4 is preferably a C 1-6 alkylene group, -(CH 2 ) z5” -O-(CH 2 ) z6” - (in the formula, z5” is an integer from 0 to 6, for example, from 1 to 6 Integer, z6” is an integer from 0 to 6, for example, it is an integer from 1 to 6) or -(CH 2 ) z7” -phenyl-(CH 2 ) z8” - (in the formula, z7” is an integer from 0 to 6 An integer, for example, an integer from 1 to 6, z8″ is an integer from 0 to 6, for example, an integer from 1 to 6). The C 1-6 alkylene group can be a straight chain or a branched chain, preferably a straight chain. These groups may be substituted by one or more substituents selected from, for example, fluorine atom, C 1-6 alkyl group, C 2-6 alkenyl group and C 2-6 alkynyl group, preferably unsubstituted .

於較佳樣態中,Z4為C1-6伸烷基或-(CH2)z7”-伸苯基-(CH2)z8”-,較佳為-伸苯基-(CH2)z8”-。於Z4為該基之情形時,耐光性,尤其是耐紫外線性可進一步提高。 In a preferred embodiment, Z 4 is C 1-6 alkylene or -(CH 2 ) z7” -phenylene-(CH 2 ) z8” -, preferably -phenylene-(CH 2 ) z8” -. When Z 4 is the base, the light resistance, especially the ultraviolet resistance, can be further improved.

於其他較佳樣態中,上述Z4為C1-3伸烷基。於一樣態中,Z4可為-CH2CH2CH2-。於其他樣態中,Z4可為-CH2CH2-。 In other preferred embodiments, the above-mentioned Z 4 is a C 1-3 alkylene group. In one aspect, Z 4 can be -CH 2 CH 2 CH 2 -. In other aspects, Z 4 can be -CH 2 CH 2 -.

於一樣態中,RSi為以式(S2)、(S3)、(S4)或(S5)所表示之基。此等化合物可形成具有高表面平滑性之表面處理層。 In one aspect, R Si is a radical represented by formula (S2), (S3), (S4) or (S5). These compounds can form surface treatment layers with high surface smoothness.

於一樣態中,RSi為以式(S1)、(S3)、(S4)或(S5)所表示之基。此等化合物由於在一個末端中具有複數個水解性基,所以可強力地密著於基材而形成具有高摩擦耐久性之表面處理層。 In one aspect, R Si is a group represented by formula (S1), (S3), (S4) or (S5). Since these compounds have a plurality of hydrolyzable groups at one end, they can adhere strongly to the substrate and form a surface treatment layer with high friction durability.

於一樣態中,RSi為以式(S1)、(S3)或(S4)所表示之基。此等化合物由於在一個末端中具有複數個水解性基,所以可強力地密著於基材而形成具有高摩擦耐久性之表面處理層。 In one aspect, R Si is a radical represented by formula (S1), (S3) or (S4). Since these compounds have a plurality of hydrolyzable groups at one end, they can adhere strongly to the substrate and form a surface treatment layer with high friction durability.

於一樣態中,RSi為以式(S3)或(S4)所表示之基。此等化合物由於在一個末端中可具有從一個Si原子或C原子所分枝之複數個水解性基,所以可形成具有更高的摩擦耐久性之表面處理層。 In one aspect, R Si is a base represented by formula (S3) or (S4). Since these compounds can have a plurality of hydrolyzable groups branched from one Si atom or C atom at one end, they can form a surface treatment layer with higher friction durability.

於一樣態中,RSi為以式(S1)所表示之基。 In one aspect, R Si is a base represented by formula (S1).

於一樣態中,RSi為以式(S2)所表示之基。 In one form, R Si is a base represented by formula (S2).

於一樣態中,RSi為以式(S3)所表示之基。 In one form, R Si is a base represented by formula (S3).

於一樣態中,RSi為以式(S4)所表示之基。 In one form, R Si is a base represented by formula (S4).

於一樣態中,RSi為以式(S5)所表示之基。 In one form, R Si is a base represented by formula (S5).

於式(A1)中,α1為1至9的整數,β1為1至9的整數。此等α1及β1可因應XA的價數而變化。α1及β1之和係與XA的價數相同。例如於XA為10價基之情形時,α1及β1之和為10,例如α1可為9且β1為1,α1為5且β1為5,或α1為1且β1為9。此外,於XA為2價基之情形時,α1及β1為1。 In formula (A1), α1 is an integer from 1 to 9, and β1 is an integer from 1 to 9. These α1 and β1 can change according to the valence of X A. The sum of α1 and β1 is the same as the valence of X A. For example, when X A is a 10-valent base, the sum of α1 and β1 is 10. For example, α1 can be 9 and β1 can be 1, α1 can be 5 and β1 can be 5, or α1 can be 1 and β1 can be 9. In addition, when X A is a divalent base, α1 and β1 are 1.

於式(A2)中,γ1為1至9的整數。γ1可因應XA的價數而變化。亦即,γ1為從XA的價數減去1後之值。 In formula (A2), γ1 is an integer from 1 to 9. γ1 can change according to the valence of X A. In other words, γ1 is the value obtained by subtracting 1 from the valence of X A.

於式(A1)及(A2)中,XA可理解為將主要提供撥水性及表面平滑性等之氟聚醚部(RFA1及RFA2),與提供和基材的鍵結能之部(RSi)進行連結之連結基。因此,該XA只要是以式(A1)及(A2)所表示之化合物可穩定地存在者,則可為單鍵或任意基。 In formulas ( A1 ) and ( A2 ), (R Si ) A linking group for connection. Therefore, X A may be a single bond or any group as long as the compounds represented by formulas (A1) and (A2) can exist stably.

XA分別獨立地為單鍵或2至10價基。 X A are each independently a single bond or a valence base of 2 to 10.

XA較佳係分別獨立地為單鍵或2至10價有機基。 Preferably, X A is independently a single bond or an organic group with 2 to 10 valence.

於一樣態中,XA不含矽氧烷鍵(-Si-O-Si-)。 In one state, X A contains no siloxane bonds (-Si-O-Si-).

上述XA中的2至10價基較佳為2至8價基。於一樣態中,該2至10價基較佳為2至4價基,尤佳為2價基。於其他樣態中,該2至10價基較佳為3至8價基,尤佳為3至6價基。 The valence base of 2 to 10 in the above-mentioned X A is preferably a valence base of 2 to 8. In one aspect, the 2- to 10-valent base is preferably a 2- to 4-valent base, and particularly preferably a 2-valent base. In other forms, the 2-10 valency base is preferably a 3-8 valency base, particularly preferably a 3-6 valency base.

於一樣態中,XA為單鍵或2價基,α1為1,β1為1。 In one state, X A is a single bond or a divalent group, α1 is 1, and β1 is 1.

於一樣態中,XA為單鍵或2價基,γ1為1。 In one state, X A is a single bond or a divalent base, and γ1 is 1.

上述2價基較佳為氧原子、硫原子、NH、CO或2價有機基,尤佳為氧原子或2價有機基,更佳為2價有機基。 The above-mentioned divalent group is preferably an oxygen atom, a sulfur atom, NH, CO or a divalent organic group, more preferably an oxygen atom or a divalent organic group, and more preferably a divalent organic group.

於一樣態中,XA為3至6價基,較佳為3至6價有機基,α1為1,β1為2至5。 In one form, X A is a 3- to 6-valent group, preferably a 3 to 6-valent organic group, α1 is 1, and β1 is 2 to 5.

於一樣態中,XA為3至6價基,較佳為3至6價有機基,γ1為2至5。 In one form, X A is a 3- to 6-valent radical, preferably a 3- to 6-valent organic radical, and γ1 is from 2 to 5.

於一樣態中,XA為3價基,較佳為3價有機基,α1為1,β1為2。 In one form, X A is a trivalent radical, preferably a trivalent organic radical, α1 is 1, and β1 is 2.

於一樣態中,XA為3價基,較佳為3價有機基,γ1為2。 In one form, X A is a trivalent radical, preferably a trivalent organic radical, and γ1 is 2.

於XA為單鍵或2價基之情形時,式(A1)及(A2)係以下述式(A1’)及(A2’)所表示。 When X A is a single bond or a divalent group, formulas (A1) and (A2) are represented by the following formulas (A1') and (A2').

RF1-XA-RSi (A1’) R F1 -X A -R Si (A1')

RSi-XA-RF2-XA-RSi (A2’) R Si -X A -R F2 -X A -R Si (A2')

於一樣態中,XA為單鍵。 In one state, X A is a single bond.

於其他樣態中,XA為2價有機基。 In other aspects, X A is a divalent organic group.

於一樣態中,XA可列舉例如單鍵或以下述式所表示之2價有機基: In one form, X A can include, for example, a single bond or a divalent organic group represented by the following formula:

-(R51)p5-(X51)q5- -(R 51 ) p5 -(X 51 ) q5 -

式中: In the formula:

R51表示單鍵、-(CH2)s5-或鄰、間或對伸苯基,較佳為-(CH2)s5-, R 51 represents a single bond, -(CH 2 ) s5 - or o-, m- or p-phenylene group, preferably -(CH 2 ) s5 -,

s5為1至20的整數,較佳為1至6的整數,尤佳為1至3的整數,再更佳為1或2, s5 is an integer from 1 to 20, preferably an integer from 1 to 6, particularly preferably an integer from 1 to 3, and more preferably 1 or 2,

X51表示-(X52)l5-, X 51 means -(X 52 ) l5 -,

X52分別獨立地表示為選自由-O-、-S-、鄰、間或對伸苯基、-C(O)O-、-Si(R53)2-、-(Si(R53)2O)m5-Si(R53)2-、-CONR54-、-O-CONR54-、-NR54-及-(CH2)n5-所組成之群組的基, Each of _ _ 2 O) m5 -Si(R 53 ) 2 -, -CONR 54 -, -O-CONR 54 -, -NR 54 - and -(CH 2 ) n5 -, the group consisting of,

R53分別獨立地表示苯基、C1-6烷基或C1-6烷氧基,較佳為苯基或C1-6烷基,尤佳為甲基, R 53 independently represents phenyl, C 1-6 alkyl or C 1-6 alkoxy, preferably phenyl or C 1-6 alkyl, especially methyl,

R54分別獨立地表示氫原子、苯基或C1-6烷基(較佳為甲基), R 54 each independently represents a hydrogen atom, phenyl or C 1-6 alkyl group (preferably methyl),

m5於每次出現時分別獨立地為1至100的整數,較佳為1至20的整數, Each time m5 appears, it is independently an integer from 1 to 100, preferably an integer from 1 to 20.

n5於各出現分別獨立地為1至20的整數,較佳為1至6的整數,尤佳為1至3的整數, Each occurrence of n5 is independently an integer from 1 to 20, preferably an integer from 1 to 6, particularly preferably an integer from 1 to 3,

l5為1至10的整數,較佳為1至5的整數,尤佳為1至3的整數, l5 is an integer from 1 to 10, preferably an integer from 1 to 5, particularly preferably an integer from 1 to 3,

p5為0或1, p5 is 0 or 1,

q5為0或1, q5 is 0 or 1,

在此,p5及q5的至少一方為1,標註p5或q5並以括弧括起之各重複單元的存在順序為任意, Here, at least one of p5 and q5 is 1, and the order of existence of the repeating units marked with p5 or q5 and enclosed in parentheses is arbitrary,

右側鍵結至RSiThe right side is bonded to R Si .

在此,XA(典型而言為XA的氫原子)可經選自氟原子、C1-3烷基及C1-3氟烷基之1個或多於1個的取代基所取代。於較佳樣態中,XA未經此等基所取代。 Here, X A (typically the hydrogen atom of X A ) may be substituted by one or more substituents selected from a fluorine atom, a C 1-3 alkyl group and a C 1-3 fluoroalkyl group. . In a preferred form, X A is unsubstituted by these groups.

於較佳樣態中,上述XA分別獨立地為-(R51)p5-(X51)q5-R52-。R52表示單鍵、-(CH2)t5-或鄰、間或對伸苯基,較佳為-(CH2)t5-。t5為1至20的整數,較佳為2至6的整數,尤佳為2至3的整數。在此,R52(典型而言為R52的氫原子)可經選自氟原子、C1-3烷基及C1-3氟烷基之1個或多於1個的取代基所取代。於較佳樣態中,R56未經此等基所取代。 In a preferred aspect, the above-mentioned X A are independently -(R 51 ) p5 -(X 51 ) q5 -R 52 -. R 52 represents a single bond, -(CH 2 ) t5 - or o-, m- or p-phenylene group, preferably -(CH 2 ) t5 -. t5 is an integer from 1 to 20, preferably an integer from 2 to 6, particularly preferably an integer from 2 to 3. Here, R 52 (typically the hydrogen atom of R 52 ) may be substituted by one or more substituents selected from a fluorine atom, a C 1-3 alkyl group and a C 1-3 fluoroalkyl group. . In a preferred form, R 56 is unsubstituted by these groups.

上述XA較佳可分別獨立地為: The above X A can preferably be independently:

單鍵、 single key,

C1-20伸烷基、 C 1-20 alkylene group,

-R51-X53-R52-、或 -R 51 -X 53 -R 52 -, or

-X54-R5- -X 54 -R 5 -

式中,R51及R52與上述為相同涵義; In the formula, R 51 and R 52 have the same meaning as above;

X53表示: X 53 means:

-O-、 -O-、

-S-、 -S-、

-C(O)O-、 -C(O)O-、

-CONR54-、 -CONR 54 -,

-O-CONR54-、 -O-CONR 54 -,

-Si(R53)2-、 -Si(R 53 ) 2 -,

-(Si(R53)2O)m5-Si(R53)2-、 -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -,

-O-(CH2)u5-(Si(R53)2O)m5-Si(R53)2-、 -O-(CH 2 ) u5 -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -,

-O-(CH2)u5-Si(R53)2-O-Si(R53)2-CH2CH2-Si(R53)2-O-Si(R53)2-、 -O-(CH 2 ) u5 -Si(R 53 ) 2 -O-Si(R 53 ) 2 -CH 2 CH 2 -Si(R 53 ) 2 -O-Si(R 53 ) 2 -,

-O-(CH2)u5-Si(OCH3)2OSi(OCH3)2-、 -O-(CH 2 ) u5 -Si(OCH 3 ) 2 OSi(OCH 3 ) 2 -,

-CONR54-(CH2)u5-(Si(R53)2O)m5-Si(R53)2-、 -CONR 54 -(CH 2 ) u5 -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -,

-CONR54-(CH2)u5-N(R54)-、或是 -CONR 54 -(CH 2 ) u5 -N(R 54 )-, or

-CONR54-(鄰、間或對伸苯基)-Si(R53)2- -CONR 54 -(o-, m- or p-phenyl)-Si(R 53 ) 2 -

式中,R53、R54及m5與上述為相同涵義,u5為1至20的整數,較佳為2至6的整數,尤佳為2至3的整數; In the formula, R 53 , R 54 and m5 have the same meaning as above, u5 is an integer from 1 to 20, preferably an integer from 2 to 6, especially preferably an integer from 2 to 3;

X54表示: X 54 means:

-S-、 -S-、

-C(O)O-、 -C(O)O-、

-CONR54-、 -CONR 54 -,

-O-CONR54-、 -O-CONR 54 -,

-CONR54-(CH2)u5-(Si(R54)2O)m5-Si(R54)2-、 -CONR 54 -(CH 2 ) u5 -(Si(R 54 ) 2 O) m5 -Si(R 54 ) 2 -,

-CONR54-(CH2)u5-N(R54)-、或是 -CONR 54 -(CH 2 ) u5 -N(R 54 )-, or

-CONR54-(鄰、間或對伸苯基)-Si(R54)2- -CONR 54 -(o-, m- or p-phenyl)-Si(R 54 ) 2 -

式中,各記號與上述為相同涵義。 In the formula, each symbol has the same meaning as above.

上述XA尤佳係分別獨立地為: The above-mentioned X A preferred series are independently:

單鍵、 single key,

C1-20伸烷基、 C 1-20 alkylene group,

-(CH2)s5-X53-、 -(CH 2 ) s5 -X 53 -、

-(CH2)s5-X53-(CH2)t5-、 -(CH 2 ) s5 -X 53 -(CH 2 ) t5 -,

-X54-、或是 -X 54 -, or

-X54-(CH2)t5- -X 54 -(CH 2 ) t5 -

式中,X53、X54、s5及t5與上述為相同涵義。 In the formula, X 53 , X 54 , s5 and t5 have the same meanings as above.

上述XA尤佳可分別獨立地為: The above X A can preferably be independently:

單鍵、 single key,

C1-20伸烷基、 C 1-20 alkylene group,

-(CH2)s5-X53-(CH2)t5-、或是 -(CH 2 ) s5 -X 53 -(CH 2 ) t5 -, or

-X54-(CH2)t5- -X 54 -(CH 2 ) t5 -

式中,各記號與上述為相同涵義。 In the formula, each symbol has the same meaning as above.

於較佳樣態中,上述XA可分別獨立地為: In a preferred embodiment, the above X A can be independently:

單鍵、 single key,

C1-20伸烷基、 C 1-20 alkylene group,

-(CH2)s5-X53-、或是 -(CH 2 ) s5 -X 53 -, or

-(CH2)s5-X53-(CH2)t5- -(CH 2 ) s5 -X 53 -(CH 2 ) t5 -

式中, In the formula,

X53為-O-、-CONR54-或-O-CONR54-, X 53 is -O-, -CONR 54 - or -O-CONR 54 -,

R54分別獨立地表示氫原子、苯基或C1-6烷基, R 54 each independently represents a hydrogen atom, a phenyl group or a C 1-6 alkyl group,

s5為1至20的整數, s5 is an integer from 1 to 20,

t5為1至20的整數。 t5 is an integer from 1 to 20.

於較佳樣態中,上述XA可分別獨立地為: In a preferred embodiment, the above X A can be independently:

-(CH2)s5-O-(CH2)t5- -(CH 2 ) s5 -O-(CH 2 ) t5 -

-CONR54-(CH2)t5- -CONR 54 -(CH 2 ) t5 -

式中, In the formula,

R54分別獨立地表示氫原子、苯基或C1-6烷基, R 54 each independently represents a hydrogen atom, phenyl group or C 1-6 alkyl group,

s5為1至20的整數, s5 is an integer from 1 to 20,

t5為1至20的整數。 t5 is an integer from 1 to 20.

於一樣態中,上述XA分別獨立地為: In a state, the above X A are independently:

單鍵、 single key,

C1-20伸烷基、 C 1-20 alkylene group,

-(CH2)s5-O-(CH2)t5-、 -(CH 2 ) s5 -O-(CH 2 ) t5 -,

-(CH2)s5-(Si(R53)2O)m5-Si(R53)2-(CH2)t5-、 -(CH 2 ) s5 -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -(CH 2 ) t5 -,

-(CH2)s5-O-(CH2)u5-(Si(R53)2O)m5-Si(R53)2-(CH2)t5-、或是 -(CH 2 ) s5 -O-(CH 2 ) u5 -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -(CH 2 ) t5 -, or

-(CH2)s5-O-(CH2)t5-Si(R53)2-(CH2)u5-Si(R53)2-(CvH2v)- -(CH 2 ) s5 -O-(CH 2 ) t5 -Si(R 53 ) 2 -(CH 2 ) u5 -Si(R 53 ) 2 -(C v H 2v )-

式中,R53、m5、s5、t5及u5與上述為相同涵義,v5為1至20的整數,較佳為2至6的整數,尤佳為2至3的整數。 In the formula, R 53 , m5, s5, t5 and u5 have the same meaning as above, and v5 is an integer from 1 to 20, preferably an integer from 2 to 6, particularly preferably an integer from 2 to 3.

上述式中,-(CvH2v)-可為直鏈或分枝鏈,例如可為-CH2CH2-、-CH2CH2CH2-、-CH(CH3)-、-CH(CH3)CH2-。 In the above formula, -(C v H 2v )- can be a straight chain or a branched chain, for example, it can be -CH 2 CH 2 -, -CH 2 CH 2 CH 2 -, -CH(CH 3 )-, -CH (CH 3 )CH 2 -.

上述XA可分別獨立地經選自氟原子、C1-3烷基及C1-3氟烷基(較佳為C1-3全氟烷基)之1個或多於1個的取代基所取代。於一樣態中,XA為非取代。 The above - mentioned replaced by base. In one state, X A is unsubstituted.

於一樣態中,XA可分別獨立地為-O-C1-6伸烷基以外者。 In one form, X A can each independently be other than -OC 1-6 alkylene group.

於其他樣態中,XA可列舉例如下述基: In other aspects, X A may include, for example, the following groups:

Figure 112115596-A0202-12-0057-13
Figure 112115596-A0202-12-0057-13

Figure 112115596-A0202-12-0057-14
Figure 112115596-A0202-12-0057-14

Figure 112115596-A0202-12-0057-15
Figure 112115596-A0202-12-0057-15

Figure 112115596-A0202-12-0057-16
Figure 112115596-A0202-12-0057-16

Figure 112115596-A0202-12-0057-17
Figure 112115596-A0202-12-0057-17

Figure 112115596-A0202-12-0057-18
Figure 112115596-A0202-12-0057-18

Figure 112115596-A0202-12-0057-19
Figure 112115596-A0202-12-0057-19

式中,R41分別獨立地為氫原子、苯基、碳數1至6的烷基或C1-6烷氧基,較佳為甲基, In the formula, R 41 is independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms or a C 1-6 alkoxy group, preferably a methyl group,

D為選自下列式之基: D is a basis selected from the following formulas:

-CH2O(CH2)2-、 -CH 2 O(CH 2 ) 2 -,

-CH2O(CH2)3-、 -CH 2 O(CH 2 ) 3 -,

-CF2O(CH2)3-、 -CF 2 O(CH 2 ) 3 -,

-(CH2)2-、 -(CH 2 ) 2 -,

-(CH2)3-、 -(CH 2 ) 3 -,

-(CH2)4-、 -(CH 2 ) 4 -,

-CONH-(CH2)3-、 -CONH-(CH 2 ) 3 -,

-CON(CH3)-(CH2)3-、 -CON(CH 3 )-(CH 2 ) 3 -,

-CON(Ph)-(CH2)3-(式中,Ph意指苯基)、以及 -CON(Ph)-(CH 2 ) 3 -(where Ph means phenyl), and

Figure 112115596-A0202-12-0058-20
Figure 112115596-A0202-12-0058-20

式中,R42分別獨立地表示氫原子、C1-6的烷基或C1-6的烷氧基,較佳為甲基或甲氧基,尤佳為甲基; In the formula, R 42 independently represents a hydrogen atom, a C 1-6 alkyl group or a C 1-6 alkoxy group, preferably a methyl group or a methoxy group, especially a methyl group;

E為-(CH2)n-(n為2至6的整數), E is -(CH 2 ) n -(n is an integer from 2 to 6),

D為鍵結至分子主鏈的RFA1或RFA2,E為鍵結至RSiD is R FA1 or R FA2 bonded to the main chain of the molecule, and E is bonded to R Si .

上述XA的具體例可列舉例如: Specific examples of the above-mentioned X A include, for example:

單鍵、 single key,

-CH2OCH2-、 -CH 2 OCH 2 -,

-CH2O(CH2)2-、 -CH 2 O(CH 2 ) 2 -,

-CH2O(CH2)3-、 -CH 2 O(CH 2 ) 3 -,

-CH2O(CH2)4-、 -CH 2 O(CH 2 ) 4 -,

-CH2O(CH2)5-、 -CH 2 O(CH 2 ) 5 -,

-CH2O(CH2)6-、 -CH 2 O(CH 2 ) 6 -,

-CH2O(CH2)3Si(CH3)2OSi(CH3)2(CH2)2-、 -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 OSi(CH 3 ) 2 (CH 2 ) 2 -,

-CH2O(CH2)3Si(CH3)2OSi(CH3)2OSi(CH3)2(CH2)2-、 -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 OSi(CH 3 ) 2 OSi(CH 3 ) 2 (CH 2 ) 2 -,

-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)2Si(CH3)2(CH2)2-、 -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 2 Si(CH 3 ) 2 (CH 2 ) 2 -,

-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)3Si(CH3)2(CH2)2-、 -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 3 Si(CH 3 ) 2 (CH 2 ) 2 -,

-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)10Si(CH3)2(CH2)2-、 -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 10 Si(CH 3 ) 2 (CH 2 ) 2 -,

-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)20Si(CH3)2(CH2)2-、 -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 20 Si(CH 3 ) 2 (CH 2 ) 2 -,

-CH2OCF2CHFOCF2-、 -CH 2 OCF 2 CHFOCF 2 -,

-CH2OCF2CHFOCF2CF2-、 -CH 2 OCF 2 CHFOCF 2 CF 2 -,

-CH2OCF2CHFOCF2CF2CF2-、 -CH 2 OCF 2 CHFOCF 2 CF 2 CF 2 -,

-CH2OCH2CF2CF2OCF2-、 -CH 2 OCH 2 CF 2 CF 2 OCF 2 -,

-CH2OCH2CF2CF2OCF2CF2-、 -CH 2 OCH 2 CF 2 CF 2 OCF 2 CF 2 -,

-CH2OCH2CF2CF2OCF2CF2CF2-、 -CH 2 OCH 2 CF 2 CF 2 OCF 2 CF 2 CF 2 -,

-CH2OCH2CF2CF2OCF(CF3)CF2OCF2-、 -CH 2 OCH 2 CF 2 CF 2 OCF (CF 3 )CF 2 OCF 2 -,

-CH2OCH2CF2CF2OCF(CF3)CF2OCF2CF2-、 -CH 2 OCH 2 CF 2 CF 2 OCF (CF 3 )CF 2 OCF 2 CF 2 -,

-CH2OCH2CF2CF2OCF(CF3)CF2OCF2CF2CF2-、 -CH 2 OCH 2 CF 2 CF 2 OCF (CF 3 )CF 2 OCF 2 CF 2 CF 2 -,

-CH2OCH2CHFCF2OCF2-、 -CH 2 OCH 2 CHFCF 2 OCF 2 -,

-CH2OCH2CHFCF2OCF2CF2-、 -CH 2 OCH 2 CHFCF 2 OCF 2 CF 2 -,

-CH2OCH2CHFCF2OCF2CF2CF2-、 -CH 2 OCH 2 CHFCF 2 OCF 2 CF 2 CF 2 -,

-CH2OCH2CHFCF2OCF(CF3)CF2OCF2-、 -CH 2 OCH 2 CHFCF 2 OCF(CF 3 )CF 2 OCF 2 -,

-CH2OCH2CHFCF2OCF(CF3)CF2OCF2CF2-、 -CH 2 OCH 2 CHFCF 2 OCF(CF 3 )CF 2 OCF 2 CF 2 -,

-CH2OCH2CHFCF2OCF(CF3)CF2OCF2CF2CF2-、 -CH 2 OCH 2 CHFCF 2 OCF(CF 3 )CF 2 OCF 2 CF 2 CF 2 -,

-CH2OCF2CHFOCF2CF2CF2-C(O)NH-CH2-、 -CH 2 OCF 2 CHFOCF 2 CF 2 CF 2 -C(O)NH-CH 2 -,

-CH2OCH2(CH2)7CH2Si(OCH3)2OSi(OCH3)2(CH2)2Si(OCH3)2OSi(OCH3)2(CH2)2-、 -CH 2 OCH 2 (CH 2 ) 7 CH 2 Si(OCH 3 ) 2 OSi(OCH 3 ) 2 (CH 2 ) 2 Si(OCH 3 ) 2 OSi(OCH 3 ) 2 (CH 2 ) 2 -,

-CH2OCH2CH2CH2Si(OCH3)2OSi(OCH3)2(CH2)3-、 -CH 2 OCH 2 CH 2 CH 2 Si(OCH 3 ) 2 OSi(OCH 3 ) 2 (CH 2 ) 3 -,

-CH2OCH2CH2CH2Si(OCH2CH3)2OSi(OCH2CH3)2(CH2)3-、 -CH 2 OCH 2 CH 2 CH 2 Si(OCH 2 CH 3 ) 2 OSi(OCH 2 CH 3 ) 2 (CH 2 ) 3 -,

-CH2OCH2CH2CH2Si(OCH3)2OSi(OCH3)2(CH2)2-、 -CH 2 OCH 2 CH 2 CH 2 Si(OCH 3 ) 2 OSi(OCH 3 ) 2 (CH 2 ) 2 -,

-CH2OCH2CH2CH2Si(OCH2CH3)2OSi(OCH2CH3)2(CH2)2-、 -CH 2 OCH 2 CH 2 CH 2 Si(OCH 2 CH 3 ) 2 OSi(OCH 2 CH 3 ) 2 (CH 2 ) 2 -,

-(CH2)2-Si(CH3)2-(CH2)2-、 -(CH 2 ) 2 -Si(CH 3 ) 2 -(CH 2 ) 2 -,

-CH2-、 -CH 2 -,

-(CH2)2-、 -(CH 2 ) 2 -,

-(CH2)3-、 -(CH 2 ) 3 -,

-(CH2)4-、 -(CH 2 ) 4 -,

-(CH2)5-、 -(CH 2 ) 5 -,

-(CH2)6-、 -(CH 2 ) 6 -,

-CO-、 -CO-、

-CONH-、 -CONH-、

-CONH-CH2-、 -CONH-CH 2 -,

-CONH-(CH2)2-、 -CONH-(CH 2 ) 2 -,

-CONH-(CH2)3-、 -CONH-(CH 2 ) 3 -,

-CONH-(CH2)4-、 -CONH-(CH 2 ) 4 -,

-CONH-(CH2)5-、 -CONH-(CH 2 ) 5 -,

-CONH-(CH2)6-、 -CONH-(CH 2 ) 6 -,

-CON(CH3)-CH2-、 -CON(CH 3 )-CH 2 -,

-CON(CH3)-(CH2)2-、 -CON(CH 3 )-(CH 2 ) 2 -,

-CON(CH3)-(CH2)3-、 -CON(CH 3 )-(CH 2 ) 3 -,

-CON(CH3)-(CH2)4-、 -CON(CH 3 )-(CH 2 ) 4 -,

-CON(CH3)-(CH2)5-、 -CON(CH 3 )-(CH 2 ) 5 -,

-CON(CH3)-(CH2)6-、 -CON(CH 3 )-(CH 2 ) 6 -,

-CON(Ph)-CH2-(式中,Ph意指苯基)、 -CON(Ph)-CH 2 -(where Ph means phenyl),

-CON(Ph)-(CH2)2-(式中,Ph意指苯基)、 -CON(Ph)-(CH 2 ) 2 -(where Ph means phenyl),

-CON(Ph)-(CH2)3-(式中,Ph意指苯基)、 -CON(Ph)-(CH 2 ) 3 -(where Ph means phenyl),

-CON(Ph)-(CH2)4-(式中,Ph意指苯基)、 -CON(Ph)-(CH 2 ) 4 -(where Ph means phenyl),

-CON(Ph)-(CH2)5-(式中,Ph意指苯基)、 -CON(Ph)-(CH 2 ) 5 -(where Ph means phenyl),

-CON(Ph)-(CH2)6-(式中,Ph意指苯基)、 -CON(Ph)-(CH 2 ) 6 -(where Ph means phenyl),

-CONH-(CH2)2NH(CH2)3-、 -CONH-(CH 2 ) 2 NH(CH 2 ) 3 -,

-CONH-(CH2)6NH(CH2)3-、 -CONH-(CH 2 ) 6 NH(CH 2 ) 3 -,

-CH2O-CONH-(CH2)3-、 -CH 2 O-CONH-(CH 2 ) 3 -,

-CH2O-CONH-(CH2)6-、 -CH 2 O-CONH-(CH 2 ) 6 -,

-S-(CH2)3-、 -S-(CH 2 ) 3 -,

-(CH2)2S(CH2)3-、 -(CH 2 ) 2 S(CH 2 ) 3 -,

-CONH-(CH2)3Si(CH3)2OSi(CH3)2(CH2)2-、 -CONH-(CH 2 ) 3 Si(CH 3 ) 2 OSi(CH 3 ) 2 (CH 2 ) 2 -,

-CONH-(CH2)3Si(CH3)2OSi(CH3)2OSi(CH3)2(CH2)2-、 -CONH-(CH 2 ) 3 Si(CH 3 ) 2 OSi(CH 3 ) 2 OSi(CH 3 ) 2 (CH 2 ) 2 -,

-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)2Si(CH3)2(CH2)2-、 -CONH-(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 2 Si(CH 3 ) 2 (CH 2 ) 2 -,

-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)3Si(CH3)2(CH2)2-、 -CONH-(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 3 Si(CH 3 ) 2 (CH 2 ) 2 -,

-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)10Si(CH3)2(CH2)2-、 -CONH-(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 10 Si(CH 3 ) 2 (CH 2 ) 2 -,

-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)20Si(CH3)2(CH2)2-、 -CONH-(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 20 Si(CH 3 ) 2 (CH 2 ) 2 -,

-C(O)O-(CH2)3-、 -C(O)O-(CH 2 ) 3 -,

-C(O)O-(CH2)6-、 -C(O)O-(CH 2 ) 6 -,

-CH2-O-(CH2)3-Si(CH3)2-(CH2)2-Si(CH3)2-(CH2)2-、 -CH 2 -O-(CH 2 ) 3 -Si(CH 3 ) 2 -(CH 2 ) 2 -Si(CH 3 ) 2 -(CH 2 ) 2 -,

-CH2-O-(CH2)3-Si(CH3)2-(CH2)2-Si(CH3)2-CH(CH3)-、 -CH 2 -O-(CH 2 ) 3 -Si(CH 3 ) 2 -(CH 2 ) 2 -Si(CH 3 ) 2 -CH(CH 3 )-,

-CH2-O-(CH2)3-Si(CH3)2-(CH2)2-Si(CH3)2-(CH2)3-、 -CH 2 -O-(CH 2 ) 3 -Si(CH 3 ) 2 -(CH 2 ) 2 -Si(CH 3 ) 2 -(CH 2 ) 3 -,

-CH2-O-(CH2)3-Si(CH3)2-(CH2)2-Si(CH3)2-CH(CH3)-CH2-、 -CH 2 -O-(CH 2 ) 3 -Si(CH 3 ) 2 -(CH 2 ) 2 -Si(CH 3 ) 2 -CH(CH 3 )-CH 2 -,

-OCH2-、 -OCH 2 -,

-O(CH2)3-、 -O(CH 2 ) 3 -,

-OCFHCF2-、以及 -OCFHCF 2 -, and

Figure 112115596-A0202-12-0062-21
Figure 112115596-A0202-12-0062-21

等。 wait.

於另外的樣態中,XA分別獨立地為以式:-(R16)x1-(CFR17)y1-(CH2)z1-所表示之基。式中,x1、y1及z1分別獨立地為0至10的整數,x1、y1及z1之和為1以上,以括弧括起之各重複單元的存在順序於式中為任意。 In other aspects, X A are each independently a base represented by the formula: -(R 16 ) x1 -(CFR 17 ) y1 -(CH 2 ) z1 -. In the formula, x1, y1 and z1 are each independently an integer from 0 to 10, and the sum of x1, y1 and z1 is more than 1. The order of existence of the repeating units enclosed in brackets is arbitrary in the formula.

上述式中,R16分別獨立地為氧原子、伸苯基、伸咔唑基(Carbazolylene)、-NR18-(式中,R18表示氫原子或有機基)或2價有機基。R18較佳為氧原子或2價極性基。 In the above formula, R 16 is independently an oxygen atom, a phenyl group, a carbazolyl group (Carbazolylene), -NR 18 - (in the formula, R 18 represents a hydrogen atom or an organic group) or a divalent organic group. R 18 is preferably an oxygen atom or a divalent polar group.

上述「2價極性基」並無特別限定,可列舉-C(O)-、-C(=NR19)-及-C(O)NR19-(此等式中,R19表示氫原子或低級烷基)。該「低級烷基」例如為碳數1至6的烷基,例如甲基、乙基、正丙基,此等可經1個或多於1個的氟原子所取代。 The above "divalent polar group" is not particularly limited, and examples thereof include -C(O)-, -C(=NR 19 )- and -C(O)NR 19 - (in this equation, R 19 represents a hydrogen atom or lower alkyl). The "lower alkyl group" is, for example, an alkyl group having 1 to 6 carbon atoms, such as methyl, ethyl, n-propyl, which may be substituted by one or more fluorine atoms.

上述式中,R17分別獨立地為氫原子、氟原子或低級氟烷基,較佳為氟原子。該「低級氟烷基」例如為碳數1至6,較佳為碳數1至3的氟烷基,較佳為碳數1至3的全氟烷基,尤佳為三氟甲基、五氟乙基,更佳為三氟甲基。 In the above formula, R 17 is each independently a hydrogen atom, a fluorine atom or a lower fluoroalkyl group, preferably a fluorine atom. The "lower fluoroalkyl group" is, for example, a fluoroalkyl group having 1 to 6 carbon atoms, preferably a fluoroalkyl group having 1 to 3 carbon atoms, preferably a perfluoroalkyl group having 1 to 3 carbon atoms, especially trifluoromethyl, Pentafluoroethyl, more preferably trifluoromethyl.

上述XA之各式的左側鍵結至RFA1或RFA2,右側鍵結至RSiThe left side of each of the above X A formulas is bonded to R FA1 or R FA2 , and the right side is bonded to R Si .

於另外的樣態中,XA的例子可列舉下述基: In other aspects, examples of X A include the following radicals:

Figure 112115596-A0202-12-0064-22
Figure 112115596-A0202-12-0064-22

式中, In the formula,

R41分別獨立地為氫原子、苯基、碳數1至6的烷基或C1-6烷氧基,較佳為甲基, R 41 is independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms or a C 1-6 alkoxy group, preferably a methyl group,

於各XA基中,T中的任意數個為鍵結至分子主鏈的RFA1或RFA2之下列基: In each X A group, any number of T is the following group of R FA1 or R FA2 bonded to the main chain of the molecule:

-CH2O(CH2)2-、 -CH 2 O(CH 2 ) 2 -,

-CH2O(CH2)3-、 -CH 2 O(CH 2 ) 3 -,

-CF2O(CH2)3-、 -CF 2 O(CH 2 ) 3 -,

-(CH2)2-、 -(CH 2 ) 2 -、

-(CH2)3-、 -(CH 2 ) 3 -,

-(CH2)4-、 -(CH 2 ) 4 -,

-CONH-(CH2)3-、 -CONH-(CH 2 ) 3 -,

-CON(CH3)-(CH2)3-、 -CON(CH 3 )-(CH 2 ) 3 -,

-CON(Ph)-(CH2)3-(式中,Ph意指苯基)、或是 -CON(Ph)-(CH 2 ) 3 -(where Ph means phenyl), or

Figure 112115596-A0202-12-0065-23
Figure 112115596-A0202-12-0065-23

式中,R42分別獨立地表示氫原子、C1-6的烷基或C1-6的烷氧基,較佳為甲基或甲氧基,尤佳為甲基; In the formula, R 42 independently represents a hydrogen atom, a C 1-6 alkyl group or a C 1-6 alkoxy group, preferably a methyl group or a methoxy group, especially a methyl group;

於其他T的數個鍵結至分子主鏈的RSi而存在之情形時,剩餘的T分別獨立地為甲基、苯基、C1-6烷氧基或自由基捕集基或是紫外線吸收基。 In the case where several other T's are bonded to R Si in the main chain of the molecule, the remaining T's are independently methyl, phenyl, C 1-6 alkoxy, free radical trapping groups or ultraviolet rays Absorbent base.

自由基捕集基只要是可捕集藉由光照射所產生之自由基者,就無特別限定,可列舉例如:二苯基酮類、苯并三唑類、苄酸酯類、柳酸苯酯類、巴豆酸類、丙二酸酯類、有機丙烯酸酯類、受阻胺類、受阻酚類或三嗪類的殘餘基。 The radical trapping group is not particularly limited as long as it can trap free radicals generated by light irradiation. Examples thereof include benzophenones, benzotriazoles, benzyl esters, and salicyl benzene. Residual groups of esters, crotonic acids, malonates, organic acrylates, hindered amines, hindered phenols or triazines.

紫外線吸收基只要是可吸收紫外線者,就無特別限定,可列舉例如:苯并三唑類、羥基二苯基酮類、取代及未取代苄酸或柳酸化合物的酯類、丙烯酸酯或桂皮酸烷氧酯類、草醯胺(Oxamide)類、草醯苯胺(Oxanilide)類、苯并

Figure 112115596-A0202-12-0065-39
酮(Benzoxazinone)類、苯并
Figure 112115596-A0202-12-0065-40
唑(Benzoxazole)類的殘餘基。 The ultraviolet absorbing group is not particularly limited as long as it can absorb ultraviolet rays, and examples thereof include benzotriazoles, hydroxydiphenylketones, esters of substituted and unsubstituted benzyl acid or salicylic acid compounds, acrylates, and cinnamon. Acid alkoxyesters, oxamides, oxanilides, benzo
Figure 112115596-A0202-12-0065-39
Ketones (Benzoxazinone), benzo
Figure 112115596-A0202-12-0065-40
Residual groups of Benzoxazoles.

於較佳樣態中,較佳的自由基捕集基或紫外線吸收基可列舉下列結構式。 In a preferred embodiment, preferred free radical trapping groups or ultraviolet absorbing groups include the following structural formulas.

Figure 112115596-A0202-12-0066-24
Figure 112115596-A0202-12-0066-24

於此樣態中,XA可分別獨立地為3至10價基。 In this aspect, X A can independently range from 3 to 10 valence bases.

於另外的樣態中,XA的例子可列舉下述基: In other aspects, examples of X A include the following radicals:

Figure 112115596-A0202-12-0066-38
Figure 112115596-A0202-12-0066-38

式中,R25、R26及R27分別獨立地為2至6價有機基, In the formula, R 25 , R 26 and R 27 are independently 2 to 6 valent organic groups,

R25鍵結至至少1個RFA1或RFA2,R26及R27分別鍵結至至少1個RSiR 25 is bonded to at least one R FA1 or R FA2 , and R 26 and R 27 are each bonded to at least one R Si .

於一樣態中,R25為單鍵、C1-20伸烷基、C3-20環伸烷基、C5-20伸芳基、-R57-X58-R59-、-X58-R59-或-R57-X58-。上述R57及R59分別獨立地為單鍵、C1-20伸烷基、C3-20環伸烷基或C5-20伸芳基。上述X58為-O-、-S-、-CO-、-O-CO-或-COO-。 In one form, R 25 is a single bond, C 1-20 alkylene group, C 3-20 cycloalkylene group, C 5-20 aryl group, -R 57 -X 58 -R 59 -, -X 58 -R 59 - or -R 57 -X 58 -. The above-mentioned R 57 and R 59 are each independently a single bond, a C 1-20 alkylene group, a C 3-20 cycloalkylene group or a C 5-20 aryl group. The above X 58 is -O-, -S-, -CO-, -O-CO- or -COO-.

於一樣態中,R26及R27分別獨立地為烴、或是於烴的端部或主鏈中具有選自N、O及S之至少1個原子的基,較佳可列舉C1-6烷基、-R36-R37-R36-、-R36-CHR38 2-等。在此,R36分別獨立地為單鍵或碳數1至6的烷基,較佳為碳數1至6的烷基。R37為N、O或S,較佳為N或O。R38為-R45-R46-R45-、-R46-R45-或-R45-R46-。在此,R45分別獨立地為碳數1至6的烷基。R46為N、O或S,較佳為O。 In one aspect, R 26 and R 27 are each independently a hydrocarbon, or a group having at least 1 atom selected from N, O and S in the terminal or main chain of the hydrocarbon, preferably C 1- 6 alkyl, -R 36 -R 37 -R 36 -, -R 36 -CHR 38 2 -, etc. Here, R 36 is each independently a single bond or an alkyl group having 1 to 6 carbon atoms, preferably an alkyl group having 1 to 6 carbon atoms. R 37 is N, O or S, preferably N or O. R 38 is -R 45 -R 46 -R 45 -, -R 46 -R 45 - or -R 45 -R 46 -. Here, R 45 is each independently an alkyl group having 1 to 6 carbon atoms. R 46 is N, O or S, preferably O.

於此樣態中,XA可分別獨立地為3至10價基。 In this aspect, X A can independently range from 3 to 10 valence bases.

於另外的樣態中,XA為以下述式所表示之基: In another aspect, X A is a radical represented by:

Figure 112115596-A0202-12-0067-25
Figure 112115596-A0202-12-0067-25

式中,Xa為單鍵或2價有機基。 In the formula, X a is a single bond or a divalent organic group.

上述Xa為直接鍵結至異三聚氰酸環之單鍵或二價連結基。Xa較佳為含有單鍵、伸烷基、或是選自由醚鍵、酯鍵、醯胺鍵及硫化基鍵所組成之群組的至少1種鍵之二價基,尤佳為含有單鍵、碳數1至10的伸烷基、或是選自由醚鍵、酯鍵、醯胺鍵及硫化基鍵所組成之群組的至少1種鍵之碳數1至10的二價烴基。 The above-mentioned X a is a single bond or a divalent linking group directly bonded to the isocyanuric acid ring. X a is preferably a divalent group containing a single bond, an alkylene group, or at least one bond selected from the group consisting of an ether bond, an ester bond, an amide bond and a sulfide bond, and particularly preferably bond, an alkylene group having 1 to 10 carbon atoms, or a divalent hydrocarbon group having 1 to 10 carbon atoms that is at least one bond selected from the group consisting of an ether bond, an ester bond, an amide bond, and a sulfide bond.

Xa更佳為以下述式所表示之基: X a is more preferably a base represented by the following formula:

-(CX121X122)x1-(Xa1)y1-(CX123X124)z1- -(CX 121 X 122 ) x1 -(X a1 ) y1 -(CX 123 X 124 ) z1 -

式中,X121至X124分別獨立地為H、F、OH或-OSi(OR121)3(式中,3個R121分別獨立地為碳數1至4的烷基), In the formula , X 121 to

上述Xa1為-C(=O)NH-、-NHC(=O)-、-O-、-C(=O)O-、-OC(=O)-、-OC(=O)O-或-NHC(=O)NH-(各鍵的左側鍵結至CX121X122), The above X a1 is -C(=O)NH-, -NHC(=O)-, -O-, -C(=O)O-, -OC(=O)-, -OC(=O)O- or -NHC(=O)NH-(the left side of each bond is bonded to CX 121 X 122 ),

x1為0至10的整數,y1為0或1,z1為1至10的整數。 x1 is an integer from 0 to 10, y1 is 0 or 1, and z1 is an integer from 1 to 10.

上述Xa1較佳為-O-或-C(=O)O-。 The above-mentioned X a1 is preferably -O- or -C(=O)O-.

上述Xa特佳為以下述式所表示之基: The above-mentioned X a is preferably a base represented by the following formula:

-(CF2)m11-(CH2)m12-O-(CH2)m13- -(CF 2 ) m11 -(CH 2 ) m12 -O-(CH 2 ) m13 -

式中,m11為1至3的整數,m12為1至3的整數,m13為1至3的整數;或 In the formula, m11 is an integer from 1 to 3, m12 is an integer from 1 to 3, and m13 is an integer from 1 to 3; or

以下述式所表示之基: The basis represented by the following formula:

-(CF2)m14-(CH2)m15-O-CH2CH(OH)-(CH2)m16- -(CF 2 ) m14 -(CH 2 ) m15 -O-CH 2 CH(OH)-(CH 2 ) m16 -

式中,m14為1至3的整數,m15為1至3的整數,m16為1至3的整數;或 In the formula, m14 is an integer from 1 to 3, m15 is an integer from 1 to 3, and m16 is an integer from 1 to 3; or

以下述式所表示之基: The basis represented by the following formula:

-(CF2)m17-(CH2)m18- -(CF 2 ) m17 -(CH 2 ) m18 -

式中,m17為1至3的整數,m18為1至3的整數;或 In the formula, m17 is an integer from 1 to 3, m18 is an integer from 1 to 3; or

以下述式所表示之基: The basis represented by the following formula:

-(CF2)m19-(CH2)m20-O-CH2CH(OSi(OCH3)3)-(CH2)m21- -(CF 2 ) m19 -(CH 2 ) m20 -O-CH 2 CH(OSi(OCH 3 ) 3 )-(CH 2 ) m21 -

式中,m19為1至3的整數,m20為1至3的整數,m21為1至3的整數;或是 In the formula, m19 is an integer from 1 to 3, m20 is an integer from 1 to 3, m21 is an integer from 1 to 3; or

以下述式所表示之基: The basis represented by the following formula:

-(CH2)m22- -(CH 2 ) m22 -

式中,m22為1至3的整數。 In the formula, m22 is an integer from 1 to 3.

上述Xa並無特別限定,具體而言可列舉: The above-mentioned X a is not particularly limited, and specific examples include:

-CH2-、-C2H4-、-C3H6-、-C4H8-、-C4H8-O-CH2-、-CO-O-CH2-CH(OH)-CH2-、-(CF2)n5-(n5為0至4的整數)、-(CF2)n5-(CH2)m5-(n5及m5分別獨立地為0至4的整數)、-CF2CF2CH2OCH2CH(OH)CH2-、-CF2CF2CH2OCH2CH(OSi(OCH3)3)CH2-等。 -CH 2 -, -C 2 H 4 -, -C 3 H 6 -, -C 4 H 8 -, -C 4 H 8 -O-CH 2 -, -CO-O-CH 2 -CH(OH) -CH 2 -, -(CF 2 ) n5 -(n5 is an integer from 0 to 4), -(CF 2 ) n5 -(CH 2 ) m5 -(n5 and m5 are independently an integer from 0 to 4), -CF 2 CF 2 CH 2 OCH 2 CH(OH)CH 2 -, -CF 2 CF 2 CH 2 OCH 2 CH(OSi(OCH 3 ) 3 )CH 2 -etc.

於此樣態中,XA可分別獨立地為2或3價基。 In this aspect, X A can be independently a 2- or 3-valent base.

於一樣態中,以式(A1)或式(A2)所表示之含氟聚醚基之矽烷化合物不含矽氧烷鍵(-Si-O-Si-)。 In one aspect, the fluorine polyether group-containing silane compound represented by formula (A1) or formula (A2) does not contain a siloxane bond (-Si-O-Si-).

以式(A1)或式(A2)所表示之含氟聚醚基之矽烷化合物並無特別限定,可具有5×102至1×105的數量平均分子量。於該範圍中,具有2,000至32,000,尤佳為2,500至12,000的數量平均分子量者,從摩擦耐久性之觀點來看為佳。含氟聚醚基之矽烷化合物的數量平均分子量係設成為藉由19F-NMR所測定之值。 The fluorine polyether group-containing silane compound represented by formula (A1) or formula (A2) is not particularly limited, and may have a number average molecular weight of 5×10 2 to 1×10 5 . Within this range, those having a number average molecular weight of 2,000 to 32,000, particularly preferably 2,500 to 12,000 are preferred from the viewpoint of friction durability. The number average molecular weight of the silane compound containing a fluorine polyether group is a value measured by 19 F-NMR.

於一樣態中,以式(A1)或式(A2)所表示之含氟聚醚基之矽烷化合物的數量平均分子量為500至30,000,較佳為1,000至20,000,尤佳為2,000至15,000,再更佳為2,000至10,000,例如可為3,000至6,000。 In one aspect, the number average molecular weight of the fluorine-containing polyether group silane compound represented by formula (A1) or formula (A2) is 500 to 30,000, preferably 1,000 to 20,000, particularly preferably 2,000 to 15,000, and further More preferably, it is 2,000 to 10,000, for example, it can be 3,000 to 6,000.

於其他樣態中,以式(A1)或式(A2)所表示之含氟聚醚基之矽烷化合物的數量平均分子量為4,000至30,000,較佳為5,000至10,000,尤佳可為6,000至10,000。 In other aspects, the number average molecular weight of the fluorine-containing polyether group silane compound represented by formula (A1) or formula (A2) is 4,000 to 30,000, preferably 5,000 to 10,000, particularly preferably 6,000 to 10,000 .

於一樣態中,本揭示之表面處理劑中,含氟聚醚基之矽烷化合物為以式(A1)所表示之化合物。 In one aspect, in the surface treatment agent of the present disclosure, the silane compound containing a fluoropolyether group is a compound represented by formula (A1).

於其他樣態中,本揭示之表面處理劑中,含氟聚醚基之矽烷化合物為以式(A2)所表示之化合物。 In other aspects, in the surface treatment agent of the present disclosure, the silane compound containing a fluoropolyether group is a compound represented by formula (A2).

於其他樣態中,本揭示之表面處理劑中,含氟聚醚基之矽烷化合物為以式(A1)所表示之化合物及式(A2)所表示之化合物。 In other aspects, in the surface treatment agent of the present disclosure, the fluorine-containing polyether group silane compound is a compound represented by formula (A1) and a compound represented by formula (A2).

於其他樣態中,本揭示之表面處理劑中,以式(A1)所表示之化合物及以式(A2)所表示之化合物可分別或是相互部分地縮合。亦即以式(A1)所表示之化合物彼此、以式(A2)所表示之化合物彼此、或是在以式(A1)所表示之化合物及以式(A2)所表示之化合物之間,亦可在經部分地縮合之狀態下存在。因此,本揭示之表面處理劑可含有:以式(A1)所表示之化合 物的部分縮合物、以式(A2)所表示之化合物的部分縮合物、或是以式(A1)所表示之化合物與以式(A2)所表示之化合物的部分縮合物。 In other aspects, in the surface treatment agent of the present disclosure, the compound represented by formula (A1) and the compound represented by formula (A2) may be separately or partially condensed with each other. That is, between compounds represented by formula (A1), between compounds represented by formula (A2), or between compounds represented by formula (A1) and compounds represented by formula (A2), also Can exist in a partially condensed state. Therefore, the surface treatment agent of the present disclosure may contain: a compound represented by formula (A1) A partial condensate of a compound represented by formula (A2), or a partial condensate of a compound represented by formula (A1) and a compound represented by formula (A2).

本揭示之表面處理劑中,相對於以式(A1)所表示之化合物與以式(A2)所表示之化合物之合計,以式(A2)所表示之化合物較佳為0.1莫耳%以上35莫耳%以下。相對於以式(A1)所表示之化合物與以式(A2)所表示之化合物之合計,以式(A2)所表示之化合物之含量的下限較佳為0.1莫耳%,尤佳為0.2莫耳%,更佳為0.5莫耳%,再更佳為1莫耳%,特佳為2莫耳%,尤其可為5莫耳%。相對於以式(A1)所表示之化合物與以式(A2)所表示之化合物之合計,以式(A2)所表示之化合物之含量的上限較佳為35莫耳%,尤佳為30莫耳%,更佳為20莫耳%,再更佳可為15莫耳%或10莫耳%。相對於以式(A1)所表示之化合物與以式(A2)所表示之化合物之合計,以式(A2)所表示之化合物較佳為0.1莫耳%以上30莫耳%以下,尤佳為0.1莫耳%以上20莫耳%以下,更佳為0.2莫耳%以上10莫耳%以下,再更佳為0.5莫耳%以上10莫耳%以下,特佳為1莫耳%以上10莫耳%以下,例如為2莫耳%以上10莫耳%以下或5莫耳%以上10莫耳%以下。藉由將以式(A2)所表示之化合物設成為該範圍,可進一步提升摩擦耐久性。 In the surface treatment agent of the present disclosure, the compound represented by formula (A2) is preferably 0.1 mol% or more 35 based on the total of the compound represented by formula (A1) and the compound represented by formula (A2). Mol% or less. The lower limit of the content of the compound represented by formula (A2) is preferably 0.1 mol%, particularly preferably 0.2 mol%, based on the total of the compound represented by formula (A1) and the compound represented by formula (A2). %, more preferably 0.5 mol%, still more preferably 1 mol%, particularly preferably 2 mol%, especially 5 mol%. The upper limit of the content of the compound represented by formula (A2) is preferably 35 mol%, particularly preferably 30 mol%, relative to the total of the compound represented by formula (A1) and the compound represented by formula (A2). %, preferably 20 mol%, and even more preferably 15 mol% or 10 mol%. The compound represented by formula (A2) is preferably 0.1 mol% or more and 30 mol% or less based on the total of the compound represented by formula (A1) and the compound represented by formula (A2), and particularly preferably 0.1 mol% or more and 20 mol% or less, more preferably 0.2 mol% or more and 10 mol% or less, still more preferably 0.5 mol% or more and 10 mol% or less, particularly preferably 1 mol% or more and 10 mol% or less. % or less, for example, 2 mol% or more and 10 mol% or less or 5 mol% or more and 10 mol% or less. By setting the compound represented by formula (A2) within this range, friction durability can be further improved.

上述以式(A1)或(A2)所表示之化合物可藉由例如上述專利文獻1、日本國際公開第2006/10708號、日本特開2019-183160號公報等所記載之方法來得到。 The compound represented by the formula (A1) or (A2) can be obtained, for example, by the method described in the above-mentioned Patent Document 1, Japanese International Publication No. 2006/10708, Japanese Patent Application Laid-Open No. 2019-183160, and the like.

(含氟聚醚基之聚氧化烯化合物) (Fluorinated polyether-based polyoxyalkylene compound)

上述含氟聚醚基之聚氧化烯化合物為含有聚氧化烯基以及氟聚醚基之化合物。 The above-mentioned fluoropolyether group-containing polyoxyalkylene compound is a compound containing a polyoxyalkylene group and a fluoropolyether group.

本揭示之表面處理劑除了成分(A)之含氟聚醚基之矽烷化合物之外,藉由含有成分(B)之含氟聚醚基之聚氧化烯化合物,摩擦耐久性係進一步提升。 In addition to the fluorine-containing polyether-based silane compound of the component (A), the surface treatment agent of the present disclosure also contains the fluorine-containing polyether-based polyoxyalkylene compound of the component (B), so that the friction durability is further improved.

於一樣態中,上述含氟聚醚基之聚氧化烯化合物為以下列式(B1)或(B2)所表示之化合物: In one aspect, the above-mentioned fluorine-containing polyether group polyoxyalkylene compound is a compound represented by the following formula (B1) or (B2):

RFB1-XB-RB (B1) R FB1 -X B -R B (B1)

RB-XB-RFB2-XB-RB (B2) R B -X B -R FB2 -X B -R B (B2)

式中: In the formula:

RFB1為Rf1-RF-Oq-, R FB1 is Rf 1 -R F -O q -,

RFB2為-Rf2 p-RF-Oq-, R FB2 is -Rf 2 p -R F -O q -,

RF分別獨立地為2價氟聚醚基, R F are independently divalent fluoropolyether groups,

Rf1可經1個或多於1個的氟原子所取代之C1-16烷基, Rf 1 may be a C 1-16 alkyl group substituted by 1 or more than 1 fluorine atom,

Rf2可經1個或多於1個的氟原子所取代之C1-6伸烷基, Rf 2 may be a C 1-6 alkylene group substituted by 1 or more than 1 fluorine atom,

p為0或1, p is 0 or 1,

q分別獨立地為0或1, q is independently 0 or 1,

XB分別獨立地為單鍵或2價基, X B is independently a single bond or a divalent base,

RB分別獨立地為含氧化烯之基。 R B are each independently an alkylene oxide-containing group.

於式(B1)中,RFB1為Rf1-RF-Oq-。 In formula (B1), R FB1 is Rf 1 -R F -O q -.

於式(B2)中,RFB2為-Rf2 p-RF-Oq-。 In formula (B2), R FB2 is -Rf 2 p -R F -O q -.

式(B1)及(B2)中的RFB1及RFB2分別對應於式(A1)及(A2)中的RFA1及RFA2。式(B1)及(B2)中的Rf1-RF-Oq-及-Rf2 p-RF-Oq-與式(A1)及 (A2)中的Rf1-RF-Oq-及-Rf2 p-RF-Oq-為相同涵義,可具有同一樣態。表面處理劑中,RFB1與RFA1及RFA2與RFB2可分別相同或不同。 R FB1 and R FB2 in formulas (B1) and (B2) respectively correspond to R FA1 and R FA2 in formulas (A1) and (A2). Rf 1 -R F -O q -and -Rf 2 p -R F -O q - in formulas (B1) and (B2) and Rf 1 -R F -O q in formulas (A1) and (A2) - and -Rf 2 p -R F -O q - have the same meaning and may have the same form. Among the surface treatment agents, R FB1 and R FA1 and R FA2 and R FB2 may be the same or different, respectively.

於式(B1)及(B2)中,XB分別獨立地為單鍵或2價基。以下當中,XB的左側鍵結至RFB1或RFB2In formulas (B1) and (B2), X B is independently a single bond or a divalent group. In the following, the left side of X B is bonded to R FB1 or R FB2 .

上述2價基較佳為氧原子、硫原子、NH、CO或2價有機基,尤佳為氧原子或2價有機基,尤佳為2價有機基。 The above-mentioned divalent group is preferably an oxygen atom, a sulfur atom, NH, CO or a divalent organic group, more preferably an oxygen atom or a divalent organic group, and particularly preferably a divalent organic group.

於一樣態中,XB分別獨立地為單鍵或以-(R67)b1-(R68)b2-所表示之基, In a state, X B are independently a single bond or a base represented by -(R 67 ) b1 -(R 68 ) b2 -,

式中: In the formula:

R67分別獨立地為C1-6伸烷基, R 67 are each independently C 1-6 alkylene group,

R68分別獨立地為氧原子、硫原子、CO、NR69、CONR69、NR69CO或C6-12伸芳基, R 68 is independently an oxygen atom, a sulfur atom, CO, NR 69 , CONR 69 , NR 69 CO or C 6-12 aryl group,

R69分別獨立地為氫原子或C1-6烷基, R 69 are each independently a hydrogen atom or a C 1-6 alkyl group,

b1為0至6的整數, b1 is an integer from 0 to 6,

b2為0至6的整數, b2 is an integer from 0 to 6,

b1及b2之合計為1以上, The total of b1 and b2 is 1 or more,

標註b1或b2並以括弧括起之各重複單元的存在順序於式中為任意。 The order of existence of each repeating unit marked b1 or b2 and enclosed in parentheses is arbitrary in the formula.

XB較佳係分別獨立地為單鍵、C1-6伸烷基或-R64-O-R65-。R64為單鍵或C1-6伸烷基;R65為單鍵或C1-6伸烷基。 X B are preferably each independently a single bond, C 1-6 alkylene group or -R 64 -OR 65 -. R 64 is a single bond or C 1-6 alkylene group; R 65 is a single bond or C 1-6 alkylene group.

於一樣態中,XB分別獨立地為單鍵或C1-6伸烷基。 In one form, X B are each independently a single bond or a C 1-6 alkylene group.

於其他樣態中,XB分別獨立地為單鍵。 In other forms, X B are independently single bonds.

於其他樣態中,XB分別獨立地為C1-6伸烷基。 In other aspects, X B are each independently a C 1-6 alkylene group.

上述XB可分別獨立地經選自氟原子、C1-3烷基及C1-3氟烷基(較佳為C1-3全氟烷基)之1個或多於1個的取代基所取代。於一樣態中,XB為非取代。 The above - mentioned replaced by base. In one state, X B is non-substituted.

於式(B1)及(B2)中,RB分別獨立地為含氧化烯之基。 In formulas (B1) and (B2), R B are each independently an oxyalkylene-containing group.

上述含氧化烯之基意指含有氧化烯基(-O-伸烷基)之基。 The above-mentioned oxyalkylene-containing group means a group containing an oxyalkylene group (-O-alkylene group).

上述含氧化烯之基較佳為以下述式所表示之基: The above-mentioned oxyalkylene-containing group is preferably a group represented by the following formula:

-R61-(OR63)b3-R62、或是 -R 61 -(OR 63 ) b3 -R 62 , or

-XE(-R61-(OR63)b3-R62)r2 -X E (-R 61 -(OR 63 ) b3 -R 62 ) r2

式中: In the formula:

R61為單鍵或C1-6伸烷基, R 61 is a single bond or C 1-6 alkylene group,

R62為氫原子、C1-6烷基或C1-6烷氧基, R 62 is a hydrogen atom, C 1-6 alkyl group or C 1-6 alkoxy group,

R63分別獨立地為C1-6伸烷基, R 63 are each independently C 1-6 alkylene group,

XE為3至10價基, X E is 3 to 10 price base,

r2為2至9的整數,且較XE的價數小1。 r2 is an integer from 2 to 9, and is 1 less than the valence of X E.

於較佳樣態中,上述含氧化烯之基為-R61-(OR63)b3-R62In a preferred embodiment, the above-mentioned oxyalkylene-containing group is -R 61 -(OR 63 ) b3 -R 62 .

於其他樣態中,上述含氧化烯之基為-XE(-R61-(OR63)b3-R62)r2In other forms, the above-mentioned oxyalkylene-containing group is -X E (-R 61 -(OR 63 ) b3 -R 62 ) r2 .

於上述式中,R61為單鍵或C1-6伸烷基。 In the above formula, R 61 is a single bond or C 1-6 alkylene group.

於一樣態中,R61為單鍵。 In one form, R 61 is a single bond.

於其他樣態中,R61為C1-6伸烷基。 In other aspects, R 61 is C 1-6 alkylene.

上述R61中的C1-6伸烷基可為直鏈或分枝鏈。於一樣態中,R61中的C1-6伸烷基為直鏈。於其他樣態中,R61中的C1-6伸烷基為分枝鏈。 The C 1-6 alkylene group in the above-mentioned R 61 may be a straight chain or a branched chain. In one form, the C 1-6 alkylene group in R 61 is a straight chain. In other aspects, the C 1-6 alkylene group in R 61 is a branched chain.

上述R61中的C1-6伸烷基較佳為C1-4伸烷基,尤佳為C1-3伸烷基。 The C 1-6 alkylene group in the above-mentioned R 61 is preferably a C 1-4 alkylene group, and particularly preferably a C 1-3 alkylene group.

於上述式中,R62分別獨立地為氫原子、C1-6烷基或C1-6烷氧基。 In the above formula, R 62 is each independently a hydrogen atom, a C 1-6 alkyl group or a C 1-6 alkoxy group.

於一樣態中,R62為氫原子。 In one state, R 62 is a hydrogen atom.

於其他樣態中,R62為C1-6烷基。 In other aspects, R 62 is C 1-6 alkyl.

於其他樣態中,R62為C1-6烷氧基。 In other aspects, R 62 is C 1-6 alkoxy.

上述R62中的C1-6烷基可為直鏈或分枝鏈。於一樣態中,R62中的C1-6烷基為直鏈。於其他樣態中,R62中的C1-6烷基為分枝鏈。 The C 1-6 alkyl group in the above-mentioned R 62 may be a straight chain or a branched chain. In one form, the C 1-6 alkyl group in R 62 is a straight chain. In other aspects, the C 1-6 alkyl group in R 62 is a branched chain.

上述R62中的C1-6烷基較佳為C1-4烷基,尤佳為C1-3烷基。 The C 1-6 alkyl group in the above-mentioned R 62 is preferably a C 1-4 alkyl group, especially a C 1-3 alkyl group.

上述R62中的C1-6烷氧基可為直鏈或分枝鏈。於一樣態中,R62中的C1-6烷氧基為直鏈。於其他樣態中,R62中的C1-6烷氧基為分枝鏈。 The C 1-6 alkoxy group in the above R 62 may be a straight chain or a branched chain. In one form, the C 1-6 alkoxy group in R 62 is a straight chain. In other aspects, the C 1-6 alkoxy group in R 62 is a branched chain.

上述R62中的C1-6烷氧基較佳為C1-4烷氧基,尤佳為C1-3烷氧基。 The C 1-6 alkoxy group in the above-mentioned R 62 is preferably a C 1-4 alkoxy group, and particularly preferably a C 1-3 alkoxy group.

於上述式中,R63分別獨立地為C1-6伸烷基。 In the above formula, R 63 is each independently a C 1-6 alkylene group.

R63中的C1-6伸烷基可為直鏈或分枝鏈。於一樣態中,R63中的C1-6伸烷基為直鏈。於其他樣態中,R63中的C1-6伸烷基為分枝鏈。 The C 1-6 alkylene group in R 63 may be a straight chain or a branched chain. In one form, the C 1-6 alkylene group in R 63 is a straight chain. In other aspects, the C 1-6 alkylene group in R 63 is a branched chain.

上述C1-6伸烷基較佳為C1-3伸烷基,尤佳為C2-3伸烷基。 The above-mentioned C 1-6 alkylene group is preferably a C 1-3 alkylene group, and particularly preferably a C 2-3 alkylene group.

b3為1至6的整數,較佳為1至4的整數,例如可為1至3、1至2或2至4的整數。 b3 is an integer from 1 to 6, preferably an integer from 1 to 4, for example, it can be an integer from 1 to 3, 1 to 2 or 2 to 4.

於上述式中,XE為3至10價基,較佳為3至6價基。 In the above formula, X E is a 3- to 10-valent base, preferably a 3- to 6-valent base.

上述3至10價基較佳為3至10價烴基,尤佳可為3至6價烴基。 The above-mentioned 3- to 10-valent hydrocarbon groups are preferably 3 to 10-valent hydrocarbon groups, particularly preferably 3 to 6-valent hydrocarbon groups.

XE較佳可為CH、CH2CHCH2、CH3CH2C(CH2)3等3價基、C(CH2)4等4價基、CH2[CH]4CH2等6價基。 Preferably , _ _ _ _ _ _ _ _ _ _ base.

於上述式中,r2係較XE的價數小1之值,為2至9的整數,較佳為2至6的整數,例如為3或4。 In the above formula, r2 is a value smaller than the valence of X E by 1, and is an integer from 2 to 9, preferably an integer from 2 to 6, such as 3 or 4.

以式(B1)或(B2)所表示之含氟聚醚基之聚氧化烯化合物的數量平均分子量並無特別限定,可具有5×102至1×105的數量平均分子量。於該範圍中,具有1,000至20,000,尤佳為2,000至10,000的數量平均分子量者,從摩擦耐久性之觀點來看為佳。含氟聚醚基之聚氧化烯化合物的數量平均分子量係設成為藉由19F-NMR所測定之值。 The number average molecular weight of the fluoropolyether group-containing polyoxyalkylene compound represented by formula (B1) or (B2) is not particularly limited, and may have a number average molecular weight of 5×10 2 to 1×10 5 . Within this range, those having a number average molecular weight of 1,000 to 20,000, particularly preferably 2,000 to 10,000 are preferred from the viewpoint of friction durability. The number average molecular weight of the fluoropolyether group-containing polyoxyalkylene compound is a value measured by 19 F-NMR.

上述以式(B1)及(B2)所表示之含氟聚醚基之聚氧化烯化合物可藉由例如下列方式來合成。 The above-mentioned fluoropolyether group-containing polyoxyalkylene compounds represented by formulas (B1) and (B2) can be synthesized, for example, by the following method.

將以下述式(1a)或(2a)所表示之化合物: The compound represented by the following formula (1a) or (2a):

RFB1-XB-OH (1a) RFB1 - XB -OH (1a)

HOOC-XB-RFB2-XB-OH (2a) HOOC-X B -R FB2 -X B -OH (2a)

[式中,各記號與上述為相同涵義]; [In the formula, each symbol has the same meaning as above];

連同鹼一同與下述式: Together with the base and the following formula:

RHRB R H R B

[式中: [In the formula:

RH為鹵素原子,較佳為溴原子, R H is a halogen atom, preferably a bromine atom,

RB與上述為相同涵義]; R B has the same meaning as above];

進行反應而得到。 Obtained by reaction.

上述鹼可列舉例如氫氧化鈉、氫化鈉等。 Examples of the base include sodium hydroxide, sodium hydride, and the like.

於一樣態中,本揭示之表面處理劑中,含氟聚醚基之聚氧化烯化合物為以式(B1)所表示之化合物。 In one aspect, in the surface treatment agent of the present disclosure, the polyoxyalkylene compound containing a fluoropolyether group is a compound represented by formula (B1).

於其他樣態中,本揭示之表面處理劑中,含氟聚醚基之聚氧化烯化合物為以式(B2)所表示之化合物。 In other aspects, in the surface treatment agent of the present disclosure, the fluoropolyether-based polyoxyalkylene compound is a compound represented by formula (B2).

於其他樣態中,本揭示之表面處理劑中,含氟聚醚基之聚氧化烯化合物為以式(B1)所表示之化合物及以式(B2)所表示之化合物。 In other aspects, in the surface treatment agent of the present disclosure, the fluorine-containing polyether group polyoxyalkylene compound is a compound represented by formula (B1) and a compound represented by formula (B2).

於其他樣態中,本揭示之表面處理劑中,以式(B1)所表示之化合物及以式(B2)所表示之化合物可分別或是相互部分地縮合。亦即以式(B1)所表示之化合物彼此、以式(B2)所表示之化合物彼此、或是在以式(B1)所表示之化合物及以式(B2)所表示之化合物之間,亦可在經部分地縮合之狀態下存在。因此,本揭示之表面處理劑可含有:以式(B1)所表示之化合物的部分縮合物、以式(B2)所表示之化合物的部分縮合物、或是以式(B1)所表示之化合物與以式(B2)所表示之化合物的部分縮合物。 In other aspects, in the surface treatment agent of the present disclosure, the compound represented by formula (B1) and the compound represented by formula (B2) may be separately or partially condensed with each other. That is, between compounds represented by formula (B1), between compounds represented by formula (B2), or between compounds represented by formula (B1) and compounds represented by formula (B2), or between compounds represented by formula (B1) and compounds represented by formula (B2). Can exist in a partially condensed state. Therefore, the surface treatment agent of the present disclosure may contain: a partial condensate of a compound represented by formula (B1), a partial condensate of a compound represented by formula (B2), or a compound represented by formula (B1) A partial condensate of a compound represented by formula (B2).

相對於成分(A)與成分(B)之合計,成分(B)的含量較佳為1質量%以上,尤佳為5質量%以上,更佳可為10質量%以上。此外,相對於成分(A)與成分(B)之合計,成分(B)的含量較佳為70質量%以下,尤佳為60質量%以下,更佳為35質量%以下,再更佳為25質量%以下,特佳可為20質量%以下。藉由以上述量含有成分(B),可得到具有優異摩擦耐久性之表面處理層。 The content of component (B) is preferably 1 mass% or more, more preferably 5 mass% or more, and more preferably 10 mass% or more based on the total of component (A) and component (B). In addition, the content of component (B) is preferably 70 mass% or less, more preferably 60 mass% or less, more preferably 35 mass% or less, based on the total of component (A) and component (B), and still more preferably 25% by mass or less, preferably 20% by mass or less. By containing component (B) in the above-mentioned amount, a surface-treated layer having excellent friction durability can be obtained.

於一樣態中,相對於成分(A)與成分(B)之合計,成分(B)的含量較佳為1至70質量%,尤佳為1至40質量%,更佳為5至40質量%。 In one aspect, the content of component (B) is preferably 1 to 70 mass%, more preferably 1 to 40 mass%, more preferably 5 to 40 mass%, based on the total of component (A) and component (B). %.

表面處理劑中,成分(A)及成分(B)的濃度以合計來算,較佳為0.1至99.9質量%,尤佳為1.0至50質量%,更佳為5.0至30質量%,再更佳為5.0至15質量%。 In the surface treatment agent, the total concentration of component (A) and component (B) is preferably 0.1 to 99.9 mass%, more preferably 1.0 to 50 mass%, more preferably 5.0 to 30 mass%, and more preferably Preferably, it is 5.0 to 15% by mass.

本揭示之表面處理劑中,成分(A)與成分(B)亦可在經部分地縮合之狀態下存在。亦即,本揭示之表面處理劑可含有成分(A)與成分(B)之部分縮合物。 In the surface treatment agent of the present disclosure, component (A) and component (B) may also exist in a partially condensed state. That is, the surface treatment agent of the present disclosure may contain a partial condensate of component (A) and component (B).

(其他成分) (other ingredients)

本揭示之表面處理劑可含有:溶劑、醇類、可理解為含氟油之(非反應性的)氟聚醚化合物,較佳為全氟聚醚化合物(以下總稱為「含氟油」)、可理解為聚矽氧油之(非反應性的)聚矽氧化合物(以下稱為「聚矽氧油」)、相溶化劑、觸媒、界面活性劑、聚合禁止劑、增感劑等。 The surface treatment agent of the present disclosure may contain: solvents, alcohols, (non-reactive) fluoropolyether compounds that can be understood as fluorine-containing oils, preferably perfluoropolyether compounds (hereinafter collectively referred to as "fluorine-containing oils") , which can be understood as (non-reactive) polysilicone compounds (hereinafter referred to as "polysilicone oil"), compatibilizers, catalysts, surfactants, polymerization inhibitors, sensitizers, etc. .

上述溶劑可列舉例如:己烷、環己烷、庚烷、辛烷、壬烷、癸烷、十一烷、十二烷、礦油精等脂肪族烴類;苯、甲苯、二甲苯、萘、溶劑油等芳香族烴類;乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸正丁酯、乙酸異丙酯、乙酸異丁酯、乙酸溶纖劑、丙二醇甲醚乙酸酯、乙酸卡必醇、草酸二乙酯、丙酮酸乙酯、丁酸乙基-2-羥酯、乙醯乙酸乙酯、乙酸戊酯、乳酸甲酯、乳酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、2-羥基異丁酸甲酯、2-羥基異丁酸乙酯等酯類;丙酮、丁酮、甲基異丁酮、2-己酮、環己酮、甲胺酮、2-庚酮等酮類;乙基溶纖劑、甲基溶纖劑、甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯、丙二醇單甲醚、丙二醇單乙醚、丙二醇單丁醚、丙二醇 單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丁醚乙酸酯、二丙二醇二甲醚、乙二醇單烷醚等二醇醚類;甲醇、乙醇、異丙醇、正丁醇、異丁醇、第三丁醇、第二丁醇、3-戊醇、辛醇、3-甲基-3-甲氧基丁醇、第三戊醇等醇類;乙二醇、丙二醇等二醇類;四氫呋喃(Tetrahydrofuran)、四氫吡喃(Tetrahydropyran)、二

Figure 112115596-A0202-12-0078-41
烷(Dioxane)等環狀醚類;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺類;甲基溶纖劑、溶纖劑、異丙基溶纖劑、丁基溶纖劑、二乙二醇單甲醚等醚醇類;二乙二醇單乙醚乙酸酯;1,1,2-三氯-1,2,2-三氟乙烷、1,2-二氯-1,1,2,2-四氟乙烷、二甲基亞碸、1,1-二氯-1,2,2,3,3-五氟丙烷(HCFC 225)、1,1,2,2,3,3,4-七氟環戊烷(例如Zeorora H)、全氟丁基甲醚(C4F9OCH3)(例如HFE7100)、全氟丁基乙醚(C4F9OC2H5)(例HFE 7200)、全氟己基甲醚(C2F5CF(OCH3)C3F7)(例如HFE7300)、CF3CH2OH、CF3CF2CH2OH、(CF3)2CHOH、1,1,2,3,3,3-六氟丙基甲醚(CF3CFHCF2OCH3)(HFE-356mec)等含氟溶劑等。或是此等之2種以上的混合溶劑等。 Examples of the above-mentioned solvent include aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, and mineral spirits; benzene, toluene, xylene, naphthalene, etc. , solvent oil and other aromatic hydrocarbons; methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate, card acetate Bitol, diethyl oxalate, ethyl pyruvate, ethyl butyrate-2-hydroxy ester, ethyl acetyl acetate, amyl acetate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate , ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, ethyl 2-hydroxyisobutyrate and other esters; acetone, butanone, methyl isobutyl ketone, 2-hexanone, cyclohexanone Ketones such as ketone, methylamine ketone, 2-heptanone; ethyl cellosolve, methyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether, propylene glycol Glycol ethers such as monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol dimethyl ether, ethylene glycol monoalkyl ether; methanol , ethanol, isopropanol, n-butanol, isobutanol, tertiary butanol, second butanol, 3-pentanol, octanol, 3-methyl-3-methoxybutanol, tertiary pentanol Alcohols such as ethylene glycol, propylene glycol and other glycols; Tetrahydrofuran (Tetrahydrofuran), Tetrahydropyran (Tetrahydropyran), diols
Figure 112115596-A0202-12-0078-41
Dioxane and other cyclic ethers; N,N-dimethylformamide, N,N-dimethylacetamide and other amides; methyl cellosolve, cellosolve, isopropyl Cellulose agent, butyl cellosolve, diethylene glycol monomethyl ether and other ether alcohols; diethylene glycol monoethyl ether acetate; 1,1,2-trichloro-1,2,2-trifluoroethane, 1 ,2-Dichloro-1,1,2,2-tetrafluoroethane, dimethylstyrene, 1,1-dichloro-1,2,2,3,3-pentafluoropropane (HCFC 225), 1,1,2,2,3,3,4-Heptafluorocyclopentane (such as Zeorora H), perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) (such as HFE7100), perfluorobutyl ethyl ether (C 4 F 9 OC 2 H 5 ) (e.g. HFE 7200), perfluorohexyl methyl ether (C 2 F 5 CF (OCH 3 ) C 3 F 7 ) (e.g. HFE7300), CF 3 CH 2 OH, CF 3 CF 2 CH 2 Fluorine-containing solvents such as OH, (CF 3 ) 2 CHOH, 1,1,2,3,3,3-hexafluoropropyl methyl ether (CF 3 CFHCF 2 OCH 3 ) (HFE-356mec), etc. Or a mixed solvent of two or more of these.

上述醇類例如為可經1個或多於1個的氟原子所取代之碳數1至6的醇,可列舉例如:甲醇、乙醇、異丙醇、第三丁醇、CF3CH2OH、CF3CF2CH2OH、(CF3)2CHOH、H(CF2CF2)CH2OH、H(CF2CF2)2CH2OH、H(CF2CF2)3CH2OH。藉由將此等醇類添加於表面處理劑,來提升表面處理劑的穩定性,此外並改善成分(A)及成分(B)與溶劑之相溶性。 The above-mentioned alcohols are, for example, alcohols with 1 to 6 carbon atoms that may be substituted by one or more fluorine atoms. Examples include: methanol, ethanol, isopropyl alcohol, tert-butanol, CF 3 CH 2 OH , CF 3 CF 2 CH 2 OH, (CF 3 ) 2 CHOH, H(CF 2 CF 2 )CH 2 OH, H(CF 2 CF 2 ) 2 CH 2 OH, H(CF 2 CF 2 ) 3 CH 2 OH . By adding these alcohols to the surface treatment agent, the stability of the surface treatment agent is improved, and the compatibility between component (A) and component (B) and the solvent is improved.

於較佳樣態中,本揭示之表面處理劑係含有溶劑與醇。 In a preferred aspect, the surface treatment agent of the present disclosure contains a solvent and alcohol.

相對於溶劑與醇之合計,醇的含量較佳為0.1至50質量%,尤佳為0.5至30質量%,更佳為1.0至20質量%,再更佳為2.0至10質量%。 The alcohol content is preferably 0.1 to 50% by mass, more preferably 0.5 to 30% by mass, more preferably 1.0 to 20% by mass, and still more preferably 2.0 to 10% by mass relative to the total of the solvent and alcohol.

含氟油並無特別限定,可列舉例如以下列通式(3)所表示之化合物(全氟聚醚化合物)。 The fluorine-containing oil is not particularly limited, and examples thereof include compounds represented by the following general formula (3) (perfluoropolyether compounds).

Rf5-(OC4F8)a’-(OC3F6)b’-(OC2F4)c’-(OCF2)d’-Rf6‧‧‧(3) Rf 5 -(OC 4 F 8 ) a' -(OC 3 F 6 ) b' -(OC 2 F 4 ) c' -(OCF 2 ) d' -Rf 6 ‧‧‧(3)

式中,Rf5表示可經1個或多於1個的氟原子所取代之碳數1至16烷基(較佳為C1-16全氟烷基),Rf6表示可經1個或多於1個的氟原子所取代之碳數1至16烷基(較佳為C1-16全氟烷基)、氟原子或氫原子,Rf5及Rf6尤佳係分別獨立地為C1-3全氟烷基。 In the formula, Rf 5 represents an alkyl group having 1 to 16 carbon atoms (preferably a C 1-16 perfluoroalkyl group) which may be substituted by one or more fluorine atoms, and Rf 6 represents an alkyl group which may be substituted by one or more fluorine atoms. An alkyl group having 1 to 16 carbon atoms (preferably C 1-16 perfluoroalkyl group), fluorine atom or hydrogen atom substituted by more than 1 fluorine atom, preferably Rf 5 and Rf 6 are independently C 1-3 perfluoroalkyl.

a’、b’、c’及d’分別表示構成聚合物的主骨架之全氟聚醚的4種重複單元數,係相互獨立地為0以上300以下的整數,a’、b’、c’及d’之和至少為1,較佳為1至300,尤佳為20至300。標註下標a’、b’、c’或d’並以括弧括起之各重複單元的存在順序於式中為任意。於此等重複單元中,-(OC4F8)-為-(OCF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-及(OCF2CF(C2F5))-中任一者,較佳為-(OCF2CF2CF2CF2)-。-(OC3F6)-為-(OCF2CF2CF2)-、-(OCF(CF3)CF2)-及(OCF2CF(CF3))-中任一者,較佳為-(OCF2CF2CF2)-。-(OC2F4)-為-(OCF2CF2)-及(OCF(CF3))-中任一者,較佳為-(OCF2CF2)-。 a', b', c' and d' respectively represent the number of four repeating units of the perfluoropolyether constituting the main skeleton of the polymer, and are independently integers from 0 to 300. a', b', c The sum of ' and d' is at least 1, preferably 1 to 300, particularly preferably 20 to 300. The order of existence of each repeating unit marked with the subscript a', b', c' or d' and enclosed in parentheses is arbitrary in the formula. In these repeating units, -(OC 4 F 8 )- is -(OCF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 )-,-(OCF 2 CF 2 CF(CF 3 ))-,-(OC(CF 3 ) 2 CF 2 )-,-(OCF 2 C(CF 3 ) 2 )-,-(OCF Any one of (CF 3 )CF(CF 3 ))-, -(OCF(C 2 F 5 )CF 2 )- and (OCF 2 CF(C 2 F 5 ))-, preferably -(OCF 2 CF 2 CF 2 CF 2 )-. -(OC 3 F 6 )- is any one of -(OCF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 )- and (OCF 2 CF(CF 3 ))-, preferably -(OCF 2 CF 2 CF 2 )-. -(OC 2 F 4 )- is any one of -(OCF 2 CF 2 )- and (OCF(CF 3 ))-, and preferably -(OCF 2 CF 2 )-.

上述以通式(3)所表示之全氟聚醚化合物的例子,可列舉以下列通式(3a)及(3b)中任一者所表示之化合物(可為1種或2種以上的混合物)。 Examples of the perfluoropolyether compound represented by the general formula (3) include compounds represented by any one of the following general formulas (3a) and (3b) (which may be one type or a mixture of two or more types) ).

Rf5-(OCF2CF2CF2)b”-Rf6‧‧‧(3a) Rf 5 -(OCF 2 CF 2 CF 2 ) b” -Rf 6 ‧‧‧(3a)

Rf5-(OCF2CF2CF2CF2)a”-(OCF2CF2CF2)b”-(OCF2CF2)c”-(OCF2)d”-Rf6‧‧‧(3b) Rf 5 -(OCF 2 CF 2 CF 2 CF 2 ) a” -(OCF 2 CF 2 CF 2 ) b” -(OCF 2 CF 2 ) c” -(OCF 2 ) d” -Rf 6 ‧‧‧(3b )

此等式中,Rf5及Rf6如上述所說明;於式(3a)中,b”為1以上100以下的整數;於式(3b)中,a”及b”分別獨立地為0以上30以下的整數,c”及d”分別獨立地為1以上300以下的整數。標註下標a”、b”、c”、d”並以括弧括起之各重複單元的存在順序於式中為任意。 In this equation, Rf 5 and Rf 6 are as explained above; in formula (3a), b” is an integer from 1 to 100; in formula (3b), a” and b” are independently 0 or more Integers below 30, c” and d” are independently integers above 1 and below 300. The subscripts a”, b”, c”, d” are marked and the order of existence of each repeating unit enclosed in parentheses is in the formula is arbitrary.

此外,從其他觀點來看,含氟油可為以通式Rf3-F(式中,Rf3為C5-16全氟烷基)所表示之化合物。此外,亦可為氯三氟乙烯低聚物。 In addition, from another point of view, the fluorine-containing oil may be a compound represented by the general formula Rf 3 -F (in the formula, Rf 3 is a C 5-16 perfluoroalkyl group). In addition, it may also be a chlorotrifluoroethylene oligomer.

上述含氟油可具有500至10000的平均分子量。含氟油的分子量可使用GPC來測定。 The above-mentioned fluorine-containing oil may have an average molecular weight of 500 to 10,000. The molecular weight of fluorinated oil can be determined using GPC.

相對於本揭示之表面處理劑,含氟油可含有例如0至50質量%,較佳為0至30質量%,尤佳為0至5質量%。於一樣態中,本揭示之表面處理劑實質上不含有含氟油。所謂實質上不含有含氟油,意指完全不含有含氟油或是含有極微量的含氟油。 Relative to the surface treatment agent of the present disclosure, the fluorine-containing oil may contain, for example, 0 to 50 mass%, preferably 0 to 30 mass%, and particularly preferably 0 to 5 mass%. In one aspect, the surface treatment agent of the present disclosure contains substantially no fluorine-containing oil. The term “substantially does not contain fluorinated oil” means that it does not contain fluorinated oil at all or contains a very small amount of fluorinated oil.

於一樣態中,可將含氟油的平均分子量設成為大於含氟聚醚基之矽烷化合物的平均分子量。藉由設成為此平均分子量,尤其在藉由真空蒸鍍法來形成表面處理層之情形時,可得到更優異的摩擦耐久性與表面平滑性。 In one aspect, the average molecular weight of the fluorine-containing oil can be set to be greater than the average molecular weight of the silane compound containing the fluorine-containing polyether group. By setting the average molecular weight to this value, particularly when the surface treatment layer is formed by vacuum evaporation, more excellent friction durability and surface smoothness can be obtained.

於一樣態中,亦可將含氟油的平均分子量設成為小於含氟聚醚基之矽烷化合物的平均分子量。藉由設成為此平均分子量,可抑制由該化合物所得到之表面處理層之透明性的降低,並且形成具有高摩擦耐久性及高表面平滑性之硬化物。 In one aspect, the average molecular weight of the fluorine-containing oil may be smaller than the average molecular weight of the silane compound containing the fluorine-containing polyether group. By setting the average molecular weight to this, it is possible to form a cured product having high friction durability and high surface smoothness while suppressing the decrease in transparency of the surface treatment layer obtained from the compound.

含氟油係有益於提升藉由本揭示之表面處理劑所形成之層的表面平滑性。 Fluorine-containing oil is beneficial to improving the surface smoothness of the layer formed by the surface treatment agent of the present disclosure.

上述聚矽氧油可使用例如矽氧烷鍵為2,000以下之直鏈狀或環狀的聚矽氧油。直鏈狀的聚矽氧油可為所謂純聚矽氧油及改質聚矽氧油。純聚矽氧油可列舉二甲基聚矽氧油、甲基苯基聚矽氧油、甲基氫聚矽氧油。改質聚矽氧油可列舉藉由烷基、芳烷基、聚醚、高級脂肪酸酯、氟烷基、胺基、環氧基、羧基、醇等將純聚矽氧油進行改質者。環狀的聚矽氧油可列舉例如環狀二甲基矽氧烷油等。 As the polysiloxane oil, for example, a linear or cyclic polysiloxane oil having a siloxane bond number of 2,000 or less can be used. Linear polysilicone oil can be so-called pure polysilicone oil and modified polysilicone oil. Examples of pure polysilicone oil include dimethyl polysilicone oil, methylphenyl polysilicone oil, and methyl hydrogen polysilicone oil. Modified polysilicone oils include those that modify pure polysilicone oil through alkyl groups, aralkyl groups, polyethers, higher fatty acid esters, fluoroalkyl groups, amine groups, epoxy groups, carboxyl groups, alcohols, etc. . Examples of the cyclic polysiloxane oil include cyclic dimethylsiloxane oil.

本揭示之表面處理劑中,相對於上述本揭示之含氟聚醚基之矽烷化合物的合計100質量份(於2種以上之情形時為此等之合計,以下亦同),該聚矽氧油例如能夠以0至300質量份,較佳以50至200質量份來含有。 In the surface treatment agent of the present disclosure, relative to a total of 100 parts by mass of the fluorine-containing polyether group silane compound of the present disclosure (in the case of two or more cases, the total of these, the same applies below), the polysiloxane The oil can be contained in, for example, 0 to 300 parts by mass, preferably 50 to 200 parts by mass.

聚矽氧油係有益於提升表面處理層的表面平滑性。 Polysilicone oil is beneficial to improve the surface smoothness of the surface treatment layer.

上述相溶化劑可列舉:2,2,2-三氟乙醇、2,2,3,3,3-五氟-1-丙醇或2,2,3,3,4,4,5,5-八氟-1-戊醇等氟取代醇,較佳係末端為CF2H之氟取代醇;1,3-雙(三氟甲基)苯等氟取代芳基,較佳為氟取代苯等。 Examples of the above-mentioned compatibilizing agents include: 2,2,2-trifluoroethanol, 2,2,3,3,3-pentafluoro-1-propanol or 2,2,3,3,4,4,5,5 -Fluorine-substituted alcohols such as octafluoro-1-pentanol, preferably fluorine-substituted alcohols with CF 2 H at the end; fluorine-substituted aryl groups such as 1,3-bis(trifluoromethyl)benzene, preferably fluorine-substituted benzene wait.

上述觸媒可列舉:酸(例如乙酸、三氟乙酸等)、鹼(例如氨、三乙胺、二乙胺等)、過渡金屬(例如Ti、Ni、Sn等)等。 Examples of the above catalyst include acids (such as acetic acid, trifluoroacetic acid, etc.), bases (such as ammonia, triethylamine, diethylamine, etc.), transition metals (such as Ti, Ni, Sn, etc.).

觸媒係促進含氟聚醚基之矽烷化合物的水解及脫水縮合,而促進藉由本揭示之表面處理劑所形成之層的形成。 The catalyst promotes the hydrolysis and dehydration condensation of the fluorine-containing polyether group silane compound, thereby promoting the formation of the layer formed by the surface treatment agent of the present disclosure.

其他成分除了上述之外,可列舉例如:四乙氧矽烷、甲基三甲氧矽烷、3-胺基丙基三甲氧矽烷、3-環氧丙氧基丙基三甲氧矽烷、甲基三乙醯氧矽烷等。 In addition to the above, examples of other components include: tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, and methyltriethoxysilane. Oxysilane, etc.

本揭示之組成物(例如表面處理劑)可含浸於將多孔質物質,例如多孔質的陶瓷材料,或是金屬纖維,例如將鋼絲絨固化為棉狀者並構成為顆粒。該顆粒可使用在例如真空蒸鍍。 The composition of the present disclosure (such as surface treatment agent) can be impregnated with porous materials, such as porous ceramic materials, or metal fibers, such as steel wool, which are solidified into cotton-like shapes and formed into particles. The particles can be used, for example, in vacuum evaporation.

本揭示之表面處理劑除了上述成分之外,亦可微量地含有作為雜質之例如Pt、Rh、Ru、1,3-二乙烯基四甲基二矽氧烷、三苯基膦、NaCl、KCl、矽烷的縮合物等。 In addition to the above-mentioned components, the surface treatment agent of the present disclosure may also contain trace amounts of impurities such as Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, and KCl. , condensates of silane, etc.

(物品) (thing)

以下說明本揭示之物品。 The following describes the items disclosed.

本揭示之物品係包含:基材;以及於該基材表面上由本揭示之表面處理劑所形成之層(表面處理層)。 The article of the present disclosure includes: a substrate; and a layer (surface treatment layer) formed by the surface treatment agent of the present disclosure on the surface of the substrate.

本揭示中可使用之基材可由例如玻璃、樹脂(天然或合成樹脂,例如可為一般的塑膠材料)、金屬、陶瓷、半導體(矽、鍺等)、纖維(織物、不織布等)、毛皮、皮革、木材、陶磁器、石材等、建築構件等、衛生用品之任意適當的材料所構成。 The substrates that can be used in the present disclosure can be made of, for example, glass, resin (natural or synthetic resin, such as general plastic materials), metal, ceramics, semiconductors (silicon, germanium, etc.), fibers (fabrics, non-woven fabrics, etc.), fur, It is composed of any suitable material such as leather, wood, ceramics, stone, etc., building components, etc., and sanitary products.

例如於應製造的物品為光學構件之情形時,構成基材的表面之材料可為光學構件用材料,例如玻璃或透明塑膠等。此外,於應製造的物品為光學構件之情形時,於基材的表面(最外層)上可形成有某種層(或 膜),例如硬塗層或抗反射層等。抗反射層可使用單層抗反射層及多層抗反射層中任一種。可使用在抗反射層之無機物的例子可列舉:SiO2、SiO、ZrO2、TiO2、TiO、Ti2O3、Ti2O5、Al2O3、Ta2O5、Ta3O5、Nb2O5、HfO2、Si3N4、CeO2、MgO、Y2O3、SnO2、MgF2、WO3等。此等無機物可單獨使用或組合此等的2種以上(例如為混合物)而使用。在構成為多層抗反射層之情形時,於該最外層較佳係使用SiO2及/或SiO。於應製造的物品為觸控面板用的光學玻璃零件之情形時,可在基材(玻璃)之表面的一部分上具有透明電極,例如使用了氧化銦錫(ITO)或氧化銦鋅等之薄膜。此外,基材可因應該具體的規格等,具有絕緣層、黏著層、保護層、裝飾框層(I-CON)、霧化膜層、硬塗膜層、偏光膜、相位差膜及液晶顯示模組等。 For example, when the article to be manufactured is an optical component, the material constituting the surface of the base material may be a material for optical components, such as glass or transparent plastic. In addition, when the article to be manufactured is an optical component, a certain layer (or film), such as a hard coating layer or an anti-reflective layer, may be formed on the surface (outermost layer) of the base material. As the anti-reflection layer, either a single-layer anti-reflection layer or a multi-layer anti-reflection layer can be used. Examples of inorganic substances that can be used in the anti-reflective layer include: SiO 2 , SiO, ZrO 2 , TiO 2 , TiO, Ti 2 O 3 , Ti 2 O 5 , Al 2 O 3 , Ta 2 O 5 , Ta 3 O 5 , Nb 2 O 5 , HfO 2 , Si 3 N 4 , CeO 2 , MgO, Y 2 O 3 , SnO 2 , MgF 2 , WO 3 , etc. These inorganic substances can be used individually or in combination of 2 or more types (for example, a mixture). In the case of a multi-layer anti-reflection layer, it is preferable to use SiO 2 and/or SiO in the outermost layer. When the article to be manufactured is an optical glass component for a touch panel, a transparent electrode may be provided on part of the surface of the base material (glass), for example, a thin film using indium tin oxide (ITO) or indium zinc oxide. . In addition, the base material can have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomized film layer, a hard coating layer, a polarizing film, a phase difference film, and a liquid crystal display according to the specific specifications. Modules etc.

上述基材的形狀並無特別限定,可為例如板狀、膜及其他型態。此外,應形成表面處理層之基材的表面區域只要是基材表面的至少一部分即可,可因應要製造之物品的用途及具體的規格等來適當地決定。 The shape of the above-mentioned substrate is not particularly limited, and may be, for example, plate-shaped, film-shaped, or other shapes. In addition, the surface area of the base material on which the surface treatment layer should be formed only needs to be at least a part of the surface of the base material, and can be appropriately determined according to the use and specific specifications of the article to be manufactured.

於一樣態中,該基材可為至少其表面部分由原先即具有羥基之材料所構成者。該材料可列舉玻璃,此外,可列舉於表面上形成有自然氧化膜或熱氧化膜之金屬(尤其是卑金屬)、陶瓷、半導體等。或是在如樹脂等般雖具有羥基但並不足之情形時,或是原先即不具有羥基之情形時,藉由對基材施以某種前處理而在基材的表面上導入羥基或增加其量。該前處理的例子可列舉電漿處理(例如電暈放電)或離子束照射。由於電漿處理可在基材表面上導入羥基或增加其量,並且清淨化基材表面(去除異物等),因此亦可適當地應用。此外,該前處理的其他例子可列舉:藉由LB法(Langmuir-Blodgett法)或化學吸附法等,預先以單分子膜的型態將具有碳 -碳不飽和鍵結基之界面吸附劑形成於基材表面,然後在含有氧或氮等之環境下將不飽和鍵進行開裂之方法。 In one aspect, the substrate may be one in which at least part of its surface is composed of a material that originally has hydroxyl groups. Examples of the material include glass, metals (especially base metals), ceramics, and semiconductors having natural oxide films or thermal oxide films formed on the surface. Or when there are hydroxyl groups, such as resins, but they are not sufficient, or when there are no hydroxyl groups in the first place, hydroxyl groups are introduced or added to the surface of the base material by subjecting the base material to some kind of pretreatment. Its quantity. Examples of this pretreatment include plasma treatment (such as corona discharge) or ion beam irradiation. Since plasma treatment can introduce or increase the amount of hydroxyl groups on the surface of the substrate and clean the surface of the substrate (removing foreign matter, etc.), it can also be used appropriately. In addition, other examples of this pretreatment can include: using the LB method (Langmuir-Blodgett method) or chemical adsorption method, etc., to pre-treat carbon in the form of a monomolecular film. -The interfacial adsorbent of carbon unsaturated bonding group is formed on the surface of the substrate, and then the unsaturated bond is cracked in an environment containing oxygen or nitrogen.

於其他樣態中,該基材亦可為至少其表面部分由具有1個以上的其他反應性基,例如Si-H基之聚矽氧化合物,或是含有烷氧矽烷之材料所構成者。 In other aspects, the substrate may also be composed of at least a surface part of a polysiloxy compound having one or more other reactive groups, such as Si-H groups, or a material containing alkoxysilane.

於較佳樣態中,上述基材為玻璃。該玻璃較佳為藍寶石玻璃、鈉鈣玻璃、鹼鋁矽酸鹽玻璃、硼矽酸玻璃、無鹼玻璃、結晶玻璃、石英玻璃,特佳為經化學強化之鈉鈣玻璃、經化學強化之鹼鋁矽酸鹽玻璃、以及經化學鍵結之硼矽酸玻璃。 In a preferred aspect, the substrate is glass. The glass is preferably sapphire glass, soda-lime glass, alkali aluminosilicate glass, borosilicate glass, alkali-free glass, crystallized glass, quartz glass, and particularly preferably chemically strengthened soda-lime glass, chemically strengthened alkali glass Aluminosilicate glass, and chemically bonded borosilicate glass.

本揭示之物品可藉由在上述基材的表面上形成上述本揭示之表面處理劑的層,然後視需要對此層進行後處理而形成由本揭示之表面處理劑所構成之層。 The article of the present disclosure can be formed by forming a layer of the surface treatment agent of the present disclosure on the surface of the above-mentioned substrate, and then post-processing the layer if necessary to form a layer composed of the surface treatment agent of the present disclosure.

本揭示之表面處理劑的層形成可藉由以被覆該表面之方式,將上述表面處理劑適用在基材的表面上而實施。被覆方法並無特別限定。例如可使用濕潤被覆法及乾燥被覆法。 The layer of the surface treatment agent disclosed in the present disclosure can be formed by applying the above-mentioned surface treatment agent on the surface of the substrate in a manner to cover the surface. The covering method is not particularly limited. For example, a wet coating method and a dry coating method can be used.

濕潤被覆法的例子可列舉:浸漬塗佈、旋轉塗佈、流動塗佈、噴霧塗佈、輥塗佈、凹版塗佈及類似的方法。 Examples of wet coating methods include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating and similar methods.

乾燥被覆法的例子可列舉:蒸鍍(通常是真空蒸鍍)、濺鍍、CVD及類似的方法。蒸鍍法(通常是真空蒸鍍法)的具體例可列舉:電阻加熱、電子束、使用微波等之高頻加熱、離子束及類似的方法。CVD方法的具體例可列舉:電漿CVD、光學CVD、熱CVD及類似的方法。 Examples of dry coating methods include evaporation (usually vacuum evaporation), sputtering, CVD and similar methods. Specific examples of evaporation methods (usually vacuum evaporation methods) include resistance heating, electron beams, high-frequency heating using microwaves, ion beams, and similar methods. Specific examples of the CVD method include plasma CVD, optical CVD, thermal CVD and similar methods.

再者,亦可為藉由常壓電漿法之被覆。 Furthermore, it can also be coated by the normal pressure plasma method.

於使用濕潤被覆法之情形時,本揭示之表面處理劑可在經溶劑稀釋後適用在基材表面上。從本揭示之表面處理劑的穩定性及溶劑的揮發性之觀點來看,係適合使用下列溶劑:碳數5至12的全氟脂肪族烴(例如全氟己烷、全氟甲基環己烷及全氟-1,3-二甲基環己烷);聚氟芳香族烴(例如雙(三氟甲基)苯);聚氟脂肪族烴(例如C6F13CH2CH3(例如旭硝子股份有限公司製的Asahiklin(註冊商標)AC-6000)、1,1,2,2,3,3,4-七氟環戊烷(例如Zeon Japan股份有限公司製的Zeorora(註冊商標)H);氫氟醚(HFE)(例如全氟丙基甲醚(C3F7OCH3)(例如住友3M股份有限公司製的Novec(商標)7000)、全氟丁基甲醚(C4F9OCH3)(例如住友3M股份有限公司製的Novec(商標)7100)、全氟丁基乙醚(C4F9OC2H5)(例如住友3M股份有限公司製的Novec(商標)7200)、全氟己基甲醚(C2F5CF(OCH3)C3F7)(例如住友3M股份有限公司製的Novec(商標)7300)等烷基全氟烷醚(全氟烷基及烷基可為直鏈或分枝狀)、或是CF3CH2OCF2CHF2(例如旭硝子股份有限公司製的Asahiklin(註冊商標)AE-3000))等。此等溶劑可單獨使用或作為2種以上的混合物而使用。當中較佳為氫氟醚,特佳為全氟丁基甲醚(C4F9OCH3)及/或全氟丁基乙醚(C4F9OC2H5)。 When a wet coating method is used, the surface treatment agent of the present disclosure can be applied on the surface of the substrate after being diluted with a solvent. From the viewpoint of the stability of the surface treatment agent and the volatility of the solvent of the present disclosure, the following solvents are suitable for use: perfluoroaliphatic hydrocarbons with 5 to 12 carbon atoms (such as perfluorohexane, perfluoromethylcyclohexane alkane and perfluoro-1,3-dimethylcyclohexane); polyfluorinated aromatic hydrocarbons (such as bis(trifluoromethyl)benzene); polyfluorinated aliphatic hydrocarbons (such as C 6 F 13 CH 2 CH 3 ( For example, Asahiklin (registered trademark) AC-6000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (such as Zeorora (registered trademark) manufactured by Zeon Japan Co., Ltd. H); hydrofluoroether (HFE) (such as perfluoropropyl methyl ether (C 3 F 7 OCH 3 ) (such as Novec (trademark) 7000 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) (for example, Novec (trademark) 7100 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl ether (C 4 F 9 OC 2 H 5 ) (for example, Novec (trademark) 7200 manufactured by Sumitomo 3M Co., Ltd.), Alkyl perfluoroalkyl ethers ( perfluoroalkyl and alkyl It can be linear or branched), or CF 3 CH 2 OCF 2 CHF 2 (for example, Asahiklin (registered trademark) AE-3000 manufactured by Asahi Glass Co., Ltd.)), etc. These solvents can be used alone or as two types A mixture of the above is used. Among them, hydrofluoroether is preferred, and perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) and/or perfluorobutyl ethyl ether (C 4 F 9 OC 2 H 5 ) is particularly preferred.

於使用乾燥被覆法之情形時,本揭示之表面處理劑可直接用於乾燥被覆法,或是經上述溶劑稀釋後用於乾燥被覆法。 When a dry coating method is used, the surface treatment agent of the present disclosure can be used directly in the dry coating method, or can be used in the dry coating method after being diluted with the above solvent.

表面處理劑的層形成,較佳係在層中使本揭示之表面處理劑與用於水解及脫水縮合之觸媒一同存在之方式來實施。簡便上,於藉由濕潤被覆法來進行之情形時,在以溶劑來稀釋本揭示之表面處理劑後,於適用在基材表面不久前,可將觸媒添加於本揭示之表面處理劑的稀釋液。於 藉由乾燥被覆法來進行之情形時,可將添加了觸媒之本揭示之表面處理劑直接進行蒸鍍(通常為真空蒸鍍)處理,或是將添加了觸媒之本揭示之表面處理劑含浸於鐵或銅等金屬多孔體而形成顆粒狀物質,然後使用此顆粒狀物質來進行蒸鍍(通常為真空蒸鍍)處理。 The layer formation of the surface treatment agent is preferably carried out in such a manner that the surface treatment agent of the present disclosure is present together with a catalyst for hydrolysis and dehydration condensation in the layer. Simply speaking, when it is carried out by the wet coating method, after diluting the surface treatment agent of the present disclosure with a solvent, a catalyst can be added to the surface treatment agent of the present disclosure shortly before applying it to the surface of the substrate. diluent. at When the dry coating method is used, the surface treatment agent disclosed in this disclosure with a catalyst added can be directly subjected to evaporation (usually vacuum evaporation), or the surface treatment agent disclosed in this disclosure with a catalyst added can be used. The agent is impregnated into a porous metal such as iron or copper to form a granular material, and then the granular material is used for evaporation (usually vacuum evaporation).

觸媒可使用任意適當的酸或鹼。酸觸媒可使用例如乙酸、甲酸、三氟乙酸等。此外,鹼觸媒可使用例如氨、有機胺類等。 Any suitable acid or alkali can be used as the catalyst. As the acid catalyst, for example, acetic acid, formic acid, trifluoroacetic acid, etc. can be used. In addition, ammonia, organic amines, etc. can be used as an alkali catalyst, for example.

本揭示之物品所含有的表面處理層係具有高摩擦耐久性。此外,上述表面處理層除了高摩擦耐久性之外,雖與所使用之表面處理劑的組成相依,惟亦可具有撥水性、撥油性、防污性(例如防止指紋等髒污的附著)、防水性(防止水往電子零件等之浸入)、表面平滑性(或潤滑性,例如指紋等髒污的拭除性或是相對於手指之優異觸感)、耐藥品性等,可適合應用作為功能性薄膜。 Articles of the present disclosure contain surface treatments that provide high friction durability. In addition, in addition to high friction durability, the above-mentioned surface treatment layer may also have water repellency, oil repellency, and antifouling properties (for example, preventing the adhesion of dirt such as fingerprints), depending on the composition of the surface treatment agent used. Water resistance (preventing water from penetrating into electronic parts, etc.), surface smoothness (or lubricity, such as the ability to wipe away dirt such as fingerprints or excellent touch against fingers), chemical resistance, etc., can be suitable for use as Functional films.

亦即,本揭示亦進一步關於在最外層具有上述表面處理層之光學材料。 That is, the present disclosure further relates to an optical material having the above-mentioned surface treatment layer in the outermost layer.

光學材料除了後述所例示之與顯示器等相關的光學材料之外,亦適合列舉各式各樣的光學材料:例如陰極射線管(CRT(Cathode Ray Tube);例如個人電腦顯示器)、液晶顯示器、電漿顯示器、有機EL顯示器、無機薄膜EL點矩陣顯示器、背投影型顯示器、螢光顯示管(VFD:Vacuum Fluorescent Display)、場放射顯示器(FED;Field Emission Display)等顯示器或彼等顯示器的保護板、或是於彼等的表面上施以抗反射膜處理者。 In addition to the optical materials related to displays and the like exemplified below, the optical materials are also suitable for various optical materials: for example, cathode ray tubes (CRT (Cathode Ray Tube); for example, personal computer monitors), liquid crystal displays, electronic Displays such as slurry displays, organic EL displays, inorganic thin film EL dot matrix displays, rear projection displays, fluorescent display tubes (VFD: Vacuum Fluorescent Display), field emission displays (FED; Field Emission Display) or the protective boards of these displays , or applying anti-reflective coating treatment to their surfaces.

本揭示之物品並無特別限定,可為光學構件。光學構件的例子可列舉如下:眼鏡等鏡片;PDP、LCD等顯示器的前面保護板、抗反射 板、偏光板、防眩板;行動電話、可攜式資訊終端等機器的觸控面板片;藍光(Blue-ray(註冊商標))光碟、DVD光碟、CD-R、MO等光碟的光碟面;光纖;鐘錶的顯示面等。 The object of the present disclosure is not particularly limited and may be an optical component. Examples of optical components include: lenses for glasses, etc.; front protective plates, anti-reflection panels for displays such as PDP and LCD, etc. panels, polarizing plates, anti-glare plates; touch panels for mobile phones, portable information terminals and other machines; disc surfaces for Blu-ray (registered trademark) discs, DVD discs, CD-R, MO and other discs ; Optical fiber; display surface of clocks, etc.

此外,本揭示之物品亦可為醫療機器或醫療材料。 In addition, the items disclosed herein may also be medical machines or medical materials.

上述層的厚度並無特別限定。於光學構件之情形時,上述層的厚度為1至50nm、1至30nm,較佳為1至15nm的範圍者,從光學性能、摩擦耐久性及防污性之點來看為佳。 The thickness of the above layer is not particularly limited. In the case of an optical member, the thickness of the above-mentioned layer is 1 to 50 nm, 1 to 30 nm, preferably 1 to 15 nm, from the viewpoint of optical performance, friction durability and antifouling properties.

以上係已詳細說明使用本揭示之表面處理劑以及物品。惟本揭示之表面處理劑以及物品等並不限定於上述所例示者。 The above has been a detailed description of the use of the surface treatment agents and articles disclosed herein. However, the surface treatment agents and articles disclosed in this disclosure are not limited to those illustrated above.

[實施例] [Example]

以下係於實施例中說明本揭示之表面處理劑,惟本揭示並不限定於下列實施例。於本實施例中,構成氟聚醚及聚醚之重複單元的存在順序為任意,下列所示之化學式表示平均組成。 The surface treatment agent of the present disclosure is described below in examples, but the present disclosure is not limited to the following examples. In this embodiment, the order of the repeating units constituting the fluoropolyether and the polyether is arbitrary, and the chemical formula shown below represents the average composition.

(成分(A)) (ingredient (A))

係準備下述化合物(a1)及(a2)作為含氟聚醚基之矽烷化合物。 The following compounds (a1) and (a2) were prepared as fluorine-containing polyether group silane compounds.

‧化合物(a1):m=15、n=16 ‧Compound (a1): m=15, n=16

Figure 112115596-A0202-12-0087-26
Figure 112115596-A0202-12-0087-26

‧化合物(a2):m=21、n=36 ‧Compound (a2): m=21, n=36

Figure 112115596-A0202-12-0088-27
Figure 112115596-A0202-12-0088-27

(成分(B)) (ingredient (B))

係準備下述化合物(b)作為含氟聚醚基之聚氧化烯化合物。 The following compound (b) was prepared as a fluorine-containing polyether group polyoxyalkylene compound.

‧化合物(b):m=23.1、n=39.4、數量平均分子量=5620 ‧Compound (b): m=23.1, n=39.4, number average molecular weight=5620

Figure 112115596-A0202-12-0088-28
Figure 112115596-A0202-12-0088-28

合成例(b) Synthesis example (b)

將以平均組成HOCH2CF2O(CF2CF2)23.1(CF2O)39.4CF2CH2OH(惟於混合物中亦微量地含有下列化合物:微量地含有(CF2CF2CF2O)及/或(CF2CF2CF2CF2O)的重複單元之化合物)所表示之全氟聚醚改質醇體2g、1,3-雙(三氟甲基)苯4g、以及氫氧化鈉0.1g投入於安裝了迴流冷卻器、溫度計及攪拌機之50mL的三頸燒瓶,並於60℃攪拌2小時。接著投入1-溴-2-(2-甲氧基乙氧基)乙烷0.3g並於60℃攪拌2小時。然後進行3次藉由分液漏斗並以3N鹽酸所進行之洗淨操作(更詳細而言,將氟系化合物維持在1,3-雙(三氟甲基)苯相,將非氟系化合物分離至鹽酸層(水系)之操作)。接著在減壓下餾除揮發成分,藉此得到含有全氟聚醚基之聚氧化烯化合物(b)1.3g。 The average composition will be HOCH 2 CF 2 O (CF 2 CF 2 ) 23.1 (CF 2 O) 39.4 CF 2 CH 2 OH (but the mixture also contains trace amounts of the following compounds: trace amounts of (CF 2 CF 2 CF 2 O ) and/or (a compound with a repeating unit of CF 2 CF 2 CF 2 CF 2 O)), 2 g of perfluoropolyether modified alcohol body, 4 g of 1,3-bis(trifluoromethyl)benzene, and hydrogen 0.1 g of sodium oxide was put into a 50 mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer, and stirred at 60°C for 2 hours. Then, 0.3 g of 1-bromo-2-(2-methoxyethoxy)ethane was added and stirred at 60° C. for 2 hours. Then, the washing operation with 3N hydrochloric acid through a separatory funnel was performed three times (more specifically, the fluorine-based compound was maintained in the 1,3-bis(trifluoromethyl)benzene phase, and the non-fluorine-based compound was Separate into hydrochloric acid layer (water system). Then, volatile components were distilled off under reduced pressure, thereby obtaining 1.3 g of a polyoxyalkylene compound (b) containing a perfluoropolyether group.

CH3OCH2CH2OCH2CH2-OCH2CF2O(CF2CF2)20.4(CF2O)34.5CF2CH2O-CH2CH2OCH2CH2OCH3 (b) CH 3 OCH 2 CH 2 OCH 2 CH 2 -OCH 2 CF 2 O(CF 2 CF 2 ) 20.4 (CF 2 O) 34.5 CF 2 CH 2 O-CH 2 CH 2 OCH 2 CH 2 OCH 3 (b)

實施例1至3 Examples 1 to 3

(表面處理劑的調製) (Preparation of surface treatment agent)

以成為表1所示之比率的方式來混合表1所示之含氟聚醚基之矽烷化合物(成分A)以及含氟聚醚基之聚氧化烯化合物(成分B)。以成分A與成分B之合計的濃度成為20質量%之方式,藉由氫氟醚(3M公司製、Novec 7200)來稀釋所得到之混合物,而調製表面處理劑。 The fluorine-containing polyether group-containing silane compound (component A) and the fluorine-containing polyether group-containing polyoxyalkylene compound (component B) shown in Table 1 were mixed so as to achieve the ratios shown in Table 1. The obtained mixture was diluted with hydrofluoroether (Novec 7200, manufactured by 3M Company) so that the total concentration of component A and component B became 20% by mass, and a surface treatment agent was prepared.

比較例1至2 Comparative Examples 1 to 2

除了不使用成分B之外,其他與上述實施例相同而調製表面處理劑。 A surface treatment agent was prepared in the same manner as in the above-described embodiment except that component B was not used.

[表1]

Figure 112115596-A0202-12-0089-29
[Table 1]
Figure 112115596-A0202-12-0089-29

(表面處理層的形成) (Formation of surface treatment layer)

將上述所調製之表面處理劑(實施例1至3及比較例1至2)真空蒸鍍於化學強化玻璃(Corning公司製、「Gorilla」玻璃、厚度0.7mm)上。真空蒸鍍的處理條件係設成為壓力3.0×10-3Pa,首先在化學強化玻璃表面上形成二氧化矽膜,接著蒸鍍表面處理劑400mg而形成表面處理層。 The surface treatment agents prepared above (Examples 1 to 3 and Comparative Examples 1 to 2) were vacuum evaporated on chemically strengthened glass ("Gorilla" glass manufactured by Corning Co., Ltd., thickness 0.7 mm). The processing conditions of vacuum evaporation were set to a pressure of 3.0×10 -3 Pa. First, a silica film was formed on the surface of the chemically strengthened glass, and then 400 mg of the surface treatment agent was evaporated to form a surface treatment layer.

(初期接觸角的測定) (Measurement of initial contact angle)

對於從上述實施例1至3及比較例1至2的表面處理劑所得到之表面處理層,係測定5處之水的靜態接觸角(度)並取其平均值(度),而設成為初期接觸角(度)之值(摩擦次數0次)。 For the surface treatment layer obtained from the surface treatment agent of Examples 1 to 3 and Comparative Examples 1 to 2, the static contact angle (degree) of water was measured at 5 places and the average value (degree) was taken, and it was set as The value of the initial contact angle (degrees) (the number of frictions is 0).

(橡皮擦(ER)摩擦耐久性試驗) (Eraser (ER) friction durability test)

水平地配置形成了表面處理層之基材,並將橡皮擦(Minoan公司製、型號:MB006004、直徑0.6cm)接觸於該表面處理層的表面,接著於該上方賦予1000gf的荷重,然後在施加荷重之狀態下以20mm/秒的速度使橡皮擦來回移動,而實施橡皮擦摩擦耐久試驗。每當於來回次數100次時,係測定5處之水的靜態接觸角(度)並取其平均值(度)。在接觸角的平均值(度)未達100度之時點下中止試驗,採用之前接觸角超過100度時之來回次數作為橡皮擦摩擦耐久性的數值(次),並表示於下述表中。 The base material on which the surface treatment layer was formed was arranged horizontally, and an eraser (manufactured by Minoan, model: MB006004, diameter 0.6cm) was brought into contact with the surface of the surface treatment layer, and then a load of 1000gf was applied to the top, and then the The eraser is moved back and forth at a speed of 20 mm/second under load to conduct an eraser friction durability test. Whenever the number of back and forth is 100, the static contact angle (degrees) of water at 5 locations is measured and the average value (degrees) is taken. The test was stopped when the average contact angle (degrees) did not reach 100 degrees, and the number of back and forth times when the contact angle exceeded 100 degrees was used as the value (times) of the eraser friction durability, and is shown in the table below.

[表2]

Figure 112115596-A0202-12-0090-30
[Table 2]
Figure 112115596-A0202-12-0090-30

‧鋼絲絨(SW)摩擦耐久性評估 ‧Evaluation of friction durability of steel wool (SW)

對形成了表面處理層之基材實施鋼絲絨摩擦耐久性評估。具體而言,水平地配置形成了表面處理層之基材,並使鋼絲絨(號數#0000、尺寸5mm×10mm×10mm)接觸於基材的表面處理層,接著於該上方賦予1,000gf的荷重,然後在施加荷重之狀態下以140mm/秒的速度使鋼絲絨來回移動。 每當於來回次數1000次時,測定水的靜態接觸角(度),在接觸角的測定值未達100度之時點下中止評估。將最後接觸角超過100度時之來回次數表示於下述表(表中,記號「-」表示未測定)。於來回次數20000次時中止試驗。 The steel wool friction durability was evaluated on the base material on which the surface treatment layer was formed. Specifically, the base material on which the surface treatment layer was formed was arranged horizontally, steel wool (number #0000, size 5 mm × 10 mm × 10 mm) was brought into contact with the surface treatment layer of the base material, and then 1,000 gf was applied on top of the base material. Load is applied, and then the steel wool is moved back and forth at a speed of 140mm/second while the load is applied. The static contact angle (degree) of water is measured every time the number of back and forth is 1000, and the evaluation is stopped when the measured value of the contact angle does not reach 100 degrees. The number of back and forth when the final contact angle exceeds 100 degrees is shown in the table below (in the table, the mark "-" indicates that it was not measured). The test was terminated when the number of back and forth times reached 20,000.

[表3]

Figure 112115596-A0202-12-0091-31
[table 3]
Figure 112115596-A0202-12-0091-31

從上述結果中,係確認含有含氟聚醚基之矽烷化合物以及含氟聚醚基之聚氧化烯化合物之本揭示的表面處理劑,可形成具有優異摩擦耐久性之表面處理層。 From the above results, it was confirmed that the surface treatment agent disclosed herein containing a silane compound containing a fluorine-containing polyether group and a polyoxyalkylene compound containing a fluorine-containing polyether group can form a surface treatment layer having excellent friction durability.

[產業上之可應用性] [Industrial applicability]

本揭示之物品係適合應用在各式各樣的用途,例如作為觸控面板等光學構件。 The disclosed article is suitable for application in various applications, such as as optical components such as touch panels.

Figure 112115596-A0202-11-0002-1
Figure 112115596-A0202-11-0002-1

Claims (27)

一種含氟聚醚基之聚氧化烯化合物,其為:下列式(B1)或(B2)所表示之成分(B): A fluoropolyether-based polyoxyalkylene compound, which is component (B) represented by the following formula (B1) or (B2): RFB1-XB-RB (B1) R FB1 -X B -R B (B1) RB-XB-RFB2-XB-RB (B2) R B -X B -R FB2 -X B -R B (B2) 式中: In the formula: RFB1為Rf1-RF-Oq-, R FB1 is Rf 1 -R F -O q -, RFB2為-Rf2 p-RF-Oq-, R FB2 is -Rf 2 p -R F -O q -, RF分別獨立地為2價氟聚醚基, R F are independently divalent fluoropolyether groups, Rf1為可經1個或多於1個的氟原子所取代之C1-16烷基, Rf 1 is a C 1-16 alkyl group which may be substituted by 1 or more than 1 fluorine atom, Rf2為可經1個或多於1個的氟原子所取代之C1-6伸烷基, Rf 2 is a C 1-6 alkylene group which may be substituted by 1 or more than 1 fluorine atom, p為0或1, p is 0 or 1, q分別獨立地為0或1, q is independently 0 or 1, XB分別獨立地為單鍵或2價基, X B is independently a single bond or a divalent base, RB分別獨立地為含氧化烯之基。 R B are each independently an alkylene oxide-containing group. 如請求項1所述之含氟聚醚基之聚氧化烯化合物,其中前述含氧化烯之基係分別獨立地為以下述式所表示之基: The polyoxyalkylene compound containing fluoropolyether groups as claimed in claim 1, wherein the aforementioned oxyalkylene-containing groups are independently groups represented by the following formula: -R61-(OR63)b3-R62,或是 -R 61 -(OR 63 ) b3 -R 62 , or -XE(-R61-(OR63)b3-R62)r2 -X E (-R 61 -(OR 63 ) b3 -R 62 ) r2 式中: In the formula: R61分別獨立地為單鍵或C1-6伸烷基, R 61 are each independently a single bond or C 1-6 alkylene group, R62分別獨立地為氫原子、C1-6烷基或C1-6烷氧基, R 62 are each independently a hydrogen atom, C 1-6 alkyl group or C 1-6 alkoxy group, R63分別獨立地為C1-6伸烷基, R 63 are each independently C 1-6 alkylene group, b3分別獨立地為1至6的整數, b3 are independently integers from 1 to 6, XE為3至10價基, X E is 3 to 10 price base, r2為2至9的整數,且較XE的價數小1。 r2 is an integer from 2 to 9, and is 1 less than the valence of X E. 如請求項1或2所述之含氟聚醚基之聚氧化烯化合物,其中前述含氧化烯之基分別獨立地為以下述式所表示之基: The polyoxyalkylene compound containing fluoropolyether groups as claimed in claim 1 or 2, wherein the aforementioned oxyalkylene-containing groups are independently represented by the following formula: -R61-(OR63)b3-R62 -R 61 -(OR 63 ) b3 -R 62 式中: In the formula: R61為單鍵或C1-6伸烷基, R 61 is a single bond or C 1-6 alkylene group, R62為氫原子、C1-6烷基或C1-6烷氧基, R 62 is a hydrogen atom, C 1-6 alkyl group or C 1-6 alkoxy group, R63分別獨立地為C1-6伸烷基, R 63 are each independently C 1-6 alkylene group, b3為1至6的整數。 b3 is an integer from 1 to 6. 如請求項2或3所述之含氟聚醚基之聚氧化烯化合物,其中R63為C1-3伸烷基。 The polyoxyalkylene compound containing fluoropolyether group as described in claim 2 or 3, wherein R 63 is a C 1-3 alkylene group. 如請求項1至4中任一項所述之含氟聚醚基之聚氧化烯化合物,其中XB分別獨立地為單鍵或-(R67)b1-(R68)b2-, The fluoropolyether-based polyoxyalkylene compound as described in any one of claims 1 to 4, wherein X B is independently a single bond or -(R 67 ) b1 -(R 68 ) b2 -, 式中: In the formula: R67分別獨立地為C1-6伸烷基, R 67 are each independently C 1-6 alkylene group, R68分別獨立地為氧原子、硫原子、CO、NR69、CONR69、NR69CO或C6-12伸芳基, R 68 is independently an oxygen atom, a sulfur atom, CO, NR 69 , CONR 69 , NR 69 CO or C 6-12 aryl group, R69分別獨立地為氫原子或C1-6烷基, R 69 are each independently a hydrogen atom or a C 1-6 alkyl group, b1為0至6的整數, b1 is an integer from 0 to 6, b2為0至6的整數, b2 is an integer from 0 to 6, b1及b2之合計為1以上, The total of b1 and b2 is 1 or more, 標註b1或b2並以括弧括起之各重複單元的存在順序於式中為任意。 The order of existence of each repeating unit marked b1 or b2 and enclosed in parentheses is arbitrary in the formula. 如請求項1至5中任一項所述之含氟聚醚基之聚氧化烯化合物,其中XB分別獨立地為單鍵、C1-6伸烷基或-R64-O-R65-, The fluoropolyether-based polyoxyalkylene compound as described in any one of claims 1 to 5, wherein X B is independently a single bond, C 1-6 alkylene group or -R 64 -OR 65 -, R64為單鍵或C1-6伸烷基, R 64 is a single bond or C 1-6 alkylene group, R65為單鍵或C1-6伸烷基。 R 65 is a single bond or C 1-6 alkylene group. 如請求項1至6中任一項所述之含氟聚醚基之聚氧化烯化合物,其中RF分別獨立地為以下列式所表示之基: The polyoxyalkylene compound containing fluoropolyether groups as described in any one of claims 1 to 6, wherein R F are independently groups represented by the following formula: -(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3RFa 6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - 式中: In the formula: RFa分別獨立地為氫原子、氟原子或氯原子, R Fa are each independently a hydrogen atom, a fluorine atom or a chlorine atom, a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的RFa為氫原子或氯原子之情形時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e and f are each independently an integer from 0 to 200. The sum of a, b, c, d, e and f is more than 1. Mark a, b, c, d, e or f The order of existence of each repeating unit enclosed in parentheses is arbitrary in the formula. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more. . 如請求項1至7中任一項所述之含氟聚醚基之聚氧化烯化合物,其中Rf1為C1-16全氟烷基, The fluoropolyether-based polyoxyalkylene compound as described in any one of claims 1 to 7, wherein Rf 1 is a C 1-16 perfluoroalkyl group, Rf2為C1-6全氟伸烷基, Rf 2 is C 1-6 perfluoroalkyl group, RF分別獨立地為以下列式所表示之基: R F are independently the basis represented by the following formula: -(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - 式中: In the formula: a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的RFa為氫原子或氯原子之情形時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e and f are each independently an integer from 0 to 200. The sum of a, b, c, d, e and f is more than 1. Mark a, b, c, d, e or f The order of existence of each repeating unit enclosed in parentheses is arbitrary in the formula. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more. . 如請求項1至8中任一項所述之含氟聚醚基之聚氧化烯化合物,其中RF分別獨立地為以下述式(f1)、(f2)、(f3)、(f4)、(f5)或(f6)所表示之基: The fluoropolyether-based polyoxyalkylene compound as described in any one of claims 1 to 8, wherein R F are independently represented by the following formulas (f1), (f2), (f3), (f4), The basis represented by (f5) or (f6): -(OC3F6)d-(OC2F4)e- (f1) -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1) 式中,d為1至200的整數,e為0或1; In the formula, d is an integer from 1 to 200, and e is 0 or 1; -(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f2) -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2) 式中,c及d分別獨立地為0至30的整數, In the formula, c and d are independently integers from 0 to 30, e及f分別獨立地為1至200的整數, e and f are independently integers from 1 to 200, c、d、e及f之和為10至200的整數, The sum of c, d, e and f is an integer from 10 to 200, 標註c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; The order of existence of each repeating unit marked c, d, e or f and enclosed in parentheses is arbitrary in the formula; -(R6-R7)g- (f3) -(R 6 -R 7 ) g - (f3) 式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 , R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups selected from these groups, g為2至100的整數; g is an integer from 2 to 100; -(R6-R7)g-Rr-(R7’-R6’)g’- (f4) -(R 6 -R 7 ) g -R r -(R 7' -R 6' ) g' - (f4) 式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 , R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups independently selected from these groups, R6’為OCF2或OC2F4R 6' is OCF 2 or OC 2 F 4 , R7’為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是獨立地選自此等基之2或3個基的組合, R 7' is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups independently selected from these groups, g為2至100的整數, g is an integer from 2 to 100, g’為2至100的整數, g’ is an integer from 2 to 100, Rr為下列式: R r is the following formula:
Figure 112115596-A0202-13-0005-42
Figure 112115596-A0202-13-0005-42
式中,*表示鍵結位置; In the formula, * represents the bonding position; -(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f5) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5) 式中,e為1以上200以下的整數,a、b、c、d及f分別獨立地為0以上200以下的整數,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, e is an integer from 1 to 200, a, b, c, d and f are each independently an integer from 0 to 200. Label a, b, c, d, e or f and enclose it in brackets. The order of existence of each repeating unit in the formula is arbitrary; -(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f6) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6) 式中,f為1以上200以下的整數,a、b、c、d及e分別獨立地為0以上200以下的整數,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。 In the formula, f is an integer from 1 to 200, a, b, c, d and e are each independently an integer from 0 to 200. Label a, b, c, d, e or f and enclose it in brackets. The order of existence of each repeating unit in the formula is arbitrary.
一種表面處理劑,係含有:成分(A):含氟聚醚基之矽烷化合物、以及 A surface treatment agent containing: component (A): fluorine-containing polyether-based silane compound, and 成分(B):如請求項1至9中任一項所述之含氟聚醚基之聚氧化烯化合物。 Component (B): the fluorine-containing polyether-based polyoxyalkylene compound as described in any one of claims 1 to 9. 如請求項10所述之表面處理劑,其中前述含氟聚醚基之矽烷化合物為以下述式(A1)或(A2)所表示之化合物: The surface treatment agent according to claim 10, wherein the silane compound containing fluorine polyether group is a compound represented by the following formula (A1) or (A2): RFA1 α1-XA-RSi β1 (A1) R FA1 α1 -X A -R Si β1 (A1) RSi γ1-XA-RFA2-XA-RSi γ1 (A2) R Si γ1 -X A -R FA2 -X A -R Si γ1 (A2) 式中: In the formula: RFA1分別獨立地為Rf1-RF-Oq-, R FA1 are independently Rf 1 -R F -O q -, RFA2為-Rf2 p-RF-Oq-, R FA2 is -Rf 2 p -R F -O q -, RF分別獨立地為2價氟聚醚基, R F are independently divalent fluoropolyether groups, Rf1為可經1個或多於1個的氟原子所取代之C1-16烷基, Rf 1 is a C 1-16 alkyl group which may be substituted by 1 or more than 1 fluorine atom, Rf2為可經1個或多於1個的氟原子所取代之C1-6伸烷基, Rf 2 is a C 1-6 alkylene group which may be substituted by 1 or more than 1 fluorine atom, p為0或1, p is 0 or 1, q分別獨立地為0或1, q is independently 0 or 1, RSi分別獨立地為含有與羥基、水解性基、氫原子或1價基鍵結之Si原子的1價基, R Si is each independently a univalent group containing a Si atom bonded to a hydroxyl group, a hydrolyzable group, a hydrogen atom or a univalent group, 至少1個RSi為含有與羥基或水解性基鍵結之Si原子的1價基, At least one R Si is a univalent group containing a Si atom bonded to a hydroxyl group or a hydrolyzable group, XA分別獨立地為單鍵或2至10價基, X A are each independently a single bond or a valence base of 2 to 10, α1為1至9的整數, α1 is an integer from 1 to 9, β1為1至9的整數, β1 is an integer from 1 to 9, γ1分別獨立地為1至9的整數。 γ1 is each independently an integer from 1 to 9. 如請求項11所述之表面處理劑,其中於式(A1)及(A2)中,RF分別獨立地為以下列式所表示之基: The surface treatment agent as claimed in claim 11, wherein in the formulas (A1) and (A2), R F are each independently a base represented by the following formula: -(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3RFa 6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - 式中: In the formula: RFa分別獨立地為氫原子、氟原子或氯原子, R Fa are each independently a hydrogen atom, a fluorine atom or a chlorine atom, a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的RFa為氫原子或氯原子之情形時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e and f are each independently an integer from 0 to 200. The sum of a, b, c, d, e and f is more than 1. Mark a, b, c, d, e or f The order of existence of each repeating unit enclosed in parentheses is arbitrary in the formula. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more. . 如請求項11或12所述之表面處理劑,其中於式(A1)及(A2)中,Rf1為C1-16全氟烷基, The surface treatment agent as described in claim 11 or 12, wherein in formulas (A1) and (A2), Rf 1 is a C 1-16 perfluoroalkyl group, Rf2為C1-6全氟伸烷基, Rf 2 is C 1-6 perfluoroalkyl group, RF分別獨立地為以下列式所表示之基: R F are independently the basis represented by the following formula: -(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - 式中: In the formula: a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的RFa為氫原子或氯原子之情形時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e and f are each independently an integer from 0 to 200. The sum of a, b, c, d, e and f is more than 1. Mark a, b, c, d, e or f The order of existence of each repeating unit enclosed in parentheses is arbitrary in the formula. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more. . 如請求項11至13中任一項所述之表面處理劑,其中於式(A1)及(A2)中,RF分別獨立地為以下述式(f1)、(f2)、(f3)、(f4)、(f5)或(f6)所表示之基: The surface treatment agent as described in any one of claims 11 to 13, wherein in the formulas (A1) and (A2), R F is independently the following formula (f1), (f2), (f3), The basis represented by (f4), (f5) or (f6): -(OC3F6)d-(OC2F4)e- (f1) -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1) 式中,d為1至200的整數,e為0或1; In the formula, d is an integer from 1 to 200, and e is 0 or 1; -(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f2) -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2) 式中,c及d分別獨立地為0至30的整數, In the formula, c and d are independently integers from 0 to 30, e及f分別獨立地為1至200的整數, e and f are independently integers from 1 to 200, c、d、e及f之和為10至200的整數, The sum of c, d, e and f is an integer from 10 to 200, 標註c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; The order of existence of each repeating unit marked c, d, e or f and enclosed in parentheses is arbitrary in the formula; -(R6-R7)g- (f3) -(R 6 -R 7 ) g - (f3) 式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 , R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups selected from these groups, g為2至100的整數; g is an integer from 2 to 100; -(R6-R7)g-Rr-(R7’-R6’)g’- (f4) -(R 6 -R 7 ) g -R r -(R 7' -R 6' ) g' - (f4) 式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 , R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups independently selected from these groups, R6’為OCF2或OC2F4R 6' is OCF 2 or OC 2 F 4 , R7’為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基或是獨立地選自此等基之2或3個基的組合, R 7' is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 or a combination of 2 or 3 groups independently selected from these groups, g為2至100的整數, g is an integer from 2 to 100, g’為2至100的整數, g’ is an integer from 2 to 100, Rr為下列式: R r is the following formula:
Figure 112115596-A0202-13-0009-43
Figure 112115596-A0202-13-0009-43
式中,*表示鍵結位置; In the formula, * represents the bonding position; -(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f5) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5) 式中,e為1以上200以下的整數,a、b、c、d及f分別獨立地為0以上200以下的整數,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, e is an integer from 1 to 200, a, b, c, d and f are each independently an integer from 0 to 200. Label a, b, c, d, e or f and enclose it in brackets. The order of existence of each repeating unit in the formula is arbitrary; -(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f6) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6) 式中,f為1以上200以下的整數,a、b、c、d及e分別獨立地為0以上200以下的整數,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。 In the formula, f is an integer from 1 to 200, a, b, c, d and e are each independently an integer from 0 to 200. Label a, b, c, d, e or f and enclose it in brackets. The order of existence of each repeating unit in the formula is arbitrary.
如請求項11至14中任一項所述之表面處理劑,其中RSi為以下述式(S1)、(S2)、(S3)、(S4)或(S5)所表示之基: The surface treatment agent according to any one of claims 11 to 14, wherein R Si is a group represented by the following formula (S1), (S2), (S3), (S4) or (S5):
Figure 112115596-A0202-13-0010-44
Figure 112115596-A0202-13-0010-44
- SiR11 n1R12 3-n1 (S2) - SiR 11 n1 R 12 3-n1 (S2) - SiRa1 k1Rb1 l1Rc1 m1 (S3) - SiR a1 k1 R b1 l1 R c1 m1 (S3) - CRd1 k2Re1 l2Rf1 m2 (S4) - CR d1 k2 R e1 l2 R f1 m2 (S4) - NRg1Rh1 (S5) - NR g1 R h1 (S5) 式中: In the formula: R11分別獨立地為羥基或水解性基, R 11 are each independently a hydroxyl group or a hydrolyzable group, R12分別獨立地為氫原子或1價有機基, R 12 is each independently a hydrogen atom or a monovalent organic group, n1於每個(SiR11 n1R12 3-n1)單元中分別獨立地為0至3的整數, n1 is an integer from 0 to 3 independently in each (SiR 11 n1 R 12 3-n1 ) unit, X11分別獨立地為單鍵或2價基, X 11 is independently a single bond or a divalent base, R13分別獨立地為氫原子或1價有機基, R 13 is each independently a hydrogen atom or a monovalent organic group, t分別獨立地為2以上的整數, t is independently an integer above 2, R14分別獨立地為氫原子、鹵素原子或-X11-SiR11 n1R12 3-n1R 14 is independently a hydrogen atom, a halogen atom or -X 11 -SiR 11 n1 R 12 3-n1 , R15分別獨立地為單鍵、氧原子、碳數1至6的伸烷基或碳數1至6的伸烷氧基, R 15 is each independently a single bond, an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or an alkyleneoxy group having 1 to 6 carbon atoms, Ra1分別獨立地為-Z1-SiR21 p1R22 q1R23 r1R a1 are independently -Z 1 -SiR 21 p1 R 22 q1 R 23 r1 ; Z1分別獨立地為2價基, Z 1 are independently 2-valent bases, R21分別獨立地為-Z1’-SiR21’ p1’R22’ q1’R23’ r1’R 21 are independently -Z 1' -SiR 21' p1' R 22' q1' R 23' r1' ; R22分別獨立地為羥基或水解性基, R 22 are each independently a hydroxyl group or a hydrolyzable group, R23分別獨立地為氫原子或1價有機基, R 23 is each independently a hydrogen atom or a monovalent organic group, p1分別獨立地為0至3的整數, p1 are independently integers from 0 to 3, q1分別獨立地為0至3的整數, q1 are independently integers from 0 to 3, r1分別獨立地為0至3的整數, r1 are independently integers from 0 to 3, p1、q1及r1之合計於(SiR21 p1R22 q1R23 r1)單元中為3, The total of p1, q1 and r1 in the unit (SiR 21 p1 R 22 q1 R 23 r1 ) is 3, Z1’分別獨立地為2價基, Z 1' are independently 2-valent bases, R21’分別獨立地為-Z1”-SiR22” q1”R23” r1”R 21' are independently -Z 1” -SiR 22” q1” R 23” r1” ; R22’分別獨立地為羥基或水解性基, R 22' are each independently a hydroxyl group or a hydrolyzable group, R23’分別獨立地為氫原子或1價有機基, R 23' are each independently a hydrogen atom or a monovalent organic group, p1’分別獨立地為0至3的整數, p1’ are independently integers from 0 to 3, q1’分別獨立地為0至3的整數, q1’ are independently integers from 0 to 3, r1’分別獨立地為0至3的整數, r1’ are independently integers from 0 to 3, p1’、q1’及r1’之合計於(SiR21’ p1’R22’ q1’R23’ r1’)單元中為3, The total of p1', q1' and r1' in the (SiR 21' p1' R 22' q1' R 23' r1' ) unit is 3, Z1”分別獨立地為2價基, Z 1” are independently 2-valent bases, R22”分別獨立地為羥基或水解性基, R 22″ are each independently a hydroxyl group or a hydrolyzable group, R23”分別獨立地為氫原子或1價有機基, R 23″ are each independently a hydrogen atom or a monovalent organic group, q1”分別獨立地為0至3的整數, q1” are independently integers from 0 to 3, r1”分別獨立地為0至3的整數, r1” are independently integers from 0 to 3, q1”及r1”之合計於(SiR22” q1”R23” r1”)單元中為3, The total of q1” and r1” in the unit (SiR 22” q1” R 23” r1” ) is 3, Rb1分別獨立地為羥基或水解性基, R b1 are each independently a hydroxyl group or a hydrolyzable group, Rc1分別獨立地為氫原子或1價有機基, R c1 are each independently a hydrogen atom or a monovalent organic group, k1分別獨立地為0至3的整數, k1 are independently integers from 0 to 3, l1分別獨立地為0至3的整數, l1 are independently integers from 0 to 3, m1分別獨立地為0至3的整數, m1 are independently integers from 0 to 3, k1、l1及m1之合計於(SiRa1 k1Rb1 l1Rc1 m1)單元中為3, The total of k1, l1 and m1 in the (SiR a1 k1 R b1 l1 R c1 m1 ) unit is 3, Rd1分別獨立地為-Z2-CR31 p2R32 q2R33 r2R d1 are independently -Z 2 -CR 31 p2 R 32 q2 R 33 r2 ; Z2分別獨立地為單鍵、2價基; Z 2 are independently single bond and divalent base; R31分別獨立地為-Z2’-CR32’ q2’R33’ r2’R 31 are independently -Z 2' -CR 32' q2' R 33' r2' ; R32分別獨立地為-Z3-SiR34 n2R35 3-n2R 32 are each independently -Z 3 -SiR 34 n2 R 35 3-n2 , R33分別獨立地為氫原子、羥基或1價有機基, R 33 is independently a hydrogen atom, a hydroxyl group or a monovalent organic group, p2分別獨立地為0至3的整數, p2 are independently integers from 0 to 3, q2分別獨立地為0至3的整數, q2 are independently integers from 0 to 3, r2分別獨立地為0至3的整數, r2 are independently integers from 0 to 3, p2、q2及r2之合計於(CR31 p2R32 q2R33 r2)單元中為3, The total of p2, q2 and r2 in the unit (CR 31 p2 R 32 q2 R 33 r2 ) is 3, Z2’分別獨立地為單鍵或2價基; Z 2' is independently a single bond or a divalent base; R32’分別獨立地為-Z3-SiR34 n2R35 3-n2R 32' are each independently -Z 3 -SiR 34 n2 R 35 3-n2 , R33’分別獨立地為氫原子、羥基或1價有機基, R 33' are each independently a hydrogen atom, a hydroxyl group or a monovalent organic group, q2’分別獨立地為0至3的整數, q2’ are independently integers from 0 to 3, r2’分別獨立地為0至3的整數, r2’ are independently integers from 0 to 3, q2’及r2’之合計於(CR32’ q2’R33’ r2’)單元中為3, The total of q2' and r2' in the (CR 32' q2' R 33' r2' ) unit is 3, Z3分別獨立地為單鍵或2價基; Z 3 is independently a single bond or a divalent base; R34分別獨立地為羥基或水解性基, R 34 are each independently a hydroxyl group or a hydrolyzable group, R35分別獨立地為氫原子或1價有機基, R 35 is each independently a hydrogen atom or a monovalent organic group, n2分別獨立地為0至3的整數, n2 are independently integers from 0 to 3, Re1分別獨立地為-Z3-SiR34 n2R35 3-n2R e1 are each independently -Z 3 -SiR 34 n2 R 35 3-n2 , Rf1分別獨立地為氫原子、羥基或1價有機基, R f1 are each independently a hydrogen atom, a hydroxyl group or a monovalent organic group, k2分別獨立地為0至3的整數, k2 are independently integers from 0 to 3, l2分別獨立地為0至3的整數, l2 are independently integers from 0 to 3, m2分別獨立地為0至3的整數, m2 are independently integers from 0 to 3, k2、l2及m2之合計於(CRd1 k2Re1 l2Rf1 m2)單元中為3, The total of k2, l2 and m2 in the (CR d1 k2 R e1 l2 R f1 m2 ) unit is 3, Rg1及Rh1分別獨立地為-Z4-SiR11 n1R12 3-n1、-Z4-SiRa1 k1Rb1 l1Rc1 m1或-Z4-CRd1 k2Re1 l2Rf1 m2R g1 and R h1 are independently -Z 4 -SiR 11 n1 R 12 3-n1 , -Z 4 -SiR a1 k1 R b1 l1 R c1 m1 or -Z 4 -CR d1 k2 R e1 l2 R f1 m2 , Z4分別獨立地為單鍵或2價基, Z 4 is independently a single bond or a divalent base, 惟於式(S1)、(S2)、(S3)、(S4)及(S5)中,存在有至少1個與羥基或水解性基鍵結之Si原子。 However, in formulas (S1), (S2), (S3), (S4) and (S5), there is at least one Si atom bonded to a hydroxyl group or a hydrolyzable group.
如請求項11至15中任一項所述之表面處理劑,其中α1、β1及γ1為1,XA為2價基。 The surface treatment agent as described in any one of claims 11 to 15, wherein α1, β1 and γ1 are 1, and X A is a divalent base. 如請求項11至16中任一項所述之表面處理劑,其中XA為單鍵或以下述式所表示之2價基: The surface treatment agent as described in any one of claims 11 to 16, wherein X A is a single bond or a divalent radical represented by the following formula: -(R51)p5-(X51)q5- -(R 51 ) p5 -(X 51 ) q5 - 式中: In the formula: R51為單鍵、-(CH2)s5-或鄰、間或對伸苯基, R 51 is a single bond, -(CH 2 ) s5 - or o-, m- or p-phenylene group, s5為1至20的整數, s5 is an integer from 1 to 20, X51為-(X52)l5-, X 51 is -(X 52 ) l5 -, X52分別獨立地為選自由-O-、-S-、鄰、間或對伸苯基、-C(O)O-、-Si(R53)2-、-(Si(R53)2O)m5-Si(R53)2-、-CONR54-、-O-CONR54-、-NR54-及-(CH2)n5-所組成之群組的基, X 52 is independently selected from -O-, -S-, o-, m- or p-phenylene, -C(O)O-, -Si(R 53 ) 2 -, -(Si(R 53 ) 2 O) m5 -The base of the group consisting of -Si(R 53 ) 2 -, -CONR 54 -, -O-CONR 54 -, -NR 54 - and -(CH 2 ) n5 -, R53分別獨立地為苯基、C1-6烷基或C1-6烷氧基, R 53 is independently phenyl, C 1-6 alkyl or C 1-6 alkoxy, R54分別獨立地為氫原子、苯基或C1-6烷基, R 54 is independently a hydrogen atom, a phenyl group or a C 1-6 alkyl group, m5分別獨立地為1至100的整數, m5 are independently integers from 1 to 100, n5分別獨立地為1至20的整數, n5 are independently integers from 1 to 20, l5為1至10的整數, l5 is an integer from 1 to 10, p5為0或1, p5 is 0 or 1, q5為0或1, q5 is 0 or 1, 在此,p5及q5的至少一方為1,標註p5或q5並以括弧括起之各重複單元的存在順序為任意, Here, at least one of p5 and q5 is 1, and the order of existence of the repeating units marked with p5 or q5 and enclosed in parentheses is arbitrary, 右側鍵結於RSiThe right side is bonded to R Si . 如請求項11至15中任一項所述之表面處理劑,其中XA為以下述式所表示之基: The surface treatment agent according to any one of claims 11 to 15, wherein X A is a base represented by the following formula:
Figure 112115596-A0202-13-0015-45
Figure 112115596-A0202-13-0015-45
式中,Xa為單鍵或2價基。 In the formula, X a is a single bond or a divalent base.
如請求項10至18中任一項所述之表面處理劑,其中相對於成分(A)與成分(B)之合計,前述成分(B)的含量為1至70質量%。 The surface treatment agent according to any one of claims 10 to 18, wherein the content of the component (B) is 1 to 70% by mass relative to the total of the component (A) and the component (B). 如請求項10至19中任一項所述之表面處理劑,其中相對於成分(A)與成分(B)之合計,前述成分(B)的含量為1至40質量%。 The surface treatment agent according to any one of claims 10 to 19, wherein the content of the component (B) is 1 to 40% by mass relative to the total of the component (A) and the component (B). 如請求項10至20中任一項所述之表面處理劑,其更含有選自含氟油、聚矽氧油、醇及觸媒之1種或多於1種的其他成分。 The surface treatment agent as described in any one of claims 10 to 20, further contains one or more than one other component selected from the group consisting of fluorine-containing oil, polysiloxane oil, alcohol and catalyst. 如請求項10至21中任一項所述之表面處理劑,其更含有溶劑。 The surface treatment agent according to any one of claims 10 to 21, further containing a solvent. 如請求項10至22中任一項所述之表面處理劑,其係使用作為防污性塗佈劑或防水性塗佈劑。 The surface treatment agent according to any one of claims 10 to 22, which is used as an antifouling coating agent or a waterproof coating agent. 一種顆粒,係含有如請求項10至23中任一項所述之表面處理劑。 A particle containing the surface treatment agent as described in any one of claims 10 to 23. 一種物品,係包含:基材;以及於該基材上由如請求項10至23中任一項所述之表面處理劑所形成之層。 An article includes: a base material; and a layer formed on the base material by the surface treatment agent described in any one of claims 10 to 23. 如請求項25所述之物品,其中前述基材為玻璃基材。 The article of claim 25, wherein the aforementioned substrate is a glass substrate. 如請求項25所述之物品,其係光學構件。 The article according to claim 25, which is an optical component.
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