TW202132721A - Light source unit, display apparatus, and light source unit manufacturing device - Google Patents
Light source unit, display apparatus, and light source unit manufacturing device Download PDFInfo
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- TW202132721A TW202132721A TW110100466A TW110100466A TW202132721A TW 202132721 A TW202132721 A TW 202132721A TW 110100466 A TW110100466 A TW 110100466A TW 110100466 A TW110100466 A TW 110100466A TW 202132721 A TW202132721 A TW 202132721A
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
- F21S2/00—Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V3/00—Globes; Bowls; Cover glasses
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V3/00—Globes; Bowls; Cover glasses
- F21V3/04—Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings
- F21V3/10—Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings characterised by coatings
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V7/00—Reflectors for light sources
- F21V7/22—Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors
- F21V7/28—Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors characterised by coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2105/00—Planar light sources
- F21Y2105/10—Planar light sources comprising a two-dimensional array of point-like light-generating elements
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2115/00—Light-generating elements of semiconductor light sources
- F21Y2115/10—Light-emitting diodes [LED]
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2115/00—Light-generating elements of semiconductor light sources
- F21Y2115/20—Electroluminescent [EL] light sources
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2115/00—Light-generating elements of semiconductor light sources
- F21Y2115/30—Semiconductor lasers
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- General Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
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- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Planar Illumination Modules (AREA)
Abstract
Description
本發明係關於一種光源單元及顯示裝置,尤其有關一種考慮微小光源的配光特性而設計之光源單元及顯示裝置。又,本發明係還關於一種製造光源單元之光源單元製造裝置。The present invention relates to a light source unit and a display device, and more particularly to a light source unit and a display device designed in consideration of the light distribution characteristics of tiny light sources. Moreover, the present invention also relates to a light source unit manufacturing device for manufacturing the light source unit.
為了顯示高品質的視訊,對用作液晶電視機等顯示裝置的背光之光源單元要求光出射面上之亮度的均勻性。作為能夠進行均勻的光照射之先前的光源單元,例如可以舉出專利文獻1中所記載之光源模組。In order to display high-quality video, a light source unit used as a backlight of a display device such as a liquid crystal television requires uniformity of brightness on the light exit surface. As a conventional light source unit capable of uniform light irradiation, for example, a light source module described in
專利文獻1中所記載之光源模組被用作直下型的背光,其在光源與光出射面之間具備透射反射板(在專利文獻1中標記為“光幕(lighting curtain)”)。依據該構成,即使在利用了指向性強的光源之情況下,亦能夠抑制出射面上之亮度不均來均勻地照射光。The light source module described in
[專利文獻1]日本特開2012-0174634號公報[Patent Document 1] JP 2012-0174634 A
期望作為顯示裝置的背光之光源單元比包含專利文獻1的光源模組之先前品薄型化。又,作為光源單元的品質,要求進一步對出射面上之亮度的均勻性進行提高。但是,在光源單元中存在愈薄型化,則愈難以確保出射面上之亮度的均勻性之傾向。The light source unit as the backlight of the display device is expected to be thinner than the prior product including the light source module of
本發明係鑑於上述情況而完成者,其課題在於解決以下所示之目的。 本發明的目的在於,解決上述先前技術的問題點,並提供一種即使在薄型化的情況下亦能夠確保出射面上之亮度的均勻性之光源單元及顯示裝置。 又,本發明的另一目的在於提供一種用於製造上述光源單元之光源單元製造裝置。The present invention was made in view of the above-mentioned circumstances, and its problem is to solve the objects shown below. The purpose of the present invention is to solve the above-mentioned problems of the prior art and provide a light source unit and a display device that can ensure the uniformity of the brightness on the exit surface even in the case of thinning. Furthermore, another object of the present invention is to provide a light source unit manufacturing apparatus for manufacturing the above-mentioned light source unit.
本發明人等為了達成上述目的而進行了深入研究之結果,得知了微小光源的設置面與在第一面形成有反射圖案之透光性的基材中之第二面之間的間隔對亮度的均勻性帶來影響。具體而言,間隔愈寬,則愈容易形成反射圖案,間隔變得愈窄,則愈可適當發揮反射圖案的效果。 基於以上觀點,本發明人等發現,當上述間隔在既定的數值範圍內時,使光源單元薄型化,並且確保光出射面上之亮度的均勻性,從而完成了本發明。亦即,本發明人等發現了藉由以下構成能夠解決上述課題。The inventors of the present invention have conducted intensive studies in order to achieve the above object, and found that the distance between the installation surface of the micro light source and the second surface of the translucent substrate with a reflective pattern formed on the first surface is relative to The uniformity of brightness has an impact. Specifically, the wider the interval, the easier it is to form a reflective pattern, and the narrower the interval, the more appropriate the effect of the reflective pattern can be exerted. Based on the above viewpoints, the inventors of the present invention found that when the aforementioned interval is within a predetermined numerical range, the light source unit is made thinner and the brightness uniformity on the light exit surface is ensured, thereby completing the present invention. That is, the inventors of the present invention found that the above-mentioned problem can be solved by the following configuration.
[1]一種光源單元,其係具有:光源設置面,係設置有至少一個微小光源;基材,係與光源設置面排列而配置且具有透光性;及反射圖案,係根據至少一個微小光源的配光特性而形成於基材中位於光源設置面側之第一面,基材中位於與第一面相反的一側之第二面與光源設置面之間的間隔為1mm以上且2mm以下。 [2]如[1]所述之光源單元,其係具備具有平面狀的光源設置面之基板,在光源設置面上,作為至少一個微小光源之複數個微小發光元件以光源設置面的中央位置作為基準而對稱地配置。 [3]如[1]或[2]所述之光源單元,其中在第一面上,作為反射圖案之複數個單位圖案以第一面的中央位置作為基準而對稱地形成。 [4]如[3]所述之光源單元,其中複數個單位圖案分別由氧化鈦構成。 [5]如[3]或[4]所述之光源單元,其中複數個單位圖案分別具有朝向光源設置面突出且隨著靠近光源設置面而直徑階段性地變小之形狀。 [6]如[3]至[5]之任一項所述之光源單元,其中複數個單位圖案分別為了使與第二面上之亮度的分布有關之指標值滿足設定條件而形成於第一面。 [7]如[6]所述之光源單元,其中藉由滿足下述第一條件及第二條件,指標值滿足設定條件,複數個單位圖案各自的厚度、尺寸及配置位置為以滿足第一條件及第二條件之方式確定之厚度、尺寸及配置位置。 第一條件:第二面中位於與至少一個微小光源重疊之位置之特定區域及包圍特定區域之周邊區域各自中之亮度成為基準值以下。 第二條件:第二面上之亮度的分散程度在目標範圍內。 [8]如[1]至[7]之任一項所述之光源單元,其中基材由具有透光性之薄膜材料構成。 [9]如[1]至[8]之任一項所述之光源單元,其中基材和反射圖案構成第一光散射體,在第一光散射體與至少一個光源之間配置有第二光散射體,僅在第一光散射體及第二光散射體中的第一光散射體上設置有反射圖案。 [10]如[9]所述之光源單元,其中分別在與光源設置面平行且相互正交之兩個方向上,相對於光源設置面之第一光散射體的正規的配置位置與第一光散射體的實際配置位置的偏離量為0.2mm以下。 [11]一種顯示裝置,其係具有液晶顯示器,在前述液晶顯示器的背面側具備[1]至[10]之任一項所述之光源單元作為背光單元。 [12]一種光源單元製造裝置,其係製造[1]至[10]之任一項所述之光源單元,前述光源單元製造裝置係具有:配光特性獲取裝置,係獲取至少一個微小光源的配光特性;及圖案形成裝置,係按照根據所獲取之配光特性而生成之圖案形成資料,在基材的第一面上形成反射圖案。 [發明效果][1] A light source unit having: a light source installation surface, which is provided with at least one micro light source; a substrate, which is arranged in line with the light source installation surface and is transparent; and a reflection pattern, which is based on the at least one micro light source The light distribution characteristics of the base material are formed on the first surface on the side of the light source installation surface, and the distance between the second surface on the opposite side of the first surface and the light source installation surface is 1mm or more and 2mm or less . [2] The light source unit according to [1], which is provided with a substrate having a planar light source installation surface, and on the light source installation surface, a plurality of micro light emitting elements as at least one micro light source are positioned at the center of the light source installation surface It is arranged symmetrically as a reference. [3] The light source unit according to [1] or [2], wherein on the first surface, a plurality of unit patterns as reflection patterns are symmetrically formed with the center position of the first surface as a reference. [4] The light source unit according to [3], wherein the plurality of unit patterns are each composed of titanium oxide. [5] The light source unit according to [3] or [4], wherein the plurality of unit patterns respectively have a shape that protrudes toward the light source installation surface and gradually decreases in diameter as it approaches the light source installation surface. [6] The light source unit according to any one of [3] to [5], wherein a plurality of unit patterns are formed on the first surface in order to satisfy the set conditions for index values related to the brightness distribution on the second surface. noodle. [7] The light source unit according to [6], wherein by satisfying the following first and second conditions, the index value satisfies the setting condition, and the thickness, size and arrangement position of each of the plurality of unit patterns are to satisfy the first The thickness, size and placement position determined by the condition and the second condition. The first condition: the brightness in each of the specific area located at the position overlapping with the at least one tiny light source and the peripheral area surrounding the specific area on the second surface becomes below the reference value. The second condition: the degree of brightness dispersion on the second surface is within the target range. [8] The light source unit according to any one of [1] to [7], wherein the substrate is composed of a thin film material having light transmittance. [9] The light source unit according to any one of [1] to [8], wherein the base material and the reflective pattern constitute a first light scattering body, and a second light scattering body is arranged between the first light scattering body and the at least one light source. The light scattering body is provided with a reflective pattern only on the first light scattering body among the first light scattering body and the second light scattering body. [10] The light source unit according to [9], wherein the normal arrangement position of the first light scatterer relative to the light source installation surface and the first The amount of deviation of the actual arrangement position of the light scattering body is 0.2 mm or less. [11] A display device having a liquid crystal display, and the light source unit described in any one of [1] to [10] as a backlight unit on the back side of the liquid crystal display. [12] A light source unit manufacturing device that manufactures the light source unit described in any one of [1] to [10], the light source unit manufacturing device having: a light distribution characteristic acquisition device that acquires at least one tiny light source Light distribution characteristics; and a pattern forming device, which forms a reflective pattern on the first surface of the substrate in accordance with the pattern formation data generated according to the acquired light distribution characteristics. [Effects of the invention]
依本發明,能夠實現一種薄型化且確保了出射面上之亮度的均勻性之光源單元及顯示裝置。 又,依本發明,能夠提供一種製造上述光源單元之裝置。According to the present invention, it is possible to realize a light source unit and a display device that are thinner and ensure the uniformity of the brightness on the exit surface. Furthermore, according to the present invention, it is possible to provide an apparatus for manufacturing the above-mentioned light source unit.
以下,參閱所附圖式所示之較佳實施形態,對本發明的一實施形態(以下,稱為本實施形態)進行詳細說明。 另外,以下說明之裝置構成、用途及用法係基於本發明的代表性實施態樣者,但本發明並不限定於這樣的實施態樣。亦即,本發明只要不脫離其趣旨,則能夠從以下說明之實施形態進行變更或改良。又,本發明中當然包括其等效物。Hereinafter, an embodiment of the present invention (hereinafter referred to as this embodiment) will be described in detail with reference to preferred embodiments shown in the accompanying drawings. In addition, the device configuration, usage, and usage described below are based on representative embodiments of the present invention, but the present invention is not limited to such embodiments. That is, the present invention can be changed or improved from the embodiment described below as long as it does not deviate from its spirit. In addition, of course, the equivalents are included in the present invention.
另外,在本說明書中,使用“~”表示之數值範圍係指將記載於“~”前後之數值作為下限值及上限值而包含之範圍。 又,在本說明書中,“相同”、“同樣”及“同等”除了包括完全同等之情況之外,還包括雖然稍微不同,但該不同在本發明的技術領域中通常容許之誤差範圍內之情況。 又,在本說明書中,在稱為“全部”、“均”及“整個面”等時,除了包括100%的情況之外,還包括包含在本發明所屬之技術領域中通常容許之誤差範圍,例如99%以上、95%以上或90%以上的情況。 又,在本說明書中,“平行”除了包括相對於成為基準之線、面或方向平行的情況之外,還包括雖然存在幾度的傾斜度,但大致平行的情況。In addition, in this specification, the numerical range represented by "-" means the range which includes the numerical value described before and after "-" as the lower limit and the upper limit. In addition, in this specification, "same", "same" and "equivalent" include not only the case of being completely equivalent, but also includes the difference in the range of error generally allowed in the technical field of the present invention, although the difference is slightly different. Condition. In addition, in this specification, the term "all", "equal", "entire surface", etc., includes not only the case of 100%, but also includes the error range that is generally allowed in the technical field to which the present invention belongs. , Such as 99% or more, 95% or more, or 90% or more. In addition, in this specification, "parallel" includes not only the case of being parallel to the reference line, surface, or direction, but also the case of being substantially parallel although there is an inclination of several degrees.
又,在以下的說明中,“配光特性”係指來自光源之光的發散程度,係從光源向各方向之強度(例如,輻射強度或照度等)的分布。配光特性通常由如圖1所示之特性圖表示。在特性圖中,將強度成為最大之方向上之出射光的強度設為100%,且以相對值(比率)表示向各方向之出射光的強度。 另外,配光被分類為從光源看似點之無窮遠的距離測定之遠場(far-field)配光和從能夠判別從光源內的各個點發出之光的分布之距離測定之近場(rear-field)配光。以下,除非特別指定之情況,否則配光係指遠場配光。In addition, in the following description, "light distribution characteristics" refers to the degree of divergence of light from a light source, and is the distribution of intensity (for example, radiation intensity or illuminance, etc.) from the light source in various directions. The light distribution characteristics are usually represented by the characteristic diagram shown in Figure 1. In the characteristic diagram, the intensity of the emitted light in the direction where the intensity becomes the maximum is set to 100%, and the intensity of the emitted light in each direction is expressed as a relative value (ratio). In addition, the light distribution is classified into the far-field light distribution measured from the infinite distance of the point where the light source appears, and the near-field light distribution measured from the distance that can discriminate the distribution of light emitted from various points in the light source ( rear-field) light distribution. Below, unless otherwise specified, the light distribution refers to the far-field light distribution.
又,在以下的說明中,除非特別指定之情況,否則“反射”係指擴散反射(漫反射),其含義視為與擴散相同。In addition, in the following description, unless otherwise specified, "reflection" refers to diffuse reflection (diffuse reflection), and its meaning is regarded as the same as diffusion.
[本實施形態之顯示裝置的概要]
如圖2所示,本實施形態之顯示裝置10具有顯示圖像之液晶顯示器(Liquid Crystal Display:以下,標記為LCD)12和配置於LCD12的背面側之光源單元14。[Outline of the display device of this embodiment]
As shown in FIG. 2, the
LCD12作為圖像顯示面板而發揮作用,來自光源單元14之光從其背面側照射到LCD12的顯示畫面上。The
光源單元14作為直下型的背光單元而具備於顯示裝置10中,係朝向LCD12側之表面構成出射面之面狀照明裝置。如圖3所示,光源單元14具有設置有至少一個微小光源16之光源設置面22和與光源設置面22排列而配置之具有透光性之基材24。在基材24中位於光源設置面22側之第一面26上設置有根據至少一個微小光源16的配光特性而形成之反射圖案30。如圖3所示,反射圖案30由複數個單位圖案32構成。
另外,在圖3所示之剖面圖中,為了簡化圖示,將微小光源16及單位圖案32各自的個數設為與實際不同之個數。The
又,在本實施形態中,基材中位於與第一面26相反的一側之第二面28與光源設置面22之間的間隔(在圖3中,用符號d表示)為1mm以上且2mm以下。藉此,在本實施形態中,能夠使光源單元14及顯示裝置10分別薄型化,並且確保出射面上之亮度的均勻性。In addition, in this embodiment, the distance between the
更詳細地進行說明,間隔d變得愈寬,則愈容易設置反射圖案30,間隔d變得愈窄,則能夠愈良好地發揮反射圖案30的效果。另一方面,對包括光源單元14之顯示裝置10要求進一步的薄型化,但愈薄型化,則間隔d愈窄,因此難以設置反射圖案30。Describing in more detail, the wider the interval d, the easier it is to provide the
在此,假定在基材24上未設置有反射圖案30之情況下,與作為出射面之第二面28上之亮度的分布有關之指標值相對於間隔d的變化而以圖4及圖5所示之舉動變化。Here, assuming that the
圖4所示之指標值(縱軸的數值)係第二面28上之亮度的分布(直方圖)上的最大點與最小點的差分除以亮度的平均值所得之值,以下,為了方便起見稱為“正規化動態範圍”。另外,亮度的分布的最大點係相當於累積直方圖的97%之點,最小點相當於累積直方圖的3%。
圖5所示之指標值(縱軸的數值)係根據第二面28上之亮度的二維分布計算出之標準偏差(西格瑪)除以亮度的平均值所得之值,以下,為了方便起見稱為“正規化西格瑪”。
亮度的分布的均勻性愈高,則正規化動態範圍及正規化西格瑪均變得愈小。The index value shown in Fig. 4 (the value on the vertical axis) is the value obtained by dividing the difference between the maximum point and the minimum point on the brightness distribution (histogram) on the
在基材24上未設置有反射圖案30之情況下,由圖4及圖5可知,為了確保亮度的均勻性,需要將間隔d設為比較大(例如,在圖4及圖5所示之情況下設為超出15mm)。In the case where the
與其相反地,藉由在基材24的第一面26上形成反射圖案30,如圖6及圖7所示,即使在間隔d為1.0mm~2.0mm的情況下,亦能夠與上述相同程度地確保亮度的均勻性。但是,由圖6及圖7可知,若間隔d變小,則難以確保亮度的均勻性,若間隔d小於1mm,則僅藉由反射圖案30難以確保均勻性。On the contrary, by forming the
又,由圖8及圖9可知,在基材24上設置有反射圖案30之構成中,若基材24的配置位置從正規的位置偏離,則亮度的均勻性會降低。
圖8及圖9表示基材24的配置位置偏離之情況(具體而言,在後述之XY方向上配置位置偏離0.2mm之情況)的指標值的變化,圖8示出正規化動態範圍的變化,圖9示出正規化西格瑪的變化。另外,在圖8及圖9所示之情況下,藉由基材24的配置位置偏離,指標值向圖中的箭頭方向上升。In addition, as can be seen from FIGS. 8 and 9, in the configuration in which the
在此,在間隔d為2.0mm的情況下,與間隔d為1.0mm的情況相比,配置位置的偏離對亮度的均勻性帶來之影響變小,換言之,針對配置位置的偏離之穩健性(robustness)(耐性)變高。
基於以上觀點,在本實施形態中,將間隔d設為1mm以上且2mm以下,藉此來實現光源單元14的薄型化及出射面上之亮度的均勻性的改善。Here, when the interval d is 2.0 mm, compared with the case where the interval d is 1.0 mm, the effect of the deviation of the arrangement position on the uniformity of brightness becomes smaller, in other words, the robustness against the deviation of the arrangement position (Robustness) (resistance) becomes higher.
Based on the above point of view, in the present embodiment, the interval d is set to 1 mm or more and 2 mm or less, thereby achieving the thinning of the
又,在本實施形態中,基材24和反射圖案30構成第一光散射體34,如圖3所示,在第一光散射體34與至少一個微小光源16之間配置有第二光散射體36。又,反射圖案30僅設置於第一光散射體34及第二光散射體36中的第一光散射體34上,而未設置於第二光散射體36上。Furthermore, in this embodiment, the
如上所述,藉由在第一光散射體34與微小光源16之間配置不具備反射圖案30之第二光散射體36,針對基材24(亦即,第一光散射體34)的配置位置的偏離之穩健性(耐性)變高。
詳細地進行說明,由圖8及圖9可知,基於第一光散射體34的反射圖案30之出射面上之亮度均勻化的效果像印表機的陰影(shading)校正那樣,受到第一光散射體34的配置位置的稍微偏離的影響。As described above, by arranging the second
另一方面,藉由將第二光散射體36與第一光散射體34進行組合,如圖10及圖11所示,與未設置第二光散射體36之情況相比,能夠進一步減輕第一光散射體34的配置位置偏離時的亮度的均勻性降低。這樣的設置第二光散射體36之效果在來自微小光源16之配光強度在有限範圍內變高(亦即,係峰狀配光特性)時尤其有效。On the other hand, by combining the second
另外,圖10及圖11表示在除了具備第二光散射體36這點之外,與圖8及圖9相同之條件下基材24的配置位置偏離之情況的指標值的變化。In addition, FIGS. 10 and 11 show changes in index values when the arrangement position of the
順便提及,在使用第二光散射體36之情況下能夠容許之基材24的配置位置的偏離量在XY方向上分別為0.2mm以下。XY方向相當於與光源設置面22平行且相互正交之兩個方向。偏離量係相對於光源設置面22之第一光散射體34的正規的配置位置與第一光散射體34的實際配置位置的偏離量。
又,為了良好地發揮基於具有反射圖案30之第一光散射體34和第二光散射體36的併用之效果,間隔d較佳設定為1.0mm以上且小於2.0mm。Incidentally, when the
[本實施形態之光源單元的構成例]
如圖3所示,本實施形態之光源單元14具備設置有微小光源16之基板20和具有反射圖案30之第一光散射體34、及第二光散射體36。以下,對光源單元14的各構成設備進行說明。[Configuration example of light source unit of this embodiment]
As shown in FIG. 3, the
(微小光源)
微小光源16係指向性強的點光源,在本實施形態中,由圖3所示之微小發光元件18構成,具體而言,由被稱為迷你LED(Light Emitting Diode:發光二極體)之、晶片尺寸為100~200μm的LED構成。
但是,關於微小光源16的種類,並不限定於迷你LED,例如亦可以使用晶片尺寸為100μm以下的微型LED或LED以外的微小發光元件,具體而言,可以使用微小的電致發光元件或微小的半導體雷射器。(Tiny light source)
The micro
對本實施形態的微小發光元件18(亦即,迷你LED)的配光特性進行說明,將光的出射方向中光的強度成為最高之方向設為0度時的視角成為±65~±80度左右(亦即,約130~160度的範圍)。另外,在0度下之亮度(亦即,最大亮度)在本發明的成立上並不重要,並不受特別限定。The light distribution characteristics of the micro light-emitting element 18 (ie, mini LED) of this embodiment will be described. The viewing angle when the direction in which the light intensity becomes the highest in the light emission direction is set to 0 degrees, the viewing angle is about ±65 to ±80 degrees. (That is, the range of about 130 to 160 degrees). In addition, the brightness at 0 degrees (that is, the maximum brightness) is not important for the establishment of the present invention, and is not particularly limited.
又,微小發光元件18上可以安裝有光擴散型透鏡(未圖示)。光擴散型透鏡係使從迷你LED出射之光擴散之光擴散型的透鏡,例如為非球面透鏡,能夠適當使用能夠發揮所期望之光擴散效果之公知的透鏡構件(例如,日本特開2013-012417號公報中所揭示之透鏡構件)。藉由將這樣的光擴散型透鏡安裝於微小發光元件18上,能夠提供更高亮度且出射面上之亮度的均勻性亦優異之光源單元14。In addition, a light diffusion lens (not shown) may be attached to the micro
(基板)
基板20係平面狀的構件,係通常用作LCD12的背光單元之剛性基板、撓性基板或剛性-撓性(rigid-flexible)基板。又,基板20具有未圖示之平板狀的基底層,在基底層中LCD12所在之一側具有光源設置面22。關於基底層的材質,並不受特別限制,例如可以舉出AGSP(Advanced Grade Solid-Bump Process)、氧化鋁、玻璃環氧樹脂及PCB(Polychlorinated Biphenyl:多氯聯苯)等,特佳為導熱率高的材質。(Substrate)
The
在光源設置面22上形成有未圖示之金屬配線部。作為至少一個微小光源16之複數個微小發光元件18(例如,迷你LED)經由該金屬配線部而設置於光源設置面22。在本實施形態中,複數個微小發光元件18以光源設置面22的中央位置作為基準而有規則地且對稱地配置。舉出一例,複數個微小發光元件18從光源設置面22的中央位置開始在XY方向上以5~6mm的間隔配置成矩陣狀。
另外,就光源設置面22的中央位置而言,例如若光源設置面22為長方形或正方形,則對角線的交點的位置相當於該光源設置面22的中央位置,若光源設置面22為圓,則圓的中心位置相當於該光源設置面22的中央位置。A metal wiring part (not shown) is formed on the light
又,光源設置面22中未配置微小光源16而露出之部分(非光源配置區域)係被反射層覆蓋且具有光反射性。
另外,可以由具有光擴散性之材料例如光擴散薄膜來形成基板20的基底層,在該情況下,可以不在基底層上形成反射層。In addition, the exposed portion (non-light source arrangement area) of the light
(第一光散射體)
第一光散射體34由反射型透射體構成,如圖3所示,具備具有光透射性之透明或半透明的基材24和形成於基材24的表面之反射圖案30。(First light scatterer)
The first
(基材)
基材24由具有透光性之薄膜材料構成,但只要係使光透射者,則可以為透明的基材、半透明的基材以及其他的具備光擴散性之基材中的任一種。(Substrate)
The
如圖3所示,基材24以與基板20的光源設置面22平行之方式排列配置。相對於光源設置面22之基材24的正規的配置位置係在XY方向上基材24的中央位置與光源設置面22的中央位置一致且基材24的延伸方向與光源設置面22的延伸方向一致時之位置。
另外,就基材24的中央位置而言,例如若基材24的表面為長方形或正方形,則對角線的交點的位置相當於該基材24的中央位置,若基材24的表面為圓,則該圓的中心位置相當於該基材24的中央位置。As shown in FIG. 3, the
作為構成基材24之薄膜材料,例如能夠舉出聚對酞酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)及聚乳酸(PLA)等聚酯系樹脂;三乙酸纖維素等纖維素系樹脂;聚乙烯(PE)、聚丙烯(PP)及環烯烴系(COC、COP)樹脂等聚烯烴系樹脂;聚甲基丙烯酸甲酯(PMMA)等丙烯酸系樹脂;聚碳酸酯(PC)樹脂;聚四氟乙烯(PTFE)等氟系樹脂等。Examples of the film material constituting the
又,基材24可以係由1層構成者,或者,亦可以係由2層以上構成者。例如,由複數層構成之基材24可以包括由光擴散薄膜構成之層。
順便提及,在本實施形態的基材24上,在微小光源16所在之一側設置有與反射圖案30相同之材質的反射層(未圖示)。該反射層係厚度均勻且充分小的層。In addition, the
又,當將透明薄膜用作基材24時,基材24的透射率(嚴格來說,微小光源16在發光波長帶中之平均光線透射率)較佳為50%以上,更佳為70%以上,特佳為85%以上。Furthermore, when a transparent film is used as the
又,基材24可以係具備光擴散性者。例如,可以藉由在基材24的至少一個表面上形成凹凸形狀或稜鏡形狀而對基材24賦予光擴散性。又,亦可以藉由使無機微粒或有機微粒分散於基材24的內部而對基材24賦予光擴散性。In addition, the
又,就基材24的折射率而言,為了使透射基材24之光線的入射角度不過度受限,根據與空氣的折射率之關係,較佳為1.00~2.00,更佳為1.30~1.80。In addition, with regard to the refractive index of the
在此,將基材24的厚度方向亦即基材24和光源設置面22的排列方向設為Z方向,將從基材24觀察時LCD12所在之一側設為+Z側,將光源設置面22所在之一側設為-Z側。基材24的-Z側的表面為第一面26,如上所述,在第一面26上形成有反射圖案30。又,基材24的+Z側的表面為第二面28,第二面28例如與LCD12的背面對向,在本實施形態中其構成光源單元14的光出射面。Here, the thickness direction of the
(反射圖案)
反射圖案30形成(圖案化)於基材24的第一面26,其反射來自複數個微小發光元件18之入射光(嚴格來說,透射了第二光散射體36之光)。反射圖案30在基材24的-Z側與基材24積層。(Reflective pattern)
The
在本實施形態中,例如,如圖12所示,反射圖案30由與微小發光元件18相同數量的單位圖案32構成。
另外,在圖12所示之反射圖案30中,為了方便圖示,單位圖案32的個數設為與實際不同之個數。In this embodiment, for example, as shown in FIG. 12, the
又,複數個單位圖案32以第一面26的中央位置作為基準而有規則地且對稱地配置。具體而言,單位圖案32從第一面26的中央位置開始分別在XY方向上以等間距形成。在此,第一面26上之單位圖案32的間距與光源設置面22上之微小發光元件18的間距同等或大致相等。藉此,如圖3所示,在基材24位於正規的配置位置之狀態下,各個單位圖案32會位於各微小發光元件18的正上方。In addition, the plurality of
又,如圖13所示,各個單位圖案32係下端比較寬的大致圓錐形狀的圖案。亦即,在本實施形態中,單位圖案32具有朝向光源設置面22突出且隨著靠近光源設置面22而直徑階段性地變小之形狀。
另外,各單位圖案32亦可以如圖13所示為朝向光源設置面22而逐漸縮徑之錐形形狀,還可以如圖14所示為藉由在複數個縮徑部位不連續地縮徑而呈階梯(段差)之形狀。
又,各單位圖案32的形狀並不限於大致圓錐形狀,亦可以為三角錐或四角錐形狀,還可以為圓柱或在俯視下呈多邊形之角柱形狀等,或者還可以為不規則形狀。In addition, as shown in FIG. 13, each
單位圖案32的材質為光反射率高的材料(以下,稱為反射材料)。作為反射材料,例如可以舉出白色顏料等,作為白色顏料,可以舉出氧化鈦、硫酸鋇、碳酸鉀、二氧化矽、滑石及黏土等。作為白色顏料以外的反射材料,可以舉出以銀錯合物為主成分之導電性銀油墨(例如,以包覆銀超微粒為主成分之導電性銀油墨)等。又,作為反射材料,能夠使用包含上述白色顏料之熱塑性樹脂組成物。作為用作反射材料之熱硬化性樹脂組成物的具體例,能夠使用公知的胺酯樹脂與異氰酸酯化合物的組合、環氧樹脂與多胺或酸酐的組合、矽酮樹脂與交聯劑的組合等包含主劑和硬化劑之2成分型的熱硬化性樹脂、以及含有胺、咪唑及磷系等硬化促進劑之3成分型的熱硬化性樹脂。具體而言,能夠例示出使用了日本特開2014-129549中所記載之矽酮系的熱硬化性樹脂之光反射層。
另外,在本實施形態中,將氧化鈦用作反射材料來形成單位圖案32。The material of the
第一面26上之反射圖案30的形成(圖案化)可以藉由噴墨方式的印刷或其他方式(例如,網版印刷等)的印刷來進行。但是,圖案形成(圖案化)的方法並不限定於印刷,亦可以為金屬蒸鍍或反射材料的塗佈。又,可以在第一面26的整個面上塗佈反射材料之後,以保留上述單位圖案32之方式削掉反射材料來形成反射圖案30。The formation (patterning) of the
然後,在本實施形態中,根據設置於光源設置面22上之微小光源16(詳細而言,作為微小發光元件18之迷你LED)的配光特性而將反射圖案30形成於第一面26。
具體而言,構成反射圖案30之複數個單位圖案32分別以與第二面28上之亮度的分布有關之指標值(例如,正規化動態範圍及正規化西格瑪等)滿足設定條件之方式形成於第一面26。在此,設定條件係作為光源單元14的要求規格而正規化動態範圍及正規化西格瑪等指標值應滿足之數值範圍。Then, in the present embodiment, the
更詳細地進行說明,在出射面中位於微小發光元件18的正上方之區域中,以使光減少至目標值之方式確定單位圖案32的厚度、尺寸及配置位置。又,在位於微小發光元件18的正上方附近的區域中,以減少各擴散光及反射光之方式確定單位圖案32的厚度、尺寸及配置位置。
在此,單位圖案32的厚度係從單位圖案32的底面(+Z側的端部)到頂部(-Z側的端部)為止的長度,單位圖案32的尺寸係單位圖案32的最大直徑。又,單位圖案32的配置位置係XY方向上之單位圖案32的中心位置(呈圓形之單位圖案32的底面的中心位置)。Described in more detail, the thickness, size, and arrangement position of the
而且,以使各單位圖案32成為所確定之厚度、尺寸及配置位置之方式將反射圖案30形成於第一面26。另外,關於形成反射圖案30之程序,在後項中詳細敘述。Furthermore, the
(第二光散射體)
第二光散射體36在其內部使來自微小光源16之光散射而使其擴散。在本實施形態中,第二光散射體36為平板或薄膜狀,如圖3所示,在Z方向上,在第一光散射體34與至少一個微小光源16(亦即,複數個微小發光元件18)之間以與第一光散射體34平行之方式配置。(Second light scatterer)
The second
從各微小發光元件18發出之光入射到第二光散射體36中,並在第二光散射體36內散射之後最終透射第二光散射體36。藉此,能夠提高作為出射面之第二面28上之亮度的均勻性,進而提高針對第一光散射體34的位置偏離之穩健性。The light emitted from each small
如上所述,在第二光散射體36上未形成有反射圖案30。具體地進行說明,第二光散射體36由包括基層和散射層之積層體構成。基層由具有透光性之板材料或薄膜材料構成,例如在包含聚碳酸酯或丙烯酸樹脂等之半透明的樹脂薄膜上形成有光擴散構造(例如,微小且無規則的透鏡陣列等)之光學薄膜能夠用作基層。散射層並不像反射圖案30那樣分散存在,而是以大致均勻的厚度形成於基層的整個表面(例如,位於第一光散射體34側之表面)。構成散射層之材料為與反射圖案30相同之反射材料,例如能夠利用氧化鈦、硫酸鋇、碳酸鉀、二氧化矽、滑石及黏土等。
另外,第二光散射體36並不限定於上述積層體,亦可以將使折射率與基材的折射率不同之光散射粒子分散於由透明的樹脂形成之基材內而構成之導光構件用作第二光散射體36。As described above, the
第二光散射體36愈靠近光源設置面22,則從微小光源16朝向第二光散射體36之光的發散愈大。又,第一光散射體34與第二光散射體36之間的距離變得愈大,則來自第二光散射體36之光的發散(擴散程度)變得愈大。考慮到這樣的傾向,期望第二光散射體36配置於能夠最大限度地發揮光發散的效果之位置。The closer the second
以上,對本實施形態的光源單元14的構成例進行了說明,但上述構成僅為一例,亦可以考慮其他構成。
在本實施形態中,作為基材24的+Z側的表面之第二面28為出射面,但並不限定於此。例如,亦可以將在第二面28上重疊稜鏡片,將該稜鏡片的+Z側的表面作為出射面。
又,在本實施形態中,設置有第二光散射體36,但亦可以為未設置有第二光散射體36之構成。
又,本實施形態之光源單元14用作顯示裝置10的背光單元,但並不限定於此,亦可以用作面發光的照明裝置。The configuration example of the
[光源單元製造裝置]
接著,對製造本實施形態的光源單元14之光源單元製造裝置40進行說明。如圖15所示,光源單元製造裝置40具有配光特性獲取裝置42、圖案形成資料生成裝置44及圖案形成裝置46。[Light source unit manufacturing device]
Next, the light source
(配光特性獲取裝置)
配光特性獲取裝置42係獲取光源單元14中所使用之微小光源16的配光特性(嚴格來說,與配光特性有關之資訊)之裝置,其例如由公知的配光特性測定裝置構成。作為配光特性測定裝置,能夠利用藉由測角器、旋轉台或旋轉鏡使光源旋轉並藉由照度計或亮度計測定該角度下之照度(發光強度)之裝置。作為其一例,可以舉出systems engineering公司製造之LED照明配向測定系統NeoLight及Hamamatsu Photonics K.K.製造之亮度配光特性測定裝置C9920-11等。
又,作為上述以外的配光特性測定裝置,亦能夠利用在預先設定之條件下測定LED元件或LED模組的配光光譜分布特性之LED配光測定裝置(例如,OptCom Co.,Ltd.的測定裝置等)。在該裝置中,控制鉛垂配光台及水平配光台來調整LED輻射角,在以與光檢測器對向之方式進行定位之後,按照測定條件控制裝置的點燈電源而使其點燈,並藉由測量控制設備測定光譜分布。(Optical distribution characteristic acquisition device)
The light distribution
(圖案形成資料生成裝置)
圖案形成資料生成裝置44係生成用於形成反射圖案30之資料(以下,稱為圖案形成資料。)之裝置,其例如由具備未圖示之處理器之電腦構成。處理器例如由CPU(Central Processing Unit:中央處理單元)或MPU(Micro-Processing Unit:微處理單元)等構成,其執行儲存於裝置內的儲存裝置(未圖示)中之光學模擬用程式。藉由執行該模擬程式,圖案形成資料生成裝置44根據微小光源16的配光特性確定反射圖案30的形成條件,生成表示該條件之圖案形成資料。(Pattern forming data generating device)
The pattern forming
具體地進行說明,圖案形成資料生成裝置44從配光特性獲取裝置42獲取與微小光源16的配光特性有關之資訊(例如,配光特性的測定值)。圖案形成資料生成裝置44根據所獲取之配光特性,藉由光學模擬來決定各單位圖案32的厚度、尺寸及配置位置(以下,稱為厚度等)。此時,以滿足下述第一條件及第二條件之方式決定厚度等。
第一條件:第二面28中位於與至少一個微小光源16重疊之位置之特定區域及包圍特定區域之周邊區域各自中之亮度成為基準值以下。
第二條件:第二面28上之亮度的分散程度在目標範圍內。Specifically, the pattern formation
然後,藉由滿足第一條件及第二條件,使正規化西格瑪及正規化動態範圍等指標值滿足前述設定條件。
另外,第一條件下之“特定區域”係第二面28中位於與各微小發光元件18在Z方向上重疊之位置之區域,通俗易懂地說,係位於各微小發光元件18的正上方之區域。若假想假定在第一面26上未形成複數個單位圖案32之情況,則特定區域中之亮度成為最高。
第一條件下之“周邊區域”係第二面28中以圍繞特定區域之方式配置之區域,其從與特定區域鄰接之一側朝向外側以層狀排列而存在。
第一條件下之“基準值”係對特定區域中之亮度設定之目標值,例如係將在第一面26上未形成複數個單位圖案32之情況下之第二面28的各區域中之亮度進行平均化所得之值(平均亮度)。Then, by satisfying the first condition and the second condition, the index values such as the normalized sigma and the normalized dynamic range meet the aforementioned setting conditions.
In addition, the "specified area" under the first condition is the area on the
第二條件下之“亮度的分散程度”係與第二面28的各區域(亦即,特定區域及周邊區域各自)中之亮度的分布有關之評價指標,換言之,表示亮度的平滑性。 第二條件下之“目標範圍”係對亮度的分散程度設定之數值範圍,例如係與分散程度的目標值同等或能夠視為同等之範圍(誤差範圍)。另外,在本實施形態中,根據第一條件的基準值來設定目標範圍。The "degree of dispersion of brightness" under the second condition is an evaluation index related to the distribution of brightness in each area of the second surface 28 (that is, each of the specific area and the surrounding area), in other words, it represents the smoothness of the brightness. The "target range" under the second condition is a numerical range set for the degree of dispersion of brightness, for example, a range (error range) that is equal to or can be regarded as the target value of the degree of dispersion. In addition, in this embodiment, the target range is set based on the reference value of the first condition.
在以滿足上述第一條件及第二條件之方式確定各單位圖案32的厚度等時,圖案形成資料生成裝置44實施既定的運算處理。該運算處理流程係按照圖16所示之程序來進行。以下,參閱圖16對上述運算處理流程進行說明。When the thickness of each
(運算處理流程)
在實施運算處理流程時,將第二面28分區為複數個計算單位。具體地進行說明,將第二面28在XY方向上劃分為以各微小發光元件18的配置位置作為中心之複數個區域,將各自作為計算單位。在此,計算單位在第二面28上存在與微小發光元件18相同之數量,在本實施形態中,如圖17A及圖17B所示,成為方形形狀的區域。(Operation processing flow)
When implementing the arithmetic processing flow, the
如圖17A及圖17B所示,各計算單位進一步分為細小的計算區域。在此,計算區域可以如圖17A所示在XY方向上排列成格子狀,亦可以如圖17B所示排列成同心圓上。
各計算單位中位於與XY方向上之各微小發光元件18的配置位置相同之位置之計算區域P1相當於上述特定區域。以呈在特定區域的外側圍繞特定區域之方形框或環之方式排列之計算區域P2~P6相當於上述周邊區域。As shown in FIG. 17A and FIG. 17B, each calculation unit is further divided into small calculation areas. Here, the calculation areas may be arranged in a grid in the XY direction as shown in FIG. 17A, or may be arranged in concentric circles as shown in FIG. 17B.
In each calculation unit, the calculation area P1 located at the same position as the arrangement position of the micro
另外,關於計算區域的尺寸(網格尺寸)及分區方式,並不受特別限定,以下舉出將各計算單位劃分為以微小發光元件18的配置位置作為中心之多層計算區域之情況為例子進行說明。例如,當使用圖17A中所圖示之計算單位時,成為處理在XY方向上配置成矩陣狀之9×9個計算區域之形態。另一方面,當使用圖17B中所圖示之計算單位時,成為處理排列成同心圓狀之6個計算區域之形態。In addition, the size (mesh size) of the calculation area and the division method are not particularly limited. The following is an example where each calculation unit is divided into a multi-layer calculation area with the arrangement position of the micro
運算處理流程中的各步驟係以一個計算單位為對象而實施。在運算處理流程中,如圖16所示,首先,將計算單位中之所有計算區域設定為初始值(S001)。為了求出初始值,假想假定在第一面26上未形成複數個單位圖案32之情況,求出該情況的第二面28的各區域中之亮度的分布。然後,評價作為亮度的分散程度之平滑性,將該評價值成為最小之厚度作為初始值。Each step in the arithmetic processing flow is implemented for one calculation unit. In the arithmetic processing flow, as shown in Figure 16, first, all the calculation areas in the calculation unit are set to initial values (S001). In order to obtain the initial value, suppose that a case where a plurality of
接著,在各計算區域被設定為初始值之狀態下,計算微小發光元件18點燈之情況的計算單位中之亮度的分布,並評價平滑性(S002)。然後,將步驟S002中所計算之亮度的分布中之平均值設定為目標值(亦即,前述第一條件的基準值)(S003)。Next, in a state where each calculation area is set to an initial value, the brightness distribution in the calculation unit when the micro
以後的步驟係對每個計算區域重複進行,因此將作為計算對象之計算區域設為Pi,並設定為i=1(S004)。在此,i係在XY方向上以微小發光元件18的配置位置作為基準而確定,i愈小,則意味著愈靠近微小發光元件18。另外,i=1的情況的計算區域亦即P1為位於微小發光元件18的正上方之特定區域。The subsequent steps are repeated for each calculation area, so the calculation area as the calculation object is set to Pi, and set to i=1 (S004). Here, i is determined based on the arrangement position of the micro
在下一個步驟S005中,判定相對於步驟S003中所設定之目標值(平均亮度),步驟S002中所計算之分布的亮度是否在預先設定之誤差範圍內。又,在步驟S005中,判定步驟S002中所評價之平滑性是否在以目標值作為基準而確定之設定範圍內,詳細而言,判定是否在目標值的誤差範圍內且是否滿足目標值。In the next step S005, it is determined whether the brightness of the distribution calculated in step S002 is within a preset error range relative to the target value (average brightness) set in step S003. Furthermore, in step S005, it is determined whether the smoothness evaluated in step S002 is within a set range determined with the target value as a reference. Specifically, it is determined whether it is within the error range of the target value and whether the target value is satisfied.
當步驟S005中之判定結果為“是”時,分布的亮度滿足目標值,且平滑性在設定範圍內,因此結束運算處理流程。 另一方面,當步驟S005中之判定結果為“否”時,判定計算區域Pi中之亮度是否達到目標值(S006)。另外,在最初進行之步驟S006中,i=1,因此判定特定區域中之亮度是否達到目標值。When the determination result in step S005 is "Yes", the distributed brightness meets the target value and the smoothness is within the set range, so the calculation processing flow ends. On the other hand, when the determination result in step S005 is "No", it is determined whether the brightness in the calculation area Pi reaches the target value (S006). In addition, in the first step S006, i=1, so it is determined whether the brightness in the specific area reaches the target value.
當步驟S006中之判定結果為“是”時,亦即,若計算區域Pi中之亮度滿足目標值,則使i增加,將作為計算對象之計算區域Pi變更為下一個區域(S007)。然後,返回到步驟S005。When the determination result in step S006 is "Yes", that is, if the brightness in the calculation area Pi meets the target value, i is increased, and the calculation area Pi as the calculation target is changed to the next area (S007). Then, it returns to step S005.
另一方面,當步驟S006中之判定結果為“否”時,亦即,若計算區域Pi中之亮度不滿足目標值,則在後述之步驟S008中進行另一種判定。然後,當步驟S008中之判定結果為“否”時,變更計算區域Pi中之厚度(亦即,計算區域Pi上之單位圖案32的厚度)(S009)。On the other hand, when the determination result in step S006 is "No", that is, if the brightness in the calculation area Pi does not meet the target value, another determination is made in step S008 described later. Then, when the determination result in step S008 is "No", the thickness in the calculation area Pi (that is, the thickness of the
在步驟S009中,當計算區域Pi中之亮度大大超出目標值時,以降低亮度之方式變更厚度。相反地,當計算區域Pi中之亮度大大低於目標值時,以使亮度上升之方式變更厚度。 另外,在變更厚度時,預先確定厚度的變化量與亮度的變化量之間的關係(相關性),並將所確定之相關關係作為表資料而進行儲存即可。然後,在步驟S009中,較佳為參閱表資料求出成為適當的亮度之厚度的變化量,並以所求出之變化量變更厚度。In step S009, when the brightness in the calculation area Pi greatly exceeds the target value, the thickness is changed by reducing the brightness. Conversely, when the brightness in the calculation area Pi is much lower than the target value, the thickness is changed in such a way that the brightness is increased. In addition, when changing the thickness, the relationship (correlation) between the thickness change and the brightness change is determined in advance, and the determined correlation relationship can be stored as table data. Then, in step S009, it is preferable to refer to the table data to obtain the amount of change in the thickness that becomes an appropriate brightness, and to change the thickness with the obtained amount of change.
又,在步驟S009中,以使變更後的厚度不超出預先確定之厚度的調整範圍之方式變更厚度。當變更後的厚度達到上述調整範圍的上限值或下限值時,將對計算區域Pi之計算次數變更為既定值(具體而言,上限次數)。在該情況下,後述之步驟S008中之判定結果成為“是”而返回到步驟S002,計算亮度的分布並評價平滑性。然後,實施下一個步驟S003來設定目標值。In addition, in step S009, the thickness is changed so that the changed thickness does not exceed the predetermined thickness adjustment range. When the changed thickness reaches the upper limit or lower limit of the above adjustment range, the number of calculations for the calculation area Pi is changed to a predetermined value (specifically, the upper limit number). In this case, the result of the determination in step S008 described later becomes "Yes", and the process returns to step S002 to calculate the brightness distribution and evaluate the smoothness. Then, the next step S003 is implemented to set the target value.
具體地進行說明,在厚度達到上限之計算區域Pi中,無法進一步減小亮度,因此需要降低目標值。在此,計算區域Pi的亮度係以降序進行計算,因此上述狀況僅在i=1亦即特定區域中發生。基於這點,與初始值相比,增加厚度,在特定區域的亮度降低之狀態下再次計算平均值。藉此,與其以前的值相比,平均亮度亦即目標值降低。其結果,將圖案的厚度設為小的值並且滿足目標值之可能性提高。Specifically, in the calculation area Pi where the thickness reaches the upper limit, the brightness cannot be further reduced, so the target value needs to be lowered. Here, the brightness of the calculation area Pi is calculated in descending order, so the above situation only occurs in i=1, that is, in a specific area. Based on this, the thickness is increased compared to the initial value, and the average value is calculated again while the brightness of the specific area is reduced. As a result, the average brightness, that is, the target value, is reduced compared to the previous value. As a result, the possibility of setting the thickness of the pattern to a small value and meeting the target value increases.
相反地,在厚度達到下限之計算區域Pi中,處於與目標值相比亮度降低之狀態。在該情況下,需要降低(散射)更靠近特定區域的區域中之亮度,並將光引導到上述計算區域Pi。在上述計算區域Pi的前一個計算區域P[i-1]等中,亮度已滿足目標值,因此若計算平均值,則與其以前的目標值(平均亮度)相比降低。基於這點,在前一個計算區域P[i-1]等中,以使厚度更厚地散射之方式設定目標值。其結果,在計算區域Pi中,圖案的厚度為大的值且滿足目標值之可能性提高。Conversely, in the calculation area Pi where the thickness reaches the lower limit, the brightness is lower than the target value. In this case, it is necessary to reduce (scatter) the brightness in the area closer to the specific area and guide the light to the aforementioned calculation area Pi. In the previous calculation area P[i-1] and the like of the calculation area Pi, the brightness has already met the target value, and therefore, if the average value is calculated, it will be lower than the previous target value (average brightness). Based on this, in the previous calculation area P[i-1], etc., the target value is set in such a way that the thickness is scattered more thickly. As a result, in the calculation area Pi, the possibility that the thickness of the pattern has a large value and satisfies the target value increases.
返回到圖16的流程進行說明,在步驟S009中變更計算區域Pi中之厚度之後,適用變更後的厚度來計算微小發光元件18點燈之情況的計算單位中之亮度的分布(S010)。又,在該時點,將對計算區域Pi之計算次數僅增加(count up)+1。Returning to the flow of FIG. 16 for description, after the thickness in the calculation area Pi is changed in step S009, the changed thickness is applied to calculate the brightness distribution in the calculation unit when the micro
然後,返回到步驟S006,判定計算區域Pi中之亮度是否達到目標值。若該判定結果為“是”,則實施步驟S007,然後返回到步驟S005。相反地,當步驟S006中之判定結果為“否”時,實施步驟S008,判定對計算區域Pi之計算次數是否超出既定值(上限次數)。當步驟S008中之判定結果為“否”時,實施步驟S009來變更計算區域Pi中之厚度。Then, return to step S006 to determine whether the brightness in the calculation area Pi reaches the target value. If the result of this determination is "Yes", step S007 is implemented, and then returns to step S005. Conversely, when the determination result in step S006 is "No", step S008 is implemented to determine whether the number of calculations for the calculation area Pi exceeds a predetermined value (upper limit). When the determination result in step S008 is "No", step S009 is implemented to change the thickness in the calculation area Pi.
另一方面,當步驟S008中之判定結果為“是”時,為了修正目標值而返回到步驟S002。亦即,實施步驟S002,根據在該時點所設定之各計算區域中之厚度來計算微小發光元件18點燈之情況的計算單位中之亮度的分布。然後,實施步驟S003,將步驟S002中所計算之分布中之亮度的平均值設定為新的目標值。On the other hand, when the result of the determination in step S008 is "YES", the process returns to step S002 in order to correct the target value. That is, step S002 is implemented to calculate the brightness distribution in the calculation unit when the micro
藉由以上的程序實施運算處理流程中,直至步驟S005中之判定結果成為“是”為止一邊改變作為計算對象之計算區域Pi,一邊重複進行(循環)步驟S002~步驟S010。藉此,如圖18A及圖18B所示,決定各計算區域Pi中之單位圖案32的厚度。
另外,在圖18A及圖18B的各圖中,示出從上朝下依序確定各計算區域中之厚度之情形,重新計算厚度之計算區域(各圖中重新著色之部分)從內側向外側移動。In the arithmetic processing flow implemented by the above program, steps S002 to S010 are repeated (looped) while changing the calculation area Pi as the calculation target until the determination result in step S005 becomes "YES". Thereby, as shown in FIGS. 18A and 18B, the thickness of the
另外,作為處理算法,即使在原本就不存在解之狀況下亦需要適當停止流程,因此另行對整體的循環次數進行計數,當循環次數超出上限次數時作為“無解”而停止流程。In addition, as a processing algorithm, it is necessary to appropriately stop the flow even when there is no solution. Therefore, the total number of loops is separately counted. When the number of loops exceeds the upper limit, the flow is stopped as "no solution".
然後,在步驟S005中之判定結果成為“是”之時點,決定各計算區域Pi中之厚度(亦即,單位圖案32的厚度)。藉此,對於各單位圖案32,以滿足前述第一條件及第二條件之方式決定厚度等。Then, when the result of the determination in step S005 becomes "Yes", the thickness in each calculation area Pi (that is, the thickness of the unit pattern 32) is determined. In this way, for each
(圖案形成裝置)
圖案形成裝置46按照藉由圖案形成資料生成裝置44而生成之圖案形成資料,在基材24的第一面26上形成反射圖案30。本實施形態的圖案形成裝置46由噴墨型的印表機構成,其朝向第一面26的各部噴出含有反射材料之油墨而形成複數個單位圖案32。此時,圖案形成裝置46以使各單位圖案32的厚度等成為圖案形成資料中所規定之厚度等之方式調整油墨的噴出時刻及噴出量等。(Pattern forming device)
The
亦即,本實施形態的圖案形成資料係印表機控制用資料(印刷資料)。作為印表機之圖案形成裝置46按照圖案形成資料噴出油墨,藉此既定量的油墨著落於第一面26的既定位置。其結果,在第一面26上會以成為滿足第一條件及第二條件之厚度等之方式在第一面26上形成複數個單位圖案32。That is, the pattern formation data of this embodiment is data for printer control (print data). The
以如上方式,藉由圖案形成裝置10製造形成有反射圖案30之基材24(亦即,第一光散射體34)。然後,藉由組合第一光散射體34、設置有微小發光元件18之基板20及第二光散射體36來製造光源單元14。In the above manner, the substrate 24 (that is, the first light scatterer 34) on which the
另外,圖案形成裝置46並不限定於噴墨型的印表機,亦可以由除此以外的裝置,例如噴墨型以外的印刷方式的印表機或油墨塗佈裝置構成。或者,亦可以為使用網版印刷技術製作用於形成既定的反射圖案30之版並利用該版進行印刷之裝置。
[實施例]In addition, the
以下,根據下述實施例對本發明更詳細地進行說明。 另外,關於下述實施例所示之材料、使用量、比例、處理內容及處理程序等,只要不脫離本發明的趣旨,則能夠適當進行變更。因此,本發明的範圍不應藉由下述實施例進行限定性解釋。Hereinafter, the present invention will be described in more detail based on the following examples. In addition, the materials, usage amounts, ratios, processing contents, processing procedures, etc. shown in the following examples can be appropriately changed as long as they do not depart from the spirit of the present invention. Therefore, the scope of the present invention should not be limitedly interpreted by the following examples.
[與亮度分布有關之光學模擬] 在實施例1~8及比較例1中,藉由光學模擬計算出光源單元的出射面上之亮度的分布。在此,出射面各部的亮度設為變動者,以除以其平均值之相對值來進行評價。[Optical simulation related to brightness distribution] In Examples 1 to 8 and Comparative Example 1, the brightness distribution on the exit surface of the light source unit was calculated by optical simulation. Here, the brightness of each part of the exit surface is set as a variable, and the evaluation is performed by dividing the relative value by the average value.
在光學模擬中所使用之模式(以下,稱為模擬模式)中,使用了在俯視下為正方形狀的基板20。又,在光源設置面22上的圖19所示之複數個配置位置上分別配置了作為微小發光元件18之迷你LED。具體而言,從光源設置面22的中央位置開始在XY方向的各方向上以大致恆定間距配置了共計9個迷你LED。X方向上之迷你LED的間距設為5.386mm,Y方向上之迷你LED的間距設為6.066mm。In the mode used in the optical simulation (hereinafter referred to as the simulation mode), the
各迷你LED的晶片尺寸設為230μm×120μm×130μm。各迷你LED的配光特性設為圖1所示之配光特性,將其視角設為130度,將最亮的迷你LED正上方附近處之強度設為0.32W/sr mm2 。The chip size of each mini LED is set to 230 μm×120 μm×130 μm. The light distribution characteristic of each mini LED is set to the light distribution characteristic shown in Figure 1, the viewing angle is set to 130 degrees, and the intensity at the vicinity of the brightest mini LED is set to 0.32W/sr mm 2 .
又,在模擬模式中,光源設置面22的露出部分之光散射係與光的入射角相對應之散射,其設為遵循COSN幕律(N=2)。
另外,關於基板20的反射率、透射率及吸收率,分別設為90%、5%、5%。In addition, in the simulation mode, the light scattering system of the exposed part of the light
又,在模擬模式中,將第一光散射體34以與光源設置面22平行地且在XY方向上光源設置面22的中央位置與基材24的表面的中央位置一致之方式配置於光源設置面22的上方。作為第一光散射體34的基材24,使用了厚度0.1mm的聚對酞酸乙二酯(PET)製薄膜。PET薄膜在俯視下為正方形狀,關於其折射率n,設為1.576。
又,在模擬模式中,將PET薄膜的+Z側的表面(亦即,位於與光源設置面22相反的一側之第二面)作為光的出射面,關於出射面各部處的發散角,設為10度。In addition, in the simulation mode, the
(比較例1)
使用未形成有反射圖案30之由PET薄膜構成之第一光散射體34,並將光源設置面22與出射面(亦即,PET薄膜的+Z側的表面)之間的間隔設為14mm。對該情況的出射面上之亮度的分布進行模擬,將其模擬結果示於圖20。
當未形成有反射圖案30時,由圖20可知,在出射面中迷你LED的正上方位置及其附近,亮度明顯上升,在該等部位與其他部位之間亮度差比較大。
另外,在圖20以後的各圖中,以黑白的深淺來可視化表示亮度的大小(各圖中的左側的圖表),並且以直方圖表示亮度的平滑性(各圖中的右側的圖表)。(Comparative example 1)
The
(實施例1)
在實施例1中,在模擬模式中所使用之PET薄膜的-Z側的表面(亦即,第一面)上設置了由複數個單位圖案32構成之反射圖案30。單位圖案32係由氧化鈦構成,且在XY方向上以迷你LED的正上方位置作為中心而配置,設置了由縱橫各3個共計9個單位圖案32構成之反射圖案30。(Example 1)
In
如圖14所示,各單位圖案32係將直徑互不相同之5個圓柱狀圖案片段重疊為同心圓狀而成者。各圖案片段的半徑從前端側依序設為0.5mm、1.0mm、1.6mm、2.2mm、2.65mm。各圖案片段的厚度分別設定為表1所示之值。另外,表1所示之厚度為以相對於基準厚度t(t=0.00759mm)之比率表示之值。As shown in FIG. 14, each
【表1】
又,在本實施形態中,作為反射圖案30的基底,將由氧化鈦構成之層(平坦部)設置於PET薄膜的-Z側的整個表面。平坦部的厚度均勻,並且設為上述基準厚度t的0.1倍。In addition, in this embodiment, as the base of the
又,關於設置有反射圖案30之PET薄膜的光學參數(擴散係數及吸收係數等),以透射率及反射率在藉由模擬所得之計算值與實測值之間一致之方式決定。透射率及反射率的測量中使用了光線追蹤模擬軟體(產品名:Light Tools)。
另外,關於設置有反射圖案30之PET薄膜的折射率n,設為1.4,關於吸收係數,設為0。In addition, the optical parameters (diffusion coefficient, absorption coefficient, etc.) of the PET film provided with the
另外,在實施例1中,光源設置面22與出射面(亦即,PET薄膜的+Z側的表面)之間的間隔設為1mm。In addition, in Example 1, the interval between the light
在以上的狀況下對出射面上之亮度的分布進行模擬,將其模擬結果示於圖21。由該圖可知,若使用設置有反射圖案30之PET薄膜且將光源設置面22與出射面之間的間隔設為1mm,則與未設置有反射圖案30之情況相比,能夠使出射面上之亮度的分布平滑化。又,若減小間隔,則能夠相應地減小作為光源單元整體之厚度。Under the above conditions, the brightness distribution on the exit surface was simulated, and the simulation results are shown in Fig. 21. It can be seen from this figure that if the PET film provided with the
(實施例2)
在實施例2中,將構成各單位圖案32之5個圖案片段各自的厚度設定為表1所示之值。又,在實施例2中,將光源設置面22與出射面(亦即,PET薄膜的+Z側的表面)之間的間隔設為1mm。關於除此以外的條件,設為與實施例1相同之條件。(Example 2)
In Example 2, the thickness of each of the five pattern segments constituting each
關於實施例2,對出射面上之亮度的分布進行模擬,將其模擬結果示於圖22。由圖22可知,藉由將光源設置面22與出射面之間的間隔設為2mm,能夠使出射面上之亮度的分布更加平滑化。Regarding Example 2, the brightness distribution on the exit surface was simulated, and the simulation results are shown in FIG. 22. It can be seen from FIG. 22 that by setting the interval between the light
(實施例3、4)
在實施例3、4中,將設置有反射圖案30之PET薄膜的配置位置從正規的位置沿水平方向僅偏移了0.2mm。又,在實施例3中,將光源設置面22與出射面之間的間隔設為1mm,在實施例4中,將間隔設為2mm。又,在實施例3、4中,將構成各單位圖案32之5個圖案片段各自的厚度設定為表1所示之值。關於除此以外的點,設為與實施例1相同之條件。(Examples 3 and 4)
In Examples 3 and 4, the arrangement position of the PET film provided with the
關於實施例3、4各自,對出射面上之亮度的分布進行模擬,將各自的模擬結果示於圖23、圖24。由該等圖可知,若設置有反射圖案30之PET薄膜的配置位置偏離,則出射面上之亮度的平滑性降低。尤其,當光源設置面22與出射面之間的間隔為1mm時,與間隔為2mm的情況相比,平滑性的降低變得顯著。Regarding each of Examples 3 and 4, the luminance distribution on the exit surface was simulated, and the simulation results of each are shown in FIGS. 23 and 24. It can be seen from these figures that if the arrangement position of the PET film provided with the
(實施例5~8)
在實施例5~8中,在設置有反射圖案30之PET薄膜與光源設置面22之間追加配置了作為第二光散射體36之擴散板。
所利用之擴散板係在與第一光散射體34的基材24相同種類的PET薄膜的(厚度0.3mm)的兩面以成為均勻的厚度的方式塗佈氧化鈦而構成。氧化鈦的層相對於前述基準厚度t為2.63倍的厚度。又,擴散板配置成在Z方向上擴散板的與光源設置面22之對向面處於從光源設置面22分開0.2mm之位置。
又,在實施例5、6中,將PET薄膜配置於正規的位置,在實施例7、8中,將PET薄膜的位置從正規的位置沿水平僅偏移了0.2mm。又,在實施例5、7中,將光源設置面22與出射面之間的間隔設為1mm,在實施例6、8中,將間隔設為2mm。又,在實施例5~8中,將構成各單位圖案32之5個圖案片段各自的厚度設定為表1所示之值。關於除此以外的點,設為與實施例1相同之條件。(Examples 5-8)
In Examples 5 to 8, a diffusion plate as the
關於實施例5~8各自,對出射面上之亮度的分布進行模擬,將各自的模擬結果示於圖25~28。由該等圖可知,藉由將追加的擴散板配置於PET薄膜與光源設置面22之間,能夠使出射面上之亮度的分布更進一步平滑化。又,藉由設置追加的擴散板,能夠減輕由PET薄膜的位置偏離引起之平滑化的降低。Regarding each of Examples 5 to 8, the luminance distribution on the exit surface was simulated, and the simulation results of each are shown in FIGS. 25-28. It can be seen from these figures that by arranging the additional diffuser between the PET film and the light
以上說明之本發明的實施例1~8各自的條件均在本發明的範圍內,因此本發明的效果是很明確的。The conditions of each of Examples 1 to 8 of the present invention described above are all within the scope of the present invention, so the effect of the present invention is clear.
10:顯示裝置 12:LCD(液晶顯示器) 14:光源單元 16:微小光源 18:微小發光元件 20:基板 22:光源設置面 24:基材 26:第一面 28:第二面 30:反射圖案 32:單位圖案 34:第一光散射體 36:第二光散射體 40:光源單元製造裝置 42:配光特性獲取裝置 44:圖案形成資料生成裝置 46:圖案形成裝置10: Display device 12: LCD (liquid crystal display) 14: light source unit 16: Tiny light source 18: Tiny light-emitting element 20: substrate 22: Light source setting surface 24: Substrate 26: First side 28: second side 30: reflection pattern 32: unit pattern 34: The first light scatterer 36: second light scatterer 40: Light source unit manufacturing device 42: Light distribution characteristic acquisition device 44: Pattern formation data generating device 46: Pattern forming device
圖1係表示配光特性之特性圖的一例。 圖2係顯示裝置的構成設備的示意側面圖。 圖3係表示光源單元的構成例之圖,表示圖2的I-I剖面。 圖4係表示在基材上未設置有反射圖案之情況的、與出射面上之亮度的均勻性有關之指標值之圖表(其1)。 圖5係表示在基材上未設置有反射圖案之情況的、與出射面上之亮度的均勻性有關之指標值之圖表(其2)。 圖6係表示在基材上設置有反射圖案之情況的、與出射面上之亮度的均勻性有關之指標值之圖表(其1)。 圖7係表示在基材上設置有反射圖案之情況的、與出射面上之亮度的均勻性有關之指標值之圖表(其2)。 圖8係表示基材的配置位置偏離之情況的、與出射面上之亮度的均勻性有關之指標值的變化之圖(其1)。 圖9係表示基材的配置位置偏離之情況的、與出射面上之亮度的均勻性有關之指標值的變化之圖(其2)。 圖10係表示進一步具備第二光散射體之情況的、與出射面上之亮度的均勻性有關之指標值的變化之圖(其1)。 圖11係表示進一步具備第二光散射體之情況的、與出射面上之亮度的均勻性有關之指標值的變化之圖(其2)。 圖12係第一光散射體的示意俯視圖。 圖13係反射圖案的單位圖案的側面圖。 圖14係表示反射圖案的單位圖案的變形例之圖。 圖15係有關本發明的一實施形態之光源單元製造裝置之說明圖。 圖16係表示用於確定反射圖案的形成條件之運算處理流程之圖。 圖17A係計算區域的說明圖(其1)。 圖17B係計算區域的說明圖(其2)。 圖18A係表示成為計算對象之區域遷移之情形之圖(其1)。 圖18B係表示成為計算對象之區域遷移之情形之圖(其2)。 圖19係模擬模式的說明圖。 圖20係表示比較例1中之出射面上之亮度的分布之圖。 圖21係表示實施例1中之出射面上之亮度的分布之圖。 圖22係表示實施例2中之出射面上之亮度的分布之圖。 圖23係表示實施例3中之出射面上之亮度的分布之圖。 圖24係表示實施例4中之出射面上之亮度的分布之圖。 圖25係表示實施例5中之出射面上之亮度的分布之圖。 圖26係表示實施例6中之出射面上之亮度的分布之圖。 圖27係表示實施例7中之出射面上之亮度的分布之圖。 圖28係表示實施例8中之出射面上之亮度的分布之圖。Fig. 1 shows an example of a characteristic diagram of light distribution characteristics. Fig. 2 is a schematic side view of the constituent equipment of the display device. Fig. 3 is a diagram showing a configuration example of the light source unit, and shows the I-I section of Fig. 2. Fig. 4 is a graph showing the index values related to the uniformity of brightness on the exit surface when no reflective pattern is provided on the substrate (Part 1). Fig. 5 is a graph showing the index values related to the uniformity of brightness on the exit surface when no reflective pattern is provided on the substrate (Part 2). Fig. 6 is a graph showing index values related to the uniformity of brightness on the exit surface in the case where a reflective pattern is provided on the substrate (Part 1). Fig. 7 is a graph showing the index values related to the uniformity of brightness on the exit surface when the reflective pattern is provided on the substrate (Part 2). Fig. 8 is a graph showing the change of the index value related to the uniformity of brightness on the exit surface when the arrangement position of the substrate is deviated (Part 1). Fig. 9 is a graph showing the change of the index value related to the uniformity of the brightness on the exit surface when the arrangement position of the substrate is deviated (Part 2). Fig. 10 is a diagram showing the change in the index value related to the uniformity of the brightness on the exit surface when the second light scatterer is further provided (Part 1). FIG. 11 is a diagram showing the change in the index value related to the uniformity of the brightness on the exit surface when the second light scatterer is further provided (Part 2). Fig. 12 is a schematic plan view of the first light scatterer. Fig. 13 is a side view of the unit pattern of the reflection pattern. FIG. 14 is a diagram showing a modification example of the unit pattern of the reflection pattern. Fig. 15 is an explanatory diagram of a light source unit manufacturing apparatus according to an embodiment of the present invention. FIG. 16 is a diagram showing the flow of arithmetic processing for determining the formation conditions of the reflection pattern. Fig. 17A is an explanatory diagram of the calculation area (Part 1). Fig. 17B is an explanatory diagram of the calculation area (Part 2). FIG. 18A is a diagram (Part 1) showing how the area to be calculated is shifted. FIG. 18B is a diagram (Part 2) showing how the area to be calculated is shifted. Fig. 19 is an explanatory diagram of the simulation mode. FIG. 20 is a diagram showing the distribution of brightness on the exit surface in Comparative Example 1. FIG. FIG. 21 is a diagram showing the distribution of brightness on the exit surface in Example 1. FIG. FIG. 22 is a diagram showing the brightness distribution on the exit surface in Example 2. FIG. FIG. 23 is a diagram showing the brightness distribution on the exit surface in Example 3. FIG. FIG. 24 is a diagram showing the brightness distribution on the exit surface in Example 4. FIG. FIG. 25 is a diagram showing the brightness distribution on the exit surface in Example 5. FIG. FIG. 26 is a diagram showing the brightness distribution on the exit surface in Example 6. FIG. FIG. 27 is a diagram showing the brightness distribution on the exit surface in Example 7. FIG. FIG. 28 is a diagram showing the brightness distribution on the exit surface in Example 8. FIG.
14:光源單元 14: light source unit
16:微小光源 16: Tiny light source
18:微小發光元件 18: Tiny light-emitting element
20:基板 20: substrate
22:光源設置面 22: Light source setting surface
24:基材 24: Substrate
26:第一面 26: First side
28:第二面 28: second side
30:反射圖案 30: reflection pattern
32:單位圖案 32: unit pattern
34:第一光散射體 34: The first light scatterer
36:第二光散射體 36: second light scatterer
Z:方向 Z: direction
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