TW201939644A - Aligning apparatus and aligning method - Google Patents
Aligning apparatus and aligning method Download PDFInfo
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- TW201939644A TW201939644A TW108122671A TW108122671A TW201939644A TW 201939644 A TW201939644 A TW 201939644A TW 108122671 A TW108122671 A TW 108122671A TW 108122671 A TW108122671 A TW 108122671A TW 201939644 A TW201939644 A TW 201939644A
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
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- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
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Abstract
Description
本發明,是有關於整列裝置及整列方法。 The present invention relates to an alignment device and an alignment method.
習知,在半導體製造過程中,將半導體晶圓(以下,具有只稱為晶圓的情況)切斷成規定的形狀、規定的尺寸並單片化成複數半導體晶片(以下,具有只稱為晶片的情況),將被單片化的各晶片的彼此的間隔擴大之後,搭載於導線架或基板等的被搭載物上。 Conventionally, in a semiconductor manufacturing process, a semiconductor wafer (hereinafter, referred to as a wafer only) is cut into a predetermined shape, a predetermined size, and singulated into a plurality of semiconductor wafers (hereinafter, referred to as a wafer only). In the case of), the distance between the individual wafers is increased, and the wafers are mounted on an object such as a lead frame or a substrate.
將晶片(片狀體)的彼此的間隔擴大的分離方法,已知透過薄膜(黏著薄片)將:與框架一體化的晶圓(板狀構件)支撐的框架支撐手段(支撐手段)、及薄膜面支撐機構(分離載置台)相對移動(例如文獻1:日本特開2012-204747號公報參照)。在將這種晶片的彼此的間隔擴大的方法中,例如對於黏著薄片賦予+X軸方向、-X軸方向、+Y軸方向、-Y軸方向的4方向的張力,例如藉由檢出手段檢出位於最外周的晶片到達規定的位置來完成間隔擴大的動作。 As a separation method for increasing the distance between wafers (sheet-like bodies), a frame supporting means (support means) for supporting a wafer (plate-like member) integrated with a frame through a thin film (adhesive sheet) and a thin film are known. The surface support mechanism (separate mounting table) moves relatively (for example, reference 1: Japanese Patent Application Publication No. 2012-204747). In the method of increasing the distance between such wafers, for example, a four-direction tension is applied to the adhesive sheet in the + X-axis direction, the -X-axis direction, the + Y-axis direction, and the -Y-axis direction. The wafer located at the outermost periphery is detected to reach a predetermined position to complete the interval widening operation.
但是在文獻1的習知的方法中,在黏著薄片 中除了上述4方向以外,也朝那些的合成方向即+X軸方向及+Y軸方向的合成方向、+X軸方向及-Y軸方向的合成方向、-X軸方向及+Y軸方向的合成方向、-X軸方向及-Y軸方向的合成方向賦予張力。其結果,內側的晶片的間隔及外側的晶片的間隔會不同。但是,這種間隔的不同因為是非常微小,所以各晶片,是被視為間隔被均等地擴大,以由計算被導出的位置(以下,具有稱為理論上的位置的情況)為基準藉由搬運裝置或拾取裝置等的搬運手段被搬運,被搭載於被搭載物上形成製造物。其結果,該製造物中的晶片及被搭載物的相對位置關係會產生微妙偏離的情況,打線接合的連接位置會偏離,晶片及被搭載物的端子彼此的位置會偏離,就會發生那些地方無法導通,使該製造物的成品率下降的問題。又,這種課題,不是只有半導體裝置的製造,例如在緊密的機械零件和微細的裝飾品等也會發生。 However, in the conventional method of reference 1, in addition to the above 4 directions in the adhesive sheet, those combined directions are the combined direction of the + X-axis direction and the + Y-axis direction, the + X-axis direction, and the -Y-axis direction. Tension is given by the combined direction of the -X axis direction and the combined direction of the + Y axis direction, and the combined direction of the -X axis direction and the -Y axis direction. As a result, the interval between the inner wafer and the interval between the outer wafers are different. However, since the difference in this interval is very small, it is considered that the interval is equally enlarged for each wafer, and the position derived from calculation (hereinafter, referred to as a theoretical position) is used as a reference. A conveyance means such as a conveyance device or a pick-up device is conveyed, and is mounted on an object to form a manufactured object. As a result, the relative positional relationship between the wafer and the mounted object in the manufactured product may be slightly deviated, the connection position of the wire bonding may be shifted, and the positions of the terminals of the wafer and the mounted object may be shifted. There is a problem that the conduction cannot be conducted and the yield of the manufactured product is reduced. In addition, such a problem is not limited to the manufacture of semiconductor devices. For example, compact mechanical parts and fine ornaments also occur.
本發明的目的,是提供一種可以將各片狀體的間隔正確地擴大的整列裝置及整列方法。 An object of the present invention is to provide a aligning device and a aligning method capable of accurately increasing the interval between each sheet-like body.
本發明的整列裝置,具備:可將複數片狀體由支撐面支撐的支撐手段、及可將分隔構件插入由前述支撐面被支撐的前述複數片狀體間的分隔手段、及將前述支撐面及前述分隔構件的至少一方傾斜並將各片狀體由規定的方向整列在前述支撐面上的規定的位置的整列手段。 An array device according to the present invention includes support means capable of supporting a plurality of sheet-like bodies on a support surface, and a partition means capable of inserting a partition member between the plurality of sheet-like bodies supported by the support surface, and the support surface. And at least one of the partition members is an alignment means for aligning each sheet-like body at a predetermined position on the support surface from a predetermined direction.
對於本發明的整列裝置,具備促進前述複數片狀體移動的移動促進手段較佳。 It is preferable that the in-line device of the present invention includes a movement promotion means for promoting the movement of the plurality of sheet-like bodies.
對於本發明的整列裝置,前述複數片狀體,是被貼附在黏著薄片,具備可從前述黏著薄片將前述複數片狀體轉移至前述支撐面的轉移手段較佳。 In the array device of the present invention, it is preferable that the plurality of sheet-like bodies are attached to an adhesive sheet, and the transfer means is capable of transferring the plurality of sheet-like bodies to the support surface from the adhesive sheet.
本發明的整列方法,是具備:將複數片狀體由支撐面支撐的過程、及將分隔構件插入由前述支撐面被支撐的前述複數片狀體間的過程、及將前述支撐面及前述分隔構件的至少一方傾斜並將各片狀體由規定的方向整列在前述支撐面上的規定的位置的過程。 The aligning method of the present invention includes a process of supporting a plurality of sheet-like bodies on a support surface, a process of inserting a partition member between the plurality of sheet-like bodies supported by the support surface, and separating the support surface and the partition. A process in which at least one of the members is inclined and each sheet-shaped body is aligned at a predetermined position on the support surface from a predetermined direction.
依據本發明的話,因為將分隔構件插入複數片狀體間,將支撐面及分隔構件的至少一方傾斜就可以使該片狀體整列,所以在如黏著薄片賦予張力的方向以外,因為張力也不會朝那些的合成方向被賦予,所以可以將各片狀體的間隔正確地擴大。 According to the present invention, since a partition member is inserted between a plurality of sheet-like bodies, and at least one of the support surface and the partition member is tilted, the sheet-like bodies can be aligned. Therefore, the tension is not in a direction other than the direction in which tension is given by the adhesive sheet. Since they are given in the direction of combining them, the interval between the sheet-like bodies can be accurately enlarged.
且設置移動促進手段的話,容易將片狀體朝分隔構件的規定的位置誘導。 In addition, if a movement promoting means is provided, it is easy to induce the sheet-like body toward a predetermined position of the partition member.
進一步,設置轉移手段的話,因為可以從黏著薄片將複數片狀體轉移至支撐面,所以可以將各片狀體的間隔正確地擴大。 Furthermore, when a transfer means is provided, since a plurality of sheet-like bodies can be transferred from an adhesive sheet to a support surface, the space | interval of each sheet-like body can be enlarged correctly.
AS‧‧‧黏著薄片 AS‧‧‧ Adhesive sheet
CP‧‧‧晶片 CP‧‧‧Chip
WF‧‧‧晶圓 WF‧‧‧ Wafer
WK‧‧‧一體物 WK‧‧‧One
10‧‧‧整列裝置 10‧‧‧ entire train
20‧‧‧支撐手段 20‧‧‧Support
21‧‧‧載置台 21‧‧‧mounting table
21A‧‧‧支撐面 21A‧‧‧Support surface
21B‧‧‧角 21B‧‧‧ Corner
30‧‧‧分隔手段 30‧‧‧ Separation Means
31‧‧‧門型框架 31‧‧‧ Door Frame
32,33‧‧‧線性馬達 32, 33‧‧‧ Linear Motor
32A,33A‧‧‧滑件 32A, 33A‧‧‧Slider
34,41‧‧‧直線馬達 34, 41‧‧‧ Linear Motor
34A,41A‧‧‧輸出軸 34A, 41A‧‧‧ output shaft
35‧‧‧分隔構件 35‧‧‧ divider
35A‧‧‧基座托板 35A‧‧‧Base pallet
35B‧‧‧下面 35B‧‧‧ Below
35C‧‧‧格子部 35C‧‧‧Grid Department
40‧‧‧整列手段 40‧‧‧ whole set of means
42‧‧‧球接頭 42‧‧‧ Ball Joint
50‧‧‧移動促進手段 50‧‧‧ mobile promotion tools
60‧‧‧轉移手段 60‧‧‧ Means of transfer
61,64‧‧‧線性馬達 61, 64‧‧‧ Linear Motor
61A‧‧‧滑件 61A‧‧‧Slider
61B‧‧‧托架 61B‧‧‧ Bracket
62,65‧‧‧直線馬達 62, 65‧‧‧ Linear Motor
62A‧‧‧輸出軸 62A‧‧‧Output shaft
63‧‧‧吸盤 63‧‧‧Sucker
64A‧‧‧滑件 64A‧‧‧Slider
65A‧‧‧輸出軸 65A‧‧‧Output shaft
66‧‧‧剝離板 66‧‧‧ peeling plate
第1圖,是本發明的第1實施例的整列裝置的側面 圖。 Fig. 1 is a side view of an alignment device according to a first embodiment of the present invention.
第2圖A,是第1圖的整列裝置的動作說明圖。 FIG. 2A is an operation explanatory diagram of the alignment device of FIG. 1.
第2圖B,是第1圖的整列裝置的動作說明圖。 FIG. 2B is an operation explanatory diagram of the alignment device of FIG. 1.
第2圖C,是第1圖的整列裝置的動作說明圖。 FIG. 2C is an operation explanatory diagram of the alignment device of FIG. 1.
第2圖D,是第1圖的整列裝置的動作說明圖。 FIG. 2D is an operation explanatory diagram of the alignment device of FIG. 1.
第2圖E,是第1圖的整列裝置的動作說明圖。 FIG. 2E is an operation explanatory diagram of the alignment device of FIG. 1.
以下,依據圖面說明本發明的一實施例。 Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
又,本實施例中的X軸、Y軸、Z軸,各別是位於垂直交叉的關係,X軸及Y軸,是規定平面內的軸,Z軸,是與前述規定平面垂直交叉的軸。進一步,在各實施例中,以從與Y軸平行的第1圖中前方側觀看的情況作為基準顯示方向的情況,「上」是Z軸的箭頭方向,「下」是其相反方向,「左」是X軸的箭頭方向,「右」是其相反方向,「前」是Y軸的箭頭方向,「後」是其相反方向。 The X-axis, Y-axis, and Z-axis in this embodiment are in a relationship that intersects vertically. The X-axis and Y-axis are axes in a predetermined plane. The Z-axis is an axis that intersects the predetermined plane. . Further, in each of the embodiments, the case of viewing from the front side in the first figure parallel to the Y axis is used as the reference display direction, "up" is the direction of the Z axis arrow, and "down" is the opposite direction, " "Left" is the direction of the arrow on the X axis, "Right" is the direction of the arrow, "Front" is the direction of the arrow on the Y axis, and "Back" is the direction of the opposite.
在第1圖中,整列裝置10,是具備:可將作為複數片狀體的晶片CP由支撐面21A支撐的支撐手段20、及可將分隔構件35插入由支撐面21A被支撐的複數晶片CP間的分隔手段30、及將支撐面21A及分隔構件35的雙方傾斜並將各晶片CP由規定的方向整列在支撐面21A上的規定的位置的整列手段40、及促進複數晶片CP的移動的移動促進手段50、及可從黏著薄片AS將複數晶 片CP轉移至支撐面21A的轉移手段60、及可辨認各晶片CP的位置的光學感測器或攝像手段等的無圖示的檢出手段。又,晶片CP,是藉由將晶圓WF切斷成格子狀而形成,在被貼附在黏著薄片AS的狀態下成為一體物WK。 In FIG. 1, the entire line device 10 includes a support means 20 capable of supporting a plurality of wafers CP as a support surface 21A, and a partition member 35 capable of inserting a plurality of wafers CP supported by the support surface 21A. Between the support means 21A and the partition member 35, and the alignment means 40 for aligning the wafers CP at a predetermined position on the support face 21A in a predetermined direction, and a means for promoting the movement of the plurality of wafers CP Movement promoting means 50, transfer means 60 capable of transferring a plurality of wafers CP from the adhesive sheet AS to the support surface 21A, and unillustrated detection means such as an optical sensor or an imaging means capable of identifying the position of each wafer CP . In addition, the wafer CP is formed by cutting the wafer WF into a lattice shape, and becomes the integrated body WK in a state of being attached to the adhesive sheet AS.
支撐手段20,是具備上面視為4角形的載置台21,其具有可藉由減壓泵或真空噴射器等的無圖示的減壓手段將各晶片CP由無圖示的複數吸引孔吸附保持的支撐面21A。 The supporting means 20 is provided with a mounting table 21 having a rectangular shape as described above, and each wafer CP can be adsorbed by a plurality of suction holes (not shown) by a pressure reducing means (not shown) such as a pressure reducing pump or a vacuum ejector. Holding the support surface 21A.
分隔手段30,是具備:作為被支撐於從載置台21的前面及後面立起的門型框架31的驅動機器的線性馬達32、及作為被支撐於線性馬達32的滑件32A的驅動機器的線性馬達33、及作為被支撐於線性馬達33的滑件33A的驅動機器的直線馬達34、及被支撐於直線馬達34的輸出軸34A的分隔構件35。分隔構件35,是具備:基座托板35A、及在基座托板35A的下面35B形成格子狀的格子部35C,可一次將格子部35C插入複數晶片CP間全部。格子部35C的下端部,是被作成先端較細形狀,成為容易插入晶片CP間的形狀。 The partitioning means 30 is provided with a linear motor 32 as a driving device supported by the door frame 31 standing up from the front and rear of the mounting table 21 and a driving device as a slider 32A supported by the linear motor 32. The linear motor 33 and a linear motor 34 as a driving device of the slider 33A supported by the linear motor 33 and a partition member 35 supported by the output shaft 34A of the linear motor 34. The partition member 35 includes a susceptor plate 35A and a lattice portion 35C formed in a lattice shape on the lower surface 35B of the susceptor plate 35A. The lattice portion 35C can be inserted into all of the plurality of wafers CP at one time. The lower end portion of the grid portion 35C is formed to have a thinner tip and a shape that can be easily inserted between the wafers CP.
整列手段40,是具備:作為被配置於載置台21的4隅下方的驅動機器的4個直線馬達41;及被支撐於各直線馬達41的輸出軸41A,例如可以將支撐面21A對於由X軸及Y軸形成的規定平面傾斜的方式將載置台21支撐的球接頭42。 The aligning means 40 includes four linear motors 41 as driving devices arranged below 4 隅 of the mounting table 21, and output shafts 41A supported by the linear motors 41. For example, the support surface 21A can be adjusted by X The ball joint 42 which supports the mounting table 21 so that the predetermined plane formed by the axis and the Y axis may be inclined.
移動促進手段50,是具備設在載置台21的內 部的超音波振動裝置。 The movement promoting means 50 is an ultrasonic vibration device provided inside the mounting table 21.
轉移手段60,是具備:作為驅動機器的線性馬達61、及作為透過托架61B被支撐在線性馬達61的滑件61A的驅動機器的直線馬達62、及被支撐於直線馬達62的輸出軸62A並藉由減壓泵或真空噴射器等的無圖示的減壓手段可將黏著薄片AS吸附支撐的吸盤63、及作為驅動機器的線性馬達64、及作為被支撐於線性馬達64的滑件64A的驅動機器的直線馬達65、及被支撐於直線馬達65的輸出軸65A的剝離板66。 The transfer means 60 includes a linear motor 61 as a driving device, a linear motor 62 as a driving device supported by a slider 61A of the linear motor 61 through a bracket 61B, and an output shaft 62A supported by the linear motor 62. By means of pressure reduction means (not shown) such as a pressure reduction pump or vacuum ejector, a suction pad 63 that is supported by the adhesive sheet AS can be sucked and supported, a linear motor 64 as a driving device, and a slider supported by the linear motor 64. A linear motor 65 of a 64A driving device and a peeling plate 66 supported by the output shaft 65A of the linear motor 65.
說明在以上的整列裝置10中將晶片CP整列的程序。 A procedure for aligning the wafers CP in the aligning device 10 described above will be described.
首先,作業者或是皮帶輸送帶等的無圖示的搬運手段,是對於各構件被配置於初期位置的第1圖所示的狀態的整列裝置10,將黏著薄片AS作為上側將一體物WK載置在支撐面21A的規定位置的話,支撐手段20是將無圖示的減壓手段驅動,從晶片CP側將一體物WK吸附保持。 First, an unillustrated conveyance means such as an operator or a belt conveyor is an integrated device WK with the adhesive sheet AS as an upper side of the entire device 10 in a state shown in FIG. 1 in which each member is arranged at an initial position. When placed on a predetermined position of the support surface 21A, the support means 20 drives a pressure reducing means (not shown) to suck and hold the integrated body WK from the wafer CP side.
接著,轉移手段60是將線性馬達61、64及直線馬達62、65驅動,將吸盤63及剝離板66朝第2圖A中實線所示的位置移動。且,轉移手段60是將無圖示的減壓手段驅動,由吸盤63將黏著薄片AS的右端部吸附保持。接著,轉移手段60是將線性馬達61、64及直線馬達62驅動,將吸盤63上昇之後,如第2圖A中二點鎖線所示,將該吸盤63及剝離板66朝左方移動。由此,黏 著薄片AS是從晶片CP被剝離,該晶片CP被轉移至支撐面21A。又,黏著薄片AS是從晶片CP被剝離的話,轉移手段60是停止無圖示的減壓手段的驅動,將黏著薄片AS落下使被收容在位於吸盤63的下方的箱或袋等的無圖示的薄片回收手段內。其後,轉移手段60是將線性馬達61、64及直線馬達62、65驅動,將吸盤63及剝離板66復歸至初期位置。 Next, the transfer means 60 drives the linear motors 61 and 64 and the linear motors 62 and 65, and moves the suction cup 63 and the peeling plate 66 to the position shown by the solid line in FIG. 2A. In addition, the transfer means 60 is driven by a pressure reducing means (not shown), and the right end portion of the adhesive sheet AS is sucked and held by the suction cup 63. Next, the transfer means 60 drives the linear motors 61 and 64 and the linear motor 62 to raise the suction cup 63, and then moves the suction cup 63 and the release plate 66 to the left as indicated by the two-point lock line in FIG. 2A. Thereby, the adhesive sheet AS is peeled from the wafer CP, and this wafer CP is transferred to the support surface 21A. When the adhesive sheet AS is peeled from the wafer CP, the transfer means 60 stops driving of a pressure reducing means (not shown), and drops the adhesive sheet AS so as to be stored in a box, a bag, or the like located below the suction cup 63. The flake recycling means shown below. Thereafter, the transfer means 60 drives the linear motors 61 and 64 and the linear motors 62 and 65 to return the suction cup 63 and the peeling plate 66 to the initial positions.
接著,支撐手段20是停止無圖示的減壓手段的驅動之後,依據無圖示的檢出手段的檢出結果,分隔手段30是將線性馬達32、33及直線馬達34驅動,如第2圖B所示,將格子部35C插入複數晶片CP間全部。此時,如第2圖C所示,對於格子部35C的一部分的晶片CP的前後、左右方向的位置、及方向是具有散亂的情況。在此,整列手段40是將各直線馬達41驅動,如第2圖D所示,使由格子部35C被包圍的從平面看四角形的空間中的1個角是對於其他的3個角成為最低位置的方式將載置台21傾斜(例如載置台21中的符號21B所示的角是對於其他的3個角成為最低位置的方式傾斜)。由此,晶片CP是藉由重力移動,如第2圖E所示,使位於該晶片CP中的1個角(載置台21的符號21B側的角)被退移至位於格子部35C中的1個角(載置台21的符號21B側的角),使各晶片CP是保持規定的間隔地由規定的方向整列於支撐面21A上的規定的位置。此時,移動促進手段50是將超音波振動裝置驅動,使各晶片CP的1個角容 易被退移至格子部35C的1個角也可以。且,使由分隔構件35整列的各晶片CP被配置於支撐面21A的規定的位置的方式,分隔手段30是將線性馬達32、33驅動,將分隔構件35沿著支撐面21A移動使各晶片CP移動也可以。 Next, after the support means 20 stops driving of the pressure reducing means (not shown), based on the detection result of the detection means (not shown), the separation means 30 drives the linear motors 32, 33 and the linear motor 34, as in the second example. As shown in FIG. B, the grid portion 35C is inserted into all of the plurality of wafers CP. At this time, as shown in FIG. 2C, the positions and directions of the wafer CP in the front-back, left-right direction, and direction of a part of the grid portion 35C may be scattered. Here, the aligning means 40 drives the linear motors 41, and as shown in FIG. 2D, one corner of the quadrangular space surrounded by the grid portion 35C is the lowest among the other three corners. The placement method 21 tilts the mounting table 21 (for example, the angle indicated by the symbol 21B in the mounting table 21 is a tilt method in which the other three corners become the lowest positions). As a result, the wafer CP is moved by gravity, and as shown in FIG. 2E, one corner (the corner on the side of the symbol 21B of the mounting table 21) in the wafer CP is moved back to the grid portion 35C. One corner (the corner on the side of the symbol 21B of the mounting table 21) is such that each wafer CP is aligned at a predetermined position on a support surface 21A in a predetermined direction at a predetermined interval. At this time, the movement promoting means 50 may drive the ultrasonic vibration device so that one corner of each wafer CP can be easily moved back to one corner of the grid portion 35C. In addition, each wafer CP aligned by the partition member 35 is arranged at a predetermined position on the support surface 21A. The partition means 30 drives the linear motors 32 and 33 and moves the partition member 35 along the support surface 21A to move each wafer. CP movement is also possible.
接著,支撐手段20是將無圖示的減壓手段驅動,由支撐面21A將各晶片CP吸附保持。接著,整列手段40是將各直線馬達41驅動,將載置台21復歸至初期位置之後,分隔手段30是將線性馬達32、33及直線馬達34驅動,將分隔構件35復歸至初期位置。且,支撐手段20是停止無圖示的減壓手段的驅動之後,作業者或是無圖示的搬運手段是將各晶片CP搭載在被搭載物上。且,全部的晶片CP是被搭載於被搭載物上的話,之後反覆上述同樣的動作。又,將分隔構件35復歸至初期位置之後,設置將無圖示的黏著薄片貼附在各晶片CP上的薄片貼附手段、或設置將無圖示的樹脂積層在各晶片CP上的積層手段也可以。 Next, the support means 20 drives a pressure reduction means (not shown), and each wafer CP is sucked and held by the support surface 21A. Next, the aligning means 40 drives each linear motor 41 to return the mounting table 21 to the initial position, and the partition means 30 drives the linear motors 32 and 33 and the linear motor 34 to return the partition member 35 to the initial position. In addition, after the support means 20 stops driving of the pressure reducing means (not shown), the operator or the conveying means (not shown) mounts each chip CP on the object. When all the wafers CP are mounted on the object, the same operations as described above are repeated. After returning the partition member 35 to the initial position, a sheet attaching means for attaching an adhesive sheet (not shown) to each wafer CP is provided, or a stacking means for depositing a resin (not shown) on each wafer CP is provided. Yes.
依據如以上的實施例的話,因為將格子狀的分隔構件35插入複數晶片CP間,就可以將支撐面21A及分隔構件35的雙方傾斜使該晶片CP整列,所以除了如黏著薄片AS賦予張力的方向以外,因為張力也不會朝那些的合成方向被賦予,所以可以將各晶片CP的間隔正確地擴大。 According to the above embodiment, since the grid-like partition member 35 is inserted between the plurality of wafers CP, both the support surface 21A and the partition member 35 can be tilted to align the wafer CP, so in addition to the adhesive sheet AS that imparts tension In addition to the directions, tension is not applied in the combined direction of those, so that the interval between the wafers CP can be accurately enlarged.
如以上,本發明實施用的最佳的構成、方法 等,雖如前述記載被揭示,但是本發明,不限定於此。即,本發明,主要是特別圖示及說明特定的實施例,但是只要不脫離本發明的技術的思想及目的之範圍,本行業者皆可對於以上述及實施例的形狀、材質、數量、其他的詳細的構成,加上各式各樣的變形。且,在上述揭示的形狀、材質等的限定記載,因為只是為了容易理解本發明而例示者,不是限定本發明,所以取下了那些的形狀、材質等的限定的一部分或是全部的限定的構件的名稱的記載,也被包含於本發明。 As described above, although the best structure and method for implementing the present invention are disclosed as described above, the present invention is not limited to this. That is, the present invention mainly specifically illustrates and explains specific embodiments. However, those skilled in the art can make use of the shapes, materials, quantities, and sizes of the above and embodiments without departing from the technical idea and purpose of the present invention. Other detailed structures, plus various deformations. In addition, the limited descriptions of the shapes, materials, and the like disclosed above are merely exemplified for easy understanding of the present invention, and are not the limitations of the present invention. Therefore, some or all of the restrictions of the shapes, materials, and the like are removed. The description of the names of the members is also included in the present invention.
例如,支撐手段20,是由機械挾盤或夾持筒等的挾盤手段、庫侖力、黏著劑、磁力等將晶片CP保持的構成也可以,不將晶片CP保持構成也可以。 For example, the support means 20 may be a structure that holds the wafer CP by a cymbal means such as a mechanical chuck or a holding cylinder, a Coulomb force, an adhesive, a magnetic force, or the like, or a configuration that does not hold the wafer CP.
支撐手段20,是可藉由雷射光等單片化成複數晶片CP地形成脆弱層的晶圓WF、或將形成有可單片化成複數晶片CP的溝(不朝上下方向貫通的溝)的晶圓WF支撐也可以。此情況,分隔構件,是具備可將晶圓WF切斷的切斷刃也可以。 The supporting means 20 is a wafer WF capable of forming a fragile layer by singulating into a plurality of wafers CP by laser light or the like, or a crystal formed with a groove (a groove that does not penetrate vertically) that can be singulated into a plurality of wafers CP. Round WF supports are also available. In this case, the partition member may be provided with a cutting blade capable of cutting the wafer WF.
支撐手段20,是將晶圓WF例如朝1度、30度、45度、60度等任意的方向切斷,將被單片化的晶片CP支撐也可以。 The supporting means 20 may cut the wafer WF in any direction such as 1 degree, 30 degrees, 45 degrees, and 60 degrees, and may support the wafer CP singulated.
支撐手段20,是為了容易將格子部35C插入各晶片CP間,藉由無圖示的擴大裝置將黏著薄片AS拉長(擴大),將各晶片CP間被擴大的一體物WK支撐也可以。 The supporting means 20 is for easily inserting the grid portion 35C between the wafers CP, and the adhesive sheet AS is stretched (expanded) by an expansion device (not shown) to support the integrated body WK which is enlarged between the wafers CP.
支撐手段20,是在支撐面21A上形成有格子部也可以。 The support means 20 may be formed with a grid portion on the support surface 21A.
可取代分隔構件35,採用將線狀構件配置成格子狀的網狀者也可以。 Instead of the partitioning member 35, a net-like structure in which linear members are arranged in a grid shape may be used.
分隔構件35,是不具有基座托板35A的格子部35C單體者也可以。 The partition member 35 may be a single unit without the grid portion 35C having the base pallet 35A.
格子部35C的下端部不是形成先端較細形狀也可以。 The lower end portion of the grid portion 35C may not be formed into a thinner tip.
格子部35C,是即使不將晶片CP整體包圍也可以,具有對應1個晶片CP的角的1個角的構成也可以,這種情況,整列手段40,是使晶片CP的1個角被退移至對應該1個角的格子部35C的1個角的方式將載置台21傾斜即可。 The grid portion 35C is not required to surround the entire wafer CP, and may have a configuration corresponding to one corner of one wafer CP. In this case, the aligning means 40 is to retreat one corner of the wafer CP. The stage 21 may be tilted so as to move to one corner of the grid portion 35C corresponding to one corner.
整列手段40,是不將分隔手段30傾斜,而將載置台21傾斜也可以。 The aligning means 40 does not have to tilt the partitioning means 30, but may tilt the mounting table 21.
整列手段40,是不將載置台21傾斜,而將分隔手段30傾斜也可以。此情況,可以採用:由第1圖顯示的整列裝置10的支撐手段20及分隔手段30是上下反轉的配置、或設有將支撐手段20及分隔手段30上下反轉的反轉手段的構成、或在分隔構件35上將各晶片CP整列的構成。 The aligning means 40 does not have to tilt the mounting table 21, but it is also possible to tilt the partitioning means 30. In this case, it is possible to adopt a configuration in which the supporting means 20 and the partitioning means 30 of the entire line device 10 shown in FIG. 1 are inverted upside down, or a configuration provided with a reversing means that reverses the supporting means 20 and the partitioning means 30 up and down. Or a configuration in which the wafers CP are aligned on the partition member 35.
整列手段40,是使由載置台21中的符號21B顯示的角以外的其他的3個角的其中任一個成為最低位置的方式將該載置台21傾斜也可以,使晶片CP中的1個角 被退移至格子部35C的1個角的方式將載置台21傾斜即可。 The aligning means 40 is such that one of the three corners other than the corner indicated by the symbol 21B on the mounting table 21 becomes the lowest position. The mounting table 21 may be tilted to make one corner of the wafer CP. It is sufficient to tilt the mounting table 21 so as to be moved back to one corner of the grid portion 35C.
整列手段40,是可以將載置台21傾斜即可,直線馬達41,是3個以下也可以,5個以上也可以。 The aligning means 40 is only required to incline the mounting table 21, and the linear motor 41 may be three or less, and may be five or more.
移動促進手段50,是由偏心馬達、氣壓缸、振動器等構成也可以。 The movement promotion means 50 may be constituted by an eccentric motor, a pneumatic cylinder, a vibrator, or the like.
移動促進手段50,是設在分隔構件35側也可以,將直線馬達34、41的至少一方的輸出軸34A、41A每次少量出入,或將線性馬達32、33的至少一方的滑件32A、33A每次少量移動,地促進晶片CP移動的構成也可以。 The movement promoting means 50 may be provided on the side of the partition member 35, and the output shafts 34A, 41A of at least one of the linear motors 34, 41 may be moved in and out at a small amount, or the sliders 32A, of at least one of the linear motors 32, 33, A configuration in which 33A moves a small amount to promote the movement of the wafer CP may be used.
移動促進手段50,是從設在支撐面21A的複數吸引孔將空氣或單體氣體等的氣體吹出,促進晶片CP移動的構成也可以。 The movement promoting means 50 may have a configuration in which a gas such as air or a monomer gas is blown out from a plurality of suction holes provided in the support surface 21A to promote the movement of the wafer CP.
移動促進手段50,是從基座托板35A側將空氣吸入使晶片CP浮上、或不將晶片CP浮上而減少該晶片CP及支撐面21A的靜止摩擦,地促進晶片CP移動的構成也可以。 The movement promotion means 50 may be configured to promote the movement of the wafer CP by sucking in air from the susceptor 35A side to float the wafer CP or to reduce the static friction between the wafer CP and the support surface 21A without floating the wafer CP.
轉移手段60,是例如,由夾持筒或多關節機械手臂等的把持手段將黏著薄片AS把持,由該把持手段將黏著薄片AS拉伸將該黏著薄片AS從各晶片CP剝離也可以,例如,將剝離用黏著薄片黏著在黏著薄片AS,將該剝離用黏著薄片拉伸將黏著薄片AS從各晶片CP剝離也可以,可將黏著薄片AS從各晶片CP剝離的話,無任 何限定。 The transfer means 60 is, for example, holding the adhesive sheet AS by a holding means such as a clamping cylinder or a multi-joint robotic arm, and stretching the adhesive sheet AS by the holding means to peel the adhesive sheet AS from each wafer CP. For example, The peeling adhesive sheet may be adhered to the adhesive sheet AS, and the peeling adhesive sheet may be stretched to peel the adhesive sheet AS from each wafer CP. The adhesive sheet AS may be peeled from each wafer CP without any limitation.
轉移手段60,是取代剝離板66而採用圓棒或滾子也可以,不設置剝離板66及將其移動的驅動機器等也可以。 The transfer means 60 may be a round bar or a roller instead of the peeling plate 66, and the peeling plate 66 and a driving device for moving the peeling plate 66 may not be provided.
轉移手段60,沒有也可以。 The transfer means 60 is not required.
片狀體,是例如三角形或五角形以上的多角形也可以。這種情況,採用具備片狀體的角部可嵌合的壁面的分隔構件,整列手段40,是使片狀體中的1個角被退移至分隔構件中的壁面的1個角的方式將載置台21傾斜即可。 The sheet-like body may be, for example, a triangle or a polygon having a pentagon or more. In this case, a partition member having a wall surface in which the corners of the sheet-like body can be fitted is used, and the alignment means 40 is a method in which one corner of the sheet-like body is moved back to one corner of the wall surface in the partition member. It is sufficient to tilt the mounting table 21.
片狀體,是例如圓形或橢圓形幾何學的形狀也可以。這種情況,採用具備片狀體的規定的部分可嵌合的壁面的分隔構件,整列手段40,是使片狀體中的規定的部分被退移至該壁面的方式將載置台21傾斜即可。 The sheet-like body may have a geometric shape such as a circle or an ellipse. In this case, the partitioning member is provided with a wall part into which a predetermined portion of the sheet-like body can be fitted, and the arranging means 40 is to tilt the mounting table 21 so that a predetermined portion of the sheet-like body is moved back to the wall surface. can.
且本發明中的黏著薄片AS及片狀體的材質、種別、形狀等,無特別限定。例如黏著薄片AS,是圓形、橢圓形、三角形或四角形等的多角形、其他的形狀也可以,感壓接著性、感熱黏著性等的黏著形態者也可以。且,這種黏著薄片AS,是例如,只有黏著劑層的單層者,在基材薄片及黏著劑層之間具有中間層者,在基材薄片的上面具有蓋層的等3層以上者,進一步,可以將基材薄片從黏著劑層剝離的雙面黏著薄片者也可以,雙面黏著薄片,是具有單層或是複層的中間層者、或無中間層的單層或是複層者也可以。且,片狀體,是例如食品、樹脂容 器、矽半導體晶片或化合物半導體晶片等的半導體晶片、電路基板、光碟片等的資訊記錄基板、玻璃板、鋼板、陶器、木板或是樹脂板等,任意的形態的構件或物品等也可以作為對象。又,將黏著薄片AS功能性,換成用途的讀取方式,例如可以將資訊記載用標籤、裝飾用標籤、保護薄片、切割膠帶、晶片固定片、黏晶帶、記錄層形成樹脂薄片等的任意的形狀的任意的薄片、薄膜、帶等貼附在如前述的任意的被粘附體。 In addition, the materials, types, shapes, and the like of the adhesive sheet AS and the sheet-like body in the present invention are not particularly limited. For example, the adhesive sheet AS may be a polygon such as a circle, an ellipse, a triangle, or a quadrangle, and other shapes may also be used. Adhesive forms such as pressure-sensitive adhesiveness and heat-sensitive adhesiveness may also be used. The adhesive sheet AS is, for example, a single layer having only an adhesive layer, an intermediate layer between the substrate sheet and the adhesive layer, and three or more layers including a cover layer on the substrate sheet. Furthermore, the double-sided adhesive sheet that can peel the substrate sheet from the adhesive layer can also be used. The double-sided adhesive sheet is a middle layer with a single layer or a multi-layer, or a single layer or a multi-layer without the middle layer. The layer person can also. The sheet-like body is, for example, a semiconductor wafer such as a food, a resin container, a silicon semiconductor wafer or a compound semiconductor wafer, a circuit board, an information recording substrate such as an optical disc, a glass plate, a steel plate, a pottery, a wooden board, or a resin plate. A member, an article, etc. of arbitrary form can also be made into an object. In addition, the functionality of the adhesive sheet AS is changed to a reading method for use, such as information recording labels, decorative labels, protective sheets, dicing tapes, wafer fixing sheets, sticky crystal tapes, recording layer forming resin sheets, and the like. Arbitrary sheets, films, tapes, and the like of arbitrary shapes are attached to any of the adherends as described above.
本發明中的手段及過程,只是說明了那些手段及過程動作,只要可以達成功能或是過程的話沒有任何限定,更不用說,完全不限定於由前述實施例所示的一實施例的構成物和過程。例如,支撐手段,是可將複數片狀體由支撐面支撐的話,比對申請當初的技術常識,只要是其技術範圍內的話無任何限定(省略說明其他的手段及過程)。 The means and processes in the present invention only describe those means and process actions, as long as they can achieve the function or process, there is no limitation, let alone, it is not limited to the structure of the embodiment shown in the foregoing embodiment. And process. For example, if the supporting means is capable of supporting a plurality of sheet-like bodies on a supporting surface, the technical common sense at the time of application is compared with the supporting means, as long as it is within the technical scope (the explanation of other means and processes is omitted).
且前述實施例中的驅動機器,可以採用轉動馬達、直線馬達、線性馬達、單軸機械手臂、多關節機械手臂等的電動機器、氣壓缸、油壓缸、無桿壓缸及旋轉壓缸等的致動器等,也可以採用將那些直接或間接地組合者(也有與實施例例示者重複者)。 In addition, as the driving machine in the foregoing embodiments, electric motors such as rotary motors, linear motors, linear motors, single-axis robot arms, multi-joint robot arms, pneumatic cylinders, hydraulic cylinders, rodless cylinders, and rotary cylinders can be used. Actuators and the like may also be used in combination with those directly or indirectly (there is also a duplication with those exemplified in the embodiment).
Claims (4)
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JP2014234891A JP6393596B2 (en) | 2014-11-19 | 2014-11-19 | Alignment apparatus and alignment method |
JP2014-234891 | 2014-11-19 |
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TW104133033A TWI681481B (en) | 2014-11-19 | 2015-10-07 | Array device and method |
TW108122671A TW201939644A (en) | 2014-11-19 | 2015-10-07 | Aligning apparatus and aligning method |
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CN106903978B (en) * | 2017-02-21 | 2019-01-11 | 深圳市华星光电技术有限公司 | Transfer the transfer device of template and micro- light emitting diode |
US10211363B2 (en) | 2017-02-21 | 2019-02-19 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Transfer printing template and transfer printing device of micro light-emitting diode |
JP6880431B2 (en) * | 2017-04-11 | 2021-06-02 | リンテック株式会社 | Separation device and separation method |
JP7155587B2 (en) * | 2018-04-10 | 2022-10-19 | 富士電機株式会社 | ARTICLE POSTURE CORRECTION STRUCTURE, CONVEYING APPARATUS, AND CONVEYING METHOD |
CN111554604B (en) * | 2020-04-30 | 2023-11-21 | 苏州均华精密机械有限公司 | Jointing device for improving precision and speed |
CN112992720B (en) * | 2020-07-22 | 2022-04-29 | 重庆康佳光电技术研究院有限公司 | Method and system for transferring huge amount of micro light emitting diode chips |
CN117515166A (en) * | 2022-07-28 | 2024-02-06 | 华为技术有限公司 | Valve, interconnection device |
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JPS4821418B1 (en) * | 1969-01-27 | 1973-06-28 | ||
JPS6461033A (en) * | 1987-09-01 | 1989-03-08 | Sumitomo Electric Industries | Device for mounting chip |
JP4592894B2 (en) * | 2000-08-25 | 2010-12-08 | Necエンジニアリング株式会社 | Positioning device and positioning method |
JP4272402B2 (en) * | 2002-10-11 | 2009-06-03 | 株式会社日立メディアエレクトロニクス | Package and lid combination device and combination method |
JP2007036060A (en) * | 2005-07-28 | 2007-02-08 | Sanyo Electric Co Ltd | Semiconductor device and manufacturing method thereof |
KR100676736B1 (en) * | 2006-06-30 | 2007-02-01 | 주식회사 월드프라텍 | Chip scale package tray |
JP2009175581A (en) * | 2008-01-28 | 2009-08-06 | Kyocera Mita Corp | Transfer belt device for image forming apparatus |
JP5350980B2 (en) * | 2009-11-02 | 2013-11-27 | シチズン電子株式会社 | LED element manufacturing method |
JP5607965B2 (en) * | 2010-03-23 | 2014-10-15 | 日東電工株式会社 | Semiconductor wafer mounting method and semiconductor wafer mounting apparatus |
JP5533695B2 (en) * | 2011-01-26 | 2014-06-25 | 豊田合成株式会社 | Semiconductor chip manufacturing method and semiconductor chip mounting method |
JP6007008B2 (en) * | 2012-07-06 | 2016-10-12 | リンテック株式会社 | Sheet pasting device |
JP6047439B2 (en) * | 2013-03-26 | 2016-12-21 | 株式会社Screenホールディングス | Peeling apparatus and peeling method |
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TW201626488A (en) | 2016-07-16 |
KR20160059967A (en) | 2016-05-27 |
CN105609447A (en) | 2016-05-25 |
KR102419700B1 (en) | 2022-07-11 |
JP2016100413A (en) | 2016-05-30 |
TWI681481B (en) | 2020-01-01 |
CN105609447B (en) | 2020-06-02 |
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