TW201716544A - Fluorescent body, production method therefor and light-emitting device - Google Patents
Fluorescent body, production method therefor and light-emitting device Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 229910052796 boron Inorganic materials 0.000 claims abstract description 49
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 43
- 239000000203 mixture Substances 0.000 claims abstract description 38
- 229910052788 barium Inorganic materials 0.000 claims abstract description 22
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 22
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 15
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 148
- 150000001875 compounds Chemical class 0.000 claims description 58
- 239000002994 raw material Substances 0.000 claims description 20
- 239000013078 crystal Substances 0.000 claims description 16
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 claims description 15
- 238000010304 firing Methods 0.000 claims description 15
- 238000002441 X-ray diffraction Methods 0.000 claims description 13
- 239000007789 gas Substances 0.000 claims description 13
- 238000002156 mixing Methods 0.000 claims description 13
- 238000000295 emission spectrum Methods 0.000 claims description 12
- 239000011261 inert gas Substances 0.000 claims description 7
- 230000005284 excitation Effects 0.000 claims description 4
- 239000002184 metal Substances 0.000 abstract description 4
- 239000002245 particle Substances 0.000 description 29
- 239000000843 powder Substances 0.000 description 29
- 239000011575 calcium Substances 0.000 description 23
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 19
- 230000000052 comparative effect Effects 0.000 description 19
- 239000011777 magnesium Substances 0.000 description 19
- 238000004020 luminiscence type Methods 0.000 description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 13
- 239000001301 oxygen Substances 0.000 description 13
- 229910052760 oxygen Inorganic materials 0.000 description 13
- 238000009826 distribution Methods 0.000 description 10
- 238000005259 measurement Methods 0.000 description 10
- 238000010298 pulverizing process Methods 0.000 description 10
- 229910052712 strontium Inorganic materials 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 9
- 229910052684 Cerium Inorganic materials 0.000 description 8
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000009616 inductively coupled plasma Methods 0.000 description 6
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 4
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- 229910002703 Al K Inorganic materials 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910017639 MgSi Inorganic materials 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- BCZWPKDRLPGFFZ-UHFFFAOYSA-N azanylidynecerium Chemical compound [Ce]#N BCZWPKDRLPGFFZ-UHFFFAOYSA-N 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000004993 emission spectroscopy Methods 0.000 description 2
- 238000002189 fluorescence spectrum Methods 0.000 description 2
- 125000005842 heteroatom Chemical class 0.000 description 2
- 238000010191 image analysis Methods 0.000 description 2
- 229910052743 krypton Inorganic materials 0.000 description 2
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 2
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- -1 strontium nitride Chemical class 0.000 description 2
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 108010043121 Green Fluorescent Proteins Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910020068 MgAl Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- JOMGYQRFIJXMJV-UHFFFAOYSA-N [B].OOO Chemical compound [B].OOO JOMGYQRFIJXMJV-UHFFFAOYSA-N 0.000 description 1
- ROZSPJBPUVWBHW-UHFFFAOYSA-N [Ru]=O Chemical compound [Ru]=O ROZSPJBPUVWBHW-UHFFFAOYSA-N 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- PPQREHKVAOVYBT-UHFFFAOYSA-H dialuminum;tricarbonate Chemical compound [Al+3].[Al+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O PPQREHKVAOVYBT-UHFFFAOYSA-H 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007580 dry-mixing Methods 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- BDAGIHXWWSANSR-NJFSPNSNSA-N hydroxyformaldehyde Chemical compound O[14CH]=O BDAGIHXWWSANSR-NJFSPNSNSA-N 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- IDBFBDSKYCUNPW-UHFFFAOYSA-N lithium nitride Chemical compound [Li]N([Li])[Li] IDBFBDSKYCUNPW-UHFFFAOYSA-N 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- 229910001947 lithium oxide Inorganic materials 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- XFBLPIPEFDRLTH-UHFFFAOYSA-N oxoruthenium(1+) Chemical compound [Ru+]=O XFBLPIPEFDRLTH-UHFFFAOYSA-N 0.000 description 1
- UFQXGXDIJMBKTC-UHFFFAOYSA-N oxostrontium Chemical compound [Sr]=O UFQXGXDIJMBKTC-UHFFFAOYSA-N 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910000018 strontium carbonate Inorganic materials 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/64—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing aluminium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B20/00—Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
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- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Luminescent Compositions (AREA)
- Led Device Packages (AREA)
Abstract
Description
本發明係關於一種螢光體及其製造方法以及發光裝置,尤其是關於一種顯現綠色發光之螢光體及其製造方法以及發光裝置。 The present invention relates to a phosphor, a method of manufacturing the same, and a light-emitting device, and more particularly to a phosphor that exhibits green light, a method of manufacturing the same, and a light-emitting device.
以往,白色發光二極體(白色LED)廣泛應用將釋放藍光之半導體發光元件與黃色之螢光體組合,藉由藍色與黃色之混色而獲得白光之雙色混色類型者。然而,該雙色混色類型之白色LED所發出之白光存在演色性較差之問題。因此,作為其他構成,開發有如下三色混色類型之白色LED,該三色混色類型之白色LED係將發出藍光之半導體發光元件、與綠色、紅色之2種螢光體進行組合,利用來自半導體發光元件之光激發各螢光體,藉此利用藍色、綠色、紅色之混色而獲得白光。 In the past, white light-emitting diodes (white LEDs) have been widely used to combine a blue-emitting semiconductor light-emitting element with a yellow phosphor, and a two-color mixed type of white light is obtained by mixing colors of blue and yellow. However, the white light emitted by the two-color mixed type white LED has a problem of poor color rendering. Therefore, as another configuration, a white LED having a three-color mixed color type in which a semiconductor light-emitting element that emits blue light and two kinds of phosphors of green and red are combined is used, and a semiconductor LED is used. The light of the light-emitting element excites the respective phosphors, thereby obtaining white light by using a mixed color of blue, green, and red.
作為顯現綠色發光之螢光體,開發有各種組成之綠色螢光體。例如於專利文獻1及非專利文獻1中,作為LED等所使用之綠色螢光體,記載有具有Sr5-y-z-aMySi23-xAl3+xOx+2aN37-x-2a:EuzCez1組成之螢光體,尤其是於專利文獻1之實施例中記載有具有Sr4.9Al5Si21O2N35:Eu0.1組成之螢光體。 As a phosphor that exhibits green light emission, a green phosphor having various compositions has been developed. For example, in Patent Document 1 and Non-Patent Document 1, a green phosphor used for an LED or the like is described as having Sr 5-yza M y Si 23-x Al 3+x O x+2a N 37-x-2a. A phosphor composed of Eu z Ce z1 , in particular, an embodiment having a composition of Sr 4.9 Al 5 Si 21 O 2 N 35 :Eu 0.1 is described in the embodiment of Patent Document 1.
又,例如於專利文獻2中記載有如下螢光體:含有含規定結晶中之外側區域中之氧濃度與內側區域中之氧濃度之比且經Eu活化之 Sr3Si13Al3O2N21屬結晶之粒子,且於利用波長250~500nm之光激發時,顯現於波長490~580nm之間具有發光峰之發光。 Further, for example, Patent Document 2 discloses a phosphor comprising Sr 3 Si 13 Al 3 O 2 N activated by Eu, which contains a ratio of an oxygen concentration in an outer side region of a predetermined crystal to an oxygen concentration in an inner region. The 21- genus crystal particles exhibit light emission with a luminescence peak between 490 and 580 nm when excited by light having a wavelength of 250 to 500 nm.
[專利文獻1]日本專利特表2011-505451號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2011-505451
[專利文獻2]日本專利特開2013-43937號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2013-43937
[非專利文獻] [Non-patent literature]
[非專利文獻1]Chemistry-A European Journal 2009, 15, 5311-5319 [Non-Patent Document 1] Chemistry-A European Journal 2009, 15, 5311-5319
然而,專利文獻1及非專利文獻1所記載之綠色螢光體存在發光特性並不充分,尤其是發光強度低之問題。又,如非專利文獻1所記載般具有如下問題,即由於SrAlSi4N7或Sr2Si5N8等橙色~紅色螢光體以異相之形式生成,故而必須以機械方式去除。進而,專利文獻2所記載之螢光體雖其發光強度對熱之穩定性高,但期待螢光體本身之發光特性進一步提昇。 However, the green phosphors described in Patent Document 1 and Non-Patent Document 1 have insufficient light-emitting characteristics, and particularly have a problem that the light-emitting intensity is low. Further, as described in Non-Patent Document 1, since the orange-red phosphor such as SrAlSi 4 N 7 or Sr 2 Si 5 N 8 is formed in a different phase, it must be mechanically removed. Further, although the phosphor described in Patent Document 2 has high luminous stability against heat, it is expected that the luminous characteristics of the phosphor itself are further improved.
又,關於白色LED用螢光體,已知有若粒徑過大,則變得難以均勻地分散於樹脂中,而色調產生偏差之問題,從而必須控制為特定之粒徑範圍。又,若為了使粒徑較小而進行粉碎、分級,則會產生微粒子而成為降低亮度之主因,因此必須在無需粉碎步驟下控制為特定之粒徑。 Further, as for the phosphor for white LEDs, it has been known that when the particle diameter is too large, it is difficult to uniformly disperse in the resin, and the color tone varies, and it is necessary to control the specific particle size range. Further, when pulverization and classification are carried out in order to reduce the particle size, fine particles are generated and the main cause of the decrease in brightness is required. Therefore, it is necessary to control the specific particle diameter without a pulverization step.
本發明係鑒於上述問題而完成者,其目的在於提供一種被控制為特定之粒徑並且異相之生成受到抑制,而發光特性尤其是發光強度較 以往優異之螢光體及其製造方法以及發光裝置。 The present invention has been made in view of the above problems, and an object thereof is to provide a particle size controlled to be specific and the generation of a heterogeneous phase is suppressed, and the luminescence property, particularly the luminescence intensity, is A conventional phosphor, a method for producing the same, and a light-emitting device.
為了達成以上之目的,本發明人等反覆進行努力研究,結果發現:藉由使經銪及/或鈰活化之綠色螢光體含有特定量之硼,可控制為特定之粒徑並且抑制異相之生成,而大幅提昇發光強度,從而完成本發明。 In order to achieve the above object, the inventors of the present invention have repeatedly conducted intensive studies, and as a result, have found that by allowing a green phosphor activated by ruthenium and/or osmium to contain a specific amount of boron, it can be controlled to a specific particle diameter and suppress the heterogeneous phase. The present invention is completed by greatly increasing the luminous intensity.
即,本發明係關於一種螢光體,其含有下述式(1)之組成所表示之結晶相,其特徵在於:進而含有硼100~2500ppm。 That is, the present invention relates to a phosphor comprising a crystal phase represented by the composition of the following formula (1), which further contains 100 to 2,500 ppm of boron.
SraM1bAlcSidNeOf:Eux1Cey1 (1) Sr a M1 b Al c Si d N e O f :Eu x1 Ce y1 (1)
(此處,M1係選自由Ca、Ba及Mg所組成之群中之1種以上之金屬元素,2≦a≦8,0≦b≦3,2≦c≦7,10≦d≦25,15≦e≦37,0≦f≦3,0<x1+y1≦0.6)。 (here, M1 is one or more metal elements selected from the group consisting of Ca, Ba, and Mg, 2≦a≦8, 0≦b≦3, 2≦c≦7, 10≦d≦25, 15≦e≦37,0≦f≦3,0<x1+y1≦0.6).
又,本發明係關於一種螢光體,其至少含有Sr5Al5Si21N35O2結構之結晶相,其特徵在於:將X射線繞射圖案中之Sr5Al5Si21N35O2結構之螢光體之來自(021)面的繞射峰強度設為A,且將SrAlSi4N7結構之螢光體之來自(221)面之繞射峰強度設為B時,B/A<0.03。 Further, the present invention relates to a phosphor comprising at least a crystal phase of a structure of Sr 5 Al 5 Si 21 N 35 O 2 characterized by: Sr 5 Al 5 Si 21 N 35 O in an X-ray diffraction pattern when the phosphor of structure 2 from the diffraction peak intensity of (021) plane is a, and the phosphor structure of SrAlSi 4 N 7 from the (221) diffraction peak intensity of the set B, B / A<0.03.
又,本發明係關於一種螢光體,其含有下述式(2)之組成所表示之結晶相。 Further, the present invention relates to a phosphor comprising a crystal phase represented by the composition of the following formula (2).
SrgM2hBiAljSikNlOm:Eux2Cey2 (2) Sr g M2 h B i Al j Si k N l O m :Eu x2 Ce y2 (2)
(此處,M2係選自由Ca、Ba及Mg所組成之群中之1種以上之金屬元素,2≦g≦8,0≦h≦3,0.02≦i≦0.8,2≦j≦7,10≦k≦25,15≦l≦37,0≦m≦3,0<x2+y2≦0.6)。 (here, M2 is one or more metal elements selected from the group consisting of Ca, Ba, and Mg, 2≦g≦8, 0≦h≦3, 0.02≦i≦0.8, 2≦j≦7, 10≦k≦25,15≦l≦37,0≦m≦3,0<x2+y2≦0.6).
又,本發明係關於一種螢光體之製造方法,其具備如下步 驟:將含Sr化合物、含Al化合物、含Si化合物、含Eu化合物及/或含Ce化合物、以及含B化合物進行混合而獲得原料混合物之步驟;與於非活性氣體環境下或還原性氣體環境下將上述原料混合物進行燒製之步驟,其特徵在於:上述含B化合物之添加量為上述原料混合物之250~10000ppm。 Moreover, the present invention relates to a method of manufacturing a phosphor, which has the following steps Step: a step of obtaining a raw material mixture by mixing an Sr-containing compound, an Al-containing compound, an Si-containing compound, an Eu-containing compound and/or a Ce-containing compound, and a B-containing compound; and in an inert gas atmosphere or a reducing gas atmosphere The step of firing the raw material mixture is characterized in that the amount of the B-containing compound added is from 250 to 10,000 ppm of the raw material mixture.
進而,本發明係關於一種發光裝置,其特徵在於:具備上述螢光體與對該螢光體照射激發光而使之發光之光源。 Furthermore, the present invention relates to a light-emitting device comprising: the phosphor; and a light source that emits excitation light to the phosphor and emits light.
根據本發明,可提供一種被控制為特定之粒徑並且異相之生成受到抑制,而發光特性尤其是發光強度較以往優異之螢光體及其製造方法以及發光裝置。 According to the present invention, it is possible to provide a phosphor, a method for producing the same, and a light-emitting device which are controlled to have a specific particle diameter and which suppress generation of a different phase, and which have excellent light-emitting characteristics, in particular, an emission intensity superior to those of the prior art.
圖1係表示實施例5及比較例1中所獲得之螢光體之X射線繞射(XRD)圖案之圖。 Fig. 1 is a view showing an X-ray diffraction (XRD) pattern of a phosphor obtained in Example 5 and Comparative Example 1.
圖2係表示實施例5及比較例1中所獲得之螢光體之發射光譜之圖。 Fig. 2 is a graph showing the emission spectra of the phosphors obtained in Example 5 and Comparative Example 1.
圖3係實施例5及比較例1中所獲得之螢光體之掃描式電子顯微鏡照片。 Fig. 3 is a scanning electron micrograph of the phosphor obtained in Example 5 and Comparative Example 1.
圖4係表示實施例5中所獲得之螢光體之B濃度深度剖面之圖。 Fig. 4 is a view showing a B-depth depth profile of the phosphor obtained in Example 5.
1.螢光體 Fluorescent body
本發明之螢光體含有下述式(1)之組成所表示之結晶相。 The phosphor of the present invention contains a crystal phase represented by the composition of the following formula (1).
SraM1bAlcSidNeOf:Eux1Cey1 (1) Sr a M1 b Al c Si d N e O f :Eu x1 Ce y1 (1)
(此處,M1係選自由Ca、Ba及Mg所組成之群中之1種以上之金屬元素,2≦a≦8,0≦b≦3,2≦c≦7,10≦d≦25,15≦e≦37,0≦f≦3,0<x1+y1≦0.6)。 (here, M1 is one or more metal elements selected from the group consisting of Ca, Ba, and Mg, 2≦a≦8, 0≦b≦3, 2≦c≦7, 10≦d≦25, 15≦e≦37,0≦f≦3,0<x1+y1≦0.6).
即,本發明之螢光體係經銪(Eu)及/或鈰(Ce)活化之螢光體,且為於利用波長330~500nm之光激發時,於500~560nm之間具有波峰之綠色螢光體。 That is, the fluorescent system of the present invention is activated by europium (Eu) and/or cerium (Ce), and is a green fluorescent light having a peak between 500 and 560 nm when excited by light having a wavelength of 330 to 500 nm. Light body.
於本發明之螢光體中,銪(Eu)及/或鈰(Ce)為活化劑,具有於螢光體中以發光原子之形式進行發光之性質。螢光體中之銪之莫耳比即上述x1之值為0≦x1≦0.3之範圍內,較佳為0.001≦x1≦0.25之範圍內,更佳為0.1≦x1≦0.15之範圍內。若x1之值超過0.3,則發光原子變成高濃度從而相互接近而相互抵消發光,因此發光強度容易變弱。又,螢光體中之鈰之莫耳比、即上述y1之值為0≦y1≦0.3之範圍內,較佳為0≦y1≦0.1之範圍內,更佳為0≦y1≦0.0001之範圍內。x1+y1之值為0<x1+y1≦0.6之範圍,較佳為0.001≦x1+y1≦0.25之範圍內,更佳為0.1≦x1+y1≦0.15之範圍。於本發明中亦包含為不含有Eu之組成之情形,即x1之值為0之情形;或者為不含有Ce之組成之情形,即y1之值為0之情形,但必須為至少含有Eu或Ce中之任一元素之組成,即x1+y1>0之組成。 In the phosphor of the present invention, lanthanum (Eu) and/or cerium (Ce) are activators and have a property of emitting light in the form of luminescent atoms in the phosphor. The molar ratio of the krypton in the phosphor is in the range of 0 ≦ x 1 ≦ 0.3, preferably 0.001 ≦ x 1 ≦ 0.25, more preferably 0.1 ≦ x 1 ≦ 0.15. When the value of x1 exceeds 0.3, the luminescence atoms become high in concentration and close to each other to cancel the luminescence, and thus the luminescence intensity is likely to be weak. Further, the molar ratio of the krypton in the phosphor, that is, the value of the above y1 is in the range of 0 ≦ y1 ≦ 0.3, preferably in the range of 0 ≦ y1 ≦ 0.1, more preferably in the range of 0 ≦ y1 ≦ 0.0001. Inside. The value of x1 + y1 is in the range of 0 < x1 + y1 ≦ 0.6, preferably in the range of 0.001 ≦ x 1 + y1 ≦ 0.25, more preferably in the range of 0.1 ≦ x 1 + y1 ≦ 0.15. Also included in the present invention is the case where the composition of Eu is not contained, that is, the case where the value of x1 is 0; or the case where the composition of Ce is not contained, that is, the value of y1 is 0, but it must be at least containing Eu or The composition of any element in Ce, that is, the composition of x1+y1>0.
又,於本發明之螢光體中,螢光體中之鍶(Sr)之莫耳比為2≦a≦8之範圍內,較佳為4≦a≦8之範圍內,更佳為4.5≦a≦6之範圍內,更佳為4.75≦a≦5.25之範圍內。於a之值為2≦a≦8之範圍內之情形時,可獲得半值寬窄之高亮度之綠色螢光體。 Further, in the phosphor of the present invention, the molar ratio of strontium (Sr) in the phosphor is in the range of 2 ≦ a ≦ 8, preferably in the range of 4 ≦ a ≦ 8, more preferably 4.5. Within the range of ≦a≦6, it is more preferably in the range of 4.75 ≦ a ≦ 5.25. When the value of a is in the range of 2≦a≦8, a green phosphor having a half-value width and a high brightness can be obtained.
又,於本發明之螢光體中,M1係選自由鈣(Ca)、鋇(Ba)及鎂(Mg)所組成之群中之1種以上之金屬元素,上述b之值較佳為0≦b≦3之範圍內。於本發明中亦包含為不含有Ca、Ba及Mg中之任一者之組成之情形、即上述b之值為0之情形。 Further, in the phosphor of the present invention, the M1 is one or more metal elements selected from the group consisting of calcium (Ca), barium (Ba), and magnesium (Mg), and the value of b is preferably 0. Within the range of ≦b≦3. Also included in the present invention is a case where the composition of any of Ca, Ba, and Mg is not contained, that is, the case where the value of b is zero.
又,於本發明之螢光體中,螢光體中之鋁(Al)之莫耳比為2≦c≦7之範圍內,較佳為3≦c≦7之範圍內,較佳為4≦c≦6之範圍內。於c之值為2≦c≦7之範圍內之情形時,可獲得半值寬窄之高亮度之綠色螢光體。 Further, in the phosphor of the present invention, the molar ratio of aluminum (Al) in the phosphor is in the range of 2 ≦ c ≦ 7, preferably in the range of 3 ≦ c ≦ 7, preferably 4 Within the range of ≦c≦6. When the value of c is in the range of 2 ≦ c ≦ 7, a green phosphor having a half-value width and a high brightness can be obtained.
又,於本發明之螢光體中,螢光體中之矽(Si)之莫耳比為10≦d≦25之範圍內,較佳為15≦d≦25之範圍內,更佳為19.5≦d≦22.5之範圍內,更佳為20.5≦d≦21.5之範圍內。於d之值為10≦d≦25之範圍內之情形時,可獲得半值寬窄之高亮度之綠色螢光體。 Further, in the phosphor of the present invention, the molar ratio of cerium (Si) in the phosphor is in the range of 10 ≦d ≦ 25, preferably in the range of 15 ≦ d ≦ 25, more preferably 19.5. Within the range of ≦d≦22.5, more preferably within the range of 20.5≦d≦21.5. When the value of d is in the range of 10 ≦d ≦ 25, a green phosphor having a half-value width and a high brightness can be obtained.
進而,於本發明之螢光體中,螢光體中之氮(N)之莫耳比為15≦e≦37之範圍內,較佳為32≦e≦37之範圍內,更佳為34≦e≦36之範圍內,更佳為34.5≦e≦35.5之範圍內。於e之值為15≦e≦37之範圍內之情形時,可獲得半值寬窄之高亮度之綠色螢光體。 Further, in the phosphor of the present invention, the molar ratio of nitrogen (N) in the phosphor is in the range of 15 ≦e ≦ 37, preferably in the range of 32 ≦ e ≦ 37, more preferably 34. Within the range of ≦e≦36, it is more preferably within the range of 34.5 ≦e ≦ 35.5. When the value of e is in the range of 15 ≦e ≦ 37, a green phosphor having a half-value width and a high brightness can be obtained.
又,於本發明之螢光體中,螢光體中之氧(O)之莫耳比為0≦f≦3之範圍內,較佳為0.1≦f≦2.3之範圍內。於f之值為0≦f≦3之範圍內之情形時,可獲得半值寬窄之高亮度之綠色螢光體。 Further, in the phosphor of the present invention, the molar ratio of oxygen (O) in the phosphor is in the range of 0 ≦ f ≦ 3, preferably in the range of 0.1 ≦ f ≦ 2.3. When the value of f is in the range of 0 ≦ f ≦ 3, a green phosphor having a high half-value width and high brightness can be obtained.
此處,本發明之螢光體之特徵在於進而含有硼。相對於螢光體整體之硼之含量為100~2500ppm,較佳為200~1500ppm,更佳為300~1500ppm。若硼之含量低於100ppm,則發光強度不會提昇,即便遠遠多於 2500ppm,發光強度亦變低。硼之含量可使用電感耦合電漿發射光譜分析(ICP-AES)裝置進行測量。 Here, the phosphor of the present invention is characterized by further containing boron. The content of boron relative to the entire phosphor is 100 to 2,500 ppm, preferably 200 to 1,500 ppm, more preferably 300 to 1,500 ppm. If the boron content is less than 100 ppm, the luminescence intensity will not increase, even if it is much more At 2500 ppm, the luminescence intensity also became low. The boron content can be measured using an inductively coupled plasma emission spectroscopy (ICP-AES) apparatus.
進而,關於本發明之螢光體,其螢光體最表面之硼元素濃度較佳為20000~100000ppm,更佳為30000~60000ppm。於本發明中,所謂螢光體最表面之硼元素濃度,可定義為於對螢光體最表面照射X射線時可獲得光電子之距外側數nm之深度處所測得之硼元素濃度。螢光體最表面之硼元素濃度可使用X射線光電子光譜(XPS)裝置進行測量。 Further, in the phosphor of the present invention, the boron element concentration on the outermost surface of the phosphor is preferably from 20,000 to 100,000 ppm, more preferably from 30,000 to 60,000 ppm. In the present invention, the concentration of the boron element on the outermost surface of the phosphor may be defined as the concentration of the boron element measured at a depth of several nm from the outer side when the X-ray is irradiated to the outermost surface of the phosphor. The concentration of boron element on the outermost surface of the phosphor can be measured using an X-ray photoelectron spectroscopy (XPS) apparatus.
螢光體粒子於大多情況下其組成於粒子表面附近與粒子內部會不同,確認組成變動。於本發明中,可將距螢光體最表面100nm(外側~100nm)之深度區域定義為螢光體表面,又,將超過螢光體表面(距外側超過100nm)之深度區域定義為螢光體內部。螢光體內部未見組成變動。 In many cases, the composition of the phosphor particles differs from the inside of the particle surface in the vicinity of the particle surface, and the composition variation is confirmed. In the present invention, a depth region of 100 nm (outside ~100 nm) from the outermost surface of the phosphor may be defined as a phosphor surface, and a depth region exceeding the surface of the phosphor (more than 100 nm from the outside) may be defined as fluorescence. Inside the body. No composition changes were observed inside the phosphor.
本發明之螢光體較佳為螢光體最表面之硼元素濃度高於螢光體內部之硼元素濃度。若螢光體最表面之硼元素濃度高於螢光體內部之硼元素濃度,則可獲得半值寬窄之高亮度之綠色螢光體。具體而言,螢光體最表面之硼元素濃度較佳為相對於距螢光體最表面200nm內部所存在之硼之元素濃度,具有5~8倍左右之差。距螢光體最表面200nm內部所存在之硼之元素濃度可定義為於自螢光體最表面蝕刻至200nm後,對蝕刻後之表面照射X射線時可獲得光電子之距蝕刻後之表面數nm之深度處測得的硼之元素濃度,可使用X射線光電子光譜(XPS)裝置進行測量。 Preferably, the phosphor of the present invention has a boron element concentration on the outermost surface of the phosphor higher than a boron element concentration in the phosphor. If the concentration of the boron element on the outermost surface of the phosphor is higher than the concentration of the boron element in the phosphor, a green phosphor having a half-value width and a high brightness can be obtained. Specifically, the concentration of the boron element on the outermost surface of the phosphor is preferably about 5 to 8 times the concentration of the element of boron existing inside the inner surface of 200 nm from the outermost surface of the phosphor. The concentration of boron in the interior of 200 nm from the outermost surface of the phosphor can be defined as the number of surfaces after etching from the surface of the phosphor to 200 nm after the surface of the phosphor is irradiated with X-rays. The elemental concentration of boron measured at the depth can be measured using an X-ray photoelectron spectroscopy (XPS) apparatus.
又,本發明之螢光體較佳為發射光譜之半值寬為70nm以下。此處,所謂半值寬,意指於將縱軸設為發光強度,將橫軸設為波長時,測量測量發射光譜並將其峰值下之發光強度設為I時,成為I/2時之波長 寬度。於半值寬如上述般相對較窄之情形時,可獲得高發光強度。 Further, the phosphor of the present invention preferably has a half value width of the emission spectrum of 70 nm or less. Here, the half value width means that when the vertical axis is the light emission intensity and the horizontal axis is the wavelength, when the measurement emission spectrum is measured and the light emission intensity at the peak is set to I, the time becomes I/2. wavelength width. When the half value width is relatively narrow as described above, high luminous intensity can be obtained.
又,關於本發明之螢光體,於將利用X射線繞射(XRD)裝置所測得之X射線繞射圖案中之Sr5Al5Si21N35O2結構之螢光體之來自(021)面的繞射峰強度設為A,將SrAlSi4N7結構之螢光體之來自(221)面之繞射峰強度設為B時,B/A<0.03,較佳為B/A<0.01,更佳為B/A=0。所謂Sr5Al5Si21N35O2結構,係與ICSD Coll Code:420168相同形狀之結晶結構,亦含有Sr之一部分經選自由Ca、Ba及Mg所組成之群中之1種以上之金屬元素取代之螢光體的結晶結構。又,所謂SrAlSi4N7結構,係與ICSD Coll Code:163667相同形狀之結晶結構,亦含有Sr之一部分經選自由Ca、Ba及Mg所組成之群中之1種以上之金屬元素取代之螢光體的結晶結構。於本發明中,B/A<0.03係意指以異相(雜質)之形式含於本發明之螢光體中之SrAlSi4N7結構之結晶之量較少。由於SrAlSi4N7結構之結晶之量少,故而可獲得發射光譜之半值寬窄之高亮度之綠色螢光體。 Further, the phosphor of the present invention is derived from a phosphor of a structure of Sr 5 Al 5 Si 21 N 35 O 2 in an X-ray diffraction pattern measured by an X-ray diffraction (XRD) apparatus. 021) The diffraction peak intensity of the surface is set to A, and when the diffraction peak intensity of the (221) plane of the phosphor of the SrAlSi 4 N 7 structure is B, B/A < 0.03, preferably B/A <0.01, more preferably B/A=0. The structure of Sr 5 Al 5 Si 21 N 35 O 2 is a crystal structure having the same shape as ICSD Coll Code: 420168, and also contains a metal of one or more selected from the group consisting of Ca, Ba, and Mg. The crystalline structure of the phosphor substituted by the element. Further, the SrAlSi 4 N 7 structure is a crystal structure having the same shape as ICSD Coll Code: 163667, and also contains a part of Sr which is replaced by one or more metal elements selected from the group consisting of Ca, Ba, and Mg. The crystal structure of the light body. In the present invention, B/A < 0.03 means that the amount of crystals of the SrAlSi 4 N 7 structure contained in the phosphor of the present invention in the form of a hetero phase (impurity) is small. Since the amount of crystals of the SrAlSi 4 N 7 structure is small, a high-luminance green phosphor having a half-value width of the emission spectrum can be obtained.
又,本發明之螢光體較佳利用雷射繞射/散射式粒度分佈測量裝置所測得之D10徑為20~30μm。若D10徑為20~30μm,則微粒較少而發光強度變大。若D10徑超過30μm,則於製成發光裝置、具體而言製成白色發光LED時,難以均勻地分散於樹脂中,而色調容易產生偏差。 Further, the phosphor of the present invention preferably has a D 10 diameter of 20 to 30 μm as measured by a laser diffraction/scattering type particle size distribution measuring apparatus. When the diameter of D 10 is 20 to 30 μm, the number of particles is small and the luminous intensity is increased. When the D 10 diameter exceeds 30 μm, it is difficult to uniformly disperse in the resin when the light-emitting device is formed, specifically, a white light-emitting LED, and the color tone is likely to vary.
進而,本發明之螢光體較佳為根據掃描式電子顯微鏡照片而測得之Heywood徑(圓當量徑)之平均值未達32μm。例如,Heywood徑可使用Mountech股份有限公司製造之圖像分析式粒度分佈測量軟體「Mac-View」,讀入粉體圖像而進行計算。若Heywood徑之平均值未達32μm,則於尤其是用作白色LED之發光元件之情形時,可在無需粉碎下獲 得所需之粒度,故而較佳。 Further, it is preferable that the phosphor of the present invention has an average value of the Heywood diameter (circular equivalent diameter) measured by a scanning electron microscope photograph of less than 32 μm. For example, the Heywood Trail can be calculated by reading the powder image using the image analysis type particle size distribution measuring software "Mac-View" manufactured by Mountech Co., Ltd. If the average value of the Heywood diameter is less than 32 μm, it can be obtained without pulverization when used especially as a light-emitting element of a white LED. It is preferred to obtain the desired particle size.
又,本發明之螢光體含有下述式(2)之組成所表示之結晶相。 Further, the phosphor of the present invention contains a crystal phase represented by the composition of the following formula (2).
SrgM2hBiAljSikNlOm:Eux2Cey2 (2) Sr g M2 h B i Al j Si k N l O m :Eu x2 Ce y2 (2)
(此處,M2係選自由Ca、Ba及Mg所組成之群中之1種以上之金屬元素,2≦g≦8,0≦h≦3,0.02≦i≦0.8,2≦j≦7,10≦k≦25,15≦l≦37,0≦m≦3,0<x2+y2≦0.6)。 (here, M2 is one or more metal elements selected from the group consisting of Ca, Ba, and Mg, 2≦g≦8, 0≦h≦3, 0.02≦i≦0.8, 2≦j≦7, 10≦k≦25,15≦l≦37,0≦m≦3,0<x2+y2≦0.6).
上述x2之值為0≦x2≦0.3之範圍內,較佳為0.001≦x2≦0.25之範圍內,更佳為0.1≦x2≦0.15之範圍內。若x2之值超過0.3,則發光原子變成高濃度從而相互接近而相互抵消發光,因此發光強度容易變弱。又,上述y2之值為0≦y2≦0.3之範圍內,較佳為0≦y2≦0.1之範圍內,更佳為0≦y2≦0.0001之範圍內。x2+y2之值為0<x2+y2≦0.6之範圍,較佳為0.001≦x2+y2≦0.25之範圍內,更佳為0.1≦x2+y2≦0.15之範圍。於本發明中亦包含為不含有Eu之組成之情形,即x2之值為0之情形;或者為不含有Ce之組成之情形,即y2之值為0之情形,但必須為至少含有Eu或Ce中之任一元素之組成,即x2+y2>0之組成。 The value of x2 above is in the range of 0 ≦ x 2 ≦ 0.3, preferably in the range of 0.001 ≦ x 2 ≦ 0.25, more preferably in the range of 0.1 ≦ x 2 ≦ 0.15. When the value of x2 exceeds 0.3, the luminescent atoms become high in concentration and close to each other to cancel the luminescence, so that the luminescence intensity is likely to be weak. Further, the value of y2 is in the range of 0 ≦ y 2 ≦ 0.3, preferably in the range of 0 ≦ y 2 ≦ 0.1, more preferably in the range of 0 ≦ y 2 ≦ 0.0001. The value of x2+y2 is in the range of 0<x2+y2≦0.6, preferably in the range of 0.001≦x2+y2≦0.25, more preferably in the range of 0.1≦x2+y2≦0.15. Also included in the present invention is a case where the composition of Eu is not contained, that is, the case where the value of x2 is 0; or the case where the composition of Ce is not contained, that is, the value of y2 is 0, but it must be at least containing Eu or The composition of any element in Ce, that is, the composition of x2+y2>0.
又,於本發明之螢光體中,螢光體中之鍶(Sr)之莫耳比為2≦g≦8之範圍內,較佳為4≦g≦8之範圍內,更佳為4.5≦g≦6之範圍內,更佳為4.75≦g≦5.25之範圍內。於g之值為2≦g≦8之範圍內之情形時,可獲得半值寬窄之高亮度之綠色螢光體。 Further, in the phosphor of the present invention, the molar ratio of strontium (Sr) in the phosphor is in the range of 2 ≦ g ≦ 8 , preferably in the range of 4 ≦ g ≦ 8 , more preferably 4.5. Within the range of ≦g≦6, it is more preferably in the range of 4.75≦g≦5.25. When the value of g is in the range of 2 ≦ g ≦ 8 , a green phosphor having a half-value width and a high brightness can be obtained.
又,於本發明之螢光體中,M2係選自由鈣(Ca)、鋇(Ba)及鎂(Mg)所組成之群中之1種以上之金屬元素,上述h之值較佳為0≦h ≦3之範圍內。於本發明中亦包含為不含有Ca、Ba及Mg中之任一者之組成之情形、即上述h之值為0之情形。 Further, in the phosphor of the present invention, the M2 is one or more metal elements selected from the group consisting of calcium (Ca), barium (Ba), and magnesium (Mg), and the value of h is preferably 0. ≦h Within the range of ≦3. Also included in the present invention is a case where the composition of any one of Ca, Ba, and Mg is not contained, that is, the value of h described above is zero.
又,於本發明之螢光體中,螢光體中之硼(B)之莫耳比為0.02≦i≦0.8之範圍內,較佳為0.04≦i≦0.4之範圍內。於i之值為0.04≦i≦0.4之範圍內之情形時,可獲得半值寬窄之高亮度之綠色螢光體。 Further, in the phosphor of the present invention, the molar ratio of boron (B) in the phosphor is in the range of 0.02 ≦ i ≦ 0.8, preferably 0.04 ≦ i ≦ 0.4. When the value of i is in the range of 0.04 ≦ i ≦ 0.4, a green phosphor having a half-value width and a high brightness can be obtained.
又,於本發明之螢光體中,螢光體中之鋁(Al)之莫耳比為2≦j≦7之範圍內,較佳為3≦j≦7之範圍內,更佳為4≦j≦6之範圍內。於j之值為2≦j≦7之範圍內之情形時,可獲得半值寬窄之高亮度之綠色螢光體。 Further, in the phosphor of the present invention, the molar ratio of aluminum (Al) in the phosphor is in the range of 2≦j≦7, preferably in the range of 3≦j≦7, more preferably 4 Within the scope of ≦j≦6. When the value of j is in the range of 2≦j≦7, a green phosphor having a half-value width and a high brightness can be obtained.
又,於本發明之螢光體中,螢光體中之矽(Si)之莫耳比為10≦k≦25之範圍內,較佳為15≦k≦25之範圍內,更佳為19.5≦k≦22.5之範圍內,更佳為20.5≦k≦21.5之範圍內。於k之值為10≦k≦25之範圍內之情形時,可獲得半值寬窄之高亮度之綠色螢光體。 Further, in the phosphor of the present invention, the molar ratio of cerium (Si) in the phosphor is in the range of 10 ≦ k ≦ 25, preferably in the range of 15 ≦ k ≦ 25, more preferably 19.5. Within the range of ≦k≦22.5, more preferably within the range of 20.5≦k≦21.5. When the value of k is in the range of 10 ≦ k ≦ 25, a green phosphor having a half-value width and a high brightness can be obtained.
進而,於本發明之螢光體中,螢光體中之氮(N)之莫耳比為15≦l≦37之範圍內,較佳為32≦l≦37之範圍內,更佳為34≦l≦36之範圍內,更佳為34.5≦l≦35.5之範圍內。於l之值為15≦l≦37之範圍內之情形時,可獲得半值寬窄之高亮度之綠色螢光體。 Further, in the phosphor of the present invention, the molar ratio of nitrogen (N) in the phosphor is in the range of 15 ≦ ≦ 37, preferably in the range of 32 ≦ ≦ 37, more preferably 34. Within the range of ≦l≦36, more preferably within the range of 34.5 ≦l ≦ 35.5. When the value of l is in the range of 15 ≦l ≦ 37, a green phosphor having a half-value width and a high brightness can be obtained.
又,於本發明之螢光體中,螢光體中之氧(O)之莫耳比為0≦m≦3之範圍內,較佳為0.1≦m≦2.3之範圍內。於m之值為0≦m≦3之範圍內之情形時,可獲得半值寬窄之高亮度之綠色螢光體。 Further, in the phosphor of the present invention, the molar ratio of oxygen (O) in the phosphor is in the range of 0 ≦ m ≦ 3, preferably in the range of 0.1 ≦ m ≦ 2.3. In the case where the value of m is in the range of 0 ≦ m ≦ 3, a green phosphor having a half-value width and a high luminance can be obtained.
2.螢光體之製造方法 2. Method of manufacturing phosphor
本發明之螢光體例如可藉由如下製造方法進行製造,該製造方法具 備:將含Sr化合物、含Al化合物、含Si化合物、含Eu化合物及/或含Ce化合物、以及含B化合物進行混合,進而視需要混合含M化合物(此處,M係選自由Ca、Ba及Mg所組成之群中之1種以上之金屬元素)而獲得原料混合物之步驟(混合步驟);與於含非活性氣體環境下或還原性氣體環境下將上述原料混合物進行燒製之步驟(燒製步驟);及視需要進行粉碎、分級之步驟。 The phosphor of the present invention can be produced, for example, by a production method having Preparation: mixing the Sr-containing compound, the Al-containing compound, the Si-containing compound, the Eu-containing compound and/or the Ce-containing compound, and the B-containing compound, and further mixing the M-containing compound as needed (here, the M system is selected from Ca, Ba) a step of obtaining a raw material mixture (mixing step) with one or more metal elements of the group consisting of Mg; and a step of firing the raw material mixture in an environment containing an inert gas or a reducing gas atmosphere ( The firing step); and the step of pulverizing and classifying as needed.
(1)混合步驟 (1) mixing step
含Sr化合物、含Al化合物、含Si化合物、含Eu化合物、含Ce化合物、含B化合物、含M化合物之各含原料化合物係分別自氮化物、氮氧化物、氧化物或藉由熱分解而成為氧化物之前驅物物質中選擇。 Each of the raw material-containing compounds containing an Sr compound, an Al-containing compound, a Si-containing compound, an Eu-containing compound, a Ce-containing compound, a B-containing compound, and an M-containing compound is separately decomposed from a nitride, an oxynitride, an oxide, or by thermal decomposition. Be selected as the precursor material for the oxide.
作為含鍶(Sr)化合物之具體例,並無特別限定,例如可較佳地使用選自由氮化鍶(Sr3N2)、碳酸鍶(SrCO3)、氧化鍶(SrO)所組成之群中之1種以上之粉末,可尤佳地使用氮化鍶(Sr3N2)之粉末。 Specific examples of the antimony-containing (Sr) compound are not particularly limited, and for example, a group selected from the group consisting of strontium nitride (Sr 3 N 2 ), strontium carbonate (SrCO 3 ), and strontium oxide (SrO) can be preferably used. A powder of cerium nitride (Sr 3 N 2 ) can be preferably used as the powder of one or more kinds.
作為含鋁(Al)化合物之具體例,並無特別限定,例如可較佳地使用選自由氮化鋁(AlN)、氧化鋁(Al2O3)、碳酸鋁(Al2(CO3)3)所組成之群中之1種以上之粉末,可尤佳地使用氮化鋁(AlN)之粉末。 Specific examples of the aluminum-containing (Al) compound are not particularly limited, and for example, aluminum nitride (AlN), aluminum oxide (Al 2 O 3 ), or aluminum carbonate (Al 2 (CO 3 ) 3 ) can be preferably used. A powder of aluminum nitride (AlN) can be preferably used as the powder of one or more of the groups.
作為含矽(Si)化合物之具體例,並無特別限定,例如可較佳地使用選自由非晶質氮化矽(Si3N4)、結晶性氮化矽(Si3N4)、二氧化矽(SiO2)所組成之群中之1種以上之粉末,可尤佳地使用非晶質氮化矽(Si3N4)、結晶性氮化矽(Si3N4)之粉末。 The specific example of the cerium (Si)-containing compound is not particularly limited, and for example, it can be preferably selected from amorphous tantalum nitride (Si 3 N 4 ), crystalline tantalum nitride (Si 3 N 4 ), and As the powder of one or more kinds of the group consisting of cerium oxide (SiO 2 ), a powder of amorphous tantalum nitride (Si 3 N 4 ) or crystalline tantalum nitride (Si 3 N 4 ) can be preferably used.
作為含銪(Eu)化合物之具體例,並無特別限定,例如可較佳地使用選自由氧化銪(III)(Eu2O3)、氧化銪(II)(EuO)、氮化銪(EuN)、 金屬銪(Eu)所組成之群中之1種以上之粉末。 Specific examples of the ruthenium-containing (Eu) compound are not particularly limited, and for example, ruthenium (III) oxide (Eu 2 O 3 ), ruthenium (II) oxide (EuO), or tantalum nitride (EuN) can be preferably used. And one or more kinds of powders of the group consisting of metal ruthenium (Eu).
作為含鈰(Ce)化合物之具體例,並無特別限定,例如可較佳地使用選自由氮化鈰(CeN)、氧化鈰(CeO2)、金屬鈰(Ce)所組成之群中之1種以上之粉末。 The specific example of the cerium-containing (Ce) compound is not particularly limited, and for example, one selected from the group consisting of cerium nitride (CeN), cerium oxide (CeO 2 ), and metal cerium (Ce) can be preferably used. More than one kind of powder.
又,本發明之特徵在於:除上述含原料化合物以外,亦於原料混合物之250~10000ppm之範圍內添加含B化合物。藉由添加含B化合物250~10000ppm,可使100~2500ppm之硼含於所獲得之螢光體中。又,於未添加含B化合物之情形時,於所獲得之螢光體中含有較多之作為異相(雜質)之SrAlSi4N7結構之結晶,但可知藉由添加含B化合物250~10000ppm,可減少SrAlSi4N7結構之結晶之量。含B化合物之添加量較佳為750~10000ppm,更佳為1000~5000ppm。 Further, the present invention is characterized in that a B-containing compound is added in the range of 250 to 10,000 ppm of the raw material mixture in addition to the above-mentioned raw material-containing compound. By adding 250 to 10,000 ppm of the B-containing compound, 100 to 2,500 ppm of boron can be contained in the obtained phosphor. Further, when the B-containing compound is not added, the obtained phosphor contains a large amount of crystals of a SrAlSi 4 N 7 structure which is a hetero phase (impurity), but it is understood that by adding a B-containing compound of 250 to 10000 ppm, The amount of crystallization of the SrAlSi 4 N 7 structure can be reduced. The amount of the compound containing B is preferably from 750 to 10,000 ppm, more preferably from 1,000 to 5,000 ppm.
作為含硼(B)化合物之具體例,並無特別限定,例如可較佳地使用選自由氮化硼(BN)、氧化硼(B2O3)、氫氧化硼(B(OH)3)所組成之群中之1種以上之粉末。 Specific examples of the boron-containing (B) compound are not particularly limited, and for example, boron nitride (BN), boron oxide (B 2 O 3 ), or boron oxyhydroxide (B(OH) 3 ) can be preferably used. One or more kinds of powders of the group formed.
又,於本發明中,可視需要而混合含M化合物(此處,M係選自由Ca、Ba及Mg所組成之群中之1種以上之金屬元素)。 Further, in the present invention, the M-containing compound (here, M is selected from one or more metal elements selected from the group consisting of Ca, Ba, and Mg) may be mixed as needed.
作為含M化合物中之含鈣(Ca)化合物之具體例,並無特別限定,例如可較佳地使用選自由氮化鈣(Ca3N2)、碳酸鈣(CaCO3)、氧化鈣(CaO)所組成之群中之1種以上之粉末。 Specific examples of the calcium-containing (Ca) compound in the M-containing compound are not particularly limited, and for example, calcium hydride (Ca 3 N 2 ), calcium carbonate (CaCO 3 ), calcium oxide (CaO) can be preferably used. One or more kinds of powders of the group consisting of.
作為含M化合物中之含鋇(Ba)化合物之具體例,並無特別限定,例如可較佳地使用選自由氮化鋇(Ba3N2)、碳酸鋇(BaCO3)、氧化鋇(BaO)所組成之群中之1種以上之粉末。 Specific examples of the cerium (Ba)-containing compound in the M-containing compound are not particularly limited, and for example, barium nitride (Ba 3 N 2 ), barium carbonate (BaCO 3 ), barium oxide (BaO) can be preferably used. One or more kinds of powders of the group consisting of.
作為含M化合物中之含鎂(Mg)化合物之具體例,並無特別限定,例如可較佳地使用選自由氮化鎂(Mg3N2)、碳酸鎂(MgCO3)、氧化鎂(MgO)所組成之群中之1種以上之粉末。 Specific examples of the magnesium-containing (Mg) compound in the M-containing compound are not particularly limited, and for example, magnesium oxynitride (Mg 3 N 2 ), magnesium carbonate (MgCO 3 ), and magnesium oxide (MgO) can be preferably used. One or more kinds of powders of the group consisting of.
該等含原料化合物可分別單獨使用1種,亦可併用2種以上。各含原料化合物較佳為純度為99質量%以上。關於上述含原料化合物,由於其混合比大致直接成為式(1)之組成比,故而以成為所需之組成比之方式調整混合比。但是,由於氧量、氮量不會始終固定,故而可考慮原料中所含有之氧含量及氮含量而設定原料之調配比,藉此調整為目標之氧量及氮量。 These raw material-containing compounds may be used alone or in combination of two or more. Each of the raw material-containing compounds preferably has a purity of 99% by mass or more. In the above-mentioned raw material-containing compound, since the mixing ratio is substantially directly equal to the composition ratio of the formula (1), the mixing ratio is adjusted so as to have a desired composition ratio. However, since the amount of oxygen and the amount of nitrogen are not always fixed, the mixing ratio of the raw materials can be set in consideration of the oxygen content and the nitrogen content contained in the raw materials, thereby adjusting the target oxygen amount and nitrogen amount.
又,於燒製中,為了促進燒結而於更低溫生成,可添加成為燒結助劑之含Li化合物。作為所使用之含Li化合物,可列舉:氧化鋰、碳酸鋰、金屬鋰、氮化鋰,可單獨使用該等粉末之各者,亦可進行併用。又,關於含Li化合物之添加量,相對於下述燒製步驟中所獲得之燒製物1mol,以Li元素計較佳為0.01~0.5mol。含Li化合物於燒製步驟中容易揮發,而幾乎不含有於螢光體粉末中。 Further, in the firing, in order to promote sintering and to form at a lower temperature, a Li-containing compound to be a sintering aid may be added. Examples of the Li-containing compound to be used include lithium oxide, lithium carbonate, lithium metal, and lithium nitride, and each of these powders may be used alone or in combination. In addition, the amount of the Li-containing compound to be added is preferably 0.01 to 0.5 mol, based on the Li element, per mol of the fired product obtained in the calcination step described below. The Li-containing compound is easily volatilized in the firing step and is hardly contained in the phosphor powder.
原料粉末之混合方法並無特別限制,可採用其本身公知之方法,例如進行乾式混合之方法;於與原料各成分實質上不反應之非活性溶劑中進行濕式混合後將溶劑去除之方法等。作為混合裝置,較佳地使用V型混合機、滾動式混合機、球磨機、振磨機、介質攪拌研磨機等。 The mixing method of the raw material powder is not particularly limited, and a method known per se, for example, a method of dry mixing, a method of removing the solvent after wet mixing in an inert solvent which does not substantially react with each component of the raw material, and the like may be employed. . As the mixing device, a V-type mixer, a rolling mixer, a ball mill, a vibrating machine, a medium agitating mill or the like is preferably used.
(2)燒製步驟 (2) firing step
其次,進行原料混合物之燒製。原料混合物之燒製較佳於非活性氣體環境下或還原性氣體環境下進行燒製。非活性氣體環境可由氮氣或氬氣等 稀有氣體或者該等之混合氣體等非活性氣體所構成。為了為非活性氣體環境,較理想為不含有氧,但亦可含有未達0.1vol%(進而未達0.01vol%)之程度的氧作為雜質。又,還原性氣體環境可由氮氣或氬氣等稀有氣體與氫氣或一氧化碳氣體之混合氣體所構成。為了為還原性氣體環境,較理想為不含有氧,但亦可含有未達0.1vol%(進而未達0.01vol%)之程度的氧作為雜質。燒製溫度為1500~2000℃、更佳為1600~1800℃之範圍內。燒製時間通常為0.5~100小時之範圍內,較佳為0.5~20小時之範圍內。燒製壓力只要為常壓以上即可,較佳未達0.92MPa。藉由使環境氣體之種類、環境氣體中之氧濃度及氮濃度、燒製溫度、燒製時間之設定變化,可調整目標螢光體之氧量、氮量。 Next, the raw material mixture is fired. The firing of the raw material mixture is preferably carried out in an inert gas atmosphere or in a reducing gas atmosphere. The inert gas atmosphere can be made of nitrogen or argon. A rare gas or an inert gas such as a mixed gas. In order to be an inert gas atmosphere, it is preferable to contain no oxygen, but it may contain oxygen as an impurity to the extent of not more than 0.1 vol% (and further less than 0.01 vol%). Further, the reducing gas atmosphere may be composed of a mixed gas of a rare gas such as nitrogen or argon and hydrogen or carbon monoxide gas. In order to be a reducing gas atmosphere, it is preferable to contain no oxygen, but it is also possible to contain oxygen as an impurity to a level of less than 0.1 vol% (and further less than 0.01 vol%). The firing temperature is in the range of 1500 to 2000 ° C, more preferably 1600 to 1800 ° C. The firing time is usually in the range of 0.5 to 100 hours, preferably in the range of 0.5 to 20 hours. The firing pressure may be at least normal pressure, preferably less than 0.92 MPa. The amount of oxygen and the amount of nitrogen in the target phosphor can be adjusted by changing the type of the ambient gas, the oxygen concentration and the nitrogen concentration in the ambient gas, the firing temperature, and the firing time.
(3)粉碎、分級步驟 (3) Smashing and grading steps
藉由燒製而獲得之螢光體無需粉碎,例如於用作白色LED之發光元件之情形時,可獲得所需之粒度,但此外,視需要進行粉碎,且視情況而分級為所需之粒徑範圍。該情形時之粉碎方法可為濕式粉碎、乾式粉碎中之任一種方法,又,關於分級方法,亦可使用篩分操作、應用流體之操作等粉體之分級通常所使用之任一種操作方法。又,藉由燒製而獲得之螢光體亦可視需要進行利用鹽酸或硝酸等礦酸之酸清洗處理、烘烤處理。 The phosphor obtained by firing does not need to be pulverized, for example, in the case of being used as a light-emitting element of a white LED, the desired particle size can be obtained, but further, pulverization is carried out as needed, and is classified as necessary as necessary. Particle size range. In this case, the pulverization method may be any one of wet pulverization and dry pulverization, and, for the classification method, any one of the operation methods generally used for grading the powder such as the sieving operation and the application of the fluid may be used. . Further, the phosphor obtained by firing may be subjected to an acid cleaning treatment or a baking treatment using a mineral acid such as hydrochloric acid or nitric acid as needed.
3.發光裝置 3. Light-emitting device
本發明之螢光體可用於各種發光裝置。本發明之發光裝置至少具備:於上述式(1)所表示之組成成分中進而含有硼100~2500ppm之本發明之螢光體;與對該螢光體照射激發光而使之發光之光源。作為發光裝置之具體例,可列舉:白色發光二極體(白色LED)、螢光燈、螢光顯示管(VFD)、 陰極射線管(CRT)、電漿顯示面板(PDP)、場發射顯示器(FED)等。其中,白色LED係如下發光裝置:具備藍色螢光體、紅色螢光體、本發明之螢光體(綠色螢光體)與例如發出波長350~430nm之紫外光之半導體發光元件,且利用來自發光元件之紫外光激發藍色螢光體、綠色螢光體、紅色螢光體,而利用藍色、紅色、綠色之混色獲得白光。又,作為其他構成,亦可應用於如下發光裝置:具備紅色螢光體、本發明之螢光體(綠色螢光體)、與發出波長430~500nm之藍光之半導體元件,且利用來自發光元件之藍光激發綠色螢光體、紅色螢光體,而利用藍色、紅色、綠色之混色獲得白光。 The phosphor of the present invention can be used in various light-emitting devices. The light-emitting device of the present invention includes at least a phosphor of the present invention containing 100 to 2,500 ppm of boron in the composition represented by the above formula (1), and a light source that emits excitation light to the phosphor. Specific examples of the light-emitting device include a white light-emitting diode (white LED), a fluorescent lamp, and a fluorescent display tube (VFD). Cathode ray tube (CRT), plasma display panel (PDP), field emission display (FED), and the like. The white LED is a light-emitting device including a blue phosphor, a red phosphor, a phosphor (green phosphor) of the present invention, and a semiconductor light-emitting device that emits ultraviolet light having a wavelength of 350 to 430 nm, for example, and utilizes The ultraviolet light from the light-emitting element excites the blue phosphor, the green phosphor, and the red phosphor, and white light is obtained by using a mixture of blue, red, and green. Further, the other configuration may be applied to a light-emitting device including a red phosphor, a phosphor (green phosphor) of the present invention, and a semiconductor element emitting blue light having a wavelength of 430 to 500 nm, and using a light-emitting element. The blue light excites the green phosphor and the red phosphor, and the white, red, and green colors are used to obtain white light.
作為藍色發光螢光體之例,可列舉:(Ba、Sr、Ca)3MgSi2O8:Eu、(Ba、Sr、Ca)MgAl10O17:Eu、(Ba、Sr、Mg、Ca)10(PO4)6(Cl、F)2:Eu等。又,作為紅色發光螢光體之例,可列舉:(Ba、Sr、Ca)3MgSi2O8:Eu、Mn、Y2O2S:Eu、La2O3S:Eu、(Ca、Sr、Ba)2Si5N8:Eu、CaAlSiN3:Eu、Eu2W2O9、(Ca、Sr、Ba)2Si5N8:Eu、Mn、CaTiO3:Pr、Bi、(La、Eu)2W3O12等。作為半導體發光元件,可列舉AlGaN系半導體發光元件等。 Examples of the blue light-emitting phosphor include (Ba, Sr, Ca) 3 MgSi 2 O 8 :Eu, (Ba, Sr, Ca) MgAl 10 O 17 :Eu, (Ba, Sr, Mg, Ca 10 (PO 4 ) 6 (Cl, F) 2 : Eu and the like. Further, examples of the red light-emitting phosphor include (Ba, Sr, Ca) 3 MgSi 2 O 8 : Eu, Mn, Y 2 O 2 S: Eu, La 2 O 3 S: Eu, (Ca, Sr, Ba) 2 Si 5 N 8 :Eu, CaAlSiN 3 :Eu, Eu 2 W 2 O 9 , (Ca, Sr, Ba) 2 Si 5 N 8 :Eu, Mn, CaTiO 3 :Pr, Bi, (La , Eu) 2 W 3 O 12, etc. Examples of the semiconductor light-emitting device include an AlGaN-based semiconductor light-emitting device.
[實施例] [Examples]
以下,基於實施例而具體地說明本發明,但該等並不限定本發明之目的。首先,揭示本實施例中所使用之各測量方法。 Hereinafter, the present invention will be specifically described based on examples, but these are not intended to limit the object of the present invention. First, each measurement method used in the present embodiment is disclosed.
(結晶相之鑑定) (identification of crystalline phase)
使用X射線繞射(XRD)裝置(理學股份有限公司製造之Ultima IV),進行結晶相之鑑定。 The crystal phase was identified using an X-ray diffraction (XRD) apparatus (Ultima IV, manufactured by Rigaku Corporation).
(粒度分佈測量) (particle size distribution measurement)
使用雷射繞射/散射式粒度分佈測量裝置(日機裝股份有限公司製造之MT3300EX II),進行粒度分佈測量。 The particle size distribution measurement was performed using a laser diffraction/scattering particle size distribution measuring apparatus (MT3300EX II manufactured by Nikkiso Co., Ltd.).
(掃描式電子顯微鏡照片,Heywood徑) (Scanning Electron Microscope Photo, Heywood Trail)
使用掃描式電子顯微鏡(日本電子股份有限公司製造之JSM-6510)而拍攝掃描式電子顯微鏡照片。又,使用圖像分析式粒度分佈測量軟體「Mac-View」(Mountech股份有限公司製造),讀入掃描式電子顯微鏡照片而計算Heywood徑。 A scanning electron microscope photograph was taken using a scanning electron microscope (JSM-6510 manufactured by JEOL Ltd.). Further, the image analysis type particle size distribution measurement software "Mac-View" (manufactured by Mountech Co., Ltd.) was used, and a scanning electron microscope photograph was read to calculate the Heywood diameter.
(螢光峰值波長、發光強度、光譜之半值寬) (fluorescence peak wavelength, luminescence intensity, half value width of the spectrum)
使用分光螢光光度計(日本分光股份有限公司製造,FP-6500),測量於激發波長450nm之螢光光譜,求出螢光峰值波長、及該波長之發光強度、光譜之半值寬。發光強度係將比較例1之峰值波長522.0nm之發光強度表示為100%。 Using a spectrofluorometer (manufactured by JASCO Corporation, FP-6500), a fluorescence spectrum at an excitation wavelength of 450 nm was measured, and the peak wavelength of the fluorescence, the intensity of the emission at the wavelength, and the half value width of the spectrum were determined. The luminescence intensity was expressed as 100% of the luminescence intensity of the peak wavelength of 522.0 nm of Comparative Example 1.
(硼含量) (boron content)
螢光體粉末中之硼含量係使用電感耦合電漿發射光譜分析(ICP-AES)裝置(精工電子納米科技股份有限公司製造,SPS3250UV)進行定量分析。 The boron content in the phosphor powder was quantitatively analyzed using an inductively coupled plasma emission spectrometry (ICP-AES) apparatus (Seiko Electronics Nanotechnology Co., Ltd., SPS3250UV).
(硼之螢光體最表面元素濃度、內部之元素濃度) (The concentration of the most surface element of the phosphor of boron, the concentration of elements inside)
藉由X射線光電子光譜(XPS)裝置(Ulvac-Phi股份有限公司製造之PHI1800),於X射線源:Al-K α、掠出角:與表面成45°之條件下,調查存在於螢光體最表面之元素(自外側直至數nm可獲得),根據各元素之峰值強度而估算硼之螢光體最表面之元素濃度。 X-ray photoelectron spectroscopy (XPS) device (PHI1800 manufactured by Ulvac-Phi Co., Ltd.), under the condition of X-ray source: Al-K α, sweep angle: 45° from the surface, investigates the presence of fluorescence The element on the outermost surface of the body (available from the outer side up to several nm), and the elemental concentration of the outermost surface of the phosphor of boron is estimated from the peak intensity of each element.
(比較例1) (Comparative Example 1)
將氧化銪(Eu2O3)粉末(純度:99.9%)、與氮化鍶(Sr3N2)粉末(純 度:99%)、非晶質氮化矽(Si3N4)粉末(純度:99%)、氮化鋁(AlN)粉末(純度:99.9%)、碳酸鋰(Li2CO3)粉末(純度:99.9%)以成為表1之混合組成之方式於經氮氣沖洗之手套箱內進行稱量,使用乾式振磨機混合1小時而獲得混合粉末。將所獲得之混合粉末放入至氮化矽製之坩堝中,添加至石墨電阻加熱式之電爐中,一面使氮氣於電爐內流通,一面於保持常壓之狀態下升溫至1650℃後,於1650℃保持7小時,進而升溫至1730℃,於1730℃保持10小時而獲得燒製物。所獲得之試樣係利用氮化矽製之研缽進行壓碎直至通過網眼32μm之篩子為止。將對所獲得之粉末測量XRD、粒度分佈、螢光光譜、ICP、XPS(PHI1800)所獲得之評價結果示於表2。又,將XRD圖案示於圖1,將發射光譜示於圖2,將掃描式電子顯微鏡照片示於圖3。 Oxide (Eu 2 O 3 ) powder (purity: 99.9%), tantalum nitride (Sr 3 N 2 ) powder (purity: 99%), amorphous tantalum nitride (Si 3 N 4 ) powder (purity : 99%), aluminum nitride (AlN) powder (purity: 99.9%), lithium carbonate (Li 2 CO 3 ) powder (purity: 99.9%) in the form of a mixed composition of Table 1 in a nitrogen-washed glove box The inside was weighed and mixed using a dry vibrator for 1 hour to obtain a mixed powder. The obtained mixed powder is placed in a crucible made of tantalum nitride, and added to a graphite resistance heating type electric furnace, and while nitrogen gas is passed through the electric furnace, the temperature is raised to 1,650 ° C while maintaining normal pressure. The temperature was maintained at 1650 ° C for 7 hours, and further heated to 1730 ° C, and kept at 1730 ° C for 10 hours to obtain a fired product. The obtained sample was crushed by a mortar made of tantalum nitride until it passed through a sieve having a mesh size of 32 μm. The evaluation results obtained by measuring XRD, particle size distribution, fluorescence spectrum, ICP, and XPS (PHI1800) of the obtained powder are shown in Table 2. Further, an XRD pattern is shown in Fig. 1, an emission spectrum is shown in Fig. 2, and a scanning electron microscope photograph is shown in Fig. 3.
XRD測量之結果為,獲得圖1所示之XRD圖案。合成粉末為Sr5Al5Si21N35O2結構與SrAlSi4N7結構之混相。Sr5Al5Si21N35O2結構之位於25.8°附近之來自(021)面之繞射峰之強度(A)與SrAlSi4N7結構之位於24.9°附近之來自(221)面之繞射峰之強度(B)的比(B/A)為2.75。又,粒度分佈測量之結果為,D10徑為13.8μm。ICP、XPS測量之結果為,未檢測到硼。若以波長450nm進行激發,則獲得圖2所示之發射光譜。雖峰值波長為522.0nm且為綠色,但半值寬寬達111.1nm,而成為含有紅色成分之發光。又,根據圖3所示之掃描式電子顯微鏡照片,比較例1之粉碎前之1次粒徑大,Heywood徑之平均值為35.9μm,而於利用網眼32μm之篩子進行分級時必須進行粉碎,因此粉碎碎片增加。 As a result of XRD measurement, the XRD pattern shown in Fig. 1 was obtained. The synthetic powder is a mixed phase of the Sr 5 Al 5 Si 21 N 35 O 2 structure with the SrAlSi 4 N 7 structure. The intensity of the diffraction peak from the (021) plane near the 25.8° of the Sr 5 Al 5 Si 21 N 35 O 2 structure (A) and the diffraction of the (221) plane near the 24.9° of the SrAlSi 4 N 7 structure The ratio (B/A) of the peak intensity (B) was 2.75. Further, as a result of measuring the particle size distribution, the D 10 diameter was 13.8 μm. As a result of measurement by ICP and XPS, boron was not detected. When excited at a wavelength of 450 nm, the emission spectrum shown in Fig. 2 was obtained. Although the peak wavelength is 522.0 nm and is green, the half-value width is 111.1 nm, and it becomes a light-emitting component containing a red component. Further, according to the scanning electron micrograph shown in Fig. 3, the primary particle diameter before the pulverization of Comparative Example 1 was large, and the average value of the Heywood diameter was 35.9 μm, and it was necessary to pulverize when grading by a sieve having a mesh size of 32 μm. Therefore, the smashing debris increases.
(實施例1~6) (Examples 1 to 6)
如表1般添加氮化硼(BN)粉末(純度:99%),除此以外,利用與比較例1相同之方法進行實施例1~6。將合成粉末之評價結果示於表2。XRD測量之結果為,位於25.8°附近之Sr5Al5Si21N35O2結構之來自(021)面之繞射峰之強度(A)與SrAlSi4N7結構之位於24.9°附近之來自(221)面之繞射峰之強度(B)的比(B/A)未達0.03,尤其是實施例2~6之B/A為0,獲得Sr5Al5Si21N35O2結構之單相。又,粒度分佈測量之結果為,D10徑為14.6~24.5μm。於圖1中表示實施例5之XRD圖案。 Examples 1 to 6 were carried out in the same manner as in Comparative Example 1, except that boron nitride (BN) powder (purity: 99%) was added as in Table 1. The evaluation results of the synthetic powder are shown in Table 2. As a result of XRD measurement, the intensity of the diffraction peak from the (021) plane of the Sr 5 Al 5 Si 21 N 35 O 2 structure located near 25.8° (A) and the structure of the SrAlSi 4 N 7 structure located near 24.9° (from 221) The ratio (B/A) of the intensity (B) of the diffraction peak of the surface is less than 0.03, especially the B/A of the examples 2 to 6 is 0, and the structure of the structure of Sr 5 Al 5 Si 21 N 35 O 2 is obtained. phase. Further, as a result of measuring the particle size distribution, the D 10 diameter was 14.6 to 24.5 μm. The XRD pattern of Example 5 is shown in FIG.
ICP測量之結果為,硼含量係隨著硼添加量而增加,為110~2300ppm。又,XPS測量之結果為,硼之於螢光體最表面之元素濃度為14000~92000ppm。又,以波長450nm激發時之發光峰值波長為520.5~524.0nm之綠色,將比較例1設為100%時之相對發光強度為132.5~194.9%。發射光譜之半值寬為67.3~76.4nm。將實施例5之發射光譜示於圖2,將實施例5之掃描式電子顯微鏡照片示於圖3。 As a result of ICP measurement, the boron content increases with the amount of boron added, and is 110 to 2300 ppm. Further, as a result of XPS measurement, the elemental concentration of boron on the outermost surface of the phosphor is 14,000 to 92,000 ppm. Further, the emission peak wavelength when excited at a wavelength of 450 nm was green at 520.5 to 524.0 nm, and the relative luminescence intensity at 13% when Comparative Example 1 was 100% was 132.5 to 194.9%. The half value width of the emission spectrum is 67.3 to 76.4 nm. The emission spectrum of Example 5 is shown in Fig. 2, and the scanning electron micrograph of Example 5 is shown in Fig. 3.
於實施例1~6中,硼含量處於100~2500ppm之範圍內,因此獲得為Sr5Al5Si21N35O2結構之單相且微粒少,並且發射光譜半值寬窄之高亮度螢光體。又,根據圖3所示之實施例5之粉碎前之掃描式電子顯微鏡照片而確認到實施例5為如下情況:1次粒徑較比較例1小,此時之Heywood徑之平均值為26.8μm,而於利用網眼32μm之篩子進行分級時無須進行粉碎,因此微粒少且粒徑一致。 In Examples 1 to 6, the boron content was in the range of 100 to 2,500 ppm, so that a single phase having a structure of Sr 5 Al 5 Si 21 N 35 O 2 and having few particles and a high-intensity fluorescence with a narrow half-value of the emission spectrum were obtained. body. Further, according to the scanning electron micrograph before the pulverization of Example 5 shown in Fig. 3, it was confirmed that Example 5 was that the primary particle diameter was smaller than that of Comparative Example 1, and the average value of the Heywood diameter at this time was 26.8. Μm, and it is not necessary to pulverize when grading by a sieve having a mesh size of 32 μm, so that the number of particles is small and the particle diameter is uniform.
進而,針對實施例5之試樣,使用X射線光電子光譜(XPS)裝置(Ulvac-Phi股份有限公司製造之PHI5000),於X射線源:Al-K α、掠出角:與表面成45°之條件下以SiO2換算計測量氬氣蝕刻至深度200nm後之 表面之硼的元素濃度。將結果示於表3、圖4。利用XPS之螢光體最表面之硼元素濃度為55000ppm,越往粒子內部,硼之元素濃度越降低,關於距螢光體最表面100nm以上之深度處之硼元素濃度(測量蝕刻後之表面),漸近至9000ppm左右。 Further, with respect to the sample of Example 5, an X-ray photoelectron spectroscopy (XPS) apparatus (PHI5000 manufactured by Ulvac-Phi Co., Ltd.) was used, and the X-ray source: Al-K α, plucking angle: 45° to the surface. The element concentration of boron on the surface after argon etching to a depth of 200 nm was measured in terms of SiO 2 in the condition of SiO 2 . The results are shown in Table 3 and Figure 4. The concentration of boron on the outermost surface of the phosphor using XPS is 55000 ppm. The concentration of boron element decreases toward the inside of the particle, and the concentration of boron element at a depth of 100 nm or more from the outermost surface of the phosphor (measures the surface after etching) , asymptotic to about 9000ppm.
(比較例2~4) (Comparative examples 2 to 4)
如表1般改變氮化硼(BN)粉末(純度:99%)之添加量,除此以外,利用與實施例1相同之方法進行比較例2~4。將合成粉末之評價結果示於表2。XRD測量之結果為,Sr5Al5Si21N35O2結構之位於25.8°附近之來自(021)面之繞射峰值之強度(A)與SrAlSi4N7結構之位於24.9°附近之來自(221)面之繞射峰值之強度(B)的比(B/A)為0.04~0.21,而成為Sr5Al5Si21N35O2結構與SrAlSi4N7結構之混相。粒度分佈測量之結果為,D10徑為11.5~17.0μm。ICP測量之結果為,硼含量於比較例2中為54ppm,於比較例3中為84ppm,於比較例4中為3600ppm。又,XPS測量之結果為,比較例2之硼之於螢光體最表面之元素濃度為8000ppm,比較例3之硼之於螢光體最表面之元素濃度為12000ppm,比較例4之硼之於螢光體最表面之元素濃度為120000ppm。發光峰值波長為523.0~524.0nm之綠色,將比較例1設為100%時之相對發光強度為113.4~120.1%。發射光譜之半值寬為78.5~90.9nm。 Comparative Examples 2 to 4 were carried out in the same manner as in Example 1 except that the amount of boron nitride (BN) powder (purity: 99%) was changed as shown in Table 1. The evaluation results of the synthetic powder are shown in Table 2. As a result of XRD measurement, the intensity of the diffraction peak from the (021) plane (A) and the structure of the SrAlSi 4 N 7 structure near the 25.8° of the Sr 5 Al 5 Si 21 N 35 O 2 structure are from 24.9°. The ratio (B/A) of the intensity (B) of the diffraction peak of the (221) plane is 0.04 to 0.21, and becomes a mixed phase of the structure of Sr 5 Al 5 Si 21 N 35 O 2 and the structure of SrAlSi 4 N 7 . As a result of the measurement of the particle size distribution, the D 10 diameter was 11.5 to 17.0 μm. As a result of ICP measurement, the boron content was 54 ppm in Comparative Example 2, 84 ppm in Comparative Example 3, and 3600 ppm in Comparative Example 4. Further, as a result of XPS measurement, the element concentration of boron on the outermost surface of the phosphor of Comparative Example 2 was 8000 ppm, and the element concentration of boron on the outermost surface of the phosphor of Comparative Example 3 was 12,000 ppm, and boron of Comparative Example 4 was used. The elemental concentration on the outermost surface of the phosphor was 120000 ppm. The luminescence peak wavelength was green at 523.0 to 524.0 nm, and the relative luminescence intensity at the time when Comparative Example 1 was 100% was 113.4 to 120.1%. The half value width of the emission spectrum is 78.5 to 90.9 nm.
於比較例2~4中,硼含量為100~2500ppm之範圍外,因此無法獲得發射光譜半值寬窄之高亮度螢光體。 In Comparative Examples 2 to 4, since the boron content was outside the range of 100 to 2,500 ppm, a high-luminance phosphor having a half-value width of the emission spectrum could not be obtained.
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