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TW201612636A - Photosensitive coloring resin composition - Google Patents

Photosensitive coloring resin composition

Info

Publication number
TW201612636A
TW201612636A TW104125450A TW104125450A TW201612636A TW 201612636 A TW201612636 A TW 201612636A TW 104125450 A TW104125450 A TW 104125450A TW 104125450 A TW104125450 A TW 104125450A TW 201612636 A TW201612636 A TW 201612636A
Authority
TW
Taiwan
Prior art keywords
resin composition
photosensitive coloring
coloring resin
pigment
photosensitive
Prior art date
Application number
TW104125450A
Other languages
Chinese (zh)
Other versions
TWI705302B (en
Inventor
Ryuichi Matsuura
Takakiyo Terakawa
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW201612636A publication Critical patent/TW201612636A/en
Application granted granted Critical
Publication of TWI705302B publication Critical patent/TWI705302B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

A photosensitive coloring resin composition which contains (A) a coloring agent, (B) a resin, (C) a polymerizable compound and (D) a polymerization initiator. This photosensitive coloring resin composition contains, as the coloring agent (A), a halogenated zinc phthalocyanine pigment, C. I. pigment yellow 185 and C. I. pigment blue 15:3 or C. I. pigment blue 15:4.
TW104125450A 2014-08-07 2015-08-05 Colored photosensitive resin composition TWI705302B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014161223 2014-08-07
JP2014-161223 2014-08-07

Publications (2)

Publication Number Publication Date
TW201612636A true TW201612636A (en) 2016-04-01
TWI705302B TWI705302B (en) 2020-09-21

Family

ID=55263791

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104125450A TWI705302B (en) 2014-08-07 2015-08-05 Colored photosensitive resin composition

Country Status (5)

Country Link
JP (1) JP6673204B2 (en)
KR (1) KR102397163B1 (en)
CN (1) CN106662809B (en)
TW (1) TWI705302B (en)
WO (1) WO2016021525A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI729175B (en) * 2016-07-29 2021-06-01 日商富士軟片股份有限公司 Colored composition, color filter, pattern forming method, solid-state imaging element, and image display device

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6578252B2 (en) * 2015-07-01 2019-09-18 株式会社Ｄｎｐファインケミカル Color material dispersion for color filter, photosensitive colored resin composition for color filter, color filter, and display device
CN109212899B (en) * 2017-06-30 2024-06-07 住友化学株式会社 Colored curable resin composition, color filter and display device
JP7315330B2 (en) * 2018-02-06 2023-07-26 住友化学株式会社 Colored photosensitive resin composition

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5141939B2 (en) * 2006-04-18 2013-02-13 Ｄｉｃ株式会社 Polyhalogenated zinc phthalocyanine pigment composition and color filter
JP5251329B2 (en) * 2008-07-22 2013-07-31 東洋インキＳｃホールディングス株式会社 Blue coloring composition for color filter, color filter, and color display device
KR20100033928A (en) * 2008-09-22 2010-03-31 후지필름 가부시키가이샤 Colored photosensitive composition, color filter and liquid crystal display device
KR101028589B1 (en) * 2009-06-30 2011-04-12 주식회사 앤디앰 Photosensitive resin composition for coloring
JP5604968B2 (en) * 2010-05-14 2014-10-15 東レ株式会社 Green colorant composition for color filter, color filter substrate and liquid crystal display device
JP5853673B2 (en) * 2010-12-27 2016-02-09 東レ株式会社 Color filter substrate and liquid crystal display device
JP5691634B2 (en) * 2011-02-25 2015-04-01 凸版印刷株式会社 Color filter for organic EL display device and organic EL display device including the same
JP2012247539A (en) * 2011-05-26 2012-12-13 Toppan Printing Co Ltd Green photosensitive resin composition and color filter
JP2012255963A (en) 2011-06-10 2012-12-27 Sumitomo Chemical Co Ltd Colored photosensitive resin composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI729175B (en) * 2016-07-29 2021-06-01 日商富士軟片股份有限公司 Colored composition, color filter, pattern forming method, solid-state imaging element, and image display device
US11073760B2 (en) 2016-07-29 2021-07-27 Fujifilm Corporation Coloring composition, color filter, pattern forming method, solid-stage imaging element, and image display device
US12019369B2 (en) 2016-07-29 2024-06-25 Fujifilm Corporation Coloring composition, color filter, pattern forming method, solid-stage imaging element, and image display device

Also Published As

Publication number Publication date
CN106662809A (en) 2017-05-10
WO2016021525A1 (en) 2016-02-11
TWI705302B (en) 2020-09-21
JP6673204B2 (en) 2020-03-25
CN106662809B (en) 2021-02-19
JPWO2016021525A1 (en) 2017-06-01
KR102397163B1 (en) 2022-05-11
KR20170041808A (en) 2017-04-17

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