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TW201527845A - Display panel - Google Patents

Display panel Download PDF

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Publication number
TW201527845A
TW201527845A TW103101396A TW103101396A TW201527845A TW 201527845 A TW201527845 A TW 201527845A TW 103101396 A TW103101396 A TW 103101396A TW 103101396 A TW103101396 A TW 103101396A TW 201527845 A TW201527845 A TW 201527845A
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TW
Taiwan
Prior art keywords
substrate
display panel
display area
layer
agglomerates
Prior art date
Application number
TW103101396A
Other languages
Chinese (zh)
Other versions
TWI530742B (en
Inventor
Chu-Chun Cheng
Yu-Ju Chen
Kuei-Ling Liu
Original Assignee
Innolux Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Innolux Corp filed Critical Innolux Corp
Priority to TW103101396A priority Critical patent/TWI530742B/en
Priority to EP14160692.1A priority patent/EP2896989A1/en
Priority to US14/592,926 priority patent/US9817271B2/en
Priority to KR1020150006339A priority patent/KR20150085479A/en
Publication of TW201527845A publication Critical patent/TW201527845A/en
Priority to US15/016,364 priority patent/US9841629B2/en
Application granted granted Critical
Publication of TWI530742B publication Critical patent/TWI530742B/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1345Conductors connecting electrodes to cell terminals
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133388Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133776Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers having structures locally influencing the alignment, e.g. unevenness
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

A display panel is provided. The display panel includes a first substrate, a second substrate, a liquid crystal layer, a plurality of thin film transistors, a plurality of metal wires, a protection layer, a first alignment layer, and a plurality of agglomerates. The first substrate has at least a display area and a non-display area located outside the display area. The second substrate is disposed opposite to the first substrate. The liquid crystal layer is disposed between the first substrate and the second substrate. The thin film transistors and the metal wires are disposed on the first substrate, the protection layer overlying at least a portion of the metal wires. The first alignment layer is disposed on the protection layer for exposing a first surface of the protection layer. The agglomerates are disposed on at least a portion of the first surface.

Description

顯示面板 Display panel

本揭露內容是有關於一種顯示面板,且特別是有關於一種具有良好顯示品質的顯示面板。 The present disclosure relates to a display panel, and in particular to a display panel having good display quality.

液晶顯示器已被廣泛地應用在各式電子產品,如手機、筆記型電腦(notebook)及平板電腦(Tablet PC)等,而且隨著大尺寸平面顯示器市場的快速發展,具有輕量化與薄型化特性的液晶顯示器更是扮演著相當重要的角色,進而逐漸取代陰極射線管(CRT)顯示器成為市場主流。 Liquid crystal displays have been widely used in various electronic products, such as mobile phones, notebooks, and tablet PCs. With the rapid development of the large-sized flat panel display market, they are lightweight and thin. The liquid crystal display plays a very important role, and gradually replaces the cathode ray tube (CRT) display to become the mainstream in the market.

垂直配向(vertical alignment)液晶顯示面板係為目前平面顯示器的主流產品之一。然而,垂直配向液晶顯示面板較易產生因漏光而影響顯示品質的問題。因此,如何提供一種具有良好顯示品質之垂直配向液晶顯示面板,乃為相關業者努力之課題之一。 The vertical alignment liquid crystal display panel is one of the mainstream products of the current flat panel display. However, the vertical alignment liquid crystal display panel is more likely to cause a problem of affecting display quality due to light leakage. Therefore, how to provide a vertical alignment liquid crystal display panel with good display quality is one of the subjects of the related industry.

本揭露內容係有關於一種顯示面板。實施例之顯示面板中,位於非顯示區內的聚團物不具有特定配向方向,使該區的液晶不會朝向特定方向傾倒,使得非顯示區的透光性降低,因而可以改善顯示面板之漏光的現象,進而提高顯示影像的品質。 The disclosure relates to a display panel. In the display panel of the embodiment, the agglomerate located in the non-display area does not have a specific alignment direction, so that the liquid crystal of the area does not fall in a specific direction, so that the light transmittance of the non-display area is lowered, thereby improving the display panel. The phenomenon of light leakage improves the quality of the displayed image.

根據本揭露內容之一實施例,係提出一種顯示面板。顯示面板包括一第一基板、一第二基板、一液晶層、複數個薄膜電晶體、複數條金屬走線、一保護層、一第一配向層以及複數個聚團物(agglomerate)。第一基板具有至少一顯示區以及一非顯示區,非顯示區位於顯示區之外。第二基板相對第一基板設置,液晶層位於第一基板與第二基板之間。薄膜電晶體和金屬走線位於第一基板上,保護層至少覆蓋部分金屬走線。第一配向層位於保護層上,且暴露保護層之一第一表面。聚團物至少位於部分之第一表面上。 According to an embodiment of the present disclosure, a display panel is proposed. The display panel includes a first substrate, a second substrate, a liquid crystal layer, a plurality of thin film transistors, a plurality of metal traces, a protective layer, a first alignment layer, and a plurality of agglomerates. The first substrate has at least one display area and a non-display area, and the non-display area is located outside the display area. The second substrate is disposed opposite to the first substrate, and the liquid crystal layer is located between the first substrate and the second substrate. The thin film transistor and the metal trace are on the first substrate, and the protective layer covers at least part of the metal trace. The first alignment layer is on the protective layer and exposes one of the first surfaces of the protective layer. The agglomerate is located at least on a portion of the first surface.

為了對本發明之上述及其他方面有更佳的瞭解,下文特舉較佳實施例,並配合所附圖式,作詳細說明如下: In order to better understand the above and other aspects of the present invention, the preferred embodiments are described below, and in conjunction with the drawings, the detailed description is as follows:

100‧‧‧顯示面板 100‧‧‧ display panel

110‧‧‧第一基板 110‧‧‧First substrate

120‧‧‧第二基板 120‧‧‧second substrate

130‧‧‧液晶層 130‧‧‧Liquid layer

140‧‧‧薄膜電晶體 140‧‧‧film transistor

150、ML‧‧‧金屬走線 150, ML‧‧‧ metal trace

160‧‧‧第一保護層 160‧‧‧First protective layer

161‧‧‧第二保護層 161‧‧‧Second protective layer

160s‧‧‧第一表面 160s‧‧‧ first surface

170‧‧‧第一配向層 170‧‧‧First alignment layer

180、180a、180b、180c、180d‧‧‧聚團物 180, 180a, 180b, 180c, 180d‧‧‧ agglomerates

190、290‧‧‧電極層 190, 290‧‧‧ electrode layer

270‧‧‧第二配向層 270‧‧‧Second alignment layer

290s‧‧‧第二表面 290s‧‧‧ second surface

291‧‧‧間隔元件 291‧‧‧ Spacer components

293‧‧‧遮光層 293‧‧‧Lighting layer

293a‧‧‧透光區 293a‧‧‧light transmission area

293b‧‧‧遮光區 293b‧‧‧ shading area

295‧‧‧框膠 295‧‧‧Box glue

297‧‧‧彩色濾光層 297‧‧‧Color filter layer

299‧‧‧面板上驅動元件 299‧‧‧ Panel drive components

310‧‧‧奈米溝道 310‧‧‧Nami channel

320‧‧‧次微米突起結構 320‧‧ ‧ micron protrusion structure

1B-1B’、4-4’‧‧‧剖面線 1B-1B’, 4-4’‧‧‧ hatching

A‧‧‧顯示區 A‧‧‧ display area

B‧‧‧非顯示區 B‧‧‧Non-display area

D1、D2‧‧‧延伸方向 D1, D2‧‧‧ extending direction

DL‧‧‧資料線 DL‧‧‧ data line

P‧‧‧畫素區域 P‧‧‧ pixel area

SL‧‧‧掃描線 SL‧‧‧ scan line

第1A圖繪示本揭露內容一實施例之顯示面板之俯視示意圖。 FIG. 1A is a schematic top view of a display panel according to an embodiment of the present disclosure.

第1B圖繪示沿第1A圖之剖面線1B-1B’之剖面示意圖。 Fig. 1B is a schematic cross-sectional view taken along line 1B-1B' of Fig. 1A.

第2圖繪示本揭露內容一實施例之顯示面板之簡化爆炸圖。 FIG. 2 is a simplified exploded view of a display panel according to an embodiment of the present disclosure.

第3圖繪示如第2圖所示之非顯示區中的金屬走線之局部立體圖。 Figure 3 is a partial perspective view of the metal trace in the non-display area as shown in Figure 2.

第4圖繪示本揭露內容另一實施例之顯示面板沿第1A圖之剖面線4-4’之剖面示意圖。 Fig. 4 is a cross-sectional view showing the display panel of another embodiment of the present disclosure taken along line 4-4' of Fig. 1A.

根據本揭露內容之實施例,顯示面板中,位於非顯示區內的聚團物不具有特定配向方向,使該區的液晶不會朝向特 定方向傾倒,使得非顯示區的透光性降低,因而可以改善顯示面板之漏光的現象,進而提高顯示影像的品質。以下係參照所附圖式詳細敘述本揭露內容之實施例。圖式中相同的標號係用以標示相同或類似之部分。需注意的是,圖式係已簡化以利清楚說明實施例之內容,實施例所提出的細部結構僅為舉例說明之用,並非對本揭露內容欲保護之範圍做限縮。具有通常知識者當可依據實際實施態樣的需要對該些結構加以修飾或變化。 According to an embodiment of the present disclosure, in the display panel, the agglomerates located in the non-display area do not have a specific alignment direction, so that the liquid crystal in the area does not face the special The tilting in a fixed direction reduces the light transmittance of the non-display area, thereby improving the phenomenon of light leakage of the display panel, thereby improving the quality of the displayed image. Embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings. The same reference numerals are used to designate the same or similar parts. It is to be noted that the drawings have been simplified to illustrate the details of the embodiments, and the detailed description of the embodiments is for illustrative purposes only and is not intended to limit the scope of the disclosure. Those having ordinary knowledge may modify or change the structures as needed in accordance with the actual implementation.

第1A圖繪示本揭露內容一實施例之顯示面板100之俯視示意圖,第1B圖繪示沿第1A圖之剖面線1B-1B’之剖面示意圖。請參照第1A圖~第1B圖,顯示面板100包括一第一基板110、一第二基板120、一液晶層130、複數個薄膜電晶體140、複數條金屬走線150、至少一保護層(例如一第一保護層160和一第二保護層161)、一第一配向層170以及複數個聚團物(agglomerate)180。第一基板110具有至少一顯示區A以及一非顯示區B,非顯示區B位於顯示區A之外。第二基板120相對第一基板110設置,液晶層130位於第一基板110與第二基板120之間。薄膜電晶體140和金屬走線150位於第一基板110上,第一保護層160和第二保護層161至少覆蓋部分金屬走線150。第一保護層160設置於第二保護層161上,且第一保護層160覆蓋薄膜電晶體140與金屬走線150。第一配向層170位於第一保護層160上,且第一配向層170部分地覆蓋第一保護層160以暴露第一保護層160之一第一表面160s。聚團物180至少位於部分之此第一表面160s上。於另一實施例中,第一保護層160係部分覆蓋第二保護層161以暴露第二保護層161之一部份表面,且聚團物 180至少位於第二保護層161暴露之此部分表面上(未繪示)。於再一實施例中,第一保護層160係部分覆蓋第二保護層161以暴露第二保護層161之一部份表面(未繪示),且聚團物180至少位於第一保護層160上且位於第二保護層161暴露之此部分表面上。 1A is a schematic plan view of a display panel 100 according to an embodiment of the present disclosure, and FIG. 1B is a schematic cross-sectional view taken along line 1B-1B' of FIG. 1A. Referring to FIG. 1A to FIG. 1B , the display panel 100 includes a first substrate 110 , a second substrate 120 , a liquid crystal layer 130 , a plurality of thin film transistors 140 , a plurality of metal traces 150 , and at least one protective layer ( For example, a first protective layer 160 and a second protective layer 161), a first alignment layer 170, and a plurality of agglomerates 180. The first substrate 110 has at least one display area A and one non-display area B, and the non-display area B is located outside the display area A. The second substrate 120 is disposed opposite to the first substrate 110 , and the liquid crystal layer 130 is located between the first substrate 110 and the second substrate 120 . The thin film transistor 140 and the metal trace 150 are located on the first substrate 110, and the first protective layer 160 and the second protective layer 161 cover at least part of the metal trace 150. The first protective layer 160 is disposed on the second protective layer 161 , and the first protective layer 160 covers the thin film transistor 140 and the metal trace 150 . The first alignment layer 170 is located on the first protection layer 160, and the first alignment layer 170 partially covers the first protection layer 160 to expose one of the first surfaces 160s of the first protection layer 160. The agglomerate 180 is located at least on a portion of this first surface 160s. In another embodiment, the first protective layer 160 partially covers the second protective layer 161 to expose a portion of the surface of the second protective layer 161, and the agglomerate 180 is at least located on the surface of the portion of the second protective layer 161 that is exposed (not shown). In still another embodiment, the first protective layer 160 partially covers the second protective layer 161 to expose a portion of the surface of the second protective layer 161 (not shown), and the agglomerate 180 is located at least in the first protective layer 160. And on the surface of the portion of the second protective layer 161 exposed.

顯示區A表示顯示面板100用於顯示影像的區域,非顯示區B表示不用於顯示影像的區域。一實施例中,如第1A圖所示,非顯示區B環繞顯示區A。實施例中,顯示區A例如是畫素區域中用於顯示畫面的區域,非顯示區B例如是扇出走線區(fan out),然而不限於此,非顯示區B可以包括不用來顯示影像的任何區域。 The display area A indicates an area in which the display panel 100 is used to display an image, and the non-display area B indicates an area in which an image is not displayed. In one embodiment, as shown in FIG. 1A, the non-display area B surrounds the display area A. In the embodiment, the display area A is, for example, an area for displaying a picture in the pixel area, and the non-display area B is, for example, a fan out, but is not limited thereto, and the non-display area B may include not for displaying an image. Any area.

實施例中,第一保護層160係直接接觸薄膜電晶體140以及金屬走線150之至少其中之一。如第1B圖所示,本實施例中,第一保護層160直接接觸薄膜電晶體140以及金屬走線150。 In an embodiment, the first protective layer 160 is in direct contact with at least one of the thin film transistor 140 and the metal trace 150. As shown in FIG. 1B, in the present embodiment, the first protective layer 160 directly contacts the thin film transistor 140 and the metal trace 150.

實施例中,第一保護層160與第二保護層161分別獨立地包括一無機介電材料,例如包括氮化矽(SiNx)、氧化矽(SiOx)和/或氮氧化矽(SiOxNy)。如第1B圖所示,第一保護層160之暴露於第一配向層170之外的第一表面160s係對應非顯示區B。 In an embodiment, the first protective layer 160 and the second protective layer 161 respectively comprise an inorganic dielectric material, for example, including tantalum nitride (SiN x ), yttrium oxide (SiO x ), and/or yttrium oxynitride (SiO x ). N y ). As shown in FIG. 1B, the first surface 160s of the first protective layer 160 exposed to the outside of the first alignment layer 170 corresponds to the non-display area B.

實施例中,非顯示區B內的聚團物180並不具有特定的排列方式與配向方向,換言之,聚團物180係不規則地排列於第一基板110之上(above)。顯示區A內的聚團物180則具有特定的配向方向以引導液晶朝特定方向傾倒。同為聚團物180,但可根據製程中的照光固化步驟與是否施加電場的不同,而於不同區域產生具有不同功能的聚團物180。因非顯示區B內的聚團物 180不具有特定配向方向,使該區的液晶不會朝向特定方向傾倒,故而使該區形成暗區,使得非顯示區B的透光性降低,因而可以達到改善顯示面板100之漏光的現象。 In the embodiment, the agglomerates 180 in the non-display area B do not have a specific arrangement and alignment direction, in other words, the agglomerates 180 are irregularly arranged on the first substrate 110. The agglomerate 180 in the display area A has a specific alignment direction to direct the liquid crystal to tilt in a specific direction. The same is the agglomerate 180, but the agglomerates 180 having different functions can be produced in different regions according to the difference between the photo-curing step in the process and whether or not the electric field is applied. Due to the agglomerates in the non-display area B The 180 does not have a specific alignment direction, so that the liquid crystal of the region does not fall in a specific direction, so that the region forms a dark region, so that the light transmittance of the non-display region B is lowered, so that the light leakage of the display panel 100 can be improved.

實施例中,聚團物180直接接觸液晶層130中的液晶分子。需注意的是,圖式中的聚團物180之尺寸比例並非按照實際產品等比例繪製,僅用以清楚說明實施例之內容,因此並非作為限縮本揭露內容之保護範圍之用。 In the embodiment, the agglomerate 180 directly contacts the liquid crystal molecules in the liquid crystal layer 130. It should be noted that the size ratio of the agglomerates 180 in the drawings is not drawn to the scale of the actual products, and is only used to clearly illustrate the contents of the embodiments, and therefore is not intended to limit the scope of the disclosure.

實施例中,聚團物180的形成方式可以有很多種。舉例來說,一實施例中,可以在形成液晶層130或形成第一配向層170時,在其中添加紫外光硬化型(UV curable)單體,接著從第一基板110側或第二基板120側照射紫外光,以形成聚團物180於第一基板110(也就是第一保護層160之暴露於第一配向層170之外的至少部分之第一表面160s)上或第一配向層170上。以紫外光硬化型單體照光聚合而形成的聚團物180之材質為高分子聚合物(polymer),不同區域中的反應情形不同。 In the embodiment, the agglomerate 180 can be formed in a wide variety of ways. For example, in an embodiment, a UV curable monomer may be added thereto when forming the liquid crystal layer 130 or forming the first alignment layer 170, and then from the first substrate 110 side or the second substrate 120. The ultraviolet light is side-illuminated to form agglomerate 180 on the first substrate 110 (ie, at least a portion of the first surface 160s of the first protective layer 160 that is exposed outside of the first alignment layer 170) or the first alignment layer 170 on. The material of the agglomerate 180 formed by photopolymerization of the ultraviolet-curable monomer is a polymer, and the reaction conditions in different regions are different.

一實施例中,以顯示面板100為奈米突起構造垂直配向液晶顯示面板(nano-protrusion vertical aligned liquid crystal display panel)為例,聚團物180和第一配向層170表面的配向奈米突起結構可以採用相同的單體原料而形成。舉例來說,在持續提供外加電場的狀況下對顯示區A內的單體進行聚合反應,以形成配向奈米突起結構;在未外加電場的狀況下對非顯示區B內的單體進行聚合反應,以形成不具特定引導方向之配向功能且呈不規則排列的聚團物180。如此一來,顯示區A內的配向奈米突起結構可以幫助液晶分子具有特定方向之配向,而非顯示區B內的 大量聚團物180因不具有特定方向之配向因而可以使非顯示區B的液晶呈各方向傾倒而形成良好的暗區,降低顯示面板100漏光的可能性,進而增進顯示面板100的對比與顯示品質。 In one embodiment, the display panel 100 is a nano-protrusion vertical aligned liquid crystal display panel, and the aligned nano protrusion structure on the surface of the agglomerate 180 and the first alignment layer 170 is taken as an example. It can be formed using the same monomer starting material. For example, the monomer in the display area A is polymerized under the condition of continuously providing an applied electric field to form a aligned nano-protrusion structure; and the monomer in the non-display area B is polymerized without applying an electric field. The reaction is carried out to form agglomerates 180 which are arranged in an irregular arrangement and which are arranged in an irregular manner. In this way, the alignment nano protrusion structure in the display area A can help the liquid crystal molecules have a specific direction alignment instead of the display area B. Because a large number of agglomerates 180 do not have a specific direction alignment, the liquid crystal of the non-display area B can be tilted in various directions to form a good dark area, thereby reducing the possibility of light leakage of the display panel 100, thereby enhancing the contrast and display of the display panel 100. quality.

以上所述分區的配向奈米突起結構以及聚團物180的形成,可以經由多種方式製作。舉例來說,可以經由電極的圖案化設計,使得對應非顯示區B的基板上不具有電極部分,而讓單體進行紫外光聚合反應時不會受到電場的影響;或者,也可以在持續提供電場並進行紫外光照射時,利用搭配圖案化光罩遮蔽非顯示區B,使得非顯示區B內的單體在受到外加電場時不進行紫外光聚合反應,電場移除後再進行紫外光聚合反應。 The alignment of the nano-protrusion structure and the formation of the agglomerate 180 of the above-described partitions can be produced in a variety of ways. For example, the patterned design of the electrodes may be such that the substrate corresponding to the non-display area B does not have an electrode portion, and the monomer is not affected by the electric field when performing ultraviolet polymerization; or, it may be continuously provided. When the electric field is irradiated with ultraviolet light, the non-display area B is shielded by using the patterned mask, so that the monomer in the non-display area B is not subjected to ultraviolet photopolymerization when subjected to an applied electric field, and then ultraviolet light polymerization is performed after the electric field is removed. reaction.

如第1B圖所示,實施例中,顯示面板100更可包括複數個間隔元件291,間隔元件291位於第一基板110與第二基板120之間,且用於提供一間隙以設置液晶層130。多個間隔元件291可以具有不同高度,以提供面板受按壓時,能夠有不同高度的間隔元件291作為緩衝。 As shown in FIG. 1B , in the embodiment, the display panel 100 further includes a plurality of spacer elements 291 disposed between the first substrate 110 and the second substrate 120 and configured to provide a gap to provide the liquid crystal layer 130 . . The plurality of spacer elements 291 can have different heights to provide spacer elements 291 of different heights as a buffer when the panel is pressed.

實施例中,如第1B圖所示,顯示面板100可包括一電極層190形成於至少部分的第一基板110之上,電極層190例如是一圖案化的電極層。如第1B圖所示,顯示面板100更可包括另一電極層290位於第二基板120上,並且,顯示面板100更可包括一第二配向層270位於電極層290上,且第二配向層270暴露電極層290之一第二表面290s,聚團物180更可位於至少部分之第二表面290s上,也就是電極層290之暴露的第二表面290s上。實施例中,第二基板120上的電極層290可以是圖案化的透光電極層或全面式的透光電極層,電極層材料例如是ITO或IZO 等。 In an embodiment, as shown in FIG. 1B, the display panel 100 may include an electrode layer 190 formed on at least a portion of the first substrate 110, and the electrode layer 190 is, for example, a patterned electrode layer. As shown in FIG. 1B, the display panel 100 further includes another electrode layer 290 on the second substrate 120, and the display panel 100 further includes a second alignment layer 270 on the electrode layer 290, and the second alignment layer. 270 exposes one of the second surfaces 290s of the electrode layer 290, and the agglomerate 180 may be located on at least a portion of the second surface 290s, that is, the exposed second surface 290s of the electrode layer 290. In an embodiment, the electrode layer 290 on the second substrate 120 may be a patterned transparent electrode layer or a comprehensive transparent electrode layer, and the electrode layer material is, for example, ITO or IZO. Wait.

實施例中,第一配向層170和第二配向層270例如是聚醯亞胺(polyimide,PI)膜。 In an embodiment, the first alignment layer 170 and the second alignment layer 270 are, for example, polyimide (PI) films.

實施例中,如第1B圖所示,顯示面板100更可包括一框膠295。框膠295位於第一基板110與第二基板120之間,且位於非顯示區B的外圍區域。 In an embodiment, as shown in FIG. 1B, the display panel 100 further includes a sealant 295. The sealant 295 is located between the first substrate 110 and the second substrate 120 and is located in a peripheral region of the non-display area B.

如第1A~1B圖所示,實施例中,第一配向層170並未完全覆蓋框膠295內的區域。相對於當第一配向層170完全覆蓋於第一基板110之上,於此情形下框膠295完全與第一配向層170黏合,但框膠295與第一配向層170之間的接著力不佳,因此容易產生膜層剝離(peeling)的問題。根據本揭露內容之實施例,由於第一配向層170係部分覆蓋於第一基板110之上,至少部分的框膠295可以黏合於第一基板110之上的具有較佳黏著性之材質,因此可以減少顯示面板100的膜層剝離之問題。 As shown in FIGS. 1A-1B, in the embodiment, the first alignment layer 170 does not completely cover the area within the sealant 295. Relative to when the first alignment layer 170 completely covers the first substrate 110, in this case, the sealant 295 is completely bonded to the first alignment layer 170, but the adhesion between the sealant 295 and the first alignment layer 170 is not Preferably, it is easy to cause peeling of the film. According to the embodiment of the present disclosure, since the first alignment layer 170 partially covers the first substrate 110, at least a portion of the sealant 295 can be adhered to the first substrate 110 to have a better adhesive material. The problem of film peeling of the display panel 100 can be reduced.

此情況下,聚團物180也位於第一保護層160之暴露於第一配向層170之外的第一表面160s上,而使得此區域的液晶分子也可傾向朝向各種方向傾倒,進而使得該區域的透光度降低,形成良好暗區,進而達到改善漏光現象以及提高顯示區域之顯示影像的對比及品質之效果。 In this case, the agglomerate 180 is also located on the first surface 160s of the first protective layer 160 that is exposed outside the first alignment layer 170, so that the liquid crystal molecules in this region may also tend to be tilted in various directions, thereby making the The transmittance of the region is lowered to form a good dark region, thereby improving the light leakage phenomenon and improving the contrast and quality of the display image in the display region.

實施例中,如第1B圖所示,顯示面板100更可包括一彩色濾光層297位於第一基板110上。另一實施例中,彩色濾光層亦可設置於第二基板120上(未繪示)。 In the embodiment, as shown in FIG. 1B , the display panel 100 further includes a color filter layer 297 on the first substrate 110 . In another embodiment, the color filter layer may also be disposed on the second substrate 120 (not shown).

第2圖繪示本揭露內容一實施例之顯示面板100之簡化爆炸圖。需注意的是,第2圖中的部分元件係省略或簡化以 利清楚說明實施例之內容,圖式上的尺寸比例並非按照實際產品等比例繪製,因此並非作為限縮本揭露內容之保護範圍之用。於此實施例中,係以框膠295緊鄰(或切齊)基板110/120側邊的設計為例,於另一實施例中,框膠295亦可不用緊鄰基板110/120側邊,或是於另一實施例中,框膠295僅緊鄰基板110之其中三側邊,另一側邊則沒有緊鄰基板110側邊。 FIG. 2 is a simplified exploded view of the display panel 100 in accordance with an embodiment of the present disclosure. It should be noted that some of the components in Figure 2 are omitted or simplified. The contents of the embodiments are clearly illustrated, and the dimensional ratios in the drawings are not drawn to the scale of the actual products, and thus are not intended to limit the scope of the disclosure. In this embodiment, the design of the side of the substrate 110/120 is closely followed (or tangled) by the sealant 295. In another embodiment, the sealant 295 may not be adjacent to the side of the substrate 110/120, or In another embodiment, the sealant 295 is only adjacent to three sides of the substrate 110, and the other side is not adjacent to the side of the substrate 110.

實施例中,顯示面板100更包括至少一資料線DL以及至少一掃描線SL。顯示區A中具有複數個畫素P,資料線DL和掃描線SL係相交以定義畫素區域P。非顯示區B中更設有複數條金屬走線ML,其中部分之該複數條金屬走線ML係與掃描線SL為同層金屬或於同一道製程中形成,部分之該複數條金屬走線ML係與資料線DL為同層金屬或於同一道製程中形成,請同時參照第1B圖及第2圖,部分金屬走線ML可位於第二保護層161下,其餘金屬走線ML可位於第一保護層160下。然而,金屬走線ML也可具有不同於第1~2圖所示的配置方式,端視設計需求。 In an embodiment, the display panel 100 further includes at least one data line DL and at least one scan line SL. The display area A has a plurality of pixels P, and the data line DL and the scan line SL intersect to define a pixel area P. The non-display area B further includes a plurality of metal traces ML, wherein a portion of the plurality of metal traces ML and the scan line SL are formed in the same layer metal or in the same process, and the plurality of metal traces are partially formed. The ML system and the data line DL are formed in the same layer of metal or in the same process. Please refer to FIG. 1B and FIG. 2 simultaneously. Some of the metal traces ML may be located under the second protective layer 161, and the remaining metal traces ML may be located. The first protective layer 160 is under. However, the metal trace ML may also have a different configuration than that shown in Figures 1 and 2, depending on the design requirements.

請同時參照第1B圖及第2圖,顯示面板100更可包括一遮光層293。實施例中,遮光層293例如是黑矩陣(black matrix,BM),黑矩陣位於第二基板120上。實施例中,非顯示區B內可包括面板上驅動元件(driver on panel)299,面板上驅動元件299例如是閘極線驅動電路(gate on panel,GOP)或資料線驅動電路。閘極線驅動電路或資料線驅動電路可同時存在或分別單獨設置於面板上。圖上僅示意繪出一組閘極驅動電路,亦可有多組閘極驅動電路或多組資料線驅動電路,端視設計需求。 Referring to FIG. 1B and FIG. 2 simultaneously, the display panel 100 further includes a light shielding layer 293. In the embodiment, the light shielding layer 293 is, for example, a black matrix (BM), and the black matrix is located on the second substrate 120. In an embodiment, the non-display area B may include a driver on panel 299, such as a gate on panel (GOP) or a data line driver circuit. The gate line driving circuit or the data line driving circuit may exist at the same time or separately separately on the panel. The figure only shows a set of gate drive circuits, and there are also multiple sets of gate drive circuits or multiple sets of data line drive circuits, depending on the design requirements.

第3圖繪示如第2圖所示之非顯示區B中的金屬走線ML之局部立體圖。 FIG. 3 is a partial perspective view of the metal trace ML in the non-display area B as shown in FIG. 2.

一實施例中,如第3圖所示,顯示面板100更可具有複數個奈米溝道(nanogroove)310。奈米溝道310位於非顯示區B中之金屬走線ML的至少其中之一條的一側。如第3圖所示,奈米溝道310位於金屬走線ML之至少一斜面(inclined surface)上。實施例中,奈米溝道310亦可以形成於非顯示區B中之至少一金屬走線ML的兩側之斜面上。實施例中,奈米溝道310可以形成於非顯示區B中具有配向層的區域以及不具有配向層的區域。實施例中,如第3圖所示,奈米溝道310的延伸方向D1和金屬走線ML的延伸方向D2係相交且具有一個角度。一實施例中,該角度例如是大約90°。 In an embodiment, as shown in FIG. 3, the display panel 100 may further have a plurality of nanogrooves 310. The nanochannel 310 is located on one side of at least one of the metal traces ML in the non-display area B. As shown in FIG. 3, the nanochannel 310 is located on at least one inclined surface of the metal trace ML. In an embodiment, the nanochannels 310 may also be formed on the slopes of the two sides of the at least one metal trace ML in the non-display area B. In an embodiment, the nanochannel 310 may be formed in a region having an alignment layer in the non-display region B and a region having no alignment layer. In the embodiment, as shown in FIG. 3, the extending direction D1 of the nanochannel 310 and the extending direction D2 of the metal trace ML intersect and have an angle. In one embodiment, the angle is, for example, about 90°.

一般來說,非顯示區B中的金屬走線ML可能會容易反光及透光。根據本揭露內容之實施例,奈米溝道310位於金屬走線ML的一側,特別是位於金屬走線ML的斜面上,而能夠降低金屬走線ML的對光線的反射,進而可以降低該區域的亮度,形成良好暗區,以及達到改善漏光現象的效果。於其他實施例中,金屬走線ML可有其他的配置圖案,而不限於直線形狀之金屬走線。 In general, the metal traces ML in the non-display area B may be easily reflected and transmitted. According to the embodiment of the present disclosure, the nanochannel 310 is located on one side of the metal trace ML, particularly on the inclined surface of the metal trace ML, and can reduce the reflection of the light trace of the metal trace ML, thereby reducing the The brightness of the area, forming a good dark area, and achieving the effect of improving light leakage. In other embodiments, the metal traces ML may have other configuration patterns, and are not limited to linear metal traces.

一實施例中,如第3圖所示,顯示面板100更可包括複數個次微米突起結構(submicron protrusion)320,次微米突起結構320位於非顯示區B中。次微米突起結構320係沿金屬走線ML之至少其中一條的延伸方向D2排列。換句話說,多個次微米突起結構320沿著金屬走線ML的延伸方向D2成長。一實施例 中,次微米突起結構320可以平行於金屬走線ML的邊緣而配置。另一實施例中,次微米突起結構320也可以形成於金屬走線ML的斜面上。次微米突起結構320具有大約小於1微米(μm)之尺寸。實施例中,次微米突起結構320位於非顯示區B中不具有配向層的區域,次微米突起結構320可位於第一保護層160暴露出之第一表面160s上之區域。 In one embodiment, as shown in FIG. 3, the display panel 100 may further include a plurality of submicron protrusions 320, and the submicron protrusion structures 320 are located in the non-display area B. The sub-micron protrusion structures 320 are arranged along the extending direction D2 of at least one of the metal traces ML. In other words, the plurality of sub-micron protrusion structures 320 grow along the extending direction D2 of the metal traces ML. An embodiment The middle, sub-micron protrusion structure 320 may be disposed parallel to the edge of the metal trace ML. In another embodiment, the sub-micron protrusion structure 320 may also be formed on the slope of the metal trace ML. The sub-micron protrusion structure 320 has a size of less than about 1 micrometer (μm). In an embodiment, the sub-micron protrusion structure 320 is located in a region of the non-display region B that does not have an alignment layer, and the sub-micron protrusion structure 320 may be located on a region of the first surface 160s exposed by the first protection layer 160.

非顯示區B中,特別是在不具有配向層的區域中,次微米突起結構320沿著金屬走線ML的延伸方向D2配置,使得金屬走線ML的邊緣較不平滑整齊,而能夠降低金屬走線ML的對光線的反射。如此一來,可以降低該區域的亮度,形成良好暗區,進而達到改善漏光現象的效果。 In the non-display area B, particularly in the area without the alignment layer, the sub-micron protrusion structure 320 is disposed along the extending direction D2 of the metal trace ML, so that the edge of the metal trace ML is less smooth and tidy, and the metal can be lowered. Trace the reflection of light from ML. In this way, the brightness of the area can be reduced, and a good dark area can be formed, thereby achieving the effect of improving the light leakage phenomenon.

第4圖繪示本揭露內容另一實施例之顯示面板沿第1A圖之剖面線4-4’之剖面示意圖。一實施例中,如第4圖所示,遮光層293位於第二基板120上,且遮光層293之至少一部份對應於非顯示區B。遮光層293具有一透光區293a與一遮光區293b,多個聚團物形成於對應於透光區293a處以及對應於遮光區293b處。遮光層293之透光區293a係用以令聚團物180之照光硬化的反應更完全。實施例中,聚團物形成於第一基板110之上,且聚團物亦可形成於第二基板120之上,因此第一基板110之上和第二基板120之上的表面粗糙度係由聚團物所形成。不同的粗糙度所對應之地貌形狀對於液晶傾倒的影響力不同,具有較大粗糙度之地貌形狀對液晶影響越大。至於粗糙度對於液晶傾倒的影響與作用方式,則視各個區域內的聚團物之特性有所不同,也需視操作電壓影響之區域範圍而定。粗糙度之大小調整可利用灰階 光罩或是利用遮罩分別控制顯示區A與非顯示區B的照光程度與時間。 Fig. 4 is a cross-sectional view showing the display panel of another embodiment of the present disclosure taken along line 4-4' of Fig. 1A. In one embodiment, as shown in FIG. 4, the light shielding layer 293 is located on the second substrate 120, and at least a portion of the light shielding layer 293 corresponds to the non-display area B. The light shielding layer 293 has a light transmitting region 293a and a light shielding region 293b, and a plurality of agglomerates are formed at the corresponding light transmitting regions 293a and corresponding to the light shielding regions 293b. The light-transmitting region 293a of the light-shielding layer 293 serves to complete the reaction of hardening the agglomerate 180. In an embodiment, the agglomerates are formed on the first substrate 110, and the agglomerates may be formed on the second substrate 120, so the surface roughness on the first substrate 110 and above the second substrate 120 is Formed by agglomerates. The shape of the geomorphology corresponding to different roughness has different influence on the liquid crystal tilting, and the shape of the landform with larger roughness has greater influence on the liquid crystal. As for the influence of the roughness on the liquid crystal dumping and the mode of action, the characteristics of the agglomerates in each region are different, and it depends on the range of the influence of the operating voltage. Roughness can be adjusted by using gray scale The mask or the mask controls the degree of illumination and time of the display area A and the non-display area B, respectively.

如第4圖所示,實施例中,對應於透光區293a的聚團物180a產生一第一表面粗糙度,對應於遮光區293b的聚團物180c產生一第二表面粗糙度,第一表面粗糙度大於第二表面粗糙度。一實施例中,此第一表面粗糙度和此第二表面粗糙度可以表示第一基板110之上和第二基板120之上的表面粗糙度。 As shown in FIG. 4, in the embodiment, the agglomerate 180a corresponding to the light-transmitting region 293a generates a first surface roughness, and the agglomerate 180c corresponding to the light-shielding region 293b generates a second surface roughness, first The surface roughness is greater than the second surface roughness. In an embodiment, the first surface roughness and the second surface roughness may represent surface roughness above the first substrate 110 and above the second substrate 120.

如第4圖所示,對應於顯示區A的聚團物180b產生一第三表面粗糙度。實施例中,第一表面粗糙度大於第三表面粗糙度,第三表面粗糙度大於第二表面粗糙度。一實施例中,此第一表面粗糙度、此第二表面粗糙度和此第三表面粗糙度表示第二基板120之上的表面粗糙度。 As shown in Fig. 4, the agglomerate 180b corresponding to the display area A produces a third surface roughness. In an embodiment, the first surface roughness is greater than the third surface roughness, and the third surface roughness is greater than the second surface roughness. In one embodiment, the first surface roughness, the second surface roughness, and the third surface roughness represent surface roughness above the second substrate 120.

如第4圖所示,對應於鄰近框膠295的聚團物180d產生一第四表面粗糙度,第四表面粗糙度大於第三表面粗糙度。一實施例中,此第三表面粗糙度和此第四表面粗糙度表示第一基板110之上的表面粗糙度。 As shown in FIG. 4, the agglomerate 180d corresponding to the adjacent sealant 295 produces a fourth surface roughness, the fourth surface roughness being greater than the third surface roughness. In one embodiment, the third surface roughness and the fourth surface roughness represent surface roughness above the first substrate 110.

上述實施例中,第一表面粗糙度、第二表面粗糙度、第三表面粗糙度和第四表面粗糙度可以是方均根粗糙度、平均粗糙度、或最大粗糙度之至少其中之一。一實施例中,第一表面粗糙度、第二表面粗糙度、第三表面粗糙度和第四表面粗糙度例如是以平均粗糙度表示。 In the above embodiment, the first surface roughness, the second surface roughness, the third surface roughness, and the fourth surface roughness may be at least one of a square root roughness, an average roughness, or a maximum roughness. In one embodiment, the first surface roughness, the second surface roughness, the third surface roughness, and the fourth surface roughness are represented, for example, by an average roughness.

以下係就實施例作進一步說明。以下係列出顯示面板100之數個不同區域之粗糙度的量測結果,以說明本揭露內容之顯示面板100的特性。然而以下之實施例僅為例示說明之用, 而不應被解釋為本揭露內容實施之限制。各區域之粗糙度的量測結果如表1,其中量測的粗糙度包括方均根粗糙度(Rq)、平均粗糙度(Ra)及最大粗糙度(Rmax)。表1所列之各種粗糙度係以原子力顯微鏡(AFM,機台型號:VEECO Dimension-icon)於選定的區域中之一5x5平方微米的面積內量測而得。 The following examples are further described. The following series shows the measurement results of the roughness of several different regions of the display panel 100 to illustrate the characteristics of the display panel 100 of the present disclosure. However, the following embodiments are for illustrative purposes only. It should not be construed as limiting the implementation of the disclosure. The measurement results of the roughness of each region are shown in Table 1, wherein the measured roughness includes a root mean square roughness (Rq), an average roughness (Ra), and a maximum roughness (Rmax). The various roughnesses listed in Table 1 were measured by an atomic force microscope (AFM, machine model: VEECO Dimension-icon) in an area of 5 x 5 square microns in a selected area.

由表1的結果可得知,對應於透光區293a的聚團物產生的平均粗糙度(Ra=20.7奈米)大於對應於遮光區293b的聚團物產生的平均粗糙度(Ra=14.1奈米)。再者,對應於顯示區A的聚團物產生的平均粗糙度(Ra=15.8奈米)及大於對應於遮光區293b的聚團物產生的平均粗糙度(Ra=14.1奈米)。換言之,透光區293a的平均粗糙度(第一平均粗糙度)最大,顯示區A的平均粗糙度(第三平均粗糙度)次之,而遮光區293b的平均粗糙度(第二平均粗糙度)較前述兩區域都小。 As can be seen from the results of Table 1, the average roughness (Ra = 20.7 nm) produced by the agglomerates corresponding to the light-transmitting regions 293a is larger than the average roughness (Ra = 14.1) generated by the agglomerates corresponding to the light-shielding regions 293b. Nano). Further, the average roughness (Ra = 15.8 nm) produced by the agglomerates corresponding to the display area A and the average roughness (Ra = 14.1 nm) generated by the agglomerates corresponding to the light-shielding regions 293b. In other words, the average roughness (first average roughness) of the light-transmitting region 293a is the largest, the average roughness (third average roughness) of the display region A is second, and the average roughness (second average roughness) of the light-blocking region 293b is obtained. ) is smaller than the previous two regions.

此外,對應於非顯示區B之透光區293a的聚團物產生的方均根粗糙度(Rq=27.3奈米)及最大粗糙度(Rmax=270奈米)均分別大於對應於非顯示區B之遮光區293b的聚團物產生的方均根粗糙度(Rq=18.7奈米)及最大粗糙度(Rmax=168奈米)。再者,對應於顯示區A的聚團物產生的方均根粗糙度(Rq=20.6奈米)最大粗糙度(Rmax=172奈米)均分別大於對應於遮光區293b的聚團物產生的方均根粗糙度(Rq=18.7奈米)及最大粗糙度(Rmax=168奈米)。因此,於非顯示區B中,因於操作下並非顯示區A中施加畫素操作電壓,故而利用遮光區293a區之聚團物所形成之地貌之粗糙度來增加對液晶之影響力,使液晶於透光區293a中呈現不朝特定方向傾倒之暗紋進而降低漏光。而遮光區293b區中因其為遮光區,故而其聚團物所形成之地貌之粗糙度可小於透光區293a之粗糙度。而顯示區A因其於顯示時,有施加畫素操作電壓之原因,粗糙度大小可次於非顯示區B中之透光區293a之粗糙度。故而透光區293a的粗糙度(第一方均根粗糙度、第一最大粗糙度)最大,顯示區A的粗糙度(第三方均根粗糙度、第三最大粗糙度)次之,而遮光區293b的粗糙度(第二方均根粗糙度、第二最大粗糙度)較前述兩區域都小。鄰近框膠295之第四表面粗糙度,可調整照射框膠295固化時之光照射角度,使得該第四表面可受到較多照射光之影響,故而該第四表面照光時間較其他區域來得長,故而第四表面之粗糙度較其他區域大。 In addition, the agglomerate roughness (Rq=27.3 nm) and maximum roughness (Rmax=270 nm) generated by the agglomerates corresponding to the light-transmitting regions 293a of the non-display area B are respectively greater than those corresponding to the non-display area B. The agglomerates of the light-shielding zone 293b produced a square root roughness (Rq = 18.7 nm) and a maximum roughness (Rmax = 168 nm). Furthermore, the square root roughness (Rq=20.6 nm) maximum roughness (Rmax=172 nm) produced by the agglomerates corresponding to the display area A are respectively larger than the square root roughness generated by the agglomerates corresponding to the light-shielding area 293b. Degree (Rq = 18.7 nm) and maximum roughness (Rmax = 168 nm). Therefore, in the non-display area B, since the pixel operation voltage is not applied in the display area A during the operation, the roughness of the landform formed by the agglomerates in the light-shielding area 293a is used to increase the influence on the liquid crystal. The liquid crystal exhibits dark lines which are not poured in a specific direction in the light transmitting region 293a to thereby reduce light leakage. The 293b region of the light-shielding region is a light-shielding region, so the roughness of the landform formed by the agglomerate may be smaller than the roughness of the light-transmitting region 293a. The display area A has a pixel operating voltage due to its display, and the roughness is second to the roughness of the light-transmitting area 293a in the non-display area B. Therefore, the roughness (first square root roughness, first maximum roughness) of the light-transmitting region 293a is the largest, and the roughness of the display region A (third-party root roughness, third maximum roughness) is second, and the shading is performed. The roughness (second square root roughness, second maximum roughness) of the region 293b is smaller than the above two regions. Adjacent to the fourth surface roughness of the sealant 295, the illumination angle of the illumination sealant 295 can be adjusted, so that the fourth surface can be affected by more illumination light, so the fourth surface illumination time is longer than other regions. Therefore, the roughness of the fourth surface is larger than that of other regions.

綜上所述,雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識 者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。 In conclusion, the present invention has been disclosed in the above preferred embodiments, and is not intended to limit the present invention. General knowledge in the technical field to which the present invention pertains Various changes and modifications can be made without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

100‧‧‧顯示面板 100‧‧‧ display panel

110‧‧‧第一基板 110‧‧‧First substrate

120‧‧‧第二基板 120‧‧‧second substrate

130‧‧‧液晶層 130‧‧‧Liquid layer

140‧‧‧薄膜電晶體 140‧‧‧film transistor

150‧‧‧金屬走線 150‧‧‧Metal routing

160‧‧‧第一保護層 160‧‧‧First protective layer

161‧‧‧第二保護層 161‧‧‧Second protective layer

160s‧‧‧第一表面 160s‧‧‧ first surface

170‧‧‧第一配向層 170‧‧‧First alignment layer

180‧‧‧聚團物 180‧‧‧Congregation

190、290‧‧‧電極層 190, 290‧‧‧ electrode layer

270‧‧‧第二配向層 270‧‧‧Second alignment layer

290s‧‧‧第二表面 290s‧‧‧ second surface

291‧‧‧間隔元件 291‧‧‧ Spacer components

293‧‧‧遮光層 293‧‧‧Lighting layer

295‧‧‧框膠 295‧‧‧Box glue

297‧‧‧彩色濾光層 297‧‧‧Color filter layer

A‧‧‧顯示區 A‧‧‧ display area

B‧‧‧非顯示區 B‧‧‧Non-display area

Claims (12)

一顯示面板,包括:一第一基板,其中該第一基板具有至少一顯示區以及一非顯示區,該非顯示區位於該顯示區之外;一第二基板,相對該第一基板設置;一液晶層,位於該第一基板與該第二基板之間;複數個薄膜電晶體,位於該第一基板上;複數條金屬走線,位於該第一基板上;一保護層,至少覆蓋部分該些金屬走線;一第一配向層,位於該保護層上,且暴露該保護層之一第一表面;以及複數個聚團物(agglomerate),至少位於部分之該第一表面上。 A display panel includes: a first substrate, wherein the first substrate has at least one display area and a non-display area, the non-display area is located outside the display area; a second substrate is disposed opposite to the first substrate; a liquid crystal layer between the first substrate and the second substrate; a plurality of thin film transistors on the first substrate; a plurality of metal traces on the first substrate; a protective layer covering at least a portion of the a metal trace; a first alignment layer on the protective layer and exposing a first surface of the protective layer; and a plurality of agglomerates on at least a portion of the first surface. 如申請專利範圍第1項所述之顯示面板,其中該保護層係直接接觸該些薄膜電晶體以及該些金屬走線之至少其中之一。 The display panel of claim 1, wherein the protective layer directly contacts at least one of the thin film transistors and the metal traces. 如申請專利範圍第1項所述之顯示面板,其中該保護層包括一無機介電材料。 The display panel of claim 1, wherein the protective layer comprises an inorganic dielectric material. 如申請專利範圍第1項所述之顯示面板,其中該第一表面係對應該非顯示區。 The display panel of claim 1, wherein the first surface corresponds to a non-display area. 如申請專利範圍第1項所述之顯示面板,更包括複數個間隔元件,位於該第一基板與該第二基板之間且用於提供一間隙以設置該液晶層。 The display panel of claim 1, further comprising a plurality of spacer elements between the first substrate and the second substrate and for providing a gap to set the liquid crystal layer. 如申請專利範圍第1項所述之顯示面板,更包括:一電極層位於該第二基板上;以及一第二配向層位於該電極層上,且暴露該電極層之一第二表面;其中該些聚團物更位於至少部分之該第二表面上。 The display panel of claim 1, further comprising: an electrode layer on the second substrate; and a second alignment layer on the electrode layer and exposing a second surface of the electrode layer; The agglomerates are further located on at least a portion of the second surface. 如申請專利範圍第1項所述之顯示面板,其中該顯示面板更具有複數個奈米溝道(nanogroove),該些奈米溝道位於該非顯示區中之該些金屬走線的至少其中之一側。 The display panel of claim 1, wherein the display panel further has a plurality of nanogrooves, wherein the nanochannels are located in at least one of the metal traces in the non-display area One side. 如申請專利範圍第7項所述之顯示面板,其中該些奈米溝道位於該些金屬走線之至少一斜面(inclined surface)上。 The display panel of claim 7, wherein the nanochannels are located on at least one inclined surface of the metal traces. 如申請專利範圍第1項所述之顯示面板,更包括複數個次微米突起結構(submicron protrusion)位於該非顯示區中,其中該些次微米突起結構係沿該些金屬走線之至少其中之一延伸方向排列。 The display panel of claim 1, further comprising a plurality of submicron protrusions in the non-display area, wherein the sub-micron protrusion structures are along at least one of the metal traces Arrange in the direction of extension. 如申請專利範圍第1項所述之顯示面板,更包括:一遮光層,位於該第二基板上並對應於該非顯示區,該遮光 層具有一透光區與一遮光區,對應於該透光區的該些聚團物所產生的一第一表面平均粗糙度係大於對應於該遮光區的該些聚團物所產生的一第二表面平均粗糙度。 The display panel of claim 1, further comprising: a light shielding layer on the second substrate and corresponding to the non-display area, the shading The layer has a light transmissive region and a light shielding region, and a first surface average roughness generated by the agglomerates corresponding to the light transmissive region is greater than a corresponding one of the agglomerates corresponding to the light shielding region Second surface average roughness. 如申請專利範圍第10項所述之顯示面板,其對應於該透光區的該些聚團物所產生的該第一表面平均粗糙度係大於對應於該顯示區的該些聚團物所產生的一第三表面平均粗糙度,且該第三表面平均粗糙度係大於對應於該遮光區的該些聚團物所產生的該第二表面平均粗糙度。 The display panel of claim 10, wherein the first surface average roughness generated by the agglomerates corresponding to the light transmissive region is greater than the agglomerates corresponding to the display regions. A third surface average roughness is produced, and the third surface average roughness is greater than the second surface average roughness produced by the agglomerates corresponding to the light-shielding region. 如申請專利範圍第10項所述之顯示面板,更包括:一框膠,位於該第一基板與該第二基板之間,且位於該非顯示區的外圍區域,其中對應於鄰近該框膠的該些聚團物所產生的一第四表面平均粗糙度係大於對應於該顯示區的該些聚團物所產生的一第三表面平均粗糙度。 The display panel of claim 10, further comprising: a sealant between the first substrate and the second substrate, and located in a peripheral region of the non-display area, wherein the adjacent sealant is adjacent to the sealant The fourth surface average roughness produced by the agglomerates is greater than a third surface average roughness produced by the agglomerates corresponding to the display regions.
TW103101396A 2014-01-15 2014-01-15 Display panel TWI530742B (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
TW103101396A TWI530742B (en) 2014-01-15 2014-01-15 Display panel
EP14160692.1A EP2896989A1 (en) 2014-01-15 2014-03-19 Display panel
US14/592,926 US9817271B2 (en) 2014-01-15 2015-01-09 Display panel
KR1020150006339A KR20150085479A (en) 2014-01-15 2015-01-13 Display panel
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