TW201332605A - Particle beam irradiation system and charged particle beam correction method - Google Patents

Abstract

OF THE DISCLOSUREPARTICLE BEAM IRRADIATION SYSTEM AND CHARGED PARTICLE BEAM CORRECTION METHOD Provided is a particle beam irradiation system capable of enhancing the beam utilization efficiency without deteriorating the uniformity of the irradiation dose. A particle beam irradiation system, comprising a synchrotron in which an ion beam is accelerated and from which the ion beam is then extracted and an irradiation device for irradiating a target volume with the ion beam extracted from the synchrotron and performing one-unit irradiation multiple times, is equipped with: cumulative beam charge quantity measurement means which measures a cumulative beam charge quantity (Qmeas) in the synchrotron; target current setting means which sets a target beam current value (Ifb) for beam current extracted from the synchrotron based on the cumulative beam charge quantity (Qmeas) measured by the cumulative beam charge quantity measurement means; and extraction beam current correction control means which controls the beam current based on the target value (Ifb) of the extraction beam current determined by the target current setting means.

Description

Particle beam irradiation system and method for correcting charged particle beam

The present invention relates to a particle beam irradiation system and a method for correcting a charged particle beam, and particularly relates to a particle beam therapy device for treating cancer by irradiating a charged particle beam (ion beam) such as a proton or a heavy ion to an affected part. The particle beam irradiation system and the charged particle beam emission method.

As a radiation therapy for cancer, a particle beam treatment in which an ion beam such as a proton or a heavy ion is irradiated to a cancer affected part of a patient is known. As the irradiation method of the ion beam, there is a uniform scanning irradiation method disclosed in Patent Documents 1 to 3 and Non-Patent Documents 1 and 2.

[Previous Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent No. 2956292

[Patent Document 2] Japanese Patent Laid-Open Publication No. 2009-28500

[Patent Document 3] Japanese Patent No. 4,189,931

[Patent Document 4] Japanese Patent Laid-Open Publication No. 2010-238463

[Patent Document 5] Japanese Patent No. 4691583

[Non-patent literature]

[Non-Patent Document 1] MEDICAL PHYSICS 36 Series No. 8 (August 2009), pages 3560 to 3567 (MEDICAL PHYSICS VOLUME 36 NUMBER 8 (AUGUST 2009) P3560-3567)

[Non-Patent Document 2] REVIEW OF SCIENTIFIC INSTRUMENTS 64 Series No. 8 (August 1993), pages 2074 to 2093 (REVIEW OF SCIENTIFIC INSTRUMENTS VOLUME 64 NUMBER 8 (AUGUST 1993) P2074-2093)

In the uniform scanning irradiation method, it is necessary to prevent the beam from being depleted as a unit of irradiation in one unit of a specific range in order to maintain the same dose of the irradiation radiation. On the other hand, the amount of charge of the ion beam stored in the synchrotron is not constant, but varies depending on the current fluctuation of the ion beam supplied from the front accelerator.

When the amount of stored charge is less than one unit of irradiation, when the direct irradiation is performed, the beam is depleted on the way, and the dose of the irradiated radiation is decreased. Conversely, if the storage beam is not utilized with less than one unit of illumination, it is disadvantageous at the point of beam utilization efficiency.

SUMMARY OF THE INVENTION An object of the present invention is to provide a particle beam irradiation system which can improve the beam utilization efficiency without reducing the dose of the irradiation radiation.

A particle beam irradiation system is a particle beam irradiation system that has a synchrotron that accelerates an ion beam and emits the same, and an irradiation device that irradiates the ion beam emitted from the synchrotron, and irradiates one unit of light from the irradiation device a plurality of times. The utility model is characterized in that: a storage beam charge amount measuring means for measuring a stored beam charge amount (Q _meas ) in the synchrotron, and a stored beam charge amount measured according to the stored beam charge amount measuring means (Q _meas a target current setting means for setting a target beam current value (I _fb ) emitted from the synchrotron, and controlling the shot based on a target value (I _fb ) of the output beam current obtained from the target current setting means The beam current is corrected by the beam current correction control means.

According to the present invention, it is possible to provide a particle beam irradiation system which can improve the beam utilization efficiency without lowering the dose of the irradiation radiation.

A particle beam irradiation apparatus used for particle beam therapy includes an ion beam generating apparatus, a beam transport system, and an irradiation apparatus. The ion beam generating device has a synchrotron or a cyclotron that accelerates the ion beam rotating along the rotating orbit to a desired energy.

The synchrotron has a high-frequency acceleration device (acceleration cavity) that applies a high-frequency voltage to an ion beam that rotates along a rotating orbit, accelerates energy to a target, and increases an amplitude of an electron cyclotron vibration of the rotating ion beam. A high frequency electrode for injection and an output deflector for taking out an ion beam from a rotating orbit (for example, Patent Document 1). The ion beam that will accelerate to the target energy, when it is emitted from the synchrotron to the beam delivery system, A high frequency magnetic field or a high frequency electric field (hereinafter referred to as a high frequency signal) is applied by the high frequency electrode to increase the amplitude of the electron cyclotron vibration of the natural vibration of the rotating ion beam. The ion beam system with an increased amplitude of the electron cyclotron vibration moves outside the stability limit, is emitted from the synchrotron to the beam delivery system, and is then transported to the illumination device.

The irradiation device is shaped by blending the ion beam guided from the ion beam generating device with the depth of the body surface of the patient and the shape of the affected part, and irradiates the affected part of the patient on the treatment bed. There is a uniform scanning irradiation method as an irradiation method (page 3561 of Non-Patent Document 1, FIG. 1).

The uniform scanning irradiation method scans the ion beam on the irradiation plane by the scanning electromagnet, and the energy loss of the double-scattering body irradiation system of the diffused body of the two types of diffused radiation in the entire area of the irradiation surface is less. For this reason, there is a feature that the range of the ion beam can be longer than that of the double-scattered body.

The uniform scanning illumination device is composed of two scanning electromagnets (horizontal scanning electromagnets, vertical scanning electromagnets) for scanning the beam on the irradiation plane, and forming an ion beam scanned by the scanning electromagnet to match the thickness of the affected part in the depth direction. Absorbing the radiation dose range (expanded below the Spread-Out Bragg Peak, denoted as SOBP) energy absorber, and the cement soil and the light collimator which form the radiation field in accordance with the shape of the affected part. In the uniform scanning irradiation device, a swell filter is used for the energy absorber forming the SOBP (page 2078 of Non-Patent Document 2, FIG. 31). The ridge filter is a structure in which a plurality of wedge-shaped energy absorbers having different thicknesses in the range through which the ion beam passes, and a plurality of structures on the plane are arranged, and the beam passing through the ridge filter is adapted to the thickness of the passage portion of the ridge filter. Energy attenuation. The SOBP is formed by the overlapping of the ion beams that are attenuated by this energy.

In the uniform scanning irradiation method, as described in Non-Patent Document 2, after the suppression of the beam current value by the depression, the ion beam is repeatedly irradiated on the irradiation plane as a plurality of times (hereinafter, redrawn). The specific radiation dose is the same. Therefore, by controlling the beam current value at a certain value, the deterioration of the radiation dose on the illumination plane can be controlled to the same extent, and the number of re-rendering can be reduced to increase the radiation dose rate.

In addition, the scanning method of the beam by the uniform scanning irradiation method is demonstrated using FIG. The uniform scanning irradiation method is a single-round shaking method (for example, described in Patent Document 2), a spiral shaking method (for example, described in Patent Document 3), a raster scanning method (No. 3, 356, and FIG. 7), and Line scan method. As shown in FIG. 4(a), the single-circle shake method forms a flat degree by superimposing the Gaussian distribution of the scanned beam when the beam is irradiated by scanning a single circular scan of the electromagnet. The spiral oscillating method (not shown) is a scanning method designed to improve the beam utilization efficiency after the single-round shaking method is secured, and is scanned on the irradiation plane by superimposing the scanning trajectory which changes the initial phase. The raster scanning method is different from the shaking method previously shown, and as shown in Fig. 4(b), a method of continuously scanning a beam in a straight line. In addition, as shown in FIG. 4(c), in the raster scanning method, in the scanning in the short scanning direction of the irradiation, the irradiation of the beam is stopped, and the efficiency of use of the effective beam is improved.

Here, a beam scan necessary for one unit of irradiation will be described. First, the case where the range of beam scanning necessary for one unit of irradiation is referred to is a trajectory for scanning from the scanning start point to the end point. Figure 4 As shown, the single-round shaking method and the spiral rocking method (not shown) are the same point at the start and end points of the scan. In addition, the raster scanning method and the line scanning method are different from the scanning start point and the end point. The scan time necessary for one unit of illumination is tens of milliseconds to 100 milliseconds per scan, and is sufficiently short for the emission control time (about 0.5 seconds to several seconds) of the synchrotron.

Next, use the description of each document and explain the matters that need to be reviewed. In the uniform scanning irradiation method, it is preferable that the irradiation is performed until the end of the specific range until the end of the specific range in the emission control in order to maintain the irradiation dose. In Non-Patent Document 1, a cyclotron is employed as the ion beam generating device. In the case of a cyclotron, the ion beam supplied to the illumination device becomes a direct current beam. However, when a synchrotron is used for the ion beam generating device, the ion beam stored in the synchrotron is supplied to the irradiation device in accordance with the operation cycle of the synchrotron. Therefore, there is a problem that the ion beam stored in the synchrotron is exhausted by continuing to emit the controller. Therefore, when the storage beam of the synchrotron is depleted, after the emission control is stopped and the beam scanning control of the scanning electromagnet is stopped, it is necessary to continue the storage and emission control of the ion beam and the scanning electromagnet again from the next operation cycle. Beam scanning control.

Even if a stop condition of the beam irradiation accompanied by the exhaustion of the stored beam charge amount is generated, the current value of the ion beam supplied from the synchrotron to the irradiation device is lowered without affecting the radiation dose. When the re-rendering is performed 100 times, the deterioration of the radiation dose at the stop position of the beam irradiation is also suppressed (described in Non-Patent Document 1). 3562 pages). Therefore, it takes time to irradiate a specific amount of the radiation dose, and there is a problem that the treatment time becomes long.

Further, as means for suppressing temporal fluctuation of the ion beam supplied from the synchrotron, emission beam current feedback control is designed. The emission beam current feedback control system converts the ionization charge amount detected by the radiation dose display or the like provided in the illumination device into a current value of the ion beam, and corrects the amplitude value of the high frequency voltage for the injection to determine the current value and the target current. The deviation of the value is corrected to the desired beam current value. When the uniform beam irradiation method is applied to the injection beam current feedback control, the target beam current value is controlled by a certain value. However, the amount of charge of the ion beam stored in the synchrotron is known to be caused by variations in the current of the ion beam supplied from the accelerator before the synchrotron. Therefore, when the emission beam current feedback control is performed, the ion stored in the synchrotron is used for the amount of the emitted beam charge indicated by the product of the time required for one unit of illumination and the target current value of the emitted beam. When the amount of charge of the beam is reduced, the amount of stored beam charge is depleted, and the emission beam current feedback control is not performed, and the beam current waveform is defective for the second half of the emission control, and the radiation dose is deteriorated. .

In Patent Document 4, as a measure for suppressing beam depletion in emission control, after the control beam is emitted from the synchrotron, the stored beam charge amount is measured, and the stored beam charge amount is insufficient for one unit of irradiation. In the case of the amount of charge, it is described that it is converted into deceleration control. By implementing such a controller, although the beam is not exhausted in one unit of irradiation, the utilization efficiency of the beam charge stored in the synchrotron is low. Question.

Further, Patent Document 5 describes that the amount of stored beam charges is measured before the emission control, and the target value of the emission beam current feedback control is corrected. For the target value of the feedback control, a standard value for setting the stored charge amount of the ion beam of the pre-rotation synchrotron is described, and a comparison result of the stored beam charge amount and the stored charge amount standard value measured before the injection control of the synchrotron is described. And correct the content of the beam current value. In Patent Document 5, it is assumed that the charge amount of the stored ion beam is efficiently emitted by the primary emission control efficiency, and it is not assumed that the current value of the ion beam supplied to the irradiation device is lowered as in the case of the uniform scanning irradiation method. An irradiation method in which scanning is performed for a plurality of times.

In the embodiments of the present invention described below, even if the amount of stored beam charges in the synchrotron is varied, the beam is not depleted in one unit of irradiation, and the flatness of the irradiation dose can be ensured. In addition, by efficiently utilizing the amount of stored beam charge in the synchrotron, the time necessary for the irradiation of a specific radiation dose can be shortened, and the treatment time can be shortened.

However, each of the embodiments described below is a configuration of a uniform scanning irradiation method in which one unit of irradiation is performed from the irradiation device a plurality of times. One unit of illumination is performed multiple times, meaning that redrawing means that, in a typical manner, it means repeating the illumination of one side of an illumination plane. In each of the embodiments, the "irradiation of one side" of the uniform scanning irradiation method is expressed as "one unit of irradiation", and this is to clarify, as in Patent Document 5, only one side of the ion beam stored in the synchrotron. The difference in illumination.

[Example 1]

A particle beam irradiation system according to a preferred embodiment of the present invention will be described with reference to Figs. 1 and 2 and Fig. 3 . As shown in FIG. 1, the particle beam irradiation system 1 of the present embodiment includes an ion beam generating device 11, a beam transfer device 14, and a radiation field forming device (charged particle beam irradiation device, hereinafter referred to as an irradiation device) 30, The beam transport device 14 is connected to the ion beam generating device 11 and the irradiation device 30 disposed in the treatment room.

The control system of the particle beam irradiation system 1 is an accelerator control device 40 that controls the ion beam generating device 11 and the beam transport device 14, and collectively controls the collective control device 41 of the entire particle beam irradiation system 1, and plans a beam for the patient. The treatment plan device 43 of the irradiation condition stores the information of the plan of the treatment plan device 43 or the memory device 42 of the synchrotron 13 of the ion beam generating device and the control information of the beam transport device 14 to realize the synchrotron 13 The time control system 50 for synchronous control of the machine is constructed in a chain system 60 independent of the collective control device 41 for ensuring patient safety. Further, the high-frequency voltage for emitting the beam from the ion beam generating device 11 to the beam transport device 14 is controlled via the emission control device 20.

The ion beam generating device 11 includes an ion source (not shown), a front stage accelerator 12, and a synchrotron 13. The ion source is connected to the front stage accelerator 12, and the front stage accelerator 12 is connected to the synchrotron 13. The front stage accelerator 12 accelerates the ion beam 10 generated at the ion source to the energy that can be incident on the synchrotron 13. Accelerated by the front accelerator 12 The beamlet 10a is incident on the synchrotron 13.

Fig. 2(a) shows the change in the energy of the rotating beam during the operation period of the synchrotron 13, and Fig. 2(b) shows the change in the amount of the stored beam charge. The synchrotron 13 performs a series of operation control of incidence, acceleration, injection, and deceleration, and is implemented in a period of 2 seconds to 3 seconds. In addition, when the injection control is performed, the injection preparation control is performed in advance.

The beam 10b incident on the synchrotron 13 is accelerated to a desired energy by being energized via a high frequency voltage applied to an acceleration cavity (not shown). At this time, the rotation orbit of the ion beam 10b rotated in the synchrotron 13 is constant, and the magnetic field strength of the electromagnet 18 and the quadrupole electromagnet (not shown) is increased in accordance with the increase in the rotational energy of the ion beam 10b. And the number of frequencies applied to the high frequency voltage of the acceleration cavity.

The ion beam 10b that has been accelerated to the desired energy is controlled by the injection preparation, and the condition that the rotating beam 10b can be emitted by the amount of excitation of the quadrupole electromagnet and the six-pole electromagnet (not shown) (the stability of the rotating beam) The boundary conditions are established. After the completion of the injection preparation control, the high frequency voltage is applied from the injection control device 20 to the high frequency electrode 16 for injection, and the amplitude of the electron cyclotron vibration of the beam 10b rotated in the synchrotron 13 is increased. As a result of the increase in the vibration amplitude of the electron cyclotron, the rotating beam 10b exceeding the stability limit condition is emitted from the synchrotron 13 to the beam transport device 14, and is sent to the irradiation device 30. The beam emission control system from the synchrotron 13 can be realized at a high speed by the ON/OFF control applied to the high frequency voltage of the high frequency electrode 16 for output via the emission control device 20.

The stored beam charge amount 70 in the synchrotron 13 is changed in accordance with the operation sequence of the synchrotron 13 (Fig. 2(a)) as shown in Fig. 2(b). When the ion beam 10a is incident on the synchrotron 13, the amount of stored beam charge is gradually increased. In the initial stage of the acceleration control, the ion beam is lost due to the space charge effect or the like, and although the stored beam charge amount is attenuated, it is slightly constant from the middle of acceleration to the late stage of acceleration. The synchrotron 13 emits the ion beam 10b from the synchrotron 13 to a charge amount (Q _scan ) necessary for one unit of irradiation. When the irradiation of one unit is completed, the beam is stopped for the preparation of the movement of the scanning start point of the scanning electromagnet 32 of the irradiation device 30 to be described later. In response to the emission and stop of such a beam, the amount of beam charge (Q _loss ) remaining in the synchrotron 13 without being emitted to the emission control section is decelerated to a low energy and eliminated by the subsequent deceleration control.

The configuration of the irradiation device is shown in FIG. In the irradiation device 30, the scanning electromagnet 32 is scanned on the irradiation plane, and the radiation dose display 31 or the beam shape display (not shown) for measuring the irradiation dose of the beam 10d irradiated to the patient is sequentially confirmed. The radiation dose intensity or beam shape of the beam 10d. The beam 10d scanned by the scanning electromagnet 32 is formed by the energy absorber 33 to form a SOBP that matches the thickness in the depth direction of the affected part. The beam of the SOBP is formed, and the radiation pattern of the shape of the affected part is formed by the optical collimator 34 or the cement mold 35 which is matched with the inherent mold of the affected part shape 37 of the patient 36.

A method of controlling the high frequency voltage for injection in the injection control device 20 will be described with reference to Fig. 8 . The high frequency oscillator 21 outputs a high frequency signal corresponding to the center frequency number Fc of the high frequency voltage for emission controlled by the energy. The high-frequency signal output from the high-frequency oscillator 21 is mixed by the high-frequency mixer 221 and the band-limited high-frequency signal output from the band-limited high-frequency signal generating unit 22. Thereby, a frequency band limited high frequency signal having a center frequency number of Fc and a frequency number wide portion 2Fw is obtained. The frequency band-limited high-frequency signal of the frequency band is realized by the beam current feedback control circuit 24 at a beam current intensity waveform (target value of the beam current intensity) obtained by the target beam current correction calculation unit 29. The amplitude value of the frequency voltage. The beam current feedback control circuit 24 is composed of an amplitude modulator 23, a feedback loop gain adjuster 241, a feedback loop gain adjuster 242, an addition calculation circuit 243, and a high frequency switch 25. First, the deviation of the radiation dose display signal 311 detected by the radiation dose display 31 from the target beam current value (I _fb ) set by the target beam current correction calculation unit 29 is calculated by the feedback loop gain adjuster 241. The calculation result is fed back to the loop gain adjuster 241 to calculate the feedback correction signal according to the feedback loop gain. The amplitude modulation signal is corrected by adding the amplitude modulation signal (Am) and the feedback correction signal by the addition calculation circuit 243. The beam current feedback control is realized by setting the addition result to the amplitude modulator 23.

The high frequency signal that controls the amplitude value by the beam current feedback control circuit 24 is transmitted to the high frequency power amplifier 17 by the high frequency switch 26 controlled by the interlock system 60. The band-limited high-frequency signal system amplified by the high-frequency power amplifier 17 is applied to the high-frequency electrode 16 for emission. Increase rotation by a high frequency signal applied to the high frequency electrode 16 for injection The amplitude of the electron cyclotron vibration of the beam 10b in the synchrotron 13 is emitted from the synchrotron 13 from the beam transport device 14.

The calculation processing method of the target beam current constituting the target beam current correction calculation unit 29 of the emission control device 20, which is a feature of the present embodiment, will be described with reference to FIGS. 5, 6, 7, and 8. Fig. 5 shows the control preparation flow before the start of the irradiation control, and Fig. 6 shows the flow at the time of the beam irradiation control. Fig. 7 is a graph showing temporal changes in the target beam current value and the amount of stored beam charges accompanying the beam irradiation control in the control flow at the time of beam irradiation shown in Fig. 6. Figure 8 shows the construction of a feedback control system for the outgoing beam current.

The calculation setting flow of the target beam current value used for the injection beam current feedback control before the irradiation is described using FIG. 5. First, a method of setting the initial value of the target beam current value (I _fb ) used for the emission beam current feedback control before starting the irradiation treatment for the patient will be described. The treatment planning device 43 calculates the total irradiation radiation dose to the patient 36 of the patient 47, and registers it in the memory device 42. In the memory device 42, the conversion platform data for the amount of the irradiation charge of the irradiation radiation dose is prepared in advance. The collective control device 41 loads the total radiation dose calculated by the treatment planning device 43 in accordance with the irradiation conditions from the treatment scheduler (not shown), and the total radiation dose required to obtain the treatment planning device 43 is The necessary total amount of irradiation charge (Q _target ) is calculated from the conversion platform data prepared in advance by the collective control device 41. The collective control device 41 transmits the total irradiation charge amount (Q _target ) or the setting condition of the irradiation device to the irradiation control device 44, and the irradiation control device receives information such as the total irradiation charge amount (Q _target ) by the receiving signal means. .

The irradiation control device 44 calculates a reference beam current value (I _scan ) for one unit of irradiation based on the beam current control range that can be emitted from the synchrotron, and sets one unit of illumination according to the scanning speed of the scanning electromagnet 32. The necessary scan time (T _scan ) (801).

Next, the amount of charge (Q _scan ) necessary for one unit of irradiation and the number of times of re-rendering (Nr) (802) are calculated. The amount of charge (Q _scan ) necessary for one unit of illumination is as shown by (Formula 1), by multiplying the reference beam current value (I _scan ) of one unit of illumination with the scan time necessary for one unit of illumination. (T _scan ) and ask for it. Further, the number of times of re-rendering (Nr) is calculated as (Expression 2), and can be calculated by dividing the charge amount (Q _scan ) necessary for one unit of irradiation by the total amount of irradiation charge (Q _target ).

[Number 1] Q _scan =I _scan ‧T _scan ... (Formula 1)

The initial irradiation charge amount (Q _target ) is set as the initial irradiation charge amount (Q _rest ) for the irradiation range as initialization (803). The residual irradiation charge amount (Q _rest ) is a cumulative value (accumulated irradiation charge amount (Q _sum )) obtained by subtracting the amount of charge irradiated to the affected part from the total irradiation charge amount (Q _target ). Further, initializing (804) is performed by setting 0 to the cumulative irradiation charge amount (Q _sum ).

As the initial value of the target beam current value (I _fb ) of the emission beam current feedback control, the reference beam current value (I _scan ) of one unit of irradiation is set to the emission control device 20 (805). The above control flow (801 to 805) is carried out by the irradiation control device 44. However, the irradiation preparation control shown in FIG. 5 is performed only in the operation cycle at the start of irradiation of the patient, and is not performed in the second and subsequent operation cycles.

The beam irradiation control flow will be described using FIG. 6. The synchrotron 13 accelerates the beam incident from the front stage accelerator 12 to a specific energy (811). After the end of the beam acceleration control, the amount of stored beam charge (Q _meas ) stored in the synchrotron is counted (812). The measurement of the stored beam charge amount (Q _meas ) is measured using the stored beam charge amount detecting means 15 such as DCCT provided in the synchrotron 13. The measurement result of the stored beam charge amount (Q _meas ) is introduced into the emission control device 20, and the target beam current correction calculation unit 29 constituting the emission control device 20 performs the processing shown in the following control flow.

In the target beam current correction calculation unit 29, it is first determined whether or not the stored beam charge amount (Q _meas ) in the synchrotron 13 is depleted (813). The case where the stored beam charge is depleted (Q _meas ≦ 0) is transferred to the beam deceleration control (814).

When the amount of stored beam charge is not exhausted (Q _meas >0), the amount of residual irradiation charge (Q _rest ) and the amount of stored beam charge (Q _meas ) are compared, and the amount of charge set to the amount of comparative charge (Q _comp ) is determined. (815). The comparative charge amount (Q _comp ) is a charge amount which is a reference at the time of the correction control of the reference beam current value (I _scan ) of the irradiation of one unit to be described later. For the storage amount of beam charge (Q _meas) irradiating the case of the residual charge amount (Q _rest) of the plurality, for comparison based charge amount (Q _comp) set stored beam charge amount (Q _meas) (816), and for storage beam charge amount (Q _meas) in terms of the amount of charge remaining irradiation (Q _rest) is less the case, the system setting the residual charge amount of irradiation (Q _rest) (817) for comparing the amount of charge (Q _comp). That is, at least one of the residual irradiation charge amount (Q _rest ) and the stored beam charge amount (Q _meas ) is used as a comparative charge amount (Q _comp ).

Next, the comparison charge amount (Q _comp ) and the charge amount (Q _scan ) necessary for one unit of irradiation (818) are compared. The comparison charge amount (Q _comp ) is more than the charge amount (Q _scan ) necessary for one unit of irradiation (Q _comp ≧Q _scan ) is the target value of the emission beam current feedback control, and the target beam current value The correction of (I _fb ) is not implemented (819). In addition, the comparison charge amount (Q _comp ) is smaller than the charge amount (Q _scan ) necessary for one unit of irradiation (Q _comp <Q _scan ), and the target beam current value (I _fb ) is compared. The reference beam current value (I _scan ) of one unit of illumination is corrected for the small ground (820).

In this manner, the target beam current correction calculation unit 29 of the target current setting means determines the target value (I _fb ) of the beam current via the correction based on the reference beam current value (I _scan ) of one unit of irradiation. In addition, it is possible to appropriately adjust the fluctuation portion of the beam current caused by the front accelerator by correcting. In this embodiment, before performing one unit of illumination, it is successively confirmed whether or not the amount of charge necessary for one unit of irradiation is stored in the synchrotron, and the amount of stored beam charge in the synchrotron is small. The one that controls the value of the emitted beam current suppresses the depletion of the beam in one unit of illumination to ensure the same dose of the irradiated radiation.

The target beam current value (I _fb ) is as shown in (Formula 3), and the reference beam current value (I _scan ) to be irradiated in one unit is the amount of charge necessary for one unit of irradiation (Q _scan ). In other _words , the ratio of the charge amount (Q _comp ) is compared to the correction.

In this way, the comparison charge amount (Q _comp ) is used for the determination of the target value (I _fb ) of the target beam current by the target beam current correction calculation unit 29 of the target current setting means. Therefore, it is possible to appropriately set the beam current by improving the beam utilization efficiency without causing the beam to be depleted during irradiation. By efficiently utilizing the amount of stored beam charge in the synchrotron, the time necessary for the irradiation of a specific radiation dose can be shortened, and the treatment time can be shortened. When the beam depletion can be suppressed in one unit of irradiation, the beam current value at one unit of irradiation can be increased and the number of re-rendering can be reduced, thereby shortening the time necessary for irradiation of a specific radiation dose and shortening the treatment time. By.

According to the above-described target beam current value (I _fb ), the beam current feedback control circuit 24 of one part of the injection control device 20 performs the emission beam current feedback control, and the beam from the synchrotron 13 to the irradiation device 30 is carried out. Injection control (821). After the irradiation of one unit is completed, the amount of charge (822) irradiated to the cumulative amount of irradiation charge (Q _sum ) is added. At this time, the cumulative irradiation charge amount (Q _sum ) is added to the cumulative irradiation charge by multiplying the target beam current value (I _fb ) and one unit of scanning time (T _scan ) as shown in (Formula 4). The quantity (Q _sum ) is obtained. In conjunction with this, the amount of residual irradiation charge (Q _rest ) (823) is updated. The residual irradiation charge amount (Q _rest ) is obtained by subtracting the cumulative irradiation charge amount (Q _sum ) from the total irradiation charge amount (Q _target ) as shown in (Expression 5).

[Number 4] Q _sum = Q _sum + (I _fb ‧ T _scan ) (Expression 4)

[Number 5] Q _rest = Q _target -Q _sum ... (Equation 5)

Finally, the cumulative amount of irradiated charge (Q _sum ) and the total amount of irradiated charge (Q _target ) are compared (824). If the cumulative irradiation charge amount (Q _sum ) reaches the total irradiation charge amount (Q _target ) (Q _sum ≧Q _target ), the beam irradiation control is ended, and the cumulative irradiation charge amount (Q _sum ) does not reach the total irradiation charge amount ( In the case of Q _target ) (Q _{sum <} Q _target ), the flow returns to the control flow (812), and the beam irradiation control is continued.

Here, also for the features of the present embodiment, the reason for comparing the residual irradiation charge amount (Q _rest ) and the stored beam charge amount (Q _meas ) shown in the control flow (815) will be described below.

First, when the half time of the injection control time (T _ext ) of the synchrotron is reached, the stored beam charge amount (Q _meas ) becomes less than the amount of charge (Q _scan ) necessary for one unit of irradiation. When the injection control is continued in a state in which the stored charge amount (Q _meas ) is less than the charge amount (Q _scan ) necessary for one unit of irradiation, the beam is exhausted and the irradiation range is completed before the end of one unit of irradiation. The same dose of radiation causes deterioration. Therefore, in the past, the beam current value at the time of one unit of irradiation was lowered, and the number of times of re-rendering (Nr) was sufficiently obtained, and the influence of the unevenness of the radiation dose at the time of beam depletion was reduced. Therefore, the radiation dose rate is not increased and the treatment time is consumed.

Further, when it is the final stage of the beam irradiation control, the amount of residual irradiation charge (Q _rest ) becomes small. That is, it is close to the total amount of irradiation charge (Q _target ) that satisfies the necessary irradiation dose. In this state, close to the amount of charge (Q _scan ) necessary for one unit of irradiation, the amount of residual charge (Q _rest ) becomes the amount of charge necessary for one unit of irradiation (Q _rest ). _Scan ) is small. In the prior art, as shown in Patent Document 4, the storage beam charge amount (Q _meas ) is shifted to the deceleration control when the charge amount (Q _scan ) necessary for one unit of irradiation is small. Therefore, the storage beam charge amount (Q _meas ) which is less than the charge amount (Q _scan ) necessary for one unit of irradiation is not decelerated by irradiation, and the beam utilization efficiency is not improved.

In response to these two conditions, the correction of the target beam current value (I _fb ) at the time of the emission beam current feedback control is performed (820), and the residual irradiation charge amount (Q _rest ) and the stored beam charge amount (Q) _{When any of the meas} ) is corrected as the comparative charge amount (Q _comp ), the radiation dose is the same, and the radiation dose rate can be increased with the improvement of the beam utilization efficiency, and the treatment time can be shortened.

The temporal change of the target beam current value at the time of beam irradiation control of the control flow at the time of beam irradiation and the amount of stored beam charge accompanying this will be described using FIG. In the present embodiment, when the storage beam charge amount (Q _meas ) is measured and output control is performed five times in the emission control time (T _ext ), the amount of residual irradiation charge (Q _rest ) is determined to be sufficiently large.

After the acceleration control of the synchrotron 13 is completed, the stored beam charge amount is detected by the stored beam charge amount detecting means 15 provided in the synchrotron 13 (Fig. 7(b)). 7(a)). At this time, the beam charge amount Q _meas 1 is stored. The amount of charge stored in the beam is higher than the amount of charge (Q _scan ) necessary for one unit of illumination, and the amount of comparison charge (Q _comp ) is used as a correction for Q _meas 1, target beam current value (I _fb ) It is not implemented. Therefore, the target beam current value (Fig. 7(c)) is the reference beam current value (I _scan ) of the irradiation unit of one of the initial setting values.

According to the beam emission control signal (Fig. 7(d)), the emission control according to the emission beam current feedback control is started. As a result, the beam 10d for supplying a constant current to the irradiation device 30 confirms the beam current value (I _dose ) converted by the detection signal on the radiation dose display 31 (Fig. 7(e)). After the beam irradiation of one unit of scanning time ( _Tscan ) is completed, the beam emission control is stopped, and the amount of stored beam charges is measured. In the present embodiment, the beam emission measurement is repeated three times in the same manner (Q _meas 2 to 4).

The stored beam charge amount (Q _meas ) is measured based on the confirmation signal of the fifth stored beam charge amount. At this time, the stored beam charge amount Q _meas 5 is smaller than the charge amount (Q _scan ) necessary for one unit of irradiation, and the comparative charge amount (Q _comp ) is taken as Q _meas 5, the target beam current value. The correction of (I _fb ) is necessary. Therefore, the correction of the target beam current value (I _fb ) is carried out according to (Formula 3), and the target beam current value (I _fb ) is compared with the reference beam current value (I _scan ) of one unit of illumination. Set for the low ground. The emission control by the emission beam current feedback control is performed in accordance with the target beam current value (I _fb ), and the beam current value (I _dose ) converted from the radiation dose display detection signal is irradiated.

Next, an operation method of the particle beam irradiation apparatus to which the present embodiment is applied will be described with reference to Fig. 8 . The physician inputs the patient information (the position and size of the affected part, the direction of the beam irradiation, and the maximum exposure depth) to the treatment planning device 43. The treatment planning device 43 uses the treatment planning software to calculate the SOBP width, the radiation field size, and the target radiation dose for the affected part, which are necessary for the treatment, based on the input patient information.

The result calculated by the treatment planning device 43 is recorded in the memory device 42. The collective control device 41 transmits the total irradiation charge amount (Q _target ) or the irradiation condition to the irradiation control device 44 in accordance with the irradiation conditions from the treatment scheduler (not shown). The irradiation control device 44 selects the setting conditions of the devices constituting the irradiation device, and cooperates with the emission control device 20 to transmit the total irradiation charge amount (Q _target ) or the reference beam current value (I _scan ) of one unit of irradiation. The scan time (T _scan ) necessary for one unit of irradiation, the amount of charge necessary for one unit of irradiation (Q _scan ), the number of times of re-rendering (Nr), and the like. The calculation of the amount of charge (Q _scan ) necessary for one unit of irradiation, which is characteristic of the present embodiment, is performed by the irradiation control device 44 based on information from the treatment planning device 43.

The treatment plan information is displayed on a display device (not shown) disposed in a control room of the treatment room where the treatment is prepared. The radiation technician confirms the display screen and arranges the energy absorber 33 designated by the display in the irradiation device 30.

The treatment bed control device (not shown), via an instruction from the collective control device 41, moves the patient's treatment bed to the treatment bed, and determines the position such that the affected part of the patient is located on the extension line (irradiation target) of the beam axis.

The accelerator control device 40 determines the irradiation beam energy from the treatment plan information from the collective control device 41, and sets the operation control parameters of the synchrotron 13 and the devices constituting the beam transport device 14. The emission control device 20 sets the center frequency number Fc, the frequency number width Fw, the amplitude modulation data Am, and the feedback gain Gfb of the operation control parameter of the high frequency signal for emission, in accordance with the energy of the emission beam.

The physician instructs the irradiation start signal to the collective control device 41 from the operation panel in the aforementioned control room. The front accelerator 12 accelerates an ion beam generated by an ion source (for example, a proton (or a heavy particle such as carbon ions)) according to an irradiation start instruction, and supplies it to the synchrotron 13.

The synchrotron 13 rotates the ion beam 10a incident from the front stage accelerator in the synchrotron 13 while accelerating to the desired energy. After the ion beam 10b is accelerated to the target beam energy, the stored beam charge amount confirmation signal 501 is output from the time system 50, and the stored beam charge amount detecting means 15 measures the stored beam charge amount (Q _meas ). The target beam current value (I _fb ) of the output beam current feedback control circuit 24 is set by the target beam current correction calculation unit 29 based on the stored beam charge amount (Q _meas ). Thereafter, when the high frequency signal for emission is applied to the high frequency electrode 16 for emission via the beam emission control signal 502 outputted from the time system 50, the emission from the synchrotron 13 is controlled in accordance with the target beam current value (I _fb ). The beam.

However, in the present embodiment, the detection of the stored beam charge amount will correspond to the detection of the stored beam charge amount of the first unit of illumination, based on the stored beam charge amount confirmation signal 501 output from the time system 50. And the detection, and the subsequent unit storage beam charge amount confirmation signal 501 is used as the starting point from the input of the beam emission control signal 502 input from the time system 50, according to one unit of scanning time (T _scan ) and illumination The stop time (T _off ) is detected based on the signal calculated by the injection control device 20, but the external beam of the emission control device 20 such as the illumination control device 44 generates a stored beam charge amount confirmation signal corresponding to all the illumination surfaces. The 501 device has no effect.

Further, in the beam injection control system of the present embodiment, the beam emission control signal 502 from the time system 50 is input to the emission control device 20, and the target beam current correction calculation unit 29 is terminated by the irradiation of each unit. When the high frequency switch 25 is turned on in accordance with the beam emission control signal 252, the supply of the beam from the synchrotron 13 to the irradiation device 30 is stopped during the irradiation stop time (T _off ) between the irradiations of one unit.

The ion beam 10c emitted from the synchrotron 13 passes through the beam transport device 14 and reaches the irradiation device 30. Further, along the beam path in the irradiation device 30, the ion beam 10d is performed, the scanning electromagnet 32 scans the ion beam 10d, and the energy absorber 33 forms SOBP, and is irradiated to the affected part of the patient.

The radiation dose of the ion beam irradiated to the affected part is measured by the radiation dose display 31. The detection signal 311 at the radiation dose display 31 is input to the outgoing beam current feedback control circuit 24, which is based on the deviation of the target beam current value (I _fb ) from the detected beam current value (I _dose ) of the radiation dose display 31. The amplitude control value of the high frequency voltage is corrected by feedback, and the emission beam current is controlled to a constant value.

When the irradiation for one unit of the affected part is completed, the beam emission control is stopped, the amount of excitation of the scanning electromagnet is returned to the irradiation start position, and the cumulative irradiation charge amount (Q _sum ) is recorded. After that, the amount of stored beam charge is measured. The target beam current value is corrected by the measurement result, and one unit of irradiation is started again. In response to such control, the cumulative amount of irradiation charge (Q _sum ) reaches the total amount of irradiation charge (Q _target ) to illuminate the beam.

However, in the machine constituting the particle beam irradiation system 1, any obstacle condition that hinders the beam irradiation to the patient is generated in the irradiation control, and the interlocking system 60 displays a signal (abnormal signal) 601 indicating that the machine state is abnormal, and collectively The control device 41 outputs the interlocking high frequency switch 26 to the injection control device 20 in parallel. The injection control device 20 receives the signal from the abnormal signal 601 from the interlocking system 60 as a beam emission stop command, and immediately turns on the interlocking high frequency switch 26. When the interlocking high frequency switch 26 is turned on, the application of the high frequency signal for emission to the high frequency electrode 16 is stopped. Thereby, the synchrotron 13 can realize interlocking control for stopping the emission of the ion beam 10b.

According to the present embodiment, the effects shown below can be obtained.

(1) In the present embodiment, in the irradiation range, the scanning range of one unit is managed from the irradiation start position to the end position, and the scanning range of one unit is managed as the irradiation unit. And, before starting the beam irradiation for the irradiation range of the unit, the stored beam charge amount (Q _meas ) in the synchrotron 13 is measured successively, in view of the amount of charge (Q _scan ) necessary for one unit of irradiation. The beam charge amount (Q _meas ) is stored, and the target beam current value emitted from the synchrotron 13 is controlled by the target beam current correction calculation unit 29 correcting the target beam current value of the output beam current feedback control circuit 24. Thereby, it is possible to suppress a unit of exhausted person who generates the amount of stored beam charges in the synchrotron 13 during irradiation.

(2) In the present embodiment, as previously described, before the irradiation of one side, the stored beam charge amount in the synchrotron 13 is sequentially measured, and the target beam current value of the exit beam current feedback control is corrected in accordance with the measurement result. Therefore, there is no depletion in the irradiation on one side. Therefore, as in the past, it is considered that the radiation dose at the time of storing the beam charge amount on the way is deteriorated as much as the depletion, and it is not necessary to reduce the target beam current value of the emission beam current feedback control. Thereby, the target beam current value of the injection beam current feedback control when the irradiation is performed on one side can be increased, and the radiation dose rate can be increased, and the treatment time can be shortened.

(3) In the present embodiment, it is not necessary to sequentially monitor the exhaustion of the stored beam charge amount 70, and the beam emission control and the beam scanning control are not required to be accompanied by the exhaustion of the stored beam charge amount 70. The configuration and control method of the control device constituting the particle beam irradiation system can be simplified. In the system in which the stored beam charge amount 70 in the synchrotron 13 is sequentially monitored in the irradiation side, the beam 10b is depleted, and the emission control by the scanning electromagnet 32 is stopped while the emission control of the beam 10b is stopped. Scan control. After that, it is shot again by the synchrotron 13 After the ‧ accelerating beam, it is then necessary to start beam emission control from the synchrotron 13 and beam scanning control by the scanning electromagnet 32.

[Embodiment 2]

A second embodiment of the present invention is shown. The machine configuration of the present embodiment is the same as that of the first embodiment, but the correction method of the target beam current value (I _fb ) by the target beam current correction calculation unit 29 is different.

The irradiation control flow of the beam will be described using FIG. The difference from FIG. 6 replaces the correction control of the target beam current value (I _fb ) according to the comparative charge amount (Q _comp ) (818 to 820 of FIG. 6), and sets the target shot according to the amount of advance irradiation charge (Q _carry ). The pre-correction control of the beam current value (I _fb ) (825 to 828 of Fig. 9).

In the case of the first embodiment, the stored beam charge amount (Q _meas ) decreases as the emission control time (T _ext ) of the synchrotron passes. Further, when it is half time after the emission control time (T _ext ), it is considered that the amount of stored beam charge (Q _meas ) is extremely small for the charge amount (Q _scan ) necessary for one unit of irradiation. In the case where the irradiation control is continued and the amount of residual irradiation charge (Q _rest ) is small, the necessity of irradiation with only a small amount of charge is similarly generated. Therefore, in order to effectively utilize the stored beam charge amount (Q _meas ) or to satisfy the total irradiation charge amount (Q _target ), it is necessary to perform one unit of irradiation control.

The processing is such that the amount of beam charge (Q _meas ) stored in the synchrotron 13 after the end of the acceleration control does not become an integral multiple of the amount of charge (Q _scan ) necessary for one unit of illumination, and is generated every time. The operating cycle of the subsynchronous accelerator.

Therefore, in the present embodiment, after setting the comparison charge amount (Q _comp ) (the control flow of 815 to 817 in Fig. 9), the amount of advance irradiation charge (Q _carry ) (825) shown in (Expression 6) is calculated.

[Number 6] Q _carry = Q _comp -Q _scan ... (Equation 6)

The amount of advance irradiation charge (Q _carry ) shown in (Formula 6) is obtained by subtracting the amount of charge (Q _scan ) necessary for one unit of irradiation from the comparative charge amount (Q _comp ). The amount of pre-irradiation charge (Q _carry ) is compared with the amount of charge necessary for one unit of illumination (Q _scan ) (826).

The amount of charge in advance (Q _carry ) is less than the amount of charge necessary for one unit of irradiation (Q _scan ) (Q _carry ≦Q _scan ), and the target current value is not corrected (827), and the pre-illumination is performed. The amount of charge (Q _carry ) is greater than the amount of charge (Q _scan ) necessary for one unit of irradiation (Q _carry >Q _scan ), and the target current value shown in (Expression 7) is corrected in advance ( 828).

The amount of charge (Q _carry ) is the amount of comparison charge (Q _comp ) determined from the correction of the target current value in the first embodiment, and the amount of charge necessary for one unit of irradiation (Q _scan ) is subtracted. By. That is, the necessary illumination for two deduction of one unit of the charge amount (Q _scan) are stored beam charge amount (Q _meas) is necessary for the irradiation of a unit amount of charge (Q _scan) is less than two terms In the case of the division, the amount of stored beam charges (Q _meas ) is irradiated in advance by one irradiation, and the irradiation time can be shortened.

The above system can also be used to compare the charge amount (Q _scan ) necessary for one unit of irradiation as a double and a comparative charge amount (Q _comp ). For the case where the comparative charge amount (Q _comp ) is less than twice the amount of charge necessary for one unit of irradiation (Q _scan ), the target beam current value (I _fb ) is more than one unit of illumination. The necessary beam current value (I _scan ) is the earth correction, and the irradiation time can be shortened by the early irradiation. Specifically, as shown in (Expression 7), the target beam current value (I _fb ) is taken as the stored beam charge amount (Q _meas ), which is divided by the scan time (T _scan ) necessary for one unit of irradiation. By.

In this way, as a criterion for judging whether or not the correction is made, the comparison of the amount of charge (Q _comp ) and the amount of charge (Q _scan ) necessary for one unit of irradiation makes it possible to store the amount of beam charge (Q _meas ). Appropriate control. That is, as in the case of the first embodiment, the amount of charge ( _Qcomp ) is smaller than the amount of charge (Q _scan ) necessary for one unit of irradiation, and the beam is exhausted while avoiding the irradiation. Control of the composition of the beam efficiency. Further, as shown in the second embodiment, when the comparative charge amount (Q _comp ) is moderately higher than the charge amount (Q _scan ) necessary for one unit of irradiation, the irradiation time can be shortened by the advance irradiation. . A criterion for judging the judgment criteria of the first embodiment and the judgment criterion of the second embodiment may be employed. This situation can enjoy the advantages of both.

However, in the second embodiment, the amount of charge (Q _scan ) necessary for one unit of irradiation is compared as a doubled amount and a comparative charge amount (Q _comp ), but if it is not twice as large as 1 times, the same can be obtained. Effect. It must be determined as a multiple of the amount of charge that can be irradiated by a unit of radiation. For the second half of the injection control time, the amount of stored beam charge in the synchrotron is greater than the amount of charge necessary for one unit of illumination, such as when the beam is irradiated at one end by the means of irradiating the charge amount, Dividing into two irradiation beams can shorten the time necessary for the irradiation of a specific radiation dose, and can shorten the treatment time.

The temporal change of the target beam current value at the time of beam irradiation control by the control flow at the time of beam irradiation and the amount of stored beam charge accompanying this will be described using FIG. For ease of explanation, the stored beam charge amount (Q _meas 1) after the end of the acceleration control of FIG. 10 and the charge amount (Q _scan ) necessary for one unit of irradiation are the same as in FIG. 7.

In Fig. 10, in the first to third measurement (Q _meas 1 to Q _meas 3) of the stored beam charge amount, although the advance irradiation is not performed, the fourth measurement (Q _meas 4) is performed. In the case of performing the pre-illumination, the amount of charge of the sub-irradiation of FIG. 7 is divided into one pre-irradiation. Therefore, compared with FIG. 7, the target beam current value (I _fb ) of the fourth irradiation is higher than the reference beam current value (I _scan ) of one unit of irradiation, and the fifth irradiation is performed. The control system is not implemented, and by shifting to the deceleration controller, the irradiation time can be shortened by the amount of scanning time (T _scan ) of one unit and the irradiation stop time (T _off ) between irradiations of one unit.

According to the present embodiment, the stored beam charge amount (Q _meas ) after the end of the acceleration control is not an integral multiple of the charge amount (Q _scan ) necessary for one unit of irradiation, and is relatively advanced by the irradiation of the unit. When the amount of charge necessary for one unit of irradiation (Q _scan ) is a small amount of stored beam charge, the irradiation time can be shortened. Such advance processing is caused by the operation cycle of each synchrotron, and the effect of shortening the irradiation time is large, and the treatment time can be shortened.

Thus, in the latter half of the injection control time, the amount of stored beam charge in the synchrotron is greater than the amount of charge necessary for one unit of illumination, and the split radiation beam can be divided into two irradiation beams. The means for advancing the amount of charge, in order to complete the beam irradiation at one time, can shorten the time necessary for the irradiation of a specific radiation dose, and can shorten the treatment time.

In the particle beam irradiation system of each of the embodiments described above, the irradiation control device 44 calculates a beam current value (I _scan ) necessary for one unit of irradiation, and the stored beam charge amount measuring means measures the inside of the synchrotron The stored beam charge amount (Q _meas ), and the target current setting means is set from the synchrotron by correcting the beam current value (I _scan ) necessary for one unit of illumination according to the stored beam charge amount (Q _meas ). The target beam current value (I _fb ) is emitted, and the emission control device 20 having the emission beam current correction control means corrects the charged particles by controlling the beam current according to the target beam current value (I _fb ). Beam. By correcting the charged particle beam in this manner, it is possible to realize a particle beam irradiation system which can improve the beam utilization efficiency without lowering the dose of the irradiation radiation.

1‧‧‧Particle line illumination system

10a, 10b, 10c, 10d‧‧‧ beam

11‧‧‧Ion Beam Generator

12‧‧‧Front accelerator

13‧‧‧Synchronization accelerator

14‧‧‧beam conveyor

15‧‧‧Storage beam charge detection means

16‧‧‧High frequency electrode

17‧‧‧High frequency power amplifier

18‧‧‧ biased electromagnet

20‧‧‧Injection control device

21‧‧‧High frequency oscillator for injection (high frequency oscillator)

22‧‧‧ Band-limited high-frequency signal generation unit

23‧‧‧Amplitude Modulator

24‧‧‧Ball current feedback control circuit

25,26‧‧‧High frequency switch

27‧‧‧High frequency signal processing unit for injection

29‧‧‧Target beam current correction calculation department

30‧‧‧ illumination device

31‧‧‧radiation dose display

32‧‧‧Scan electromagnet

33‧‧‧ energy absorber

34‧‧‧Light collimator

35‧‧‧Block soil

36‧‧‧ patients

37‧‧‧ shape of the affected part

38‧‧‧beam scanning path

40‧‧‧Accelerator control unit

41‧‧‧General control unit

42‧‧‧ memory device

43‧‧‧ treatment plan device

44‧‧‧Emission control device

50‧‧‧ time system

60‧‧‧Chain system

221‧‧‧High frequency mixer

241,242‧‧‧Return loop gain adjuster

243‧‧‧Additional calculation circuit

252‧‧‧beam emission control signal

311‧‧‧radiation dose display detection signal

501‧‧‧Storage beam charge confirmation signal

502‧‧‧beam emission control signal

Q _target ‧‧‧ total exposure charge

Q _scan ‧‧‧The amount of charge necessary for one unit of exposure

Q _rest ‧‧‧residual exposure charge

Q _sum ‧‧‧ cumulative exposure charge

Q _meas ‧‧‧Storage beam charge

Q _comp ‧‧‧Comparative charge

Q _carry ‧‧‧Advance charge

Q _ext ‧‧‧The amount of injected beam charge from the synchrotron

T _ext ‧‧‧ injection control time

T _scan ‧‧‧ one unit scan time

T _off ‧‧‧Illumination stop time between exposures of one unit

Nr‧‧‧ repainting times

N _scan ‧‧‧ the number of exposures per unit during the injection control time

I _scan ‧‧‧ reference beam current value in one unit of illumination

I _fb ‧‧‧target beam current value

I _dose ‧‧‧beam current value

Fig. 1 is a view showing the configuration of a particle beam irradiation system of an embodiment of the present invention.

Fig. 2 is a graph showing the change in energy of the rotating beam and the change in the amount of stored beam charge during the operation period of the synchrotron in the embodiment of the present invention.

Fig. 3 is a view showing the configuration of an irradiation apparatus of an embodiment of the present invention.

Fig. 4 is a view showing a scanning path of a beam in a uniform scanning irradiation method according to an embodiment of the present invention.

Fig. 5 is a flow chart showing the control preparation before the start of the irradiation control of the embodiment of the present invention.

Fig. 6 is a view showing the flow at the time of beam irradiation control of the embodiment of the present invention.

Fig. 7 is a graph showing temporal changes in the target beam current value and the amount of stored beam charges accompanying the beam irradiation control flow of the beam irradiation control flow according to the embodiment of the present invention.

Fig. 8 is a view showing the configuration of a feedback control system for the injection beam current of the embodiment of the present invention.

Fig. 9 is a flow chart showing the irradiation control of the beam in which the advance irradiation control of the embodiment of the present invention is added.

Fig. 10 is a view showing temporal changes in the target beam current value and the accompanying stored beam charge amount in the beam irradiation control by the irradiation control flow of the beam of the advance irradiation control according to the embodiment of the present invention.

11‧‧‧Ion Beam Generator

1‧‧‧Particle line illumination system

12‧‧‧Front accelerator

10a, 10b, 10c, 10d‧‧‧ beam

18‧‧‧ biased electromagnet

13‧‧‧Synchronization accelerator

15‧‧‧Storage beam charge detection means

16‧‧‧High frequency electrode

17‧‧‧High frequency power amplifier

60‧‧‧Chain system

42‧‧‧ memory device

43‧‧‧ treatment plan device

41‧‧‧General control unit

50‧‧‧ time system

20‧‧‧Injection control device

40‧‧‧Accelerator control unit

44‧‧‧Emission control device

29‧‧‧Target beam current correction calculation department

27‧‧‧High frequency signal processing unit for injection

22‧‧‧ Band-limited high-frequency signal generation unit

24‧‧‧Ball current feedback control circuit

26‧‧‧High frequency switch

221‧‧‧High frequency mixer

21‧‧‧High frequency oscillator for injection (high frequency oscillator)

30‧‧‧ illumination device

32‧‧‧Scan electromagnet

31‧‧‧radiation dose display

36‧‧‧ patients

14‧‧‧beam conveyor

Claims (9)

A particle beam irradiation system is a particle beam irradiation system that has a synchrotron that accelerates an ion beam and emits the same, and an irradiation device that irradiates the ion beam emitted from the synchrotron, and irradiates one unit of light from the irradiation device a plurality of times. The method is characterized in that: a storage beam charge amount measuring means for measuring a stored beam charge amount in the synchrotron, and an output beam charge from the synchronous accelerator according to the stored beam charge amount measured by the stored beam charge amount measuring means The target current setting means of the target beam current value and the emission beam current correction control means for controlling the beam current based on the target beam current value obtained from the target current setting means. The particle beam irradiation system according to the first aspect of the invention, comprising: a receiving signal means for receiving a total amount of irradiation charges necessary for the plurality of irradiations, and an emission control means for calculating a cumulative amount of irradiation charges; The amount of the residual irradiation charge minus the amount of the accumulated irradiation charge and the amount of the stored beam charge is smaller than the total amount of the irradiation charge, and the target beam current is passed through the target current setting means. The target value is determined by using the aforementioned comparative charge amount. A particle beam irradiation system as described in claim 2, And an irradiation control device for calculating a charge amount necessary for one unit of irradiation, wherein the target current correction means compares the comparison charge amount with a charge amount necessary for the one unit irradiation as a criterion for determining whether or not to correct the correction Value. The particle beam irradiation system according to the second or third aspect of the invention, further comprising: an illumination control device for calculating a beam current value necessary for one unit of irradiation, wherein the target current setting means is for the one unit The beam current value required for the irradiation is a reference, and the target value of the beam current is determined by the correction. The particle beam irradiation system according to any one of claims 2 to 4, wherein the target current setting means is such that the amount of charge required for the irradiation of the one unit is smaller than the amount of charge of the one unit. And correcting the target beam current value to be smaller than a beam current value necessary for the one unit of the irradiation. The particle beam irradiation system according to claim 5, wherein the target beam current value is a beam current value necessary for the irradiation of the one unit, and the charge value necessary for the irradiation of the one side is The ratio of the aforementioned comparative charge amount is corrected. The particle beam irradiation system according to any one of claims 2 to 6, wherein the target current correction means is twice the amount of charge necessary for the irradiation of the one unit for the comparative charge amount. In a rare case, the target beam current value is corrected to be larger than the beam current value necessary for the irradiation of one unit. The particle beam irradiation system according to claim 7, wherein the target beam current value is a value obtained by dividing the stored beam charge amount by a scan time necessary for one unit of irradiation. A method for correcting a charged particle beam of a particle beam irradiation system, comprising: a synchrotron that accelerates an ion beam and emits the same, and an irradiation device that irradiates the ion beam emitted from the synchrotron, and performs one unit from the irradiation device; A method for correcting a charged particle beam of an irradiated particle beam irradiation system, wherein the characteristic illumination control device calculates a beam current value necessary for one unit of irradiation, and the stored beam charge amount measuring means measures the storage shot in the synchrotron The amount of beam charge, the target current setting means sets a target beam current value emitted from the synchrotron by correcting a beam current value necessary for the one unit of irradiation in accordance with the stored beam charge amount, the outgoing beam The current correction control means controls the beam current based on the aforementioned target beam current value.