TW201031694A - Shaping method - Google Patents
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- TW201031694A TW201031694A TW98138851A TW98138851A TW201031694A TW 201031694 A TW201031694 A TW 201031694A TW 98138851 A TW98138851 A TW 98138851A TW 98138851 A TW98138851 A TW 98138851A TW 201031694 A TW201031694 A TW 201031694A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/32—Component parts, details or accessories; Auxiliary operations
- B29C43/36—Moulds for making articles of definite length, i.e. discrete articles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/32—Component parts, details or accessories; Auxiliary operations
- B29C43/52—Heating or cooling
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2011/00—Optical elements, e.g. lenses, prisms
- B29L2011/0016—Lenses
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
201031694 六、發明說明: 【發明所屬之技術領域】 本發明係關於造形例如具有由非球面形狀所成之透鏡 部的透鏡陣列等透鏡、或使用於如此透鏡成形的型等造形 物之造形方法。 【先前技術】 φ 專利文獻1係揭示使用具有形成透鏡形狀之面的金屬 模具之微透鏡陣列的製造方法,其含有藉由前述金屬模具 於第1基板上將第1樹脂硬化爲前述透鏡形狀而形成複數 透鏡基板之步驟、與將前述透鏡基板配列爲陣列狀之步驟 、與形成具有於前述陣列狀透鏡基板上進行銨敷形成前述 透鏡形狀的面的面罩之步驟、與於形成前述面罩之透鏡形 狀的面上進行鍍敷形成母模版(mother )之步驟、與藉由 前述母模版形成成形型之步驟、與藉由前述成形型於第2 φ 基板上將第2樹脂硬化爲前述透鏡形狀之形成步驟、與藉 由乾蝕刻將前述第2樹脂除去的同時除去前述第2基板的 一部份的步驟之微透鏡陣列的製造方法。 又,專利文獻2中揭示,藉由將母壓模版(mother stamper )的表面之微細圖型依序轉印之微細結構體的製造 方法,其爲含有(1)對於基板將前述母壓模版固定於所 定位置的步驟、與(2)於前述母壓模版與前述基板之間 供給樹脂的步驟、與(3)真空中將前述母壓模版壓著於 前述樹脂之步驟、與(4)硬化前述樹脂之步驟、與(5) -5- 201031694 將前述母壓模版自前述硬化樹脂脫離之步驟、與(6)如 變更前述母壓模版與前述基板之相對位置’移動前述母壓 模版或前述基板的步驟、與(7)前述步驟(6)之後’重 複步驟(2)〜步驟(6)之所定次數的步驟。 〔專利文獻1〕特開2005-4 1 1 25號公報 〔專利文獻2〕特開2〇〇3-94445號公報[Technical Field] The present invention relates to a method of forming a lens such as a lens array having a lens portion formed of an aspherical shape, or a shape for forming such a lens. [Prior Art] φ Patent Document 1 discloses a method of manufacturing a microlens array using a metal mold having a lens-shaped surface, which comprises curing a first resin onto the first substrate by the metal mold to form the lens shape. a step of forming a plurality of lens substrates, a step of arranging the lens substrates in an array, a step of forming a mask having a surface for performing ammonium coating on the array lens substrate, and a lens for forming the mask a step of forming a mother plate on the surface of the shape, a step of forming a shape by the mother die, and a step of curing the second resin into the lens shape by the molding type on the second φ substrate. a forming method and a method of manufacturing a microlens array in which a part of the second substrate is removed while removing the second resin by dry etching. Further, Patent Document 2 discloses a method for producing a microstructure in which a fine pattern of a surface of a mother stamper is sequentially transferred, which comprises (1) fixing the mother stamper to a substrate. a step of supplying a resin at a predetermined position, (2) a step of supplying a resin between the mother stamper and the substrate, and (3) a step of pressing the mother stamper against the resin in a vacuum, and (4) curing the foregoing a step of removing the mother stamper from the hardened resin and (6) changing the relative position of the mother stamper to the substrate to move the mother stamper or the substrate as described in (5) -5 to 201031694 And the step of repeating steps (2) to (6) a predetermined number of steps after (7) the aforementioned step (6). [Patent Document 1] JP-A-2005-4 1 1 25 (Patent Document 2) JP-A-2-3-4944
【發明內容】 然而,專利文獻1及專利文獻2所揭示的技術中,例 如有著難以形成由非球面形狀所成之透鏡等被要求高精度 之造形物的問題點。 本發明與過去技術相比較,提供一種可高精度地造形 透鏡等造形物之造形方法爲目的。According to the techniques disclosed in Patent Document 1 and Patent Document 2, for example, it is difficult to form a shape of a lens made of an aspherical shape or the like which is required to have high precision. The present invention has been made in view of a method for forming a shape such as a lens with high precision, as compared with the prior art.
作爲本發明之特徵,具有將被造形物、與與非球面形 狀所成之透鏡部之相同形狀、或與前述非球面形狀所成之 透鏡部反形狀所成之轉印形狀所形成之轉印體作互相接觸 ,將被造形物仿照成前述轉印形狀而變形之變形步驟、與 使被造形物之至少變形的部分經硬化的硬化步驟、與將被 造形物與前述轉印體相互分離之分離步驟、與將前述轉印 體相對移動至前述被造形物的其他位置之移動步驟,多次 重複於被造形物轉印前述轉印形狀之轉印步驟之造形方法 ’其爲前述被造形物係由含有具有聚合性官能基之脲烷化 合物與聚合啓始劑之硬化性組成物所成之造形方法。 前述硬化性組成物較佳爲含有 -6- 201031694 (A) 二氧化矽微粒子、與 (B) 下述一般式(1)所表示之脲烷化合物 〔化1〕According to a feature of the present invention, there is provided a transfer formed by a transfer shape formed by forming a shape, a shape of a lens portion formed by an aspherical shape, or a shape of a lens formed by the aspherical shape. The body is brought into contact with each other, and the deformed step of deforming the shaped object in the form of the transfer shape, the hardening step of hardening the at least deformed portion of the shaped object, and the separating of the shaped object from the transfer body a separating step, a moving step of moving the transfer body relative to the other position of the object to be shaped, and a plurality of steps of forming a transfer step of transferring the transfer shape to the object to be shaped, which is the object to be shaped It is a method of forming a curable composition containing a urethane compound having a polymerizable functional group and a polymerization initiator. The curable composition preferably contains -6-201031694 (A) cerium oxide microparticles, and (B) a urethane compound represented by the following general formula (1).
(式中,Ri表示具有直鏈或分支之碳數1〜12的2價脂肪 族基、具有脂環基之碳數3〜12的2價有機基、具有芳香 ® 環之碳數6〜30的2價有機基或〔-(Ch2) a-0- ( CH2) b-〕c (a及b各獨立表示1〜10之整數,c表示1〜5之整數。 ), R2表示具有直鏈或分支之碳數1〜10的2價脂肪族基 、具有脂環基之碳數3〜10的2價有機基、具有芳香環之 碳數6〜30的2價有機基或〔-(CH2) d-0-(CH2) e-〕f (d及e各獨立表示1〜10之整數,f表示1〜5之整數。 ),R3及R4各獨立爲氫原子或甲基。) ® ( C )具有乙烯性不飽和基且具有脂環式結構之(甲 基)丙烯酸酯、與(D)聚合啓始劑, 前述二氧化矽微粒子(A)係以下述一般式(2)所表 示之矽烷化合物(E )進行表面處理爲特徵之如申請專利 範圍第1項所記載之造形方法。 〔化2〕 R5 (2)(wherein Ri represents a divalent aliphatic group having a linear or branched carbon number of 1 to 12, a divalent organic group having a carbon number of 3 to 12 having an alicyclic group, and a carbon number of 6 to 30 having an aromatic ring; a divalent organic group or [-(Ch2) a-0-(CH2) b-]c (a and b each independently represent an integer of 1 to 10, and c represents an integer of 1 to 5.), and R2 represents a straight chain. Or a bivalent aliphatic group having a carbon number of 1 to 10, a divalent organic group having a carbon number of 3 to 10 having an alicyclic group, a divalent organic group having a carbon number of 6 to 30 of an aromatic ring or [-(CH2) ) d-0-(CH2) e-]f (d and e each independently represent an integer of 1 to 10, and f represents an integer of 1 to 5.), and R3 and R4 are each independently a hydrogen atom or a methyl group. C) a (meth) acrylate having an ethylenically unsaturated group and having an alicyclic structure, and (D) a polymerization initiator, wherein the cerium oxide microparticles (A) are represented by the following general formula (2) The surface treatment of the decane compound (E) is characterized by the forming method described in the first item of the patent application. [Chemical 2] R5 (2)
I H2C==C——CΟ— (CH2)„— SiRer(OR7)3-r Ο 201031694 (式(2)中,R5表示氫原子或甲基,R6表示碳數1〜3 之烷基或苯基,r7表示氫原子或碳數1〜1〇之烴基’ q表 示1〜6之整數,r表示〇〜2之整數。) 較佳爲含於前述硬化性組成物之前述二氧化矽微粒子 (A)對於該二氧化矽微粒子(A) 100質量份而言’以 10〜50質量份之前述矽烷化合物(E)進行表面處理。 較佳爲前述硬化性組成物之黏度爲爲100〜5 000mPa· S ° 根據本發明與過去技術相比較,可提供一種可高精度 地造形透鏡等造形物的造形方法。 其次對於本發明之實施形態依據圖面作說明。 圖1表示本發明之第1實施形態的造形裝置10。造形 裝置ίο爲造形物,具有使用於光學零件之透鏡陣列的造 形,於設置面所設置之基台12’於基台12上支持著可動 台24。於可動台24之上側面進一步支持著支持台14。 可動台24係由形成有朝下側突出形狀之突出部25之 下側部分26、與位於下側部分26的上側之上側部分27所 成,突出部25如鑲入於基台12之朝上的面12a所形成之 y軸方向的溝(未圖示),組裝於基台12。因此被y軸方 向之溝導引,可動台24成爲在面12a上可於y軸方向移 動。於突出部25上,鑲入輸送螺絲28。使輸送螺絲28之 軸方向(長方向)成爲y軸方向,使用軸承30、30於基 台12以自由轉動方式支持。輸送螺絲28的圖1中之左端 部上,與固定於基台12的y軸馬達32連結。因此,藉由 -8- 201031694 轉動y軸馬達32,介著輸送螺絲28於突出部25傳達驅動 ’可動台24往y軸方向移動。將可動台往y軸之任意方 向移動係以控制y軸馬達32之轉動方向來決定。 於可動台24之上側部分27上,設置0軸馬達34。0 軸馬達34爲將可動台24之上側部分27,對於可動台24 之下側部分26以與Z軸呈垂直方向的轉動軸作爲中心進 行轉動。如此可動台24的全體可於y軸方向移動,且同 φ 時上側部分27對於下側部分26成爲可轉動。 於支持台1 4上,例如載置由玻璃等所成之晶圓W, 支持台1 4爲將載置的晶圓W自重力方向下側支持。又, 於支持台1 4上,連結例如具備馬達等之驅動源1 8。因此 ,支持台14可成爲,對於可動台24之上側部分27以與 晶圓W成爲一體而轉動,於晶圓W上構成以所謂的旋轉 塗佈將硬化性組成物等進行塗佈時所使用的旋轉塗佈用之 轉動桌。或者將支持台14作爲旋轉塗佈用轉動桌而構成 φ ,取代藉由旋轉塗佈,於晶圓W如塗佈硬化性組成物而 構成,於晶圓w所形成之複數孔h2 (參照圖2 )上,例 如將如注入一般將硬化性組成物注入的注入裝置(未圖示 )設於造形裝置10,亦可以該注入裝置於晶圓W所形成 之複數孔h2上注入硬化性組成物。 支持台14爲,例如使用具有玻璃等光透過性的材料 等,成爲可通過後述之光照射裝置60所發之光。且,於 支持台14載置晶圓W,由於支持台14上載置之狀態除去 晶圓W時,例如可使用機器人等所成之載置·除去裝置( -9 - 201031694 未圖示),亦可由操作者以手進行作業。 於可動台24的上側部分27上,設置將作爲被成形物 所使用的光硬化性組成物供給於晶圓W之供給裝置3 6。 供給裝置3 6中,介著閥3 8,接續貯藏光硬化性組成物之 貯藏部40,供給裝置36爲將貯藏於貯藏部40之光硬化性 組成物,於略圓形(圓板形狀)所成之晶圓W的略中心 部自上方落下而可供給。供給於晶圓W之光硬化性組成 物爲,藉由支持台14以預定的所定時間進行轉動而藉由 _ 離心力擴散,成爲於晶圓W表面塗佈成略均勻厚度之狀 態。 又,於可動台24之上側部分27上,設有作爲硬化裝 置所使用的光照射裝置60。光照射裝置60藉由作爲光傳 達手段所使用的光纖維68而接續於光源70,使用於塗佈 於晶圓W之光硬化性組成物上以光照射時。該實施形態 中,光照射裝置60爲,對於支持台14、晶圓W、及塗佈 於晶圓W之光硬化性組成物,設置於與後述轉印體62爲 ◎ 相反側之下側。因此,將轉印體62接觸於光硬化性組成 物之狀態下,無須被轉印體62遮住下,於光硬化性組成 物可照射光。 於基台12,裝置可動台24之同時,固定支柱42。於 支柱42上’對於支柱42可於X軸方向上移動之可動單位 44被組裝上。可動單位44係由位置於圖中左側的左側部 分48、與固定於左側部分48之右側部分50所成。左側部 分48爲’支持成對於支柱42可於x軸方向上移動,鑲入 -10- 201031694 輸送螺絲52。輸送螺絲52爲藉由軸承54使軸方向呈χ軸 方向而於支柱42上可轉動。 於輸送螺絲52之一端部,連結組裝於支柱42之χ軸 馬達56。因此’使χ軸馬達56轉動時,介著輸送螺絲52 於左側部分48傳達χ軸馬達56之驅動,可動單位44之 左側部分4 8與右側部分5 0成爲一體,而於x軸方向移動 。將可動單位44於χ軸方向之任一方向上移動係以控制χ φ 軸馬達56之轉動方向而決定。 可動單位44之右側部分50上,轉印體62爲介著支 持構件4 5而裝著。支持構件4 5爲對於可動單位44組裝 成可於z軸方向移動,由圖1中朝左側突出之突出部46、 與固定於突出部46之支持部47所成。於支持部47上, 例如組裝成於往下面上可脫離轉印體62,轉印體62爲配 合欲形成之透鏡部形狀、或作爲被造形物所使用的硬化性 組成物之種類等’組裝成可選自尺寸或形狀彼此相異者之 Φ 1種。 於突出部46上螺合輸送螺絲58。輸送螺絲58於可動 單位44之右側部分50,組裝成使用軸承6丨、6 1可使軸方 向呈z軸方向而可轉動。輸送螺絲58之上端部連結於支 持構件用z軸馬達64。因此’轉動支持構件用z軸馬達 64時’介著輸送螺絲58於支持構件45傳達驅動,支持構 件45 '與支持於支持構件45之轉印體62成爲—體往z軸 方向移動。 於可動單位44之右側部分50中,作爲檢測晶圓w -11 - 201031694 及轉印體62之位置的檢測手段所使用的檢測裝置72,組 裝成可與支持構件45獨立下可上下移動(可於z軸方向 移動)。檢測裝置72爲’例如具有由CCD照相機所成之 攝影部74、設置於攝影部74之晶圓W側的透鏡單位76 、與作爲可確保藉由攝影部74可順利攝影的鮮明度之照 明手段所使用的燈78。於檢測裝置72組裝檢測裝置用z 軸馬達8 0,檢測裝置用z軸馬達8 0爲,作爲將檢測裝置 72對可動單位44於z軸方向移動時的驅動源使用,藉由 φ 可上下移動檢測裝置72,可將攝影部74之焦點對準轉印 體62等。 如上述,將支持構件45組裝成對於可動單位44可於 z軸方向移動,將可動單位44組裝成對於支柱42可於X 軸方向移動。因此,藉由控制X軸馬達56與支持構件用z 軸馬達64,將支持構件45與轉印體62同時可於X軸方向 與z軸方向上移動。又,如上述,支持台14爲藉由驅動y 軸馬達32及Θ軸馬達34,可同時將可動台24於y軸方向 ❹ 上移動並轉動。藉此,藉由控制y軸馬達32、X軸馬達56 、支持構件用z軸馬達64、及Θ軸馬達34 ’可變更與晶 圓W、光照射裝置60及轉印體62之相對位置關係。 因此,藉由變更晶圓W與轉印體62之相對位置關係 ,將塗佈於晶圓W之光硬化性組成物與轉印體62 ’可互 相接觸並離開。如此該實施形態中,y軸馬達32、X軸馬 達56、支持構件用z軸馬達64、及Θ軸馬達34與輸送螺 絲2 8、5 2、5 8等同時於光硬化性組成物與轉印體6 2以互 -12- 201031694 相接觸並離開下,使用作爲將光硬化性組成物及轉印體62 的至少任一方移動之移動裝置使用。對於y軸馬達32、X 軸馬達56、支持構件用z軸馬達64、及Θ軸馬達34之控 制的詳細內容如後述。 以上所說明之實施形態中,所謂光硬化性組成物爲, 藉由照射光而可硬化之硬化性組成物。又,對於以上所說 明之實施形態中,作爲被造形物雖使用光硬化性組成物, φ 作爲被造形物,藉由接觸轉印體62、或壓接觸轉印體62 下可能會仿照轉印體62之形狀而變形,可適用保持變形 狀態下可使其硬化之材料,例如可使用藉由上述硬化性組 成物且藉由加熱而進行硬化的熱硬化性組成物。又,該實 施形態中,作爲硬化被造形物之硬化裝置,雖使用硬化光 硬化性組成物之光照射裝置,但硬化裝置配合作爲被造形 物所使用的材料可適宜選擇。例如如前述作爲被造形物使 用熱硬化性組成物時,作爲硬化裝置可選擇加熱熱硬化性 φ 組成物之加熱器。 圖2表示轉印體62及晶圓W之詳細情況。 如圖2所示,晶圓W爲於基板W1上方具有重疊保持 板W2之結構。基板W1爲例如由可透過光之材料的玻璃 所成,其厚度tl,例如爲400μ。保持板W2,例如由液體 所成,將流動性高之硬化前光硬化性組成物保持於所定位 置上時使用,例如由矽所成,其厚度t2,例如爲725 μ, 形成複數個自上方貫通至下方的貫通孔hi。各貫通孔hi ,例如成爲自上方往下方變狹隘之鉢形狀。 -13- 201031694 如此,於基板W1之上方所配置之保持板W2’如貫 通保持板W2下,形成複數貫通孔hi’故貫通孔hi下側 被基板W1封住,於基板W1上,下方被封住,成爲形成 往上方開放的凹部形狀所成之複數孔h2之狀態。又,於 基板W1彼此相鄰之貫通孔h 1之間的位置上,例如於基 板W1内部上,形成刻畫(scriber )層(刻畫部)S。形 成基板W1之刻畫層S的位置因比其他部分之強度還弱, 故於分割基板W1時,基板W1沿著刻畫層S而被分割。 轉印體62例如由金屬所成,作爲非球面形狀所成之 透鏡部與所使用的透鏡部3 1 2 (參照後述之圖8 )爲同形 狀、或作爲由與透鏡部3 1 2爲反形狀所成之轉印形狀所形 成之轉印體而使用,作爲該轉印形狀,例如形成凸部90。 又,轉印體62使用於仿照凸部90之形狀並變形光硬化性 組成物,以經變形之狀態下硬化光硬化性組成物,形成爲 轉印體62的轉印形狀對光硬化性組成物進行轉印。凸部 90係將由金屬所成之轉印體62,例如使用機械中心等工 作機械,例如進行削出等,以機械性加工而形成,成爲非 球面形狀。 形成爲轉印體62之轉印形狀藉由經轉印而造形的被 造形物,被要求高精度。因此,例如作爲凸部9 0於轉印 體62所形成之轉印形狀亦要求高精度,且凸部90爲具有 非球面形狀,難以加工,故於轉印體62之加工上需要長 時間且高成本之情況較多。因此,該實施形態中》欲縮短 加工時間,抑制成本,於轉印體62僅一處形成轉印形狀 -14- 201031694 其中,所謂非球面形狀爲,一般由切出球面的一部份 之形狀所成的曲面形狀以外之表面形狀。又,如透鏡部 312之光學零件中,稱爲以下式(1)所示非球面形狀式表 示的形狀。 z = C.p2/[l + {l-(l+Kl).C2.p2}1/2] ...式(1) 但,將C作爲曲率半徑R之逆數,將p作爲由反射鏡 面之光軸的高度,將z作爲垂陷(sag)量,將κΐ作爲圓 錐係數。 圖2中,於晶圓W朝上的面、全面藉由旋轉塗佈塗 佈光硬化性組成物,經塗佈之光硬化性組成物流入保持板 W2的孔h2,並保持於保持板W2,對於經保持之光硬化 性組成物,至少凸部90與光硬化性組成物接觸下呈現轉 φ 印體62爲接觸之狀態。該狀態中,使用光照射裝置60接 觸於光硬化性組成物的凸部90之位置、及於該周邊以光 照射時,光硬化性組成物經硬化,形成凸部之轉印形狀轉 印至光硬化性組成物。而光硬化性組成物經硬化後,轉印 體62如圖2所示二點鏈線,由晶圓W離開,如圖2中所 示箭頭,例如與保持經硬化之硬化性組成物的孔h2之鄰 接孔h2所保持的未硬化之硬化性組成物接觸下移動。 圖3中表示,取代於晶圓W朝上之面、全面藉由旋 轉塗佈塗佈光硬化性組成物,於晶圓W所形成之複數孔 -15- 201031694 h2中,使用注入裝置(未圖示)注入光硬化性組成物時’ 對於保持板W2所保持之光硬化性組成物’至少凸部90 如接觸光硬化性組成物一般,顯示接觸轉印體62的狀態 。此時,於1個孔h2所保持之光硬化性組成物與凸部90 接觸,以光照射的時點,已成爲於該孔h2鄰接之孔h2已 經注入光硬化性組成物之狀態,1個孔h2内之光硬化性組 成物經硬化後,轉印體62如圖3中二點鏈線所示,由晶 圓W離開,如圖3中箭頭所示,與保持經硬化之硬化性 組成物的孔h2之鄰近孔h2所保持之未硬化的硬化性組成 物接觸下移動。而與於鄰近孔h2所保持之硬化性組成物 接觸的狀態之轉印體62爲,往鄰近孔h2的進一步鄰近孔 h2之移動前,於該進一步鄰近的孔h2藉由注入裝置注入 光硬化性組成物。 即’如圖3所示,使用注入裝置將光硬化性組成物注 入於孔h2時’將光硬化性組成物仿照轉印體62使其變形 時(變形步驟)時,預先於形成複數孔h2之晶圓W,注 入光硬化性組成物(注入步驟),於孔h2被注入之光硬 化性組成物、與轉印體62進行接觸(接觸步驟)。又, 使光硬化性組成物變形時,對孔h2之光硬化性組成物的 注入(注入步驟)、與於孔h2注入之光硬化性組成物的 轉印體62之接觸(接觸步驟)可相互重複進行數次。 圖4表示晶圓W的第1變形例。有關前述實施形態 之晶圓W爲’雖成爲基板Wi與保持板W2爲層合之狀態 ’但該第1變形例之基板W1僅由保持板W2所成。使用 201031694 有關第1變形例之基板W1時,使貫通孔hi的: 由下方塞入下,將轉印體62對於保持板W2由 接觸,藉由由下方塞住,於所形成之孔h2由上 硬化性組成物,供給於孔h2的光硬化性組成物 照射光下,必須變更造形裝置1 0之構成。使用言 形例之相關晶圓W時,於孔h2所注入之光硬化 經硬化後,將轉印體62鄰接之貫通孔hi由下方 φ 動,其後如塞住貫通孔h 1下,於所形成之鄰接孑I 注入裝置注入光硬化性組成物。且,對於與有關 形態之晶圓W的同一部分,賦予於圖3之相同 略說明。 如以上說明,使用具有保持板W2之晶圓W 持板W2所成之晶圓W時,因光硬化性組成物保 板W2,與於保持板W2未保持之情況相異,光 成物於晶圓W之表面全體並非以連續方式存在 〇 分爲由複數之小體積所成之空間的存在狀態。因 光硬化性組成物經收縮之時點,因光硬化性組成 爲累積方式,故轉印體62之形狀於經轉印的位 望位置之間產生誤差之弊害可被防止。又,與未 板W2,於基板W1全面塗佈光硬化性組成物時 可減少所使用的光硬化性組成物的量。 圖5表示晶圓W的第2變形例。I H2C==C——CΟ—(CH2)„—SiRer(OR7)3-r Ο 201031694 (In the formula (2), R5 represents a hydrogen atom or a methyl group, and R6 represents an alkyl group having 1 to 3 carbon atoms or benzene. The group, r7 represents a hydrogen atom or a hydrocarbon group having a carbon number of 1 to 1 Å, wherein q represents an integer of 1 to 6, and r represents an integer of 〇 〜2.) It is preferably the aforementioned cerium oxide microparticles contained in the hardenable composition ( A) The surface treatment of 10 to 50 parts by mass of the above-described decane compound (E) is carried out for 100 parts by mass of the cerium oxide fine particles (A). Preferably, the viscosity of the aforementioned hardenable composition is 100 to 5 000 mPa. S ° According to the present invention, a method for forming a shape such as a lens with high precision can be provided as compared with the prior art. Next, an embodiment of the present invention will be described with reference to the drawings. Fig. 1 shows a first embodiment of the present invention. The shape forming device 10 is a shaped object having a lens array for use in an optical component, and the base 12' disposed on the installation surface supports the movable table 24 on the base 12. The movable table 24 is The upper side further supports the support table 14. The movable table 24 is formed by The lower side portion 26 of the protruding portion 25 of the lower side protruding shape is formed with the upper side upper side portion 27 of the lower side portion 26, and the protruding portion 25 is formed, for example, on the y-axis formed by the upward facing surface 12a of the base 12 The groove (not shown) in the direction is assembled to the base 12. Therefore, it is guided by the groove in the y-axis direction, and the movable table 24 is movable in the y-axis direction on the surface 12a. The conveying screw is inserted into the protruding portion 25. 28. The axial direction (long direction) of the conveying screw 28 is set to the y-axis direction, and is supported by the bases 12 in a freely rotatable manner by the bearings 30 and 30. The left end of the conveying screw 28 in Fig. 1 is fixed to the base. The y-axis motor 32 of 12 is coupled. Therefore, the y-axis motor 32 is rotated by -8-201031694, and the drive screw 28 is transmitted to the protruding portion 25 via the transport screw 28 to move the movable table 24 in the y-axis direction. The movable table is moved to the y-axis. The movement in any direction is determined by controlling the rotational direction of the y-axis motor 32. On the upper side portion 27 of the movable table 24, a zero-axis motor 34 is provided. The zero-axis motor 34 is the upper side portion 27 of the movable table 24, and the movable table 24 is provided. The lower side portion 26 is centered on a rotational axis perpendicular to the Z axis. The entire movable table 24 is movable in the y-axis direction, and the upper portion 27 is rotatable to the lower portion 26 at the same time φ. On the support table 14, for example, a wafer W made of glass or the like is placed. The support table 14 supports the wafer W placed on the lower side in the direction of gravity. Further, the support unit 14 is connected to a drive source 18 such as a motor. Therefore, the support table 14 can be moved. The upper portion 27 of the stage 24 is rotated integrally with the wafer W, and a spin table for spin coating which is used for coating a curable composition or the like by spin coating is formed on the wafer W. Alternatively, the support table 14 may be formed as a φ as a rotary table for spin coating, instead of being coated with a curable composition on the wafer W by spin coating, and a plurality of holes h2 formed in the wafer w (refer to the figure) 2) For example, an injection device (not shown) for injecting a curable composition as described above is provided in the forming device 10, and the injecting device may inject a curable composition into the plurality of holes h2 formed in the wafer W. . The support table 14 is made of, for example, a material having light transmittance such as glass, and is light that can be emitted by the light irradiation device 60 to be described later. In the case where the wafer W is placed on the support table 14 and the wafer W is removed in the state in which the support table 14 is placed, for example, a mounting and removing device (not shown in the figure) of a robot or the like can be used. The work can be performed by the operator by hand. A supply device 36 for supplying a photocurable composition used as a molded article to the wafer W is provided on the upper portion 27 of the movable table 24. In the supply device 36, the storage unit 40 for storing the photocurable composition is connected to the valve 3, and the supply device 36 is a photocurable composition to be stored in the storage unit 40, and is slightly circular (arc shape). The slightly center portion of the formed wafer W is dropped from above and can be supplied. The photocurable composition supplied to the wafer W is dispersed by the centrifugal force by the support stage 14 by a predetermined predetermined time, and is applied to the surface of the wafer W to have a slightly uniform thickness. Further, a light irradiation device 60 used as a curing device is provided on the upper side portion 27 of the movable table 24. The light irradiation device 60 is connected to the light source 70 by the optical fiber 68 used as the light transmitting means, and is used for light irradiation on the photocurable composition applied to the wafer W. In the embodiment, the light irradiation device 60 is provided on the support plate 14, the wafer W, and the photocurable composition applied to the wafer W on the side opposite to the side opposite to the transfer body 62 to be described later. Therefore, in a state in which the transfer body 62 is brought into contact with the photocurable composition, it is not necessary to be covered by the transfer body 62, and the photocurable composition can be irradiated with light. The base 42 is fixed to the base 12 while the movable table 24 is being mounted. The movable unit 44 which is movable in the X-axis direction with respect to the pillar 42 is assembled on the pillar 42. The movable unit 44 is formed by a left side portion 48 positioned on the left side in the drawing and a right side portion 50 fixed to the left side portion 48. The left side portion 48 is 'supported to move in the x-axis direction for the post 42 and is inserted into the -10- 201031694 delivery screw 52. The conveying screw 52 is rotatable on the strut 42 by the bearing 54 in the direction of the x-axis of the shaft. At one end of the conveying screw 52, the cymbal motor 56 assembled to the strut 42 is coupled. Therefore, when the spindle motor 56 is rotated, the drive of the spindle motor 56 is transmitted to the left portion 48 via the feed screw 52, and the left portion 48 of the movable unit 44 is integrated with the right portion 50 and moved in the x-axis direction. The movable unit 44 is moved in either direction of the x-axis direction to control the direction of rotation of the φ φ shaft motor 56. On the right side portion 50 of the movable unit 44, the transfer body 62 is attached via the supporting member 45. The support member 45 is formed by disposing the movable unit 44 in the z-axis direction, and is formed by a protruding portion 46 that protrudes to the left side in Fig. 1 and a support portion 47 that is fixed to the protruding portion 46. For example, the support portion 47 is assembled so as to be detachable from the transfer body 62, and the transfer body 62 is assembled to match the shape of the lens portion to be formed or the type of the curable composition used as the object to be formed. It can be selected from Φ which differs in size or shape from each other. The conveying screw 58 is screwed onto the projection 46. The conveying screw 58 is assembled to the right side portion 50 of the movable unit 44 so as to be rotatable in the z-axis direction by using the bearings 6A, 61. The upper end portion of the conveying screw 58 is coupled to the z-axis motor 64 for the support member. Therefore, when the z-axis motor 64 is rotated, the transfer screw 58 is driven to the support member 45, and the support member 45' and the transfer member 62 supported by the support member 45 are moved in the z-axis direction. In the right portion 50 of the movable unit 44, the detecting device 72 used as the detecting means for detecting the positions of the wafers w-11 - 201031694 and the transfer body 62 is assembled so as to be movable up and down independently of the supporting member 45 ( Move in the z-axis direction). The detecting device 72 is, for example, a photographing unit 74 formed of a CCD camera, a lens unit 76 provided on the wafer W side of the photographing unit 74, and an illumination means capable of ensuring the sharpness of photographing by the photographing unit 74. Lamp 78 used. The detection device 72 is equipped with a z-axis motor 80 for the detection device, and the z-axis motor 80 for the detection device is used as a drive source for moving the detection unit 72 to the movable unit 44 in the z-axis direction, and can be moved up and down by φ. The detecting device 72 can align the focus of the photographing portion 74 with the transfer body 62 or the like. As described above, the support member 45 is assembled so as to be movable in the z-axis direction with respect to the movable unit 44, and the movable unit 44 is assembled so as to be movable in the X-axis direction with respect to the pillar 42. Therefore, by controlling the X-axis motor 56 and the support member z-axis motor 64, the support member 45 and the transfer body 62 can be simultaneously moved in the X-axis direction and the z-axis direction. Further, as described above, the support table 14 can simultaneously move and rotate the movable table 24 in the y-axis direction by driving the y-axis motor 32 and the y-axis motor 34. Thereby, the relative positional relationship with the wafer W, the light irradiation device 60, and the transfer body 62 can be changed by controlling the y-axis motor 32, the X-axis motor 56, the support member z-axis motor 64, and the boring motor 34'. . Therefore, by changing the relative positional relationship between the wafer W and the transfer body 62, the photocurable composition applied to the wafer W and the transfer body 62' can be brought into contact with each other and separated. In this embodiment, the y-axis motor 32, the X-axis motor 56, the z-axis motor 64 for the support member, and the boring motor 34 and the conveying screws 28, 5 2, 5 8 and the like are simultaneously cured by the photocurable composition. The printing body 6 2 is brought into contact with each other and separated from each other, and is used as a moving device that moves at least one of the photocurable composition and the transfer body 62. Details of the control of the y-axis motor 32, the X-axis motor 56, the support member z-axis motor 64, and the boring motor 34 will be described later. In the embodiment described above, the photocurable composition is a curable composition that can be cured by irradiation with light. Further, in the embodiment described above, a photocurable composition is used as the object to be formed, and φ is used as the object to be formed, and the contact transfer member 62 or the pressure contact transfer member 62 may be transferred to the transfer. The shape of the body 62 is deformed, and a material which can be cured while being deformed can be applied. For example, a thermosetting composition which is cured by heating by the above-mentioned curable composition can be used. Further, in the embodiment, the light irradiation device for curing the photocurable composition is used as the curing device for curing the shaped object, but the curing device may be appropriately selected by mixing the material used as the object to be molded. For example, when a thermosetting composition is used as the object to be formed as described above, a heater for heating the thermosetting φ composition can be selected as the curing means. FIG. 2 shows the details of the transfer body 62 and the wafer W. As shown in Fig. 2, the wafer W has a structure in which the holding plate W2 is overlapped above the substrate W1. The substrate W1 is made of, for example, glass which is permeable to light, and has a thickness t1 of, for example, 400 μ. The holding plate W2 is formed, for example, of a liquid, and is used when a precurable photocurable composition having high fluidity is held at a predetermined position. For example, the thickness t2 is 725 μ, and a plurality of layers are formed from above. The through hole hi is penetrated to the lower side. Each of the through holes hi is, for example, a shape that is narrowed from the top to the bottom. -13- 201031694 In this manner, the holding plate W2' disposed above the substrate W1 passes through the holding plate W2 and forms a plurality of through holes hi'. Therefore, the lower side of the through hole hi is sealed by the substrate W1, and the lower surface of the substrate W1 is The state of the plurality of holes h2 formed by forming the shape of the recess opened upward is formed. Further, at a position between the through holes h 1 adjacent to each other of the substrate W1, for example, a scriber layer (scriber portion) S is formed on the inside of the substrate W1. Since the position of the patterned layer S on which the substrate W1 is formed is weaker than the strength of the other portions, the substrate W1 is divided along the patterned layer S when the substrate W1 is divided. The transfer body 62 is made of, for example, a metal, and the lens portion formed as an aspherical shape has the same shape as the lens portion 3 1 2 (see FIG. 8 described later) used, or is opposite to the lens portion 3 1 2 . The transfer body formed by the transfer shape formed by the shape is used, and as the transfer shape, for example, the convex portion 90 is formed. Further, the transfer body 62 is used to deform the photocurable composition in the shape of the convex portion 90, and to cure the photocurable composition in a deformed state, and to form a transfer shape of the transfer body 62 to form a photocurable composition. The material is transferred. The convex portion 90 is formed by a metal working body such as a mechanical center, for example, by cutting, and is formed by mechanical processing to form an aspherical shape. The transfer shape formed into the transfer body 62 is required to be high-precision by the shape-formed object which is formed by transfer. Therefore, for example, the transfer shape formed by the transfer portion 62 as the convex portion 90 is also required to have high precision, and the convex portion 90 has an aspherical shape and is difficult to process, so that it takes a long time to process the transfer body 62. There are more cases of high costs. Therefore, in this embodiment, it is intended to shorten the processing time and suppress the cost, and the transfer shape is formed in only one place in the transfer body 62-14-201031694. The aspherical shape is generally a shape in which a part of the spherical surface is cut out. The surface shape other than the curved surface formed. Further, in the optical component of the lens portion 312, it is referred to as a shape represented by the aspherical shape shown by the following formula (1). z = C.p2/[l + {l-(l+Kl).C2.p2}1/2] Equation (1) However, C is taken as the inverse of the radius of curvature R, and p is used as the reflection The height of the optical axis of the mirror, z is the amount of sag, and κ is taken as the conic coefficient. In FIG. 2, the photocurable composition is applied by spin coating on the surface of the wafer W upward, and the applied photocurable composition flows into the hole h2 of the holding plate W2 and is held by the holding plate W2. With respect to the held photocurable composition, at least the convex portion 90 is in contact with the photocurable composition, and the φ-printed body 62 is in contact with each other. In this state, when the light irradiation device 60 is in contact with the position of the convex portion 90 of the photocurable composition and when the periphery is irradiated with light, the photocurable composition is cured, and the transfer shape forming the convex portion is transferred to Photocurable composition. After the photocurable composition is hardened, the transfer body 62 is separated from the wafer W by a two-dot chain line as shown in FIG. 2, as shown by an arrow in FIG. 2, for example, a hole for holding the hardened hardenable composition. The uncured hardenable composition held by the adjacent hole h2 of h2 moves under contact. 3 shows that the photo-curable composition is applied by spin coating instead of the wafer W facing upward, and the injection device is used in the plurality of holes -15-201031694 h2 formed by the wafer W (not In the case where the photocurable composition is injected, the photocurable composition held by the holding plate W2 is at least the convex portion 90, and the state in which the transfer body 62 is contacted is displayed. At this time, the photocurable composition held in the one hole h2 is in contact with the convex portion 90, and the light hardening composition has been injected into the hole h2 adjacent to the hole h2 at the time of light irradiation. After the photocurable composition in the hole h2 is hardened, the transfer body 62 is separated from the wafer W as shown by the two-dot chain line in FIG. 3, as shown by the arrow in FIG. 3, and the hardened composition is maintained. The uncured hardenable composition held by the adjacent hole h2 of the hole h2 of the object moves under contact. And the transfer body 62 in a state of being in contact with the hardenable composition held by the adjacent hole h2 is, before the movement of the adjacent hole h2 further adjacent to the hole h2, the light hardening is injected into the further adjacent hole h2 by the injection device. Sexual composition. In other words, as shown in FIG. 3, when the photocurable composition is injected into the hole h2 using an injection device, when the photocurable composition is deformed in the transfer body 62 (deformation step), a plurality of holes h2 are formed in advance. The wafer W is injected with a photocurable composition (injection step), and the photocurable composition injected into the hole h2 is brought into contact with the transfer body 62 (contact step). Further, when the photocurable composition is deformed, the injection of the photocurable composition of the hole h2 (injection step) and the contact with the transfer body 62 of the photocurable composition injected into the hole h2 (contact step) may be performed. Repeat several times with each other. FIG. 4 shows a first modification of the wafer W. The wafer W of the above-described embodiment is in a state in which the substrate Wi and the holding plate W2 are laminated. However, the substrate W1 of the first modification is formed only by the holding plate W2. When the substrate W1 of the first modification is used, the through hole hi is inserted from below, and the transfer body 62 is brought into contact with the holding plate W2, and is closed by the lower side, and the hole h2 formed is formed by In the upper curable composition, the photocurable composition supplied to the hole h2 is irradiated with light, and the configuration of the forming device 10 must be changed. When the wafer W related to the example is used, the light hardening injected in the hole h2 is hardened, and the through hole hi adjacent to the transfer body 62 is moved by the lower side φ, and then the through hole h 1 is closed. The formed adjacent iridium I injection device injects a photocurable composition. The same portions as those of the wafer W of the related art are given the same as those in Fig. 3. As described above, when the wafer W formed by the wafer holding plate W2 having the holding plate W2 is used, the photocurable composition protective sheet W2 is different from the case where the holding plate W2 is not held, and the photoconductor is formed. The entire surface of the wafer W does not exist in a continuous manner and is divided into a state in which a space formed by a plurality of small volumes is present. When the photocurable composition is shrunk, since the photocurable composition is a cumulative mode, the occurrence of an error in the shape of the transfer body 62 between the transferred positions can be prevented. Further, when the photocurable composition is entirely applied to the substrate W1 and the non-plate W2, the amount of the photocurable composition to be used can be reduced. FIG. 5 shows a second modification of the wafer W.
前述實施形態之相關晶圓W對於基板W 1 W2成爲層合之情況,該第2變形例中,晶圓W 至少1個 下方進行 方供給光 可由上方 亥第1變 性組成物 塞住下移 ,h2藉由 前述實施 號碼並省 、或由保 持於保持 硬化性組 ,係以細 此,對於 物之收縮 置、與所 使用保持 作比較, 與保持板 未具有保 -17- 201031694 持板W2而由基板W1所成。使用第2變形例之相關晶圓 W時,於晶圓W之表面全體以旋轉塗佈塗佈光硬化性組 成物,對於塗佈於晶圓W之光硬化性組成物,再藉由轉 印體62進行轉印。 該第2變形例之相關晶圓W,因未有保持板W2,故 光硬化性組成物成爲於晶圓W之表面全體以連續方式存 在之狀態,對於光硬化性組成物經收縮之時點,因累積光 硬化性組成物之收縮,轉印體62之形狀經轉印的位置、 與所望位置之間會有產生誤差之疑慮。因此,欲防止該誤 差之產生,配合所使用的光硬化性組成物之收縮,變更轉 印體62與光硬化性組成物接觸之位置的間距爲佳。即, 轉印體62爲,經轉印之1位置、與該位置鄰接且轉印體 接觸光硬化性組成物之其他位置之距離的間距,配合所使 用的光硬化性組成物之收縮率,成爲比光硬化性組成物經 硬化後之所望間距更廣下,進行設定、變更爲佳。且對於 與前述實施形態相關之晶圓 W之同一部分,賦予與圖5 之同一號碼而省略說明。 圖6表示具有造形裝置10之控制裝置200之格子圖 〇 如圖6所示’控制裝置2 0 0具有介著將以檢測裝置7 2 所攝影之畫像進行辨識的畫像辨識裝置202,由檢測裝置 72的輸出被輸入之主控制部2〇4。主控制部204藉由控制 馬達控制電路206,控制y軸馬達32、X軸馬達56、支持 構件用z軸馬達64、及Θ軸馬達34。又,主控制部204 201031694 藉由控制光源驅動電路208,控制光源70。又,主控制部 2 04爲藉由控制馬達控制電路2 1 0而控制檢測裝置用z軸 馬達80。又,主控制部204爲藉由控制閥驅動電路212而 控制閥3 8。又,主控制部204爲藉由控制驅動源控制電路 2 1 4而控制驅動源1 8。又,如前述將於晶圓W所形成之 孔h2注入光硬化性組成物之注入裝置(未圖示)設置於 造形裝置10時,該注入裝置之控制亦藉由控制裝置200 ❹ 實施。 圖7表示藉由控制裝置2 00之造形裝置10的控制之 第1流程圖,其中表示造形物之光學零件的透鏡陣列造形 之造形方法的步驟。於此所謂透鏡陣列爲,於1個構件形 成複數透鏡部之光學零件而言。該第1流程圖中表示,於 晶圓W全面例如藉由旋轉塗佈塗佈光硬化性組成物時的 步驟。 一連串步驟開始時,在階段S100,實行載置於支持 台14的晶圓W之載置步驟。其次在階段s 2 00,實行於晶 圓 W塗佈光硬化性組成物之光硬化性組成物塗佈步驟。 在光硬化性組成物塗佈步驟中,主控制部204控制閥驅動 電路2 12,將閥3 8以預先設定的時間、打開狀態下,於晶 圓W之表面供給光硬化性組成物。光硬化性組成物之供 給完成後,主控制部2 04爲控制驅動源控制電路2 1 4,使 驅動源1 8以預先設定的時間進行驅動。藉由驅動驅動源 18,轉動支持台14,供給於載置於支持台14的晶圓W之 光硬化性組成物藉由離心力,於晶圓W之表面成爲略均 -19- 201031694 勻擴散之狀態。 其次階段S3 00中,實行將轉印體62所形成之轉印形 狀轉印至光硬化性組成物之轉印步驟。對於階段S300之 轉印步驟的詳細說明如後述。 下階段S 4 0 0中,判斷所有轉印步驟是否已結束。即 ,作爲階段S300,例如重覆進行1 500次〜2400次程度的 轉印步驟後,判斷是否爲最後轉印步驟。階段S4 00中, 若判斷爲非最後轉印步驟時,再回到階段S 3 00。另一方 面,於階段S300中判斷爲最後轉印步驟時,再往下階段 S500前進。 階段S 5 00中,轉印於經塗佈的光硬化性組成物之晶 圓W,自載置於支持台14的狀態,搬出於造形裝置10外 。且,造形裝置1〇爲不具有於支持台14載置晶圓W,將 晶圓W自造形裝置10搬出之機器人等裝置時,晶圓W至 支持台14的載置、與自造形裝置10之晶圓W的除去則 由操作者以手作業進行,不進行藉由主控制部204的控制 之階段S100及階段S500之動作。 圖8表示藉由控制裝置200之轉印步驟的第1流程圖 ,於晶圓W全面藉由旋轉塗佈等塗佈光硬化性組成物時 ,於熱硬化性組成物將形成於轉印體62之轉印形狀進行 轉印的轉印步驟(階段S 3 0 0 )之控制的詳細流程圖。 轉印步驟開始時,實行將在階段S302塗佈於晶圓W 之光硬化性組成物仿照形成於轉印體62之轉印形狀並使 其變形的變形步驟。即,在階段S 3 02中,主控制部204 201031694 控制馬達控制電路206,使y軸馬達32、x軸馬達56、支 持構件用z軸馬達64、及Θ軸馬達34驅動,塗佈於晶圓 W之光硬化性組成物的所定位置與轉印體62接觸,使光 硬化性組成物變形下,移動轉印體62及支持台14之至少 —方。 階段S 3 02之變形步驟中,以檢測裝置7 2檢測,以畫 像辨識裝置202進行畫像處理的數據爲準,欲使轉印體62 φ 接觸於光硬化性組成物的適正位置,於支持台1 4及轉印 體62作成位置補正數據,依據該補正數據,以藉由主控 制部204之控制可移動轉印體62及支持台1 4的至少一方 〇 階段S3 02的變形步驟中,如前述光硬化性組成物會 仿照轉印體62的凸部90而變形。其中,轉印體62的凸 部90經加工爲具有構成透鏡陣列之各透鏡部(光學零件 部)之反形狀。因此,藉由自非球面形狀仿照凸部90而 φ 變形,光硬化性組成物變形爲凹形狀非球面形狀所成之透 鏡部形狀。且,該實施形態中,欲形成凹形狀透鏡部,使 用具有凸部90之轉印體62,但例如使用具有欲形成凸形 狀透鏡部的凹部的轉印體62等,配合欲形成之光學零件 部的形狀,可選擇使用具有加工爲該光學零件部形狀與反 形狀之轉印部的轉印體62。 又,選擇轉印體62時,考慮到所使用的光硬化性組 成物之種類,配合所使用的光硬化性組成物的收縮率,即 使爲形成相同最終形狀之透鏡部的情況,可選擇相異大小 -21 - 201031694 、形成相異形狀之凸部90等的轉印體。即,配合光硬化 性組成物之成形途中的收縮,成爲轉印體62之變更。 下階段S3 04中,藉由與轉印體62之接觸,實行使仿 照轉印體62而變形之光硬化性組成物進行硬化的硬化步 驟。即,主控制部204控制光源驅動電路208,於光源70 ,光硬化組成物的至少與轉印體62接觸而變形的部分以 預先設定之時間進行光照射。經由藉階段S3 04之硬化步 驟,光硬化性組成物以變形爲透鏡部的形狀之狀態下進行 @ 硬化,於光硬化性組成物製造出1個透鏡部。 下階段S3 06中,實行使經硬化之光硬化性組成物與 轉印體62進行分離之分離步驟。即,主控制部204控制 馬達控制電路206,例如將與熱硬化性組成物接觸之狀態 的轉印體62移動至上方下驅動支持構件用z軸馬達64。 藉由上述說明之階段S302、階段S304、階段S306所 進行的一連串轉印步驟終了後,表示轉印步驟已結束,於 光硬化性組成物形成1個透鏡部。而如圖6所示,配合所 0 形成之透鏡部的數,藉由重複進行轉印步驟至轉印終了, 於光硬化性組成物轉印與重複轉印步驟次數相同之透鏡部 的形狀,而製造透鏡陣列。 圖9表示藉由控制裝置200的造形裝置10之控制的 第2流程圖,其中表示造形物的光學零件之透鏡陣列造形 的造形方法之步驟。前述第1流程圖中表示於晶圓W全 面,例如藉由旋轉塗佈塗佈光硬化性組成物時的步驟。相 對於此,於該第2流程圖表示於形成晶圓w之複數孔h2 -22- 201031694 (參照圖2)使用注入裝置(未圖示)注入光硬化性組成 物時的步驟。 前述第1流程圖所示步驟中,階段S100中實行於支 持台14載置晶圓W之載置步驟,階段S2 00中於晶圓W 全面塗佈光硬化性組成物,階段s 3 00中,將形成於轉印 體62之轉印形狀轉印於光硬化性組成物,階段S400中判 斷所有轉印步驟是否結束後,階段S 5 00中搬出晶圓W於 φ 造形裝置1 〇外。 相對於此,該第2流程圖所示步驟中,對階段S200 中之晶圓W全面未進行光硬化性組成物之塗佈,如後述 對於階段S 3 00之轉印步驟,對形成於晶圓W之孔h2注 入硬化性組成物。 圖1 0表示藉由控制裝置200的轉印步驟之第2流程 圖,其表示於形成於晶圓W之複數孔h2,使用注入裝置 注入光硬化性組成物時,於熱硬化性組成物轉印形成於轉 印體62之轉印形狀的轉印步驟(階段S3 00 )之控制的詳 細流程圖。 轉印步驟開始時,階段S3 02中,具有於形成於晶圓 W之複數孔h2之1個注入光硬化性組成物的注入步驟( 階段S3 02a)、與階段S3 02a中,將注入於孔h2之1個的 光硬化性組成物與轉印體62接觸之接觸步驟(S3 02b), 實行將光硬化性組成物仿照形成於轉印體62之轉印形狀 而變形之變形步驟。即,階段S302中,主控制部204爲 控制注入裝置,於形成於晶圓W之複數孔h2之1個注入 -23- 201031694 光硬化性組成物後,控制馬達控制電路206,注入於1個 孔h2之孔h2與轉印體62接觸下,移動轉印體62及支持 台1 4之至少一方。 下階段S3 04中,實行硬化仿照轉印體62而變形之光 硬化性組成物之硬化步驟。即,主控制部204爲照射光源 70使對於階段S3 02a中注入於孔h2之硬化性組成物至少 以光照射。經由藉階段S3 04之硬化步驟,注入於孔h2之 光硬化性組成物以變形爲透鏡部形狀之狀態下製造1個透 @ 鏡部。 下階段S306中,實行分離於硬化之孔h2所注入之光 硬化性組成物、與轉印體62之分離步驟。 藉由上述說明之階段S302a、階段S302b、階段S304 、階段S306所進行的一連串轉印步驟終了後,藉由轉印 步驟之結束,於形成於晶圓W之複數孔h2之1個注入光 硬化性組成物之同時,將該光硬化性組成物仿照形成於轉 印體62之轉印形狀而變形之狀態下進行硬化時,形成1 H 個透鏡部。而如圖9所示,配合所形成之透鏡部的數,藉 由重複進行轉印步驟至所有轉印終了,於光硬化性組成物 轉印與重複轉印步驟之次數相同數目的透鏡部之形狀,形 成透鏡陣列。 圖11中說明使用藉由以上說明的步驟所造形之透鏡 陣列3 04,製造出具有至少1個非球面形狀所成之透鏡部 的光學零件之透鏡的步驟。 首先,所形成之透鏡陣列如圖11(a)、圖11(b) -24 - 201031694 所示,視必要將複數片以貼合等方法進行接合(接合步驟 )。圖11(a)表示接合前的3個透鏡陣列304,圖n(b )表示3片透鏡陣列3 04經接合之接合透鏡陣列3 1 0。 其次,將以接合步驟接合之接合透鏡陣列3 1 0 ’例如 以切斷等方法分割成具有至少1個透鏡部(分割步驟)° 藉由分割接合透鏡陣列310而製造透鏡。於此’如前述若 於晶圓W形成刻畫層S(參照圖2)時’容易進行接合透 φ 鏡陣列3 1 0之分割。 圖11(c)表示將透鏡陣列304如層合一般所接合之 接合透鏡陣列310,切斷成含有1個透鏡部312所製造之 透鏡314。將透鏡314,例如藉由組裝於CMOS傳感器等 受光元件上而可製造照相機,所製造之照相機,例如可作 爲行動電話機内藏之照相機使用。 且,以上說明之透鏡的製造步驟中,藉由接合複數透 鏡陣列3 04,對於形成接合透鏡陣列,藉由分割接合透鏡 φ 陣列3 1 0,製造具有複數透鏡部之透鏡3 1 4的步驟作說明 ,但因未接合複數透鏡陣列304而直接單層下進行分割, 故可由單層形成透鏡314。又,未分割透鏡陣列304、接 合透鏡陣列310下,亦可作爲透鏡陣列304、接合透鏡陣 列3 1 0利用。 其次對於本發明之第2實施形態作說明。 第1實施形態中,對於使用造形裝置1 0 (參照圖1 ) 進行透鏡陣列3 04 (參照圖1 1 )之造形,該第2實施形態 中,使用造形裝置1 〇,進行成形透鏡陣列時所使用的模型 -25- 201031694 之形成。模型與第1實施形態同樣地’經由階段S 1 00之 載置步驟、於階段S200塗佈光硬化性組成物之步驟、階 段S300之轉印步驟、階段S500之晶圓搬出步驟而造形, 階段S300之轉印步驟爲配合最終所成形之透鏡陣列的透 鏡部數目而重複進行。 前述第1實施形態中,作爲轉印體62 (參照圖2 ) ’ 使用具有於透鏡陣列304所形成之非球面形狀所成之透鏡 部與加工成反形狀的轉印部之轉印體62。相對於此,該第 2實施形態中,使用具有加工成與最終所形成之透鏡陣列 的透鏡部爲同形狀之透鏡部之轉印體62。因此,所造形之 透鏡成形用的模型中,最終所形成之透鏡陣列304的透鏡 部3 1 2之形狀被轉印。 圖12中,對於本發明之第2實施形態,使用經使用 造形裝置1 〇造形之模型,成形作爲1次光學零件之透鏡 陣列的步驟、與分割經成形之透鏡陣列製造作爲2次光學 零件之透鏡的步驟進行說明。 使用以造形裝置10造形之模型並造形透鏡陣列,製 造透鏡時,首先如圖12(a)所示,使用造形裝置10並造 形模型300 (造形步驟)、使用經造形之模型300,例如 使用奈米壓印(nanoimprint)之技術,成形透鏡陣列304 (透鏡陣列成形步驟)。例如準備2個模型3 00,將2個 模型300、300經轉印爲轉印體62 (參照圖2 )之形狀的 側面以彼此相對方向進行配置,於模型3 00、3 00之間, 使用供給裝置3 02,例如供給硬化性組成物等透鏡陣列之 201031694 材料’將硬化性組成物等材料仿照模型3 0 0、3 Ο 0之形狀 而變形的狀態下使其硬化’成形爲具有模型3 00之轉印面 形狀與相反形狀之透鏡陣列。此時,例如與模型3 0 0的製 造時同樣地’作爲透鏡陣列的材料使用光硬化性組成物時 ’藉由照射光’可使硬化性組成物硬化。 且,取代將2個模型3 00配置成轉印體62的形狀經 轉印的側面彼此相對,於模型3 0 0、3 0 0之間供給透鏡陣 鲁 列之材料’配置成模型3 0 0的轉印體6 2之形狀經轉印的 側面、與具有平面之平板成相對方向,亦可於模型300與 平板之間供給透鏡陣列之材料。 所形成之透鏡陣列與前述第1實施形態所形成之透鏡 陣列同樣地,視必要接合複數片成如圖1 2 ( b )所示(接 合步驟),如圖1 2 ( c )所示作爲接合透鏡陣列3 1 0,分 割成接合透鏡陣列3 1 0至少具有1個透鏡部(分割步驟) ’如圖12(d)所示,製造出具有1個透鏡部312之透鏡 Φ 3 1 4。透鏡3 14與前述第1實施形態所製造之透鏡同樣地 ,例如組裝於CMOS傳感器等受光元件而可製造照相機, 製造之照相機,例如可作爲行動電話機内藏之照相機使用 〇 與前述第1實施形態同樣地,該第2實施形態所製造 之透鏡陣列3 04無須接合下直接單層下進行分割,故可形 成由單層所成之透鏡314。又,無須分割透鏡陣列304、 接合透鏡陣列3 1 0下,亦可作爲透鏡陣列3 04、接合透鏡 陣列3 1 0利用》 -27- 201031694 以上所說明之第1實施形態中,說明形成透鏡陣列之 例子’第2實施形態中,對於將欲成形爲透鏡陣列所使用 的模型進行成形的例子作說明,但可使用造形裝置1 〇進 行造形的造形物並未限定於欲成形透鏡陣列等光學零件、 或光學零件時的模型,例如可舉出電鑄所使用的電鑄母型 、入槽模型。 以下對本發明所使用的硬化性組成物作詳細說明。 〔硬化性組成物〕 本發明所使用的硬化性組成物係含有具有聚合性官能 基之脲烷化合物與聚合啓始劑者,較佳爲 (A)二氧化矽微粒子、(B)具有特定結構之脲烷化 合物(以下可僅稱爲「脲烷化合物(B)」)、(C)具有 乙烯性不飽和基且具有脂環式結構之(甲基)丙烯酸酯( 以下可僅稱爲反應性(甲基)丙烯酸酯(C))、與(D) 聚合啓始劑,前述二氧化矽微粒子(A )係以特定矽烷化 合物進行表面處理爲特徵。以下對於各構成要素作說明。 且,其中所謂(甲基)丙烯酸酯表示甲基丙烯酸酯及/或 丙烯酸酯。 〈(A)二氧化矽微粒子〉 作爲硬化性組成物所使用的二氧化矽微粒子(A ), 可使用平均粒子徑爲1〜l〇〇nm者。平均粒子徑未達lnm 時,所製作之硬化性組成物的黏度增大,二氧化矽微粒子 -28 - 201031694 (A )的硬化性組成物中之含有量受到限制之同時,硬化 性組成物中之分散性會惡化,對於硬化硬化性組成物所得 之硬化物(以下僅稱爲硬化物)而言,有著未能得到充分 之透明性及耐熱性的傾向。又,平均粒子徑超過100 nm時 ,硬化物的透明性會有惡化之情況。 二氧化矽微粒子(A )的平均粒子徑由硬化性組成物 之黏度與硬化物之透明性的平衡點來看,較佳爲1〜50nm ,更佳爲5〜50nm,最佳爲5〜40nm。且,二氧化砂微粒 子(A)之平均粒子徑以高分解能透過型電子顯微鏡(( 股)日立製作所製 H-9000型)觀察二氧化矽微粒子,由 所觀察到之微粒子像任意選出1 00個二氧化矽粒子像,藉 由公知畫像數據統計處理手法求得數平均粒子徑。 硬化性組成物中,欲提高對二氧化矽微粒子(A )的 硬化物之塡充量,可混合平均粒子徑相異的二氧化矽微粒 子後使用。又,作爲二氧化矽微粒子(A),可使用多孔 φ 質二氧化矽膠、或亦可使用鋁、鎂、鋅等與矽之複合金屬 氧化物。 硬化性組成物中之二氧化矽微粒子(A)的含有量, 作爲經表面處理之二氧化矽微粒子而言以20〜80質量%爲 佳,由硬化物的耐熱性、耐環境性與硬化性組成物之黏度 平衡來看,較佳爲40〜60質量%。若爲該範圍,因硬化性 組成物的流動性及硬化性組成物中之二氧化矽微粒子(A )的分散性良好,故若使用如此硬化性組成物,可容易製 造出持有充分強度及耐熱性、耐環境性之硬化物。 -29- 201031694 又,作爲二氧化矽微粒子(A ),由硬化性組成物中 之分散性的觀點來看,使用分散於有機溶劑之二氧化矽微 粒子者爲佳。作爲有機溶劑,使用含於硬化性組成物中之 有機成分(後述脲烷化合物(B)及(甲基)丙烯酸酯(C )等)經溶解者爲佳。 作爲前述有機溶劑,例如可舉出醇類、酮類、酯類、 甘醇醚類。由後述二氧化矽微粒子(A)、脲烷化合物(B )及(甲基)丙烯酸酯(C)之混合液除去有機溶劑之脫 溶劑步驟中之脫溶劑的容易度來看,以甲醇、乙醇、異丙 基醇、丁基醇、η-丙基醇等醇系、甲基乙基酮、甲基異丁 基酮等酮系之有機溶劑爲佳。 彼等中,亦以異丙基醇爲特佳。使用分散於異丙基醇 之二氧化矽微粒子(A )時,脫溶劑後之硬化性組成物的 黏度比使用其他溶劑時還低,可安定下製造出黏度低之硬 化性組成物。 分散於如此有機溶劑之二氧化矽微粒子可藉由過去公 知方法製造,又例如可購得市售商品名Snow-TechIPA-ST (曰產化學(股)製)等使用。且,使用作爲二氧化矽微 粒子(A)分散於有機溶劑之二氧化矽微粒子時,前述本 發明的硬化性組成物中之二氧化矽微粒子(A )的含有量 表示含於組成物中之僅二氧化矽微粒子本身的含有量。 又’使用於本發明之硬化性組成物所使用的二氧化矽 微粒子(A)以矽烷化合物(E)進行表面處理。以下對於 矽烷化合物作說明。 201031694 〈(E)矽烷化合物〉 前述矽烷化合物(E)如下述一般式(2)所示。 〔化3〕 R6 H2C=C 一 C一- 〇一 (CH2)e——SiR6r(OR7)3_r (2) Ο φ (式(2)中,R5表示氫原子或甲基,R6表示碳數1〜3 之烷基或苯基,R7表示氫原子或碳數1〜10之烴基,q表 示1〜6之整數,r表示0〜2之整數。) 由硬化性組成物的黏度減低、保存安定性之觀點來看 ,R6較佳爲甲基,R7較佳爲甲基,q較佳爲3,Γ較佳爲〇 〇 矽烷化合物(E)爲減低硬化性組成物之黏度,且藉 由與後述脲烷化合物(B)進行反應,欲提高二氧化矽微 φ 粒子(A )之硬化性組成物中的分散安定性、及減低硬化 硬化性組成物時的硬化收縮,且欲對硬化物賦予成形加工 性而使用者。換言之,未以矽烷化合物(E )表面處理二 氧化矽微粒子(A )時,硬化性組成物之黏度提高的同時 ,硬化時之硬化收縮變大,硬化物會變脆,於硬化物會產 生裂縫而不佳。 作爲矽烷化合物(E),例如可舉出r -丙烯氧基丙基 二甲基甲氧基矽烷、γ-丙烯氧基丙基甲基二甲氧基矽烷、 γ-丙烯氧基丙基二乙基甲氧基矽烷、γ-丙烯氧基丙基乙基 -31 - 201031694 二甲氧基矽烷、γ-丙烯氧基丙基三甲氧基矽烷、γ-丙烯氧 基丙基二甲基乙氧基矽烷、γ-丙烯氧基丙基甲基二乙氧基 矽烷、γ-丙烯氧基丙基二乙基乙氧基矽烷、γ-丙烯氧基丙 基乙基二乙氧基矽烷、γ-丙烯氧基丙基三乙氧基矽烷、γ_ 甲基丙烯氧基丙基二甲基甲氧基矽烷、γ-甲基丙烯氧基丙 基甲基二甲氧基矽烷、γ-甲基丙烯氧基丙基二乙基甲氧基 矽烷、γ -甲基丙烯氧基丙基乙基二甲氧基矽烷、γ -甲基丙 烯氧基丙基三甲氧基矽烷、γ-甲基丙烯氧基丙基二甲基乙 氧基矽烷、γ -甲基丙烯氧基丙基甲基二乙氧基矽烷、γ_甲 基丙烯氧基丙基二乙基乙氧基矽烷、γ_甲基丙烯氧基丙基 乙基二乙氧基矽烷、γ -甲基丙烯氧基丙基三乙氧基矽烷等 〇 由二氧化矽微粒子(A )的硬化性組成物中之凝集防 止、硬化性組成物之黏度的減低及保存安定性提高的觀點 來看’以r-丙烯氧基丙基二甲基甲氧基矽烷、γ-丙烯氧基 丙基甲基二甲氧基矽烷、γ-甲基丙烯氧基丙基二甲基甲氧 基矽烷、γ -甲基丙烯氧基丙基甲基二甲氧基矽烷、γ-丙烯 氧基丙基三甲氧基矽烷、γ-甲基丙烯氧基丙基三甲氧基矽 烷爲佳,較佳爲r-丙烯氧基丙基三甲氧基矽烷。又,這 些可倂用2種以上。 又,如此矽烷化合物(E)可由公知方法製造,又可 被販賣。 使二氧化矽微粒子(A)進行表面處理時的矽烷化合 物(E)之使用量對於二氧化矽微粒子A) 100質量份而言 -32- 201031694 ,一般爲10〜50質量份,較佳爲20〜40質量份,更佳爲 24〜36質量份。矽烷化合物(E)之使用量未達10質量 份時,硬化性組成物之黏度會變高,對二氧化矽微粒子( A )之硬化性組成物中的分散性會惡化而可能產生凝膠化 。又,超過50質量份時,會引起二氧化矽微粒子(A )之 凝集。且,使用作爲二氧化矽微粒子(A)分散於有機溶 劑之二氧化矽微粒子時,前述二氧化矽微粒子(A)之質 φ 量表示分散於有機溶劑之僅二氧化矽微粒子本身之質量。 又.,對於二氧化矽微粒子(A)之表面處理如後述。 於硬化性組成物中含有大量丙烯酸酯(後述脲烷化合 物(B )及反應性丙烯酸酯(C ))時,作爲前述矽烷化合 物(E),具有丙烯基,換言之R1爲氫原子之一般式(1 )所表示之矽烷化合物、硬化性組成物中含有大量甲基丙 烯酸酯(後述脲烷化合物(B)及甲基丙烯酸酯(C))時 ,作爲前述矽烷化合物(E),使用含有甲基丙烯基,換 φ 言之R1爲甲基之一般式(1)所表示之矽烷化合物爲佳。 如此情況下,硬化本發明之硬化性組成物時容易引起硬化 反應。 〈(B )脲烷化合物〉 本發明所使用之(B )脲烷化合物(以下僅稱爲「( B )脲烷化合物」。)如下述一般式(1)所示,分子中含 有2個以上的聚合性不飽和鍵。 -33- 201031694 〔化4〕In the second modification, in the second modification, at least one of the lower side of the wafer W is supplied with light, and the first modified composition of the wafer W is plugged down. H2 is saved by the above-mentioned implementation number, or by holding in the group of holding hardenability, and is compared with the shrinkage of the object, compared with the use of the holding, and the holding plate does not have the holding plate W2 of -17-201031694 It is made of the substrate W1. When the wafer W according to the second modification is used, the photocurable composition is applied by spin coating on the entire surface of the wafer W, and the photocurable composition applied to the wafer W is transferred by transfer. The body 62 is transferred. In the wafer W of the second modification, since the holding plate W2 is not provided, the photocurable composition is continuously present on the entire surface of the wafer W, and the photocurable composition is shrunk. Due to the shrinkage of the cumulative photocurable composition, there is a fear that an error occurs between the position where the transfer body 62 is transferred and the position where it is transferred. Therefore, in order to prevent the occurrence of such an error, it is preferable to change the pitch of the position where the transfer body 62 is in contact with the photocurable composition in accordance with the shrinkage of the photocurable composition to be used. In other words, the transfer body 62 is a pitch at which the transfer position is adjacent to the position and the transfer body is in contact with the other position of the photocurable composition, and the shrinkage ratio of the photocurable composition to be used is matched. It is preferable to set and change it to be wider than the desired distance after curing of the photocurable composition. The same portions as those of the wafer W according to the above-described embodiment are denoted by the same reference numerals as those in Fig. 5, and description thereof will be omitted. Figure 6 shows a grid diagram of a control device 200 having a forming device 10. As shown in Figure 6, the control device 200 has an image recognition device 202 for identifying an image captured by the detecting device 72. The output of 72 is input to the main control unit 2〇4. The main control unit 204 controls the y-axis motor 32, the X-axis motor 56, the z-axis motor 64 for the support member, and the boring motor 34 by controlling the motor control circuit 206. Further, the main control unit 204 201031694 controls the light source 70 by controlling the light source driving circuit 208. Further, the main control unit 404 controls the z-axis motor 80 for the detecting device by controlling the motor control circuit 2 10 . Further, the main control unit 204 controls the valve 38 by controlling the valve drive circuit 212. Further, the main control unit 204 controls the drive source 18 by controlling the drive source control circuit 2 1 4 . Further, when an injection device (not shown) for injecting a photocurable composition into the hole h2 formed in the wafer W is provided in the forming device 10, the control of the injection device is also carried out by the control device 200. Fig. 7 is a first flow chart showing the control of the forming apparatus 10 of the control unit 200, which shows the steps of the forming method of the lens array forming of the optical parts of the shaped object. Here, the lens array is an optical component in which a plurality of members form a plurality of lens portions. In the first flowchart, the step of applying the photocurable composition to the wafer W in total is applied, for example, by spin coating. At the beginning of the series of steps, in step S100, the placing step of the wafer W placed on the support stage 14 is carried out. Next, in the stage s 2 00, a photocurable composition coating step of applying a photocurable composition to the wafer W is carried out. In the photocurable composition application step, the main control unit 204 controls the valve drive circuit 2 12 to supply the photocurable composition to the surface of the wafer W at a predetermined time and in an open state. After the supply of the photocurable composition is completed, the main control unit 204 controls the drive source control circuit 2 1 4 to drive the drive source 18 for a predetermined time. By driving the driving source 18, the support table 14 is rotated, and the photohardenable composition supplied to the wafer W placed on the support table 14 is slightly spread by the centrifugal force on the surface of the wafer W. -19-201031694 status. In the next stage S300, a transfer step of transferring the transfer shape formed by the transfer body 62 to the photocurable composition is carried out. A detailed description of the transfer step of the stage S300 will be described later. In the next stage S 4 0 0, it is judged whether or not all the transfer steps have ended. That is, as the step S300, for example, after the transfer step of about 1,500 times to 2,400 times is repeated, it is determined whether or not the final transfer step is performed. In the step S4 00, if it is determined that the final transfer step is not the same, the process returns to the step S3 00. On the other hand, when it is determined in the step S300 that the final transfer step is made, the process proceeds to the next stage S500. In the stage S 5 00, the crystal circle W transferred to the applied photocurable composition is placed on the support table 14 and carried out of the forming apparatus 10. Further, when the forming apparatus 1 is a device such as a robot that does not have the wafer W placed on the support table 14 and the wafer W is carried out from the forming apparatus 10, the wafer W is placed on the support table 14 and the self-forming apparatus 10 is mounted. The removal of the wafer W is performed by the operator by hand, and the operations of the stages S100 and S500 by the control of the main control unit 204 are not performed. FIG. 8 shows a first flow chart of the transfer step of the control device 200. When the photocurable composition is applied to the entire wafer W by spin coating or the like, the thermosetting composition is formed on the transfer body. A detailed flowchart of the control of the transfer step (stage S 3 0 0) in which the transfer shape of the transfer is performed. At the start of the transfer step, a step of deforming the photocurable composition applied to the wafer W in the step S302 in a transfer shape formed on the transfer body 62 and deforming the same is carried out. That is, in the stage S 3 02, the main control unit 204 201031694 controls the motor control circuit 206 to drive the y-axis motor 32, the x-axis motor 56, the support member z-axis motor 64, and the x-axis motor 34 to be applied to the crystal. The predetermined position of the photocurable composition of the circle W is in contact with the transfer body 62, and the photocurable composition is deformed to move at least the transfer member 62 and the support table 14. In the deformation step of the stage S 3 02, the detection device 7 2 detects that the image recognition device 202 performs image processing, and the transfer body 62 φ is in contact with the positive position of the photocurable composition on the support table. 1 and the transfer body 62 creates position correction data, and in accordance with the correction data, in the deformation step of at least one of the movable transfer body 62 and the support table 14 by the control of the main control unit 204, The photocurable composition is deformed in accordance with the convex portion 90 of the transfer body 62. Here, the convex portion 90 of the transfer body 62 is processed to have an inverted shape of each lens portion (optical part portion) constituting the lens array. Therefore, the photocurable composition is deformed into a shape of a lens portion formed by a concave aspherical shape by deforming the convex portion 90 from the aspherical shape. In the embodiment, the transfer body 62 having the convex portion 90 is used to form the concave lens portion. For example, the transfer member 62 having the concave portion to form the convex lens portion is used, and the optical component to be formed is used. For the shape of the portion, a transfer body 62 having a transfer portion processed into the shape of the optical component portion and the reverse shape may be selected. Further, when the transfer body 62 is selected, the shrinkage ratio of the photocurable composition to be used is selected in consideration of the type of the photocurable composition to be used, and even if the lens portion having the same final shape is formed, the phase can be selected. Different size - 21 - 201031694 A transfer body that forms a convex portion 90 or the like of a different shape. In other words, the shrinkage during the molding of the photocurable composition is changed to the transfer body 62. In the next step S3 04, a curing step of hardening the photocurable composition deformed by the transfer member 62 is carried out by contact with the transfer member 62. In other words, the main control unit 204 controls the light source driving circuit 208 to irradiate the light source 70 with a portion of the photo-curing composition that is at least deformed by contact with the transfer body 62 at a predetermined time. By the hardening step of the step S3 04, the photocurable composition is subjected to @hardening in a state of being deformed into the shape of the lens portion, and one lens portion is produced in the photocurable composition. In the next step S3 06, a separation step of separating the cured photocurable composition from the transfer body 62 is carried out. In other words, the main control unit 204 controls the motor control circuit 206 to move the transfer body 62 in a state of being in contact with the thermosetting composition to the z-axis motor 64 for the upper and lower driving support members. After the completion of the series of transfer steps by the step S302, the step S304, and the step S306 described above, the transfer step is completed, and one lens portion is formed in the photocurable composition. On the other hand, as shown in FIG. 6, the number of the lens portions formed by the 0 is repeated, and the transfer process is repeated until the transfer is completed, and the shape of the lens portion in which the photocurable composition is transferred and the number of repeated transfer steps is the same, And the lens array is manufactured. Fig. 9 is a second flow chart showing the control of the lens array forming of the optical component of the shaped object by the control of the forming device 10 of the control device 200. The first flowchart shows a step in which the photocurable composition is applied to the entire surface of the wafer W by spin coating. On the other hand, in the second flowchart, the steps of injecting the photocurable composition into the plurality of holes h2-22 to 201031694 (see Fig. 2) of the wafer w using an injection device (not shown) are shown. In the step shown in the first flowchart, in step S100, the mounting step of placing the wafer W on the support table 14 is performed, and in the step S2 00, the photo-curable composition is entirely applied to the wafer W, in the stage s 3 00. The transfer shape formed on the transfer body 62 is transferred to the photocurable composition, and in step S400, it is determined whether or not all of the transfer steps are completed, and then the wafer W is carried out in the step S5 00 outside the φ shape forming apparatus 1. On the other hand, in the step shown in the second flowchart, the wafer W in the step S200 is not coated with the photocurable composition in its entirety, and is formed in the crystal in the transfer step of the step S 3 00 described later. The hole h2 of the circle W is injected into the curable composition. Fig. 10 shows a second flow chart of the transfer step by the control device 200, which is shown in the plurality of holes h2 formed in the wafer W, and is injected into the photocurable composition using an injection device, and is transferred to the thermosetting composition. A detailed flowchart of the control of the transfer step (stage S3 00) formed on the transfer shape of the transfer body 62. At the start of the transfer step, in the step S302, the injection step (stage S3 02a) of one of the plurality of holes h2 formed in the wafer W is injected into the hole, and the step S3 02a is injected into the hole. The step of contacting (S3 02b) of the photocurable composition of one of h2 in contact with the transfer body 62 is carried out by a deformation step of deforming the photocurable composition in a transfer shape formed on the transfer body 62. In other words, in the step S302, the main control unit 204 controls the injection device to inject the -23-201031694 photocurable composition into one of the plurality of holes h2 of the wafer W, and then controls the motor control circuit 206 to inject one. At least one of the transfer body 62 and the support table 14 is moved by the hole h2 of the hole h2 in contact with the transfer body 62. In the next step S3 04, a hardening step of curing the photocurable composition which is deformed in accordance with the transfer body 62 is carried out. That is, the main control unit 204 irradiates the light source 70 with at least light irradiation of the curable composition injected into the hole h2 in the step S3 02a. By the hardening step of the step S3 04, the photocurable composition injected into the hole h2 is deformed into the shape of the lens portion to produce one through mirror portion. In the next step S306, a step of separating the photocurable composition injected from the hardened hole h2 and the transfer member 62 is performed. After the end of the series of transfer steps by the stages S302a, S302b, S304, and S306 described above, one shot of the plurality of holes h2 formed in the wafer W is hardened by the end of the transfer step. At the same time as the composition, the photocurable composition is cured in a state of being deformed in a transfer shape formed on the transfer body 62, and 1 H lens portions are formed. As shown in FIG. 9, the number of the lens portions formed is the same as the number of lens portions of the photocurable composition transfer and the repeated transfer step by repeating the transfer step until all the transfer ends. Shape to form a lens array. Fig. 11 shows a step of producing a lens of an optical component having a lens portion formed by at least one aspherical shape using the lens array 306 formed by the above-described steps. First, as shown in Fig. 11 (a) and Fig. 11 (b) - 24 - 201031694, the formed lens array is joined by a method such as bonding (joining step) as necessary. Fig. 11(a) shows three lens arrays 304 before bonding, and Fig. n(b) shows bonded lens arrays 310 of three lens arrays 34 joined. Then, the cemented lens array 3 1 0 ' joined by the joining step is divided into at least one lens portion by a cutting method or the like (dividing step). The lens is manufactured by dividing the bonded lens array 310. Here, as described above, when the patterned layer S (see Fig. 2) is formed on the wafer W, it is easy to perform the division of the bonded φ mirror array 310. Fig. 11 (c) shows a lens array 314 in which the lens array 304 is bonded to the bonded lens array 310, which is normally laminated, and cut into a lens portion 312. The lens 314 can be manufactured by, for example, being incorporated in a light-receiving element such as a CMOS sensor, and the manufactured camera can be used, for example, as a camera incorporated in a mobile phone. Further, in the manufacturing step of the lens described above, the step of manufacturing the lens 3 1 4 having the plurality of lens portions by dividing the bonded lens φ array 3 10 by bonding the complex lens array 306 to the bonded lens array is performed. Although the division is performed directly under a single layer without joining the complex lens array 304, the lens 314 can be formed by a single layer. Further, the undivided lens array 304 and the bonded lens array 310 can also be used as the lens array 304 and the bonded lens array 310. Next, a second embodiment of the present invention will be described. In the first embodiment, the lens array 30 (see Fig. 1) is formed by using the forming device 10 (see Fig. 1). In the second embodiment, the forming device 1 is used to form the lens array. The formation of the model -25-201031694 was used. In the same manner as in the first embodiment, the model is formed by the step of placing the stage S 1 00, the step of applying the photocurable composition in the step S200, the transfer step of the step S300, and the wafer unloading step of the stage S500. The transfer step of S300 is repeated in accordance with the number of lens portions of the finally formed lens array. In the first embodiment, the transfer body 62 having the aspherical shape formed by the lens array 304 and the transfer portion 62 processed in the reverse shape are used as the transfer body 62 (see Fig. 2). On the other hand, in the second embodiment, the transfer body 62 having the lens portion processed in the same shape as the lens portion of the finally formed lens array is used. Therefore, in the model for forming the lens, the shape of the lens portion 31 of the finally formed lens array 304 is transferred. In the second embodiment of the present invention, in the second embodiment of the present invention, a step of forming a lens array as a primary optical component and a process of dividing a molded lens array into a secondary optical component are used. The steps of the lens are explained. When a lens is manufactured using a model formed by the forming device 10 and a lens array is formed, first, as shown in Fig. 12(a), the forming device 10 is used and the model 300 is formed (formation step), and the shaped model 300 is used, for example, using a nai. The technique of nanoimprint, forming lens array 304 (lens array forming step). For example, two models 300 are prepared, and the side surfaces of the two models 300 and 300 which are transferred to the shape of the transfer body 62 (see FIG. 2) are arranged in opposite directions to each other, and are used between the models 300 and 300. The supply device 308, for example, 201031694 material for supplying a lens array such as a curable composition, is formed by having a material such as a curable composition deformed in a shape deformed by the shape of the model 300 and 3 Ο 0. 00 The transfer surface shape and the lens array of the opposite shape. In this case, for example, when the photocurable composition is used as the material of the lens array in the same manner as in the case of the manufacture of the model 300, the curable composition can be cured by irradiation of light. Further, instead of arranging the two models 300 to the shape of the transfer body 62, the transfer side faces are opposed to each other, and the material for supplying the lens array between the models 300 and 300 is configured as a model 3 0 0 The shape of the transfer body 62 is transferred to the side opposite to the flat plate, and the material of the lens array can be supplied between the mold 300 and the flat plate. The lens array formed is the same as the lens array formed in the first embodiment, and the plurality of sheets are joined as necessary as shown in Fig. 12 (b) (joining step), as shown in Fig. 12 (c). The lens array 310 is divided into the bonded lens arrays 310 to have at least one lens portion (dividing step). As shown in FIG. 12(d), a lens Φ 3 1 4 having one lens portion 312 is manufactured. In the same manner as the lens manufactured in the first embodiment, the lens 3 14 can be manufactured by, for example, being incorporated in a light-receiving element such as a CMOS sensor, and the camera can be used as a camera incorporated in a mobile phone, for example, in the first embodiment. Similarly, the lens array 304 manufactured in the second embodiment can be divided into a single layer without being bonded, so that a lens 314 made of a single layer can be formed. Further, in the first embodiment described above, the lens array 304 and the cemented lens array 3 1 0 can be used as the lens array 304 and the cemented lens array 3 1 0, and the lens array can be formed. In the second embodiment, an example in which a mold to be formed into a lens array is molded is described. However, the shape in which the forming device 1 is used for forming is not limited to an optical component such as a lens array to be formed. The model for the optical component or the optical component may, for example, be an electroforming mother mold or a grooved model used for electroforming. The hardenable composition used in the present invention will be described in detail below. [Curable composition] The curable composition used in the present invention contains a urethane compound having a polymerizable functional group and a polymerization initiator, preferably (A) cerium oxide microparticles, and (B) has a specific structure. a urethane compound (hereinafter may be simply referred to as "urethane compound (B)"), (C) a (meth) acrylate having an ethylenically unsaturated group and having an alicyclic structure (hereinafter may be referred to simply as reactivity) The (meth) acrylate (C)) and (D) polymerization initiator are characterized in that the cerium oxide microparticles (A) are surface-treated with a specific decane compound. Each component will be described below. Further, the term "(meth)acrylate" means methacrylate and/or acrylate. <(A) cerium oxide microparticles> As the cerium oxide microparticles (A) used as the curable composition, those having an average particle diameter of 1 to 10 nm can be used. When the average particle diameter is less than 1 nm, the viscosity of the curable composition to be produced is increased, and the content of the curable composition of the cerium oxide microparticles -28 - 201031694 (A) is limited, and the curable composition is The dispersibility is deteriorated, and the cured product obtained by curing the curable composition (hereinafter simply referred to as a cured product) tends to have insufficient transparency and heat resistance. Further, when the average particle diameter exceeds 100 nm, the transparency of the cured product may deteriorate. The average particle diameter of the cerium oxide microparticles (A) is preferably from 1 to 50 nm, more preferably from 5 to 50 nm, most preferably from 5 to 40 nm, from the balance between the viscosity of the curable composition and the transparency of the cured product. . Further, the average particle diameter of the silica sand fine particles (A) was observed by a high-decomposition energy transmission electron microscope (H-9000 type manufactured by Hitachi, Ltd.), and the fine particle images observed were randomly selected from 100. The cerium oxide particle image is obtained by a known image data statistical processing method to obtain a numerical average particle diameter. In the curable composition, in order to increase the amount of the hardened material of the cerium oxide microparticles (A), the cerium oxide microparticles having an average particle diameter difference may be mixed and used. Further, as the cerium oxide fine particles (A), porous φ-type cerium oxide rubber or a composite metal oxide of aluminum, magnesium, zinc or the like may be used. The content of the cerium oxide microparticles (A) in the curable composition is preferably 20 to 80% by mass as the surface-treated cerium oxide microparticles, and the heat resistance, environmental resistance and curability of the cured product. The viscosity balance of the composition is preferably from 40 to 60% by mass. If it is in this range, the fluidity of the curable composition and the dispersibility of the cerium oxide microparticles (A) in the curable composition are good. Therefore, if such a curable composition is used, it is easy to produce sufficient strength and A cured product of heat resistance and environmental resistance. -29- 201031694 Further, as the cerium oxide fine particles (A), it is preferred to use cerium oxide microparticles dispersed in an organic solvent from the viewpoint of dispersibility in the curable composition. As the organic solvent, it is preferred to use an organic component (hereinafter referred to as a urethane compound (B) or a (meth) acrylate (C)) to be dissolved in the curable composition. Examples of the organic solvent include alcohols, ketones, esters, and glycol ethers. The ease of desolvation in the solvent removal step of removing the organic solvent from the mixture of the cerium oxide microparticles (A), the urethane compound (B), and the (meth) acrylate (C) described later, with methanol and ethanol An alcohol such as isopropyl alcohol, butyl alcohol or η-propyl alcohol, or a ketone-based organic solvent such as methyl ethyl ketone or methyl isobutyl ketone is preferred. Among them, isopropyl alcohol is also preferred. When the cerium oxide fine particles (A) dispersed in isopropyl alcohol are used, the viscosity of the curable composition after solvent removal is lower than when other solvents are used, and a hardening composition having a low viscosity can be produced by stability. The cerium oxide fine particles dispersed in such an organic solvent can be produced by a conventionally known method, and, for example, commercially available under the trade name Snow-TechIPA-ST (manufactured by Seiko Chemical Co., Ltd.) or the like can be used. When the cerium oxide fine particles dispersed in the organic solvent as the cerium oxide fine particles (A) are used, the content of the cerium oxide fine particles (A) in the curable composition of the present invention is expressed only in the composition. The content of the cerium oxide microparticles themselves. Further, the cerium oxide microparticles (A) used in the curable composition of the present invention are surface-treated with a decane compound (E). The following describes the decane compound. 201031694 <(E) decane compound> The aforementioned decane compound (E) is represented by the following general formula (2). [Chemical 3] R6 H2C=C-C--〇(CH2)e——SiR6r(OR7)3_r (2) Ο φ (In the formula (2), R5 represents a hydrogen atom or a methyl group, and R6 represents a carbon number of 1 ~3 alkyl or phenyl, R7 represents a hydrogen atom or a hydrocarbon group having a carbon number of 1 to 10, q represents an integer of 1 to 6, and r represents an integer of 0 to 2.) The viscosity of the curable composition is reduced, and the stability is preserved. From the viewpoint of nature, R6 is preferably a methyl group, R7 is preferably a methyl group, q is preferably 3, and hydrazine is preferably a decane compound (E) for reducing the viscosity of the curable composition, and by The urethane compound (B) to be described later is subjected to a reaction, and the dispersion stability in the curable composition of the cerium oxide micro φ particle (A) and the hardening shrinkage at the time of curing the hardenable composition are increased, and the cured product is to be imparted. Formability and user. In other words, when the cerium oxide microparticles (A) are not surface-treated with the decane compound (E), the viscosity of the curable composition is increased, and the hardening shrinkage at the time of hardening is increased, the hardened material becomes brittle, and cracks are formed in the cured product. Not good. Examples of the decane compound (E) include r-propyleneoxypropyldimethylmethoxydecane, γ-acryloxypropylmethyldimethoxydecane, and γ-acryloxypropyldiethyl. Methoxymethoxydecane, γ-propyleneoxypropylethyl-31 - 201031694 dimethoxydecane, γ-propyleneoxypropyltrimethoxydecane, γ-propyleneoxypropyldimethylethoxy Decane, γ-acryloxypropylmethyldiethoxydecane, γ-propyleneoxypropyldiethylethoxydecane, γ-acryloxypropylethyldiethoxydecane, γ-propylene Oxypropyl triethoxy decane, γ-methacryloxypropyl dimethyl methoxy decane, γ-methacryloxypropyl methyl dimethoxy decane, γ-methyl propyleneoxy Propyl diethyl methoxy decane, γ-methyl propyloxypropyl ethyl dimethoxy decane, γ-methyl propyloxypropyl trimethoxy decane, γ-methyl propyleneoxy propyl Dimethylethoxydecane, γ-methacryloxypropylmethyldiethoxydecane, γ-methacryloxypropyldiethylethoxysilane, γ-methylpropoxypropane Base B The coagulation of the curable composition of the cerium oxide microparticles (A) and the viscosity of the curable composition are reduced by the bismuth ethoxy decane, γ-methyl propyloxypropyl triethoxy decane, and the like. From the standpoint of improving stability, 'r-propoxypropyldimethylmethoxydecane, γ-acryloxypropylmethyldimethoxydecane, γ-methylpropoxypropyldi Methyl methoxy decane, γ-methacryloxypropyl methyl dimethoxy decane, γ-acryloxypropyl trimethoxy decane, γ-methyl propyloxypropyl trimethoxy decane Preferably, it is r-propyleneoxypropyltrimethoxydecane. Moreover, these can be used in two or more types. Further, such a decane compound (E) can be produced by a known method and can be sold. The amount of the decane compound (E) used for surface treatment of the cerium oxide microparticles (A) is -32 to 201031694, generally 10 to 50 parts by mass, preferably 20, for the cerium oxide microparticles A) 100 parts by mass. ~ 40 parts by mass, more preferably 24 to 36 parts by mass. When the amount of the decane compound (E) is less than 10 parts by mass, the viscosity of the curable composition is increased, and the dispersibility in the curable composition of the cerium oxide microparticle (A) is deteriorated to cause gelation. . Further, when it exceeds 50 parts by mass, aggregation of the cerium oxide microparticles (A) is caused. When the cerium oxide fine particles dispersed as an organic solvent in the cerium oxide fine particles (A) are used, the mass φ of the cerium oxide fine particles (A) indicates the mass of only the cerium oxide fine particles themselves dispersed in the organic solvent. Further, the surface treatment of the cerium oxide microparticles (A) will be described later. When the curable composition contains a large amount of acrylate (the urethane compound (B) and the reactive acrylate (C) described later), the decane compound (E) has a propylene group, in other words, R1 is a hydrogen atom. 1) When the decane compound or the curable composition is a large amount of methacrylate (the urethane compound (B) and the methacrylate (C) described later), the methyl group is used as the decane compound (E). The propylene group is preferably a decane compound represented by the general formula (1) wherein R1 is a methyl group. In this case, the hardening reaction of the present invention is likely to cause a hardening reaction. <(B) urethane compound> The (B) urethane compound (hereinafter referred to simply as "(B) urethane compound") used in the present invention has two or more molecules as shown in the following general formula (1). Polymeric unsaturated bond. -33- 201031694 〔化4〕
上述一般式(1)中,Ri爲具有直鏈或分支之碳數1 〜12的2價脂肪族基、具有脂環基之碳數3〜I2的2價有 機基、具有芳香環之碳數6〜30之2價有機基或〔-( CH2) a-〇-(CH2) b-〕^(a及b各獨立表示1〜10之整數 ,c表示1〜5之整數)。R i由後述之本發明的硬化性組 ® 成物之硬化性觀點、與硬化該硬化性組成物所得之硬化物 (以下僅稱爲「硬化物」)的硬度及與捲曲性之平衡觀點來 看,以碳數1〜6之2價脂肪族基或〔-(CH2) a-0- ( CH2 ) b-〕c (a及b各獨立表示1〜5之整數,c表示1〜3之整數)時爲佳 ,以碳數2〜4之2價脂肪族基或〔-(CH2) a-0- ( CH2) b-〕c (a及b各獨立表示2〜4之整數,c表示1或2)時爲較 佳,以碳數2或3之2價脂肪族基或-(CH2 ) 2-0- ( CH2 ) 2-時爲更佳。 ¥ 上述一般式(1)中,r2表示具有直鏈或分支之碳數 1〜10的2價脂肪族基、具有脂環基之碳數3〜10的2價 有機基、具有芳香環之碳數6〜30的2價有機基或〔-( CH2) d-0-(CH2) e-〕f (但,d及e各獨立表示1〜10之 整數,f表示1〜5之整數)。112由後述本發明之硬化性 組成物之硬化性觀點、與硬化該硬化性組成物所得之硬化 物的硬度及與捲曲性之平衡觀點來看,以碳數1〜6的2 價脂肪族基或具有芳香環之碳數6〜30的2價有機基或 -34- 201031694 (-(CH2 ) d-〇-(CH2) e-〕f(d 及 e 各獨立表示 1〜5 的 整數,f表示1〜3的整數)爲佳,以碳數2〜4的2價脂 肪族基、具有苯環之碳數 6〜30的2價有機基或〔_ (CH2 ) d-〇-(CH2) e-〕f(d及e各獨立表示2〜4的整 數,f表示1或2)時爲較佳,以碳數2或3的2價脂肪 族基或-(CH2) 2-0- ( CH2) 2-時爲更佳。 上述式(1)中,R3及R4各獨立爲氫原子或甲基。由 φ 低曝光量下進行硬化的硬化性觀點來看,以氫原子爲佳。 於硬化性組成物使用(B )脲烷化合物時,可得到表 面硬度、透明性及捲曲性之平衡性優良之硬化物。即,可 達到對於由本發明之硬化物所成之種種製品之高品質》 本發明的硬化性組成物1 〇〇質量份中,(B )脲烷化 合物的含量較佳爲10〜99質量份,較佳爲20〜99質量份 ,更佳爲3〇〜99質量份。(B)脲烷化合物之含量藉由前 述範圍内,可得到硬化性、鉛筆硬度、耐擦傷性、捲曲性 Φ 、強度與柔軟性之平衡性優良之樹脂。 本發明所使用之上述一般式(1)所示脲烷化合物可 將下述一般式(3)所示含聚合性不飽和基之醇化合物( 以下亦稱爲「化合物(1)」)、與下述一般式(4)所示 含聚合性不飽和基之異氰酸酯化合物(以下亦稱爲「化合 物(2)」)進行接觸而合成。 〔化5〕In the above general formula (1), Ri is a divalent aliphatic group having a linear or branched carbon number of 1 to 12, a divalent organic group having an alicyclic group having 3 to 12 carbon atoms, and a carbon number having an aromatic ring. a valence organic group of 6 to 30 or [-(CH2) a-〇-(CH2) b-]^ (a and b each independently represent an integer of 1 to 10, and c represents an integer of 1 to 5). R i is derived from the viewpoint of the curability of the curable group of the present invention described later, and the balance between the hardness and the curl of the cured product obtained by curing the curable composition (hereinafter simply referred to as "cured material"). Look, a divalent aliphatic group having a carbon number of 1 to 6 or [-(CH2) a-0-(CH2) b-]c (a and b each independently represent an integer of 1 to 5, and c represents 1 to 3; In the case of an integer), it is preferably a divalent aliphatic group having 2 to 4 carbon atoms or [-(CH2) a-0-(CH2) b-]c (a and b each independently represent an integer of 2 to 4, and c represents It is preferably 1 or 2), more preferably a divalent aliphatic group having 2 or 3 carbon atoms or -(CH2) 2-0-(CH2) 2-. In the above general formula (1), r2 represents a divalent aliphatic group having a linear or branched carbon number of 1 to 10, a divalent organic group having a carbon number of 3 to 10 having an alicyclic group, and a carbon having an aromatic ring. A divalent organic group of 6 to 30 or [-(CH2)d-0-(CH2)e-]f (however, d and e each independently represent an integer of 1 to 10, and f represents an integer of 1 to 5). 112 is a divalent aliphatic group having a carbon number of 1 to 6 from the viewpoint of the curability of the curable composition of the present invention and the balance between the hardness of the cured product obtained by curing the curable composition and the curling property. Or a divalent organic group having an aromatic ring having a carbon number of 6 to 30 or -34-201031694 (-(CH2) d-〇-(CH2)e-]f (d and e each independently represent an integer of 1 to 5, f An integer of 1 to 3 is preferable, and a divalent aliphatic group having a carbon number of 2 to 4, a divalent organic group having a carbon number of 6 to 30 of a benzene ring or [_(CH2)d-〇-(CH2) E-]f (d and e each independently represent an integer of 2 to 4, and f represents 1 or 2), preferably a divalent aliphatic group having 2 or 3 carbon atoms or -(CH2) 2-0- ( In the above formula (1), each of R3 and R4 is independently a hydrogen atom or a methyl group. From the viewpoint of hardenability at which φ is hardened at a low exposure amount, a hydrogen atom is preferred. When the (B) urethane compound is used as the curable composition, a cured product having excellent balance of surface hardness, transparency, and curling property can be obtained. That is, high quality of various products made of the cured product of the present invention can be achieved. Hardening of the invention The content of the (B) urethane compound in the composition 1 part by mass is preferably 10 to 99 parts by mass, preferably 20 to 99 parts by mass, more preferably 3 to 99 parts by mass. (B) Urea When the content of the compound is within the above range, a resin having excellent curability, pencil hardness, scratch resistance, curling property Φ, and balance between strength and flexibility can be obtained. The urea represented by the above general formula (1) used in the present invention The alkane compound may contain a polymerizable unsaturated group-containing alcohol compound represented by the following general formula (3) (hereinafter also referred to as "compound (1)"), and a polymerizable unsaturated group represented by the following general formula (4). The isocyanate compound (hereinafter also referred to as "compound (2)") is synthesized by contact. [Chemical 5]
-35- (4) 201031694 式(3 )中,Ri及R3與前述相同。-35- (4) 201031694 In the formula (3), Ri and R3 are the same as described above.
式(4 )中,R2及R4與前述相同。In the formula (4), R2 and R4 are the same as described above.
作爲上述化合物(1 ) ’例如可舉出2-羥基乙基(甲 基)丙烯酸酯、2-羥基丙基(甲基)丙烯酸酯、3-羥基丙 基(甲基)丙烯酸酯、4-羥基丁基(甲基)丙烯酸酯等。 這些可單獨使用1種或組合2種類以上。較佳爲2-羥基乙 基(甲基)丙烯酸酯。一般而言R3爲氫原子時,即化合 物(1)爲具有丙烯酸酯結構時,比R3爲甲基,即化合物 (1)爲具有甲基丙烯酸酯結構時,所得之含有脲烷化合 物的硬化性組成物之硬化性有更優良之傾向。且,本案說 明書中「(甲基)丙烯酸酯」之記載表示甲基丙烯酸酯及 /或丙烯酸酯。 一般式(4)所示分子内含有1個以上不飽和基的異 氰酸酯化合物之〇CN-R2-的r2與上述一般式(1)所表示 之化合物中的R2相同,但作爲〇CN-R2-之具體例,可舉 出下述所示(a)〜(e)等。 〔化7〕 la) —(CHj)Examples of the compound (1) ' include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, and 4-hydroxyl group. Butyl (meth) acrylate and the like. These may be used alone or in combination of two or more. Preferred is 2-hydroxyethyl (meth) acrylate. In general, when R3 is a hydrogen atom, that is, when the compound (1) has an acrylate structure, and the ratio R3 is a methyl group, that is, when the compound (1) has a methacrylate structure, the resulting sulfamate-containing compound has curability. The hardenability of the composition tends to be better. Further, the description of "(meth) acrylate" in the present specification means methacrylate and/or acrylate. R2 of 〇CN-R2- of the isocyanate compound having one or more unsaturated groups in the molecule represented by the formula (4) is the same as R2 in the compound represented by the above general formula (1), but as 〇CN-R2- Specific examples thereof include the following (a) to (e) and the like. 〔化7〕 la) —(CHj)
CO * <b) —(CH2), JCH2 (—CO * <b) —(CH2), JCH2 (—
•NCO <c) NCO-卜一 * -36- 201031694 (e) —{•{CHJi—0-)^-•NCO <c) NCO-卜一 * -36- 201031694 (e) —{•{CHJi—0-)^-
會 ❹ 上述式中,*爲含有異氰酸醋基 '氫、(甲基)丙烯 基、烴基、或芳香環之結構。各*可爲相同或相異。(a) 爲含有具有直鏈或分支結構之2價飽和脂肪族基、脂環基 或芳香環之結構’ h爲除去異氰酸酯基之部分的碳數爲滿 足成爲1以上1〇以下的條件之整數。(b)爲含有具有直 鏈或分支結構之2價飽和脂肪族基、脂環基或芳香環之結 構,1爲除去異氰酸酯基之部分的碳數爲滿足成爲1以上 10以下之條件的整數。(c)爲將環己院環作爲主骨架之 結構,除去異氰酸酯基之部分的碳數爲6以上10以下。 (d)爲將苯環作爲主骨架之結構’除去異氰酸酯基的部 分之碳數爲6以上1〇以下。(e)爲具有酸骨架之結構’ i、j'k各爲除去異氰酸酯基的部分之碳數爲滿足成爲1 以上1 0 0以下之條件的整數。 上述一般式(4)中’ R4爲氫原子或甲基’較佳爲氫 原子。 上述化合物(2 )之較佳具體例如下所示。作爲具有 上述(a)結構者,可舉出2-(甲基)丙烯醯氧基乙基異 氰酸酯、3-(甲基)丙烯醯氧基丙基異氰酸酯、4-(甲基 )丙嫌酿氧基丁基異氰酸醋、5-(甲基)丙稀醯基戊基異 氰酸酯、6-(甲基)丙烯醯氧基己基異氰酸酯、2-(甲基 )丙烯醯氧基丙基異氰酸酯、1,1-雙(丙烯醯氧基甲基) -37- 201031694 乙基異氰酸酯,作爲具有上述(b)之結構者,可舉出3_ 異氰酸基-2-甲基丙基(甲基)丙烯酸酯,作爲具有上述( c)之結構者,可舉出3 -異氰酸基環己基(甲基)丙烯酸 酯、4-異氰酸基環己基(甲基)丙烯酸酯,作爲具有上述 (d)之結構者,可舉出3-異氰酸基苯基(甲基)丙烯酸 酯、4-異氰酸基苯基(甲基)丙烯酸酯、3,5-二異氰酸基_ 2-甲基苯基(甲基)丙烯酸酯,作爲具有上述(e)之結 構者,可舉出2-(異氰酸基乙氧基)乙基(甲基)丙烯酸 酯。一般而言,R4爲氫原子時,即化合物(2)具有丙燦 酸酯結構之情況,比R4爲甲基時,即化合物(2 )具有甲 基丙烯酸酯結構之情況,所得之含有脲烷化合物之硬化性 組成物的硬化性有更優良之傾向。 將上述化合物(1)與化合物(2)進行反應時的莫耳 比爲化合物(1 ):化合物(2 ) = 1 : 1〜1 : 1 .5。 上述化合物(1)與上述化合物(2)進行反應時,使 用脲烷化觸媒較佳。藉由使用脲烷化觸媒,可顯著加速反 應。作爲脲烷化觸媒之具體例,可舉出二丁基錫二月桂酸 酯、萘酸銅、萘酸鈷、萘酸鋅、三乙基胺、1,4-二氮雜雙 環〔2.2.2〕辛烷、2,6,7-三甲基-1,4-二氮雜雙環〔2.2_2〕 辛烷等。 這些脲烷化觸媒可單獨使用1種、或亦可組合2種以 上使用。脲烷化觸媒之添加量對於化合物(2) 100質量份 而言,以0.01〜5質量份爲佳,較佳爲0.1〜1質量份。添 加量未達0.01質量份時,有時反應性會下降。另一方面 -38- 201031694 ,添加量超過5質量份時,反應時可能會引起副反應。 上述化合物(1)與化合物(2)之反應中的反應溫度 較佳爲-10〜100°C,更佳爲〇〜60°C。特佳爲10〜30°C。 上述反應可於含有BHT( 2,6-二-第三丁基-4-甲基酚 )之己烷中進行。含有BHT之己烷經反應終了後直接可 作爲洗淨溶劑使用’故進行上述反應時對於環境之負荷可 減低。此時的含有BHT之己烷中的BHT之含有量爲1〜 ❿ 1 OOOppm,較佳爲50〜500ppm ’更佳爲1 〇〇〜400ppm。 藉由上述之量比、溫度條件下進行反應時’可抑制副 反應,以良好收率、純度下得到(B )脲烷化合物。又, 可於室溫附近進行反應,故可降低(B )脲烷化合物彼此 之聚合可能性。 ((C)(甲基)丙烯酸酯〉 使用於硬化性組成物之具有乙烯性不飽和基且具有脂 • 環式結構之(甲基)丙烯酸酯(C)因有減低硬化時之收 縮的效果,於造形時可提高對模型之形狀追隨性。例如可 舉出環己基(甲基)丙烯酸酯、4-丁基環己基(甲基)丙 烯酸酯、二環戊基(甲基)丙烯酸酯、二環戊烯基(甲基 )丙烯酸酯、二環戊二烯基(甲基)丙烯酸酯、冰片基( 甲基)丙烯酸酯、異冰片基(甲基)丙烯酸酯、三環癸烷 基(甲基)丙烯酸酯、金剛烷基(甲基)丙烯酸酯、二環 戊基二(甲基)丙烯酸酯、三環癸烷二甲醇二丙烯酸酯、 金剛烷基二(甲基)丙烯酸酯等環烷基(甲基)丙烯酸酯 -39- 201031694 類。 於上述例示的(甲基)丙烯酸酯中’由對金屬模具之 形狀追隨性的觀點來看’具有2個乙嫌性不飽和基之(甲 基)丙烯酸酯爲佳,以二環戊基二(甲基)丙嫌酸酯爲最 佳。 且,所謂脂環式結構爲,碳原子結合成環狀的結構後 除去芳香環結構者。 使用於硬化性組成物之(甲基)丙稀酸酯(c)的配 © 合量,對於表面處理前之二氧化矽微粒子(A) 100質量 份而言’以5〜400質量份爲佳’較佳爲10〜200質量份 ,更佳爲20〜100質量份。配合量若未達5質量份時’對 金屬模具之形狀追隨性會降低。配合量若超過400質量份 時,對基板之密著性會降低。且’使用作爲二氧化砂微粒 子(A)分散於有機溶劑之二氧化矽微粒子時,前述二氧 化矽微粒子(A)的質量表示分散於有機溶劑之僅二氧化 矽微粒子本身的質量而言。 ® 〈(D )聚合啓始劑〉 作爲使用於硬化性組成物之聚合啓始劑(D ) ’可舉 出產生自由基之光聚合啓始劑及熱聚合啓始劑。 作爲前述光聚合啓始劑,例如可舉出二苯甲酮、苯偶 因甲基醚、苯偶因丙基醚、二乙氧基苯乙酮、1-羥基-苯基 苯基酮、2,6-二甲基苯甲醯基二苯基膦氧化物、2,4,6-三甲 基苯甲醯基二苯基膦氧化物及二苯基-(2,4,6-三甲基苯甲 -40- 201031694 醯基)膦氧化物。這些光聚合啓始劑亦’可倂用2種以上。 光聚合啓始劑之硬化性組成物中的含有量’僅可使硬 化性組成物適度硬化的量即可,對於硬化性組成物100質 量份而Η,以0.01〜10質量份爲佳,較佳爲〇.〇2〜5質量 份,更佳爲0.1〜2質量份。光聚合啓始劑的添加量過多 時,會使硬化性組成物之保存安定性降低、或著色、或經 交聯得到硬化物時的交聯會急速進行,產生硬化時的割裂 φ 等問題。又,光聚合啓始劑之添加量過少時,硬化性組成 物無法充分硬化。 作爲前述熱聚合啓始劑,可舉出苯甲醯基過氧化物、 二異丙基過氧碳酸酯、t-丁基過氧(2-乙基己酸酯)等。 熱聚合啓始劑之硬化性組成物中的含有量對於硬化性 組成物100質量份而言,以2質量份以下者爲佳,以0.1 〜2質量份爲較佳。 又,本發明所使用的硬化性組成物視必要以不損害組 成物之黏度及硬化物的透明性、耐熱性等特性的範圍下, 可含有坦平劑、抗氧化劑、紫外線吸收劑、溶劑、顏料、 其他無機塡料等塡充劑、反應性稀釋劑、其他改質劑等。 作爲坦平劑,例如可舉出聚醚變性二甲基聚矽氧烷共 聚合物、聚酯變性二甲基聚矽氧烷共聚合物、聚醚變性甲 基烷基聚矽氧烷共聚合物、芳烷基變性甲基烷基聚矽氧烷 共聚合物、聚醚變性甲基烷基聚矽氧烷共聚合物等。 作爲塡充劑或顏料,可舉出碳酸鈣、滑石、雲母、黏 土、Aerosil (註冊商標)等、硫酸鋇 '氫氧化鋁、硬脂酸 -41 - 201031694 鋅、鋅華、鐵丹、偶氮顏料等。 含有如此各種成分之本發明的硬化性組成物,藉由錐 板式式黏度計 DV-IIIULTRA( BROOKFIELD公司製)、 25°C、SpindleNo.CP-41所測定之黏度一般爲 100〜 5000mPa*s,即使未含有溶劑,其爲低黏度,具有良好操 作性。此原因爲藉由上述二氧化矽微粒子(A)之表面處 理,與二氧化矽微粒子(A)的脲烷化合物(B)及(甲基 )丙烯酸酯(C)之高相溶性、脲烷化合物(B)及(甲基 )丙烯酸酯(C)中之二氧化矽微粒子(A)的高分散安定 性。 〈硬化性組成物的製造方法〉 本發明本發明所使用的硬化性組成物,例如以將分散 於有機溶劑之膠狀二氧化矽(二氧化矽微粒子(A ))以 矽烷化合物(E )進行表面處理的步驟(步驟1 )、於經 表面處理之二氧化矽微粒子(A)中添加脲烷化合物(B) 及(甲基)丙烯酸酯(C),經均勻混合之步驟(步驟2 )、由步驟2所得之二氧化矽微粒子(A)與脲烷化合物 (B)及(甲基)丙烯酸酯(C)之均勻混合液將有機溶劑 及水餾去·脫溶劑的步驟(步驟3)、在步驟3經餾去·脫 溶劑之組成物中添加聚合啓始劑(D ),經均勻混合後作 爲硬化性組成物之步驟(步驟4 )之順序進行而可製造。 以下對各步驟作說明。 •42- 201031694 (步驟1 ) 步驟1中,將二氧化矽微粒子(A)以矽烷化合物(E )進行表面處理。表面處理爲,將二氧化矽微粒子(A) 放入於反應器’一邊攪拌一邊添加矽烷化合物(E)並攪 拌混合’再添加進行該矽烷化合物之水解時所必要的水與 觸媒’並一邊攪拌,一般水解該矽烷化合物,於二氧化矽 微粒子(A)表面使其縮聚合而進行。且,作爲前述二氧 φ 化矽微粒子(A ),使用分散於有機溶劑之二氧化矽微粒 子較佳,此如前述。 且,將藉由前述矽烷化合物之水解的消失,可由氣相 層析法進行確認。藉由氣相層析法(Agilent (股)製型 式6850),使用無極性管柱DB-1(J&W公司製),於溫 度50〜3 00°C,昇溫速度10°C/min,作爲載流氣體使用He ,流量 1.2cc/min,火焰離子化偵測器(Flame ionization detector )下,以内部標準法可測定矽烷化合物之殘存量 Φ ,故可確認藉由矽烷化合物之水解的消失。 且,如前述將二氧化矽微粒子(A )進行表面處理時 的矽烷化合物(E)之使用量對於二氧化矽微粒子(A) 1〇〇質量份而言,一般爲10〜50質量份’較佳爲20〜40 質量份,更佳爲24〜36質量份。 進行水解反應所必要之水量的下限値爲’結合於矽烷 化合物(E)之烷氧基及羥基的莫耳數合計之1倍,上限 値爲1 0倍。水量過度少時,水解速度會極端變慢’缺乏 經濟性,有著無法充分進行表面處理之顧慮。相反地’若 -43- 201031694 水量過度多時’二氧化矽微粒子(A)恐怕會形成凝膠。 進行水解反應時,一般使用水解反應用之觸媒。作爲 如此觸媒之具體例,例如可舉出鹽酸、乙酸、硫酸、磷酸 等無機酸; 甲酸、丙酸、草酸、對甲苯磺酸、安息香酸、鄰苯二甲酸 、馬來酸等有機酸; 氫氧化鉀、氫氧化鈉、氫氧化鈣、氨等鹼觸媒;有機金屬 ♦ 金屬烷氧化物; 二丁基錫二月桂酸酯、二丁基錫二辛酸酯、二丁基錫二乙 酸醋等有機錫化合物, 鋁參(乙醯基丙酮酸酯)、鈦肆(乙醯基丙酮酸酯)、鈦 雙(丁氧基)雙(乙醯基丙酮酸酯)、鈦雙(異丙氧基) 雙(乙醯基丙酮酸酯)、銷雙(丁氧基)雙(乙醯基丙酮 酸酯)、锆雙(異丙氧基)雙(乙醯基丙酮酸酯)等金屬 螯合化合物; 丁氧化硼、硼酸等硼化合物; 等。 彼等中,由對水之溶解性、可得到充分水解速度之觀 點來看,以鹽酸、乙酸、馬來酸、硼化合物爲佳。這些觸 媒可使用1種或組合2種以上使用。 步驟1中,進行矽烷化合物(E)的水解反應時,可 使用非水溶性觸媒,但使用水溶性觸媒較佳。使用水解反 應用之水溶性觸媒時’將水溶性觸媒溶解於適當量的水中 -44- 201031694 後添加於反應系時,可均勻地分散觸媒故較佳。 水解反應所使用之觸媒的添加量雖無特別限定,一般 對於二氧化矽微粒子(a) 100質量份而言,以0.1〜10質 量份爲佳,較佳爲0.5〜5質量份。且,作爲二氧化矽微 粒子(A)使用分散於有機溶劑的二氧化矽微粒子時,前 述二氧化矽微粒子(A)的質量表示分散於有機溶劑之僅 二氧化矽微粒子本身的質量。❹ In the above formula, * is a structure containing an isocyanato group 'hydrogen, a (meth) propylene group, a hydrocarbon group, or an aromatic ring. Each * can be the same or different. (a) is a structure containing a divalent saturated aliphatic group having a linear or branched structure, an alicyclic group or an aromatic ring, and h is a part of the portion from which the isocyanate group is removed, and is an integer satisfying the condition of 1 or more and 1 Torr or less. . (b) is a structure containing a divalent saturated aliphatic group, an alicyclic group or an aromatic ring having a linear or branched structure, and the number of carbons in the portion where 1 is an isocyanate group is an integer satisfying the condition of 1 or more and 10 or less. (c) The structure in which the ring of the ring is used as the main skeleton, and the carbon number of the portion from which the isocyanate group is removed is 6 or more and 10 or less. (d) is a structure in which a benzene ring is used as a main skeleton. The carbon number of the portion from which the isocyanate group is removed is 6 or more and 1 or less. (e) is a structure having an acid skeleton. The number of carbon atoms in the portion where the isocyanate group is removed is an integer satisfying the condition of 1 or more and 100 or less. In the above general formula (4), 'R4 is a hydrogen atom or a methyl group' is preferably a hydrogen atom. Preferred specific examples of the above compound (2) are shown below. Examples of the structure having the above (a) include 2-(meth)acryloxyethyl isocyanate, 3-(meth)acryloxypropyl isocyanate, and 4-(methyl)propene. Butyl butyl isocyanate, 5-(methyl) propyl decyl pentyl isocyanate, 6-(methyl) propylene methoxy hexyl isocyanate, 2-(methyl) propylene methoxy propyl isocyanate, 1 , 1-bis(acryloxymethyl)-37- 201031694 ethyl isocyanate, as the structure having the above (b), 3-isocyanyl-2-methylpropyl (meth)acrylic acid The ester, as the structure having the above (c), may be exemplified by 3-isocyanylcyclohexyl (meth) acrylate or 4-isocyanatocyclohexyl (meth) acrylate. The structure of the structure is exemplified by 3-isocyanatophenyl (meth) acrylate, 4-isocyanatophenyl (meth) acrylate, 3,5-diisocyanato group _ 2- Methylphenyl (meth) acrylate, as the structure which has the said (e), is 2-(isocytyl ethoxy) ethyl (meth) acrylate. In general, when R4 is a hydrogen atom, that is, the compound (2) has a propylene carbonate structure, and when the ratio R4 is a methyl group, that is, the compound (2) has a methacrylate structure, the obtained urethane is contained. The curability of the curable composition of the compound tends to be more excellent. The molar ratio when the above compound (1) is reacted with the compound (2) is the compound (1): the compound (2) = 1 : 1 to 1: 1.5. When the above compound (1) is reacted with the above compound (2), it is preferred to use a urethanized catalyst. By using a urethane catalyst, the reaction can be significantly accelerated. Specific examples of the urethanization catalyst include dibutyltin dilaurate, copper naphthalate, cobalt naphthalate, zinc naphthalate, triethylamine, and 1,4-diazabicyclo[2.2.2] Octane, 2,6,7-trimethyl-1,4-diazabicyclo[2.2_2]octane, and the like. These urethane catalysts may be used singly or in combination of two or more. The amount of the urethane-catalyzed catalyst to be added is preferably 0.01 to 5 parts by mass, preferably 0.1 to 1 part by mass, per 100 parts by mass of the compound (2). When the amount is less than 0.01 parts by mass, the reactivity may be lowered. On the other hand, -38- 201031694, when the amount is more than 5 parts by mass, a side reaction may occur during the reaction. The reaction temperature in the reaction of the above compound (1) with the compound (2) is preferably -10 to 100 ° C, more preferably 〇 to 60 ° C. Very good for 10~30 °C. The above reaction can be carried out in hexane containing BHT (2,6-di-t-butyl-4-methylphenol). The hexane containing BHT can be used as a washing solvent immediately after the completion of the reaction. Therefore, the environmental load can be reduced when the above reaction is carried out. The BHT content in the BHT-containing hexane at this time is 1 to 10,000 ppm, preferably 50 to 500 ppm', more preferably 1 to 400 ppm. When the reaction is carried out under the above-mentioned amount ratio and temperature conditions, the side reaction can be suppressed, and the (B) urethane compound can be obtained in a good yield and purity. Further, since the reaction can be carried out in the vicinity of room temperature, the possibility of polymerization of (B) urethane compounds can be reduced. ((C) (meth) acrylate> The (meth) acrylate (C) having an ethylenically unsaturated group and having a lipid • ring structure in the curable composition has an effect of reducing shrinkage at the time of hardening The shape followability of the model can be improved during the formation, and examples thereof include cyclohexyl (meth) acrylate, 4-butylcyclohexyl (meth) acrylate, and dicyclopentyl (meth) acrylate. Dicyclopentenyl (meth) acrylate, dicyclopentadienyl (meth) acrylate, borneol (meth) acrylate, isobornyl (meth) acrylate, tricyclodecyl ( Rings such as methyl) acrylate, adamantyl (meth) acrylate, dicyclopentyl di(meth) acrylate, tricyclodecane dimethanol diacrylate, and adamantyl di(meth) acrylate Alkyl (meth) acrylate-39- 201031694 class. In the above-exemplified (meth) acrylate, 'having two ethyl septic unsaturated groups from the viewpoint of the shape followability of the metal mold Methyl) acrylate is preferred as dicyclopentyldi(a) The propyl acrylate is the most preferable. The alicyclic structure is a structure in which a carbon atom is bonded to a cyclic structure and the aromatic ring structure is removed. The (meth) acrylate used in the curable composition (c) The amount of the combination is preferably from 5 to 400 parts by mass, preferably from 10 to 200 parts by mass, more preferably from 20 to 100 parts by mass per 100 parts by mass of the cerium oxide microparticles (A) before the surface treatment. When the amount of the compound is less than 5 parts by mass, the shape followability of the metal mold is lowered. When the amount exceeds 400 parts by mass, the adhesion to the substrate is lowered, and 'use as the silica sand fine particles (A When the cerium oxide fine particles dispersed in the organic solvent, the mass of the cerium oxide fine particles (A) indicates the mass of only the cerium oxide fine particles dispersed in the organic solvent. ® <(D) polymerization initiator> The polymerization initiator (D) used for the curable composition is exemplified by a photopolymerization initiator which generates a radical and a thermal polymerization initiator. As the photopolymerization initiator, for example, benzophenone is mentioned. Benzoin methyl ether, benzoin propyl ether , diethoxyacetophenone, 1-hydroxy-phenyl phenyl ketone, 2,6-dimethylbenzimidyl diphenylphosphine oxide, 2,4,6-trimethylbenzylidene Diphenylphosphine oxide and diphenyl-(2,4,6-trimethylbenzone-40-201031694 mercapto)phosphine oxide. These photopolymerization initiators can also be used in more than two types. The content of the curable composition in the polymerization initiator may be an amount which can only moderately cure the curable composition. It is preferably 0.01 to 10 parts by mass, preferably 0.01 to 10 parts by mass, per 100 parts by mass of the curable composition. It is 2 to 5 parts by mass, more preferably 0.1 to 2 parts by mass. When the amount of the photopolymerization initiator is too large, the storage stability of the curable composition is lowered, or colored, or crosslinked. Crosslinking at the time of hardening is rapidly progressed, causing problems such as splitting φ at the time of hardening. Further, when the amount of the photopolymerization initiator added is too small, the curable composition cannot be sufficiently cured. Examples of the thermal polymerization initiator include benzammonium peroxide, diisopropyl peroxycarbonate, t-butylperoxy (2-ethylhexanoate), and the like. The content of the curable composition of the thermal polymerization initiator is preferably 2 parts by mass or less, and preferably 0.1 to 2 parts by mass, per 100 parts by mass of the curable composition. In addition, the curable composition used in the present invention may contain a flattening agent, an antioxidant, an ultraviolet absorber, a solvent, or the like, as long as it does not impair the viscosity of the composition and the transparency and heat resistance of the cured product. Fillers such as pigments and other inorganic materials, reactive diluents, other modifiers, and the like. As the pingping agent, for example, a polyether-denatured dimethyl polyoxyalkylene copolymer, a polyester-denatured dimethyl polyoxyalkylene copolymer, and a polyether-denatured methyl alkyl polyoxyalkylene copolymer are exemplified. And aralkyl modified methyl alkyl polyoxyalkylene copolymer, polyether modified methyl alkyl polyoxyalkylene copolymer, and the like. Examples of the chelating agent or pigment include calcium carbonate, talc, mica, clay, Aerosil (registered trademark), barium sulfate 'aluminum hydroxide, stearic acid-41 - 201031694 zinc, zinc oxide, iron oxide, azo. Pigments, etc. The curable composition of the present invention containing such various components is generally 100 to 5000 mPa*s as measured by a cone-and-plate type viscometer DV-IIIULTRA (manufactured by BROOKFIELD Co., Ltd.), 25 ° C, and Spindle No. CP-41. Even if it does not contain a solvent, it has a low viscosity and good handleability. The reason for this is that the surface of the above-mentioned cerium oxide microparticles (A) is highly compatible with the urethane compound (B) and the (meth) acrylate (C) of the cerium oxide microparticle (A), and the urethane compound. High dispersion stability of the cerium oxide microparticles (A) in (B) and (meth) acrylate (C). <Method for Producing Curable Composition> The curable composition used in the present invention is, for example, a colloidal cerium oxide (cerium oxide fine particles (A)) dispersed in an organic solvent as a decane compound (E). a step of surface treatment (step 1), a step of uniformly mixing the urethane compound (B) and the (meth) acrylate (C) in the surface-treated cerium oxide microparticles (A), and a step of uniformly mixing (step 2), a step (step 3) of distilling and desolvating the organic solvent and water by a homogeneous mixture of the cerium oxide microparticles (A) obtained in the step 2 and the urethane compound (B) and the (meth) acrylate (C), In the step 3, the polymerization initiator (D) is added to the composition obtained by distillation and desolvation, and the mixture is uniformly mixed and then produced as a step of the curable composition (step 4). The steps are explained below. • 42- 201031694 (Step 1) In step 1, the cerium oxide microparticles (A) are surface-treated with a decane compound (E). In the surface treatment, the cerium oxide microparticles (A) are placed in the reactor, and the decane compound (E) is added while stirring, and the mixture is stirred and mixed, and water and a catalyst necessary for the hydrolysis of the decane compound are added. The decane compound is generally hydrolyzed by stirring, and the polycondensation of the cerium oxide microparticles (A) is carried out by condensation polymerization. Further, as the above-mentioned diox φ 矽 矽 fine particles (A), cerium oxide fine particles dispersed in an organic solvent are preferably used, as described above. Further, the disappearance of hydrolysis by the aforementioned decane compound can be confirmed by gas chromatography. By gas chromatography (Agilent type 6850), a non-polar column DB-1 (manufactured by J&W) was used at a temperature of 50 to 300 ° C, and the temperature was raised at 10 ° C/min. When He is used as a carrier gas, the flow rate is 1.2 cc/min, and the residual ion amount Φ of the decane compound can be measured by an internal standard method under the flame ionization detector, so that the disappearance of hydrolysis by the decane compound can be confirmed. . Further, the amount of the decane compound (E) used in the surface treatment of the cerium oxide microparticles (A) as described above is generally 10 to 50 parts by mass for the bismuth dioxide microparticles (A) of 1 part by mass. Preferably, it is 20 to 40 parts by mass, more preferably 24 to 36 parts by mass. The lower limit 水 of the amount of water necessary for the hydrolysis reaction is 1 times the total number of moles of the alkoxy group and the hydroxyl group bonded to the decane compound (E), and the upper limit 値 is 10 times. When the amount of water is too small, the rate of hydrolysis will be extremely slow. 'Lack of economy, there is a concern that the surface treatment cannot be fully performed. Conversely, if '43-201031694 is too much water', the cerium oxide microparticles (A) may form a gel. When the hydrolysis reaction is carried out, a catalyst for the hydrolysis reaction is generally used. Specific examples of such a catalyst include inorganic acids such as hydrochloric acid, acetic acid, sulfuric acid, and phosphoric acid; and organic acids such as formic acid, propionic acid, oxalic acid, p-toluenesulfonic acid, benzoic acid, phthalic acid, and maleic acid; An alkali catalyst such as potassium hydroxide, sodium hydroxide, calcium hydroxide or ammonia; an organic metal ♦ a metal alkoxide; an organic tin compound such as dibutyltin dilaurate, dibutyltin dioctanoate or dibutyltin diacetate; Aluminum ginseng (ethionyl pyruvate), titanium bismuth (acetyl acetonate), titanium bis (butoxy) bis (ethyl acetonate), titanium bis (isopropoxy) double (B Metal chelating compounds such as mercaptopyruvate, pin bis(butoxy)bis(ethyl phthalate), zirconium bis(isopropoxy) bis(ethyl phthalate); Boron compounds such as boric acid; Among them, hydrochloric acid, acetic acid, maleic acid, and boron compounds are preferred from the viewpoints of solubility in water and sufficient hydrolysis rate. These catalysts can be used alone or in combination of two or more. In the step 1, in the hydrolysis reaction of the decane compound (E), a water-insoluble catalyst can be used, but a water-soluble catalyst is preferably used. When a water-soluble catalyst for hydrolysis is used, it is preferred to dissolve the water-soluble catalyst in an appropriate amount of water -44-201031694 after it is added to the reaction system to uniformly disperse the catalyst. The amount of the catalyst to be used in the hydrolysis reaction is not particularly limited, and is usually 0.1 to 10 parts by mass, preferably 0.5 to 5 parts by mass, per 100 parts by mass of the cerium oxide fine particles (a). When the cerium oxide microparticles (A) are used as the cerium oxide microparticles dispersed in the organic solvent, the mass of the cerium oxide microparticles (A) described above indicates the mass of the cerium oxide microparticles themselves dispersed in the organic solvent.
φ 水解反應的反應溫度雖無特別限定,一般爲1 〇〜8 (TC 之範圍,較佳爲20〜50°C之範圍。反應溫度過度低時,水 解速度會極端變慢,而欠缺經濟性' 或有著無法充分進行 表面處理之顧慮。反應溫度若過度高時,有著容易引起凝 膠化反應之傾向。 又,進行水解反應之反應時間並無特別限定,一般爲 10分鐘〜48小時,較佳爲30分鐘〜24小時的範圍。 φ (步驟2 ) 步驟2中,經表面處理的二氧化矽微粒子(A )與脲 烷化合物(B)及(甲基)丙烯酸酯(C)之混合方法,雖 無特別限定,例如可舉出於室溫或加熱條件下藉由攪拌器 、磨珠硏磨器、3根輥等混合機進行混合的方法、或進行 步驟1之反應器中一邊連續攪拌一邊添加脲烷化合物(B )及(甲基)丙烯酸酯(C)並混合之方法。 (步驟3 ) -45- 201031694 步驟3中,由二氧化矽微粒子(A)與脲烷化合物(B )及(甲基)丙烯酸酯(C )之均勻混合液將有機溶劑及 水餾去·脫溶劑(以下總稱爲脫溶劑)時,於減壓狀態下 進行加熱爲佳。 溫度以保持20〜100°C爲佳,凝集凝膠化防止與脫溶 劑速度之平衡下,較佳爲30〜70°C,更佳爲30〜50°C。若 溫度過度上升時,硬化性組成物的流動性會極端降低、或 硬化性組成物會成爲凝膠狀。 @ 減壓時的真空度一般爲10〜4000kPa,欲達到脫溶劑 速度與凝集凝膠化防止之平衡,更佳爲10〜l〇〇〇kPa,最 佳爲10〜50 OkP a。真空度的値過大時,脫溶劑速度會極端 變慢而缺乏經濟性。 脫溶劑後之組成物於實質上未含有溶劑者爲佳。於此 所謂實質上,表示使用硬化性組成物而實際得到硬化物時 ,不須再次經由脫溶劑的步驟之意思,具體而言,硬化性 組成物中之有機溶劑及水殘存量以1質量%以下爲佳,較 〇 佳爲0.5質量%以下,更佳爲0.1質量%以下。 步驟3中,進行脫溶劑前,對於脫溶劑後之組成物 1〇〇質量份而言,可添加0.1質量份以下的聚合禁止劑。 聚合禁止劑爲使用於脫溶劑過程中或脫溶劑後的組成物及 硬化性組成物之保存中防止組成物所含之成分引起聚合反 應時。作爲聚合禁止劑,例如可舉出氫醌、氫醌單甲基醚 、苯醌、p-t-丁基兒茶酚、2,6-二-t-丁基-4-甲基酚等。彼 等可組合1種或2種以上而使用。 -46 - 201031694 步驟3爲,可於經步驟2將二氧化矽微粒子(A)與 脲烷化合物(B)及(甲基)丙烯酸酯(C)之均勻混合液 移至専用裝置中進行,若將步驟2在實施步驟1的反應器 中進行’即可在步驟2之後於該反應器中進行。 (步驟4) 步驟4中,於在步驟3經脫溶劑的組成物添加聚合啓 φ 始劑(D )並均勻混合之方法並無特別限制,例如於室溫 下藉由攪拌器、磨珠硏磨器、3根輥等混合機進行混合的 方法、或進行步驟1〜3的反應器中以連續方式一邊攪拌 一邊添加聚合啓始劑(D)並混合之方法可舉出。 且,對於進行如此聚合啓始劑(D )之添加、混合所 得之硬化性組成物,視必要可進行過濾。該過濾以除去硬 化性組成物中之垃圾等外來異物爲目的而進行。過濾方法 並無特別限定,可使用加壓過濾孔徑1 .Ομιη之膜類型、濾 Φ 筒類型等濾器,進行加壓過濾之方法爲佳。 藉由經由以上各步驟,可製造使用於本發明之硬化性 組成物。該硬化性組成物因該構成成分之二氧化矽微粒子 (A )以特定矽烷化合物進行處理,即使未含有溶劑,其 黏度低且操作性良好。 〔硬化物〕 本發明所使用的硬化性組成物爲藉由進行硬化,成爲 可作爲光學透鏡、光學透鏡成形用型 '光碟基板、液晶顯 -47- 201031694 示元件用塑質基板、彩色過濾器用基板、有機EL顯示元 件用塑質基板、太陽電池基板、觸控板、光學元件、光波 導、LED封止材等構件使用之硬化物。 其中因硬化收縮率較小,可使用於各種成形用模型, 特別爲可成爲使用於作爲成形透鏡陣列等光學零件時的模 型而適用的硬化物。 〈硬化物之製造方法〉 @ 藉由硬化本發明所使用的硬化性組成物,可得到硬化 物。作爲硬化方法,有藉由活性能量線之照射使脲烷化合 物(B)及(甲基)丙烯酸酯(C)的乙烯性不飽和基交聯 之方法、加熱使乙烯性不飽和基進行熱聚合之方法等,這 些方法亦可倂用。 將硬化性組成物藉由紫外線等活性能量線進行硬化時 ,於上述步驟4中,使於硬化性組成物中含有光聚合啓始 劑。 ❹ 對於硬化性組成物施予加熱使其硬化時,於上述步驟 4中,使硬化性組成物中含有熱聚合啓始劑。 本發明所使用的硬化性組成物的硬化物,例如可由將 硬化性組成物塗佈於玻璃板、塑質板、金屬板、矽晶圓等 基材上形成塗膜後,於該硬化性組成物照射活性能量線、 或藉由加熱而得到。進行硬化,亦可進行活性能量線的照 射與加熱之雙方。 作爲硬化性組成物的塗佈方法,例如可舉出藉由棒塗 -48- 201031694 佈器、塗抹器、狹縫式塗佈器、旋轉塗佈器、噴墨塗佈器 、簾幕式塗佈器、輥塗佈器等之塗佈、藉由網目塗佈器等 之塗佈、藉由浸漬等之塗佈。 對於本發明所使用的硬化性組成物的基材上之塗佈量 並無特別限定,視目的可適宜調整。由成形性之觀點來看 ,以活性能量線照射及/或加熱之硬化處理後所得之塗膜 膜厚以成爲1〜200μιη的量爲佳,以成爲5〜ΙΟΟμιη之量 ❿ 爲較佳。 作爲使用於硬化之活性能量線,以電子線、或自紫外 至紅外線的波長範圍的光爲佳。 作爲光源,例如若爲紫外線可使用超高壓水銀光源或 金屬鹵素光源 '若爲可見光線可使用金屬鹵素光源或鹵素 光源、若爲紅外線可使用鹵素光源,其他亦可使用雷射、 LED等光源。 活性能量線之照射量依光源種類、塗膜膜厚等而作適 Φ 宜設定,較佳爲脲烷化合物(B)及(甲基)丙烯酸酯(C )之乙烯性不飽和基的反應率可至80%以上,較佳爲90% 以上而適宜設定。 又,照射活性能量線並使其硬化後,視必要可進行加 熱處理(煅燒處理)並進一步進行硬化。此時的加熱溫度 以80〜200°C的範圍爲佳。加熱時間以10分鐘〜60分鐘 的範圍爲佳。 本發明所使用的硬化性組成物於進行硬化時藉由加熱 處理使其熱聚合時,加熱溫度以80〜200°C之範圍爲佳, -49- 201031694 較佳爲100〜15 0°C之範圍。加熱溫度若比80°C低時,加熱 時間必須加長,故有欠缺經濟性之傾向,加熱溫度若比 200°C高時,會花費能量成本,且需要更長之加熱昇溫時 間及降溫時間,故有著欠缺經濟性之傾向。 加熱時間可依據加熱溫度、塗膜膜厚等作適宜設定, 較佳爲設定至脲烷化合物(B)及(甲基)丙烯酸酯(C) 的乙烯性不飽和基之反應率爲8 0%以上,較佳爲90%以上 〇 藉由熱聚合使硬化性組成物硬化後,視必要亦可進行 加熱處理(煅燒處理)進一步進行硬化。此時的加熱溫度 以150〜200°C之範圍爲佳。加熱時間爲5分鐘〜60分鐘 的範圍爲佳。 〈硬化物〉 本發明所使用的硬化性組成物之硬化物因具有優良之 透明性、硬化性、形狀追隨性、基板密著性,使用於成形 透鏡陣列等光學零件時所使用的模型之成形上爲佳。 前述硬化物因具有優良的透明性,故在硬化膜100μιη 厚度下的波長4 OOnm之光線透過率較佳爲達到8 5 %以上。 波長400nm的光線透過率爲85%以下時,利用光之效率會 降低’故會損害到使其光硬化時的硬化性故不佳。 缺乏硬化性時’與空氣接觸之部分因氧阻害而無法硬 化’故無法得到所望形狀、或使其硬化時,必須要大量光 照射能量、或加熱時間變長,故由生產性之觀點來看爲不 -50- 201031694 佳,前述硬化物因具有優良硬化性,故在空氣中進行光硬 化或熱硬化時,不會受到氧阻害而容易得到硬化物。 前述硬化物爲於玻璃等基板上塗佈硬化性組成物,於 該硬化性組成物接觸轉印體,仿照該轉印體之形狀變形硬 化性組成物之狀態下,藉由將硬化化性組成物以光照射等 使其硬化而得到,形成轉印體之轉印形狀轉印爲硬化物。 前述硬化物具有優良之對轉印體的形狀追隨性。於此所謂 φ 的「優良的形狀追隨性」爲,轉印體之形狀直接作爲硬化 物之形狀而被轉印,於硬化物的表面不易產生縐折或裂縫 之意思。 前述硬化物爲於玻璃等基板上塗佈硬化性組成物,於 該硬化性組成物接觸轉印體,仿照該轉印體之形狀並變形 硬化性組成物之狀態下,藉由光照射硬化性組成物等而使 其硬化後,由轉印體分離。進行該分離時,必須對基板側 保持密著,但前述硬化物具有優良之基板密著性。若基板 Φ 密著性較差時,轉印體側會帶走前述硬化物,由基板剝離 硬化物,故例如作爲成形光學零件時所使用的模型會失去 該功能而不佳。 【實施方式】 〔實施例1〕 以下將使用於本發明之硬化性組成物藉由實施例作詳 細說明,但該硬化性組成物僅不超過該要旨下,並未限定 於以下例子。 -51 - 201031694 (合成例1 ) 〈脲烷化合物(B-l )〉 於反應容器中放入2-羥基乙基丙烯酸酯(大阪有機化 學工業(股)製)100份、含2,6-二-第三丁基-4-甲基酚 (BHT、純正化學(股)製)200ppm之己烷(純正化學( 股)製)142份、二丁基錫二月桂酸酯(東京化成工業( 股)製)2.8份並攪拌。其後將2-丙烯醯氧基乙基異氰酸 酯(昭和電工(股)製之商品名Calends (註冊商標)AOI )122份徐徐滴下,於室溫下進行攪拌。在高速液體層析 法下確認2-羥基乙基丙烯酸酯之波峰幾乎消失而結束反應 ,繼續使用含有BHT200ppm之己烷203份,進行4次洗 淨後得到脲烷化合物(B-1 )。 (合成例2) 〈脲烷化合物(B-2)〉 合成例1中,取代2-丙烯醯氧基乙基異氰酸酯而使用 2 -甲基丙烯醯氧基乙基異氰酸酯(昭和電工(股)製之商 品名Calends (註冊商標)MOI )以外,與合成例1同樣 下得到脲烷化合物(B-2)。 〔硬化性組成物之調製〕 (調製例1 ) 於分離式燒瓶放入異丙基醇分散型膠狀二氧化矽(二 -52- 201031694 氧化矽含量3 0質量%,平均粒子徑丨〇〜2 0nrn,商品名 Snow-TechIPA-ST ;日產化學(股)製)100質量份,於 該分離式燒瓶加入7-甲基丙烯氧基丙基三甲氧基矽烷9.0 質量份’進行攪拌混合,再加入0.1825質量%之 HC1溶 液2.9質量份’於2〇°C進行24hr攪拌後進行二氧化矽微 粒子之表面處理。 且’將藉由r-甲基丙烯氧基丙基三甲氧基矽烷之水 φ 解的消失’以氣相層析法(Agilent (股)製之型式68 5 0 )進行確認。使用無極性管柱D B - 1 ( J & W公司製),於 溫度50〜3 00°C ’昇溫速度l〇°C/min,作爲載流氣體使用 He,流量 1 .2cc/min,火焰離子化偵測器 (Flame ionization detector)下以内部標準法進行測定。甲基 丙烯氧基丙基三甲氧基矽烷於添加上述HC1溶液後經8hr 消失。 其次,於進行表面處理之二氧化矽微粒子加入脲烷化 # 合物(B-1) 22.0質量份與二環戊二烯基二丙烯酸酯(商 品名燈丙烯酸酯DCP-A ;共榮社化學(股)製)14.7質量 份並均勻地混合。其後,一邊攪拌,一邊於40。(:,l〇〇kPa 下進行減壓加熱’除去揮發成分。揮發成分的除去量爲 72.0質量份。 藉由該揮發分之除去所得之母液76.6質量份中,溶 解作爲光聚合啓始劑之D1173(Ciba Specialty Chemicals (股)製之商品名:DAROCURE 1173) 0.766質量份及 MBF ( Ciba Specialty Chemicals (股)製之甲基苯甲醯基 -53- 201031694 甲酸酯,商品名:DAROCURE MBF) 1.532質量份’經膜 濾器(孔徑Ι.ΟμπΟ加壓過濾(壓力0.2MPa)後得到硬化 性組成物1。該硬化性組成物1之黏度爲3 7 0 0mP a · s ° (調製例2) 調製例1中,取代脲烷化合物(B -1 ),使用脲烷化 合物(B-2 )以外,與調製例1同樣地得到硬化性組成物2 。該硬化性組成物2之黏度爲3 3 00mPa· S。 _ (比較調製例1 ) 調製例1中,取代脲烷化合物(B-1 ),使用環氧乙 烷變性三羥甲基丙烷三丙烯酸酯(大阪有機化學(股)製 之商品名Bis-coat#3 60 )以外,與調製例1同樣地得到硬 化性組成物3。該硬化性組成物3之黏度爲3 OOOmP a · S。The reaction temperature of the φ hydrolysis reaction is not particularly limited, but is generally in the range of 1 〇 8 (TC), preferably 20 to 50 ° C. When the reaction temperature is excessively low, the hydrolysis rate is extremely slow, and the economy is lacking. 'There is a concern that the surface treatment cannot be sufficiently performed. If the reaction temperature is too high, the gelation reaction tends to occur. Further, the reaction time for the hydrolysis reaction is not particularly limited, and is generally 10 minutes to 48 hours. Preferably, the range is from 30 minutes to 24 hours. φ (Step 2) Step 2, the method of mixing the surface treated cerium oxide microparticles (A) with the urethane compound (B) and the (meth) acrylate (C) Although it is not particularly limited, for example, a method of mixing by a mixer such as a stirrer, a bead honing machine, or a three-roller at room temperature or under heating, or continuous stirring in the reactor of the step 1 may be employed. A method in which a urethane compound (B) and a (meth) acrylate (C) are added and mixed. (Step 3) -45- 201031694 In step 3, the cerium oxide microparticles (A) and the urethane compound (B) are used. And (meth)acrylic acid When the organic solvent and the water are distilled off and desolventized (hereinafter collectively referred to as desolvation), it is preferred to heat the mixture in a reduced pressure. The temperature is preferably maintained at 20 to 100 ° C. The balance between the gelation prevention and the solvent removal speed is preferably 30 to 70 ° C, more preferably 30 to 50 ° C. If the temperature is excessively increased, the fluidity of the curable composition is extremely lowered, or the curable composition is The object will become gelatinous. @ Vacuum under reduced pressure is generally 10~4000kPa, to achieve the balance between desolvation speed and agglutination gelation prevention, more preferably 10~l〇〇〇kPa, optimally 10~ 50 OkP a. When the degree of vacuum is too large, the solvent removal rate is extremely slow and economical. The composition after solvent removal is preferably not substantially contained in the solvent. When the cured product is actually obtained, it is not necessary to pass the step of removing the solvent again. Specifically, the organic solvent and the residual amount of water in the curable composition are preferably 1% by mass or less, and more preferably 0.5% by mass. Hereinafter, it is more preferably 0.1% by mass or less. In the third step, before the solvent is removed, 0.1 part by mass or less of a polymerization inhibitor may be added to 1 part by mass of the composition after the solvent removal. The polymerization inhibitor is used in the solvent removal process or after solvent removal. In the storage of the composition and the curable composition, the polymerization reaction is prevented when the components contained in the composition are prevented. Examples of the polymerization inhibiting agent include hydroquinone, hydroquinone monomethyl ether, benzoquinone, and pt-butyl tea. Phenol, 2,6-di-t-butyl-4-methylphenol, etc., may be used in combination of one or two or more kinds. -46 - 201031694 Step 3 is that cerium oxide can be obtained in step 2. The uniform mixture of the microparticles (A) and the urethane compound (B) and the (meth) acrylate (C) is transferred to a sputum apparatus, and if the step 2 is carried out in the reactor of the step 1, the step can be carried out. 2 is then carried out in the reactor. (Step 4) In the step 4, the method of adding the polymerization initiator (D) to the solvent-decomposed composition in Step 3 and uniformly mixing is not particularly limited, for example, at room temperature by a stirrer or a bead mill. A method of mixing a mixer such as a mill or a three-roller or a method of adding the polymerization initiator (D) while stirring in a continuous manner in the reactors of the steps 1 to 3 may be mentioned. Further, the curable composition obtained by adding and mixing the polymerization initiator (D) can be filtered as necessary. This filtration is carried out for the purpose of removing foreign matter such as garbage in the hardening composition. The filtration method is not particularly limited, and a method of pressurizing filtration using a membrane having a pressure filtration pore size of 1. Ομιη, a filter type, and the like can be used. The curable composition used in the present invention can be produced by the above steps. The curable composition is treated with a specific decane compound by the cerium oxide fine particles (A) of the constituent component, and the viscosity is low and the workability is good even if the solvent is not contained. [Cured material] The curable composition used in the present invention is used as an optical lens, an optical lens molding type optical disk substrate, a liquid crystal display device, and a color filter for a color filter. A cured product used for a substrate, a plastic substrate for an organic EL display device, a solar cell substrate, a touch panel, an optical element, an optical waveguide, and an LED sealing material. Among them, the hardening shrinkage ratio is small, and it can be used for various molding models, and is particularly suitable for use as a mold for use as an optical component such as a molded lens array. <Method for Producing Hardened Material> @ A hardened material can be obtained by curing the curable composition used in the present invention. As a curing method, there is a method of crosslinking an ethylenically unsaturated group of a urethane compound (B) and a (meth) acrylate (C) by irradiation with an active energy ray, and heating to thermally polymerize an ethylenically unsaturated group. The method, etc., these methods can also be applied. When the curable composition is cured by an active energy ray such as ultraviolet rays, in the above step 4, a photopolymerization initiator is contained in the curable composition. ❹ When the curable composition is heated and hardened, in the above step 4, the curable composition contains a thermal polymerization initiator. The cured product of the curable composition used in the present invention may be formed by applying a curable composition to a substrate such as a glass plate, a plastic plate, a metal plate or a tantalum wafer to form a coating film. The object is irradiated with an active energy ray or obtained by heating. For hardening, both the irradiation and heating of the active energy ray can be performed. Examples of the coating method of the curable composition include a bar coating-48-201031694 cloth applicator, an applicator, a slit applicator, a spin coater, an inkjet applicator, and a curtain coating method. Coating by a cloth, a roll coater, or the like, coating by a mesh coater or the like, coating by dipping or the like. The coating amount on the substrate of the curable composition used in the present invention is not particularly limited, and can be appropriately adjusted depending on the purpose. From the viewpoint of moldability, the film thickness of the coating film obtained by the treatment of the active energy ray irradiation and/or the heat treatment is preferably from 1 to 200 μm, preferably from 5 to ΙΟΟμηη. As the active energy ray used for hardening, it is preferred to use electron beams or light in the wavelength range from ultraviolet to infrared. As the light source, for example, an ultra-high pressure mercury light source or a metal halogen light source can be used as the ultraviolet light. For the visible light, a metal halogen light source or a halogen light source can be used, and if it is an infrared light, a halogen light source can be used, and other light sources such as lasers and LEDs can be used. The irradiation amount of the active energy ray should be set according to the type of the light source, the thickness of the coating film, etc., and preferably the reaction rate of the ethylenic unsaturated compound of the urethane compound (B) and the (meth) acrylate (C). It can be set to 80% or more, preferably 90% or more. Further, after the active energy ray is irradiated and hardened, it may be subjected to heat treatment (calcination treatment) as necessary and further cured. The heating temperature at this time is preferably in the range of 80 to 200 °C. The heating time is preferably in the range of 10 minutes to 60 minutes. When the curable composition used in the present invention is thermally polymerized by heat treatment during curing, the heating temperature is preferably in the range of 80 to 200 ° C, and -49 to 201031694 is preferably 100 to 15 ° °C. range. When the heating temperature is lower than 80 ° C, the heating time must be lengthened, so there is a lack of economy. If the heating temperature is higher than 200 ° C, energy costs will be incurred, and a longer heating and heating time and a cooling time are required. Therefore, there is a tendency to lack economics. The heating time can be appropriately set depending on the heating temperature, the film thickness of the coating film, etc., and the reaction rate of the ethylenically unsaturated group of the urethane compound (B) and the (meth) acrylate (C) is preferably set to 80%. In the above, it is preferably 90% or more, and the curable composition is cured by thermal polymerization, and may be further subjected to heat treatment (calcination treatment) if necessary. The heating temperature at this time is preferably in the range of 150 to 200 °C. The heating time is preferably in the range of 5 minutes to 60 minutes. <Cured material> The cured product of the curable composition used in the present invention has excellent transparency, hardenability, shape followability, and substrate adhesion, and is used for forming a mold used for forming optical components such as a lens array. It is better. Since the cured product has excellent transparency, the light transmittance at a wavelength of 400 nm at a thickness of 100 μm of the cured film is preferably 85 % or more. When the light transmittance at a wavelength of 400 nm is 85% or less, the efficiency of light utilization is lowered, so that the hardenability at the time of photohardening is impaired. When there is a lack of hardenability, the part which is in contact with the air cannot be hardened by oxygen resistance, so when the shape is not obtained or hardened, it is necessary to irradiate a large amount of light or the heating time becomes long, so from the viewpoint of productivity In the case of not being -50-201031694, since the cured product has excellent hardenability, when it is subjected to photohardening or thermal hardening in the air, it is not affected by oxygen and it is easy to obtain a cured product. The cured product is formed by applying a curable composition to a substrate such as glass, and the curable composition is in contact with the transfer body, and the curable composition is formed in a state in which the shape of the transfer body is deformed to form a curable composition. The object is obtained by hardening by light irradiation or the like, and the transfer shape forming the transfer body is transferred into a cured product. The cured product has excellent shape followability to the transfer body. Here, "excellent shape followability" of φ means that the shape of the transfer body is directly transferred as the shape of the cured material, and it is difficult to cause collapse or crack on the surface of the cured product. In the cured product, a curable composition is applied to a substrate such as glass, and the curable composition is in contact with the transfer member, and the curable property is irradiated by light irradiation in a state in which the shape of the transfer member is deformed and the curable composition is deformed. After the composition or the like is hardened, it is separated by the transfer body. When this separation is carried out, it is necessary to keep the substrate side adhered, but the cured product has excellent substrate adhesion. When the substrate Φ is inferior in adhesion, the cured product is removed from the transfer body side, and the cured product is peeled off from the substrate. Therefore, for example, the model used for molding the optical component may lose the function. [Embodiment] [Example 1] Hereinafter, the curable composition used in the present invention will be described in detail by way of examples, but the curable composition is not limited to the above, and is not limited to the following examples. _ _ _ _ _ Tert-butyl-4-methylphenol (BHT, manufactured by Pure Chemical Co., Ltd.) 200 ppm hexane (manufactured by Pure Chemical Co., Ltd.) 142 parts, dibutyltin dilaurate (manufactured by Tokyo Chemical Industry Co., Ltd.) 2.8 parts and stirred. Thereafter, 122 parts of 2-propenyloxyethyl isocyanate (trade name Calends (registered trademark) AOI, manufactured by Showa Denko Co., Ltd.) was slowly dropped, and stirred at room temperature. Under the high-speed liquid chromatography, it was confirmed that the peak of 2-hydroxyethyl acrylate almost disappeared, and the reaction was terminated. Then, 203 parts of hexane containing 200 ppm of BHT was used, and the urethane compound (B-1) was obtained by washing four times. (Synthesis Example 2) <Uranane Compound (B-2)> In the synthesis example 1, 2-methylpropenyloxyethyl isocyanate (manufactured by Showa Denko Co., Ltd.) was used instead of 2-propenyloxyethyl isocyanate. The urethane compound (B-2) was obtained in the same manner as in Synthesis Example 1 except for the trade name of Calends (registered trademark) MOI. [Preparation of curable composition] (Preparation Example 1) A isopropyl alcohol-dispersed colloidal cerium oxide was placed in a separate flask (di-52-201031694 cerium oxide content of 30% by mass, average particle diameter 丨〇~ 20 nrn, trade name Snow-TechIPA-ST; manufactured by Nissan Chemical Co., Ltd.), 100 parts by mass of 7-methacryloxypropyltrimethoxydecane in the separation flask, and stirred and mixed. The surface treatment of the cerium oxide microparticles was carried out by adding 9.2 parts by mass of a 0.1825 mass% HCl solution and stirring at 24 ° C for 24 hr. Further, 'the disappearance of the water φ solution by r-methacryloxypropyltrimethoxydecane' was confirmed by gas chromatography (Agilent's model 68 5 0). Using a non-polar column DB-1 (manufactured by J & W) at a temperature of 50 to 300 ° C 'temperature rising rate l 〇 ° C / min, using He as a carrier gas, flow rate 1.2 cc / min, flame The internal standard method was used for the measurement under the Flame ionization detector. The methacryloxypropyltrimethoxydecane disappeared after 8 hours from the addition of the above HCl solution. Next, the surface-treated cerium oxide microparticles are added to the urethanization compound (B-1) 22.0 parts by mass and dicyclopentadienyl diacrylate (trade name lamp acrylate DCP-A; Kyoeisha Chemical Co., Ltd. (Stock)) 14.7 parts by mass and uniformly mixed. Thereafter, while stirring, it was 40. (:, the pressure-reduction heating was carried out at 10 kPa to remove the volatile component. The removal amount of the volatile component was 72.0 parts by mass. In 76.6 parts by mass of the mother liquid obtained by removing the volatile matter, it was dissolved as a photopolymerization initiator. D1173 (trade name: DAROCURE 1173, manufactured by Ciba Specialty Chemicals Co., Ltd.) 0.766 parts by mass and MBF (Methylbenzhydryl-53-201031694 formate manufactured by Ciba Specialty Chemicals Co., Ltd., trade name: DAROCURE MBF) 1.532 parts by mass of a transmembrane filter (aperture Ι.ΟμπΟ pressure filtration (pressure 0.2 MPa) gave a curable composition 1. The viscosity of the curable composition 1 was 3700 mPa a · s ° (Preparation Example 2) In the preparation example 1, the curable composition 2 was obtained in the same manner as in Preparation Example 1 except that the urethane compound (B-1) was used instead of the urethane compound (B-1). The viscosity of the curable composition 2 was 3 3 . 00mPa·S. _ (Comparative Preparation Example 1) In the preparation example 1, in place of the urethane compound (B-1), ethylene oxide-modified trimethylolpropane triacrylate (product of Osaka Organic Chemical Co., Ltd.) was used. In the same manner as in Modification Example 1, except for the name Bis-coat #3 60 ) 3. The composition of the hard actinic curable composition viscosity of 3 to 3 OOOmP a · S.
(比較調製例2 ) Q 調製例1中,取代脲烷化合物(B -1 ),使用乙基金 剛烷基丙烯酸酯(大阪有機化學(股)製之商品名EtADA )以外,與調製例1同樣地,得到硬化性組成物4。該硬 化性組成物4之黏度爲4100mPa· S。 以上使用於硬化性組成物之調製的各成分之組成如下 述表1所示。 -54- 201031694 〔表1〕 調製例1 調製例2 比較 調製例1 比較 調製例2 硬化性 硬化性 硬化性 硬化性 組成物1 組成物2 組成物3 組成物4 組成膠狀二氧化矽 100.0 100.0 100.0 100.0 7 -甲基丙稀醢氧丙基三甲氧基矽烷(MPS) 9.0 9.0 9.0 9.0 0.05NHC1 溶液 2.9 2.9 2.9 2.9 脲烷化合物B-1 22.0 - - - 脲烷化合物B-2 - 22.0 - - 環氧乙烯變彳生三羥甲基丙烷三丙烯酸酯 - - 22.0 - 乙基金剛烷丙烯酸酯 . • - 22.0 二環戊二烯二丙烯酸酯 14/7 14.7 14.7 14.7 〔硬化膜之調製〕 〈活性能量線硬化〉 實施例及比較例中,將硬化性組成物於各別玻璃基板 (50mmx50mm)上,塗佈至硬化膜之厚度爲ΙΟΟμιη,在組 裝有超高壓水銀燈之曝光裝置下進行4J/Cm2曝光並硬化塗 膜。 〔性能評估方法〕 〈透過率〉 將所得之硬化膜的波長400nm之光透過率依據JIS-K7105,使用分光光度計(日本分光(股)製之UV3100) 進行測定。結果如表2所示。其爲透過率値越大,透明性 越良好之硬化膜。 又,將所得之硬化膜的全光線透過率使用色彩濁度計 (日本電色工業(股)製之COH4 00 )進行測定。結果如 表2所示。其爲該全光線透過率値越大,透明性越良好之 -55- 201031694 硬化膜。 〈形狀追隨性〉 如圖3所示’於晶圓W上使用注入裝置注入上述硬 化性組成物,對於硬化性組成物,接觸轉印體62使凸部 90接觸於光硬化性組成物,在組裝有超高壓水銀燈之曝光 裝置下進行4J/cm2曝光並使其硬化。其後,將轉印體62 自晶圓W分離。重複進行上述操作1〇〇次,得到經1〇〇 個轉印體62之形狀轉印的硬化物。該1 〇〇個硬化物之形 狀由光學顯微鏡觀察下,評估其縐折或裂縫之有無。評估 基準如以下所示,結果如表2所示。 A:完全無綴折、裂縫產生 B :未產生縐折、裂縫的頻率爲90/1 00以上 C:未產生縐折、裂縫的頻率爲50/100以上、未達90/100 D :未產生縐折、裂縫的頻率爲未達50/100 〈基板密著性〉 如圖3所示,於晶圓W上使用注入裝置注入上述硬 化性組成物,對於硬化性組成物,接觸轉印體62至使凸 部90接觸光硬化性組成物,在組裝有超高壓水銀燈之曝 光裝置下進行4J/cm2曝光並使其硬化。其後,將轉印體 62自晶圓W分離。重複進行上述操作100次。將轉印體 62由晶圓W分離時,若硬化物之基板密著性較差時,硬 化物會黏上轉印體62側,由晶圓W剝落。100個硬化物 -56- 201031694 中於晶圓W所得之個數作爲基板密著性而評估之結果如 表2所示。例如,100個中90個於晶圓W密著時’表示 90/1 00之評估結果。 〈硬化收縮率〉 在旋轉塗佈器法將樹脂溶液塗佈於矽晶圓上。該塗佈 基板以光學式膜厚計進行測定。將該膜厚作爲初期膜厚。 ❹ 其後,於氮氣環境下進行曝光’作成硬化膜’將該膜厚以 同樣方法下進行測定。將該膜厚作爲曝光後膜厚。將硬化 收縮率由以下式求得。且,測定於5處進行’並算出平均 値。 (初期膜厚-曝光後膜厚)/初期膜厚 χΐ00 〈%〉 〔表2〕 調製例1 調製例2 比較 調製例1 比較 調製例2 硬化性 組成物1 硬化性 組成物2 硬化性 組成物3 硬化性 組成物4 硬化物之400nm透過率。/〇 91 90 91 90 硬化物之全光線透過率% 93 92 93 93 形狀追隨性 B A C D 基板密著性 100/100 100/100 100/100 84/100 硬化收縮率〇/〇 5.65 5.50 -(Comparative Preparation Example 2) In the same manner as in Preparation Example 1, except for the urethane compound (B-1), the ethyl adamantyl acrylate (trade name: EtADA, manufactured by Osaka Organic Chemical Co., Ltd.) was used. The curable composition 4 was obtained. The viscosity of the hardening composition 4 was 4,100 mPa·s. The composition of each component used in the preparation of the curable composition described above is shown in Table 1 below. -54- 201031694 [Table 1] Preparation Example 1 Preparation Example 2 Comparative Preparation Example 1 Comparative Preparation Example 2 Curable Curable Curable Curable Composition 1 Composition 2 Composition 3 Composition 4 Composition of Colloidal Ceria 100.0 100.0 100.0 100.0 7 -Methyl propyl oxypropyltrimethoxy decane (MPS) 9.0 9.0 9.0 9.0 0.05NHC1 solution 2.9 2.9 2.9 2.9 urethane compound B-1 22.0 - - - urethane compound B-2 - 22.0 - - Ethylene oxide to trimethylolpropane triacrylate - 22.0 - Ethyl adamantane acrylate. - 22.0 Dicyclopentadiene diacrylate 14/7 14.7 14.7 14.7 [Modification of hardened film] <Activity Energy ray hardening> In the examples and comparative examples, the curable composition was applied to a respective glass substrate (50 mm x 50 mm), and the thickness of the cured film was ΙΟΟμηη, and 4 J/cm 2 was carried out under an exposure apparatus equipped with an ultrahigh pressure mercury lamp. Exposure and hardening of the film. [Performance Evaluation Method] <Transmittance> The light transmittance of the obtained cured film having a wavelength of 400 nm was measured in accordance with JIS-K7105 using a spectrophotometer (UV3100 manufactured by JASCO Corporation). The results are shown in Table 2. It is a cured film having a higher transmittance and a higher transparency. Further, the total light transmittance of the obtained cured film was measured using a color turbidity meter (COH 4 00 manufactured by Nippon Denshoku Industries Co., Ltd.). The results are shown in Table 2. It is that the greater the total light transmittance, the better the transparency -55-201031694 cured film. <Shape Followability> As shown in FIG. 3, the above-described curable composition is injected onto the wafer W using an injection device, and the curable composition is brought into contact with the transfer member 62 to bring the convex portion 90 into contact with the photocurable composition. The exposure was performed at 4 J/cm 2 under an exposure apparatus equipped with an ultrahigh pressure mercury lamp and hardened. Thereafter, the transfer body 62 is separated from the wafer W. The above operation was repeated 1 time to obtain a cured product which was transferred by the shape of one transfer body 62. The shape of the one hardened material was evaluated by an optical microscope to evaluate the presence or absence of cracks or cracks. The evaluation criteria are shown below, and the results are shown in Table 2. A: Completely free of gussets and cracks. B: No breaks occurred. The frequency of cracks is 90/1 00 or more. C: No breaks occurred. The frequency of cracks is 50/100 or more and less than 90/100 D: not produced. The frequency of the break and the crack is less than 50/100. <Substrate Adhesion> As shown in FIG. 3, the curable composition is injected onto the wafer W using an injection device, and the curable composition is contacted with the transfer body 62. The convex portion 90 was brought into contact with the photocurable composition, and exposed to 4 J/cm 2 under an exposure apparatus equipped with an ultrahigh pressure mercury lamp. Thereafter, the transfer body 62 is separated from the wafer W. The above operation was repeated 100 times. When the transfer body 62 is separated from the wafer W, if the substrate adhesion of the cured product is poor, the hard material adheres to the transfer body 62 side and is peeled off by the wafer W. The results obtained by evaluating the number of wafers W in the 100 hardened materials -56-201031694 as the substrate adhesion are shown in Table 2. For example, 90 out of 100 when the wafer W is dense ’ represents the evaluation result of 90/1 00. <Curing and shrinking ratio> A resin solution was applied onto a tantalum wafer by a spin coater method. The coated substrate was measured by an optical film thickness meter. This film thickness was made into the initial film thickness. Thereafter, exposure was carried out under a nitrogen atmosphere to form a cured film, and the film thickness was measured in the same manner. This film thickness was made into the film thickness after exposure. The hardening shrinkage ratio was determined by the following formula. Further, the measurement was carried out at 5 places and the average enthalpy was calculated. (Initial film thickness - film thickness after exposure) / initial film thickness χΐ 00 <%> [Table 2] Preparation Example 1 Preparation Example 2 Comparative Preparation Example 1 Comparative Preparation Example 2 Curable Composition 1 Curable Composition 2 Curable Composition 3 The 400 nm transmittance of the cured composition 4 cured product. /〇 91 90 91 90 Total light transmittance of hardened material % 93 92 93 93 Shape followability B A C D Substrate adhesion 100/100 100/100 100/100 84/100 Hardening shrinkage 〇/〇 5.65 5.50 -
由表2得知,調製例1及2的硬化性組成物具有優良 之形狀追隨性、基板密著性、透明性,故可適用於成形透 鏡陣列等光學零件時所使用的模型的成形上。 -57- 201031694 另一方面,比較例調製1的硬化性組成物具有優良之 基板密著性、透明性,但形狀追隨性較差,會產生縐折、 裂縫故不佳。 又,比較調製例2之硬化性組成物雖具有優良透明性 ,但形狀追隨性、基板密著性較差,會產生由基板之剝落 ,即使密著於基板上,亦會產生縐折、裂縫故不佳。 (實誦 © 使用上述硬化性組成物之調製例1及2所示方法下所 製作之硬化性組成物1及2,進行圖1 0、圖1 1及圖1 2所 示步驟時,可得到使用於良好透鏡陣列及透鏡的成形之模 型。特別對於使用於透鏡之成形的模型的造形,其形狀追 隨性、基板密著性皆良好。 〔產業上可利用性〕 如上述,本發明可適用於例如具有由非球面形狀所成 @ 之透鏡部的透鏡陣列等透鏡、或造形於如此透鏡的成形上 所使用的模型等造形物之造形方法上。 【圖式簡單說明】 〔圖1〕表示有關本發明之第1實施形態的造形裝置 槪略構成圖,圖1(a)表示平面圖,圖1(b)表示左側 面圖。 〔圖2〕表示使用於本發明的第1實施形態之轉印體 -58- 201031694 及晶圓的部分截面圖。 〔圖3〕表示說明於使用於本發明的第1實施形態之 於晶圓所形成之孔上,注入光硬化性組成物的步驟之變形 例的說明圖。 〔圖4〕表示使用於本發明的第1實施形態之轉印體 及晶圓的第1變形例之部分截面圖。 〔圖5〕表示使用於本發明的第1實施形態之轉印體 φ 及晶圓的第2變形例之部分截面圖。 〔圖6〕表示有關本發明的第1實施形態之造形裝置 所使用的控制裝置的方塊圖。 〔圖7〕表示有關本發明的第1實施形態之造形裝置 的動作之第1流程圖。 〔圖8〕表示有關本發明的第1實施形態之造形裝置 的轉印動作之第1流程圖。 〔圖9〕表示有關本發明的第1實施形態之造形裝置 Φ 的動作之第2流程圖。 〔圖10〕表示有關本發明的第1實施形態之造形裝置 的轉印動作之第2流程圖。 〔圖11〕表示說明有關本發明的第1實施形態之透鏡 製造方法的步驟之說明圖。 〔圖12〕表示說明有關本發明的第2實施形態之透鏡 製造方法的步驟之說明圖。 【主要元件符號說明】 -59- 201031694 1 〇:造形裝置 14 :支持台 1 8 :驅動源 24 :可動台 3 2 : y軸馬達 34 : Θ軸馬達 3 6 :供給裝置 44 :可動單位 _ 5 6 : X軸馬達 60 :光照射裝置 62 :轉印體 64 :支持構件用Z軸馬達 68 :光纖維 70 :光源 72 :檢測裝置 74 :攝影部 © 76 :透鏡單位 90 :凸部 2 0 0 :控制裝置 2 04 :主控制部 3 0 0 :模型 3 04 :透鏡陣列 3 1 0 :接合透鏡陣列 3 1 2 :透鏡部 -60- 201031694 3 14 :透鏡 W :晶圓 W 1 :基板 W2 :保持板 h 1 :貫通孔 h2 :孔As is apparent from Table 2, the curable compositions of Modification Examples 1 and 2 have excellent shape followability, substrate adhesion, and transparency, and thus can be applied to molding of a mold used for molding optical components such as a lens array. -57-201031694 On the other hand, the curable composition of the comparative example 1 has excellent substrate adhesion and transparency, but the shape followability is inferior, and collapse or cracking is caused, which is not preferable. Further, although the curable composition of the preparation example 2 has excellent transparency, shape followability and substrate adhesion are inferior, and peeling of the substrate occurs, and even if it is adhered to the substrate, collapse or crack occurs. Not good. (Embodiment © Using the curable compositions 1 and 2 produced by the methods shown in Preparation Examples 1 and 2 of the above-described curable composition, the steps shown in Figs. 10, 11 and 12 can be obtained. A model for forming a good lens array and a lens. In particular, the shape of the model used for forming the lens is good in shape followability and substrate adhesion. [Industrial Applicability] As described above, the present invention is applicable. For example, a lens such as a lens array having a lens portion formed by an aspherical shape, or a shape forming method such as a model used for forming such a lens is formed. [Simplified description of the drawing] [Fig. 1] BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1(a) is a plan view and FIG. 1(b) is a left side view. FIG. 2 is a view showing a first embodiment of the present invention. A partial cross-sectional view of the ink-58-201031694 and the wafer. [Fig. 3] shows a modification of the step of injecting the photo-curable composition onto the hole formed in the wafer used in the first embodiment of the present invention. An illustration of an example. [Fig. 4] A partial cross-sectional view showing a first modification of the transfer body and the wafer used in the first embodiment of the present invention. [Fig. 5] shows a transfer body φ used in the first embodiment of the present invention. And a partial cross-sectional view of a second modification of the wafer. Fig. 6 is a block diagram showing a control device used in the forming device according to the first embodiment of the present invention. [Fig. 7] shows a first embodiment of the present invention. Fig. 8 is a first flowchart showing a transfer operation of the forming device according to the first embodiment of the present invention. Fig. 9 shows a first embodiment of the present invention. Fig. 10 is a second flowchart showing the transfer operation of the forming device according to the first embodiment of the present invention. Fig. 11 is a view showing the first aspect of the present invention. Fig. 12 is an explanatory view showing a procedure of a lens manufacturing method according to a second embodiment of the present invention. [Description of main component symbols] -59- 201031694 1 〇: Shaped equipment Setting 14: Support table 1 8 : Drive source 24: Movable table 3 2 : Y-axis motor 34 : Clamp motor 3 6 : Supply device 44 : Movable unit _ 5 6 : X-axis motor 60 : Light irradiation device 62 : Transfer Body 64: Z-axis motor 68 for supporting member: Optical fiber 70: Light source 72: Detection device 74: Photographing unit © 76: Lens unit 90: Projection 2 0 0: Control device 2 04: Main control unit 3 0 0 : Model 3 04 : lens array 3 1 0 : cemented lens array 3 1 2 : lens portion - 60 - 201031694 3 14 : lens W : wafer W 1 : substrate W2 : holding plate h 1 : through hole h2 : hole
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