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TW201038659A - Resin composition - Google Patents

Resin composition Download PDF

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Publication number
TW201038659A
TW201038659A TW99101807A TW99101807A TW201038659A TW 201038659 A TW201038659 A TW 201038659A TW 99101807 A TW99101807 A TW 99101807A TW 99101807 A TW99101807 A TW 99101807A TW 201038659 A TW201038659 A TW 201038659A
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Taiwan
Prior art keywords
resin composition
resin
epoxy resin
manufactured
ion
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TW99101807A
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Chinese (zh)
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TWI473854B (en
Inventor
Eiichi Hayashi
Motoyuki Takada
Yuichi Kageyama
Hiroyasu Koto
Hiroshi Amano
Shigeru Kawahara
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Ajinomoto Kk
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2650/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G2650/28Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
    • C08G2650/56Polyhydroxyethers, e.g. phenoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08Homopolymers or copolymers of acrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

A resin composition which has excellent low-temperature curability and can give a cured object having excellent moisture imnermeabilitv The resin composition comprises an epoxy resin and an ionic liquid.

Description

201038659 六、發明說明: 【發明所屬之技術領域】 本發明係有關一種樹脂組成物、及使用該物之有機 EL元件封閉用薄膜。 【先前技術】 有機EL( Electroluminescence)元件,對水分而言弱 0 ’使用有機EL·元件構成顯示裝置或照明裝置時,會有有 機材料本身因水分而變質,亮度降低且變得無法發光,以 及電極與有機EL層之界面受到水分影響而剝離,且金屬 氧化而高電阻化的缺點。因此,例如第4圖所示,在玻璃 基板1上形成的有機EL元件2上,使附設有吸濕材料3 之玻璃4以所定間隔予以隔開、對向,使基板i與玻璃板 4之間形成惰性氣體環境或真空狀態,進行密封的罐封閉 處理。然而’由於含有有機EL元件及2張玻璃板之封閉 Q 構造部的厚度變大,故變得無法使顯示裝置或照明裝置充 分地薄型化。 因此’如第1圖所示,提案在被覆於其一面形成有機 EL元件2之玻璃基板1上的有機EL元件2之全面下,形 成硬化性樹脂組成物層6,且於其上貼合封閉基材7,使 硬化性樹脂組成物層6予以硬化,形成硬化層之封閉構造 (以下該封閉構造稱爲「有機EL元件之全面封閉」或簡 稱爲「全面封閉」)(專利文獻1 )。然而,於該專利文 獻:1中記載,由於硬化性樹脂組成物爲丙烯酸系紫外線硬 -5- 201038659 化性樹脂組成物’會有有機EL元件惡化的問題、或產生 紫外線沒有到達的部分(未硬化部分),而不易製得信賴 性高的封閉構造的問題。而且,與環氧樹脂相比時,就耐 熱性等之物性而言,丙烯酸樹脂不佳。 因此’近年來亦進行檢討以環氧樹脂爲主劑之熱硬化 型組成物(例如專利文獻2等)。然而,爲抑制有機E L 元件之熱惡化情形時’必須具有優異的低溫硬化性,而且 ’環氧樹脂之硬化物與丙烯酸系樹脂之硬化物相比時,就 耐透濕性而言不佳’故必須提高硬化物之耐透濕性,惟目 前仍未達成可充分滿足該要求之以環氧樹脂爲主劑之硬化 性樹脂組成物。 〔專利文獻〕 [專利文獻1]日本特開平5-182759號公報 [專利文獻2]日本特開2006-70221號公報 【發明內容】 本發明之課題係提供在低溫下迅速硬化、具有優異的 黏合性’且可形成耐透濕性優異的硬化物之樹脂組成物。 本發明人等爲解決前述課題時,再三深入硏究檢討的 結果’發現藉由使用含有環氧樹脂及離子液體之樹脂組成 物,可完成本發明。 換言之,本發明包含下述之內容。 (1 ) 一種樹脂組成物,其特徵爲含有環氧樹脂及離 子液體。 -6- 201038659 (2 )如前述(1 )記載之樹脂組成物,其中離子液體 係由銨系陽離子或鱗系陽離子、與N -醯基胺基酸離子或 羧酸系陰離子構成。 (3 )如前述(1 )或(2 )記載之樹脂組成物,其中 更含有吸濕性金屬氧化物。 (4 )如前述(1 )〜(3 )中任一項記載之樹脂組成 物,其中更含有無機塡充材料。 (5) —種樹脂組成物薄片,其特徵爲在支持體上形 成(1 )〜(4 )中任一項記載之樹脂組成物的層所形成。 (ό )如前述(5 )記載之樹脂組成物薄片,其係有機 EL元件封閉用。 (7) —種有機EL裝置,其特徵爲使用前述(6)記 載之有機E L兀件封閉用樹脂組成物薄片所形成。 〔發明效果〕 Q 藉由本發明之樹脂組成物,在1 4 0。{:以下(較佳者 1 2〇°C以下)之低溫度下快速硬化,可形成耐透濕性優異 、且具有優異的密接強度之硬化物。而且,本發明之樹脂 組成物及使用該物之樹脂組成物薄片,可適合使用作爲使 用於容易熱惡化'且必須具有防濕效果之各種裝置及其構 成要素等之被覆材料、黏合材料、封閉材料等,可簡單地 形成具有高防濕性之高信賴性的被覆構造'黏合構造、封 閉構造等。特別是可提供高信賴性之有機EL顯示裝置或 有機EL照明裝置。 201038659 〔爲實施發明之形態〕 於下述中,以適合的實施形態說明本發明。 本發明之樹脂組成物,其特徵爲含有環氧樹脂及離子 液體。 此處之用語「離子液體」,一般而言係指「由陰離子 與陽離子所構成的、在約loot以下之溫度範圍內熔融的 鹽」,惟於本說明書中係指「由陰離子與陽離子所構成的 、在硬化溫度以下之溫度範圍內熔融的鹽」。換言之,係 在14(TC以下(較佳者120°c以下)之溫度範圍內熔融的鹽 ,具有環氧樹脂之硬化作用者。 [環氧樹脂] 本發明使用的環氧樹脂,只要是平均在每一分子中具 有2個以上之環氧基者即可。例如雙酚A型環氧樹脂、聯 苯型環氧樹脂、聯苯芳烷基型環氧樹脂、萘酚型環氧樹脂 、萘型環氧樹脂、雙酚F型環氧樹脂、含磷之環氧樹脂、 雙酚S型環氧樹脂、芳香族環氧丙胺型環氧樹脂(例如四 環氧丙二胺基二苯基甲烷、三環氧丙基-P-胺基苯酚、二環 氧丙基甲苯胺、二環氧丙基苯胺等)、脂環式環氧樹脂、 脂肪族鏈狀環氧樹脂、苯酚酚醛清漆型環氧樹脂、甲酚酚 醛清漆型環氧樹脂、雙酚A酚醛清漆型環氧樹脂、具有丁 二烯構造之環氧樹脂、雙酚之二環氧丙氧醚化物、萘二醇 之二環氧丙氧醚化物、苯酚類之環氧丙醚化物、及醇類之 -8- 201038659 二環氧丙氧醚化物、以及此等之環氧樹脂的烷基取代物、 鹵化物及氫化物等。該環氧樹脂可使用任何一種或2種以 上混合使用。 環氧樹脂就保持本發明樹脂組成物之高耐熱性及低透 濕性等而言,於此等之中以雙酚A型環氧樹脂、雙酚F型 環氧樹脂 '苯酚酚醛清漆型環氧樹脂、聯苯芳烷基型環氧 樹脂 '苯酚芳烷基型環氧樹脂、芳香族環氧丙氧胺型環氧 樹脂、具有二環戊二烯構造之環氧樹脂等較佳。 〇 此外,環氧樹脂可爲液狀,可爲固體狀,亦可使用液 狀與固體狀兩者。此處,「液狀」及「固體狀」係在常溫 (25 °c )下之環氧樹脂的狀態。就塗覆性、加工性、黏合 性而言,以使用環氧樹脂全體中至少1 0重量%以上爲液狀 較佳。 而且,於本發明中,就反應性而言,環氧樹脂以環氧 當量爲100〜1000之範圍者較佳,更佳者爲120〜1000之 Q 範圍者。此處,環氧當量係含1克當量之環氧基的樹脂之 克數(g/eq) ’以Jis K 723 6規定的方法爲基準所測定者 [離子液體] 本發明使用的離子液體,具有作爲樹脂硬化劑之作用 。於本發明之樹脂組成物中,以使該離子液體均勻地溶解 於環氧樹脂中的狀態使用爲宜。 構成離子液體之陽離子,例如咪唑鑰鹽離子、哌啶鑰 -9 201038659 鹽離子、暖;格烷鏺鹽離子、吡嗪鑰鹽離子、脈鑰鹽離子、 吡啶鑰離子等之銨系陽離子;四烷基鱗陽離子(例如四丁 基鱗離子、三丁基己基鍈離子等)等之鱗系陽離子;三乙 基鎏離子等之鎏系陽離子等。 構成離子液體之陰離子,例如氟化物離子、氯化物離 子、溴化物離子、碘化物離子等之齒化物系陰離子;甲烷 磺酸離子等之烷基硫酸系陰離子;三氟甲烷磺酸離子、六 氟膦酸離子、三氟參(五氟乙基)膦酸離子、雙(三氟甲 烷磺醯基)醯亞胺離子、三氟醋酸離子、四氟硼酸離子等 之含氟化合物系陰離子;苯酚離子、2 -甲氧基苯酚離子、 2,6-二-第3-丁基苯酚離子等之苯酚系陰離子;天冬胺酸離 子、谷胺酸離子等之酸性胺基酸離子;甘胺酸離子、丙胺 酸離子、苯基丙胺酸離子等之中性胺基酸離子;N -苯甲醯 基丙胺酸離子、N -乙醯基苯基丙胺酸離子、N_乙醯基甘胺 酸離子等以下述一般式(1)所示之N -酸基胺基酸離子; 甲酸離子、醋酸離子、癸酸離子、2 -吡咯烷酮-5-羧酸離子 、α -硫辛酸離子、乳酸離子、酒石酸離子、馬尿酸離子、 Ν-甲基馬尿酸離子、苯甲酸離子等之羧酸系陰離子。 【化1】 〇[Technical Field] The present invention relates to a resin composition and a film for sealing an organic EL element using the same. [Prior Art] The organic EL (electroluminescence) element is weak to moisture. When the display device or the illumination device is formed using an organic EL device, the organic material itself is deteriorated by moisture, and the brightness is lowered and the light is not emitted. The interface between the electrode and the organic EL layer is deviated by the influence of moisture, and the metal is oxidized to have a high resistance. Therefore, for example, as shown in Fig. 4, on the organic EL element 2 formed on the glass substrate 1, the glass 4 to which the moisture absorbing material 3 is attached is placed at a predetermined interval and opposed to each other so that the substrate i and the glass plate 4 are placed. An inert gas atmosphere or a vacuum state is formed to perform a sealed can closure process. However, the thickness of the closed Q structure portion including the organic EL element and the two glass sheets is increased, so that the display device or the illumination device cannot be sufficiently thinned. Therefore, as shown in Fig. 1, it is proposed to form the curable resin composition layer 6 on the entire surface of the organic EL element 2 coated on the glass substrate 1 on which the organic EL element 2 is formed, and to be bonded thereto. In the base material 7, the curable resin composition layer 6 is cured to form a closed structure of the hardened layer (hereinafter, the closed structure is referred to as "total sealing of the organic EL element" or simply "completely closed") (Patent Document 1). However, in the patent document: 1, the curable resin composition is an acrylic ultraviolet hard-5-201038659 resin composition, which has a problem that the organic EL element is deteriorated or a portion where ultraviolet rays are not reached (not The hardened part) does not easily produce the problem of a highly reliable closed structure. Further, when compared with an epoxy resin, the acrylic resin is not preferable in terms of physical properties such as heat resistance. Therefore, in recent years, a thermosetting composition containing an epoxy resin as a main component has been reviewed (for example, Patent Document 2). However, in order to suppress the deterioration of the heat of the organic EL element, it is necessary to have excellent low-temperature hardenability, and when the cured product of the epoxy resin is compared with the cured product of the acrylic resin, it is not good in moisture permeability resistance. Therefore, it is necessary to improve the moisture permeability resistance of the cured product, but it has not yet reached a curable resin composition containing an epoxy resin as a main agent which can sufficiently satisfy the requirement. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. 2006-70221. It is a resin composition of a cured product which is excellent in moisture permeability. In order to solve the above problems, the inventors of the present invention have further infiltrated the results of the review. It has been found that the present invention can be completed by using a resin composition containing an epoxy resin and an ionic liquid. In other words, the present invention encompasses the following. (1) A resin composition characterized by containing an epoxy resin and an ionic liquid. (2) The resin composition according to the above (1), wherein the ionic liquid is composed of an ammonium cation or a squamous cation, and an N-mercaptoamino acid ion or a carboxylic acid anion. (3) The resin composition according to (1) or (2) above which further contains a hygroscopic metal oxide. (4) The resin composition according to any one of (1) to (3) above which further comprises an inorganic chelating material. (5) A resin composition sheet which is formed by forming a layer of the resin composition according to any one of (1) to (4) on a support. (A) The resin composition sheet according to the above (5), which is used for sealing an organic EL element. (7) An organic EL device comprising the sheet of the resin composition for sealing an organic E L element described in the above (6). [Effect of the Invention] Q By the resin composition of the present invention, it is 14,000. {: The following (better than 1 2 ° C) or less is rapidly hardened at a low temperature to form a cured product excellent in moisture permeability resistance and excellent in adhesion strength. In addition, the resin composition of the present invention and the resin composition sheet using the same can be suitably used as a coating material, a bonding material, and a sealing device which are used for various devices and components thereof which are susceptible to heat deterioration and which have a moisture-proof effect. A material or the like can easily form a coating structure, a bonded structure, a closed structure, and the like which have high moisture resistance and high reliability. In particular, it is possible to provide a highly reliable organic EL display device or an organic EL illumination device. 201038659 [Mode for Carrying Out the Invention] Hereinafter, the present invention will be described in a suitable embodiment. The resin composition of the present invention is characterized by containing an epoxy resin and an ionic liquid. The term "ionic liquid" as used herein generally means "a salt composed of an anion and a cation which melts in a temperature range of about loot or less", but in the present specification means "consisting of an anion and a cation" a salt that melts in a temperature range below the hardening temperature." In other words, it is a salt which melts in a temperature range of 14 (TC or less (preferably 120 ° C or less)), and has an epoxy resin hardening effect. [Epoxy resin] The epoxy resin used in the present invention is an average It is sufficient to have two or more epoxy groups per molecule, such as bisphenol A type epoxy resin, biphenyl type epoxy resin, biphenyl aralkyl type epoxy resin, naphthol type epoxy resin, Naphthalene type epoxy resin, bisphenol F type epoxy resin, phosphorus-containing epoxy resin, bisphenol S type epoxy resin, aromatic epoxy propylamine type epoxy resin (for example, tetraglycidyldiamine diphenyl group) Methane, triepoxypropyl-P-aminophenol, diepoxypropyl toluidine, diepoxypropyl aniline, etc.), alicyclic epoxy resin, aliphatic chain epoxy resin, phenol novolac type Epoxy resin, cresol novolac type epoxy resin, bisphenol A novolak type epoxy resin, epoxy resin with butadiene structure, diepoxypropoxy ether compound of bisphenol, two rings of naphthalenediol Oxypropoxylates, phenolic propyl ethers, and alcohols -8- 201038659 diepoxypropoxylate And an alkyl group-substituted product, a halide, a hydride, etc. of the epoxy resin, etc. The epoxy resin may be used in combination of any one or two or more kinds. The epoxy resin maintains high heat resistance of the resin composition of the present invention. In terms of properties and low moisture permeability, among these, bisphenol A type epoxy resin, bisphenol F type epoxy resin 'phenol novolac type epoxy resin, biphenyl aralkyl type epoxy resin' A phenol aralkyl type epoxy resin, an aromatic propylene oxide type epoxy resin, an epoxy resin having a dicyclopentadiene structure, etc. 〇 In addition, the epoxy resin may be in a liquid form and may be a solid. In the form of a liquid or a solid, the "liquid" and the "solid" are in the form of an epoxy resin at a normal temperature (25 ° C), in terms of coatability, workability, and adhesion. It is preferable to use at least 10% by weight or more of the entire epoxy resin as a liquid. Further, in the present invention, in terms of reactivity, the epoxy resin has an epoxy equivalent of 100 to 1,000. Preferably, the preferred one is in the range of 120 to 1000 Q. Here, the epoxy equivalent system contains 1 gram. The number of grams of epoxy resin (g/eq) 'measured according to the method specified in Jis K 723 6 [Ionic liquid] The ionic liquid used in the present invention has a function as a resin curing agent. The resin composition is preferably used in a state in which the ionic liquid is uniformly dissolved in the epoxy resin. The cation constituting the ionic liquid, such as imidazolium salt, piperidine-9, 201038659 salt ion, warm; An ammonium cation such as a phosphonium salt, a pyridylium salt ion, a sulfonium salt ion, or a pyridine key ion; a squamous cation such as a tetraalkyl squamous cation (for example, tetrabutyl sulfonium ion, tributylhexyl hydrazine ion, etc.) An anion such as a triethylsulfonium ion or the like, an anion of an ionic liquid, such as a fluoride ion, a chloride ion, a bromide ion, an iodide ion, or the like; an alkyl group such as a methanesulfonate ion; Sulfate anion; trifluoromethanesulfonate ion, hexafluorophosphonic acid ion, trifluoroparagon (pentafluoroethyl) phosphonic acid ion, bis(trifluoromethanesulfonyl) quinone imine ion, trifluoroacetate ion a fluorine-containing compound such as tetrafluoroboric acid ion; an phenolic anion such as a phenol ion, a 2-methoxyphenol ion or a 2,6-di-tert-butylphenol ion; an aspartate ion, a valley Acidic amino acid ion such as aminic acid ion; neutral amino acid ion such as glycine ion, alanine ion, phenylalanine ion; N-benzhydryl propylamine ion, N-ethyl decyl benzene a N-acid amino acid ion represented by the following general formula (1); a formic acid ion, an acetic acid ion, a decanoic acid ion, a 2-pyrrolidone-5- group, such as a propylamine ion, an N-ethlyl glycine acid ion or the like; A carboxylic acid anion such as a carboxylate ion, an α-lipoic acid ion, a lactate ion, a tartaric acid ion, a hippuric acid ion, a quinone-methyl hippuric acid ion, or a benzoic acid ion. 【化1】 〇

-10- 201038659 (式中’ R-C 0-係由碳數1〜5之直鏈狀或支鏈狀脂肪 酸所衍生的醯基、或經取代或未經取代苯甲醯基,-ΝΗ-CHX-C〇2爲天冬胺酸、谷胺酸等之酸性胺基酸離子、或甘 胺酸、丙胺酸離子、苯基丙胺酸離子等之中性胺基酸離子 )° 於前述中’構成離子液體之陽離子,以銨系陽離子、 0 鍈系陽離子較佳,以咪唑鎗鹽離子、鐃離子更佳。更詳言 之’咪唑鐵鹽離子有1-乙基-3-甲基咪唑鎗鹽離子、1-丁 基-3-甲基咪唑鑰鹽離子、1_丙基_3_甲基咪唑鎗鹽離子等 〇 此外’構成離子液體之陰離子,以苯酚系陰離子、以 一般式(1)所示之Ν -醯基胺基酸離子或羧酸系陰離子較 佳’以Ν-醯基胺基酸離子或羧酸系陰離子更佳。 苯酚系陰離子之具體例,如2,6 -二-第3-丁基苯酚離 Q 子。而且’羧酸系陰離子之具體例,如醋酸離子、癸酸離 子、2-吡咯烷酮-5-羧酸離子、甲酸離子、α_硫辛酸、乳酸 離子、酒石酸離子、馬尿酸離子、Ν-甲基馬尿酸離子等, 其中’以醋酸離子、2-吡咯烷酮-5 -羧酸離子 '甲酸離子、 乳酸離子、酒石酸離子、馬尿酸離子、Ν -甲基馬尿酸離子 較佳’以醋酸離子、Ν -甲基馬尿酸離子、甲酸離子更佳。 此外,以一般式(1 )所示之Ν-醯基胺基酸離子之具體例 ’如Ν -苯甲醯基丙胺酸離子、Ν -乙醯基苯基丙胺酸離子 、天冬胺酸離子、甘胺酸離子' Ν -乙醯基甘胺酸離子等, -11 - 201038659 其中以N-苯甲醯基丙胺酸離子、N-乙醯基苯基丙胺酸離 子、N-乙醯基甘胺酸離子較佳,以N-乙醯基甘胺酸離子 更佳。 具體的離子液體,例如月桂酸-1-丁基-3-甲基咪唑鐵 鹽、四丁基鱗-2-吡咯烷酮-5-羧酸鹽、乙酸四丁基鐵鹽、 癸酸四丁基錢鹽、三氟乙酸四丁基錢鹽、α-硫辛酸四丁基 鳞鹽、甲酸四丁基鱗鹽、四丁基錢乳酸鹽、酒石酸雙(四 丁基鱗)鹽、馬尿酸四丁基鱗鹽、Ν-甲基馬尿酸四丁基鍈 鹽、苯甲醯基-DL-丙胺酸四丁基鐃鹽、Ν-乙醯基苯基丙胺 酸四丁基辚鹽、2,6-二-第3-丁基苯酚四丁基錢鹽、L-天冬 胺酸單四丁基鱗鹽、甘胺酸四丁基銹鹽、Ν-乙醯基甘胺酸 四丁基鐵鹽、乳酸-1-乙基-3 -甲基咪唑鑰鹽、乙酸-1-乙基-3_甲基咪唑鑰鹽、甲酸_1_乙基_3_甲基咪唑鑰鹽、馬尿酸-1-乙基-3-甲基咪唑鑰鹽、Ν-甲基馬尿酸-1-乙基-3-甲基咪 唑鐵鹽、酒石酸雙(1-乙基-3-甲基咪唑鑰)鹽、Ν-乙醯基 甘胺酸-1-乙基-3-甲基咪唑鑰鹽較佳,以Ν-乙醯基甘胺酸 四丁基鍈鹽、乙酸-1-乙基-3-甲基咪唑鑰鹽、甲酸-l-乙基-3-甲基咪唑鑰鹽、馬尿酸-1-乙基-3-甲基咪唑鑰鹽、Ν-甲 基馬尿酸-1-乙基-3-甲基咪唑鑰鹽更佳。 本發明使用的離子液體之合成法,爲使由烷基咪唑鑰 鹽、烷基吡啶鑰鹽、烷基銨鹽及烷基鎏鹽離子等之陽離子 部位、及含鹵素之陰離子部位所構成的前驅體,與NaBF4 、NaPF6、CF3S03Na或LiN(S02CF3)2等進行反應的陰離 子交換法;使胺系物質與酸酯進行反應以導入烷基,且使 -12- 201038659 有機酸殘基形成對陰離子之酸酯法;以及使胺類 中和,製得鹽之中和法等,惟不受此等所限制。 陽離子藉由溶劑之中和法,係可使用等量的陰離 子,且餾去所得的反應液中之溶劑直接使用·,亦 機溶劑(甲醇、甲苯、醋酸乙酯、丙酮等),予 縮。 離子液體之配合量,只要是可使環氧樹脂硬 ^ 沒有特別的限制,於每1 00重量份環氧樹脂中以 Ο 重量份較佳,以〇.5〜5重量份更佳。少於0.1重 會有硬化性降低的傾向;大於1 〇重量份時,會 之使用壽命、硬化物之耐透濕性降低的傾向。 [聚硫醇化合物] 於本發明之樹脂組成物中,亦可含有離子液 中至少具有2個以上硫醇基之聚硫醇化合物。藉 Q 子內具有2個以上硫醇基之硫醇化合物,可使硬 快。具體而言,例如三羥甲基丙烷參(硫代乙醇 季戊四醇肆(硫代乙醇酸酯)、乙二醇二硫代乙 三羥甲基丙烷參(β-硫代丙酸酯)、季戊四醇肆 丙酸酯)、二季戊四醇聚(β-硫代丙酸酯)。如 醇與毓基有機酸之酯化反應所得的硫醇化合物, 言不一定使用鹼性物質,在分子內具有2個以上 硫醇化合物。 同樣地,如1 ,4-丁烷二硫醇、1,6-己烷二硫 以有機酸 陰離子與 子與陽離 可添加有 以液體濃 化即可, 0.1 〜1 0 量份時, 有組成物 體與分子 由含有分 化速度變 酸酯)、 醇酸酯、 (β-硫代 藉由多元 就製造而 硫醇基之 醇、1,10- •13- 201038659 癸烷二硫醇等之烷基聚硫醇化合物;含末端硫醇基之聚醚 :含末端硫醇基之聚硫醚;藉由使環氧化合物與硫化氫反 應所得的硫醇化合物;藉由使聚硫醇化合物與環氧化合物 反應所得的具末端硫醇基之硫醇化合物等,就製造步驟而 言使用鹼性物質作爲反應觸媒時,可使用進行脫鹼處理、 鹼金屬離子濃度爲50ppm以下之分子內具有2個以上硫醇 基之硫醇化合物。該脫鹼處理之方法,例如使進行處理之 聚硫醇化合物溶解於丙酮、甲醇等之有機溶劑中,藉由添 加稀鹽酸、稀硫酸等之酸予以中和後,藉由萃取·洗淨予 以脫鹽的方法或使用離子交換樹脂予以吸附的方法,藉由 蒸餾予以精製的方法等,惟不受此等所限制。 於本發明之樹脂組成物中,使用該聚硫醇化合物時, 環氧樹脂與聚硫醇化合物之混合比例,以SH當量數/環氧 當量數爲0.2〜I.2較佳。少於0.2時,無法得到充分的速 硬化性’另外,多於1 .2時,會損及耐熱性等之硬化物的 物性。就黏合性安定而言,以0.5〜1.0更佳。 [吸濕性金屬氧化物] 於本發明之樹脂組成物中,爲更爲提高硬化物之耐透 濕性時,可配合離子液體與吸濕性金屬氧化物。此處,「 吸濕性金屬氧化物」係指具有吸收水分之能力,與所吸濕 的水分進行化學反應,形成氫氧化物之金屬氧化物。具體 而言,例如氧化鈣、氧化鎂、氧化緦、氧化鋇等。此等可 選擇1種或2種以上使用,其中,就吸濕性高、成本、原 -14- 201038659 料之安定性而言,以氧化鈣較佳。 吸濕性金屬氧化物之粒徑過大時,恐會產生 驟中粗粒子損傷有機EL元件的缺點,另外,就 脂成分之界面結合力而言,以粒徑愈小、愈爲有 於粒徑變得愈小時,容易引起粒子間之凝聚情形 成物中分散不佳的情形,恐會不易充分地賦予硬 高的耐透濕性。而且,吸濕性金屬氧化物之平 ^ 0.001〜10 μιη之範圍較佳,更佳的平均粒徑爲0. 之範圍。 此外,吸濕性金屬氧化物之平均粒徑,在前 範圍內時,以不含粒徑爲20μιη以上之粗大粒子 藉由不含該粗大粒子,就在封閉步驟中不會損傷 而言爲有利。 吸濕性金屬氧化物之平均粒徑,可以米氏| 射理論爲基準,藉由雷射•散射法測定。具體而 Q 雷射繞射式粒度分布測定裝置,以體積基準作成 屬氧化物之粒度分布,可測定其介質直徑作爲平 測定試樣可以使用藉由超音波使吸濕性金屬氧化 水中者較佳。雷射繞射式粒度分布測定裝置,可 製作所公司製 LA-500。 吸濕性金屬氧化物可使用以表面處理劑進行 者。藉由使用該表面處理吸濕性金屬氧化物,可 硬化物之黏合安定性,在硬化前之階段中可防止 水分與吸濕性金屬氧化物進行反應或組成物之經 在封閉步 提高與樹 利,惟由 ,因在組 化物具有 均粒徑以 00 1 〜5 μιη 述之較佳 者更佳。 .EL元件 〔Mie )散 言,藉由 吸濕性金 均粒徑。 物分散於 使用堀場 表面處理 更爲提高 樹脂中之 時增黏情 -15- 201038659 形。 表面處理時使用的表面處理劑,例如可使用高級脂肪 酸、烷基矽烷類、矽烷偶合劑等’其中,以高級脂肪酸或 烷基矽烷類爲宜。 高級脂肪酸例如以硬脂酸、褐煤酸、肉宣蔻酸、棕櫚 酸等之碳數1 8以上的高級脂肪酸較佳。此等可選擇1種 或2種以上使用。其中,以硬脂酸較佳。 烷基矽烷類例如甲基三甲氧基矽烷、乙基三甲氧基矽 烷、己基三甲氧基矽烷、辛基三甲氧基矽烷、癸基三甲氧 基矽烷、十八烷基三甲氧基矽烷、二甲基二甲氧基矽烷、 辛基三乙氧基矽烷、正十八烷基二甲基(3-(三甲氧基甲 矽烷基)丙基)氯化銨等,此等可選擇1種或2種以上使 用。 矽烷偶合劑例如3 -環氧丙氧基丙基三甲氧基矽烷、3 -環氧丙氧基丙基三乙氧基矽烷、3-環氧丙氧基丙基(二甲 氧基)甲基矽烷及2- ( 3,4-環氧基環己基)乙基三甲氧基 矽烷等之環氧系矽烷偶合劑;3-锍基丙基三甲氧基矽烷、 3-酼基丙基甲基三乙氧基矽烷、3-巯基丙基甲基二甲氧基 矽烷及11 -巯基十一烷基三甲氧基矽烷等之锍系矽烷偶合 劑;3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷 、3-胺基丙基二甲氧基甲基矽烷、N-苯基-3-胺基丙基三甲 氧基矽烷、N-甲基胺基丙基三甲氧基矽烷、N-( 2-胺基乙 基)-3-胺基丙基三甲氧基矽烷及Ν·( 2-胺基乙基)-3-胺 基丙基二甲氧基甲基矽烷等之胺基系矽烷偶合劑;3 -脲基 -16- 201038659 丙基三乙氧基矽烷等之脲基系矽烷偶合劑、乙烯基三甲氧 基矽烷、乙烯基三乙氧基矽烷及乙烯基甲基二乙氧基矽烷 等之乙烯基系矽烷偶合劑;P-苯乙烯基三甲氧基矽烷等之 苯乙烯基系矽烷偶合劑;3 -丙烯氧基丙基三甲氧基矽烷及 3 -甲基丙烯氧基丙基三甲氧基矽烷等之丙烯酸酯系矽烷偶 合劑;3 -異氰酸酯丙基三甲氧基矽烷等之異氰酸酯系矽烷 偶合劑、雙(三乙氧基甲矽烷基丙基)二硫醚、雙(三乙 氧基甲矽烷基丙基)四硫醚等之硫醚系矽烷偶合劑;苯基 〇 三甲氧基矽烷、甲基丙烯氧基丙基三甲氧基矽烷、咪唑矽 烷、三嗪矽烷等。此等可選擇1種或2種以上使用。 表面處理例如可藉由使未處理的吸濕性金屬氧化物在 常溫下以混合機進行攪拌分散,且添加表面處理劑(高級 脂肪酸、烷基矽烷類或矽烷偶合劑)進行噴霧處理,攪拌 5〜60分鐘予以進行。混合機可使用習知的混合機,例如 V混合機、蝴蝶結混合機、圓錐型混合機等之混合機、手 Q 動混合機及水泥混合機等之混合機、球磨機、切割磨等。 此外’以球磨機等粉碎吸濕材料時,使前述之高級脂肪酸 、烷基矽烷類或矽烷偶合劑混合,且進行表面處理的方法 。表面處理劑(高級脂肪酸、烷基矽烷類或矽烷偶合劑) 之處理量’係視吸濕性金屬氧化物之種類或表面處理劑之 種類等而不同,相對於吸濕性金屬氧化物而言以1〜i 0重 量%較佳,以1〜5重量%更佳。 於本發明之樹脂組成物中,吸濕性金屬氧化物之含有 量相對於1 〇〇重量%樹脂組成物中之不揮發成分而言,以 -17- 201038659 1〜4 0重量%之範圍較佳,以1〜3 0重量%之範圍更佳’以 5〜20重量%之範圍尤佳,以7〜1 8重量%之範圍特佳’以 9〜1 6重量%之範圍最佳。含有量過少時,無法得到充分 的配合吸濕性金屬氧化物之效果;含有量過多時’會有組 成物之黏度上昇的傾向、或硬化物之強度降低、變脆的傾 向。 [無機塡充材料] 於本發明之樹脂組成物中,就硬化物之耐透濕性、防 止薄膜加工時之反彈情形、提高密接性等而言’可含有無 機塡充材料。無機塡充材料例如二氧化矽、氧化鋁、硫酸 鋇、滑石、黏土、雲母、氫氧化鋁、氫氧化鎂、碳酸鈣、 碳酸鎂、氮化硼、硼酸鋁、鈦酸鋇、鈦酸緦、鈦酸鈣、鈦 酸鎂、鈦酸鉍、氧化鈦、锆酸鋇、锆酸鈣等。於此等之中 ,就維持樹脂硬化物之低透濕性、高密接性而言,以滑石 、雲母較佳,以滑石更佳。無機塡充材料可使用1種或2 種以上組合。 於本發明之樹脂組成物中,使用無機塡充材料時,無 機塡充材料之含有量相對於1 〇 〇重量%樹脂組成物中之不 揮發成分而言,以1〜50重量%之範圍較佳,以1〜40重 量%之範圍更佳,以5〜3 0重量%之範圍尤佳,以1 0〜2 0 重量%之範圍最佳。含有量過少時,無法得到充分的配合 吸濕性金屬氧化物之效果;含有量過多時,會有組成物之 黏度上昇的傾向、或硬化物之強度降低、變脆的傾向。 -18- 201038659 本發明中使用的無機塡充材料之平均粒徑的上限値, 就處理性而言以1 0 μηι較佳,以5 μιη更佳,以2.5 μιη尤佳 ’以1·5μιη最佳。另外,無機塡充材料之平均粒徑的下限 値,就防止樹脂組成物之黏度變高而言,以〇.5μιη較佳。 無機塡充材料之平均粒徑,可以米氏(Mie )散射理 論爲基準,藉由雷射繞射•散射法進行測定。具體而言, 可藉由雷射繞射式粒度分布測定裝置,以體積基準作成無 0 機塡充材料之粒度分布,測定其介質粒徑作爲平均粒徑。 測定試樣以使用藉由超音波使無機塡充材料分散於水中者 較佳。雷射繞射式粒度分布測定裝置,可使用堀場製作所 公司製 LA-5 00等。 [橡膠粒子] 於本發明之樹脂組成物中,就提高硬化物之機械強度 或緩和應力等爲目的時,亦可含有橡膠粒子。該橡膠粒子 Q 以不會溶解於調製樹脂組成物時之有機溶劑中,亦不會與 環氧樹脂等之樹脂組成物中之成分相溶,在樹脂組成物之 清漆中以分散狀態存在者較佳。該橡膠粒子,一般而言可 使橡膠成分之分子量直至不會溶解於有機溶劑或樹脂之水 準的大値,調製成粒子狀,具體而言例如芯殼型橡膠粒子 、交聯丙烯腈丁二烯橡膠粒子、交聯苯乙烯丁二烯橡膠粒 子、丙烯酸橡膠粒子等。芯殻型橡膠粒子係粒子具有芯層 與殼層之橡膠粒子,例如以外層之殼層爲玻璃狀聚合物、 內層之殻層爲橡膠狀聚合物所構成的2層構造,或以外層 -19- 201038659 之殼層爲玻璃狀聚合物、中間層爲橡膠狀聚合物、芯層爲 玻璃狀聚合物所構成的3層構造者等。玻璃層例如以甲基 丙烯酸甲酯之聚合物等所構成’橡膠狀聚合物層例如丙烯 酸丁酯聚合物(丁基橡膠)等所構成。芯殼型橡膠粒子之 具體例’如 Staphyloid AC3832、AC3816N (以上爲 Ganz Chemi cal (股)製)、Metablen KW-4426 ( Mitsubishi-10- 201038659 (wherein RC 0- is a fluorenyl group derived from a linear or branched fatty acid having 1 to 5 carbon atoms, or a substituted or unsubstituted benzamidine group, -ΝΗ-CHX- C〇2 is an acidic amino acid ion such as aspartic acid or glutamic acid, or a neutral amino acid ion such as glycine acid, alanine ion or phenylalanine ion. The cation of the liquid is preferably an ammonium cation or a ruthenium cation, and more preferably an imidazole salt or a ruthenium ion. More specifically, 'imidazole iron salt ion has 1-ethyl-3-methylimidazole gun salt ion, 1-butyl-3-methylimidazolium salt ion, 1-propyl-3-methylimidazole salt In addition, the ion is equal to the anion of the ionic liquid, and the phenol-based anion is preferably a fluorenyl-mercapto-amino acid ion or a carboxylic acid-based anion represented by the general formula (1) as a fluorenyl-mercaptoamino acid ion. Or a carboxylic acid anion is more preferable. Specific examples of the phenolic anion, such as 2,6-di-tert-butylphenol, are separated from the Q. Further, specific examples of the 'carboxylic acid anion, such as acetate ion, citric acid ion, 2-pyrrolidone-5-carboxylic acid ion, formic acid ion, α-lipoic acid, lactate ion, tartaric acid ion, hippuric acid ion, strontium-methyl group Horse uric acid ion, etc., wherein 'with acetic acid ion, 2-pyrrolidone-5-carboxylic acid ion 'formic acid ion, lactate ion, tartaric acid ion, hippuric acid ion, Ν-methyl hippuric acid ion preferably' with acetic acid ion, strontium - Methyl hippuric acid ion and formic acid ion are more preferable. Further, specific examples of the indole-fluorenylamino acid ion represented by the general formula (1) such as Ν-benzimidylalanine ion, Ν-acetylphenyl phenylalanine ion, aspartate ion , glycine acid ion ' Ν - acetyl methionine ion, etc., -11 - 201038659 wherein N-benzhydryl propylamine ion, N-acetyl phenylalanine ion, N-ethyl thioglycolate The amine acid ion is preferred, and the N-acetylglycolic acid ion is more preferred. Specific ionic liquids, such as lauric acid-1-butyl-3-methylimidazolium, tetrabutylscale-2-pyrrolidone-5-carboxylate, tetrabutyliron acetate, tetrabutyl phthalate Salt, tetrabutylammonium trifluoroacetate, tetrabutylphosphonium alpha-lipoate, tetrabutylammonium formate, tetrabutyl garrate, bis(tetrabutyl) tartaric acid, tetrabutyl urate Squama salt, Ν-methyl horse uric acid tetrabutyl sulfonium salt, benzamidine-DL-alanine tetrabutyl sulfonium salt, Ν-ethyl phenyl phenylalanine tetrabutyl sulfonium salt, 2,6-two - 3-butylphenol tetrabutyl ketone salt, L-aspartic acid monotetrabutyl sulphate salt, glycine acid tetrabutyl rust salt, Ν-acetamidoglycine tetrabutyl iron salt, lactic acid 1-ethyl-3-methylimidazolium salt, acetate-1-ethyl-3-methylimidazolium salt, formic acid_1_ethyl_3_methylimidazole key salt, hippuric acid-1-B 3-methylimidazolium salt, Ν-methyl horse uric acid-1-ethyl-3-methylimidazolium salt, bis(1-ethyl-3-methylimidazolium) tartaric acid, bismuth-B Mercaptoglycine-1-ethyl-3-methylimidazolium salt is preferred, tetrabutylphosphonium sulphate-acetate, 1-ethyl-3-methyl acetate Carbazole salt, formic acid-l-ethyl-3-methylimidazolium salt, hippuric acid-1-ethyl-3-methylimidazolium salt, Ν-methyl hippuric acid-1-ethyl-3-methyl The base imidazole salt is more preferred. The method for synthesizing an ionic liquid used in the present invention is a precursor composed of a cationic moiety such as an alkyl imidazolium salt, an alkyl pyridyl salt, an alkylammonium salt, an alkyl phosphonium salt or the like, and an anion site containing a halogen. An anion exchange method for reacting with NaBF4, NaPF6, CF3S03Na or LiN(S02CF3)2; reacting an amine-based substance with an acid ester to introduce an alkyl group, and forming an organic acid residue of -12-201038659 to form an anion The acid ester method; and the neutralization of the amine, the neutralization of the salt, etc., are not limited thereto. The cation can be used in the solvent neutralization method, and an equivalent amount of anion can be used, and the solvent in the obtained reaction liquid can be directly used, and the solvent (methanol, toluene, ethyl acetate, acetone, etc.) can be used for pre-shrinking. The amount of the ionic liquid to be added is not particularly limited as long as it is an epoxy resin, and is preferably 5% by weight to 5% by weight per 100 parts by weight of the epoxy resin. When it is less than 0.1%, the hardenability tends to decrease. When it is more than 1 part by weight, the service life and the moisture permeability resistance of the cured product tend to decrease. [Polythiol compound] The resin composition of the present invention may further contain a polythiol compound having at least two or more thiol groups in the ionic liquid. By using a thiol compound having two or more thiol groups in the Q group, it can be hard. Specifically, for example, trimethylolpropane ginseng (thioethanol pentaerythritol oxime (thioglycolate), ethylene glycol dithioethylene trimethylolpropane ginseng (β-thiopropionate), pentaerythritol quinone Propionate), dipentaerythritol poly(β-thiopropionate). For example, a thiol compound obtained by esterification of an alcohol with a mercapto organic acid does not necessarily have to be a basic substance, and has two or more thiol compounds in the molecule. Similarly, for example, 1, 4-butane dithiol, 1,6-hexane disulfide, organic acid anion, and cation and cation can be added with liquid concentration, 0.1 to 10 parts by volume, The constituent objects and molecules are composed of an alcoholic acid ester having a differentiation rate, an alkyd ester, an alcohol having a thiol group, a thiol group, and a 1,10-?13-201038659 decanedithiol. a polythiol compound; a terminal thiol group-containing polyether: a terminal thiol group-containing polysulfide; a thiol compound obtained by reacting an epoxy compound with hydrogen sulfide; by using a polythiol compound and a ring When a thiol compound having a terminal thiol group obtained by the reaction of an oxygen compound is used as a reaction catalyst in the production step, a de-alkali treatment can be used, and a molecule having an alkali metal ion concentration of 50 ppm or less can be used. a thiol compound having more than one thiol group. The method for removing the alkali, for example, dissolving the treated polythiol compound in an organic solvent such as acetone or methanol, and adding an acid such as dilute hydrochloric acid or dilute sulfuric acid. And after desalting by extraction and washing The method or the method of adsorbing by using an ion exchange resin, the method of purifying by distillation, etc., but it is not limited by these. In the resin composition of this invention, when this polythiol compound is used, an epoxy resin and poly The mixing ratio of the thiol compound is preferably from 0.2 to 1.2 in terms of the number of SH equivalents/epoxide equivalent. When the amount is less than 0.2, sufficient rapid hardenability cannot be obtained'. Further, when it is more than 1.2, it may be damaged. The physical properties of the cured product such as heat resistance are preferably 0.5 to 1.0 in terms of adhesive stability. [Hygroscopic metal oxide] In the resin composition of the present invention, the moisture resistance of the cured product is further enhanced. When used, it can be combined with an ionic liquid and a hygroscopic metal oxide. Here, "hygroscopic metal oxide" means a metal which has the ability to absorb moisture and chemically react with moisture absorbed to form a hydroxide. Specifically, for example, calcium oxide, magnesium oxide, cerium oxide, cerium oxide, etc. These may be used singly or in combination of two or more kinds, among which, high hygroscopicity, cost, and the original -14-201038659 In terms of stability, calcium oxide is more When the particle size of the hygroscopic metal oxide is too large, there is a fear that the coarse organic particles are damaged by the organic EL element, and the smaller the particle size is, the more the particle is bonded. The smaller the diameter is, the more likely it is to cause poor dispersion in the formation of cohesive particles between the particles, and it is difficult to sufficiently impart a high resistance to moisture permeability. Moreover, the hygroscopic metal oxide is 0.001 to 10 The range of μιη is better, and the average particle diameter is preferably in the range of 0. Further, when the average particle diameter of the hygroscopic metal oxide is within the former range, coarse particles having a particle diameter of 20 μm or more are not used. The absence of the coarse particles is advantageous in that it does not damage in the blocking step. The average particle diameter of the hygroscopic metal oxide can be measured by the laser scattering method based on the Mie|spot theory. Specifically, the Q laser diffraction type particle size distribution measuring apparatus is configured to form a particle size distribution of the oxide on a volume basis, and the medium diameter can be measured as a flat measurement sample, and it is preferable to use a supersonic wave to oxidize the hygroscopic metal. . The laser diffraction type particle size distribution measuring device can be manufactured by the company LA-500. The hygroscopic metal oxide can be used as a surface treating agent. By using the surface treatment of the hygroscopic metal oxide, the adhesion stability of the hardenable material prevents the moisture from reacting with the hygroscopic metal oxide during the pre-hardening phase or the composition is improved in the closed step and the tree However, it is more preferable because the composition has a mean particle diameter of 00 1 to 5 μηη. .EL element [Mie] scatters, by hygroscopic gold average particle size. Dispersion in the use of the surface of the market to improve the viscosity of the resin in the -15- 201038659 shape. For the surface treatment agent used for the surface treatment, for example, a higher fatty acid, an alkyl decane, a decane coupling agent or the like can be used. Among them, a higher fatty acid or a alkyl decane is preferable. The higher fatty acid is preferably a higher fatty acid having a carbon number of 18 or more such as stearic acid, montanic acid, orchisamic acid or palmitic acid. One or two or more of these may be used. Among them, stearic acid is preferred. Alkanodecanes such as methyltrimethoxydecane, ethyltrimethoxydecane, hexyltrimethoxydecane, octyltrimethoxydecane, decyltrimethoxydecane,octadecyltrimethoxydecane,dimethyl Dimethoxy decane, octyl triethoxy decane, n-octadecyl dimethyl (3-(trimethoxymethyl decyl) propyl) ammonium chloride, etc., one or two of these may be selected More than one kind. A decane coupling agent such as 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane, 3-glycidoxypropyl(dimethoxy)methyl Epoxy decane coupling agent of decane and 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane; 3-mercaptopropyltrimethoxydecane, 3-mercaptopropylmethyltri An oxane coupling agent such as ethoxy decane, 3-mercaptopropylmethyldimethoxydecane and 11-decylundecyltrimethoxydecane; 3-aminopropyltrimethoxydecane, 3- Aminopropyltriethoxydecane, 3-aminopropyldimethoxymethylnonane, N-phenyl-3-aminopropyltrimethoxydecane, N-methylaminopropyltrimethoxy Baseline, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane, and Ν(2-aminoethyl)-3-aminopropyldimethoxymethyldecane, etc. Amino decane coupling agent; 3-ureido--16- 201038659 ureido decane coupling agent such as propyl triethoxy decane, vinyl trimethoxy decane, vinyl triethoxy decane and vinyl Vinyl oxime such as bis ethoxy decane a coupling agent; a styryl decane coupling agent such as P-styryltrimethoxydecane; an acrylic acid such as 3-propoxypropyltrimethoxydecane or 3-methylpropoxypropyltrimethoxydecane; Ester decane coupling agent; isocyanate decane coupling agent such as 3-isocyanate propyl trimethoxy decane, bis(triethoxymethyl decyl propyl) disulfide, bis (triethoxy carbaryl propyl propyl) a thioether decane coupling agent such as tetrasulfide; phenyl hydrazine trimethoxy decane, methacryloxypropyl trimethoxy decane, imidazolium, triazine decane, and the like. These may be used alone or in combination of two or more. The surface treatment can be carried out, for example, by subjecting an untreated hygroscopic metal oxide to a stirring and dispersing at a normal temperature by a mixer, and adding a surface treatment agent (higher fatty acid, alkyl decane or decane coupling agent) to spray treatment, and stirring 5 ~60 minutes will be carried out. As the mixer, a conventional mixer such as a mixer of a V mixer, a bow mixer, a conical mixer, a mixer such as a Q-mixer or a cement mixer, a ball mill, a cutting mill or the like can be used. Further, when the moisture absorbing material is pulverized by a ball mill or the like, the above-mentioned higher fatty acid, alkyl decane or decane coupling agent is mixed and subjected to a surface treatment. The treatment amount of the surface treatment agent (higher fatty acid, alkyl decane or decane coupling agent) is different depending on the type of the hygroscopic metal oxide or the type of the surface treatment agent, and is relative to the hygroscopic metal oxide. It is preferably 1 to i% by weight, more preferably 1 to 5% by weight. In the resin composition of the present invention, the content of the hygroscopic metal oxide is in the range of -17 to 201038659 1 to 40% by weight relative to the nonvolatile content of the resin composition of 1% by weight. Preferably, it is preferably in the range of 1 to 30% by weight, preferably in the range of 5 to 20% by weight, and particularly preferably in the range of 7 to 18% by weight, preferably in the range of 9 to 16% by weight. When the content is too small, the effect of sufficiently incorporating the hygroscopic metal oxide cannot be obtained. When the content is too large, the viscosity of the composition tends to increase, or the strength of the cured product decreases and becomes brittle. [Inorganic medicinal material] The resin composition of the present invention may contain an inorganic ruthenium material in terms of moisture permeability resistance of the cured product, prevention of rebound during film processing, improvement of adhesion, and the like. Inorganic chelating materials such as cerium oxide, aluminum oxide, barium sulfate, talc, clay, mica, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, boron nitride, aluminum borate, barium titanate, barium titanate, Calcium titanate, magnesium titanate, barium titanate, titanium oxide, barium zirconate, calcium zirconate, and the like. Among them, in order to maintain the low moisture permeability and high adhesion of the cured resin, talc and mica are preferred, and talc is more preferable. The inorganic filler may be used alone or in combination of two or more. In the resin composition of the present invention, when the inorganic filler is used, the content of the inorganic filler is in the range of 1 to 50% by weight based on 1% by weight of the nonvolatile component of the resin composition. Preferably, it is more preferably in the range of 1 to 40% by weight, particularly preferably in the range of 5 to 30% by weight, and most preferably in the range of 10 to 20% by weight. When the content is too small, the effect of sufficiently mixing the hygroscopic metal oxide cannot be obtained. When the content is too large, the viscosity of the composition tends to increase, and the strength of the cured product tends to decrease and become brittle. -18- 201038659 The upper limit 平均 of the average particle diameter of the inorganic ruthenium material used in the present invention is preferably 10 μηη in terms of handleability, more preferably 5 μιηη, and 2.5 μιηη, especially preferably 1·5 μιη. good. Further, the lower limit of the average particle diameter of the inorganic chelating material is preferably 〇5 μmη in order to prevent the viscosity of the resin composition from becoming high. The average particle size of the inorganic chelating material can be determined by the laser diffraction/scattering method based on the Mie scattering theory. Specifically, the particle size distribution of the zero-free chargeable material can be prepared on a volume basis by a laser diffraction type particle size distribution measuring apparatus, and the particle diameter of the medium can be measured as an average particle diameter. It is preferred to measure the sample to use an inorganic cerium filling material dispersed in water by ultrasonic waves. For the laser diffraction type particle size distribution measuring device, LA-5 00, etc., manufactured by Horiba, Ltd., can be used. [Rubber Particles] The resin composition of the present invention may contain rubber particles for the purpose of improving the mechanical strength of the cured product or relieving stress. The rubber particles Q are not dissolved in the organic solvent when the resin composition is prepared, and are not compatible with the components in the resin composition such as an epoxy resin, and are present in a dispersed state in the varnish of the resin composition. good. The rubber particles are generally prepared such that the molecular weight of the rubber component is not dissolved in the level of the organic solvent or the resin, and is, for example, a core-shell type rubber particle or a crosslinked acrylonitrile butadiene. Rubber particles, crosslinked styrene butadiene rubber particles, acrylic rubber particles, and the like. The core-shell type rubber particle-based particles have rubber particles of a core layer and a shell layer, and for example, a shell layer of an outer layer is a glassy polymer, and a shell layer of an inner layer is a rubber-like polymer, or an outer layer - 19-201038659 The three-layer structure of the shell layer is a glassy polymer, the middle layer is a rubbery polymer, and the core layer is a glassy polymer. The glass layer is composed of, for example, a polymer of methyl methacrylate or the like, and a rubbery polymer layer such as butyl acrylate polymer (butyl rubber). Specific examples of the core-shell type rubber particles are as follows: Staphyloid AC3832, AC3816N (above is Ganz Chemi cal), Metablen KW-4426 (Mitsubishi)

Rayon(股)製)、F351 (日本Zeon(股)製)等。丙烯腈丁 二烯橡膠(NBR )粒子之具體例,如XER-91 ( JSR(股)製 )等。苯乙烯丁二烯橡膠(SBR)粒子之具體例,如XSK-5 00 ( JSR(股)製)等。丙烯酸橡膠粒子之具體例,如Rayon (share) system, F351 (Japan Zeon (share) system) and so on. Specific examples of the acrylonitrile butadiene rubber (NBR) particles are, for example, XER-91 (manufactured by JSR Co., Ltd.). Specific examples of the styrene butadiene rubber (SBR) particles are, for example, XSK-5 00 (manufactured by JSR Co., Ltd.). Specific examples of acrylic rubber particles, such as

Metablen W300A、W450A(以上爲 Mitsubishi Rayon(股) 製)。 橡膠粒子之平均粒徑以0.005〜Ιμιη之範圍較佳,以 0.2〜0.6 μιη之範圍更佳。該橡膠粒子之平均粒徑,可使用 動態光散射法測定。例如,藉由超音波等使橡膠粒子均勻 地分散於適當的有機溶劑中,使用F P R A - 1 0 0 0 (大塚電子 (股)製),以重量基準作成橡膠粒子之粒度分布,以其介 質粒徑作爲平均粒徑予以測定。 於本發明之樹脂組成物中使用橡膠粒子時,橡膠粒子 之含有量相對於100重量%樹脂組成物中之不揮發成分而 言,以0.1〜2 0重量%較佳,以0.1〜1 0重量%更佳。少於 0.1重量%時,無法得到充分的配合橡膠粒子之效果;大 於20重量%時,會有耐熱性、耐透濕性降低的情形。 -20 - 201038659 [熱可塑性樹脂] 於本發明之樹脂組成物中,就可賦予硬化物具有可撓 性、於塗佈樹脂組成物時維持良好的加工性等而言,可含 有熱可塑性樹脂。熱可塑性樹脂例如苯氧基樹脂、聚乙烯 基縮醛樹脂、聚醯亞胺樹脂、聚醯胺醯亞胺樹脂、聚醚楓 樹脂、聚硼樹脂等。此等之熱可塑性樹脂可使用任何一種 ,亦可2種以上混合使用。熱可塑性樹脂就可賦予可撓性 ^ 、防止塗佈時之剝離情形而言,重量平均分子量以30,00〇 〇 以上較佳、以50,000以上更佳。然而,重量平均分子量 過大時,由於會有與環氧樹脂之相溶性降低等的傾向,故 重量平均分子量以1,000,000以下較佳,以800,000以下 更佳。 而且,此處所指的「熱可塑性樹脂之重量平均分子量 」,係以凝膠滲透色層分析法(GPC )(聚苯乙烯換算) 所測定。藉由GPC法之重量平均分子量,具體而言使用 Q 島津製作所(股)LC-9A/RID-6A作爲測定裝置,使用昭和電 工(股)公司製 Shodex K-800P/K-804L/K-804L 作爲柱,使 用氯仿作爲移動相等,在柱溫度40°C下進行測定,使用標 準聚苯乙烯檢量線求取。 於前述之例示物中,熱可塑性樹脂以苯氧基樹脂更佳 。苯氧基樹脂就與「苯氧基樹脂」之相溶性良好,且對本 發明之樹脂組成物的硬化物之黏合性、耐濕性的影響少而 言較佳。 苯氧基樹脂例如具有1種以上選自雙酚A骨架、雙酚 -21 - 201038659 F骨架、雙酚S骨架、雙酚苯乙酮骨架、酚醛清漆樹脂骨 架、聯苯骨架、芴骨架、二環戊二烯骨架、原菠烯骨架、 萘骨架、蒽骨架、金剛烷骨架、萜烯骨架、三甲基環己烷 骨架之骨架者。苯氧基樹脂可混合2種以上使用。 苯氧基樹脂之市售品,例如Japan Epoxy Resin(股)製 1 2 5 6、42 50 (含有雙酚 A骨架之苯氧基樹脂)、Japan Epoxy Resin(股)製YX8100(含有雙酚S骨架之苯氧基樹 脂)、Japan Epoxy Resin(股)製ΥΧ6954.(含有雙酸苯乙酮 骨架之苯氧基樹脂)、Union Carbide公司製ΡΚΗΗ (重量 平均分子量(Mw) 42600、數平均分子量(Μη) 11200) 等,東都化成(股)製 FX280、FX293、Japan Epoxy Resin( 股)製 YL7553BH30、YL6794、YL7213、YL7290,YL7482 等。 於本發明之樹脂組成物中使用熱可塑性樹脂時,熱可 塑性樹脂之含有量相對於1〇〇重量%樹脂組成物中之不揮 發成分而言,以1〜50重量%之範圍較佳,以3〜25重量 %之範圍更佳。少於1重量%時,無法得到充分的配合熱 可塑性樹脂之效果;多於5 0重量%時,會有硬化物之透濕 性降低的傾向。 [偶合劑] 於本發明之樹脂組成物中,就與被黏合物之密接性、 硬化物、耐透濕性等而言,可含有偶合劑。該偶合劑例如 鈦系偶合劑、鋁系偶合劑、矽烷偶合劑等。其中,以矽烷 -22- 201038659 偶合劑較佳。而且,偶合劑可1種或2種以上組合使用。 矽烷偶合劑例如3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-環氧丙氧基丙基(二甲 氧基)甲基矽烷及2-(3,4-環氧基環己基)乙基三甲氧基 矽烷等之環氧系矽烷偶合劑;3 -锍基丙基三甲氧基矽烷、 3-锍基丙基三乙氧基矽烷、3-锍基丙基甲基二甲氧基矽烷 及11-锍基十一烷基三甲氧基矽烷等之巯基系矽烷偶合劑 0 ; 3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、 3-胺基丙基二甲氧基甲基矽烷、N-苯基-3-胺基丙基三甲氧 基矽烷、N-甲基胺基丙基三甲氧基矽烷、N-(2-胺基乙基 )_3_胺基丙基三甲氧基矽烷及N-(2-胺基乙基)-3-胺基 丙基二甲氧基甲基矽烷等之胺系矽烷偶合劑;3-脲基丙基 三乙氧基矽烷等之脲基系矽烷偶合劑、乙烯基三甲氧基矽 烷、乙烯基三乙氧基矽烷及乙烯基甲基二乙氧基矽烷等之 乙烯基系矽烷偶合劑;P -苯乙烯基三甲氧基矽烷等之苯乙 0 烯基系矽烷偶合劑;3-丙烯氧基丙基三甲氧基矽烷及3-甲 基丙烯氧基丙基三甲氧基矽烷等之丙烯酸酯系矽烷偶合劑 ;3-異氰酸酯丙基三甲氧基矽烷等之異氰酸酯系矽燒偶合 劑、雙(三乙氧基甲矽烷基丙基)二硫醚、雙(三乙氧基 甲矽烷基丙基)四硫醚等之硫醚系矽烷偶合劑;苯基三甲 氧基矽烷、甲基丙烯氧基丙基三甲氧基矽烷、咪唑矽烷、 三嗪矽烷等。於此等之中,以環氧基系矽烷偶合劑更佳。 於本發明之樹脂組成物中使用偶合劑時,偶合劑之含 有量相對於1 00重量%樹脂組成物中之不揮發成分而言, -23- 201038659 以0.5〜1 0重量%較佳,以〇 5〜5重量%更佳。含有量爲 該範匱I外時’無法得到藉由添加偶合劑之密接性的改善效 果。 本發明之樹脂組成物,在可發揮本發明之效果的範圍 內’可任意含有除前述成分外之各種樹脂添加劑。該樹脂 添加劑例如矽粉末、耐龍粉末、氟粉末等之有機塡充劑、 白石、有機性搬土( benton )等之增黏劑、聚矽氧烷系、 氟系、高分子系消泡劑或整平劑、三唑化合物、噻唑化合 物、三嗪化合物、卜啉化合物等之密接性賦予劑等。 [樹脂組成物薄片] 本發明之樹脂組成物,可直接塗佈於被覆對象物或黏 合對象物上,形成樹脂組成物被膜(層),惟製作在支持 體上形成有本發明之樹脂組成物的層之樹脂組成物薄片, 且使該樹脂組成物薄片積層於被覆對象物或黏合對象物之 必要處,使該樹脂組成物層轉印於被覆對象物或黏合對象 物。工業上以使用該樹脂組成物薄片之方法爲宜。 樹脂組成物薄片,可藉由習知的方法,例如調製使樹 脂組成物溶解於有機溶劑的清漆,在支持體上塗佈清漆, 再藉由加熱、或熱風吹附等’使有機溶劑乾燥,形成樹脂 組成物層予以製造。 樹脂組成物薄片中使用的支持體’例如聚乙烯、聚丙 烯、聚氯化乙烯基等之聚烯烴、聚對苯二甲酸乙二酯(以 下簡稱爲「PET」)、聚萘酸乙二酯等之聚酯 '聚碳酸酯 -24- 201038659 、聚醯亞胺等之塑膠薄膜。塑膠薄膜以PET更佳。支持體 除實施墊片處理、電暈處理外,亦可實施脫模處理。脫模 處理例如藉由聚矽氧烷樹脂系脫模劑、烷氧化物樹脂系脫 模劑、氟樹脂系脫模劑等脫模劑之脫模處理。 支持體之厚度,沒有特別的限制,就樹脂組成物薄片 之處理性等而言,以使用10〜150 μιη之範圍較佳,以2〇 〜100μιη之範圍更佳。 q 有機溶劑例如丙酮、甲基乙酮(以下簡稱爲「ΜΕΚ」 )、環己酮等之酮類、醋酸乙酯、醋酸丁酯、溶纖劑乙酸 酯、丙二醇單甲醚乙酸酯、卡必醇乙酸酯等之醋酸酯類、 溶纖劑、丁基卡必醇等之卡必醇類、甲苯、二甲苯等之芳 香族烴類、二甲基甲醯胺、二甲基乙醯胺、Ν-甲基吡略烷 酮等。該有機溶劑可單獨使用任何一種,亦可2種以上組 合使用。 乾燥條件沒有特別的限制,以在5 0〜1 0 0。(:進行3〜 0 1 5分鐘爲宜。Metablen W300A, W450A (above is Mitsubishi Rayon). The average particle diameter of the rubber particles is preferably in the range of 0.005 to Ιμηη, more preferably in the range of 0.2 to 0.6 μηη. The average particle diameter of the rubber particles can be measured by a dynamic light scattering method. For example, the rubber particles are uniformly dispersed in a suitable organic solvent by ultrasonic waves or the like, and FPRA - 1000 (manufactured by Otsuka Electronics Co., Ltd.) is used to prepare the particle size distribution of the rubber particles by weight, and the medium particles are used. The diameter is measured as an average particle diameter. When the rubber particles are used in the resin composition of the present invention, the rubber particles are contained in an amount of 0.1 to 20% by weight, preferably 0.1 to 10% by weight based on 100% by weight of the nonvolatile component of the resin composition. % is better. When the amount is less than 0.1% by weight, the effect of sufficiently blending the rubber particles is not obtained, and when it is more than 20% by weight, the heat resistance and the moisture permeability resistance may be lowered. -20 - 201038659 [The thermoplastic resin] The resin composition of the present invention may contain a thermoplastic resin in order to impart flexibility to the cured product and maintain good processability when the resin composition is applied. The thermoplastic resin is, for example, a phenoxy resin, a polyvinyl acetal resin, a polyimide resin, a polyamidimide resin, a polyether maple resin, a polyboron resin or the like. These thermoplastic resins may be used alone or in combination of two or more. The thermoplastic resin can impart flexibility and prevent peeling at the time of coating, and the weight average molecular weight is preferably 30,00 Torr or more, more preferably 50,000 or more. However, when the weight average molecular weight is too large, the compatibility with the epoxy resin tends to decrease, and the weight average molecular weight is preferably 1,000,000 or less, more preferably 800,000 or less. Further, the "weight average molecular weight of the thermoplastic resin" referred to herein is measured by gel permeation chromatography (GPC) (polystyrene conversion). By the weight average molecular weight of the GPC method, specifically, the Shimadzu Corporation (stock) LC-9A/RID-6A is used as a measuring device, and Shodex K-800P/K-804L/K-804L manufactured by Showa Denko Co., Ltd. is used. As a column, chloroform was used as the movement equivalent, and the measurement was performed at a column temperature of 40 ° C, and was determined using a standard polystyrene calibration line. In the foregoing examples, the thermoplastic resin is more preferably a phenoxy resin. The phenoxy resin is excellent in compatibility with the "phenoxy resin", and has little effect on the adhesion and moisture resistance of the cured product of the resin composition of the present invention. The phenoxy resin has, for example, one or more selected from the group consisting of a bisphenol A skeleton, a bisphenol-21 - 201038659 F skeleton, a bisphenol S skeleton, a bisphenol acetophenone skeleton, a novolak resin skeleton, a biphenyl skeleton, an anthracene skeleton, and A skeleton of a cyclopentadiene skeleton, a raw spinel skeleton, a naphthalene skeleton, an anthracene skeleton, an adamantane skeleton, a terpene skeleton, or a trimethylcyclohexane skeleton. The phenoxy resin may be used in combination of two or more kinds. A commercially available product of a phenoxy resin, for example, 1 2 5 6 , 42 50 (a phenoxy resin containing a bisphenol A skeleton) manufactured by Japan Epoxy Resin Co., Ltd., and YX8100 (a bisphenol S manufactured by Japan Epoxy Resin Co., Ltd.) Benzene phenolic resin), Japan Epoxy Resin Co., Ltd. ΥΧ6954. (phenoxy resin containing a acetophenone skeleton), Union Carbide ΡΚΗΗ (weight average molecular weight (Mw) 42600, number average molecular weight ( Μη) 11200) Etc., DF280, FX293, Japan Epoxy Resin (shares) YL7553BH30, YL6794, YL7213, YL7290, YL7482, etc. When a thermoplastic resin is used in the resin composition of the present invention, the content of the thermoplastic resin is preferably in the range of 1 to 50% by weight based on 1% by weight to 5% by weight of the nonvolatile component of the resin composition. A range of 3 to 25% by weight is more preferable. When the amount is less than 1% by weight, the effect of sufficiently blending the thermoplastic resin is not obtained, and when it is more than 50% by weight, the moisture permeability of the cured product tends to be lowered. [Coupling Agent] The resin composition of the present invention may contain a coupling agent in terms of adhesion to a binder, a cured product, moisture permeability resistance, and the like. The coupling agent is, for example, a titanium coupling agent, an aluminum coupling agent, a decane coupling agent or the like. Among them, a coupling agent of decane-22-201038659 is preferred. Further, the coupling agent may be used singly or in combination of two or more kinds. Decane coupling agents such as 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane, 3-glycidoxypropyl(dimethoxy)methyl Epoxy decane coupling agent of decane and 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane; 3-mercaptopropyltrimethoxydecane, 3-mercaptopropyltriethoxy Tertyl decane coupling agent such as decane, 3-mercaptopropylmethyldimethoxydecane and 11-decylundecyltrimethoxydecane; 0; 3-aminopropyltrimethoxydecane, 3 -Aminopropyltriethoxydecane, 3-aminopropyldimethoxymethylnonane, N-phenyl-3-aminopropyltrimethoxydecane, N-methylaminopropyltrimethyl Oxydecane, N-(2-aminoethyl)_3-aminopropyltrimethoxydecane, and N-(2-aminoethyl)-3-aminopropyldimethoxymethyldecane Amine decane coupling agent; urea-based decane coupling agent such as 3-ureidopropyltriethoxy decane, vinyl trimethoxy decane, vinyl triethoxy decane and vinyl methyl diethoxy Vinyl decane coupling agent such as decane; P-styrene based a phenothiyl decane coupling agent such as oxydecane; an acrylate decane coupling agent such as 3-propenyloxypropyltrimethoxydecane or 3-methylpropoxypropyltrimethoxydecane; - an isocyanate-based oxime coupling agent such as isocyanate propyl trimethoxy decane, bis(triethoxymethyl decyl propyl) disulfide, bis (triethoxymethyl decyl propyl ) tetrasulfide, etc. a thioether decane coupling agent; phenyltrimethoxydecane, methacryloxypropyltrimethoxynonane, imidazolium, triazine decane, and the like. Among these, an epoxy group-based decane coupling agent is more preferable. When a coupling agent is used in the resin composition of the present invention, the content of the coupling agent is preferably from 0.5 to 10% by weight based on the nonvolatile content of 100% by weight of the resin composition, and is preferably from 0.5 to 10% by weight. 〇 5 to 5 wt% is better. When the content is outside the range, the effect of improving the adhesion by adding a coupling agent cannot be obtained. The resin composition of the present invention may optionally contain various resin additives other than the above-mentioned components within a range in which the effects of the present invention can be exhibited. The resin additive is, for example, an organic filler such as strontium powder, nylon powder or fluorine powder, a tackifier such as white stone or organic benton, a polyoxyalkylene system, a fluorine-based or a polymer-based antifoaming agent. Or an adhesion-imparting agent such as a leveling agent, a triazole compound, a thiazole compound, a triazine compound or a porphyrin compound. [Resin Composition Sheet] The resin composition of the present invention can be directly applied to a coated object or a bonded object to form a resin composition film (layer), but the resin composition of the present invention is formed on the support. The resin composition sheet of the layer is laminated on the object to be coated or the object to be bonded, and the resin composition layer is transferred to the object to be coated or the object to be bonded. Industrially, a method of using the sheet of the resin composition is preferred. The resin composition sheet can be dried by a conventional method, for example, by dissolving a varnish in which the resin composition is dissolved in an organic solvent, applying a varnish to the support, and then drying the organic solvent by heating or hot air blowing. A resin composition layer is formed and manufactured. The support used in the resin composition sheet is, for example, polyolefin such as polyethylene, polypropylene, or polyvinyl chloride, polyethylene terephthalate (hereinafter abbreviated as "PET"), polyethylene naphthalate. Polyester 'polycarbonate-24- 201038659, plastic film such as polyimine. The plastic film is better with PET. The support body can be subjected to mold release treatment in addition to gasket treatment and corona treatment. The mold release treatment is carried out by, for example, a release treatment of a release agent such as a polyoxyalkylene resin-based release agent, an alkoxide resin-based release agent, or a fluororesin-based release agent. The thickness of the support is not particularly limited, and the range of use of 10 to 150 μm is preferably in the range of 2 to 150 μm, and the range of 2 to 100 μm is more preferable in terms of handleability of the resin composition sheet. q organic solvents such as acetone, methyl ethyl ketone (hereinafter abbreviated as "ΜΕΚ"), ketones such as cyclohexanone, ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, Acetate such as carbitol acetate, cellosolve, carbitol such as butyl carbitol, aromatic hydrocarbon such as toluene or xylene, dimethylformamide, dimethyl Indoleamine, hydrazine-methylpyrrolidone, and the like. The organic solvent may be used singly or in combination of two or more. The drying conditions are not particularly limited to 5 0 to 1 0 0. (: It is advisable to carry out 3~0 1 5 minutes.

乾燥後所形成的樹脂組成物層之厚度,以3 μ m〜 200μιη較佳’以5μιη〜1〇〇μιη之範圍更佳,以5μηι〜50μιη 之範圍最佳。而且’如下所述,使用作爲有機EL元件封 閉用樹脂組成物薄片時,於其封閉構造中,由於樹脂組成 物層(硬化層)上積層封閉基材(參照第1圖),水分之 侵入由於僅自樹脂組成物層(硬化層)之側面觀察時,樹 脂組成物層之層厚變薄,就與外氣之接觸面積變少、遮斷 水分而言較佳。而且,層厚過小時,轉印於形成有機EL -25- 201038659 元件之基板(以下簡稱爲「有機EL元件形成基板」)上 後’會有塗膜之厚度的均句性降低,貼合封閉基材時之作 業性降低的傾向。 樹脂組成物層可以保護薄膜予以保護,亦可藉由以保 護薄膜保護,以防止灰塵附著或刮傷樹脂組成物層表面。 保護薄膜以使用與支持體相同的塑膠薄膜較佳。而且,保 護薄膜係除墊片處理、電暈處理外,亦可實施脫模處理。 保護薄膜之厚度,沒有特別的限制,以使用1〜40μηι之範 圍較佳,以1 〇〜3 0μιη之範圍更佳。 [有機EL元件之封閉] 本發明之樹脂組成物及樹脂組成物薄片的用途之具體 例,如有機EL元件封閉用樹脂組成物或有機EL元件封 閉用樹脂組成物薄片。使用本發明之樹脂組成物或樹脂組 成物薄片,使有機E L元件封閉時,首先在有機E L元件 形成基板上被覆有機EL元件下形成樹脂組成物層。 直接使用樹脂組成物時,塗佈該物形成樹脂組成物層 。樹脂組成物以使用使環氧樹脂及離子液體、及視其所需 配合的其他材料混合的清漆狀態較佳。在不會影響有機 EL元件的程度下’視其所需可添加前述之溶劑等。使用 溶劑時,於塗佈後進行乾燥,形成樹脂組成物層。該樹脂 組成物層之厚度,與前述之樹脂組成物薄片的厚度相同。 使用樹脂組成物薄片時,使用在樹脂組成物薄片之支 持體上具有防濕性者即可,使用該物作爲封閉基材(即以 -26- 201038659 第1圖中之符號7所特定的基材)。該具有防濕性之支持 體(封閉基材)係使用具有防濕性之塑膠薄膜、或銅箱、 鋁箔等之金屬箔等。具有防濕性之塑膠薄膜,例如在表面 上使氧化矽(二氧化矽)、氮化矽、SiCN、非晶狀矽等之 無機物蒸鍍的塑膠薄膜等。此處之塑膠薄膜,可使用與前 述例示相同者。市售的具有防濕性之塑膠薄膜,例如 Techbarrier HX、AX、LX、L系列(三菱樹脂公司製)或 防濕效果更爲提高之X-BARRIER (三菱樹脂公司製)等 。封閉基材亦可使用具有2層以上之複數層構造者。 樹脂組成物薄片之樹脂組成物層以保護薄膜保護時, 使其剝離後,在該樹脂組成物層直接接合有機EL元件形 成基板下,將樹脂組成物薄片積層於有機EL元件形成基 板上。積層的方法可爲分批式,亦可爲以輥之連續式。樹 脂組成物薄片之支持體具有防濕性(即爲封閉基材)時, 使樹脂組成物薄片積層於有機EL元件形成基板後,在沒 Q 有剝離支持體下直接進行下述之樹脂組成物層之熱硬化作 業(藉此完成有機EL元件之封閉處理)。 另外,支持體不具防濕性時,以剝離支持體且使封閉 基材壓熔於所露出的樹脂組成物層上,進行下述之樹脂組 成物層之熱硬化作業較佳。此時,封閉基材可使用前述具 有防濕性之塑膠薄膜或銅箔、鋁箔等之金屬箔外,亦可使 用不適合使用作爲樹脂組成物薄片之支持體的玻璃板、金 屬板等之不具可撓性的基材。封閉基材於壓熔時之壓力, 以約0.5〜10kg f/cm2爲宜,在加熱下壓熔時,其溫度約爲 -27- 201038659 50〜130 °C。而且,封閉基材之厚度’就有機EL裝置本身 薄且輕而言以5mm以下較佳,更佳者爲1mm以下,最佳 者爲ΙΟΟμιη以下;就防止水分透過而g,以5μηι以上較 佳,以1 0 μ m以上更佳,以2 0 μ m以上最佳。封閉基材亦 可使用2張或其以上予以貼合。 如第1圖所示,在玻璃基板1上形成有機EL元件2 時,以玻璃基板1側作爲顯示裝置之顯示面或照明器具之 發光面時,封閉基材7不一定必須使用透明材料,可使用 金屬板、金屬箔等。相反地,有機EL元件形成於由不透 明或透明性低的材料所形成的基板上時,以封閉基材側作 爲顯示裝置之顯示面或照明器具之發光面時,通常封閉基 材使用玻璃板或透明塑膠薄膜(或板)等。 於封閉基材壓熔後(使用有機EL元件封閉用樹脂組 成物薄片之支持體作爲封閉基材時,於有機EL元件封閉 用樹脂組成物薄片積層後),可藉由使樹脂組成物層進行 熱硬化處理’形成目的之封閉構造(第1圖所示之封閉構 造)。使樹脂組成物層進行熱硬化的方法,沒有特別的限 制’可使用各種方法。例如’熱風循環式烤箱、紅外線加 熱器、加熱管' 高周波誘導加熱裝置、藉由熱風槍(heat to ο 1 )之壓熔予以加熱等。本發明之樹脂組成物具有極佳 的低溫硬化性,在1 40°C以下(較佳者i 2(rC以下、更佳者 1 1 0 °C以下)之低溫範圍內,大約1 2 0分鐘以下(較佳者 9 0分鐘以下、更佳者6 0分鐘以下)之短時間內進行硬化 。因此,可使有機E L元件因熱而導致惡化的情形變得極 -28- 201038659 少。而且,硬化溫度及硬化時間之各下限値,就可確保充 分滿足硬化物之黏合性(密接性)而言,硬化溫度以5 0 °C 以上較佳、以55°C以上更佳,硬化時間以20分鐘以上較 佳、以3 0分鐘以上更佳。 由下述記載的實施例及比較例可知,本發明之樹脂組 成物,由於爲含有環氧樹脂及離子液體之樹脂組成物,在 低溫度下可快速硬化,形成耐透濕性優異且可得優異的密 0 接強度之硬化物。特別是可實現耐透濕性優異 '不會有經 時之黏合力降低情形、具有安定黏合性之硬化物被膜(層 )。而且,藉由在環氧樹脂中配合離子液體與吸濕性金屬 氧化物,可形成耐透濕性更爲提高的硬化物。 〔實施例〕 於下述中,以實施例及比較例更具體地說明本發明, 惟本發明不受此等實施例所限制。 Q 實施例及比較例中使用的材料(原料)如下所述。 (A) 環氧樹脂 •828EL( Japan Epoxy Resin 公司製):液狀雙酣 a 型環氧樹脂、環氧當量(1 8 5 g/eq )、低氯型環氧樹脂。 •NC3 00 0 (日本化藥公司製):聯苯基芳烷基型環氧 樹脂、環氧當量(2 75g/eq )、調製成70wt%固成分之 MEK溶液使用。 •GOT (日本化藥公司製):間甲苯胺二環氧丙胺(液 -29- 201038659 狀)、環氧當量(135g/eq)。 •Epiclon EXA835LV(DIC公司製):液狀雙酣f型 環氧樹脂、環氧當量160-170g/eq。 •Epicot 828 ( Japan Epoxy Resin 公司製):雙酣 ^ 型環氧樹脂低氯型。 •Epicot 10 0 1 ( Japan Epoxy Resin 公司製):固體雙 酚A型環氧樹脂、環氧當量(47 5 g/eq)。 (B) 硬化劑 (離子液體) •N-乙醯基甘胺酸四丁基鐃鹽 •N-甲基馬尿酸-1-乙基-3-甲基咪唑鎗鹽 •醋酸-1-乙基-3-甲基咪唑鎗鹽(乙酸-1-乙基-3-甲基 咪唑鑰鹽) •甲酸-1-乙基-3-甲基咪唑鑰鹽 (固體分散型硬化劑) •Amicure MY-24 ( Ajinomoto Fine Techno 公司製、平 均粒徑1 〇 μ m ) •2PZ-CNS-PW (四國化成公司製):偏苯三酸-1-氰基 乙基-2-苯基咪唑鎗鹽之粉碎品、平均粒徑1 〇μηι (酸酐型硬化劑) •RikacidMH-700 (新日本理化公司製):甲基六氫苯 -30- 201038659 二甲酸酐 (液狀硬化劑) •2E4MZ (四國化成公司製):2-乙基-4-甲基咪唑 •1B2MZ (四國化成公司製):1-苯甲基-2-甲基咪唑 (C) 苯氧基樹脂 ◎ .YX6954(J ap an Epoxy Resin 公司製):高耐熱型苯 氧基樹脂、重量平均分子量(40000)、調製成35 wt %固 成分之MEK溶液使用。 •YL7213 (Japan Epoxy Resin 公司製):商耐熱型苯 氧基樹脂、重量平均分子量(35000 )、調製成35wt%固 成分之MEK溶液使用。The thickness of the resin composition layer formed after drying is preferably from 3 μm to 200 μm, preferably from 5 μm to 1 μm, and most preferably from 5 μm to 50 μm. In the case where the resin composition sheet for the organic EL element sealing is used as described below, in the closed structure, the resin composition layer (hardened layer) is laminated on the substrate (see Fig. 1), and moisture is invaded due to When the resin composition layer is thinned from the side of the resin composition layer (hardened layer), it is preferable that the contact area with the outside air is small and the moisture is blocked. In addition, when the thickness of the layer is too small, the substrate is formed on the substrate on which the organic EL-25-201038659 element is formed (hereinafter referred to as "organic EL element forming substrate"), and the thickness of the coating film is lowered. The workability at the time of the substrate is lowered. The resin composition layer can protect the film from protection, and can also be protected by a protective film to prevent dust from adhering or scratching the surface of the resin composition layer. It is preferable that the protective film is made of the same plastic film as the support. Further, the protective film can be subjected to mold release treatment in addition to the gasket treatment and the corona treatment. The thickness of the protective film is not particularly limited, and a range of 1 to 40 μm is preferably used, and a range of 1 〇 to 3 0 μm is more preferable. [Blocking of the organic EL device] The resin composition of the present invention and the resin composition sheet are, for example, a resin composition for sealing an organic EL element or a resin composition sheet for sealing an organic EL element. When the resin composition or the resin composition sheet of the present invention is used to close the organic EL element, the resin composition layer is first formed on the organic EL element formation substrate by coating the organic EL element. When the resin composition is directly used, the material is applied to form a resin composition layer. The resin composition is preferably in a varnish state in which an epoxy resin, an ionic liquid, and other materials which are required to be blended are used. To the extent that the organic EL element is not affected, the aforementioned solvent or the like may be added as needed. When a solvent is used, it is dried after coating to form a resin composition layer. The thickness of the resin composition layer is the same as the thickness of the aforementioned resin composition sheet. When a resin composition sheet is used, it is sufficient to use a moisture-repellent property on a support of the resin composition sheet, and the object is used as a sealing substrate (that is, a group specified by symbol 7 in Fig. 1 of -26-201038659). material). The moisture-proof support (closed substrate) is a plastic film having moisture resistance, a metal foil such as a copper box or an aluminum foil, or the like. A plastic film having moisture resistance, for example, a plastic film obtained by vapor-depositing an inorganic substance such as cerium oxide (cerium oxide), cerium nitride, SiCN or amorphous cerium on the surface. The plastic film herein may be the same as the above-described examples. Commercially available plastic film with moisture resistance, such as Techbarrier HX, AX, LX, L series (manufactured by Mitsubishi Plastics Co., Ltd.) or X-BARRIER (manufactured by Mitsubishi Plastics Co., Ltd.) with improved moisture resistance. As the closed substrate, a multilayer structure having two or more layers can also be used. When the resin composition layer of the resin composition sheet is protected by a protective film, the resin composition layer is directly bonded to the organic EL element forming substrate, and the resin composition sheet is laminated on the organic EL element forming substrate. The method of laminating may be a batch type or a continuous type of rolls. When the support of the resin composition sheet has a moisture-proof property (that is, a closed substrate), the resin composition sheet is laminated on the organic EL element forming substrate, and the following resin composition is directly subjected to the peeling support without Q. The layer is thermally hardened (by thereby completing the sealing treatment of the organic EL element). Further, when the support is not moisture-proof, it is preferable to peel off the support and to melt the closed base material on the exposed resin composition layer, and to perform the heat hardening operation of the resin composition layer described below. In this case, the sealing substrate may be a plastic film having a moisture-proof property, a metal foil such as a copper foil or an aluminum foil, or a glass plate or a metal plate which is not suitable for use as a support for the resin composition sheet. Flexible substrate. The pressure of the closed substrate at the time of pressure fusion is preferably about 0.5 to 10 kgf/cm2, and when it is melted under heating, the temperature is about -27-201038659 50 to 130 °C. Further, the thickness of the closed substrate is preferably 5 mm or less, more preferably 1 mm or less, and most preferably ΙΟΟμηη or less, in order to prevent moisture from permeating, and preferably 5 μm or more. More preferably, it is more preferably 10 μm or more, and more preferably 20 μm or more. The closed substrate can also be attached using two or more sheets. As shown in Fig. 1, when the organic EL element 2 is formed on the glass substrate 1, when the glass substrate 1 side is used as the display surface of the display device or the light-emitting surface of the lighting fixture, the sealing substrate 7 does not necessarily have to use a transparent material. Use metal plates, metal foils, etc. Conversely, when the organic EL element is formed on a substrate formed of a material having low opacity or low transparency, when the substrate side is closed as a display surface of a display device or a light-emitting surface of a lighting fixture, the substrate is usually closed using a glass plate or Transparent plastic film (or board), etc. After the base material is melted by the sealing material (when the support of the resin sheet for sealing the organic EL element is used as the sealing substrate, after the resin composition sheet for the organic EL element sealing is laminated), the resin composition layer can be formed. The heat-hardening treatment 'closed structure for the purpose of formation (the closed structure shown in Fig. 1). The method of thermally hardening the resin composition layer is not particularly limited, and various methods can be used. For example, a "hot air circulating oven, an infrared heater, a heating tube", a high-frequency induction heating device, and heating by a heat to heat (heat to wh1). The resin composition of the present invention has excellent low-temperature hardenability, and is about 1 to 20 minutes in a low temperature range of 1 to 40 ° C or less (preferably i 2 (rC or less, more preferably 1 to 10 ° C or less)). The curing is performed in a short period of time (preferably 90 minutes or less, and more preferably 60 minutes or less). Therefore, the organic EL element may be deteriorated due to heat, and the amount of the organic EL element may be extremely reduced from -28 to 201038659. The lower limit of the hardening temperature and the hardening time can ensure that the adhesiveness (adhesiveness) of the cured product is sufficiently satisfied, and the curing temperature is preferably 50 ° C or more, more preferably 55 ° C or more, and the hardening time is 20 Preferably, it is more preferably 30 minutes or more, and more preferably 30 minutes or more. It is understood from the examples and comparative examples described below that the resin composition of the present invention is a resin composition containing an epoxy resin and an ionic liquid at a low temperature. It can be quickly hardened to form a cured product which is excellent in moisture permeability and excellent in adhesion strength. In particular, it is excellent in moisture permeability resistance, and it does not have a tendency to reduce adhesion over time, and has a firm adhesiveness. Material film (layer). The ionic liquid and the hygroscopic metal oxide are blended in the epoxy resin to form a cured product having improved moisture permeability resistance. [Examples] Hereinafter, the present invention will be more specifically described by way of Examples and Comparative Examples. However, the present invention is not limited by these examples. Q The materials (raw materials) used in the examples and comparative examples are as follows: (A) Epoxy resin • 828EL (made by Japan Epoxy Resin Co., Ltd.): liquid bismuth Type a epoxy resin, epoxy equivalent (1 8 5 g/eq), low chlorine type epoxy resin. • NC3 00 0 (manufactured by Nippon Kayaku Co., Ltd.): biphenyl aralkyl type epoxy resin, epoxy Equivalent (2 75g/eq), MEK solution prepared with 70wt% solid content. • GOT (manufactured by Nippon Kayaku Co., Ltd.): m-toluidine diglycidylamine (liquid -29- 201038659), epoxy equivalent (135g) /eq) • Epiclon EXA835LV (manufactured by DIC): liquid bismuth f-type epoxy resin, epoxy equivalent 160-170g/eq. • Epicot 828 (made by Japan Epoxy Resin Co., Ltd.): double 酣^ type epoxy resin Low chlorine type • Epicot 10 0 1 (made by Japan Epoxy Resin Co., Ltd.): solid bisphenol A type epoxy tree Epoxy equivalent (47 5 g/eq) (B) Hardener (ionic liquid) • N-Ethyl glycine tetrabutyl phosphonium salt • N-methyl hippuric acid 1-ethyl-3- Methylimidazole gun salt • Acetate-1-ethyl-3-methylimidazole gun salt (acetic acid-1-ethyl-3-methylimidazolium salt) • Formic acid-1-ethyl-3-methylimidazole key Salt (solid dispersion type hardener) • Amicure MY-24 (Ajinomoto Fine Techno company, average particle size 1 〇μ m) • 2PZ-CNS-PW (made by Shikoku Chemical Co., Ltd.): trimellitic acid-1-cyano Crude product of base ethyl-2-phenylimidazole gun salt, average particle size 1 〇μηι (anhydride type hardener) • RikacidMH-700 (manufactured by Nippon Chemical and Chemical Co., Ltd.): methylhexahydrobenzene-30- 201038659 Anhydride (liquid hardener) • 2E4MZ (manufactured by Shikoku Chemicals Co., Ltd.): 2-ethyl-4-methylimidazole•1B2MZ (manufactured by Shikoku Chemical Co., Ltd.): 1-benzyl-2-methylimidazole (C) Phenoxy resin ◎ YX6954 (manufactured by J ap an Epoxy Resin Co., Ltd.): a high heat-resistant phenoxy resin, a weight average molecular weight (40000), and a MEK solution prepared to have a solid content of 35 wt%. • YL7213 (manufactured by Japan Epoxy Resin Co., Ltd.): a heat-resistant phenoxy resin, a weight average molecular weight (35,000), and a MEK solution prepared to have a solid content of 35 wt%.

•PKHH ( InChem公司製):高耐熱型苯氧基樹脂、 重量平均分子量(42600 )、調製成20wt%固成分之MEK Ο 溶液使用。 (D) 橡膠粒子 •F351 (日本Zeon公司製):丙烯酸系芯殼樹脂粒子 、平均粒徑(〇.3μπι) (Ε) 吸濕性金屬氧化物 •Moistop #10 (三共製粉公司製)··氧化錦、平均粒 徑(4μιη)、最大粒徑(15μιη) -31 - 201038659 •燒成白雲石:使吉澤石灰公司製「輕燒白雲石」予 以濕式粉碎者之MEK漿料(固成分爲40wt%、平均粒徑 :0.8 7 μιη ) (F) 無機塡充材料 • SG95S (日本滑石公司製):滑石、平均粒徑( 1.4 μιη ) •D-600 (日本滑石公司製):使滑石予以濕式粉碎者 之MEK漿料(固成分爲30wt%、平均粒徑:❽·72^111) (G) 表面處理劑 ·ΚΒΜ3103(信越Silicon公司製):癸基三甲氧基矽 烷 •硬脂酸(純正化學公司製) (H) 偶合劑 •KBM-403 C信越 Silicon公司製):3-環氧丙氧基丙 基二甲氧基砂院 【實施方式】 以下述所示之順序調整實施例及比較例之各組成物。 配合係以表1、2所示之重量份的量進行。 (實施例1 ) -32- 201038659 在液狀雙酌A型環氧樹脂(japan Ep0Xy Resin公司 製「82 8 EL」)、與液狀環氧樹脂(日本化藥公司製「 GOT」)中’配合使丙烯酸系芯殼樹脂(日本Ze〇n公司 製「F3 51」)輥分散之混合物(混合物〇)、聯苯基芳烷 基型環氧樹脂(日本化藥公司製「NC3000」)之70wt%固 成分之MEK溶液、苯氧基樹脂(Japan Epoxy Resin公司 製「YX6954」)之35wt%固成分之MEK溶液、滑石粉末 0 (日本滑石公司製「SG95S」)、偶合劑(信越Silicon公 司製「KBM-403」),以 AGI Homomixer Robomix 型混合 攪拌機(Primix公司製)混合(混合物η )。然後,該混 合物(混合物Η ) '離子液體硬化劑(Ν-乙醯基甘胺酸四 丁基鱗鹽)及有機溶劑(ΜΕΚ、丙酮),以高速回轉混合 機均勻分散’製得清漆狀樹脂組成物。其次,藉由在使該 清漆狀樹脂組成物以醇酸系脫模劑處理的PET薄膜(厚度 3 8 μιη )之脫模處理面上,在乾燥後之樹脂組成物層的厚度 ❹ 爲40 μιη下,以塑模塗佈器均勻地塗佈,在60〜8〇 °C下進 行乾燥6分鐘,製得樹脂組成物薄片。 (實施例2) 除在離子液體硬化劑中使用N -甲基馬尿酸咪唑鎗鹽 外,以與實施例1相同的方法,調製清漆狀樹脂組成物, 製作樹脂組成物薄片。 (實施例3 ) -33- 201038659 除在離子液體硬化劑中使用醋酸咪唑 施例1相同的方法,調製清漆狀樹脂組成 成物薄片。 (實施例4 ) 除在離子液體硬化劑中使用甲酸咪唑 施例1相同的方法’調製清漆狀樹脂組成 成物薄片。 (實施例5 ) 以切割磨粉碎裝置攪拌氧化鈣(三 Moistop#10」)與表面處理劑(純正化學 ),進行表面處理。然後,除使用在液狀 脂(Japan Epoxy Resin 公司製「828EL」 脂(日本化藥公司製「GOT」)中配合丙 (日本Zeon公司製「F351」)以輥分散 所表面處理的氧化鈣、聯苯基芳烷基型環 藥公司製「NC3000」)之70wt%固成分的 氧基樹脂(Japan Epoxy Resin公司製 3 5wt%固成分之MEK溶液、滑石粉末(日 SG95S」)、偶合劑(信越Siiicon公司寒 ’以 AGI Homomixer Robomix 型混合攪 司製)混合的混合物取代實施例1之混合 施例1記載的方法相同的方法,調製清漆 鑰鹽外,以與實 物,製作樹脂組 鑰鹽外,以與實 物,製作樹脂組 共製粉公司製「 公司「硬脂酸」 雙酚A型環氧樹 )與液狀環氧樹 烯酸系芯殻樹脂 之混合物、前述 氧樹脂(日本化 ]Μ E K溶液、苯 「ΥΧ6954」)之 本滑石公司製「 g「ΚΒΜ-403」) 拌機(Primix公 物Η外,以與實 ί狀樹脂組成物, -34- 201038659 製作樹脂組成物薄片。 (比較例1 ) 除使用在液狀雙酷A型環氧樹脂(japall Epoxy Resin 公司製「828EL」)與液狀環氧樹脂(日本化藥公司製Γ GOT」)中配合丙烯酸系芯殻樹脂(日本zeon公司製「 F351」)、固體分散型硬化劑(Ajin〇m〇t〇 Fine Techn〇公 0 司製「MY_24」)以輥分散之混合物取代實施例1之混合 物G’且沒有使用離子液體硬化劑(N_乙醯基甘胺酸四丁 基鐵鹽)外’以實施例1記載的方法相同的方法,調製清 漆狀樹脂組成物’製作樹脂組成物薄片。 (比較例2 ) 除使用在液狀雙酣A型環氧樹脂(Japan Epoxy Resin 公司製「828EL」)與液狀環氧樹脂(日本化藥公司製「 Q GOT」)中配合丙烯酸系芯殻樹脂(日本Zeon公司製「 F351」)、陽離子聚合觸媒型硬化劑(2-乙基-4-甲基咪口坐 、四國化成公司製「2E4MZ」)以輥分散之混合物取代實 施例1之混合物G’且沒有使用離子液體硬化劑(N_乙釀 基甘胺酸四丁基鱗鹽)外,以實施例1記載的方法相同的 方法,調製清漆狀樹脂組成物,製作樹脂組成物薄片。 (比較例3) 以所定量配合在液狀雙酣F型環氧樹脂(DIC公司製 -35- 201038659 「EXA- 8 3 5 LV」)與雙酚 A型環氧樹脂(Japan Epoxy Resin公司製「Epicot 1001」)中均勻分散有固體分散硬 化劑(偏苯三酸-1-氰基乙基-2_苯基異咪唑鐵鹽之粉碎品 、四國化成公司製「2PZ-CNS-PW」)之混合物、苯氧基 樹脂(InChem公司製「PKHH」)之20wt%固成份的MEK 溶液、砂院偶合劑(信越Silicon公司製「KBM403」)’ 製得樹脂組成物。使用該樹脂組成物,以與實施例1記載 的方法相同的方法,製作樹脂組成物薄片。 (比較例4 ) 以所定量混合Epiclon EXA- 8 3 5 LA (液狀雙酚F型環 氧樹脂、DIC公司製)、Rikacid MH-700 (甲基六氫苯二 甲酸酐、新日本理化公司製)、1B2MZ ( 1-苯甲基-2-甲基 咪唑、四國化成司製),製得樹脂組成物。使用該樹脂組 成物,使用模具製得厚度40μιη之薄片狀硬化物。 (比較例5) 以所定量混合Epicot 82 8 (液狀雙酚Α型環氧樹脂低 氯型、Japan Epoxy Resin 公司製)、Rikacid MH-700 (甲 基六氫苯二甲酸酐、新日本理化公司製)、1B2MZ(1-苯 甲基-2-甲基咪唑、四國化成司製),製得樹脂組成物。使 用該樹脂組成物,使用模具製得厚度40 μιη之薄片狀硬化 物。 -36- 201038659 (實施例6 ) 在液狀雙酣A型環氧樹脂(japail Epoxy Resin公司 製「828EL」)與液狀環氧樹脂(日本化藥公司製r got 」)中丙烯酸系芯殻樹脂(日本Z eon公司製「F351」) 以輥分散之混合物(混合物G)中,配合氧化鈣(三共製 粉公司製「Moistop#10」)、聯苯基芳烷基型環氧樹脂( 日本化藥公司製「NC3000」)之70wt%MEK溶液、苯氧 0 基樹脂(Japan Epoxy Resin 公司製「γχ6954」)之 35wt%MEK溶液、滑石粉末(日本滑石公司製r SG95S」 )、偶合劑(信越Silicon公司製「KBM-403」),以 AGI Homomixer Robomix型混合攪拌機(primix公司製) 混合(混合物Η )。然後,該混合物(混合物Η )、離子 液體硬化劑(Ν -乙醯基甘胺酸四丁基鐵鹽)及有機溶劑( ΜΕΚ、丙酮)混合’以高速回轉混合機均勻分散,製得清 漆狀樹脂組成物。其次’藉由在該清漆狀樹脂組成物以醇 〇 酸系脫模劑處理的PET薄膜(厚度38μη〇之脫模處理面 上,在乾燥後之樹脂組成物層的厚度爲4 0 μιη下,以塑模 ,塗佈器均勻地塗佈’在60〜8 0°C下進行乾燥6分鐘,製得 樹脂組成物薄片。 (實施例7) 使用攪拌式表面處理裝置,在氧化鈣(三共製粉公司 製「Moistop#10」)上,藉由癸基三甲氧基矽烷(信越 Silicon公司製「KBM3103」)進行表面處理後,以與實 -37- 201038659 施例6相同的方法,調製清漆狀樹脂組成物,製作樹脂組 成物薄片。而且,於氧化鈣之表面處理中癸基三甲基矽烷 之處理量,相對於氧化鈣而言爲2重量。/〇。 (實施例8) 除使用攪拌式表面處理裝置,在氧化鈣(三共製粉公 司製「MoistoP#10」)上藉由硬脂酸(純正化學公司製) 進行表面處理後,使用作爲離子液體硬化劑之N-甲基馬 尿酸1-乙基-3-甲基咪唑鏺鹽外,以與實施例6相同的方 法,調製清漆狀樹脂組成物,作成樹脂組成物薄片。而且 ,於氧化鈣之表面處理中硬脂酸之處理量,相對於氧化鈣 而言爲2重量%。 (實施例9) 製作使固體環氧樹脂(DIC公司製「HPUOOH」)溶 解於苯氧基樹脂(Japan Epoxy Resin公司製「YL7213」 、3 5wt%固成分之MEK溶液)之混合物A。另外,製作在 燒成白雲石(吉澤石灰公司製經濕式粉碎者)之MEK漿 料(固成分40wt% )中添加分散有硬脂酸的混合物b。配 合混合物 A、混合物B、滑石(日本滑石公司製「D-600 」經濕式粉碎者’固成分3 0wt%之MEK漿料)、橡膠微 粒子分散液狀環氧樹脂(日本觸媒公司製「BpA32 8」)、 環氧樹脂用潛在性硬化促進劑(Sunpro公司製「1)-CAT3502T」)、液狀環氧樹脂(日本化藥公司製「GOT」 -38- 201038659 )、矽院偶合劑(信越化學公司製「ΚΒΜ-403」),以 AGI Homomixer Robomix型混合攪拌機(Primix公司製) 進行混合。於其中添加離子液體硬化劑(N_乙醯基甘胺酸 四丁基鐵鹽)’以高速回轉混合機均句分散,製得清漆狀 樹脂組成物。使用該樹脂組成物,以與實施例1記載的方 法相同的方法,製作樹脂組成物薄片。 0 (實施例1 〇 ) 藉由與實施例9相同的方法,以下述表3之配合表爲 基準’調製清漆狀樹脂組成物。使用該樹脂組成物,以與 實施例1記載的方法相同的方法,製作樹脂組成物薄片。 (實施例11 ) 藉由與實施例9相同的方法,以下述表3之配合表爲 基準’調製清漆狀樹脂組成物。使用該樹脂組成物,以與 〇 實施例1記載的方法相同的方法,製作樹脂組成物薄片。 而且,比較例4、5相當於專利文獻2 (特開2〇〇6_ 7022 1號公報)之實施例1、2。 說明有關各種測定方法•評估方法。 -39- 1 · 低溫硬化性•保存安定性之測定及評估 有關實施例及比較例所得的樹脂組成物,評估相對於 其樹脂組成物層以1 2 0°c、9 0分鐘之條件進行加熱硬化時 的軟鋼板而固之低溫硬化性、保存安定性。 201038659 首先,使用表面以無端環帶(JIS#120)硏磨的平面 形狀爲矩形的軟鋼板(JISG3141、SPCCD、第1寬度: lOOmmx第2寬度:25mmx厚度:1.6mm ) ’如第2圖所示 ,在該軟鋼板11之一面UA的長度方向之一末端部分上 重疊平面形狀爲矩形之樹脂組成物薄片(第1寬度: I2.5mmx第2寬度:25 mm) 12之樹脂組成物層12A,藉由 真空積層器、以溫度80°C、壓力lkgf/cm2(9.8xl04Pa) 之條件進行積層,製作試驗片13。而且,該試驗片13中 製作2張相同者。 其次,如第3圖所示,剝離2張試驗片I 3之雙面的 PET薄膜12B,使樹脂組成物層12A對向,以12mm寬度 重疊下予以貼合,在約3 00g/cm2之壓力下、以固定器固 定,進行120°C/90分鐘加熱硬化處理。然後,以拉幅器萬 能試驗機(東洋精機(股)製TENSILON UTM-5T )測定該2 張試驗片間之拉伸切變黏合強度。測定條件係測定溫度爲 2 5 °C、拉伸速度爲1 m m / m i η。測定硬化處理後(初期)與 硬化處理後、室溫(25t:、4〇%RH )下保管24小時後之 拉伸切變黏合強度。 硬化處理後之初期拉伸切變黏合強度未達1 7 Μ P a時, 低溫硬化性判斷爲不佳(X) ' 17MPa以上、未達19MPa 時判斷爲佳「〇」’ 1 9 Μ P a以上時判斷爲極佳「◎」。 此外’保存安定性係以「保管24小時後之拉伸切變 黏合強度」/「初期拉伸切變黏合強度」X 1 〇 〇 ( % )作爲黏 合保持率’黏合保持率未達7 0 %時,保持安定性判斷爲不 -40- 201038659 充分(x ) ’ 7 0 %以上、未達8 5 %時判斷爲可「△」>85% 以上、未達100%時爲佳「〇」,100%以上時爲極佳「◎ 」°惟保管24小時後之拉伸切變黏合強度降低至未達 15MPa時,就黏合力不足而言爲不適合「X」,15MPa以 上時爲佳「〇」。 2- 耐透濕性(560μιη)之測定及評估 使用1 4張具有實施例及比較例所得的厚度40μιη之樹 脂組成物層之樹脂組成物薄片,使此等以前項記載條件順 序積層,重疊14層之樹脂組成物層之總厚度爲560μιη的 積層薄片狀物。使該物進行12(TC/90分鐘熱硬化處理的硬 化物以JISZ0208爲基準的方法,溫度85°C、濕度85%RH 、24小時之條件,測定水蒸氣透過量,求取每1 m2之水蒸 氣透過量。 水蒸氣透過量爲250g/m2*24hr 以上時,耐透濕 性(5 60μη: I ) 判斷爲不佳^ X」 ,未達 250g/m2<*24hr、 1 5 0 g/m2 · 2 4 hr 以上時爲可「△」 ,未達 150g/m、24hr、 1 00g/m2#24hr 以上時爲佳「〇」, 未達1 00g/m2*24hr時爲 極佳「◎」 〇 沒有進行評估時爲^ -J ° 而且, 測定試料係使用厚度爲 5 6 0 μπι 之積層薄片狀物 之硬化物,觀察假設第1圖所示之有機EL元件之全面封 閉構造,且積層薄片狀物之硬化物的厚度(5 60μιη ) ’與 第1圖中位於硬化性樹脂組成物層(硬化層)6之有機EL 元件2的側部之外氣接觸的部位之寬度(第1圖中之W1 -41 - 201038659 3 . 耐透濕性(4 0 μ m )之測定及評估 以實施例及比較例所製作的樹脂組成物薄片之樹脂組 成物層(厚度:40μηι )進行120°C/90分鐘熱硬化處理, 相對於自支持體(PET薄膜)剝離的硬化層而言,以 JISZ0208爲基準的方法,溫度85°C、濕度85%RH ' 24小 時之條件,測定水蒸氣透過量,求取每lm2之水蒸氣透過 量。 水蒸氣透過量爲300g/m2*24hr以上時,耐透濕性判斷 爲不佳「X」,未達 300g/m2*24hr、250g/m2*24hr 以上時 爲佳「〇」,未達250g/m、24hr時爲極佳「◎」。沒有進 行評估時爲「-」。 4. 積層加工性之評估 以實施例及比較例所得的樹脂組成物薄片之樹脂組成 物層於昇溫測定時之最低熔融黏度的値評估積層加工性。 最低熔融黏度係使用UBM公司製之型式Rheosol-G3000 ’ 樹脂量爲1 g、直徑1 8mm之平行板,測定開始溫度60°C、 昇溫速度 5°C/分鐘 '測定溫度 60°C〜200°C、振動數 1 H z/d eg進行測定。以最低的黏度値(η )作爲最低熔融黏 度。積層加工性係最低熔融黏度未達20000泊(poise)爲 佳(〇)、20000泊以上爲不佳(X )。沒有進行評估時爲 -42- 201038659 5 . 與基材之黏合性的測定 使用2張鋁箔(寬度50mm、長度50mm、厚度50μηι ),在第1張鋁箔之一面上重疊於支持體上具有的樹脂組 成物層(寬度40mm、長度50mm),藉由真空積層器、以 溫度 80°C、壓力lkgf/cm2 ( 9·8χ 104Pa )之條件進行積層 。然後,剝離支持體,且在經露出的樹脂組成物層上重疊 第2張鋁箔,以相同的條件進行積層,作成鋁箔、樹脂組 成物層、鋁箔之3層構造的試驗片。使該試驗片以1 1 、3〇分鐘之條件進行加熱硬化後,切成寬度10mm、長度 50mm之矩形試驗片’以〗IS K_6854之T型剝離試驗方法 爲基準,測定試驗片之長度方向的黏合性。 前述之試驗結果如表1、2記載。 ❹ -43- 201038659 實施例 8 *— to e> u> » CO ο S p g to § to s i' Ο (115.3) © (19.0) I - - 〇 (18*2) os r~x OS CO 實施例i 7 ! •CO e> <〇 5 CO ο S <*> ci m «ο § \£> δ 1 1 Ο (102.5) @ (20.0) 〇 (18.9) ! OS o (10900) 實施例 6 5 CO 0» <D r- u> CO ο 3 CO CQ δ s IO s Ί· @ (67.6) ◎ (21.7) I I ! 〇 '(15.$) <§ o (8730) 比較例 2 ri C9 〇> <〇 Γ- tr> CO 8 S C4 s LO o ▼- X (321) I ◎ (20.1) i_ I 〇 I (1M) 1 比,例| <〇 〇> (D 2 CO 3 S CO s U> s O (255) I 0 I (18.6) X 1 (14.8) <1 1 實,例| CO a> Φ S eo S S CO CO 8 <〇 s in 8 T— 0 (285) Ο (110) 〇 (18.6) I ! 〇 1 07.6) OS 〇 (8850) 實r « CO 〇> cd 卜 U) to Ο S § to 〇 1-» O (256) 1 o (18.0) 1- 0 1 (19.4) I_ @1 1 實施例 3 w 〇> <D 卜 xei CO S S 兮、 8 ir> o r· (226) I 〇 (17.8) I_ I- ! 〇 1 (19.0) @i 1 實施例 2 «〇 to 〇> cd r*» IO CO ο S 3 s u> o 0 (277) 1 I o (18.0) 1- 〇 (19.5) 1 實,例 5 C9 A CCk 09 ο S « ci § u> s Τ» 0 (292) Λ (221.0) © (202) I- 〇 1 (19.7) 〇g o (3810) NC3000 (70wt%固成分之MEK溶液) δ ΰ ΥΧ6954 (35wt%固成分之ΜΕΚ溶液) N-乙醣基甘胺酸四丁基锇鹽 1 -1 N-甲基馬尿酸1-乙基-3-甲基咪唑鑲鹽 _____ ... ________1 醋酸1-乙基-3-甲基咪唑鎗鹽 1 甲酸1-乙基-3-甲基咪唑鎗鹽 1 ΜΥ-24 1 1 2E4MZ Ο 1 1 海 鷀 g cr S S j SG95S 1 1 1 s 0Q 水蒸氣透過量 (e/mz*24hr) 水蒸氣透過量 (g/m2.24hr) 初期之拉伸切變黏合強度 (MPa) _ ti| r 黏合保持率(%) 最低熔融黏度(泊) 40//m耐透濕性 560//ra耐透濕性 ! 低溫硬化性 保存安定性 積層加工性 -44- 201038659 [表2] 比較例3 比較例4 比較例5 EpodonEXA-835LV 25 100 Epicot 828 100 Epicot 1001 25 PKHH (70%固成分之MEK溶液) 50 2PZ-CNS-PW 0.5 RikacidMH-700 90 90 1B2MZ 2 2 KBM403 1 MEK 200 40 "m耐透濕性 水蒸氣透過量(g/m*.24hr> X (1755) X (812) X (694) 56〇MmSi透濕性 水蒸氣透過量(e/m2>24hr) X (523.4) X (342.9) X (338.0) 低溫硬化性 初期之拉伸切變黏合強度(MPa) X (15.3) ◎ (19.1) ◎ (19.3) 保存安定性 保管24小時後之拉伸 切樊黏合強度(MPa) X (14.8) X (17.4) X (18.5) 黏合保持率(%) 〇 (97) 〇 (91) 〇 (96) 稹層加工性 最低熔融黏度(泊) 〇 (3000) - -• PKHH (manufactured by InChem): a high heat-resistant phenoxy resin, a weight average molecular weight (42,600), and a MEK Ο solution prepared to have a solid content of 20% by weight. (D) Rubber particles • F351 (manufactured by Zeon, Japan): Acrylic core-shell resin particles, average particle diameter (〇.3μπι) (Ε) Hygroscopic metal oxide • Moistop #10 (manufactured by Sankyo Powder Co., Ltd.)·· Oxidation bromine, average particle size (4μιη), maximum particle size (15μιη) -31 - 201038659 •Breaked dolomite: MEK slurry for the wet pulverizer of the "light burnt dolomite" made by Giza Lime Co., Ltd. 40wt%, average particle size: 0.8 7 μιη) (F) Inorganic sputum material • SG95S (made by Japan Talc Co., Ltd.): talc, average particle size (1.4 μιη) • D-600 (made by Japan Talc Co., Ltd.): talc MEK slurry of wet pulverizer (solid content: 30% by weight, average particle diameter: ❽·72^111) (G) Surface treatment agent ΚΒΜ3103 (manufactured by Shin-Etsu Silicon Co., Ltd.): decyltrimethoxydecane-stearic acid (manufactured by Junsei Chemical Co., Ltd.) (H) Coupling agent: KBM-403 C by Shin-Seicon Co., Ltd.): 3-glycidoxypropyldimethoxy sand sand [Embodiment] The examples were adjusted in the order shown below. And the respective compositions of the comparative examples. The blending was carried out in the amounts shown in Tables 1 and 2. (Example 1) -32- 201038659 In liquid double-type A-type epoxy resin ("8 8 EL" manufactured by Japan Ep0Xy Resin Co., Ltd.) and liquid epoxy resin ("GOT" manufactured by Nippon Kayaku Co., Ltd.) 70 wt of a mixture of an acrylic core-shell resin ("F3 51" manufactured by Zenitron Co., Ltd.) and a biphenyl aralkyl epoxy resin ("NC3000" manufactured by Nippon Kayaku Co., Ltd.) MEK solution of % solid component, MEK solution of 35 wt% solid content of phenoxy resin ("YX6954" manufactured by Japan Epoxy Resin Co., Ltd.), talc powder 0 ("SG95S" manufactured by Nippon Talc Co., Ltd.), coupling agent (manufactured by Shin-Etsu Silicon Co., Ltd.) "KBM-403") was mixed with an AGI Homomixer Robomix type mixer (manufactured by Primix) (mixture η). Then, the mixture (mixture Η) 'ionic liquid hardener (tetrabutyl sulfonium ethoxide) and organic solvent (ΜΕΚ, acetone) are uniformly dispersed in a high-speed rotary mixer to obtain a varnish-like resin. Composition. Next, the thickness of the resin composition layer after drying is 40 μm by the release treatment surface of the PET film (thickness 3 8 μmη) which is treated with the alkyd-based resin composition as the varnish-like resin composition. Then, it was uniformly coated by a mold coater, and dried at 60 to 8 ° C for 6 minutes to obtain a resin composition sheet. (Example 2) A varnish-like resin composition was prepared in the same manner as in Example 1 except that an N-methyluric acid imidazole gun salt was used for the ionic liquid curing agent to prepare a resin composition sheet. (Example 3) -33 - 201038659 A varnish-like resin composition sheet was prepared in the same manner as in Example 1 except that imidazole acetate was used in the ionic liquid hardener. (Example 4) A varnish-like resin composition sheet was prepared by using the same method as in the example 1 of the ionic liquid hardener. (Example 5) A surface treatment was carried out by stirring a calcium oxide (three Moistop #10) and a surface treatment agent (pure chemical) with a cutting mill pulverizing apparatus. Then, in addition to using a liquid grease ("Gate" made by Nippon Epoxy Resin Co., Ltd. ("GOT" manufactured by Nippon Kayaku Co., Ltd.), the surface-treated calcium oxide was dispersed by a roll ("F351" manufactured by Zeon Corporation, Japan). Oxygen resin of 70 wt% solid content of "NC3000" manufactured by biphenyl aralkyl type ring company (MEK solution of 35 wt% solid content manufactured by Japan Epoxy Resin Co., Ltd., talc powder (daily SG95S)), coupling agent ( In the same method as the method described in the mixing example 1 of the first embodiment, the mixture of the mixture of the Shin-Etsu Siiicon Co., Ltd. and the AGI Homomixer Robomix type mixing compound was used to prepare the resin group key salt. In the case of the resin, the company's "stearic acid" bisphenol A type epoxy resin and the liquid epoxy resin core-shell resin, and the above-mentioned oxygen resin (Japan) EK solution, benzene "ΥΧ6954") talc company "g "ΚΒΜ-403") Mixer (Primix public Η, with a solid resin composition, -34- 201038659 to make a resin composition sheet. (Comparative 1) Acrylic core-shell resin (Japanese zeon) is used in addition to liquid double-cooled A-type epoxy resin ("828EL" manufactured by Japanl Epoxy Resin Co., Ltd.) and liquid epoxy resin (GOT manufactured by Nippon Kayaku Co., Ltd.) Company "F351"), solid dispersion type hardener ("jin_m" from Fine Chemical Co., Ltd.) replaced the mixture G' of Example 1 with a roll-dispersed mixture and did not use an ionic liquid hardener. (N-Ethylglycine glycinate tetrabutyl iron salt) In the same manner as in the method described in Example 1, a varnish-like resin composition was prepared to prepare a resin composition sheet. (Comparative Example 2) Except for use in liquid A bismuth A-type epoxy resin ("828EL" manufactured by Japan Epoxy Resin Co., Ltd.) and a liquid epoxy resin ("Q GOT" manufactured by Nippon Kayaku Co., Ltd.) are blended with acrylic core-shell resin ("F351" manufactured by Zeon Corporation, Japan) ), a cationic polymerization catalyst type hardener (2-ethyl-4-methyl mirruckine, "2E4MZ" manufactured by Shikoku Kasei Co., Ltd.), which replaced the mixture G' of Example 1 with a roll-dispersed mixture and did not use an ionic liquid. Hardener (N_ethyl glycosamine) A varnish-like resin composition was prepared in the same manner as in the method described in Example 1 to prepare a resin composition sheet. (Comparative Example 3) The liquid bismuth F-type epoxy was compounded in a quantitative manner. Resin ("EXA- 8 3 5 LV", manufactured by DIC Corporation) and bisphenol A epoxy resin ("Epicot 1001" manufactured by Japan Epoxy Resin Co., Ltd.) are uniformly dispersed with a solid dispersion hardener (trimellitic acid). Mixture of 1-cyanoethyl-2-phenylisoimidazole iron salt, "2PZ-CNS-PW" manufactured by Shikoku Kasei Co., Ltd., and 20 wt% of phenoxy resin ("PKHH" manufactured by InChem Co., Ltd.) A resin composition was prepared by using a MEK solution of a solid content and a sand compound coupling agent ("KBM403" manufactured by Shin-Etsu Silicon Co., Ltd.). Using this resin composition, a resin composition sheet was produced in the same manner as in the method described in Example 1. (Comparative Example 4) Epiclon EXA-8 3 5 LA (liquid bisphenol F type epoxy resin, manufactured by DIC Corporation), Rikacid MH-700 (methyl hexahydrophthalic anhydride, New Japan Physical and Chemical Co., Ltd.) were mixed in a predetermined amount. (1), 1B2MZ (1-benzyl-2-methylimidazole, manufactured by Shikoku Kasei Seisakusho Co., Ltd.) to obtain a resin composition. Using this resin composition, a sheet-like cured product having a thickness of 40 μm was obtained using a mold. (Comparative Example 5) Epicot 82 8 (liquid bisphenol quinone type epoxy resin low chlorine type, manufactured by Japan Epoxy Resin Co., Ltd.), Rikacid MH-700 (methyl hexahydrophthalic anhydride, New Japan Physicochemical) were mixed in a quantitative manner. A company made of 1B2MZ (1-benzyl-2-methylimidazole, manufactured by Shikoku Kasei Co., Ltd.) was used to prepare a resin composition. Using this resin composition, a sheet-like cured product having a thickness of 40 μm was obtained using a mold. -36- 201038659 (Example 6) Acrylic core shell in liquid bismuth A type epoxy resin ("828EL" manufactured by Japail Epoxy Resin Co., Ltd.) and liquid epoxy resin (Rgot" manufactured by Nippon Kayaku Co., Ltd.) Resin ("F351" manufactured by Zeon Co., Ltd.) In a roll-dispersed mixture (mixture G), calcium oxide ("Moistop #10" manufactured by Sankyo Powder Co., Ltd.) and biphenyl aralkyl type epoxy resin (Japan) 70 wt% MEK solution of "NC3000" manufactured by Pharmaceutical Co., Ltd., 35 wt% MEK solution of phenoxy oxide resin ("γχ6954" manufactured by Japan Epoxy Resin Co., Ltd.), talc powder (r SG95S manufactured by Nippon Talc Co., Ltd.), coupling agent (Shin-Etsu "KBM-403" manufactured by Silicon Co., Ltd. was mixed with an AGI Homomixer Robomix type mixer (manufactured by primix) (mixture Η). Then, the mixture (mixture Η), ionic liquid hardener (tetrabutylammonium ethionate) and organic solvent (plutonium, acetone) are uniformly dispersed in a high-speed rotary mixer to obtain a varnish. Resin composition. Next, a PET film treated with an alcoholic acid-based release agent in the varnish-like resin composition (the thickness of the resin composition layer after drying is 40 μηη, the thickness of the resin composition layer after drying is 40 μmη, The resin composition was uniformly coated by a coater and dried at 60 to 80 ° C for 6 minutes to obtain a resin composition sheet. (Example 7) Using a stirring type surface treatment apparatus, calcium oxide (tri-co-production) In the company's "Moistop #10"), varnish-like resin was prepared in the same manner as in Example 6 of the actual-37-201038659 by surface treatment with decyltrimethoxydecane ("KBM3103" manufactured by Shin-Etsu Silicon Co., Ltd.). In the composition, a resin composition sheet was produced, and the amount of mercaptotrimethylnonane treated in the surface treatment of calcium oxide was 2% by weight based on the calcium oxide. (Example 8) Except for stirring The surface treatment apparatus was subjected to surface treatment with stearic acid (manufactured by Junsei Chemical Co., Ltd.) on calcium oxide ("MoistoP#10" manufactured by Sankyo Powder Co., Ltd.), and N-methyl hippuric acid 1- as an ionic liquid hardener was used. Ethyl-3-methyl In the same manner as in Example 6, a varnish-like resin composition was prepared in the same manner as in Example 6 to prepare a resin composition sheet. Further, the amount of stearic acid treated in the surface treatment of calcium oxide was 2 with respect to calcium oxide. (Example 9) A mixture A in which a solid epoxy resin ("PUOOOH" manufactured by DIC Corporation) was dissolved in a phenoxy resin ("ME7213" manufactured by Japan Epoxy Resin Co., Ltd., and a MEK solution of 35 wt% solid content) was prepared. In addition, a mixture b in which stearic acid was dispersed was added to the MEK slurry (solid content: 40% by weight) of the fired dolomite (the wet pulverizer manufactured by Yoshizawa Lime Co., Ltd.), and the mixture A, the mixture B, and the talc were blended ( "D-600" manufactured by Japan Talc Co., Ltd. is a MEK slurry of 30% by weight of the solid-type pulverizer, a rubber fine particle dispersion liquid epoxy resin ("BpA32 8" manufactured by Nippon Shokubai Co., Ltd.), and epoxy resin. Potential hardening accelerator ("1)-CAT3502T" by Sunpro Co., Ltd.), liquid epoxy resin ("GOT" manufactured by Nippon Kayaku Co., Ltd. -38- 201038659), brothel coupling agent (ΚΒΜ-403, manufactured by Shin-Etsu Chemical Co., Ltd.) ") to AGI Homomixer A Robomix type mixer (manufactured by Primix) was mixed. An ionic liquid hardener (N-ethinylglycine tetrabutyl iron salt) was added thereto to be dispersed in a high-speed rotary mixer to obtain a varnish-like resin composition. Using this resin composition, a resin composition sheet was produced in the same manner as in the method described in Example 1. 0 (Example 1 〇) A varnish-like resin composition was prepared by the same method as in Example 9 on the basis of the following Table 3. Using this resin composition, a resin composition sheet was produced in the same manner as in the method described in Example 1. (Example 11) A varnish-like resin composition was prepared by the same method as in Example 9 on the basis of the following Table 3. Using this resin composition, a resin composition sheet was produced in the same manner as in the method described in Example 1. Further, Comparative Examples 4 and 5 correspond to Examples 1 and 2 of Patent Document 2 (JP-A-6-6022). Explain the various methods of measurement and evaluation methods. -39- 1 · Low-temperature hardening property|Measurement of the storage stability and evaluation The resin composition obtained by the Example and the comparative example was evaluated, and it was set as the heating of the resin composition layer in the temperature of 1280 degree and 90 minutes. Low-temperature hardenability and storage stability of the soft steel plate at the time of hardening. 201038659 First, a soft steel plate with a rectangular shape whose surface is honed by an endless belt (JIS #120) (JISG3141, SPCCD, 1st width: lOOmmx 2nd width: 25mmx thickness: 1.6mm) is used as shown in Fig. 2 A resin composition sheet 12 having a rectangular rectangular shape (first width: I2.5 mmx second width: 25 mm) 12 is laminated on one end portion of the surface UA of the soft steel sheet 11 in the longitudinal direction. The test piece 13 was produced by laminating under the conditions of a temperature of 80 ° C and a pressure of lkgf/cm 2 (9.8 x 10 Pa) by a vacuum laminator. Further, two identical pieces were produced in the test piece 13. Next, as shown in Fig. 3, the PET film 12B on both sides of the two test pieces I 3 was peeled off, and the resin composition layer 12A was opposed to each other and laminated under a width of 12 mm, at a pressure of about 300 g/cm 2 . Next, fixed by a holder, and subjected to a heat hardening treatment at 120 ° C / 90 minutes. Then, the tensile shear bond strength between the two test pieces was measured by a tenter universal testing machine (TENSILON UTM-5T manufactured by Toyo Seiki Co., Ltd.). The measurement conditions were a measurement temperature of 25 ° C and a tensile speed of 1 m m / m i η. The tensile shear bond strength after storage (initial) and after hardening treatment at room temperature (25t:, 4〇% RH) for 24 hours was measured. When the initial tensile shear bond strength after the hardening treatment is less than 17 Μ P a , the low-temperature hardenability is judged to be poor (X) '17 MPa or more, and when it is less than 19 MPa, it is judged to be good "〇"' 1 9 Μ P a The above is judged to be excellent "◎". In addition, the 'storage stability is based on the "stretch shear bond strength after 24 hours of storage" / "initial tensile shear bond strength" X 1 〇〇 (%) as the adhesion retention rate, and the adhesion retention rate is less than 70%. When the stability is judged to be -40- 201038659, it is judged to be "△" > 85% or more when it is less than 80%, and it is not more than 85%. When it is 100% or more, it is excellent "◎". However, when the tensile shear bond strength after 24 hours of storage is reduced to less than 15 MPa, it is not suitable for "X" when the adhesive strength is insufficient, and it is preferable when it is 15 MPa or more. "." 2-Measurement and Evaluation of Moisture Permeability (560 μm) Using 14 sheets of a resin composition sheet having a resin composition layer having a thickness of 40 μm obtained in the examples and the comparative examples, the conditions described in the foregoing items were sequentially laminated and overlapped. The resin composition layer of the layer had a total thickness of 560 μm of a laminated sheet. This product was subjected to a method of 12 (TC/90-minute heat-hardening-treated hardened material based on JISZ0208, and the conditions of temperature 85 ° C, humidity 85% RH, and 24 hours, and the amount of water vapor permeation was measured, and the measurement was performed every 1 m 2 . The amount of water vapor permeation. When the water vapor permeation amount is 250 g/m 2 * 24 hr or more, the moisture permeability resistance (5 60 μη: I ) is judged to be unsatisfactory ^ X", which is less than 250 g/m 2 < * 24 hr, 1 500 g / When m2 · 2 4 hr or more, it can be "△". If it is less than 150g/m, 24hr, 1 00g/m2#24hr or more, it is better, and it is excellent when it is less than 100g/m2*24hr. ^ When the evaluation is not performed, it is ^ -J ° and the test material is a cured product of a laminate sheet having a thickness of 560 μm. The overall closed structure of the organic EL element shown in Fig. 1 is observed, and the laminated sheet is laminated. The thickness of the cured product (5 60 μmη) 'the width of the portion in contact with the side of the organic EL element 2 of the curable resin composition layer (hardened layer) 6 in Fig. 1 (Fig. 1) W1 -41 - 201038659 3. Determination of moisture permeability (40 μm) and evaluation of resin groups prepared by the examples and comparative examples The resin composition layer (thickness: 40 μηι) of the product sheet was subjected to a heat hardening treatment at 120 ° C for 90 minutes, and the hardened layer peeled off from the support (PET film) was subjected to a method based on JIS Z0208 at a temperature of 85°. C, humidity 85% RH '24 hours, the amount of water vapor permeation is measured, and the water vapor per lm2 is measured. When the water vapor permeation amount is 300 g/m 2 * 24 hr or more, the moisture permeability resistance is judged to be poor. X" is less than 300g/m2*24hr and 250g/m2*24hr or more. It is excellent "◎" when it is less than 250g/m and 24hr. It is "-" when it is not evaluated. Evaluation of the laminating processability The resin composition layer of the resin composition sheet obtained in the examples and the comparative examples was evaluated for the lamination processability at the lowest melt viscosity at the time of temperature rise measurement. The lowest melt viscosity was a type Rheosol-G3000 manufactured by UBM. A parallel plate having a resin amount of 1 g and a diameter of 18 mm was measured at a measurement start temperature of 60 ° C, a temperature increase rate of 5 ° C / min, a measurement temperature of 60 ° C to 200 ° C, and a vibration number of 1 H z / d. The lowest viscosity η(η ) is used as the lowest melt viscosity. The lowest melt viscosity of the sexual system is less than 20,000 poise, which is better (〇), and the 20,000 poise or more is not good (X). When not evaluated, it is -42-201038659 5. The adhesion to the substrate is measured using 2 sheets. Aluminum foil (width: 50 mm, length: 50 mm, thickness: 50 μm) was superposed on one surface of the first aluminum foil on a resin composition layer (width: 40 mm, length: 50 mm) provided on the support, by a vacuum laminator at a temperature of 80 ° C The conditions of the pressure lkgf/cm2 (9·8χ 104Pa) are laminated. Then, the support was peeled off, and the second aluminum foil was placed on the exposed resin composition layer, and laminated under the same conditions to prepare a test piece having a three-layer structure of an aluminum foil, a resin composition layer, and an aluminum foil. The test piece was heat-cured under the conditions of 1 1 and 3 Torr, and then cut into a rectangular test piece having a width of 10 mm and a length of 50 mm. The length of the test piece was measured based on the T-peel test method of IS K_6854. Adhesiveness. The test results described above are shown in Tables 1 and 2. ❹ -43- 201038659 Example 8 *—to e>u> » CO ο S pg to § to si' Ο (115.3) © (19.0) I - - 〇(18*2) os r~x OS CO Example i 7 ! •CO e><〇5 CO ο S <*> ci m «ο § \£> δ 1 1 Ο (102.5) @ (20.0) 〇(18.9) ! OS o (10900) Implementation Example 6 5 CO 0» <D r- u> CO ο 3 CO CQ δ s IO s Ί· @ (67.6) ◎ (21.7) II ! 〇'(15.$) <§ o (8730) Comparative Example 2 ri C9 〇><〇Γ-tr> CO 8 S C4 s LO o ▼- X (321) I ◎ (20.1) i_ I 〇I (1M) 1 ratio, example | <〇〇> ( D 2 CO 3 S CO s U> s O (255) I 0 I (18.6) X 1 (14.8) <1 1 Real, Example | CO a> Φ S eo SS CO CO 8 <〇s in 8 T — 0 (285) Ο (110) 〇(18.6) I ! 〇1 07.6) OS 〇(8850) Real r « CO 〇> cd 卜 U) to Ο S § to 〇1-» O (256) 1 o (18.0) 1- 0 1 (19.4) I_ @1 1 Example 3 w 〇><D Bu xei CO SS 兮, 8 ir> or· (226) I 〇(17.8) I_ I- ! 〇1 ( 19.0) @i 1 Example 2 «〇to 〇> cd r* » IO CO ο S 3 s u> o 0 (277) 1 I o (18.0) 1- 〇 (19.5) 1 Real, Example 5 C9 A CCk 09 ο S « ci § u> s Τ» 0 (292) Λ (221.0) © (202) I- 〇1 (19.7) 〇go (3810) NC3000 (70% by weight of MEK solution) δ ΰ ΥΧ 6954 (35 wt% solid solution) N-glycosylglycine IV Butyl sulfonium salt 1 -1 N-methyl horse uric acid 1-ethyl-3-methylimidazolium salt _____ ... ________1 1-ethyl-3-methylimidazole acetate salt 1 1-ethyl formate -3-methylimidazole gun salt 1 ΜΥ-24 1 1 2E4MZ Ο 1 1 jellyfish g cr SS j SG95S 1 1 1 s 0Q water vapor transmission (e/mz*24hr) water vapor transmission (g/m2. 24hr) Initial tensile shear bond strength (MPa) _ ti| r Adhesion retention rate (%) Minimum melt viscosity (poise) 40//m moisture permeability 560//ra moisture resistance! Low temperature hardening preservation Stability laminating processability -44- 201038659 [Table 2] Comparative Example 3 Comparative Example 4 Comparative Example 5 Epodon EXA-835LV 25 100 Epicot 828 100 Epicot 1001 25 PKHH (70% solid content MEK solution) 50 2PZ-CNS-PW 0.5 RikacidMH-700 90 90 1B2MZ 2 2 KBM403 1 MEK 200 40 "m moisture vapor transmission resistance (g/m*.24hr> X (1755) X (812) X (694) 56〇MmSi moisture vapor transmission (e/m2>24hr) X (523.4) X (342.9) X (338.0) Tensile shear bond strength (MPa) at the initial stage of low-temperature hardening X (15.3) ◎ (19.1) ◎ (19.3) Tensile chevron bonding after 24 hours of storage stability Strength (MPa) X (14.8) X (17.4) X (18.5) Bond retention (%) 〇 (97) 〇 (91) 〇 (96) 加工 layer processing minimum melting viscosity (poise) 〇 (3000) - -

[表3] 實施例9 實施例10 實施例11 PBA328 30 30 30 GOT 10 10 10 U-CAT3502T 3 3 3 KBM-403 1 1 1 HP7200H 60 60 60 YL7213 (35wt%固成分之MEK溶液) 60 60 60 燒成白雲石漿料 個成分40wt%) 37.5 37.5 37.5 硬脂酸 0.6 0.6 0.6 D-600分級漿料 個成分30wt%) 50 33 17 N-乙醯基甘胺酸四丁基鳞鹽 3 3 3 與基材之黏合性(N/cm) 3.5 2.4 1.3 -45- 201038659 由實施例與比較例之對比可知,本發明之樹 ,在1 20°C之低溫下、以短時間進行硬化,以高 度予以黏合,可得安定的黏合性,且硬化物具有 分的低透濕性。而且,由實施例9〜1 1可知,藉 機塡充材料,提高與基材之密接性。由此可知, EL元件之封閉,更爲有用。因此,本發明之樹 及使用它之樹脂組成物薄片,可適合使用作爲使 熱惡化且必須具有防濕之各種裝置或其構成要素 材料、黏合劑、封閉材料等,可簡單地形成具有 之高信賴性的被覆構造、黏合構造、封閉構造等 適合提供有機EL顯示裝置。 〔產業上之利用價値〕 本發明之樹脂組成物,由於在低溫下迅速硬 成優異的黏合性與低的透濕性之硬化物,除有機 之封閉用途外,例如可適合使用於平面面板用之 、印刷電路板之防濕保護薄膜、鋰離子電池之防 包裝用積層薄膜等之用途。 本發明係以日本申請的特願2009-0 1 3 684 2009-013686號爲基礎,此等之內容皆全部包含 書中。 【圖式簡單說明】 脂組成物 的黏合強 實用上充 由含有無 藉由有機 脂組成物 用於容易 等之被覆 高防濕性 。特別是 化,可形 EL元件 封閉樹脂 濕薄膜、 號及特願 於本說明 -46- 201038659 [第1圖]第1圖係有機EL元件之全面封閉構造的典 型截面圖。 [第2圖]第2圖係在實施例及比較例之評估試驗中使 用的試驗片之製作步驟的典型圖。 [第3圖]第3圖係在實施例及比較例之評估試驗中提 供給拉伸試驗之試料(2張試驗片之貼合物)的典型圖。 [第4圖]第4圖係有機EL元件之罐封閉構造之典型 截面圖。 【主要元件符號說明】 1、4 :玻璃基板 2 :有機EL元件 3 :吸濕材料 5 :封閉材料 6 :硬化性樹脂組成物層(硬化層) 7 :封閉基材 1 1 :軟鋼板 1 2 :樹脂組成物薄片 1 2 A :樹脂組成物層 12B : PET 薄膜 1 3 :試驗片 -47-[Table 3] Example 9 Example 10 Example 11 PBA328 30 30 30 GOT 10 10 10 U-CAT3502T 3 3 3 KBM-403 1 1 1 HP7200H 60 60 60 YL7213 (35 wt% solid content MEK solution) 60 60 60 Burned dolomite slurry component 40wt%) 37.5 37.5 37.5 Stearic acid 0.6 0.6 0.6 D-600 graded slurry component 30wt%) 50 33 17 N-acetamidoglycine tetrabutyl quaternary salt 3 3 3 Adhesion to substrate (N/cm) 3.5 2.4 1.3 -45- 201038659 It can be seen from the comparison between the examples and the comparative examples that the tree of the present invention is hardened at a low temperature of 1200 ° C for a short time to a height. When it is bonded, it has a stable adhesiveness, and the hardened material has a low moisture permeability. Further, from Examples 9 to 11, it is known that the adhesive material is borrowed to improve the adhesion to the substrate. It can be seen that the sealing of the EL element is more useful. Therefore, the tree of the present invention and the resin composition sheet using the same can be suitably used as a device for preventing deterioration of heat and having moisture resistance, a constituent material thereof, a binder, a sealing material, and the like, and can be easily formed to have a high height. An organic EL display device is suitably provided for a reliable coating structure, a bonding structure, a closed structure, and the like. [Industrial use price] The resin composition of the present invention is a cured product which is rapidly hardened to have excellent adhesion at low temperature and low moisture permeability, and can be suitably used for flat panels, for example, in addition to organic sealing applications. The use of a moisture-proof protective film for a printed circuit board or a laminated film for anti-packaging of a lithium ion battery. The present invention is based on Japanese Patent Application No. 2009-0 1 3 684 2009-013686, the entire contents of which are incorporated herein by reference. [Simple description of the figure] The adhesion of the lipid composition is practically high. It is contained in the coating which is easy to be coated by the organic fat composition and is highly moisture-proof. In particular, the shape of the EL element, the sealing resin, the wet film, the number and the purpose of this description -46- 201038659 [Fig. 1] Fig. 1 is a typical cross-sectional view of the overall closed structure of the organic EL element. [Fig. 2] Fig. 2 is a typical view showing the steps of producing the test piece used in the evaluation tests of the examples and the comparative examples. [Fig. 3] Fig. 3 is a typical view of a sample (a laminate of two test pieces) which was supplied to a tensile test in the evaluation tests of the examples and the comparative examples. [Fig. 4] Fig. 4 is a typical cross-sectional view showing a closed structure of a can of an organic EL element. [Explanation of main component symbols] 1, 4: Glass substrate 2: Organic EL element 3: moisture absorbing material 5: sealing material 6: hardening resin composition layer (hardened layer) 7: closed substrate 1 1 : soft steel plate 1 2 : Resin composition sheet 1 2 A : Resin composition layer 12B : PET film 1 3 : Test piece - 47-

Claims (1)

201038659 七、申請專利範圍: 1· 一種樹脂組成物,其特徵爲含有環氧樹脂及離子 液體。 2. 如申請專利範圍第1項之樹脂組成物,其中離子 液體係由銨系陽離子或鳞系陽離子、與N-醯基胺基酸離 子或殘酸系陰離子構成。 3. 如申請專利範圍第1或2項之樹脂組成物,其中 更含有吸濕性金屬氧化物。 4 ·如申請專利範圍第1〜3項中任一項之樹脂組成物 ,其中更含有無機塡充材料。 5- 一種樹脂組成物薄片,其特徵爲在支持體上形成 申請專利範圍第1〜4項中任一項之樹脂組成物的層所形 成。 6. 如申請專利範圍第5項之樹脂組成物薄片,其係 有機EL元件封閉用。 7. —種有機EL裝置,其特徵爲使用申請專利範圍第 6項之有機EL元件封閉用樹脂組成物薄片所形成。 -48-201038659 VII. Patent application scope: 1. A resin composition characterized by containing an epoxy resin and an ionic liquid. 2. The resin composition according to claim 1, wherein the ionic liquid system is composed of an ammonium cation or a squamous cation, and an N-decylamino acid ion or a residual acid anion. 3. The resin composition of claim 1 or 2, which further comprises a hygroscopic metal oxide. The resin composition according to any one of claims 1 to 3, which further comprises an inorganic chelating material. A resin composition sheet which is formed by forming a layer of a resin composition according to any one of claims 1 to 4 on a support. 6. A sheet of a resin composition according to item 5 of the patent application, which is used for sealing an organic EL element. 7. An organic EL device characterized by using a sheet of a resin composition for sealing an organic EL element of claim 6 of the patent application. -48-
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