TW200827963A - An interface for operating and monitoring abatement systems - Google Patents

Abstract

Method and systems are provided for monitoring and controlling one or more abatement systems. One or more abatement systems may be represented on a display alone with one or more effluent flows from processing tools. A selected effluent flow configuration is received. An interface manifold is controlled to implement the selected effluent flow configuration. Numerous other aspects are provided.

Description

200827963 IX. Department of the Invention: Field of the Invention The present invention relates to a method and system for manufacturing a semiconductor device. More specifically, with respect to the use of η ι prior art] from the fabrication of semiconductor materials, components, products, and memory articles, the various compounds included in the process equipment and produced include inorganic and organic compounds, The photoresist and its decomposition products, as well as various other gases, must be removed from the exhaust gas before it is placed in the atmosphere via the process. Various compounds are used in the semiconductor manufacturing process, and many of them have extremely low human tolerance levels. Some of the tools used in rU technology (such as physical vapor deposition, diffusion, etching PFC processes, ' )) (such as chemical vapor deposition chambers, chemical vapor deposition chambers, diffusion chambers, etc.) and processes may produce unwanted By-products such as perfluorocompounds (PFCs) or by-products of Cs. P F C s has been identified as causing a greenhouse effect 藉 By a weakening system, these unwanted by-products can be removed from the stream & The gas meter generated by the substrate and the flat panel display / LCD process is converted into a form that has less impact on the environment and is discharged. The abatement system can be lightly coupled to the semiconductor process tool and is typically extensible to attenuate process gases from the tool. According to this, still waiting

He came to combine and he tried to prepare a process for the production of a stupid crystal machine, which was solved by a large amount of material, and the environment was developed in the gas. 5 200827963 An interface was used to operate and monitor the weakening system. SUMMARY OF THE INVENTION In one aspect of the invention, a method of monitoring and controlling one or more attenuation systems is provided. The method comprises the steps of (1) presenting one or more attenuation systems on a display; (2) presenting one or more effluent streams from the process tool on the display; (3) presenting a plurality of effluent streams on the display Selection of an effluent stream configuration; (4) receiving a selected effluent stream configuration; and (5) controlling an interface manifold to perform the selected effluent stream configuration. In another aspect of the invention, a method of monitoring and controlling one or more attenuation systems is provided. The method comprises the steps of (1) presenting one or more abatement systems on a display; (2) presenting one or more effluent streams from the process tool on the display; (3) accepting a selection, the selection Instructing an alternate outflow logistics configuration, wherein the first subset of the one or more attenuation systems is selected as a primary attenuation system and the second subset of the one or more attenuation systems is selected as a a standby abatement system; (4) introducing the one or more effluent streams into the one or more primary abatement systems; (5) setting one or more of the abatement systems to be in a standby mode; and (6) configuring an interface disparity And re-importing the effluent stream from the one or more primary abatement systems to the one or more alternate abatement systems in accordance with a state of the primary abatement system. In yet another aspect of the present invention, a method of monitoring and controlling one or more attenuation systems is provided, the method comprising the steps of (1) presenting one or more attenuation systems on a display; (2) on the display Presenting one or more outflow streams from the process tool; (3) accepting a selection indicating a redundant 6200827963 remaining outflow configuration, wherein the at least one first abatement system of the one or more attenuation systems, Receiving one or more effluent streams from the process tool, and at least one second abatement system of the one or more abatement systems, receiving one or more effluent streams from the process tool; and (4) An interface manifold is configured to re-introduce the one or more effluent streams from the disconnection abatement system into an operational abatement system in accordance with a disconnection attenuating system condition.

In another aspect of the invention, a method of monitoring and controlling one or more attenuation systems is provided. The method comprises (1) presenting one or more attenuation systems on a display; (2) presenting one or more effluent streams from the process tool on the display; (3) accepting a selection, the selection is indicative a load balancing effluent stream configuration; and (4) configuring an interface manifold to direct the effluent stream to the one or more abatement systems in accordance with at least one efficiency criterion. In yet another aspect of the invention, a method of monitoring and controlling one or more attenuation systems is provided. The method comprises (1) presenting one or more attenuation systems on a display; (2) presenting one or more effluent streams from the process tool on the display; (3) accepting a selection, the selection is indicative a specific application effluent stream configuration; (4) configuring an interface manifold to direct a first effluent stream to a first abatement system, wherein the first effluent stream is from a first process; and (5) configuring An interface manifold for introducing a second effluent stream into a second abatement system, wherein the second effluent stream is from a second process. Further features and aspects of the present invention will become apparent from the Detailed Description, the appended claims and appended claims. 7 200827963 [Embodiment] The present invention provides a system and method for monitoring and controlling one or more abatement systems to integrate the attenuating system into a single integrated system. The present invention is capable of automatically monitoring, tracking, and operating the abatement system and the effluent stream from the electronic component process tool to the weakened system. For example, in a system with two operational abatement systems, the operator can review the effluent flowing into each of the abatement systems via a software interface to a system controller and decide that only one of the abatement systems is to be These effluent streams are accommodated. Thereafter, the operator can use the interface to input the appropriate transitions into the system to set the second abatement system to the standby mode, while the effluent originally flowing into the second abatement system is directed to the first abatement system. In addition, the system controller can be constructed to automatically use the abatement system, for example, in the most efficient manner. In some embodiments, the present invention enables an operator to direct an effluent stream to an abatement system via an interface manifold, which may include a series of electronically controlled valves for opening, closing, and/or switching one or A channel between a plurality of electronic component processing tools and one or more abatement systems. The interface manifold can be coupled to a controller and operated by a controller for receiving messages from the interface manifold, the operator, the process tool, and the abatement system. In some embodiments, the operator can review the messages and then communicate the instructions to the interface manifold via the controller. In addition, the controller can automatically operate the interface manifold based on messages received from interface manifolds, operators, process tools, and abatement systems. The system controller allows for easy selection and execution of effluent flow configurations that have been preset or set by the operator. For example, the default outbound logistics configuration 8 200827963 can include alternate configurations, redundant configurations, load balancing configurations, and application specific configurations. These flow configuration types are detailed below. Referring to Figure 1, a schematic diagram of a user interface 100 is shown. The user interface can be executed by a standard personal computer (PC) using a standard operating system. In addition, a user interface can be implemented on the controller, which is disclosed in U.S. Patent Application Serial No. 60/82, filed on Jan. 23, the entire disclosure of (ABATEMENT SYSTEM WITH BACK-UP FUNCTIONALITY AND METHOD OF USING THE SAME)" (Attorney Docket No. 1 1 469), the entire disclosure of which is incorporated herein by reference. The user interface 100, on the display 104, may include images of one or more selectively interacting attenuation systems 102. Here, three attenuation systems 102 are shown, however this is for illustrative purposes only and can show any number of attenuation systems 102 detected. Each attenuating system can have a specific (e. g., static) IP address and can be connected via a hub to a single integrated system such as a personal computer or server. The user interface 1 〇 〇 may also contain images of one or more effluent streams 1 〇 6 that may be applied to each abatement system 102. For example, the effluent stream configuration can include a standby effluent stream configuration, a specific application effluent stream configuration, a load balance effluent stream configuration, a redundant settling stream configuration, and a user set effluent stream configuration. The effluent configuration 106 applied to the attenuating system 102A-C shown may be otherwise marked or indicated. The effluent configuration will be described in more detail below. The operator (not shown) can be remotely installed using the user interface 100.

Each of the abatement systems 102' in the process system is systemically coupled. The operator can monitor and track the per-attenuation system 1〇2, the number (as shown in Figure 2) can also operate parameters. In some embodiments: The operator selects the first weakening system 102, and the display will display a specific message about the system 102A, as shown in FIG. Referring to Fig. 2, the schematic diagram of the display 2 is shown in Fig. 2, and the first weakening system 1〇8 selected in Fig. i is shown. L

Ci 200827963 No, the attenuation system 202A is presented graphically. You can also use the complex presentation method. Several parameters related to the weakening system 2〇2A can be displayed 2〇4. The parameter message 204 can include, for example, a weak system 2〇2a per-input pressure, a CDA flow rate, a fuel flow rate, a bath temperature, a pressure at each inlet, a tank level, a scrubber exhaust pressure, and the like. The operator selectively operates several parameters to change the function of the weakening system 2〇2A. Display 200 can also include an alarm indicator 2〇6. With the optional indicator 206, the operator can view all alarms and warnings associated with the selected attenuating system 2〇2A. The operator can view the alarm depending on the type (eg alarm, alarm. or according to the attenuation system 2 0 2 A. The operator can also view the alarm history of the weakened system 2 0 2 A. Alarms, warnings or other related information can be stored locally The PC (for example, in the form of a text file) is automatically stored in the server or controller. The display 200 can also include a trend indicator 208. By selecting the trend 2 0 8, the operator can view the attenuation system 2 0 2 A. Historical trends. It is stated that there are similar values from the sensors located in the attenuation system 102A-C (202A-C?), which can be recorded at a specific rate. The operator can choose to use the same reference separately, if the indicator is weakened The strength of his message mouth can be selected from police related, etc.) Specify the event - the feeling of the remote example

200827963 Detector, and adjust the range of the sensor minimum and maximum, for example, the trend is drawn into a trend display. In addition, the data of each weakening system 202A may be a comma separated value file (eg, CSV, etc.), which may be coupled to other tools coupled to the system (eg, Excel file, etc., refer to FIG. 3, which is illustrated A flowchart for monitoring and controlling one of the one or more system examples. In step S100, one or more attenuation systems are presented thereon. In step S102, one or more slaves are presented An effluent stream from the process tool. In addition, one or more channels are present on the display for communicating one or more streams to one or more abatement systems. Several outflows are present on the display in step S104. Selection of logistics configuration. The outbound logistics is provided with a user setting configuration, a standby configuration, a redundant configuration, a balanced configuration, and a specific application outflow logistics configuration. Thereafter, in 4, a selection indicating the outflow logistics configuration is received. Alternatively, the presenter presents one or more channels for delivering one or more effluent streams to one or more systems, thereby reflecting the selected effluent stream in step S108, with control Several valves in the interface manifold, selected effluent flow configuration. Referring to Figure 4, there is shown a flow chart for an example method for monitoring and controlling one or more systems. In step S200, One or more attenuation systems are presented thereon. In step S202, one or more effluent streams from the process tool are presented thereon. In addition, one or more channels are presented on the display, the channels being used to Compatible with a letter format. Attenuated display monitors are available in multiple streams, and can be packaged in a single load. The L S106 can be configured in a weakened configuration. To perform a reduced display display, the flow can be sent to one or more abatement systems in multiple streams 11 200827963. In step S204, a selection is received indicating an alternate outflow configuration. One or more abatement systems are selected as the primary abatement system, and one or more abatement systems are selected as the backup abatement system. One or more weakening systems can be selected as primary or backup systems based on a number of parameters. These primary and alternate abatement systems can also be presented on the display. Alternatively, one or more channels for delivering one or more effluent streams to one or more abatement systems may be presented on the display to reflect the selected effluent stream configuration. In step S206, one or more effluent streams are directed to one or more primary abatement systems. In step S 2 0 8 , one or more standby weakening systems are set to the standby mode. Thereafter, in step S2 1 0, an interface manifold is configured to reintroduce the effluent stream from one or more primary abatement systems to one or more spare abatement systems depending on the state of the primary abatement system. The foregoing state may indicate that the primary weakening system has been disconnected. It is also possible to present the updated status of the primary and the abatement system on the display. Referring to Figure 5, there is shown a flow chart of an exemplary method for monitoring and controlling one or more of the attenuation systems. In step S300, one or more attenuation systems are presented on the display. In step S302, one or more effluent streams from the process tool are presented on the display. In addition, one or more channels may be presented on the display for communicating one or more outgoing streams to one or more abatement systems. In step S 3 04, the selection indicating the redundant outflow logistics configuration is accepted. Alternatively, one or more channels for delivering one or more effluent streams to one or more abatement systems may be presented on the display to reflect the selected effluent stream configuration. At least one first abatement system of the one or more attenuation systems receives one or more effluent streams from the process tool 12 200827963, and at least one second abatement system of the one or more attenuation systems receives the slave process tool One or more effluent streams coming. At least one of the first or second attenuation systems can be broken. The updated state of the system and the weakened system in the operation can be presented on the display. In step S306, an interface manifold is configured to re-introduce one or more effluent streams from a disconnection abatement system into an operational abatement system in accordance with the state of the disconnection abatement system.

Referring to Figure 6, a flow diagram of an exemplary method for monitoring and controlling one or more of the attenuation systems is shown. In step S400, one or more attenuation systems are presented on the display. In step S402, one or more effluent streams from the process tool are presented on the display. In addition, one or more channels may be presented on the display for communicating one or more outgoing streams to one or more abatement systems. In step S404, a selection is received indicating the load balancing outflow configuration. Alternatively, one or more channels for delivering one or more effluent streams to one or more of the abatement systems may be presented on the display to reflect the selected effluent stream configuration. Thereafter, in step S106, an interface manifold is configured to introduce the effluent stream into one or more abatement systems in accordance with efficiency criteria. Each abatement system may have an associated operating cost, and the efficiency criteria may include, for example, a minimum cost of attenuating a particular effluent stream, a minimum amount of material that reduces a particular effluent stream, and a minimum time to a particular effluent stream. One or more abatement systems can be presented on the display for receiving the effluent stream. Referring to Figure 7, a flow diagram of an exemplary method for monitoring and controlling one or more of the attenuation systems is shown. In step S5 00, one or more attenuation systems are presented on display 13 200827963. In step S502, one or more effluent streams from the process tool are presented. In addition, one or more channels are presented on the display for communicating one or more streams to one or more abatement systems. In step S504, a selection of a particular application effluent configuration is indicated. The interface manifold is configured in step S506 to direct the first effluent stream to a first weakening system. The first effluent stream is from the first process. Thereafter, the interface manifold is configured in step S508 to introduce the second effluent stream into a second weakening system and the second effluent stream is from the second process. The first and second processes may be similar or different. For example, the first process can be a substrate manufacturing process, and the second process can be a process chamber cleaning process. Alternatively, the display can be used to deliver one or more effluent streams to one or more abatement systems or channels, thereby reflecting the selected effluent stream configuration. The foregoing merely discloses examples of the invention. Any skilled artisan will readily appreciate modifications of the systems and methods that fall within the scope of the invention. In an embodiment, the system and method of the present invention is applicable to semiconductor component and/or electronic component processing. Accordingly, the present invention has been described by way of example only, and the scope of the present invention is defined by the scope of the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic diagram showing a system for controlling one or more attenuation systems in accordance with an embodiment of the present invention. The indicator can be used in stream reception. Medium, unified. For the sake of the above, a further partial process is further monitored. 14 200827963 FIG. 2 is a schematic diagram of a system for monitoring and controlling one or more attenuation systems in accordance with an embodiment of the present invention. 3 is a flow chart showing an exemplary method for monitoring and controlling one or more attenuation systems in accordance with an embodiment of the present invention. 4 is a flow chart showing an exemplary method for monitoring and controlling one or more attenuation systems in accordance with an embodiment of the present invention. Figure 5 is a flow chart showing an exemplary method for monitoring and controlling one or more attenuation systems in accordance with an embodiment of the present invention. Figure 6 is a flow chart showing an exemplary method for monitoring and controlling one or more attenuation systems in accordance with an embodiment of the present invention. Figure 7 is a flow chart showing an exemplary method for monitoring and controlling one or more attenuation systems in accordance with an embodiment of the present invention. [Main Component Symbol Description] 100 User Interface 102 Attenuation System 104 Display 106 Outflow Logistics Configuration 200 Display 202A Attenuation System 204 Parameter Message 206 Alarm Indicator 208 Trend Indicator S100 Step S102 Step S 1 04 Step S106 Step S 1 0 8 Step S200 Step S202 Step S204 Step S206 Step S208 Step S210 Step 15 200827963 S300 Step S3 02 Step S304 Step S306 Step S400 Step S402 Step S404 Step S406 Step S 5 0 0 Step S502 Step S504 Step S 5 0 6 Step S508 Step

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Claims (1)

200827963 X. Patent Application Range: 1 - A method of monitoring and controlling one or more attenuation systems, comprising at least: presenting one or more attenuation systems on a display; presenting a display from the process tool on the display Or a plurality of effluent streams, β presenting a plurality of effluent stream configurations on the display; ^ receiving a selected effluent stream configuration; and controlling an interface manifold to perform the selected effluent stream configuration. 2. The method of claim 1, wherein the interface manifold comprises a plurality of valves to perform the selected effluent configuration. 3 - The method of claim 1, further comprising: presenting one or more channels on the display for communicating the one or more effluent streams to the one or more abatement systems . 4. The method of claim 3, further comprising: presenting one or more channels on the display for transmitting the one or more effluent streams to the one or more attenuations System to reflect the selected outflow logistics configuration. 5. The method of claim 1, wherein the selected effluent configuration is set by a user. The method of claim 1, wherein the selected effluent stream is configured as at least one of a standby configuration, a redundant configuration, a load balancing configuration, and a specific application configuration. 7. A method of monitoring and controlling one or more attenuation systems, at least comprising: f, presenting one or more attenuation systems on a display; presenting one or more from the process tool on the display An outflow stream; accepting a selection indicating a standby outflow configuration, wherein the first subset of the one or more attenuation systems is selected as a primary abatement system, and one of the one or more attenuation systems The second subset is selected as a backup weakening system; the one or more effluent streams are directed to the one or more primary abatement systems; I) the one or more standby abatement systems are set to a standby mode; and an interface is configured A manifold for reintroducing the effluent stream from the one or more primary abatement systems to the one or more alternate abatement systems in accordance with a state of the primary abatement system. 8. The method of claim 7, further comprising: receiving a state of the one or more primary abatement systems, the one or more abatement systems being disconnected. The method of claim 8, further comprising: presenting, on the display, an update status of the one or more primary and active abatement systems. 10. The method of claim 7, wherein the one or more abatement systems are selected as the primary or backup system, depending on one or more parameters. 11. The method of claim 7, further comprising: presenting the one or more attenuation systems selected as the primary attenuation system on the display, and the one or more attenuation systems selected as the backup attenuation system . 1 2. The method of claim 7, further comprising: presenting one or more channels on the display for transmitting the one or more effluent streams to the one or more attenuations system. (J1 3. The method of claim 12, further comprising: presenting the one or more channels on the display, the channel is for transmitting the one or more effluent streams to the One or more abatement systems to reflect the selected alternate outflow logistics configuration. 1 4. A method of monitoring and controlling one or more abatement systems, comprising at least: 19 200827963 presenting one or more on a display Attenuating system; presenting one or more effluent streams from the process tool on the display; accepting a selection indicating a redundant effluent configuration, wherein at least one of the one or more mitigation systems Attenuating the system by receiving one or more effluent streams from the process tool, and wherein the at least one second abatement system of the one or more abatement systems receives one or more effluent streams from the process tool; An interface manifold for re-introducing the one or more effluent streams from the disconnection abatement system to an abatement system in operation in accordance with a disconnection attenuating system state. The method of claim 14, further comprising: receiving a state indicating that at least one of the first or second attenuating systems is disconnected. 1 6 · as claimed in claim 15 The method further includes: presenting, on the display, an update status of the one or more operations or a disconnection abatement system. 17. The method of claim 14, further comprising: on the display Presenting the one or more channels for conveying the one or more effluent streams to the one or more abatement systems. 20 200827963 1 8. The method of claim 17, wherein The method includes: presenting the one or more channels on the display for communicating the one or more effluent streams to the one or more abatement systems to reflect the selected alternate effluent stream configuration. 9. A method of monitoring and controlling one or more attenuation systems, comprising: presenting one or more attenuation systems on a display; presenting one or more effluent streams from a process tool on the display; Accepting a selection indicating a load balancing effluent configuration; and configuring an interface manifold to direct the one or more effluent streams to the one or more abatement systems in accordance with at least one efficiency criterion. The method of claim 19, further comprising: presenting the one or more channels on the display, the channel for transmitting the one or more effluent streams to the one or more Attenuate the system. 21. The method of claim 19, further comprising: presenting the selected load balancing effluent stream configuration on the display. 22. The method of claim 19, wherein each of the reduced systems has an associated operating cost, and wherein the efficiency criterion includes a minimum cost of one of the specific ones of the effluent streams. 23. The method of claim 19, wherein each of the reduced systems has an associated operating cost, and wherein the efficiency criterion includes a minimum amount of material that reduces a particular effluent stream. 24. The method of claim 19, wherein each of the reduced systems has an associated operating cost, and wherein the efficiency criterion includes a minimum time to reduce a particular outflow. </ RTI> A method of monitoring and controlling one or more attenuation systems, comprising: presenting one or more attenuation systems on a display; presenting one or more effluent streams from the process tool on the display Accepting a selection indicating a particular application effluent configuration; configuring an interface manifold to direct a first effluent stream to a first abatement system, wherein the first effluent stream is from a first process And configuring an interface manifold to direct a second effluent stream to a second abatement system, wherein the second effluent stream is from a second process. 2. The method of claim 25, further comprising: presenting the one or more channels on the display, the channel for transmitting the one or more effluent streams to the one or more Attenuate the system. The method of claim 26, further comprising: presenting the one or more channels on the display, the channel for transmitting the one or more effluent streams to the one or more The system is attenuated to reflect the selected specific application outflow logistics configuration. 28. The method of claim 25, wherein the first process is different from the second process. 29. The method of claim 25, wherein the first process is a manufacturing process and the second process is a cleaning process. twenty three