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TW200815799A - Black matrix compositions and methods of forming the same - Google Patents

Black matrix compositions and methods of forming the same Download PDF

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Publication number
TW200815799A
TW200815799A TW96120400A TW96120400A TW200815799A TW 200815799 A TW200815799 A TW 200815799A TW 96120400 A TW96120400 A TW 96120400A TW 96120400 A TW96120400 A TW 96120400A TW 200815799 A TW200815799 A TW 200815799A
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TW
Taiwan
Prior art keywords
black matrix
matrix component
polymerizable
quot
polar
Prior art date
Application number
TW96120400A
Other languages
Chinese (zh)
Inventor
Quanyuan Shang
Liqui Zhou
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/521,577 external-priority patent/US20070065571A1/en
Priority claimed from US11/733,665 external-priority patent/US20080026302A1/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW200815799A publication Critical patent/TW200815799A/en

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0046Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)

Abstract

Black matrix compositions, methods for forming a black matrix, and apparatus for use in forming a color filter for a flat-panel display are disclosed. The compositions, methods and apparatus use an additive including polymerizable molecules, the polymerizable molecules each including polar portions and non-polar portions. The non-polar portions are ink-phobic and migrate toward the surface of the black matrix composition upon the surface being exposed to activation energy. The polar portions of the polymerizable molecules are ink-philic relative to the non-polar portions. Numerous other features are disclosed.

Description

200815799 九、發明說明: 【發明所屬之技術領域】 ^主要關於平板顯示器,更尤其關於用於平板鏵 示器的黑變修,及麵 .... ... ... . ·: ... ' .. .. 【先前技術】 ,::,示器産業—直試圖採用喷墨列印製造顯示· 一 /、疋氣1^ 1色濾光片。有效採用噴墨列印的問題之 將墨或其他材料精確及準確地噴射到基板上, 並同時具有高産量。 準確地落入基板上的查一二 下,例如,墨滴可能不敍 古土、具素井(pixel well)内。因此仍需要_ 種方法和裝置,以拚笑W ^ 1 γ 。利用高産量的噴墨列印所製造的# 【發明内容】 在本發月的某些態樣中,提供一種用於形成平板顯 # ^ ^ ^ ^ ^ ^ , ^ f ^ ^ ^ ^ ^ ^ ^ ^ 聚合分子的添加劑,| ^ 7 ^ 母個可聚合分子均包括極性部分和 極性部分〇非極Μ卹八曰丄 性0Ρ分具有疏墨性(ink-phobic),並在 ^ ^ ^ 81 5 ^ ^ ^ ^ # ^ ^ 6¾ ^ ® it # 〇 T ^ 刀子的極丨生„ρ分相對於非極性部分具有親墨 UnbphUiO。當料形❹素矩料,其産生的結果 形成具有疏墨頂表面和親墨側壁表面的結構/ 6 200815799 在本發明的其他態樣 t ^ ^ 器之彩色濾光片的裝置,該裝置包括基板,以及在該基板· 上形成的黑矩陣成分的層。黑矩陣成分包括含有可聚合分 子的添加劑,每锻可聚合分子都包括極性部分私 刀。非極性部分具有疏墨性,並在表面暴露於活化能時, - . . - . 1 會向黑矩陣成分的表面遷移。可聚合分子的極性部分相對 於非極性部分具有親墨性。 在本發明的又一態樣中’提供一種形成平板顯示器之 彩色濾光片的方法。該方法包括形成含有可聚合分子的零 矩陣成分,每個可聚合分子都包括極性部分和非極性部 分;提供基板;在基板上形成黑矩陣成分的層;以及對基 板上的黑矩陣成分施加活化能、非極性部分係呈疏墨性, 且將活化能施加到黑矩陣成分的表面時,非極性部分會向 黑矩陣成分的表面遷移Λ可聚合分子的極性部分相對於非 極性部分呈親墨性。200815799 IX. Description of the invention: [Technical field to which the invention pertains] ^ Mainly concerned with flat panel displays, more particularly with respect to black variations for flat panel displays, and ..... ...::.. . . . . . [Previous Technology], :::, the industry of the display - directly trying to use inkjet printing to produce a display · a /, Xenon 1 ^ 1 color filter. The problem of effective ink jet printing is to accurately and accurately eject ink or other materials onto a substrate while achieving high throughput. Accurately falling into the substrate, for example, the ink droplets may not be described in the ancient soil, the pixel well. Therefore, there is still a need for methods and devices to tease W ^ 1 γ. Manufactured by high-yield inkjet printing # [Summary of the Invention] In some aspects of the present month, a method for forming a flat panel is displayed. ^ ^ ^ ^ ^ ^ , ^ f ^ ^ ^ ^ ^ ^ ^ ^ Additives for Polymeric Molecules, | ^ 7 ^ The parent polymerizable molecules include both polar and polar moieties. Non-polar entanglement 曰丄 曰丄 Ρ Ρ 具有 具有 具有 具有 具有 具有 具有 具有 具有 具有 具有 具有 具有 具有5 ^ ^ ^ ^ # ^ ^ 63⁄4 ^ ® it # 〇T ^ The extreme 丨 of the knife „ρ 分 has a ink-replenishing UnbphUiO with respect to the non-polar part. Structure of top surface and ink-retaining sidewall surface / 6 200815799 In another aspect of the present invention, a device for a color filter comprising a substrate, and a layer of a black matrix component formed on the substrate. The black matrix component includes an additive containing a polymerizable molecule, each of which includes a polar portion of a private knife. The non-polar portion has ink repellency, and when the surface is exposed to activation energy, - . . . Surface migration of the component. The polar portion of the polymerizable molecule is relative to the non-polar portion In a further aspect of the invention, there is provided a method of forming a color filter for a flat panel display, the method comprising forming a zero matrix component comprising polymerizable molecules, each polymerizable molecule comprising a polar portion And a non-polar portion; providing a substrate; forming a layer of a black matrix component on the substrate; and applying an activation energy to the black matrix component on the substrate, the non-polar portion is ink repellent, and applying activation energy to the surface of the black matrix component When the non-polar portion migrates to the surface of the black matrix component, the polar portion of the polymerizable molecule is ink-receptive with respect to the non-polar portion.

【實施方式】[Embodiment]

峡卞板顯不益,而此彩色攄光片 材料)基板上的不同顏色墨水二 積,而此喷墨印表機則是適用於 200815799 ... . ..... . .... 將墨水和/或其他合適材料直接噴射到由畫素被陣(―般稱 為「黑矩陣」)所定義出的特定之查也a 舟 々旦素井中。在墨水沈積之 前,可使用微影或任意適宜製程在其始^ / 丄 ' '隹暴板上形成畫素井的黑 矩陣。 、 —. ....... . : ' . . : : \ 與液體接觸的材料具有對液體吸引或者排斥的反應 材料的成分、所對應的表面化學性質以及液體的化學^質 決定與液體的交互作用。這種現象蘊这细^ 貝 篆稱爲親水性(例如,類 似於對液態墨水的親墨性)和疏水料r μ, r性(例如,類似於對液 態墨水的疏墨性)。 親水性,也稱爲親水的,是展頻*祖r 展現出對水親和力的材料 收 衣甶上形成液 膜或者塗層。親水材料還具有高表面H 4 衣面張力值並具有與冰 成鍵合的能力、 疏水性,也稱爲疏水的,是相士 +细, 疋相比于親水材料對水具 相反的反應的材料特性。疏水材料>「命, ' 珂料(與水疏離」)具有 小或者沒有吸收水的趨勢,並且在夕桐从 匕椚的表面上水縐 「珠J狀(即,形成離散的液滴)〇跻★从』t )‘水材料具有低表面 力值,並在它們的表面化學物質中缺,b命u 貝甲缺,與水形成鍵合的 性基圈。 >i t f-i - # τ ^ # ^ ^ ^ ^ ^ 為基底)可以是「親性的」,而相對於该鱗 於液體(例如以油為基 水。表面化學性質允許這些材料潤濕在表面上形成液熊 赤本备麻。雜7k; (魏谨目女合丄 200815799 可以疋「啤性的」,或者反之亦然。在此使胳私 親墨性、疏水性以及疏墨性意指相對的術語,材料對於— 些墨水可以是疏墨的,而對於其他墨水可以是親墨的。 J。另The gorge board is not good, and the color stencil material) has different colors of ink on the substrate, and the inkjet printer is suitable for 200815799 ... . . . . . . And/or other suitable materials are injected directly into the specific wells defined by the pixel array ("commonly known as the "black matrix"). Prior to ink deposition, a black matrix of photographic wells may be formed on the turbulence plate using lithography or any suitable process. , — . . . : : . . : : : The material in contact with the liquid has the composition of the reactive material that attracts or repels the liquid, the corresponding surface chemistry, and the chemical properties of the liquid. Interaction. This phenomenon is known as hydrophilicity (for example, similar to ink affinity for liquid inks) and hydrophobic material r μ, r (for example, similar to ink repellency to liquid inks). Hydrophilic, also known as hydrophilic, is a film or coating formed on the crepe of a material that exhibits affinity for water. The hydrophilic material also has a high surface H 4 surface tension value and has the ability to bond with ice, hydrophobicity, also known as hydrophobic, is a phase + fine, 疋 is opposite to water in response to hydrophilic materials. Material properties. Hydrophobic material > "Life, 'thickness (with water)" has a tendency to absorb water or not, and in the sputum from the surface of the scorpion, the water is "bead J (ie, forming discrete droplets) 〇跻★From 』t)' Water materials have low surface force values and are lacking in their surface chemicals, b-deficient shellfish lacks, and forms a bond with water. >it fi - # τ ^ # ^ ^ ^ ^ ^ for the base) can be "parental", and relative to the scale in liquid (for example, oil-based water. Surface chemistry allows these materials to wet on the surface to form liquid bears Miscellaneous 7k; (Wei Jinmu female 丄200815799 can be "beer", or vice versa. Here the smothering, hydrophobicity and ink repellency means relative terms, materials for - some ink can It is ink-repellent, but it can be in-ink for other inks. J. Another

外’不此因爲材料是疏水性的就認爲該材料是疏墨的。二 樣,不能因爲材料是親水性的就認爲該材料是親墨的。因 此,例如,材料可以同時是疏水及親墨性的,或者同時是 親水或者疏墨的,因爲例如墨水可以油為基底或者水為茂 - :: …-:.:...: 潤濕性指的是材料表面性質特徽,其會對每一化合物 產生一個值。潤濕是當兩者接觸時,流體和表面之間的 觸狀態。當液體具有高表面張力值(強内部鍵合)時,它 將形成液滴,而具有低表面張力值的液體則會在較大區: 上鋪展開(與表面結合)。另一方品目 ' ) 万面,如果表面具有高表面 能(或者表面張力),液滴將伸展或者潤濕表面。如果表面 具有低表面能’則會形成液滴。該現象是介肩能最小化 結果。如果表面是高能量的,則希望由液體覆蓋,原因在 於該介面將降低其能量等等。利用特定液體,可藉由材料 的表面張力值確定材料的潤、;^性。通過測量固體表面和在 ^ ® ^ ^ ^ ^ 0 ^ ^ ^ ^ δ m ^ 〇 表面張力乃為分早六又〇>似 勹刀于力不千衡引起的力,其發生在當兩 種不同材料(例如,在固體砉 骽表面上的液滴)彼此接觸, 而形成介面或者邊界時。該力产 . 吁忑刀産生的原因在於為了回應在 9 200815799 • ; . · .... 接觸點處所發生的分子力的不平衡現,所有枒、 匁何枓都具有 減少其表面積的趨勢。該力的結果將隨著不同貧體和固體 的系統改變,其將控制液滴和表面之間的潤濕性和接觸 對於在固體表面上的特定液,「 沿著從固體接觸點正切至液滴半徑的線兩者之間形成的角 度測量值。接觸角與揚氏方程的表面張力相關,通過橋氏 方程可以計算特定的液-固交互作用的行爲/零度接觸角導 致潤濕,而在零度和九十度之間的角度導致液體的鑰展(由 於分子引力)。大於九十度的角度表示液體趨向水珠或者遠 離固體表面縮減。90。或者更大的接觸角通常代表著表面爲 非濕性的,而一個小於9〇。的角度意味著該表面是可濕性 的對水而δ ’可濕性表面還可稱爲親水性的,而非滿性 的表面可%爲疏水性的。同樣,對墨水而言,可濕性表面 還/ &爲親墨的’而非濕性表面還可稱爲疏墨的。超疏The outside is not considered to be ink-repellent because the material is hydrophobic. Similarly, the material cannot be considered to be ink-retained because the material is hydrophilic. Thus, for example, the material can be both hydrophobic and ink-receptive, or both hydrophilic or ink-repellent, since, for example, the ink can be oil-based or water---: ...-::::: wettability Refers to the surface properties of the material, which produces a value for each compound. Wetting is the state of contact between the fluid and the surface when the two are in contact. When the liquid has a high surface tension value (strong internal bonding), it will form droplets, while a liquid with a low surface tension value will expand in a larger area: the upper layer (combined with the surface). The other item, '), if the surface has high surface energy (or surface tension), the droplets will stretch or wet the surface. If the surface has a low surface energy, then droplets are formed. This phenomenon is the result of minimizing the gap. If the surface is high energy, it is desirable to cover it with liquid because the interface will reduce its energy and the like. With a specific liquid, the moisture content of the material can be determined by the surface tension value of the material. By measuring the surface of the solid and the surface tension at ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ δ m ^ 〇 is the force caused by the force of the 勹 〇 , , , , , , , , , Different materials (eg, droplets on the surface of a solid crucible) contact each other to form an interface or boundary. The reason for the production of the knives is that in order to respond to the imbalance of molecular forces occurring at the point of contact at 9 200815799, all 桠 and 匁 have a tendency to reduce their surface area. The result of this force will vary with the system of different poor and solids, which will control the wettability between the droplet and the surface and the contact with the specific liquid on the solid surface, "along from the solid point of contact to the liquid The angle measurement formed between the lines of the drop radius. The contact angle is related to the surface tension of the Young's equation, and the behavior of the specific liquid-solid interaction/zero contact angle can be calculated by the bridge equation to cause wetting. The angle between zero and ninety degrees results in a keying of the liquid (due to molecular attraction). Angles greater than ninety degrees indicate that the liquid tends to shrink toward or away from the solid surface. 90. Or larger contact angles usually represent the surface. Non-wet, and an angle of less than 9 意味着 means that the surface is wettable to water and δ 'wettable surface may also be referred to as hydrophilic, while non-full surface may be hydrophobic Similarly, for inks, the wettable surface is also / ink-repellent 'non-wet surface can also be called ink-repellent.

(superphobic)表面且 士 L 由具有大約150。的接觸角,一般表現爲 在液滴和表面之間不垃纽 ^ j不接觸。這種情況有時候稱爲「荷葉效 應(Lotus effect ),〇 > 土 J 在較大面積上鋪展開的屬性有時候稱 爲「潤濕效應」。 -. . . . . . .... . 由於基板和/或田+人 二, 用於形成黑矩陣义材料的親墨性/疏墨 性變化,造成沈積左蚤士 / ,, 在晝素井中的墨滴截面輪廓(例如,分 佈)對於形成彩色濟永口 务 愿先片而言,可能不是最隹的。在一些 情形下,晝素井内墨水的不均勻分佈可能導致彩色濾光片 10 200815799 t 1¾ ^ m ο • _ : · ·' · . - · . . ' . :-. ..... ·The (superphobic) surface has a diameter of about 150. The contact angle is generally expressed as no contact between the droplet and the surface. This condition is sometimes referred to as the "Lotus effect," > the property of the soil J spread over a large area is sometimes referred to as the "wetting effect." -. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . The cross-sectional profile (eg, distribution) of the ink droplets in the well may not be the most embarrassing for forming a color. In some cases, the uneven distribution of ink in the alizarin well may result in a color filter 10 200815799 t 13⁄4 ^ m ο • _ : · · ' · . . . . . . . .

. . ... --. :.. . ! . .、 ... . L 六知Ή i矩陣由包板 d t合單體或者低聚物或者A,人 L 光聚合單體、埶汲合(例如, 〜灰合早體等)、枯合劑樹脂、環氧美 溶劑。本發明之方土i 4基早體和 之方法和裝置所提供的黑矩陣成分, 一 步包括改善里拓陆、抑 又刀〔T進 …、矩陣潤濕性質的潤濕添加劑。例如,在一此 實施方式中,潤項浃上^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 二 添加劑可增加黑矩陣的頂平坦表面銪 * ^ ^ ^ ^ ^ ^ t ^ ^ ^ ^ ^ ^ ^ ( ; 黑矩_定義的每個畫素井之㈣ 一改變(例如,增加)親墨性)。該黑矩陣成分可喷 墨期間降低彩色墨水的混合,並改善每個㈣ 分佈:改㈣⑽ 不慎落在晝素矩陣頂表面上的墨水,將落入晝素井中,並 更佳地潤濕側壁^本發明的墨水其落入晝素井中並在晝素 井中展開的趨勢,降低了在分配墨水時對於印表機的準確 度或精確度的要求。 在一假或多個實施方式中,潤濕添加劑(wetting additive )可包括具有可聚合分子的任意材料,其中每個可 聚合分子均具有相對親墨極性部分和相對疏墨非極性部 分。例如,該材料可包括一個爽多個含疏水基的單體和/ 或低聚物’諸如氟丙稀酸S旨早體和/或低聚物、含砍基 (silicone· group-contained )丙烯酸酯單體和/或低聚物、 200815799 其他丙舞酸㈣ 合是在反應的軍錢_ 維網路結構或者聚合物鏈的製程。如一 适一步所述,可以 ^ ^ ^ 氧基單體,並藉由固化 (CM—)步驟㈣ 矩陣的頂表面處濃縮添加劑分子的疏墨端。在圖案I 可以形成具有疏墨極性畫素井(1 ο 相對于黑矩陣的頂平坦表面)畫素井側壁表面的黑矩陣 以下參照第1圖至第12圖,其描述本發明之黑矩陣」 分、形成黑矩陣成分的方法和製造黑矩陣的方法示例。」 如’第1圖係繪示根據本發明的實施例,在基板上製造】 矩陣的方法101。參照第)圖,在步驟1〇5中,可以形义 含有潤濕添加劑的黑矩陣成分。舉例而言,黑矩陣成分飞 包括潤濕添加劑,諸如含疏水基的單體或低聚物(例如 氣丙烯酸酯單體或低聚物、含石夕基的丙烯酸酯單體和7或4 聚物、其他丙烯礙酯單體和/或低聚物等)。 黑矩陣成分可包括其他成分諸如,例如顏料分散劑、 起始劑(例如,光起始劑)、聚合單體、粘合劑樹脂、溶負 所含的顏料分散劑係用於使顏料(例如,碳黑)分黄 在整個黑矩陣成分中。所含·的起始劑係用於幫助聚合反肩 (例如’光聚合反應、熱聚合反應或者其他可行反應)。功 可包括聚合單體(或低聚物)以聚合所述成分,從而形启 12 200815799 ' . ... , L -. .. . .·· . . * ·. . -:....- : _ - Γ , .',.-. . ' •… , . . ... y : ' -- . . . . .' . - ' ' - - · …-.L . . . : . ' r : '; ;. ' · ; ; I.. :' .. .: - . , : · ·. . ...- ...- / · ' ^ ' . . I .: ... .... ' :. . ...:. . . 1 .' . : :- ' ................. 入...... ---....: ... ·, - : ........ .- . ·. . : -V . . .... : . 黑矩陣。談分子的實施例包括丙缚酸酯單體/饭 .... ' . · ' _ . . · -- 體/低聚物等。可良 . ···'.' '* . : - . . ' ' . ’ 度和強度。談枯合劑樹鹿的:實施舛^ - · ' ..... . . '-.· - '.· - . 可包括溶劑以暫時降低成分的枯度(例如 r I ^ ^ ,. , ' -- · ..... ? . : . - . - : . · - - 醚醋酸酯(PGME A )或其他適宜的溶劑諸如有機溶劑1 _ 在至少部分實施方式中,黑矩陣成分可包含佔總成分 重量份約100 ppm到約10,000 ppm的潤濕添加劑(其包括 具有親墨極性部分和疏墨非極性部分的可聚合分子),而前 述之總成分係指在不包括溶劑的情形下。在部分實施例 中,潤濕添加劑的濃度可能較佳選在總成分(不含溶劑)的 重量份約500 ppm到5,000 ppm的範圍内。然雨,可採用 不同濃度範園的潤濕添加劑。另外的潤濕添力σ劑示例包括 由位於ΡΑ的Exton的Sartomer有限公司製造的一個或多. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . (for example, ~ ash, early body, etc.), dry resin, epoxy solvent. The black matrix component provided by the method and apparatus of the present invention and the method and apparatus of the present invention include, in one step, a wetting additive which improves the properties of the lining, the turret, and the wetting of the matrix. For example, in one embodiment, the addition of ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ two additives can increase the top flat surface of the black matrix 铕 * ^ ^ ^ ^ ^ ^ t ^ ^ ^ ^ ^ ^ ^ ^ ( ; black moment _ defined each pixel well (four) a change (for example, increase) ink affinity). The black matrix component can reduce the mixing of color inks during ink jetting and improve each (four) distribution: (4) (10) Inadvertently falling on the top surface of the halogen matrix, it will fall into the halogen well and better wet the sidewalls The tendency of the ink of the present invention to fall into a sapphire well and unfold in a sputum well reduces the accuracy or precision required for the printer when dispensing ink. In one or more embodiments, the wetting additive can comprise any material having a polymerizable molecule, wherein each polymerizable molecule has a relatively inotropic polar portion and a relatively ink-repellent non-polar portion. For example, the material may comprise a plurality of hydrophobic group-containing monomers and/or oligomers such as fluoropropionic acid S precursors and/or oligomers, silicone-group-contained acrylic acid. Ester monomers and / or oligomers, 200815799 Other prosthetic acid (IV) is in the process of reaction of military money - dimensional network structure or polymer chain process. As described in one step, the oleoyl group of the additive molecule can be concentrated at the top surface of the matrix by curing (CM-) step (iv). In the pattern I, a black matrix having a surface of the pixel surface of the ink-repellent polar pixel well (1 ο relative to the top flat surface of the black matrix) can be formed. Referring to FIGS. 1 to 12, the black matrix of the present invention will be described. A method of forming a black matrix component and an example of a method of manufacturing a black matrix. As shown in Fig. 1, a method 101 of fabricating a matrix on a substrate in accordance with an embodiment of the present invention is illustrated. Referring to the figure, in step 1〇5, a black matrix component containing a wetting additive can be defined. For example, the black matrix component fly includes a wetting additive such as a hydrophobic group-containing monomer or oligomer (eg, a gas acrylate monomer or oligomer, a sulphur-containing acrylate monomer, and 7 or 4 poly , other propylene ester ester monomers and / or oligomers, etc.). The black matrix component may include other components such as, for example, a pigment dispersant, a starter (for example, a photoinitiator), a polymerizable monomer, a binder resin, and a pigment dispersant contained in the solution for the pigment (for example, , carbon black) is divided into yellow throughout the black matrix composition. The initiators contained are used to aid in the polymerization of the reverse shoulders (e.g., 'photopolymerization, thermal polymerization, or other feasible reactions). The work may include polymerizing a monomer (or oligomer) to polymerize the component, thereby forming 12 200815799 ' . . , L - . . . . . . . . . . . . . . . - : _ - Γ , .',.-. . ' •... , . . . y : ' -- . . . . . . . . - ' ' - - · ...-.L . . . : . ' r : '; ;. ' · ; ; I.. :' .. .: - . , : · ·. . ...- ...- / · ' ^ ' . . I .: ... .. .. ' :. . ...:. . . 1 .' . : :- ' ................. into... ---.. ..: ... ·, - : ........ .- . ·. . : -V . . . . : . Black matrix. Examples of the molecule include a acrylate monomer/rice.. ' _ _ . . . -- body/oligomer, and the like.可良. ···'.' '* . : - . . ' ' . ' Degree and intensity. Talking about the dry mixture tree deer: implementation 舛^ - · ' ..... . . '-.· - '.· - . may include solvents to temporarily reduce the dryness of the composition (eg r I ^ ^ , . , ' -- · ..... ? . : . - . - : . - - - Ether acetate (PGME A ) or other suitable solvent such as organic solvent 1 _ In at least some embodiments, the black matrix component may comprise A total of about 100 ppm to about 10,000 ppm by weight of the wetting additive (which includes a polymerizable molecule having an ink-sensitive polar portion and a non-polar non-polar portion), and the foregoing total components are in the absence of a solvent. In some embodiments, the concentration of the wetting additive may preferably be selected from the range of about 500 ppm to 5,000 ppm by weight of the total component (without solvent). Additives. Additional examples of wetting additive σ agents include one or more manufactured by Sartomer Ltd. of Exton, Minn.

個 CN4000、 CN9800、 CN990 ’ 由德國 Dusseldorf 的CN4000, CN9800, CN990' by Dusseldorf, Germany

Degussa^AG 製造的 TEGO® Rad 2000 系列(例如 2200η, 23 50 和 /或等等),TEGO® Glide 系列和 /或 TEGO® Flow 系列等等。然而,可採用一個或多個額外的且/或不同的添 加劑。 - . · ^ _ . _ 適當的潤濕添加劑的選擇可基於,例如,潤濕添加劑 的分子量、疏水基濃度、反應性等。在一些實施方式中, 13 - ..-.--- - - - - · · .——' ...-/ '.. . ..: :- ' -...':..〆:, : - ., ...... - , : V - ι ::·- " . .... ' 、 ' - - ' · ; : ,1 . , · . · · .··.·. . - · · ·..、'-··、.·· '、 ·- · :.:...1 ': .·.. ....... ..... 、. - - - - ' . - '· ...... '. : - .-'ι ... 潤濕添加劑可具有在約1 00 MW到約1 0〇ν〇〇〇 Mw^TEGO® Rad 2000 series manufactured by Degussa^AG (eg 2200η, 23 50 and/or etc.), TEGO® Glide series and / or TEGO® Flow series, etc. However, one or more additional and/or different additives may be employed. The choice of a suitable wetting additive can be based, for example, on the molecular weight of the wetting additive, the hydrophobic base concentration, the reactivity, and the like. In some embodiments, 13 - ..-.--- - - - - · · . -' ...-/ '.. . ..: :- ' -...':..〆: , : - ., ...... - , : V - ι ::·- " . .... ' , ' - - ' · ; : , 1 . , · . · · ······ . . - · · ·..,'-··,.·· ', ·- · :.:...1 ': .·.. ....... ..... ,. - - - - ' . - '· ...... '. : - .-'ι ... The wetting additive can have from about 1 00 MW to about 10 〇ν〇〇〇Mw^

’ · * :-. . . · · · .... -::均分子量)範圍内的分子量。复I 500 MW到1〇,〇〇〇 的範圍内。儘管可貫:橡^ 或較小且/或不同分子量的潤濕添加劑。 /'· * :-. . . · · · .... -:: molecular weight in the range of average molecular weight). Complex I 500 MW to 1 〇, within the range of 〇〇〇. Although it can be: rubber or smaller and / or different molecular weight wetting additives. /

- ' Λ'' V- :- ' - ' ; - -V 。 :, . . .· : ' . ,; ' Λ:...... ^ ^ ^ ^ % . " : ..... . . :. 三醋酸纖維素(TAC )、聚碳酸醋(?〇1^- ' Λ'' V- :- ' - ' ; - -V . :, . . . : : ' . ,; ' Λ:...... ^ ^ ^ ^ % . " : ..... . . :. Triacetate (TAC), polycarbonate ( ?〇1^

聚對苯二甲酸乙二醇酿(PET)、聚萘乙醋( PEN )、聚氯乙 烯(PVC ) '聚曱基丙烯酸甲醋(PMMA )、環烯烴共聚合 物(COP)及/或其他適宜的材料。第2圖是可根據方法ι〇ι . . ' · 進行處理的基板201之側部截面視圖。 - . · · . - - . 在步驟109中,可在基板201上形成黑矩陣成分2〇5 的層203 (第2圖)。可採用沈浸方法、喷霧方法、旋轉方 法和旋塗方法或者其他適宜的方法,在基板201上形成黑 矩陣成分層203。如此一來,基板201可被黑矩陣成分2〇5 塗覆。可加熱基板201以乾燥黑矩陣成分205。從而,在 黑矩陣成分205中的落劑可蒸發。此種塗佈後加熱 (post-coating heating)的方法可稱之爲「軟烤」製程。 在步驟111中,活化能可施加到黑矩陣成分205以聚 合潤濕添加劑,從而極化潤濕添加劑的分子,使得分子的 疏墨部分斩向活化能遷移二可依據成分205,使用任何可 行的活化能源完成聚合。例如,紫外光、電子東、雷射及/ 或燈可用做活化能源。亦可使用其他活化能源或結合使用。 14 200815799 在一些實施例中、在步驟111中,可圖案化黑矩陣成 : ;- : - ' . - \ '. - -- 分的層203。例如,如第3圖所示,遮罩301可放置在(或 . ..... . .... . ' ; - / . :.v - - .;Polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyvinyl chloride (PVC) 'polymethyl methacrylate (PMMA), cyclic olefin copolymer (COP) and / or other Suitable materials. Fig. 2 is a side cross-sectional view of the substrate 201 which can be processed according to the method ι〇ι . . . - In step 109, a layer 203 of the black matrix component 2〇5 can be formed on the substrate 201 (Fig. 2). The black matrix composition layer 203 may be formed on the substrate 201 by an immersion method, a spray method, a rotation method, a spin coating method, or other suitable methods. As such, the substrate 201 can be coated by the black matrix component 2〇5. The substrate 201 can be heated to dry the black matrix component 205. Thereby, the falling agent in the black matrix component 205 can be evaporated. This method of post-coating heating can be referred to as a "soft-bake" process. In step 111, activation energy can be applied to the black matrix component 205 to polymerize the wetting additive, thereby polarizing the molecules of the wetting additive such that the ink-repellent portion of the molecule migrates toward the activation energy, depending on the composition 205, using any feasible The activated energy completes the polymerization. For example, ultraviolet light, electron east, lasers, and/or lamps can be used as an activating energy source. Other sources of activation energy can also be used or used in combination. 14 200815799 In some embodiments, in step 111, the black matrix can be patterned into : : - : - ' . - \ '. For example, as shown in Fig. 3, the mask 301 can be placed at (or . . . . . . . ' ; - / . :.v - - .;

形成在)黑矩陣成分層203上部。其後,可使用UV或其 他波長光或者能曼3 03,以遣過 展2 0 3。能量3 0 3可曝光黑矩陣成分層2 0 3的一部分3 0 5, - - . , - / . ' 1 .. - : . 但是不曝光黑矩陣成分層203的其他部分307。當注意的 是在其,他實施例中,可採用能將黑矩陣成分層203的相反 . _' . - · . - - ' , . 部分307暴露於能量303中的負遮罩。 當具有適當波長的光(或其他能量)衝擊黑矩陣成分 層2 03的一部分時,在黑矩陣成分層205中的起始劑可吸 收光303 (能量),以在暴露部分形成自由基分子。起始劑 可用作聚合起始劑,以於黑矩陣成分層203暴露部分中, : . - .. · 聚合可被聚合的單體。因此,該黑矩陣成分層203的暴露 部分中,可包括由可聚合單體所聚合而成的聚合物。在該 微影曝光時,潤濕添加劑的可聚合單體則能夠鎖合住( lockIt is formed on the upper portion of the black matrix composition layer 203. Thereafter, UV or other wavelength light or energy 3 03 can be used to relocate 2 0 3 . The energy 3 0 3 may expose a portion of the black matrix composition layer 2 0 3 3 5 , - - . , - / . ' 1 .. - : . . . but the other portion 307 of the black matrix composition layer 203 is not exposed. It is noted that in its embodiment, a negative mask capable of exposing the opposite of the black matrix composition layer 203 to the energy 303 may be employed. When light (or other energy) having a suitable wavelength strikes a portion of the black matrix composition layer 203, the initiator in the black matrix composition layer 205 absorbs light 303 (energy) to form radical molecules in the exposed portion. The initiator can be used as a polymerization initiator for the exposed portion of the black matrix component layer 203, as follows: Polymerization of a monomer which can be polymerized. Therefore, the exposed portion of the black matrix component layer 203 may include a polymer obtained by polymerizing a polymerizable monomer. At the lithography exposure, the polymerizable monomer of the wetting additive is able to lock (lock

在曝光之後,可在基板201上執行顯影步驟。例如, 可採用顯影液以顯影黑矩陣成分層203的暴露或未暴露部 分,以去除該部分。例如,在暴露部分中所包括的粘合劑 樹脂可與顯影液反應 ' 第4圖是在顯影之後基板201的橫 截面視圖的實施例。 而在形成彩色濾光片時,利用去除顯影部分所産生的 15 200815799 空間,則作為畫素區域或井4〇1之用,以藉由+羞肚 气,裝置將 墨水注八其中,進而定義出黑矩陣4 0 3。 ...... : 1. . : :* . • · . ' · * . · · * 基板2〇1可進一步固化。例如,基板201可加執七 “、、或暴 露於紫外光、電子束轄射、雷射等,以使在層203中的 的黑 矩陣成分固化及交聯,進而在黑矩陣成分層203中形成交 聯樹脂。i第5圖所示,當黑矩陣成分層2 〇 3被施以能量 • . · · · . -.· - · . : . . ;-.. . ' ... . 501時,潤濕添加劑分子的疏墨非極性部分可上升到黑矩 陣成分層203的頂表面503,在接近黑矩陣尤 . " .. . ' ' - . 、 - - 頂表面503形成疏墨層505、該疏墨層505爲相對地疏墨 (例如,與含有較低濃度或者不含潤濕添加劑的黑短陣材 .. . . . -. ' . . '. - 料相較,更加疏墨)。 以這種方式,黑矩陣403的頂表面503可以是疏墨的’ 而形成於黑矩陣中各個晝素井的側壁表面507 (例如,鄰 近畫素區域401 )其疏墨程度小於頂表面503,在一些實施 例中,甚至是親墨的。因此,黑矩陣的頂表面5 0 3 <防土 鄰近的畫素井之間的漏墨,並可在喷射製程期間防土墨水 顏色的混合,以及有助於改善畫素井的填充輪廓(例如 使畫素井的填充更加一致且完全)。進而可生産改善的♦色 濾光片。舉例而 言,第6圖是根據本發明一實施例中’基 201的晝素區域401中,墨水601的截面倒視圖 板 參.照 第6圖,在固化之後,集中在黑矩 陣4 03的頂表面503的 潤濕添加劑,使得頂表面503疏墨,而側壁表面507則保 16 200815799 . . . -. ...: : . .. . - / ' ' . ' - ' -,- .:- '-. ... . / :' ' - . - - · ·· . 1 · • : . . . · . ... , ..... , - ' ... · - · · - · . ·- ' . .-.: - - . . : ^ ·. . . '. 持較小的疏墨性,甚至親墨性.。因此^墨水60 1可聚集成 . .. . - — - . 珠狀而遠離黑矩陣403的頂表面503,使得墨水601不超 ....·.' - ' ' ' " . - · 出畫素區域401鋪展。 實際上,濶濕添加劑的遷移可以是在整個晝素井形成 製程期間(例如,在基板上黑矩陣成分層形成期間、在軟 烤期間、在任意UV固化製程期間等),所發生的動態過 程。在至少一個實施例中,在 1051溫度下,軟烤時間可 . ... · - · . ; ....After the exposure, a development step can be performed on the substrate 201. For example, a developer may be employed to develop exposed or unexposed portions of the black matrix component layer 203 to remove the portion. For example, the binder resin included in the exposed portion can be reacted with the developer. Fig. 4 is an embodiment of a cross-sectional view of the substrate 201 after development. In the formation of the color filter, by using the 15 200815799 space generated by the removal of the developing portion, it is used as a pixel area or a well, and by means of + shame, the device injects ink into it, thereby defining The black matrix is 4 0 3 . ...... : 1. . : : * . . . . . . . . . . . . . The substrate 2〇1 can be further cured. For example, the substrate 201 may be modified by "s," or exposed to ultraviolet light, electron beam ray, laser, or the like to cure and crosslink the black matrix components in the layer 203, and in the black matrix composition layer 203. Forming a crosslinked resin. As shown in Fig. 5, when the black matrix component layer 2 〇3 is energized, . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . When the non-polar portion of the wetting additive molecule can rise to the top surface 503 of the black matrix composition layer 203, an ink repellent layer is formed on the top surface 503 near the black matrix. 505. The ink repellent layer 505 is relatively ink-repellent (for example, compared with a black short-form material containing a lower concentration or no wetting additive. . . . . . . . . . . In this manner, the top surface 503 of the black matrix 403 may be ink-repellent' and formed on the sidewall surface 507 of each of the pixel wells in the black matrix (eg, adjacent to the pixel region 401). Surface 503, in some embodiments, is even ink-repellent. Thus, the top surface of the black matrix is 5 0 3 < leakage between the adjacent wells of the soil Ink, and can mix the color of the anti-soil ink during the jetting process, and help to improve the filling profile of the pixel well (for example, make the filling of the pixel well more consistent and complete), and then produce improved ♦ color filters For example, FIG. 6 is a cross-sectional view of the ink 601 in the halogen region 401 of the base 201 according to an embodiment of the present invention. According to FIG. 6, after curing, the black matrix is concentrated. The wetting additive of the top surface 503 causes the top surface 503 to be ink-repellent, while the sidewall surface 507 is protected. 2008 200899799 . . . . . .:: . . . - / ' ' . ' - ' -, - . :- '-. ... . / :' ' - . - - · ·· . 1 · • : . . . · . ... , ..... , - ' ... · - · · - · · · ' . .-.: - - . . : ^ ·. . . '. Holds less ink repellency, even ink retention. So ^ ink 60 1 can be integrated. .. . - Beads away from the top surface 503 of the black matrix 403, so that the ink 601 does not exceed .....' - ' ' ' " . - · The pixel area 401 spreads. In fact, the migration of the moisturizing additive May be during the entire formation process of the wells (eg, on the substrate) Dynamic procedure component layer during the black matrix is formed, during the soft bake, during the UV curing process of any other), it occurred. In at least one embodiment, at a temperature of 1051, the soft roasting time can be .... - - . . .

约為1.5分鐘(在空氣中)。11¥固化(曝光)在空氣中可 约為30-60秒,最終固化在空氣中則約為10分鐘。根據其 ... : . · . ‘ :. ' 他烘烤和/或固化氣體環境(例如,氣氣、氬氣尊)可以採 用其他軟烤、UV固化和/或最終固:化時間。 第7圖示出根據本發明的一實施例,可用作潤濕添加 劑分子701:之示例。參照第7圖,作為示例的分子701可 包括親墨及/或反應性的第一端703。另外,示例分子701 可包括疏墨的第二端705。 第8圖繪示根據本發明的一實施例,在固化前(例如, 在施以活化能之前),於黑矩陣成分205中,第7圖之示例 分手701的位向801。參照第8圖,在固化前的位向801 » · . · · 中,分子的第一和第二端7〇3、7〇5可大約隨機定向,並且 分子大致均勻分佈在整個黑矩陣成分205中。 第9圖繪示根據本發明的一實施例,在固化後(例如, 在施以活化能之後),於黑矩陣成分205中,第7圖之示例 17 200815799 翁干的位,9〇1。參照 間’分辛:701升至黑矩陣於分^ 分子7P1的疏裏端 露於活,能的表面),以形成之前所I岭 此,頂奉面593比任穴形, 疏墨性〇 :-. .;'.. ' :' . . - . . ..- ' . ...... . '·; . · :' - . . . ; . .. 現請參照第10圖至第I2圖’其描繪了根據本聲明, 適用於濕潤添加劑之可聚合分子的三個示例結構式。第1〇 圖描绛了具有非極性尾端部分1002的潤濕添加劑分子 1000其結構式,其中該非極性尾端部分1002包含了疏墨 的CF2鏈。而極性部分1004包括一鐽其#版1 ’ 灰基厌原子以雙鍵鍵合 ^ r-^ 〇 ^^ ^ 1〇〇4是親墨的。分子1000更包括聚合部分1〇〇6 ,此聚人 部分1〇〇6亦直接附接到極性部分10〇4的幾基碟原子。ζ ^.^ 1006 ^ 〇 r n - 描繪了具有非極性主體部分之示例濶士七 ' 捫潤屬添加劑分子u 的結構式。第1 2爵描繪了示例之石夕人 几之矽聚合物潤濕添加劑子 1200 ^ ’ 俸統的黑矩陣材料配方可包枯 ▲ 匕括傳統的成分諸如單體、 低聚物/聚合物、光起始劑、顏料、溶等… 为〗等 洛在此愛矩腺 材料上的墨水通常會在黑矩陣頂矣 “、、矩降 上’產生小於約5戶 的墨水接觸角。相反地,本發呀 、^5度 月所包含的添加劑可將在黑 18It is about 1.5 minutes (in the air). 11 ¥curing (exposure) can be about 30-60 seconds in air and about 10 minutes in air. According to its ... : . . . ‘ :. ' He can bake and/or cure the gas environment (eg, gas, argon) with other soft bake, UV cure and/or final solidification time. Figure 7 shows an example of the use as a wetting additive molecule 701: in accordance with an embodiment of the present invention. Referring to Figure 7, molecular 701, by way of example, can include a first end 703 that is inked and/or reactive. Additionally, the example molecule 701 can include a second end 705 that is ink repellent. Figure 8 illustrates the orientation 801 of the example breakout 701 of Figure 7 in the black matrix component 205 prior to curing (e.g., prior to applying activation energy), in accordance with an embodiment of the present invention. Referring to Fig. 8, in the position 801 » · · · · before curing, the first and second ends 7 〇 3, 7 〇 5 of the molecules may be approximately randomly oriented, and the molecules are substantially uniformly distributed throughout the black matrix component 205 in. Figure 9 illustrates the position of Figure 17 200815799, after the curing (e.g., after application of activation energy), in the black matrix composition 205, in accordance with an embodiment of the present invention. The reference room 'minus: 701 liters to the black matrix in the sub-molecule 7P1's sparse end exposed to the surface, the surface of the energy), in order to form the former I Ling, the top face 593 than any hole shape, ink repellency :-. .;'.. ' :' . . - . . .. ' ' . . . '.; . : : - - . . . . . . . Please refer to Figure 10 to Figure I2' depicts three exemplary structural formulas for polymerizable molecules suitable for wetting additives in accordance with this statement. The first schematic depicts the wetted additive molecule 1000 having a non-polar tail portion 1002 having a structural formula wherein the non-polar tail portion 1002 contains an ink-repellent CF2 chain. The polar portion 1004 includes a 版 版 # 厌 厌 厌 以 以 以 以 以 以 以 以 以 以 是 是 是 是 是 是 是 是 是 是 是 是 是 是 是 是 是 是 是The molecule 1000 further includes a polymerized portion 1〇〇6 which is also directly attached to a few base plate atoms of the polar portion 10〇4. ζ ^.^ 1006 ^ 〇 r n - Describes the structural formula of the sample gentleman's additive molecule u with a non-polar body moiety. The 12th prince depicts the example of the stone 人 几 矽 矽 矽 矽 1200 1200 1200 ^ ' 黑 的 的 的 的 的 的 的 的 的 的 的 的 的 的 的 的 ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ ▲ Photoinitiators, pigments, solvents, etc.. In this case, the ink on the love gland material usually produces an ink contact angle of less than about 5 households on the top of the black matrix "., moment drop". Conversely, The additive contained in this hair, ^5 degree month can be in black 18

;: : . . '.二_:.v .. · . ,- :- '' 'v .: , ,. :' - ' ·.. ' . ' ; - . - - ' / .:·. >-..:' - ;-:;'; ';; :·;;νΛ·" :''; '.'; ;V ; :vv:;-;;;V^· .', ;; V :. ;·-···,Λ:.;^ ; .' ·:···;· .-;'v:. . ''...;.;-; -::;' ;,;: .'’.: — . - ;.'τ — . .Λ ’ I:. . . '- Τ ' : . I . : .-厂:...I: ' ..厂 _ ' - .':''.'./··--· .' Γ\. - - J ^ ; :' - ' ;' : I」. ' ;' : ;.* ' - - . ';: : . . '.二_:.v .. · . ,- :- '' 'v .: , ,. :' - ' ·.. ' . ' ; - . - - ' / .:·. >-..:' - ;-:;'; ';; :·;;νΛ·":'';'.';;V;:vv:;-;;;V^·.',;; V :. ;·····,Λ:.;^ ; .' ·:······.-;'v:. . ''...;.;-; -::;' ;,;: .''.: — . - ;.'τ — . .Λ ' I:. . . '- Τ ' : . I . : .-厂:...I: ' ..厂_ ' - .':''.'./··--· .' Γ\. - - J ^ ; :' - ' ;' : I". ' ;' : ;.* ' - - . '

: I. ....:, : . - - ^ - ; . ' I ' , · ' . / / : - : ' : ' ^ 4 李:現 ':: .; ':.: .. : ;: ;'-- '. · /-; ' "·, -. ^ ;,· ; ;-.,.; ·. ·.'. - " ' ; " .: / -V '- ' *'' : ; : ;·.. 變,較佳地從約25對约60度。所用的添加劑的濃度和 .;;. ; - ;:: -.;; :' ;:-; \^ ' . . .V : ·; : . ; :;; : - ' ;. ;. ;-' 程條件(例如,活化/曝光時間和能^量 用以在上述範圍内,將接觸角調整至更明確所需的值( 1 -; . : ., : 如.,约2 8度、約3 5度等)。 述的描述僅揭示本發明示範用之實施例。對本領 之熟習技藝者而言,舉凡落入本發明範圍内的前述裝置 _' '._ ;: .….. ... 方法的改良係顯而易見。例如,可改變在黑矩P車成分中 * . — - 顏料分散劑、起始劑、聚合單體、枯合劑樹脂和/或溶劑 濃度。同樣地,在一些實施例中,可在平板顯示器的薄 電晶體( TFT )層上直接形成黑矩陣。例如,本發明還 應用到間隔墊形成、偏光器塗覆和納米顆粒電路形成的 程中。 因此,雖然本發明之實施例已揚示本發明,但是當 解的是,其他實施例亦可落入本發明的精神和範圍内, 如下述申請專利範圍所界定者。 【圖式簡單說明】 ...., ......八 第1圖爲繪示根據本發明的一些態樣,作為示例之 法的流程圖, 第2圖是根據本發明的一些態樣,塗覆黑矩陣成分 部分基板的放大截面示意圖; 改 製 可 例 域 和 的 的 膜 可 製 理 其 方 之 19 200815799 第3圖是根據本發明的一些態樣,被遮享遮覆且塗覆 Λ..· '1 黑矩陣成分之部分基板,其暴露於能:量時的:放^ 意’圖.- V: . 第4圖是拫據本發明的一些態丨 ;. ' : ·' . ^ '; ·;ν ·;^:ι. 的放大截面不意圖, 第5圖是根據本發明的一些態樣,具有疏墨的頂表面 -· · t . . - .. . : .. .- .. .- . - .,. 和親墨的側壁表面的部分黑矩陣晝素井之放大截面示意 _ V ' . Γ -- - . .: I. ....:, : . - - ^ - ; . ' I ' , · ' . / / : - : ' : ' ^ 4 Li: Now ':: .; ':.: .. : ; : ;'- ' '. · /-; ' "·, -. ^ ;,· ; ;-.,.; ·. ·.'. - "';" .: / -V '- ' *'' : ; : ; . . . change, preferably from about 25 to about 60 degrees. The concentration of the additive used is .;;.; - ;:: -.;; :' ;:-; \^ ' . . . V : · : : ; ; ; ; ; : - : ; ; ; ; ; The process conditions (for example, the activation/exposure time and the amount of energy used to adjust the contact angle to a more defined value within the above range (1 -; . : ., :, for example, about 28 degrees, about 3 5 degrees, etc. The descriptions are merely illustrative of the embodiments of the invention. For those skilled in the art, the aforementioned devices _'..; The improvement of the method is obvious. For example, it can be changed in the black moment P composition * pigment dispersant, initiator, polymer monomer, dry resin and/or solvent concentration. Similarly, in some implementations In an example, a black matrix can be directly formed on a thin transistor (TFT) layer of a flat panel display. For example, the present invention is also applied to a process of spacer formation, polarizer coating, and nanoparticle circuit formation. The embodiments have been presented to illustrate the invention, but other embodiments may fall within the spirit and scope of the invention as follows. [Description of the scope of the patent application] [Simplified description of the drawings] ...., ... Figure 1 is a flow chart showing an example of the method according to some aspects of the present invention, the second BRIEF DESCRIPTION OF THE DRAWINGS FIG. 3 is a schematic enlarged cross-sectional view showing a portion of a substrate coated with a black matrix component according to some aspects of the present invention; a film which can be modified and exemplified can be processed. 19 200815799 FIG. 3 is a view of some aspects according to the present invention, Covered and covered with Λ..· '1 part of the substrate of the black matrix component, which is exposed to the energy: quantity: put the meaning of the figure. - V: . Figure 4 is some according to the invention State of the art;; ': ·' . ^ '; ·; ν ·; ^: ι. The enlarged cross section is not intended, and Fig. 5 is a view of the top surface of the ink absorbing surface according to some aspects of the present invention. - . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .

圖·;- 第6圖是根據本發明的一些態樣,由墨水填充的部分 黑矩陣晝素井的放大截面示意圖; , - . : 第7圖是根據本發明的一些態樣,具有親墨極性部分 和疏墨的非極性部分之可聚合添加劑分子的放大示意圖; 第 8圖是根據本發明的一些態樣,在施以活化能之 前,在黑矩陣成分中可聚合添加劑分子的放大示意圖; -- ,. . . 第 9圖是根據本發明的一些態樣,在施以活化能之 後,在黑矩陣成分中可聚合添加劑分子的放大示意圖; 第10圖是根據本發明的一些態樣,具有非極性尾部的 ' .· '- .'' ; . 潤濕添加劑的結構式; - 第11圖是拫據本發明的一些態樣,具有非極性主體部 分的潤濕添加劑的結構式; 第12圖是根據本發明的一些態樣,矽聚合物潤濕添加 劑的結構式。 20 200815799 【主要元件符號說明 101方法 105步驟 107步驟 109步驟 111步驟 2 01基板 203層 205黑矩蜂成分 301遮罩 3 03能量 3 05部分層 3 07部分層 401井 403黑矩陣 501能量 503頂表面 5 05疏墨層 5 07側壁表面 ο 7 端端水子一 二肖 墨分第第位 200815799 1 . . ..; .V ': / ;' V - . 901 向 1000分子 1002非極性尾端部分 1004極性部分 … 1006聚合部分 :1100潤濕添加劑分子 ... ... - 1200潤濕添加劑分子Figure 6 is a schematic enlarged cross-sectional view of a portion of a black matrix halogen well filled with ink in accordance with some aspects of the present invention; - - : Figure 7 is a view of some aspects of the invention in accordance with the present invention. An enlarged schematic view of a polar portion and a non-polar portion of a non-polar portion of a polymerizable additive molecule; Figure 8 is an enlarged schematic view of a polymerizable additive molecule in a black matrix component prior to application of activation energy, in accordance with some aspects of the present invention; - Figure 9 is an enlarged schematic view of a polymerizable additive molecule in a black matrix component after application of activation energy in accordance with some aspects of the present invention; Figure 10 is a view of some aspects of the present invention, a structural formula of a wetting additive having a non-polar tail; - Figure 11 is a structural formula of a wetting additive having a non-polar body portion according to some aspects of the invention; Figure 12 is a structural formula of a ruthenium polymer wetting additive in accordance with some aspects of the present invention. 20 200815799 [Main component symbol description 101 method 105 step 107 step 109 step 111 step 2 01 substrate 203 layer 205 black moment bee component 301 mask 3 03 energy 3 05 partial layer 3 07 partial layer 401 well 403 black matrix 501 energy 503 top Surface 5 05 ink-repellent layer 5 07 sidewall surface ο 7 end-end water one or two Xiao Mo points first 200815799 1 . . ..; .V ': / ;' V - . 901 to 1000 molecules 1002 non-polar tail Part 1004 polar part... 1006 polymerized part: 1100 wetting additive molecule... - 1200 wetting additive molecule

Claims (1)

200815799 .... .. ' . .i . . ::..、 . : ' :' : , ... ' ' . ' 二:.: - ' · ,..-.w。.. - /"·:.:·'- ... ': \ 二:丨' ..- .-.. * ' . . . ... . . - .. . .. - .::...... ... 1 · 一種用於形成平板顯示器之彩色濾先另的 • — • ' · .... - ... · .... · -. ' 分,其包括: 一添力σ劑,該添加劑包含可聚合之分子,且 - · ' . . . · · · . ★ J · 合分子包含極性部分和非極性部分,其中該非極 • 有疏墨性。 2/如申請專利範圍第1項所述之黑矩陣成分 ... , .. . V 該黑矩陣成分的表面暴露於活化能時,該可聚合 非極性部分係朝向該表面遷移。 3.如申請專利範圍第1項所述之黑矩陣成分 可聚合分子的該極性部分相對於該非極性部分係 性。 4.如申請專利範圍第1項所述之黑矩陣成分 添加劑包括以下至少其中之一:氟丙雄酸醋單體 酸酯低聚物、含矽基的丙烯酸酯單體、含矽基的 低聚物、含疏水基的丙烯酸醋單體、含疏水基的 ' 低聚物、活性蠟以及氟矽烷。 5.如申請專利範圍第1項所述之黑矩陣成分 I矩陣成 每一可聚 性部分具 ,其中當 分子之該 ,其中該 具有親墨 ,其中該 、氟丙烯 丙嫦酸酉旨 丙烯酸酯 ,更包含 23 200815799 .— -. - ; - r . . .….. - -;' - .. ' :: . . V:. -... . . - - _ ' J ' L .. . - ., --.- …...I I. . - V . , . . -I _ I'.人.:. - : .:. .,:. ... - .: .... ... 以下至少其中之一: 」::v ^ - : -; ; ' -v ,. ^ -- . ' ;'; :- - - ·. :顏料分散辦 一起始劑; - : - i : _ _ " - - _ 一可聚合單體或低聚物; :- V:- -.. ; - · _ ' - : 一粘合劑樹脂;以及 … - - . -. 丨.·... …-. · . . ' - . . 一溶劑。200815799 .... .. ' . .i . . ::.., . : ' :' : , ... ' ' . ' Two:.: - ' · ,..-.w. .. - /"·:.:·'- ... ': \ 二:丨' ..- .-.. * ' . . . . . . - .. . .. - .:: ...... 1 · A color filter used to form a flat panel display. • • • • .... - ... · .... · -. ' An additive σ agent, the additive comprises a polymerizable molecule, and - J . . . . . . . J · Molecular molecule comprises a polar portion and a non-polar portion, wherein the non-polarity has ink repellency. 2/ The black matrix component as described in claim 1 of the patent scope ..., . . . V When the surface of the black matrix component is exposed to activation energy, the polymerizable non-polar portion migrates toward the surface. 3. The black matrix component of claim 1, wherein the polar portion of the polymerizable molecule is linear with respect to the non-polar moiety. 4. The black matrix component additive according to claim 1, comprising at least one of the following: a fluoropropionate monoester oligomer, a mercapto group-containing acrylate monomer, and a mercapto group-containing low Polymer, hydrophobic group-containing acrylic acid vinegar monomer, hydrophobic group-containing oligomer, reactive wax, and fluorodecane. 5. The matrix of the black matrix component I according to claim 1 of the patent application, wherein each of the polymerizable portions has a glycerin, wherein the fluoropropionate acrylate is acrylated. , including 23 200815799 .— -. - ; - r . . ...... - -;' - .. ' :: . . V:. -... . . - - _ ' J ' L .. . - ., --.- ......I I. . - V . , . . -I _ I'.人.:. - : .:. .,:. ... - .: .... ... at least one of the following: ”::v ^ - : -; ; ' -v ,. ^ -- . ' ;'; :- - - ·. : pigment dispersion to start a starter; - : - i : _ _ " - - _ a polymerizable monomer or oligomer; :- V:- -.. ; - · _ ' - : a binder resin; and ... - - . -. 丨.. .. ...-. · . . ' - . . A solvent. 6.如申請專利範圍第1項所述之黑矩陣成分,其中該 圓.. * - - - .- . * - - 黑矩陣成分包括一添加劑,且在該黑矩陣成分並不包括任 , ' ' . : ’ " - - . - .. 、 . : - _ . -. - ' ·· ,. . - . · . ... 何溶劑的情形下,該添力Π劑之濃度係該羞色矩陣成分龜重 .- , ' . ' · · ·. . - . · 量份約 100 ppm 到約 10,000 ppm。 7. 如申請專利範圍第1項所述之黑矩陣成分,其中該 添加劑之分子量係在約1 〇〇 Mw到約1 00,000 Mw重量平均 . " · · — · - · · - * ·6. The black matrix component of claim 1, wherein the circle: .* - - - .- . * - - the black matrix component comprises an additive, and the black matrix component does not include any, ' ' . : ' " - - . - .. , . : - _ . -. - ' ·· , . . - . · . . . In the case of solvent, the concentration of the added force is the shame The color matrix component is the weight of the turtle. - , ' . ' · · ·. . - . · The amount is about 100 ppm to about 10,000 ppm. 7. The black matrix component of claim 1, wherein the molecular weight of the additive is from about 1 〇〇 Mw to about 1 000,000 Mw weight average. " · · · · - · · - * 分子量範圍内。 . . . ; . . . , ' : ‘ . : ; · ..' • ’: . . : - · . ·. ‘ ' 1 . . - ' - - ' .. - : . . -' ' . - ' 8, ——種甩於形成平板顯示器之彩色濾光片的塗覆基 板,其包括: ... .--_ - . . .· . : 一基板;以及 - ..' - . . - . : ’ 一黑色矩陣成分層,形成於該基板上,其中該黑矩身 成分包括可聚合分子,該每一可聚合分子都包括極性部分 24 ‘. * -- - ; 、, -/.·^ .. .. ... . Λν; ;'; . .,: ;, ; . ;- :;-;,':. ..- - : ;:·-;·',·;;·· ::ν - ·;ν '; - ':.:'::·:-^ ,:: ;. .: , .; ., - .·. '.: ':: ••'v - - -" : ' ' ;, -..:_ ',": ' · . ".: ' :, , ' . .. '..· ,. '"'·· -· . · - - . · _ ' . ' : / ·. · : - ^ - - . - - * - ^ ' . . -,-; ,;; : - - ' ' :; .- :.';. ...; . ^和非極性部分,其:中談非極性部分具有疏墨性 广 .. . - Λ. -., . . ' - ' .; '.' ....... ' :'; :;-. -. .....,'、* ,_ . .:. . ·. : ... " - . , :/ .V·- : ' -:' : : ': ^ : - .- ..... . . - 中當該 之非極 9·如申請專利範圍第8項所述之塗覆基板, -.; :' .Λ . ; ..... 黑矩陣成分的表面暴露於活化能時,該可聚合分 ... -1 . . . . . 性部分係朝向該表面遷移。Within the molecular weight range. . . . ; . . . , ' : ' . : ; · ..' • ': . . : - · . ·. ' ' 1 . . - ' - - ' .. - : . . -' ' . - '8' - a coated substrate for forming a color filter of a flat panel display, comprising: ....----. . . . . : a substrate; and - ..' - . . - : a black matrix component layer formed on the substrate, wherein the black matrix component comprises a polymerizable molecule, each of the polymerizable molecules including a polar portion 24 '. * -- - ; , , -/. ^ .. .. ... . Λν; ;'; . .,: ;, ; . ;- :;-;,':. ..- - : ;:·-;·',·;;·· ::ν - ·;ν '; - ':.:'::·:-^ ,:: ;. .: , .; ., - .·. '.: ':: ••'v - - - " : ' ' ;, -..:_ ',": ' · . ".: ' :, , ' . .. '..· ,. '"'·· -· . · - - · _ ' . ' : / ·. · : - ^ - - . - - * - ^ ' . . -,-; ,;; : - - ' ' :; .- :.';. ...; ^ and the non-polar part, which: the non-polar part of the talk has a wide range of ink-repellent.. - Λ. -., . . ' - ' .; '.' ..... .. ' :'; :;-. -. .....,',*,_ . .:. . ·. : ... " - . , :/ .V·- : ' -:' : : ': ^ : - .- ..... . . - In the non-polar 9 of the coated substrate as described in claim 8 of the patent application, -.; :' .Λ . ; .. When the surface of the black matrix component is exposed to the activation energy, the polymerizable component ... -1 . . . . The sexual portion migrates toward the surface. 10·如申請專利範圍第8項所述之塗覆基板 可聚合分子的該極性部分相對於該非極性部分係 性。 . . " .'.... .’ / . - - : , 、 -• . .. - _ . . ' "· : 11·如申請專利範圍第8項所述之塗覆基板 可聚合分子包括以下至少其中之一:氟丙烯酸酯 丙烯酸醋低聚物、含矽基的丙烯酸酯單體、含矽 酸醋低聚物、含疏水基的丙烯遗醋單體、含疏水 r ... · ; / - ;-. _ 酸S旨低聚物、活性壤以及氟石夕烧。 ... ... … . 12.如申請專利範圍第8項所述之塗覆基板 . .. . ... … ... * 黑矩陣成分更包含以下至少其中之一: 一顏料分散劑; 一起始劑; 一聚合單體或低聚物; 其中該 有親墨 其中該 體、氟 的丙烯 的丙烯 其中該 25 200815799 一:粘合劑樹脂r以及:丨 - · ' ':·. :..·ϊ ·:·:·· "' - .一::溶'劑 : ;. _ · . ' * ·, -.- : • ' _ · · · .· · ' - · · · ·.-. -, - ;.- :-ν-:ΛΛ, - . - ' . .· : . · - · . . · - _ · 13·如申|專 黑矩%成分包括一可f夂 括任何落劑的情形下,詼 成分總重量份約1 00 ppm到約] .' -:·' ' : , :. · ·: ' . - ·', : ; ' .… . . . ·· ·. V-. Λ.':'. 14·知申請專利範圍第8項所述之塗覆基板,其中該 可聚合分子之分子量係在約100 Mw到約100,000 Mw重量 平均分子量範圍内。 5· —種形成平板顯示器之彩色濾先片的方法,其包 括乂 形成含有可聚合分子的黑矩陣成分,該每一可聚合分 子都包括極性部分和非極性部分,其中該非極性部分具有 疏墨性; .· ί : .;- . ' :- ... ...... ' 提供一基板; … ' ............. :· . .... - ^ - V _ 每秦板上形成該黑矩陣成分的層;以及 對該基板上的該黑矩睁成分施加活化能。 2610. The coated substrate of claim 8, wherein the polar portion of the polymerizable molecule is linear with respect to the non-polar portion. . . . " .'.... .' / . - - : , , -• . . . - _ . . ' "· : 11· The coated substrate as described in claim 8 is polymerizable. The molecule includes at least one of the following: a fluoroacrylate acrylate acrylate oligomer, a thiol-containing acrylate monomer, a phthalic acid-containing vinegar oligomer, a hydrophobic group-containing propylene vinegar monomer, ... · ; / - ;-. _ Acid S is an oligomer, active soil, and fluorite. 12. The coated substrate according to item 8 of the patent application. . . . . . . . * The black matrix component further comprises at least one of the following: a pigment dispersant a starter; a polymerized monomer or oligomer; wherein the propylene having the ink, the fluorine, and the propylene, wherein the 25 200815799 one: the binder resin r and: 丨- · ' ':: ..·ϊ ·:·:·· "' - .一::溶'剂: ;. _ · . ' * ·, -.- : • ' _ · · · ·· · ' - · · · · .-. -, - ;.- :-ν-:ΛΛ, - . - ' . . . : · · · · · · · · · ························································· In the case of any falling agent, the total weight of the bismuth component is about 1 00 ppm to about]. ' -:·' ' : , :. · ·: ' . - · ', : ; ' .... . . . The coated substrate of claim 8, wherein the polymerizable molecule has a molecular weight in the range of from about 100 Mw to about 100,000 Mw weight average molecular weight. 5. A method of forming a color filter for a flat panel display, comprising: forming a black matrix component comprising a polymerizable molecule, each polymerizable molecule comprising a polar portion and a non-polar portion, wherein the non-polar portion has an ink repellency Sex; .. ί : .;- . ' :- ... ...... ' Provide a substrate; ... ' ............. :· . . . ^ - V _ a layer forming the black matrix component per Qin plate; and applying activation energy to the black matrix component on the substrate. 26 . ..·.:·.; .. ...:-: . -, · : :·'^:^-·:.·.-.:.-:.. ' ^- ' '..』:..:'·..... .... : ' ..., : .. - . .... - ...... - *- ; -: . ' . r. * *' . -. - ' -. ... . - - ...-、.. • ' ' . .- .: .. . :--i' . ..-:: ' ——.:....: .' .' -'V: - · ' . . , '. ' ' ' .-.. -· . ' -: ' ·, :- . - . . ' ..... - - - ^ \ : - -. .〆 -. 1 6.如申請專利範圍第]15項所述之方法-, ,-.::.广---... : - ;.--.;.: _· - .;.' : 矩陣成分更包括形成一黑矩陣成分,且在對該 施加活化能時,該黑矩陣成分中該可聚合分子 部分會朝該黑矩陣成分的表面移動。 . -' . - / ' - - : ..-- - ... ' .- . - . .__ .'.— V.':..':. :, · -. .... .·..-. - ..... - . ··, 17·如申請專利範圍第15項所述之方法v . ' ... ' ' 矩陣成分更包括形成一黑矩陣成分,且該募矩 · . . 二..... ...1 可聚合分子的該極性部分,相對於該非極性部 :... ......_ .. ν'::. ….' 性':: 18.如申請專利範圍第15項所述之方法, 矩陣成分更包括形成一黑矩陣成分,且該黑矩 可聚合分子包括以下至少其中之一 ··氟丙烯酸 丙豨酸酯低聚物、含矽基的丙烯酸酯單體、含 酸酯低聚物、含疏水基的丙嫦酸酯單體、含疏 酸醋低聚物、活性蠟以及氣石夕烷。 19.如申請專利範圍第15項所述之方法, 矩陣成分更包括形成一黑矩陣成分,且該黑矩 ..... :\ .... ... ' .... . 含以下至少其中之一: - . 一顏料分散劑; 一起始劑; 其中形成黑 黑矩陣成分 的該非極性 其中形成黑 陣成分之該 分具有親墨 其中形成黑 陣成分之該 醋單體、氟 石夕基的丙婦 水基的丙婦 其中形成黑 陣成分更包 27 200815799 • .….:.ν' .. ' . . - .- . ' .. - - -.'…:二:.;'........; 一聚合單體或低聚物; 一粘合劑樹脂;以及 溶劑。 ::. _ . - - 厂........- ---- ' . / ·. . ; Λ,··/: ;: ,;:;.; '/ J:. ;;;: '. .' .,-. - ; ' . - : ;' - : " ;;. ;,. 2 0.如申讀專利範園第1 5項所述之方法,其中形成黑 矩陣成分更包括形成一黑矩陣成分,且在該黑矩曄成分並 不包括任何溶劑的情形下,該可聚合分子之iT度係該黑色..·.:·.; .. ...:-: . -, · : :·'^:^-·:.·.-.:.-:.. ' ^- ' '..』 :..:'·..... .... : ' ..., : .. - . .... - ...... - *- ; -: . ' . r. * * ' . -. - ' -. ... . - - ...-,.. • ' ' . .- .: .. . :--i' . ..-:: ' ——.:.. ..: .' . ' -'V: - · ' . . , '. ' ' ' .-.. -· . ' -: ' ·, :- . - . . ' ..... - - - ^ \ : - -. .〆-. 1 6. The method described in Article 15 of the patent application -, -.::. wide---... : - ;.--.;.: _· - .;.' : The matrix component further includes forming a black matrix component, and the portion of the polymerizable molecule in the black matrix component moves toward the surface of the black matrix component when the activation energy is applied thereto. . -' . - / ' - - : ..-- - ... ' .- . - . .__ .'.- V.':..':. :, · -. .... .. ..-. - ..... - . ··· 17· The method described in claim 15 of the patent application v. '...' 'The matrix component further includes forming a black matrix component, and the recruitment · . . . . . . . 1 The polar part of the polymerizable molecule, relative to the non-polar part: ... ...... _.. ν'::. .... 'Sex': 18. The method of claim 15, wherein the matrix component further comprises forming a black matrix component, and the black matrix polymerizable molecule comprises at least one of the following: a fluoroacrylic acid propionate oligomer, A mercapto group-containing acrylate monomer, an acid ester-containing oligomer, a hydrophobic group-containing propionate monomer, an acid-containing vinegar oligomer, a reactive wax, and a gas sulfoxide. 19. The method of claim 15, wherein the matrix component further comprises forming a black matrix component, and the black matrix..... :\ .... ... ' .... At least one of: - a pigment dispersant; an initiator; wherein the non-polar portion of the black matrix component is formed, wherein the fraction forming the black matrix component has an ink-repellent aceton monomer in which a black matrix component is formed, and fluorite The basis of the B-whole water-based B-women in which the black matrix component is formed. 27 200815799 • .....:.ν' .. ' . . - .- . ' .. - - -.'...: Two:.;' ........; a polymerized monomer or oligomer; a binder resin; and a solvent. ::. _ . - - Factory........- ---- ' . / ·. . ; Λ,··/: ;: ,;:;.; '/ J:. ;;; : '. .' . , -. - ; ' . - : ;' - : ";;.;,. 2 0. For example, the method described in the patent specification, item 15, which forms the black matrix component Further including forming a black matrix component, and in the case where the black matrix component does not include any solvent, the iT degree of the polymerizable molecule is the black 矩陣成分總重量份約1 〇 〇 P P m到約1 0,0 0 0 p pm。 21.如申請專利範圍第15項所述之方法,其中形成黑 矩陣成分更包括形成一黑矩陣成分,且在該黑矩陣成分中 該可聚合分子之分子量係在約1 0 0 M w到約10 0,0 0 0 M W重 量平均分子量範圍内。 22.如申請專利範圍第15項所述之方法,其中對該黑 矩陣成分施加活化能包括向該黑矩陣成分施加電子束輻 23.如申請專利範圍第1 5項所述之方法,更包含圖案 化在該黑矩陣成分中的矩陣。 28 200815799 24.如申請專利範圍第23項所述之方法^ 矩陣成分施加活化能包括聚合該黑矩陣成分,使得談矩陣 的頂表面具有疏墨性,而該矩陣的側表面具有親墨性。 29The total weight of the matrix component is about 1 〇 〇 P P m to about 1 0,0 0 0 p pm. 21. The method of claim 15, wherein forming the black matrix component further comprises forming a black matrix component, and wherein the molecular weight of the polymerizable molecule in the black matrix component is between about 1000 Mw to about 10 0,0 0 0 MW weight average molecular weight range. The method of claim 15, wherein applying the activation energy to the black matrix component comprises applying an electron beam to the black matrix component. 23. The method of claim 15 further includes A matrix in the black matrix component is patterned. 28 200815799 24. The method of claim 23, wherein applying the activation energy to the matrix component comprises polymerizing the black matrix component such that the top surface of the matrix has ink repellency and the side surface of the matrix has ink receptivity. 29
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