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TW200719980A - Resist dilution system - Google Patents

Resist dilution system

Info

Publication number
TW200719980A
TW200719980A TW095140798A TW95140798A TW200719980A TW 200719980 A TW200719980 A TW 200719980A TW 095140798 A TW095140798 A TW 095140798A TW 95140798 A TW95140798 A TW 95140798A TW 200719980 A TW200719980 A TW 200719980A
Authority
TW
Taiwan
Prior art keywords
pipe
resist
highly viscous
diluent solvent
dilution system
Prior art date
Application number
TW095140798A
Other languages
Chinese (zh)
Other versions
TWI311078B (en
Inventor
Kimitaka Morio
Toru Hasegawa
Eiji Murobushi
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200719980A publication Critical patent/TW200719980A/en
Application granted granted Critical
Publication of TWI311078B publication Critical patent/TWI311078B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Coating Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The invention provides a resist dilution system equipped with pipes where easy-to-dry liquids such as highly viscous resists flow. A resist dilution system 1 consists of a pipe 3 equipped with a highly viscous resist pipe 3a, a diluent solvent pipe 3b, and a discharger 3e; and a preparation tank 2 for mixing a highly viscous resist fed via the highly viscous resist pipe 3a and discharged via the discharger 3e, and a diluent solvent fed via the diluent solvent pipe 3b and discharged via the discharger 3e. Consequently, highly viscous resists on the pipe are constantly washed away by the diluent solvent during use.
TW095140798A 2005-11-18 2006-11-03 Resist dilution system TW200719980A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005333617A JP4901191B2 (en) 2005-11-18 2005-11-18 Resist dilution system

Publications (2)

Publication Number Publication Date
TW200719980A true TW200719980A (en) 2007-06-01
TWI311078B TWI311078B (en) 2009-06-21

Family

ID=38076213

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095140798A TW200719980A (en) 2005-11-18 2006-11-03 Resist dilution system

Country Status (4)

Country Link
JP (1) JP4901191B2 (en)
KR (1) KR100816319B1 (en)
CN (1) CN100552547C (en)
TW (1) TW200719980A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI466729B (en) * 2007-12-20 2015-01-01 Rave N P Inc Fluid injection assembly for nozzles

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4923882B2 (en) * 2006-09-07 2012-04-25 三菱化学エンジニアリング株式会社 Photoresist supply apparatus and photoresist supply method
WO2009133621A1 (en) * 2008-05-01 2009-11-05 長瀬産業株式会社 Resist liquid diluting apparatus and method of diluting resist liquid
CN102989629A (en) * 2012-10-30 2013-03-27 茅惠杰 Improved device for spraying adhesive onto neutral electrode
JP6237511B2 (en) * 2014-07-11 2017-11-29 東京エレクトロン株式会社 Chemical discharge mechanism, liquid processing apparatus, chemical discharge method, storage medium
CN106179867B (en) * 2016-09-07 2019-05-21 武汉华星光电技术有限公司 Anti-static liquid application system
JP6291676B2 (en) * 2017-05-16 2018-03-14 東京エレクトロン株式会社 Chemical discharge mechanism, liquid processing apparatus, chemical discharge method, storage medium

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4605146A (en) * 1985-02-15 1986-08-12 E. I. Du Pont De Nemours And Company Hydrostatic film support
JPH0443630A (en) * 1990-06-11 1992-02-13 Nec Corp Semiconductor manufacturing equipment
JPH0929158A (en) * 1995-07-18 1997-02-04 Dainippon Screen Mfg Co Ltd Rotary coater
JP3333121B2 (en) * 1996-12-25 2002-10-07 東京エレクトロン株式会社 Coating device
JP3410342B2 (en) * 1997-01-31 2003-05-26 東京エレクトロン株式会社 Coating device
JP2001176776A (en) * 1999-12-16 2001-06-29 Toshiba Corp Device for forming coating film
JP4335470B2 (en) * 2000-03-31 2009-09-30 東京エレクトロン株式会社 Coating device and mixing device
JP3813118B2 (en) * 2002-10-15 2006-08-23 沖電気工業株式会社 Resist processing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI466729B (en) * 2007-12-20 2015-01-01 Rave N P Inc Fluid injection assembly for nozzles

Also Published As

Publication number Publication date
JP4901191B2 (en) 2012-03-21
CN1967385A (en) 2007-05-23
KR20070053100A (en) 2007-05-23
TWI311078B (en) 2009-06-21
JP2007142133A (en) 2007-06-07
CN100552547C (en) 2009-10-21
KR100816319B1 (en) 2008-03-24

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees