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TW200638165A - Method of manufacturing transparent pattern layer - Google Patents

Method of manufacturing transparent pattern layer

Info

Publication number
TW200638165A
TW200638165A TW094112903A TW94112903A TW200638165A TW 200638165 A TW200638165 A TW 200638165A TW 094112903 A TW094112903 A TW 094112903A TW 94112903 A TW94112903 A TW 94112903A TW 200638165 A TW200638165 A TW 200638165A
Authority
TW
Taiwan
Prior art keywords
pattern layer
substrate
transparent pattern
manufacturing transparent
layer
Prior art date
Application number
TW094112903A
Other languages
Chinese (zh)
Other versions
TWI302227B (en
Inventor
Shou-Ling Sui
Chen-Hsien Liao
Original Assignee
Au Optronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Au Optronics Corp filed Critical Au Optronics Corp
Priority to TW94112903A priority Critical patent/TWI302227B/en
Publication of TW200638165A publication Critical patent/TW200638165A/en
Application granted granted Critical
Publication of TWI302227B publication Critical patent/TWI302227B/en

Links

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  • Laminated Bodies (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Position Input By Displaying (AREA)

Abstract

A method of manufacturing a pattern layer is provided. The pattern layer is transparent to visible light and reflects light of particular wavelengths. The method at least comprises following steps: (1) providing a substrate; (2) forming a anti-pattern layer on the substrate, the anti-pattern layer covers a first predetermined portion of the substrate and exposes a second portion of the substrate; (3) forming a multi-layer film to cover the anti-pattern layer and the second portion of the substrate; and (4) removing the anti-pattern layer and a portion of the multi-layer film above it from the substrate.
TW94112903A 2005-04-22 2005-04-22 Method of manufacturing transparent pattern layer TWI302227B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW94112903A TWI302227B (en) 2005-04-22 2005-04-22 Method of manufacturing transparent pattern layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW94112903A TWI302227B (en) 2005-04-22 2005-04-22 Method of manufacturing transparent pattern layer

Publications (2)

Publication Number Publication Date
TW200638165A true TW200638165A (en) 2006-11-01
TWI302227B TWI302227B (en) 2008-10-21

Family

ID=45070434

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94112903A TWI302227B (en) 2005-04-22 2005-04-22 Method of manufacturing transparent pattern layer

Country Status (1)

Country Link
TW (1) TWI302227B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI649893B (en) * 2016-08-17 2019-02-01 位元奈米科技股份有限公司 A method for manufacturing a photoelectric conversion composite layer structure of a photovoltaic cell.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI649893B (en) * 2016-08-17 2019-02-01 位元奈米科技股份有限公司 A method for manufacturing a photoelectric conversion composite layer structure of a photovoltaic cell.

Also Published As

Publication number Publication date
TWI302227B (en) 2008-10-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees