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TW200604172A - Oxime ester compound, photopolymerizable composition and color filter using it - Google Patents

Oxime ester compound, photopolymerizable composition and color filter using it

Info

Publication number
TW200604172A
TW200604172A TW094105432A TW94105432A TW200604172A TW 200604172 A TW200604172 A TW 200604172A TW 094105432 A TW094105432 A TW 094105432A TW 94105432 A TW94105432 A TW 94105432A TW 200604172 A TW200604172 A TW 200604172A
Authority
TW
Taiwan
Prior art keywords
color filter
ester compound
photopolymerizable composition
oxime ester
photopolymerization initiator
Prior art date
Application number
TW094105432A
Other languages
Chinese (zh)
Other versions
TWI378919B (en
Inventor
Junji Mizukami
Yasuhiro Kameyama
Toshiyuki Urano
Original Assignee
Mitsubishi Chem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chem Corp filed Critical Mitsubishi Chem Corp
Publication of TW200604172A publication Critical patent/TW200604172A/en
Application granted granted Critical
Publication of TWI378919B publication Critical patent/TWI378919B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/94—[b, c]- or [b, d]-condensed containing carbocyclic rings other than six-membered
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00—Azomethine dyes
    • C09B55/002—Monoazomethine dyes
    • C09B55/003—Monoazomethine dyes with the -C=N- group attached to an heteroring
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00—Azomethine dyes
    • C09B55/005—Disazomethine dyes
    • C09B55/006—Disazomethine dyes containing at least one heteroring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)

Abstract

An oxime ester compound having a specific structure is provided. Particularly, the oxime ester compound constitutes a photopolymerization initiator (c) of a photopolymerizable composition comprising a black coloring material (a), an organic binder (b) and the photopolymerization initiator (c). It is applicable as a high sensitive photopolymerization initiator. A photopolymerizable composition using it, in the form of a thin film, is excellent in sensitivity and resolution properties even though it has high light shielding properties, and thus it can form a high quality resin black matrix (BM) at a low cost. A color filter using this resin BM is excellent in precision, flatness and durability, and thus it can improve display quality of a liquid crystal element. Further, the production process and the color filter itself are free from toxic substances, and thus the risk to the body can be reduced, and the environment safety improves. It is also applicable to an application in which no coloring material is used, such as photo spacers or ribs (liquid crystal division alignment protrusion).
TW094105432A 2004-02-23 2005-02-23 Oxime ester compound, photopolymerizable composition and color filter using it TWI378919B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004046071 2004-02-23
JP2004094927 2004-03-29
JP2004183593 2004-06-22

Publications (2)

Publication Number Publication Date
TW200604172A true TW200604172A (en) 2006-02-01
TWI378919B TWI378919B (en) 2012-12-11

Family

ID=34890890

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094105432A TWI378919B (en) 2004-02-23 2005-02-23 Oxime ester compound, photopolymerizable composition and color filter using it

Country Status (4)

Country Link
KR (1) KR100897224B1 (en)
CN (2) CN1922142B (en)
TW (1) TWI378919B (en)
WO (1) WO2005080337A1 (en)

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EP1780209B1 (en) * 2004-08-20 2010-03-10 Adeka Corporation Oxime ester compound and photopolymerization initiator containing such compound
JP4408421B2 (en) * 2005-03-18 2010-02-03 富士フイルム株式会社 Dye-containing negative curable composition, color filter and method for producing the same
JP4633582B2 (en) * 2005-09-06 2011-02-16 東京応化工業株式会社 Photosensitive composition
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TWI406840B (en) * 2006-02-24 2013-09-01 Fujifilm Corp Oxime derivative, photopolymerizable composition, color filter, and process for producing the same
US8293436B2 (en) 2006-02-24 2012-10-23 Fujifilm Corporation Oxime derivative, photopolymerizable composition, color filter, and process for producing the same
JP5354863B2 (en) * 2006-02-24 2013-11-27 富士フイルム株式会社 Oxime derivative, photopolymerizable composition, color filter and method for producing the same
TWI403840B (en) 2006-04-26 2013-08-01 Fujifilm Corp Dye-containing negative curable composition, color filter and method for producing the same
KR100787853B1 (en) * 2006-08-16 2007-12-27 주식회사 동진쎄미켐 Acrylic photoresist monomer, polymer and photoresist composition comprising the same
WO2008078678A1 (en) 2006-12-27 2008-07-03 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the compound
KR20090104877A (en) * 2007-01-23 2009-10-06 후지필름 가부시키가이샤 Oxime compound, photosensitive composition, color filter, manufacturing method thereof and liquid crystal display device
EP2144900B1 (en) * 2007-05-11 2015-03-18 Basf Se Oxime ester photoinitiators
US8349548B2 (en) 2007-05-11 2013-01-08 Basf Se Oxime ester photoinitiators
EP2144876B1 (en) 2007-05-11 2012-09-12 Basf Se Oxime ester photoinitiators
TWI436163B (en) 2007-07-17 2014-05-01 Fujifilm Corp Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
KR101007440B1 (en) 2007-07-18 2011-01-12 주식회사 엘지화학 Dendritic photoactive compound containing oxime ester and its preparation method
JP2009040762A (en) * 2007-08-09 2009-02-26 Ciba Holding Inc Oxime ester photo-initiator
JP5496482B2 (en) * 2007-08-27 2014-05-21 富士フイルム株式会社 Novel compound, photopolymerizable composition, photopolymerizable composition for color filter, color filter and method for producing the same, solid-state imaging device, and lithographic printing plate precursor
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KR101546103B1 (en) 2010-08-12 2015-08-20 주식회사 엘지화학 Photoactive compound containing a silyl group and photosensitive resin composition comprising the same
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
KR101831912B1 (en) 2010-10-05 2018-02-26 바스프 에스이 Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
JP5606869B2 (en) * 2010-10-22 2014-10-15 富士フイルム株式会社 Photopolymerizable composition, color filter and method for producing the same, low refractive index cured film, solid-state imaging device, and novel compound
WO2012101245A1 (en) 2011-01-28 2012-08-02 Basf Se Polymerizable composition comprising an oxime sulfonate as thermal curing agent
KR101469519B1 (en) * 2011-10-07 2014-12-08 (주)경인양행 Oxim ester Compound, and Photopolymerization initiator Comprising the Same
JP6113181B2 (en) 2011-12-07 2017-04-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ Oxime ester photoinitiator
JP5890297B2 (en) * 2011-12-22 2016-03-22 東京応化工業株式会社 Photosensitive resin composition, color filter and display device using the same, oxime ester compound, and photopolymerization initiator
EP2829534B1 (en) * 2012-03-22 2019-10-09 Adeka Corporation Novel compound and photosensitive resin composition
KR101489067B1 (en) 2012-05-30 2015-02-04 주식회사 엘지화학 Photoactive compound and photosensitive resin composition comprising the same
WO2013180419A1 (en) * 2012-05-30 2013-12-05 주식회사 엘지화학 Photoactive compound and light-sensitive resin composition comprising same
EP2855598B1 (en) 2012-06-01 2017-01-11 Basf Se Black colorant mixture
CN103293855B (en) * 2013-05-20 2015-12-23 常州强力先端电子材料有限公司 A kind of esters of acrylic acid Photocurable composition
KR102282647B1 (en) 2013-09-10 2021-07-28 바스프 에스이 Oxime ester photoinitiators
WO2016030790A1 (en) 2014-08-29 2016-03-03 Basf Se Oxime sulfonate derivatives
TWI761230B (en) * 2015-12-08 2022-04-11 日商富士軟片股份有限公司 Radiation-sensitive resin composition, cured film, pattern forming method, solid-state imaging element, and image display device
EP3246378B1 (en) * 2016-05-17 2019-03-20 Merck Patent GmbH Polymerisable liquid crystal material and polymerised liquid crystal film
KR20180014982A (en) * 2016-08-02 2018-02-12 동우 화인켐 주식회사 Carbazole Derivatives and Photocurable Composition Comprising the Same
CN111417623B (en) * 2017-12-13 2025-01-07 株式会社艾迪科 Compound, latent base generator, photosensitive resin composition containing the compound and cured product
CN119874207A (en) 2018-02-23 2025-04-25 巴斯夫欧洲公司 Organically modified metal oxide or metalloid oxide polymer films
CN112313290B (en) 2018-06-25 2022-11-04 太阳化学有限公司 Red pigment composition for color filter
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
DE112020002202T5 (en) 2019-06-21 2022-01-20 IGM (Anqing) High Technology Development Co., Ltd. Novel diaroylcarbazole compound and use of the same as a sensitizer
CN112111028A (en) 2019-06-21 2020-12-22 江苏英力科技发展有限公司 Photoinitiator composition containing acylcarbazole derivative and carbazolyl oxime ester and application of photoinitiator composition in photocuring composition
WO2021125132A1 (en) * 2019-12-20 2021-06-24 株式会社Adeka Carbamoyl oxime compound, and polymerization initiator and polymerizable composition containing said compound
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WO2025011754A1 (en) 2023-07-10 2025-01-16 Basf Se Photocurable as well as thermally curable compositions suitable for low temperature curing

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Also Published As

Publication number Publication date
KR100897224B1 (en) 2009-05-14
CN1922142A (en) 2007-02-28
CN1922142B (en) 2012-05-02
WO2005080337A1 (en) 2005-09-01
CN101805282A (en) 2010-08-18
CN101805282B (en) 2012-07-04
KR20070100810A (en) 2007-10-11
TWI378919B (en) 2012-12-11

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