TW200502262A - Curing resin composition and its uses - Google Patents
Curing resin composition and its usesInfo
- Publication number
- TW200502262A TW200502262A TW093106345A TW93106345A TW200502262A TW 200502262 A TW200502262 A TW 200502262A TW 093106345 A TW093106345 A TW 093106345A TW 93106345 A TW93106345 A TW 93106345A TW 200502262 A TW200502262 A TW 200502262A
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- curing resin
- component
- curing
- polymer
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title abstract 5
- 229920000642 polymer Polymers 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 125000003700 epoxy group Chemical group 0.000 abstract 1
- 150000002170 ethers Chemical class 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 230000000379 polymerizing effect Effects 0.000 abstract 1
Classifications
-
- A—HUMAN NECESSITIES
- A63—SPORTS; GAMES; AMUSEMENTS
- A63H—TOYS, e.g. TOPS, DOLLS, HOOPS OR BUILDING BLOCKS
- A63H1/00—Tops
- A63H1/28—Musical tops
-
- A—HUMAN NECESSITIES
- A63—SPORTS; GAMES; AMUSEMENTS
- A63H—TOYS, e.g. TOPS, DOLLS, HOOPS OR BUILDING BLOCKS
- A63H1/00—Tops
- A63H1/20—Tops with figure-like features; with movable objects, especially figures
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Epoxy Resins (AREA)
- Optical Filters (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
Abstract
There is disclosed a curing resin composition which can form a coating film that is extremely excellent not only in the heat resistance but also in the transparency. The curing resin composition is a curing resin composition which comprises a polymer component (A) and a curing component (B), wherein the curing component (B) includes at least one selected from among compounds (b1) having a radically polymerizable double bond and compounds (b2) having an epoxy group, with the curing resin composition being characterized in that the polymer component (A) is a polymer (a) which is formed by polymerizing a monomer component including a specific ether dimer as an essential component.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003092597A JP4142973B2 (en) | 2003-03-28 | 2003-03-28 | Curable resin composition and use thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200502262A true TW200502262A (en) | 2005-01-16 |
TWI282796B TWI282796B (en) | 2007-06-21 |
Family
ID=33405641
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093106345A TWI282796B (en) | 2003-03-28 | 2004-03-10 | Curing resin composition and its uses |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4142973B2 (en) |
KR (1) | KR100685229B1 (en) |
CN (1) | CN1269921C (en) |
TW (1) | TWI282796B (en) |
Families Citing this family (36)
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TWI387777B (en) * | 2006-04-06 | 2013-03-01 | Nippon Catalytic Chem Ind | Optical film and manufacturing method for same |
JP2008056867A (en) * | 2006-09-04 | 2008-03-13 | The Inctec Inc | Pigment dispersion and colored photosensitive composition |
EP1975702B1 (en) * | 2007-03-29 | 2013-07-24 | FUJIFILM Corporation | Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device |
JP4296225B2 (en) * | 2007-07-18 | 2009-07-15 | 株式会社日本触媒 | New polymer |
JP5187492B2 (en) * | 2007-11-22 | 2013-04-24 | Jsr株式会社 | Curable resin composition, protective film and method for forming protective film |
JP2009244619A (en) * | 2008-03-31 | 2009-10-22 | Fujifilm Corp | Color filter and method of manufacturing the same, and liquid crystal display device |
JP5201066B2 (en) * | 2008-06-19 | 2013-06-05 | Jsr株式会社 | Radiation sensitive resin composition for forming protective film of touch panel and method for forming the same |
JP5617177B2 (en) * | 2009-03-27 | 2014-11-05 | 東洋インキScホールディングス株式会社 | Coloring composition for color filter and color filter |
JP5701576B2 (en) | 2009-11-20 | 2015-04-15 | 富士フイルム株式会社 | Dispersion composition, photosensitive resin composition, and solid-state imaging device |
JP2012003225A (en) | 2010-01-27 | 2012-01-05 | Fujifilm Corp | Polymerizable composition for solder resist and method for forming solder resist pattern |
JP5617329B2 (en) * | 2010-04-28 | 2014-11-05 | 東洋インキScホールディングス株式会社 | Photosensitive resin composition and insulating film for touch panel |
US8152863B2 (en) | 2010-06-01 | 2012-04-10 | Fujifilm Corporation | Pigment dispersion composition, red colored composition, colored curable composition, color filter for a solid state imaging device and method for producing the same, and solid state imaging device |
JP5615123B2 (en) * | 2010-10-12 | 2014-10-29 | 株式会社日本触媒 | Polymer and its use |
JP5191553B2 (en) * | 2011-02-17 | 2013-05-08 | 富士フイルム株式会社 | Colored radiation-sensitive composition, method for producing color filter, color filter, and solid-state imaging device |
JP5679860B2 (en) * | 2011-02-23 | 2015-03-04 | 富士フイルム株式会社 | Colored radiation-sensitive composition, color filter, method for producing the color filter, and solid-state imaging device |
JP5417364B2 (en) | 2011-03-08 | 2014-02-12 | 富士フイルム株式会社 | Curable composition for solid-state imaging device, photosensitive layer, permanent pattern, wafer level lens, solid-state imaging device, and pattern forming method using the same |
KR101622990B1 (en) | 2011-09-14 | 2016-05-20 | 후지필름 가부시키가이샤 | Colored radiation-sensitive composition for color filter, pattern forming method, color filter and method of producing the same, and solid-state image sensor |
JP5976523B2 (en) | 2011-12-28 | 2016-08-23 | 富士フイルム株式会社 | Optical member set and solid-state imaging device using the same |
JP5922013B2 (en) | 2011-12-28 | 2016-05-24 | 富士フイルム株式会社 | Optical member set and solid-state imaging device using the same |
JP2013167786A (en) * | 2012-02-16 | 2013-08-29 | Mitsubishi Chemicals Corp | Curable resin composition for organic insulating film, cured material, tft active matrix substrate, and liquid-crystal display |
JP5934664B2 (en) | 2012-03-19 | 2016-06-15 | 富士フイルム株式会社 | Colored radiation-sensitive composition, colored cured film, color filter, colored pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device |
JP5775479B2 (en) | 2012-03-21 | 2015-09-09 | 富士フイルム株式会社 | Colored radiation-sensitive composition, colored cured film, color filter, pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device |
WO2014084147A1 (en) * | 2012-11-29 | 2014-06-05 | 富士フイルム株式会社 | Composition, infrared pass filter and method for fabricating same, and infrared sensor |
JP6302650B2 (en) | 2012-11-30 | 2018-03-28 | 富士フイルム株式会社 | Curable resin composition, method for forming dye-containing layer using the same, method for producing image sensor chip, and image sensor chip |
WO2014084288A1 (en) | 2012-11-30 | 2014-06-05 | 富士フイルム株式会社 | Curable resin composition, and image-sensor-chip production method and image sensor chip using same |
JP6170673B2 (en) | 2012-12-27 | 2017-07-26 | 富士フイルム株式会社 | Composition for color filter, infrared transmission filter, method for producing the same, and infrared sensor |
KR20150090142A (en) | 2012-12-28 | 2015-08-05 | 후지필름 가부시키가이샤 | Curable resin composition for forming infrared-reflecting film, infrared-reflecting film and manufacturing method therefor, infrared cut-off filter, and solid-state imaging element using same |
JP6166050B2 (en) * | 2013-02-01 | 2017-07-19 | 株式会社日本触媒 | Ether dimer composition and polymer |
JP6062876B2 (en) * | 2013-02-28 | 2017-01-18 | 富士フイルム株式会社 | Composition for forming transparent resin layer, transparent resin layer, solid-state imaging device and optoelectronic device |
JP6097128B2 (en) | 2013-04-12 | 2017-03-15 | 富士フイルム株式会社 | Far infrared light shielding layer forming composition |
JP6177204B2 (en) * | 2013-09-02 | 2017-08-09 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | Photosensitive resin composition, color filter using the same, and liquid crystal display device |
JP6162084B2 (en) | 2013-09-06 | 2017-07-12 | 富士フイルム株式会社 | Colored composition, cured film, color filter, method for producing color filter, solid-state imaging device, image display device, polymer, xanthene dye |
KR101917406B1 (en) * | 2014-03-21 | 2018-11-09 | 동우 화인켐 주식회사 | Photosensitive resin composition, color filter with high color reproducing and liquid crystal display device using the same |
EP3418313B1 (en) * | 2016-02-15 | 2020-09-02 | Okamoto Chemical Industry Co., Ltd | Composition optical three-dimensional molding |
JP6475783B2 (en) * | 2017-06-22 | 2019-02-27 | 株式会社日本触媒 | Ether dimer composition and polymer |
WO2021039205A1 (en) | 2019-08-29 | 2021-03-04 | 富士フイルム株式会社 | Composition, film, near-infrared cut-off filter, pattern formation method, laminate, solid-state imaging element, infrared sensor, image display device, camera module and compound |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100263906B1 (en) * | 1998-06-02 | 2000-09-01 | 윤종용 | Photosensitive polymer having backbone of cyclic structure and resist composition comprising the same |
KR100281903B1 (en) | 1998-12-24 | 2001-03-02 | 윤종용 | Photosensitive polymer having a cyclic structure of the backbone and a resist composition comprising the same |
-
2003
- 2003-03-28 JP JP2003092597A patent/JP4142973B2/en not_active Expired - Lifetime
-
2004
- 2004-03-10 TW TW093106345A patent/TWI282796B/en not_active IP Right Cessation
- 2004-03-25 KR KR1020040020335A patent/KR100685229B1/en active IP Right Grant
- 2004-03-26 CN CNB2004100312847A patent/CN1269921C/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2004300204A (en) | 2004-10-28 |
CN1542067A (en) | 2004-11-03 |
TWI282796B (en) | 2007-06-21 |
KR100685229B1 (en) | 2007-02-22 |
JP4142973B2 (en) | 2008-09-03 |
KR20040084825A (en) | 2004-10-06 |
CN1269921C (en) | 2006-08-16 |
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Legal Events
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MK4A | Expiration of patent term of an invention patent |