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TW200508812A - Optical illumination device, exposure device and exposure method - Google Patents

Optical illumination device, exposure device and exposure method

Info

Publication number
TW200508812A
TW200508812A TW093116640A TW93116640A TW200508812A TW 200508812 A TW200508812 A TW 200508812A TW 093116640 A TW093116640 A TW 093116640A TW 93116640 A TW93116640 A TW 93116640A TW 200508812 A TW200508812 A TW 200508812A
Authority
TW
Taiwan
Prior art keywords
aspect ratio
exposure
illumination device
optical illumination
variation means
Prior art date
Application number
TW093116640A
Other languages
English (en)
Chinese (zh)
Inventor
Hisashi Nishinaga
Yuji Kudo
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200508812A publication Critical patent/TW200508812A/zh

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70066Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/7015Details of optical elements
    • G03F7/70158Diffractive optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW093116640A 2003-06-16 2004-06-10 Optical illumination device, exposure device and exposure method TW200508812A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003170128 2003-06-16
JP2004150366 2004-05-20

Publications (1)

Publication Number Publication Date
TW200508812A true TW200508812A (en) 2005-03-01

Family

ID=33554420

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093116640A TW200508812A (en) 2003-06-16 2004-06-10 Optical illumination device, exposure device and exposure method

Country Status (3)

Country Link
JP (1) JPWO2004112107A1 (ja)
TW (1) TW200508812A (ja)
WO (1) WO2004112107A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115453766A (zh) * 2022-11-11 2022-12-09 南京英田光学工程股份有限公司 一种变高宽比扩束镜头以及含有该镜头的激光通信终端

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036108A1 (nl) 2007-11-09 2009-05-12 Asml Netherlands Bv Device Manufacturing Method and Lithographic Apparatus, and Computer Program Product.
NL2017493B1 (en) * 2016-09-19 2018-03-27 Kulicke & Soffa Liteq B V Optical beam homogenizer based on a lens array
KR102541300B1 (ko) * 2020-08-25 2023-06-09 세메스 주식회사 기판 처리 장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3295956B2 (ja) * 1992-03-05 2002-06-24 株式会社ニコン 露光装置及び半導体素子の製造方法
JPH11271619A (ja) * 1998-03-19 1999-10-08 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2002231619A (ja) * 2000-11-29 2002-08-16 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2003068604A (ja) * 2001-08-23 2003-03-07 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2003142387A (ja) * 2001-11-07 2003-05-16 Nikon Corp 照明光学装置、露光装置および露光方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115453766A (zh) * 2022-11-11 2022-12-09 南京英田光学工程股份有限公司 一种变高宽比扩束镜头以及含有该镜头的激光通信终端

Also Published As

Publication number Publication date
WO2004112107A1 (ja) 2004-12-23
JPWO2004112107A1 (ja) 2006-07-27

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