TW200508812A - Optical illumination device, exposure device and exposure method - Google Patents
Optical illumination device, exposure device and exposure methodInfo
- Publication number
- TW200508812A TW200508812A TW093116640A TW93116640A TW200508812A TW 200508812 A TW200508812 A TW 200508812A TW 093116640 A TW093116640 A TW 093116640A TW 93116640 A TW93116640 A TW 93116640A TW 200508812 A TW200508812 A TW 200508812A
- Authority
- TW
- Taiwan
- Prior art keywords
- aspect ratio
- exposure
- illumination device
- optical illumination
- variation means
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70158—Diffractive optical elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microscoopes, Condenser (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003170128 | 2003-06-16 | ||
JP2004150366 | 2004-05-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200508812A true TW200508812A (en) | 2005-03-01 |
Family
ID=33554420
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093116640A TW200508812A (en) | 2003-06-16 | 2004-06-10 | Optical illumination device, exposure device and exposure method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2004112107A1 (ja) |
TW (1) | TW200508812A (ja) |
WO (1) | WO2004112107A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115453766A (zh) * | 2022-11-11 | 2022-12-09 | 南京英田光学工程股份有限公司 | 一种变高宽比扩束镜头以及含有该镜头的激光通信终端 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL1036108A1 (nl) | 2007-11-09 | 2009-05-12 | Asml Netherlands Bv | Device Manufacturing Method and Lithographic Apparatus, and Computer Program Product. |
NL2017493B1 (en) * | 2016-09-19 | 2018-03-27 | Kulicke & Soffa Liteq B V | Optical beam homogenizer based on a lens array |
KR102541300B1 (ko) * | 2020-08-25 | 2023-06-09 | 세메스 주식회사 | 기판 처리 장치 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3295956B2 (ja) * | 1992-03-05 | 2002-06-24 | 株式会社ニコン | 露光装置及び半導体素子の製造方法 |
JPH11271619A (ja) * | 1998-03-19 | 1999-10-08 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
JP2002231619A (ja) * | 2000-11-29 | 2002-08-16 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
JP2003068604A (ja) * | 2001-08-23 | 2003-03-07 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
JP2003142387A (ja) * | 2001-11-07 | 2003-05-16 | Nikon Corp | 照明光学装置、露光装置および露光方法 |
-
2004
- 2004-06-10 WO PCT/JP2004/008096 patent/WO2004112107A1/ja active Application Filing
- 2004-06-10 TW TW093116640A patent/TW200508812A/zh unknown
- 2004-06-10 JP JP2005506913A patent/JPWO2004112107A1/ja not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115453766A (zh) * | 2022-11-11 | 2022-12-09 | 南京英田光学工程股份有限公司 | 一种变高宽比扩束镜头以及含有该镜头的激光通信终端 |
Also Published As
Publication number | Publication date |
---|---|
WO2004112107A1 (ja) | 2004-12-23 |
JPWO2004112107A1 (ja) | 2006-07-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE540424T1 (de) | Optisches beleuchtungsgerät, belichtungsgerät und belichtungsverfahren | |
AU2001270833A1 (en) | Diffractive device | |
TW200511392A (en) | Illumination optical system and exposure apparatus using the same | |
WO2005026843A3 (en) | Illumination system for a microlithography projection exposure installation | |
TW200628928A (en) | Brightness enhancement article | |
DE502004004769D1 (de) | Adapter zum koppeln einer laserbearbeitungsvorrichtung mit einem objekt | |
EP1602981A3 (en) | Illumination optical system and exposure apparatus | |
DE60235025D1 (de) | Vorrichtung zum beleuchten einer allgemein flachen fläche | |
DE60235372D1 (de) | Gerät und verfahren zur regulierung der beleuchtung oder bildverstärkung in einer bildgebenden vorrichtung in vivo | |
WO2004008022A3 (en) | Method and apparatus for uniform lighting source | |
HUP0300308A2 (en) | Illumination device | |
WO2003021352A1 (fr) | Reticule et procede de mesure de caracteristiques optiques | |
ATE424787T1 (de) | Intraokularvorrichtung mit fokussierstärken/optiken | |
DE69921796D1 (de) | Beleuchtungsvorrichtung für nicht-emitierende anzeige | |
CA2390781A1 (en) | Line generator optical apparatus | |
DE60142022D1 (de) | Vorrichtung und verfahren zur ausrichtung von riemenscheiben | |
ATE360783T1 (de) | Beleuchtungsverfahren und -vorrichtung | |
DE60219404D1 (de) | Beleuchtungsvorrichtung | |
EP1164407A3 (en) | Illumination system and scanning exposure apparatus using the same | |
WO2007140348A3 (en) | Energy efficient illumination for a light source inthe form of a surface | |
DE59608551D1 (de) | Vorrichtung zur linienförmigen Beleuchtung von Blattgut, wie z.B. Banknoten oder Wertpapiere | |
TW200833999A (en) | Lighting device and lighting method | |
HK1047410A1 (en) | Device and method for controlling the quality of microdroplets deposited on a substrate. | |
EP0886163A3 (de) | Strichplatte und optische Einrichtung mit einer beleuchtbaren Strichplatte | |
TW200508812A (en) | Optical illumination device, exposure device and exposure method |