TW200417764A - Ceramic optical sub-assembly for opto-electronic module utilizing LTCC (low-temperature co-fired ceramic) technology - Google Patents
Ceramic optical sub-assembly for opto-electronic module utilizing LTCC (low-temperature co-fired ceramic) technology Download PDFInfo
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200417764 (1) 玖、發明說明 有關專利及申請書之對照參考 本申請書爲於2 0 0 0年5月9日所提出之題爲”可行列 ,可伸縮,及可堆疊之模塑封裝構造”之美專利申請書 09/568,558號(律師案號NSCIP156),及於2002年6月 6日所提出之題爲’’光電模組之光學副組件”之美專利申請 書1 0/ 1 65,5 5 3號(律師案號NSCIP212)之後續部份,後 者申請於 200 1年 8月3日所提出之美臨時申請書 6 0/3 3 1,3 3 9號之優先權,此等各列作參考。 本申請書係有關於2000年5月9日所提出之題爲”提 供真正半導體晶粒於外部光纖纜連接之裝置及方法”之美 專利6,364,542號,於2000年11月14日所提出之題爲” 小型光電收訊機’’之美專利申請書〇9/7 1 3,3 6 7號(律師案 號NSCIP180),於200 1年8月3日所提出之題爲”光電 裝置之小型半導體封裝”之美專利申請書0 9/922,3 5 8號( 律師案號NSCIP204),於2001年8月3日所提出之題爲 ”連接光電模組於半導體封裝之技術 ”之美專利申請書〇9/947,2 1 0號(律師案號NSCIP205 ),及於2002年11月6日所提出之題爲”光學裝置之二 層電基體”之美專利申請書1 0/290,4 8 1號(律師案號 NSCIP247 ),此等內容各列作參考。 本申請書亦係有關於2002年6月6日所提出之題爲” 光電模組之陶瓷光學副組件”之美專利申請書10/;! 65,71 i 號(律師案號 NSCIP212X1 ),此爲美專利申請書 (2) (2)200417764 1 0/1 6 5,5 5 3號之後續部份,此列作參考。 【發明所屬之技術領域】 本發明一般係有關連接光及電裝置組成件之技術。更 明確言之,本發明係有關用於光學副組件上之LTCC (低 溫共燒製陶瓷)結構。 【先前技術】 目前所建造之許多電腦及通訊網路,包含網際網路使 用光纖纜取代銅線。由光纖纜,資料使用光信號,而非電 信號傳輸。例如,邏輯1可由特定持續時間及頻率之一光 脈波代表,邏輯〇可由同持續時間之一光脈波之不存在代 表。光纖具有遠較銅線爲大之頻帶寬之優點。 雖光纖纜用以轉移資料非常有效,但光信號之使用於 處理資料非常困難。例如,目前並無有效之方法來”儲存” 代表資料之光信號。網路故此使用光纖來發送資料於節點 之間,及使用矽晶片處理電腦節點內之資料。此由使用光 纖收發訊機達成,此變換來光纖纜之光信號爲電信號,及 反之亦然。圖1顯示一示範光電模組1 0 0之透視圖,此可 用以構成光收發訊機。 光電模組100包含一半導體晶片副組件(CS A ) 102 及一光學副組件(OSA) 104aCSA102爲一封裝之半導體 裝置。如顯示於圖1,C S A 1 0 2爲模塑材料1 0 6之一方形 塊件,此具有電接觸點1 0 8通過其底及側表面露出。在模 (3) (3)200417764 塑材料1 06之塊件內爲一半導體晶粒,此電連接至接觸點 108。例如,可使用黏接線於此連接。不得見之CS A102 之另一方面爲在CS A 102之頂表面上之上鏈接觸點。上鏈 接觸點亦電連接至包裹之半導體晶粒,且故此提供半導體 晶粒及OS A 104間之電連通。所示之特定CS A 102爲無引 線前框半導體封裝(LLP )。然而,應明瞭CSA102可製 成各種模塑之封裝。 一普通OSA104包含一普通支持塊110,一電路基體 112,及光子裝置114。支持塊110具有一前表面116,此 支持電基體112及光子裝置114,此等連接於電路基體 1 1 2。一普通支持塊1 1 0可爲多種材料,諸如陶瓷材料, 聚乙烯醚酮(PEEK ),或液晶聚合物(LCP )所製。普通 OS A之104及支持塊104之例爲精於本藝之人士所知。此 一普通支持塊之普通實例說明於例如於2002年6月6曰 所提出之題爲”光電模組之陶瓷光學副組件”之美專利申請 書 10/165,711 號(律師案號 NSCIP212X1)。 在普通實施中,電路基體1 1 2連接於支持塊1 1 0之前 表面116上,包圍支持塊110之底前角,並覆蓋支持塊 1 1 0之大部份底表面。電路基體1 1 2之線跡自前表面上之 光子裝置1 1 4延伸至支持塊1 1 〇之底表面,在此,此等接 觸C S A 1 0 2之上鏈接觸點。爲增加可能之電連接數至最大 程度,以上裝置之體積小。然而,即使體積製小,電路基 體1 1 2僅構製於支持塊1 1 〇之表面處(或在一*些實施,二 層深),限制可構製自光子裝置1 1 4至C S A 1 〇 2之接觸點 (4) 200417764 之電連接總數。 而且’此表面安裝電路基體112可遭受 通貝施中’電路基體所涉及之體積小,並使 相互密切設置。體積小同樣有優點,大部電 小。然而’線跡之密切接近可引起”串擾”, 作頻率上。串擾爲二或更多導電元件間之電 可嚴重降低光電裝置1 〇 〇之性能。 圖2槪要顯示普通支持塊204 (顛倒顯 低面201及一前面202。光子裝置214普通 204之前面上,並電連接至底面201上之接 子裝置2 1 4使用表面金屬化技術電連接至接 子裝置2 1 4普通使用電線跡(或引線)2 1 6 墊2 1 5,線跡構製於支持塊2 0 4所附著之一 。此實施之一問題爲電線跡2 1 6易於在該帶 2 04之邊緣上處失效。 鑒於上述,需要一種有效之技術,用以 置之光子裝置至關聯之半導體晶片裝置之高 俾該連接呈現高電路密度及低串擾程度。 【發明內容】 本發明之目的爲一種高性能及小型電路 ,用於光學副組件。在一實施例,構製一: OSA ),適用於與光纖光互接及與晶片副組 互接。OS A包含一陶瓷塊,具有一第二表面 M串擾’’。在普 電路線跡非常 子裝置之體積 尤其是在高操 干擾。此串擾 示),顯示一 構製於支持塊 觸墊2 1 5。光 觸塾2 1 5。光 電連接至接觸 特殊接觸帶上 彎曲於支持塊 構製自光學裝 密度電連接, 基體及支持塊 光學副組件( 件(C S A )電 及一第二表面 (5) (5)200417764 ,陶瓷塊使用低溫共燒製陶瓷(LTCC )及高溫共燒製陶 瓷(Η T C C )技術之一製造。光子裝置構製於陶瓷塊之第 一表面上,及電接觸點構製於陶瓷塊之第二表面上。電接 觸點適於電連通於晶片副組件。而且,構製電連接,俾此 等通過陶瓷塊內部,以電互接陶瓷塊之第一面上之光子裝 置於陶瓷塊之第二面上之電接觸點。 另一實施例包含一陶瓷塊,具有一第〜面及一第二面 。陶瓷塊使用低溫共燒製陶瓷(LTCC )及高溫共燒製陶 瓷(HTCC)技術之一'製造。陶瓷塊之第一面具有至少一· 光子裝置構製於其上。接觸墊構製於陶瓷塊之第二面上。 陶瓷塊亦包含電連接,此電連接至光子裝置,並通過陶瓷 塊之內部,俾電連接可電連接光子裝置至晶片副組件( CSA )。電連接可包含信號連接及地連接。而且,實施例 可包含內部屏蔽層。陶瓷塊之構造可經設計,俾減少串擾 ’呈現低度之地跳躍及電寄生,及可獲得最佳之阻抗程度 。可利用電路基體,以構製光學副組件。 在另一實施例,陶瓷塊包含多個陶瓷層,使用低溫共 燒製陶瓷(LTCC )及高溫共燒製陶瓷(HTCC )技術之一 製造。陶瓷塊包含一前表面及一底表面。陶瓷塊之前表面 包含與多個光子裝置接觸之多個接觸墊。底表面包含多個 焊墊。陶瓷塊另包含內部電接觸平面,具有至少一電接觸 線構製於其上,俾至少一電接觸線通過陶瓷塊之內部’並 電連通於接觸墊及關聯之焊墊。接觸墊具有黏接線’用以 電連接接觸墊及光子裝置。陶瓷塊亦包含至少一內部地平 (6) (6)200417764 面,具有至少一地接觸線構製於其上,俾至少一地接觸線 通過陶瓷塊內部,並電連通於所選之焊墊。模組另包含半 導體晶片副組件(CSA ),具有頂表面,此曝露上鏈接觸 點,當陶瓷塊置於C S A之頂表面上時,此等與陶瓷塊之 底表面上所構製之焊墊電接觸。 在以下本發明之說明及附圖中,更詳細提出本發明之 此等及其他特色及優點,此等以實例顯示本發明之原理。 應明瞭附圖中相同之編號指相同之結構元件。且應明 瞭各圖無需依比例顯示。 【實施方式】 現參考附圖所示之之較宜實施例,詳細說明本發明。 在以下說明中,提出許多特定細節,以便澈底明瞭本發明 。然而’精於本藝之人士顯然明瞭,可實施本發明,而無 一些或所有此等特定細節。在其他情形,未詳細說明熟悉 之操作,俾不致不必要地模糊本發明。 光學副組件中所用之現有技術之限制之一爲需構製光 t ^:置及其下之晶片副組件(C S A )間之所有電互接,使 用金屬化技術,此構製一或至多二層深度之電互接結構。 此導致限制電接觸密度,且導致各種電互接間之許多串擾 問題。現行技術中之串擾可高至7 5 %。而且,隨資料傳輸 率之增加,該問題可能增加。200417764 (1) 玖. Cross-references to related patents and applications for the description of the invention This application is entitled “Feasibility, Scalable, and Stackable Molded Package Structure”, which was put forward on May 9, 2000. "US Patent Application No. 09 / 568,558 (lawyer case number NSCIP156), and US Patent Application entitled" Optical Subassembly of Optoelectronic Module "filed on June 6, 2002 1 0/1 65,5 The subsequent part of No. 5 (Lawyer Case No. NSCIP212), which applied for the priority of US Provisional Application No. 6 0/3 3 1, 3 3 9 filed on August 3, 2001. For reference, this application is related to US Patent No. 6,364,542 entitled "Apparatus and Method for Providing Real Semiconductor Die to External Optical Fiber Cable Connection" on May 9, 2000, and was filed on November 14, 2000 US Patent Application No. 09/7 1 3,3 6 7 (Lawyer Case No. NSCIP180) entitled "Small Optoelectronic Receiver", filed August 3, 2001 entitled "Small Optoelectronic Device "Semiconductor Package" US Patent Application No. 0 9 / 922,3 5 8 (Lawyer Case No. NSCIP204), August 3, 2001 The US patent application entitled "Technology for Connecting Optoelectronic Modules to Semiconductor Packaging" No. 09/947, 2 10 (lawyer case number NSCIP205), and the title proposed on November 6, 2002 290,4. 8 1 US Patent application Layer of the electrical-optical device substrate "and 10 / (attorney docket No. NSCIP247), each incorporated by reference for such content. This application is also related to the US patent application No. 10 / ;! 65,71 i (lawyer case number NSCIP212X1) entitled "Ceramic Optical Subassembly of Photoelectric Module" filed on June 6, 2002. The subsequent parts of US Patent Application (2) (2) 200417764 1 0/1 6 5,5 5 3 are listed here for reference. [Technical Field to which the Invention belongs] The present invention generally relates to a technology for connecting components of optical and electrical devices. More specifically, the present invention relates to an LTCC (Low Temperature Cofired Ceramic) structure for use in an optical subassembly. [Previous Technology] Many computer and communication networks currently being built, including the Internet, use fiber optic cables instead of copper wires. With fiber optic cables, data is transmitted using optical signals rather than electrical signals. For example, logic 1 may be represented by a pulse of light of a particular duration and frequency, and logic 0 may be represented by the absence of a pulse of light of the same duration. Optical fiber has the advantage of a much larger frequency bandwidth than copper wire. Although fiber optic cables are very effective at transferring data, the use of optical signals to process data is very difficult. For example, there is currently no effective way to "store" the light signal representing the data. The network therefore uses fiber optics to send data between nodes and a silicon chip to process data within computer nodes. This is achieved by using an optical fiber transceiver, and the optical signal converted from the optical fiber cable is an electrical signal, and vice versa. Figure 1 shows a perspective view of an exemplary photovoltaic module 100, which can be used to form an optical transceiver. The optoelectronic module 100 includes a semiconductor wafer sub-assembly (CS A) 102 and an optical sub-assembly (OSA) 104a. The CSA 102 is a packaged semiconductor device. As shown in FIG. 1, C S A 1 0 2 is a square block of a molding material 10 6, which has electrical contact points 108 exposed through its bottom and side surfaces. In the die (3) (3) 200417764 plastic material 106 is a semiconductor die, which is electrically connected to the contact point 108. For example, a sticky wire can be used for this connection. Not see the other hand to link the CS A102 contact over the CS A 102 on the top surface. The contact point of the chain is also electrically connected to the semiconductor die of the package, and therefore provides electrical connection between the semiconductor die and the OS A 104 communication. CS A specific non-shown lead wires 102 of the front frame of a semiconductor package (LLP). However, it should be understood that CSA102 can be made into a variety of molded packages. A common OSA 104 includes a common support block 110, a circuit substrate 112, and a photonic device 114. Support block 110 having a front surface 116, photonic devices 112 and this support substrate 114 is electrically, connected to the circuit substrate such 112. A common support block 110 can be made of various materials, such as ceramic materials, polyvinyl ether ketone (PEEK), or liquid crystal polymer (LCP). Examples of ordinary OS A 104 and support block 104 are known to those skilled in the art. A common example of such a general support block is illustrated in, for example, US Patent Application No. 10 / 165,711 (Lawyer Case No. NSCIP212X1) entitled "Ceramic Optical Subassembly for Photoelectric Modules" filed on June 6, 2002. In a common implementation, the circuit substrate 1 12 is connected to the front surface 116 of the support block 110, surrounding the front corner of the bottom of the support block 110, and covering most of the bottom surface of the support block 110. The traces of the circuit substrate 1 1 2 extend from the photonic device 1 1 4 on the front surface to the bottom surface of the support block 1 1 0, where these contacts link contacts above CS A 102. In order to increase the number of possible electrical connections to the maximum extent, the size of the above devices is small. However, even if the size is small, the circuit substrate 1 1 2 is only constructed on the surface of the support block 1 1 0 (or some implementations, two layers deep), which limits the construction from photonic devices 1 1 4 to CSA 1 〇2 contact point (4) 200417764 The total number of electrical connections. Furthermore, 'this surface mount circuit substrate 112 can suffer from the small volume involved in the tumbecht' circuit substrate, and it can be arranged close to each other. Small size also has advantages, most of them are small. However, the close proximity of the stitches can cause "crosstalk" in frequency. Crosstalk is the electricity between two or more conductive elements, which can severely degrade the performance of photovoltaic devices. Fig. 2 shows the general support block 204 (upside-down display 201 and a front face 202. Photonic device 214 is generally on the front face of 204 and is electrically connected to the connector device on the bottom face 201 2 1 4 is electrically connected using surface metallization technology To the connector device 2 1 4 wire traces (or leads) are commonly used 2 1 6 pads 2 1 5 and the stitches are constructed on one of the attachment blocks 2 0 4. One problem with this implementation is that the wire traces 2 1 6 are easy Failures occur on the edge of the belt 204. In view of the above, an effective technique is needed to place the photonic device to the associated semiconductor wafer device at a high level. The connection exhibits high circuit density and low crosstalk. [Content of the Invention] object of the present invention is a high-performance and small circuit, an optical subassembly in one embodiment, a system configuration:. OSA), and applied to the optical fiber and the sub-group of interconnected wafer interconnection. OS A includes a ceramic block with a second surface M crosstalk ''. P is the circuit traces of the sub-volume means operation especially in high interference. This crosstalk indication) is displayed on the support block 2 1 5. Light touches 2 1 5. Optoelectronic connection to the contact Special contact strip Bent to the support block Constructed from the optical assembly density Electrical connection, the substrate and the support block optical subassembly (CSA) electrical and a second surface (5) (5) 200417764, ceramic block use low temperature co-fired ceramic (LTCC) and high temperature cofired. photonic device constructed on the first surface of the ceramic block, and electrical contacts constructed on ceramic (Η TCC) one of the techniques for producing the second surface of the ceramic block The electrical contacts are adapted to be in electrical communication with the wafer sub-assembly. Furthermore, an electrical connection is constructed so that a photon device on the first side of the ceramic block is electrically connected to the second side of the ceramic block through the inside of the ceramic block The electrical contact point. Another embodiment includes a ceramic block having a first surface and a second surface. The ceramic block is manufactured using one of low temperature co-fired ceramic (LTCC) and high temperature co-fired ceramic (HTCC) technology. the first face of the ceramic block having a least-photonic devices constructed thereon. contact pads constructed on a second face of the ceramic block. also includes electrically connecting the ceramic block, are electrically connected to the photonic devices, and through the ceramic block Inside May be electrically connected photonic device to a wafer sub-assembly (CSA). Electrical connection may comprise signal connection and a ground connection. Also, embodiments may include internal shield. Configured ceramic block of may be designed to serve to reduce crosstalk 'exhibit low land Jump and electrical parasitics, and the best degree of impedance can be obtained. The circuit substrate can be used to construct the optical subassembly. In another embodiment, the ceramic block includes multiple ceramic layers, and low temperature co-fired ceramic (LTCC) and Manufactured by one of the high-temperature co-fired ceramics (HTCC) technology. The ceramic block includes a front surface and a bottom surface. The front surface of the ceramic block includes a plurality of contact pads in contact with a plurality of photonic devices. The bottom surface includes a plurality of solder pads. The block further includes an internal electrical contact plane with at least one electrical contact line constructed thereon, at least one electrical contact line passes through the interior of the ceramic block and is in electrical communication with the contact pads and associated solder pads. The contact pads have adhesive wiring. Used to electrically connect contact pads and photonic devices. The ceramic block also includes at least one internal ground plane (6) (6) 200417764 surface with at least one ground contact line constructed thereon, at least one The ground contact wire passes through the inside of the ceramic block and is electrically connected to the selected pad. The module also includes a semiconductor wafer subassembly (CSA) with a top surface, which exposes the link contacts. When the ceramic block is placed on the top surface of the CSA In the above, these are in electrical contact with the pads formed on the bottom surface of the ceramic block. In the following description of the present invention and the accompanying drawings, these and other features and advantages of the present invention are presented in more detail. The principle of the present invention is shown. It should be understood that the same reference numerals in the drawings refer to the same structural elements. It should be understood that the drawings do not need to be shown to scale. [Embodiment] Now, the preferred embodiment shown in the drawings will be described in detail. Invention. In the following description, numerous specific details are set forth in order to clarify the invention. However, it will be apparent to those skilled in the art that the invention may be practiced without some or all of these specific details. In other cases, familiar operations have not been described in detail, so as not to unnecessarily obscure the present invention. One of the limitations of the existing technology used in optical sub-assemblies is the need to construct all electrical interconnections between the substrate sub-assemblies (CSA) and the sub-assemblies (CSA) below, using metallization techniques. depth of layer interconnection structure. This results in limiting electrical contact density and causing many crosstalk issues between various electrical interconnections. Crosstalk in current technology can be as high as 75%. Moreover, as data transmission rates increase, the problem may increase.
本發明屬於高性能及小規模之OSA。本發明之改良之 OSA包含一陶瓷塊,由若干層低溫共燒製之陶瓷(LTCC -10- (7) (7)200417764 )或高溫共燒製之陶瓷(HTCC )構成。光子裝置’或更 普通多個光子裝置構製於陶瓷塊之一面上。光子裝置電連 接至陶瓷塊之另一面上所構製之多個焊墊。重要者,光子 裝置及焊墊間之電連接通過陶瓷塊之內部。此結構可經由 使用LTCC及HTCC技術構製。設計通過陶瓷塊內部之電 互接之構造,以降低串擾,呈現低度之地跳躍及寄生,並 獲得最佳之阻抗程度。裝有此陶瓷塊之OSA可利用於構 製光電模組。 爲在依本發明之原理構製之陶瓷塊中達成所需之性質 ’使用多層陶瓷(MLC )製造技術。此技術說明於例如微 電子封裝手冊,VanNostrandReinhold出版,紐約1 9 8 9版 ’第45 5 - 5 22頁,此提供一熱有效,多組成件陶瓷結構, 能支持三維互接電路。 一般言之’此陶瓷結構使用耐高溫介質材料,諸如氧 化銘及玻璃之微粒懸浮於有機黏合劑中,構製並乾燥爲所 謂”綠薄片”製成。個別薄片帶印刷以金屬化及其他電路圖 条’相互堆疊,並在預定溫度及壓力下疊合一起,及然後 在局溫常式下燒製,在此,大部份黏合劑材料蒸發掉,同 日寸留下之材料熔合或繞結。在此,普通使用氧化鋁玻璃作 爲絕緣材料,普通使用鎢,鉬,或鉬錳,或其他適當材料 爲亞屬化。緣薄片經製圖,及然後堆疊成適當構造。疊層 然後在約1,6 〇 〇它(攝氏度)之溫度,降低之大氣,諸如 氨中製。此稱爲高溫共燒製HTCC )技術。在普通 HTCC方法中,使用高熔點耐火金屬漿作爲導體。 -11 - (8) (8)200417764 無需高處理溫度或氫大氣之其化陶瓷疊層方法通常稱 爲低溫共燒製陶瓷(LTCC )技術。低溫陶瓷帶由DuPont 公司以綠帶牌陶瓷帶供應市面,此在約8 5 0 °C燒結,並呈 現熱膨脹與氧化鋁相似。低溫處理可使用高導電性貴金屬 厚膜導體,諸如金,銀,或其合金。 厚薄技術及高/及低溫共燒製陶瓷帶技術之討論見之 於 WilliamVitriol等所作之”低溫共燒製多層陶瓷技術之 發展”,ISHM會議記錄1983,593-598頁。 雖HTCC及LTCC技術可依發明原理使用,但LTCC 爲較宜之實施。 陶瓷組成件可使用諸如HTCC及LTCC技術構製。例 如,可構製及使用陶瓷塊,以連接光電模組之各種電系統 。當連接小型電系統時,更完全展示此陶瓷塊之優點。例 如,該陶瓷塊可用以連接光電模組中之光學裝置於半導體 晶片裝置。現說明圖3,以說明此陶瓷塊之使用。 圖3包含本發明之一實施例之簡單光學副組件(0 S A )3 0 0及晶片副組件(C S A ) 3 0 2之槪要顯示。Ο S A 3 0 0及 CSA302可合倂,以形成光電模組。OSA300及CSA302由 連接CSA302之頂表面上之上鏈接觸點304於OSA300之 底表面上之接觸墊(未顯示於圖中),而置於相互電連接 中。此等連接可利用導電性材料,包含,但不限於焊料膏 及導電性環氧樹脂。 C S A3 02爲一封裝之半導體裝置(大致與圖}所述之 C S A 1 0 2相似),其中,一半導體晶粒(未顯示)包裹於 -12- (9) (9)200417764 模塑材料1 0 8內,並電連接至上鏈接觸點3 04。上鏈接觸 點3 04提供徑路,俾電連通於半導體晶粒及OS A3 00之光 子裝置3 1 2之間。 一-OS A3 0 0包含一陶瓷塊314 (在此亦稱爲陶瓷體) ,具有一前表面318及一底表面320。一裝置連接區332 普通構製於前表面3 1 8.上。裝置連接區3 3 2亦稱爲陰極墊 。光子裝置312連接至陶瓷陶瓷塊314之前表面318之裝 置連接區332。而且,前表面318包含接觸墊338構製於 其上。黏接線3 3 3電接觸光子裝置3 1 2於接觸墊3 3 8。通 過陶瓷塊3 1 4之內部之信號連接線3 2 2 (由內部虛線槪要 表示)電連接黏接墊3 3 8至焊墊(未見之於圖中)。如此 ,光子裝置3 12可連接至晶片副組件(CS A ) 3 02之上鏈 接觸點3 04,俾此等最後可連接至CSA3 02內之半導體晶 粒。 爲更佳顯示陶瓷塊實施例及其關聯之電連接之結構及 特色,參考圖3及4A-C,討論陶瓷塊實施例。圖3以透 視圖顯示一陶瓷塊實施例3 1 4,圖4 A-C分別以斷面側視 圖,陶瓷塊314之前表面318上之前平面圖,及陶瓷塊 3 1 4之底表面3 2 0上之底視圖顯示陶瓷塊實施例3 1 4。 參考圖4A,4B,及4C,顯示陶瓷塊OSA之一實施 。圖4A爲斷面圖,圓4B爲前表面之平面圖,及圖4C爲 底表面之平面圖。參考圖4A,陶瓷塊314由多個陶瓷層 350構成。所示陶瓷塊314之前表面318包含一裝置連接 區332,具有光子裝置312構製於其上。而且,所示之實 (10) (10)200417764 施例具有接觸墊3 3 8構製於前表面3 1 8上,及接觸墊3 0 6 (在此,此接觸墊3 06與前表面3 1 8之接觸墊3 3 8不同, 稱爲焊墊3 06 )構製於底表面3 2 0上。接觸墊3 3 8電連接 至光子裝置3 1 2之接觸點。此等連接普通使用連接線線 333達成,此等普通爲金所製,但可包含任何適當之導電 性材料。所示接觸墊3 3 8之下面爲一信號連接,此通過陶 瓷塊3 1 8之內部。信號連接構製方便光子裝置及晶片副組 件(C S A )之上鏈接觸點3 0 4間之電連接。在所示之實施 例中,信號連接線包含一信號通道3 5 1,一信號線跡3 5 2 ,一對應接觸墊3 3 8,及一對應焊墊3 0 6。信號通道3 5 1 由金屬化一或更多陶瓷層350中之一孔構成。而且,一關 聯之信號線跡3 5 2構製於陶瓷層3 5 0上。信號通道3 5 1電 連接至關聯之信號線跡3 5 2。信號通道3 5 1電連接至一對 應之接觸墊3 3 8,及信號線跡3 52電連接至對應之焊墊 3 〇 6。信號通道3 5 1,接觸墊3 3 8,信號線跡3 5 2,及焊墊 3 0 6普通爲銅材料。然而,許多其他導電性材料亦可使用 〇 裝置連接區332及構製於其上之光子裝置312之下面 爲一地連接,此通過陶瓷塊3 1 8之內部。地連接構製方便 光子裝置及晶片副組件(CSA )之上鏈接觸點3 04間之電 連接。在所示之實施例中,地連接包含一地通道3 6 1及一 地線3 62。地連接電連接至裝置連接區3 3 2 (及從而至關 聯之光子裝置3 1 2 )及一對應之焊墊3 06。如此,一地連 接電連接一光子裝置3 1 2至晶片副組件(CSA )之上鏈接 -14- (11) (11)200417764 觸點。地通道3 6 1由金屬化一或更多陶瓷層3 5 0中之孔製 成,及關聯之地線3 62構製於一陶瓷層3 5 0上。與信號連 接同樣,地通道3 6 1,地線3 6 2,及焊墊3 0 6普通爲銅材 料所製。然而,許多其他導電性材料亦可使用。 應注意地線3 62可包含一單條地線,所有光子裝置 3 1 2電連接於此,且從而接地。或且及較宜者,地線3 6 2 可包含多條地線,俾每一光子裝置3 1 2可個別連接。此一 貫施提供較擾良之防串擾。 本發明之另一實施例顯示於圖5 A - 5 Β。此一實施例實 施另一接觸墊構造。圖5 A爲陶瓷塊實施例之斷面圖。圖 5B爲圖5A所示之陶瓷塊實施例之前表面之平面圖。圖 5 A之斷面圖爲沿圖5 B之線A - A '上所取者。與前發表之 實施例同樣,所示之陶瓷陶瓷塊5 1 4可用於光電模組中所 用之光學副組件(OSA)上。 陶瓷塊514具有一前表面518及一底表面520。所示 之實施例包含一裝置連接區5 3 2 (陰極墊)構製於前表面 518上。光子裝置512構製於裝置連接區532上。而且, 接觸墊構製於陶瓷塊514之前表面518上。在所示之實施 例中,接觸墊包含一第一組接觸墊5 3 8及一第二組接觸塾 5 3 9。第一組接觸墊5 3 8及第二組接觸墊5 3 9相互交錯安 排。此更易見之於圖5 B,此顯示第一組接觸墊5 3 8與第 —•組接觸塾5 3 9偏置父錯構造。此構造使連接光子裝置 5 1 2至接觸墊5 3 8,5 3 9之接觸線5 3 3之間可更爲分開。 此增加之隔離減少串擾。此特色在具有許多光子裝置5】? -15> (12) (12)200417764 之實施例中更爲有利。一般言之,在使用η個光子裝置之 處,一第一組η/2黏接墊構製於光子裝置之一側,及一第 二組η/2黏接墊構製於光子裝置之另一側。 與前述實施例同樣,前表面5 1 8包含接觸墊5 3 8, 5 3 9構製於其上。對第一組黏接墊5 3 8,信號連接通過陶 瓷塊5 1 4之內部,以電連接第一組接觸墊5 3 8至構製於該 陶瓷塊之底表面520上之焊墊306。如此,光子裝置512 可連接至晶片副組件(c s a )之上鏈接觸點,及最後連接 至CSA內關聯之半導體晶粒。如前述,信號連接包含信 號通道,信號線跡,及對應之接觸墊及焊墊。參考圖5 A ,一接觸墊 5 3 8包含一信號通道 5 5 1,此通過該陶瓷塊 514之一或更多陶瓷層550。信號通道551電連接至陶瓷 層5 5 0之一上所構製之一信號線跡5 5 2。信號線跡5 5 2延 伸至陶瓷塊5 1 4之邊緣之底表面5 2 0處,在此,一焊墊 5 06構製於其上。同樣,對第一組黏接墊5 3 9,信號連接 通過陶瓷塊5 1 4之內部,以電連接第二組黏接墊5 3 9至陶 瓷塊之底表面5 2 0上所構製之焊墊3 0 6。接觸墊5 3 9之信 號連接包含一信號通道5 6 1,此通過陶瓷塊5 1 4之一或更 多陶瓷層550,並電連接至陶瓷層550之一上所構製之信 號線跡5 62。信號線跡5 62延伸至陶瓷塊514之底表面 5 2 0上,在此,焊墊5 0 6構製於其上。在所示之實施例中 ,使用一單條地線。 而且,陶瓷塊5 1 4包含地連接,此通道陶瓷塊5 1 4之 內部。如前述,每一地連接電連接至裝置連接區532 (且 -16- (13) 200417764 從而至關聯之光子裝置5 1 2 )及一對應之焊墊5 0 6。如此 ,地連接電連接一光子裝置5 1 2至一^晶片副組件(C S A ) 之上鏈連接點。地通道571構製於一或更多陶瓷層5 5 0中 ,及一關聯之地線5 7 2構製於一陶瓷層5 5 0上。應注意所 示之地線5 7 2可包含一單條地線,所有光子裝置5 1 2電連 接於此,且從而接地。或且及較宜者,地線5 7 2可包含多 條地線,俾每一光子裝置5 1 2可個別連接。The present invention pertains to a high-performance and small-scale OSA. The improved OSA of the present invention includes a ceramic block composed of several layers of low-temperature co-fired ceramics (LTCC -10- (7) (7) 200417764) or high-temperature co-fired ceramics (HTCC). Photonic devices' or more Photonic devices are constructed on one side of the ceramic block. The photonic device is electrically connected to a plurality of pads constructed on the other side of the ceramic block. Importantly, the electrical connection between the photonic device and the pads passes through the interior of the ceramic block. This structure can be constructed using LTCC and HTCC technology. Designed by the electrical interconnection structure inside the ceramic block to reduce crosstalk, show low ground jumps and parasitics, and obtain the best degree of impedance. The OSA with this ceramic block can be used to construct photovoltaic modules. In order to achieve the desired properties in a ceramic block constructed in accordance with the principles of the present invention, 'multi-layer ceramic (MLC) manufacturing technology is used. This technique is described in, for example, the Microelectronics Package Handbook, published by Van Nostrand Reinhold, New York, 1989 edition, pp. 45 5-5 22, which provides a thermally efficient, multi-component ceramic structure that supports three-dimensional interconnect circuits. Generally speaking, 'this ceramic structure is made of a high-temperature-resistant dielectric material, such as oxide particles and glass particles suspended in an organic binder, and is formed and dried into a so-called "green sheet". Individual thin strips are printed with metallization and other circuit strips stacked on top of each other, and are stacked together at a predetermined temperature and pressure, and then fired under a local temperature normal mode. Here, most of the adhesive material evaporates, the same day The remaining material is fused or tangled. Here, alumina glass is generally used as the insulating material, and tungsten, molybdenum, or molybdenum-manganese, or other appropriate materials are generally used as the sub-genus. The margin sheets are mapped and then stacked into a suitable configuration. The stack is then made at a temperature of about 1,600 degrees Celsius, lowered to the atmosphere, such as ammonia. This is called high temperature co-firing (HTCC) technology. In the ordinary HTCC method, a refractory refractory metal paste is used as a conductor. -11-(8) (8) 200417764 The method of laminating ceramics that does not require high processing temperature or hydrogen atmosphere is commonly referred to as low temperature co-fired ceramic (LTCC) technology. Low temperature ceramic tapes are commercially available from DuPont under the Green Belt brand of ceramic tapes, which are sintered at approximately 850 ° C and exhibit thermal expansion similar to alumina. Low temperature processing can use highly conductive noble metal thick film conductors such as gold, silver, or alloys thereof. The discussion of thickness technology and high / low temperature co-firing ceramic tape technology can be found in "Development of Low-temperature Co-firing Multi-Layer Ceramic Technology" by William Vitriol et al., ISHM Conference Records 1983, pages 593-598. Although HTCC and LTCC technologies can be used in accordance with the principles of the invention, LTCC is a more appropriate implementation. Ceramic components can be constructed using technologies such as HTCC and LTCC. For example, and may be constructed using a ceramic block, to connect the various electrical systems of the optoelectronic module. The advantages of this ceramic block are more fully demonstrated when connecting small electrical systems. For example, the ceramic block can be used to connect an optical device in a photovoltaic module to a semiconductor wafer device. Figure 3 will now be described to illustrate the use of this ceramic block. FIG. 3 includes a simple optical sub-assembly (0 S A) 300 and a wafer sub-assembly (C S A) 3 202 according to an embodiment of the present invention. 〇 S A 3 0 0 and CSA302 can be combined to form a photovoltaic module. OSA300 and CSA302 are connected to each other by contact pads (not shown) on the bottom surface of OSA300 that link contact 304 above the top surface of CSA302. These connections can utilize conductive materials including, but not limited to, solder paste and conductive epoxy. CS A3 02 is a packaged semiconductor device (roughly similar to CSA 1 0 2 described in the figure), in which a semiconductor die (not shown) is wrapped in -12- (9) (9) 200417764 molding material 1 0 0, and is electrically connected to the upper link contact 3 04. The winding contact point 3 04 provides a path, which is electrically connected between the semiconductor die and the photonic device 3 1 2 of OS A3 00. A-OS A300 includes a ceramic block 314 (also referred to herein as a ceramic body) having a front surface 318 and a bottom surface 320. A device connection area 332 is generally formed on the front surface 3 1 8. The device connection area 3 3 2 is also called a cathode pad. The photonic device 312 is connected to the device connection area 332 of the front surface 318 of the ceramic ceramic block 314. Moreover, the front surface 318 includes a contact pad 338 structured thereon. The adhesive wires 3 3 3 are in electrical contact with the photonic device 3 1 2 on the contact pads 3 3 8. Electrically connect the bonding pads 3 3 8 to the solder pads (not shown in the figure) through the signal connection wires 3 2 2 (indicated by the inner dashed line 槪) inside the ceramic block 3 1 4. In this way, the photonic device 3 12 can be connected to the wafer sub-assembly (CS A) 3 02 uplink contact point 3 04, and finally these can be connected to the semiconductor crystals in the CSA 3 02. In order to better show the structure and features of the ceramic block embodiment and its associated electrical connections, embodiments of the ceramic block are discussed with reference to FIGS. 3 and 4A-C. FIG. 3 shows a ceramic block embodiment 3 1 4 in a perspective view, FIG. 4 AC is a sectional side view, a front plan view on the front surface 318 of the ceramic block 314, and a bottom surface 3 2 0 on the bottom surface of the ceramic block 3 1 4 View shows ceramic block examples 3 1 4. 4A, 4B, and 4C, one implementation of a ceramic block OSA is shown. Fig. 4A is a sectional view, circle 4B is a plan view of the front surface, and Fig. 4C is a plan view of the bottom surface. Referring to FIG. 4A, the ceramic block 314 is composed of a plurality of ceramic layers 350. The front surface 318 of the ceramic block 314 shown includes a device connection region 332 having a photonic device 312 constructed thereon. Moreover, the illustrated embodiment (10) (10) 200417764 has a contact pad 3 3 8 configured on the front surface 3 1 8 and a contact pad 3 0 6 (here, this contact pad 3 06 and the front surface 3 The contact pads 3 3 8 of 18 are different from each other, and are called solder pads 3 06) are formed on the bottom surface 3 2 0. The contact pad 3 3 8 is electrically connected to the contact point of the photonic device 3 1 2. These connections commonly used to achieve connection wire 333, such as gold general system, but it may comprise any suitable conductive material. Below the contact pad 3 3 8 shown is a signal connection, which passes through the interior of the ceramic block 3 1 8. The signal connection structure facilitates the electrical connection between the photonic device and the link contacts 300 on the wafer sub-assembly (C S A). In the illustrated embodiment, the signal connection line includes a signal channel 3 51, a signal trace 3 5 2, a corresponding contact pad 3 38, and a corresponding solder pad 3 06. The signal channel 3 5 1 is formed by one of the holes in the metallized one or more ceramic layers 350. Furthermore, an associated signal trace 3 5 2 is formed on the ceramic layer 3 50. Signal channel 3 5 1 is electrically connected to the associated signal trace 3 5 2. The signal channel 3 5 1 is electrically connected to a corresponding contact pad 3 3 8, and the signal stitch 3 52 is electrically connected to a corresponding solder pad 3 06. The signal channel 3 5 1, the contact pad 3 3 8, the signal stitch 3 5 2, and the solder pad 3 0 6 are usually made of copper. However, many other conductive materials can also be used as a ground connection under the device connection area 332 and the photonic device 312 formed thereon, which passes through the inside of the ceramic block 3 1 8. The ground connection structure facilitates the electrical connection between the photonic device and the wafer contact assembly (CSA) over the link contacts 304. In the illustrated embodiment, the ground connection includes a ground channel 3 6 1 and a ground line 3 62. The ground connection is electrically connected to the device connection area 3 3 2 (and thus to the associated photonic device 3 1 2) and a corresponding solder pad 3 06. As such, a ground connection electrically connects a photonic device 3 1 2 to a wafer subassembly (CSA) link -14- (11) (11) 200417764 contact. The ground channel 3 6 1 is made of metallized holes in one or more ceramic layers 3 50, and the associated ground line 3 62 is constructed on a ceramic layer 3 50. As with the signal connection, the ground channel 3 6 1, the ground wire 3 6 2, and the solder pad 3 0 6 are usually made of copper. However, many other conductive materials can also be used. It should be noted that the ground wire 3 62 may include a single ground wire, to which all photonic devices 3 1 2 are electrically connected, and thus grounded. Alternatively, and preferably, the ground wire 3 6 2 may include multiple ground wires, and each photonic device 3 1 2 may be individually connected. This consistent implementation provides better interference prevention. Another embodiment of the present invention is shown in FIG. 5 A - 5 Β. This embodiment implements another contact pad structure. Fig. 5A is a sectional view of an embodiment of a ceramic block. Fig. 5B is a plan view of the front surface of the ceramic block embodiment shown in Fig. 5A. The cross-sectional view of Fig. 5A is taken along the line A-A 'of Fig. 5B. The publication previous Example, the ceramic of the ceramic block 514 shown can be used for the optical subassembly (OSA) as used in the optoelectronic module. The ceramic block 514 has a front surface 518 and a bottom surface 520. The illustrated embodiment includes a device connection area 5 3 2 (cathode pad) formed on the front surface 518. The photonic device 512 is constructed on the device connection area 532. Moreover, the contact pads are formed on the front surface 518 of the ceramic block 514. In the embodiment shown, the contact pads include a first set of contact pads 5 3 8 and a second set of contact pads 5 3 9. The first group of contact pads 5 3 8 and the second group of contact pads 5 3 9 are arranged alternately with each other. This is easier to see in Figure 5B, which shows that the first group of contact pads 5 3 8 and the first group of contact pads 5 3 9 offset the parent fault structure. This structure allows the photonic device 5 1 2 to be more separated from the contact line 5 3 3 of the contact pads 5 3 8 and 5 3 9. This increases the isolation to reduce crosstalk. This has featured in many photonic devices 5]? -15 > (12) embodiment (12) 200 417 764 of the embodiment is more advantageous. Generally speaking, the use of a [eta] of the photonic device, a first set of side η / 2 bond pad constructed in the photonic devices and a second group η / 2 bond pad constructed in the other photonic devices side. As in the previous embodiment, the front surface 5 1 8 includes contact pads 5 3 8 and 5 3 9 formed thereon. For the first group of bonding pads 5 3 8, the signal is connected through the inside of the ceramic block 5 1 4 to electrically connect the first group of contact pads 5 3 8 to the solder pads 306 formed on the bottom surface 520 of the ceramic block. In this way, the photonic device 512 can be connected to the link contacts on the wafer subassembly (c s a) and finally to the associated semiconductor die in the CSA. As mentioned above, the signal connection includes signal channels, signal traces, and corresponding contact pads and solder pads. Referring to FIG. 5A, a contact pad 5 3 8 includes a signal channel 5 5 1, which passes through one or more ceramic layers 550 of the ceramic block 514. The signal path 551 is electrically connected to one of the signal traces 5 5 2 formed on one of the ceramic layers 5 50. The signal trace 5 5 2 extends to the bottom surface 5 2 0 of the edge of the ceramic block 5 1 4, where a solder pad 5 06 is formed thereon. Similarly, for the first group of bonding pads 5 3 9, the signal is connected through the inside of the ceramic block 5 1 4 to electrically connect the second group of bonding pads 5 3 9 to the bottom surface of the ceramic block 5 2 0. Welding pad 3 0 6. The signal connection of the contact pad 5 3 9 includes a signal channel 5 6 1, which passes through one or more ceramic layers 550 of the ceramic block 5 1 4 and is electrically connected to a signal trace 5 formed on one of the ceramic layers 550. 62. The signal trace 5 62 extends to the bottom surface 5 2 0 of the ceramic block 514, where a pad 5 06 is formed thereon. In the illustrated embodiment, a single ground wire is used. Moreover, the ceramic block 5 1 4 includes a ground connection, and the channel ceramic block 5 1 4 is inside. As mentioned above, each ground connection is electrically connected to the device connection area 532 (and -16- (13) 200417764 to the associated photonic device 5 1 2) and a corresponding solder pad 5 0 6. In this way, the ground connection electrically connects a photonic device 5 1 2 to a wafer sub-assembly (C S A) uplink connection point. The ground channel 571 is formed in one or more ceramic layers 5 50, and an associated ground line 5 7 2 is formed on a ceramic layer 5 50. It should be noted that the illustrated ground wire 5 7 2 may include a single ground wire, and all the photonic devices 5 1 2 are electrically connected thereto, and thus grounded. Alternatively, and preferably, the ground wire 5 7 2 may include multiple ground wires, and each photonic device 5 1 2 may be individually connected.
本發明之另一實施例顯示於圖6A-6C。圖6A爲陶瓷 塊實施例之斷面圖。圖6 B爲圖6 A所示之陶瓷塊實施例 之前表面之平面圖。圖6A爲沿圖6B之線6a-6a'所取之 斷面圖。與前發表之實施例同樣,所示之陶瓷塊6 1 4可用 於光電模組中所用之光學副組件(OSA )上。Another embodiment of the present invention is shown in FIGS. 6A-6C. Fig. 6A is a sectional view of an embodiment of a ceramic block. Fig. 6B is a plan view of the front surface of the embodiment of the ceramic block shown in Fig. 6A. Fig. 6A is a sectional view taken along line 6a-6a 'of Fig. 6B. The publication on the previous Example, the ceramic block 614 shown in FIG optically sub-assembly (OSA) as used in the optoelectronic module.
陶瓷塊614具有一前表面618及一底表面620。所示 之實施例包含一裝置連接區632 (陰極墊)構製於前表面 618上,具有光子裝置612構製於其上。接觸墊638,639 構製於前表面6 1 8上,並使用黏接線6 3 3電連接至光子裝 置6 1 2。如顯示於圖6B,在此實施例中,接觸墊包含一第 一組接觸墊6 3 8及一第二組接觸墊6 3 9構造成相互錯開安 排。在此實施中,光子裝置612可作爲第一組光子裝置 6 1 2 '及一第二組光子裝置6丨2 ”實施,此等分別電連接至第 一組接觸墊63 8及一第二組接觸墊63 9。此構造使接觸線 6 3 3之間可更爲分開,從而減少串擾。 與前述實施例同樣,連接光子裝置612至焊墊606之 信號連接如本專利他處所述構製。此信號連接通過陶瓷塊 -17- (14) (14)200417764 6 1 4之內部,以電連接光子裝置6 1 2至陶瓷塊之底表面上 所構製之焊墊606。如前述,信號連接包含信號通道651 ,信號線跡6 5 2,及對應之接觸墊6 3 8及焊墊606。參考 圖6A,至接觸墊6 3 8之一信號連接包含信號通道651, 此通過陶瓷塊614之一或更多陶瓷層650。信號通道651 電連接至陶瓷層6 5 0之一上所構製之一信號線跡6 52。信 號線跡652延伸至陶瓷塊614之邊緣之底表面620處,在 此,一焊墊6 0 6構製於其上。同樣,對第二組黏接墊639 ,信號連接通過陶瓷塊6 1 4之內部,以電連接第二組黏接 墊63 9至陶瓷塊之底表面62 0上所構製之焊墊606。接觸 墊63 9之信號連接包含信號通道681 (由虛線表示),此 通過陶瓷塊614之一或更多陶瓷層650,並電連接至陶瓷 層65 0之一上所構製之信號線跡6 82 (由虛線表面)。信 號線跡682延伸至陶瓷塊614之底表面620,在此,一焊 墊606構製於其上。 所示之實施例使用二地連接。二地連接通過陶瓷塊 6 1 4之內部。地連接電連接光子裝置6 1 2至關聯之焊墊 606。在所示之實施例中,與第一組黏接墊63 8關聯之第 一組光子裝置6 1 2 '接觸第一地線6 7 2。一第一地通道6 7 1 電連接至第一組光子裝置612'之裝置連接區632,及亦至 第一地線6 7 2。第一地線6 7 2電連接至對應之焊墊6 0 6。 如此,一第一地連接電互接光子裝置6 1 2至晶片副組件( CSA )之上鏈接觸點。應注意所示之地線672可包含一單 條地線,所有第一光子裝置6 1 2 '電連接於此,且從而接 -18- (15) (15)200417764 地。在此一實施中,單條地線6 72構製於陶瓷層6 5 0上, 從而形成一第一地平面 6 0 1。或且及較宜者,第一地線 6 7 2可包含多條個別地線,俾每一光子裝置6 1 2 '可個別接 地。 而且,第二地連接通道陶瓷塊6 1 4之內部。第二組黏 接墊6 3 9關聯之第二組光子裝置6 1 2 ”接觸第二地線6 6 2。 此地連接電連接光子裝置612”至關聯之焊墊6 06。一第二 地通道 6 6 1電連接至至第二組光子裝置6 1 2 "之裝置連接 區6 3 2,及至第二地線6 6 2。第二地線6 6 2電連接至對應 之焊墊6 0 6。如此,一第二地連接電互接光子裝置6 1 2 ”至 晶片副組件(c s a )之上鏈接觸點。應注意所示之第二地 線6 62可包含一單條地線,所有光子裝置61 2”電連接於 此,且從而接地。在此一實施中,單條地線662構製於陶 瓷層6 5 0上,從而形成一第二地平面602。如前述,第二 地線662可包含多條個別地線,俾每一光子裝置6 1 2 ”可 個別接地。 或且,可引進一屏蔽平面690於第一組光子裝置 6 1 2 '及第二組光子裝置6〗2 ”之二組電連接之間。屏蔽平面 6 9 0包含金屬材料一屏蔽層6 9 9,構製用以降低第一組光 子裝置6 1 2 '及第二組光子裝置6丨2 ”間之串擾。此一屏蔽 平面690包含孔,以便通道通過屏蔽平面690。此可顯示 於圖6C。圖6C顯示本發明原理之屏蔽層6 99之一實施例 。所示之屏蔽層699包含孔700,701,此使通道及電連 接可通過。例如,孔7 0 0容許地通道6 6 1通過,及孔7 〇 1 -19- (16) 200417764 容許信號通道681通過。而且,在每一光子裝 別地連接及一個別信號連接之情形,此屏蔽可 信號及地連接周圍。A ceramic block 614 having a front surface 618 and a bottom surface 620. The illustrated embodiment includes a device connection region 632 (cathode pad) formed on the front surface 618, and a photonic device 612 formed thereon. The contact pads 638, 639 are constructed on the front surface 6 1 8 and are electrically connected to the photonic device 6 1 2 using a bonding wire 6 3 3. As shown in FIG. 6B, in this embodiment, the contact pads include a first group of contact pads 6 3 8 and a second group of contact pads 6 3 9 configured to be staggered from each other. In this implementation, the photon device 612 can be implemented as a first group of photon devices 6 1 2 ′ and a second group of photon devices 6 丨 2 ″, which are electrically connected to the first group of contact pads 63 8 and a second group, respectively. 9. this contact pad 63 may be configured so that the contact line of separation between the others 633, thereby reducing crosstalk. Similarly to the previous embodiment, the photonic device 612 is connected to signal pad 606 of the connection as described elsewhere in this patent constructed This signal connection passes through the inside of the ceramic block -17- (14) (14) 200417764 6 1 4 to electrically connect the photonic device 6 1 2 to the pad 606 formed on the bottom surface of the ceramic block. As mentioned above, the signal The connection includes a signal path 651, a signal stitch 6 5 2 and the corresponding contact pad 6 3 8 and a solder pad 606. Referring to FIG. 6A, one of the signal connections to the contact pad 6 3 8 includes a signal path 651, which is through a ceramic block 614. one or more ceramic layers 650. the signal path 651 is electrically connected to one of the ceramic layers 650 constructed by one of the signal trace of an edge of the bottom surface 620 of the ceramic block 52. 6 614 of signal trace 652 extends to Here, a solder pad 6 0 6 is constructed thereon. Similarly, for the second set of bonding pads 639, the letter Connected through the inside of the ceramic block 6 1 4 to electrically connect the second set of bonding pads 63 9 to the solder pads 606 formed on the bottom surface 62 0 of the ceramic blocks. The signal connection of the contact pads 63 9 includes a signal channel 681 ( (Represented by the dotted line), which passes through one or more ceramic layers 650 of the ceramic block 614 and is electrically connected to a signal trace 6 82 (by a dotted surface) constructed on one of the ceramic layers 650. The signal trace 682 extends To the bottom surface 620 of the ceramic block 614, where a pad 606 is constructed. The embodiment shown uses two ground connections. The two ground connections pass through the inside of the ceramic block 6 1 4. The ground connection electrically connects the photonic device 6 1 2 to the associated solder pad 606. In the illustrated embodiment, the first group of photonic devices 6 1 2 'associated with the first group of bonding pads 63 8 contacts the first ground wire 6 7 2. A first The ground channel 6 7 1 is electrically connected to the device connection area 632 of the first group of photonic devices 612 ′, and also to the first ground line 6 7 2. The first ground line 6 7 2 is electrically connected to the corresponding pad 6 0 6. thus, a first interconnection is electrically connected to photonic devices 612 to wafer sub-assembly (CSA) on the contact link. it is noted that the ground 672 may be shown Contains a single ground wire, where all the first photonic devices 6 1 2 ′ are electrically connected, and thus -18- (15) (15) 200417764 ground. In this implementation, a single ground wire 6 72 is constructed of ceramic Layer 6 5 0 to form a first ground plane 6 0 1. Or, and preferably, the first ground line 6 7 2 may include a plurality of individual ground lines, and each photonic device 6 1 2 ′ may be individually Ground. Moreover, the second ground is connected to the inside of the channel ceramic block 6 1 4. The second group of bonding pads 6 3 9 is associated with the second group of photonic devices 6 1 2 ”contacting the second ground wire 6 6 2. This place is electrically connected to the photonic device 612 ″ to the associated pad 6 06. A second ground channel 6 6 1 is electrically connected to a device connection area 6 3 2 of the second group of photonic devices 6 1 2, and to a second ground line 6 6 2. The second ground wire 6 6 2 is electrically connected to the corresponding solder pad 6 0 6. In this way, a second ground connects the electrical interconnection photonic device 6 1 2 ”to the link contact on the wafer subassembly (csa). It should be noted that the second ground line 6 62 shown may include a single ground line, all photonic devices 61 2 "is electrically connected here and is thus grounded. In this implementation, a single ground line 662 is formed on the ceramic layer 650 to form a second ground plane 602. As mentioned above, the second ground wire 662 may include multiple individual ground wires, and each photonic device 6 1 2 ″ may be individually grounded. Alternatively, a shielding plane 690 may be introduced in the first group of photonic devices 6 1 2 ′ and the first Two groups of photonic devices 6〗 2 ″ between the two groups of electrical connections. The shielding plane 6 9 0 includes a metallic material and a shielding layer 6 9 9, which is configured to reduce crosstalk between the first group of photonic devices 6 1 2 ′ and the second group of photonic devices 6 丨 2 ”. This shielding plane 690 includes holes So that the channel passes through the shielding plane 690. This can be shown in Figure 6C. Figure 6C shows an embodiment of the shielding layer 6 99 of the principles of the present invention. The shown shielding layer 699 includes holes 700, 701, which allows the channels and electrical connections to be accessible. Pass. For example, hole 7 0 0 allows the ground channel 6 61 to pass, and hole 7 0 1 -19- (16) 200417764 allows the signal channel 681 to pass. Moreover, each photon is connected separately and a separate signal is connected. In this case, this shield can be connected to signal and ground.
參考圖7,陶瓷塊實施例包含實施,其中 墊之各接觸墊7 02之間之間隔節距大於關聯一 之個別光子裝置7 0 3間之間隔節距。如此,關 線7 04 (例如金黏接線)顯示當其自光子裝置 墊7 02延伸離開時,成扇形向外張開。此等向 接觸墊702各相互分開一距離大於各光子裝置 離。此成扇形分開構形增加每一電連接線704 能力,因爲每一連接線間之距離增加。每一接 之更大距離亦可有較大空間用以構製與C S A 觸之接觸點。明確言之,提供更大之空間供互 〇 本發明原理之一特定實施爲二波道光電收 一收發訊機之簡單實施槪要顯示於圖8,此一 製於一 OSA800上,此包含一陶瓷塊810,使 LTCC法製造。陶瓷塊810包含一發送波道, 發射器光子裝置801 (例如一半導體雷射裝置 波道,此包含一光接收光子裝置802。光子婆 8 02 )安排於標準MPO格式中,俾與標準光纖 接。該實施例可包含屏蔽,以額外降低串擾。 80 1,8 02 )電連接至接觸墊8 0 3。而且,接觸! 過該陶瓷塊8 1 0之內部之電連接8 0 5 (由虛線 置包含一個 構製於每對 ,一組接觸 組光于裝置 聯之電連接 7 0 3向接觸 外伸開,俾 7 0 1間之距 相互屏蔽之 觸墊702間 上之上鏈接 接焊球之用 發訊機。此 收發訊機構 用HTCC或 此包含一光 )及一接收 ξ 置(80 1, 套圈裝置配 光子裝置( 塾8 0 3由通 槪要顯示) -20 - (17) 200417764 電連接至焊墊8 0 4。在所示之實施例中,使用二地平 及地連接由地電連接8 0 6 (由虛線槪要表示,此亦顯 過陶瓷塊8 1 0之內部)電連接地至焊墊8 0 8。亦可選 用屏蔽。CSA820包含電上鏈連接 82],此可電連 OSA之焊墊804,808,以電連接OSA800之光子裝置 ,8 02至CSA 8 2 0內所包裹之一半導體晶片(未顯示) 本發明之實施例具有較少串擾,較低寄生,減少 躍,增加連接密度,及較易控制阻抗程度之優點。在 施例,在1 2波道模組(1 2發射器或偵測器或其組合 在3.125013]^之資料傳輸率上可獲得約2.5%之總串 由調整接觸墊間之間隔,電連接之寬度,所有組成件 小及間隔,可達成各種電性能特性,如由陶瓷陶瓷塊 小決定。 本發明之〇 s A可製成各種大小及性能規格,且 ,適用於許多不同之連接器及系統。例如,OSA MPO連接器相容,此可由2光纖或1 2光纖帶(以及 熟悉之大小及構形)實施。本發明之電路基體可用於 應用上,用以連接二電系統。而且,電路基體宜可用 常小之系統上,因爲其體積小,成本低,且電性能優. 現參考圖9A,一陶瓷體可使用微電子封裝工業 熟知之LTCC或HTCC處理步驟製造。多個陶瓷薄片 ,920,930,940’ 950’ 960,及 970 處理 ~'起,以 所需之陶瓷體。所示之陶瓷體構造包含一屏蔽層,信 接,及地連接。例如,頂層9 1 0爲陶瓷體之前表面。 面, 示通 擇使 接至 ;801 〇 地跳 一實 )上 擾。 之大 之大 故此 可與 其他 各種 於非 良。 上所 910 形成 號連 光子 (18) 200417764 裝置及交錯之接觸墊構製於其上。然後衝壓及衝孔薄 9 1 〇,以製成一預形狀,具有通道,其中置導電性材料 諸如金屬獎或摻以導電性加強之材料’諸如銀之環氧树 ,以形成導電性通道9 1,9 2,9 3,9 4於薄片9 1 0中。 等區之大小及位置相當於所需之電路圖案。例如,在此 通道9 1相當於電互接結構,此用於第一光子裝置之信 連接。一接觸墊構製於通道91之金屬上。通道92及 用作地連接,此通過更深進陶瓷體中。一裝置連接區其 可構製於通道92及93上。通道94用於另一信號連接 層920包含其他導電性通道,此等在通道91,93,及 下面。而且,一信號線跡9 5構製延伸全程至薄片9 2 〇 邊緣。信號線跡9 5在通道91下面,並電連接於此。 93包含另外之導電性通道,此等在通道93及94下g 而且,一地線96構製延伸全程至薄片9 3 0之邊緣。地 96在通道92下面,並電連接於此。層940包含一屏蔽 97 ’此包含孔,俾可構製其他連接通道,此等在通道 及94下面。屏蔽層97爲導電性材料(例如銅)所製, 構製不接觸其下之通道9 3及9 4之導電性材料。層9 5 〇 含其他導電性通道,此在通道9 3下面。而且,信號線 98構製延伸全程至薄片95〇之邊緣。信號線跡98在通 94下面,並電連接於此。層9 60包含一地線99,構製 伸全程至薄片9 6 0之邊緣。地線99在通道93下面,並 連接於此。最後,可使一底薄片9 70於其他薄片下面。 薄片普通由黏合材料,諸如環氧樹脂黏合一起。宜選擇 片 , 脂 此 , 號 93 後 〇 94 之 層 〇 線 層 93 並 包 跡 道 延 電 各 -22- (19) (19)200417764 B平台式非導電性材料。如此,敏感之電徑路可通過陶瓷 體中。 圖9B顯示在組合及燒結後,陶瓷體9 0 0之一邊。裝 置連接墊9 0 2構製於陶瓷體9 0 0之前表面上,及二光子裝 置9 0 3,904構製於裝置連接墊902上。接觸墊(圖中僅 可見最近之墊905)亦構製於陶瓷體900之前表面上。導 電性線(9 5,9 6,9 8,及9 9 )之邊緣曝露於陶瓷體之底 表面上。焊墊 9 0 1構製於導電性線(9 5,9 6,9 8,及 9 9 )之邊緣上。其後之焊球可構製於焊墊90 1上,此等然後 重流至關聯之C S A之上鏈接觸點,以完成光電模組。 雖已以若干較宜實施例說明本發明,但在本發明之範 圍內有更改,改變,及相等者。亦應注意有許多其他方法 實施本發明之方法及裝置。故此,後附之申請專利應解釋 爲包含在本發明之精神及範圍內之所有更改,改變,及相 等者。 【圖式簡單說明】 參考以下說明及附圖,可最佳明瞭本發明,及其他優 點’在附圖中: 圖1爲簡單透視圖,顯示可用以構製光收發訊機之普 通光電模組。 圖2爲普通光學副組件中所用之普通支持塊之簡單透 視圖。 圖3爲含有本發明原理之08人及CSA之光電模組之 (20) (20)200417764 實施例之簡單透視圖。 圖4A,4B,及4C分別以斷面圖,陶瓷塊之前表面 之前平面圖,及陶瓷塊之底表面之底平面圖顯示陶瓷塊實 施例。 圖5 A - 5 B包含陶瓷塊實施例之斷面及平面圖。顯示 本發明之一實施例之其他接觸墊構造之實施例特色。 圖6A,6B,及6C簡單顯示又另一陶瓷塊實施例, 包含斷面圖,陶瓷塊之前表面之前平面圖,及陶瓷塊之底 表面之底平面圖。 圖7簡單顯示所構造之另一陶瓷塊實施例,顯示依本 發明之原理,電連接當延伸離開光子裝置時向外成扇形分 開。 圖8爲依本發明原理構製之二波道光電收發訊機之簡 單透視圖。 圖9A爲用以依本發明原理構製一簡單陶瓷塊實施例 之陶瓷疊層組成件之簡單顯示。 圖9 B爲圖9 A所示之組合及燒結之陶瓷疊層組成件 之簡單平面圖。 元件對照表 3 00 :光學副組件 3 02 :晶片副組件 3 04 :上鏈接觸點 3 0 6 :焊墊 24- (21)200417764Referring to FIG. 7, the embodiment of the ceramic block includes implementation, wherein the interval pitch between the contact pads 702 of the pads is greater than the interval pitch between the individual photonic devices 703 of the associated one. In this way, the closing line 7 04 (such as a metal-glued wire) shows that when it extends away from the photonic device pad 70 2, it fan-outs. The isotropic contact pads 702 are separated from each other by a distance greater than that of each photonic device. This fan-shaped split configuration increases the capacity of each electrical connection line 704 because the distance between each connection line increases. Each of the contact may also have a greater distance to the contact point a large space and constructed of C S A touch. Specifically, a larger space is provided for mutual interaction. One of the specific implementations of the principles of the present invention is a simple implementation of a two-channel photoelectric receiver-transceiver. To be shown in FIG. 8, this system is made on an OSA800, and this includes a The ceramic block 810 is manufactured by the LTCC method. The ceramic block 810 includes a transmission channel, the transmitter photonic device 801 (e.g., a semiconductor laser device channel, which comprises a light receiving photonic devices 802. Photonic po 802) arranged in a standard format MPO, serve to standard Fiber Access . This embodiment may include shielding to additionally reduce crosstalk. 80 1, 8 02) is electrically connected to the contact pad 8 0 3. And, contact! The electrical connection 8 0 5 through the ceramic block 8 1 0 (set by a dotted line and including one structured in each pair, a group of contact groups are connected to the device electrical connection 7 0 3 to extend out of the contact, 俾 7 0 Transmitter for connecting solder balls on upper and lower shielded contact pads 702. This transceiver uses HTCC or contains a light) and a receiving device (80 1, ferrule device with photon) Device (塾 8 0 3 is shown by the general manager) -20-(17) 200417764 is electrically connected to the pad 8 0 4. In the embodiment shown, a two-level flat ground connection is used to electrically connect the ground 8 0 6 ( It is indicated by the dotted line ,, which also shows the inside of the ceramic block 8 1 0) The electrical connection ground to the pad 8 0 8. Shielding is also optional. CSA820 includes an electric winding connection 82], which can be electrically connected to the OSA pad 804, 808, to electrically connect the photonic device of OSA800, one of the semiconductor wafers (not shown) wrapped in 802 to CSA 8 2 0 The embodiment of the present invention has less crosstalk, lower parasitics, reduces jumps, and increases connection density , and easier to control the extent of the advantages of the impedance. in the embodiment, the channel modules 12 (12, or a transmitter or detector The combination can obtain about 2.5% of the total string on the data transmission rate of 3.125013] ^ By adjusting the interval between the contact pads, the width of the electrical connection, all the components are small and the interval can achieve a variety of electrical performance characteristics, such as by ceramic The small size is decided. The 0s A of the present invention can be made into various sizes and performance specifications, and is suitable for many different connectors and systems. For example, the OSA MPO connector is compatible, and this can be made by 2 optical fibers or 12 optical fiber ribbons ( And the familiar size and configuration) implementation. The circuit substrate of the present invention can be used in applications to connect two electrical systems. Moreover, the circuit substrate should be used on systems that are often small because of its small size, low cost, and electrical performance preferably Referring now to Figure 9A, a ceramic body is well known in the industry may be used microelectronic package of LTCC or HTCC manufacturing process step plurality of ceramic sheets, 920,930,940 '950' 960, 970 and the processing ~ 'onwards to the desired The ceramic body structure shown includes a shielding layer, a letter connection, and a ground connection. For example, the top layer 9 10 is the front surface of the ceramic body. The surface is shown to make the connection to 801 ground. Upset It is so large that it can be used with other kinds of defects. The Shanghai Institute 910 Formation No. Photon (18) 200417764 device and staggered contact pads are constructed on it. Then punch and punch a thin 9 1 0 to make a Pre-shaped, with channels, in which conductive materials such as metal awards or conductive materials reinforced, such as epoxy resins of silver, are used to form conductive channels 9 1, 9 2, 9 3, 9 4 on the sheet 9 1 0 in. The size and position of the equal zones are equivalent to the required circuit pattern. For example, the channel 91 is equivalent to an electrical interconnection structure, which is used for the letter connection of the first photonic device. Constructed a contact pad 91 on the metallic channel. Channels 92 and serve as ground connections, which pass deeper into the ceramic body. A device connection area may be formed on the channels 92 and 93. Channel 94 is used for another signal connection layer 920 containing other conductive channels, these are below channels 91, 93, and below. Further, a signal trace 95 constructed to extend throughout the sheet edge 92 billion. The signal trace 95 is below the channel 91 and is electrically connected thereto. 93 contains additional conductive channels, which are below the channels 93 and 94g. Furthermore, a ground wire 96 is constructed to extend all the way to the edge of the sheet 930. The ground 96 is below the channel 92 and is electrically connected thereto. Layer 940 contains a shield 97 'which contains holes, so that other connection channels can be constructed, which are below the channels and 94. The shielding layer 97 is made of a conductive material (for example, copper), and constitutes a conductive material that does not contact the channels 9 3 and 94 under it. Layer 95 billion contain other conductive channel in the channel 93 below this. Moreover, the signal line 98 is structured to extend to the edge of the sheet 95. The signal trace 98 is below the pass 94 and is electrically connected thereto. Layer 960 comprises a ground line 99, constructed to extend the entire edge 960 of the sheet. The ground wire 99 is under the channel 93 and is connected thereto. Finally, a bottom sheet 9 70 can be placed under the other sheets. Ordinary sheet of adhesive material, such as epoxy bonding together. It is better to choose the film, grease, and layer No. 93, 〇94, 〇Wire layer 93, and encapsulation of the track and extension. Each -22- (19) (19) 200417764 B platform type non-conductive material. In this way, sensitive electrical paths can pass through the ceramic body. Figure 9B shows the composition and the sintered ceramic body 900 of the side. The device connection pad 902 is formed on the front surface of the ceramic body 900, and the two-photon device 903,904 is formed on the device connection pad 902. The contact pad (only the nearest pad 905 is visible in the figure) is also formed on the front surface of the ceramic body 900. The edges of the conductive wires (9 5, 9, 6, 9 and 9 9) are exposed on the bottom surface of the ceramic body. The pads 9 0 1 are formed on the edges of the conductive wires (9 5, 9 6, 9 8, and 9 9). Thereafter the balls may be constructed to bonding pads 901, and these flows to the top of the weight of C S A link associated with the contact, in order to complete the optoelectronic module. Although the invention has been described in terms of several preferred embodiments, there are alterations, changes, and equivalents within the scope of the invention. It should also be noted that there are many other ways to implement the method and apparatus of the present invention. Therefore, the appended patent application should be interpreted to encompass all modifications, changes, and are equal within the spirit and scope of the present invention. [Brief Description of the drawings Referring to the following description and the accompanying drawings, the present invention can be best understood, and other advantages of 'In the drawings: Figure 1 is a simple perspective view showing an optical system configuration can be used ordinary Receiver - the optoelectronic module . Figure 2 is a simple perspective view of a conventional support block used in a common optical subassembly. Fig. 3 is a simple perspective view of the (20) (20) 200417764 embodiment of the photovoltaic module containing the 08 person of the present invention and the CSA. FIGS. 4A, 4B, and 4C, respectively a sectional view before a plan view of the surface before the ceramic block, the ceramic block and a bottom plan view of the bottom surface of the ceramic block display of Example. 5A-5B include cross-sectional and plan views of an embodiment of a ceramic block. An embodiment feature of another contact pad structure according to an embodiment of the present invention is shown. FIG 6A, 6B, and 6C show a simple yet another embodiment of the ceramic block, comprising a cross-sectional view, a plan view of the surface of the ceramic block prior to before, and the bottom surface of the bottom plan view of the ceramic block. Fig. 7 simply shows another embodiment of a ceramic block constructed, showing that, in accordance with the principles of the present invention, the electrical connections are fanned out when extending away from the photonic device. Fig. 8 is a simple perspective view of a two-channel photoelectric transceiver constructed in accordance with the principles of the present invention. Fig. 9A is a simple display of a ceramic laminated component used to construct a simple ceramic block embodiment according to the principles of the present invention. Fig. 9B is a simple plan view of the assembled and sintered ceramic laminated component shown in Fig. 9A. Component comparison table 3 00: Optical subassembly 3 02: Wafer subassembly 3 04: Uplink contact 3 0 6: Solder pad 24- (21) 200417764
3 0 8 :模塑材料 3 1 2 :光子裝置 3 1 4 :陶瓷塊 3 1 8 :前表面 3 2 0 :底表面 3 3 2 :裝置連接區 3 3 3 :黏接線 3 3 8 :接觸墊 3 5 0 :陶瓷層 3 5 1 :信號通道 3 5 2 :信號線跡 3 6 1 :地通道 3 6 2 :地線 9 1 0 :陶瓷薄片3 0 8: Molding material 3 1 2: Photonic device 3 1 4: Ceramic block 3 1 8: Front surface 3 2 0: Bottom surface 3 3 2: Device connection area 3 3 3: Adhesive wiring 3 3 8: Contact pad 3 5 0: Ceramic layer 3 5 1: Signal channel 3 5 2: Signal trace 3 6 1: Ground channel 3 6 2: Ground line 9 1 0: Ceramic sheet
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