(i) (i)200407676 玖、發明說明 (發明說明應敘明：發明所屬之技術領域、先前技術、内容、實施方式及圖式簡單說明) 本發明係關於一種石版印刷投影裝置，其包含： -一輻射系統，用以提供輻射投影光束； -一支撐結構，用以支撐圖案化構件，該圖案化構件用 於依據所需圖案來圖案化投影光束； -一真空室，用以向投影光束提供一真空光束路徑； -一基板台，用於支樓一基板；以及 -一投影系統，用以將圖案化光束投影至該基板的一 i 標部分。 此處所使用的術語「圖案化構件」應廣義地解釋為可 用以賦予一進入的輻射光束一圖案化斷面，且係對應於需 在基板的一目標部分中建立的一圖案的構件；本文中也可 使用術語「光閥」。一般而言，該圖案係與建立於目標部 份之裝置妁一特別功能層有關，如一積體電路或其它裝置 (見下文）。此類圖案化構件的範例包含： -一遮罩。遮罩的概念在石版印刷技術中廣為人知，其 包含二元式、交替式相位偏移和衰減式相位偏移的遮 罩形式，及各種混合遮罩形式。將此類遮罩置於輻射 光束中，將導致照射在遮罩上的輻射，根據遮罩上的 圖案進行選擇性透射（在一透射式遮罩的情形中）或反 射（在一反射式遮罩的情形中）。在遮罩的情形中，其支 撐結構一般為一遮罩台，其可確保遮罩支撐於進入的 輻射光束中的一理想位置，且在需要時可相對於光束 移動。 -6- 200407676 (2) 發明說明續頁 -一可程式鏡面陣列。此類裝置的一範例為一可定 陣表面，其具有一黏彈性控制層及一反射表面。 裝置的基本原理為（例如），反射表面之定址區域將 光反射為繞射光，而未定址區域將入射光反射為 射光。使用一適當的濾鏡，可自反射光束中篩檢 非繞射光，而只擋下繞射光；如此光束即依矩陣 址表面的定址圖案而圖案化。使用適當的電子構 執行所需的矩陣定址。關於此鏡面陣列的更多資 見於如—美國專利案號5,296,891及5,523，193，此處以 方式併入本文。在一可程式鏡面陣列的例子中， 撐結構可具體實施為一框架或平台，其可依需要 或移動。 -一可程式LCD陣列。此構造之範例可見於美國專利 5,229,872 ^此處以提及方式併入本文。如上所述， 例中的支撐結構可具體實施為一框架或平台，其 需要固定或移動。 為了簡化起見，本文之其它部分將在特定位置專門 有關遮罩及遮罩台的實例；但是，在此類例子中所討 一般性原理，應適用於較廣域的圖案化構件中。 石版印刷投影裝置可用於（例如）積體電路（1C)的 中。在此情形中，圖案化構件可產生相關於1C中單一 電路圖案，且此圖案可映射於一已塗佈一輻射敏感： 抗蝕劑）層之基板（矽晶圓）上的一目標部分（如包含 多個晶片）。一般而言，一單一晶圓將包含多個相鄰 址矩 此類 入射 非繞 出該 可定 件可 訊可 提及 該支 固定 案號 在此 可依 說明 論的 製造 層的 才料（ 一或 目標 200407676 (3) 發明說明續頁 部分組成的一整體網路，它們經由投影系統相繼接受照射 。在目前的裝置中，利用一遮罩台上遮罩的圖案化，可造 成兩種不同類型機器之間的區別。在一種石版印刷投影裝 置中，一趟動作將整個遮罩圖案曝露於目標部分上，使各 目標部分得到照射；這種裝置通常稱為一晶圓步進機 (wafer stepper)。在通常稱為步進掃描裝置（step-and-scan apparatus)的另一種裝置中，於投影光束下以一指定的參考 方向（「掃描」方向），逐步掃描遮罩圖案，使各目標部吩 得到照射，同時在平行或逆向平行於此方向同步掃描基板 台；因為一般而言，投影系統將有一放大因數Μ (—般< 1) ，掃描基板台的速率V將為掃描遮罩台速率的Μ倍。關於 此處所述之石版印刷裝置的更多資訊可見於如美國專利 案號6,046,792，其以提及方式併入本文。 在使用一石版印刷投影裝置的製程中，一圖案（如在一 遮罩中）映射於至少部分覆蓋一輻射敏感材料（抗蝕劑）層 的基板上。在此成像步驟前，基板可經各種程序處理^例 如打底（priming)、抗姓劑塗佈及一軟烘（soft bake)。曝光之 後，基板接受其它處理，例如曝光後烘乾（post-exposure bake ; PEB)、顯影、硬烘及測量/檢查成像之特徵。此系列 之程序係作為一基礎，以圖案化裝置（如I C)之單一層。然 後此圖案化層再經過各種處理，例如餘刻、離子植入（摻 雜）、金屬電鍍、氧化、化學機械拋光等，其皆為處理一 單層表面。如果需要幾個層時，則必須對每個新層重複整 個程序或其一變化程序。最後，基板（晶圓）上就呈現一裝 -8- 200407676 (4) 發s月說明身頁 置陣列。然後這些裝置藉由一技術，如切割（dicing)或鑛 切（sawing)而彼此分隔，由此個體裝置可安裝於一載架 (carriei·)上，連接到梢（pin)等。關於這種製程的進一步資 sfl可從此書獲付·「微晶片製造·半導體製程的實用指南 (Microchip Fabrication: A Practical Guide to Semiconductor(i) (i) 200407676 发明 Description of the invention (The description of the invention should state: the technical field, prior art, content, embodiments and drawings of the invention are briefly explained) The invention relates to a lithographic projection device, which includes: -A radiation system for providing a radiation projection beam;-a support structure for supporting a patterned member for patterning the projection beam in accordance with a desired pattern;-a vacuum chamber for projecting the beam A vacuum beam path is provided;-a substrate table for a substrate of a supporting building; and-a projection system for projecting a patterned beam onto an i-mark portion of the substrate. The term "patterned member" as used herein should be broadly interpreted as a member that can be used to impart a patterned cross-section to an incoming radiation beam and corresponds to a patterned member that needs to be established in a target portion of a substrate; herein The term "light valve" may also be used. In general, the pattern is related to a special functional layer of the device built on the target part, such as an integrated circuit or other device (see below). Examples of such patterned components include:-a mask. The concept of masks is widely known in lithography, and it includes binary, alternate phase shift, and attenuation phase shift mask forms, as well as various hybrid mask forms. Placing such a mask in a radiation beam will cause the radiation shining on the mask to be selectively transmitted (in the case of a transmissive mask) or reflected (in a reflective mask) according to the pattern on the mask. Hood case). In the case of a mask, its support structure is generally a mask table, which can ensure that the mask is supported at an ideal position in the incoming radiation beam and can be moved relative to the beam when needed. -6- 200407676 (2) Description of the Invention Continued-A programmable mirror array. An example of such a device is an arrayable surface having a viscoelastic control layer and a reflective surface. The basic principle of the device is, for example, that an addressed area of a reflective surface reflects light as diffracted light, while an unaddressed area reflects incident light as incident light. Using an appropriate filter, non-diffracted light can be screened from the reflected light beam, and only the diffracted light is blocked; thus, the light beam is patterned according to the addressing pattern of the matrix address surface. Use appropriate electronics to perform the required matrix addressing. More information on this mirror array is found in, for example, U.S. Patent Nos. 5,296,891 and 5,523,193, which are incorporated herein by reference. In the example of a programmable mirror array, the supporting structure can be embodied as a frame or platform, which can be moved or moved as needed. -A programmable LCD array. An example of this configuration can be found in U.S. Patent 5,229,872 ^ incorporated herein by reference. As mentioned above, the supporting structure in the example can be embodied as a frame or platform, which needs to be fixed or moved. For the sake of simplicity, the rest of this article will focus on examples of masks and mask tables at specific locations; however, the general principles discussed in such examples should be applied to wider area patterned components. Lithographic projection devices can be used in, for example, integrated circuits (1C). In this case, the patterned component can produce a single circuit pattern related to 1C, and this pattern can be mapped to a target portion (silicon wafer) on a substrate (silicon wafer) that has been coated with a radiation-sensitive: resist) layer. (E.g. containing multiple wafers). Generally speaking, a single wafer will contain multiple adjacent address moments. Such incidents do not bypass the settable and can be mentioned. The fixed case number can be mentioned here. Or objective 200407676 (3) Description of the invention A continuum network composed of continuation pages, which are successively illuminated by a projection system. In the current device, the patterning of a mask on a mask table can cause two different types The difference between machines. In a lithographic projection device, a single action exposes the entire mask pattern to the target part, so that each target part is illuminated; this device is often called a wafer stepper ). In another device commonly referred to as a step-and-scan apparatus, the mask pattern is gradually scanned under a projected beam in a specified reference direction ("scanning" direction) to make each target The part is irradiated, and the substrate table is scanned simultaneously in parallel or antiparallel to this direction; because in general, the projection system will have a magnification factor M (-general < 1) to scan the substrate The speed V will be M times the speed of the scanning mask table. More information about the lithographic printing device described herein can be found in, for example, U.S. Patent No. 6,046,792, which is incorporated herein by reference. Using a lithographic printing During the manufacturing process of the projection device, a pattern (such as in a mask) is mapped on a substrate that is at least partially covered with a layer of radiation-sensitive material (resist). Prior to this imaging step, the substrate can be processed by various procedures. Priming, anti-surname coating, and a soft bake. After exposure, the substrate undergoes other treatments, such as post-exposure bake (PEB), development, hard bake, and measurement / inspection imaging Features. This series of procedures is used as a basis to pattern a single layer of a device (such as an IC). The patterned layer is then subjected to various treatments, such as etching, ion implantation (doping), metal plating, and oxidation. , Chemical mechanical polishing, etc., which are all dealing with a single layer surface. If several layers are required, the entire process or a change process must be repeated for each new layer. Finally, the substrate (wafer) is Now it is installed -8- 200407676 (4) Announces the description of the body placement array. These devices are then separated from each other by a technique such as dicing or sawing, whereby individual devices can be installed in a Carrier (carriei), connected to pins, etc. Further information on this process can be obtained from this book "Microchip Fabrication: A Practical Guide to Semiconductor Process (Microchip Fabrication: A Practical Guide to Semiconductor
Processing)」第三版，Peter van Zant 著，1997 年，McGraw HillProcessing), Third Edition, by Peter van Zant, 1997, McGraw Hill
Publishing公司出版，ISBN 0-07-067250-4，本文以提及方 式併入。 一 為了簡化，在下文中投影系統稱為「透鏡」；但是，此 術語應廣義地解釋為包含各種類型的投影系統，如包含折 射光學、反射光學及反折射（catadioptric)系統。該輻射系 統亦可包含根據這些設计形式操作的組件，用以引導、成 形或控制輻射投影光束，而此類組件在下文中亦可統稱或 單稱為「·:透鏡」。此外’石版印刷裝置亦可為具有兩個或 多個基板台（及兩個以上遮罩台）的形式。在這種「多平台 」裝置中，可平行使用額外的平台，或在一或多個平台上 執行預備步驟，而一或多個其它平台則用於曝光。雙平台 石版印刷裝置在如美國專利案號5,969,441及世界專利號 98/4079 1均有說明，此處以提及方式併入本文。 在這種石版印刷裝置中，通常有必須要在裝置中提供 不同氣體壓力的幾個區域，如某些區域處於大氣壓力下， 而另一些區域處於真空中。但是，裝置中需要可自由移動 但分隔不同壓力區域的組件。因而有必要配置一軸承使組 件可運動，及一真空密封，用以保持由可移組件分隔之區 -9- 200407676 (5) 發辦說明續頁 域間的壓差。 附圖2(a)說明這種真空密封氣體軸承總成。它包含一滑 塊10,其分隔處於大氣壓力下的一氣體區域與一真空的排 空室1 2。在滑塊1 0與室1 2間之介面提供一氣體軸承1 4。這 可包含一或多個孔或凹槽，經其泵入氣體而產生一氣墊以 支撐滑塊1 0，使其運動時只有很小的摩擦力。泵入氣體所 經的孔或凹槽可由台地（land)分隔，氣體受壓駐留其上。 滑塊1 0的運動由未顯示的構件，如電磁致動器或馬達引發^ 在滑塊10與室12之間的介面還有一差壓密封16。差壓 密封16包含一或多個連續的凹槽或孔，經由其一真空泵可 吸取氣體。因此，由氣體軸承1 4排出並向室1 2的真空内部 運動的任何氣體，皆經差壓密封1 6清除。 關於真空密封氣體軸承總成的進一步詳細内容，在美 國專利案號US 4，191，3 85中已說明，此處以提及方式併入 本文。 如圖2(b)所示，此類總成的一個問題是，真空空間外的 大氣壓力對滑塊1 0的整個上表面施加一壓力，但在滑塊1 0 的相反側卻沒有施加對應的真空壓力，而只有氣體軸承上 的壓力（圖2(b)中以向上的大箭頭表示）。由於滑塊10上較 大的彎曲力矩，這種壓力分佈的結果使其趨於變形。但是 ，由於對氣體軸承滑動表面的精度要求很高，所以不允許 變形。在圖中，滑動表面間的缝隙未按比例顯示。在實務 中，縫隙極小，因而表面必須平坦且對應一高公差。因此 ，傳統上設計的滑塊1 0非常堅硬因而很重，以避免滑動表 -10- 200407676 (6) 發明說明續頁 面的任何變形。於是造成的問題就是需要很大的力量才能 移動笨重的滑塊1 0。 當此類氣體軸承總成用於一石版印刷裝置中時，如為 支樓包括一基板台或一遮罩台的一滑塊，必須迅速移動且 必須經常加速這些平台，就產生笨重的設計要求較大的力 量、沈重的質量平衡問題，這意味著裝置中有許多力的浪 費。 本發明的一個目標就是至少要部分地減輕上述問題^ 依據本-發明在一石版印刷裝置中實現的這些及其它目 標，如公開文獻中所指明的，其特徵進一步包括： - 使用中由一氣體軸承支撐的一可動移構件，該可動移 構件有相反的第一和第二側，該第二侧曝露於該真空 室内部；及 - 在可移了動構件的第一側上的一壓力補償容器，用以在 該可移動構件的該第一和第二側的至少一部分上提供 一大體上相等的氣體壓力。 在可移動構件的第一和第二侧的至少一部分上提供大 體相等的氣體壓力，大體上可減少可移動構件上的彎曲力 矩，使其剛度和重量減小，同時在氣體軸承的滑動表面上 仍保持必要的公差，以進行滿意的操作。氣體壓力的均衡 可參照大氣壓力來評價，如一側的壓力為大致真空，而另 一側的壓力為超高真空，但二者的壓力相對於大氣壓力基 本上為零。 最好壓力補償容器的内部由一通路與可移動構件第二 -11- 200407676 (7) 發明說明續頁 側上的區域溝通。這就易於被動地實現壓力均衡，而無需 任何額外的設備、泵、壓力監視等。 最好壓力補償容器至少可部分變形。這可減輕其重量。 最好壓力補償容器的至少一壁，在氣體軸承支撐可移 動構件的鄰近區域，接觸可移動構件。這表示壓力補償容 器上的外部壓力施加於可移動構件上的力，實質上與氣體 軸承施加於可移動構件上的力在同一條線上，因此可移動 構件上的轉矩或彎曲力矩實質上最小。 - 最好在可移動構件的第二側上有一空心構件，一孔從 該空心構件的内部通過該可移動構件且通過該壓力補償 容器。這表示在可移動構件（如一滑塊）内可含有空氣，且 電纜可導引至滑塊之外。最好在孔周圍有風箱，以隔離該 壓力補償容器的内部與該空心構件的内部。風箱有一障壁 ，以保捧壓力補償容器内部的壓力與空心構件内部的壓 力不同，但因為有風箱，壓力補償容器仍可變形，尤其在 變形的風箱未對可移動構件施壓時。因此，可移動構件的 壓力補償容器的變形藉由風箱減弱，因而仍然避免了滑動 表面的變形。 可移動構件可以為一滑塊，使一基板台或遮罩台可相 對xy座標定位，或可移動構件可以為一轉動體，使之圍繞 一特定的軸定位，或可結合線性滑動與旋轉兩種方式定位。 壓力補償容器中及可移動構件的第二側上該真空室中 的氣體壓力最好小於大氣壓力，壓力小於100帕斯卡（Pa) 或甚至較此低幾個或多個等級，如少於10_2帕斯卡（10_4mbar) -12- 200407676 (8) 發明說明續頁 就更佳，且最好為真空或超高真空。 依據本發明的另一項觀點，提供的一裝置製造方法包 括以下步驟： - 提供至少部分覆蓋一輻射敏感材料層的一基板； -用一輻射系統提供一輻射投影光束； -向一真空室内的投影光束提供一真空光束路徑； -用圖案化構件賦予該投影光束之斷面一圖案； - 將輻射的圖案化光束投影至輻射敏感材料層的一目標 部分，- 其特徵為：提供由一氣體軸承支撐的一可移動構件，該構 件具有相反的第一和第二側，該第二側曝露於該真空室的 内部；在可移動構件的第一側上提供一壓力補償容器，且 大體上均衡該可移動構件之該第一侧上的該壓力補償容 器中，及諸—可移動構件之該第二侧的至少一部分上的氣體 壓力。 雖然文中具體參考了依據本發明之裝置在I C製造中的 應用，但應當明白此裝置還可有許多其它可能的應用。例 如，其可用於製造整合光學系統、磁性區域記憶體之導引 及偵測圖案、液晶顯示器面板、薄膜磁頭等。習知技術人 士將明白在這些替代應用中，文中使用的術語「主光罩」 、「晶圓」或「晶粒」應視為可分別由一般性的術語「遮 罩」、「基板」及「目標部分」所取代。 在本文件中，術語「輻射」及「光束」係用來包含所 有形式的電磁輻射，包含紫外線輻射（如波長為365、248 -13- 200407676 (9) 頁 、：I93、I57或I26奈米者）及EUV(遠紫外線輻射，如其波長 範圍為5至2〇奈米者），以及離子束或電子束之類的粒手束。 現在將僅藉由範例，並參考所附的架構圖來說明本發 明具體實施例，其中： 圖1顯示依據本發明一項具體貫施例的一石版印刷投 影裝置； 圖2 U)顯示一滑塊及其支撐配置的示意斷面圖； 圖2(b)顯示圖2(a)中滑塊上所受的力； 一 圖3 (a)顯示實施本發明之一滑塊裝置的斷面圖； 圖3 (b)顯示圖3 ( a)中滑塊上所受的力；以及 圖4顯示依據本發明’滑塊裝置的另一項具體實施例的 斷面圖。 在圖中，對應的參考符號係代表對應的零件。 I明洋細說明 施例1 圖1顯示依據本發明的一石版印刷投影裝置。該裝置包 括： 一輻射系統L· A、IL用以提供一輻射投影光束p B (如電子 或離子的UV或EUV輻射）； 弟一物件台（遮罩台）MT具有一第一物件（遮罩）支架 ，支撐一遮罩MA(如一主光罩），且連接至第一定位構 件PM，以參照項目PL準確定位遮罩； 一 • 一第二物件台（基板台）W2T具有一第二物件（基板）支架 ，用以支撐一基板W2 (如一塗佈了抗蝕劑的矽晶圓）， 200407676 (10) 發明說明續頁 並連接至第二定位構件P2W，以參照項目PL準確定位 基板； • 一第三物件台（基板台）W3T具有一第三物件（基板）支架 ’支撐一基板W 3 (如一塗佈了抗蝕劑的矽晶圓），且連 接至第三定位構件P3 W，以參照項目PL準確定位基板 ;及 • 一投影系統（「透鏡」）PL(如一折射或反折射系統、一 鏡面群組或一場偏向器（field deflectors)陣列），用以將 遮罩Μ A的一照射部分映射於基板W的一目標部分C上。 輕射系統包括一輻射源L A，其生成一輻射光束（如磁帶 環（storage ring)或同步加速器中，圍繞一電子束之路徑的 聚頻磁鐵（undulator)或增頻磁鐵（wiggler)，一電漿源、一電 子或離子束源、一水銀燈或一雷射）。使光束穿越照明系 統IL中的·各種光學組件，因此最後獲得的光束PB之斷面 具有預期的形態和亮度分佈。 隨後光束PB照射在遮罩MA上，其在一遮罩台MT上支撐 於一遮罩支架中。經遮罩MA選擇性反射（或透射）後，光 束PB通過「透鏡」PL，使光束PB聚焦於基板W2、W3的一 目標部分 <：上。借助定位構件P2W、P3W及干涉位移測量構 件IF，町準確移動基板台W2T、W3T，以在光束PB的路徑 中定位不同的目標部分C。以類似方式，定位構件PM及干 涉位移測量構件IF，可用於參照光束P B的路徑準確定位 遮罩]ViA，如自遮罩庫機械地取得遮罩MA後或在一掃描動 作中。在先前技術中’ 一般用一長行程模組（粗略定位） 200407676 (Π) 及一短行程模組（精確定位）以實現物件台ΜΤ ’它們均未明確標示於圖1中。 所述的裝置可用於兩種不同的模式： • 在步進模式中，遮罩台ΜΤ基本上保持固 個遮罩影像在一次處理（即一「快閃」）中投影 分C上。然後基板台W2T在X及γ方向偏移，使 射不同的目標部分C ; • 在掃描模式中，基本上適用相同的情形 的目標部-分C未在一「快閃」中曝光。而遮罩 給定的方向（即所謂的「掃描方向」，如γ方向 移動，使投影光束PB可掃描整個遮罩影像； 台W2T則以一速率V = Mv與之同向或反方移動， 鏡PL的放大率（如M=l/4或1/5)。以此方式，可 大的目標·部分C ’而不需犧牲解析度。 在依據本發明的一石版印刷投影裝置中，4 一真空室8中至少有第一及第二物件台的其中 參照圖3(a)，顯示一滑塊配置之斷面，上述 實施例中的遮罩台MT或基板台W2T、W3T的移 配置。對應於圖2(a)的零件由對應的參考符號 關說明將不再重複。該裝置包括一可移動構科 為一滑塊1 0。在滑塊1 0的第一側2 2上為一壓力 ，之外為氣體如空氣或沖洗氣，其實質上處於 在滑塊1 0之下其第二側2 4上為一含有減壓氣 間。滑塊1 0支樓於一大氣轴承1 4上，真空空間 發明說明續頁 ‘ W2T的運動 定，而一整 到一目標部 光束P B可照 ，但一給定 台MT可在_ )以一速率v 同時，基板 其中Μ為透 曝光一相當 :口圖1所示， 之 一〇 本發明具體 動可採用此 表示，其有 -，在本例中 補償容器20 大氣壓力。 體的真空空 與外部氣體 200407676 (12) 發明說明續頁 之間的壓差由一差壓密封16保持，對此前面已參照圖2(a) 說明。Published by Publishing Company, ISBN 0-07-067250-4, which is incorporated herein by reference. -For the sake of simplicity, projection systems are referred to as "lenses" in the following; however, this term should be interpreted broadly to include various types of projection systems, such as those that include refractive optics, reflective optics, and catadioptric systems. The radiation system may also include components operating according to these design forms to guide, shape or control the radiation projection beam, and such components may be collectively or simply referred to as "·: lens" in the following. In addition, the 'lithographic printing apparatus may have a form having two or more substrate tables (and two or more mask tables). In this "multi-platform" device, additional platforms can be used in parallel, or preliminary steps can be performed on one or more platforms, while one or more other platforms are used for exposure. Dual-platform lithographic printing devices are described in, for example, U.S. Patent No. 5,969,441 and World Patent No. 98/4079 1, which are incorporated herein by reference. In such a lithographic printing apparatus, there are usually several regions where different gas pressures must be provided in the apparatus, for example, some regions are under atmospheric pressure, and others are under vacuum. However, the device requires components that can move freely but separate different pressure regions. Therefore, it is necessary to arrange a bearing to make the component moveable and a vacuum seal to maintain the area separated by the movable component. -9- 200407676 (5) Development Instructions Continued Page The pressure difference between the fields. Figure 2 (a) illustrates such a vacuum-sealed gas bearing assembly. It contains a sliding block 10 which separates a gas region under atmospheric pressure from a vacuum evacuation chamber 12. A gas bearing 14 is provided at the interface between the slider 10 and the chamber 12. This may include one or more holes or grooves through which gas is pumped to create an air cushion to support the slider 10, causing it to move with little friction. The holes or grooves through which the gas is pumped can be separated by a land, on which the gas resides under pressure. The movement of the slider 10 is caused by components not shown, such as an electromagnetic actuator or a motor. There is also a differential pressure seal 16 at the interface between the slider 10 and the chamber 12. The differential pressure seal 16 contains one or more continuous grooves or holes through which a gas can be sucked by a vacuum pump. Therefore, any gas exhausted from the gas bearing 14 and moving toward the vacuum inside the chamber 12 is removed by the differential pressure seal 16. Further details of the vacuum-sealed gas bearing assembly are described in U.S. Patent No. 4,191,385, which is incorporated herein by reference. As shown in Figure 2 (b), a problem with this type of assembly is that the atmospheric pressure outside the vacuum space exerts a pressure on the entire upper surface of the slider 1 0, but no corresponding is applied on the opposite side of the slider 1 0 The vacuum pressure is only the pressure on the gas bearing (indicated by the large upward arrow in Figure 2 (b)). Due to the large bending moment on the slider 10, the result of this pressure distribution tends to deform it. However, due to the high accuracy requirements for the sliding surfaces of gas bearings, deformation is not allowed. In the figure, the gaps between the sliding surfaces are not shown to scale. In practice, the gap is extremely small, so the surface must be flat and correspond to a high tolerance. Therefore, the slider 10 traditionally designed is very hard and heavy to avoid any deformation of the sliding surface -10- 200407676 (6) Description of the invention. The problem is that it takes a lot of force to move the bulky slider 10. When such gas bearing assemblies are used in a lithographic printing device, if a slider including a base plate stage or a mask stage for a branch building must be moved quickly and these platforms must be frequently accelerated, heavy design requirements are created Large forces and heavy mass balance problems mean that there is a lot of wasted power in the device. It is an object of the present invention to at least partially alleviate the above-mentioned problems ^ According to the present invention, these and other objectives achieved in a lithographic printing apparatus, as specified in the published literature, further include:-a gas in use A bearing-supported movable member having opposite first and second sides, the second side being exposed inside the vacuum chamber; and-a pressure compensation on the first side of the movable member A container for providing a substantially equal gas pressure on at least a portion of the first and second sides of the movable member. Providing substantially equal gas pressure on at least a portion of the first and second sides of the movable member can substantially reduce the bending moment on the movable member, reduce its stiffness and weight, and at the same time on the sliding surface of the gas bearing The necessary tolerances are still maintained for satisfactory operation. The equilibrium of gas pressure can be evaluated with reference to atmospheric pressure. For example, the pressure on one side is roughly vacuum, and the pressure on the other side is ultra-high vacuum, but the pressure of the two is basically zero relative to the atmospheric pressure. Preferably, the inside of the pressure compensating container is communicated with a movable member by a passage -11-200407676 (7) Description of the invention continued on the side of the area on the side. This makes it easy to achieve pressure equalization passively without any additional equipment, pumps, pressure monitoring, etc. Preferably, the pressure compensation container is at least partially deformable. This can reduce its weight. Preferably, at least one wall of the pressure compensating container contacts the movable member in a region adjacent to the gas bearing supporting the movable member. This means that the force exerted on the movable member by the external pressure on the pressure compensation container is substantially on the same line as the force exerted by the gas bearing on the movable member, so the torque or bending moment on the movable member is substantially the smallest. . -Preferably, a hollow member is provided on the second side of the movable member, and a hole passes from the inside of the hollow member through the movable member and through the pressure compensation container. This means that air can be contained in a movable member, such as a slider, and the cable can be routed outside the slider. It is preferable to have a bellows around the hole to isolate the inside of the pressure compensation container from the inside of the hollow member. The bellows has a barrier to ensure that the pressure inside the pressure compensation container is different from the pressure inside the hollow member, but because of the bellows, the pressure compensation container can still be deformed, especially when the deformed bellows does not put pressure on the movable member. Therefore, the deformation of the pressure-compensated container of the movable member is weakened by the bellows, and thus deformation of the sliding surface is still avoided. The movable member can be a slider, so that a substrate stage or a mask stage can be positioned relative to the xy coordinates, or the movable member can be a rotating body, which can be positioned around a specific axis, or a combination of linear sliding and rotating Way to locate. The pressure of the gas in the pressure-compensated container and the vacuum chamber on the second side of the movable member is preferably less than atmospheric pressure, the pressure is less than 100 Pascals (Pa) or even a few or more levels lower, such as less than 10_2 Pascal (10_4mbar) -12- 200407676 (8) Description of the invention The continuation page is better, and the vacuum or ultra-high vacuum is preferred. According to another aspect of the present invention, a device manufacturing method is provided including the following steps:-providing a substrate at least partially covering a layer of radiation-sensitive material;-providing a radiation projection beam with a radiation system; The projected beam provides a vacuum beam path;-a pattern is given to the cross-section of the projected beam with a patterning member;-a patterned beam of radiation is projected onto a target portion of the radiation-sensitive material layer,-characterized by: A movable member supported by a bearing, the member having opposite first and second sides, the second side being exposed to the inside of the vacuum chamber; a pressure compensation container is provided on the first side of the movable member, and generally Equalize the gas pressure in the pressure compensation container on the first side of the movable member and on at least a portion of the second side of the movable member. Although the text specifically refers to the application of the device according to the invention in IC manufacturing, it should be understood that there are many other possible applications for this device. For example, it can be used to manufacture integrated optical systems, guidance and detection patterns for magnetic area memory, liquid crystal display panels, and thin-film magnetic heads. Those skilled in the art will understand that in these alternative applications, the terms "main mask", "wafer", or "die" used in this text should be considered as being deduced by the general terms "mask", "substrate", and "Target part". In this document, the terms "radiation" and "beam" are used to include all forms of electromagnetic radiation, including ultraviolet radiation (such as wavelengths 365, 248 -13- 200407676 (9) pages, I93, I57 or I26 nm ) And EUV (far ultraviolet radiation, such as those with a wavelength range of 5 to 20 nm), and granular hand beams such as ion beams or electron beams. A specific embodiment of the present invention will now be described by way of example only and with reference to the accompanying architecture diagram, wherein: FIG. 1 shows a lithographic projection projection device according to a specific embodiment of the present invention; FIG. 2 U) shows a slide A schematic sectional view of a block and its supporting configuration; Fig. 2 (b) shows the force on the slider in Fig. 2 (a); Fig. 3 (a) shows a sectional view of a slider device implementing the present invention Figure 3 (b) shows the force on the slider in Figure 3 (a); and Figure 4 shows a cross-sectional view of another embodiment of the slider device according to the present invention. In the figures, the corresponding reference symbols represent corresponding parts. Detailed description of Mingyang Example 1 FIG. 1 shows a lithographic projection apparatus according to the present invention. The device includes: a radiation system L · A, IL for providing a radiation projection light beam p B (such as UV or EUV radiation of electrons or ions); an object stage (mask stage) MT having a first object (shield Mask) bracket that supports a mask MA (such as a main photomask) and is connected to the first positioning member PM to accurately position the mask with reference to item PL; a second object table (substrate table) W2T has a second Object (substrate) holder to support a substrate W2 (such as a resist-coated silicon wafer), 200407676 (10) Description of the Invention Continued and connected to the second positioning member P2W to accurately position the substrate with reference to item PL • A third object stage (substrate stage) W3T has a third object (substrate) holder 'supporting a substrate W 3 (such as a resist-coated silicon wafer), and is connected to the third positioning member P3 W To accurately position the substrate with reference item PL; and • a projection system ("lens") PL (such as a refractive or retroreflective system, a mirror group, or an array of field deflectors) for masking M A An irradiated part of A target part C. The light emission system includes a radiation source LA, which generates a radiation beam (such as a storage ring or synchrotron, an undulator or a wiggler that surrounds the path of an electron beam, an electric Plasma source, an electron or ion beam source, a mercury lamp or a laser). The light beam passes through various optical components in the lighting system IL, so the cross section of the finally obtained light beam PB has a desired shape and brightness distribution. The light beam PB is then irradiated on the mask MA, which is supported in a mask holder on a mask table MT. After being selectively reflected (or transmitted) by the mask MA, the light beam PB passes through the "lens" PL, so that the light beam PB is focused on a target portion < of the substrates W2, W3. With the help of the positioning members P2W and P3W and the interference displacement measuring member IF, the substrate stages W2T and W3T are accurately moved to locate different target portions C in the path of the beam PB. In a similar manner, the positioning member PM and the interference displacement measuring member IF can be used to accurately position the mask with reference to the path of the beam PB] ViA, such as after the mask MA is mechanically obtained from the mask library or during a scanning operation. In the prior art, a long-stroke module (rough positioning) 200407676 (Π) and a short-stroke module (precise positioning) are generally used to realize the object table MT. They are not clearly marked in FIG. 1. The device described can be used in two different modes: • In the step mode, the mask table MT basically keeps a fixed mask image projected on a point C in a single process (ie, a "flash"). Then the substrate table W2T is shifted in the X and γ directions, so that different target portions C are shot; • In the scan mode, the target portion C which is basically applicable to the same situation is not exposed in a “flash”. The given direction of the mask (that is, the so-called "scanning direction", such as moving in the γ direction, allows the projection beam PB to scan the entire mask image; the stage W2T moves at the same rate or opposite to it at a rate V = Mv. PL magnification (such as M = 1/4 or 1/5). In this way, a large target · part C 'can be achieved without sacrificing resolution. In a lithographic projection projector according to the present invention, 4- At least the first and second object stages are included in the vacuum chamber 8. Referring to FIG. 3 (a), a cross section of a slider configuration is shown. The parts corresponding to FIG. 2 (a) will not be repeated by the corresponding reference signs. The device includes a movable structure as a slider 10. On the first side 22 of the slider 10 is a The pressure outside is a gas such as air or flushing gas, which is substantially below the slider 10 on a second side 24 which contains a decompression gas chamber. The slider 10 is on an atmospheric bearing 14 The description of the invention of the vacuum space continuation page 'W2T's motion is fixed, and a whole to a target part of the beam PB can shine, but a given platform MT can A speed v the same time, wherein the substrate is transparent exposing a relatively Μ: port shown in FIG. 1, the ten movable invention can be used to express specifically, it has - in this example, 20 atmospheric pressure compensating container. The vacuum between the body and the outside air 200407676 (12) Description of the invention The pressure difference between the continuation pages is maintained by a differential pressure seal 16, which has been described previously with reference to Fig. 2 (a).
滑塊1 0有一通道2 6，使壓力補償容器2 0的内部，與滑 塊1 0第二側24上之區域中的真空空間溝通。當達到均衡時 ，壓力補償容器20内部的壓力將與真空空間中的相同，因 此也將為真空。壓力補償容器2 0的内部也可由一獨立的氣 體抽空構件抽空，而無需通道2 6。這較為有利，因為在此 情形下，由於釋氣造成壓力補償容器2 0中存在的任何污普 ，將不會-到達滑塊1 0第二側2 4上對污染很敏感的真空空 間。依據上述的任一方案，滑塊10之第一側22和第二側24 的主要部分上的氣體壓力相同，因此滑塊1 0上沒有較大的 彎曲力矩，因而不需要高剛度，也可造得更輕些。當然在 裝置的上部分始終存在外部氣體壓力，但壓力補償容器的 上壁2 8將-景終應力傳遞至壓力補償容器2 0的側壁3 0。因此 ，壓力未分散於滑塊1 〇的整個第一側2 2，而是集中於與側 壁3 0接觸的滑塊1 0。側壁3 0定位於氣體軸承1 4的對應位置 。如圖3 (b)所示，其結果為側壁3 0施加於滑塊1 0上的力 (圖3 (b)中以向下的大箭頭表示）與氣體軸承1 4施力口於滑 塊10上的力（（圖3(b)中以向上的箭頭表示）在一條線上。 在使用中，大氣軸承1 4的向上應力不僅必須抵消裝置 上部分的大氣壓力，而且必須抵消滑塊1 〇及相關組件的重 量。重力作用產生的滑塊1 〇的重量當然也分散在整個滑塊 1 0，因而滑塊1 0上仍然存在一些彎曲力矩，但這是裝置固 有的，因而不能消除，但因為其上表面上105帕斯卡的氣 -17- 200407676 (13) 體壓力，滑塊1 0不會變形，使滑塊可造得 了彎曲力矩。 如圖3(a)所示，因為壓力補償容器20内 補償壓力補償容器2 0的上壁2 8上承受的夕 以顯示其上壁2 8可向内彎曲而變形。當然 可部分變形並不是本發明的要點，但其優 補償容器2 0造得剛度小而重量輕。壓力補 特點是，改變氣體壓力在滑塊1 0上的分佈 償容器20的側壁30傳輸而非散佈於滑塊 22 ° 具體實施例2 圖4顯示本發明的另一較.佳具體實施例 不同的特點。在前面的圖式中，滑塊1 0只 但在實務冲如圖4所示為一更合理的形態 的下側有一空心構件，使滑塊内含有空氣 了將電纜等導出空心構件3 2的内部，一 並穿過壓力補償容器20的上壁28。圍繞孔 3 6，將外部空氣與壓力補償容器2 0内部的 使外部空氣不能通過孔3 4沿任何電纜（4 構件3 2的内部。風箱3 6由金屬或其它適當 為一折疊形式。風箱3 6的依從性使壓力補 可變形，但風箱3 6沒有或有很小的彈性， 壓縮風箱時，沒有應力傳輸至滑塊1 〇的苐 式，壓力補償容器2 0的上壁2 8可變形且重 發明說明續頁 更輕，所以減少 部的真空，不能 卜部氣體壓力，所 壓力補償容器20 勢在於可使壓力 償容器2 0的主要 ，使其經壓力補 的整個第一表面 。只說明與圖3(a) 示意為一光束， ，其中在滑塊1 0 ，或其它氣體。為 孔3 4穿過滑塊1 0 3 4有氣密式風箱 真空密封隔離， 匕顯示）進入空心 k的材料製成，且 償容器的上壁2 8 使得實務中垂直 『一側2 2。以此方 :量輕，但沒有應 -18- 200407676 發明說明續頁 (14) 力傳 輸至其與 滑塊1 〇的接觸點， 其 距氣體轴承1 4的 支 撐 點 較遠 。壓力補償容器20之上壁28上 的大氣壓力產生 的 多 數 應力 ，仍然經 與大氣軸承1 4在一 條 •線上的侧壁3 0傳 •輸 0 當 缺， ο'、 ^ 滑塊1 0上 還有一較小的附加 ，其等於孔3 4的 面 積 與 大氣 壓力之乘 積，但此力只作用 於 空心構件3 2之壁 與 滑 塊 1 0的 結合處，仍遠小於壓力補償 容 器20之上壁28上 的 總 氣 體壓 力。 儘 管上面已 對本發明的特定 具 體實施例進行說 明 1 It 當暸 解木發明 也可以上述内容之外的方式實施。此 說 明 並 非限 制本發明 〇 圖式 代表符號 說明 10 滑塊 12 抽空 室 14 氣體 車由承 16 差壓 密封 20 壓力 補償容器 22 第一 侧 24 第二 側 26 通道 28 上壁 ▲ 30 侧壁 32 空心 構件 - 34 孔 36 氣密 式風箱The slider 10 has a channel 26, so that the inside of the pressure compensation container 20 communicates with the vacuum space in the area on the second side 24 of the slider 10. When equilibrium is reached, the pressure inside the pressure compensation container 20 will be the same as in the vacuum space, and therefore will also be a vacuum. The inside of the pressure compensation container 20 can also be evacuated by a separate gas evacuation member without the need for the passage 26. This is advantageous because in this case any dirt present in the pressure compensation vessel 20 due to outgassing will not-reach the vacuum space sensitive to pollution on the second side 24 of the slider 10. According to any of the above schemes, the gas pressure on the main part of the first side 22 and the second side 24 of the slider 10 is the same, so there is no large bending moment on the slider 10, so high rigidity is not required, and Made lighter. Of course, there is always external air pressure in the upper part of the device, but the upper wall 28 of the pressure compensation container transmits the final stress to the side wall 30 of the pressure compensation container 20. Therefore, the pressure is not dispersed over the entire first side 22 of the slider 10, but is concentrated on the slider 10 in contact with the side wall 30. The side wall 30 is positioned at a corresponding position of the gas bearing 14. As shown in Fig. 3 (b), the result is that the force exerted by the side wall 30 on the slider 10 (indicated by a large downward arrow in Fig. 3 (b)) and the force exerted by the gas bearing 14 on the slider The force on 10 (indicated by the upward arrow in Figure 3 (b)) is on a line. In use, the upward stress of the atmospheric bearing 14 must not only offset the atmospheric pressure on the upper part of the device, but must also offset the slider 1 〇 And the weight of related components. Of course, the weight of the slider 10 caused by gravity is also dispersed throughout the slider 10, so there are still some bending moments on the slider 10, but this is inherent to the device and cannot be eliminated, but Because of the gas pressure of 105 Pascal on its upper surface, 2004-17676 (13), the slider 10 will not be deformed, so that the slider can create a bending moment. As shown in Figure 3 (a), because the pressure compensation container 20 The bearing on the upper wall 28 of the inner compensation pressure compensation container 20 shows that the upper wall 28 can be bent inwardly and deformed. Of course, partial deformation is not the gist of the present invention, but its superior compensation container 20 is made Low stiffness and light weight. The pressure compensation feature is to change the gas pressure in the slider 1. The side wall 30 of the distribution compensation container 20 on 0 is transmitted instead of being scattered on the slider 22 ° Specific Embodiment 2 FIG. 4 shows the different features of another preferred embodiment of the present invention. In the previous figure, the slider 10 but there is a hollow member on the underside of a more reasonable form as shown in Figure 4 so that the slider contains air to lead cables and the like out of the hollow member 3 2 and pass through the pressure compensation container together. 20 on the upper wall 28. Surround the holes 36, 6 with the outside air and the pressure compensation container 20 inside so that outside air cannot pass through the holes 3 4 along any cable (4 inside the member 32. The bellows 36 is made of metal or other suitable It is a folded form. The compliance of the bellows 36 makes the pressure compensation deformable, but the bellows 36 has no or little elasticity. When the bellows is compressed, there is no stress transmission to the slider 10. The pressure compensation The upper wall 28 of the container 20 can be deformed and the invention is described. The continuation page is lighter, so the vacuum in the part is reduced, and the gas pressure in the part cannot be reduced. The pressure compensation container 20 is mainly capable of making the pressure compensation container 2 The entire first surface of pressure compensation. Figure 3 (a) is a light beam, which is in the slider 1 0, or other gas. The hole 3 4 passes through the slider 1 0 3 4 and is hermetically sealed by a hermetically sealed bellows. k is made of material, and the upper wall 2 8 of the compensation container is vertical in practice. "One side 2 2. In this way: light weight, but there is no response to -18- 200407676 Description of the invention Continued (14) Force transmission to it and The contact point of the slider 10 is far from the support point of the gas bearing 14. The majority of the stress generated by the atmospheric pressure on the pressure compensation container 20 wall 28 still passes through the side of the line with the atmospheric bearing 14 Wall 3 0 is transmitted. 0 is missing. There is a small addition on ο ′, ^ slider 1 0, which is equal to the product of the area of the hole 34 and the atmospheric pressure, but this force only acts on the hollow member 3 2 The joint between the wall and the slider 10 is still much smaller than the total gas pressure on the wall 28 above the pressure compensation container 20. Although the specific embodiments of the present invention have been described above, it is understood that the invention can also be implemented in ways other than the above. This description is not a limitation of the present invention. Illustrative symbols are illustrated. 10 Slider 12 Evacuation chamber 14 Gas car is supported by 16 Differential pressure seal 20 Pressure compensation container 22 First side 24 Second side 26 Channel 28 Upper wall ▲ 30 Side wall 32 Hollow Component-34-hole 36 air-tight bellows