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SG11202011279VA - Block copolymer comprising block having polysilane skeleton and block having polysilazane skeleton - Google Patents

Block copolymer comprising block having polysilane skeleton and block having polysilazane skeleton

Info

Publication number
SG11202011279VA
SG11202011279VA SG11202011279VA SG11202011279VA SG11202011279VA SG 11202011279V A SG11202011279V A SG 11202011279VA SG 11202011279V A SG11202011279V A SG 11202011279VA SG 11202011279V A SG11202011279V A SG 11202011279VA SG 11202011279V A SG11202011279V A SG 11202011279VA
Authority
SG
Singapore
Prior art keywords
block
skeleton
polysilazane
polysilane
copolymer
Prior art date
Application number
SG11202011279VA
Inventor
Takashi Fujiwara
Yuji Tashiro
Original Assignee
Merck Patent Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent Gmbh filed Critical Merck Patent Gmbh
Publication of SG11202011279VA publication Critical patent/SG11202011279VA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/62—Nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42—Block-or graft-polymers containing polysiloxane sequences
    • C08G77/452—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Silicon Polymers (AREA)
  • Formation Of Insulating Films (AREA)
SG11202011279VA 2018-06-04 2019-05-29 Block copolymer comprising block having polysilane skeleton and block having polysilazane skeleton SG11202011279VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018107089A JP2019210370A (en) 2018-06-04 2018-06-04 Block copolymer comprising block having polysilane skeleton and block having polysilazane skeleton
PCT/EP2019/063910 WO2019233838A1 (en) 2018-06-04 2019-05-29 Block copolymer comprising block having polysilane skeleton and block having polysilazane skeleton

Publications (1)

Publication Number Publication Date
SG11202011279VA true SG11202011279VA (en) 2020-12-30

Family

ID=66690350

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202011279VA SG11202011279VA (en) 2018-06-04 2019-05-29 Block copolymer comprising block having polysilane skeleton and block having polysilazane skeleton

Country Status (8)

Country Link
US (1) US11466127B2 (en)
EP (1) EP3802667B1 (en)
JP (2) JP2019210370A (en)
KR (1) KR102705085B1 (en)
CN (1) CN112236466B (en)
SG (1) SG11202011279VA (en)
TW (1) TW202003643A (en)
WO (1) WO2019233838A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020083728A (en) * 2018-11-29 2020-06-04 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ Amorphous silicon formation composition formed by containing block copolymer, and production method of amorphous silicon film therewith
JP2020102525A (en) * 2018-12-21 2020-07-02 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ Siliceous film-forming composition containing block copolymer, and manufacturing method of siliceous film using the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5008422A (en) * 1985-04-26 1991-04-16 Sri International Polysilazanes and related compositions, processes and uses
JP2613787B2 (en) 1987-08-13 1997-05-28 財団法人石油産業活性化センター Inorganic silazane high polymer, production method thereof and use thereof
JP3080104B2 (en) * 1991-06-20 2000-08-21 東燃株式会社 Thermosetting copolymer and method for producing the same
JP4205374B2 (en) * 2002-07-05 2009-01-07 大阪瓦斯株式会社 Composition for optical element and optical element
DE102004001288A1 (en) * 2004-01-07 2005-08-11 Clariant International Limited Hydrophilic polysilazane-based coating
KR20090097948A (en) * 2006-12-28 2009-09-16 다우 코닝 도레이 캄파니 리미티드 Porous silicon-containing carbon-based composite material, electrode composed of the same and battery
JP2008305974A (en) 2007-06-07 2008-12-18 Elpida Memory Inc Oxide film forming application composition and manufacturing method of semiconductor device using the same
WO2011053551A1 (en) 2009-10-28 2011-05-05 Dow Corning Corporation Polysilane - polysilazane copolymers and methods for their preparation and use
JP5557624B2 (en) * 2010-06-30 2014-07-23 富士フイルム株式会社 Composition, film using the composition, charge transport layer, organic electroluminescent device, and method for forming charge transport layer
US20130224503A1 (en) * 2010-09-21 2013-08-29 Lintec Corporation Formed body, production method thereof, electronic device member and electronic device
CN107236453B (en) * 2012-07-03 2019-06-11 伯宁布什集团有限公司 Silicon substrate high performance paint composition
CN104684968B (en) * 2012-12-31 2017-06-13 第一毛织株式会社 Modification hydrogenation silicones azane, composition and its preparation method, insulating barrier and its preparation method

Also Published As

Publication number Publication date
JP2021526169A (en) 2021-09-30
JP2019210370A (en) 2019-12-12
EP3802667A1 (en) 2021-04-14
US20210230374A1 (en) 2021-07-29
KR102705085B1 (en) 2024-09-11
CN112236466A (en) 2021-01-15
KR20210016604A (en) 2021-02-16
CN112236466B (en) 2023-07-21
TW202003643A (en) 2020-01-16
US11466127B2 (en) 2022-10-11
EP3802667B1 (en) 2023-12-27
WO2019233838A1 (en) 2019-12-12
JP7304894B2 (en) 2023-07-07

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