PL2044816T3 - Urządzenie i sposób do wytwarzania i/lub do utrzymywania plazmy - Google Patents

Urządzenie i sposób do wytwarzania i/lub do utrzymywania plazmy

Info

Publication number: PL2044816T3
Authority: PL; Poland
Prior art keywords: confining; plasma; producing
Prior art date: 2006-07-21

Application number

PL07765802T

Other languages

English (en)

Inventor

Jacques Pelletier

Ana Lacoste

Stéphane Bechu

Original Assignee

Centre National De La Recherche Scientifique (Cnrs)

Université Grenoble Alpes

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2006-07-21

Filing date

2007-07-04

Publication date

2017-01-31

2007-07-04 Application filed by Centre National De La Recherche Scientifique (Cnrs), Université Grenoble Alpes filed Critical Centre National De La Recherche Scientifique (Cnrs)

2017-01-31 Publication of PL2044816T3 publication Critical patent/PL2044816T3/pl

Classifications

- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32678—Electron cyclotron resonance

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Electromagnetism (AREA)
Spectroscopy & Molecular Physics (AREA)
Plasma Technology (AREA)
Chemical Vapour Deposition (AREA)
Physical Or Chemical Processes And Apparatus (AREA)

PL07765802T 2006-07-21 2007-07-04 Urządzenie i sposób do wytwarzania i/lub do utrzymywania plazmy PL2044816T3 (pl)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
FR0606680A FR2904178B1 (fr)	2006-07-21	2006-07-21	Dispositif et procede de production et/ou de confinement d'un plasma

Publications (1)

Publication Number	Publication Date
PL2044816T3 true PL2044816T3 (pl)	2017-01-31

Family

ID=37709764

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
PL07765802T PL2044816T3 (pl)	2006-07-21	2007-07-04	Urządzenie i sposób do wytwarzania i/lub do utrzymywania plazmy

Country Status (7)

Country	Link
US (1)	US8324814B2 (pl)
EP (1)	EP2044816B1 (pl)
ES (1)	ES2589109T3 (pl)
FR (1)	FR2904178B1 (pl)
HU (1)	HUE032512T2 (pl)
PL (1)	PL2044816T3 (pl)
WO (1)	WO2008009559A2 (pl)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
FR2938150B1 (fr) *	2008-10-30	2010-12-17	Centre Nat Rech Scient	Dispositif et procede de production et/ou de confinement d'un plasma
FR2993429B1 (fr) *	2012-07-11	2016-08-05	Centre Nat De La Rech Scient (Cnrs)	Applicateur micro-onde coaxial pour la production de plasma
EP2784175A1 (fr) *	2013-03-28	2014-10-01	NeoCoat SA	Equipement de dépôt de diamant en phase vapeur
FR3019708B1 (fr) *	2014-04-04	2016-05-06	Hydromecanique & Frottement	Procede et dispositif pour generer un plasma excite par une energie micro-onde dans le domaine de la resonnance cyclonique electronique (rce), pour realiser un traitement de surface ou revetement autour d'un element filiforme.
CN105590824B (zh) *	2014-10-20	2017-11-03	中微半导体设备(上海)有限公司	一种等离子体加工设备
US10748745B2 (en) *	2016-08-16	2020-08-18	Applied Materials, Inc.	Modular microwave plasma source
CN107316729B (zh) *	2017-06-15	2019-08-30	中国科学院近代物理研究所	磁环组件和制造磁环组件的方法
CN108776129B (zh) *	2018-07-06	2023-12-08	中国科学院西安光学精密机械研究所	多功能环形磁铁阵列激光等离子体约束装置及其应用系统
WO2023178004A1 (en) *	2022-03-14	2023-09-21	The Trustees Of Princeton University	Planar coil stellarator

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS53147217A (en) *	1977-05-26	1978-12-21	Matsushita Electric Ind Co Ltd	Cylindrical shape field magnet for small direct current motor
US5370765A (en) *	1989-03-09	1994-12-06	Applied Microwave Plasma Concepts, Inc.	Electron cyclotron resonance plasma source and method of operation
US5133826A (en) *	1989-03-09	1992-07-28	Applied Microwave Plasma Concepts, Inc.	Electron cyclotron resonance plasma source
US6022446A (en) *	1995-08-21	2000-02-08	Shan; Hongching	Shallow magnetic fields for generating circulating electrons to enhance plasma processing
US5767628A (en) *	1995-12-20	1998-06-16	International Business Machines Corporation	Helicon plasma processing tool utilizing a ferromagnetic induction coil with an internal cooling channel
US5975014A (en) *	1996-07-08	1999-11-02	Asm Japan K.K.	Coaxial resonant multi-port microwave applicator for an ECR plasma source
FR2797372B1 (fr)	1999-08-04	2002-10-25	Metal Process	Procede de production de plasmas elementaires en vue de creer un plasma uniforme pour une surface d'utilisation et dispositif de production d'un tel plasma
FR2838020B1 (fr)	2002-03-28	2004-07-02	Centre Nat Rech Scient	Dispositif de confinement de plasma
FR2840451B1 (fr) *	2002-06-04	2004-08-13	Centre Nat Rech Scient	Dispositif de production d'une nappe de plasma
US7084573B2 (en) *	2004-03-05	2006-08-01	Tokyo Electron Limited	Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
US7551265B2 (en) *	2004-10-01	2009-06-23	Nikon Corporation	Contact material and system for ultra-clean applications

2006
- 2006-07-21 FR FR0606680A patent/FR2904178B1/fr active Active
2007
- 2007-07-04 US US12/374,478 patent/US8324814B2/en active Active
- 2007-07-04 HU HUE07765802A patent/HUE032512T2/en unknown
- 2007-07-04 EP EP07765802.9A patent/EP2044816B1/fr active Active
- 2007-07-04 ES ES07765802.9T patent/ES2589109T3/es active Active
- 2007-07-04 WO PCT/EP2007/056760 patent/WO2008009559A2/fr active Application Filing
- 2007-07-04 PL PL07765802T patent/PL2044816T3/pl unknown

Also Published As

Publication number	Publication date
FR2904178B1 (fr)	2008-11-07
WO2008009559A3 (fr)	2009-03-05
ES2589109T3 (es)	2016-11-10
FR2904178A1 (fr)	2008-01-25
HUE032512T2 (en)	2017-09-28
US20100109532A1 (en)	2010-05-06
WO2008009559A9 (fr)	2008-05-08
EP2044816B1 (fr)	2016-06-01
US8324814B2 (en)	2012-12-04
WO2008009559A2 (fr)	2008-01-24
EP2044816A2 (fr)	2009-04-08

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