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KR980002880U - 정화조용접촉베이스의접촉여재 - Google Patents

정화조용접촉베이스의접촉여재

Info

Publication number
KR980002880U
KR980002880U KR2019970033507U KR19970033507U KR980002880U KR 980002880 U KR980002880 U KR 980002880U KR 2019970033507 U KR2019970033507 U KR 2019970033507U KR 19970033507 U KR19970033507 U KR 19970033507U KR 980002880 U KR980002880 U KR 980002880U
Authority
KR
South Korea
Prior art keywords
contact
septic tank
medium
base
contact base
Prior art date
Application number
KR2019970033507U
Other languages
English (en)
Other versions
KR200175674Y1 (ko
Inventor
전중호
Original Assignee
전중호
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 전중호 filed Critical 전중호
Priority to KR2019970033507U priority Critical patent/KR200175674Y1/ko
Publication of KR980002880U publication Critical patent/KR980002880U/ko
Application granted granted Critical
Publication of KR200175674Y1 publication Critical patent/KR200175674Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00—Biological treatment of water, waste water, or sewage
    • C02F3/02—Aerobic processes
    • C02F3/06—Aerobic processes using submerged filters
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00—Biological treatment of water, waste water, or sewage
    • C02F3/02—Aerobic processes
    • C02F3/10—Packings; Fillings; Grids
    • C02F3/109—Characterized by the shape
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00—Biological treatment of water, waste water, or sewage
    • C02F3/02—Aerobic processes
    • C02F3/12—Activated sludge processes
    • C02F3/1236—Particular type of activated sludge installations
    • C02F3/1242—Small compact installations for use in homes, apartment blocks, hotels or the like
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00—Biological treatment of water, waste water, or sewage
    • C02F2003/001—Biological treatment of water, waste water, or sewage using granular carriers or supports for the microorganisms

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Biodiversity & Conservation Biology (AREA)
  • Microbiology (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Biological Treatment Of Waste Water (AREA)
KR2019970033507U 1997-11-24 1997-11-24 정화조용접촉베이스의접촉여재 KR200175674Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019970033507U KR200175674Y1 (ko) 1997-11-24 1997-11-24 정화조용접촉베이스의접촉여재

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019970033507U KR200175674Y1 (ko) 1997-11-24 1997-11-24 정화조용접촉베이스의접촉여재

Publications (2)

Publication Number Publication Date
KR980002880U true KR980002880U (ko) 1998-03-30
KR200175674Y1 KR200175674Y1 (ko) 2000-04-15

Family

ID=19514926

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019970033507U KR200175674Y1 (ko) 1997-11-24 1997-11-24 정화조용접촉베이스의접촉여재

Country Status (1)

Country Link
KR (1) KR200175674Y1 (ko)

Also Published As

Publication number Publication date
KR200175674Y1 (ko) 2000-04-15

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Legal Events

Date Code Title Description
A201 Request for examination
G15R Request for early opening
E902 Notification of reason for refusal
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20050110

Year of fee payment: 6

LAPS Lapse due to unpaid annual fee