KR970043334A - Plating amount deviation prevention device - Google Patents
Plating amount deviation prevention device Download PDFInfo
- Publication number
- KR970043334A KR970043334A KR1019950061784A KR19950061784A KR970043334A KR 970043334 A KR970043334 A KR 970043334A KR 1019950061784 A KR1019950061784 A KR 1019950061784A KR 19950061784 A KR19950061784 A KR 19950061784A KR 970043334 A KR970043334 A KR 970043334A
- Authority
- KR
- South Korea
- Prior art keywords
- plating
- control signal
- current
- amount
- cell
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
전기 도금 설비의 도금량 편차 방지 장치에 관한 것으로, 비지니스 컴퓨터로 부터 소재 사양에 필요한 데이터, 목표 도금량, 강종 등의 데이터를 수신하여 도금효율에 의한 전류 제어신호 및 도금 용액 제어신호 등을 출력하는 프로세스 컴퓨터와, 상기 프로세스 커뮤터로 부터 전류 제어신호를 구신하여 전류 투입 제어신호를 출력하는 PLC와, 강판에 전기도금을 실행하는 플레이팅 셀과, 상기 PLC로 부터 제어신호를 받아 상기 플레이팅 셀로 전류를 출력하는 전류 투입부와, 상기 프로세스 컴퓨터로 부터 도금 용액 제어 신호를 입력 받아 이온 투입 제어신호를 출력하는 계장 제어부와, 상기 계장 제어부로 부터 이온 투입 제어신호를 입력받아 상기 플래이팅 셀에 이온을 투입하는 이온 투입부와, 상기 플레이팅 셀에서 도금 용액을 분석하여 그 결과를 상기 계장 제어부로 출력하는 도금 용액 분석부르 구비하여 도금용액량 조절로써 전체적인 전압 균일화를 이루어 버닝현사을 방지하고, 최적의 도금효율을 산출하여 도금량 제어의 편차를 최소화함으로써 품질향상을 이루어질 수 있다.The present invention relates to a plating amount variation prevention device of an electroplating equipment. A process computer for receiving data necessary for material specification, target plating amount, and steel grade from a business computer to output current control signals and plating solution control signals based on plating efficiency. And a PLC for outputting a current input control signal by receiving a current control signal from the process commutator, a plating cell for performing electroplating on a steel plate, and receiving a control signal from the PLC and outputting current to the plating cell. A current controller configured to receive a plating solution control signal from the process computer and output an ion implantation control signal, and an ion implantation control signal from the instrumentation controller to inject ions into the plating cell. Analysis of the plating solution in the ion input unit and the plating cell and the result Group can be made to improve performance by providing plating bath analysis call for output to the instrumentation control by the overall voltage made uniform by adjusting the amount of the plating solution hyeonsaeul prevent burning and, by calculating the optimum plating efficiency minimizing the deviation of the coating weight control.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제1도는 종래의 플레이팅 셀의 구성도이다.1 is a block diagram of a conventional plating cell.
제2도는 본 발명에 의한 도금량 편차 방지장치의 구성을 보이는 블록도이다2 is a block diagram showing the structure of the plating amount deviation preventing apparatus according to the present invention.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950061784A KR100256353B1 (en) | 1995-12-28 | 1995-12-28 | The prevention device of the deflection for the electroplating mass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950061784A KR100256353B1 (en) | 1995-12-28 | 1995-12-28 | The prevention device of the deflection for the electroplating mass |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970043334A true KR970043334A (en) | 1997-07-26 |
KR100256353B1 KR100256353B1 (en) | 2000-05-15 |
Family
ID=19446014
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950061784A KR100256353B1 (en) | 1995-12-28 | 1995-12-28 | The prevention device of the deflection for the electroplating mass |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100256353B1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101889197B1 (en) * | 2016-12-23 | 2018-08-16 | 주식회사 포스코 | Apparatus and method for controlling plating to material |
CN110528057A (en) * | 2019-09-23 | 2019-12-03 | 俊杰机械(深圳)有限公司 | Electroplating device control system |
KR102435753B1 (en) | 2021-10-25 | 2022-08-25 | 임지훈 | System for improving deviation of electroplating apparatus |
-
1995
- 1995-12-28 KR KR1019950061784A patent/KR100256353B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100256353B1 (en) | 2000-05-15 |
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