KR970048918A - Halftone Phase Inversion Mask Manufacturing Method - Google Patents
Halftone Phase Inversion Mask Manufacturing Method Download PDFInfo
- Publication number
- KR970048918A KR970048918A KR1019950050921A KR19950050921A KR970048918A KR 970048918 A KR970048918 A KR 970048918A KR 1019950050921 A KR1019950050921 A KR 1019950050921A KR 19950050921 A KR19950050921 A KR 19950050921A KR 970048918 A KR970048918 A KR 970048918A
- Authority
- KR
- South Korea
- Prior art keywords
- halftone phase
- mask
- phase shift
- phase inversion
- light shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 7
- 230000010363 phase shift Effects 0.000 claims abstract 6
- 239000000463 material Substances 0.000 claims abstract 3
- 239000000758 substrate Substances 0.000 claims abstract 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
본 발명은 하프톤 위상반전마스크 제조방법에 있어서, 투명 기판 상에 불투명막과 위상반전물질 및 차광막을 차례로 형성하고, 마스크 프레임의 바깥쪽에만 차광막이 형성되도록 패터닝하여 하프톤 위상반전마스크 원판을 형성하는 것을 특징으로 하는 위상반전마스크 제조방법에 관한 것으로, 하프톤 위상반전마스크제작시 마스크 프레임 테두리 바깥쪽에 불투명 링을 형성시키지 않기 때문에, 기존의 크롬 마스크와 같은 양의 데이타만 필요하게 되어 종래 보다 마스크 제작시간을 단축할 수 있다.In the method of manufacturing a halftone phase shift mask, an opaque film, a phase shift material, and a light shielding film are sequentially formed on a transparent substrate, and patterned so that a light shielding film is formed only on the outer side of the mask frame to form a halftone phase shift mask disc. The present invention relates to a method of manufacturing a phase inversion mask, which does not form an opaque ring on the outer edge of a mask frame when a halftone phase inversion mask is manufactured. Production time can be shortened.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제3도는 본 발명의 일실시예에 따른 하프톤 위상반전마스크 제조 공정도.Figure 3 is a halftone phase inversion mask manufacturing process according to an embodiment of the present invention.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950050921A KR970048918A (en) | 1995-12-16 | 1995-12-16 | Halftone Phase Inversion Mask Manufacturing Method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950050921A KR970048918A (en) | 1995-12-16 | 1995-12-16 | Halftone Phase Inversion Mask Manufacturing Method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR970048918A true KR970048918A (en) | 1997-07-29 |
Family
ID=66595114
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950050921A Withdrawn KR970048918A (en) | 1995-12-16 | 1995-12-16 | Halftone Phase Inversion Mask Manufacturing Method |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR970048918A (en) |
-
1995
- 1995-12-16 KR KR1019950050921A patent/KR970048918A/en not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR950004440A (en) | Blanks for Halftone Phase Shift Photomask, Halftone Phase Shift Photomask and Manufacturing Method Thereof | |
| KR970016774A (en) | Manufacturing method of half-tone phase inversion mask | |
| KR950027933A (en) | Phase inversion mask | |
| KR980003804A (en) | Halftone phase reversal mask | |
| KR970048918A (en) | Halftone Phase Inversion Mask Manufacturing Method | |
| KR940012496A (en) | Phase Shift Photomask | |
| KR950025855A (en) | Method of manufacturing a mask for forming an overlap pattern | |
| KR910020802A (en) | How to make a mask | |
| KR970076062A (en) | Method of manufacturing phase inversion mask | |
| KR970016787A (en) | Photomasks for Narrow Pitch Patterns | |
| KR930001346A (en) | How to form a resist mask pattern by light irradiation | |
| KR970022521A (en) | Phase inversion mask and manufacturing method thereof | |
| KR930017113A (en) | Phase shift mask manufacturing method | |
| KR970016789A (en) | Phase inversion mask and manufacturing method thereof | |
| KR970028806A (en) | Mask with transmittance control pattern | |
| KR970023741A (en) | Uniform contact formation method on structure with step | |
| KR970022531A (en) | Mask with dummy pattern | |
| KR900002109A (en) | Manufacturing method of negative color liquid crystal display device in which black mask layer is formed | |
| KR940001290A (en) | Phase reversal mask and manufacturing method | |
| KR970016757A (en) | Manufacturing method of halftone phase shift mask | |
| KR930004796A (en) | Color filter manufacturing method | |
| KR970016780A (en) | Manufacturing method of halftone phase shift mask | |
| KR960024646A (en) | Phase inversion mask | |
| KR950012597A (en) | Manufacturing method of mask | |
| KR950012630A (en) | Phase inversion mask and manufacturing method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19951216 |
|
| PG1501 | Laying open of application | ||
| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |