KR870001109A - 규소분말의 용융응고법 - Google Patents
규소분말의 용융응고법 Download PDFInfo
- Publication number
- KR870001109A KR870001109A KR1019860005943A KR860005943A KR870001109A KR 870001109 A KR870001109 A KR 870001109A KR 1019860005943 A KR1019860005943 A KR 1019860005943A KR 860005943 A KR860005943 A KR 860005943A KR 870001109 A KR870001109 A KR 870001109A
- Authority
- KR
- South Korea
- Prior art keywords
- silicon
- temperature
- per minute
- rate
- torr
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
내용 없음.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (9)
- 사불화규소와 나트륨의 반응으로부터 얻어진 규소를 용융응고시키는 방법에 있어서, 부분 진공압(partial vscuum), 200-300 torr의 불활성가스하에서 전술한 규소를 용융점까지 가열함을 포함하는 방법.
- 제1항에 있어서, 온도가 분당 5-50℃의 속도로 상승되는 방법.
- 제2항에 있어서, 온도가 분당 약 10℃의 속도로 상승되는 방법.
- 제1항에 있어서, 용융된 규소의 표면에 슬레그가 없어지게 되기에 충분한 시간동안 규소가 용융된 상태에서 유지시키는 방법.
- 제4항에 있어서, 온도가 분당 약 5-20℃의 속도로 상승시키는 방법.
- 제5항에 있어서, 온도를 분당 약 10℃의 속도로 상승시키는 방법.
- 제1항에 있어서, 반응로내의 불활성가스가 분당 10-100 torr의 속도로 비워져서 규소분말이 튀기지 않게 하는 방법.
- 제1항에 있어서, 규소가 1405-1409℃의 온도로 가열되고, 그 후 알곤이 20 torr의 분압(partial pressure)로 되는 방법.
- 4불화규소와 나트륨의 반응으로부터 얻어지는 규소분말을 용융응고시키는 방법에 있어서, 200-300 torr의 불활성가스 부분진공압(partial vacuum)하에서 분당 약 5-20℃의 상승온도로 규소분말을 녹을 때까지 가열하고 이후 슬레그가 완전히 휘발하여 없어질 때까지 온도를 용융점 이상으로 유지함을 포함하는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/758,602 US4676968A (en) | 1985-07-24 | 1985-07-24 | Melt consolidation of silicon powder |
US758,602 | 1985-07-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR870001109A true KR870001109A (ko) | 1987-03-11 |
KR890003675B1 KR890003675B1 (ko) | 1989-09-30 |
Family
ID=25052362
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019860005943A KR890003675B1 (ko) | 1985-07-24 | 1986-07-22 | 규소분말의 용융응고법 |
Country Status (5)
Country | Link |
---|---|
US (1) | US4676968A (ko) |
EP (1) | EP0209954A3 (ko) |
JP (1) | JPS6317215A (ko) |
KR (1) | KR890003675B1 (ko) |
CA (1) | CA1250131A (ko) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4820587A (en) * | 1986-08-25 | 1989-04-11 | Ethyl Corporation | Polysilicon produced by a fluid bed process |
US5242671A (en) * | 1988-10-11 | 1993-09-07 | Ethyl Corporation | Process for preparing polysilicon with diminished hydrogen content by using a fluidized bed with a two-step heating process |
US5326547A (en) * | 1988-10-11 | 1994-07-05 | Albemarle Corporation | Process for preparing polysilicon with diminished hydrogen content by using a two-step heating process |
US5431127A (en) * | 1994-10-14 | 1995-07-11 | Texas Instruments Incorporated | Process for producing semiconductor spheres |
US5798137A (en) | 1995-06-07 | 1998-08-25 | Advanced Silicon Materials, Inc. | Method for silicon deposition |
DE10291940D2 (de) * | 2001-05-03 | 2004-11-11 | Wacker Chemie Gmbh | Verfahren zur Energieerzeugung |
US20030183161A1 (en) * | 2002-03-29 | 2003-10-02 | Japan Super Quartz Corporation | Surface modified quartz glass crucible and its modification process |
JP5374673B2 (ja) * | 2006-04-04 | 2013-12-25 | シリコール マテリアルズ インク | 珪素精製方法 |
TW200914371A (en) * | 2007-06-01 | 2009-04-01 | Gt Solar Inc | Processing of fine silicon powder to produce bulk silicon |
AU2008282166A1 (en) * | 2007-08-01 | 2009-02-05 | Boston Silicon Materials Llc | Process for the production of high purity elemental silicon |
CA2700997A1 (en) * | 2007-10-03 | 2009-04-09 | 6N Silicon Inc. | Method for processing silicon powder to obtain silicon crystals |
EP2650405A3 (en) * | 2008-11-05 | 2014-02-26 | MEMC Singapore Pte. Ltd. | Methods for preparing a melt of silicon powder for silicon crystal growth |
JP5052493B2 (ja) * | 2008-12-29 | 2012-10-17 | ジャパンスーパークォーツ株式会社 | シリコン単結晶の製造方法 |
KR20110138248A (ko) * | 2009-03-20 | 2011-12-26 | 보스톤 실리콘 머티리얼즈 엘엘씨 | 광전지 등급 규소 금속의 제조 방법 |
JP2012111672A (ja) * | 2010-11-29 | 2012-06-14 | Sharp Corp | シリコン精製方法および精製シリコン |
CN108059167A (zh) * | 2017-12-26 | 2018-05-22 | 中国科学院过程工程研究所 | 切割硅粉渣制备高纯硅的方法及装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3177100A (en) * | 1963-09-09 | 1965-04-06 | Rca Corp | Depositing epitaxial layer of silicon from a vapor mixture of sih4 and h3 |
GB1103329A (en) * | 1964-09-15 | 1968-02-14 | Gen Trustee Co Ltd | Refining of silicon |
US4298423A (en) * | 1976-12-16 | 1981-11-03 | Semix Incorporated | Method of purifying silicon |
DE2933164A1 (de) * | 1979-08-16 | 1981-02-26 | Consortium Elektrochem Ind | Verfahren zum reinigen von rohsilicium |
US4388286A (en) * | 1982-01-27 | 1983-06-14 | Atlantic Richfield Company | Silicon purification |
US4442082A (en) * | 1982-12-27 | 1984-04-10 | Sri International | Process for obtaining silicon from fluosilicic acid |
JPH10911A (ja) * | 1996-04-17 | 1998-01-06 | Hino Motors Ltd | 後2軸車の駆動力付加装置 |
-
1985
- 1985-07-24 US US06/758,602 patent/US4676968A/en not_active Expired - Fee Related
-
1986
- 1986-07-21 EP EP86201274A patent/EP0209954A3/en not_active Withdrawn
- 1986-07-22 KR KR1019860005943A patent/KR890003675B1/ko not_active IP Right Cessation
- 1986-07-23 CA CA000514502A patent/CA1250131A/en not_active Expired
- 1986-07-24 JP JP61172931A patent/JPS6317215A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP0209954A2 (en) | 1987-01-28 |
CA1250131A (en) | 1989-02-21 |
US4676968A (en) | 1987-06-30 |
EP0209954A3 (en) | 1989-02-01 |
JPS6317215A (ja) | 1988-01-25 |
KR890003675B1 (ko) | 1989-09-30 |
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