KR20190098551A - Vertical apparatus for coating with parylene - Google Patents

Abstract

The present invention relates to a vertical integrated parylene coating device. According to the present invention, the vertical integrated parylene coating device includes: a lower chamber; a parylene accommodating unit installed on the inner side of the lower chamber and accommodating parylene inside; a first heating unit heating the parylene accommodating unit; a thermal decomposition tube connected to the upper part of the parylene accommodating unit and extended in the vertical direction by being connected to the inside of the parylene accommodating unit; a second heating unit enclosing a part or the whole of the outer side of the thermal decomposition tube and heating the thermal decomposition tube; an upper chamber installed in the upper part of the thermal decomposition tube; a substrate accommodating unit installed on the inner side of the upper chamber and accommodating a substrate inside by being connected to the thermal decomposition tube; a cooling unit installed on the inner side of the upper chamber and cooling the substrate accommodating unit as cooling water circulates therein; a vacuum pump connected to the upper chamber; a sensor unit measuring the temperature and the pressure of the parylene accommodating unit, the thermal decomposition tube, and the substrate accommodating unit; a heat controller controlling heating temperature of the first heating unit and the second heating unit in accordance with a measurement value of the sensor unit; a pressure controller controlling the inner pressure of the parylene accommodating unit, the thermal decomposition tube, and the substrate accommodating unit in accordance with the measurement value of the sensor unit; a needle valve individually connected to the lower chamber and the upper chamber and controlled by the pressure controller; and a parylene dispersion preventing plate or a pneumatic injector. According to an embodiment of the present invention, the vertical integrated parylene coating device is manufactured in a vertical integrated type and reduces a moving distance for evaporation of parylene. Also, the vertical integrated parylene coating device has high evaporation efficiency and facilitates even evaporation.

Description

Vertical Integrated Parylene Coating Equipment {VERTICAL APPARATUS FOR COATING WITH PARYLENE}

The present invention relates to a vertically integrated parylene coating apparatus, and more particularly to a vertically integrated parylene coating apparatus that is improved coating apparatus for vaporizing, pyrolyzing, and depositing parylene.

In general, parylene is a polymer in which p-xylene is polymerized and can be deposited in a thin film form on various substrates through vaporization, pyrolysis, and polymerization processes. The deposited parylene thin film is known to be transparent, waterproof, chemically resistant and corrosion resistant. The deposition of parylene typically vaporizes powdered parylene monomers in the form of p-xylene dimers at around 160 degrees Celsius, and pyrene monomers in the form of highly reactive radicals which thermally decompose the vaporized dimers at temperatures near 650 degrees. To form. In this way, the monomer obtained by thermal decomposition is polymerized to form a deposited film on the substrate surface.

The evaporator for depositing parylene is formed by connecting each chamber for sequentially evaporating, pyrolyzing, and depositing parylene monomer. Generally, a monomer having a constant pressure in a vacuum state to form a uniform thin film Is controlled so that polymerization proceeds.

1 is a conceptual diagram of a known parylene coating apparatus.

Referring to FIG. 1, a conventional parylene coating apparatus includes an evaporator (Vaporizer) for vaporizing parylene, a pyrolysis (pyrolysis) for pyrolyzing parylene, and the deposition of parylene in a pyrolyzed state on a substrate such as a substrate. It consists of three chambers consisting of a deposition chamber. The three chambers must be regulated at their respective temperatures and pressures.

As shown in FIG. 1, the conventional parylene coating apparatus is composed of the three chambers described above, and thus, the size of the equipment is increased, and the distance between the evaporator and the deposition chamber is long, so that the deposition rate of parylene is low and the deposition speed is low. .

In addition, even if parylene is deposited in a vaporized state, it is difficult to deposit uniformly on all surfaces of a substrate such as a substrate, and there is a problem in that the deposition thickness of parylene becomes thick for this purpose.

(Document 0001) Republic of Korea Patent Publication No. 10-2013-0041454 (Patent 0002) Republic of Korea Patent Publication No. 10-2001-0099356 (Document 0003) Republic of Korea Patent No. 10-0498889 (Document 0004) Republic of Korea Patent No. 10-1021682

The object of the present invention in view of the above point is to provide a vertically integrated parylene coating apparatus having a fast and excellent deposition rate by reducing the moving distance of the parylene is deposited.

In addition, it is to provide a vertically integrated parylene coating device that is easy to deposit evenly on the surface of the substrate, such as a substrate.

Vertically integrated parylene coating apparatus according to an embodiment of the present invention is provided in the lower chamber, the lower chamber, the parylene accommodating portion, the first heating portion for heating the parylene accommodating part, parylene is accommodated therein, parylene Pyrolysis tube coupled to the upper portion of the receiving portion and in communication with the interior of the parylene receiving portion extending in the vertical direction, the second heating portion formed to surround the outer part or all of the pyrolysis tube to heat the pyrolysis tube, the upper portion of the pyrolysis tube A substrate accommodating part provided inside the upper chamber and the upper chamber and communicating with the pyrolysis tube and accommodating the substrate therein, a cooling part provided inside the upper chamber and circulating with a cooling water to cool the substrate accommodating part, and a vacuum pump connected to the upper chamber. A sensor unit for measuring temperature and pressure of the parylene accommodating unit, the pyrolysis tube, and the substrate accommodating unit, and a first heating unit and a first unit according to the measured value of the sensor unit. 2 includes a thermal controller for adjusting the heating temperature of the heating part and a pressure controller for adjusting the internal pressure of the parylene accommodating part, the pyrolysis tube, and the substrate accommodating part according to the measured value of the sensor part.

In addition, it may include a needle valve connected to the lower chamber and the upper chamber, respectively, and controlled by a pressure controller.

In addition, the inner side of the pyrolysis tube or the inside of the upper chamber may further include a parylene dispersion plate formed with a plurality of openings.

In addition, the parylene dispersion plate may further include a rotating device for rotating the parylene dispersion plate.

The apparatus may further include an air pressure sprayer connected to the upper chamber and injecting air pressure into the upper chamber to form a vortex in the upper chamber.

In addition, the pneumatic injector is plural and can be controlled by a pressure controller.

According to the vertically integrated coating apparatus according to the embodiment of the present invention, the moving distance of parylene is reduced from vaporization of parylene to deposition, thereby shortening the process and excellent deposition rate.

In addition, it can be manufactured in a small scale because of the vertical integrated type, and the utilization of space is high.

In addition, since a parylene dispersion plate or an air sprayer is provided and deposited on a substrate such as a substrate in a state in which parylene is dispersed in the upper chamber, uniform deposition is easy.

1 is a conceptual diagram showing a conventional parylene coating apparatus.
Figure 2 is a schematic diagram showing a vertically integrated parylene coating apparatus according to an embodiment of the present invention.
Figure 3 is a detailed view showing a parylene dispersion plate according to an embodiment of the present invention.
Figure 4 is a schematic diagram showing a vertically integrated parylene coating apparatus according to another embodiment of the present invention.
Figure 5 is a detailed view showing an air injector according to another embodiment of the present invention.

In describing the present invention, when it is determined that detailed descriptions of related known functions or configurations may unnecessarily obscure the gist of the present invention, the detailed description thereof will be omitted.

Embodiments according to the concept of the present invention can be variously modified and can have various forms, and specific embodiments will be illustrated in the drawings and described in detail in the present specification or application. However, this is not intended to limit the embodiments in accordance with the concept of the present invention to a particular disclosed form, it should be understood to include all changes, equivalents, and substitutes included in the spirit and scope of the present invention.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this specification, the "inclusive" or "gajida" and the terms are staking the features, numbers, steps, operations, elements, parts or geotyiji to be a combination thereof specify the presence, of one or more other features, integers It should be understood that it does not exclude in advance the possibility of the presence or addition of steps, actions, components, parts or combinations thereof.

Hereinafter, the present invention will be described in detail.

2 is a schematic view showing a vertical parylene coating apparatus according to an embodiment of the present invention, Figure 3 is a detailed view showing a parylene dispersion plate according to an embodiment of the present invention, Figure 4 is another of the present invention 5 is a schematic view showing a vertically integrated parylene coating apparatus according to one embodiment, and FIG. 5 is a detailed view showing an air sprayer according to another embodiment of the present invention.

2 and 4, the vertically integrated parylene coating apparatus of the present invention is provided in the lower chamber 100, the inner side of the lower chamber 100, the parylene accommodating portion is accommodated in the parylene (P) ( 110, the first heating unit 120 for heating the parylene accommodating unit 110, coupled with the upper portion of the parylene accommodating unit 110 and in communication with the interior of the parylene accommodating unit 110 and the vertical direction Pyrolysis tube 200 formed to extend, the second heating unit 210, the upper portion of the pyrolysis tube 200 is formed to surround the outer portion or all of the pyrolysis tube 200 to heat the pyrolysis tube 200 The upper chamber 300, which is provided in the inside of the upper chamber 300, the substrate receiving portion 320, the upper chamber 300 in communication with the pyrolysis tube 200, the substrate (S) is accommodated therein Cooling unit 400 is provided inside the cooling unit 400, the cooling water is circulated to cool the substrate receiving portion 320, the upper portion Sensor unit for measuring the temperature and pressure of the vacuum pump 500, the parylene accommodating unit 110, the pyrolysis tube 200 and the substrate accommodating unit 320 connected to the burr 300, according to the measured value of the sensor unit The parylene accommodating part 110, the pyrolysis tube 200, and the thermal controller controlling the heating temperature of the first heating part 120 and the second heating part 210 according to the measured values of the sensor part. It includes a pressure controller for adjusting the internal pressure of the substrate receiving portion (320). In addition, each of the lower chamber 100 and the upper chamber 300 may include a needle valve 520 is controlled by the pressure controller.

The lower chamber 100 of the present invention is provided with a parylene accommodating part 110 therein to accommodate the parylene (P), the parylene (P) accommodated in the parylene accommodating part 110 is a powder form Parylene monomers. The lower chamber 100 is formed to open and close the opening and closing portion 310 to the outside is formed to supply parylene (P) to the parylene accommodating portion (110).

The parylene P accommodated in the parylene accommodating part 110 may be heated and vaporized by the first heating part 120. It is preferable that the temperature of the parylene accommodating part 110 heated by the first heating part 120 is 200 ° C. or less, and the parylene (P) is formed of parylene dimer at 200 ° C. or less while receiving the parylene. It is vaporized to the top of the portion (110).

In an embodiment of the present invention, the lower chamber 100 has a cylindrical shape, and the parylene accommodating part 110 and the first heating part 120 are provided inside the lower chamber 100 and the lower chamber ( As one side of the 100 is opened and closed is configured to accommodate the parylene (P). The parylene accommodating part 110 may be a crucible pot.

The pyrolysis tube 200 of the present invention is combined with the upper part of the parylene accommodating part 110 and the parylene dimer vaporized in the parylene accommodating part 110 passes through the pyrolysis tube 200 to the parylene monomer. Is changed. An inner side of the pyrolysis tube 200 and an inner side of the parylene accommodating part 110 communicate with each other, and a second heating part 210 is provided at an outer circumference of the pyrolysis tube 200.

The pyrolysis tube 200 may be formed of quartz material. The pyrolysis tube 200 formed of a quartz material can minimize the deformation at a high temperature and decompose stable parylene (P).

The second heating unit 210 is provided to surround all or part of the outer circumference of the pyrolysis tube 200 to heat the pyrolysis tube 200, the heating temperature of the pyrolysis tube 200 is about 700 ℃ Preferably heated to 650 ℃ to 680 ℃. As the pyrolysis tube 200 is heated by the second heating unit 210, the parylene dimer passing through the pyrolysis tube 200 in an upward direction is changed into a parylene monomer.

In one embodiment of the present invention, the second heating unit 210 has a furnace structure, and surrounds a part or all of the outer portion of the pyrolysis tube 200 to heat the pyrolysis tube 200. The second heating unit 210 may be formed to be shorter than the length in the height direction of the pyrolysis tube 200.

In addition, a heat shield member 211 for blocking heat heated by the second heating unit 210 is coupled to the upper and lower portions of the pyrolysis tube 200 or the upper and lower portions of the second heating unit 210. Can be. The thermal barrier member 211 has various shapes and materials according to the position and coupling relationship, material, installation environment, etc. of the lower chamber 100, the pyrolysis tube 200, the second heating unit 210, and the upper chamber 300. Can have

The upper chamber 300 of the present invention is coupled to the upper portion of the pyrolysis tube 200, the parylene (P) is provided with a substrate (S) is deposited therein parylene passing through the pyrolysis tube 200 A monomer is deposited on the substrate S or the like. The upper portion of the upper chamber 300 may be formed so that one side is hinged and the other side is opened and closed, the water-tight material is provided in a position that is opened and closed to maintain the internal pressure of the upper chamber (300).

In the present invention, the substrate (S) may be a silicon wafer, glass, film, rubber (elastomer) and the like, and means an article or equipment requiring surface deposition.

The inside of the upper chamber 300 is provided with a substrate receiving portion 320 on which the substrate (S) is mounted.

The substrate accommodating part 320 is formed extending in the height direction and a pair of height adjustment frame is formed spaced apart from each other to enable height adjustment, a plurality of fixing jig and one side provided in each of the pair of height adjustment frame It may be configured to include a pair of length adjusting devices connected to the upper chamber 300, the other side is connected to the pair of height adjusting frames, respectively, and adjusts the distance of the pair of height adjusting frames.

The height adjusting frame composed of a pair of the substrate accommodating part 320 is configured to be able to adjust the height in the vertical direction according to the number, size, etc. of the substrate. In one embodiment of the present invention, the pair of height adjusting frames may adjust the height in a telescopic manner in which the lower member is inserted into the upper member.

In more detail, the height adjusting frame is composed of a plurality of members, each member may be formed such that the inner diameter of the upper member provided on the upper than the inner diameter of the lower member provided on the lower. The lower member may be inserted into the upper member. With the configuration as described above, the height adjustment frame can be adjusted in height step by step.

The plurality of fixing jigs are provided in the pair of height adjusting frames, respectively, and are formed to protrude to the inside or the outside of the height adjusting frame, such that the substrate is mounted on the top.

The plurality of fixing jig may be provided while being spaced apart from each other in the height adjustment frame. When the height adjusting frame performs a height adjusting function in a telescopic manner, the plurality of fixing jigs may be provided at the lower portions of the upper member and the lower member, respectively. In this case, when the lower member of the height adjusting frame is inserted into the upper member and the length of the height adjusting frame is shortened, some or all of the plurality of fixing jigs may overlap or contact each other. In addition, when the lower member is separated out of the upper member so that the length of the height adjusting frame is long, the plurality of fixing jigs are positioned to be spaced apart from each other by a predetermined interval. A substrate may be accommodated in each of the plurality of fixing jigs positioned to be spaced apart from each other.

A pair of length adjusting device of the present invention as a device for securing the horizontal movement of the height adjustment frame, and is connected to the upper chamber 300 and the pair of height adjustment frame, respectively. Since the distance adjusting distance of the pair of height adjustment frame is adjusted by the length adjusting device, it is possible to accommodate a variety of substrates, regardless of the size and type of the substrate accommodated in the substrate accommodating portion 320, an object of various shapes It is also acceptable.

The length adjusting device may include a length adjusting rail coupled to an upper portion of the upper chamber 300 and extending in a longitudinal direction and connected to an upper portion of the height adjusting frame, and fastened to the length adjusting rail to be movable. have.

The length adjusting rail may be connected to the opening and closing portion 310 of the upper chamber 300 or to the side wall of the upper chamber 300. In addition, the length adjustment rail may be detachably coupled with the upper chamber (300). The detachable coupling may be used in various configurations. And the rail fastener is connected to the height adjustment frame and is bound to the length control rail. The height adjustment frame may be moved in the longitudinal direction of the length adjustment rail by the rail fastener. The length adjustment rail or rail fastener may be provided with a roller.

Preferably, the length adjusting device and the height adjusting frame are detachably coupled by a separate coupling means provided in the upper chamber 300 after being first coupled before being provided in the upper chamber 300. The detachable coupling may be used in various configurations. According to an embodiment of the present invention having the configuration as described above is easy to attach and detach the substrate accommodating portion 320 and the upper chamber 300 and to adjust the height adjusting frame and the length adjusting device in accordance with the size, type, shape of the substrate After adjustment is inserted into the upper chamber 300 is easy to use and can be used for various kinds of substrates.

In another embodiment of the present invention, the length adjustment device may be a plurality of cylinders one side is connected to the inside of the upper chamber 300 and the other side is connected to the outside of the height adjustment frame. In this case, it is preferable to provide a separate controller for adjusting the pressure in the plurality of cylinders. The plurality of cylinders are connected to each of the pair of height adjustment frames, and configured to adjust the separation distance of the pair of height adjustment frames.

In one embodiment of the present invention, the substrate accommodating part 320 extends in the height direction and has a disc shape, and the inside of the substrate accommodating part 320 may be mounted on the substrate S. The shape and size of the substrate accommodating part 320 may be variously changed within the object range of the present invention in which the substrate S and the like are accommodated. As an example, the substrate accommodating part 320 extends in a height direction and has a pair of fixed shafts that are height-adjustable in a telescopic manner, and protruded jaws protruding in a direction perpendicular to the fixed shafts to mount the substrate S and the like. And a moving rail on which the fixed shaft slides on the fixed shaft. The protrusion jaw is formed in a plurality at a predetermined height. The substrate accommodating part 320 having the above configuration is easy to adjust the height and can be modified according to the size of the substrate (S) by adjusting the left and right length to accommodate a variety of substrate (S).

The cooling unit 400 of the present invention cools the temperature of the substrate accommodating unit 320. To this end, in one embodiment of the present invention, the cooling unit 400 is provided to surround all or part of the outer circumference of the substrate accommodating part 320, and cooling water flows inside the substrate accommodating part 320 by the cooling water. Decrease the temperature. The cooling unit 400 may be provided with a valve for controlling the flow of the cooling water.

The temperature of the substrate accommodating part 320 cooled by the cooling part 400 is preferably maintained at about 25 ° C. In addition, the cooling unit 400 may be controlled by the thermal controller.

In an embodiment of the present invention, the lower chamber 100 may be integrally coupled to the lower portion of the pyrolysis tube 200, and the upper chamber 300 may be integrally coupled to the upper portion of the pyrolysis tube 200. To this end, the interior of the pyrolysis tube 200 is in communication with the parylene receiving portion 110 and the substrate receiving portion 320, the lower portion of the pyrolysis tube 200 is in contact with the upper portion of the lower chamber 100. While being coupled while the upper portion of the pyrolysis tube 200 is in contact with the lower portion of the upper chamber 300. According to one embodiment of the present invention having the above-described bond, parylene (P) vaporized in the parylene accommodating part 110 moves until deposited on the substrate S accommodated in the substrate accommodating part 320. As the distance becomes short and the vaporized parylene (P) is moved to the parylene monomer by the second heating unit 210, the deposition time is further shortened and the deposition efficiency is increased.

In an embodiment of the present invention, the inner side of the pyrolysis tube 200 or the inside of the upper chamber 300 may further include a parylene dispersion plate 330 having a plurality of openings.

2 and 3, the parylene dispersion plate 330 disperses the parylene (P) gas rising from the bottom to the top (S) evenly picked on the substrate (S) accommodated in the substrate accommodating portion (320) To facilitate deposition. When the parylene dispersion plate 330 is provided inside the pyrolysis tube 200, the parylene dispersion plate 330 may be formed of the same material as the pyrolysis tube 200, and is preferably provided on the pyrolysis tube 200. . In addition, the parylene dispersion plate 330 may be provided on the inner lower portion of the upper chamber 300, it is preferably provided at a height lower than the substrate accommodating portion (320).

The surface of the parylene dispersion plate 330 may be disposed to face the substrate receiving portion 320 or the parylene receiving portion 110. In this case, a plurality of openings may be formed on the surface of the parylene dispersion plate 330. The hole 331 is formed. The parylene (P) gas may pass from the bottom through the opening hole 331 in the upward direction, and the shape of the opening hole 331 may vary.

The parylene dispersion plate 330 may rotate based on the central axis, and for this purpose, the parylene dispersion plate 330 may be connected to the rotating device 332. In more detail, the rotary device 332 is provided outside the upper chamber 300 or the pyrolysis tube 200 and penetrates the upper chamber 300 or the pyrolysis tube 200 to allow the parylene dispersion plate ( 330). In order to maintain the internal pressure of the upper chamber 300 or the pyrolysis tube 200, a mechanical seal may be provided on a connection line between the rotary device 332 and the parylene dispersion plate 330. The mechanical seal may have various methods and configurations such as a pressure or a spring of a fluid. Rotating female screw 335 is formed around the outer periphery of the parylene dispersion plate 330, and a part of the upper and lower surfaces of the parylene dispersion plate 330 is fixed by the paneling part, and the rotating female screw inside the paneling part. A rotation screw 334 corresponding to 335 is provided. The rotational screw 334 receives power by the rotation device 332 to rotate the parylene dispersion plate 330 in engagement with the rotational female screw. However, the above configuration is not limited to the method of connecting the rotary device 332 and the parylene dispersion plate 330 because it is only one embodiment of the present invention.

The parylene dispersion plate 330 may be provided in plural, and when the plurality of parylene dispersion plates 330 are provided, the parylene dispersion plates 330 are spaced apart from each other by a predetermined distance and disposed along the vertical direction. It is preferable that the opening holes 331 formed in the fields have different arrangements. In addition, the plurality of parylene dispersion plates 330 may have different rotation directions from each other.

According to an embodiment of the present invention having the configuration of the rotary device 332 and the parylene dispersion plate 330, the parylene dispersion is dispersed while passing through the plurality of opening holes 331, the parylene dispersion As the plate 330 rotates, a vortex is formed in the upper chamber 300, and accordingly, parylene P is deposited in a state in which a spiral vortex is formed on the substrate S accommodated in the substrate accommodating part 320. Therefore, more uniform deposition is possible, and in particular, in the case of depositing parylene (P) on a plurality of substrates (S), the parylene (P) is caused by the vortex inside the upper chamber (300) to the upper chamber (300) to the corners. It can be evenly distributed, which has a more advantageous effect.

The apparatus may further include a heating device 333 (not shown) for heating the parylene dispersion plate 330.

The heating device 333 heats the parylene dispersion plate 330 to prevent the parylene (P) from being deposited on the parylene dispersion plate 330. To this end, the parylene dispersion plate 330 may be provided with a plurality of heating wires, and the heater may heat the plurality of heating wires to increase the temperature of the parylene dispersion plate 330.

4 and 5, in one embodiment of the present invention, the air chamber is connected to the upper chamber 300 to inject air pressure into the upper chamber 300 to form a vortex inside the upper chamber 300. It may further include a pneumatic injector 340.

The upper chamber 300 may be provided with the air injector 340 and the parylene dispersion plate 330 at the same time, or may be provided with any one of them.

The air injector 340 is for injecting the outside air into the upper chamber 300 to form a vortex inside the upper chamber 300, the outside air is inside the upper chamber 300 It is preferable to spray in the state heated or cooled to temperature. In addition, when the external air is injected into the upper chamber 300 by the air injector 340, since the internal pressure of the upper chamber 300 may be changed, the air injection of the air injector 340 is precisely controlled. More preferably. To this end, the air jet of the air pressure injector 340 may be controlled by a pressure controller.

The air injector 340 may be provided on the inner circumferential surface of the upper chamber 300 to inject air in a tangential direction in contact with the inner circumferential surface of the upper chamber 300. Vortex is formed inside the upper chamber 300 by spraying in the same direction.

The air pressure injector 340 is plural and may be controlled by the pressure controller.

According to the size of the inner circumferential surface of the upper chamber 300 may be provided with a plurality of air injector 340, in this case the air injector 340 is located in front, rear, left and right of the inner circumferential surface of the upper chamber 300 and The air injection direction injected from the air pressure injector 340 positioned at has a tangential direction in contact with the inner circumferential surface of the upper chamber 300 but preferably has one direction so as not to conflict with each other. As described above, since the air injection of the air pressure sprayer 340 is closely related to the internal pressure of the upper chamber 300, it is preferable to be controlled by the pressure controller.

The sensor unit of the present invention means an apparatus for measuring the internal temperature and pressure of the lower chamber 100, the pyrolysis tube 200, the upper chamber 300. The sensor unit may use a temperature sensor, a pressure sensor, and the like, and various kinds of sensors may be used within various objects of the present invention, and may be installed at various positions.

The value measured by the sensor unit is transmitted to the pressure controller and the thermal controller.

The pressure controller adjusts the pressure of the parylene accommodating part 110 and the substrate accommodating part 320 by adjusting internal pressures of the lower chamber 100 and the upper chamber 300 according to the measured value of the sensor part. . The lower chamber 100 and the upper chamber 300 are respectively connected to the vacuum pump 500 and the needle valve 520 on the connection line between the lower chamber 100 and the upper chamber 300 and the vacuum pump 500, respectively. Can be combined. The pressure controller may control the pressure of the parylene accommodating part 110 and the substrate accommodating part 320 by controlling the opening and closing of the needle valve 520. The pressure controller can be applied to a variety of mechanisms.

The thermal controller controls the internal temperature of the parylene accommodating part 110 and the pyrolysis tube 200 by controlling the first heating part 120 and the second heating part 210 according to the measured value of the sensor part. . In addition, the temperature of the substrate accommodating part 320 may be adjusted by controlling the cooling part 400. The thermal controller can be applied to a variety of mechanisms.

The pressure controller and the thermal controller may be organically coupled to each other. As an example, the moving distance, speed and temperature of the parylene (P) passing through the pyrolysis tube 200 is an important factor in the deposition of parylene (P), in order to organically control the moving distance, speed and temperature The pressure controller and the thermal controller are coupled to control the internal temperature and pressure of the pyrolysis tube 200. When the height of the pyrolysis tube 200 is increased, the heat received by the parylene (P) is relatively increased, thereby lowering the internal pressure of the pyrolysis tube 200 to induce a rapid movement of parylene (P). When the internal temperature of the pyrolysis tube 200 is high, the temperature of the parylene P moving the pyrolysis tube 200 increases, thereby lowering the internal pressure of the pyrolysis tube 200 to further lower parylene (P). ) Can lead to rapid movement.

The vacuum pump 500 of the present invention is connected to the upper chamber 300 to maintain the internal pressure of the upper chamber 300, the pyrolysis tube 200 and the lower chamber 100 at a low pressure. A dust collector 510 for sucking dust may be mounted on an upper portion of the vacuum pump 500.

The vacuum pump 500 may be connected to the upper chamber and the lower chamber 100, respectively, and the needle valve 520 may be coupled to adjust respective internal pressures. The needle valve 520 may be controlled by the pressure controller.

Lower chamber 100 and the pyrolysis tube 200 according to the present invention is coupled in a vertical integral form has the advantage that the scale is smaller than the known parylene coating apparatus. In one embodiment of the present invention by using the above advantages, a plurality of pyrolysis tubes 200 are coupled to one upper chamber 300, and a lower chamber 100 may be coupled to each of the plurality of pyrolysis tubes 200. have. In this case, the size of the upper chamber 300 may vary. The upper chamber 300 is provided with a plurality of substrate accommodating part 320 and a plurality of cooling parts 400. In addition, the upper chamber 300 may be provided with a plurality of parylene dispersion plate 330, may be provided with a plurality of air injector 340. In the case of having the configuration as described above, evenly dispersing parylene P in the upper chamber 300 is easy. According to one embodiment of the present invention having the configuration as described above has the advantage that can greatly reduce the deposition time by increasing the vaporization and pyrolysis rate of parylene (P).

Referring to the parylene coating method using the vertical integrated parylene coating apparatus of the present invention, the parylene coating method is a parylene supplying step of supplying parylene to the parylene accommodating unit 110, the parylene supplying step The vaporization step of vaporizing parylene into parylene dimer using the first heating unit 120, the parylene dimer vaporized in the vaporization step passes the inside of the pyrolysis tube 200 in the height direction while the second Decomposition step of decomposing the parylene monomer by the heating unit 210, the parylene monomer decomposed in the decomposition step is moved into the interior of the upper chamber 300, the cooling provided in the interior of the upper chamber 300 A cooling step of cooling the parylene monomer with the parylene polymer using the unit 400 and the parylene polymer cooled in the cooling step are deposited on the substrate accommodated in the substrate accommodating part 320. And a deposition step.

In addition, a plurality of opening holes 331 are formed in the upper chamber 300 so that a parylene dispersion plate 330 for dispersing parylene monomers is provided, and using the height adjusting frame and the length adjusting device. The adjusting step of adjusting the substrate receiving part 320 according to the size and type of the substrate accommodated in the substrate receiving part 320 and the parylene monomer decomposed in the disassembling step are dispersed by the parylene dispersion plate 330. It may further comprise a dispersion step.

The adjusting step is to increase or decrease the pair of height adjustment frame in the vertical direction, and to adjust the distance of the pair of height adjustment frame spaced apart from each other by using the length adjustment device. Through the adjusting step, the substrate and the like of various types and shapes can be accommodated in the substrate accommodating part 320, and can accommodate a plurality of substrates at the same time.

The parylene supplying step is a step of accommodating parylene in the parylene accommodating part 110 after opening and closing a part of the lower chamber 100, and the vaporizing step is a first heating provided inside or outside the lower chamber 100. The parylene accommodating unit 110 is heated by the unit 120 to vaporize parylene to change to parylene dimer, and the decomposition step includes converting parylene dimer vaporized in the vaporization step into the pyrolysis tube 200. Parylene dimer by parsing the parylene dimer by heating the pyrolysis tube 200 by a second heating unit 210 provided to move the inside to pass in the height direction and surround the outer part or the whole of the pyrolysis tube 200. It is a step to change beyond Ren.

Since the parylene accommodating part 110 is in communication with the pyrolysis tube 200, the parylene accommodated in the parylene accommodating part 110 is in the parylene accommodating part 110 of the lower chamber 100. Vaporization and pyrolysis while passing through the pyrolysis tube 200 has a shorter moving distance of parylene and does not stagnate the movement of parylene, and thus has a high speed and efficiency in coating.

In the dispersing step, the parylene dispersing plate is moved into the upper chamber 300 and the parylene dispersing plate 330 is provided in the upper chamber 300. As a step of being dispersed in the 330, it is dispersed while passing through the plurality of opening holes 331 formed in the parylene dispersion plate 330.

In one embodiment of the present invention, the parylene dispersion plate 330 of the dispersing step may be replaced by the pneumatic injector 340. When using the air injector 340 in the dispersing step, the air injector 340 may be a plurality.

In the cooling step, parylene monomer is cooled by parylene polymer in the upper chamber 300 by circulation of the cooling water through the cooling unit 400, and the deposition step is the parylene cooled in the cooling step. The polymer is deposited onto a plurality of substrates. The cooling step and the deposition step may proceed simultaneously.

The substrate in which the parylene is deposited in the deposition step has a short moving distance from the vaporization to the vapor deposition and is distributed in the upper chamber 300, thereby enabling uniform deposition.

100: lower chamber 110: parylene accommodation portion
120: first heating unit
200: pyrolysis tube 210: second heating part
211: heat shield member
300: upper chamber 310: opening and closing part
320: substrate receiving portion 330: parylene dispersion plate
331: opening hole 332: rotating device
333: heating device 334: rotational screw
335: rotating female screw 340: air pressure spray
400: cooling unit
500: vacuum pump 510: dust collector
520: Needle Valve
S: Substrate P: Parylene

Claims (5)

Lower chamber;
A parylene accommodating part provided inside the lower chamber and accommodating parylene therein;
A first heating part for heating the parylene accommodating part;
A pyrolysis tube coupled to an upper part of the parylene accommodating part and communicating with an interior of the parylene accommodating part and extending in a vertical direction;
A second heating unit formed to surround a part or the whole of the outer pyrolysis tube to heat the pyrolysis tube;
An upper chamber provided above the pyrolysis tube;
A substrate accommodating part provided inside the upper chamber and communicating with the pyrolysis tube and accommodating a substrate therein;
A cooling unit provided inside the upper chamber to circulate cooling water to cool the substrate accommodating part;
A vacuum pump connected to the upper chamber;
A sensor unit for measuring the temperature and pressure of the parylene accommodating part, the pyrolysis tube, and the substrate accommodating part;
A thermal controller adjusting a heating temperature of the first heating unit and the second heating unit according to the measured value of the sensor unit;
A pressure controller that adjusts internal pressures of the parylene accommodating part, the pyrolysis tube, and the substrate accommodating part according to the measured value of the sensor part; And
And a needle valve connected to the lower chamber and the upper chamber and controlled by the pressure controller, respectively.
The method of claim 1,
Vertical parylene coating apparatus further comprises a parylene dispersion plate provided in the inner side of the pyrolysis tube or the upper chamber and a plurality of openings are formed.
The method of claim 2,
Vertical parylene coating device further comprises a rotary device connected to the parylene dispersion plate to rotate the parylene dispersion plate.
The method of claim 1,
And an air pressure sprayer connected to the upper chamber and injecting air pressure into the upper chamber to form a vortex in the upper chamber.
The method of claim 4, wherein
The pneumatic injector is a plurality of vertically integrated parylene coating apparatus, characterized in that controlled by the pressure controller.

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