KR20190021186A - 불활성 연마 입자의 분리 및 현탁을 위한 젤라틴성 입자의 안정한 현탁액의 현장 형성법 - Google Patents
불활성 연마 입자의 분리 및 현탁을 위한 젤라틴성 입자의 안정한 현탁액의 현장 형성법 Download PDFInfo
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- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
- 229930195725 Mannitol Natural products 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- 229920000604 Polyethylene Glycol 200 Polymers 0.000 description 1
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- 229920002472 Starch Polymers 0.000 description 1
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- 238000005411 Van der Waals force Methods 0.000 description 1
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- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
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- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
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- 150000001556 benzimidazoles Chemical class 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 235000010410 calcium alginate Nutrition 0.000 description 1
- 239000000648 calcium alginate Substances 0.000 description 1
- 229960002681 calcium alginate Drugs 0.000 description 1
- OKHHGHGGPDJQHR-YMOPUZKJSA-L calcium;(2s,3s,4s,5s,6r)-6-[(2r,3s,4r,5s,6r)-2-carboxy-6-[(2r,3s,4r,5s,6r)-2-carboxylato-4,5,6-trihydroxyoxan-3-yl]oxy-4,5-dihydroxyoxan-3-yl]oxy-3,4,5-trihydroxyoxane-2-carboxylate Chemical compound [Ca+2].O[C@@H]1[C@H](O)[C@H](O)O[C@@H](C([O-])=O)[C@H]1O[C@H]1[C@@H](O)[C@@H](O)[C@H](O[C@H]2[C@H]([C@@H](O)[C@H](O)[C@H](O2)C([O-])=O)O)[C@H](C(O)=O)O1 OKHHGHGGPDJQHR-YMOPUZKJSA-L 0.000 description 1
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- 230000005764 inhibitory process Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910021506 iron(II) hydroxide Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- NCNCGGDMXMBVIA-UHFFFAOYSA-L iron(ii) hydroxide Chemical compound [OH-].[OH-].[Fe+2] NCNCGGDMXMBVIA-UHFFFAOYSA-L 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- TYQCGQRIZGCHNB-JLAZNSOCSA-N l-ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(O)=C(O)C1=O TYQCGQRIZGCHNB-JLAZNSOCSA-N 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
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- 238000003801 milling Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- 229910052605 nesosilicate Inorganic materials 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 150000004762 orthosilicates Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000002688 persistence Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001308 poly(aminoacid) Polymers 0.000 description 1
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- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
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- 239000010980 sapphire Substances 0.000 description 1
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- 239000004065 semiconductor Substances 0.000 description 1
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- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000007614 solvation Methods 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical class O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
- APBDREXAUGXCCV-UHFFFAOYSA-L tetraethylazanium;carbonate Chemical compound [O-]C([O-])=O.CC[N+](CC)(CC)CC.CC[N+](CC)(CC)CC APBDREXAUGXCCV-UHFFFAOYSA-L 0.000 description 1
- KJFVITRRNTVAPC-UHFFFAOYSA-L tetramethylazanium;sulfate Chemical compound C[N+](C)(C)C.C[N+](C)(C)C.[O-]S([O-])(=O)=O KJFVITRRNTVAPC-UHFFFAOYSA-L 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
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- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M103/00—Lubricating compositions characterised by the base-material being an inorganic material
- C10M103/06—Metal compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Colloid Chemistry (AREA)
Abstract
Description
%
고체
Al 2 (SO 4 ) 3 ·16H 2 O |
g 수도물 |
g 고체 당량
Al 2 (SO 4 ) 3 |
g 25%
TMAH |
% 연마제 로딩 |
pH |
10.8 | 267.7 | 32.2 | 99.25 | 15 | 7.69 |
% 고체
Al 2 (SO 4 ) 3 ·16H 2 O |
25℃에서의 점도 (cP) |
주변 연질-침강 & SVR |
50℃ 연질-침강 SVR |
|||||||
제1일 | 제4주차 | 제1일 | 제4주차 | |||||||
10.8 |
담체 | 슬러리 | % SVR | SSR | % SVR | SSR | % SVR | SSR | % SVR | SSR |
16 | 74 | 66 | 0 | 42 | 0 | 56 | 0 | 51 | 0 |
% 고체
Al 2 (SO 4 ) 3 |
25℃에서의 점도 (cP) |
슬러리의 주변 연질-침강 & SVR |
50℃ 연질-침강 SVR |
|||||||
제1일 | 제4주차 | 제1일 | 제4주차 | |||||||
15.5 |
담체 | 슬러리 | % SVR | SSR | % SVR | SSR | % SVR | SSR | % SVR | SSR |
29.4 | 236.5 | 71 | 0 | 58 | 0 | 71 | 0 | 74 | 0 |
% 고체
Al 2 (SO 4 ) 3 ·18H 2 O |
g 수도물 |
g 0.4M
Al 2 (SO 4 ) 3 |
g 0.5M
NaOH |
pH |
15.54 | 253.37 | 46.52 | 146.03 | 7.73 |
% 고체
Al 2 (SO 4 ) 3 |
25℃에서의 점도 (cP) |
슬러리의 주변 연질-침강 & SVR |
슬러리의 50℃ 연질-침강 SVR |
|||||||
제1일 | 제4주차 | 제1일 | 제4주차 | |||||||
15.54 |
담체 | 슬러리 | SVR | SSR | SVR | SSR | SVR | SSR | SVR | SSR |
29.4 | 236.5 | 71 | 0 | 58 | 0 | 71 | 0 | 49 | 0 |
% 고체
Al 2 (SO 4 ) 3 |
% 0.4M Al 2 (SO 4 ) 3 |
DEG*의
중량 (g) |
0.4M Al
2
(SO
4
)
3
의 중량 (g) |
25% TMAH의
중량 (g) |
pH |
0.49 | 2.03 | 366.16 | 7.99 | 5.84 | 8.01 |
0.99 | 4.12 | 703.91 | 30.25 | 22.09 | 8.05 |
1.50 | 6.28 | 589.22 | 39.45 | 28.83 | 7.80 |
2.03 | 8.5 | 566.14 | 52.57 | 38.42 | 7.79 |
2.58 | 10.77 | 336.74 | 40.66 | 29.20 | 8.80 |
% 활성 고체 Al 2 (SO 4 ) 3 |
25℃에서의 점도 (cP) | 주변 SSR | 50℃ SSR | |||
담체 |
18% ZrO 2 를이용한 슬러리 | 제1일 | 1주차 | 제1일 | 1주차 | |
SSR | SSR | SSR | SSR | |||
0.49 | 31 | 212 | 0 | 1.16 | 0 | 0.21 |
0.99 | 49 | 218 | 0 | 1.24 | 0 | 0 |
1.50 | 27 | 217 | 0 | 1.03 | 0 | 0.51 |
2.03 | 34 | 353 | 0 | 0.16 | 0 | 0 |
2.58 | 32 | 330 | 0 | 0 | 0 | 0 |
% 고체 Al 2 (SO 4 ) 3 | 실시예 4a의 담체 중량 (g) | 수도물의 중량 (g) | pH |
0.25 | 140 | 140 | 7.77 |
0.50 | 140 | 140 | 7.86 |
0.75 | 140 | 140 | 7.63 |
1.01 | 140 | 140 | 7.71 |
1.29 | 140 | 140 | 7.61 |
% 고체 Al 2 (SO 4 ) 3 |
25℃에서의 점도 (cP) | 주변 SSR | 50℃ SSR | |||
담체 |
18% ZrO
2
를이용한
슬러리 |
제1일 | 1주차 | 제1일 | 1주차 | |
SSR | SSR | SSR | SSR | |||
0.25 | 6 | 63 | 0 | 1.3 | 0 | 1.6 |
0.50 | 8 | 73 | 0 | 1.5 | 0 | 1.16 |
0.750 | 10 | 86 | 0 | 0.76 | 0 | 0.53 |
1.01 | 9 | 87 | 0 | 1.1 | 0 | 0.14 |
1.29 | 16 | 185 | 0 | 0.73 | 0 | 0 |
담체 중 % Al 2 (OH) 2 습식 겔 입자 | 실시예 4c의 담체 중량 (g) |
수도물
중량 (g) |
% 담체
희석 |
희석된 담체 중 % 겔 입자 | pH |
3주 후 슬러리 SSR (SVR)
(18% ZrO 2 ) |
30 | 140 | 140 | 50 | 15 | 7.77 | 0 (52%) |
30 | 140 | 46.7 | 25 | 22.5 | 7.86 | 0 (61%) |
30 | 140 | 420 | 75 | 7.5 | 7.54 | 0 (41%) |
% 아크릴 폴리머 "겔-입자들"
(#11383) |
g PEG-200 |
g 아미노-
수산화물 베이스 |
담체 점도
cP |
pH |
wt/wt %
연마제 로딩 |
슬러리
점도 cP |
0.9-1.0 | 446 | 13 | 73 | 5.3 | 47.5 | 300-320 |
%
겔 입자 |
25℃에서의
점도 (cP) |
주변 연질-침강 & SVR | 50℃ 연질-침강 & SVR | |||||||
제1일 | 4주차 | 제1일 | 4주차 | |||||||
0.9-1.0 | 담체 | 슬러리 | %SVR | SSR | %SVR | SSR | %SVR | SSR | %SVR | SSR |
74 | ~310 | 87 | 0 | 61 | 0 | 79 | 0 | 51 | 0 |
겔 입자
희석 배수 |
제1일 - [t=0]* | 제2일 | 제21일 | |||
SVR (ml) |
본래
현탁액의 % |
SVR (ml) |
본래
현탁액의 % |
SVR (ml) |
본래
현탁액의 % |
|
3:1 | 40 | 100 | 28.75 | 72 | 27 | 67.5 |
5:1 | 40 | 100 | 20 | 50 | 17.5 | 44 |
6:1 | 40 | 100 | 21.25 | 53 | 19 | 47.5 |
8:1 | 40 | 100 | 18.75 | 47 | 17 | 42.5 |
9:1 | 40 | 100 | 17.5 | 44 | 15 | 37.5 |
10:1 | 40 | 100 | 16 | 40 | 12.5 | 31.3 |
Claims (18)
- 안정한 수성, 반수성 또는 유기 담체 매질 중에 불활성 콜로이드성 또는 비- 콜로이드성 연마제 또는 비-연마성 불활성 입자들을 현탁시키기 위한 방법으로서, 상기 방법은 상기 담체 매질 내에서 상기 불활성 입자들의 침강에 대한 충분한 간섭을 일으키기 위해 불활성 입자들에 대한 현탁 입자들의 적절한 농도를 수립하도록, 현장(in situ) 형성된 현탁 입자를 생산하는 것을 포함하며, 여기서 상기 담체 매질은 상기 불활성 입자들과는 상이하고 pH 4 내지 12에서 상기 담체 매질 내에서 상기 현탁 입자들을 현장 형성하는, 알칼리토 금속 및 전이금속 수산화물, 옥시 수산화물, 및 산화물 수화물로 이루어진 군으로부터 선택된 현탁 입자들을 0.1 내지 60 중량% 범위로 포함하되, 담체 매질 내 현탁 입자들의 현장 형성에 의해, 담체 매질과는 분자, 입체 배열, 레올로지 및 물리적 구조가 현저히 상이하고, 담체 매질보다 밀도가 더 크며, 시각적으로 동정가능하고 담체 매질과는 별개의 물리적 구조를 가지고, 약 2-3 ㎛ 내지 500 ㎛ 범위의 측정가능한 크기 차이를 가지며, 현탁입자들이 형성된 그러나 담체 매질과의 추가의 반응 능력은 없고, 성분들의 형성 메카니즘이나 기원과 무관한 담체 분자를 포함한다는 실질적으로 균일한 특성을 나타내는 현탁 입자들이 결과되고, 이에 의해 상기 불활성 입자들이 현탁 입자와 불활성 입자 사이의 물리적 간섭, 화학적, 물리적 또는 이화학적 간섭을 위한 근접성을 제공하는 현탁 입자와 불활성 입자 사이의 인력, 및 불활성 입자 및 그 자체로부터의 현탁 입자들의 정전기적 전하 반발과 같은 적어도 한 가지에 의해 담체 매질에 현탁되어 상기 담체 매질 내 상기 불활성 입자들이 장기간 동안 응집 또는 집괴화하는 것을 방지하는 것인 방법.
- 제1항에 있어서, 상기 현탁 입자들은 최종 담체 매질과는 별도의 매질에서 형성되는 것인 방법.
- 제1항에 있어서, 상기 수성 담체 매질은 적어도 1종의 불활성 극성 용매를 함유하는 것인 방법.
- 제3항에 있어서, 상기 불활성 극성 용매는 디알킬렌 글리콜, 알킬렌 글리콜, 글리콜 에테르, 폴리알킬렌 글리콜, 알킬 락톤, N-메틸 피롤리돈, 알킬렌 카보네이트, 아세토니트릴, 및 디메틸 아세트아미드로 이루어진 군으로부터 선택되는 것인 방법.
- 제1항에 있어서, 상기 현탁 입자들은 알칼리토 금속 또는 전이금속 수산화물, 옥시 수산화물, 또는 산화물 수화물로부터 형성된 겔 입자, 졸 겔 입자 및 젤라틴성 침전물인 것인 방법.
- 제5항에 있어서, 상기 현탁 입자들은 수산화알루미늄, 옥시수산화 알루미늄, 수산화아연, 수산화구리, 수산화마그네슘 및 수산화주석으로 이루어진 군으로부터 선택되는 구성원으로부터 형성되는 것인 방법.
- 제1항에 있어서, 상기 현탁 입자들은 현탁 입자들이 금속의 수화-산화물이 되도록, Fe, Cr, Al, Zn, Cu, Ni 등의 현장염을 중화하는데 브론스테드 또는 비-브론스테드 염기를 이용하는 물 또는 다른 가성(caustic) 매질에서 형성된 전이금속의 알칼리성 중화염으로부터 형성되는 겔 입자, 졸 겔 입자 및 젤라틴성 침전물인 것인 방법.
- 제1항에 있어서, 상기 현탁 입자들은 히드록실 셀룰로스, 히드록실 프로필 셀룰로스, 메틸 카르복시메틸 셀룰로스 및 아세틸 셀룰로스를 포함하는 셀룰로스 유도체, 변성 전분으로부터 형성된 겔 입자, 졸 겔 입자 및 젤라틴성 침전물인 것인 방법.
- 제1항에 있어서, 상기 현탁 입자들은 구아, 구아검, 한천, 한천-구아 혼합물, 카라기난, 펙틴, 젤란 검, 알긴산염 및 금속 알긴산염, 식물 유래 다당류 및 이의 혼합물을 포함하여, 담체 매질의 외부에서 형성된 다당류로부터 형성된 겔 입자, 졸 겔 입자 및 젤라틴성 침전물인 것인 방법.
- 제1항에 있어서, 상기 현탁 입자들은 설폰화된 폴리스티렌, 폴리-아크릴산, 메타크릴산, 말레산 또는 이의 코폴리머, 암모늄 폴리(메타크릴레이트), 폴리 에스테르 아미드 및 폴리아민과 폴리-(아미노산) 고분자전해질의 코폴리머를 비롯하여, 비이온성 또는 극성 담체 매질에서 형성된 고분자전해질로부터 형성된 겔 입자, 졸 겔 입자 및 젤라틴성 침전물인 것인 방법.
- 제1항에 있어서, 현탁되는 상기 불활성 입자들은 이산화티타늄, 탄화 규소, 산화 지르코늄, 실리카, 산화 세륨, 산화 알루미늄, 질화 규소, 탄화 붕소, 탄화 텅스텐, 다이아몬드, 이산화 규소 및 건조 염료 입자들로 이루어진 군으로부터 선택되는 것인 방법.
- 제1항에 있어서, 부식 억제제를 포함하는 방법.
- 제1항에 있어서, 현탁된 입자들과 불활성 입자들 간에 추가적인 밀도 차이 또는 정전기적 반발력을 제공하기 위해 불활성 염을 포함하는 것인 방법.
- 제13항에 있어서, 현탁 입자들의 형성에 의해 형성된 불활성 염의 제거를 포함하는 방법.
- 불활성 콜로이드성 또는 비- 콜로이드성 연마제 또는 비-연마성 불활성 입자들의 현탁을 위한, 안정한 수성, 반수성 또는 유기 담체 매질 중에 현장(in situ) 형성된 현탁 겔 입자로서, 상기 불활성 입자들과 상이한 상기 현탁 겔 입자는 상기 담체 매질 내에서 상기 불활성 입자들의 침강에 대한 충분한 간섭을 일으키기 위해 불활성 입자들에 대한 현탁 입자들의 적절한 농도를 수립하도록, 상기 담체 매질에 대해 0.1 내지 60중량%의 범위로 포함되며, 상기 현탁 겔 입자들은 pH 4 내지 12에서 상기 담체 매질 내에서 상기 현탁 입자들을 현장 형성하는, 알칼리토 금속 및 전이금속 수산화물, 옥시 수산화물, 및 산화물 수화물로 이루어진 군으로부터 선택되고, 담체 매질 내 현탁 입자들의 현장 형성에 의해, 담체 매질과는 분자, 입체 배열, 레올로지 및 물리적 구조가 현저히 상이하고, 담체 매질보다 밀도가 더 크며, 시각적으로 동정가능하고 담체 매질과는 별개의 물리적 구조를 가지고, 약 2-3 ㎛ 내지 500 ㎛ 범위의 측정가능한 크기 차이를 갖고, 현탁 입자들이 형성된 그러나 담체 매질과 추가의 반응 능력은 없고, 성분들의 형성 메카니즘이나 기원과 무관한 담체 분자를 포함한다는 실질적으로 균일한 특성을 나타내는 현탁 겔 입자들이 결과되고, 이에 의해 상기 불활성 입자들이 현탁 겔 입자와 불활성 입자 사이의 물리적 간섭, 화학적, 물리적 또는 이화학적 간섭을 위한 근접성을 제공하는 현탁 겔 입자와 불활성 입자 사이의 인력, 및 불활성 입자 및 그 자체로부터의 현탁 입자들의 정전기적 전하 반발과 같은 적어도 한 가지에 의해 담체 매질에 현탁되어 상기 담체 매질 내 상기 불활성 입자들이 장기간 동안 응집 또는 집괴화하는 것을 방지하는 것인 현탁 겔 입자.
- 제15항에 있어서, 상기 담체 매질과는 별도의 유연하고 가단성있는 물리적 실체로서, 담체 매질 내 상기 임의의 불활성 입자들에 기계적으로 부착되어 상기 불활성 입자 주변에 쿠션을 형성하여 담체 매질 내의 불활성 입자들의 현탁성을 증가시키는 역할을 하는 것인 현탁 겔 입자.
- 제15항에 있어서, 상기 겔 입자들은 상기 겔 입자들이 온전하게 유지된 겔 입자 내에서 담체 분자와 반-액체로 남아있는 조건 하에서만 계속 존재하는 것인 현탁 겔 입자.
- 제15항에 있어서, 비이온성, 극성 유기 담체 내에 알칼리토 금속 수산화물 및 산화물 수화물, 전이금속의 알칼리성 중화염, 실리케이트, 오르토-실리케이트 및 특정한 폴리-실리케이트, 변성 전분, 셀룰로스 유도체, 다당류 및 고분자전해질을 함유하는 군으로부터 선택된 화학적 화합물 성분을 갖는 것인 현탁 겔 입자.
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US15/191,294 | 2016-06-23 | ||
PCT/US2017/038737 WO2017223308A1 (en) | 2016-06-23 | 2017-06-22 | In situ formation of stable slurry suspensions of gelatinous particles for separating and suspending inert abrasive particles |
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CN109575818A (zh) * | 2018-12-28 | 2019-04-05 | 天津洙诺科技有限公司 | 一种低钠抛光液及其制备方法和应用 |
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US3663284A (en) | 1970-01-09 | 1972-05-16 | Marine Colloids Inc | Titanium dioxide suspensions |
US4376655A (en) * | 1982-02-17 | 1983-03-15 | Scm Corporation | Production of an optically efficient titanium slurry |
US4693751A (en) * | 1984-08-23 | 1987-09-15 | Crompton & Knowles Corporation | Titanium dioxide suspension for use in film coating |
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US9394502B2 (en) | 2008-04-28 | 2016-07-19 | Ppt Research, Inc. | Stable aqueous slurry suspensions |
US7985719B2 (en) | 2008-04-28 | 2011-07-26 | Ward Irl E | Cutting and lubricating composition for use with a wire cutting apparatus |
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