KR20180100522A - Decoration film and preparation method thereof - Google Patents

Abstract

The present invention relates to a deco film and a method for producing the same, and the deco film can realize various colors while having non-conductive characteristics, and thus can be usefully used as a surface decorating film for various products such as IT devices and electronic products. In addition, according to the method for manufacturing a decoupled film, the composition of the constituent layer can be easily controlled by controlling the injection amount of the reactive gas, and a decoupled film of various colors can be continuously produced.

Description

TECHNICAL FIELD [0001] The present invention relates to a decolor film,

The present invention relates to a decorative film for decorating a surface of a product, which can realize various colors while having non-conductive characteristics, and a method for producing the same.

Recently, as the appearance of IT devices and electronic products is becoming more and more advanced, there is a growing demand for a method for easily implementing a color on the surface of an external appearance. There are various methods of implementing color on the outer surface, however, when a color film manufactured using a vacuum coating method such as vapor deposition or sputtering is used, a luxurious color can be easily implemented, which is preferred.

The color film is generally prepared by coating a thin film of metal such as nickel, aluminum or chromium on a base film by physical vapor deposition or chemical vapor deposition, and has a metallic silver color. However, in the case of a product such as a mobile communication terminal that uses a wireless signal to communicate, if a metal thin film such as the above-described conductive material is included, it affects the wireless signal, resulting in a disconnection during communication.

To solve this problem, Korean Patent Laid-Open Publication No. 2009-0026453 discloses a method of coating an alloy thin film of silicon and aluminum under a vacuum condition using a stirrup method.

Korea Patent Publication No. 2009-0026453

However, the method disclosed in the above-mentioned patent application has a disadvantage in that it is difficult to realize various colors because the alloy thin film is coated by the batch type discontinuous process and the productivity is low.

Accordingly, it is an object of the present invention to provide a decorative film for decorating a surface of a product and a method of manufacturing the same, which can realize various colors while having non-conductive characteristics and high productivity in a continuous process.

The present invention comprises a substrate layer, a refractive layer, a resonant layer, and a semi-refractive layer in the form of a stack,

Wherein the reflective layer comprises an inorganic material,

Wherein the resonant layer comprises a complete oxide of the inorganic material,

Wherein the semi-reflective layer comprises a partial oxide of the inorganic material.

In addition,

(1) depositing an inorganic material on the base layer to form a reflection layer;

(2) depositing the inorganic material on the reflection layer while completely oxidizing the inorganic material to form a resonance layer; And

(3) depositing the inorganic material on the resonance layer while partially oxidizing the inorganic material to form a semi-reflective layer.

The decolorized film can be used as a surface decorating film for various products such as IT devices and electronic products because it can realize various colors while having non-conductive properties.

In addition, according to the method for manufacturing a decoupled film, the composition of the constituent layer can be easily controlled by controlling the injection amount of the reactive gas, and a decoupled film of various colors can be continuously produced.

1 is a sectional view of a deco film according to the present invention.
2 shows an example of forming a reflection layer according to the present invention.
Fig. 3 shows an example of forming the resonance layer according to the present invention.
4 shows an example of forming a semi-reflective layer according to the present invention.
Fig. 5 shows an example of a device for manufacturing a deco film according to the present invention.
Fig. 6 shows another example of the apparatus for manufacturing a deco film according to the present invention.

Deco film

The decoupfilm 100 of the present invention uses a fabry perot principle and includes a substrate layer 110, a reflective layer 120, a resonant layer 130, and a reflective layer 140 in a laminated order (See Fig. 1).

When light is incident on the deco film, only a part of the incident light selectively passes through the antireflection layer, and the light having passed through the antireflection layer passes through the transparent resonance layer and is then reflected by the reflection layer. In the resonance layer, light is complemented and canceled, and when light of a specific wavelength among the lights canceled with the reinforcement passes through the anti-reflection layer, this is recognized as a color.

The base layer 110 may include a polymer resin. For example, the polymer resin may be at least one selected from the group consisting of polyethylene terephthalate (PET), polyethylene naphthalate (PEN), cycloolefin polymer (COP), polyethylene sulfide (PES), polyphenylene sulfide (PPS), polycarbonate Polyimide (PI), and polyamide (PA). Further, the base layer may be a transparent polymer film.

The reflective layer 120 includes an inorganic material that reflects light and reflects light. Specifically, the reflective layer may have a light transmittance of 0 to 10%, specifically 0 to 5%.

The inorganic material is not particularly limited as long as it can reflect light and be deposited on the base film by sputtering. Specifically, the inorganic material may include at least one selected from the group consisting of In, Zn, Si, Al, Cu, and Ti. More specifically, the inorganic material may be indium (In), silicon (Si), or an alloy thereof.

The resonant layer 130 is a transparent layer that resonates light, and includes a complete oxide of the inorganic material. Specifically, the resonant layer has a composition of 80 to 95%, specifically 90 to 95 % ≪ / RTI > of light transmittance.

Specifically, when the inorganic material is silicon, the complete oxide of the inorganic material may be silicon dioxide (SiO ₂ ). When the inorganic material is indium, the complete oxide of the inorganic material may be indium oxide (In ₂ O ₃ ).

The semi-reflective layer 140 selectively transmits only a part of the incident light, and includes a partial oxide of the inorganic material. Specifically, the semi-reflective layer may have a light transmittance of 30 to 70%, specifically 40 to 60%.

The partial oxide means a partially oxidized " semi-oxide ", and has a smaller content of oxygen than the complete oxide of the inorganic material constituting the resonance layer. For example, when the inorganic material is silicon, the partial oxide of the inorganic material may be represented by the following formula (1). When the inorganic substance is indium, the partial oxide of the inorganic substance may be represented by the following general formula (2).

[Chemical Formula 1]

SiO _n

In the above formula (1), n is a real number of 0.4 to 1.4, specifically 0.5 to 1.0.

(2)

In ₂ O _m

In Formula 2, m is a real number of 0.5 to 2.0, specifically 0.8 to 1.5.

Specifically, the inorganic substance is silicon, the complete oxide of the inorganic substance is silicon dioxide (SiO ₂ ), and the partial oxide of the inorganic substance may be represented by the formula (1).

Specifically, the inorganic material is indium, the complete oxide of the inorganic material is indium oxide (In ₂ O ₃ ), and the partial oxide of the inorganic material may be represented by the above formula (2).

The thicknesses of the reflective layer, the resonant layer, and the semi-reflective layer may be variously adjusted according to the color to be implemented. For example, if a blue decal film is desired, the decolor film may include a reflective layer, a resonant layer and a semi-reflective layer in a thickness ratio of 1: 0.3 to 1.5: 1 to 3, respectively. Further, for example, when a yellow deco film is intended, the deco film may include a reflective layer, a resonant layer and a semi-reflective layer in a thickness ratio of 1: 0.5 to 2: 0.1 to 0.8, respectively.

The above-mentioned deco film can realize various colors while having non-conductive characteristics, and thus can be usefully used as a surface decorating film for various products such as IT devices and electronic products.

Method for manufacturing deco film

The method for producing a deco film of the present invention

(1) depositing an inorganic material on the base layer to form a reflection layer;

(2) depositing the inorganic material on the reflection layer while completely oxidizing the inorganic material to form a resonance layer; And

(3) depositing the inorganic material on the resonant layer while partially oxidizing the inorganic material to form a semi-reflective layer.

The deposition of the steps (1), (2) and (3) is performed by sputtering, and the amount of oxygen to be implanted can be varied in each step.

In step (1), an inorganic material is deposited on the base layer to form a reflection layer.

2, a first nozzle 401 for spraying a discharge gas 501 and a second nozzle 402 are spaced apart from each other with an evaporation material 300 therebetween. The first nozzle 401 and the second nozzle 402 are deposited on one surface of the base layer 110, The reflective layer 120 can be formed while the substrate layer is transported so that the portion to be treated passes sequentially through the position opposed to the first nozzle 401 and the position opposed to the second nozzle 402.

The deposition material (300) is the inorganic material, and the inorganic material is as defined in the Deco film.

The discharge gas 501 may be injected at a flow rate of 200 to 1000 sccm. As the discharge gas, an argon gas, a helium gas, a neon gas, a xenon gas, or the like can be used, and specifically argon (Ar ₂ ) gas can be used.

The base layer 110 is the same as that defined in the decoy film.

The first nozzle and the second nozzle do not spray reactive gas, for example, oxygen. That is, no reactive gas, for example, oxygen, is implanted during the deposition of the step (1).

The deposition can be performed by sputtering. Specifically, the sputtering may be plasma sputtering. More specifically, the sputtering may be reactive plasma sputtering. The plasma may be an arc discharge plasma or a glow discharge plasma.

For example, referring to FIG. 2, the substrate layer 110 is attached to an anode or a ground electrode, the deposition material 300 is attached to a cathode electrode, When the output is applied, the discharge gas 501 is separated into ions and electrons and becomes a plasma 200 state. Ions of the discharge gas collide with the deposition material 300 to sputter the deposition material to atomic state and the separated deposition material atoms are deposited on the substrate layer 110 in the form of an inorganic material 601 to form the reflection layer 120 .

In step (2), the inorganic material is vapor-deposited on the reflection layer while completely oxidizing the inorganic material to form a resonance layer.

3, a third nozzle 403 and a fourth nozzle 404 for spraying the discharge gas 501 and the reactive gas 502 are spaced apart from each other with the deposition material 300 therebetween, and the reflective layer 120 May pass through the first nozzle 403 and the fourth nozzle 404 in this order to form the resonant layer 130. In this case,

The deposition can be performed by sputtering. The sputtering is as defined in the above step (1).

3, the reflective layer 120 is attached to the anode or the ground electrode, and the deposition material 300 is attached to the cathode electrode. Then, while the discharge gas 501 is being injected, The discharge gas 501 is separated into ions and electrons and becomes a plasma state. Ions of the discharge gas collide with the deposition material 300 to sputter the deposition material to atomic state and the separated deposition material atoms react with the reaction gas 502 to form a complete oxide 602 of the inorganic material 120 to form the resonance layer 130. [

The reaction gas 502 may be oxygen.

The flow rate of the reaction gas may be an amount which completely oxidizes the inorganic material. The complete oxidation means that a complete oxide of the inorganic material is produced by oxidizing the inorganic material, and the complete oxide of the inorganic material is the same as defined in the Deco film.

Specifically, during the deposition of step (2), oxygen can be injected in an amount sufficient to completely oxidize the inorganic material.

In the step (3), the inorganic material is deposited on the resonance layer while partially oxidizing it to form a semi-reflective layer.

4, a fifth nozzle 405 and a sixth nozzle 406 for spraying the discharge gas 501 and the reactive gas 502 are positioned apart from each other with the evaporation material 300 therebetween, Reflective layer 140 can be formed while the film is being transferred so that one side of the second nozzle 130 sequentially passes through a position opposite to the fifth nozzle 405 and a position opposite to the sixth nozzle 406.

The deposition can be performed by sputtering. The sputtering is as defined in the above step (1).

4, the resonance layer 130 is mounted on the anode or the ground electrode, and the deposition material 300 is mounted on the cathode electrode. Then, while the discharge gas 501 is being injected, The discharge gas 501 is separated into ions and electrons to be in a plasma state. The ions of the discharge gas collide with the deposition material 300 to sputter the deposition material to atomic state. The separated deposition material atoms react with the reaction gas 502 to form a partial oxide 603 of the inorganic material, (130) to form a reflective layer (140).

The reaction gas 502 may be oxygen.

The flow rate of the reaction gas may be 30 to 70%, specifically 40 to 50% of the amount of the reactive gas injected in step (2). The partial oxidation means oxidizing the inorganic substance to produce a partial oxide of the inorganic substance, and the partial oxide of the inorganic substance is the same as defined in the Deco film.

In addition, the deposition of the above steps (1), (2) and (3) can be continuously performed in a roll-to-roll process. 5 and 6, the deposition of the steps (1), (2) and (3) is performed by using the cathode electrode and two nozzles (the first nozzle and the second nozzle, Four nozzles, or a fifth nozzle and a sixth nozzle) can be continuously performed in a roll-to-roll process.

The U1 is a unit (reflective layer deposition unit) for depositing a reflective layer on a base layer, and may include a first nozzle and a second nozzle. Further, U2 is a unit (a resonance layer deposition unit) for depositing a resonance layer on the reflection layer, and may include a third nozzle and a fourth nozzle. Furthermore, the U3 may be a unit (semi-reflective layer deposition unit) for depositing a semi-reflective layer on the resonance layer, and may include a fifth nozzle and a sixth nozzle.

According to the method for producing a decoy film as described above, the composition of the constituent layer can be easily controlled by controlling the injection amount of the reactive gas, and a decoupled film of various colors can be continuously produced.

Hereinafter, the present invention will be described in more detail with reference to examples. It is to be understood that the following examples are for illustrative purposes only and are not intended to limit the scope of the present invention.

[Example]

Reference example: Deco film manufacturing apparatus

A roll drum in the vacuum chamber, and three units (a cathode electrode on which the evaporation material is mounted) and two nozzles (a first nozzle and a second nozzle, a third nozzle and a fourth nozzle, or a fifth nozzle and a sixth nozzle ), A device for sequentially depositing a reflective layer, a resonant layer, and a semi-reflective layer on the surface of a base film through sputtering of an evaporation material (see FIGS. 5 and 6). Further, the roll drum is rotated so as to transport the base film in a predetermined direction so that the base film passes through the first nozzle, the second nozzle, the third nozzle, the fourth nozzle, the fifth nozzle and the sixth nozzle in turn Deposition was performed.

Manufacture of Deco-Films

Example 1

A deco film producing apparatus of the above-mentioned reference example was used, and transparent polyethylene terephthalate (PET) film was used as a base film. The base film is wound on a roll drum and transferred to sequentially pass the three units (the reflective layer deposition unit, the resonance layer deposition unit and the semi-reflective layer deposition unit) according to the rotation of the roll, and the silicon (Si) Respectively. And argon gas was jetted from the first and second nozzles at a flow rate of 300 sccm (300 × 1.69 × 10 ^-3 Pa · m ³ / sec). In the third nozzle and the fourth nozzle, argon gas and oxygen (purity: 5N: 99.999%) were injected at a flow rate of 300 sccm and 80 sccm, respectively. In the fifth nozzle and the sixth nozzle, argon gas and oxygen (purity: 5N: 99.999%) were jetted at a flow rate of 300 sccm and 30 sccm, respectively.

A 20 kW discharge output was applied to the device for plasma generation. As a result, a plasma was generated, and an evaporation material was sputtered and deposited on the base film. The deposition was carried out while the substrate film passed through the three units in turn.

As a result, the produced decoupled film was obtained by stacking a base layer of PET, a reflection layer of 15 nm in thickness made of silicon, a resonance layer 40 nm in thickness made of silicon dioxide, and a reflection layer 24 nm in thickness made of SiO 2 in this order Respectively.

Examples 2 and 3

A decoupled film was produced in the same manner as in Example 1, except that the thickness of the resonance layer was changed to 17 nm and 10 nm, respectively.

Experimental Example 1

The color / reflectance of the deco films of Examples 1 to 3 was measured using a spectrophotometer (manufacturer: Konica Minolta, product name: CM3600D), and the results are shown in Table 1 below.

Antireflective layer / resonant layer / reflective layer thickness (nm) L / a / b Example 1 24/40/15 70 / -6.5 / -2 Example 2 24/17/15 54 / -8 / -10 Example 3 24/10/15 53 / -6 / -17

As shown in Table 1, as the thickness of the resonance layer became thinner, the color of the film changed to a deep blue color.

Examples 4 to 6

Except that the thickness of the reflective layer was fixed to 20 nm and the thickness of the resonance layer was fixed to 20 nm and the thickness of the reflective layer was changed to 16 nm, 13 nm, and 6 nm, respectively. .

Experimental Example 2

The color / reflectance of the film was measured in the same manner as in Experimental Example 1 with respect to the deco films of Examples 4 to 6, and the results are shown in Table 2 below.

Antireflective layer / resonant layer / reflective layer thickness (nm) L / a / b Example 4 16/20/20 43 / -9 / -26 Example 5 13/20/20 32/9 / -7 Example 6 6/20/20 47/9/34

As shown in Table 2, the color of the film changed to yellow as the thickness of the semi-reflective layer became thinner.

100: Deco film 110: Base layer
120: reflective layer 130: resonant layer
140: Reflective layer 200: Plasma
300: Deposition material 401: First nozzle
402: second nozzle 403: third nozzle
404: fourth nozzle 405: fifth nozzle
406: sixth nozzle 501: discharge gas
502: reaction gas 601: inorganic substance
602: Complete oxide of inorganic material 603: Partial oxide of inorganic material
700: roll drum U1: reflective layer deposition unit
U2: resonance layer deposition unit U3: semi-reflective layer deposition unit

Claims (8)

A substrate layer, a reflective layer, a resonant layer, and a semi-reflective layer in this order,
Wherein the reflective layer is formed by depositing an inorganic material and has a light transmittance of 0 to 10%
Wherein the resonant layer is formed by depositing a complete oxide of the inorganic material and has a light transmittance of 80 to 95%
Wherein the semi-reflective layer is formed by depositing a partial oxide of the inorganic substance, and has a light transmittance of 30 to 70%.
The method according to claim 1,
Wherein the inorganic material comprises at least one selected from the group consisting of indium (In), zinc (Zn), silicon (Si), aluminum (Al), copper (Cu), and titanium (Ti).
3. The method of claim 2,
Wherein the inorganic material is silicon,
Complete oxide of the inorganic material is a silicon dioxide (SiO _2),
Wherein the partial oxide of the inorganic substance is represented by the following formula 1:
[Chemical Formula 1]
SiO _n
In the above formula, n is a real number of 0.4 to 1.4.
3. The method of claim 2,
Wherein the inorganic material is indium,
Wherein the complete oxide of the inorganic material is indium oxide (In ₂ O ₃ )
Wherein the partial oxide of the inorganic substance is represented by the following formula 2:
(2)
In ₂ O _m
In the above formula, m is a real number of 0.5 to 2.0.
(1) depositing an inorganic material on the base layer without injecting oxygen to form a reflection layer having a light transmittance of 0 to 10%;
(2) implanting oxygen in an amount sufficient to completely oxidize the inorganic material and depositing the inorganic material on the reflective layer while completely oxidizing the inorganic material to form a resonance layer having a light transmittance of 80 to 95%; And
(3) oxygen is injected in an amount of 30 to 70% of the amount of oxygen injected in the step (2), and the inorganic material is partially oxidized and deposited on the resonant layer to form a semi-reflective layer having a light transmittance of 30 to 70% ≪ / RTI > further comprising the steps of:
6. The method of claim 5,
Wherein the deposition of the steps (1), (2) and (3) is performed by sputtering.
6. The method of claim 5,
Wherein the deposition of the steps (1), (2) and (3) is continuously performed in a roll-to-roll process.
6. The method of claim 5,
Wherein the inorganic material comprises at least one selected from the group consisting of indium (In), zinc (Zn), silicon (Si), aluminum (Al), copper (Cu) and titanium (Ti) Gt;

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