KR20170041124A - Liquid Crystal Display - Google Patents

Abstract

A liquid crystal display device according to the present invention includes a first substrate, a second substrate, a liquid crystal layer, a column spacer, and a protruding pattern. An aperture region and a non-aperture region are defined in the first substrate and the second substrate. The liquid crystal layer is interposed between the first substrate and the second substrate. The column spacer is provided on either the first substrate or the second substrate in the non-aperture region. The protruding pattern is provided on another substrate opposite to the substrate having a column spacer, in the non-aperture region. The upper surface of the column spacer touches the protruding pattern. So, an aperture ratio can be improved.

Description

[0001] Liquid crystal display [0002]

The present invention relates to a liquid crystal display device having a column spacer for maintaining a cell gap.

A liquid crystal display displays an image by adjusting the light transmittance of a liquid crystal using an electric field. Such a liquid crystal display device can be divided into a vertical electric field type and a horizontal electric field type in accordance with the direction of the electric field driving the liquid crystal.

In a vertical electric field type liquid crystal display device, a common electrode formed on an upper substrate and a pixel electrode formed on a lower substrate are arranged so as to face each other, and a liquid crystal of a TN (Twisted Nematic) mode is driven by a vertical electric field formed therebetween. Such a vertical electric field type liquid crystal display device has an advantage of a large aperture ratio.

The horizontal electric field type liquid crystal display device drives the liquid crystal in the IPS (In Plane Switching) mode or the FFS (Fringe Field Swiching) mode by the horizontal electric field between the pixel electrode and the common electrode arranged in parallel to the lower substrate. Such a horizontal electric field type liquid crystal display device has a wide viewing angle advantage.

Hereinafter, a conventional liquid crystal display device and its problems will be described with reference to Figs. 1 and 2. Fig. 1 is a plan view showing the structure of a conventional liquid crystal display device. 2 is a cross-sectional view of the liquid crystal display device shown in FIG. 1 taken along the cutting line I-I '.

1 and 2, a liquid crystal display according to the related art includes a lower substrate SL, an upper substrate SU, a liquid crystal layer LC interposed between the lower substrate SL and the upper substrate SU, . The lower substrate SL and the upper substrate SU include pixel regions arranged in a matrix manner. The pixel region includes an opening region, and a non-opening region surrounding the opening region.

On the lower substrate SL, a gate line GL and a data line DL intersecting with each other, a thin film transistor T formed at an intersection thereof, and a pixel electrode PXL And the common electrode COM and the common wiring CL connected to the common electrode COM and advancing in parallel with the gate wiring GL are formed.

The gate wiring GL supplies a gate signal to the gate electrode G of the thin film transistor T. [ The data line DL supplies a pixel signal to the pixel electrode PXL through the drain electrode D of the thin film transistor T. [ The gate line GL and the data line DL are formed in an intersecting structure to define a pixel region. The common line CL is formed in parallel with the gate line GL and supplies a common voltage for driving the liquid crystal to the common electrode COM.

The thin film transistor T supplies the pixel signal of the data line DL to the pixel electrode PXL in response to the gate signal of the gate line GL. To this end, the thin film transistor T includes a gate electrode G connected to the gate wiring GL, a source electrode S connected to the data wiring DL, and a drain electrode connected to the pixel electrode PXL D). Further, the thin film transistor T includes a semiconductor layer. One side of the semiconductor layer is connected to the source electrode (S), and the other side of the semiconductor layer is connected to the drain electrode (D). A region of the semiconductor layer overlapping with the gate electrode G is defined as a channel region.

The pixel electrode PXL is connected to the drain electrode D of the thin film transistor T through the pixel contact hole PH passing through the protective film PAS and the planarization film PAC. The pixel electrode PXL includes a horizontal pixel electrode PXLh connected to the drain electrode D and formed in parallel with the adjacent gate line GL and a plurality of vertical pixel electrodes PXLh branched in the vertical direction from the horizontal pixel electrode PXLh PXLv).

The common electrode COM is connected to the common wiring CL through the common contact hole CH through the gate insulating film GI, the protective film PAS and the planarization film PAC. The common electrode COM includes a horizontal common electrode COMh formed in the horizontal direction and a plurality of vertical common electrodes COMv branched in the vertical direction from the horizontal common electrode COMh. The vertical common electrode COMv is arranged in parallel with the vertical pixel electrode PXLv in the pixel region.

The upper substrate SU includes black matrices BMh and BMv and a color filter CF. The color filter CF includes red, green, and blue color filters CF. The color filters CF may be alternately arranged in the R-G-B manner. Further, the color filter CF may further include a white color filter CF. Each color filter CF is formed to correspond to each pixel region. The neighboring color filters CF are formed so as to cover a part of the black matrixes BMh and BMv.

An alignment film ALL, a liquid crystal alignment film GL, and a liquid crystal alignment film GL are formed between the lower substrate SL and the liquid crystal layer LC and between the upper substrate SU and the liquid crystal layer LC, ALU) is formed. The lower substrate SL is bonded to the upper substrate SU with the liquid crystal layer LC therebetween. At this time, a column spacer CS is formed on the inner surface of the upper substrate SU in order to maintain a constant cell gap between the lower substrate SL and the upper substrate SU.

A horizontal electric field is formed between the vertical pixel electrode PXLv to which the pixel signal is supplied through the thin film transistor T and the vertical common electrode COMv to which the common voltage is supplied through the common line CL. This horizontal electric field causes the liquid crystal molecules to rotate due to dielectric anisotropy. The light transmittance through the pixel region is changed according to the degree of rotation of the liquid crystal molecules, thereby realizing an image.

The black matrixes BMh and BMv are formed so as to correspond to the non-opening regions. Specifically, the black matrixes BMh and BMv cover the thin film transistor T and the various wirings GL, DL, and CL, and the ends of the vertical pixel electrode PXLv and / or the vertical common electrode COMv during liquid crystal driving, The blocking layer may be formed at a level that can block the scattering due to the disclination that may occur at the end of the alignment layer or the declination that may occur in the alignment layer (ALL, ALU) rubbing process.

In particular, the horizontal black matrix BMh should be formed in a sufficiently large area so as to prevent the defects of the light source that may occur due to the disorder of the arrangement of the liquid crystal. In detail, when an external force is applied to the liquid crystal display device, damages occur on the surface of the lower alignment film ALL according to the movement of the column spacer CS formed on the upper substrate SU. At this time, damage to the surface of the lower alignment film (ALL) causes the alignment of the liquid crystal to be disturbed. In the region DA1 in which the basic orientation of the liquid crystal is changed, defects of light are generated. 2 (b) shows an upper substrate SU in which an external force acts on the liquid crystal display to form column spacers CS, Shifted state.

The black matrixes BMh and BMv are formed in consideration of the margin region M1 in which the column spacer CS can move in order to prevent the defects of the light source due to the movement of the column spacer CS in the conventional liquid crystal display device. As shown in Fig. In particular, the width W1 in the vertical direction of the horizontal black matrix BMh is formed to be wide. Increasing the area of the black matrix (BMh, BMv) causes a decrease in aperture ratio and a problem of luminance reduction. This problem is further problematic in realizing a liquid crystal display device of high resolution. That is, a high resolution liquid crystal display device includes a relatively large number of pixel regions in a single panel. In order to secure a plurality of pixel regions in an area of a limited panel, the area of each pixel region must be reduced. In the case of forming black matrices (BMh, BMv) having a large area in pixel regions having a small area, it is difficult to secure an aperture ratio for product realization.

It is an object of the present invention to provide a liquid crystal display device having a protruding pattern superimposed on a column spacer so as to secure an aperture ratio while preventing defects of a light source. It is still another object of the present invention to provide a liquid crystal display device in which color mixing defects are reduced by changing the arrangement of black matrices or the like.

A liquid crystal display device according to the present invention includes a first substrate, a second substrate, a liquid crystal layer, a column spacer, and a protruding pattern. In the first substrate and the second substrate, an opening region and a non-opening region are defined. The liquid crystal layer is interposed between the first substrate and the second substrate. The column spacer is provided in either of the first and second substrates in the non-aperture region. The protruding pattern is provided in the non-aperture region on another substrate opposite to the substrate provided with the column spacer. The top surface of the column spacer abuts the protruding pattern.

The protruding pattern may include a horizontal protruding pattern provided in the horizontal direction and a vertical protruding pattern provided in the vertical direction on the upper substrate. The column spacer can be superimposed on the lower substrate in a region where the horizontal projection pattern and the vertical projection pattern cross each other.

The protruding pattern may include a vertical protruding pattern provided in the vertical direction on the lower substrate. The column spacers may be superimposed on the upper substrate with a vertical protrusion pattern.

The present invention can provide a liquid crystal display device having a protrusion pattern that is superimposed on a column spacer, thereby preventing a defective light spot. In addition, there is an advantage that a sufficient aperture ratio can be ensured even in a liquid crystal display device of high resolution.

The present invention can remarkably reduce the color mixture defects by changing the arrangement of the black matrix or the like. In the present invention, it is not necessary to increase the width of the black matrix in order to prevent color mixture defects, and the decrease of the aperture ratio can be prevented. Accordingly, the present invention can provide a liquid crystal display device with improved display quality.

1 is a plan view showing the structure of a conventional liquid crystal display device.
2 is a cross-sectional view of the liquid crystal display device shown in FIG. 1 taken along the cutting line I-I '.
3 is a plan view showing the structure of a liquid crystal display device according to the first embodiment of the present invention.
4 is a cross-sectional view of the liquid crystal display device shown in Fig. 3 taken along a perforated line II-II '.
Fig. 5 is a view for explaining various structural examples of the protruding pattern.
6 is a view for explaining the effect of the liquid crystal display device according to the present invention.
7 is a plan view showing a structure of a liquid crystal display device according to a second embodiment of the present invention.
8 is a plan view schematically showing only a protruding pattern and a column spacer in Fig.
9 is a plan view showing a structure of a liquid crystal display device according to a third embodiment of the present invention.
10 is a plan view schematically showing only a protruding pattern and a column spacer in Fig.
11 is a plan view showing a structure of a liquid crystal display device according to a fourth embodiment of the present invention.
12 is a cross-sectional view of the liquid crystal display device shown in Fig. 11 taken along the perforated lines III-III '.
FIG. 13 is a view for explaining various examples of the structure of the vertical protruding pattern cut along the perforated line IV-IV 'of the liquid crystal display device shown in FIG.
FIGS. 14 and 15 are views for explaining the arrangement of the first auxiliary patterns. FIG.
16 and 17 show a structure of a liquid crystal display device according to a fifth embodiment of the present invention, and are plan views schematically showing only a vertical protruding pattern and a column spacer.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. Like reference numerals throughout the specification denote substantially identical components. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In the following description, a detailed description of known technologies or configurations related to the present invention will be omitted when it is determined that the gist of the present invention may be unnecessarily obscured. In describing the various embodiments, the same components are represented at the outset and may be omitted in other embodiments.

≪ Embodiment 1 >

Hereinafter, a liquid crystal display according to a first embodiment of the present invention will be described with reference to FIGS. 3 to 5. FIG. 3 is a plan view showing the structure of a liquid crystal display device according to the first embodiment of the present invention. 4 is a cross-sectional view of the liquid crystal display device shown in Fig. 3 taken along a perforated line II-II '. Fig. 5 is a view for explaining various structural examples of the protruding pattern.

3 and 4, the liquid crystal display according to the first embodiment of the present invention includes a first substrate (hereinafter referred to as a "lower substrate") SL, a second substrate (hereinafter referred to as an "upper substrate" And a liquid crystal layer LC interposed between the lower substrate SL and the upper substrate SU. The lower substrate SL and the upper substrate SU include pixel regions arranged in a matrix manner. The pixel region includes an opening region, and a non-opening region surrounding the opening region. The aperture region may be defined by a black matrix (BM). The non-aperture area may be defined as an area covered by the black matrix (BM).

On the lower substrate SL, a gate line GL and a data line DL intersecting with each other, a thin film transistor T formed at an intersection thereof, and a pixel electrode PXL And the common electrode COM and the common wiring CL connected to the common electrode COM and advancing in parallel with the gate wiring GL are formed.

At least one thin film transistor T is arranged in each pixel region. The thin film transistor T has a gate electrode G connected to the gate wiring GL, a source electrode S connected to the data wiring DL and a drain electrode D connected to the pixel electrode PXL . Further, the thin film transistor T includes a semiconductor layer. One side of the semiconductor layer is connected to the source electrode (S), and the other side of the semiconductor layer is connected to the drain electrode (D). A region of the semiconductor layer overlapping with the gate electrode G is defined as a channel region. The thin film transistor T may be realized by any known structure as long as it can drive a liquid crystal display device. For example, a top gate structure, a bottom gate structure, a double gate structure, and the like.

The thin film transistor T supplies the pixel signal of the data line DL to the pixel electrode PXL in response to the gate signal of the gate line GL. The common line CL is formed in parallel with the gate line GL and supplies a common voltage for driving the liquid crystal to the common electrode COM. The storage capacitor STG is connected to the thin film transistor T and charges the difference voltage between the pixel signal and the common voltage.

The pixel electrode PXL is connected to the drain electrode D of the thin film transistor T through the pixel contact hole PH passing through the protective film PAS and the planarization film PAC. The pixel electrode PXL includes a horizontal pixel electrode PXLh connected to the drain electrode D and formed in parallel with the adjacent gate line GL and a plurality of vertical pixel electrodes PXLh branched in the vertical direction from the horizontal pixel electrode PXLh PXLv).

The common electrode COM can be connected to the common wiring CL through the common contact hole CH passing through the gate insulating film GI, the protective film PAS and the planarization film PAC. The common electrode COM includes a horizontal common electrode COMh formed in the horizontal direction and a plurality of vertical common electrodes COMv branched in the vertical direction from the horizontal common electrode COMh.

The pixel electrode PXL and the common electrode COM may be formed on the same layer with the same material. The vertical common electrode COMv and the vertical pixel electrode PXLv may have a comb structure in which a plurality of line segments are arranged in parallel at regular intervals in a pixel region. The vertical common electrode COMv and the vertical pixel electrode PXLv are disposed to be in mesh with each other, but are arranged in parallel so as not to be in contact with each other. However, the present invention is not limited thereto.

That is, the position and shape of the pixel electrode PXL and the common electrode COM can be selected in accordance with the design environment and purpose. For example, the pixel electrode PXL and the common electrode COM may be provided in different layers with an insulating film interposed therebetween. That is, on the planarization film PAC, the pixel electrode PXL and the insulating film covering the pixel electrode PXL can be formed in order, and the common electrode COM is formed on the insulating film so that the pixel electrode PXL and the horizontal electric field . Alternatively, the common electrode COM and the insulating film covering the common electrode COM may be formed in this order on the planarizing film PAC, and the pixel electrode PXL may be formed on the insulating film so that the common electrode COM and the horizontal electric field .

In this case, the pixel electrode PXL (or the common electrode COM) positioned under the insulating film may have a plate shape having a predetermined area, and the common electrode COM (or the common electrode COM) Pixel electrode PXL) may have a comb structure in which a plurality of line segments are arranged in parallel at regular intervals in a pixel region.

The upper substrate SU includes a color filter CF. The color filter CF includes red, green, and blue color filters CF. The color filters CF may be alternately arranged in the R-G-B manner. Further, the color filter CF may further include a white color filter CF. Each color filter CF may be formed one by one to correspond to each pixel region.

The non-opening region of the upper substrate SU includes protruding patterns (or stepped portions) SGh and SGv. In the upper substrate SU, a step is caused by a height difference between a structure disposed in the opening region and a structure disposed in the non-opening region. The portion of the non-opening region protruded from the opening region by the height difference is defined as the protruding pattern SGh, SGv.

The protruding patterns SGh and SGv may include a color filter CF and a black matrix BM. For example, a black matrix BM may be disposed on neighboring color filters CF extending to the non-aperture region to form a step. The color filter CF is disposed in the opening region of the upper substrate SU and the neighboring color filter CF and the black matrix BM are stacked in the non-opening region of the upper substrate SU, The protruding patterns SGh and SGv due to the height difference between the opening regions are formed.

The protruding patterns SGh and SGv include a vertical protruding pattern SGv and a horizontal protruding pattern SGh. The vertical protrusion pattern SGv means a vertical component extending in the vertical direction among the protrusion patterns SGh and SGv and the horizontal protrusion pattern SGh means a horizontal component extending in the horizontal direction among the protrusion patterns SGh and SGv do. The vertical protrusion pattern SGv is arranged in parallel with the data line DL of the lower substrate SL and overlaps with the data line DL so as to completely cover the data line DL. The horizontally protruding pattern SGh overlaps with the thin film transistor of the lower substrate SL and the various lines GL, DL and CL and overlaps the end of the vertical pixel electrode PXLv and / The blocking layer may be formed at a level that can block the disclination that may occur at the end of the alignment layer (ALL, ALU) rubbing process, or the light leakage due to the cleavage that may occur during the rubbing process. The protruding patterns SGh and SGv may be arranged in the form of a mesh surrounding the aperture regions arranged in a matrix when the upper substrate SU is viewed in a plan view.

As described above, the protruding patterns SGh and SGv can be formed by laminating a black matrix BM on the color filters CF adjacent to each other in the non-opening region, but the present invention is not limited thereto. Referring to FIG. 5A, the protruding patterns SGh and SGv may be formed only of the black matrix BM. That is, the upper substrate SU includes a color filter CF disposed in the opening region and a black matrix BM disposed in the non-opening region. At this time, the black matrix BM is formed on the upper substrate SU and extends by a predetermined height from the upper substrate SU to partition the color filters CF disposed in the neighboring opening regions. The black matrix BM is formed to have a higher height than the neighboring color filters CF. Thus, the protruding patterns SGh and SGv are formed by the height difference between the black matrix BM and the neighboring color filters CF.

Referring to FIG. 5 (b), the protruding patterns SGh and SGv may be formed of color filters CF. That is, the upper substrate SU includes color filters CF provided so as to correspond to the respective pixel regions. At this time, the color filters CF are arranged in the opening region of each pixel region, and extend to the non-opening region. The neighboring color filters CF in the non-aperture region are stacked on each other. A single-layer color filter (CF) is disposed in the aperture area, and color filters (CF) stacked in the non-aperture area, so that a height difference occurs between the aperture area and the non-aperture area. The protrusion patterns SGh and SGv are formed by the height difference. In the non-aperture region, the color filters (CF) stacked on each other can function as a black matrix (BM).

Referring to FIG. 5 (c), the protruding patterns SGh and SGv may be formed of a color filter CF and a black matrix BM. That is, the upper substrate SU includes color filters CF provided so as to correspond to the respective pixel regions. The color filters CF are disposed in the opening regions of the respective pixel regions, and extend to the non-opening regions. The neighboring color filters CF in the non-aperture region are stacked on each other. At this time, a black matrix (BM) may be further disposed on the color filters CF stacked in the non-aperture region. A color filter CF of a single layer is disposed in the aperture area and color filters CF and a black matrix BM are stacked in the non-aperture area, and a height difference is generated between the aperture area and the non-aperture area. The protrusion patterns SGh and SGv are formed by the height difference.

Although not shown, an overcoat layer may be further formed on the entire surface of the upper substrate SU where the protruding patterns SGh and SGv are formed. When the black matrix BM is formed on the color filter CF in the above-described protruding patterns SGh and SGv, the overcoat layer may be interposed between the color filter CF and the black matrix BM have.

An alignment film ALL, a liquid crystal alignment film GL, and a liquid crystal alignment film GL are formed between the lower substrate SL and the liquid crystal layer LC and between the upper substrate SU and the liquid crystal layer LC, ALU) is formed. The lower substrate SL is bonded to the upper substrate SU with the liquid crystal layer LC therebetween. A horizontal electric field is formed between the vertical pixel electrode PXLv to which the pixel signal is supplied through the thin film transistor T and the vertical common electrode COMv to which the common voltage is supplied through the common line CL. This horizontal electric field causes the liquid crystal molecules to rotate due to dielectric anisotropy. The light transmittance through the pixel region is changed according to the degree of rotation of the liquid crystal molecules, thereby realizing an image.

The present invention has protruding patterns (SGh, SGv) so that the upper alignment layer (ALU) and / or the overcoat layer have a height difference between the open area and the non-open area. For example, when the overcoat layer is formed, the overcoat layer is intended to reduce a step that may occur due to the color filter CF or the like. However, in the present invention, even if the overcoat layer is formed, Is formed. For this purpose, the structures forming the protruding patterns SGh and SGv are formed to have predetermined heights. The predetermined height of the protruding patterns SGh and SGv is appropriately selected in consideration of the height of the neighboring color filters CF, the physical properties of the materials constituting the alignment layers ALL and ALU, and the physical properties of the materials constituting the overcoat layer. .

A column spacer CS is formed to maintain a constant cell gap between the lower substrate SL and the upper substrate SU. The column spacer CS is disposed on the lower alignment film ALL of the lower substrate SL. The column spacers CS formed on the lower substrate SL are formed to overlap the protruding patterns SGh and SGv disposed on the upper substrate SU. The upper surface of the column spacer CS abuts the upper alignment film ALU disposed on the upper substrate SU. In the drawing, the column spacer CS has a circular cross-sectional shape as an example, but the present invention is not limited thereto. The cross-sectional shape of the column spacer CS may have various planar shapes including a circular shape and a polygonal shape.

The horizontal protrusion pattern SGh should be formed in an area that can block the light spots that may occur due to the disorder of the arrangement of the liquid crystal. In detail, when an external force is applied to the liquid crystal display device, damages occur on the surface of the upper alignment film (ALU) contacting the upper surface of the column spacer (CS) according to the movement of the upper substrate (SU). At this time, damage occurs on the surface of the upper alignment film (ALU), and the alignment of the liquid crystal is disturbed. In the region DA2 in which the basic orientation of the liquid crystal is changed, defects of light are generated. 4 (a) shows a state before an external force acts on the liquid crystal display device, and FIG. 4 (b) shows a state in which an external force is applied to the liquid crystal display device and the upper substrate SU is shifted at a constant interval. The present invention sets the width W2 in the vertical direction of the horizontal protruding pattern SGh in consideration of the margin region M2 in which the column spacer CS can move in order to prevent defects of the light source.

Hereinafter, effects of the liquid crystal display device according to the present invention will be described with reference to comparative descriptions of Fig. 2 and Fig. In the present invention, the column spacer CS is formed on the lower substrate SL, and the upper surface of the column spacer is in contact with the upper alignment film (ALU) formed on the upper substrate SU. At this time, since the column spacer CS overlaps the protruding patterns SGh and SGv of the upper substrate SU, the area of the upper alignment film ALU contacting the column spacer is larger than that of the other regions of the upper alignment film ALU And protrudes toward the lower substrate SL. The protruded upper alignment film (ALU) region corresponds to the non-opening region, and the other region of the upper alignment film (ALU) corresponds to the opening region.

When an external force is applied to the liquid crystal display device so that the upper substrate SU is shifted at a constant interval, the column spacers CS are contacted only on the protruded upper alignment film (ALU) region. Assuming that the same external force is applied to the liquid crystal display device and the upper substrates SU are shifted at the same interval, the region where damage occurs to the alignment film and light spots are generated is different from the present invention in the prior art. That is, as the column spacer CS moves in the prior art, damage occurs in the region DA1 of the lower alignment film ALL corresponding to the movement of the column spacer CS. In contrast, according to the present invention, since the column spacer CS can be extended from the end of the protruding upper alignment layer (ALU) region even when the upper substrate SU is shifted, The area DA2 where the damage occurs in the ALU is reduced. Figs. 2B and 4B show a case where the same external force is applied to the liquid crystal display device and the upper substrates SU are shifted at equal intervals.

The liquid crystal display device according to the present invention can reduce the light source area DA2 due to the provision of external force compared to the prior art. The width W2 of the horizontal projection pattern SGh for covering the light source area DA2 in the present invention is smaller than the width W1 of the horizontal black matrix BMh for covering the conventional light source area DA1 ). ≪ / RTI > Accordingly, the present invention can provide a liquid crystal display device with improved aperture ratio compared to the prior art. In addition, according to the present invention, a sufficient aperture ratio can be ensured even in a liquid crystal display device of high resolution.

Hereinafter, another effect of the liquid crystal display device according to the present invention will be described with reference to FIG. 6 is a view for explaining the effect of the liquid crystal display device according to the present invention. 6 (a) shows a conventional liquid crystal display device, and FIG. 6 (b) shows an example of a liquid crystal display device according to the present invention.

Since a liquid crystal display can not emit light by itself, a separate light source is required to realize an image. Therefore, although not shown, a backlight unit may be further disposed on the back surface of the lower substrate SL.

The light emitted from the backlight unit to the lower substrate SL is incident on each of the pixel regions and passes through the color filters corresponding to the respective pixel regions to implement a display image. At this time, color mixture defects may occur between adjacent pixel regions. This color mixing defect may be more problematic when the user views the liquid crystal display device from the side.

For example, referring to FIG. 6A, the first color filter CF1 disposed in the first pixel area PA1 of the light (1, 2, 3) passing through the first pixel area PA1 A color mixture defect may occur in which the light (1) passing through and the light (3) passing through the second color filter CF2 arranged in the adjacent second pixel area PA2 are recognized at the same time. Such color mixing defects deteriorate the display quality of the liquid crystal display device.

In order to prevent color mixture defects, a black matrix BM is formed on the upper substrate SU. The black matrix BM blocks light (2) incident in the lateral direction in the pixel region. Therefore, the black matrix (BM) reduces defects caused by mixing undesired colors in adjacent pixel regions. There is a limit in preventing the color mixture defect even though the black matrix (BM) is formed. That is, a black matrix (BM) having a wide width is required in order to effectively prevent color mixture defects by using a black matrix (BM). For example, the width of the black matrix BM can be made wider in order to block light (hereinafter referred to as 'mixed color light') (3) that causes color mixture defects between adjacent pixel regions. However, in the case of forming a black matrix (BM) having a wide width, light incident from the side face can be effectively blocked, but the light from the front face is also blocked to lower the aperture ratio.

In order to form the protruding patterns SGh and SGv, the present invention is formed such that the black matrix BM provided in the non-opening region protrudes from the color filter CF. FIG. 6 (b) shows an example thereof. Accordingly, the liquid crystal display device according to the present invention has a narrow gap between the black matrix (BM) and the bottom alignment film (ALL), as compared with the prior art, so that the black matrix BM can block the color mixture light The range can be increased.

For example, in the prior art, light (3) passing through the second color filter CF2 disposed in the second pixel area PA2 among the lights (1, 2, 3) passing through the first pixel area PA1, Is recognized by the user. (1), (2) passing through the first color filter CF1 disposed in the first pixel area PA1 among the lights (1, 2, 3) passing through the first pixel area PA1, Thereby causing color mixture defects (Fig. 6 (a)).

On the other hand, in the present invention, light (3) directed to the second color filter B disposed in the second pixel area PA2 of the light (1, 2, 3) passing through the first pixel area PA1 is black It is blocked by the matrix BM to prevent the color mixture failure. That is, the liquid crystal display device according to the present invention increases the range of the mixed color light blocked by the black matrix (BM) compared with the conventional art, thereby effectively preventing the color mixture defects (Fig. 6 (b)).

The liquid crystal display device according to the present invention can significantly reduce the color mixture defects by changing the arrangement and / or thickness of the black matrix (BM) as compared with the prior art. In addition, it is not necessary to increase the width of the black matrix (BM) in order to prevent color mixing defects, and the decrease of the aperture ratio can be prevented. Accordingly, the present invention in which color mixing defects are reduced can provide a liquid crystal display device with improved display quality.

≪ Embodiment 2 >

Hereinafter, a liquid crystal display according to a second embodiment of the present invention will be described with reference to FIGS. 7 and 8. FIG. In the following description of the second embodiment, descriptions of substantially the same portions as those of the first embodiment will be omitted. 7 is a plan view showing a structure of a liquid crystal display device according to a second embodiment of the present invention. 8 is a plan view schematically showing only a protruding pattern and a column spacer in Fig.

In the second embodiment of the present invention, the column spacers CS formed on the lower substrate SL are arranged so as to overlap the protruding patterns SGh and SGv formed on the upper substrate SU. The protruding patterns SGh and SGv include a horizontal protruding pattern SGh and a vertical protruding pattern SGv. At this time, it is preferable that the column spacer CS is formed in a region where the horizontal protrusion pattern SGh and the vertical protrusion pattern SGv intersect each other.

As described above, when an external force acts on the liquid crystal display device and the upper substrate SU is shifted, a light spot (hereinafter referred to as 'light spot') due to damage of the upper alignment layer (ALU) The present invention forms the protruding patterns SGh and SGv having a certain area. At this time, since the horizontally protruding pattern SGh is arranged extending along the horizontal direction, it is possible to sufficiently cover the light splitting phenomenon in the case where the upper substrate SU is shifted in the horizontal direction by an external force. The horizontal protruding pattern SGh must necessarily extend in the horizontal direction so as to cover the thin film transistor T and the various wirings GL and CL. Therefore, it is not necessary to separately extend the horizontal projection pattern SGh in the horizontal direction to shield the light source.

However, in order to cover the light scattering phenomenon occurring when the upper substrate SU is shifted in the vertical direction, it is necessary to secure a margin region M2 in which the column spacer CS can move. That is, in order to block the light source, the horizontal projection pattern SGh should secure a width W2 in the vertical direction corresponding to the margin region M2. Therefore, it is required that the width W2 of the horizontal projecting pattern SGh be widened.

The second embodiment of the present invention is characterized in that the column spacer CS is divided into a horizontal protruding pattern SGh and a vertical protruding pattern SGv in order to prevent the width W2 of the horizontal protruding pattern SGh from becoming too long And overlapping each other in an intersecting area. Accordingly, even when the external force is applied and the upper substrate SU is shifted in the vertical direction, the column spacer CS can be moved (RT) along the vertical protruding pattern SGv. When the column spacer CS moves (RT) along the vertical protruding pattern SGv, no damage occurs in the upper alignment film (ALU) region corresponding to the opening region.

The second embodiment of the present invention is characterized in that a horizontal protrusion pattern SGh is formed to block the light spots by arranging the column spacer CS in a region where the horizontal protrusion pattern SGh and the vertical protrusion pattern SGv cross each other, It is possible to prevent the problem that the width W2 in the vertical direction of the light guide plate should be excessively wide. Thus, the second embodiment of the present invention can provide a liquid crystal display device capable of blocking light leakage due to damage of the alignment film while ensuring a sufficient aperture ratio.

 ≪ Third Embodiment >

Hereinafter, a liquid crystal display according to a third embodiment of the present invention will be described with reference to FIGS. In describing the third embodiment, description of the substantially same parts as those of the first embodiment will be omitted. 9 is a plan view showing a structure of a liquid crystal display device according to a third embodiment of the present invention. 10 is a plan view schematically showing only a protruding pattern and a column spacer in Fig.

The liquid crystal display device according to the third embodiment of the present invention includes a horizontal projection pattern SGh arranged in the horizontal direction and a vertical projection pattern SGv arranged in the vertical direction in the non- And a column spacer CS superimposed on a region where the horizontal projection pattern SGh and the vertical projection pattern SGv intersect in the non-opening region of the lower substrate SL.

The cross-sectional shape of the column spacer CS may be a planar shape including elliptical, polygonal, and the like. At this time, the column spacer CS has a predetermined length in the horizontal direction. For example, the predetermined length in the horizontal direction may be the length of the major axis when the cross-sectional shape of the column spacer CS is elliptical, and may be a length of one side when the cross-sectional shape of the column spacer CS is square . Hereinafter, the case where the column spacer CS is rectangular will be described as an example. For example, the column spacer CS may have a rod shape having a predetermined length LE1 in the horizontal direction of the cross sectional shape and a predetermined width WI1 in the vertical direction.

The horizontal length LE1 of the column spacer CS is preferably longer than the width LE2 of the vertical projection pattern SGv. When the column spacer CS is moved along the vertical protruding pattern SGv by forming the horizontal length LE1 of the column spacer CS longer than the width LE2 of the vertical protruding pattern SGv, A sufficient area for overlapping with the protruding pattern SGv can be ensured. The width W3 in the vertical direction of the horizontal projection pattern SGh can be further reduced when a sufficient area is secured to overlap the vertical projection pattern SGv when the column spacer CS moves.

Specifically, when the upper substrate SU is shifted in the vertical direction by an external force, the column spacer CS can move along the vertical projection pattern SGv (RT), and the upper alignment film ALU) can be prevented from being damaged. Even when the upper substrate SU is shifted in an oblique direction by an external force by forming the column spacer CS to have a length LE1 in the horizontal direction sufficiently longer than the width LE2 of the vertical projection pattern SGv , The column spacer CS can move (TT) along the vertical protruding pattern SGv, thereby preventing damage to the upper alignment layer ALU provided in the opening region.

The third embodiment according to the present invention is arranged such that the width of the horizontal protrusion pattern SGh in the vertical direction (in the vertical direction) by the shift margin in the diagonal direction of the column spacer CS, taking into consideration the case where the upper substrate SU is shifted in the oblique direction W3) need not be extended. The third embodiment according to the present invention can reduce the width W3 of the horizontally protruding pattern SGh as compared with the third embodiment. Therefore, the third embodiment of the present invention can provide a liquid crystal display device capable of blocking light leakage due to damage of the alignment film while ensuring a sufficient aperture ratio.

However, when the column spacer CS is moved in the oblique direction, the end of the column spacer CS abuts on the upper alignment layer (ALU) of the opening region, so that the alignment film damage may occur. In order to prevent this, the horizontal length LE1 of the column spacer CS may be longer than the separation distance LE3 between the adjacent vertical projection patterns SGv. When the upper substrate SU is shifted in an oblique direction by an external force, the column spacers CS can move along the neighboring vertical protruding patterns SGv with their both ends overlapping with the neighboring vertical protruding patterns SGv . When the upper substrate SU is shifted in the diagonal direction by forming the horizontal length LE1 of the column spacer CS to be sufficiently longer than the separation distance LE3 between the adjacent vertical projection patterns SGv, It is possible to prevent the end of the spacer CS from directly contacting the upper alignment film ALU of the opening region.

The length LE1 in the horizontal direction and the width WI1 in the vertical direction of the column spacer CS can be set in consideration of the distribution density of the column spacer CS. That is, the length LE1 and the width WI1 of the column spacer CS can be set in consideration of the distribution density required to maintain the cell gap between the upper substrate SU and the lower substrate SL . When it is required that the column spacer CS has a specific area to meet the distribution density, the present invention can secure the length LE1 of the column spacer CS sufficiently long and reduce the width WI1. That is, as described above, the column spacer CS in the present invention needs to secure a certain length LE1 in the horizontal direction. Therefore, in the present invention, the area of the column spacer CS is set in consideration of the required distribution density, and the length LE1 in the horizontal direction of the column spacer CS is formed longer than the width WI1 in the vertical direction .

The column spacer CS may be formed to overlap with at least one of the contact holes arranged in the non-opening region. The contact hole disposed in the non-opening region may include the pixel contact hole PH and the common contact hole CH. When the lower alignment film (ALL) is applied to the upper portion of the region where the contact holes are formed, the alignment film may spread unexpectedly. That is, during the process of applying the lower alignment layer (ALL), the alignment film may not spread to the contact hole region due to the surface tension. Unevenly spreading of the alignment film causes unevenness in appearance and deteriorates display quality. The present invention can prevent the unevenness of the alignment film from spreading by applying the alignment film after forming the column spacer CS to cover the contact hole region. Therefore, the third embodiment of the present invention can provide a liquid crystal display device in which defective stains are prevented to improve product reliability and product yield.

<Fourth Embodiment>

Hereinafter, a liquid crystal display according to a fourth embodiment of the present invention will be described with reference to FIGS. 11 to 13. FIG. 11 is a plan view showing a structure of a liquid crystal display device according to a fourth embodiment of the present invention. 12 is a cross-sectional view of the liquid crystal display device shown in Fig. 11 taken along the perforated lines III-III '. FIG. 13 is a view for explaining various examples of the structure of the vertical protruding pattern cut along the perforated line IV-IV 'of the liquid crystal display device shown in FIG. FIGS. 14 and 15 are views for explaining the arrangement of the first auxiliary patterns. FIG.

11 and 12, a liquid crystal display according to a fourth exemplary embodiment of the present invention includes a lower substrate SL, an upper substrate SU, and an upper substrate SU, which are interposed between a lower substrate SL and an upper substrate SU And a liquid crystal layer LC. The lower substrate SL and the upper substrate SU include pixel regions arranged in a matrix manner. The pixel region includes an opening region, and a non-opening region surrounding the opening region. The aperture region may be defined by a black matrix (BM). The non-aperture area may be defined as an area covered by the black matrix (BM).

On the lower substrate SL, a gate line GL and a data line DL intersecting with each other, a thin film transistor T formed at an intersection thereof, and a pixel electrode PXL And a common electrode COM are formed.

At least one thin film transistor T is arranged in each pixel region. The thin film transistor T has a gate electrode G connected to the gate wiring GL, a source electrode S connected to the data wiring DL and a drain electrode D connected to the pixel electrode PXL . Further, the thin film transistor T includes a semiconductor layer. One side of the semiconductor layer is connected to the source electrode (S), and the other side of the semiconductor layer is connected to the drain electrode (D). A region of the semiconductor layer overlapping with the gate electrode G is defined as a channel region.

The thin film transistor T supplies the pixel signal of the data line DL to the pixel electrode PXL in response to the gate signal of the gate line GL. The common electrode COM is electrically connected to a common voltage source (not shown) to receive a common voltage. The storage capacitor is connected to the thin film transistor T, and charges the difference voltage between the pixel signal and the common voltage.

A common electrode COM and a pixel electrode PXL are provided on the protective film PAS and the planarizing film PAC covering the thin film transistor to form a horizontal electric field. The position and shape of the pixel electrode PXL and the common electrode COM can be selected according to the design environment and purpose.

For example, on the planarizing film PAC, a common electrode COM and an insulating film covering the common electrode COM may be formed in order, and the pixel electrode PXL may be formed on the insulating film, An electric field can be formed. Although not shown, the pixel electrode PXL and the insulating film covering the pixel electrode PXL can be formed in order on the planarizing film PAC. The common electrode COM is formed on the insulating film to form the pixel electrode PXL, And a horizontal electric field may be formed.

In this case, the common electrode COM (or the pixel electrode PXL) located under the insulating film may have a plate shape having a predetermined area, and the pixel electrode PXL (or the common electrode COM) may have a comb structure in which a plurality of segment shapes within a pixel region are arranged at regular intervals in parallel.

The non-opening region of the lower substrate SL includes the vertical projection pattern SGv. In the lower substrate SL, a step is caused by a height difference between a structure disposed in the opening region and a structure disposed in the non-opening region. The portion of the non-opening region protruded from the opening region by the height difference is defined as a vertical protrusion pattern SGv.

The vertical projection pattern SGv includes a first auxiliary pattern ME arranged so as to overlap with the data line extending in the vertical direction in the non-opening region. The first auxiliary pattern ME is provided to have a predetermined thickness. Therefore, the vertical protruding pattern SGv including the first auxiliary pattern ME has a shape more projected toward the upper substrate SU than the peripheral area (e.g., the opening area).

As shown in FIG. 12, it is preferable that the first auxiliary pattern ME overlaps with the data line DL and is located at the uppermost layer excluding the lower alignment layer ALL, but the present invention is not limited thereto. In other words, various materials are sequentially stacked on the lower substrate SL to form elements. At this time, it is not necessary for the first auxiliary pattern ME to have the latest stacking order. That is, even if another layer is formed after the first auxiliary pattern ME, it is sufficient that the first auxiliary pattern ME is provided with a predetermined thickness so as to form a vertical protruding pattern SGv having a sufficient height.

The first auxiliary pattern ME may be in contact with other electrodes to receive a specific voltage (or signal), or may be provided independently. However, in order to prevent unnecessary parasitic capacitors from being formed, it may be preferable that the first auxiliary pattern ME is electrically connected to an electrode to which a specific signal is applied.

13A, the pixel electrode PXL and the common electrode COM may be provided in different layers with the first insulating film IN1 and the second insulating film IN2 interposed therebetween . That is, on the planarizing film PAC, the common electrode COM may be provided so as to have a plate shape having a predetermined area. On the common electrode COM, a first insulating film IN1 covering the common electrode COM may be provided. The first auxiliary pattern ME may be provided so as to overlap the data line DL on the first insulating layer IN1. The first auxiliary pattern ME may be electrically connected to the common electrode COM through the first contact hole INH passing through the first insulating layer IN1 in a predetermined area. A second insulating layer IN2 covering the first auxiliary pattern ME may be provided on the first auxiliary pattern ME and a pixel electrode PXL may be provided on the second insulating layer IN2. The pixel electrode PXL is connected to the drain electrode D of the thin film transistor T. [ The pixel electrode PXL may have a comb structure in which a plurality of line segments are arranged in parallel at regular intervals in a pixel region. At this time, the vertical protrusion pattern SGv formed by the first auxiliary pattern ME is provided to have a height sufficiently higher than the area where the pixel electrode PXL is formed, and protruded toward the upper substrate SU.

13 (b), the pixel electrode PXL and the common electrode COM may be provided in different layers with the first insulating film IN1 interposed therebetween. That is, on the planarizing film PAC, the common electrode COM may be provided so as to have a plate shape having a predetermined area. The first auxiliary pattern ME may be provided so as to overlap the data line DL on the common electrode COM. The first auxiliary pattern ME is directly connected to the common electrode COM. A first insulating layer IN1 covering the first auxiliary pattern ME may be provided on the first auxiliary pattern ME and a pixel electrode PXL may be provided on the first insulating layer IN1. The pixel electrode PXL is connected to the drain electrode D of the thin film transistor T. [ The pixel electrode PXL may have a comb structure in which a plurality of line segments are arranged in parallel at regular intervals in a pixel region. At this time, the vertical protrusion pattern SGv formed by the first auxiliary pattern ME is provided to have a height sufficiently higher than the area where the pixel electrode PXL is formed, and protruded toward the upper substrate SU.

Since a liquid crystal display can not emit light by itself, a separate light source is required to realize an image. Therefore, a backlight unit may further be disposed on the back surface of the lower substrate SL. Passes through the lower substrate SL and the upper substrate SU from the backlight unit and is recognized by the user. At this time, the common electrode COM having a plate shape of a predetermined area needs to be formed of a transparent conductive material such as ITO (Idium Tin Oxide) in order to pass the light emitted from the backlight unit. Since the transparent conductive material has a high specific resistance value, the transparent conductive material may not have a constant voltage value over the entire area of the common electrode COM. Such a problem is more problematic in the case of a large-area liquid crystal display device, and may cause a problem of image quality deterioration.

The first auxiliary pattern ME is formed of a conductive material having a low resistivity value and can be electrically connected to the common electrode COM directly or through the contact hole. In this case, the first auxiliary pattern ME can lower the resistance of the common electrode COM. Therefore, the common electrode COM can supply a uniform common voltage for each pixel without deviation according to the position. The first auxiliary pattern ME may be formed of at least one selected from the group consisting of molybdenum (Mo), titanium (Ti), tantalum (Ta), tungsten (W), copper (Cu), chromium (Cr) Or the like. However, the present invention is not limited thereto.

The upper substrate SU includes a color filter CF. The color filter CF includes red, green, and blue color filters CF. The color filters CF may be alternately arranged in the R-G-B manner. Further, the color filter CF may further include a white color filter CF. Each color filter CF may be formed one by one to correspond to each pixel region.

Between adjacent color filters CF, a black matrix BM may be further provided. The black matrix BM may be formed directly on the upper substrate SU and may be formed on the neighboring color filter CF. The black matrix BM may be implemented by stacking neighboring color filters CF.

The black matrix includes a vertical black matrix BMv and a horizontal black matrix BMh. The vertical black matrix BMv denotes a vertical component extending in the vertical direction of the black matrix, and the horizontal black matrix BMh denotes a horizontal component extending in the horizontal direction of the black matrix. The vertical black matrix BMv is arranged in parallel with the data line DL of the lower substrate SL and overlaps with the data line DL so as to completely cover the data line DL. The horizontal black matrix BMh is disposed so as to overlap with the thin film transistor of the lower substrate SL and the various wirings GL and DL. The vertical black matrix BMv and the horizontal black matrix BMh are formed at a level at which the arrangement of the liquid crystal is disturbed to block the light spots that may occur. The black matrix may be arranged in the form of a mesh surrounding the aperture regions arranged in a matrix when the upper substrate SU is viewed in plan view.

The lower substrate SL and the upper substrate SU are joined together with the liquid crystal layer LC therebetween. An alignment film ALL, a liquid crystal alignment film GL, and a liquid crystal alignment film GL are formed between the lower substrate SL and the liquid crystal layer LC and between the upper substrate SU and the liquid crystal layer LC, ALU) is formed. The liquid crystal layer LC is driven by an electric field formed between the pixel electrode PXL and the common electrode COM.

In order to maintain a constant cell gap between the lower substrate SL and the upper substrate SU, a column spacer CS is formed. The column spacers CS are formed on the upper alignment film ALU of the upper substrate SU. The column spacers CS formed on the upper substrate SU are arranged so as to overlap the vertical projection patterns SGv formed on the lower substrate SL. The upper surface of the column spacer CS is in contact with the lower alignment film ALL on the vertical projection pattern SGv provided on the lower substrate SL. The region where the column spacer CS is disposed may be an area overlapping the area where the vertical black matrix BMv and the horizontal black matrix BMh intersect.

When the upper substrate SU is shifted in the vertical direction by an external force, the column spacer CS can move along the vertical protrusion pattern SGv, thereby preventing the damage of the lower alignment film ALL provided in the opening region have. Even if the upper substrate SU is shifted in an oblique direction by an external force by forming the column spacer CS in the horizontal direction to be sufficiently longer than the width of the vertical projection pattern SGv, Can move along the vertical protrusion pattern SGv from above and can more effectively prevent damage to the lower alignment film ALL provided in the opening region.

14, the first auxiliary pattern ME may be elongated in the vertical direction (or vertical direction). At this time, the first auxiliary pattern ME may be formed of a conductive material having a low resistance, and may receive a common voltage from a common voltage source and transmit the common voltage COM to the common electrode COM. Thereby, the common voltage can be uniformly supplied to each pixel without deviation according to the position.

15, the first auxiliary pattern ME extends in the vertical direction and may have an independent island pattern. That is, the first auxiliary pattern ME may be limitedly provided in a certain region, taking into account the movement of the column spacer CS when an external force is applied. The predetermined region includes at least a portion of the non-aperture region (NA) and at least a portion of the aperture region (AA).

The first auxiliary patterns ME are not provided in all the regions where the data lines DL are formed but may be locally provided only in the regions where the column spacers CS are formed. In other words, the vertical protrusion pattern SGv may be provided only in the region where the column spacer CS is formed. Therefore, the distribution density of the column spacer CS and the distribution density of the first auxiliary pattern ME in the liquid crystal display device can be matched.

<Fifth Embodiment>

Hereinafter, a liquid crystal display according to a fifth embodiment of the present invention will be described with reference to FIGS. 16 and 17. FIG. In the following description of the fifth embodiment, description of portions substantially the same as those of the fourth embodiment will be omitted. 16 and 17 show a structure of a liquid crystal display device according to a fifth embodiment of the present invention, and are plan views schematically showing only a vertical protruding pattern and a column spacer.

The liquid crystal display according to the fifth embodiment of the present invention includes the vertical protruding pattern SGv extending in the vertical direction in the non-opening area NA of the lower substrate SL and the vertical protruding pattern SGv extending in the non- And a column spacer CS superimposed on the vertical protruding pattern SGv in the vertical direction.

16, the cross-sectional shape of the column spacer CS may be a planar shape including an ellipse, a polygon, and the like. At this time, the column spacer CS has a predetermined length LE in the horizontal direction. For example, the predetermined length LE in the horizontal direction may be the length of the long axis when the cross-sectional shape of the column spacer CS is elliptical, and the length of one side of the column spacer CS when the cross- Lt; / RTI &gt; Hereinafter, the case where the column spacer CS is rectangular will be described as an example.

The length LE in the horizontal direction of the column spacer CS may be longer than the gap GAP between the adjacent vertical protrusion patterns SGv in the horizontal direction. That is, both ends of the column spacer CS may be positioned above the vertical protrusion patterns SGv adjacent to each other in the horizontal direction. This means that the column spacers CS can be induced to shift over the adjacent vertical protrusion patterns SGv.

In the fifth embodiment of the present invention, when an external force is applied, the column spacer CS moves in contact with the upper portion of the vertically adjacent projection patterns SGv in the horizontal direction. Therefore, the fifth embodiment of the present invention can minimize the damage caused by the contact of the column spacer CS with the lower alignment film ALL provided in the opening area AA.

In this case, it is not necessary to secure a wide width W of the vertical projection pattern SGv to which the column spacer CS can move. In other words, since it is not necessary to secure a sufficient contact area between any one vertical projection pattern SGv and the column spacer CS moving along the vertical projection pattern SGv, the width of the vertical projection pattern SGv which is the non- W) can be relatively reduced. Therefore, the fifth embodiment of the present invention can provide a liquid crystal display device capable of blocking light leakage due to damage of the alignment film while ensuring a sufficient aperture ratio.

17, when the gap GAP between the horizontally adjacent vertical protrusion patterns SGv is wide, the column spacers CS located above the vertical protrusion patterns SGv are moved by the provided external force Deflection may occur. In this case, the column spacer CS and the lower alignment film ALL of the opening area AA may be in contact with each other, and the lower alignment film ALL may be damaged.

In order to prevent this, at least one second auxiliary pattern AME may be further formed between the vertically protruding patterns SGv adjacent in the horizontal direction. The second auxiliary pattern AME can be positioned at and support the column spacer CS when the column spacer CS is shifted to the opening area AA. The second auxiliary pattern AME may have an isolated island pattern. The second auxiliary pattern AME is spaced apart from the neighboring first auxiliary pattern ME by a predetermined distance. One of the second auxiliary patterns AME and the other of the second auxiliary patterns AME are spaced apart from each other by a predetermined distance.

The second auxiliary pattern AME may be locally disposed only in a partial area of the pixel area. The part of the area may be a part of the opening area AA and a part of the non-opening area NA extending therefrom. Alternatively, the part of the area may be a part of the opening area AA.

The second auxiliary pattern AME is preferably formed of the same material during the same process as the first auxiliary pattern ME. However, the first auxiliary pattern ME and the second auxiliary pattern AME may be connected to different electrodes (or wirings) and different signals may be applied.

The shape, size, number and the like of the second auxiliary pattern AME can be appropriately selected in consideration of the aperture ratio. The fifth embodiment of the present invention further includes a second auxiliary pattern (AME), thereby minimizing the damage of the alignment film due to deflection of the column spacer CS.

The technical idea of the present invention is not limited to the structure of the liquid crystal display device described above. That is, the technical idea of the present invention can be applied to any liquid crystal display device having a column spacer for maintaining a cell gap irrespective of the driving method thereof. It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention. Therefore, the present invention should not be limited to the details described in the detailed description, but should be defined by the claims.

SU: upper substrate SL: lower substrate
CS: column spacer LC: liquid crystal layer
SGh: Horizontal protrusion pattern SGv: Vertical protrusion pattern

Claims (15)

An upper substrate and a lower substrate defining an opening region and a non-opening region;
A liquid crystal layer interposed between the upper substrate and the lower substrate;
A column spacer provided on one of the upper and lower substrates in the non-opening region; And
And a protruding pattern provided on another substrate opposite to the substrate provided with the column spacer in the non-opening region,
And an upper surface of the column spacer abuts against the protruding pattern. The method according to claim 1,
The protruding pattern
A horizontal protrusion pattern provided in a horizontal direction and a vertical protrusion pattern provided in a vertical direction on the upper substrate,
Wherein the column spacer comprises:
Wherein the horizontal projection pattern and the vertical projection pattern intersect each other on the lower substrate. 3. The method of claim 2,
The protruding pattern
A color filter, and a black matrix disposed on the color filter. 3. The method of claim 2,
The protruding pattern
Wherein the color filters are stacked one upon the other. 5. The method of claim 4,
The protruding pattern
And a black matrix disposed on the color filters stacked on each other. 3. The method of claim 2,
The protruding pattern
And a black matrix for partitioning neighboring color filters. 3. The method of claim 2,
Wherein the lower substrate comprises:
And a contact hole disposed in the non-opening region,
Wherein the column spacer comprises:
And the liquid crystal layer is superimposed on the contact hole. The method according to claim 1,
The protruding pattern
A vertical protrusion pattern provided in a vertical direction on the lower substrate,
Wherein the column spacer comprises:
And the liquid crystal display device is arranged on the upper substrate in a superimposed manner with the vertical protrusion pattern. 9. The method of claim 8,
Wherein the lower substrate comprises:
Gate wirings arranged in the horizontal direction in the non-aperture region, and data wirings arranged in parallel in the vertical direction,
The protruding pattern
And a first auxiliary pattern superimposed on at least a part of the data line. 10. The method of claim 9,
Wherein the lower substrate comprises:
A thin film transistor provided in the pixel region;
A pixel electrode connected to the thin film transistor; And
And a common electrode which forms an electric field with the pixel electrode,
The first auxiliary pattern may include a first auxiliary pattern,
And the common electrode is electrically connected to the common electrode. 11. The method of claim 10,
Further comprising a common voltage source for generating said common voltage,
The first auxiliary pattern may include a first auxiliary pattern,
And the common voltage is supplied from the common voltage source to the common electrode. 9. The method of claim 8,
Further comprising at least one second auxiliary pattern provided between the adjacent protruding patterns in the horizontal direction,
Wherein the second auxiliary pattern comprises:
And the liquid crystal layer is superimposed on at least a part of the opening region. 9. The method according to claim 2 or 8,
Wherein the column spacer comprises:
And having a predetermined length in the horizontal direction,
The predetermined length of the column spacer
Wherein the width of the vertical protrusion pattern is longer than the width of the vertical protrusion pattern. 9. The method according to claim 2 or 8,
Wherein the column spacer comprises:
And having a predetermined length in the horizontal direction,
The predetermined length of the column spacer
Wherein the distance between the vertical protruding patterns adjacent to each other in the horizontal direction is longer than the distance between the vertical protruding patterns adjacent to each other in the horizontal direction. 15. The method of claim 14,
Wherein both ends of the column spacer
Wherein the liquid crystal display panel is positioned above the vertical protrusion patterns adjacent to each other in the horizontal direction.

Images