KR20160104534A - Input device - Google Patents

Abstract

An input device capable of enlarging an area of a display area (input area) by reducing a wiring area at an edge portion of a substrate, eliminating the necessity of spanning a wiring layer between electrode layers and densely arranging electrode layers is provided do.
The first electrode layer 21 is connected to the connection portion 22 in the Y direction and the second electrode layer 31 is arranged in the X direction. The second wiring layers 37b and 37c are integrally formed in the second electrode layers 31 and 31A and the second wiring layers 37b and 37c are formed in the wiring paths 23A and 23B formed in the first electrode layers 21A and 21B, And the wiring passages 33A and 33B formed in the second electrode layers 31A and 31B. The first wiring layers 27a, 27b and 27c extending from the first electrode row 20 and the second wiring layers 37a, 37b and 37c extending from the second electrode row 30 are not staggered from each other, The capacitance between the first wiring layer and the second wiring layer can be reduced.

Description

Input device {INPUT DEVICE}

The present invention relates to an input device in which a plurality of light-transmitting first electrode layers and second electrode layers are formed on the same surface of a transparent substrate.

In a portable electronic device or the like, an input device for detecting capacitance is formed, and this input device is disposed in front of a display panel such as a color liquid crystal panel in a superimposed manner.

In this type of input device, a plurality of light-transmitting electrode layers are formed on a light-transmitting substrate, and the electrode layer has a first electrode layer connected in the first direction and a second electrode layer connected in the second direction. When drive power is applied to one electrode layer of the first electrode layer and the second electrode layer, a detection output is obtained from the other electrode layer, and it is possible to detect at which point of the input device the finger or the like is approaching.

In this type of input device, both the first electrode layer and the second electrode layer are formed on the same surface of one substrate, so that the number of substrates can be reduced to be thin.

In this input device, it is necessary to form a first wiring layer (lead layer) connected to the first electrode layer and a second wiring layer (lead layer) connected to the second electrode layer on the surface of the substrate, And the second electrode layer is connected in the second direction, the first wiring layer is made to run around the edge portion in the first direction of the substrate, and the second wiring layer is made to extend from the edge portion in the second direction of the substrate It becomes necessary to circulate. If a wiring region is formed at two mutually orthogonal sides of the substrate, this wiring region becomes a dead region which does not function as a detection region. Further, when the input device is mounted on the front panel, it is necessary to cover the wiring area with the decorative layer, and there is a problem that the display area of the display panel is narrowed by the amount of forming the decorative layer.

In the touch screen panel described in Patent Document 1, a second sensing electrode and a second connecting pattern for continuing the second sensing electrode in the Y direction are integrally formed. The first connection electrodes are arranged in the X direction on both sides of the second connection pattern, the second connection pattern is covered with the insulation layer, and the first connection pattern formed on the insulation layer 1 The sensing electrodes are connected to each other. A driving pattern is connected to the first sensing electrode. The driving pattern passes between the first sensing electrode and the second sensing electrode, passes through the lower side of the first connection pattern, and is drawn out in the Y direction.

In this touch screen panel, the drive wiring connected to the first sensing electrode via the driving wiring and the driving pattern connected to the second sensing electrode passes through the lower side of the first connection pattern, It can be drawn only to the edge portion which is facing.

In the touch panel described in Patent Document 2, a plurality of first electrodes arranged in the X direction and a first conductor connecting the first electrodes are integrally formed on the surface of the substrate. Openings are formed in the respective first electrodes, and second electrodes are formed independently in the openings. An insulating layer is formed on the first electrode, a second conductive line is formed on the insulating layer, and the second electrode layers neighboring in the Y direction are connected by the second conductive line.

On the surface of the substrate, conductive segments extending in the Y direction are formed, and each of the conductive segments is connected to the first conductive line. At the intersection of the first conductive line and the conductive segment that should not be connected, The insulating layer is formed, and the conductive segments are connected to each other through the third conductive line formed on the insulating layer.

In this touch panel, since the conductive segment connected to the first electrode conducting in the X direction extends in the Y direction, the lead wire connected to the first electrode and the lead wire connected to the second electrode are arranged in the Y direction It can only run to the edge.

Japanese Laid-Open Patent Publication No. 2012-150782 Japanese Laid-Open Patent Publication No. 2013-143131

In the touch screen panel disclosed in Patent Document 1, a driving pattern extending from the first sensing electrode passes between the first sensing electrode and the second sensing electrode. Since the first sensing electrode and the second sensing electrode must be spaced apart from each other to allow the driving pattern to pass between the adjacent first sensing electrode and the second sensing electrode, It is necessary to ensure a wide arrangement interval of the two sensing electrodes. As a result, the arrangement density of the sensing electrodes can not be increased, and the resolution of position detection with respect to fingers and the like is lowered.

In the touch screen panel disclosed in Patent Document 1, the driving wiring extending from the first sensing electrode and the driving wiring extending from the second sensing electrode are staggered in the wiring region. As a result, in the wiring region, the driving wiring extending from the first sensing electrode and the driving wiring extending from the second sensing electrode are adjacent to each other, so that the capacitance between the driving wiring is increased, and the wiring region generates the detection noise . Therefore, it is preferable to interpose the wiring guide layer set to the ground potential or the like between the driving wiring extending from the first sensing electrode and the driving wiring extending from the second sensing electrode. In this case, however, It is necessary to arrange the wiring guide layer in the wiring region, and the structure of the wiring region becomes complicated.

In the touch panel described in Patent Document 2, since the conductive segments extending in the Y direction pass between the first electrodes neighboring in the X direction, the first electrodes neighboring in the X direction can be made to pass through the conductive segments It is necessary to arrange them away from each other. As in Patent Document 1, it becomes difficult to arrange the electrodes densely.

In addition, since the second electrode is disposed in the opening portion formed in the first electrode, the number of the second conductive wires connecting the second electrodes to each other is set to two . Therefore, when the number of electrodes is increased, the number of the second conductive lines and the number of the insulating blocks formed below the second conductive lines increase, and when a display panel formed behind is displayed, many second conductive lines and insulating blocks are easily visible And the display quality is easily deteriorated.

In the touch panel disclosed in Patent Document 2, since the first peripheral lead extending from the first electrode and the second peripheral lead extending from the second electrode extend in opposite directions to each other, It is necessary to form them separately on the edge portion of the reverse side of Fig. The useless space of the substrate is widened. In Patent Document 2, if the first peripheral lead wire and the second peripheral lead wire are wired on the same side of the substrate, the first peripheral lead wire and the second peripheral lead wire are wired so as to be staggered from each other, Area is liable to become an area where detection noise is generated.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned conventional problems, and it is an object of the present invention to provide a display device capable of enlarging the area of the display area (input area) by reducing the wiring area at the edge of the substrate, And an object of the present invention is to provide an input device capable of densely arranging electrode layers.

It is another object of the present invention to provide an input device capable of wiring a wiring layer extending from a first electrode layer and a wiring layer extending from a second electrode layer to another region of the wiring region.

The present invention provides a light-transmissive substrate, in which a first electrode layer and a second electrode layer formed of a light-transmitting conductive material are formed, a plurality of the first electrode layers are arranged in a first direction and a plurality of the second electrode layers are arranged in a first direction In an input device arranged in a second direction intersecting,

A connecting portion connecting one of the first electrode layer and the second electrode layer is integrally formed of the light transmitting conductive material and the first insulating layer and the first bridge connecting layer are formed on the connecting portion in an overlapping manner , The other electrode layer is electrically connected to each other by the first bridge connection layer,

A wiring layer is formed in the first electrode layer, a wiring layer extending from the second electrode layer passes through the wiring passage,

The first electrode layer is divided into the wiring layers and the second electrode layer and the second bridge connection layer are formed on the continuous portion of the wiring layer, And the other layer is made conductive by the second bridge connection layer.

In the input device of the present invention, since the wiring layer extending from the second electrode layer passes through the wiring passage formed in the first electrode layer, it is not necessary to pass the wiring layer between the electrode layer and the electrode layer, The detection sensitivity of the apparatus can be increased.

In the input device of the present invention, it is preferable that an electrode guide layer is further formed between the segment electrode layer and the wiring layer of the first electrode layer.

The input device of the present invention is characterized in that the wiring layer is formed in the second electrode layer and the wiring layer extending from the second electrode layer is formed in the second electrode layer different from the wiring path formed in the first electrode layer, Passes through the wiring passage,

In the other second electrode layer, either one of the segment electrode layer and the wiring layer separated by the wiring passage is continuous in the wiring passage, and the third insulating layer and the third bridge connection Layer is formed, and the other layer is made conductive by the third bridge connection layer.

In the input device of the present invention, for example, the first electrode layer and the second electrode layer are arranged in an oblique direction inclined with respect to both the first direction and the second direction, and the wiring layer extends in the oblique direction have.

In this case, a plurality of first electrode rows formed of a plurality of the first electrode layers arranged in the first direction are arranged in a spaced relationship in the second direction, and the plurality of second electrode layers arranged in the second direction A plurality of two-electrode rows are arranged in a line in the first direction at intervals.

The input device of the present invention is characterized in that the wiring layer extending from the first electrode layer and the wiring layer extending from the second electrode layer extend in the first direction and the wiring layers extending from the first electrode layer are adjacent to each other, And the wiring layers extending from the second electrode layer are adjacent to each other.

The input device according to the present invention eliminates the need to arrange the interconnection layer extending from the first electrode layer and the interconnection layer extending from the second electrode layer in a staggered manner, so that the interconnection layer extending from the first electrode layer and the interconnection layer extending from the second electrode layer The electrostatic capacity can be lowered, and detection noise can be prevented from being generated from the wiring region.

In this case, the present invention is characterized in that a region (i) in which wiring layers extending from the first electrode layer are arranged adjacent to each other, and a region (ii) in which wiring layers extending from the second electrode layer are arranged adjacent to each other, It is preferable that a guide layer is formed.

In the input device of the present invention, since the wiring layer extending from the second electrode layer passes through the inside of the first electrode layer, it is not necessary to form the wiring passage between the adjacent electrode layers, . Therefore, the sensitivity of the input device can be increased and the resolution of the detection on the operation surface can be increased.

In addition, since it is unnecessary to interpose the interconnection layers extending from the first electrode layer and the interconnection layers extending from the second electrode layer, it is possible to suppress detection noise from occurring in the interconnection region.

1 is an exploded perspective view of a touch panel using an input device according to an embodiment of the present invention.
2 is a plan view showing the arrangement of electrode layers of the input device according to the first embodiment of the present invention.
Fig. 3 is an enlarged cross-sectional view of the input device shown in Fig. 2 taken along line III-III.
4 is an enlarged cross-sectional view taken along the line IV-IV of the input device shown in Fig.
5 is a partial plan view showing the arrangement of the electrode layers of the input device according to the second embodiment of the present invention.
6 is a partial plan view showing a drawing state of a wiring layer of an input device according to a third embodiment of the present invention.
7 is an enlarged plan view of a first electrode layer showing a modification of the present invention.

The touch panel 1 is shown in Fig. The touch panel 1 is composed of a front panel 2 and an input device 10 of the present invention positioned below the front panel 2.

The surface panel 2 forms a part of a case of various electronic devices such as a portable telephone, a navigation device, a game device, and a communication device. The surface panel 2 is made of a translucent synthetic resin material such as acrylic or glass or the like, and can be seen from the outside of the surface panel 2 through the inside of the apparatus.

The input device 10 has a light-transmitting substrate 11. The substrate 11 is a resin sheet such as PET (polyethylene terephthalate). The surface panel 2 and the input device 10 are bonded via OCA (transparent adhesive adhesive).

In the input device 10, the Y direction is the first direction and the X direction is the second direction. 1 and 2, in the input device 10, a wiring region H is formed only on one edge portion 10y side in the first direction (Y direction) The detection area S is the detection area S. A display panel 5 such as a color liquid crystal panel is housed in the case of the electronic apparatus and the display screen of the display panel 5 is placed on the surface panel 2 and the detection area S of the input device 10 It is possible to see from the outside through the transmission. Therefore, the detection area S is also the display area.

The input device 10 does not include the wiring region in the edge portion 10x facing the second direction (X direction), so that the detection region (display region) S is divided into the X direction It is possible to extend to a position that is very close to the edge portion 10x that faces the end portion 10x, and dead space for wiring can be eliminated.

A first electrode row 20 extending in a first direction (Y direction) and a second electrode row 20 extending in a second direction (X direction) are formed on the common surface of the substrate 11 30 are formed.

In the first electrode array 20, the connection portions 22 connecting and connecting (connecting) the plurality of first electrode layers 21 (21A, 21B) and the first electrode layers 21 (21A, 21B) in the Y- The first electrode row 20 is formed in three rows of y1, y2, and y3. The first electrode layers 21A and 21B are regularly arranged at equal pitches in the Y direction along each column of y1, y2 and y3 and arranged along the columns of xa, xb, xc and xd in the X direction Are regularly arranged at even pitches. The number of the first electrode layers 21 is selected according to the area of the input device 10.

The first electrode layers 21A and 21B are square (or diamond-like), the corner portions of the square face in the X direction and the Y direction, and the connecting portions 22 are in contact with the first electrode layer 21 21A, 21B are connected to each other.

In the second electrode column 30, the second electrode layers 31 (31A and 31B) are formed independently of each other. The second electrode layers 31 and 31B are regularly arranged at equal pitches in the X direction along the three columns of x1, x2 and x3 and are arranged along the columns of ya, yb, yc, And are regularly arranged at even pitches in the direction of the arrow. The number of columns in the X direction and the Y direction is selected according to the area of the input device 10. The second electrode layers 31 (31A and 31B) are square (or rhombic), and their edge portions face the X direction and the Y direction. The sizes of the respective sides of the first electrode layers 21 (21A, 21B) and the second electrode layers 31 (31A, 31B) are coincident with each other.

The first electrode layer 21 A and 21B and the second electrode layer 31 A and 31B are formed in the X direction and the second electrode layer 30 in the X direction, And are arranged alternately adjacent to each other along an oblique direction of approximately 45 degrees inclined in both directions in the Y direction. In addition, the sides of the first electrode layers 21 (21A, 21B) and the second electrode layers 31 (31A, 31B) are opposed to each other in the oblique direction at 45 degrees.

A first wiring passage 23A is formed in the first electrode layer 21A and a first wiring passage 23B is formed in the first electrode layer 21B. A plurality of first electrode layers having no first wiring passage are denoted by reference numeral 21. In the row y1, the first electrode layer 21B and a plurality of first electrode layers 21 having no first wiring passage are connected to each other in the Y direction through the connecting portion 22. [ In the row y2, the first electrode layer 21A and the plurality of first electrode layers 21 having no wiring passage are connected in the Y direction through the connecting portion 22. [

A second wiring passage 33A is formed in the second electrode layer 31A and a second wiring passage 33B is formed in the second electrode layer 31B. And a plurality of second electrode layers on which the second wiring lines are not formed are denoted by reference numeral 31. [

In the first electrode layer 21A located at the intersection of the row y2 and column xc, the first wiring passage 23A is linearly formed along the oblique direction at 45 degrees with respect to the X-Y direction. The first wiring passage 23A is formed at the center so that the first electrode layer 21A can be evenly divided in an oblique direction. The first electrode layer 21A is divided into two divided electrode layers 24 and 24 by a first wiring passage 23A. Similarly, the first electrode layer 21B located at the intersection of the column y1 and the column xb is also provided with a first wiring passage 23B that obliquely traverses the central portion thereof. The first electrode layer 21B is connected to the first wiring And divided into the segment electrode layers 25 and 25 by the passage 23B.

In the second electrode layer 31A located at the intersection of the x2 and yb columns, the second wiring passage 33A extends linearly along the oblique direction. The second wiring passage 33A obliquely traverses the central portion of the second electrode layer 31A. The second electrode layer 31A is divided into two divided electrode layers 34, 34 by the second wiring passage 33A. In the second electrode layer 31B located at the intersection of the x1 column and the ya column, the second wiring passage 33B is bent and formed with a portion extending in the oblique direction and a portion extending in the first direction (X direction) . The second electrode layer 31B is divided into two divided electrode layers 35 and 35 by the second wiring passage 33B.

The first electrode layers 21, 21A and 21B and the connecting portions 22 constituting the first electrode array 20 and the second electrode layers 31 31A and 31B constituting the second electrode array 30 are the same And is formed of a light-transmitting conductive material. The light-transmitting conductive material is formed of an ITO (indium tin oxide) layer, a metal nanowire layer typified by silver nano wire, a thin metal layer formed of a mesh, or a conductive polymer layer.

3, the lamination structure of the intersection of the first electrode column 20 in the y3-th column and the second electrode column 30 in the x1-column is shown in a sectional view taken along the III-III arrow direction.

The first insulating layer 41 is formed at the intersection so as to cover the connecting portion 22 of the first electrode array 20. A first bridge connecting layer 42 is formed on the first insulating layer 41, Respectively. The second electrode layer 31 adjacent to both sides in the X direction of the connection portion 22 is connected and conducted by the first bridge connection layer 42. [ The first insulating layer 41 and the first bridge connection layer 42 are formed at all intersections of the first electrode array 20 and the second electrode array 30. [ In the x1 column, the three second electrode layers 31 and the second electrode layer 31B are connected in the X direction by the first bridge connection layer 42. In the x2 column, the three second electrode layers 31 and the second electrode layer 31A are connected by the first bridge connection layer 42 in the X direction. In the x3 column, the four second electrode layers 31 are connected by the first bridge connection layer 42 in the X direction.

The transparent first insulating layer 41 is made of novolak resin or novolac resin and acrylic resin. The first bridge connection layer 42 is formed by laminating a conductive metal material such as Au (gold), Au alloy, CuNi alloy (copper-nickel alloy) or Ni (nickel) on the base layer of the ITO layer of amorphous, More preferably a protective layer of an ITO layer of amorphous.

When the first electrode layers 21A and 21B, the connecting portion 22 and the second electrode layers 31 and 31A and 31B are formed of an ITO layer, they are formed of crystalline ITO, (42) is made of amorphous ITO. As a result, the crystalline ITO constituting the first electrode layers 21 (21A and 21B), the connecting portion 22 and the second electrode layers 31 (31A and 31B) and the amorphous ITO constituting the first bridge connection layer 42 It becomes possible to select and etch Perth's ITO.

The second electrode layer 31 (31A, 31B) and the connecting portion for connecting the electrode layers are integrally formed of the same conductive material at the intersection of the first electrode row 20 and the second electrode row 30 The first electrode layers 21A and 21B are formed on both sides of the connecting portion independently and are connected to the connecting portion connecting the second electrode layers 31 and 31A and 31B. A first bridge layer 42 and a first bridge layer 42 are formed on the first electrode layer 21 and the first electrode layer 21 adjacent to each other in the Y direction by the first bridge connection layer 42, And the first electrode layer 21A or 21B may be bridged.

2, a first wiring layer 27a integrally extending from the first electrode layer 21 in the y1 row and a first wiring layer 27b extending in the y2 and y3 columns are formed in the wiring region H formed at one end of the substrate 11 in the Y- First wiring layers 27b and 27c extending integrally from each of the first electrode layers 21 are formed.

Second wiring layers 37a, 37b, and 37c are formed in the wiring region H to be conductive to the second electrode lines 30, respectively.

As shown in Fig. 2, the second wiring layer 37a is formed integrally with the second electrode layer 31B located at the intersection of the x1 column and the ya column.

The second wiring layer 37b is formed integrally with the second electrode layer 31A located at the intersection of the x2 row and the yb row. The second wiring layer 37b passes through the inside of the first wiring passage 23B formed in the first electrode layer 21B located at the intersection of the column y1 and the column xb, Passes through the inside of the second wiring passage 33B formed by bending into the two-electrode layer 31B, and reaches the wiring region H shown above in the figure.

The second wiring layer 37c is formed integrally with the second electrode layer 31 located at the intersection of the x3 row and the yc row. This second wiring layer 37c passes through the first wiring passage 23A formed in the first electrode layer 21A located at the intersection of the y2 and xc columns and passes through the second electrode layer 21A located at the intersection of the x2 and yb columns Passes through the second wiring passage 33A formed in the first wiring layer 31A and passes through the first wiring passage 23B formed in the first electrode layer 21B positioned at the intersection of the y1 column and the xb column, Passes through the second wiring passage 33B formed in the second electrode layer 31B located at the intersection and reaches the wiring region H. [

The second wiring layer 37a is electrically connected to all the second electrode layers 31 and 31B constituting the second electrode column 30 located in the x1 column. The second wiring layer 37b is electrically connected to all the second electrode layers 31 and 31A constituting the second column 30 of x2 rows. The second wiring layer 37c is electrically connected to all the second electrode layers 31 constituting the second electrode column 30 located in the x3 column.

The second wiring layers 37a, 37b and 37c are formed integrally with the second electrode layers 31 (31A and 31B) by the light-transmitting conductive material constituting the second electrode layers 31 (31A and 31B) have.

4 shows the cross-sectional structure of the first electrode layer 21B located at the intersection of the column y1 and the column xb.

The first electrode layer 21B is divided into the division electrode layers 25 and 25 by the first wiring passage 23B. The second insulation layer 43 is formed on the first wiring passage 23B and the two second wiring layers 37b and 37c passing through the first wiring passage 23B and the second bridge connection layer 44 is formed on the second insulation layer 43 . The segment electrode layers 25 and 25 divided by the wiring passage 23B are connected by the second bridge connection layer 44 so that the first electrode layer 21B can function as one electrode layer as a whole have.

Similarly, the first wiring layer 23A and the second wiring layer 37c passing through the first wiring layer 23A are covered with the second insulating layer 43 in the first electrode layer 21A located at the intersection of the row y2 and column xc, The group electrode layers 24 and 24 are made conductive by the second bridge connection layer 44 formed thereon so that the entire first electrode layer 21A can function as one electrode layer.

the second wiring layer 33A and the second wiring layer 37c passing through the second wiring layer 33A are covered with the third insulating layer 45 in the second electrode layer 31A located at the intersection of the x2 and yb columns, The third bridge connection layer 46 thus formed connects the segment electrode layers 34, 34. the second wiring layer 33B and the second wiring layers 37b and 37c passing through the second wiring layer 33B are covered with the third insulating layer 45 in the second electrode layer 31B located at the intersection of the x1 column and the y column, And the third bridge connection layer 46 formed thereon connects the segment electrode layers 35 and 35 to each other.

The second insulating layer 43 shown in Fig. 4 is formed by the same process as the first insulating layer 41 shown in Fig. The second bridge connection layer 44 shown in Fig. 4 is formed by the same process with the same material as the first bridge connection layer 42 shown in Fig. The third insulating layer 45 is formed of the same material as the first insulating layer 41 in the same process and the third bridge connecting layer 46 is formed of the same material as the first bridge connecting layer 42 .

The manufacturing process of the input device 10 uses a material having a transparent conductive material such as ITO formed on the surface of the substrate 11 and the conductive material is etched to form the first electrode row 20, 30, the first wiring layers 27a, 27b, 27c and the second wiring layers 37a, 37b, 37c are formed.

Thereafter, a resin layer of a novolak resin and an acrylic resin is formed on the substrate 11, and a first insulating layer 41, a second insulating layer 43, and a third insulating layer 45 are formed in the photolithography process, Are simultaneously patterned. Further, a laminate for a bridge connection layer is formed, and the first bridge connection layer 42, the second bridge connection layer 44, and the third bridge connection layer 46 are simultaneously formed by an etching process.

2, an extended wiring layer 28a extends from the first wiring layer 27a in the wiring region H and the extended wiring layers 28b and 28c extend from the first wiring layers 27b and 27c similarly have. The extension wiring layers 28a, 28b and 28c are formed by laminating a low resistance metal layer such as silver or copper on a light-transmitting conductive material layer such as an ITO layer constituting the first wiring layers 27a, 27b and 27c. Likewise, extended wiring layers 38a, 38b, and 38c extend from the second wiring layers 37a, 37b, and 37c. The extended wiring layers 38a, 38b and 38c are formed by laminating a metal layer of low resistance such as silver or copper on a light-transmitting conductive material layer such as an ITO layer constituting the second wiring layers 37a, 37b and 37c.

Connection portions 51 such as a connector portion and a land portion are formed in the wiring region H on the surface of the substrate 11 and the terminal portions of the extension wiring layers 28a, 28b, 28c and the extension wiring layers 38a, 38b, 38c Is extended to the connection portion 51.

2, the second wiring layer 37c is formed by laminating the first wiring layer 21A and the second wiring layer 31A, and the wiring paths inside the first and second electrode layers 21B and 31B And the second wiring layer 37b extends through the respective wiring passages in the first and second electrode layers 21B and 31B and is located at the same position as the first row Extended. The second wiring layers 37a, 37b and 37c extend to the wiring region H in a region deviated to the right from the region in which the first wiring layers 27a, 27b and 27c extend. Therefore, the first wiring layers 27a, 27b, and 27c and the second wiring layers 37a, 37b, and 37c are not staggered from each other.

The connecting portion 51 is provided with a region i in which the extended wiring layers 28a, 28b and 28c communicating with the first electrode row 20 are gathered and an extended wiring layer 38a, 38b, 38c can be divided into left and right regions. In the connection portion 51, a wiring guide layer 49 is formed between the region (i) and the region (ii). The wiring guide layer 49 is formed of the same conductive material as the extended wiring layer 28a and the like by the same process. The wiring guide layer 49 is formed so as to be electrically independent of both the extended wiring layers 28a, 28b and 28c and the extended wiring layers 38a, 38b and 38c. The capacitance between the extended wiring layers 28a, 28b and 28c formed in the region i and the extended wiring layers 38a, 38b and 38c formed in the region ii can be lowered by interposing the wiring guide layer 49 . The wiring guide layer 49 is preferably set at the ground potential.

If the first wiring layer extending from the first electrode row and the second wiring layer extending from the second electrode layer are collected and concentrated in one wiring region of the substrate as in the conventional input device described in Patent Document 1 or the like, The first wiring layer from the heat and the second wiring layer from the second electrode layer have to be interwoven with each other so that the first wiring layer and the second wiring layer are adjacent to each other and the wiring layers are coupled by a relatively large capacitance. As a result, the wiring region has sensitivity and the sensitivity of the wiring region is superimposed as noise to the sensing operation.

On the other hand, in the above embodiment, the first wiring layers 27a, 27b, 27c extending from the first electrode row 20 and the second wiring layers 37a, 37b, 37c extending from the second electrode row 30 The extended wiring layers 28a, 28b and 28c can be wired to the region of (i) and the extended wiring layers 38a, 38b and 38c can be wired to the region of (ii) have. Therefore, the coupling capacitance between the individual first wiring layers and the second wiring layers can be lowered, and the region having sensitivity sensitive to the wiring region H can be eliminated.

If the first wiring layers 27a, 27b, and 27c and the second wiring layers 37a, 37b, and 37c are staggered and wired to each other, the wiring guide layer may be formed in all the spaces between the first and second wiring layers And it becomes necessary to form a large number of wiring guide layers. On the other hand, in the embodiment, the wiring guide layer 49 may be formed only between the region (i) and the region (ii).

In the input device 10 shown in Fig. 2, a display image of the display panel 5 can be seen from the outside through the input device 10 and the surface panel 2. [ By touching the surface panel 2 with a finger while viewing this display, the input device 10 can be operated.

In this input device 10, an electrostatic capacitance is formed between the first electrode row 20 and the second electrode row 30. When pulse driving power is sequentially given to one of the first electrode row 20 and the second electrode row 30, a detection current flows in the other electrode row at the timing of rising and falling of the driving power, The detection current is detected. When the finger approaches, a capacitance is formed between the finger and the electrode layer, so that the detection current changes. By detecting the change of the detection current, it is possible to detect at which point of the surface panel 2 the finger is approaching.

Since the second wiring layers 37b and 37c pass through the inside of the first electrode layers 21A and 21B and the second electrode layers 31A and 31B in the input device 10, It is not necessary to form a passageway for passing the gas. Therefore, the dimensions and arrangement intervals of each of the first electrode layers 21 (21A, 21B) and the second electrode layers 31 (31A, 31B) can be freely set without restriction for the main circuit of the second wiring layer . Therefore, it becomes possible to dispose the electrode layers 21 (21A, 21B), 31 (31A, 31B) closer to each other, increase the detection sensitivity, and improve the resolution of the detection operation.

Since the second wiring layers 37b and 37c pass through the first electrode layers 21A and 21B and the second electrode layers 31A and 31B, the second wiring layers 37a, 37b, The first wiring layers 27a, 27b, and 27c and the second wiring layers 37a, 37b, and 37c do not need to be alternated with each other because they can be wired in regions different from the first wiring layers 27a, 27b, and 27c. The same applies to the extension wiring layers 28a, 28b, and 28c and the extension wiring layers 38a, 38b, and 38c. Therefore, the coupling capacitance between the wiring layer from the first electrode array 20 and the wiring layer from the second electrode array 30 can be reduced, the detection noise in the wiring region H can be reduced, and the S / N ratio can be improved.

5 is a partially enlarged plan view showing an arrangement structure of electrodes of the input device 110 according to the second embodiment of the present invention. 5, the same components as those of the first embodiment shown in Fig. 2 are denoted by the same reference numerals, and a detailed description thereof will be omitted.

2 and 5, a second wiring layer 37c extending from the second electrode layer 31 is formed on the first wiring layer 23A and the first electrode layer 21B of the first electrode layer 21A, Of the first wiring layer 23B. The second wiring layer 37b extending from the second electrode layer 31A also passes through the first wiring passage 23B formed in the first electrode layer 21B. Electrostatic capacitance is formed between the second wiring layer 37c and the first electrode layer 21A to have sensitivity and a capacitance is formed between the second wiring layers 37b and 37c and the first electrode layer 21B to have sensitivity , And this sensitivity causes the S / N ratio to deteriorate.

5, the electrode guide layers 26 and 26 are formed on both sides of the second wiring layer 37c in the first electrode layer 21A and the electrode guide layers 26 and 26 are formed on both sides of the second wiring layer 37c. 26 are insulated from the group electrode layers 24, 24 of the first electrode layer 21A and are also insulated from the second wiring layer 37c. The presence of the electrode guide layers 26 and 26 makes it possible to reduce capacitive coupling between the second wiring layer 37c and the first electrode layer 21A and to improve the S / N ratio.

Similarly, also in the first electrode layer 21B, the electrode guide layers 26, 26 are formed on both sides of the second wiring layers 37b, 37c passing through the inside of the first wiring passage 23B, The layers 26 and 26 are insulated from both the second wiring layers 37b and 37c and the first electrode layer 21B. Therefore, generation of detection noise in the first electrode layer 21B can be suppressed.

The electrode guide layer 26 may be in a floating state without special wiring. However, it is preferable that the electrode guide layer 26 is set to the ground potential in a separate wiring path.

In the embodiment shown in Fig. 5, an opening 21a extending in the same oblique direction as that of the first wiring passages 23A and 23B is formed in the first electrode layer 21 in which no wiring passage is formed. The second electrode layer 31 is also provided with an opening 31a extending in an inclined direction. This makes it possible to reduce the difference in area between the first electrode layers 21A and 21B in which the first wiring paths 23A and 23B are formed and the first electrode layer 21 in which the wiring paths are not formed, The sensitivity of the electrode layer can be made uniform. The difference between the areas of the second electrode layers 31A and 31B in which the second wiring paths 33A and 33B are formed and the area of the second electrode layer 31 in which the wiring paths are not formed can be reduced, The sensitivity of the electrode layer can be made uniform.

6 is a partial plan view showing the arrangement structure of the electrodes of the input device 210 according to the third embodiment of the present invention. Only the differences from the input device 10 of the first embodiment shown in Fig. 2 will be described below.

The input device 210 shown in Fig. 6 has an input device 10 shown in Fig. 2, in which a second electrode row 30 of x4 rows and a first electrode layer 21 of xe row are added.

the second wiring layer 37c is extended from the second electrode layer 31C located at the intersection of the x3 and yc columns and the second wiring layer 33C is formed on the second electrode layer 31C. The first electrode layer 21C located at the intersection of the row y3 and the row xd is formed with a bent first wiring passage 23C.

and the second wiring layer 37d extends from the second electrode layer 31 located at the intersection of the x4 and yc columns. The second wiring layer 37d is electrically connected to the first wiring passage 23C of the first electrode layer 21C and the second wiring passage 33C of the second electrode layer 31C and the first wiring layer 33C of the first electrode layer 21A, The second wiring passage 33A of the second electrode layer 31A and the first wiring passage 23B of the first electrode layer 21B and the second wiring passage 33B of the second electrode layer 31B, And is led out to the wiring region H side by side with the second wiring layers 37a, 37b, and 37c.

As shown in FIG. 6, by forming the bent wiring path 23C in the first electrode layer 21C, the second wiring layer 37d extending from the second electrode layer 31 located below the lower electrode layer 31 is passed And the second wiring layers 37a, 37b, and 37c are aligned and drawn out. When this structure is employed, even when the number of electrode layers arranged in the Y direction is increased without increasing the number of electrode layers arranged in the X direction, the second wiring layer extending from the second electrode layer 31 can be formed as the first electrode layer 1 wiring path and the second wiring path of the second electrode layer, and the size and area of the detection area S can be freely set.

When it is necessary to increase the number of electrode arrangements in the X direction without increasing the number of electrode layers arranged in the Y direction, the arrangement of the entire electrode layers shown in Fig. 2 is made to be one pair, Or more. In this case, a plurality of first wiring layers extending from the first electrode row 20 and a plurality of second wiring layers extending from the second electrode row 30 are alternately arranged in the X direction. However, And the second wiring layer can be avoided from being alternately wired one by one, and generation of detection noise in the wiring region H can be suppressed.

Fig. 7 shows a modification of the first electrode layer 21A located at the intersection of the y2 column and the xc column.

In the first electrode layer 21A, the segment electrode layers 24, 24 are connected by a connecting portion 24a. The group electrode layers 24 and 24 and the connecting portion 24a are integrally formed from the same conductive material. The wiring paths 23A and 23A are formed by being divided in an oblique direction with a connecting portion 24a therebetween. The second wiring layers 37c and 37c are disposed inside the wiring paths 23A and 23A and are separated from each other with the connecting portion 24a therebetween.

In this configuration, the fourth insulating layer 47 and the fourth bridge connection layer 48 that cover the connection portion 24a are formed to extend obliquely, and the fourth bridge connection layer 48 is formed by the second bridge connection layer 48, And the wiring layers 37c and 37c are connected to each other and rendered conductive.

1: Touch panel
2: Surface panel
5: Display panel
10: Input device
11: substrate
20: first electrode column
21, 21A, 21B: first electrode layer
22: Connection
23A, 23B, and 23C: a first wiring passage
24, 25: Classification electrode layer
26: electrode guide layer
27a, 27b, 27c: a first wiring layer
28a, 28b, 28c:
30: Second electrode column
31, 31A and 31B: the second electrode layer
33A, 33B, 33C: a second wiring passage
37a, 37b, 37c, 37d: the second wiring layer
38a, 38b, and 38c:
41: first insulating layer
42: first bridge connection layer
43: second insulating layer
44: second bridge connection layer
45: second insulating layer
46: third bridge connection layer
49: wiring guide layer
110, 210: input device
H: wiring area

Claims (7)

A first electrode layer and a second electrode layer formed of a light-transmitting conductive material are formed on a light-transmissive substrate, a plurality of the first electrode layers are arranged in a first direction, and a plurality of the second electrode layers cross each other in the first direction In an input device arranged in two directions,
A connecting portion connecting one of the first electrode layer and the second electrode layer is integrally formed of the light transmitting conductive material and the first insulating layer and the first bridge connecting layer are formed on the connecting portion in an overlapping manner , The other electrode layer is electrically connected to each other by the first bridge connection layer,
A wiring layer is formed in the first electrode layer, a wiring layer extending from the second electrode layer passes through the wiring passage,
The first electrode layer is divided into the wiring layers and the second electrode layer and the second bridge connection layer are formed on the continuous portion of the wiring layer, And the other layer is made conductive by the second bridge connection layer. The method according to claim 1,
And an electrode guide layer is formed between the segment electrode layer and the wiring layer of the first electrode layer. 3. The method according to claim 1 or 2,
The wiring layer is formed in the second electrode layer and the wiring layer extending from the second electrode layer passes through the wiring path formed in the second electrode layer different from the wiring path formed in the first electrode layer,
In the other second electrode layer, either one of the segment electrode layer and the wiring layer separated by the wiring passage is continuous in the wiring passage, and the third insulating layer and the third bridge connection Layer is formed, and the other layer is conducted by the third bridge connection layer. 3. The method according to claim 1 or 2,
Wherein the first electrode layer and the second electrode layer are arranged in an inclined direction inclined with respect to both the first direction and the second direction, and the wiring layer extends in the oblique direction. 5. The method of claim 4,
A plurality of first electrode rows formed of a plurality of the first electrode layers arranged in a first direction are arranged in a line in a second direction at intervals and a second electrode row formed of a plurality of second electrode layers arranged in a second direction Wherein the plurality of input devices are arranged in a line in the first direction at intervals. 3. The method according to claim 1 or 2,
The wiring layer extending from the first electrode layer and the wiring layer extending from the second electrode layer all extend in the first direction and the wiring layers extending from the first electrode layer are adjacent to each other, Wherein the wiring layers are adjacent to each other. The method according to claim 6,
Wherein a wiring guide layer is formed between a region (i) in which wiring layers extending from the first electrode layer are arranged adjacent to each other and a region (ii) in which wiring layers extending from the second electrode layer are arranged adjacent to each other, Input device.

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