KR20130125918A - Composition for enamel, preparation method of composition for enamel, and cooking appliance - Google Patents

Abstract

An enamel composition, a method for preparing the same and a cooking appliance are disclosed. The enamel composition comprises glass frit including P2O5, SiO2, B2O3, a heat resisting reinforcement composition and an adhesion reinforcement composition. The heat resisting reinforcement composition is selected from ZrO2, Al2O3, TiO2, or BaO, and the adhesion reinforcement composition is selected from CoO, NiO, MnO, Fe2O3 or CuO.

Description

Enamel composition, its manufacturing method and cooking apparatus {COMPOSITION FOR ENAMEL, PREPARATION METHOD OF COMPOSITION FOR ENAMEL, AND COOKING APPLIANCE}

The present invention relates to an enamel composition.

Enamel is a glass glaze applied to the surface of a metal plate. Common enamel is used in cooking appliances such as microwave ovens and ovens. On the other hand, the enamel is divided into an acid-proof enamel to prevent oxidation, a heat-resistant enamel to withstand high temperatures, etc., depending on the type or use of the glaze. Moreover, according to the material added to an enamel, it is classified into aluminum enamel, zirconium enamel, titanium enamel, soda glass enamel, etc.

In general, a cooking device is a device for cooking food by heating food using a heating source. Since food waste generated during the cooking process is buried in the cavity inner wall of the cooking appliance, when the cooking of the food is completed in the cooking appliance, it is necessary to clean the inside of the cavity. In addition, cooking of food involves high temperature, and the cavity inner wall and the like are exposed to organic substances and alkali components. Therefore, when enamel is used in a cooking appliance, such enamel requires heat resistance, chemical resistance, abrasion resistance, and stain resistance. Therefore, there is a need for a composition for enamel to improve the heat resistance, chemical resistance, abrasion resistance and fouling resistance of the enamel.

In particular, a technique that can easily clean the enamel commonly used in the oven is a pyrrolisis method that burns contaminants at a high temperature to ashes or a strong alkaline detergent. Accordingly, enamel is exposed to high temperature or high alkali detergents, and thus requires high heat resistance and chemical resistance.

In addition, various kinds of glass frits may be used to form such enamel. That is, to form the enamel, glass frits having different components may be used. In such a case, a process of forming various types of glass frits and uniformly mixing them may be applied, resulting in high energy consumption and high defective rate.

Embodiments provide an enamel composition having improved heat resistance, chemical resistance, and cleaning properties, a method for preparing the same, and a cooking apparatus including the same.

The enamel composition according to one embodiment includes a glass frit including P 2 O 5, SiO 2, B 2 O 3, a heat resistant strengthening component and an adhesion enhancing component, and the heat resistant enhancing component is selected from ZrO 2, Al 2 O 3, TiO 2 or BaO, and the adhesion strength The reinforcing component is selected from CoO, NiO, MnO, Fe 2 O 3 or CuO.

In one embodiment, the glass frit may further include Li 2 O, Na 2 O and K 2 O.

In one embodiment, the glass frit may further include NaF and ZnO.

In one embodiment, the glass frit may further include a Group II oxide, and the Group II oxide may be selected from CaO or MgO.

In one embodiment, the heat resistance enhancing component may include ZrO 2, Al 2 O 3, TiO 2 and BaO.

In one embodiment, the glass frit has a ratio of 10wt% to 20wt% of P2O5, 35wt% to 50wt% of SiO2, 15wt% to 25wt% of B2O3, and 10wt% to 25wt% of Na2O. Ratio, K2O at 4wt% to 15wt%, Li2O at 0.1wt% to 5wt%, Al2O3 at 0.1wt% to 10wt%, ZrO2 at 0.1wt% to 10wt%, BaO at a rate of 0.1wt% to 5wt%, TiO2 at a rate of 0.1wt% to 5wt%, NaF at a rate of 0.1wt% to 10wt%, ZnO at a rate of 0.1wt% to 5wt%, the above II The group oxide may be included in a ratio of 0.1 wt% to 10 wt%, and the adhesion reinforcing component may be included in a ratio of 0.1 wt% to 5 wt%.

In one embodiment, the adhesion enhancing component may include CoO, NiO, MnO, Fe 2 O 3 and CuO, and the Group II oxide may include CaO and MgO.

In one embodiment, the glass frit has a ratio of 14 wt% to 16 wt% of P2O5, 31 wt% to 33 wt% of SiO2, 19 wt% to 20 wt% of B2O3, and 6 wt% to 8 wt% of Na2O. Ratio, K2O at 4wt% to 5wt%, Li2O at 3wt% to 5wt%, Al2O3 at 1wt% to 2wt%, ZrO2 at 2wt% to 4wt%, BaO 2wt % To 4 wt%, NaF to 4wt% to 5wt%, Group II oxides to 4wt% to 5wt%, and the adhesion enhancing component at a ratio of 1.5wt% to 2.5wt%. .

According to an embodiment, a method of preparing an enamel composition may include providing a glass frit material including P 2 O 5, SiO 2, B 2 O 3, a heat resistance enhancing component, and an adhesion enhancing component; Melting the glass frit material; And quenching the melted P 2 O 5, SiO 2, B 2 O 3, a heat resistant strengthening component and an adhesion enhancing component to form a glass frit, wherein the heat resistant enhancing component is selected from ZrO 2, Al 2 O 3, TiO 2 or BaO, and The adhesion enhancing component is selected from CoO, NiO, MnO, Fe 2 O 3 or CuO.

In one embodiment, the glass deformation temperature of the glass frit may be 520 ℃ to 700 ℃.

The enamel composition according to the embodiment may have high heat resistance through a combination of components such as ZrO 2, Al 2 O 3, TiO 2, and BaO. In addition, the enamel composition according to the embodiment may provide an enamel having a high surface hardness through components such as Al 2 O 3, SiO 2, and ZrO 2.

In addition, the enamel composition according to the embodiment includes P2O5, SiO2, B2O3, Na2O, K2O, Li2O, Al2O3, ZrO2, BaO, TiO2, NaF, ZnO, Group II-based oxides, and the adhesion-enhancing component in one kind of glass frit at once. You can.

Accordingly, the enamel composition according to the embodiment can easily form a coating layer on a cooking appliance such as an oven by using one kind of glass frit. That is, the enamel composition according to the embodiment includes the components necessary for the coating layer of the cooking appliance in one type of glass frit.

Thus, the enamel composition according to the embodiment has a uniform property as a whole. In addition, the enamel composition according to the embodiment can be easily prepared in a simple process.

1 is a front view showing a cooking apparatus according to an embodiment of the present invention;
FIG. 2 is an enlarged cross-sectional view of a portion of a cavity inner surface of FIG. 1. FIG.
3 is an enlarged cross-sectional view of a part of the rear surface of the door of FIG. 1;

The enamel composition according to one embodiment includes a glass frit including P 2 O 5, SiO 2, B 2 O 3, a heat resistance enhancing component and an adhesion enhancing component.

In addition, the glass frit may further include Li 2 O, Na 2 O, and K 2 O.

In addition, the glass frit may further include NaF and ZnO.

In addition, the glass frit may further include a Group II oxide.

SiO 2 and B 2 O 3 may be the main constituents of the glass frit. SiO 2 and B 2 O 3 may be included in the ratio of about 50 wt% to about 75 wt% in the glass frit. In more detail, SiO 2 and B 2 O 3 may be included in the ratio of about 50 wt% to about 60 wt% in the glass frit. In more detail, SiO 2 and B 2 O 3 may be included in the glass frit in a ratio of about 50 wt% to about 55 wt%.

In addition, SiO 2 may be included in a ratio of about 35 wt% to about 50 wt% based on the glass frit. In more detail, SiO 2 may be included in a ratio of about 31 wt% to about 33 wt% based on the glass frit.

In addition, B 2 O 3 may be included in a ratio of about 15 wt% to about 25 wt% based on the glass frit. In more detail, B 2 O 3 may be included in a ratio of about 19 wt% to about 20 wt% based on the glass frit.

As SiO 2 and B 2 O 3 are used as main components of the glass frit, the glass frit may include P 2 O 5, Na 2 O, K 2 O, LiO 2, ZrO 2, Al 2 O 3, TiO 2, BaO, NaF, the Group II-based oxide, and the adhesion enhancing component. have. That is, SiO 2 and B 2 O 3 may perform a solvent function to form the glass frit together with P 2 O 5, Na 2 O, K 2 O, LiO 2, ZrO 2, Al 2 O 3, TiO 2, BaO, NaF, the Group II oxide, and the adhesion enhancing component. . That is, by SiO 2 and B 2 O 3, P 2 O 5, Na 2 O, K 2 O, LiO 2, ZrO 2, Al 2 O 3, TiO 2, BaO, NaF, the Group II oxide, and the adhesion enhancing component may be formed of one glass frit.

In addition, SiO 2 may be included in the glass frit to improve acid resistance of the glass frit. In addition, B 2 O 3 may perform a function of enlarging the vitrification area of the glass frit and appropriately adjusting the thermal expansion coefficient of the enamel composition according to the embodiment.

P 2 O 5, Na 2 O, K 2 O and LiO 2 may form an alkali phosphate glass structure. In addition, P 2 O 5, Na 2 O, K 2 O and LiO 2 impart improved cleaning performance to the enamel composition according to the embodiment. That is, since the glass frit includes P 2 O 5, Na 2 O, K 2 O and LiO 2, when the coating layer formed by the enamel composition according to the embodiment is contaminated by food or the like, the coating layer may be easily cleaned by water.

P 2 O 5 may be included in a ratio of about 10 wt% to about 20 wt% based on the glass frit. In more detail, P 2 O 5 may be included in a ratio of about 14 wt% to about 16 wt% based on the glass frit.

Na 2 O may be included in a ratio of about 10 wt% to about 25 wt% based on the glass frit. In more detail, Na 2 O may be included in a ratio of about 6 wt% to about 8 wt% based on the glass frit.

K2O may be included in the glass frit in a ratio of about 4 wt% to about 15 wt% based on the glass frit. In more detail, K 2 O may be included in the glass frit in a ratio of about 4 wt% to about 5 wt% based on the glass frit.

Li2O may be included in the glass frit in a ratio of about 0.1 wt% to about 5 wt% based on the glass frit. In more detail, Li 2 O may be included in the glass frit in a ratio of about 3 wt% to about 5 wt% based on the glass frit.

The heat resistance enhancing component may be selected from ZrO 2, Al 2 O 3, TiO 2 or BaO. In more detail, the heat resistance enhancing component may include ZrO 2, Al 2 O 3, TiO 2 and BaO. The heat resistance enhancing component may include ZrO 2, Al 2 O 3 and BaO. That is, the glass frit may include all of ZrO 2, Al 2 O 3, TiO 2 and BaO, or may include ZrO 2, Al 2 O 3, and BaO except for TiO 2. In particular, ZrO 2, Al 2 O 3 and BaO may be combined to improve heat resistance characteristics of the enamel composition according to the embodiment.

The glass frit may have a glass deformation temperature of about 520 ° C. or more. For example, the glass deformation temperature of the glass frit may be 520 ° C to 700 ° C. Accordingly, the coating layer formed by the enamel composition according to the embodiment may have a glass deformation temperature of about 520 ° C. or more, more specifically, about 520 ° C. to about 700 ° C. Accordingly, the enamel composition according to the embodiment can form a coating layer that does not deform even at high temperatures.

In addition, Al 2 O 3 and ZrO 2 may improve the chemical durability of the glass frit. In particular, Al 2 O 3 and ZrO 2 can compensate for the weak chemical resistance of the alkaline foam glass structure formed by P 2 O 5, Na 2 O, K 2 O and LiO 2.

In addition, by the combination of SiO 2, Al 2 O 3 and ZrO 2, the surface hardness of the coating layer may be improved.

Al 2 O 3 may be included in the glass frit in a ratio of about 0.1 wt% to about 10 wt% based on the glass frit. In more detail, Al 2 O 3 may be included in the glass frit in a ratio of about 1 wt% to about 2 wt% based on the glass frit.

ZrO 2 may be included in the glass frit in a ratio of about 0.1 wt% to about 10 wt% based on the glass frit. In more detail, ZrO 2 may be included in the glass frit in a ratio of about 2 wt% to about 4 wt% based on the glass frit.

BaO may be included in the glass frit in a ratio of about 0.1 wt% to about 5 wt% based on the glass frit. In more detail, BaO may be included in the glass frit in a ratio of about 2 wt% to about 4 wt% based on the glass frit.

TiO 2 may be included in the glass frit at a rate of about 0.1 wt% to about 5 wt% based on the glass frit.

In addition, NaF and TiO 2 may perform a function of appropriately adjusting the surface tension of the coating layer. In addition, NaF and TiO 2 may improve the hiding power of the enamel composition according to the embodiment. That is, by NaF and TiO2, hiding power of the coating layer can be improved.

NaF may be included in the glass frit in a ratio of about 0.1 wt% to about 10 wt% based on the glass frit. In more detail, NaF may be included in the glass frit in a ratio of about 4 wt% to about 5 wt% based on the glass frit.

ZnO may be included in the glass frit in a ratio of about 0.1 wt% to about 5 wt% based on the glass frit.

The Group II-based oxide may be selected from CaO or MgO. In more detail, the Group II oxide may include CaO and MgO. That is, the glass frit may include CaO and MgO.

The Group II-based oxide may be included in the glass frit in a ratio of about 0.1 wt% to about 10 wt% based on the glass frit. In more detail, the Group II-based oxide may be included in the glass frit in a ratio of about 4 wt% to about 5 wt% based on the glass frit.

The adhesion enhancing component is selected from CoO, NiO, MnO, Fe 2 O 3 or CuO. In more detail, the adhesion enhancing component may include CoO, NiO, MnO, Fe 2 O 3 and CuO. That is, the glass frit may include all of CoO, NiO, MnO, Fe 2 O 3, and CuO.

The adhesion enhancing component may be included in the glass frit in a ratio of about 0.1 wt% to about 5 wt% based on the glass frit. In more detail, the adhesion enhancing component may be included in the glass frit in a ratio of about 1.5 wt% to about 2.5 wt% based on the glass frit.

In addition, the glass frit has a ratio of about 10 wt% to about 20 wt% of P 2 O 5, about 35 wt% to about 50 wt% of SiO 2, about 15 wt% to about 25 wt% of B 2 O 3, and about 10 wt% of Na 2 O. To about 25 wt%, K 2 O at about 4 wt% to about 15 wt%, Li 2 O at about 0.1 wt% to about 5 wt%, Al 2 O 3 at about 0.1 wt% to about 10 wt%, ZrO 2 At a ratio of about 0.1 wt% to about 10 wt%, BaO at a ratio of about 0.1 wt% to about 5 wt%, TiO 2 at a ratio of about 0.1 wt% to about 5 wt%, NaF about 0.1 wt% to about 10 wt% % Of ZnO in a ratio of about 0.1 wt% to about 5 wt%, about 0.1 wt% to about 10 wt% of the Group II oxide, and about 0.1 wt% to about 5 wt% of the adhesion enhancing component. It can be included as a ratio.

More specifically, the glass frit has a ratio of about 14 wt% to about 16 wt% P 2 O 5, about 31 wt% to about 33 wt% SiO 2, about 19 wt% to about 20 wt% B 2 O 3, about 6 wt% Na 2 O. % To about 8wt%, K2O to about 4wt% to about 5wt%, Li2O to about 3wt% to about 5wt%, Al2O3 to about 1wt% to about 2wt%, ZrO2 to From about 2 wt% to about 4 wt%, from about 2 wt% to about 4 wt% BaO, from about 4 wt% to about 5 wt% NaF, and from about 4 wt% to about 5 wt% of the Group II oxide. In proportion, the adhesion enhancing component may be included in a ratio of about 1.5 wt% to about 2.5 wt%.

The glass frit may have a diameter of about 0.1 μm to about 50 μm. In addition, the glass frit may be dispersed in a solvent such as acetone or water. That is, the enamel composition according to the embodiment may be used by dispersing the glass frit in the solvent.

The enamel composition according to the embodiment may be prepared by the following method.

First, a glass frit material for forming the glass frit is provided. The glass frit material includes P 2 O 5, SiO 2, B 2 O 3, the heat resistance enhancing component and the adhesion enhancing component. In addition, the glass frit material may further include Li 2 O, Na 2 O and K 2 O. In addition, the glass frit material may further comprise NaF and ZnO. In addition, the glass frit material may further include the Group II oxide.

Thereafter, the glass frit material is melted. For example, the glass frit material may be melted at a temperature of about 1300 ° C to about 1600 ° C. In addition, the glass frit material may be melted for about 1 hour to about 1 hour 30 minutes.

Thereafter, the melted glass frit material may be quenched by using a chiller or the like. Accordingly, the glass frit may be formed. In this case, the content of each component of the glass frit to be formed may be determined by the content of each component included in the glass frit material. That is, the content of each component included in the glass frit material may be substantially the same as the content of each component of the glass frit.

Thereafter, the glass frit may be dispersed in a solvent such as acetone. Thereafter, the solvent may be dried. Thereafter, the glass frit may be filtered by a mesh or the like. In particular, the glass frit may be filtered to have a diameter of about 50 μm or less.

As such, an enamel composition including the glass frit may be formed.

Thereafter, the enamel composition according to the embodiment may form the coating layer by the following method.

First, the enamel composition according to the embodiment can be used dispersed in a solvent such as water. That is, the glass frit is dispersed in a solvent. Thereafter, the enamel composition according to the embodiment is coated on one surface of the object to be coated by a spray method. The object may be a metal plate or a tempered glass plate. In particular, the target object may be part or all of the cooking appliance.

Alternatively, the enamel composition according to the embodiment may be coated on the object in a dried state. The enamel composition according to the embodiment may be coated on the object by electrostatic attraction.

Thereafter, the object to which the enamel composition is coated according to the embodiment may be fired at a temperature of about 700 ° C to about 900 ° C. The coated enamel composition may be calcined for about 100 seconds to about 400 seconds.

Accordingly, the enamel composition according to the embodiment may form a coating layer on the target object.

The coating layer may have high heat resistance through a combination of components such as ZrO 2, Al 2 O 3, TiO 2, and BaO. In addition, the coating layer may provide an enamel having high surface hardness through components such as Al 2 O 3, SiO 2, and ZrO 2.

Therefore, the enamel composition according to the embodiment may provide a coating layer having improved heat resistance, cleaning property and chemical resistance.

In addition, the enamel composition according to the embodiment includes P2O5, SiO2, B2O3, Na2O, K2O, Li2O, Al2O3, ZrO2, BaO, TiO2, NaF, ZnO, Group II-based oxides, and the adhesion-enhancing component in one kind of glass frit at once. You can.

Accordingly, the enamel composition according to the embodiment may easily form the coating layer on a cooking appliance such as an oven by using one kind of glass frit. That is, the enamel composition according to the embodiment includes the components necessary for the coating layer of the cooking appliance in one type of glass frit.

Thus, the enamel composition according to the embodiment may provide a coating layer having a uniform property as a whole. In addition, the enamel composition according to the embodiment can be easily prepared in a simple process.

Hereinafter, a cooking apparatus according to an embodiment of the present invention will be described in more detail with reference to the accompanying drawings.

1 is a front view showing a cooking appliance according to an embodiment of the present invention, Figure 2 is a sectional view showing an enlarged portion of the inner surface of the cavity of Figure 1, Figure 3 is a sectional view showing an enlarged portion of the rear surface of the door of Figure 1 to be.

Referring to FIG. 1, the cooking apparatus 1 includes a cavity 11 in which a cooking chamber 12 is formed, a door 14 selectively opening and closing the cooking chamber 12, and a food in the cooking chamber 12. At least one heating source 13, 15, 16 providing heat for heating.

More specifically, the cavity 11 may be formed in a hexahedral shape of which the front surface is approximately opened. The heating source 13, 15, 16 may include a convection assembly 13 for discharging the heated air into the cavity 11, an upper heater 15 disposed above the cavity 11, And a lower heater 16 disposed below the cavity 11. The upper heater 15 and the lower heater 16 may be provided inside or outside the cavity 11. Of course, the heating source 13, 15, 16 does not necessarily include the convection assembly 13, the upper heater 15, and the lower heater 16. That is, the heating source 13, 15, 16 may include any one or more of the convection assembly 13, the upper heater 15, and the lower heater 16.

2 and 3, coating layers 17 and 18 are provided on the inner surface of the cavity 11 and the inner surface of the door 14, respectively. The coating layer 17 is formed by coating the enamel composition described above on the inner surface of the cavity 11 or the rear surface of the door 14. Substantially, the coating layers 17 and 18 serve to improve the heat resistance, chemical resistance and stain resistance of the inner surface of the cavity 12 and the rear surface of the door 14.

In particular, the cavity 11 and the door 14 may be formed of a metal plate, and the coating layers 17 and 18 may be directly coated on the metal plate. That is, since the enamel composition according to the embodiment includes the adhesion enhancing component, the coating layers 17 and 18 do not require an additional buffer layer, and may be directly coated on the metal plate or the like.

Referring to FIG. 4, a coating layer 18 is provided on the rear surface of the door. In particular, in the state in which the cooking chamber 12 is shielded, the coating layer 18 is provided on the rear surface of the door 14 facing the cooking chamber 12. The coating layer 18 serves to improve the heat resistance, chemical resistance and fouling resistance of the rear surface of the door 12. That is, the rear surface of the door 14 also has the same effect as the inner surface of the cavity 11.

Therefore, the inner surface of the cavity 11 and the rear surface of the door 14 have improved heat resistance, so that they can withstand long-term cooking and washing at high temperatures. In addition, by the coating layers 17 and 18, the inner surface of the cavity 11 and the rear surface of the door 14 have improved stain resistance, so that the inner surface of the cavity 11 and the rear surface of the door 14 are organic. The phenomenon of contamination by the material is reduced, and cleaning of the inner surface of the cavity 11 and the rear surface of the door 14 is easy. In addition, the inner surface of the cavity 11 and the rear surface of the door 14 are improved in chemical resistance, so that they are not denatured to organic substances and alkali chemicals, and do not corrode even after long-term use.

Although described above with reference to the embodiment, this is only an example and not to limit the present invention, those skilled in the art to which the present invention belongs to a variety of not illustrated above in the range without departing from the essential characteristics of the present embodiment It will be appreciated that eggplant modifications and applications are possible. For example, each component specifically shown in the embodiments can be modified and implemented. And differences relating to such modifications and applications will have to be construed as being included in the scope of the invention defined in the appended claims.

Experimental Example

As shown in Table 1 below, a glass frit material was provided. Thereafter, the glass frit material was melted for about 1 hour at a temperature of about 1500 ° C. Thereafter, the melted glass frit material was quenched through a chiller to produce a raw frit. The loaf frit was then dispersed in acetone and milled for 5 hours in a ball mill. The frit was dried and filtered through a mesh (325 mesh sieve) to have a particle diameter of about 45 μm or less, thereby forming a glass frit.

Thereafter, the enamel composition comprising the glass frit was coated on a steel plate through a corona discharge gun.

Thereafter, the coated enamel composition was baked at a temperature of about 850 ° C. for about 300 seconds to form a coating layer.

ingredient Ratio (wt%) P2O5 14.86 SiO2 32.24 B2O3 19.42 Na2O 6.99 K2O 4.40 Li2O 3.75 Al2O3 1.32 ZrO2 2.84 BaO 3 NaF 4.74 CaO + MgO 4.5 CoO + MnO + NiO + Fe2O3 1.94

result

The glass strain temperature (Td) of the coating layer thus formed was found to have a very high heat resistance of about 530 ℃. In particular, in order to measure the coefficient of thermal expansion and the heat resistance of the glass, both surfaces of the specimen were polished in parallel and then measured using the TMA (Thermo Machnical Analyzer), until the glass strain temperature, immediately after Ts (softening point), and the transition temperature and coefficient of thermal expansion. It was.

The cleaning performance of the composition for enamel (A) was measured. To measure the cleaning performance, apply 1g of chicken oil or monster mesh evenly and thinly as a contaminant on the surface of the test specimen (200 × 200 (mm) coated enamel), and then apply the contaminant. The prepared test body was placed in a thermostat and the contaminants were fixed at a temperature of 240 ° C. and a condition of 1 hour. After solidification, the test specimen was naturally cooled, and then the degree of curing was confirmed, and then immersed in a water bath having water at 25 ° C. for 10 minutes. After that, the hardened chicken oil was wiped with a wet cloth with a force of 2.5 kgf or less. A flat bar with a diameter of 5 cm was used to homogenize the wipe on the contaminated enamel surface. At this time, the number of reciprocating wipes is measured and this is defined as the number of cleaning, and the evaluation index is as follows. The cleaning performance of the coating layer made of the enamel composition measured by the above method was 5. Table 2 below relates to cleaning performance.

In addition, the acid and alkali resistance of the coating layer consisting of the enamel composition was measured. Acid resistance was dropped a few drops of the citric acid 10% solution on the calcined enamel specimens, after 15 minutes to wipe off the solution and observed the surface change. Alkali resistance evaluation was performed in the same manner as acid resistance evaluation, but anhydrous sodium carbonate 10% solution was used as a reagent.

As a result, the coating layer comprising the enamel composition had an acid resistance of AA and an alkali resistance of AA. Here, the degree of acid resistance and alkali resistance was evaluated by ASTM, ISO 2722 method, which means that AA is very excellent, A is excellent, B is usually low, C is low, and D is very low.

Number of cleanings Level 1 to 5 5 6 to 15 4 16-25 3 26-50 2 51- One

As such, the coating layer was determined to have high cleaning performance, thermal shock stability, high chemical resistance and high adhesion.

Claims (15)

A glass frit comprising P 2 O 5, SiO 2, B 2 O 3, a heat resistance enhancing component and an adhesion enhancing component,
The heat resistance enhancing component is selected from ZrO 2, Al 2 O 3, TiO 2 or BaO,
The adhesion enhancing component is enamel composition selected from CoO, NiO, MnO, Fe 2 O 3 or CuO. The enamel composition of claim 1, wherein the glass frit further comprises Li 2 O, Na 2 O, and K 2 O. 6. The enamel composition of claim 2, wherein the glass frit further comprises NaF and ZnO. The method of claim 3, wherein the glass frit further comprises a Group II-based oxide,
Wherein the II-family oxide is selected from CaO or MgO. 5. The enamel composition of claim 4, wherein the heat resistance enhancing component comprises ZrO2, Al2O3, TiO2, and BaO. The method of claim 5, wherein the glass frit,
P 2 O 5 in a ratio of 10wt% to 20wt%,
SiO 2 at a rate of 35wt% to 50wt%,
B2O3 in a ratio of 15 wt% to 25 wt%,
Na 2 O at a rate of 10wt% to 25wt%,
K 2 O at a rate of 4wt% to 15wt%,
Li 2 O at a rate of 0.1wt% to 5wt%,
Al2O3 in a ratio of 0.1wt% to 10wt%,
ZrO 2 in a ratio of 0.1 wt% to 10 wt%,
BaO in a ratio of 0.1wt% to 5wt%,
TiO2 in a ratio of 0.1wt% to 5wt%,
NaF in a ratio of 0.1wt% to 10wt%,
ZnO at a ratio of 0.1 wt% to 5 wt%,
0.1 to 10 wt% of the Group II-based oxide,
Enamel composition comprising the adhesion strength enhancing component in a ratio of 0.1wt% to 5wt%. The method of claim 5, wherein the adhesion enhancing component comprises CoO, NiO, MnO, Fe2O3 and CuO,
Wherein the II-family oxide comprises CaO and MgO. The method of claim 7, wherein the glass frit,
P2O5 at a ratio of 14 wt% to 16 wt%,
SiO 2 in a ratio of 31wt% to 33wt%,
B2O3 at a ratio of 19 wt% to 20 wt%,
Na 2 O at a rate of 6wt% to 8wt%,
K 2 O at a rate of 4wt% to 5wt%,
Li 2 O at a rate of 3wt% to 5wt%,
Al2O3 in a ratio of 1wt% to 2wt%,
ZrO 2 in a ratio of 2wt% to 4wt%,
BaO in a ratio of 2wt% to 4wt%,
NaF at a rate of 4wt% to 5wt%,
4 wt% to 5wt% of the Group II oxide,
Enamel composition comprising the adhesive strength enhancing component in a ratio of 1.5wt% to 2.5wt%. Providing a glass frit material comprising P 2 O 5, SiO 2, B 2 O 3, a heat resistance enhancing component and an adhesion enhancing component;
Melting the glass frit material; And
Quenching the melted P 2 O 5, SiO 2, B 2 O 3, heat resistance enhancing component and adhesion enhancing component to form a glass frit,
The heat resistance enhancing component is selected from ZrO 2, Al 2 O 3, TiO 2 or BaO,
The adhesion enhancing component is a method for producing an enamel composition selected from CoO, NiO, MnO, Fe 2 O 3 or CuO. 10. The method of claim 9, wherein the glass frit material further comprises Li 2 O, Na 2 O, K 2 O, NaF, ZnO and Group II based oxides.
Wherein the II-family oxide is selected from CaO or MgO. The method of claim 10, wherein the heat resistance enhancing component comprises ZrO 2, Al 2 O 3, TiO 2, and BaO. The method of claim 11, wherein the adhesion enhancing component comprises CoO, NiO, MnO, Fe2O3 and CuO,
Wherein the II-family oxide comprises CaO and MgO. The method of claim 12, wherein the glass frit,
P2O5 at a ratio of 14 wt% to 16 wt%,
SiO 2 in a ratio of 31wt% to 33wt%,
B2O3 at a ratio of 19 wt% to 20 wt%,
Na 2 O at a rate of 6wt% to 8wt%,
K 2 O at a rate of 4wt% to 5wt%,
Li 2 O at a rate of 3wt% to 5wt%,
Al2O3 in a ratio of 1wt% to 2wt%,
ZrO 2 in a ratio of 2wt% to 4wt%,
BaO in a ratio of 2wt% to 4wt%,
NaF at a rate of 4wt% to 5wt%,
4 wt% to 5wt% of the Group II oxide,
Method for producing an enamel composition comprising the adhesive strength enhancing component in a ratio of 1.5wt% to 2.5wt%. The method of claim 13, wherein the glass deformation temperature of the glass frit is from 520 ° C to 700 ° C. The method of claim 12, wherein SiO 2 and B 2 O 3 are included in the glass frit in a ratio of 50 wt% to 75 wt%.

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